USD956005S1 - Shaped electrode - Google Patents

Shaped electrode Download PDF

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Publication number
USD956005S1
USD956005S1 US29/706,320 US201929706320F USD956005S US D956005 S1 USD956005 S1 US D956005S1 US 201929706320 F US201929706320 F US 201929706320F US D956005 S USD956005 S US D956005S
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US
United States
Prior art keywords
shaped electrode
design
view
electrode
shaped
Prior art date
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Active
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US29/706,320
Inventor
Robert C. Lindberg
Alexandre Likhanskii
Wayne LeBlanc
Frank Sinclair
Svetlana Radovanov
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Applied Materials Inc
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Applied Materials Inc
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Priority to US29/706,320 priority Critical patent/USD956005S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: RADOVANOV, SVETLANA, SINCLAIR, FRANK, LeBlanc, Wayne, LIKHANSKII, ALEXANDRE, LINDBERG, ROBERT C.
Priority to TW109300174F priority patent/TWD207500S/en
Priority to JPD2020-851F priority patent/JP1688601S/ja
Application granted granted Critical
Publication of USD956005S1 publication Critical patent/USD956005S1/en
Active legal-status Critical Current
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Description

FIG. 1 is an isometric view of our new design;
FIG. 2 is a first side view of the design of FIG. 1;
FIG. 3 is a second side view of the design of FIG. 1;
FIG. 4 is a first end view of the design of FIG. 1;
FIG. 5 is a second end view of the design of FIG. 1;
FIG. 6 is a top view of the design of FIG. 1; and,
FIG. 7 is a bottom view of the design of FIG. 1.
The broken lines shown represent portions of the shaped electrode that form no part of the claimed design.

Claims (1)

    CLAIM
  1. The ornamental design for a shaped electrode, as shown and described.
US29/706,320 2019-09-19 2019-09-19 Shaped electrode Active USD956005S1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US29/706,320 USD956005S1 (en) 2019-09-19 2019-09-19 Shaped electrode
TW109300174F TWD207500S (en) 2019-09-19 2020-01-13 Shaped electrode
JPD2020-851F JP1688601S (en) 2019-09-19 2020-01-20

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/706,320 USD956005S1 (en) 2019-09-19 2019-09-19 Shaped electrode

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USD956005S1 true USD956005S1 (en) 2022-06-28

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US29/706,320 Active USD956005S1 (en) 2019-09-19 2019-09-19 Shaped electrode

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JP (1) JP1688601S (en)
TW (1) TWD207500S (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD983151S1 (en) * 2020-09-09 2023-04-11 Kokusai Electric Corporation Exhaust liner for reaction tube
USD1018283S1 (en) * 2020-09-02 2024-03-19 Joseph Hamad Cooling insert for cast
USD1045838S1 (en) * 2015-10-30 2024-10-08 Lutron Technology Company Llc Illuminated antenna cover

Citations (81)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3025834A (en) * 1959-04-08 1962-03-20 American Stencil Mfg Co Double-end ball-point pen
US4107830A (en) * 1977-05-02 1978-08-22 Thomson George V Rolling pin construction
USD254912S (en) * 1978-05-16 1980-05-06 Pilot Man-Nen Hitsu Kabushiki Kaisha Fountain pen
US4544464A (en) * 1983-12-23 1985-10-01 Oronzio De Nora S.A. Ground anode prepacked with backfill in a flexible structure for cathode protection with impressed currents
USD282753S (en) * 1983-12-27 1986-02-25 The Parker Pen Company Writing instrument with a striped body
US5196171A (en) * 1991-03-11 1993-03-23 In-Vironmental Integrity, Inc. Electrostatic vapor/aerosol/air ion generator
USD335347S (en) * 1991-04-26 1993-05-04 Hu-Friedy Mfg. Co., Inc. Dental instrument handle
JPH0888074A (en) 1994-09-16 1996-04-02 Kazuo Okano Discharge electrode for ion generating device
JPH10270198A (en) 1997-03-27 1998-10-09 Nissin Electric Co Ltd Rfq electrode for four-rod rfq accelerator
USD407157S (en) * 1997-06-24 1999-03-23 Empi, Inc. Vaginal electrode
USD412531S (en) * 1997-11-13 1999-08-03 Debra Sue Blair Scratcher pen
US6130436A (en) 1998-06-02 2000-10-10 Varian Semiconductor Equipment Associates, Inc. Acceleration and analysis architecture for ion implanter
USD439337S1 (en) * 1998-02-06 2001-03-20 Michael Harold Jones Surgical needle holder
USD446213S1 (en) * 2001-01-04 2001-08-07 Intel Corporation Stylus
US6326631B1 (en) 1998-09-24 2001-12-04 U.S. Philips Corporation Ion implantation device arranged to select neutral ions from the ion beam
US6441382B1 (en) 1999-05-21 2002-08-27 Axcelis Technologies, Inc. Deceleration electrode configuration for ultra-low energy ion implanter
US6489622B1 (en) 2000-03-01 2002-12-03 Advanced Ion Beam Technology, Inc. Apparatus for decelerating ion beams with minimal energy contamination
US6573517B1 (en) 1999-07-30 2003-06-03 Sumitomo Eaton Nova Corporation Ion implantation apparatus
US6710358B1 (en) 2000-02-25 2004-03-23 Advanced Ion Beam Technology, Inc. Apparatus and method for reducing energy contamination of low energy ion beams
US6777696B1 (en) 2003-02-21 2004-08-17 Axcelis Technologies, Inc. Deflecting acceleration/deceleration gap
USD497388S1 (en) * 2004-02-25 2004-10-19 Premium Collection Industries Limited Four-in-one pen
US6946667B2 (en) 2000-03-01 2005-09-20 Advanced Ion Beam Technology, Inc. Apparatus to decelerate and control ion beams to improve the total quality of ion implantation
US6998625B1 (en) 1999-06-23 2006-02-14 Varian Semiconductor Equipment Associates, Inc. Ion implanter having two-stage deceleration beamline
US7022984B1 (en) 2005-01-31 2006-04-04 Axcelis Technologies, Inc. Biased electrostatic deflector
US7098614B2 (en) 2002-02-06 2006-08-29 Nissin Ion Equipment Co., Ltd. Electrostatic accelerator and ion implanting apparatus with the same
US20070045557A1 (en) 2005-08-26 2007-03-01 Angel Gordon C Technique for implementing a variable aperture lens in an ion implanter
US7223973B2 (en) 2000-12-01 2007-05-29 Ebara Corporation Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
US20070164229A1 (en) 2005-11-15 2007-07-19 Radovanov Svetlana B Technique for providing a segmented electrostatic lens in an ion implanter
US20070295901A1 (en) 2006-04-26 2007-12-27 Kellerman Peter L Methods and systems for trapping ion beam particles and focusing an ion beam
USD564462S1 (en) * 2005-12-27 2008-03-18 Tokyo Electron Limited RF electrode for a process tube of semiconductor manufacturing apparatus
US20080135777A1 (en) 2006-10-11 2008-06-12 Takatoshi Yamashita Ion implanter
USD572673S1 (en) * 2006-07-13 2008-07-08 Ebara Corporation Anode shaft
USD576647S1 (en) * 2006-10-06 2008-09-09 Nuflare Technology, Inc. Nozzle for vapor-phase epitaxial equipment
US7521675B2 (en) 2005-02-04 2009-04-21 Hitachi High-Technologies Corporation Charged particle beam apparatus
US7579605B2 (en) 2006-09-29 2009-08-25 Varian Semiconductor Equipment Associates, Inc. Multi-purpose electrostatic lens for an ion implanter system
US7579602B2 (en) 2006-12-22 2009-08-25 Varian Semiconductor Equipment Associates, Inc. Ion implantation with a collimator magnet and a neutral filter magnet
US20100171042A1 (en) 2009-01-02 2010-07-08 Varian Semiconductor Equipment Associates, Inc. Techniques for independently controlling deflection, deceleration and focus of an ion beam
US20110114851A1 (en) 2009-11-19 2011-05-19 Twin Creeks Technologies, Inc. Method and apparatus for modifying a ribbon-shaped ion beam
USD653760S1 (en) * 2010-08-31 2012-02-07 Johnson Dennis E J Vapor ion plasma generator
US8129695B2 (en) 2009-12-28 2012-03-06 Varian Semiconductor Equipment Associates, Inc. System and method for controlling deflection of a charged particle beam within a graded electrostatic lens
US20120168637A1 (en) 2010-12-29 2012-07-05 Varian Semiconductor Equipment Associates, Inc. Method and apparatus for controlling an electrostatic lens about a central ray trajectory of an ion beam
US8395070B2 (en) * 2010-04-01 2013-03-12 American Torch Tip Electrical contact point device for use in a plasma arc cutting torch
US8502160B2 (en) 2007-03-21 2013-08-06 Advanced Ion Beam Technology, Inc. Beam control assembly for ribbon beam of ions for ion implantation
US8604418B2 (en) 2010-04-06 2013-12-10 Axcelis Technologies, Inc. In-vacuum beam defining aperture cleaning for particle reduction
US20140034843A1 (en) 2012-08-01 2014-02-06 Varian Semiconductor Equipment Associates, Inc. Hybrid electrostatic lens with increased natural frequency
JP2014058724A (en) 2012-09-18 2014-04-03 Lintec Corp Ion implantation device
USD702654S1 (en) * 2012-05-29 2014-04-15 Asm Ip Holding B.V. Plasma power transfer rod for a semiconductor deposition apparatus
USD715235S1 (en) * 2014-03-05 2014-10-14 Alan G Ellman Fixed position RF electrode
US20150144810A1 (en) 2013-11-27 2015-05-28 Varian Semiconductor Equipment Associates, Inc. Triple mode electrostatic collimator
US20150155129A1 (en) 2013-12-02 2015-06-04 Sen Corporation Ion implantation apparatus
US20150340197A1 (en) 2014-05-26 2015-11-26 Sumitomo Heavy Industries Ion Technology Co., Ltd. Ion implantation apparatus
US20150340202A1 (en) 2014-05-26 2015-11-26 Sumitomo Heavy Industries Ion Technology Co., Ltd. Ion implantation apparatus
US20150380206A1 (en) 2014-06-27 2015-12-31 Advanced Ion Beam Technology, Inc. Single bend energy filter for controlling deflection of charged particle beam
TWD173861S (en) 2014-12-02 2016-02-21 日本麥克隆尼股份有限公司 Electric contact
US9287386B2 (en) 2014-06-19 2016-03-15 Applied Materials, Inc. Method for fabricating vertically stacked nanowires for semiconductor applications
US9293295B2 (en) 2014-03-27 2016-03-22 Sumitomo Heavy Industries Ion Technology Co., Ltd. Ion implantation apparatus, final energy filter, and ion implantation method
TWD179921S (en) 2016-05-23 2016-12-01 艾提那科技股份有限公司 Cathode electrode of neutralizer of ion source vacuum coating system
US9515166B2 (en) 2014-04-10 2016-12-06 Applied Materials, Inc. Selective atomic layer deposition process utilizing patterned self assembled monolayers for 3D structure semiconductor applications
US20170032924A1 (en) 2015-07-28 2017-02-02 Varian Semiconductor Equipment Associates, Inc. Controlling contamination particle trajectory from a beam-line electrostatic element
US9595451B1 (en) 2015-10-19 2017-03-14 Applied Materials, Inc. Highly selective etching methods for etching dielectric materials
CN206098343U (en) * 2016-04-21 2017-04-12 瓦里安半导体设备公司 A electrostatic lens for among ion implanter
US9640385B2 (en) 2015-02-16 2017-05-02 Applied Materials, Inc. Gate electrode material residual removal process
US9653310B1 (en) 2015-11-11 2017-05-16 Applied Materials, Inc. Methods for selective etching of a silicon material
US9679739B2 (en) 2014-12-26 2017-06-13 Axcelis Technologies, Inc. Combined electrostatic lens system for ion implantation
US9831097B2 (en) 2015-12-18 2017-11-28 Applied Materials, Inc. Methods for selective etching of a silicon material using HF gas without nitrogen etchants
TWD189296S (en) 2017-05-12 2018-03-21 晶元光電股份有限公司 Portion of light-emitting diode
US9978556B2 (en) 2015-12-11 2018-05-22 Varian Semiconductor Equipment Associates, Inc. Parallelizing electrostatic acceleration/deceleration optical element
US10068758B2 (en) 2017-01-27 2018-09-04 Varian Semiconductor Equipment Associates, Inc. Ion mass separation using RF extraction
US10088694B1 (en) * 2014-05-08 2018-10-02 Regina B. Casperson Rolled elastomeric tubular casings for eyewear
TWD195250S (en) 2017-11-17 2019-01-01 日商鳳凰電機股份有限公司 Partial design of electrode for discharge lamp
TWD195583S (en) 2018-02-02 2019-01-21 日商日本麥克隆尼股份有限公司 Part of electric contact
US10410844B2 (en) 2016-12-09 2019-09-10 Varian Semiconductor Equipment Associates, Inc. RF clean system for electrostatic elements
US10468224B2 (en) 2017-12-21 2019-11-05 Varian Semiconductor Equipment Associates, Inc. Apparatus and method for controlling ion beam properties using energy filter
US10497578B2 (en) 2016-07-22 2019-12-03 Applied Materials, Inc. Methods for high temperature etching a material layer using protection coating
US10522330B2 (en) 2015-06-12 2019-12-31 Varian Semiconductor Equipment Associates, Inc. In-situ plasma cleaning of process chamber components
US20200020508A1 (en) 2017-03-21 2020-01-16 Varian Semiconductor Equipment Associates, Inc. Electrostatic element having grooved exterior surface
US20200161077A1 (en) 2018-11-20 2020-05-21 Applied Materials, Inc. Electrostatic filter and ion implanter having asymmetric electrostatic configuration
US20200161078A1 (en) 2018-11-20 2020-05-21 Applied Materials, Inc. Apparatus and method for controlling ion beam using electostatic filter
US10665415B1 (en) 2018-11-06 2020-05-26 Applied Materials, Inc. Apparatus and method for controlling ion beam properties using electrostatic filter
USD901998S1 (en) * 2018-05-18 2020-11-17 Robert Bosch Gmbh Hot-melt pencil
US20210090845A1 (en) * 2019-09-19 2021-03-25 Applied Materials, Inc. Electrostatic filter with shaped electrodes

Patent Citations (91)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3025834A (en) * 1959-04-08 1962-03-20 American Stencil Mfg Co Double-end ball-point pen
US4107830A (en) * 1977-05-02 1978-08-22 Thomson George V Rolling pin construction
USD254912S (en) * 1978-05-16 1980-05-06 Pilot Man-Nen Hitsu Kabushiki Kaisha Fountain pen
US4544464A (en) * 1983-12-23 1985-10-01 Oronzio De Nora S.A. Ground anode prepacked with backfill in a flexible structure for cathode protection with impressed currents
USD282753S (en) * 1983-12-27 1986-02-25 The Parker Pen Company Writing instrument with a striped body
US5196171A (en) * 1991-03-11 1993-03-23 In-Vironmental Integrity, Inc. Electrostatic vapor/aerosol/air ion generator
USD335347S (en) * 1991-04-26 1993-05-04 Hu-Friedy Mfg. Co., Inc. Dental instrument handle
JPH0888074A (en) 1994-09-16 1996-04-02 Kazuo Okano Discharge electrode for ion generating device
JPH10270198A (en) 1997-03-27 1998-10-09 Nissin Electric Co Ltd Rfq electrode for four-rod rfq accelerator
USD407157S (en) * 1997-06-24 1999-03-23 Empi, Inc. Vaginal electrode
USD412531S (en) * 1997-11-13 1999-08-03 Debra Sue Blair Scratcher pen
USD439337S1 (en) * 1998-02-06 2001-03-20 Michael Harold Jones Surgical needle holder
US6130436A (en) 1998-06-02 2000-10-10 Varian Semiconductor Equipment Associates, Inc. Acceleration and analysis architecture for ion implanter
US6326631B1 (en) 1998-09-24 2001-12-04 U.S. Philips Corporation Ion implantation device arranged to select neutral ions from the ion beam
US6441382B1 (en) 1999-05-21 2002-08-27 Axcelis Technologies, Inc. Deceleration electrode configuration for ultra-low energy ion implanter
US6998625B1 (en) 1999-06-23 2006-02-14 Varian Semiconductor Equipment Associates, Inc. Ion implanter having two-stage deceleration beamline
US6573517B1 (en) 1999-07-30 2003-06-03 Sumitomo Eaton Nova Corporation Ion implantation apparatus
US6710358B1 (en) 2000-02-25 2004-03-23 Advanced Ion Beam Technology, Inc. Apparatus and method for reducing energy contamination of low energy ion beams
US6489622B1 (en) 2000-03-01 2002-12-03 Advanced Ion Beam Technology, Inc. Apparatus for decelerating ion beams with minimal energy contamination
US6946667B2 (en) 2000-03-01 2005-09-20 Advanced Ion Beam Technology, Inc. Apparatus to decelerate and control ion beams to improve the total quality of ion implantation
US7223973B2 (en) 2000-12-01 2007-05-29 Ebara Corporation Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
USD446213S1 (en) * 2001-01-04 2001-08-07 Intel Corporation Stylus
US7098614B2 (en) 2002-02-06 2006-08-29 Nissin Ion Equipment Co., Ltd. Electrostatic accelerator and ion implanting apparatus with the same
US6777696B1 (en) 2003-02-21 2004-08-17 Axcelis Technologies, Inc. Deflecting acceleration/deceleration gap
USD497388S1 (en) * 2004-02-25 2004-10-19 Premium Collection Industries Limited Four-in-one pen
US7022984B1 (en) 2005-01-31 2006-04-04 Axcelis Technologies, Inc. Biased electrostatic deflector
US7521675B2 (en) 2005-02-04 2009-04-21 Hitachi High-Technologies Corporation Charged particle beam apparatus
US20070045557A1 (en) 2005-08-26 2007-03-01 Angel Gordon C Technique for implementing a variable aperture lens in an ion implanter
US20070164229A1 (en) 2005-11-15 2007-07-19 Radovanov Svetlana B Technique for providing a segmented electrostatic lens in an ion implanter
USD564462S1 (en) * 2005-12-27 2008-03-18 Tokyo Electron Limited RF electrode for a process tube of semiconductor manufacturing apparatus
US20070295901A1 (en) 2006-04-26 2007-12-27 Kellerman Peter L Methods and systems for trapping ion beam particles and focusing an ion beam
USD572673S1 (en) * 2006-07-13 2008-07-08 Ebara Corporation Anode shaft
US7579605B2 (en) 2006-09-29 2009-08-25 Varian Semiconductor Equipment Associates, Inc. Multi-purpose electrostatic lens for an ion implanter system
USD576647S1 (en) * 2006-10-06 2008-09-09 Nuflare Technology, Inc. Nozzle for vapor-phase epitaxial equipment
US20080135777A1 (en) 2006-10-11 2008-06-12 Takatoshi Yamashita Ion implanter
US7579602B2 (en) 2006-12-22 2009-08-25 Varian Semiconductor Equipment Associates, Inc. Ion implantation with a collimator magnet and a neutral filter magnet
US8502160B2 (en) 2007-03-21 2013-08-06 Advanced Ion Beam Technology, Inc. Beam control assembly for ribbon beam of ions for ion implantation
US20100171042A1 (en) 2009-01-02 2010-07-08 Varian Semiconductor Equipment Associates, Inc. Techniques for independently controlling deflection, deceleration and focus of an ion beam
US7888653B2 (en) 2009-01-02 2011-02-15 Varian Semiconductor Equipment Associates, Inc. Techniques for independently controlling deflection, deceleration and focus of an ion beam
US20110114851A1 (en) 2009-11-19 2011-05-19 Twin Creeks Technologies, Inc. Method and apparatus for modifying a ribbon-shaped ion beam
US8129695B2 (en) 2009-12-28 2012-03-06 Varian Semiconductor Equipment Associates, Inc. System and method for controlling deflection of a charged particle beam within a graded electrostatic lens
US8395070B2 (en) * 2010-04-01 2013-03-12 American Torch Tip Electrical contact point device for use in a plasma arc cutting torch
US8604418B2 (en) 2010-04-06 2013-12-10 Axcelis Technologies, Inc. In-vacuum beam defining aperture cleaning for particle reduction
USD653760S1 (en) * 2010-08-31 2012-02-07 Johnson Dennis E J Vapor ion plasma generator
US8519353B2 (en) 2010-12-29 2013-08-27 Varian Semiconductor Equipment Associates, Inc. Method and apparatus for controlling an asymmetric electrostatic lens about a central ray trajectory of an ion beam
US20120168637A1 (en) 2010-12-29 2012-07-05 Varian Semiconductor Equipment Associates, Inc. Method and apparatus for controlling an electrostatic lens about a central ray trajectory of an ion beam
USD702654S1 (en) * 2012-05-29 2014-04-15 Asm Ip Holding B.V. Plasma power transfer rod for a semiconductor deposition apparatus
US20140034843A1 (en) 2012-08-01 2014-02-06 Varian Semiconductor Equipment Associates, Inc. Hybrid electrostatic lens with increased natural frequency
JP2014058724A (en) 2012-09-18 2014-04-03 Lintec Corp Ion implantation device
US20150144810A1 (en) 2013-11-27 2015-05-28 Varian Semiconductor Equipment Associates, Inc. Triple mode electrostatic collimator
US20150155129A1 (en) 2013-12-02 2015-06-04 Sen Corporation Ion implantation apparatus
USD715235S1 (en) * 2014-03-05 2014-10-14 Alan G Ellman Fixed position RF electrode
US9293295B2 (en) 2014-03-27 2016-03-22 Sumitomo Heavy Industries Ion Technology Co., Ltd. Ion implantation apparatus, final energy filter, and ion implantation method
US9515166B2 (en) 2014-04-10 2016-12-06 Applied Materials, Inc. Selective atomic layer deposition process utilizing patterned self assembled monolayers for 3D structure semiconductor applications
US9911594B2 (en) 2014-04-10 2018-03-06 Applied Materials, Inc. Selective atomic layer deposition process utilizing patterned self assembled monolayers for 3D structure semiconductor applications
US10088694B1 (en) * 2014-05-08 2018-10-02 Regina B. Casperson Rolled elastomeric tubular casings for eyewear
US20150340197A1 (en) 2014-05-26 2015-11-26 Sumitomo Heavy Industries Ion Technology Co., Ltd. Ion implantation apparatus
US20150340202A1 (en) 2014-05-26 2015-11-26 Sumitomo Heavy Industries Ion Technology Co., Ltd. Ion implantation apparatus
US9287386B2 (en) 2014-06-19 2016-03-15 Applied Materials, Inc. Method for fabricating vertically stacked nanowires for semiconductor applications
US9419107B2 (en) 2014-06-19 2016-08-16 Applied Materials, Inc. Method for fabricating vertically stacked nanowires for semiconductor applications
US9508831B2 (en) 2014-06-19 2016-11-29 Applied Materials, Inc. Method for fabricating vertically stacked nanowires for semiconductor applications
US9281162B2 (en) 2014-06-27 2016-03-08 Advanced Ion Beam Technology, Inc. Single bend energy filter for controlling deflection of charged particle beam
US20150380206A1 (en) 2014-06-27 2015-12-31 Advanced Ion Beam Technology, Inc. Single bend energy filter for controlling deflection of charged particle beam
TWD173861S (en) 2014-12-02 2016-02-21 日本麥克隆尼股份有限公司 Electric contact
US9679739B2 (en) 2014-12-26 2017-06-13 Axcelis Technologies, Inc. Combined electrostatic lens system for ion implantation
KR20170101884A (en) 2014-12-26 2017-09-06 액셀리스 테크놀러지스, 인크. Combined electrostatic lens system for ion implantation
US9640385B2 (en) 2015-02-16 2017-05-02 Applied Materials, Inc. Gate electrode material residual removal process
US10522330B2 (en) 2015-06-12 2019-12-31 Varian Semiconductor Equipment Associates, Inc. In-situ plasma cleaning of process chamber components
US20170032924A1 (en) 2015-07-28 2017-02-02 Varian Semiconductor Equipment Associates, Inc. Controlling contamination particle trajectory from a beam-line electrostatic element
US9721750B2 (en) 2015-07-28 2017-08-01 Varian Semiconductor Equipment Associates, Inc. Controlling contamination particle trajectory from a beam-line electrostatic element
US9595451B1 (en) 2015-10-19 2017-03-14 Applied Materials, Inc. Highly selective etching methods for etching dielectric materials
US9653310B1 (en) 2015-11-11 2017-05-16 Applied Materials, Inc. Methods for selective etching of a silicon material
US10249507B2 (en) 2015-11-11 2019-04-02 Applied Materials, Inc. Methods for selective etching of a silicon material
US9978556B2 (en) 2015-12-11 2018-05-22 Varian Semiconductor Equipment Associates, Inc. Parallelizing electrostatic acceleration/deceleration optical element
US9831097B2 (en) 2015-12-18 2017-11-28 Applied Materials, Inc. Methods for selective etching of a silicon material using HF gas without nitrogen etchants
US10204796B2 (en) 2015-12-18 2019-02-12 Applied Materials, Inc. Methods for selective etching of a silicon material using HF gas without nitrogen etchants
CN206098343U (en) * 2016-04-21 2017-04-12 瓦里安半导体设备公司 A electrostatic lens for among ion implanter
TWD179921S (en) 2016-05-23 2016-12-01 艾提那科技股份有限公司 Cathode electrode of neutralizer of ion source vacuum coating system
US10497578B2 (en) 2016-07-22 2019-12-03 Applied Materials, Inc. Methods for high temperature etching a material layer using protection coating
US10410844B2 (en) 2016-12-09 2019-09-10 Varian Semiconductor Equipment Associates, Inc. RF clean system for electrostatic elements
US10068758B2 (en) 2017-01-27 2018-09-04 Varian Semiconductor Equipment Associates, Inc. Ion mass separation using RF extraction
US20200020508A1 (en) 2017-03-21 2020-01-16 Varian Semiconductor Equipment Associates, Inc. Electrostatic element having grooved exterior surface
TWD189296S (en) 2017-05-12 2018-03-21 晶元光電股份有限公司 Portion of light-emitting diode
TWD195250S (en) 2017-11-17 2019-01-01 日商鳳凰電機股份有限公司 Partial design of electrode for discharge lamp
US10468224B2 (en) 2017-12-21 2019-11-05 Varian Semiconductor Equipment Associates, Inc. Apparatus and method for controlling ion beam properties using energy filter
TWD195583S (en) 2018-02-02 2019-01-21 日商日本麥克隆尼股份有限公司 Part of electric contact
USD901998S1 (en) * 2018-05-18 2020-11-17 Robert Bosch Gmbh Hot-melt pencil
US10665415B1 (en) 2018-11-06 2020-05-26 Applied Materials, Inc. Apparatus and method for controlling ion beam properties using electrostatic filter
US20200161077A1 (en) 2018-11-20 2020-05-21 Applied Materials, Inc. Electrostatic filter and ion implanter having asymmetric electrostatic configuration
US20200161078A1 (en) 2018-11-20 2020-05-21 Applied Materials, Inc. Apparatus and method for controlling ion beam using electostatic filter
US20210090845A1 (en) * 2019-09-19 2021-03-25 Applied Materials, Inc. Electrostatic filter with shaped electrodes

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
International Search Report and Written Opinion dated Nov. 17, 2020, for the International Patent Application No. PCT/US2020/045232, filed on Aug. 6, 2020, 10 pages.

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1045838S1 (en) * 2015-10-30 2024-10-08 Lutron Technology Company Llc Illuminated antenna cover
USD1018283S1 (en) * 2020-09-02 2024-03-19 Joseph Hamad Cooling insert for cast
USD983151S1 (en) * 2020-09-09 2023-04-11 Kokusai Electric Corporation Exhaust liner for reaction tube

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JP1688601S (en) 2021-06-28

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