US4737639A - Energy and analysis detection system for surface chemical analysis - Google Patents
Energy and analysis detection system for surface chemical analysis Download PDFInfo
- Publication number
- US4737639A US4737639A US07/063,806 US6380687A US4737639A US 4737639 A US4737639 A US 4737639A US 6380687 A US6380687 A US 6380687A US 4737639 A US4737639 A US 4737639A
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- lens
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/44—Energy spectrometers, e.g. alpha-, beta-spectrometers
- H01J49/46—Static spectrometers
- H01J49/48—Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter
- H01J49/484—Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter with spherical mirrors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/022—Circuit arrangements, e.g. for generating deviation currents or voltages ; Components associated with high voltage supply
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/025—Detectors specially adapted to particle spectrometers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/06—Electron- or ion-optical arrangements
Definitions
- This invention relates to analytical instruments, and more particularly to an instrument particularly adapted for surface chemical studies of materials using x-ray photoelectron spectroscopy (XPS or ESCA) and ion scattering spectrometry (ISS) techniques.
- the invention can also be used for other spectroscopic techniques which require information on the energy distribution of electrons or ions excited from gaseous, liquid, or solid samples.
- the present invention is particularly adapted, among other possible uses, for the surface analysis of semiconductors, polymers, and insulating materials used in the semiconductor industry, as well as fracture analysis of glasses, friction and wear studies of bearings, corrosion analysis, adhesion studies of composite materials, catalyst pellet analysis, fracture and failure analysis of metals, magnetic storage media, and optical coatings, for example.
- ESCA is a technique whereby a solid sample is irradiated with low energy photons causing photoelectrons to be emitted from surface atoms.
- the emitted photoelectrons are energy analyzed and detected, with the resulting signal acting as a "fingerprint" for elements on the sample surface.
- the instrument of the present invention measures the kinetic energies of the emitted electrons and from these measurements the elemental and chemical composition of the outermost about 20 atomic layers can be determined.
- ISS is a technique whereby a solid sample is bombarded with monoenergetic ions and the energies of the scattered ions are determined.
- the instrument of the present invention measures the kinetic energy distribution of the scattered ions, and from this measurement, the elemental composition of the single outermost atomic layer can be determined.
- Objects of this invention reside in the provision of an energy analysis and detection system for surface chemical analysis, which provides constant area mode analysis independent of kinetic energy, which provides computer selectable image magnification for small solid angle or large solid angle detection capability, which provides dual polarity energy analyzer controls for both electron spectroscopy and ion scattering spectrometry, and which provides analyzer control for both large area and small area modes of operation using HeI, HeII, NeI, NeII, Mg, K ⁇ , A1K ⁇ , SiK ⁇ , ArL ⁇ , AnM ⁇ , AgZ ⁇ , or TiK ⁇ photon sources.
- the constant area mode of analysis independent of kinetic energy allows the analyst to use a full range of photo sources for non-destructive depth profiling and enhanced chemical identification while remaining confident that the data originated from a single area, rather than a mixture of areas dependent on kinetic energies.
- the computer selectable image magnification allows the operator to trade excellent resolution of angle-resolved ESCA data in the large area mode for enhanced ESCA sensitivity in the small area mode.
- the dual polarity energy analyzer controls allow analysis of both negatively charged electrons for ESCA and positively charged ions for ISS.
- Image magnification selection and adjustable mechanical apertures function for electrons and for positive ions, allowing the analyzer to be used for both large area and small area ESCA and ISS.
- the focused x-ray source used for small area definition in heretofore known systems did not allow the systems to perform small spot ISS. This eliminated the possibility of using complimentary ESCA and ISS data from the same selected area of analysis to obtain a more complete understanding of the surface chemistry.
- the analyzer control electronics permit analysis of electrons from about 0eV to about 4800 eV and positive ions from about 0eV to about 3200 eV, for example. This allows the analyzer to be used for electron spectroscopy for a wide range of ultra-violet sources, e.g. HeI, HeII, NeI, NeII, as well as for x-ray sources from the lower energy MgK ⁇ to the higher energy TiK ⁇ .
- ultra-violet sources e.g. HeI, HeII, NeI, NeII
- the invention contemplates in one form thereof the provision of a new and improved energy analysis and detection system for surface chemical analysis, which comprises input lens means for receiving charged particles.
- This lens means has a first lens stage for analysis area and angular acceptance definition and a second lens stage for energy adjustment.
- Aperture means are interposed between the first lens stage and the second lens stage.
- the system includes a spherical capacitor energy analyzer for receiving the output from the lens means and performing spectroscopic energy resolution.
- Detection circuitry means are provided for receiving the output from the spherical capacitor energy analyzer and counting the charged particles.
- FIG. 1 is a schematic drawing of an energy analysis and detection system for surface chemical analysis according to the present invention
- FIG. 2 is a medial cross-sectional view showing details of the lens construction according to the present invention.
- FIGS. 3A and 3B are schematic drawings showing the optical principle governing the variable magnification of the first stage of the lens
- FIGS. 4A and 4B show radial sections of the first stage of the lens with calculated particle trajectories for two operating modes of the present invention
- FIG. 5 which consists of FIGS. 5A and 5B is a more detailed schematic of the present invention with the corresponding electronics indicated;
- FIG. 6 shows a radial section of the second stage of the lens with calculated particle trajectories
- FIG. 7A, 7B, 8A and 8B show scanning electron images of the analysis areas at electron kinetic energies of 250 eV and 1250 eV, which are the end point energies of a typical ESCA survey spectrum exited by Mg K x-radiation.
- an energy analysis and detection system for surface chemical analysis comprises input optics or input lens means, indicated generally at 10 in FIG. 1, for receiving charged particles from a sample 12.
- the input lens assembly or means defines the acceptance area and solid angle of collection of the particles and also acts as a coarse energy filter, focussing only electrons or ions in a moderate kinetic energy range into a 180° energy resolving spherical capacitor energy analyzer (SCA) indicated at 14 in FIG. 1.
- SCA spherical capacitor energy analyzer
- This analyzer performs the precise spectroscopic energy resolution function.
- a detection means and associated circuitry, indicated generally at 16 receive the output from the spherical capacitor energy analyzer, amplify the output, and count the charged particles.
- the input lens has two distinct sections or stages 18 and 20, as best seen in FIG. 1.
- the first stage defines the analysis area and angular acceptance by creating an image of the sample 12 on an intermediate aperture plane 22.
- the area of analysis can be made constant for either electrons or ions, independent of their kinetic energy.
- This constant area definition is an improvement over designs known heretofore and is the result of using a non-retarding lens for the first stage.
- the electrons or ions which pass through the aperture in this plane are then focussed onto the input plane of the SCA 14, indicated at 24 in FIG. 1, with concurrent energy retardation.
- high sensitivity is then achieved by the optimum choice of potentials in the second stage 20 of the input lens means 10. Because imaging is of secondary importance in the second stage 20 a wider range of lens voltages can be considered in the optimization process.
- the illustrated input lens means 10 is a computer 26 controlled, multi-element system enclosed in a cylindrical magnetic shield 21 to eliminate undesirable electron trajectory distortion by stray magnetic fields.
- the two stages 18 and 20 each have a different function.
- the front or first stage 18 images electrons or ions leaving the sample 12 onto the plane of the intermediate aperture with a magnification selected through the computer 26 via the control electronics 27.
- the intermediate aperture assembly 28 includes a set of four mechanically selectable apertures 30, 32, 34 and 36 positionable at the focal plane of the first stage.
- the apertures used in the preferred embodiment are three circular apertures which have diameters of 0.5 mm, 2 mm, and 4 mm, plus a rectangular aperture with dimensions of 3 mm by 8 mm.
- the size of the image area can be varied over a wider range such as, for example, areas up to about 3 mm by about 8 mm or areas down to about 200 ⁇ m in diameter.
- the first stage is composed of two electrically-biasable elements 38 and 40 isolated by insulators 42 from an electrically-grounded frame 44.
- the frame 44 is further shaped by elements 46 and 48 to provide a lens contour which tailors the electrostatic field distributions to minimize spherical aberration.
- the magnification of the lens can be changed from approximately -1 to approximately -5 because the effective position of the lens can be moved from a position approximately mid-way between the sample 12 and aperture plane 22 to a position approximately one-sixth of the distance from the sample 12 to the aperture plane 22.
- magnification, M of an object in the sample plane imaged at the image plane
- the object size is equal to the analysis area, by definition, and selectively changing the voltages applied to the elements 38 and 40 moves the effective lens position and adjusts the lens strength.
- the image size is defined by and equal to the aperture size, the equation above indicates that each dimension of the analysis area will equal the corresponding aperture dimension divided by the magnification, M, as when in FIGS. 3A and 3B. Furthermore, this last statement implies that in two dimensions the analysis area, A(an), and aperture area, A(ap), are related by:
- Helmholtz-Lagrange equation which relates the angular distribution of particles which can pass through areas at any two planes in a charged particle optical system.
- Helmholtz-Lagrange equation is:
- A(1), O(1), and E(1) are the area of, for example, an aperture in plane 1 of the optical systems
- O(1) is the solid angle of the particle distribution passing through plane 1
- E(1) is the kinetic energy of particles passing through plane 1
- O(2), and E(2) are the maximum solid angle and kinetic energy, respectively, of the charged particle distribution passing through an area A(2) in plane 2 of the optical system.
- the maximum current or signal, S(2) which can pass through an aperture in plane 2 of the optical system is proportional to the product of the aperture area A(2) times the solid angle O(2):
- the lens and spectrometer design goal is to maximize the signal, hence, the angular acceptance, within the constraints imposed by the desired analysis area, the overall spectrometer dimensions, and the desired energy resolution.
- the energy resolution, dE, of the spherical capacitor energy analyzer can be expressed as:
- E is the pass energy, or the energy to which the analyzer is tuned
- W1 is the input slit width in the radial direction
- W2 is the exit slit width or effective detector element slit width in the radial direction
- R is the mean radius of the analyzer
- a is the half-angle in the radial direction of the input particle distribution.
- FIGS. 4A and 4B The relationship between this simple thin lens optical analog to the variable magnification input lens is shown schematically in FIGS. 4A and 4B. These figures present a radial section through the first stage with charged particle trajectories which were calculated for optimized electrode shapes and two different sets of lens voltages.
- FIG. 4A presents the trajectories for the lens biasing mode which results in unity magnification.
- the trajectories start on the lens axis at the sample plane with a radical position of zero and at angular inclinations of 2°, 4°, 6° and 8°. Because the analysis area dimensions are approximately equal to the intermediate aperture dimensions, this mode is referred to as the "Large Area" mode.
- the lens has ground potential on electrode elements 44, 46, 48 and 38, and a potential numerically equal to a fraction of the charged particle kinetic energy on element 40.
- the resultant electrostatic lens is very nearly symmetrically positioned between the sample and aperture planes.
- the trajectories with initial angles which exceed approximately 4° are focussed in front of the aperture plane and are unable to pass through the aperture.
- the angular acceptance in this operating mode with unity magnification is approximately 4°.
- FIG. 4B presents the trajectories of the lens biasing mode which results in a magnification of approximately 3.
- the trajectories start on the lens axis at the sample plane with a radial position of zero and at angular inclinations of 2°, 4°, 6°, 8°, 10° and 12°. Because the analysis area dimensions are about 1/3 of the intermediate aperture dimensions, this mode is referred to as the "Small Area" mode.
- the lens has ground potential on electrodes 44, 46 and 48, and potentials numerically equal to fractions of the charged particle kinetic energy on elements 38 and 40.
- the resultant effective electrostatic lens position is displaced toward the sample plane 12 and causes the magnification to increase.
- the trajectories with initial angles which exceed approximately 10° are focussed in front of the aperture plane and are unable to pass through the aperture.
- the angular acceptance in this operating mode with a magnification of 3 ⁇ is approximately 10°.
- the function of the first stage of the lens is to form an electron image of the sample at the intermediate aperture with low aberrations in order to sharply define the analysis area. Because no electron energy modification is necessary in this case, the electrons have the same kinetic energy at both the entrance to and exit from the first stage.
- This allows the focussing potentials applied to the lens elements to be proportional to the retarding potential applied to analyzer, hence a resistive voltage divider 70 shown in FIG. 5 can be used to derive the lens potentials.
- an output from the computer 26 is used to switch relays 72 and 74 of the control electronics 27, which connect the lens elements 38 and 40 to the optimum points on the voltage divider 70.
- computer control selects the first stage magnification and the solid angle of particle detection.
- the acceptance angle can be decreased to + or -4° allowing the analyzer to perform angle-dependent ESCA studies with take-off angles from about 5° to about 90°. This range of take-off angles makes it possible to vary the depth of analysis on smooth surfaces from about 1 to about 20 molecular layers in a non-destructive manner.
- the acceptance angle is increased to increase the sensitivity of analysis. This allows the operator to select optimized angle-resolved ESCA results in the large area mode or optimized ESCA sensitivity in the small spot mode.
- the second set or stage of lens elements 20 defines the energy of and focusses the electrons or ions onto the entrance plane of the spherical capacitor energy analyzer 14.
- Eq. 3 electrons or ions with kinetic energy E(1) and angular distribution O(1) enter the second stage through the intermediate aperture which has an area A(1).
- the charged particles are then retarded in energy to a kinetic energy E(2) and focussed onto the analyzer input slit 24 which has an area A(2). Because E(2) is less than E(1), the energy resolution of the spectrometer system is improved and the angular distribution O(2) of the particles at the entrance slit 24 is greater than the angular distribution O(1), hence, the analyzer is more effectively filled so the signal is increased.
- the second stage is composed of four electrically-biasable elements 52, 54, 56 and 58 isolated by insulators 42 from an electrically-grounded frame 60.
- the fourth element, 56 is an aperture which limits the angular distribution of particles entering the analyzer in order to maintain acceptable energy resolution as noted in the discussion of Eq. 5.
- a resistive voltage divider 76 of the control electronics 27, FIG. 5, is used to maintain this aperture at a potential between the potentials applied to elements 54 and 58.
- the shapes of elements 52, 54 and 58 are adapted from a design by Wannberg and Skollermo (see references).
- a and B are constants which depend upon the pass energy being used and V(retard) is the value of the retarding voltage.
- the output voltage from power supply 80 is programmed to have a constant value with respect to the output of the retarding voltage supply 82.
- C is a constant which also depends upon the pass energy being used.
- the values of these constants as a function of pass energy have been determined experimentally and are stored in the computer memory.
- the voltage for element 58, provided by a third independently programmable power supply 84, has a value with respect to the retarding voltage supply 82 which is numerically equal to the pass energy.
- FIG. 6 presents representative trajectories calculated for charged particles in the second stage for the operating condition in which the particle energy is retarded by a factor of 12.
- the trajectories originate on the lens axis in the intermediate aperture plane at angular inclinations of 4°, 6°, 8°, 10+ and 12°.
- the radial trajectory distribution at the input slit to the analyzer is much broader than the trajectory distribution at the output of the first stage. This graphically illustrates the increase in the angular distribution of the particles with retardation in the second stage.
- the ions or electrons pass through the 180° hemispherical sector analyzer 14 to the detector means 16.
- This type of analyzer permits the use of either a conventional single channel detector (SCD) or a conventional position sensitive detector (PSD) for electron or ion detection, this modular detector system allows the user to configure a high sensitivity instrument using the PSD detector or a lower cost instrument using the SCD detector, depending on the analytical requirements, and still have the flexibility to update to the other detector in the future.
- FIG. 7A shows a scanning electron image of an analysis area of 360 micrometer diameter at an electron kinetic energy of 250 eV
- FIG. 7B shows the same area at an electron kinetic area of 1250 eV
- FIG. 8A shows a scanning electron image of an analysis area of 2 ⁇ 8 mm at an electron kinetic energy of 250 eV
- FIG. 8B shows the same area at a kinetic energy of 1250 eV.
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- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Description
M=-I/O (1)
A(an)=A(ap)/M*M (2)
A(1)*O(1)*E(1)=A(2)*O(2)*E(2) (3)
S(2)=c*A(2)*O(2) (4)
dE=E*(((W1+W2)/2R)+a*a) (5)
V(78)=A*V(retard)+B (6)
V(80)=C (7)
Claims (8)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/063,806 US4737639A (en) | 1985-07-15 | 1987-06-24 | Energy and analysis detection system for surface chemical analysis |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US75505085A | 1985-07-15 | 1985-07-15 | |
| US07/063,806 US4737639A (en) | 1985-07-15 | 1987-06-24 | Energy and analysis detection system for surface chemical analysis |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US75505085A Continuation | 1985-07-15 | 1985-07-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US4737639A true US4737639A (en) | 1988-04-12 |
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ID=26743829
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US07/063,806 Expired - Lifetime US4737639A (en) | 1985-07-15 | 1987-06-24 | Energy and analysis detection system for surface chemical analysis |
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| Country | Link |
|---|---|
| US (1) | US4737639A (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5089699A (en) * | 1989-03-14 | 1992-02-18 | Hitachi, Ltd. | Secondary charged particle analyzing apparatus and secondary charged particle extracting section |
| US5128543A (en) * | 1989-10-23 | 1992-07-07 | Charles Evans & Associates | Particle analyzer apparatus and method |
| US5185524A (en) * | 1990-05-22 | 1993-02-09 | Kratos Analytical Limited | Charged particle energy analyzers |
| US5285066A (en) * | 1991-07-02 | 1994-02-08 | Jeol Ltd. | Imaging XPS system |
| EP0617453A1 (en) * | 1993-03-26 | 1994-09-28 | FISONS plc | Charged particle analyser |
| US6608308B1 (en) * | 1999-05-26 | 2003-08-19 | Nikon Corporation | Electrostatic lens systems for secondary-electron mapping-projection apparatus, and mapping-projection apparatus and methods comprising same |
| US20040238735A1 (en) * | 2001-10-26 | 2004-12-02 | Larson Paul E. | System and method for depth profiling and characterization of thin films |
| US7561438B1 (en) | 2004-12-22 | 2009-07-14 | Revera Incorporated | Electronic device incorporating a multilayered capacitor formed on a printed circuit board |
| US11002693B2 (en) * | 2019-07-09 | 2021-05-11 | Scienta Omicron Ab | Hard X-ray photoelectron spectroscopy system |
| US11311917B2 (en) | 2007-08-09 | 2022-04-26 | Bruker Nano, Inc. | Apparatus and method for contamination identification |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4048498A (en) * | 1976-09-01 | 1977-09-13 | Physical Electronics Industries, Inc. | Scanning auger microprobe with variable axial aperture |
| US4358680A (en) * | 1979-11-30 | 1982-11-09 | Kratos Limited | Charged particle spectrometers |
-
1987
- 1987-06-24 US US07/063,806 patent/US4737639A/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4048498A (en) * | 1976-09-01 | 1977-09-13 | Physical Electronics Industries, Inc. | Scanning auger microprobe with variable axial aperture |
| US4358680A (en) * | 1979-11-30 | 1982-11-09 | Kratos Limited | Charged particle spectrometers |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5089699A (en) * | 1989-03-14 | 1992-02-18 | Hitachi, Ltd. | Secondary charged particle analyzing apparatus and secondary charged particle extracting section |
| US5128543A (en) * | 1989-10-23 | 1992-07-07 | Charles Evans & Associates | Particle analyzer apparatus and method |
| US5185524A (en) * | 1990-05-22 | 1993-02-09 | Kratos Analytical Limited | Charged particle energy analyzers |
| US5285066A (en) * | 1991-07-02 | 1994-02-08 | Jeol Ltd. | Imaging XPS system |
| EP0617453A1 (en) * | 1993-03-26 | 1994-09-28 | FISONS plc | Charged particle analyser |
| US5506414A (en) * | 1993-03-26 | 1996-04-09 | Fisons Plc | Charged-particle analyzer |
| US6608308B1 (en) * | 1999-05-26 | 2003-08-19 | Nikon Corporation | Electrostatic lens systems for secondary-electron mapping-projection apparatus, and mapping-projection apparatus and methods comprising same |
| US20040238735A1 (en) * | 2001-10-26 | 2004-12-02 | Larson Paul E. | System and method for depth profiling and characterization of thin films |
| US7449682B2 (en) * | 2001-10-26 | 2008-11-11 | Revera Incorporated | System and method for depth profiling and characterization of thin films |
| US7561438B1 (en) | 2004-12-22 | 2009-07-14 | Revera Incorporated | Electronic device incorporating a multilayered capacitor formed on a printed circuit board |
| US11311917B2 (en) | 2007-08-09 | 2022-04-26 | Bruker Nano, Inc. | Apparatus and method for contamination identification |
| US11002693B2 (en) * | 2019-07-09 | 2021-05-11 | Scienta Omicron Ab | Hard X-ray photoelectron spectroscopy system |
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