US4470886A - Gold alloy electroplating bath and process - Google Patents
Gold alloy electroplating bath and process Download PDFInfo
- Publication number
- US4470886A US4470886A US06/454,503 US45450383A US4470886A US 4470886 A US4470886 A US 4470886A US 45450383 A US45450383 A US 45450383A US 4470886 A US4470886 A US 4470886A
- Authority
- US
- United States
- Prior art keywords
- electroplating bath
- cobalt
- alkali metal
- gold
- bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/62—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing of the conductive pattern
- H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
Definitions
- the present invention relates to an improved gold ternary alloy electroplating bath and process wherein the combination of alloying metals is gold, cobalt, and molybdenum. More particularly, the invention pertains to a gold ternary alloy electroplating bath and process from which deposits on various substrates, both in the electronic and decorative fields, having improved physical properties such as substantially enhanced wear resistance, and the like are produced.
- Freedman et al. in U.S. Pat. No. 3,598,706 claimed an electrodeposition solution for producing gold and gold based alloy deposits employing the cyanoaurate (III) complex.
- the preferred form was the cyanoauric acid as opposed to the potassium or sodium salt because of the advantage of not producing alkali metal hydroxide during the operation of the bath.
- the solution was operated at pH less than 3 and preferentially at 1.5 using citric and phosphoric acid, at current densities between 2 and 8.6 ASD and at temperatures between 35° and 50° C.
- the solution was buffered with a compound chosen from a group consisting of citrates, phosphates and tartrates.
- the use of the cyanoaurate (III) salts always contained a variable amount of the gold (I) complex and this was true no matter what method they used for producing the gold (III) salt.
- the cyanoaurate (I) complex decomposes precipitating AuCN at the low pH required for optimum deposition conditions.
- the former compound readily reacted with the acid to form ethylenediamine hydrochloride which provides a ready supply of chloride ions.
- the invention was aimed at electrodepositing gold on unactivated stainless steel, and it was felt that the presence of chloride and nitrate ions in an acid media provided a dilute aqua regia-like composition which would adequately prepare such a surface. Alloying metals such as nickel, cobalt, copper, tin, and indium were disclosed in this patent.
- One object of the present invention is to provide an improved gold (III) ternary alloy electroplating bath.
- Another object of the present invention is to provide a trivalent gold ternary alloy electroplating bath which avoids the disadvantages attendant upon previously suggested gold (III) electroplating systems.
- a further object of the present invention is to provide a gold (III), cobalt, and molybdenum ternary alloy electroplating bath which has markedly improved wear resistance.
- a gold (III) ternary alloy electroplating bath can be attained by utilizing an alkali metal auricyanide in combination with a water soluble cobalt inorganic salt, such as sulfate, and a water soluble molybdenum inorganic salt such as an alkali metal molybdate.
- a water soluble cobalt inorganic salt such as sulfate
- a water soluble molybdenum inorganic salt such as an alkali metal molybdate.
- the use of cobalt sulfate and sodium molybdate are preferred and citric acid is preferred as the matrix.
- the electroplating bath contains a wetting agent or sulfactant such as alkali metal perfluoroalkyl sulfonate, as well as a stress reducer-brightener such as sodium saccharin.
- a wetting agent or sulfactant such as alkali metal perfluoroalkyl sulfonate
- a stress reducer-brightener such as sodium saccharin.
- one of the essential features of the present invention is to employ, as the source of the gold in the electroplating bath, a water-soluble gold complex or compound wherein the gold ion is in the trivalent state.
- the preferred gold material is an alkali metal auricyanide, and the especially preferred gold component is potassium auricyanide.
- the bath will contain from about 4 to 16 grams per liter, preferably 7 to 12.5 grams per liter of the alkali metal auricyanide.
- the trivalent gold salts will contain from about 52 to 54%, and preferably from about 53 to about 54% gold metal. It is important that the alkali metal auricyanide be substantially free of chloride ions.
- the alloying metal components are (a) cobalt inorganic salts such as cobalt sulfate, often in the hydrated form; and (b) molybdenum inorganic salts such as an alkali metal molybdate.
- concentration of the cobalt salt ranges from about 2 to 16 grams per liter, while the alkali metal molybdate concentration ranges from about 1 to 6 grams per liter.
- the cobalt inorganic salt will range from about 2.5 to 9.5 grams per liter, while the alkali metal molybdate will range from about 1.2 to 3.8 grams per liter.
- the bath matrix or electrolyte preferred for the present invention is citric acid.
- Other acids such as the carboxylic acids, may also be utilized in concentrations ranging from about 100 to 400 ml/l, and preferably from about 200 to 300 ml/l.
- an anionic fluorochemical wetting agent or surfactant such as a blend of potassium perfluoroalkyl sulfonates, sold under the trademarks FC-98 and FC-95 by the Minnesota Mining and Manufacturing Company, may be usefully employed.
- the amount of wetting agent or surfactant will generally range from about 2 to 15 ml/l, preferably from about 4 to 10 ml/l.
- FC-95 and FC-98 are potassium perfluoroalkyl sulfonates, and their use is generally preferred. Both FC-95 and FC-98 decompose at 390° C.
- FC-95 has a pH of 7-8
- FC-98 has a pH of 6-8
- FC-98 is slightly less surface active and is capable of producing foam that is less dense and less stable. Both types have outstanding chemical and thermal stability, especially in acidic and oxidizing systems.
- the method of preparing these perfluoroalkyl sulfonates is disclosed in U.S. Pat. No. 2,519,983 to Simons; while a prior art use of such surfactants in electroplating is illustrated by U.S. Pat. No. 2,740,334 to Brown. The teachings of these patents are incorporated herein by reference.
- baths of this invention will contain a stress reduce-brightener such as organic compounds containing nitrogen and sulfur atoms, for example, alkali metal saccharin, etc. Minor amounts of this additive will be employed, with amounts ranging from 25 to 75 mg/l being found quite useful.
- a stress reduce-brightener such as organic compounds containing nitrogen and sulfur atoms, for example, alkali metal saccharin, etc. Minor amounts of this additive will be employed, with amounts ranging from 25 to 75 mg/l being found quite useful.
- the pH of the electroplating bath may be within the range of from about 1 to 2, and preferably from about 1.2 to 1.5.
- Current densities will range from 3.0 to 7.5 ASD, preferably from 4.6 to 6.1 ASD. Although higher current densities may give a higher alloy concentration, the resulting alloy deposit is more brittle.
- the electroplating bath of this invention will be maintained at a temperature of from about 45° to 65° C.
- Substrate treatment times will, of course, vary widely depending upon such factors as the type of substrate, the deposit of thickness required, etc.
- the electroplating baths of this invention may be effectively utilized for plating operations both in the electronic as well as in the decorative field.
- Illustrative substrates including brass, copper, copper alloys, steel, stainless steel, as well as other commercial metals and alloys.
- a metal substrate such as a brass panel may be subjected to a degreasing step using a hot alkaline solution followed by rinsing with deionized water. The panel may then be dipped in hydrochloric or sulfuric acid maintained at elevated temperatures. Finally, there may be another rinsing treatment with deionized water. Since all of these and other pretreatment or precleaning treatments are well known in the art, the exact procedure employed is not a feature of the present invention.
- An electroplating bath was prepared from the ingredients set forth below:
- the bath had a pH of 1.5 and a specific gravity of 16.0° Be.
- a brass panel was electroplated with vigorous stirring at 50° C., a current density of 4.6 ASD, and a plating rate of 6.7 mg/A-minute.
- the deposited alloy coating was composed of 1.5% by weight, cobalt, 0.2% by weight molybdenum and the balance gold.
- the thickness of the bright, grey tinted deposit was about 20 micrometers. It has a hardness of 269 KHN. Remarkable wear resistance was revealed when the alloy survived crossed-wire wear tests of up to 20,000 passes at a deposit thickness of 80 microinches. This wear resistance is determined by using a crossed-wire tester reciprocating at 2 cycles per minute with a 200 gram load.
- An electroplating bath was prepared from ingredients set forth below:
- This bath also had a pH of 1.5 and a specific gravity of 16° Be.
- a brass panel was electroplated with vigorous stirring at 50° C., a current density 6.1 ASD, and a plating rate of 8.4 mg/A minute.
- the deposited alloy was composed of 1.8% by weight cobalt, 0.4% by weight molybdenum, and the balance being gold. It has a hardness of 253 KHN. Remarkable wear resistance was demonstrated again when the alloy survived crossed-wire wear tests of up to 20,000 passes at a deposit thickness of about 80 microinches.
- An electroplating bath was prepared from the ingrediets set forth below:
- the pH of this bath was 1.2 and the specific gravity was 16° Be.
- a brass panel was electroplated with vigorous stirring at 50° C., a current density of 4.6 ASD, and a plating rate of 8.4 mg/A-minute.
- the deposited alloy was composed of 1.0% by weight of cobalt, 0.26% by weight molybdenum, and the balance gold. It had a hardness of 263 KHN. When subjected to the wear resistance test described in Example I this alloy also survived up to 20,000 passes at a deposit thickness of about 80 microinches.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
______________________________________
INGREDIENTS AMOUNTS (g/l)
______________________________________
Potassium auricyanide
7
Cobalt sulfate 9
Sodium molybdate 15
Citric acid 300
Sodium saccharin 50 mg/l
FC-98 10 mg/l
Water Balance
______________________________________
______________________________________
INGREDIENTS AMOUNTS (g/l)
______________________________________
Potassium auricyanide
10
Cobalt sulfate 9
Sodium molybdate 3.8
Citric Acid 300
Sodium saccharin 50 mg/l
FC-98 10 ml/l
Water Balance
______________________________________
______________________________________
INGREDIENTS AMOUNT (g/l)
______________________________________
Potassium Auricyanide
12.5
Cobalt sulfate 4.7
Sodium molybdate 1.5
Citric acid 300
Sodium saccharin 50 mg/l
FC-98 10 ml/l
Water Balance
______________________________________
Claims (17)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/454,503 US4470886A (en) | 1983-01-04 | 1983-01-04 | Gold alloy electroplating bath and process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/454,503 US4470886A (en) | 1983-01-04 | 1983-01-04 | Gold alloy electroplating bath and process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US4470886A true US4470886A (en) | 1984-09-11 |
Family
ID=23804872
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US06/454,503 Expired - Fee Related US4470886A (en) | 1983-01-04 | 1983-01-04 | Gold alloy electroplating bath and process |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | US4470886A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6099624A (en) * | 1997-07-09 | 2000-08-08 | Elf Atochem North America, Inc. | Nickel-phosphorus alloy coatings |
| US6576114B1 (en) | 1995-11-03 | 2003-06-10 | Enthone Inc. | Electroplating composition bath |
| US20040231999A1 (en) * | 2003-05-21 | 2004-11-25 | Morrissey Ronald J. | Electroplating solution for alloys of gold with tin |
| WO2016115494A1 (en) * | 2015-01-16 | 2016-07-21 | Hutchinson Technology Incorporated | Gold electroplating solution and method |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3598706A (en) * | 1967-12-11 | 1971-08-10 | Trifari Krussman And Fishel In | Acid gold plating baths |
| US4013523A (en) * | 1975-12-24 | 1977-03-22 | Oxy Metal Industries Corporation | Tin-gold electroplating bath and process |
| US4168214A (en) * | 1978-06-14 | 1979-09-18 | American Chemical And Refining Company, Inc. | Gold electroplating bath and method of making the same |
| US4358350A (en) * | 1980-06-10 | 1982-11-09 | Degussa Ag | Strongly acid gold alloy bath |
| US4391679A (en) * | 1980-04-03 | 1983-07-05 | Degussa Aktiengesellschaft | Electrolytic bath and process for the deposition of gold alloy coatings |
-
1983
- 1983-01-04 US US06/454,503 patent/US4470886A/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3598706A (en) * | 1967-12-11 | 1971-08-10 | Trifari Krussman And Fishel In | Acid gold plating baths |
| US4013523A (en) * | 1975-12-24 | 1977-03-22 | Oxy Metal Industries Corporation | Tin-gold electroplating bath and process |
| US4168214A (en) * | 1978-06-14 | 1979-09-18 | American Chemical And Refining Company, Inc. | Gold electroplating bath and method of making the same |
| US4391679A (en) * | 1980-04-03 | 1983-07-05 | Degussa Aktiengesellschaft | Electrolytic bath and process for the deposition of gold alloy coatings |
| US4358350A (en) * | 1980-06-10 | 1982-11-09 | Degussa Ag | Strongly acid gold alloy bath |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6576114B1 (en) | 1995-11-03 | 2003-06-10 | Enthone Inc. | Electroplating composition bath |
| US6099624A (en) * | 1997-07-09 | 2000-08-08 | Elf Atochem North America, Inc. | Nickel-phosphorus alloy coatings |
| US20040231999A1 (en) * | 2003-05-21 | 2004-11-25 | Morrissey Ronald J. | Electroplating solution for alloys of gold with tin |
| US7279086B2 (en) | 2003-05-21 | 2007-10-09 | Technic, Inc. | Electroplating solution for alloys of gold with tin |
| WO2016115494A1 (en) * | 2015-01-16 | 2016-07-21 | Hutchinson Technology Incorporated | Gold electroplating solution and method |
| US10570525B2 (en) | 2015-01-16 | 2020-02-25 | Hutchinson Technology Incorporated | Gold electroplating solution and method |
| US12173423B2 (en) | 2015-01-16 | 2024-12-24 | Hutchinson Technology Incorporated | Gold electroplating solution and method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1009869B1 (en) | Cyanide-free monovalent copper electroplating solutions | |
| US3940319A (en) | Electrodeposition of bright tin-nickel alloy | |
| US4076598A (en) | Method, electrolyte and additive for electroplating a cobalt brightened gold alloy | |
| US3870526A (en) | Electroless deposition of copper and copper-tin alloys | |
| KR102575117B1 (en) | Platinum electrolytic plating bath and platinum plated product | |
| US3925170A (en) | Method and composition for producing bright palladium electrodepositions | |
| JPH11217690A (en) | Electroplating palladium alloy composition and electroplating method using the composition | |
| IE892857L (en) | Improvements in plating | |
| US4066517A (en) | Electrodeposition of palladium | |
| JP7695086B2 (en) | Platinum electrolytic plating bath and platinum plated products | |
| US4242180A (en) | Ammonia free palladium electroplating bath using aminoacetic acid | |
| US4715935A (en) | Palladium and palladium alloy plating | |
| US20030183533A1 (en) | Electrolytic solution for electrochemical deposit of palladium or its alloys | |
| KR910004972B1 (en) | Manufacturing method of tin-cobalt, tin-nickel, tin-lead binary alloy electroplating bath and electroplating bath manufactured by this method | |
| US20040195107A1 (en) | Electrolytic solution for electrochemical deposition gold and its alloys | |
| US5435838A (en) | Immersion plating of tin-bismuth solder | |
| EP0112561B1 (en) | Aqueous electroplating solutions and process for electrolytically plating palladium-silver alloys | |
| US3468676A (en) | Electroless gold plating | |
| EP0073236B1 (en) | Palladium and palladium alloys electroplating procedure | |
| US3892638A (en) | Electrolyte and method for electrodepositing rhodium-ruthenium alloys | |
| US4470886A (en) | Gold alloy electroplating bath and process | |
| US4048023A (en) | Electrodeposition of gold-palladium alloys | |
| GB2089374A (en) | Electrodeposition of palladium and palladium alloys | |
| US4545869A (en) | Bath and process for high speed electroplating of palladium | |
| US6576114B1 (en) | Electroplating composition bath |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AS | Assignment |
Owner name: OCCIDENTAL CHEMICAL CORPORATION, 21441 HOOVER ROAD Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNORS:DUVA, ROBERT;MARX, DANIEL R.;REEL/FRAME:004151/0357;SIGNING DATES FROM 19821220 TO 19830105 |
|
| AS | Assignment |
Owner name: OMI INTERNATIONAL CORPORATION 21441 HOOVER RD WARR Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:OCCIDENTAL CHEMICAL CORPORATION;REEL/FRAME:004175/0761 Effective date: 19830930 Owner name: OMI INTERNATIONAL CORPORATION, 21441 HOOVER ROAD, Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:OCCIDENTAL CHEMICAL CORPORATION;REEL/FRAME:004190/0827 Effective date: 19830915 Owner name: OMI INTERNATIONAL CORPORATION, A DE CORP, MICHIGAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:OCCIDENTAL CHEMICAL CORPORATION;REEL/FRAME:004175/0761 Effective date: 19830930 |
|
| AS | Assignment |
Owner name: MANUFACTURERS HANOVER TRUST COMPANY, A CORP OF NY Free format text: SECURITY INTEREST;ASSIGNOR:INTERNATIONAL CORPORATION, A CORP OF DE;REEL/FRAME:004201/0733 Effective date: 19830930 |
|
| FPAY | Fee payment |
Year of fee payment: 4 |
|
| REMI | Maintenance fee reminder mailed | ||
| FPAY | Fee payment |
Year of fee payment: 8 |
|
| SULP | Surcharge for late payment | ||
| FEPP | Fee payment procedure |
Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
|
| REMI | Maintenance fee reminder mailed | ||
| LAPS | Lapse for failure to pay maintenance fees | ||
| FP | Lapsed due to failure to pay maintenance fee |
Effective date: 19960911 |
|
| STCH | Information on status: patent discontinuation |
Free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362 |