USD623673S1 - Large area substrate processor - Google Patents

Large area substrate processor Download PDF

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Publication number
USD623673S1
USD623673S1 US29/330,000 US33000008F USD623673S US D623673 S1 USD623673 S1 US D623673S1 US 33000008 F US33000008 F US 33000008F US D623673 S USD623673 S US D623673S
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United States
Prior art keywords
large area
area substrate
substrate processor
processor
processing system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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US29/330,000
Inventor
Thomas L. Duer
John A. Miller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
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Publication date
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Priority to US29/330,000 priority Critical patent/USD623673S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: DUER, THOMAS L., MILLER, JOHN A.
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Publication of USD623673S1 publication Critical patent/USD623673S1/en
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FIG. 1 is a top plan view of a processing system for processing large area substrates.
FIG. 2 is a front elevation of the processing system of FIG. 1. The back elevation being the same as the front elevation.
FIGS. 3-4 are side views of the processing system of FIG. 1.
FIG. 5 is a bottom view of the processing system of FIG. 1; and,
FIG. 6 is a perspective view of the processing system of FIG. 1.
The present invention generally includes a vacuum processing system for processing large area substrates, such as flat panel displays (i.e., LCD, OLED, and other types of flat panel displays), solar panels, and the like.
The broken lines in the drawings depict unclaimed environmental subject matter.

Claims (1)

  1. The ornamental design for a large area substrate processor, as shown and described.
US29/330,000 2008-12-24 2008-12-24 Large area substrate processor Expired - Lifetime USD623673S1 (en)

Priority Applications (1)

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US29/330,000 USD623673S1 (en) 2008-12-24 2008-12-24 Large area substrate processor

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Application Number Priority Date Filing Date Title
US29/330,000 USD623673S1 (en) 2008-12-24 2008-12-24 Large area substrate processor

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USD623673S1 true USD623673S1 (en) 2010-09-14

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US29/330,000 Expired - Lifetime USD623673S1 (en) 2008-12-24 2008-12-24 Large area substrate processor

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD831085S1 (en) * 2016-12-09 2018-10-16 Hitachi High-Technologies Corporation Substrate processing unit
USD831086S1 (en) * 2016-12-09 2018-10-16 Hitachi High-Technologies Corporation Substrate processing unit
USD847237S1 (en) * 2016-12-09 2019-04-30 Hitachi High-Technologies Corporation Substrate processing unit
US11551960B2 (en) 2020-01-30 2023-01-10 Applied Materials, Inc. Helical plug for reduction or prevention of arcing in a substrate support

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6235634B1 (en) * 1997-10-08 2001-05-22 Applied Komatsu Technology, Inc. Modular substrate processing system
US6319373B2 (en) * 2000-01-28 2001-11-20 Anelva Corporation Substrate transfer apparatus of substrate processing system
US20040053184A1 (en) * 2002-09-12 2004-03-18 Applied Materials, Inc. Large area substrate processing system
US20050095088A1 (en) * 2003-10-20 2005-05-05 Applied Materials, Inc. Load lock chamber for large area substrate processing system
US20060008134A1 (en) * 2004-05-11 2006-01-12 Olympus Corporation Substrate processing apparatus and substrate processing system
US20060054495A1 (en) * 2004-09-10 2006-03-16 Hartmut Rohrmann Substrate processing system
US20070065581A1 (en) * 2005-09-22 2007-03-22 Tokyo Electron Limited Substrate processing system and method
US20070212816A1 (en) * 2006-03-08 2007-09-13 Tokyo Electron Limited Substrate processing system
US20080040061A1 (en) * 2006-08-08 2008-02-14 Tokyo Electron Limited Data collection method, substrate processing apparatus, and substrate processing system
US20080099440A1 (en) * 2006-11-01 2008-05-01 Tokyo Electron Limited Substrate processing method and substrate processing system
US20080141509A1 (en) * 2006-12-19 2008-06-19 Tokyo Electron Limited Substrate processing system, substrate processing method, and storage medium
US20090014414A1 (en) * 2006-10-12 2009-01-15 Tokyo Electron Limited Substrate processing method, substrate processing system, and computer-readable storage medium

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6235634B1 (en) * 1997-10-08 2001-05-22 Applied Komatsu Technology, Inc. Modular substrate processing system
US6319373B2 (en) * 2000-01-28 2001-11-20 Anelva Corporation Substrate transfer apparatus of substrate processing system
US20040053184A1 (en) * 2002-09-12 2004-03-18 Applied Materials, Inc. Large area substrate processing system
US20050095088A1 (en) * 2003-10-20 2005-05-05 Applied Materials, Inc. Load lock chamber for large area substrate processing system
US20060008134A1 (en) * 2004-05-11 2006-01-12 Olympus Corporation Substrate processing apparatus and substrate processing system
US20060054495A1 (en) * 2004-09-10 2006-03-16 Hartmut Rohrmann Substrate processing system
US20070065581A1 (en) * 2005-09-22 2007-03-22 Tokyo Electron Limited Substrate processing system and method
US20070212816A1 (en) * 2006-03-08 2007-09-13 Tokyo Electron Limited Substrate processing system
US20080040061A1 (en) * 2006-08-08 2008-02-14 Tokyo Electron Limited Data collection method, substrate processing apparatus, and substrate processing system
US20090014414A1 (en) * 2006-10-12 2009-01-15 Tokyo Electron Limited Substrate processing method, substrate processing system, and computer-readable storage medium
US20080099440A1 (en) * 2006-11-01 2008-05-01 Tokyo Electron Limited Substrate processing method and substrate processing system
US20080141509A1 (en) * 2006-12-19 2008-06-19 Tokyo Electron Limited Substrate processing system, substrate processing method, and storage medium

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD831085S1 (en) * 2016-12-09 2018-10-16 Hitachi High-Technologies Corporation Substrate processing unit
USD831086S1 (en) * 2016-12-09 2018-10-16 Hitachi High-Technologies Corporation Substrate processing unit
USD847237S1 (en) * 2016-12-09 2019-04-30 Hitachi High-Technologies Corporation Substrate processing unit
US11551960B2 (en) 2020-01-30 2023-01-10 Applied Materials, Inc. Helical plug for reduction or prevention of arcing in a substrate support

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