US4956252A - Aqueous processible photosensitive compositions containing core shell microgels - Google Patents
Aqueous processible photosensitive compositions containing core shell microgels Download PDFInfo
- Publication number
- US4956252A US4956252A US07/238,104 US23810488A US4956252A US 4956252 A US4956252 A US 4956252A US 23810488 A US23810488 A US 23810488A US 4956252 A US4956252 A US 4956252A
- Authority
- US
- United States
- Prior art keywords
- microgel
- core
- shell
- composition
- aqueous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 118
- 239000011258 core-shell material Substances 0.000 title claims abstract description 45
- 239000000178 monomer Substances 0.000 claims abstract description 62
- 239000007787 solid Substances 0.000 claims abstract description 34
- 239000011230 binding agent Substances 0.000 claims abstract description 22
- 229920001577 copolymer Polymers 0.000 claims abstract description 19
- 238000004132 cross linking Methods 0.000 claims abstract description 19
- 238000005192 partition Methods 0.000 claims abstract description 14
- 229920000642 polymer Polymers 0.000 claims description 46
- 238000011161 development Methods 0.000 claims description 40
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 28
- 230000005855 radiation Effects 0.000 claims description 26
- 238000007639 printing Methods 0.000 claims description 18
- -1 methacrylic acid modified n-butyl acrylate Chemical class 0.000 claims description 17
- 239000002904 solvent Substances 0.000 claims description 17
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 15
- 239000002253 acid Substances 0.000 claims description 15
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 12
- 239000004014 plasticizer Substances 0.000 claims description 12
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 8
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 6
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 claims description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 6
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 4
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 4
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 claims description 4
- 239000000908 ammonium hydroxide Substances 0.000 claims description 2
- WGLUMOCWFMKWIL-UHFFFAOYSA-N dichloromethane;methanol Chemical compound OC.ClCCl WGLUMOCWFMKWIL-UHFFFAOYSA-N 0.000 claims description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims 1
- 230000000052 comparative effect Effects 0.000 description 64
- 239000007864 aqueous solution Substances 0.000 description 34
- 239000011541 reaction mixture Substances 0.000 description 33
- 230000009477 glass transition Effects 0.000 description 27
- 239000010410 layer Substances 0.000 description 26
- 239000002245 particle Substances 0.000 description 25
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 24
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 22
- 230000015572 biosynthetic process Effects 0.000 description 22
- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 description 21
- 238000000034 method Methods 0.000 description 20
- 238000003786 synthesis reaction Methods 0.000 description 20
- 239000000839 emulsion Substances 0.000 description 19
- 239000000463 material Substances 0.000 description 18
- 239000008367 deionised water Substances 0.000 description 17
- 229910021641 deionized water Inorganic materials 0.000 description 17
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 16
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 16
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 15
- 229920001169 thermoplastic Polymers 0.000 description 15
- 239000004416 thermosoftening plastic Substances 0.000 description 15
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 14
- DAJSVUQLFFJUSX-UHFFFAOYSA-M sodium;dodecane-1-sulfonate Chemical compound [Na+].CCCCCCCCCCCCS([O-])(=O)=O DAJSVUQLFFJUSX-UHFFFAOYSA-M 0.000 description 14
- 238000000113 differential scanning calorimetry Methods 0.000 description 13
- 239000012299 nitrogen atmosphere Substances 0.000 description 13
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 12
- 238000000638 solvent extraction Methods 0.000 description 12
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 11
- 239000000243 solution Substances 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 239000006185 dispersion Substances 0.000 description 10
- 229920005989 resin Polymers 0.000 description 10
- 239000011347 resin Substances 0.000 description 10
- 239000004372 Polyvinyl alcohol Substances 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 229920001971 elastomer Polymers 0.000 description 9
- 229920002451 polyvinyl alcohol Polymers 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 8
- 239000001488 sodium phosphate Substances 0.000 description 8
- 229910000162 sodium phosphate Inorganic materials 0.000 description 8
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 7
- 239000003431 cross linking reagent Substances 0.000 description 7
- 238000001035 drying Methods 0.000 description 7
- 238000007720 emulsion polymerization reaction Methods 0.000 description 7
- 229920001223 polyethylene glycol Chemical class 0.000 description 7
- 239000004094 surface-active agent Substances 0.000 description 7
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 239000011324 bead Substances 0.000 description 6
- 238000003384 imaging method Methods 0.000 description 6
- 239000003999 initiator Substances 0.000 description 6
- 229910052708 sodium Inorganic materials 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- 230000008961 swelling Effects 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 239000002202 Polyethylene glycol Chemical class 0.000 description 5
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 239000000975 dye Substances 0.000 description 5
- 238000001125 extrusion Methods 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000012071 phase Substances 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 238000000518 rheometry Methods 0.000 description 5
- 238000012719 thermal polymerization Methods 0.000 description 5
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 239000003995 emulsifying agent Substances 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 238000004108 freeze drying Methods 0.000 description 4
- 230000004927 fusion Effects 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 4
- 229920006267 polyester film Polymers 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 239000000523 sample Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 3
- 229920002799 BoPET Polymers 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 3
- 238000007605 air drying Methods 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 229960002130 benzoin Drugs 0.000 description 3
- 238000003490 calendering Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 229940073584 methylene chloride Drugs 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 229940001593 sodium carbonate Drugs 0.000 description 3
- 238000006467 substitution reaction Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000000930 thermomechanical effect Effects 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical class C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- MJVAVZPDRWSRRC-UHFFFAOYSA-N Menadione Chemical compound C1=CC=C2C(=O)C(C)=CC(=O)C2=C1 MJVAVZPDRWSRRC-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 238000012644 addition polymerization Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- 230000001680 brushing effect Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 229920002301 cellulose acetate Polymers 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 150000001993 dienes Chemical class 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000000806 elastomer Substances 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 229920005684 linear copolymer Polymers 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- AJDUTMFFZHIJEM-UHFFFAOYSA-N n-(9,10-dioxoanthracen-1-yl)-4-[4-[[4-[4-[(9,10-dioxoanthracen-1-yl)carbamoyl]phenyl]phenyl]diazenyl]phenyl]benzamide Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2NC(=O)C(C=C1)=CC=C1C(C=C1)=CC=C1N=NC(C=C1)=CC=C1C(C=C1)=CC=C1C(=O)NC1=CC=CC2=C1C(=O)C1=CC=CC=C1C2=O AJDUTMFFZHIJEM-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- CELWCAITJAEQNL-UHFFFAOYSA-N oxan-2-ol Chemical compound OC1CCCCO1 CELWCAITJAEQNL-UHFFFAOYSA-N 0.000 description 2
- 230000020477 pH reduction Effects 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical class OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 150000004053 quinones Chemical class 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- KEAYESYHFKHZAL-BJUDXGSMSA-N sodium-22 Chemical compound [22Na] KEAYESYHFKHZAL-BJUDXGSMSA-N 0.000 description 2
- 238000000807 solvent casting Methods 0.000 description 2
- 239000006228 supernatant Substances 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 229940096522 trimethylolpropane triacrylate Drugs 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- UIYCHXAGWOYNNA-UHFFFAOYSA-N vinyl sulfide Chemical compound C=CSC=C UIYCHXAGWOYNNA-UHFFFAOYSA-N 0.000 description 2
- 239000001043 yellow dye Substances 0.000 description 2
- AFVDZBIIBXWASR-AATRIKPKSA-N (E)-1,3,5-hexatriene Chemical compound C=C\C=C\C=C AFVDZBIIBXWASR-AATRIKPKSA-N 0.000 description 1
- XHXSXTIIDBZEKB-UHFFFAOYSA-N 1,2,3,4,5,6,7,8-octamethylanthracene-9,10-dione Chemical compound CC1=C(C)C(C)=C2C(=O)C3=C(C)C(C)=C(C)C(C)=C3C(=O)C2=C1C XHXSXTIIDBZEKB-UHFFFAOYSA-N 0.000 description 1
- AZESNEXPGASJRZ-UHFFFAOYSA-N 1,2,3,4-tetrahydrobenzo[a]anthracene-7,12-dione Chemical compound C1CCCC2=CC=C3C(=O)C4=CC=CC=C4C(=O)C3=C21 AZESNEXPGASJRZ-UHFFFAOYSA-N 0.000 description 1
- CGXVUIBINWTLNT-UHFFFAOYSA-N 1,2,3-tris(ethenoxy)propane Chemical compound C=COCC(OC=C)COC=C CGXVUIBINWTLNT-UHFFFAOYSA-N 0.000 description 1
- WVAFEFUPWRPQSY-UHFFFAOYSA-N 1,2,3-tris(ethenyl)benzene Chemical compound C=CC1=CC=CC(C=C)=C1C=C WVAFEFUPWRPQSY-UHFFFAOYSA-N 0.000 description 1
- ZXHDVRATSGZISC-UHFFFAOYSA-N 1,2-bis(ethenoxy)ethane Chemical compound C=COCCOC=C ZXHDVRATSGZISC-UHFFFAOYSA-N 0.000 description 1
- WDCYWAQPCXBPJA-UHFFFAOYSA-N 1,3-dinitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC([N+]([O-])=O)=C1 WDCYWAQPCXBPJA-UHFFFAOYSA-N 0.000 description 1
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 1
- DVFAVJDEPNXAME-UHFFFAOYSA-N 1,4-dimethylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C(C)=CC=C2C DVFAVJDEPNXAME-UHFFFAOYSA-N 0.000 description 1
- BOCJQSFSGAZAPQ-UHFFFAOYSA-N 1-chloroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl BOCJQSFSGAZAPQ-UHFFFAOYSA-N 0.000 description 1
- GEGLCBTXYBXOJA-UHFFFAOYSA-N 1-methoxyethanol Chemical compound COC(C)O GEGLCBTXYBXOJA-UHFFFAOYSA-N 0.000 description 1
- WVOVXOXRXQFTAS-UHFFFAOYSA-N 1-methyl-7-propan-2-ylphenanthrene-9,10-dione Chemical compound C1=CC=C2C3=CC=C(C(C)C)C=C3C(=O)C(=O)C2=C1C WVOVXOXRXQFTAS-UHFFFAOYSA-N 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- NEBBLNDVSSWJLL-UHFFFAOYSA-N 2,3-bis(2-methylprop-2-enoyloxy)propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(OC(=O)C(C)=C)COC(=O)C(C)=C NEBBLNDVSSWJLL-UHFFFAOYSA-N 0.000 description 1
- SVPKNMBRVBMTLB-UHFFFAOYSA-N 2,3-dichloronaphthalene-1,4-dione Chemical compound C1=CC=C2C(=O)C(Cl)=C(Cl)C(=O)C2=C1 SVPKNMBRVBMTLB-UHFFFAOYSA-N 0.000 description 1
- VEPOHXYIFQMVHW-XOZOLZJESA-N 2,3-dihydroxybutanedioic acid (2S,3S)-3,4-dimethyl-2-phenylmorpholine Chemical compound OC(C(O)C(O)=O)C(O)=O.C[C@H]1[C@@H](OCCN1C)c1ccccc1 VEPOHXYIFQMVHW-XOZOLZJESA-N 0.000 description 1
- KIJPZYXCIHZVGP-UHFFFAOYSA-N 2,3-dimethylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=C(C)C(C)=C2 KIJPZYXCIHZVGP-UHFFFAOYSA-N 0.000 description 1
- LZWVPGJPVCYAOC-UHFFFAOYSA-N 2,3-diphenylanthracene-9,10-dione Chemical compound C=1C=CC=CC=1C=1C=C2C(=O)C3=CC=CC=C3C(=O)C2=CC=1C1=CC=CC=C1 LZWVPGJPVCYAOC-UHFFFAOYSA-N 0.000 description 1
- BJELTSYBAHKXRW-UHFFFAOYSA-N 2,4,6-triallyloxy-1,3,5-triazine Chemical compound C=CCOC1=NC(OCC=C)=NC(OCC=C)=N1 BJELTSYBAHKXRW-UHFFFAOYSA-N 0.000 description 1
- LCPVQAHEFVXVKT-UHFFFAOYSA-N 2-(2,4-difluorophenoxy)pyridin-3-amine Chemical compound NC1=CC=CN=C1OC1=CC=C(F)C=C1F LCPVQAHEFVXVKT-UHFFFAOYSA-N 0.000 description 1
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 1
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 description 1
- LTHJXDSHSVNJKG-UHFFFAOYSA-N 2-[2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOCCOC(=O)C(C)=C LTHJXDSHSVNJKG-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- YQZHOBBQNFBTJE-UHFFFAOYSA-N 2-chloro-3-methylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=C(C)C(Cl)=C2 YQZHOBBQNFBTJE-UHFFFAOYSA-N 0.000 description 1
- FPKCTSIVDAWGFA-UHFFFAOYSA-N 2-chloroanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3C(=O)C2=C1 FPKCTSIVDAWGFA-UHFFFAOYSA-N 0.000 description 1
- HGPNKTHAVDVUNT-UHFFFAOYSA-N 2-dodecylpyridine;hydrochloride Chemical compound [Cl-].CCCCCCCCCCCCC1=CC=CC=[NH+]1 HGPNKTHAVDVUNT-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 229940093475 2-ethoxyethanol Drugs 0.000 description 1
- GTELLNMUWNJXMQ-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical class OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(CO)(CO)CO GTELLNMUWNJXMQ-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- CKKQLOUBFINSIB-UHFFFAOYSA-N 2-hydroxy-1,2,2-triphenylethanone Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(O)C(=O)C1=CC=CC=C1 CKKQLOUBFINSIB-UHFFFAOYSA-N 0.000 description 1
- DIVXVZXROTWKIH-UHFFFAOYSA-N 2-hydroxy-1,2-diphenylpropan-1-one Chemical compound C=1C=CC=CC=1C(O)(C)C(=O)C1=CC=CC=C1 DIVXVZXROTWKIH-UHFFFAOYSA-N 0.000 description 1
- TURITJIWSQEMDB-UHFFFAOYSA-N 2-methyl-n-[(2-methylprop-2-enoylamino)methyl]prop-2-enamide Chemical compound CC(=C)C(=O)NCNC(=O)C(C)=C TURITJIWSQEMDB-UHFFFAOYSA-N 0.000 description 1
- VTWDKFNVVLAELH-UHFFFAOYSA-N 2-methylcyclohexa-2,5-diene-1,4-dione Chemical compound CC1=CC(=O)C=CC1=O VTWDKFNVVLAELH-UHFFFAOYSA-N 0.000 description 1
- DUIOKRXOKLLURE-UHFFFAOYSA-N 2-octylphenol Chemical compound CCCCCCCCC1=CC=CC=C1O DUIOKRXOKLLURE-UHFFFAOYSA-N 0.000 description 1
- NTZCFGZBDDCNHI-UHFFFAOYSA-N 2-phenylanthracene-9,10-dione Chemical compound C=1C=C2C(=O)C3=CC=CC=C3C(=O)C2=CC=1C1=CC=CC=C1 NTZCFGZBDDCNHI-UHFFFAOYSA-N 0.000 description 1
- YTPSFXZMJKMUJE-UHFFFAOYSA-N 2-tert-butylanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(C(C)(C)C)=CC=C3C(=O)C2=C1 YTPSFXZMJKMUJE-UHFFFAOYSA-N 0.000 description 1
- BCHZICNRHXRCHY-UHFFFAOYSA-N 2h-oxazine Chemical compound N1OC=CC=C1 BCHZICNRHXRCHY-UHFFFAOYSA-N 0.000 description 1
- IKQUUYYDRTYXAP-UHFFFAOYSA-N 3-methylpenta-1,4-diene Chemical compound C=CC(C)C=C IKQUUYYDRTYXAP-UHFFFAOYSA-N 0.000 description 1
- JIGUICYYOYEXFS-UHFFFAOYSA-N 3-tert-butylbenzene-1,2-diol Chemical class CC(C)(C)C1=CC=CC(O)=C1O JIGUICYYOYEXFS-UHFFFAOYSA-N 0.000 description 1
- PTOFMVRVTDBZKK-UHFFFAOYSA-N 4-[3-methyl-4-[[3-methyl-5-oxo-1-(4-sulfophenyl)pyrazol-4-ylidene]methyl]-5-oxo-4h-pyrazol-1-yl]benzenesulfonic acid Chemical compound CC1=NN(C=2C=CC(=CC=2)S(O)(=O)=O)C(=O)C1C=C(C1=O)C(C)=NN1C1=CC=C(S(O)(=O)=O)C=C1 PTOFMVRVTDBZKK-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- YMRDPCUYKKPMFC-UHFFFAOYSA-N 4-hydroxy-2,2,5,5-tetramethylhexan-3-one Chemical compound CC(C)(C)C(O)C(=O)C(C)(C)C YMRDPCUYKKPMFC-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- RKCRIUIBDUVZSP-UHFFFAOYSA-N 7,8,9,10-tetrahydrotetracene-1,2-dione Chemical compound C1CCCC2=C1C=C1C=C3C=CC(=O)C(=O)C3=CC1=C2 RKCRIUIBDUVZSP-UHFFFAOYSA-N 0.000 description 1
- RZVHIXYEVGDQDX-UHFFFAOYSA-N 9,10-anthraquinone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C(=O)C2=C1 RZVHIXYEVGDQDX-UHFFFAOYSA-N 0.000 description 1
- 229940076442 9,10-anthraquinone Drugs 0.000 description 1
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical class [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 239000004971 Cross linker Substances 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical class CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 229920000305 Nylon 6,10 Polymers 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- CNYGFPPAGUCRIC-UHFFFAOYSA-L [4-[[4-(dimethylamino)phenyl]-phenylmethylidene]cyclohexa-2,5-dien-1-ylidene]-dimethylazanium;2-hydroxy-2-oxoacetate;oxalic acid Chemical compound OC(=O)C(O)=O.OC(=O)C([O-])=O.OC(=O)C([O-])=O.C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1.C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 CNYGFPPAGUCRIC-UHFFFAOYSA-L 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- WNLRTRBMVRJNCN-UHFFFAOYSA-L adipate(2-) Chemical compound [O-]C(=O)CCCCC([O-])=O WNLRTRBMVRJNCN-UHFFFAOYSA-L 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 125000003118 aryl group Chemical class 0.000 description 1
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- LHMRXAIRPKSGDE-UHFFFAOYSA-N benzo[a]anthracene-7,12-dione Chemical compound C1=CC2=CC=CC=C2C2=C1C(=O)C1=CC=CC=C1C2=O LHMRXAIRPKSGDE-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical class C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Chemical class 0.000 description 1
- 229950011260 betanaphthol Drugs 0.000 description 1
- QRHCILLLMDEFSD-UHFFFAOYSA-N bis(ethenyl)-dimethylsilane Chemical compound C=C[Si](C)(C)C=C QRHCILLLMDEFSD-UHFFFAOYSA-N 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- ZOSAYFDMPYAZTB-UHFFFAOYSA-N bis(prop-2-enyl)cyanamide Chemical compound C=CCN(C#N)CC=C ZOSAYFDMPYAZTB-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- WFYPICNXBKQZGB-UHFFFAOYSA-N butenyne Chemical group C=CC#C WFYPICNXBKQZGB-UHFFFAOYSA-N 0.000 description 1
- DNBZRBSJOJZJKV-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.COC(=O)C(C)=C.CCCCOC(=O)C=C DNBZRBSJOJZJKV-UHFFFAOYSA-N 0.000 description 1
- 235000010354 butylated hydroxytoluene Nutrition 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- BGTFCAQCKWKTRL-YDEUACAXSA-N chembl1095986 Chemical compound C1[C@@H](N)[C@@H](O)[C@H](C)O[C@H]1O[C@@H]([C@H]1C(N[C@H](C2=CC(O)=CC(O[C@@H]3[C@H]([C@@H](O)[C@H](O)[C@@H](CO)O3)O)=C2C=2C(O)=CC=C(C=2)[C@@H](NC(=O)[C@@H]2NC(=O)[C@@H]3C=4C=C(C(=C(O)C=4)C)OC=4C(O)=CC=C(C=4)[C@@H](N)C(=O)N[C@@H](C(=O)N3)[C@H](O)C=3C=CC(O4)=CC=3)C(=O)N1)C(O)=O)=O)C(C=C1)=CC=C1OC1=C(O[C@@H]3[C@H]([C@H](O)[C@@H](O)[C@H](CO[C@@H]5[C@H]([C@@H](O)[C@H](O)[C@@H](C)O5)O)O3)O[C@@H]3[C@H]([C@@H](O)[C@H](O)[C@@H](CO)O3)O[C@@H]3[C@H]([C@H](O)[C@@H](CO)O3)O)C4=CC2=C1 BGTFCAQCKWKTRL-YDEUACAXSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Chemical class 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 239000011243 crosslinked material Substances 0.000 description 1
- 229940045803 cuprous chloride Drugs 0.000 description 1
- WQPDQJCBHQPNCZ-UHFFFAOYSA-N cyclohexa-2,4-dien-1-one Chemical class O=C1CC=CC=C1 WQPDQJCBHQPNCZ-UHFFFAOYSA-N 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
- 238000001938 differential scanning calorimetry curve Methods 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- MQRJBSHKWOFOGF-UHFFFAOYSA-L disodium;carbonate;hydrate Chemical compound O.[Na+].[Na+].[O-]C([O-])=O MQRJBSHKWOFOGF-UHFFFAOYSA-L 0.000 description 1
- AFOSIXZFDONLBT-UHFFFAOYSA-N divinyl sulfone Chemical compound C=CS(=O)(=O)C=C AFOSIXZFDONLBT-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000011067 equilibration Methods 0.000 description 1
- IYNRVIKPUTZSOR-HWKANZROSA-N ethenyl (e)-but-2-enoate Chemical compound C\C=C\C(=O)OC=C IYNRVIKPUTZSOR-HWKANZROSA-N 0.000 description 1
- FFYWKOUKJFCBAM-UHFFFAOYSA-N ethenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC=C FFYWKOUKJFCBAM-UHFFFAOYSA-N 0.000 description 1
- BLCTWBJQROOONQ-UHFFFAOYSA-N ethenyl prop-2-enoate Chemical compound C=COC(=O)C=C BLCTWBJQROOONQ-UHFFFAOYSA-N 0.000 description 1
- 229940052303 ethers for general anesthesia Drugs 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 239000011790 ferrous sulphate Substances 0.000 description 1
- 235000003891 ferrous sulphate Nutrition 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000011491 glass wool Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 238000010559 graft polymerization reaction Methods 0.000 description 1
- AUBDSFLQOBEOPX-UHFFFAOYSA-N hexa-1,5-dien-3-yne Chemical group C=CC#CC=C AUBDSFLQOBEOPX-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 239000000852 hydrogen donor Substances 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000005213 imbibition Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 1
- 229910000359 iron(II) sulfate Inorganic materials 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- CDOSHBSSFJOMGT-UHFFFAOYSA-N linalool Chemical compound CC(C)=CCCC(C)(O)C=C CDOSHBSSFJOMGT-UHFFFAOYSA-N 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 229910052901 montmorillonite Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- 150000005002 naphthylamines Chemical class 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000000018 nitroso group Chemical group N(=O)* 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 125000005498 phthalate group Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006149 polyester-amide block copolymer Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920002959 polymer blend Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000012744 reinforcing agent Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229940076133 sodium carbonate monohydrate Drugs 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Substances [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- OPQYOFWUFGEMRZ-UHFFFAOYSA-N tert-butyl 2,2-dimethylpropaneperoxoate Chemical compound CC(C)(C)OOC(=O)C(C)(C)C OPQYOFWUFGEMRZ-UHFFFAOYSA-N 0.000 description 1
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 1
- 239000012085 test solution Substances 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- 238000001757 thermogravimetry curve Methods 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000012745 toughening agent Substances 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
Definitions
- This invention relates to solid photosensitive compositions and, more particularly, to aqueous processible photosensitive compositions having core shell microgels.
- Photosensitive compositions useful in preparing flexographic printing plates are well known in the art. These compositions generally comprise (1) an addition polymerizable, non-gaseous, ethylenically unsaturated monomer, (2) a photoinitiator or system activated by actinic radiation and (3) a thermoplastic, elastomeric polymeric binder comprising polymerized conjugated diene monomers. Flexographic printing elements can be made from these photosensitive compositions by solvent casting or by extruding, calendering or pressing at an elevated temperature of the photosensitive composition into the form of a layer or self-supporting sheet on a suitable casting wheel, belt or platen. The sheet can be permanently affixed to a suitable permanent substrate and, usually, a removable cover sheet is placed on top to protect the photosensitive composition.
- Extrusion is the preferred method for making photosensitive elements using the photosensitive composition of the instant invention.
- the photosensitive composition of this invention extrudes well. It is equally important that this composition be developable in a semi-aqueous or aqueous systems and this composition should have storage stability.
- Cold flow deleteriously affects storage stability in that an excessive amount of cold flow results in the material becoming unacceptable, i.e., edge fusion occurs which prevents unstacking of photopolymerizable plates without damaging the continuity of the photopolymerizable composition.
- an additive component to change physical properties in a composition is well known.
- One example is using beads as filler in an organic polymer composition which may be optionally polymerizable as disclosed in U.S. Pat. No. 4,414,278.
- the polymeric beads are discrete, substantially nonswellable and crosslinked with an average diameter of 0.7 to 20 micrometers.
- Microgel is a term originated in the paint industry and it includes crosslinked spherical polymer molecules of high molecular weight such as of the order of 10 9 to 10 10 with a particle size of 0.05 to 1 micron in diameter prepared by emulsion polymerization.
- the term microgel conventionally refers to a particle having some degree of crosslinking throughout the entire particle. Crosslinking renders these microgels insoluble but capable of swelling in strong solvent without destroying the crosslinked structure.
- the preparation and use of such microgels is disclosed in British Patent No. 967,051 and U.S. Pat. No. 3,895,082.
- microgel as used herein is not used in its conventional sense, rather, the term refers to a particle having two domains--a crosslinked core and an aqueous processible non-crosslinked shell.
- the core should have less than 10% crosslinking and the shell consists of an acid-modified copolymer.
- U.S. Pat. No. 4,726,877 teaches the use of microgels to replace all or part of the binder of photosensitive compositions to improve resistance to cold flow.
- the microgels discussed have some degree of crosslinking throughout the entire particle.
- Even the core shell microgels which are mentioned have a crosslinked shell as is evidenced by the presence of the crosslinker, butanediol diacrylate, in the shell. See, core shell microgels O and P discussed in Table 1 in column 7.
- core shell microgels O and P discussed in Table 1 in column 7.
- Japanese Patent Application No. 52/116,301 discloses the use of a component described as microgel in a non-aqueous processible photosensitive composition use for molding plates.
- the microgel appears to be a core shell microgel which is described as a rubber type substance obtained by a graft polymerization of a vinyl monomer with a so-called rubber type base material having particle diameter of 0.01 to 10 microns.
- the microgel materials used are referred to as elastomers which by definition have glass transition temperatures below room temperature. It is believed that the microgel is incorporated to toughen the rubber type material.
- the principles underlying rubber toughening are discussed by Seymour Newman and C. B. Bucknall in "Polymer Blends", D. R.
- a delustering coating compositon which contains fine particles is disclosed in U.S. Pat. No. 4,518,472.
- the composition is applied to a molded article to provide high abrasion resistance or scratch resistance.
- Such composition for coating is a liquid which differs from the solid films of the present invention.
- U.S. Pat. No. 4,272,608 discloses photosensitive compositions comprising high molecular weight butadiene/acrylonitrile copolymer containing carboxyl groups cross-linked via selected metal ions.
- the butadiene/acrylonitrile copolymer components are compatible with, and can be soluble in, the ethylenically unsaturated compound in the proportions used.
- the copolymer components, which constitute the binder, and the ethylenically unsaturated compound are dispersed evenly within one another. Microgels are not used.
- thermoplastic-elastomeric block copolymer component should be compatible with and, preferably soluble in, the ethylenic component when used in a ratio range of 99:1 to about 1:1. It is mentioned that compatibility can be achieved when the ethylenic component is soluble in either of the component blocks of the block copolymer. Microgels are not used.
- the present invention concerns an aqueous processible solid photosensitive composition for making relief plates comprising
- a core shell microgel binder wherein the core shell microgel binder has two domains, a core having less than 10% crosslinking and an aqueous processible non-crosslinked outer shell consisting of an acid-modified copolymer, and further wherein the monomer partitions in the shell of the microgel.
- the invention also concerns a photosensitive element containing this composition.
- FIG. 1 shows that core shell microgel C has two glass transition temperatures as determined by thermomechanical analysis.
- FIG. 2 shows that core shell microgel C has two glass transition temperatures as determined by dynamic mechanical analysis.
- FIG. 3A shows that core shell microgel C has two glass transition temperatures as determined by differential scanning calorimetry.
- FIG. 3B shows that core shell microgel C has two glass transition temperatures after second heat as determined by differential scanning calorimetry.
- FIGS. 4A-4E show partitioning of the monomer, 1,6-hexanediol diacrylate (HMDA), in the core of the core shell microgel C as determined by differential scanning calorimetry.
- HMDA 1,6-hexanediol diacrylate
- FIGS. 5A-5D show partitioning of the momomer, trimethylolpropane ethoxy triacrylate (TMPEOTA), in the shell of core shell microgel C as determined indirectly by differential scanning calorimetry.
- TMPEOTA trimethylolpropane ethoxy triacrylate
- FIG. 6 shows a plot of log (viscosity) versus log (shear rate) for microgel C and comparative microgels 1D and 1E.
- FIG. 7 shows a plot of log (viscosity) versus log (shear rate) for microgel C, microgel A, and comparative microgels 1F and 1G.
- microgel as used herein has the meaning set forth above. Thus, by definition, the term excludes a highly crosslinked material such as in U.S. Pat. No. 4,414,278 which discloses substantially nonswellable beads. Since the degree of crosslinking is controlled in manufacture of a microgel, a substantially nonswellable crosslinked polymeric bead (even of proper size) is not a microgel. Generally, the microgels will be present in an average particle size range of from 0.01 to 1 microns and more preferably 0.05 to 0.15 microns.
- Core shell microgels can be used to replace all or part of the binder.
- core shell microgel binder refers to binders composed entirely of a core shell microgel and to binders which are blends of a core shell microgel and a preformed macromolecular polymer.
- the preferred embodiment of this invention is an aqueous processible solid photosensitive composition having a core shell microgel binder composed entirely of the core shell microgel.
- the core shell microgels of the present invention will swell in at least one of the following solvents: n-heptane, carbon tetrachloride, toluene, methylene chloride, ethyl acetate, acetone, acetonitrile, acetic acid, dimethylsulfoxide, dimethylformamide, formamide, water, aqueous ammonium hydroxide solution containing up to 10% by weight ammonia, aqueous potassium hydroxide solution containing up to 10% by weight potassium hydroxide, methylene chloride-methanol solution containing by weight 92% methylene chloride and 8% methanol, aqueous sodium carbonate solution containing by weight 1% sodium carbonate.
- solvents n-heptane, carbon tetrachloride, toluene, methylene chloride, ethyl acetate, acetone, acetonitrile, acetic acid, dimethylsulfoxide, dimethylformamide, form
- Swellability can be detected in a variety of ways.
- One test of swellability is to place a 10 gram sample of the microgel in 100 grams of solvent.
- the microgel will swell at least 10%, i.e., at least a 10% increase in volume of the microgel.
- swelling of at least 50% is more common and swelling increases of at least 100% can be realized with many microgels.
- Another way to test swellability is to measure the increase in viscosity of the solvent which is caused by the microgel absorbing solvent. Initially, the viscosity of the solvent is measured using a viscometer, such as a Brookfield viscometer, with a spindle appropriate for the viscosity of the solvent. Ten grams of the core shell microgel is introduced into one hundred grams of the test solution. The material for testing and solvent are stirred at room temperature, about 25° C., for about 24 hours. At the end of the time period, additional test liquid is added to obtain a final weight of 110 grams, 100 grams of solvent and 10 grams of microgel. The viscosity of the microgel dispersion is again measured using the viscometer and a spindle appropriate for the viscosity of the mixture.
- a viscometer such as a Brookfield viscometer
- the increase in viscosity should be at least 100 centipoise, preferably, 1000 centipoise and, most preferably, 3,000 centipoise. An increase in viscosity which is less than 100 centipoise indicates that the proper degree of cross linking is missing.
- a storage stable composition will have a creep viscosity of at least 50 megapoise, preferably at least 60 megapoise, and most preferably at least 70 megapoise at 40° C.
- the core shell microgels of the present invention are conventionally prepared by emulsion polymerization.
- the microgels are generally formed from 90 to 99.5% by weight polymer component and 10 to 0.5% by weight crosslinking agent with these materials compatible in formation of a continuous phase system.
- the polymer components can be varied during polymerization to produce core and shell microgel so that the core has less than 10% crosslinking and the shell is designed for aqueous processibility in that an acid-modified copolymer is used to make the shell.
- the microgels used in this invention have elastomeric crosslinked cores and aqueous processible elastomeric or thermoplastic non-crosslinked shell.
- Elastomers by definition, have glass transition temperatures below room temperature and thermoplastic materials, by definition, have glass transition temperatures above room temperature. It is also possible to use a microgel having a thermoplastic crosslinked core and a thermoplastic non-crosslinked shell. The choice will depend upon the use to which the photosensitive composition is to be put.
- the preferred microgel for practicing the invention has an elastomeric crosslinked core and an elastomeric non-crosslinked shell.
- Core shell microgels can be made from a wide variety of starting materials. Conventionally monoethylenically unsaturated monomers are used in preparing the bulk portion of the microgel, whereas the crosslinking agents contain at least two double bonds.
- Suitable monomers are esters of acrylic and methacrylic acid with C 1 -C 18 alcohols. There can be mentioned methyl methacrylate, ethyl acrylate, methacrylic acid, butyl methacrylate, ethyl methacrylate, glycidyl methacrylate, styrene and allyl methacrylate, while other useful monomers include acrylonitrile, methacrylonitrile, acrylic acid, butadiene (BD) and 2-ethyl-hexyl acrylate.
- the preferred monomer for making the core is 2-ethyl-hexyl acrylate.
- the preferred acid-modified copolymer for the shell is a methacrylic acid-modified n-butyl acrylate.
- Suitable monomers include vinyl ethers and vinyl esters, nitriles and amides of acrylic and methacrylic acid.
- a preferred crosslinking agent is butanediol diacrylate (BDDA); while others include ethylene glycol dimethacrylate, tetramethylene glycol diacrylate, trimethylol propane triacrylate, tetraethylene glycol dimethacrylate, methylene bisacrylamide, methylene bismethacrylamide, divinyl benzene, vinyl methacrylate, vinyl crotonate, vinyl acrylate, vinyl acetylene, trivinyl benzene, glycerine trimethacrylate, pentaerythritol tetramethacrylate, triallyl cyanurate, divinyl acetylene, divinyl ethane, divinyl sulfide, divinyl sulfone, dienes such as butadiene, hexatriene, triethylene glycol dimethacrylate, diallyl cyanamide, glycol diacrylate, ethylene glycol divinyl ether, diallylphthalate, divin
- core shell microgels having cores with less than 10% crosslinking is accomplished by using 10% or less of the crosslinking agent to crosslink the core, i.e., no crosslinking agent is used to make the shell.
- one or more monomers and crosslinking agents are dispersed in water with suitable emulsifiers and initiators in manufacture of the microgel.
- suitable emulsifiers and initiators in manufacture of the microgel.
- suitable emulsifiers and initiators can be employed.
- emulsifying agents are sodium lauryl sulfate, lauryl pyridine chloride, polyoxyethylene, polyoxypropylene, colloidal silica, anionic organic phosphates, magnesium montmorillonite, the reaction product of 12 to 13 moles of ethylene oxide with 1 mole of octyl phenol, secondary sodium alkyl sulfates and mixtures thereof.
- emulsifier based on the total weight of reactants is used.
- initiators are potassium persulfate, sodium persulfate, ammonium persulfate, tertiary butyl hydroperoxide, hydrogen peroxide, azo bis(isobutyronitrile), azo bis(isobutyroimidine hydrochloride), various redox (reduction-oxidation) systems such as hydrogen peroxide and ferrous sulfate and well known persulfate-bisulfate combinations. Usually from 0.05 to 5% by weight of initiator based on the weight of copolymerizable monomers is used.
- Microgels suitable for the practice of the present invention can be produced by the technique of emulsion polymerization as described in U.S. Pat. No. 3,895,082 (Also, British Pat. No. 967,051 teaches a suitable method.) This technique can also be modified by beginning the reaction with one set of monomers and by varying the ratios for the final part of the reaction in order to produce spherical microgels in which the part of the polymer, i.e., the core is different monomeric composition than the outer part of the polymer, i.e., shell. It is also desired that the shell be designed for aqueous processibility. This is achieved by constructing the shell so that it has an acid-modified copolymer. For the present invention, it is desired that the core be elastomeric while the shell can be either elastomeric or thermoplastic.
- the art of emulsion polymerization is well known concerning reaction conditions to produce spherical microgels dispersed in a water phase. Unless the dispersion can be used as made and contain no objectionable impurities or byproducts, it is usually necessary to convert the microgels to a solid prior to their use as a photosensitive composition. Well-known techniques of coagulation, filtration, washing and drying may be employed for this purpose. Freeze drying is a particularly useful method for the present invention. Generally the amount of crosslinking agent in the microgel will be less than 20% by weight of the overall weight of the microgel and generally less than 10% by weight.
- the weight ratio of the core to the shell is usually in the range from about 4:1 to about 1:4.
- compositions of some of the microgels produced and tested and found useful for the practice of the present invention are set forth in Table 1. All parts are by weight.
- the microgel will be present in an amount from 1 to 90% by weight of the components monomer, initiating system, and microgel.
- Preformed macromolecular polymer if used in a blend, should contain sufficient acidic or other groups so that the binder is also processible in a semi-aqueous or aqueous developer.
- Useful aqueous-processible binders include those disclosed in U.S. Pat. Nos. 3,458,311, and 4,273,857.
- Useful amphoteric polymers include interpolymers derived from N-alkylacrylamides or methacrylamides, acidic film-forming comonomer and an alkyl or hydroxyalkyl acrylate such as those disclosed in U.S. Pat. No. 4,293,635.
- the photosensitive layer will be removed in portions which are not exposed to radiation but the exposed portions will be substantially unaffected during development by a liquid such as wholly aqueous solutions containing 2% sodium carbonate by weight.
- Partitioning in the conventional sense, refers to distribution of a solute between two liquid phases. When a solute is allowed to distribute or partition itself between equal volumes of two immiscible liquids, the ratio of the concentrations of the solute in the two phases, at equilibrium a given temperature, is called the partition coefficient.
- partitioning indicates that the addition polymerizable monomer is distributed predominantly in the domain of the microgel with which it is compatible. Partitioning occurs as the photosensitive element is being made.
- the driving force which causes the monomer to partition in the shell is believed to be the compatibility of the monomer with the aqueous processible shell.
- the driving force is believed to be imbibition which occurs as the microgel is swelling.
- Tg glass transition temperatures
- DMA dynamic mechanical analysis
- DSC differential scanning calorimetry
- FIG. 1 shows that core shell microgel C has two glass transition temperatures as determined by thermomechanical analysis.
- FIG. 2 shows that core shell microgel C has two glass transition temperatures as determined by dynamic mechanical analysis.
- FIG. 3A shows that core shell microgel C has two glass transition temperatures as determined by differential scanning calorimetry.
- FIG. 3B shows that core shell microgel C has two glass transition temperatures after second heat as determined by differential scanning calorimetry.
- Table 2 summarizes the data presented in FIGS. 1 to 3B.
- the glass transition temperatures fluctuated because the sensitivity of each technique, in responding to the property it is measuring, varies.
- TMA is preferred to measure depression of Tg of the shell because it is sensitive enough to detect the depression.
- a plasticizer it can be any one of the common plasticizers compatible with the microgel binder.
- Some of the common plasticizers which can be used are dialkyl phthalates, alkyl phosphates, polyethylene glycol, polyethylene glycol esters, polyethylene glycol others, and low molecular weight (MW ⁇ 5000) polybutadienes.
- Monomers which partition in the shell should also be capable of forming a high polymer by free-radical initiated chain propagating addition polymerizatio.
- Suitable monomers can be selected, generally, which have chemical compositions similar to the chemical composition of the aqueous processible outer shell in which it partitions.
- One class of suitable ethylenically unsaturated compounds includes unsaturated esters of alcohols. The following can also be mentioned: trimethylolpropane triacrylate, poloxyethylated trimethylolpropane triacrylate.
- Preferred free radical-generating addition polymerization initiators activatable by actinic light and thermally inactive at and below 185° C. include the substituted or unsubstituted polynuclear quinones which are compounds having two intracyclic carbon atoms in a conjugated carbocyclic ring system, e.g., 9,10-anthraquinone, 1-chloroanthraquinone, 2-chloroanthraquinone, 2-methylanthraquinone, 2-ethylanthraquinone, 2-tert-butylanthraquinone, octamethylanthraquinone, 1,4-naphthoquinone, 9,10-phenanthrenequinone, 1,2-benzanthraquinone, 2,3-benzanthraquinone, 2-methyl-1,4-naphthoquinone, 2,3-dichloronaphthoquinone, 1,4-dimethylan
- photoinitiators which are also useful, even though some may be thermally active at temperatures as low as 85° C., are described in U.S. Pat. No. 2,760,863 and include vicinal ketaldonyl alcohols, such as benzoin, pivaloin, acyloin ethers, e.g., benzoin methyl and ethyl ethers; alpha-hydrocarbon-substituted aromatic acyloins, including alpha-methylbenzoin, alpha-benzoin and alphaphenylbenzoin. Photoreducible dyes and reducing agents diclosed in U.S. Pat. Nos.
- Thermal polymerization inhibitors that can be used in photopolymerizable compositions are: p-methoxyphenol, hydroquinone, and alkyl and aryl-substituted hydroquinones and quinones, tert-butyl catechol, pyrogallol, copper resinate, naphthylamines, beta-naphthol, cuprous chloride, 2,6-di-tertbutyl-p-cresol, phenothiazine, pyridine, nitrobenzene and dinitrobenzene, p-toluquinone and chloranil. Also useful for thermal polymerization inhibitors are the nitroso compositions disclosed in U.S. Pat. No. 4,168,982.
- the photosensitive elements of this invention can be made by solvent casting or by extruding, calendering or pressing at an elevated temperature of the photosensitive composition into the form of a layer on a suitable casting wheel, belt or platen as a self-supporting sheet.
- the layer or sheet may be laminated to the surface of a suitable permanent support or, if necessary, it may be affixed by means of a suitalbe adhesive, or the solution may be coated directly onto a suitable support.
- the photosensitive elements may have antihalation material beneath the photosensitive layer.
- the support may contain an antihalation material or have a layer or stratum of such material on its surface.
- the elements may be made in the various manners described in Plambeck U.S. Pat. Nos.
- the photosensitive layer itself can serve as the light absorption layer, e.g., when dyes or pigments are included in the photosensitive composition or when the layer is sufficiently thick.
- suitable base or support materials include sheets and foils, and films or plates composed of various film-forming synthetic resins or high polymers, such as the addition polymers and in particular vinylidene chloride copolymers with vinyl chloride, vinyl acetate, styrene, isobutylene and acrylonitrile; vinyl chloride homopolymers and copolymers with vinyl acetate, styrene, isobutylene and acrylonitrile; linear condensation polymers such as polyesters, e.g., polyethylene terephthalate, polyamide, e.g., polyhexamethylenesebacamide; polyimides, e.g., films as disclosed in assignee's Edwards, U.S.
- polyester amide e.g., polyhexamethylenedipamide adipate
- Fillers or reinforcing agents can be present in the synthetic resin or polymer basis such as the various fibers (synthetic modified, or natural), e.g., cellulosic fibers, for instance, cotton, cellulose acetate, viscose rayon, paper; glass wool; nylon and polyethylene terephthalate. These reinforced bases may be used in laminated form.
- Various anchor layers disclosed in U.S. Pat. No. 2,760,863 can be used to give strong adherence between the support and the photosensitive layer or, in the case of transparent support, pre-exposure through the support to actinic radiation may be useful.
- the adhesive compositions disclosed in assignee's Burg, U.S. Pat. No. 3,036,913, are also effective.
- a transparent cover sheet such as a thin film of polystyrene, polyethylene, polypropylene or other strippable material is used to prevent contamination of or damage to the photosensitive layer during storage or manipulation.
- aqueous release layer is coated onto the cover sheet which is then laminated or extruded onto the surface of the aqueous processible photopolymer plate.
- the release layer provides a smooth flexible surface which allows easy release from the negative used for imaging.
- the preferred release layer is a plasticized polyvinyl alcohol layer which is described in applicant's assignee's, E. I. du Pont de Nemours and Company's, copending patent application filed concurrently herewith, Ser. No. 238103, filing date 8-30-88, incorporated herein by reference.
- the polymer which must be processible in an aqueous or semiaqueous development system It has been found that a substantially hydrolyzed polyvinyl alcohol works well.
- the polyvinyl alcohol should be hydrolyzed at least 75% and, more preferably, at least 80%. It is possible to work with a fully hydrolyzed polyvinyl alcohol. However, it is less desirable because it would be less soluble in water due to the absence of any acetate groups and, thus, may take longer to be removed from the plate surface during development.
- At least 60% substantially hydrolyzed polyvinyl alcohol should be present based on the total weight of the release composition.
- at least 70% should be present and, most preferably, at least 80% should be present.
- the release composition of this invention contains a plasticizer.
- a plasticizer for example, low molecular weight polyethylene glycol, Carbowax® 400 and Carbowax® 1000 manufactured by Union Carbide, can be used. There can also be mentioned urea, sorbitol and glycerine.
- the preferred plasticizer for practicing the invention is a low molecular weight polyethylene glycol having an average molecular weight in the range 200-5000.
- At least 10% plasticizer is used based on the total weight of the release composition. Preferably, at least 14% plasticizer should be present.
- this plasticized release composition provides good release from the transparency through which it is imagewise exposed and the release composition of this invention can be quickly removed by an aqueous or semi-aqueous developer because it is designed to be processible in aqueous or semi-aqueous systems.
- a surfactant can be added to the plasticized release composition in order to improve coating/wetting of the plasticized release composition on the flexible cover sheet.
- Any surfactant can be used as long as it is processible in an aqueous system.
- fluorinated surfactants such as, perfluoroalkyl ethoxylate.
- At least 1.0% of surfactant should be present based on the total weight of the release composition.
- the process of preparing a relief printing plate from a photopolymer element includes the steps of main image exposure, development or washout, post-development treatment which includes drying, and post-exposure.
- Detackification is an optional post-development treatment which can be applied if the surface is still tacky.
- a backflash exposure may be used with elements having a transparent support.
- Backflash generally uses a radiation source emitting a principal wavelength around 360 nm. It serves to sensitize the plate and establishes the depth of the plate relief. The backflash procedure gives the photopolymer layer a uniform and relatively short exposure through the support, thereby photocrosslinking binder and monomer in the support region.
- Printing reliefs can be made from a photosensitive composition of this invention by exposing to actinic radiation selected portions of a photosensitive layer through an imagebearing transparency. During the addition-polymerization or cross-linking, the ethylenically unsaturated compound composition is converted to the insoluble state in the radiation-exposed portions of the layer, with no significant polymerization or cross-linking taking place in the unexposed portions or areas of the layer. The unexposed portions of the layer are removed by means of an aqueous or semi-aqueous solvent.
- the process transparency may be constructed of any suitable material including cellulose acetate film and oriented polyester film.
- Actinic radiation from any source and of any type can be used in the photopolymerization process.
- the radiation may emanate from point sources or be in the form of parallel rays or divergent beams.
- the radiation passing through the clear areas of the transparency enters as divergent beams and thus irradiates a continually diverging area in the photopolymerizable layer underneath the clear portions of the transparency.
- This results in a polymeric relief having its greatest width at the bottom of the photopolymerizable layer, i.e., a frustum, the top surface of the relief being the dimensions of the clear area.
- the radiation preferably having a wavelength range between about 2500 ⁇ and 5000 ⁇ Suitable sources of such radiation, in addition to sunlight, include carbon arcs, mercury-vapor arcs, fluorescent lamps with ultraviolet radiation-emitting phosphors, argon glow lamps, lasers, electron flash units and photographic flood lamps. Electron accelerators and electron beam sources through an appropriate mask may also be used. Of these, the mercury-vapor lamps, particularly the sun lamps, are most suitable.
- the radiation exposure time may vary from fractions of a second to minutes, depending upon the intensity and spectral energy distribution of the radiation, its distance from the composition and the nature and amount of the composition available.
- a mercury vapor arc or a sunlamp is used at a distance of about 1.5 to about 60 inches (3.8-153 cm) from the photosensitive composition.
- Exposure temperatures are preferably operated at about ambient temperatures or slightly higher, i.e., about 20° to about 35° C.
- Solvent development may be carried out at about 25° C., but best results are sometimes obtained when the solvent is warm, e.g., 30° to 60° C. Development time can be varied, but it is preferably in the range of about 5 to 25 minutes. Developer may be applied in any convenient manner, including immersion, spraying and brush or rolleer application. Brushing aids in removing the unploymerized or non-crosslinked portions of the composition. Washout is frequently carried out in an automatic processing unit which uses developer and mechanical brushing action to remove the unexposed portions of the plate, leaving a relief constituting the exposed image and floor.
- Preferred aqueous developers usually also contain a water miscible organic solvent and an alkaline material.
- Suitable water miscible organic solvents include isopropanol, butanol, diacetone alcohol, 1-methoxyethanol, 2-ethoxyethanol and 2-n-butoxyethanol.
- Suitable alkaline materials include alkali metal hydroxides.
- a preferred aqueous developer is 0.5% sodium hydroxide solution.
- Other aqueous developer combinations which may be employed are described in U.S. Pat. No. 3,796,602.
- the relief printing plates are generally blotted or wiped dry, and then dried in a forced air or infrared oven. Drying times and temperatures vary, but drying for 60 to 120 minutes at 60° C. (140° F.) is typical. High temperatures are not recommended as shrinkage of the support may cause registration problems. Additional air drying overnight (16 hours or more) is common. Solvent will continue to evaporate from the printing relief during drying at ambient conditions.
- photopolymer flexographic printing plates Even after drying, however, photopolymer flexographic printing plates generally retain at least some degree of surface tackiness, particularly on the "shoulders" of the relief and other non-image areas.
- the surface tackiness is undesirable in a printing relief.
- Satisfactory detackification of a photopolymer plate which has been developed in an aqueous or semiaqueous solution can be obtained by applying an aprotic organic solvent to the surface of the plate after drying and prior to exposing the printing surface to radiation with wavelengths in the range of 200 nm to 300 nm.
- Post-exposure utilizes the same ultraviolet radiation source as the main exposure (usually wavelengths of 300 to 420 nm). Post-exposure is used to complete polymerization and maximize plate hardness and durability, but does not remove tackiness. Post-exposure can occur subsequently, simultaneously, and/or prior to light finishing.
- each exposure step is to affect polymerization, and actinic radiation from a variety of sources can be used, including commercial ultravioletfluorescent tubes, medium, high and low pressure mercury vapor lamps, argon glow lamps, electronic flash units, photographic flood lamps, pulsed xenon lamps, carbon arc lamps, etc.
- the radiation source must emit an effective amount of radiation having a wavelength in the range of 230 nm to 450 nm, preferably 300 to 420 nm, and more preferably, 340 to 400 nm.
- the wavelength is matched to the absorption characteristics of the photoinitiator present in the photopolymerizable layers.
- a standard radiation source is the Sylvania 350 Blacklight fluorescent lamp (FR 48T12/350 VL/VHO/180, 115w) which emits actinic radiation having a central wavelength around 354 nm.Exposure times vary from a few seconds to a few minutes, depending on the output of the lamps, distance from the lamps, relief depth desired, and the thickness of the plate.
- Printing reliefs made in accordance with this invention can be used in all classes of printing, especially, the flexographic printing class.
- the emulsion polymerization apparatus consisted of a 5 liter, 4 necked flask equipped with a mechanical stirrer, 2 liter addition funnel, thermometer, nitrogen inlet, water cooled condenser and a heating mantle.
- the flask was charged with 1938 grams of deionized water and 30 grams of a 30% aqueous solution of sodium lauryl sulfonate.
- This surfactant system was heated to 80° C. under a nitrogen atmosphere. At that temperature, 12.5% of a mixture of 1094 grams of 2-ethylhexyl acrylate, 11.2 grams of allyl methacrylate and 11.2 grams of 1,4-butanediol diacrylate was added in one shot. This was followed immediately by the addition of 15 ml of a 7% aqueous solution of sodium phosphate and 15 ml of a 5% aqueous solution of ammonium persulfate. The reaction mixture turned milky and exothermed to 85° C.
- the remainder of the monomer mixture was added over a period of 90 minutes while maintaining the temperature between 83° to 88° C.
- the reaction mixture was heated for an additional 2 hours at 80° to 85° C.
- the milky emulsion was filtered to produce a solid content of 35.7% and a particle size 0.09 micron.
- the flask was charged with 2000 grams of core emulsion above and 2.7 grams of tert-butyl perpivalate. Over a 32 minute period, a mixture of 1964 grams of deionized water and 2.9 grams of a 30% aqueous solution of sodium laurysulfonate was added. The charge was heated to 60° C. under a nitrogen blanket. At this point, a mixture of 287.6 grams of n-butyl acrylate and 71.9 grams of methacrylic acid was added over a 60 minute period, with the temperature maintained at 80° C. When the addition was completed, the reaction mixture was kept at 80° C. for 90 minutes. The resulting emulsion had a solid content of 25%, a particle size of 0.1 micron, and its acid number was 46.5.
- This emulsion was placed in a freezer for 2 days.
- the coagulated microgel was filtered and washed several times with water. Air drying for 3 days produced a rubbery material.
- microgel To test the solubility, 5 grams of the microgel were tumbled in 100 ml aqueous solution of 1% sodium carbonate monohydrate. The microgel was dispersed within a day at ambient.
- the flask was charged with 1909 grams of deionized water and 30 grams of a 30% aqueous solution of sodium lauryl sulfonate. The contents of the flask were heated to 80° C. under a nitrogen atmosphere. At that temperature, 12.5% of a mixture of 853 grams of 2-ethylhexylacrylate, 154 grams of methacrylic acid and 20.5 grams of 1,4-butanediol diacrylate was added in one shot. This was followed immediately by the addition of 15 ml of a 7% aqueous solution of sodium phosphate and 15 ml of a 5% aqueous solution of ammonium persulfate. The reaction mixture turned milky and exothermed to 85° C.
- the remainder of the monomer mixture was added over a period of 90 minutes while maintaining the temperature between 83°-88° C.
- the reaction mixture was heated for an additional 2 hours at 80°-85° C.
- the milky emulsion which had 35.1% solids, particle size 0.077 micron, acid number 103, was placed in a freezer for 2 days.
- the coagulated microgel was filtered and washed several times with water. Air drying for 3 days produced a rubbery material.
- the flask was charged with 2388 gm of deionized water and 37.5 gm of a 30% aqueous solution of sodium lauryl sulfonate.
- the contents of the flask were heated to 80° C. under a nitrogen atmosphere. At that temperature, 12.5% of a mixture of 1367.5 gm of 2-ethyl hexyl acrylate, 14 gm of allyl methacrylate and 14 gm of 1,4-butanediol diacrylate was added in one shot. This was followed immediately by the addition of 19 ml of a 7% aqueous solution of sodium phosphate and 20 ml of a 5% aqueous solution of ammonium persulfate.
- the reaction mixture turned milky and exothermed to 86° C.
- the remainder of the monomer mixture was added over a period of 90 minutes while maintaining the temperature between 84°-87° C.
- the reaction mixture was heated for another 2 hours at 80°-85° C.
- the milky emulsion was filtered. Solid content 35.8%; particle size 0.097 micron.
- the flask was charged with 1000 gm of core emulsion above and 0.3 gm of tertiary butyl perpivalate. Over a 30 minute period, a mixture of 511.4 gm of deionized water and 0.2 gm of a 30% aqueous solution of sodium lauryl sulfonate was added. The charge was heated to 60° C. under a nitrogen atmosphere. At this point, 23.6 gm of methacrylic acid was added over a 60 minute period, with the temperature maintained at 80° C. When the addition was completed, the reaction mixture was kept at 80° C. for 90 minutes. Solid content 24.6%; particle size 0.1 micron; acid number 41.7.
- the solid polymer was isolated as described in the previous example.
- the flask was charged with 955.4 gm of deionized water and 15 gm of a 30% aqueous solution of sodium lauryl sulfonate.
- the reaction mixture was heated to 80° C. under a nitrogen atmosphere. At that temperature, 12.5% of a mixture of 496.8 gm of 2-ethyl hexyl acrylate, 5.6 gm of allyl methacrylate and 55.8 gm of 1,4-butanediol diacrylate was added in one shot. This was followed immediately by the addition of 7.5 ml of a 7% aqueous solution of sodium phosphate and 8 ml of a 5% aqueous solution of ammonium persulfate.
- the reaction mixture turned milky and exothermed to 85° C.
- the remainder of the monomer mixture was added over 90 minutes while maintaining the temperature between 83°-86° C.
- the reaction mixture was heated an additional 2 hours at 80°-85° C.
- the milky emulsion was filtered. Solid content 35.8%; particle size 0.08 micron.
- the flask was charged with 1100 gm of core emulsion above, and to it was added with stirring over 25 minutes, a mixture of 1069 gm of deionized water, 1.58 gm of a 30% aqueous solution of sodium layryl sulfonate.
- the charge was heated to 60° C. under a nitrogen atmosphere.
- a mixture of 157.8 gm of butyl acrylate and 39.3 gm of methacrylic acid was added over a 60 minute period, with the temperature maintained at 80° C.
- the reaction mixture was kept at 80° C. for 90 minutes.
- Solid content 24.2%; particle size 0.085 micron; acid number 46.8.
- the solid polymer was isolated as described in previous examples.
- the flask was charged with 2627 grams of deionized water and 41.25 gm of a 30% aqueous solution of a sodium lauryl sulfonate.
- the contents of the reaction flask were heated to 80° C. under a nitrogen atmosphere. At that temperature, 12.5% of a mixture of 1504 gm of 2-ethylhexyl acrylate, 15.4 gm of allyl methacrylate, and 15.4 gm of 1,4-butanediol diacrylate was added in one shot. This was followed immediately by the addition of 21 ml of a 7% aqueous solution of sodium phosphate and 22 ml of a 5% aqueous solution of ammonium persulfate.
- the reaction mixture turned milky and exothermed to 83° C.
- the remainder of the monomer mixture was added over a period of 90 minutes while maintaining the temperature between 83° C. and 85° C.
- the reaction mixture was heated for an additional 2 hours at 82°-85° C.
- the milky emulsion was filtered. Solid content 35.6%; particle size 0.073 micron.
- the flask was charged with 2000 grams of core emulsion above and 2.9 grams of tertiary butyl perpivalate. Over a 30 minute period, a mixture of 1964 grams of deionized water and 2.9 gm of a 30% aqueous solution of sodium lauryl sulfonate was added. The reaction mixture was heated to 60° C. under a nitrogen atmosphere. At this point, a mixture of 287.6 gm of butyl acrylate, 76 gm of methacrylic acid, and 3.6 gm of 1,4-butanediol diacrylate was added over a 60 minute period while maintaining the temperature at 80° C. When the addition was completed, the reaction mixture was kept at 80° C. for 90 minutes. Solid content 23.7%; particle size 0.078 micron; acid number 45.5.
- the solid microgel was isolated as previously described.
- the flask was charged with 2627 gm of deionized water and 41.25 gm of a 30% aqueous solution of sodium lauryl sulfonate.
- the reaction mixture was heated to 80° C. under a nitrogen atmosphere. At that temperature, 12.5% of a mixture of 1504 gm of methyl methacrylate, 15.4 gm of allyl methacrylate, and 15.4 gm of 1,4-butanediol diacrylate was added in one shot. This was followed immediately by the addition of 21 ml of a 7% aqueous solution of sodium phosphate and 2 ml of a 5% aqueous solution of ammonium persulfate.
- the reaction mixture turned milky and exothermed to 84° C.
- the remainder of the monomer mixture was added over a period of 90 minutes while maintaining the temperature between 82° C. and 86° C.
- the reaction mixture was heated for an additional 2 hours at 80°-85° C.
- the milky emulsion was filtered. Solid content 36.6%; particle size 0.073 micron.
- the flask was charged with 2000 grams of core emulsion above and 2.9 gm of tertiary butyl perpivalate. Over a 30 minute period, a mixture of 1964 gm of deionized water and 2.9 gm of a 30% aqueous solution of sodium lauryl sulfonate was added. The reaction mixture was heated to 60° C. under a nitrogen atmosphere. At this point, a mixture of 287.6 gm of butyl acrylate and 71.9 gm of methacrylic acid was added over a 60 minute period, with the temperature maintained at 80° C. When the addition was completed, the reaction mixture was kept at 80° C. for 90 minutes. Solid content 24.4%; particle size 0.078 micron; acid number 51.1.
- the solid microgel was isolated as previously described.
- the core used in this example is the same as the one used in Comparative Example 1F.
- the flask was charged with 2000 gm of core emulsion above and 2.9 gm of tertiary butyl perpivalate. Over a 30 minute period, a mixture of 1964 gm of deionized water and 2.9 gm of a 30% aqueous solution of sodium lauryl sulfonate was added. The charge was heated to 60° C. under a nitrogen blanket. At this point, a mixture of 188.3 gm of methyl methacrylate, 104.2 gm of ethyl acrylate, and 71.9 gm of methacrylic acid was added over a 60 minute period while maintaining the temperature at 80° C. When the addition was completed, the reaction mixture was kept at 80° C. for 90 minutes. Solid content 24.2%; particle size 0.078 micron; acid number 48.1.
- the solid microgel was isolated as previously described.
- a resin plate (4" ⁇ 4") was prepared by pressing 30 grams of microgel synthesized in Example 1 between 2 sheets of 5 mil Mylar® polyester film, using a Carver Laboratory Press, Model 2000-129 from Fred S. Carver, Inc., Summit, N.J., U.S.A.
- the press cycle was the equilibration at 150° C., followed by 2 minutes at 5000 psi and 1 minute at 10000 psi.
- the microgel filled the mold.
- the plate was uniform, transparent, 123 mil thick with durometer (Shore A) 58 and 10% resilience. Resilience was tested according to ASTM D-2632 with a Shore Resiliometer Model SR-1 from the Shore Instrument & Mfg. Co., Inc., Freeport, N.Y., U.S.A.
- the mixture was charged to a rubber mill (6" ⁇ 12") at 100° C. to flash the solvent mixture, followed by milling for 15 minutes at 100° C.
- the photopolymer was rubbery.
- a plate (4" ⁇ 4") was pressed at 100° C. from 30 grams of photopolymer using the press and cycle above.
- the support base was 8.5 mil Cronar® polyester film, coated with an adhesive layer containing a yellow antihalation dye.
- the adhesive layer contained 33.26 parts polyvinylidene chloride, 0.317 part polymethylmethacrylate beads, 1.51 parts oxanol yellow dye and 0.053 part surfactant (Zonyl FSN, E. I. du Pont de Nemours & Co., Wilmington, Delaware).
- Oxanol yellow dye was 4-((3-methyl-5-oxo-1-(4-sulfophenyl)-2-pyrazolin-4-ylidene)-methyl)-3-methyl-1-(4-sulfophenyl)-2-pyrazolin-5-one.
- the coversheet was 5 mil Mylar® polyester film coated with polyvinyl alcohol at 40 mg/dm 2 .
- the coversheet was peeled with the release layer remaining adhered to the photopolymer surface.
- the plate was 120 mil thick with durometer 6 and 21% resilience.
- the plate was exposed for 1517 millijoules to a Riston® PC-130 exposure unit (E. I. du Pont de Nemours & Co., Inc., Wilmington, DE, U.S.A.) through a phototool. The exposure produced a photofugitive image. The imaged plate tested at durometer 86 and 22% resilience.
- a Riston® PC-130 exposure unit E. I. du Pont de Nemours & Co., Inc., Wilmington, DE, U.S.A.
- the exposure produced a photofugitive image.
- the imaged plate tested at durometer 86 and 22% resilience.
- the imaged plate was developed with 0.5% aqueous sodium hydroxide solution for 5 minutes at 140° F. in a Cyrel® Aqueous Processor (E. I. du Pont de Nemours & Co., Inc., Wilmington, DE, U.S.A.), then dried for 1 hour at 140° F.
- the relief was 77 mil, calculated at a development rate of 15.4 mil/minute.
- the plate tested at durometer 89 and 22% resilience.
- Example 2 The procedure described in Example 2 was used to prepare resin plates and photosensitive elements containing microgels from Comparative Examples 1A-1E.
- Table 3A presents data showing the relative solubilities of microgel C described in Example 1 and comparative microgels 1A-1E in a 1% Na 2 CO 3 H 2 O solution.
- Table 3B presents a resin evaluation of the plates containing microgel C described in Example 1 versus photosensitive elements containing comparative microgels 1A-1E.
- Table 4 presents an evaluation of photosensitive elements containing microgel C and comparative microgels 1A-1E.
- the development rates for each element were obtained by comparing them individually against the element containing the preferred microgel. In all cases, the element containing the preferred microgel C (described in Example 1), had the best development rate.
- Photopolymer containing comparative microgel 1B did not melt to produce a resin plate.
- Photopolymer containing comparative microgel 1C which had a core shell microgel with a 10% crosslinked core, had a lower development rate of 12.6 mil/min versus a 14 mil/min development rate for microgel C.
- the photosensitive element containing comparative core shell microgel (1D) had a development rate of 15.2 mil/min.
- the photosensitive element containing microgel C had a development rate of 15.8 mil/min.
- Photopolymer containing comparative microgel 1E which contained microgel B, Table 1 of U.S. Pat. No. 4,726,877, flowed very poorly. The resin plate was cracked and very brittle.
- the flask was charged with 2128 grams of deionized water and 33 gm of a 30% aqueous solution of sodium lauryl sulfonate.
- the reaction mixture was heated under nitrogen to 80° C. At that temperature, 12.5% of a mixture of 1203 gm of 2-ethyl hexyl acrylate, 6 gm of allyl methacrylate, and 6 gm of 1,4-butanediol diacrylate was added in one shot. This was followed immediately by the addition of 16.3 ml of a 7% aqueous solution of sodium phosphate and 16.3 ml of a 5% aqueous solution of ammonium persulfate. The reaction mixture turned milky and exothermed to 85° C.
- the flask was charged with 2250 gm of core emulsion above and 3.2 gm of tertiary butyl perpivalate. Over a 30 minute period 1950.5 gm of deionized water was added. The charge was heated to 60° C. under a nitrogen blanket. At this point, a mixture of 203.4 gm of methyl methacrylate, 115.7 gm of ethyl acrylate, and 79.8 gm of methacrylic acid was added over a 60 minute period, with the temperature maintained at 80° C. When the addition was completed, the reaction mixture was kept at 80° C. for 90 minutes. Solid content 25.7%; particle size 0.111 micron; acid number 45.
- the solid microgel was isolated as previously described.
- Example 2 The procedure described in Example 2 was used to prepare resin plates and photosensitive elements containing comparative microgels from comparative examples 1F and 1G.
- Table 5A presents data showing relative solubilities in a 1% Na 2 CO 3 H 2 O solution of microgel C described in Example 1, comparative microgels 1F and 1G, and microgel A described in Example 3.
- Table 5B presents a resin evaluation of plates containing microgel C, microgel A, and comparative microgels 1F and 1G.
- Table 6A presents an evaluation of photosensitive elements containing Microgel A versus photosensitive element containing Microgel C.
- Table 6B presents a comparison of plates made from photopolymer containing microgel C versus plates made from comparative photopolymers containing comparative microgels 1F and 1G.
- the photopolymer composition discussed in Example 2 above was prepared via melt extrusion without solvent.
- the extruded polymer was calendered between a cover and support sheet to a total thickness of 42 mils.
- the cover sheet was 5 mil Mylar® coated with polyvinyl alcohol (40 mg/dm 2 ) and the support sheet was 8.5 mil Cronar® coated with an adhesive layer and yellow antihalation dye as discussed in Example 2.
- the photopolymer plate was exposed to actinic radiation using the Cyrel® 3040 Exposure Unit (E. I. du Pont de Nemours & Co., Wilmington, Delaware), and washed out in 0.5% NaOH.
- the relief image held a 2% highlight and 5 mil isolated dot.
- a photosensitive element containing 30% HMDA and 66% core shell microgel C was prepared as described in Example 2.
- the element was scanned in a Du Pont 910 Differential Scanning Calorimeter from -120° C. to 250° C. at a constant rate of 20° C./minute (FIG. 4A).
- the Du Pont 9900 Computer/Analyzer identified a glass transition at -83.41° C. (FIG. 4B).
- the monomer was thermally polymerized, as shown by the strong exotherm between +150° C. and +200° C. (FIG. 4A).
- the sample was then cooled to -120° C. and reheated to +250° C. at a constant rate of 20° C./minute. All monomer was polymerized during the first scan, as evidenced by the absence of any exotherm between +150° C. and +200° C. during the second scan (FIG. 4C).
- a glass transition temperature was recorded at -68.98° C. (FIG. 4D).
- the glass transition temperature of core microgel C earlier was recorded (DSC mode) at -69.93° C. (Table 2; FIG. 3A) and -68.32° C. after the second scan (Table 2; FIG. 3B). With the glass transition temperature of the core depressed to -83.41° C. (FIG. 4B) and recovered at -69.97° C. (FIG. 4D) after deplasticization of the core by the thermal polymerization of the monomer during the first scan, it was concluded that HMDA monomer partitioned in the core.
- a photosensitive element containing 20% trimethylolpropane ethoxy triacrylate (TMPEOTA) and 76% microgel C was prepared as described in Example 2.
- the photosensitive element was clear and did not exude monomer.
- the DSC thermograms did not record any significant change of the glass transition temperature of the microgel core.
- the initial scan (FIG. 5A), after electronic analysis (FIG. 5B), placed the glass transition at -68.43° C.
- the glass transition of the core was recorded at -69.94° C. (FIG. 5D).
- Photosensitive elements containing 25% HMDA or 25% TMPEOTA and microgel C were prepared and evaluated as described in Example 2.
- the development rate of the TMPEOTA-containing photosensitive element (15.8 mil/min) was significantly higher than that of the equivalent HMDA-containing photosensitive element (12.4 mil/min).
- melt viscosity In order for a photopolymer to be extruded well, it must have a sufficiently low melt viscosity at the shear rates involved. If the melt viscosity is very high, the pressure required to extrude the material will also be very high. This can lead to the build-up of excessive heat in the system which may result in thermal polymerization of the monomer. By examining melt rheology curves relating melt viscosity to shear rate for the different microgels, it is possible to determine the relative ease of extrusion of photopolymers containing these microgels.
- microgels were shear thinning, i.e., non-Newtonian.
- FIG. 6 is a graph of log of Apparent Viscosity (in poise) versus log "Shear Rate” (in 1/sec). It was found that the additional crosslinking in comparative microgel 1D increased the melt viscosity at high shear rates. Comparative microgels 1A and 1E had higher melt viscosities. In particular, the comparative microgel 1E in the series tested had an even higher viscosity at higher shear rates. Thus, Microgel C described in Example 1, would be easiest to extrude because it had a lower melt viscosity, as shown by the results in FIG. 6.
- microgels All four microgels were shear thinning, i.e., non-Newtonian. These microgels had the following architectures:
- FIG. 7 is a graph of log apparent viscosity (in poise) versus log shear rate (in 1/sec). It was found that microgel C had the lowest shear rate. At high shear rates, microgel C and comparative microgel 1F had lower viscosities than microgel A and comparative microgel 1F which had thermoplastic non-crosslinked shells. Of all the microgels evaluated, Microgel C had the lowest shear rate.
- Comparative Polymer 8A corresponded to core C only and the other copolymer corresponded to Shell C only.
- Crosslinked core C contained 98% 2-ethylhexyl acrylate, 1% 1,4-butanediol diacrylate and 1% allyl methacrylate.
- Comparative polymer 8B contained 80% n-butyl acrylate and 20% methacrylic acid. Comparative copolymer 8C contained 93.3% n-butyl acrylate and 6.7% methacrylic acid. This comparative polymer had the same amount of acid substitution as was present in the core shell microgel synthesized in Example 1.
- the flask was charged with 2627 gm of deionized water and 41.25 gm of a 30% aqueous solution of sodium lauryl sulfonate.
- the contents of the reaction flask were heated to 80° C. under a nitrogen atmosphere. At that temperature 12.5% of a monomer mixture consisting of 1504 gm of 2-ethyl hexyl acrylate, 15.4 gm of allyl methacrylate and 15.4 gm of 1,4-butanediol diacrylate was added in one shot. This was followed immediately by the addition of 21 ml of a 7% aqueous solution of sodium phosphate and 22 ml of a 5% aqueous solution of ammonium persulfate.
- the reaction mixture turned milky and exothermed to 84° C.
- the remainder of the monomer mixture was added over a period of 90 minutes while maintaining the temperature between 82° C. and 85° C.
- the reaction mixture was heated for an additional 2.5 hours at 80°-85° C.
- the bluish milky emulsion had a solids content of 35.8% and a particle size of 0.088 microns.
- the solid microgel was isolated by freeze drying.
- the flask was charged with 2388 gm of deionized water, 37.5 gm of a 30% aqueous solution of sodium lauryl sulfonate, and 2.9 gm of ammonium persulfate.
- the reaction mixture was heated to 80° C. under a nitrogen atmosphere. At that temperature, a mixture of 1116 gm of butyl acrylate and 279 gm of methacrylic acid was added over a 90 minute period.
- the reaction mixture turned milky within 10 minutes, exothermed to 85° C. and remained at that temperature without any external heating for the duration of the monomer addition.
- the eaction mixture was heated at 83°-86° C. for an additional 2.5 hours.
- the bluish milky emulsion had a solids content of 36.1%, a particle size of 0.051 microns, and an acid number of 138.
- the solid polymer was isolated by freeze drying.
- the flask was charged with 2388 gm of deionized water, 37.5 gm of a 30% aqueous solution of sodium lauryl sulfonate, and 2.9 gm of ammonium persulfate.
- the reaction mixture was heated to 80° C. under a nitrogen atmosphere. At that temperature, a mixture of 1302 gm of butyl acrylate and 93.5 gm of methacrylic acid was added over a 90 minute period.
- the reaction mixture turned milky within 15 minutes and exothermed to 85° C. It remained at that temperature throughout the addition with only minimal external heating.
- the reaction mixture was heated at 82°-84° C. for an additional 2.5 hours.
- the bluish milky emulsion had a solids content of 36.3%, a particle size of 0.054 microns, and an acid number of 48.7.
- the solid polymer was isolated by freeze drying.
- Photopolymers containing comparative polymers 8A, 8B and 8C were synthesized following the procedure detailed in Example 2. The photopolymer evaluation is presented in Table 10.
- a fourth photopolymer was made by blending comparative polymer 8A with comparative polymer 8B so that they were present in a ratio of 2:1. This 2:1 ratio corresponded to the core to shell ratio of microgel C which was synthesized in Example 1.
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
- Graft Or Block Polymers (AREA)
Abstract
Description
TABLE 1
__________________________________________________________________________
MICROGEL COMPOSITION
Core*/Shell Core/Shell
Microgel
2-EHA
BD BDDA
MMA nBA
MAA EA AA Weight Ratio
__________________________________________________________________________
A Core 98.5
-- 0.5 -- -- -- -- -- A Core/A Shell
A Shell.sup.1
-- -- -- 51 -- 20 29 -- 2:1
B Core 98.5
-- 0.5 -- -- -- -- -- B Core/B Shell
B Shell
-- -- -- -- 80 20 -- -- 2:1
C Core 98 -- 1.0 -- -- -- -- -- C Core/C Shell
C Shell
-- -- -- -- 80 20 -- -- 2:1
D Core -- 100
-- -- -- -- -- -- D Core/D Shell
D Shell
-- -- -- -- 80 20 -- -- 2:1
E Core -- 100
-- -- -- -- -- -- E Core/E Shell
E Shell
-- -- -- -- 80 20 -- -- 1:1
F Core 98 -- 1.0 -- -- -- -- -- F Core/F Shell
F Shell
-- -- -- -- 80 -- -- 20 2:1
G Core 97 -- 2.0 -- -- -- -- -- G Core/G Shell
G Shell
-- -- -- -- 80 20 -- -- 2:1
H Core 98 -- 1.0 -- -- -- -- -- H Core/H Shell
H Shell
-- -- -- -- 80 -- -- 20 1:1
I Core 98 -- 1.0 -- -- -- -- -- I Core/I Shell
I Shell
-- -- -- -- 80 20 -- -- 1:1
J Core 98 -- 1.0 -- -- -- -- -- J Core/J Shell
J Shell
-- -- -- -- 70 30 -- -- 2:1
K Core 98 -- 1.0 -- -- -- -- -- K Core/K Shell
K Shell
80 -- -- -- -- 20 -- -- 2:1
L Core -- -- 1.0 -- 98 -- -- -- L Core/L Shell
L Shell
-- -- -- -- 80 20 -- -- 2:1
M Core 98 -- 1.0 -- -- -- -- -- M Core/M Shell
M Shell
-- -- -- -- 80 20 -- -- 1:2
N Core 98 -- 1.0 -- -- -- -- -- N Core/N Shell
N Shell
-- -- -- -- 80 20 -- -- 1:4
O Core 98 -- 1.0 -- -- -- -- -- O Core/O Shell
O Shell
-- -- -- -- 87 13 -- -- 1:1
__________________________________________________________________________
BDDA = butanediol diacrylate
2EHA = 2ethylhexyl acrylate
MMA = methyl methacrylate
EA = ethyl acrylate
nBA = nbutyl acrylate
AA = acrylic acid
MAA = methacrylic acid
* = All cores also contained 1% allyl methacrylate (AMA), except D and E.
.sup.1 = This is a thermoplastic shell. Shells B-O are elastomeric.
BD = butadiene
TABLE 2
______________________________________
Glass Transition Temperature
(Tg °C.)
Technique Core C Shell C Figure
______________________________________
TMA -71.90 +2.06 1
DMA -73.37 +19.28 2
(loss modulus)
DSC -69.93 -6.84 3A
DSC, 2nd heat
-68.32 -6.96 3B
______________________________________
______________________________________
Composition
______________________________________
Elastomeric Core C
2-ethylhexyl acrylate (98%)
1,4-butanediol diacrylate (1%)
allyl methacrylate (1%)
Elastomeric Shell C
n-butyl acrylate (80)
methacrylic acid (20)
Core/Shell 2:1
______________________________________
______________________________________ Composition ______________________________________ 2-ethylhexyl acrylate 83% Methacrylic acid 15% 1,4-butanediol diacrylate 2% ______________________________________ The apparatus used was the same as that described in Example 1.
______________________________________ Composition ______________________________________ Core 2-ethylhexylacrylate 98% allyl methacrylate 1% 1,4-butanediol diacrylate 1%Shell Methacrylic acid 100% Core/Shell - 14/1 ______________________________________
______________________________________
Composition
______________________________________
Core
2-ethyl hexyl acrylate
89
allyl methacrylate 1
1,4-butanediol diacrylate
10
Shell
n-butyl acrylate 80
methacrylic acid 20
Core/Shell - 2/1
______________________________________
______________________________________
trimethylolpropane ethoxy triacrylate
25 grams
2,2-dimethoxy-2-phenylacetophenone
4 grams
microgel C (Table 1) 71 grams
______________________________________
TABLE 3A
______________________________________
Solubility
Solubility
(1% Na.sub.2 CO.sub.3 H.sub.2 O)
______________________________________
Microgel C Dispersion
Comparative Microgel 1A
Very slight swelling.sup.1
Comparative Microgel 1B
Suspension.sup.1
Comparative Microgel 1C
Opalescent gel
Comparative Microgel 1D
Dispersion
Comparative Microgel 1E
Dispersion
______________________________________
.sup.1 Clear supernatant; unchanged after acidification w/10% H.sub.2
SO.sub.4
TABLE 3B
__________________________________________________________________________
Resin Evaluation of Plates Containing Microgel C and
Comparative Microgels 1A-1E
Flow Thickness
Durometer
Resilience
Plate Containing
(150° C.)
Appearance
(mil) (A) (%)
__________________________________________________________________________
Microgel C
Good Transparent
123 58 10
Comp. Microgel 1A
Fair Grainy 122 65 16
Comp. Microgel 1B
No Fusion
Chunks -- -- --
Comp. Microgel 1C
Poor Warped/Grainy
150 76 21
Comp. Microgel 1D
Good Transparent
123 64 13
Comp. Microgel 1E
No Fusion
Compressed
-- -- --
Powder
__________________________________________________________________________
TABLE 4
______________________________________
Photosensitive Element Containing
Comparative Microgel
Microgel C
1A 1B 1C 1D 1E
______________________________________
Raw Plate
Appearance Uniform Unif. 2 Unif.
Unif.
3
Thickness (mil)
120 122 117 116
Durometer (A)
6 27 43 20
Resilience (%)
21 7 13 15
Imaging
Millijoules 1517 1566 1620 1504
Durometer (A)
86 84 90 87
Resilience (%)
22 20 31 22
Development
Durometer (A)
89 85 86 89
Resilience (%)
22 20 32 21
Relief (Mil) 77 33 63 76
Dev.Rate.sup.1 (Mil/Min)
15.4 6.6 -- --
15.8 -- -- 15.2
14.0 -- 12.6
______________________________________
.sup.1 The development rate for each element containing comparative
microgels 1A-1E was compared to the development rate obtained for the
element containing microgel C in three separate experiments. The results
of all three experiments are presented. Elements containing comparative
microgels 1B and 1E could not be made.
.sup.2 Charge dropped from mill after solvent was flashed.
.sup.3 Poor flow; hard, very brittle plate.
TABLE 5A
______________________________________
Solubility
Solubility
(1% Na.sub.2 CO.sub.3 H.sub.2 O)
______________________________________
Microgel C Dispersion
Microgel A Dispersion
Comparative Microgel 1F
Dispersion
Comparative Microgel 1G
Dispersion
______________________________________
TABLE 5B
______________________________________
Resin Evaluation
Plates Containing
Comparative
Microgels
Microgel C
Microgel A 1F 1G
______________________________________
Resin Plate
Flow (150° C.)
Good Good Very Poor
Poor
Appearance
Transparent
Transparent
1 2
Thickness (mil)
118 116 -- --
Durometer (A)
50 95 -- --
Resilience (%)
9 32 -- 3
______________________________________
.sup.1 Compacted powder.
.sup.2 Polymer fused in center of mold only; warped plate.
.sup.3 Plate shattered under impact of probe.
TABLE 6A
______________________________________
Comparison of Photosensitive Element Containing
Microgel C versus Microgel A
Photosensitive Element
Containing Microgel
C A
______________________________________
Raw Plate
Appearance Uniform Uniform
Thickness (mil) 120 119
Durometer (A) 6 25
Resilience (%) 21 5
Imaging
Millijoules 1517 1566
Durometer (A) 86 95
Resilience (%) 22 38
Development
Durometer (A) 89 95
Resilience (%) 22 36
Relief (mil) 77 43
Development Rate (mil/min)
15.4 8.6
______________________________________
TABLE 6B
______________________________________
Comparison of Photosensitive Elements Containing
Microgel C, Microgels 1F and 1G
Photosensitive Element Containing
Comp. Comp.
Microgel C
Microgel 1F
Microgel 1G
______________________________________
Raw Plate
Appearance Uniform Uniform Uniform
Thickness (mil)
117 116 116
Durometer (A)
16 94 95
Resilience (%)
17 23 23
Imaging
Millijoules 1489 1386 1471
Durometer (A)
90 94 95
Resilience (%)
23 41 46
Development
Durometer (A)
89 93 95
Resilience (%)
22 45 51
Relief (mil)
79 16 6
Development Rate
15.8 3.2 1.2
mil/min)
______________________________________
TABLE 7
______________________________________
Monomer HMDA TMPEOTA
______________________________________
Raw Plate
Appearance Uniform Uniform
Thickness (mil) 117 117
Durometer (Shore A)
22 16
Resilience (%) 29 17
Imaging
Millijoules 1465 1489
Durometer (Shore A)
84 90
Resilience (%) 20 23
Development
Durometer (Shore A)
85 89
Resilience (%) 21 22
Relief (mil) 62 79
Dev. Rate (mil/min)
12.4 15.8
______________________________________
TABLE 8
______________________________________
Crosslinking
Non-Cross-
Core in Core (%) linked Shell
______________________________________
Microgel C
Elastomeric 1% Elastomeric
Microgel A
Elastomeric 0.5% Thermoplastic
Comparative
Thermoplastic
1% Elastomeric
Microgel 1F
Comparative
Thermoplastic
1% Thermoplastic
Microgel 1G
______________________________________
TABLE 9
__________________________________________________________________________
Comparative Polymers
Microgel C
8A 8B 8C
__________________________________________________________________________
Objective
Control
Core Only
Shell Only
1
Tg (DSC) °C.
Scan #1 -65.61 -63.24 2 2
Scan #2 -67.04 -62.18 -13.82 -35.81
Solubility
1% Na.sub.2 CO.sub.3 H.sub.2 O
Dispersion
Not Tested
Sl.Hazy Sol.
V.Sl.Swelling.sup.3
Resin Plate
Flow (150° C.)
Good Good.sup.4
Good.sup.4
Good.sup.4
Appearance
Transparent
Transparent
Transparent
Transparent
Thickness (mil)
118 123 112 150
Durometer (A)
50 2 54 0
Resilience (%)
9 3 10 (0).sup.5
__________________________________________________________________________
.sup.1 Copolymer with acid substitution equal to acid substitution of
microgel C.
.sup.2 Tg(s) of copolymer is (are) assigned after second scan.
.sup.3 Clear supernatant; only very slight haze after acidification with
10% H.sub.2 SO.sub.4
.sup.4 Pressed at 100° C.; excessive flow at 150° C.
.sup.5 Polymer too tacky; resiliometer probe stuck.
TABLE 10
______________________________________
Photopolymer Containing
Comparative Polymer
Microgel C
8A 8B 8A + 8B.sup.1
______________________________________
Raw Plate
Appearance
Uniform Uniform Uniform
Uniform
Thickness (mil)
124 128 141 128
Durometer (A)
9 10 2 0
Resilience (%)
21 3 4 4
Imaging
Millijoules
1582 1577 1588 1601
Durometer (A)
87 79 60 60
Resilience (%)
21 16 10 12
Development
Durometer (A)
87 85 64 64.sup.2
Resilience (%)
21 16 8 11.sup.2
Relief (Mil)
83 25.5 0 57.sup.2
Dev.Rate 16.6 5.1 0 11.4.sup.2
(Mil/Min)
______________________________________
.sup.1 Blend of Comparative Polymer 8A and 8B in a 2:1 ratio correspondin
to the 2:1 core/shell ratio of microgel C.
.sup.2 Approximate data due to uneven surface.
Claims (11)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/238,104 US4956252A (en) | 1988-08-30 | 1988-08-30 | Aqueous processible photosensitive compositions containing core shell microgels |
| CA000609089A CA1335543C (en) | 1988-08-30 | 1989-08-23 | Aqueous processible photosensitive compositions containing core shell microgels |
| EP19890115794 EP0356953A3 (en) | 1988-08-30 | 1989-08-26 | Aqueous processible photosensitive compositions containing core shell microgels |
| DK425289A DK425289A (en) | 1988-08-30 | 1989-08-29 | SOLID, PHOTO-SENSIBLE MATERIALS THAT CAN BE TREATED, FOR REFLIEF PRINTING PLATES AND ITS USE |
| AU40858/89A AU630621B2 (en) | 1988-08-30 | 1989-08-29 | Aqueous processible photosensitive compositions containing core shell microgels |
| NO89893462A NO893462L (en) | 1988-08-30 | 1989-08-29 | LIGHT-SENSITIVE MATERIAL FOR RELIEF PRINT PLATES AND USE OF THIS. |
| JP1221873A JPH0646301B2 (en) | 1988-08-30 | 1989-08-30 | Photosensitive composition that can be treated with an aqueous system containing core-shell microgel |
| US07/453,565 US5075192A (en) | 1988-08-30 | 1989-12-20 | Aqueous processible photosensitive compositions containing core shell microgels |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/238,104 US4956252A (en) | 1988-08-30 | 1988-08-30 | Aqueous processible photosensitive compositions containing core shell microgels |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US07/453,565 Continuation-In-Part US5075192A (en) | 1988-08-30 | 1989-12-20 | Aqueous processible photosensitive compositions containing core shell microgels |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US4956252A true US4956252A (en) | 1990-09-11 |
Family
ID=22896518
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US07/238,104 Expired - Fee Related US4956252A (en) | 1988-08-30 | 1988-08-30 | Aqueous processible photosensitive compositions containing core shell microgels |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4956252A (en) |
| EP (1) | EP0356953A3 (en) |
| JP (1) | JPH0646301B2 (en) |
| AU (1) | AU630621B2 (en) |
| CA (1) | CA1335543C (en) |
| DK (1) | DK425289A (en) |
| NO (1) | NO893462L (en) |
Cited By (45)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5075192A (en) * | 1988-08-30 | 1991-12-24 | E. I. Du Pont De Nemours And Company | Aqueous processible photosensitive compositions containing core shell microgels |
| US5171655A (en) * | 1989-08-03 | 1992-12-15 | Fuji Photo Film Co., Ltd. | Photohardenable light-sensitive composition |
| US5238783A (en) * | 1990-04-16 | 1993-08-24 | Toray Industries, Inc. | Photosensitive polymer composition for water developable flexographic printing plate |
| US5372913A (en) * | 1989-05-18 | 1994-12-13 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin composition |
| US5393637A (en) * | 1991-03-01 | 1995-02-28 | Nippon Paint Co., Ltd. | Photosensitive composition for offset printing comprising a binder, a photosensitive substance and a microgel made from an acrylic resin having carboxyl groups as the emulsifier |
| AU658471B2 (en) * | 1992-01-24 | 1995-04-13 | Nippon Paint Co., Ltd. | Photosensitive resin composition for flexographic printing plate |
| US5466319A (en) * | 1989-06-30 | 1995-11-14 | U.S. Philips Corporation | Method for making optically readable media containing embossed information |
| US5609980A (en) * | 1991-05-14 | 1997-03-11 | Dupont (U.K.) Ltd. | Radiation-sensitive materials comprising a layer having core-shell particles and a second layer with a radiation sensitive component |
| EP0766143A1 (en) | 1995-09-29 | 1997-04-02 | E.I. Du Pont De Nemours And Company | Methods and apparatus for forming cylindrical photosensitive elements |
| US5707773A (en) * | 1993-08-27 | 1998-01-13 | E. I. Du Pont De Nemours And Company | Process for preparing an aqueous developable photosensitive element |
| US5753414A (en) * | 1995-10-02 | 1998-05-19 | Macdermid Imaging Technology, Inc. | Photopolymer plate having a peelable substrate |
| US5780202A (en) * | 1994-04-08 | 1998-07-14 | Toyo Boseki Kabushiki Kaisha | Antistatic photosensitive multilayered structure and method for producing the same |
| US5811220A (en) * | 1996-10-10 | 1998-09-22 | Polaroid Corporation | On-press lithographic development methodology facilitated by the use of a disperse hydrophilic microgel |
| US5948599A (en) * | 1992-11-18 | 1999-09-07 | Agfa Gevaert Nv | Method of forming an image in a printing plate |
| US6127094A (en) * | 1997-10-02 | 2000-10-03 | Napp Systems Inc. | Acrylate copolymer-containing water-developable photosensitive resins and printing plates prepared therefrom |
| US6139322A (en) * | 1991-07-12 | 2000-10-31 | Dentsply Research & Development Corp | Denture |
| US6245483B1 (en) * | 1997-06-09 | 2001-06-12 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin composition |
| US20020065613A1 (en) * | 2000-09-21 | 2002-05-30 | Woods Joseph Thomas | System, method and storage medium for predicting impact performance of painted thermoplastic |
| US20020077795A1 (en) * | 2000-09-21 | 2002-06-20 | Woods Joseph Thomas | System, method and storage medium for predicting impact performance of thermoplastic |
| US6413699B1 (en) | 1999-10-11 | 2002-07-02 | Macdermid Graphic Arts, Inc. | UV-absorbing support layers and flexographic printing elements comprising same |
| WO2004048428A1 (en) * | 2002-11-27 | 2004-06-10 | The University Of Melbourne | Microgel composition and process for preparation thereof |
| WO2004048429A1 (en) * | 2002-11-27 | 2004-06-10 | The University Of Melbourne | Free radical polymerisation process for microgel preparation |
| US6881533B2 (en) | 2003-02-18 | 2005-04-19 | Kodak Polychrome Graphics Llc | Flexographic printing plate with ink-repellent non-image areas |
| US20050196701A1 (en) * | 2004-03-05 | 2005-09-08 | Sabine Rapp | Process for preparing a flexographic printing plate |
| US20050227182A1 (en) * | 2004-04-10 | 2005-10-13 | Kodak Polychrome Graphics Llc | Method of producing a relief image for printing |
| EP1679549A2 (en) | 2005-01-07 | 2006-07-12 | E.I.Du pont de nemours and company | Imaging element for use as a recording element and process of using the imaging element |
| EP2009502A2 (en) | 2007-06-20 | 2008-12-31 | E. I. Du Pont de Nemours and Company | Method for making a relief printing form |
| US20090020036A1 (en) * | 2007-07-17 | 2009-01-22 | Sivapackia Ganapathiappan | Compositions and methods for producing latexes containing urethanes |
| EP2026132A2 (en) | 2007-08-16 | 2009-02-18 | E. I. Du Pont de Nemours and Company | Process for making a cylindrically-shaped photosensitive element for use as a printing form |
| US20090069275A1 (en) * | 2006-02-17 | 2009-03-12 | Rocca Jose G | Low flush niacin formulation |
| EP2045660A1 (en) | 2007-09-14 | 2009-04-08 | E. I. Du Pont de Nemours and Company | Photosensitive element having reinforcing particles and method for preparing a printing form from the element |
| EP2083325A2 (en) | 2008-01-23 | 2009-07-29 | E. I. Du Pont de Nemours and Company | Method for printing a pattern on a substrate |
| US20090191483A1 (en) * | 2008-01-30 | 2009-07-30 | E. I. Du Pont De Nemours And Company | Device and method for preparing relief printing form |
| EP2085820A2 (en) | 2008-01-30 | 2009-08-05 | E. I. du Pont de Nemours and Company | Apparatus and method for preparing relief printing form |
| EP2093059A2 (en) | 2008-02-21 | 2009-08-26 | E. I. du Pont de Nemours and Company | Extended print sleeve and method for preparing a printing form from the sleeve |
| EP2154572A2 (en) | 2008-08-15 | 2010-02-17 | E. I. du Pont de Nemours and Company | Process for making a cylindrically-shaped photosensitive element for use as a printing form |
| US20100077932A1 (en) * | 2006-11-15 | 2010-04-01 | 3M Innovative Properties Company | Solvent removal assisted material transfer for flexographic printing |
| WO2013081951A1 (en) | 2011-12-02 | 2013-06-06 | E. I. Du Pont De Nemours And Company | Method for making flexographic printing forms by welding edges of photosensitive elements with microwave energy |
| WO2013148299A2 (en) | 2012-03-27 | 2013-10-03 | E. I. Du Pont De Nemours And Company | Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor |
| US8899148B2 (en) | 2009-07-02 | 2014-12-02 | E I Du Pont De Nemours And Company | Method for printing a material onto a substrate |
| US9069252B2 (en) | 2011-08-26 | 2015-06-30 | E I Du Pont De Nemours And Company | Method for preparing a relief printing form |
| US9097974B2 (en) | 2012-08-23 | 2015-08-04 | E I Du Pont De Nemours And Company | Method for preparing a relief printing form |
| US9340053B2 (en) | 2006-11-15 | 2016-05-17 | 3M Innovative Properties Company | Flexographic printing with curing during transfer to substrate |
| US12474639B2 (en) | 2022-04-27 | 2025-11-18 | Miraclon Corporation | Flexographic printing mask with laser thermal imaging film |
| US12496846B2 (en) | 2022-06-16 | 2025-12-16 | Miraclon Corporation | Mask for low contrast printed highlights |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0356954A3 (en) * | 1988-08-30 | 1991-05-08 | E.I. Du Pont De Nemours And Company | A plasticized polyvinyl alcohol release layer for a flexographic printing plate |
| US5135837A (en) * | 1990-09-05 | 1992-08-04 | E. I. Du Pont De Nemours And Company | Photosensitive elastomeric element having improved solvent resistance |
| JPH04293907A (en) * | 1991-03-22 | 1992-10-19 | Toyo Ink Mfg Co Ltd | Water-based photosensitive resin composition |
| JP2703125B2 (en) * | 1991-03-22 | 1998-01-26 | 東洋インキ製造株式会社 | Photosensitive resin composition containing photosensitive microgel |
| JPH04340968A (en) * | 1991-05-17 | 1992-11-27 | Toyo Ink Mfg Co Ltd | Production of flexographic printing board |
| JP2629120B2 (en) * | 1991-08-09 | 1997-07-09 | 東洋インキ製造株式会社 | Photosensitive resin composition, method for producing the same, and original plate for flexographic printing |
| EP0640875A1 (en) * | 1993-08-27 | 1995-03-01 | E.I. Du Pont De Nemours And Company | Aqueous developable flexographic printing plate |
| US5902714A (en) * | 1997-07-30 | 1999-05-11 | Polyfibron Technologies, Inc. | Latex-based, aqueous developable photopolymers and use thereof in printing plates |
| KR100532162B1 (en) * | 2002-03-13 | 2005-11-29 | 주식회사 신화에프씨 | Photoresist resins composition for gravure printing |
| DE10240956B4 (en) * | 2002-09-05 | 2005-03-17 | Christian-Albrechts-Universität Zu Kiel | Heterogeneous core-shell microgels with multistage switching behavior |
| US7458825B2 (en) * | 2004-06-17 | 2008-12-02 | Walletex Microelectronics Ltd. | Double-sided USB-compatible plug connector adapted for insertion in either orientation into a USB-compatible receptacle |
| JP7241187B2 (en) * | 2019-08-26 | 2023-03-16 | 富士フイルム株式会社 | Water-developable flexographic printing plate precursor and flexographic printing plate |
Citations (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA614181A (en) * | 1961-02-07 | J. Mcgraw William | Photopolymerizable compositions, elements and processes | |
| GB976051A (en) * | 1962-03-20 | 1964-11-25 | Searle & Co | Improvements in or relating to steroid compounds |
| US3895082A (en) * | 1971-05-27 | 1975-07-15 | Du Pont | Polymer composition |
| US3929693A (en) * | 1967-09-29 | 1975-12-30 | Du Pont | Film-forming compositions comprising dispersions of cellulose acetate butyrate or polymethylmethacrylate combined with rubbery particles of crosslinked polyacrylates in liquid carrer |
| JPS5211630A (en) * | 1975-07-17 | 1977-01-28 | Mitsubishi Petrochemical Co | Float fance open close mechanism |
| US4272608A (en) * | 1979-04-05 | 1981-06-09 | E. I. Du Pont De Nemours And Company | Photosensitive compositions containing thermoplastic ionomeric elastomers useful in flexographic printing plates |
| US4323636A (en) * | 1971-04-01 | 1982-04-06 | E. I. Du Pont De Nemours And Company | Photosensitive block copolymer composition and elements |
| US4414278A (en) * | 1982-04-22 | 1983-11-08 | E. I. Du Pont De Nemours And Company | Crosslinked triacrylate polymer beads |
| US4518472A (en) * | 1982-09-10 | 1985-05-21 | Mitsubishi Rayon Company Ltd. | Delustering coating composition excellent in abrasion resistance |
| US4601970A (en) * | 1982-04-22 | 1986-07-22 | E. I. Du Pont De Nemours And Company | Dry photosensitive film containing crosslinked beads |
| EP0212542A2 (en) * | 1985-08-21 | 1987-03-04 | BASF Aktiengesellschaft | Copolymers (comb polymers) containing a main chain polymer A and side chain polymers B polymerized by anionic polymerization |
| DE3543646A1 (en) * | 1985-12-11 | 1987-06-19 | Basf Ag | IONIC POLYMERISATE |
| DE3601802A1 (en) * | 1986-01-22 | 1987-07-23 | Basf Ag | MIXTURES CROSS-LINKABLE BY PHOTOPOLYMERISATION |
| US4726877A (en) * | 1986-01-22 | 1988-02-23 | E. I. Du Pont De Nemours And Company | Methods of using photosensitive compositions containing microgels |
| US4762892A (en) * | 1986-01-28 | 1988-08-09 | Basf Aktiengesellschaft | Polymers modified by a polymer-analogous reaction |
| EP0280979A2 (en) * | 1987-02-28 | 1988-09-07 | BASF Aktiengesellschaft | Light-sensitive registration material with enhanced flexibility |
| US4777115A (en) * | 1985-11-19 | 1988-10-11 | Basf Aktiengesellschaft | Photopolymerizable composition containing an ethylene terpolymer |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4188223A (en) * | 1977-12-30 | 1980-02-12 | Monsanto Company | Amino-functional photopolymer compositions and photo-oxidation imaging processes employing same |
| US4427759A (en) * | 1982-01-21 | 1984-01-24 | E. I. Du Pont De Nemours And Company | Process for preparing an overcoated photopolymer printing plate |
| EP0092783B1 (en) * | 1982-04-22 | 1987-11-11 | E.I. Du Pont De Nemours And Company | Photosensitive coatings containing crosslinked beads |
| US4753865A (en) * | 1986-01-22 | 1988-06-28 | E. I. Du Pont De Nemours And Company | Photosensitive compositions containing microgels |
-
1988
- 1988-08-30 US US07/238,104 patent/US4956252A/en not_active Expired - Fee Related
-
1989
- 1989-08-23 CA CA000609089A patent/CA1335543C/en not_active Expired - Fee Related
- 1989-08-26 EP EP19890115794 patent/EP0356953A3/en not_active Withdrawn
- 1989-08-29 AU AU40858/89A patent/AU630621B2/en not_active Ceased
- 1989-08-29 DK DK425289A patent/DK425289A/en unknown
- 1989-08-29 NO NO89893462A patent/NO893462L/en unknown
- 1989-08-30 JP JP1221873A patent/JPH0646301B2/en not_active Expired - Lifetime
Patent Citations (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA614181A (en) * | 1961-02-07 | J. Mcgraw William | Photopolymerizable compositions, elements and processes | |
| GB976051A (en) * | 1962-03-20 | 1964-11-25 | Searle & Co | Improvements in or relating to steroid compounds |
| US3929693A (en) * | 1967-09-29 | 1975-12-30 | Du Pont | Film-forming compositions comprising dispersions of cellulose acetate butyrate or polymethylmethacrylate combined with rubbery particles of crosslinked polyacrylates in liquid carrer |
| US4323636A (en) * | 1971-04-01 | 1982-04-06 | E. I. Du Pont De Nemours And Company | Photosensitive block copolymer composition and elements |
| US3895082A (en) * | 1971-05-27 | 1975-07-15 | Du Pont | Polymer composition |
| JPS5211630A (en) * | 1975-07-17 | 1977-01-28 | Mitsubishi Petrochemical Co | Float fance open close mechanism |
| US4272608A (en) * | 1979-04-05 | 1981-06-09 | E. I. Du Pont De Nemours And Company | Photosensitive compositions containing thermoplastic ionomeric elastomers useful in flexographic printing plates |
| US4601970A (en) * | 1982-04-22 | 1986-07-22 | E. I. Du Pont De Nemours And Company | Dry photosensitive film containing crosslinked beads |
| US4414278A (en) * | 1982-04-22 | 1983-11-08 | E. I. Du Pont De Nemours And Company | Crosslinked triacrylate polymer beads |
| US4518472A (en) * | 1982-09-10 | 1985-05-21 | Mitsubishi Rayon Company Ltd. | Delustering coating composition excellent in abrasion resistance |
| EP0212542A2 (en) * | 1985-08-21 | 1987-03-04 | BASF Aktiengesellschaft | Copolymers (comb polymers) containing a main chain polymer A and side chain polymers B polymerized by anionic polymerization |
| US4777115A (en) * | 1985-11-19 | 1988-10-11 | Basf Aktiengesellschaft | Photopolymerizable composition containing an ethylene terpolymer |
| DE3543646A1 (en) * | 1985-12-11 | 1987-06-19 | Basf Ag | IONIC POLYMERISATE |
| DE3601802A1 (en) * | 1986-01-22 | 1987-07-23 | Basf Ag | MIXTURES CROSS-LINKABLE BY PHOTOPOLYMERISATION |
| US4726877A (en) * | 1986-01-22 | 1988-02-23 | E. I. Du Pont De Nemours And Company | Methods of using photosensitive compositions containing microgels |
| US4762892A (en) * | 1986-01-28 | 1988-08-09 | Basf Aktiengesellschaft | Polymers modified by a polymer-analogous reaction |
| EP0280979A2 (en) * | 1987-02-28 | 1988-09-07 | BASF Aktiengesellschaft | Light-sensitive registration material with enhanced flexibility |
Cited By (66)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5075192A (en) * | 1988-08-30 | 1991-12-24 | E. I. Du Pont De Nemours And Company | Aqueous processible photosensitive compositions containing core shell microgels |
| US5372913A (en) * | 1989-05-18 | 1994-12-13 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin composition |
| US5424172A (en) * | 1989-05-18 | 1995-06-13 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin composition |
| US5466319A (en) * | 1989-06-30 | 1995-11-14 | U.S. Philips Corporation | Method for making optically readable media containing embossed information |
| US5171655A (en) * | 1989-08-03 | 1992-12-15 | Fuji Photo Film Co., Ltd. | Photohardenable light-sensitive composition |
| US5238783A (en) * | 1990-04-16 | 1993-08-24 | Toray Industries, Inc. | Photosensitive polymer composition for water developable flexographic printing plate |
| US5393637A (en) * | 1991-03-01 | 1995-02-28 | Nippon Paint Co., Ltd. | Photosensitive composition for offset printing comprising a binder, a photosensitive substance and a microgel made from an acrylic resin having carboxyl groups as the emulsifier |
| US5928833A (en) * | 1991-05-14 | 1999-07-27 | Dupont (U.K.) Ltd. | Radiation-sensitive materials |
| US5609980A (en) * | 1991-05-14 | 1997-03-11 | Dupont (U.K.) Ltd. | Radiation-sensitive materials comprising a layer having core-shell particles and a second layer with a radiation sensitive component |
| US6139322A (en) * | 1991-07-12 | 2000-10-31 | Dentsply Research & Development Corp | Denture |
| US6843654B1 (en) | 1991-07-12 | 2005-01-18 | Dentsply Research & Development Corp. | Dental prosthesis |
| US5622813A (en) * | 1992-01-24 | 1997-04-22 | Nippon Paint Co., Ltd. | Photosensitive resin composition for flexographic printing plate |
| AU658471B2 (en) * | 1992-01-24 | 1995-04-13 | Nippon Paint Co., Ltd. | Photosensitive resin composition for flexographic printing plate |
| US5948599A (en) * | 1992-11-18 | 1999-09-07 | Agfa Gevaert Nv | Method of forming an image in a printing plate |
| US6210854B1 (en) | 1993-08-27 | 2001-04-03 | E. I. Du Pont De Nemours And Company | Aqueous developable flexographic printing plate |
| US5707773A (en) * | 1993-08-27 | 1998-01-13 | E. I. Du Pont De Nemours And Company | Process for preparing an aqueous developable photosensitive element |
| US5780202A (en) * | 1994-04-08 | 1998-07-14 | Toyo Boseki Kabushiki Kaisha | Antistatic photosensitive multilayered structure and method for producing the same |
| EP0766143A1 (en) | 1995-09-29 | 1997-04-02 | E.I. Du Pont De Nemours And Company | Methods and apparatus for forming cylindrical photosensitive elements |
| US5753414A (en) * | 1995-10-02 | 1998-05-19 | Macdermid Imaging Technology, Inc. | Photopolymer plate having a peelable substrate |
| US5811220A (en) * | 1996-10-10 | 1998-09-22 | Polaroid Corporation | On-press lithographic development methodology facilitated by the use of a disperse hydrophilic microgel |
| US6245483B1 (en) * | 1997-06-09 | 2001-06-12 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin composition |
| US6127094A (en) * | 1997-10-02 | 2000-10-03 | Napp Systems Inc. | Acrylate copolymer-containing water-developable photosensitive resins and printing plates prepared therefrom |
| US6413699B1 (en) | 1999-10-11 | 2002-07-02 | Macdermid Graphic Arts, Inc. | UV-absorbing support layers and flexographic printing elements comprising same |
| USRE39835E1 (en) * | 1999-10-11 | 2007-09-11 | Rustom Sam Kanga | UV-absorbing support layers and flexographic printing elements comprising same |
| US20020065613A1 (en) * | 2000-09-21 | 2002-05-30 | Woods Joseph Thomas | System, method and storage medium for predicting impact performance of painted thermoplastic |
| US20020077795A1 (en) * | 2000-09-21 | 2002-06-20 | Woods Joseph Thomas | System, method and storage medium for predicting impact performance of thermoplastic |
| US20050272861A1 (en) * | 2002-11-27 | 2005-12-08 | Qiao Greg G | Microgel composition and process for preparation thereof |
| WO2004048428A1 (en) * | 2002-11-27 | 2004-06-10 | The University Of Melbourne | Microgel composition and process for preparation thereof |
| US20050272868A1 (en) * | 2002-11-27 | 2005-12-08 | Qiao Greg G | Free radical polymerisation process for microgel preparation |
| WO2004048429A1 (en) * | 2002-11-27 | 2004-06-10 | The University Of Melbourne | Free radical polymerisation process for microgel preparation |
| US6881533B2 (en) | 2003-02-18 | 2005-04-19 | Kodak Polychrome Graphics Llc | Flexographic printing plate with ink-repellent non-image areas |
| US20050196701A1 (en) * | 2004-03-05 | 2005-09-08 | Sabine Rapp | Process for preparing a flexographic printing plate |
| US7682775B2 (en) | 2004-03-05 | 2010-03-23 | E. I. Du Pont De Nemours And Company | Process for preparing a flexographic printing plate |
| US8530117B2 (en) | 2004-04-10 | 2013-09-10 | Eastman Kodak Company | Method of producing a relief image for printing |
| US20050227182A1 (en) * | 2004-04-10 | 2005-10-13 | Kodak Polychrome Graphics Llc | Method of producing a relief image for printing |
| US8142987B2 (en) | 2004-04-10 | 2012-03-27 | Eastman Kodak Company | Method of producing a relief image for printing |
| US8409790B2 (en) | 2004-04-10 | 2013-04-02 | Eastman Kodak Company | Method of producing a relief image for printing |
| EP1679549A2 (en) | 2005-01-07 | 2006-07-12 | E.I.Du pont de nemours and company | Imaging element for use as a recording element and process of using the imaging element |
| US20090069275A1 (en) * | 2006-02-17 | 2009-03-12 | Rocca Jose G | Low flush niacin formulation |
| US20100077932A1 (en) * | 2006-11-15 | 2010-04-01 | 3M Innovative Properties Company | Solvent removal assisted material transfer for flexographic printing |
| US9579877B2 (en) | 2006-11-15 | 2017-02-28 | 3M Innovative Properties Company | Flexographic printing with curing during transfer to substrate |
| US9340053B2 (en) | 2006-11-15 | 2016-05-17 | 3M Innovative Properties Company | Flexographic printing with curing during transfer to substrate |
| EP2009502A2 (en) | 2007-06-20 | 2008-12-31 | E. I. Du Pont de Nemours and Company | Method for making a relief printing form |
| US7569650B2 (en) * | 2007-07-17 | 2009-08-04 | Hewlett-Packard Development Company, L.P. | Compositions and methods for producing latexes containing urethanes |
| US20090020036A1 (en) * | 2007-07-17 | 2009-01-22 | Sivapackia Ganapathiappan | Compositions and methods for producing latexes containing urethanes |
| EP2026132A2 (en) | 2007-08-16 | 2009-02-18 | E. I. Du Pont de Nemours and Company | Process for making a cylindrically-shaped photosensitive element for use as a printing form |
| US8790862B2 (en) | 2007-09-14 | 2014-07-29 | E I Du Pont De Nemours And Company | Photosensitive element having reinforcing particles and method for preparing a printing form from the element |
| EP2045660A1 (en) | 2007-09-14 | 2009-04-08 | E. I. Du Pont de Nemours and Company | Photosensitive element having reinforcing particles and method for preparing a printing form from the element |
| US8470518B2 (en) | 2007-09-14 | 2013-06-25 | E I Du Pont De Nemours And Company | Photosensitive element having reinforcing particles and method for preparing a printing form from the element |
| EP2083325A2 (en) | 2008-01-23 | 2009-07-29 | E. I. Du Pont de Nemours and Company | Method for printing a pattern on a substrate |
| US8236479B2 (en) | 2008-01-23 | 2012-08-07 | E I Du Pont De Nemours And Company | Method for printing a pattern on a substrate |
| US8241835B2 (en) | 2008-01-30 | 2012-08-14 | E I Du Pont De Nemours And Company | Device and method for preparing relief printing form |
| US9201314B2 (en) | 2008-01-30 | 2015-12-01 | E I Du Pont De Nemours And Company | Apparatus for preparing relief printing form |
| US20090191483A1 (en) * | 2008-01-30 | 2009-07-30 | E. I. Du Pont De Nemours And Company | Device and method for preparing relief printing form |
| EP2085820A2 (en) | 2008-01-30 | 2009-08-05 | E. I. du Pont de Nemours and Company | Apparatus and method for preparing relief printing form |
| US9063437B2 (en) | 2008-01-30 | 2015-06-23 | E I Du Pont De Nemours And Company | Method for preparing relief printing form |
| EP2093059A2 (en) | 2008-02-21 | 2009-08-26 | E. I. du Pont de Nemours and Company | Extended print sleeve and method for preparing a printing form from the sleeve |
| EP2251199A1 (en) | 2008-02-21 | 2010-11-17 | E. I. du Pont de Nemours and Company | Method for preparing a printing form from a sleeve |
| EP2154572A2 (en) | 2008-08-15 | 2010-02-17 | E. I. du Pont de Nemours and Company | Process for making a cylindrically-shaped photosensitive element for use as a printing form |
| US8899148B2 (en) | 2009-07-02 | 2014-12-02 | E I Du Pont De Nemours And Company | Method for printing a material onto a substrate |
| US9069252B2 (en) | 2011-08-26 | 2015-06-30 | E I Du Pont De Nemours And Company | Method for preparing a relief printing form |
| WO2013081951A1 (en) | 2011-12-02 | 2013-06-06 | E. I. Du Pont De Nemours And Company | Method for making flexographic printing forms by welding edges of photosensitive elements with microwave energy |
| WO2013148299A2 (en) | 2012-03-27 | 2013-10-03 | E. I. Du Pont De Nemours And Company | Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor |
| US9097974B2 (en) | 2012-08-23 | 2015-08-04 | E I Du Pont De Nemours And Company | Method for preparing a relief printing form |
| US12474639B2 (en) | 2022-04-27 | 2025-11-18 | Miraclon Corporation | Flexographic printing mask with laser thermal imaging film |
| US12496846B2 (en) | 2022-06-16 | 2025-12-16 | Miraclon Corporation | Mask for low contrast printed highlights |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0646301B2 (en) | 1994-06-15 |
| DK425289A (en) | 1990-03-01 |
| CA1335543C (en) | 1995-05-16 |
| JPH02175702A (en) | 1990-07-09 |
| NO893462D0 (en) | 1989-08-29 |
| NO893462L (en) | 1990-03-01 |
| AU630621B2 (en) | 1992-11-05 |
| EP0356953A3 (en) | 1991-05-02 |
| AU4085889A (en) | 1990-03-08 |
| DK425289D0 (en) | 1989-08-29 |
| EP0356953A2 (en) | 1990-03-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4956252A (en) | Aqueous processible photosensitive compositions containing core shell microgels | |
| EP0356952B1 (en) | Process for making flexographic plates with increased flexibility | |
| US5075192A (en) | Aqueous processible photosensitive compositions containing core shell microgels | |
| US4726877A (en) | Methods of using photosensitive compositions containing microgels | |
| US4753865A (en) | Photosensitive compositions containing microgels | |
| EP0106351B1 (en) | Photopolymerizable photosensitive composition | |
| US5707773A (en) | Process for preparing an aqueous developable photosensitive element | |
| US3445229A (en) | Photopolymerizable compositions,elements,and processes | |
| US5077175A (en) | Plasticized polyvinyl alcohol release layer for a flexographic printing plate | |
| AU613519B2 (en) | A plasticized polyvinyl alcohol release layer for a flexographic printing plate | |
| US3879204A (en) | Two-layer photopolymerizable gravure resist film | |
| EP0497819B1 (en) | A release layer for an aqueous or semi-aqueous processible flexographic printing plate | |
| JPH04291257A (en) | Photosensitive transfer material | |
| JP2005331966A (en) | Polymeric film having controlled viscosity response to temperature and shear | |
| JP6959887B2 (en) | A photosensitive resin composition, a photoresist film using the photosensitive resin composition, and a method for forming a resist pattern. | |
| DE1471687A1 (en) | Process for image transfer by thermal means | |
| JPS6327830A (en) | Fluorescent photocurable composition | |
| JPH02161443A (en) | Photopolymerizable composition | |
| EP0640875A1 (en) | Aqueous developable flexographic printing plate | |
| JP2003525954A6 (en) | Polymer film with controlled viscosity response to temperature and shear | |
| JPH02161441A (en) | Photopolymerizable composition | |
| JPS645687B2 (en) | ||
| JPH03106912A (en) | Production of thermoplastic polymer for photopolymerizable composition and photopolymerizable composition | |
| JP2001209177A (en) | Photosensitive resin composition |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AS | Assignment |
Owner name: E.I. DU PONT DE NEMOURS AND COMPANY, WILMINGTON, D Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNORS:FRYD, MICHAEL;LEBERZAMMER, ERNST;REEL/FRAME:004964/0215 Effective date: 19880826 Owner name: E.I. DU PONT DE NEMOURS AND COMPANY, A DE CORP., D Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:FRYD, MICHAEL;LEBERZAMMER, ERNST;REEL/FRAME:004964/0215 Effective date: 19880826 |
|
| AS | Assignment |
Owner name: E. I. DU PONT DE NEMOURS AND COMPANY, WILMINGTON, Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNORS:SEBASTIAN, S. ANDRIES R.D.;FRYD, MICHAEL;LEBERZAMMER, ERNST;REEL/FRAME:005186/0983;SIGNING DATES FROM 19891128 TO 19891201 |
|
| FPAY | Fee payment |
Year of fee payment: 4 |
|
| REMI | Maintenance fee reminder mailed | ||
| LAPS | Lapse for failure to pay maintenance fees | ||
| FP | Lapsed due to failure to pay maintenance fee |
Effective date: 19980911 |
|
| STCH | Information on status: patent discontinuation |
Free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362 |