US4849088A - Cathode arc discharge evaporating device - Google Patents

Cathode arc discharge evaporating device Download PDF

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US4849088A
US4849088A US07/167,408 US16740888A US4849088A US 4849088 A US4849088 A US 4849088A US 16740888 A US16740888 A US 16740888A US 4849088 A US4849088 A US 4849088A
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Prior art keywords
magnetic field
field generating
cathode
generating device
revolution
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US07/167,408
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Hans Veltrop
Harald Wesemeyer
Boudewijn J. A. M. Buil
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HAUZER HOLDING BV A CORP OF NETHERLANDS
Hauzer Holding BV
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Hauzer Holding BV
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Assigned to HAUZER HOLDING B.V., A CORP. OF THE NETHERLANDS reassignment HAUZER HOLDING B.V., A CORP. OF THE NETHERLANDS ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: BUIL, BOUDEWIJN J. A. M., VELTROP, HANS, WESEMEYER, HARALD
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation

Definitions

  • the present invention relates to a cathode arc discharge evaporating device, comprising a target surface of the material to be evaporated, embodied as a surface of a hollow body of revolution and provided with at least one arc controlling magnetic field generating device.
  • Such a device is known from GB-A-2127043.
  • a cylindrical consumable cathode having a surface made of the material to be deposited is described into which a work piece is introduced.
  • the housing of this device is connected as an anode.
  • a magnetic coil is provided around the housing of this device. This coil primarily functions to control the flow of material from the target surface of the substrate. However, it also has some effect on the position of the spot of the arc drawn between anode and cathode on the target surface. Control of the position of this spot is very important because it is generally desired to consume the target surface as evenly as possible.
  • the invention aims to obviate these drawbacks and to obtain a cathode surface without an erosion relief that has trenches or canyons.
  • This object is realized in that said magnetic field generating device is provided internally of the body of revolution and in that the outer surface of the body of revolution comprises the evaporation surface.
  • the magnetic field generating device can comprise an assembly of permanent magnets as well as an assembly of electro magnets or a combination thereof.
  • screen means can be provided.
  • the body of revolution with regard to the screen means it is possible to provide a fresh target surface. This embodiment is important if the work piece extends only on one side of the body of revolution.
  • means are provided to rotate the body of revolution with respect to the magnetic field generating device and/or screen means. By this a target surface can be evenly used.
  • this magnetic field generating deivce is an electro magnetic coil, rotating has to be understood in an electromagnetic sense.
  • the expression "with respect to” has to be understood that it is possible to move either component, the other component being fixed or that both components move in the same sense with a different speed or in a different sense with the same or different speed.
  • FIG. 1 is a partially cross-sectioned side elevation of the device according to the invention
  • FIG. 2 is a cross-section of the cathode arrangement according to FIG. 1 along line II--II,
  • FIG. 3 is a side elevation of a cathode arrangement which can be used in a device according to FIG. 1,
  • FIGS. 4a and 4b are respectively an exploded elevational view and a cross-sectional view along line IVb--IVb of the arrangement of a hollow cylinder in which a magnetic field generating device is introduced,
  • FIG. 5 is a projection of the path of movement of the arc in a stationary magnetic field generating device
  • FIG. 6 is a further embodiment of a magnetic field generating device arranged in a cathode formed as a hollow cylinder.
  • FIG. 1 a cathode/anode arc discharge device is shown comprising a housing 1 in which an anode ring 2 and a cathode cylinder 3 are provided.
  • the anode ring 2 can be cooled by means such as is known in the art.
  • a substrate holder 4 is provided.
  • Anode ring 2 and cathode cylinder 3 are connected to arc dc supply 5.
  • the voltage of substrate holder 4 is kept between 0 and some negative K volts by high voltage supply 6.
  • Cathode cylinder 3 is partially surrounded by insulation 41 and double dark screen shielding 7. This is also clear from FIG. 2.
  • a magnetic field generating device 8 is provided suspended to a rod 9.
  • rod 9 can be moved up and down by means not shown. With arrow 11 it is indicated that it can also rotate. From arrow 12 it is clear that cathode cylinder 3 itself can be rotated by means not shown but being known in the art.
  • Housing 1 is provided with an inlet 13 for introducing of gas and an outlet 14 to which a pump, not shown, can be connected to evacuate housing 1.
  • the device according to FIG. 1 functions as follows.
  • arc supply 5 is switched on an arc is ignited and maintained between anode ring 2 and cathode cylinder 3.
  • the cathode material from which the cathode cylinder 3 is made generates a flow of atoms and ions to substrate holder 4.
  • a negative voltage By imposing a negative voltage on the substrate holder 4 an optimised deposition of this material is obtained.
  • the cathode spot will travel randomly over the cathode cylinder. This means that from the cathode surface, macro particles and droplets will be emitted and an uneven erosion will happen.
  • magnetic field generating device 8 is provided.
  • the cathode spot will be attracted to and controlled by the magnetic field generated by this device 8.
  • cylinder 3 can be rotated as indicated by arrow 12.
  • gasses can be supplied through inlet 13.
  • FIG. 3 another embodiment of the cathode cylinder indicated as 16 is shown.
  • the cathode cylinder indicated as 16 As means for preventing the arc to wander from the cathode surface, two rings of ceramic insulation 15 are provided.
  • the arc spot trajectory 17 is also indicated which will be followed if cathode cylinder 3 and magnetic field generating device 8 as shown in FIG. 1 are fixed relative to each other.
  • cathode 16 and magnetic field generating device 18 are moved with respect to each other as indicated by arrows in FIG. 3.
  • FIG. 4b a cross-section of the cathodic cylinder 3 according to FIG. 1 is shown having a specific embodiment of the magnetic field generating device indicated by reference numeral 18.
  • Device 18 comprises a permanent magnet assembly having a central pole 23 surrounded by soft iron magnetic conductor portions 25 and 25 with opposite polarity to pole 23.
  • the magnetic field generating device is a permanent magnet assembly
  • the magnetic field generating device according to FIG. 1 can also comprise a coil assembly, in which case electrical supply leads have to be provided through rod 9. It is also possible to rotate this magnetic field generating device around axis 19 as shown in FIG. 1 by mechanical and/or electrical means known in the art.
  • FIG. 5 shows a projection of the surface of the cathodic cylinder 3.
  • the arc trajectory is indicated by reference numeral 27.
  • a magnetic field generating assembly as shown in FIG. 4a can be used having an elongated shape.
  • the magnetic field generating device can be fixed with regard to the cathode cylinder.
  • the cathode cylinder is rotated with regard to the magnetic field generating device the vertical portion of trajectory 27 will constantly change whilst the upper and lower portions of this trajectory in FIG. 5 indicated by reference numeral 28 remain the same.
  • the speed of the arc spot with respect to the cathode cylinder can be described by a sinusoidal function.
  • an electrical modulation by means of coils can be supplied to the arc track to avoid erosion at places such as 28.
  • the magnetic field generating device 32 comprises an assembly of permanent magnets 39. Between these magnets 39 soft iron parts 40 are provided. Device 32 can be moved upward and downward by rod 9 with respect to cathode 3. In this embodiment the arc spot will be at those points in which the components of the magnetic field perpendicular to the cathode surface are zero and where the parallel components are at maximum.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Cathode arc discharge evaporating device having a body of revolution as cathode. The target surface is arranged at the outside surface of the body of revolution. To control movement of the arc spot a magnetic field generating device is provided inside the body of revolution, which may be moveable with respect to the cathode.

Description

The present invention relates to a cathode arc discharge evaporating device, comprising a target surface of the material to be evaporated, embodied as a surface of a hollow body of revolution and provided with at least one arc controlling magnetic field generating device.
Such a device is known from GB-A-2127043. In this specification, a cylindrical consumable cathode having a surface made of the material to be deposited is described into which a work piece is introduced. The housing of this device is connected as an anode. Around the housing of this device a magnetic coil is provided. This coil primarily functions to control the flow of material from the target surface of the substrate. However, it also has some effect on the position of the spot of the arc drawn between anode and cathode on the target surface. Control of the position of this spot is very important because it is generally desired to consume the target surface as evenly as possible. To realize this object, it is necessary that the arc spot runs along the defined path along the target surface and that each point of that target surface is touched the same number of times by the arc spot. Because the distance of the magnetic field generating device to the target surface according to this specification is quite considerable it is not possible to obtain precise control of the path of the arc on the target surface. From the description it is also clear that it is not the object to do so.
The invention aims to obviate these drawbacks and to obtain a cathode surface without an erosion relief that has trenches or canyons. This object is realized in that said magnetic field generating device is provided internally of the body of revolution and in that the outer surface of the body of revolution comprises the evaporation surface. By introducing the magnetic field generating device inside of the body of revolution, constituting the evaporation surface, it is possible to obtain a precisely controlled movement of the arc spot along the evaporation surface. This is because the distance from the magnetic field generating device and the arc spot is considerably reduced with regard to the device according to the British specification.
The magnetic field generating device can comprise an assembly of permanent magnets as well as an assembly of electro magnets or a combination thereof.
If it is intended that the spot is only within a restricted area of the evaporation surface, screen means can be provided. By means the body of revolution with regard to the screen means it is possible to provide a fresh target surface. This embodiment is important if the work piece extends only on one side of the body of revolution.
According to a further preferred embodiment, means are provided to rotate the body of revolution with respect to the magnetic field generating device and/or screen means. By this a target surface can be evenly used.
It is of course also possible to translate the body of revolution with respect to the magnetic field generating device and/or screen means. Combinations of both rotational and translational movement are also envisaged by this invention.
It is also possible to rotate the magnetic field generating device substantially perpendicular to the axis of the body of revolution. If this magnetic field generating deivce is an electro magnetic coil, rotating has to be understood in an electromagnetic sense. The expression "with respect to" has to be understood that it is possible to move either component, the other component being fixed or that both components move in the same sense with a different speed or in a different sense with the same or different speed.
The invention will be further elucidated by way of example with reference to the accompanying drawings, in which:
FIG. 1 is a partially cross-sectioned side elevation of the device according to the invention,
FIG. 2 is a cross-section of the cathode arrangement according to FIG. 1 along line II--II,
FIG. 3 is a side elevation of a cathode arrangement which can be used in a device according to FIG. 1,
FIGS. 4a and 4b are respectively an exploded elevational view and a cross-sectional view along line IVb--IVb of the arrangement of a hollow cylinder in which a magnetic field generating device is introduced,
FIG. 5 is a projection of the path of movement of the arc in a stationary magnetic field generating device, and
FIG. 6 is a further embodiment of a magnetic field generating device arranged in a cathode formed as a hollow cylinder.
In FIG. 1 a cathode/anode arc discharge device is shown comprising a housing 1 in which an anode ring 2 and a cathode cylinder 3 are provided. The anode ring 2 can be cooled by means such as is known in the art. Furthermore, a substrate holder 4 is provided. Anode ring 2 and cathode cylinder 3 are connected to arc dc supply 5. The voltage of substrate holder 4 is kept between 0 and some negative K volts by high voltage supply 6. Cathode cylinder 3 is partially surrounded by insulation 41 and double dark screen shielding 7. This is also clear from FIG. 2. In cathode cylinder 3 a magnetic field generating device 8 is provided suspended to a rod 9. As is schematically shown by arrow 10, rod 9 can be moved up and down by means not shown. With arrow 11 it is indicated that it can also rotate. From arrow 12 it is clear that cathode cylinder 3 itself can be rotated by means not shown but being known in the art. Housing 1 is provided with an inlet 13 for introducing of gas and an outlet 14 to which a pump, not shown, can be connected to evacuate housing 1.
The device according to FIG. 1 functions as follows. When arc supply 5 is switched on an arc is ignited and maintained between anode ring 2 and cathode cylinder 3. At the spot where this arc touches cathode cylinder 3 the cathode material from which the cathode cylinder 3 is made generates a flow of atoms and ions to substrate holder 4. By imposing a negative voltage on the substrate holder 4 an optimised deposition of this material is obtained. Normally the cathode spot will travel randomly over the cathode cylinder. This means that from the cathode surface, macro particles and droplets will be emitted and an uneven erosion will happen. To prevent this, magnetic field generating device 8 is provided. The cathode spot will be attracted to and controlled by the magnetic field generated by this device 8. To evenly consume the cathode cylinder 3, it is possible to move magnetic field generating device 8 by rod 9 relative to cathode cylinder 3 as indicated by arrows 10. It is also possible to rotate rod 9 by which the magnetic field generating device 8 is moved along the surface of the cathode cylinder 3. This is also shown in FIGS. 4a and 4b. If one wishes the cathode arc spot will only travel on that side of the cathode which faces the substrate, so the cathode material evaporates in the direction of the substrate holder 4, a double dark screen shielding is provided. By this the spot will only move along the exposed surface of cathode cylinder 3. To evenly consume the cathode cylinder 3 in this case, cylinder 3 can be rotated as indicated by arrow 12. During operation of the device housing 1 is evacuated by discharging of gasses through outlet 14. During igniting of the arc, gas can be supplied through inlet 13.
In FIG. 3 another embodiment of the cathode cylinder indicated as 16 is shown. In this embodiment, as means for preventing the arc to wander from the cathode surface, two rings of ceramic insulation 15 are provided. In FIG. 3 the arc spot trajectory 17 is also indicated which will be followed if cathode cylinder 3 and magnetic field generating device 8 as shown in FIG. 1 are fixed relative to each other. To prevent localized erosion during operation of the device, cathode 16 and magnetic field generating device 18 are moved with respect to each other as indicated by arrows in FIG. 3. In FIG. 4b a cross-section of the cathodic cylinder 3 according to FIG. 1 is shown having a specific embodiment of the magnetic field generating device indicated by reference numeral 18. Device 18 comprises a permanent magnet assembly having a central pole 23 surrounded by soft iron magnetic conductor portions 25 and 25 with opposite polarity to pole 23.
Although in this embodiment the magnetic field generating device is a permanent magnet assembly, the magnetic field generating device according to FIG. 1 can also comprise a coil assembly, in which case electrical supply leads have to be provided through rod 9. It is also possible to rotate this magnetic field generating device around axis 19 as shown in FIG. 1 by mechanical and/or electrical means known in the art.
FIG. 5 shows a projection of the surface of the cathodic cylinder 3. The arc trajectory is indicated by reference numeral 27. To obtain this trajectory, a magnetic field generating assembly as shown in FIG. 4a can be used having an elongated shape. To obtain trajectory 27 the magnetic field generating device can be fixed with regard to the cathode cylinder. When the cathode cylinder is rotated with regard to the magnetic field generating device the vertical portion of trajectory 27 will constantly change whilst the upper and lower portions of this trajectory in FIG. 5 indicated by reference numeral 28 remain the same. To prevent erosion near 28 the speed of movement of the arc has to be increased. The speed of the arc spot with respect to the cathode cylinder can be described by a sinusoidal function. In addition, an electrical modulation by means of coils can be supplied to the arc track to avoid erosion at places such as 28.
In FIG. 6 a further embodiment is shown in which the magnetic field generating device 32 comprises an assembly of permanent magnets 39. Between these magnets 39 soft iron parts 40 are provided. Device 32 can be moved upward and downward by rod 9 with respect to cathode 3. In this embodiment the arc spot will be at those points in which the components of the magnetic field perpendicular to the cathode surface are zero and where the parallel components are at maximum.
In this embodiment it is not necessary to rotate rod 9 because the arc spot rotates on the lateral surface of the cathode. A helical path of the arc trajectory is obtained when rod 9 is moved.
Although preference is given to the embodiments described, it has to be understood that many modifications are possible. When using electro magnetic coils as the magnetic field generating device it is possible to provide a modulating magnetic field. Furthermore, it is possible to use all magnetic field generating devices known in the prior art.

Claims (6)

We claim:
1. Cathode arc evaporating device, comprising an evaporation surface of the material to be evaporated formed as a surface of a hollow body of revolution, means for supporting said evaporation surface for rotation about an axis, and at least one arc spot steering magnetic field generating device supported within said evaporation surface for movement in a direction parallel to the axis of rotation of said evaporation surface for avoiding non-uniform erosion of said evaporation surface.
2. Device according to claim 1, wherein the magnetic field generating device comprises an assembly of permanent magnets.
3. Device according to claim 1, wherein the magnetic field generating device comprises an assembly of electro magnets.
4. Device according to claim 1, wherein dark screen means are provided on one side of the evaporation surface.
5. Device according to claim 1, wherein means are provided to translate the body of revolution with regard to the magnetic field generating device.
6. Device according to claim 1, wherein the magnetic field generating device is rotatable in a plane substantially perpendicular to the rotational axis of the body of revolution.
US07/167,408 1987-03-16 1988-03-14 Cathode arc discharge evaporating device Expired - Fee Related US4849088A (en)

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NL8700620A NL8700620A (en) 1987-03-16 1987-03-16 CATHODE ARC VAPORIZATION DEVICE AND METHOD FOR ITS OPERATION.
NL8700620 1987-03-16

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Cited By (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5037522A (en) * 1990-07-24 1991-08-06 Vergason Technology, Inc. Electric arc vapor deposition device
EP0508612A2 (en) * 1991-03-20 1992-10-14 Vapor Technologies Inc. Apparatus and method for coating a substrate using vacuum arc evaporation
US5480527A (en) * 1994-04-25 1996-01-02 Vapor Technologies, Inc. Rectangular vacuum-arc plasma source
US5518596A (en) * 1992-01-10 1996-05-21 Suomen Itsenaisyyden Juhlarahasto Sitra Procedure and apparatus for improving a plasma accelerator plating apparatus used for diamond plating
US5932078A (en) * 1997-08-30 1999-08-03 United Technologies Corporation Cathodic arc vapor deposition apparatus
US5972185A (en) * 1997-08-30 1999-10-26 United Technologies Corporation Cathodic arc vapor deposition apparatus (annular cathode)
US5997705A (en) * 1999-04-14 1999-12-07 Vapor Technologies, Inc. Rectangular filtered arc plasma source
US6009829A (en) * 1997-08-30 2000-01-04 United Technologies Corporation Apparatus for driving the arc in a cathodic arc coater
US6036828A (en) * 1997-08-30 2000-03-14 United Technologies Corporation Apparatus for steering the arc in a cathodic arc coater
US6251233B1 (en) 1998-08-03 2001-06-26 The Coca-Cola Company Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation
US6279505B1 (en) 1997-03-14 2001-08-28 The Coca-Cola Company Plastic containers with an external gas barrier coating
US6350356B1 (en) 1997-11-26 2002-02-26 Vapor Technologies, Inc. Linear magnetron arc evaporation or sputtering source
US6599584B2 (en) 2001-04-27 2003-07-29 The Coca-Cola Company Barrier coated plastic containers and coating methods therefor
US20030194563A1 (en) * 2002-04-15 2003-10-16 Yu Shi Coating composition containing an epoxide additive and structures coated therewith
US20040007455A1 (en) * 2002-04-22 2004-01-15 Pivot A.S. Arc-coating process with rotating cathodes
US20040052995A1 (en) * 2000-08-24 2004-03-18 Mark Rule Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and UV barrier and method for making same
US20040052996A1 (en) * 2000-08-24 2004-03-18 Mark Rule Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same
US20040069233A1 (en) * 2000-12-18 2004-04-15 Pavel Holubar Apparatus for evaporation of materials for coating of objects
US20060175190A1 (en) * 2002-12-19 2006-08-10 Unaxis Balzers Ltd. Vacuum arc source comprising a device for generating a magnetic field
US20070251816A1 (en) * 2006-05-01 2007-11-01 Vapor Technologies, Inc. Bi-directional filtered arc plasma source
US20080078481A1 (en) * 2006-10-03 2008-04-03 Mcgrath Terrence S Controlled phase transition of metals
US20080138529A1 (en) * 2006-12-11 2008-06-12 Ge Global Research Center Method and apparatus for cathodic arc ion plasma deposition
US20090242397A1 (en) * 2008-03-31 2009-10-01 General Electric Company Systems for controlling cathodic arc discharge
US7867366B1 (en) 2004-04-28 2011-01-11 Alameda Applied Sciences Corp. Coaxial plasma arc vapor deposition apparatus and method
US8038858B1 (en) 2004-04-28 2011-10-18 Alameda Applied Sciences Corp Coaxial plasma arc vapor deposition apparatus and method
US20120228124A1 (en) * 2009-11-23 2012-09-13 Stan Veprek Method of creating pvd layers using a cylindrical rotating cathode and apparatus for carrying out this method
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US20230036704A1 (en) * 2021-07-30 2023-02-02 Jiangsu Xcmg Construction Machinery Research Institute Ltd. Arc ion coating device and coating method

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3781551T2 (en) * 1987-06-29 1993-04-08 Hauzer Holding METHOD AND DEVICE FOR COATING EXCAVATIONS OF OBJECTS.
DE4006456C1 (en) * 1990-03-01 1991-05-29 Balzers Ag, Balzers, Li Appts. for vaporising material in vacuum - has electron beam gun or laser guided by electromagnet to form cloud or pre-melted spot on the target surface
DE4109213C1 (en) * 1991-03-21 1992-04-09 Forschungsgesellschaft Fuer Elektronenstrahl- Und Plasmatechnik Mbh, O-8051 Dresden, De Arc-source for vacuum coating system - comprises cathode housing with double walled shell, and thin base, target, cooling water supply, drain, etc.
EP0586702A4 (en) * 1991-04-29 1994-06-01 N Proizv Predprivatie Novatekh Electric arc evaporator of metals
WO1992021788A1 (en) * 1991-05-31 1992-12-10 Kharkovsky Fiziko-Tekhnichesky Institut Device for electric arc application of coatings on articles under vacuum
DE10127012A1 (en) * 2001-06-05 2002-12-12 Gabriel Herbert M Electric arc vaporizing device used in production of hard material layers on substrates comprises anode, target, voltage, and magnet arrangement formed as one unit
KR100701267B1 (en) * 2005-11-18 2007-03-29 한국생산기술연구원 Apparatus for pulse arc by low an electric current
JP4684141B2 (en) * 2006-03-17 2011-05-18 株式会社神戸製鋼所 Vacuum arc evaporation source and vacuum arc evaporation apparatus
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RU2449513C1 (en) * 2010-11-30 2012-04-27 Государственное образовательное учреждение высшего профессионального образования "Санкт-Петербургский государственный электротехнический университет "ЛЭТИ" им. В.И. Ульянова (Ленина)" Vacuum-arc device
US20120193227A1 (en) * 2011-02-02 2012-08-02 Tryon Brian S Magnet array for a physical vapor deposition system
US20120193226A1 (en) * 2011-02-02 2012-08-02 Beers Russell A Physical vapor deposition system
EP2602354A1 (en) * 2011-12-05 2013-06-12 Pivot a.s. Filtered cathodic vacuum arc deposition apparatus and method
EP2778253B1 (en) * 2013-02-26 2018-10-24 Oerlikon Surface Solutions AG, Pfäffikon Cylindrical evaporation source
RU2510428C1 (en) * 2013-03-15 2014-03-27 Федеральное Государственное Унитарное Предприятие "Научно-Производственное Объединение "Техномаш" Arc evaporator of metal and alloys
US9506140B2 (en) 2013-03-15 2016-11-29 United Technologies Corporation Spallation-resistant thermal barrier coating
EP4195236B1 (en) * 2021-12-09 2024-02-21 Platit AG Magnetron sputtering apparatus with a movable magnetic field and method of operating the magnetron sputtering apparatus

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4221652A (en) * 1975-04-10 1980-09-09 Kabushiki Kaisha Tokuda Seisakusho Sputtering device
US4492845A (en) * 1982-09-17 1985-01-08 Kljuchko Gennady V Plasma arc apparatus for applying coatings by means of a consumable cathode
US4673477A (en) * 1984-03-02 1987-06-16 Regents Of The University Of Minnesota Controlled vacuum arc material deposition, method and apparatus

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD217964A3 (en) * 1981-10-02 1985-01-23 Ardenne Manfred DEVICE FOR HIGH-RATE SCREENING ACCORDING TO THE PLASMATRON PRINCIPLE

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4221652A (en) * 1975-04-10 1980-09-09 Kabushiki Kaisha Tokuda Seisakusho Sputtering device
US4492845A (en) * 1982-09-17 1985-01-08 Kljuchko Gennady V Plasma arc apparatus for applying coatings by means of a consumable cathode
US4673477A (en) * 1984-03-02 1987-06-16 Regents Of The University Of Minnesota Controlled vacuum arc material deposition, method and apparatus
US4673477B1 (en) * 1984-03-02 1993-01-12 Univ Minnesota

Non-Patent Citations (6)

* Cited by examiner, † Cited by third party
Title
Instruments and Experimental Techniques, vol. 19, #4, part 2, Jul./Aug. 1976, pp. 1211-1213.
Instruments and Experimental Techniques, vol. 19, 4, part 2, Jul./Aug. 1976, pp. 1211 1213. *
Journal of Vacuum Science & Technology/A. vol. 4, No. 3, part 1, May Jun. 1986, pp. 388 392, American Vacuum Society, Woodbury, N.Y., U.S.A. *
Journal of Vacuum Science & Technology/A. vol. 4, No. 3, part 1, May-Jun. 1986, pp. 388-392, American Vacuum Society, Woodbury, N.Y., U.S.A.
M. Wright et al.: "Design Advances and Applications of the Rotatable Cylindrical Magnetron".
M. Wright et al.: Design Advances and Applications of the Rotatable Cylindrical Magnetron . *

Cited By (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5037522A (en) * 1990-07-24 1991-08-06 Vergason Technology, Inc. Electric arc vapor deposition device
EP0508612A2 (en) * 1991-03-20 1992-10-14 Vapor Technologies Inc. Apparatus and method for coating a substrate using vacuum arc evaporation
EP0508612A3 (en) * 1991-03-20 1993-02-17 Vapor Technologies Inc. Apparatus and method for coating a substrate using vacuum arc evaporation
US5269898A (en) * 1991-03-20 1993-12-14 Vapor Technologies, Inc. Apparatus and method for coating a substrate using vacuum arc evaporation
US5518596A (en) * 1992-01-10 1996-05-21 Suomen Itsenaisyyden Juhlarahasto Sitra Procedure and apparatus for improving a plasma accelerator plating apparatus used for diamond plating
US5480527A (en) * 1994-04-25 1996-01-02 Vapor Technologies, Inc. Rectangular vacuum-arc plasma source
US5840163A (en) * 1994-04-25 1998-11-24 Vapor Technologies, Inc. Rectangular vacuum-arc plasma source
US6279505B1 (en) 1997-03-14 2001-08-28 The Coca-Cola Company Plastic containers with an external gas barrier coating
US6599569B1 (en) 1997-03-14 2003-07-29 The Coca-Cola Company Plastic containers with an external gas barrier coating, method and system for coating containers using vapor deposition, method for recycling coated containers, and method for packaging a beverage
US6548123B1 (en) 1997-03-14 2003-04-15 The Coca-Cola Company Method for coating a plastic container with vacuum vapor deposition
US5972185A (en) * 1997-08-30 1999-10-26 United Technologies Corporation Cathodic arc vapor deposition apparatus (annular cathode)
US6036828A (en) * 1997-08-30 2000-03-14 United Technologies Corporation Apparatus for steering the arc in a cathodic arc coater
US6009829A (en) * 1997-08-30 2000-01-04 United Technologies Corporation Apparatus for driving the arc in a cathodic arc coater
US5932078A (en) * 1997-08-30 1999-08-03 United Technologies Corporation Cathodic arc vapor deposition apparatus
US6350356B1 (en) 1997-11-26 2002-02-26 Vapor Technologies, Inc. Linear magnetron arc evaporation or sputtering source
DE19853943B4 (en) * 1997-11-26 2006-04-20 Vapor Technologies, Inc. (Delaware Corporation), Longmont Cathode for sputtering or arc vapor deposition as well as apparatus for coating or ion implantation with such a cathode
US6251233B1 (en) 1998-08-03 2001-06-26 The Coca-Cola Company Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation
US6447837B2 (en) 1998-08-03 2002-09-10 The Coca-Cola Company Methods for measuring the degree of ionization and the rate of evaporation in a vapor deposition coating system
US5997705A (en) * 1999-04-14 1999-12-07 Vapor Technologies, Inc. Rectangular filtered arc plasma source
US20040052996A1 (en) * 2000-08-24 2004-03-18 Mark Rule Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same
US6811826B2 (en) 2000-08-24 2004-11-02 The Coca-Cola Company Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and UV barrier and method for making same
US6808753B2 (en) 2000-08-24 2004-10-26 The Coca-Cola Company Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same
US20040052995A1 (en) * 2000-08-24 2004-03-18 Mark Rule Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and UV barrier and method for making same
US6740378B1 (en) 2000-08-24 2004-05-25 The Coca-Cola Company Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same
US6720052B1 (en) 2000-08-24 2004-04-13 The Coca-Cola Company Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same
US20040069233A1 (en) * 2000-12-18 2004-04-15 Pavel Holubar Apparatus for evaporation of materials for coating of objects
US6599584B2 (en) 2001-04-27 2003-07-29 The Coca-Cola Company Barrier coated plastic containers and coating methods therefor
US20030233980A1 (en) * 2001-04-27 2003-12-25 George Plester Systems for making barrier coated plastic containers
US20030194563A1 (en) * 2002-04-15 2003-10-16 Yu Shi Coating composition containing an epoxide additive and structures coated therewith
US6982119B2 (en) 2002-04-15 2006-01-03 The Coca-Cola Company Coating composition containing an epoxide additive and structures coated therewith
US20030219556A1 (en) * 2002-04-15 2003-11-27 Yu Shi Coating composition containing an epoxide additive and structures coated therewith
US20040007455A1 (en) * 2002-04-22 2004-01-15 Pivot A.S. Arc-coating process with rotating cathodes
US6926811B2 (en) * 2002-04-22 2005-08-09 Pivot A.S. Arc-coating process with rotating cathodes
US20060175190A1 (en) * 2002-12-19 2006-08-10 Unaxis Balzers Ltd. Vacuum arc source comprising a device for generating a magnetic field
US7867366B1 (en) 2004-04-28 2011-01-11 Alameda Applied Sciences Corp. Coaxial plasma arc vapor deposition apparatus and method
US8038858B1 (en) 2004-04-28 2011-10-18 Alameda Applied Sciences Corp Coaxial plasma arc vapor deposition apparatus and method
US20070251816A1 (en) * 2006-05-01 2007-11-01 Vapor Technologies, Inc. Bi-directional filtered arc plasma source
US7498587B2 (en) 2006-05-01 2009-03-03 Vapor Technologies, Inc. Bi-directional filtered arc plasma source
US7524385B2 (en) 2006-10-03 2009-04-28 Elemetric, Llc Controlled phase transition of metals
US20080078481A1 (en) * 2006-10-03 2008-04-03 Mcgrath Terrence S Controlled phase transition of metals
US20080138529A1 (en) * 2006-12-11 2008-06-12 Ge Global Research Center Method and apparatus for cathodic arc ion plasma deposition
US7879203B2 (en) * 2006-12-11 2011-02-01 General Electric Company Method and apparatus for cathodic arc ion plasma deposition
US20110073471A1 (en) * 2006-12-11 2011-03-31 General Electric Company Method and apparatus for cathodic arc ion plasma deposition
US8387561B2 (en) 2006-12-11 2013-03-05 General Electric Company Method and apparatus for cathodic arc ion plasma deposition
US20090242397A1 (en) * 2008-03-31 2009-10-01 General Electric Company Systems for controlling cathodic arc discharge
US20120228124A1 (en) * 2009-11-23 2012-09-13 Stan Veprek Method of creating pvd layers using a cylindrical rotating cathode and apparatus for carrying out this method
CN111893440A (en) * 2020-09-04 2020-11-06 江苏徐工工程机械研究院有限公司 Arc ion coating device
US20230036704A1 (en) * 2021-07-30 2023-02-02 Jiangsu Xcmg Construction Machinery Research Institute Ltd. Arc ion coating device and coating method

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EP0284145A1 (en) 1988-09-28
NL8700620A (en) 1988-10-17
JPH01234562A (en) 1989-09-19
CA1296050C (en) 1992-02-18

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