USD537048S1 - Photomask blank - Google Patents
Photomask blank Download PDFInfo
- Publication number
- USD537048S1 USD537048S1 US29/213,840 US21384004F USD537048S US D537048 S1 USD537048 S1 US D537048S1 US 21384004 F US21384004 F US 21384004F US D537048 S USD537048 S US D537048S
- Authority
- US
- United States
- Prior art keywords
- photomask blank
- view
- photomask
- blank
- along line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Description
FIG. 1 is a front elevational view of a photomask blank showing my new design;
FIG. 2 is a rear elevational view thereof;
FIG. 3 is a left side view thereof;
FIG. 4 is a right side view thereof;
FIG. 5 is a top plan view thereof;
FIG. 6 is a bottom plan view thereof;
FIG. 7 is an enlarged partial front view along line 7—7 in FIG. 1;
FIG. 8 is a reduced scale front, left side, top perspective view of the portion shown in FIG. 7; and,
FIG. 9 is a sectional view along line 9—9 in FIG. 7.
The broken line showing is for illustrative purposes only and forms no part of the claimed design.
Claims (1)
- The ornamental design for a photomask blank, as shown and described.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004014506 | 2004-05-17 | ||
| JP2004-014506 | 2004-05-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USD537048S1 true USD537048S1 (en) | 2007-02-20 |
Family
ID=37745420
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/213,840 Expired - Lifetime USD537048S1 (en) | 2004-05-17 | 2004-09-23 | Photomask blank |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | USD537048S1 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD568839S1 (en) * | 2004-05-17 | 2008-05-13 | Hoya Corporation | Photomask blank |
| USD720310S1 (en) * | 2011-06-17 | 2014-12-30 | Soraa, Inc. | Triangular semiconductor die |
| USD724552S1 (en) * | 2013-08-06 | 2015-03-17 | Formosa Epitaxy Incorporation | Partial semiconductor light emitting component |
| USD751999S1 (en) * | 2012-12-31 | 2016-03-22 | Soraa, Inc. | Array of triangular semiconductor dice |
| USD763806S1 (en) * | 2012-12-12 | 2016-08-16 | Soraa, Inc. | Triangular semiconductor die |
Citations (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1676741A (en) * | 1927-08-05 | 1928-07-10 | Moskowitz Jacob | Book-corner protector |
| US2728451A (en) * | 1951-09-12 | 1955-12-27 | Chicago Show Printing Company | Metal sheet and corner protector |
| US5112727A (en) * | 1987-12-04 | 1992-05-12 | Sharp Kabushiki Kaisha | Method of and photomask for manufacturing optical memory element |
| US5217256A (en) * | 1992-05-26 | 1993-06-08 | Lomas W P | Paper stack protection device |
| US5234781A (en) * | 1988-11-07 | 1993-08-10 | Fujitsu Limited | Mask for lithographic patterning and a method of manufacturing the same |
| US6122035A (en) * | 1997-08-22 | 2000-09-19 | Micron Technology, Inc. | Lithographic system and method for exposing a target utilizing unequal stepping distances |
| USD441730S1 (en) * | 1997-05-21 | 2001-05-08 | Sony Corporation | Semiconductor element |
| US6285783B1 (en) * | 1996-09-26 | 2001-09-04 | Kabushiki Kaisha Toshiba | Pattern data generating apparatus and method for inspecting defects in fine patterns in a photomask or semiconductor wafer |
| US20020187407A1 (en) * | 1999-11-15 | 2002-12-12 | Priestley Richard S. | Photolithography method, photolithography mask blanks, and method of making |
| US20030118918A1 (en) * | 2001-12-21 | 2003-06-26 | Masayuki Ohta | Photomask, production method of semiconductor laser element, and semiconductor laser element |
| US20030198873A1 (en) * | 2001-12-10 | 2003-10-23 | Dupont Photomasks, Inc. | Photomask and method for qualifying the same with a prototype specification |
| US20040265708A1 (en) * | 2003-06-24 | 2004-12-30 | Matsushita Electric Industrial Co., Ltd. | Photomask, pattern formation method using photomask and mask data creation method for photomask |
| USD502866S1 (en) * | 2003-09-08 | 2005-03-15 | Purple Communications, Limited | Fastener |
| US20050120326A1 (en) * | 2003-11-27 | 2005-06-02 | Infineon Technolgies Ag | Method for producing for a mask a mask layout which avoids aberrations |
| US20050147893A1 (en) * | 2002-02-08 | 2005-07-07 | Kazuhisa Ogawa | Exposure mask pattern forming method, exposure mask pattern, and semiconductor device manufacturing method |
| US20050269814A1 (en) * | 2004-06-07 | 2005-12-08 | Dillavou Thomas R | Book corner saver |
-
2004
- 2004-09-23 US US29/213,840 patent/USD537048S1/en not_active Expired - Lifetime
Patent Citations (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1676741A (en) * | 1927-08-05 | 1928-07-10 | Moskowitz Jacob | Book-corner protector |
| US2728451A (en) * | 1951-09-12 | 1955-12-27 | Chicago Show Printing Company | Metal sheet and corner protector |
| US5112727A (en) * | 1987-12-04 | 1992-05-12 | Sharp Kabushiki Kaisha | Method of and photomask for manufacturing optical memory element |
| US5234781A (en) * | 1988-11-07 | 1993-08-10 | Fujitsu Limited | Mask for lithographic patterning and a method of manufacturing the same |
| US5217256A (en) * | 1992-05-26 | 1993-06-08 | Lomas W P | Paper stack protection device |
| US6285783B1 (en) * | 1996-09-26 | 2001-09-04 | Kabushiki Kaisha Toshiba | Pattern data generating apparatus and method for inspecting defects in fine patterns in a photomask or semiconductor wafer |
| USD441730S1 (en) * | 1997-05-21 | 2001-05-08 | Sony Corporation | Semiconductor element |
| US6122035A (en) * | 1997-08-22 | 2000-09-19 | Micron Technology, Inc. | Lithographic system and method for exposing a target utilizing unequal stepping distances |
| US20020187407A1 (en) * | 1999-11-15 | 2002-12-12 | Priestley Richard S. | Photolithography method, photolithography mask blanks, and method of making |
| US20030198873A1 (en) * | 2001-12-10 | 2003-10-23 | Dupont Photomasks, Inc. | Photomask and method for qualifying the same with a prototype specification |
| US20030118918A1 (en) * | 2001-12-21 | 2003-06-26 | Masayuki Ohta | Photomask, production method of semiconductor laser element, and semiconductor laser element |
| US20050147893A1 (en) * | 2002-02-08 | 2005-07-07 | Kazuhisa Ogawa | Exposure mask pattern forming method, exposure mask pattern, and semiconductor device manufacturing method |
| US20040265708A1 (en) * | 2003-06-24 | 2004-12-30 | Matsushita Electric Industrial Co., Ltd. | Photomask, pattern formation method using photomask and mask data creation method for photomask |
| USD502866S1 (en) * | 2003-09-08 | 2005-03-15 | Purple Communications, Limited | Fastener |
| US20050120326A1 (en) * | 2003-11-27 | 2005-06-02 | Infineon Technolgies Ag | Method for producing for a mask a mask layout which avoids aberrations |
| US20050269814A1 (en) * | 2004-06-07 | 2005-12-08 | Dillavou Thomas R | Book corner saver |
Non-Patent Citations (1)
| Title |
|---|
| U.S. Appl. No. 29/213,841, filed Sep. 23, 2004, Inventors: Masaru Mitsui, et al., Entitled: Photomask Blank. |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD568839S1 (en) * | 2004-05-17 | 2008-05-13 | Hoya Corporation | Photomask blank |
| USD720310S1 (en) * | 2011-06-17 | 2014-12-30 | Soraa, Inc. | Triangular semiconductor die |
| USD763806S1 (en) * | 2012-12-12 | 2016-08-16 | Soraa, Inc. | Triangular semiconductor die |
| USD751999S1 (en) * | 2012-12-31 | 2016-03-22 | Soraa, Inc. | Array of triangular semiconductor dice |
| USD724552S1 (en) * | 2013-08-06 | 2015-03-17 | Formosa Epitaxy Incorporation | Partial semiconductor light emitting component |
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