US4470886A - Gold alloy electroplating bath and process - Google Patents
Gold alloy electroplating bath and process Download PDFInfo
- Publication number
- US4470886A US4470886A US06/454,503 US45450383A US4470886A US 4470886 A US4470886 A US 4470886A US 45450383 A US45450383 A US 45450383A US 4470886 A US4470886 A US 4470886A
- Authority
- US
- United States
- Prior art keywords
- electroplating bath
- cobalt
- alkali metal
- gold
- bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 238000009713 electroplating Methods 0.000 title claims abstract description 36
- 238000000034 method Methods 0.000 title claims abstract description 17
- 229910001020 Au alloy Inorganic materials 0.000 title abstract description 5
- 239000003353 gold alloy Substances 0.000 title abstract description 5
- 230000008569 process Effects 0.000 title description 4
- 229910052737 gold Inorganic materials 0.000 claims abstract description 27
- 239000010931 gold Substances 0.000 claims abstract description 27
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 26
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims abstract description 22
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 21
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 17
- 239000010941 cobalt Substances 0.000 claims abstract description 17
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 17
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims abstract description 13
- 150000001340 alkali metals Chemical group 0.000 claims abstract description 13
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 13
- 239000011733 molybdenum Substances 0.000 claims abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 229910002058 ternary alloy Inorganic materials 0.000 claims abstract description 10
- 239000000080 wetting agent Substances 0.000 claims abstract description 6
- -1 alkali metal molybdate Chemical class 0.000 claims description 16
- 150000003839 salts Chemical class 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- 229910052700 potassium Inorganic materials 0.000 claims description 9
- 239000011591 potassium Substances 0.000 claims description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 7
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical group [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 7
- 229940044175 cobalt sulfate Drugs 0.000 claims description 7
- 229910000361 cobalt sulfate Inorganic materials 0.000 claims description 7
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical group [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 claims description 7
- 239000011684 sodium molybdate Substances 0.000 claims description 6
- 235000015393 sodium molybdate Nutrition 0.000 claims description 6
- TVXXNOYZHKPKGW-UHFFFAOYSA-N sodium molybdate (anhydrous) Chemical group [Na+].[Na+].[O-][Mo]([O-])(=O)=O TVXXNOYZHKPKGW-UHFFFAOYSA-N 0.000 claims description 6
- 238000004070 electrodeposition Methods 0.000 claims description 4
- 239000011159 matrix material Substances 0.000 claims description 4
- 239000002659 electrodeposit Substances 0.000 claims description 2
- UHXCUZXGUKQFJO-UHFFFAOYSA-N [Mo].[Co].[Au] Chemical compound [Mo].[Co].[Au] UHXCUZXGUKQFJO-UHFFFAOYSA-N 0.000 claims 3
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 claims 1
- 150000002751 molybdenum Chemical class 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 abstract description 10
- 239000002184 metal Substances 0.000 abstract description 10
- 238000007747 plating Methods 0.000 abstract description 10
- 238000005275 alloying Methods 0.000 abstract description 6
- 239000004615 ingredient Substances 0.000 abstract description 6
- 230000003647 oxidation Effects 0.000 abstract description 6
- 238000007254 oxidation reaction Methods 0.000 abstract description 6
- 150000002739 metals Chemical class 0.000 abstract description 5
- 239000004094 surface-active agent Substances 0.000 abstract description 4
- 229910045601 alloy Inorganic materials 0.000 description 10
- 239000000956 alloy Substances 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 239000002253 acid Substances 0.000 description 7
- CBMIPXHVOVTTTL-UHFFFAOYSA-N gold(3+) Chemical compound [Au+3] CBMIPXHVOVTTTL-UHFFFAOYSA-N 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 229910001369 Brass Inorganic materials 0.000 description 5
- 239000010951 brass Substances 0.000 description 5
- ZBKIUFWVEIBQRT-UHFFFAOYSA-N gold(1+) Chemical compound [Au+] ZBKIUFWVEIBQRT-UHFFFAOYSA-N 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- WINXNKPZLFISPD-UHFFFAOYSA-M Saccharin sodium Chemical compound [Na+].C1=CC=C2C(=O)[N-]S(=O)(=O)C2=C1 WINXNKPZLFISPD-UHFFFAOYSA-M 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- 229910017053 inorganic salt Inorganic materials 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 150000001860 citric acid derivatives Chemical class 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- PXRKCOCTEMYUEG-UHFFFAOYSA-N 5-aminoisoindole-1,3-dione Chemical compound NC1=CC=C2C(=O)NC(=O)C2=C1 PXRKCOCTEMYUEG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 229910001963 alkali metal nitrate Inorganic materials 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001868 cobalt Chemical class 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- HCFPRFJJTHMING-UHFFFAOYSA-N ethane-1,2-diamine;hydron;chloride Chemical compound [Cl-].NCC[NH3+] HCFPRFJJTHMING-UHFFFAOYSA-N 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 150000002343 gold Chemical class 0.000 description 1
- RJHLTVSLYWWTEF-UHFFFAOYSA-K gold trichloride Chemical class Cl[Au](Cl)Cl RJHLTVSLYWWTEF-UHFFFAOYSA-K 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- 229940081974 saccharin Drugs 0.000 description 1
- 235000019204 saccharin Nutrition 0.000 description 1
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 230000004083 survival effect Effects 0.000 description 1
- 150000003892 tartrate salts Chemical class 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/62—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
Definitions
- the present invention relates to an improved gold ternary alloy electroplating bath and process wherein the combination of alloying metals is gold, cobalt, and molybdenum. More particularly, the invention pertains to a gold ternary alloy electroplating bath and process from which deposits on various substrates, both in the electronic and decorative fields, having improved physical properties such as substantially enhanced wear resistance, and the like are produced.
- Freedman et al. in U.S. Pat. No. 3,598,706 claimed an electrodeposition solution for producing gold and gold based alloy deposits employing the cyanoaurate (III) complex.
- the preferred form was the cyanoauric acid as opposed to the potassium or sodium salt because of the advantage of not producing alkali metal hydroxide during the operation of the bath.
- the solution was operated at pH less than 3 and preferentially at 1.5 using citric and phosphoric acid, at current densities between 2 and 8.6 ASD and at temperatures between 35° and 50° C.
- the solution was buffered with a compound chosen from a group consisting of citrates, phosphates and tartrates.
- the use of the cyanoaurate (III) salts always contained a variable amount of the gold (I) complex and this was true no matter what method they used for producing the gold (III) salt.
- the cyanoaurate (I) complex decomposes precipitating AuCN at the low pH required for optimum deposition conditions.
- the former compound readily reacted with the acid to form ethylenediamine hydrochloride which provides a ready supply of chloride ions.
- the invention was aimed at electrodepositing gold on unactivated stainless steel, and it was felt that the presence of chloride and nitrate ions in an acid media provided a dilute aqua regia-like composition which would adequately prepare such a surface. Alloying metals such as nickel, cobalt, copper, tin, and indium were disclosed in this patent.
- One object of the present invention is to provide an improved gold (III) ternary alloy electroplating bath.
- Another object of the present invention is to provide a trivalent gold ternary alloy electroplating bath which avoids the disadvantages attendant upon previously suggested gold (III) electroplating systems.
- a further object of the present invention is to provide a gold (III), cobalt, and molybdenum ternary alloy electroplating bath which has markedly improved wear resistance.
- a gold (III) ternary alloy electroplating bath can be attained by utilizing an alkali metal auricyanide in combination with a water soluble cobalt inorganic salt, such as sulfate, and a water soluble molybdenum inorganic salt such as an alkali metal molybdate.
- a water soluble cobalt inorganic salt such as sulfate
- a water soluble molybdenum inorganic salt such as an alkali metal molybdate.
- the use of cobalt sulfate and sodium molybdate are preferred and citric acid is preferred as the matrix.
- the electroplating bath contains a wetting agent or sulfactant such as alkali metal perfluoroalkyl sulfonate, as well as a stress reducer-brightener such as sodium saccharin.
- a wetting agent or sulfactant such as alkali metal perfluoroalkyl sulfonate
- a stress reducer-brightener such as sodium saccharin.
- one of the essential features of the present invention is to employ, as the source of the gold in the electroplating bath, a water-soluble gold complex or compound wherein the gold ion is in the trivalent state.
- the preferred gold material is an alkali metal auricyanide, and the especially preferred gold component is potassium auricyanide.
- the bath will contain from about 4 to 16 grams per liter, preferably 7 to 12.5 grams per liter of the alkali metal auricyanide.
- the trivalent gold salts will contain from about 52 to 54%, and preferably from about 53 to about 54% gold metal. It is important that the alkali metal auricyanide be substantially free of chloride ions.
- the alloying metal components are (a) cobalt inorganic salts such as cobalt sulfate, often in the hydrated form; and (b) molybdenum inorganic salts such as an alkali metal molybdate.
- concentration of the cobalt salt ranges from about 2 to 16 grams per liter, while the alkali metal molybdate concentration ranges from about 1 to 6 grams per liter.
- the cobalt inorganic salt will range from about 2.5 to 9.5 grams per liter, while the alkali metal molybdate will range from about 1.2 to 3.8 grams per liter.
- the bath matrix or electrolyte preferred for the present invention is citric acid.
- Other acids such as the carboxylic acids, may also be utilized in concentrations ranging from about 100 to 400 ml/l, and preferably from about 200 to 300 ml/l.
- an anionic fluorochemical wetting agent or surfactant such as a blend of potassium perfluoroalkyl sulfonates, sold under the trademarks FC-98 and FC-95 by the Minnesota Mining and Manufacturing Company, may be usefully employed.
- the amount of wetting agent or surfactant will generally range from about 2 to 15 ml/l, preferably from about 4 to 10 ml/l.
- FC-95 and FC-98 are potassium perfluoroalkyl sulfonates, and their use is generally preferred. Both FC-95 and FC-98 decompose at 390° C.
- FC-95 has a pH of 7-8
- FC-98 has a pH of 6-8
- FC-98 is slightly less surface active and is capable of producing foam that is less dense and less stable. Both types have outstanding chemical and thermal stability, especially in acidic and oxidizing systems.
- the method of preparing these perfluoroalkyl sulfonates is disclosed in U.S. Pat. No. 2,519,983 to Simons; while a prior art use of such surfactants in electroplating is illustrated by U.S. Pat. No. 2,740,334 to Brown. The teachings of these patents are incorporated herein by reference.
- baths of this invention will contain a stress reduce-brightener such as organic compounds containing nitrogen and sulfur atoms, for example, alkali metal saccharin, etc. Minor amounts of this additive will be employed, with amounts ranging from 25 to 75 mg/l being found quite useful.
- a stress reduce-brightener such as organic compounds containing nitrogen and sulfur atoms, for example, alkali metal saccharin, etc. Minor amounts of this additive will be employed, with amounts ranging from 25 to 75 mg/l being found quite useful.
- the pH of the electroplating bath may be within the range of from about 1 to 2, and preferably from about 1.2 to 1.5.
- Current densities will range from 3.0 to 7.5 ASD, preferably from 4.6 to 6.1 ASD. Although higher current densities may give a higher alloy concentration, the resulting alloy deposit is more brittle.
- the electroplating bath of this invention will be maintained at a temperature of from about 45° to 65° C.
- Substrate treatment times will, of course, vary widely depending upon such factors as the type of substrate, the deposit of thickness required, etc.
- the electroplating baths of this invention may be effectively utilized for plating operations both in the electronic as well as in the decorative field.
- Illustrative substrates including brass, copper, copper alloys, steel, stainless steel, as well as other commercial metals and alloys.
- a metal substrate such as a brass panel may be subjected to a degreasing step using a hot alkaline solution followed by rinsing with deionized water. The panel may then be dipped in hydrochloric or sulfuric acid maintained at elevated temperatures. Finally, there may be another rinsing treatment with deionized water. Since all of these and other pretreatment or precleaning treatments are well known in the art, the exact procedure employed is not a feature of the present invention.
- An electroplating bath was prepared from the ingredients set forth below:
- the bath had a pH of 1.5 and a specific gravity of 16.0° Be.
- a brass panel was electroplated with vigorous stirring at 50° C., a current density of 4.6 ASD, and a plating rate of 6.7 mg/A-minute.
- the deposited alloy coating was composed of 1.5% by weight, cobalt, 0.2% by weight molybdenum and the balance gold.
- the thickness of the bright, grey tinted deposit was about 20 micrometers. It has a hardness of 269 KHN. Remarkable wear resistance was revealed when the alloy survived crossed-wire wear tests of up to 20,000 passes at a deposit thickness of 80 microinches. This wear resistance is determined by using a crossed-wire tester reciprocating at 2 cycles per minute with a 200 gram load.
- An electroplating bath was prepared from ingredients set forth below:
- This bath also had a pH of 1.5 and a specific gravity of 16° Be.
- a brass panel was electroplated with vigorous stirring at 50° C., a current density 6.1 ASD, and a plating rate of 8.4 mg/A minute.
- the deposited alloy was composed of 1.8% by weight cobalt, 0.4% by weight molybdenum, and the balance being gold. It has a hardness of 253 KHN. Remarkable wear resistance was demonstrated again when the alloy survived crossed-wire wear tests of up to 20,000 passes at a deposit thickness of about 80 microinches.
- An electroplating bath was prepared from the ingrediets set forth below:
- the pH of this bath was 1.2 and the specific gravity was 16° Be.
- a brass panel was electroplated with vigorous stirring at 50° C., a current density of 4.6 ASD, and a plating rate of 8.4 mg/A-minute.
- the deposited alloy was composed of 1.0% by weight of cobalt, 0.26% by weight molybdenum, and the balance gold. It had a hardness of 263 KHN. When subjected to the wear resistance test described in Example I this alloy also survived up to 20,000 passes at a deposit thickness of about 80 microinches.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
______________________________________
INGREDIENTS AMOUNTS (g/l)
______________________________________
Potassium auricyanide
7
Cobalt sulfate 9
Sodium molybdate 15
Citric acid 300
Sodium saccharin 50 mg/l
FC-98 10 mg/l
Water Balance
______________________________________
______________________________________
INGREDIENTS AMOUNTS (g/l)
______________________________________
Potassium auricyanide
10
Cobalt sulfate 9
Sodium molybdate 3.8
Citric Acid 300
Sodium saccharin 50 mg/l
FC-98 10 ml/l
Water Balance
______________________________________
______________________________________
INGREDIENTS AMOUNT (g/l)
______________________________________
Potassium Auricyanide
12.5
Cobalt sulfate 4.7
Sodium molybdate 1.5
Citric acid 300
Sodium saccharin 50 mg/l
FC-98 10 ml/l
Water Balance
______________________________________
Claims (17)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/454,503 US4470886A (en) | 1983-01-04 | 1983-01-04 | Gold alloy electroplating bath and process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/454,503 US4470886A (en) | 1983-01-04 | 1983-01-04 | Gold alloy electroplating bath and process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US4470886A true US4470886A (en) | 1984-09-11 |
Family
ID=23804872
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US06/454,503 Expired - Fee Related US4470886A (en) | 1983-01-04 | 1983-01-04 | Gold alloy electroplating bath and process |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | US4470886A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6099624A (en) * | 1997-07-09 | 2000-08-08 | Elf Atochem North America, Inc. | Nickel-phosphorus alloy coatings |
| US6576114B1 (en) | 1995-11-03 | 2003-06-10 | Enthone Inc. | Electroplating composition bath |
| US20040231999A1 (en) * | 2003-05-21 | 2004-11-25 | Morrissey Ronald J. | Electroplating solution for alloys of gold with tin |
| WO2016115494A1 (en) * | 2015-01-16 | 2016-07-21 | Hutchinson Technology Incorporated | Gold electroplating solution and method |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3598706A (en) * | 1967-12-11 | 1971-08-10 | Trifari Krussman And Fishel In | Acid gold plating baths |
| US4013523A (en) * | 1975-12-24 | 1977-03-22 | Oxy Metal Industries Corporation | Tin-gold electroplating bath and process |
| US4168214A (en) * | 1978-06-14 | 1979-09-18 | American Chemical And Refining Company, Inc. | Gold electroplating bath and method of making the same |
| US4358350A (en) * | 1980-06-10 | 1982-11-09 | Degussa Ag | Strongly acid gold alloy bath |
| US4391679A (en) * | 1980-04-03 | 1983-07-05 | Degussa Aktiengesellschaft | Electrolytic bath and process for the deposition of gold alloy coatings |
-
1983
- 1983-01-04 US US06/454,503 patent/US4470886A/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3598706A (en) * | 1967-12-11 | 1971-08-10 | Trifari Krussman And Fishel In | Acid gold plating baths |
| US4013523A (en) * | 1975-12-24 | 1977-03-22 | Oxy Metal Industries Corporation | Tin-gold electroplating bath and process |
| US4168214A (en) * | 1978-06-14 | 1979-09-18 | American Chemical And Refining Company, Inc. | Gold electroplating bath and method of making the same |
| US4391679A (en) * | 1980-04-03 | 1983-07-05 | Degussa Aktiengesellschaft | Electrolytic bath and process for the deposition of gold alloy coatings |
| US4358350A (en) * | 1980-06-10 | 1982-11-09 | Degussa Ag | Strongly acid gold alloy bath |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6576114B1 (en) | 1995-11-03 | 2003-06-10 | Enthone Inc. | Electroplating composition bath |
| US6099624A (en) * | 1997-07-09 | 2000-08-08 | Elf Atochem North America, Inc. | Nickel-phosphorus alloy coatings |
| US20040231999A1 (en) * | 2003-05-21 | 2004-11-25 | Morrissey Ronald J. | Electroplating solution for alloys of gold with tin |
| US7279086B2 (en) | 2003-05-21 | 2007-10-09 | Technic, Inc. | Electroplating solution for alloys of gold with tin |
| WO2016115494A1 (en) * | 2015-01-16 | 2016-07-21 | Hutchinson Technology Incorporated | Gold electroplating solution and method |
| US10570525B2 (en) | 2015-01-16 | 2020-02-25 | Hutchinson Technology Incorporated | Gold electroplating solution and method |
| US12173423B2 (en) | 2015-01-16 | 2024-12-24 | Hutchinson Technology Incorporated | Gold electroplating solution and method |
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