US8792286B2 - Semiconductor memory device and operating method thereof - Google Patents
Semiconductor memory device and operating method thereof Download PDFInfo
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- US8792286B2 US8792286B2 US13/331,013 US201113331013A US8792286B2 US 8792286 B2 US8792286 B2 US 8792286B2 US 201113331013 A US201113331013 A US 201113331013A US 8792286 B2 US8792286 B2 US 8792286B2
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/26—Sensing or reading circuits; Data output circuits
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- Exemplary embodiments relate generally to an integrated circuit, and more particularly to a semiconductor memory device and an operating method thereof.
- a nonvolatile memory device retains data stored therein even in absence of power supply.
- the nonvolatile memory device includes a flash memory device.
- the flash memory device may be divided into a NOR flash memory device and a NAND flash memory device according to the structure of a memory cell array.
- the gate of the flash memory cell includes, for example, a tunnel insulating layer, a floating gate, a dielectric layer, and a control gate.
- a program operation and an erase operation are performed through F-N tunneling.
- the floating gate is accumulated with electrons by the program operation, and the electrons accumulated in the floating gate are discharged to a substrate by the erase operation.
- the threshold voltage of a memory cell shifted depending on the amount of electrons accumulated in the floating gate, is detected, and data is read on the basis of the detected threshold voltage.
- a random telegraph noise (RTN) phenomenon may occur and thus the threshold voltage of the memory cell may vary according to whether electrons are trapped in or released from the floating gate of the memory cell.
- detected threshold voltage of a memory cell may vary even though data stored in the memory cell has not changed owing to the RTN phenomenon.
- the RTN phenomenon makes it difficult to narrow the width of a distribution of the threshold voltages of memory cells because the threshold voltages of the memory cells verified in a programming process are shifted.
- Exemplary embodiments relate to a semiconductor memory device and an operating method thereof which are capable of narrowing a distribution of the threshold voltages of memory cells by repeatedly reading data from the same memory cell by a set number and determining the mean value of read data as data of the memory cell.
- a semiconductor memory device includes a page buffer configured to store data read from a memory cell, a counter circuit configured to count the number of first data or second data in the read data for every read operation while the read operations are repeated a set number of times, and a control logic configured to determine the number of read operations and determine the read data of the memory cell based on the counted number.
- a data read method of a semiconductor memory device includes repeating a read operation on a first memory cell a set number of times by using a first read voltage in response to a read command, counting the number of first data or second data in data read while the read operations are repeated, and determining the data, stored in the memory cell, based on the counted number of first or second data.
- a data read method of a semiconductor memory device includes repeating a read operation a set number of times using a first read voltage in order to read most significant bit (MSB) data stored in a memory cell, counting the number of first data or second data in read data for every read operation, and determining first read data based on the counted number of first data or second data.
- MSB most significant bit
- FIG. 1 shows a distribution of the threshold voltages of memory cells
- FIG. 2 shows an RTN phenomenon occurring according to the degree of integration of semiconductor memory devices
- FIG. 3A shows a semiconductor memory device for illustrating an embodiment of the present invention
- FIG. 3B shows distributions of the threshold voltages of memory cells of FIG. 3A when the memory cells are programmed
- FIG. 4 shows a page buffer of FIG. 3A ;
- FIGS. 5A and 5B are flowcharts illustrating the read operation of the semiconductor memory device according to an embodiment of the present invention.
- FIGS. 6 and 7 show an effect that RTN is compensated for according to the number of readings.
- FIG. 8 shows part of a semiconductor memory device according to an embodiment of the present invention.
- FIG. 1 shows a distribution of the threshold voltages of memory cells
- FIG. 2 shows an RTN phenomenon occurring according to the degree of integration of semiconductor memory devices.
- a random telegraph noise (RTN) phenomenon in which the threshold voltages of the memory cells are shifted occurs, thereby widening a distribution of the threshold voltages.
- the RTN phenomenon can be explained from the fact that the threshold voltage of the memory cell may vary according to whether electrons are trapped in or released from the floating gate of the memory cell.
- the RTN phenomenon is becoming a source of concern in light of the ongoing effort to achieve more highly integrated and smaller sized semiconductor memory devices. As shown in FIG. 2 , a probability of occurrence of the RTN phenomenon increases with an increase in the degree of integration.
- FIG. 3A shows a semiconductor memory device for illustrating an embodiment of the present invention.
- the semiconductor memory device 100 includes a memory cell array 110 , a page buffer group 120 , an X decoder 130 , a Y decoder 140 , an I/O logic 150 , a voltage supply circuit 160 , and a control logic 170 .
- the memory cell array 100 includes a plurality of memory blocks BK.
- Each of the memory blocks BK includes a plurality of cell strings CS.
- Each of the cell strings CS includes, for example, 0 th to 31 st memory cells C 0 to C 31 coupled in series between a drain select transistor DST and a source select transistor SST.
- the gate of the drain select transistor DST is coupled to a drain select line DSL, and the gate of the source select transistor SST is coupled to a source select line SSL.
- the gates of the 0 th to 31 st memory cells C 0 to C 31 are coupled to 0 th to 31 st word lines WL 0 to WL 31 , respectively.
- the drains of the drain select transistors DST are coupled to respective bit lines.
- the bit lines may be divided into even bit lines BLe and odd bit lines BLo.
- the sources of the source select transistors SST are coupled to a common source line SL in common.
- FIG. 3B shows distributions of the threshold voltages of the memory cells of FIG. 3A when the memory cells are programmed.
- the memory cells of FIG. 3A are Multi-Level Cells (MLC), and one of the threshold voltages of the memory cells may belong to one of four threshold voltage distributions (for example, 11, 01, 00, 10) through a programming process.
- MLC Multi-Level Cells
- LSB Least Significant Bit
- MSB Most Significant Bit
- data programmed in the MSB logical page is read using first and third read voltages R 1 and R 3 .
- the page buffer group 120 includes a plurality of page buffers PB for a program or read operation.
- Each of the page buffers PB is coupled to, for example, a pair of the even bit line BLe and the odd bit line BLo.
- the Y decoder 140 provides an I/O path between the page buffer group 120 and the I/O logic 150 in response to a control signal generated from the control logic 170 .
- the I/O logic 150 performs data input and output from and to the outside.
- the X decoder 130 includes a plurality of block selectors 131 .
- the block selectors 131 are coupled to the respective memory blocks BK.
- the block selector 131 couples the drain select line DSL and the global drain select line GDSL, couples the source select line SSL and the global source select line GSSL, and couples the 0 th to 31 st word lines WL 0 to WL 31 of the memory block BK, and the 0 th to 31 st global word lines GWL 0 to GWL 31 , respectively, in response to the control signal of the control logic 170 .
- the voltage supply circuit 160 generates operating voltages in response to the control signal of the control logic 170 and supplies the operating voltages to the global lines GSSL, GDSL, and GWL 0 to GWL 31 .
- the control logic 170 generates control signals for controlling the operations of the page buffer group 120 , the X decoder 130 , the Y decoder 140 , the I/O logic 150 , and the voltage supply circuit 160 of the semiconductor memory device 100 .
- FIG. 4 shows the page buffer PB of FIG. 3A .
- the page buffer PB includes, for example, a bit line selection unit 201 , first and second sense units 202 and 205 , a precharge unit 203 , a data I/O unit 204 , a counter circuit 206 , first and second latches L 1 and L 2 , and transistors for data transmission, reset, and set.
- bit line selection unit 201 selects one of the even bit line BLe and the odd bit line BLo and couples the selected bit line to a node K or precharges or discharges the even bit line BLe and the odd bit line BLo.
- the bit line selection unit 201 may include first to fourth NMOS transistors N 1 to N 4 .
- the first and the second NMOS transistors N 1 and N 2 are coupled in series between the even bit line BLe and the odd bit line BLo.
- An even discharge signal DISCHe is inputted to the gate of the first NMOS transistor N 1
- an odd discharge signal DISCHo is inputted to the gate of the second NMOS transistor N 2 .
- variable voltage VIRPWR is inputted to a node connecting the first and the second NMOS transistors N 1 and N 2 .
- the variable voltage VIRPWR may become a power source voltage Vcc or a ground voltage Vss in order to precharge or discharge the bit lines.
- the third NMOS transistor N 3 is coupled between the even bit line BLe and the node K, and the fourth NMOS transistor N 4 is coupled between the odd bit line BLo and the node K.
- An even selection signal BLSe is inputted to the gate of the third NMOS transistor N 3
- an odd selection signal BLSo is inputted to the gate of the fourth NMOS transistor N 4 .
- the first sense unit 202 may include a fifth NMOS transistor N 5 coupled between the node K and a first sense node SO 1 .
- the fifth NMOS transistor N 5 of the first sense unit 202 is turned on or off according to a voltage of the bit line BLe or BLo, coupled to the node K, and voltage of a sense signal PBSENSE inputted to the fifth NMOS transistor N 5 . Accordingly, the voltage of the first sense node SO 1 is determined according to the voltage of the bit line BLe or BLo coupled to the node K.
- the precharge unit 203 precharges the first sense node SO 1 .
- the precharge unit 203 may include a PMOS transistor P.
- the PMOS transistor P is coupled between the first sense node SO 1 and the input terminal of the power source voltage Vcc.
- a precharge signal PCGSO_N is inputted to the gate of the PMOS transistor P.
- Each of the first and the second latches L 1 and L 2 includes first and second inverters IN 1 and IN 2 and third and fourth inverters IN 3 and IN 4 , respectively.
- the data I/O unit 204 includes 23 rd and 24 th NMOS transistors N 23 and N 24 that are coupled between respective data I/O lines PBBITOUTb and PBBITOUT and the respective nodes QC and QC_N of the first latch L 1 .
- the data I/O unit 204 couples the nodes QC and QC_N to the respective data I/O lines PBBITOUTb and PBBITOUT in response to a data input signal PBYPASS.
- the second sense unit 205 couples a second sense node SO 2 to a ground node according to a voltage of the first sense node SO 1 .
- the second sense unit 205 may include a 20 th NMOS transistor N 20 .
- the 20 th NMOS transistor N 20 is coupled between the second sense node SO 2 and the ground node, and the gate of the 20 th NMOS transistor N 20 is coupled to the first sense node SO 1 .
- a 21 st NMOS transistor N 21 is coupled to the second sense node SO 2 .
- the page buffer PB further includes, for example, sixth to 19 th NMOS transistors N 6 to N 19 for resetting the first and the second latches L 1 and L 2 or transferring data, stored in the first and the second latches L 1 and L 2 , to the first sense node SO 1 .
- the sixth and the seventh NMOS transistors N 6 and N 7 are coupled in series between the first sense node SO 1 and the ground node.
- a first data transfer signal TRANC is inputted to the gate of the sixth NMOS transistor N 6 , and a node QC is coupled to the seventh NMOS transistor N 7 .
- the eighth and the ninth NMOS transistors N 8 and N 9 are coupled between the first sense node SO 1 and the ground node.
- a first data transfer signal TRANC_N is inputted to the gate of the eighth NMOS transistor N 8 , and a node QC_N is coupled to the ninth NMOS transistor N 9 .
- the tenth NMOS transistor N 10 is coupled between the first sense node SO 1 and the node QC_N, and a first program signal TRANCP is inputted to the gate of the tenth NMOS transistor N 10 .
- the 11 th NMOS transistor N 11 is coupled between the node QC and the second sense node SO 2 .
- the 12 th NMOS transistor N 12 is coupled between the node QC_N and the second sense node SO 2 .
- a first reset signal CRST is inputted to the gate of the 11 th NMOS transistor N 11
- a first set signal CSET is inputted to the gate of the 12 th NMOS transistor N 12 .
- the 13 th NMOS transistor N 13 is coupled between the first sense node SO 1 and a node QM, and a second data transfer signal TRANM_N is inputted to the gate of the 13 th NMOS transistor N 13 .
- the 14 th NMOS transistor N 14 is coupled between the first sense node SO 1 and a node QM_N, and a second data transfer signal TRANM is inputted to the gate of the 14 th NMOS transistor N 14 .
- the 15 th NMOS transistor N 15 is coupled between the node QM and the second sense node SO 2
- the 16 th NMOS transistor N 16 is coupled between the node QM_N and the second sense node SO 2 .
- a second reset signal MRST is inputted to the gate of the 15 th NMOS transistor N 15
- a second set signal MSET is inputted to the gate of the 16 th NMOS transistor N 16 .
- the 17 th and the 18 th NMOS transistors N 17 and N 18 are coupled in series between the first sense node SO 1 and a control signal input terminal FBIAS.
- a third data transfer signal TRANDY_N is inputted to the gate of the 17 th NMOS transistor N 17 .
- the 19 th NMOS transistor N 19 is coupled between the node QM_N and the gate of the 18 th NMOS transistor N 18 .
- a fourth data transfer signal TRANTODYN is inputted to the gate of the 19 th NMOS transistor N 19 .
- the counter circuit 206 is coupled between the first and the second sense nodes SO 1 and SO 2 .
- the counter circuit 206 may include a counter 207 and a storage unit 208 .
- the counter 207 counts the number of data 0.
- the counter 207 continues to count the number of data 0 while a read operation is repeatedly performed on one page by using the same read voltage, and the number of the data 0 counted by the counter 207 is stored in the storage unit 208 .
- a signal of the first sense node SO 1 corresponds to ‘1’.
- the signal of the first sense node SO 1 corresponds to ‘0’.
- the page buffer PB may include a 22 nd transistor N 22 for measuring the current of a memory cell.
- the 22 nd NMOS transistor N 22 is coupled to the first sense node SO 1 and one (e.g., PBBITOUT) of the data I/O lines.
- a cell current measurement signal CELLIV is inputted to the gate of the 22 nd NMOS transistor N 22 .
- the semiconductor memory device 100 comprising the counter 207 , for example, coupled to the first and the second sense nodes SO 1 and SO 2 of the page buffer PB as described above performs a read operation as follows.
- FIGS. 5A and 5B are flowcharts illustrating the read operation of the semiconductor memory device according to an embodiment of the present invention.
- FIGS. 5A and 5B an example where a read operation of an LSB logical page is performed and then a read operation of an MSB logical page is performed is described with reference to FIGS. 3A , 3 B, and 4 .
- the LSB and MSB logical pages are already known in the program operation of an MLC, and a detailed description thereof is omitted.
- the first and the third read voltages R 1 and R 3 may be used.
- the operations of FIGS. 5A and 5B focus on the operation of the page buffer PB.
- the control logic 170 of the semiconductor memory device 100 performs a first read operation using the first read voltage R 1 at step S 520 .
- parameters N and K for performing the read operation are set to ‘0’ at step S 521 .
- the parameter N is a number of times that reading is repeated.
- the parameter K is used as a count value.
- data is read using the first read voltage R 1 at step S 523 .
- the parameter N is raised by ‘1’.
- the read data is stored in the second latch L 2 of the page buffer PB.
- the data read at step S 523 is determined on the basis of the threshold voltage of a selected memory cell coupled to the page buffer PB.
- the data ‘0’ and the data ‘1’ are determined according to whether a threshold voltage is higher or lower than the first read voltage R 1 , but the definition of the data ‘0’ and the data ‘1’ may vary.
- the data ‘1’ may be defined as a data corresponding to a threshold voltage higher than the first read voltage R 1 and data ‘0’ may be defined as a data corresponding to a threshold voltage lower than the first read voltage R 1 .
- data ‘0’ is stored when a memory cell has a threshold voltage higher than the first read voltage R 1 and data ‘1’ is stored when a memory cell has a threshold voltage lower than the first read voltage R 1 .
- the control logic 170 supplies the precharge signal PCGSO_N. This operation may be performed so as to count the number of data ‘0’ or data ‘1’.
- the control logic 170 supplies the third and the fourth data transfer signals TRANDY_N and TRANTODYN of a high level to the page buffer PB.
- the 17 th and the 19 th NMOS transistors N 17 and N 19 are turned on.
- the control signal input terminal FBIAS is coupled to the ground node.
- the voltage of the node QM_N is ‘1’, and thus the 18 th NMOS transistor N 18 is turned on.
- the voltage of the first sense node SO 1 is discharged through the 17 th and the 18 th NMOS transistors N 17 and N 18 .
- the voltage of the node QM_N is ‘0’, and the 18 th NMOS transistor N 18 remains turned off.
- the voltage of the first sense node SO 1 maintains ‘1’.
- control logic 170 inputs the enable signal EN to the counter 207 .
- the counter 207 performs a counting operation according to a voltage of the first sense node SO 1 at steps S 525 and S 527 .
- the first sense node SO 1 When the data stored in the second latch L 1 is ‘1’, the first sense node SO 1 is discharged, and thus ‘0’ of a low level is inputted to the counter 207 . Thus, the counter 207 does not perform a counting operation.
- the counter 207 performs a counting operation because voltage ‘1’ of a high level remains in the first sense node SO 1 .
- the counter 207 raises the parameter K from ‘0’ to ‘1’. If the read data is ‘1’ and thus the voltage of the first sense node SO 1 becomes ‘0’, the counter 207 does not perform a counting operation.
- the count value ‘1’ is stored in the storage unit 208 .
- the counter 207 updates a count value stored in the storage unit 208 whenever the count value is updated.
- the parameter N is not equal to the set number
- data is read using the first read voltage R 1 and the parameter N is raised by ‘1’ at step S 523 .
- the number of data 0s is counted in the read data steps S 525 to S 527 .
- the repetitive read operation of a memory cell is stopped, and the control logic 170 checks whether the count value K stored in the storage unit 208 of the page buffer PB is greater than a set value at step S 531 .
- the repetitive read operation may be performed by repeatedly reading data from the same memory cell using the same read voltage, and the set value may be a value N/2 when reading is repeated N times. Therefore, if the parameter K is greater than the set value, the number of data 0s read by the repetitive read operation exceeds 50%.
- the data read from the memory cell coupled to the page buffer PB by using the first read voltage R 1 is determined as ‘0’ at step S 533 . If, as a result of the check at step S 531 , the parameter K is not greater than the set value, the data read from the memory cell coupled to the page buffer PB by using the first read voltage R 1 is determined as ‘1’ at step S 535 . The determined data is stored in the first latch L 1 . Next, the second latch L 2 is reset.
- a read operation using the third read voltage R 3 is performed like the read operation using the first read voltage R 1 .
- the read operation using the third read voltage R 3 is described below with reference to step S 550 of FIG. 5B .
- the parameter N Prior to the read operation using the third read voltage R 3 , the parameter N is reset to 0, and the parameter K is also reset to ‘0’ at step S 551 .
- the data read at step S 553 is determined as ‘0’ or ‘1’ on the basis of the threshold voltage of a memory cell.
- the determined data is stored in the node QM of the second latch L 2 .
- the data ‘0’ is stored in the page buffer PB coupled to a memory cell having a threshold voltage higher than the third read voltage R 3 .
- the data ‘1’ is stored in the page buffer PB coupled to a memory cell having a threshold voltage lower than the third read voltage R 3 .
- the counter 207 performs a counting operation according to a voltage of the first sense node SO 1 .
- the counter 207 performs a counting operation if the data stored in the second latch L 2 is ‘0’ at steps S 555 and S 557 .
- the first sense node SO 1 is first precharged.
- the 17 th and the 19 th NMOS transistors N 17 and N 19 are turned on in response to the third and the fourth data transfer signals TRANDY_N and TRANTODYN of a high level.
- the voltage of the first sense node SO 1 is changed on the basis of a state of the node QM_N of the second latch L 2 .
- the voltage of the first sense node SO 1 maintains a high level because the state of the node QM_N is ‘1’.
- the voltage of the first sense node SO 1 maintains a low level because the state of the node QM_N is ‘0’.
- the counter 207 performs a counting operation.
- the data read using the third read voltage R 3 is determined as ‘0’ at step S 563 . If the parameter K is smaller than the set number at step S 561 , the data read using the third read voltage R 3 is determined as ‘1’ at step S 565 .
- the determined data is stored in the second latch L 2 .
- Each of the data read using the first and the third read voltages R 1 and R 3 is stored in the first and the second latches L 1 and L 2 , respectively.
- step S 581 If the case of step S 581 is not true, the MSB data is determined as ‘1’ at step S 585 .
- the data read method of repeatedly reading data using the same read voltage and determining the mean value of the read data according to an embodiment of the present invention may compensate for an RTN phenomenon.
- FIGS. 6 and 7 show that an effect due to the RTN phenomenon is reduced according to the number of readings.
- the above method may also be applied to a semiconductor memory device having the page buffers PB each coupled to one bit line BL.
- FIG. 8 shows a part of a semiconductor memory device according to an embodiment.
- FIG. 8 only a memory cell array 310 and a page buffer group 320 are shown in the semiconductor memory device 300 according to an embodiment.
- the memory cell array 310 may have the same structure as that of FIG. 3A except that each page buffer PB is coupled to only one bit line BL among many bit lines.
- the page buffer PB may have a similar configuration as the page buffer PB of FIG. 4 .
- the page buffer PB may be configured without a bit line selection unit for selecting even or odd bit line.
- the above data read method may also be applied to the semiconductor memory device 300 .
- data is repeatedly read from the same memory cell a set number of times, and the mean value of the read data is determined as data of the memory cell, thereby compensating for a random telegraph noise (RTN) phenomenon.
- RTN random telegraph noise
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020100130512A KR101200125B1 (en) | 2010-12-20 | 2010-12-20 | Semiconductor memory device and method of operating the same |
| KR10-2010-0130512 | 2010-12-20 |
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| US20120155197A1 US20120155197A1 (en) | 2012-06-21 |
| US8792286B2 true US8792286B2 (en) | 2014-07-29 |
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| KR (1) | KR101200125B1 (en) |
| CN (1) | CN102543197B (en) |
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| KR100701345B1 (en) * | 2005-11-10 | 2007-03-29 | 주식회사 한국번디 | Turnpin condenser and its manufacturing method |
| KR101809202B1 (en) * | 2012-01-31 | 2017-12-14 | 삼성전자주식회사 | Non-volatile memory device and read method thereof |
| KR20140065244A (en) * | 2012-11-21 | 2014-05-29 | 서울대학교산학협력단 | Read method in semiconductor device to suppress rtn effect |
| US9142311B2 (en) * | 2013-06-13 | 2015-09-22 | Cypress Semiconductor Corporation | Screening for reference cells in a memory |
| JP5714681B2 (en) | 2013-10-25 | 2015-05-07 | ウィンボンド エレクトロニクス コーポレーション | Semiconductor memory device |
| US10074416B2 (en) * | 2016-03-28 | 2018-09-11 | Micron Technology, Inc. | Apparatuses and methods for data movement |
| KR20180053063A (en) * | 2016-11-11 | 2018-05-21 | 에스케이하이닉스 주식회사 | Semiconductor memory device |
| KR102402667B1 (en) * | 2018-01-10 | 2022-05-26 | 삼성전자주식회사 | Nonvolatile memory device and operating method of the same |
| US10878920B2 (en) | 2018-03-21 | 2020-12-29 | SK Hynix Inc. | Memory controller and memory system having the same |
| KR102366973B1 (en) * | 2018-03-26 | 2022-02-24 | 삼성전자주식회사 | Memory device |
| TWI684180B (en) | 2019-01-19 | 2020-02-01 | 大陸商深圳大心電子科技有限公司 | Data reading method, storage controller and storage device |
| KR102733670B1 (en) | 2019-05-02 | 2024-11-26 | 에스케이하이닉스 주식회사 | Memory controller and operating method of the memory controller |
| US11049582B1 (en) | 2020-05-07 | 2021-06-29 | Micron Technology, Inc. | Detection of an incorrectly located read voltage |
| CN111833927A (en) * | 2020-06-02 | 2020-10-27 | 珠海博雅科技有限公司 | Method for configuring built-in parameters of nonvolatile memory |
| CN115910166B (en) * | 2022-10-25 | 2025-08-29 | 长江存储科技有限责任公司 | Latch and driving method, page buffer, memory device and memory system |
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| KR20100086193A (en) * | 2009-01-22 | 2010-07-30 | 주식회사 하이닉스반도체 | Method of reading a semiconductor memory device |
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| US7242615B2 (en) * | 2004-06-29 | 2007-07-10 | Kabushiki Kaisha Toshiba | Non-volatile semiconductor memory device |
| US7783941B2 (en) * | 2004-09-06 | 2010-08-24 | Samsung Electronics Co., Ltd. | Memory devices with error detection using read/write comparisons |
| US7352630B2 (en) * | 2005-07-26 | 2008-04-01 | Samsung Electronics Co., Ltd. | Non-volatile memory device having improved program speed and associated programming method |
| US7590027B2 (en) * | 2006-10-04 | 2009-09-15 | Kabushiki Kaisha Toshiba | Nonvolatile semiconductor memory device |
| US7830720B2 (en) * | 2007-05-21 | 2010-11-09 | Samsung Electronics Co., Ltd. | Methods of programming non-volatile semiconductor memory devices using different program verification operations and related devices |
| KR20090129205A (en) | 2008-06-12 | 2009-12-16 | 삼성전자주식회사 | Memory device and read level control method |
| KR20100028195A (en) | 2008-09-04 | 2010-03-12 | 주식회사 하이닉스반도체 | Non volatile memory device and method of operating the same |
| US8184483B2 (en) * | 2009-05-29 | 2012-05-22 | Hynix Semiconductor Inc. | Nonvolatile memory device and method of programming the same |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102543197B (en) | 2015-07-15 |
| KR101200125B1 (en) | 2012-11-12 |
| CN102543197A (en) | 2012-07-04 |
| KR20120069108A (en) | 2012-06-28 |
| US20120155197A1 (en) | 2012-06-21 |
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