US5207505A - Illumination light source device - Google Patents

Illumination light source device Download PDF

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Publication number
US5207505A
US5207505A US07754028 US75402891A US5207505A US 5207505 A US5207505 A US 5207505A US 07754028 US07754028 US 07754028 US 75402891 A US75402891 A US 75402891A US 5207505 A US5207505 A US 5207505A
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Prior art keywords
lamp
optical member
temperature
light source
source device
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Expired - Lifetime
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US07754028
Inventor
Tsuyoshi Naraki
Haruo Ozawa
Takashi Mori
Jun Nagatsuka
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Nikon Corp
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Nikon Corp
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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21VFUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V29/00Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
    • F21V29/50Cooling arrangements
    • F21V29/502Cooling arrangements characterised by the adaptation for cooling of specific components
    • F21V29/505Cooling arrangements characterised by the adaptation for cooling of specific components of reflectors
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21VFUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V29/00Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
    • F21V29/02Cooling by forcing air or gas over or around the light source
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21VFUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V7/00Reflectors for light sources
    • F21V7/22Reflectors for light sources characterised by materials, surface treatments or coatings, e.g. dichroic reflectors

Abstract

A light source device houses a lamp such as a mercury discharge tube for generating a high temperature heat, and a reflective optical member such as an elliptic, mirror surrounding the lamp, in a lamp case. When the lamp is forcibly cooled by air, a device for substantially uniformly heating or heat-insulating a reflection surface of the reflective optical member is provided to prevent overcooling of the reflective optical member.

Description

BACKGROUND OF THE INVENTION Field of the Invention

The present invention relates to a light source device which uses a lamp such as a discharge tube which emits a highly brilliant illumination light, and more particularly to a light source device having a concave mirror such as an elliptic mirror or a parabolic mirror arranged with a lamp.

Related Background Art

A light source device of this type has been used in various applications. Among others, a light source device used for a semiconductor exposure apparatus (such as a stepper or an aligner) uses an ultra high pressure mercury discharge tube (Hg lamp or Xe-Hg lamp) to efficiently emit a light of a specific wavelength (g-ray of 436 nm or i-ray of 365 nm).

FIG. 5 is a simplified illustration of an illumination system for a stepper disclosed in U.S. Pat. No. 4,630,182. A light emission point of a lamp 1 is located at a first focal point in an elliptic mirror 2. An opening through which an electrode of the lamp 1 extends is formed at the bottom of the elliptic mirror 2. An alminum layer is coated on an entire inner surface of the elliptic mirror 2 by vapor deposition to form a reflection plane. An illumination light reflected by the elliptic mirror 2 is focused at a second focal point and directed to a secondary light source optical member 3 which includes an interference filter and a fly eye lens. The illumination light which exits from the optical member 3 as a secondary light source reaches a condenser lens 6 through a dichroic mirror 4 and a mirror 5. The illumination light from the condenser lens 6 illuminates a reticle (mask) 7 at a uniform intensity distribution by the operation of the optical member 3. A transmitted light from a circuit pattern formed on the reticle 7 is focused on a resist layer on a surface of a wafer 9 through a projection optical system 8.

The Hg lamp or Xe-Hg lamp of this type is usually used in a position such that an anode and a cathode of discharge electrodes are in a vertical direction. Thus, a mouth piece connected to one of the electrodes is positioned at a center of an opening of the elliptic mirror 2 through which the illumination light is emitted (a side facing the optical member 3).

The lamp 1 and the elliptic mirror 2 are housed in a lamp house (case) 10 to prevent the light from leaking to the exterior, and the optical member 3, the mirrors 4 and 5 and the condenser lens 6 are housed in an illumination optical system housing 11.

Air for cooling the lamp 1 flows into the lamp house 10 through the illumination optical system case 11 and flows out of the lamp house 10 from an opening at the bottom of the elliptic mirror 2.

In the prior art, no essential problem is raised with respect to the cooling of the lamp (discharge tube) and a temperature of a wall of the lamp and a temperature of the mouth piece are maintained within a proper range. However, there has been a problem in that a desired exposure illumination is not attained, in spite of the exchange of the lamp to a new one, over a long period use of the device. The inventors of the present invention studied this problem and found that a primary cause for the reduction of the exposure illumination resides in a blur of the elliptic mirror.

A cause of the blur of the elliptic mirror is that materials (fine particles or molecules) floating in the atmosphere are deposited on the reflection plane of a relatively low temperature by strong light and heat from the lamp. Such materials are densely deposited on the entire surface or a portion of the reflection plane as contaminants and reduce an overall reflection efficiency of the reflection plane.

SUMMARY OF THE INVENTION

In the light of the above, it is an object of the present invention to provide a light source device having a reflective optical member (such as an elliptic mirror) which does not create blur over a long term use.

In accordance with the present invention, when a lamp such as a mercury discharge tube (Hg lamp or Xe-Hg lamp) which generates high temperature heat and a reflective optical member (such as an elliptic mirror, a parabolic mirror or a polygon mirror) which surround the lamp are housed in a lamp case and the lamp is forcibly cooled by air, means for substantially uniformly heating or heat-insulating a reflection plane of the reflective optical member is provided in order to prevent the reflective optical means from overcooling.

According to the study by the inventors of the present invention, ammonium sulfate was detected as one of contaminants deposited on the reflective optical member, although it depends on an operation environment of a stepper on which the reflective optical member is mounted. The material is provided by the coupling of sulfuric acid sulfate ions (SO4 2-) floating in the atmosphere due to the high heat of the lamp and ammonium ions (NH3 +) on the surface of the reflective optical member which is at a relatively low temperature. A decomposition temperature of ammonium sulfate is approximately 120° C. Accordingly, if the surface of the reflective optical member is above that temperature, the production and deposition of the ammonium sulfate can be prevented.

A special thin film is vapor-deposited on the surface of the reflective optical member to attain a desired optical characteristic. Typically, an aluminum layer (Al+SiO film or Al+MgF2 film) is vapor deposited on a surface of a glass material which has a three-dimensional shape such as an elliptic mirror or a parabolic mirror for use as a reflection plane, or a dielectric multi-layer film is deposited to form a reflection plane. Thus, when the reflective optical member is heated to a temperature, or the temperature thereof is preserved, above the decomposition temperature of the contaminants deposited on the mirror surface, it must be set below a long term heat resistive temperature of the thin film formed on the mirror surface.

In accordance with the present invention, a blur of the reflective optical member or the glass member such as a lens disposed in the vicinity of the lamp in the light source device or in the illumination light path is prevented, and the illumination power is not lowered over the long term illumination and the maintenance for the optical member is eliminated.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows a schematic construction of a light source device in accordance with a first embodiment of the present invention,

FIG. 2 shows a principal part of the light source device of the first embodiment,

FIG. 3 shows a principal part of the light source device in accordance with a second embodiment of the present invention,

FIG. 4 shows a principal part of the light source device in accordance with a third embodiment of the present invention, and

FIG. 5 shows an arrangement of an optical system of a prior art stepper.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

FIG. 1 shows a schematic construction of a light source device in accordance with a first embodiment of the present invention. An elliptic mirror 2 in a lamp house 10 is held by a support plate 10A at an exit 2A of a light beam. An electric heater 30 is wound around the elliptic mirror 2 to forcibly heat the elliptic mirror 2. An upper mouth piece of a lamp 1 is held in suspension by an upper support leaf spring 12A which also serves as a lead wire. The support leaf spring 12A is connected to a centering mechanism 12. A lead wire 12B is connected to a lower mouth piece of the lamp 1. The centering mechanism 12 three-dimensionally moves the lamp in an attitude shown in FIG. 1 in order to bring a light emission point of the lamp 1 to a first focal point of the elliptic mirror 2. Shield plates 10B and 10C, which shield a highly brilliant illumination light travelling downward from a lower opening 2B of the elliptic mirror 2, and which control a cooling air flow, are formed in lamination at the bottom of the lamp house 10.

A venting duct 10E is provided at the bottom-most part of the lamp house 10 through a metallic mesh 10D. The duct 10E forcibly evacuates high temperature air in the lamp house 10 to the exterior of the stepper in order to cool the lamp 1 and the elliptic mirror 2. The cooling air flows into the lamp house 10 through an illumination optical system case 11 (see FIG. 5) and is directed to the lower opening 2B through the exit 2A of the elliptic mirror 2.

FIG. 2 shows a structure of the elliptic mirror of the light source device in the first embodiment of the present invention. The light emission point of the lamp 1 is positioned at the first focal point f of the elliptic mirror 2. An aluminum layer is coated on an inner surface of the elliptic mirror 2. It serves as a high reflection index mirror over a wide wavelength range from an ultraviolet area to an infrared area. A heater 30 made of a nichrome wire or ceramic is wound around the elliptic mirror 2 in accordance with a temperature distribution of the elliptic mirror, and it is heated by a temperature controller 32 through a power supply line 31. A temperature sensor 33 is fixed to a portion of the elliptic mirror 2, preferably at the exit of the light beam or at the lower opening which is at a lowest temperature by the air cooling, and an output signal thereof is sent to the controller 32 for the temperature feedback control of the heater 30. The controller 32 can receive two or more information S1 and S2. The information S1 relates to a set temperature of the elliptic mirror 2 (for example, higher than the decomposition temperature of ammonium sulfate). The information S2 is a flag signal which selects the energization to the heater 30 when a cover of the lamp house is opened for maintenance or exchange of lamp.

In such a heating device, precise temperature control is not necessary and the temperature sensor 33 may be a bimetal switch which is fixed to a portion of the elliptic mirror 2 or a portion of the nichrome wire of the heater 30. In this case, the bimetal switch is selected to close its contact below the decomposition temperature of the contaminant (for example, 120° C.) and opens its contact above the decomposition temperature. It may be simply connected in series with the power supply line 31.

In accordance with the first embodiment, the temperature of the elliptic mirror 2 may be kept above the decomposition temperature of the contaminant (for example, ammonium sulfate) whether the lamp 1 is turned on or off. By using the feedback system including the temperature sensor 33 or the bimetal switch, the total power supply from the controller 32 to the heater 30 may be reduced during the turn-on of the lamp 1 because the temperature of the elliptic mirror 2 rises by the heat of the lamp 1.

When a temperature sensor 33 of high linearity is used, a circuit having a temperature hysteresis to the energization of the heater 30 may be used. Namely, when the detection temperature of the temperature sensor 33 drops to a first temperature t1 (for example, 120° C.) near the decomposition temperature, the heater 30 is immediately energized, and once it is energized, the energization is continued until a second temperature t2 which is sufficiently higher than the first temperature t1 (but lower than the heating temperature of the heater 30 and lower than the heat resistive temperature of the coated layer) is reached. After the energization is stopped at the temperature t2, the energization is not initiated until the temperature drops to the temperature t1.

In the first embodiment, the temperature sensor 33 and the bimetal switch are used to control the current flowing through the heater 30 although the temperature monitor need not be used. Where the mirror surface is coated with the aluminum layer, the heat resistive temperature is approximately 200° C. while the decomposition temperature of ammonium sulfate is approximately 120° C. Accordingly, a current (or more exactly, a power) supplied to the heater 30 may be selected by an experiment such that the temperature of the elliptic mirror 2 reaches approximately 130˜180° C. and that power may be simply supplied to the heater 30. The supply to the heater 30 may be linked to the supply to the lamp 1.

FIG. 3 shows a second embodiment of the present invention. Instead of the forced heating, a heat insulating material 40 is wrapped around the elliptic mirror 2. The heat insulating material 40 is selected to be heat resistive up to approximately 200° C.

FIG. 4 shows a third embodiment in which the outer periphery of the elliptic mirror 2 is covered by a metallic (for example, stainless steel) protector 52 with a predetermined space 50. The space 50 is substantially sealed to prevent the cooling air from flowing therein. By the provision of the space 50, the same heat insulation effect as that of the second embodiment is attained. The space 50 may be evacuated or filled with carbon dioxide gas having a high heat insulation efficiency.

The heat insulation system shown in FIGS. 3 and 4 is effective for certain mirror members. For example, when a dielectric multi-layer film is used for forming the mirror surface, a wavelength dependency may be imparted to the reflectivity (or transmissivity). Accordingly, light of undesired wavelength (particularly, a long wavelength) can be absorbed by the dielectric multi-layer film and the temperature may be raised to a higher point than that permitted to the elliptic mirror with only the aluminum coated film. However, depending on the air cooling condition of the lamp house, the temperature may not reach the decomposition temperature of the contaminant even with the elliptic mirror having the multi-layer film. In such a case, the heat insulation shown in FIGS. 3 and 4 may be used so that the temperature above the decomposition temperature is easily attained and the deposition of the contaminant can be prevented in a very simple manner.

The present invention has been described in connection with the embodiments. The device to which the present invention is applied is not limited to that which uses the elliptic mirror or the parabolic mirror but the present invention is equally applicable to a light source device having a light focusing system which is a combination of a reflection mirror and a lens or a prism.

The present invention is also applicable to a lens element or a reflection mirror which is likely to create blur in the light source device.

A far infrared ceramic heater or a hot air heater may be used to heat the reflective optical member, lens element or prism.

Claims (20)

What is claimed is:
1. A light source device for irradiating an object, comprising:
a lamp operable for emitting light, said lamp creating heat during the emission of light;
an optical member disposed near said lamp for directing light from said lamp toward said object;
means for supplying cooling gas to a space between said lamp and said optical member for cooling said lamp; and
means for controlling the temperature of said optical member,
said optical member, in the absence of said temperature controlling means, being subject to a reduction in its ability to direct light from said lamp toward said object, due to deposition of a contaminant on said optical member, said contaminant having a decomposition temperature at which deposition of said contaminant on said optical member is prevented and below which such deposition occurs, said temperature controlling means setting the temperature of said optical member, during the operation of said lamp, at a temperature level that is at least as high as said decomposition temperature.
2. A light source device according to claim 1, wherein said optical member is a reflector having a reflective front surface facing said lamp.
3. A light source device according to claim 2, wherein said temperature controlling means comprises means for electrically heating said reflective front surface.
4. A light source device according to claim 3, wherein said means for electrically heating said reflective front surface comprises an electrical heater on a rear surface of said reflector and means for regulating the operation of said electrical heater.
5. A light source device according to claim 2, wherein said temperature controlling means comprises insulating means for reducing heat dissipation from said reflector.
6. A light source device according to claim 5, wherein said insulating means comprises solid insulation mounted on a rear surface of said reflector.
7. A light source device according to claim 5, wherein said insulating means comprises means defining an insulating space behind a rear surface of said reflector.
8. A light source device according to claim 7, wherein said insulating space is evacuated.
9. A light source device according to claim 7, wherein said insulating space is filled with an insulating gas.
10. A light source device according to claim 1, wherein said optical member is a concave reflector surrounding said lamp.
11. A light source device according to claim 1, further comprising a case for housing said lamp and said optical member and for shielding said lamp and said optical member from ambient conditions exterior to said case.
12. A light source device according to claim 1, wherein said optical member has a heat resistive temperature higher than said decomposition temperature, and wherein the temperature set by said temperature controlling means is less than said heat resistive temperature.
13. A light source device according to claim 1, wherein said contaminant is a sulphur compound.
14. A light source device according to claim 1, wherein said contaminant is ammonium sulphate.
15. A light source device for radiating an illumination light onto an object, comprising:
a lamp for emitting an illumination light;
a reflective optical member having a front side disposed near said lamp and including a reflection surface for reflecting said illumination light toward said object, said reflective optical member having a heat resistive temperature which is above a decomposition temperature of a sulfuric acid derived compound;
means for supplying cooling gas to a space between said lamp and said reflective optical member to forcibly cool said lamp; and
means provided on a rear side of said reflective optical member electrically heating the reflection surface of said reflective optical member to a temperature which is above said decomposition temperature and less than said heat resistive temperature in order to prevent deposition of said sulfuric acid derived compound on the reflection surface of said reflective optical member, which might otherwise occur due to influence of said illumination light and heat from said lamp and cooling of said reflective optical member by said cooling gas.
16. A light source device according to claim 15, wherein said reflective optical member is a concave mirror surrounding said lamp.
17. A light source device according to claim 15, further comprising a case for housing said lamp and said reflective optical member for shielding said lamp and said reflective optical member from the exterior of the case.
18. An exposure apparatus for exposing a pattern formed on a mask onto a photosensitive member with an illumination light from an illumination system, said illumination system comprising:
a lamp for emitting an illumination light;
a reflective optical member having a front side disposed near said lamp and including a reflection surface for reflecting said illumination light toward an object, said reflective optical member having a heat resistive temperature which is above a decomposition temperature of a sulfuric acid derived compound;
means for supply cooling gas to a space between said lamp and said reflective optical member to forcibly cool said lamp;
means provided on a rear side of said reflective optical member electrically heating the reflection surface of said reflective optical member to a temperature which is above said decomposition temperature and less than said heat resistive temperature in order to prevent deposition of said sulfuric acid derived compound on the reflection surface of said reflective optical member, which might otherwise occur due to influence of said illumination light and heat from said lamp and cooling of said reflective optical member by said cooling gas.
19. An exposure apparatus according to claim 18, wherein said reflective optical member is a concave mirror surrounding said lamp.
20. An exposure apparatus according to claim 18, further comprising a case for housing said lamp and said reflective optical member for shielding said lamp and said reflective optical member from the exterior of the case.
US07754028 1990-09-19 1991-09-03 Illumination light source device Expired - Lifetime US5207505A (en)

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JP2-249294 1990-09-19
JP24929490A JP3266156B2 (en) 1990-09-19 1990-09-19 Illuminating light source device and an exposure device

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US5685895A (en) * 1994-08-10 1997-11-11 Nikon Corporation Air cleaning apparatus used for an exposure apparatus
EP0846973A2 (en) * 1996-12-06 1998-06-10 Hitachi Video & Information System, Inc. Light source device of liquid crystal projector
US5816690A (en) * 1994-11-29 1998-10-06 The Obie Company Compact theatrical light and method
US5818167A (en) * 1996-02-01 1998-10-06 Osram Sylvania Inc. Electrodeless high intensity discharge lamp having a phosphorus fill
US5906429A (en) * 1993-09-02 1999-05-25 Nikon Corporation Optical illumination device
US6008568A (en) * 1998-03-13 1999-12-28 Dymax Corporation Heatsinked lamp assembly
US6033091A (en) * 1994-03-29 2000-03-07 Mitsubishi Denki Kabushiki Kaisha Projection display device
US6108126A (en) * 1993-10-26 2000-08-22 Nikon Corporation Illuminating apparatus
US6129042A (en) * 1996-11-08 2000-10-10 Coburn Optical Industries, Inc. Process and machine for coating ophthalmic lenses
US6183114B1 (en) * 1998-05-28 2001-02-06 Kermit J. Cook Halogen torchiere light
US6227686B1 (en) * 1999-04-02 2001-05-08 Mitsubishi Denki Kabushiki Kaisha Light source apparatus
US20020017842A1 (en) * 2000-08-04 2002-02-14 Mituo Narita Lamp unit for a projector and a process for the light control thereof
WO2002040920A1 (en) * 2000-11-14 2002-05-23 Koninklijke Philips Electronics N.V. Lighting system and lamp-reflector unit
WO2002029850A3 (en) * 2000-10-04 2002-06-13 Cogent Light Tech Temperature control for arc lamps
US6498423B1 (en) * 2001-06-27 2002-12-24 Welch Allyn, Inc. Lamp thermal control by directed air flow
US20030021120A1 (en) * 2001-06-30 2003-01-30 Teichgraeber Bryan R. Lamp reflector cooling air deflector
US6575599B1 (en) * 1998-09-08 2003-06-10 Ushiodenki Kabushiki Kaisha Light source device for projection apparatus
US6863421B2 (en) * 2001-06-11 2005-03-08 Infocus Corporation Lamphouse
US20060034050A1 (en) * 2004-08-10 2006-02-16 Jian Wang Electronic device having a temperature control system
US20060034051A1 (en) * 2004-08-10 2006-02-16 Jian Wang Electronic device having a temperature control system including a ductwork assembly
US20060262537A1 (en) * 2005-05-17 2006-11-23 Lee John W Projection assembly
US20090040765A1 (en) * 2004-09-02 2009-02-12 Koninklijke Philips Electronics, N.V. Lamp assembly comprising a high-pressure gas discharge lamp
EP2287644A2 (en) 2009-08-18 2011-02-23 Mitsubishi Electric Corporation Light source device and method of producing the same
US20140248041A1 (en) * 2011-06-30 2014-09-04 Panasonic Ecology Systems Guangdong Co., Ltd. Ventilating fan for heating
US20150177602A1 (en) * 2012-09-14 2015-06-25 Yusuke Tani Light source apparatus and electronic equipment
US20160144552A1 (en) * 2013-06-27 2016-05-26 Khs Corpoplast Gmbh Device for heating preforms consisting of thermoplastic material

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Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB197803A (en) * 1922-03-31 1923-05-24 Hugh Walter Mckenna Improvements in or relating to devices for landing goods or articles from aircraft
US2232156A (en) * 1938-01-13 1941-02-18 Julius Zellnik Combined radiator, particularly for medical purposes
US2372832A (en) * 1942-05-18 1945-04-03 Chicago Flexible Shaft Co Convection heater
US2679003A (en) * 1950-05-27 1954-05-18 Motorola Inc Heater system for microwave antennas
US3141086A (en) * 1961-09-27 1964-07-14 Infrared Corp Of America Infrared heating and illuminating fixture
US3720806A (en) * 1971-06-18 1973-03-13 Horizons Research Inc Optical development apparatus
SU391754A1 *
US4460944A (en) * 1983-05-17 1984-07-17 Purex Pool Products, Inc. Heat sensitive pool light
US4630182A (en) * 1984-03-06 1986-12-16 Nippon Kogaku K. K. Illuminating system
US4681024A (en) * 1986-07-29 1987-07-21 Fasco Industries, Inc. Combination heater-light-ventilator unit
SU1361423A1 *

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU391754A1 *
SU1361423A1 *
GB197803A (en) * 1922-03-31 1923-05-24 Hugh Walter Mckenna Improvements in or relating to devices for landing goods or articles from aircraft
US2232156A (en) * 1938-01-13 1941-02-18 Julius Zellnik Combined radiator, particularly for medical purposes
US2372832A (en) * 1942-05-18 1945-04-03 Chicago Flexible Shaft Co Convection heater
US2679003A (en) * 1950-05-27 1954-05-18 Motorola Inc Heater system for microwave antennas
US3141086A (en) * 1961-09-27 1964-07-14 Infrared Corp Of America Infrared heating and illuminating fixture
US3720806A (en) * 1971-06-18 1973-03-13 Horizons Research Inc Optical development apparatus
US4460944A (en) * 1983-05-17 1984-07-17 Purex Pool Products, Inc. Heat sensitive pool light
US4630182A (en) * 1984-03-06 1986-12-16 Nippon Kogaku K. K. Illuminating system
US4681024A (en) * 1986-07-29 1987-07-21 Fasco Industries, Inc. Combination heater-light-ventilator unit

Cited By (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5906429A (en) * 1993-09-02 1999-05-25 Nikon Corporation Optical illumination device
US6108126A (en) * 1993-10-26 2000-08-22 Nikon Corporation Illuminating apparatus
US6033091A (en) * 1994-03-29 2000-03-07 Mitsubishi Denki Kabushiki Kaisha Projection display device
US5685895A (en) * 1994-08-10 1997-11-11 Nikon Corporation Air cleaning apparatus used for an exposure apparatus
US5816690A (en) * 1994-11-29 1998-10-06 The Obie Company Compact theatrical light and method
US5818167A (en) * 1996-02-01 1998-10-06 Osram Sylvania Inc. Electrodeless high intensity discharge lamp having a phosphorus fill
US6129042A (en) * 1996-11-08 2000-10-10 Coburn Optical Industries, Inc. Process and machine for coating ophthalmic lenses
US6004010A (en) * 1996-12-06 1999-12-21 Hitachi, Ltd. Light source device of liquid crystal projector
EP0846973A2 (en) * 1996-12-06 1998-06-10 Hitachi Video & Information System, Inc. Light source device of liquid crystal projector
EP0846973A3 (en) * 1996-12-06 2004-01-07 Hitachi Video & Information System, Inc. Light source device of liquid crystal projector
US6008568A (en) * 1998-03-13 1999-12-28 Dymax Corporation Heatsinked lamp assembly
US6183114B1 (en) * 1998-05-28 2001-02-06 Kermit J. Cook Halogen torchiere light
US6575599B1 (en) * 1998-09-08 2003-06-10 Ushiodenki Kabushiki Kaisha Light source device for projection apparatus
US6227686B1 (en) * 1999-04-02 2001-05-08 Mitsubishi Denki Kabushiki Kaisha Light source apparatus
US20020017842A1 (en) * 2000-08-04 2002-02-14 Mituo Narita Lamp unit for a projector and a process for the light control thereof
US6759793B2 (en) * 2000-08-04 2004-07-06 Ushiodenki Kabushiki Kaisha Lamp unit for a projector and a process for the light control thereof
WO2002029850A3 (en) * 2000-10-04 2002-06-13 Cogent Light Tech Temperature control for arc lamps
US6616304B2 (en) 2000-10-04 2003-09-09 Cogent Light Technologies, Inc. Temperature control for arc lamps
WO2002040920A1 (en) * 2000-11-14 2002-05-23 Koninklijke Philips Electronics N.V. Lighting system and lamp-reflector unit
US6863421B2 (en) * 2001-06-11 2005-03-08 Infocus Corporation Lamphouse
WO2003002910A1 (en) * 2001-06-27 2003-01-09 Welch Allyn, Inc Lamp thermal control by directed air flow
US6498423B1 (en) * 2001-06-27 2002-12-24 Welch Allyn, Inc. Lamp thermal control by directed air flow
US6693381B2 (en) 2001-06-27 2004-02-17 Welch Allyn, Inc. Lamp and fan thermal control by directed air flow
US20030021120A1 (en) * 2001-06-30 2003-01-30 Teichgraeber Bryan R. Lamp reflector cooling air deflector
US7736026B2 (en) * 2001-06-30 2010-06-15 Texas Instruments Incorporated Lamp reflector cooling air deflector
US20060034050A1 (en) * 2004-08-10 2006-02-16 Jian Wang Electronic device having a temperature control system
US20060034051A1 (en) * 2004-08-10 2006-02-16 Jian Wang Electronic device having a temperature control system including a ductwork assembly
US7233493B2 (en) 2004-08-10 2007-06-19 E. I. Du Pont De Nemours And Company Electronic device having a temperature control system including a ductwork assembly
US7286347B2 (en) 2004-08-10 2007-10-23 Dupont Displays Electronic device having a temperature control system
US20090040765A1 (en) * 2004-09-02 2009-02-12 Koninklijke Philips Electronics, N.V. Lamp assembly comprising a high-pressure gas discharge lamp
US20060262537A1 (en) * 2005-05-17 2006-11-23 Lee John W Projection assembly
EP2287644A2 (en) 2009-08-18 2011-02-23 Mitsubishi Electric Corporation Light source device and method of producing the same
US20110044069A1 (en) * 2009-08-18 2011-02-24 Yukio Sato Light source device and method of producing the same
US8733995B2 (en) 2009-08-18 2014-05-27 Mitsubishi Electric Corporation Light source device with reduced optical part clouding
US20140248041A1 (en) * 2011-06-30 2014-09-04 Panasonic Ecology Systems Guangdong Co., Ltd. Ventilating fan for heating
US9188361B2 (en) * 2011-06-30 2015-11-17 Panasonic Ecology Systems Guangdong Co., Ltd. Ventilating fan for heating
US20150177602A1 (en) * 2012-09-14 2015-06-25 Yusuke Tani Light source apparatus and electronic equipment
US20160144552A1 (en) * 2013-06-27 2016-05-26 Khs Corpoplast Gmbh Device for heating preforms consisting of thermoplastic material
US9751250B2 (en) * 2013-06-27 2017-09-05 Khs Corpoplast Gmbh Device for heating preforms consisting of thermoplastic material

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JP3266156B2 (en) 2002-03-18 grant
JPH04128702A (en) 1992-04-30 application

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