US3900612A - Method for chemical vapor deposition of fitted surfaces in coupled article - Google Patents

Method for chemical vapor deposition of fitted surfaces in coupled article Download PDF

Info

Publication number
US3900612A
US3900612A US405536A US40553673A US3900612A US 3900612 A US3900612 A US 3900612A US 405536 A US405536 A US 405536A US 40553673 A US40553673 A US 40553673A US 3900612 A US3900612 A US 3900612A
Authority
US
United States
Prior art keywords
plating
plunger
vapor deposition
chemical vapor
coating material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US405536A
Other languages
English (en)
Inventor
Shigetake Okamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Application granted granted Critical
Publication of US3900612A publication Critical patent/US3900612A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49826—Assembling or joining
    • Y10T29/49861—Sizing mating parts during final positional association

Definitions

  • ABSTRACT 30 Foreign Application Priority Data rs article i byhavling gp j inserte one into t e 0t er is ace wit in a atm OcL 11 1972 Japan 47401789 Chamben The vapor of an extrgmely hard comigg 5 [52] US- Cl 427/232; 117/106 C; 117/1072 R; terial is IIlII'OdUCCd into Saki chamber while a rota- HWDIG.
  • This invention relates to a method for the chemical vapor deposition of fitted surfaces of a pair of members composing a coupled article. More particularly, this invention relates to a method for the chemical vapor deposition of an extremely hard coating material such as TiN or TiC on the fitted surfaces of a coupled article formed by having a pair of members inserted one into the other, such as a fuel pump or a high-speed precision roller bearing, for example.
  • an extremely hard coating material such as TiN or TiC
  • the layer of a coating material to be deposited on the fitted surfaces in such coupled article is required to be controlled accurately to a prescribed thickness since, the clearance allowed in precision coupled articles generally falls in the range of from 2 to microns.
  • the plating temperature, the flow volume of a carrier gas in use and the volume of the vapor of coating material must be regulated with high accuracy.
  • the thickness of the deposited layer of the plating material is only accurate to within i 2 microns.
  • the members which now have their surfaces coated are often found to be no longer capable of coupling.
  • the vapor of the coating material can disperse into even the smallest opening and deposit itself even on the fitted surfaces. This, consequently, renders it impossible to maintain the fitted surfaces accurately by a uniform clearance. According to this method, therefore, no uniform thickness is obtained in the deposited layer of the coating material. When the coating material is deposited excessively along the fitted surfaces, there is a possibility that the two members will be fastened to each other.
  • An object of this invention is to provide a method for the chemical vapor deposition of an extremely hard coating substance to a required thickness on fitted surfaces of a coupled article without requiring accurate control of such factors as plating temperature, flow volume of carrier gas and amount of the vapor of coating substance.
  • a barrel 2 is assembled in advance and, in that state, placed inside a plating chamber 3.
  • the barrel 2 is fastened in position by a supporting arm 4 and the plunger 1 is held stably by a chuck 5 and connected, by the medium of a supporting arm 5, to a driving apparatus 6 such as of a motor or oscillator so as to be given a rotational or vibrational motion.
  • a sensor 7 such as a torque meter or a vibration meter
  • the top and the bottom of the plating chamber are provided with rubber seals 11 and 12 respectively so that the interior of the plating chamber will be maintained air-tight in spite of the motion from the driving apparatus.
  • the outer wall of the plating chamber 3 is provided with a heating apparatus 10 such as a high-frequency coil which serves the purpose of maintaining the article to be plated at a prescribed temperature.
  • the members 1 and 2 subjected to plating are heated to a temperature between l,l00 l,20()C by means of the high-frequency coil 10.
  • the driving apparatus 6 is set into operation to confer a rotational or vibrational motion upon the plunger 1.
  • a plating vapor prepared by mixing a carrier gas at a stated proportion with a vapor of metal compound salt reacted with said carrier gas to form an extremely hard substance with the aid ofa vaporizer (not illustrated) is fed into an inlet 8 of the plating chamber 3. Since the plating vapor has a characteristic property of penetrating into even the smallest opening, it can form a desposited layer not merely on exposed surfaces but on fitted surfaces of the members subjected to plating.
  • the carrier gas which has fulfilled its part is discharged through an outlet 9.
  • the suitable peripheral speed of the plunger falls in the range of from l,000 to 3,000 m/min.
  • the stroke of vibration in the range of from to 10 mm and the frequency in the range of from 2,000 to 6,000 vibrations per second.
  • the clearance intervening between the opposed surfaces is gradually decreased, with the result that a proportional change is brought about in the torque or frequency of vibrations. Measurement of this change by the sensor 7 enables one to tell accurately the extent of progress of the plating work. When this change has reached a prescribed level, the plating operation can be terminated by discontinuing the operation of the driving apparatus.
  • Metal compound salt such as titanium tetrachloride, titanium tetrabromide, titanium tetraiodide, Wolfram hexachloride, molybdenum hexachloride, silicon chloride, boron chloride, etc. heretofore known to the art may be used as a vapor source reacted with a carrier gas to form an extremely hard coating material.
  • a carrier gas nitrogen, hydrogen, oxygen, methane, etc. can be used.
  • the mixing ratio of the vapor from the vapor source to carrier gas may suitably be adjusted according to conventional chemical vapor deposition methods.
  • Hydrocarbon may be added to the plating vapor as an additive, if necessary.
  • the chemical vapor deposition by this invention is carried out as the surfaces subjected to plating are slid over each other, the coating material is always deposited to a uniform thickness without calling for accurate control of plating temperature, flow volume of carrier gas, volume of vapor, etc. which has heretofore been indispensable for the conventional methods.
  • the rotational or vibrational motion serves to decrease the grain size of crystals of the coating material deposited in a layer on the surfaces under plating. Because of the mutual rubbing the surfaces being plated are smoothened to a surface roughness from 0.4 to 2 microns.
  • the fact that the torque or frequency of vibration is changed in proportion to the progress of plating work permits one to obtain a desired thickness in the deposited layer of the coating material by terminating the plating operation as soon as said change has reached a prescribed level.
  • the plating operation can be automated by using a device adapted so that plating operation is stopped when the torque or frequency which is measured continuously reaches a prescribed level.
  • a method for the chemical vapor deposition of fitted surfaces of an article which method comprises, inserting a plunger into a barrel assembly, both plunger and barrel assembly being disposed within a plating chamber, the outer surface of the plunger and the inner surface of the barrel being in fitted relationship to one another, conferring a rotational or vibrational motion upon the plunger or the barrel, supplying vapor of a coating material to the plating chamber, and coating the fitted surfaces of the plunger and barrel during said rotational or vibrational motion.

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Fuel-Injection Apparatus (AREA)
US405536A 1972-10-11 1973-10-11 Method for chemical vapor deposition of fitted surfaces in coupled article Expired - Lifetime US3900612A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47101789A JPS523618B2 (US06566495-20030520-M00011.png) 1972-10-11 1972-10-11

Publications (1)

Publication Number Publication Date
US3900612A true US3900612A (en) 1975-08-19

Family

ID=14309924

Family Applications (1)

Application Number Title Priority Date Filing Date
US405536A Expired - Lifetime US3900612A (en) 1972-10-11 1973-10-11 Method for chemical vapor deposition of fitted surfaces in coupled article

Country Status (2)

Country Link
US (1) US3900612A (US06566495-20030520-M00011.png)
JP (1) JPS523618B2 (US06566495-20030520-M00011.png)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1986004548A1 (en) * 1985-02-12 1986-08-14 Masco Corporation Process of manufacturing seal members having a low friction coefficient
US4935313A (en) * 1985-02-12 1990-06-19 Masco Corporation Of Indiana Process of manufacturing seal members having a low friction coefficient

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2130879A (en) * 1936-04-08 1938-09-20 Gen Electric Method of making a vacuum-tight joint between solid bodies
US2880118A (en) * 1956-04-19 1959-03-31 James E Taylor Vibratory coating method and apparatus
US3637320A (en) * 1968-12-31 1972-01-25 Texas Instruments Inc Coating for assembly of parts

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2130879A (en) * 1936-04-08 1938-09-20 Gen Electric Method of making a vacuum-tight joint between solid bodies
US2880118A (en) * 1956-04-19 1959-03-31 James E Taylor Vibratory coating method and apparatus
US3637320A (en) * 1968-12-31 1972-01-25 Texas Instruments Inc Coating for assembly of parts

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1986004548A1 (en) * 1985-02-12 1986-08-14 Masco Corporation Process of manufacturing seal members having a low friction coefficient
DE3690041T1 (US06566495-20030520-M00011.png) * 1985-02-12 1987-04-23
GB2187537A (en) * 1985-02-12 1987-09-09 Masco Corp Process of manufacturing seal members having a low friction coefficient
GB2187537B (en) * 1985-02-12 1989-06-14 Masco Corp Seal members for valves and faucets
AU588578B2 (en) * 1985-02-12 1989-09-21 Gevipi A.G. Hard material seal members having a low friction coefficient
US4935313A (en) * 1985-02-12 1990-06-19 Masco Corporation Of Indiana Process of manufacturing seal members having a low friction coefficient
US4966789A (en) * 1985-02-12 1990-10-30 Masco Corporation Of Indiana Process of manufacturing seal members having a low friction coefficient

Also Published As

Publication number Publication date
JPS4959085A (US06566495-20030520-M00011.png) 1974-06-07
JPS523618B2 (US06566495-20030520-M00011.png) 1977-01-28

Similar Documents

Publication Publication Date Title
US3959557A (en) Wear-resistant, nonabrading tic article and process for making
US3684585A (en) Method for forming adherent titanium carbide coatings on metal or composite substrates
US4623400A (en) Hard surface coatings for metals in fluidized beds
US3570449A (en) Sensor system for a vacuum deposition apparatus
US3368914A (en) Process for adherently depositing a metal carbide on a metal substrate
US3643625A (en) Thin-film deposition apparatus
US3900612A (en) Method for chemical vapor deposition of fitted surfaces in coupled article
US3642522A (en) Method for producing hard coatings on a surface
Giorgi et al. Dissolution kinetics of iron in liquid zinc
US3375129A (en) Aluminum plating employing amine complex of aluminum hydride
US4250210A (en) Chemical vapor deposition
EP0064884A1 (en) Method and apparatus for coating by glow discharge
US3540920A (en) Process of simultaneously vapor depositing silicides of chromium and titanium
US3746571A (en) Method of vacuum evaporation
Gäbler et al. Micro abrasive pencils with CVD diamond coating
ES436462A1 (es) Dispositivo para la determinacion del espesor y de la velo- cidad de deposicion de capas en procesos de deposicion sin aplicacion de corriente y galvanicos.
US3752691A (en) Method of vacuum evaporation
US3338740A (en) Electroless nickel plating
Casstevens et al. Diamond turning optical surfaces on electroless nickel
KR20080019808A (ko) 유기 박막 증착 장치 및 방법
WO1996029446A1 (en) Chemical vapor deposition of levitated objects
US3471321A (en) Vapor coating aluminum on ironcontaining substrate
JP2003520903A (ja) 液体または溶解形状にある少なくとも１つの前駆体を少なくとも一つの基板に沈積させる方法および装置
US3552939A (en) Metal carbide coatings on metal substrates
US3450558A (en) Vapor plating beryllium