USD715235S1 - Fixed position RF electrode - Google Patents
Fixed position RF electrode Download PDFInfo
- Publication number
- USD715235S1 USD715235S1 US29/484,071 US201429484071F USD715235S US D715235 S1 USD715235 S1 US D715235S1 US 201429484071 F US201429484071 F US 201429484071F US D715235 S USD715235 S US D715235S
- Authority
- US
- United States
- Prior art keywords
- electrode
- fixed position
- view
- design
- ornamental design
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Description
The broken lines shown in the drawings represent portions of the fixed position RF electrode that form no part of the claimed design.
All surfaces not shown form no part of the claimed design.
Claims (1)
- I claim the ornamental design for a fixed position RF electrode, as shown and described.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/484,071 USD715235S1 (en) | 2014-03-05 | 2014-03-05 | Fixed position RF electrode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/484,071 USD715235S1 (en) | 2014-03-05 | 2014-03-05 | Fixed position RF electrode |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USD715235S1 true USD715235S1 (en) | 2014-10-14 |
Family
ID=51661507
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/484,071 Active USD715235S1 (en) | 2014-03-05 | 2014-03-05 | Fixed position RF electrode |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | USD715235S1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD956005S1 (en) * | 2019-09-19 | 2022-06-28 | Applied Materials, Inc. | Shaped electrode |
| USD1017058S1 (en) * | 2023-03-06 | 2024-03-05 | Dongguan Miqiang Technology Co., Ltd | Radiofrequency device for eyes |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4424096A (en) * | 1982-12-23 | 1984-01-03 | Western Electric Co., Inc. | R-F Electrode type workholder and methods of supporting workpieces during R-F powered reactive treatment |
| US4882028A (en) * | 1988-01-22 | 1989-11-21 | Micron Technology, Inc. | R-F electrodes for removably providing electrical energy to an apparatus during R-F energy reactive treatment processes |
| US6590324B1 (en) * | 1999-09-07 | 2003-07-08 | Veeco Instruments, Inc. | Charged particle beam extraction and formation apparatus |
| USD681571S1 (en) * | 2010-09-29 | 2013-05-07 | Panasonic Corporation | Electrode |
| USD681572S1 (en) * | 2010-09-29 | 2013-05-07 | Panasonic Corporation | Electrode |
| USD692402S1 (en) * | 2012-03-08 | 2013-10-29 | Hypertherm, Inc. | Plasma torch electrode |
| USD699200S1 (en) * | 2011-09-30 | 2014-02-11 | Tokyo Electron Limited | Electrode member for a plasma processing apparatus |
| USD702654S1 (en) * | 2012-05-29 | 2014-04-15 | Asm Ip Holding B.V. | Plasma power transfer rod for a semiconductor deposition apparatus |
-
2014
- 2014-03-05 US US29/484,071 patent/USD715235S1/en active Active
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4424096A (en) * | 1982-12-23 | 1984-01-03 | Western Electric Co., Inc. | R-F Electrode type workholder and methods of supporting workpieces during R-F powered reactive treatment |
| US4882028A (en) * | 1988-01-22 | 1989-11-21 | Micron Technology, Inc. | R-F electrodes for removably providing electrical energy to an apparatus during R-F energy reactive treatment processes |
| US6590324B1 (en) * | 1999-09-07 | 2003-07-08 | Veeco Instruments, Inc. | Charged particle beam extraction and formation apparatus |
| US6774550B2 (en) * | 1999-09-07 | 2004-08-10 | Veeco Instruments, Inc. | Charged particle beam extraction and formation apparatus |
| US7005782B2 (en) * | 1999-09-07 | 2006-02-28 | Veeco Instruments, Inc. | Charged particle beam extraction and formation apparatus |
| USD681571S1 (en) * | 2010-09-29 | 2013-05-07 | Panasonic Corporation | Electrode |
| USD681572S1 (en) * | 2010-09-29 | 2013-05-07 | Panasonic Corporation | Electrode |
| USD699200S1 (en) * | 2011-09-30 | 2014-02-11 | Tokyo Electron Limited | Electrode member for a plasma processing apparatus |
| USD692402S1 (en) * | 2012-03-08 | 2013-10-29 | Hypertherm, Inc. | Plasma torch electrode |
| USD702654S1 (en) * | 2012-05-29 | 2014-04-15 | Asm Ip Holding B.V. | Plasma power transfer rod for a semiconductor deposition apparatus |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD956005S1 (en) * | 2019-09-19 | 2022-06-28 | Applied Materials, Inc. | Shaped electrode |
| USD1017058S1 (en) * | 2023-03-06 | 2024-03-05 | Dongguan Miqiang Technology Co., Ltd | Radiofrequency device for eyes |
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