US7022534B2 - Optimal bank height for inkjet printing - Google Patents
Optimal bank height for inkjet printing Download PDFInfo
- Publication number
- US7022534B2 US7022534B2 US10/758,430 US75843004A US7022534B2 US 7022534 B2 US7022534 B2 US 7022534B2 US 75843004 A US75843004 A US 75843004A US 7022534 B2 US7022534 B2 US 7022534B2
- Authority
- US
- United States
- Prior art keywords
- layer
- photo
- polymer
- resist
- conducting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/17—Passive-matrix OLED displays
- H10K59/173—Passive-matrix OLED displays comprising banks or shadow masks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
- H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/351—Thickness
Definitions
- This invention relates generally to the art of thin film device processing and fabrication. More specifically, the invention relates to the fabrication of Organic Light Emitting Diode based displays and other electronic devices which use selective deposition.
- Display and lighting systems based on LEDs have a variety of applications. Such display and lighting systems are designed by arranging a plurality of optoelectronic elements (“elements”) such as arrays of individual LEDs. LEDs that are based upon semiconductor technology have traditionally used inorganic materials, but recently, the organic LED (“OLED”) has come into vogue for certain applications. Examples of other elements/devices using organic materials include organic solar cells, organic transistors, organic detectors, and organic lasers. There are also a number of bio-technology applications such as biochips for DNA recognition, combinatorial synthesis, etc. which utilize organic materials.
- An OLED is typically comprised of two or more thin at least partially conducting organic layers (e.g., an electrically conducting hole transporting polymer layer and an emissive polymer layer where the emissive polymer layer emits light) which are sandwiched between an anode and a cathode.
- the anode injects holes into the conducting polymer layer, while the cathode injects electrons into the emissive polymer layer.
- the injected holes and electrons each migrate toward the oppositely charged electrode and recombine to form an exciton in the emissive polymer layer.
- the exciton relaxes to a lower energy state by emission of radiation and in process, emits light.
- Each of the OLEDs can be a pixel element in a passive or active matrix OLED display. Such pixels can be arranged in a row-column fashion and would be addressed and switched on/off differently depending upon whether the display was active or passive matrix. In the passive matrix case, each pixel is not individually addressed by a switch, but rather pixels are addressed using a combination of row lines and a column lines. In active-matrix displays, each pixel is controlled by its own switch (e.g. transistor based) which allows it to remain on until switched off.
- switch e.g. transistor based
- FIG. 1 illustrates a cross-section of a typical OLED pixel.
- OLED pixel 100 includes a patterned anode layer 102 (typically the columns) that are patterned into stripes on top of a substrate 101 .
- Anode layer 102 is typically composed of a transparent conducting oxide such as ITO (Indium Tin Oxide) or Fluorine-doped Tin Oxide.
- ITO Indium Tin Oxide
- Fluorine-doped Tin Oxide Fluorine-doped Tin Oxide.
- metal lines may be patterned upon part of the anode pattern using methods known to those of ordinary skill in the art (e.g. metal deposition, photolithography and/or etch).
- FIG. 1 depicts a metal cathode layer 104 that is laid down, typically on top of various polymer layers 108 and 109 , to provide electrical connection for the active pixel area formed consequently.
- the pixel 100 illuminates under an application of a forward biased voltage as discussed above.
- the polymer layers 108 and 109 are typically formed by depositing a gel or liquid substance on the device and then spinning the device to spread out the deposited substance. This is referred to as spin coating.
- the gel or liquid can be deposited and simply evaporated/dried for a period of time.
- selective deposition techniques such as inkjet printing (described below) pockets are formed into which the gel or liquid can be deposited drop by drop.
- polymer layer 109 is usually an emissive polymer layer.
- polymer layer 108 is a conducting polymer layer which is also called a hole transport layer because it transports holes from the anode layer into the emissive polymer layer 109 .
- the order in which layer 108 and 109 are deposited would be reversed if layer 104 were the anode layer and layer 102 the cathode layer.
- one method of fabricating polymer layers is to drop a liquid or gel onto the lower electrode layer or other underlying surface and allow it to dry. The polymer liquid is deposited in drops and allowed to spread out on the exposed surface of the anode layer and then dry into a film. In the case of selective deposition such as inkjet printing, however, pockets that are formed by photo-resist banks can often affect the spreading/flow/drying and affect the shape of the film.
- spin coating of polymers may be appropriate for monochrome light emission, it is generally not used when a pattern of pixels of different colors is desired. For instance, if a particular pixel is to emit red light, a red emissive polymer material would be deposited in the region of that pixel, while for a blue emission a blue emissive polymer material would be deposited. In such cases, it is typical to have layer of photo-resist that form pockets defining discrete deposition regions to confine the deposited liquids and avoid intermixing of different colors as shown in FIG. 2 .
- FIG. 2 illustrates an anode line 210 that has a layer of photo-resist 220 above it.
- the photo-resist 220 is patterned (in case of photolithography the photo-resist is developed away, while for screen printing, the photo-resist can be deposited where needed) to define a pocket 230 where the anode 210 is exposed.
- the pocket 230 defines an individual pixel region and defines an area upon which polymer layers can be deposited.
- each pocket, thus formed is isolated from the pocket of another pixel location in that the same substance dropped therein does not spread and overlap with that other pocket.
- FIG. 2 shows a cross-section cut in the same direction as the direction in which anode line 210 and other anode lines are patterned.
- a cross-section in the transverse direction to that shown in FIG. 2 would also show photo-resist with the same shape as photo-resist 220 .
- This layer of photo-resist patterned as shown define individual pockets as illustrated in FIG. 3 .
- the extra layer of photo-resist needed to define pockets typically has the shape shown in photo-resist 220 such that no portion of the photo-resist 220 overhangs into the pocket 230 .
- the polymer(s) is/are dropped into the pocket 230 and allowed to dry or be evaporated.
- FIG. 3 shows an inkjet printing system for an OLED that is to have RGB (red, green and blue) patterned pixels.
- RGB red, green and blue
- the cross-section section shown in FIG. 3 is perpendicular to the cross-section shown in FIG. 2 and is taken in a direction perpendicular to the direction in which anode lines 360 are patterned.
- a print head 350 contains different polymers or other organic or organometallic substances including a red light emissive polymer substance, a green light emissive polymer substance and a blue light emissive polymer substance. These three polymers substances are delivered, respectively, via nozzles 332 , 322 and 312 . (although it is possible to deposit a different material from each nozzle, industrial printers are not designed like that. Usually all nozzles are used to deposit one material and the different materials are deposited sequentially). When delivered, the polymer substances drop onto pockets formed over an anode layer 360 (or onto the conducting polymer layer 330 which may also have been deposited using an inkjet head similar to the inkjet head 350 shown in FIG. 3 ).
- red, green and blue emissive polymer substances dry or evaporate, they form red polymer layer 334 , green polymer layer 324 and blue polymer layer 314 , respectively.
- red polymer layer 334 When the red, green and blue emissive polymer substances dry or evaporate, they form red polymer layer 334 , green polymer layer 324 and blue polymer layer 314 , respectively.
- pocket 390 which has a green emitting polymer dropped therein to form green emitting polymer layer 324 (top view).
- the red, green and blue pixels are patterned into a pattern using photo-resist layer 340 which will ensure that the correct polymer substances are deposited into only that specific pocket of the OLED display which it defines.
- the pattern shown is merely illustrative of one of many possible patterns of red, green and blue pixels.
- the use of a photo-resist layer to define pockets for inkjet printing is disclosed in published patent application No. U.S. 2002/0060518 A1 entitled “Organic Electroluminescent Device and Method of Manufacturing Thereof”.
- the photo-resist 340 has a normal slope such that the top of the photo-resist 340 does not overhang the pocket.
- the typical height of the photo-resist banks is between 3 and 10 microns (when measured from the base) as currently practiced in the industry. Photo-resist banks are of such height to ensure that deposited drops do not spill over the walls of the photo-resist. However high photo-resist banks can lead to non-uniform and concave drying patterns. The profile, when dried from a liquid drop, will not be very flat or uniform.
- the drying pattern is very non-uniform and shows a piling up on the edges of the drop 400 in FIG. 4 .
- This is due to the difference in the rate of evaporation in different regions of the drop 400 .
- This difference causes the substance to move towards the edges of the drop 400 from the middle, and hence the ultimate deposition of more of the substance at the edge than in the middle.
- This phenomenon is usually referred to as the Marangoni effect.
- a common example of this phenomenon is the stain left behind by drying of a coffee drop which shows more prominence (is darker in color) on the edges of the stain than in the center.
- the height of the photo-resist layer “banks” which define pockets for inkjet printing or other patterned processes are optimized to provide a more uniform drying profile for substances which are to be deposited in those pockets and then dried therein.
- the height of the banks is under three microns in height, while tall enough to prevent any spillage of liquid over the banks.
- the height of the mushroom banks is set to be one micron or less.
- FIG. 1 illustrates a display device composed of OLED pixels under manufacture.
- FIG. 2 pockets defined by a layer a photo-resist in an electronic device under fabrication.
- FIG. 3 illustrates an example of an inkjet printing system for fabricating patterned surfaces.
- FIG. 4 illustrates the drying pattern of a liquid substance when the substance is dropped with typical height photo-resist banks.
- FIG. 5 illustrates the drying profile of a substance dropped into thin photo-resist banks in accordance with the invention.
- FIG. 6 illustrates the results of experiments carried out on drying liquid films for pockets defined by differing heights of photo-resist banks.
- FIG. 7 shows a detailed workflow of fabricating an OLED in accordance with the invention.
- the height of the photo-resist layer “banks” which define pockets for inkjet printing or other patterned processes are optimized to provide a more uniform drying profile for substances which are to be deposited in those pockets.
- the height of the banks are less than three microns, and more preferably, down to a height of one micron.
- a lower bank height reduces the level of build-up on and near the walls of the banks and induces a more uniform and flatter profile when a substance dropped into a pocket is allowed to dry.
- the materials used in constructing the banks and surface treatments on the lower electrode layer and the photo-resist bank layer (or already deposited polymer layer) may affect the rate/direction of spread, affinity, etc. of the dropped substance and therefore, the drying profile of the resulting film.
- FIG. 5 illustrates the drying profile of a substance dropped into thin photo-resist banks in accordance with the invention.
- a mass of organic liquid solution 525 is dried into a film 530 by normal process of evaporation after being deposited into a pocket defined by the photo-resist bank 510 .
- the height of the photo-resist bank 510 is lower than in typical photo-resist banks.
- the pinning line 520 which is defined as a line drawn across the top edge of the photo-resist bank 510 wall, is at a much lower level as measured against the height of the drop. This lower pinning line 520 leads to less pile-up at the wall of the photo-resist bank 510 .
- the dried film 530 which results from the drying of solution 525 has a flatter more uniform profile especially at the edges of the film 510 where it meets the photo-resist bank 510 .
- This effect has been observed in experiments where the thickness of dried liquid was found more uniform over the useful area of the pocket.
- the solution 525 is assumed in this example to have spread or be of sufficient volume to contact the side walls of the thin photo-resist banks 510 as shown.
- FIG. 6 illustrates the results of experiments carried out on drying liquid films for pockets defined by differing heights of photo-resist banks.
- the vertical axis of graph 600 is the percentage of the width of the pocket where the variation in thickness fell within a tolerance of 15% (of the minimum film thickness seen in the pocket).
- the horizontal axis is a measure of the thickness of the film samples under experiment. As can be observed, at a bank height of approximately 5 microns, only about 40% of the entire width of the film had an acceptable (less than 15%) thickness variation (at a film thickness of 100–300 nanometers).
- an anode layer is fabricated/patterned over a substrate (step 710 ).
- the substrate may be made of materials such as glass, quartz, silicon, plastic and so on in a single plate.
- Typical anode materials include metals (e.g. aluminum, silver, copper, indium, tungsten, lead etc.); metal oxides; graphite; doped inorganic semiconductors (such as doped silicon, gallium arsenide and the like); and doped conducting polymers (such as polyaniline, polythiopene and the like).
- the anode layer is usually thin enough so as to be semi-transparent and allow at least a fraction of light to transmit through.
- any thin-film deposition method may be used in the fabricating step 710 .
- These include, but are not limited to, vacuum evaporation, sputtering, electron beam deposition, chemical vapor deposition, etching and other techniques known in the art and combinations thereof.
- the process also usually involves a baking or annealing step in a controlled atmosphere to optimize the conductivity and optical transmission of anode layer. Photolithography is then used to define the pattern in the anode lines.
- Other steps like adding metal lines to connect the anode lines to power sources may also be included in the workflow.
- the workflow of FIG. 7 is not intended to be all-inclusive and is merely exemplary. For instance, after the OLED is fabricated it is often encapsulated to protect the layers from environmental damage or exposure. Such other processing steps are well-known in the art and are not a subject of the invention.
- the next step is to add photo-resist banks under a height of three microns (and preferably one micron) such that pockets in the anode layer are defined (step 720 ).
- the photo-resist banks are fabricated by applying a semi-liquid solution containing the photo-resist material onto the substrate (or anode layer) and then spinning the device under manufacture.
- Photo-resist material is usually classified in two types, either positive or negative. Positive photo-resist is photo-resist which dissolves wherever exposed to light. Negative photo-resist is photo-resist which dissolves everywhere except where exposed to light. Examples of negative photo-resist material include AZ 5214E manufactured by Clariant. Either positive or negative photo-resist can be used as desired in forming the thin banks which define the inkjet pockets.
- the conducting polymer layer is printed (step 730 ).
- the conducting polymer layer is used to enhance the hole yield of the OLED relative to the potential applied across it and thus, aids in more energy-efficient injection of holes into the emissive polymer layer for recombination.
- the conducting polymer layer is sometimes applied as solution and laid down using techniques such as spin coating, dip coating, roll coating, spray coating or thermal evaporation.
- the conducting polymer layer is applied using printing techniques such as ink-jet printing (screen printing, flexo-graphic printing). Particularly, in this instance, the conducting polymer layer is printed onto the anode layer in pockets defined by thin photo-resist banks.
- the conducting polymer layer is printed by depositing a liquid substance containing the conducting polymer into the pocket and allowing the substance to dry. The dried film then represents the conducting polymer layer.
- the conducting polymer layer is a p-type material that transports holes effectively to the emissive polymer layer.
- the conducting polymer layer is also referred to as a hole transport layer (“HTL”).
- the conducting polymer layer is used to improve, for example, the charge balance, the display stability, the turn-on voltage, the display brightness, the display efficiency, and the display lifetime.
- the conductive polymer layer can be formed from, for example, a solution comprised of water, polyethylenedioxythiophene (“PEDOT”), and polystyrenesulfonic acid (“PSS”) (this solution is referred to, herein, as a PEDOT:PSS solution).
- the emissive polymer layers are printed.
- the emissive polymer layer is primarily responsible for the emission of light from the OLED and is thus an electroluminescent, semi-conducting and organic (organometallic) type material.
- Emissive polymers include the various families, copolymers, derivatives and moieties of polyfluorene, polyphenylenevinylene, polyarylenevinylene, polyquinoline, and so on.
- organic electroluminescent materials that may make up the emissive polymer layer include:
- Lumation Green 1300 series Another example of a poly-fluorene based organic electroluminescent material that emits green light is the Lumation Green 1300 series from Dow Chemical, Midland, Mich.
- emissive polymer substances there may be a plurality of different emissive polymer substances. For instance, there may be red, green and blue emitting emissive polymers in the print head which are deposited depending upon the desired color to be emitted in a given pixel location which is defined by a pocket.
- the emissive polymer layers are printed above the conducting polymer layer and in much the same fashion.
- the emitting polymer substances are deposited on the conducting polymer layer by the print head in the exact area defined by the pockets (which are defined by the thin bank photo-resist in accordance with step 720 ).
- the emissive polymer layer results from the drying of the substance deposited by the print head.
- Both the conducting polymer layers and emissive polymer layers can be printed by depositing a liquid in between the photo-resist banks which define a pocket.
- This liquid may be any “fluid” or deformable mass capable of flowing under pressure and may include solutions, inks, pastes, emulsions, dispersions and so on.
- the liquid may also contain or be supplemented by further substances which affect the viscosity, contact angle, thickening, affinity, drying, dilution and so on of the deposited drops.
- the cathode layer is formed/deposited (step 740 ).
- the cathode layer is typically a combination of a layer of pure metal and a lower-work function metal or a high band gap metal fluoride or metal oxide. While the cathode layer can be comprised of many different materials, preferable materials include aluminum, silver, magnesium, calcium, barium, or combinations thereof. More preferably, the cathode layer is comprised of aluminum, aluminum alloys, or combinations of magnesium and silver. Low work function material which may combined with a pure element/metal include oxides such as cesium oxide or barium oxide. Insulating materials such as LiF, NaF, CsF and so on may also be used below the metal layer to enhance injection by tunneling.
- the cathode layer is formed/deposited typically using vacuum evaporation or similar techniques and often using specially designed deposition devices. Often other steps such as the addition of masks and photo-resists may precede the cathode deposition step 740 . However, these are not specifically enumerated as they do not relate specifically to the novel aspects of the invention.
- present invention may also be utilized in a solar cell, a transistor, a phototransistor, a laser, a photo-detector, or an opto-coupler. It can also be used in biological applications such as bio-sensors or chemical applications such as applications in combinatorial synthesis etc.
- OLED display described earlier can be used within displays in applications such as, for example, computer displays, information displays in vehicles, television monitors, telephones, printers, and illuminated signs.
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
T=kp 2 /W 1/2
-
- where k is a spinning constant (usually between 80 and 100), p is the percentage of solids content in the liquid solution, and w is the rotational speed of spinning in RPMs (revolutions per minute) per thousand. By adjusting these parameters, a photo-resist height of three microns or less, and preferably, one micron, can be readily achieved by those of ordinary skill in the art. Once the photo-resist is applied it is baked, developed, etched (or lifted back) and so on in order to obtain the desired shape of pockets. Photo-resist chemistry and processes such as lithography, baking, developing, etching, lifting back and radiation exposure which can be used in patterning the photo-resist into pocket-defining banks are known to those of ordinary skill in the art. While baking and other processes may adjust the height of the photo-resist banks, such processes can be taken into account by those of ordinary skill in the art in order to obtain the desired thin height.
-
- (i) poly(p-phenylene vinylene) and its derivatives substituted at various positions on the phenylene moiety;
- (ii) poly(p-phenylene vinylene) and its derivatives substituted at various positions on the vinylene moiety;
- (iii) poly(p-phenylene vinylene) and its derivatives substituted at various positions on the phenylene moiety and also substituted at various positions on the vinylene moiety;
- (iv) poly(arylene vinylene), where the arylene may be such moieties as naphthalene, anthracene, furylene, thienylene, oxadiazole, and the like;
- (v) derivatives of poly(arylene vinylene), where the arylene may be as in (iv) above, and additionally have substituents at various positions on the arylene;
- (vi) derivatives of poly(arylene vinylene), where the arylene may be as in (iv) above, and additionally have substituents at various positions on the vinylene;
- (vii) derivatives of poly(arylene vinylene), where the arylene may be as in (iv) above, and additionally have substituents at various positions on the arylene and substituents at various positions on the vinylene;
- (viii) co-polymers of arylene vinylene oligomers, such as those in (iv), (v), (vi), and (vii) with non-conjugated oligomers; and
- (ix) polyp-phenylene and its derivatives substituted at various positions on the phenylene moiety, including ladder polymer derivatives such as poly(9,9-dialkyl fluorene) and the like; (x) poly(arylenes) where the arylene may be such moieties as naphthalene, anthracene, furylene, thienylene, oxadiazole, and the like; and their derivatives substituted at various positions on the arylene moiety; (xi) co-polymers of oligoarylenes such as those in (x) with non-conjugated oligomers;
- (xii) polyquinoline and its derivatives;
- (xiii) co-polymers of polyquinoline with p-phenylene substituted on the phenylene with, for example, alkyl or alkoxy groups to provide solubility; and
- (xiv) rigid rod polymers such as poly(p-phenylene-2,6-benzobisthiazole), poly(p-phenylene-2,6-benzobisoxazole), poly(p-phenylene-2,6-benzimidazole), and their derivatives.
Claims (16)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/758,430 US7022534B2 (en) | 2004-01-14 | 2004-01-14 | Optimal bank height for inkjet printing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/758,430 US7022534B2 (en) | 2004-01-14 | 2004-01-14 | Optimal bank height for inkjet printing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| US20050153468A1 US20050153468A1 (en) | 2005-07-14 |
| US7022534B2 true US7022534B2 (en) | 2006-04-04 |
Family
ID=34740128
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US10/758,430 Expired - Lifetime US7022534B2 (en) | 2004-01-14 | 2004-01-14 | Optimal bank height for inkjet printing |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | US7022534B2 (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050052120A1 (en) * | 2003-09-09 | 2005-03-10 | Rahul Gupta | Optimal bank shapes for inkjet printing |
| US20060008956A1 (en) * | 2004-07-09 | 2006-01-12 | Seiko Epson Corporation | Method for manufacturing thin film transistor, electro-optical device and electronic apparatus |
| US20100250203A1 (en) * | 2009-03-26 | 2010-09-30 | Jie Zhang | Finite Element Algorithm for Solving a Fourth Order Nonlinear Lubrication Equation for Droplet Evaporation |
| US20100305914A1 (en) * | 2009-06-02 | 2010-12-02 | Jie Zhang | Finite Difference Algorithm for Solving Lubrication Equations with Solute Diffusion |
| US20110093241A1 (en) * | 2009-10-15 | 2011-04-21 | Jie Zhang | Upwind Algorithm for Solving Lubrication Equations |
| US20110131019A1 (en) * | 2009-12-02 | 2011-06-02 | Jiun-Der Yu | Judiciously Retreated Finite Element Method for Solving Lubrication Equation |
| US20110131018A1 (en) * | 2009-12-02 | 2011-06-02 | Jie Zhang | Finite Difference Algorithm for Solving Slender Droplet Evaporation with Moving Contact Lines |
| US20110196657A1 (en) * | 2010-02-11 | 2011-08-11 | Jie Zhang | Solving a Solute Lubrication Equation for 3D Droplet Evaporation on a Complicated OLED Bank Structure |
| US20110238389A1 (en) * | 2010-03-23 | 2011-09-29 | Jie Zhang | Finite Difference Scheme for Solving Droplet Evaporation Lubrication Equations on a Time-Dependent Varying Domain |
| US20180358584A1 (en) * | 2017-06-08 | 2018-12-13 | Samsung Display Co., Ltd. | Method of manufacturing organic light-emitting display device |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006019630A (en) * | 2004-07-05 | 2006-01-19 | Seiko Epson Corp | Wiring formation method |
| JP4051631B2 (en) * | 2004-08-20 | 2008-02-27 | セイコーエプソン株式会社 | Etching method, microstructure manufacturing method, conductive wire forming method, thin film transistor manufacturing method, and electronic device manufacturing method |
| KR101187205B1 (en) * | 2006-06-09 | 2012-10-02 | 삼성디스플레이 주식회사 | Thin film transistor array panel and method for manufacturing the same |
| TWI303892B (en) * | 2006-06-15 | 2008-12-01 | Au Optronics Corp | Organic electroluminescence structure |
| US9604245B2 (en) | 2008-06-13 | 2017-03-28 | Kateeva, Inc. | Gas enclosure systems and methods utilizing an auxiliary enclosure |
| EP2239798A1 (en) | 2009-04-07 | 2010-10-13 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Patterning the emission colour in top-emissive OLEDs |
| KR101871227B1 (en) | 2011-08-12 | 2018-08-03 | 삼성디스플레이 주식회사 | Organic light emitting device and manufacturing method therof |
| US8906752B2 (en) | 2011-09-16 | 2014-12-09 | Kateeva, Inc. | Polythiophene-containing ink compositions for inkjet printing |
| CN104409647A (en) | 2014-11-14 | 2015-03-11 | 京东方科技集团股份有限公司 | Pixel unit and preparation method thereof, luminescent device and display device |
| CN105118846B (en) * | 2015-07-28 | 2020-06-23 | 广东聚华印刷显示技术有限公司 | Printed light emitting diode display device and manufacturing method thereof |
| CN106848024A (en) * | 2017-02-20 | 2017-06-13 | 深圳市华星光电技术有限公司 | Luminescent device and display device |
| US20200312929A1 (en) * | 2017-11-28 | 2020-10-01 | Sakai Display Products Corporation | Organic electroluminescence light-emitting element and manufacturing method thereof |
| CN112259590B (en) * | 2020-10-22 | 2023-04-07 | 合肥京东方卓印科技有限公司 | Display panel, preparation method thereof and display device |
| TWI800258B (en) * | 2022-02-15 | 2023-04-21 | 友達光電股份有限公司 | Display device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6517996B1 (en) * | 2000-08-07 | 2003-02-11 | Industrial Technology Research Institute | Method of manufacturing full-color organic electro-luminescent device |
| US6762552B1 (en) | 1999-11-29 | 2004-07-13 | Koninklijke Philips Electronics N.V. | Organic electroluminescent device and a method of manufacturing thereof |
| US6774392B2 (en) * | 2002-04-10 | 2004-08-10 | Samsung Sdi Co., Ltd. | Organic light emitting diode and method for producing the same |
-
2004
- 2004-01-14 US US10/758,430 patent/US7022534B2/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6762552B1 (en) | 1999-11-29 | 2004-07-13 | Koninklijke Philips Electronics N.V. | Organic electroluminescent device and a method of manufacturing thereof |
| US6517996B1 (en) * | 2000-08-07 | 2003-02-11 | Industrial Technology Research Institute | Method of manufacturing full-color organic electro-luminescent device |
| US6774392B2 (en) * | 2002-04-10 | 2004-08-10 | Samsung Sdi Co., Ltd. | Organic light emitting diode and method for producing the same |
Cited By (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050052120A1 (en) * | 2003-09-09 | 2005-03-10 | Rahul Gupta | Optimal bank shapes for inkjet printing |
| US7132788B2 (en) * | 2003-09-09 | 2006-11-07 | Osram Opto Semiconductors Gmbh | Optimal bank shapes for inkjet printing |
| US20060008956A1 (en) * | 2004-07-09 | 2006-01-12 | Seiko Epson Corporation | Method for manufacturing thin film transistor, electro-optical device and electronic apparatus |
| US7348224B2 (en) * | 2004-07-09 | 2008-03-25 | Seiko Epson Corporation | Method for manufacturing thin film transistor, electro-optical device and electronic apparatus |
| US8229719B2 (en) | 2009-03-26 | 2012-07-24 | Seiko Epson Corporation | Finite element algorithm for solving a fourth order nonlinear lubrication equation for droplet evaporation |
| US20100250203A1 (en) * | 2009-03-26 | 2010-09-30 | Jie Zhang | Finite Element Algorithm for Solving a Fourth Order Nonlinear Lubrication Equation for Droplet Evaporation |
| US8014986B2 (en) | 2009-06-02 | 2011-09-06 | Seiko Epson Corporation | Finite difference algorithm for solving lubrication equations with solute diffusion |
| US20100305914A1 (en) * | 2009-06-02 | 2010-12-02 | Jie Zhang | Finite Difference Algorithm for Solving Lubrication Equations with Solute Diffusion |
| US20110093241A1 (en) * | 2009-10-15 | 2011-04-21 | Jie Zhang | Upwind Algorithm for Solving Lubrication Equations |
| US8285530B2 (en) | 2009-10-15 | 2012-10-09 | Seiko Epson Corporation | Upwind algorithm for solving lubrication equations |
| US8285526B2 (en) | 2009-12-02 | 2012-10-09 | Seiko Epson Corporation | Finite difference algorithm for solving slender droplet evaporation with moving contact lines |
| US20110131019A1 (en) * | 2009-12-02 | 2011-06-02 | Jiun-Der Yu | Judiciously Retreated Finite Element Method for Solving Lubrication Equation |
| US20110131018A1 (en) * | 2009-12-02 | 2011-06-02 | Jie Zhang | Finite Difference Algorithm for Solving Slender Droplet Evaporation with Moving Contact Lines |
| US8255194B2 (en) | 2009-12-02 | 2012-08-28 | Seiko Epson Corporation | Judiciously retreated finite element method for solving lubrication equation |
| US20110196657A1 (en) * | 2010-02-11 | 2011-08-11 | Jie Zhang | Solving a Solute Lubrication Equation for 3D Droplet Evaporation on a Complicated OLED Bank Structure |
| US20110238389A1 (en) * | 2010-03-23 | 2011-09-29 | Jie Zhang | Finite Difference Scheme for Solving Droplet Evaporation Lubrication Equations on a Time-Dependent Varying Domain |
| US8271238B2 (en) | 2010-03-23 | 2012-09-18 | Seiko Epson Corporation | Finite difference scheme for solving droplet evaporation lubrication equations on a time-dependent varying domain |
| US20180358584A1 (en) * | 2017-06-08 | 2018-12-13 | Samsung Display Co., Ltd. | Method of manufacturing organic light-emitting display device |
| US10211430B2 (en) * | 2017-06-08 | 2019-02-19 | Samsung Display Co., Ltd. | Method of manufacturing organic light-emitting display device |
Also Published As
| Publication number | Publication date |
|---|---|
| US20050153468A1 (en) | 2005-07-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7132788B2 (en) | Optimal bank shapes for inkjet printing | |
| US7022534B2 (en) | Optimal bank height for inkjet printing | |
| KR100919352B1 (en) | Organic Electroluminescence Display Panel and Manufacturing Method Thereof | |
| US7504770B2 (en) | Enhancement of light extraction with cavity and surface modification | |
| KR102322637B1 (en) | Exclusive liquid OLED device and its manufacturing method | |
| JP4237501B2 (en) | Electroluminescent device and method for manufacturing the same | |
| US20050067949A1 (en) | Solvent mixtures for an organic electronic device | |
| US20060159842A1 (en) | Printing of organic electronic devices | |
| KR20080010425A (en) | Solvents for PET-T-Solutions for Ink-Jet Printing | |
| US8207667B2 (en) | Organic EL display and manufacturing method thereof | |
| US20040265623A1 (en) | Conducting polymer for electronic devices | |
| EP1929560B1 (en) | Neutralized anode buffer layer to improve processing and performances of organic light emitting devices and fabrication method thereof | |
| JP2010282903A (en) | Organic EL display panel | |
| US20050276910A1 (en) | Post processing of films to improve film quality | |
| EP1709701B1 (en) | Deposition of conducting polymers | |
| US7407716B2 (en) | Light emitting devices with multiple light emitting layers to achieve broad spectrum | |
| US20070018153A1 (en) | Thick light emitting polymers to enhance oled efficiency and lifetime | |
| US7825576B2 (en) | Pixel structure and organic light emitting device including the pixel structure | |
| US20060065889A1 (en) | Compositions for making organic thin films used in organic electronic devices | |
| GB2563448A (en) | Device | |
| JP2007250719A (en) | Organic electroluminescent device and manufacturing method thereof | |
| KR20140082745A (en) | Oled display device having some of the pixels containing two diodes with organic layers of different thickness |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AS | Assignment |
Owner name: OSRAM OPTO SEMICONDUCTORS GMBH, GERMANY Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:GUPTA, RAHUL;INGLE, ANDREW;NATARAJAN, SRIRAM;SIGNING DATES FROM 20040517 TO 20040518;REEL/FRAME:015413/0421 Owner name: OSRAM OPTO SEMICONDUCTORS GMBH, GERMANY Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:GUPTA, RAHUL;INGLE, ANDREW;NATARAJAN, SRIRAM;REEL/FRAME:015413/0421;SIGNING DATES FROM 20040517 TO 20040518 |
|
| STCF | Information on status: patent grant |
Free format text: PATENTED CASE |
|
| FPAY | Fee payment |
Year of fee payment: 4 |
|
| FEPP | Fee payment procedure |
Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
|
| FPAY | Fee payment |
Year of fee payment: 8 |
|
| AS | Assignment |
Owner name: OSRAM OLED GMBH, GERMANY Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:OSRAM OPTO SEMICONDUCTORS GMBH;REEL/FRAME:036591/0389 Effective date: 20150825 |
|
| MAFP | Maintenance fee payment |
Free format text: PAYMENT OF MAINTENANCE FEE, 12TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1553) Year of fee payment: 12 |
|
| AS | Assignment |
Owner name: PICTIVA DISPLAYS INTERNATIONAL LIMITED, IRELAND Free format text: CORRECTIVE ASSIGNMENT TO CORRECT THE 11/658.772 REPLACED 11/658.772 PROPERTY NUMBERS PREVIOUSLY RECORDED AT REEL: 053464 FRAME: 0395. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT;ASSIGNOR:DOLYA HOLDCO 5 LIMITED;REEL/FRAME:053464/0395 Effective date: 20200717 Owner name: DOLYA HOLDCO 5 LIMITED, IRELAND Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:OSRAM OLED GMBH;REEL/FRAME:053464/0374 Effective date: 20200703 Owner name: PICTIVA DISPLAYS INTERNATIONAL LIMITED, IRELAND Free format text: CHANGE OF NAME;ASSIGNOR:DOLYA HOLDCO 5 LIMITED;REEL/FRAME:053464/0395 Effective date: 20200717 |