US3471271A - Electrodeposition of a micro-cracked corrosion resistant nickel-chromium plate - Google Patents
Electrodeposition of a micro-cracked corrosion resistant nickel-chromium plate Download PDFInfo
- Publication number
- US3471271A US3471271A US480156A US3471271DA US3471271A US 3471271 A US3471271 A US 3471271A US 480156 A US480156 A US 480156A US 3471271D A US3471271D A US 3471271DA US 3471271 A US3471271 A US 3471271A
- Authority
- US
- United States
- Prior art keywords
- nickel
- plate
- bath
- acid
- strike
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005260 corrosion Methods 0.000 title description 24
- 230000007797 corrosion Effects 0.000 title description 24
- 229910018487 Ni—Cr Inorganic materials 0.000 title description 3
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 title description 3
- 238000004070 electrodeposition Methods 0.000 title description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 230
- 229910052759 nickel Inorganic materials 0.000 description 115
- 235000001014 amino acid Nutrition 0.000 description 39
- 229940024606 amino acid Drugs 0.000 description 39
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 37
- 150000001413 amino acids Chemical class 0.000 description 36
- 229910052804 chromium Inorganic materials 0.000 description 36
- 239000011651 chromium Substances 0.000 description 36
- 239000002253 acid Substances 0.000 description 23
- 238000007747 plating Methods 0.000 description 19
- 239000000843 powder Substances 0.000 description 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 16
- 238000000034 method Methods 0.000 description 16
- -1 aryl sulfonic acids Chemical class 0.000 description 15
- 239000002245 particle Substances 0.000 description 15
- PVNIIMVLHYAWGP-UHFFFAOYSA-N Niacin Chemical compound OC(=O)C1=CC=CN=C1 PVNIIMVLHYAWGP-UHFFFAOYSA-N 0.000 description 12
- 238000013019 agitation Methods 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 10
- 239000002131 composite material Substances 0.000 description 10
- 230000002378 acidificating effect Effects 0.000 description 8
- 125000002947 alkylene group Chemical group 0.000 description 8
- 125000003277 amino group Chemical group 0.000 description 8
- 239000000377 silicon dioxide Substances 0.000 description 8
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 7
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 7
- 238000000151 deposition Methods 0.000 description 7
- 229910052717 sulfur Inorganic materials 0.000 description 7
- 239000011593 sulfur Substances 0.000 description 7
- 150000007513 acids Chemical class 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 229960003512 nicotinic acid Drugs 0.000 description 6
- 235000001968 nicotinic acid Nutrition 0.000 description 6
- 239000011664 nicotinic acid Substances 0.000 description 6
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 6
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 5
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 5
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 5
- URDCARMUOSMFFI-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(2-hydroxyethyl)amino]acetic acid Chemical compound OCCN(CC(O)=O)CCN(CC(O)=O)CC(O)=O URDCARMUOSMFFI-UHFFFAOYSA-N 0.000 description 4
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical class NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 230000001464 adherent effect Effects 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- PTMHPRAIXMAOOB-UHFFFAOYSA-N phosphoramidic acid Chemical class NP(O)(O)=O PTMHPRAIXMAOOB-UHFFFAOYSA-N 0.000 description 4
- SIOXPEMLGUPBBT-UHFFFAOYSA-N picolinic acid Chemical compound OC(=O)C1=CC=CC=N1 SIOXPEMLGUPBBT-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 3
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 3
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 3
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 3
- 229910052788 barium Inorganic materials 0.000 description 3
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 3
- 229960003330 pentetic acid Drugs 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 229910052712 strontium Inorganic materials 0.000 description 3
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 3
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical class NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 3
- 229940124530 sulfonamide Drugs 0.000 description 3
- HVBSAKJJOYLTQU-UHFFFAOYSA-N 4-aminobenzenesulfonic acid Chemical compound NC1=CC=C(S(O)(=O)=O)C=C1 HVBSAKJJOYLTQU-UHFFFAOYSA-N 0.000 description 2
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- 239000004471 Glycine Substances 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- SUZRRICLUFMAQD-UHFFFAOYSA-N N-Methyltaurine Chemical compound CNCCS(O)(=O)=O SUZRRICLUFMAQD-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- RWZYAGGXGHYGMB-UHFFFAOYSA-N anthranilic acid Chemical compound NC1=CC=CC=C1C(O)=O RWZYAGGXGHYGMB-UHFFFAOYSA-N 0.000 description 2
- 125000000732 arylene group Chemical group 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 239000000872 buffer Substances 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000002659 electrodeposit Substances 0.000 description 2
- KDKYADYSIPSCCQ-UHFFFAOYSA-N ethyl acetylene Natural products CCC#C KDKYADYSIPSCCQ-UHFFFAOYSA-N 0.000 description 2
- IFQUWYZCAGRUJN-UHFFFAOYSA-N ethylenediaminediacetic acid Chemical compound OC(=O)CNCCNCC(O)=O IFQUWYZCAGRUJN-UHFFFAOYSA-N 0.000 description 2
- XKUKSGPZAADMRA-UHFFFAOYSA-N glycyl-glycyl-glycine Chemical compound NCC(=O)NCC(=O)NCC(O)=O XKUKSGPZAADMRA-UHFFFAOYSA-N 0.000 description 2
- YMAWOPBAYDPSLA-UHFFFAOYSA-N glycylglycine Chemical compound [NH3+]CC(=O)NCC([O-])=O YMAWOPBAYDPSLA-UHFFFAOYSA-N 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000002815 nickel Chemical class 0.000 description 2
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 229940081066 picolinic acid Drugs 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- AOJFQRQNPXYVLM-UHFFFAOYSA-N pyridin-1-ium;chloride Chemical compound [Cl-].C1=CC=[NH+]C=C1 AOJFQRQNPXYVLM-UHFFFAOYSA-N 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 150000004760 silicates Chemical class 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- 150000003456 sulfonamides Chemical class 0.000 description 2
- XOAAWQZATWQOTB-UHFFFAOYSA-N taurine Chemical compound NCCS(O)(=O)=O XOAAWQZATWQOTB-UHFFFAOYSA-N 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 239000000080 wetting agent Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- HDIJHZHDOMXSQS-UHFFFAOYSA-N 2-ethynylbenzenesulfonic acid Chemical class OS(=O)(=O)C1=CC=CC=C1C#C HDIJHZHDOMXSQS-UHFFFAOYSA-N 0.000 description 1
- SHHKMWMIKILKQW-UHFFFAOYSA-N 2-formylbenzenesulfonic acid Chemical class OS(=O)(=O)C1=CC=CC=C1C=O SHHKMWMIKILKQW-UHFFFAOYSA-N 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical class CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- GOLORTLGFDVFDW-UHFFFAOYSA-N 3-(1h-benzimidazol-2-yl)-7-(diethylamino)chromen-2-one Chemical compound C1=CC=C2NC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 GOLORTLGFDVFDW-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- DCXYFEDJOCDNAF-UHFFFAOYSA-N Asparagine Natural products OC(=O)C(N)CC(N)=O DCXYFEDJOCDNAF-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- FCKYPQBAHLOOJQ-UHFFFAOYSA-N Cyclohexane-1,2-diaminetetraacetic acid Chemical compound OC(=O)CN(CC(O)=O)C1CCCCC1N(CC(O)=O)CC(O)=O FCKYPQBAHLOOJQ-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical class C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 description 1
- 108010008488 Glycylglycine Proteins 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- ONIBWKKTOPOVIA-BYPYZUCNSA-N L-Proline Chemical compound OC(=O)[C@@H]1CCCN1 ONIBWKKTOPOVIA-BYPYZUCNSA-N 0.000 description 1
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 1
- DCXYFEDJOCDNAF-REOHCLBHSA-N L-asparagine Chemical compound OC(=O)[C@@H](N)CC(N)=O DCXYFEDJOCDNAF-REOHCLBHSA-N 0.000 description 1
- WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical compound OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 241000080590 Niso Species 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- SXZMAOWOXXPXKR-UHFFFAOYSA-N P(O)(O)=O.NCC Chemical compound P(O)(O)=O.NCC SXZMAOWOXXPXKR-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- ONIBWKKTOPOVIA-UHFFFAOYSA-N Proline Natural products OC(=O)C1CCCN1 ONIBWKKTOPOVIA-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical class O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 1
- 229910000537 White brass Inorganic materials 0.000 description 1
- 229910000581 Yellow brass Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- MNZHBXZOPHQGMD-UHFFFAOYSA-N acetic acid;azane Chemical compound N.CC(O)=O.CC(O)=O.CC(O)=O MNZHBXZOPHQGMD-UHFFFAOYSA-N 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 235000004279 alanine Nutrition 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 230000006229 amino acid addition Effects 0.000 description 1
- 125000000539 amino acid group Chemical group 0.000 description 1
- 229960004050 aminobenzoic acid Drugs 0.000 description 1
- 230000002547 anomalous effect Effects 0.000 description 1
- 235000009582 asparagine Nutrition 0.000 description 1
- 229960001230 asparagine Drugs 0.000 description 1
- 150000008331 benzenesulfonamides Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- JHRWWRDRBPCWTF-OLQVQODUSA-N captafol Chemical compound C1C=CC[C@H]2C(=O)N(SC(Cl)(Cl)C(Cl)Cl)C(=O)[C@H]21 JHRWWRDRBPCWTF-OLQVQODUSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- RNFNDJAIBTYOQL-UHFFFAOYSA-N chloral hydrate Chemical compound OC(O)C(Cl)(Cl)Cl RNFNDJAIBTYOQL-UHFFFAOYSA-N 0.000 description 1
- 229960002327 chloral hydrate Drugs 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- UPHIPHFJVNKLMR-UHFFFAOYSA-N chromium iron Chemical compound [Cr].[Fe] UPHIPHFJVNKLMR-UHFFFAOYSA-N 0.000 description 1
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 1
- 150000001868 cobalt Chemical class 0.000 description 1
- 150000001875 compounds Chemical group 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000002993 cycloalkylene group Chemical group 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 235000013922 glutamic acid Nutrition 0.000 description 1
- 239000004220 glutamic acid Substances 0.000 description 1
- 108010067216 glycyl-glycyl-glycine Proteins 0.000 description 1
- 229940043257 glycylglycine Drugs 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical group 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- TUJKJAMUKRIRHC-UHFFFAOYSA-N hydroxyl Chemical group [OH] TUJKJAMUKRIRHC-UHFFFAOYSA-N 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 239000013528 metallic particle Substances 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical class C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- WLGDAKIJYPIYLR-UHFFFAOYSA-N octane-1-sulfonic acid Chemical compound CCCCCCCCS(O)(=O)=O WLGDAKIJYPIYLR-UHFFFAOYSA-N 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 150000003891 oxalate salts Chemical class 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- GJAWHXHKYYXBSV-UHFFFAOYSA-N quinolinic acid Chemical class OC(=O)C1=CC=CN=C1C(O)=O GJAWHXHKYYXBSV-UHFFFAOYSA-N 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- 229920006298 saran Polymers 0.000 description 1
- 239000003352 sequestering agent Substances 0.000 description 1
- 230000009919 sequestration Effects 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- DGSDBJMBHCQYGN-UHFFFAOYSA-M sodium;2-ethylhexyl sulfate Chemical compound [Na+].CCCCC(CC)COS([O-])(=O)=O DGSDBJMBHCQYGN-UHFFFAOYSA-M 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- FDDDEECHVMSUSB-UHFFFAOYSA-N sulfanilamide Chemical compound NC1=CC=C(S(N)(=O)=O)C=C1 FDDDEECHVMSUSB-UHFFFAOYSA-N 0.000 description 1
- 229950000244 sulfanilic acid Drugs 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 229960003080 taurine Drugs 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/623—Porosity of the layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/625—Discontinuous layers, e.g. microcracked layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/922—Static electricity metal bleed-off metallic stock
- Y10S428/923—Physical dimension
- Y10S428/924—Composite
- Y10S428/926—Thickness of individual layer specified
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/922—Static electricity metal bleed-off metallic stock
- Y10S428/9335—Product by special process
- Y10S428/934—Electrical process
- Y10S428/935—Electroplating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12479—Porous [e.g., foamed, spongy, cracked, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/1266—O, S, or organic compound in metal component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12806—Refractory [Group IVB, VB, or VIB] metal-base component
- Y10T428/12826—Group VIB metal-base component
- Y10T428/12847—Cr-base component
- Y10T428/12854—Next to Co-, Fe-, or Ni-base component
Definitions
- a method of electroplating comprising depositing on a basis metal at least three successive layers including, an underlying nickel electroplate, an overlying nickel strike electroplate, and a top bright chromium layer.
- the nickel bath from which the overlying nickel strike is electrodeposited must be a high-chloride bath, and must contain at least one amino acid selected from the group consisting of amino carboxylic acids, amino sulfonic acids, and amino phosphonic acids.
- the nickel strike causes the overlaying thin chromium plate to develop a porous and finely microcracked structural pattern.
- the nickel strike bath may additionally contain insoluble fine powders which are deposited with the nickel strike and occluded therein.
- This invention relates to the improvement of the corrosion protection afforded to underlying commercial basis metals such as steel, brass, copper, zinc die cast, magnesium, etc., by electrodepositing thereon certain composite decorative electroplates of nickel and chromium. More particularly, it relates to the use of certain composite nickel electroplates having a finel nickel strike layer as a critical part of the nickel composite, followed by a final chromium plate to impart maximum corrosion protection to the underlying metal.
- the flash plate could be dull nickel, semi-bright nickel or a low pH nickel strike up to a thickness that does not unduly dull the underneath bright nickel plate.
- the difliculty with this particular system of composite nickel plate is the tendency for dulling of the high current density areas of complex shaped parts before the low current density areas are sufficiently covered to provide the desired corrosion protection. On simpler shaped objects, this is less of a problem.
- an underlying nickel plate (2) an intermediate thin nickel strike layer deposited from an acidic, high-chloride nickel bath containing dissolved therein an efiective amount of at least one amino acid, and
- corrosion resistance of the basis metals is further enhanced by the dispersion of certain bath-insoluble powders in the high-chloride nickel strike bath.
- a thin nickel strike be electrodeposited on an underlying nickel electroplate, which underlying nickel plate may itself be deposited either on the basis metal, or on one or more intermediate layers of electroplates of nickel, copper, yellow brass, white brass, etc.
- the underlying nickel plate may be deposited from any conventional semi-bright or bright nickel plating bath.
- the directly underlying plate should be bright nickel. While the invention will hereinafter be described in terms of utilizing a bright nickel underlying plate, it is understood that enhanced corrosion resistance can also be obtained if such underlying nickel plate is deposited from a semibright plating bath.
- the underlying nickel plate beneath the nickel strike plate should be at least about 0.3 and preferably 0.8 to 1 mil thick if it is the sole underlying plate. It a copper or brass plate of at least 0.2 or 0.3 mil thickness is present underneath the bright nickel plate, ex-
- the total nickel plate be about one mil in thickness plated on top of 0.5 to 1.0 mil of a copper electroplate. Using much more than 3 mils total nickel plate would in general be wasteful for most decorative uses even in the most severe marine or industrial atmospheres.
- a thin nickel strike having a thickness of from about 0.005 to about 0.4 mil from a high-chloride bath.
- the high-chloride baths of this invention contain as an essential constituent an amino acid as will hereinafter be defined.
- Other agents well-known to the art may be present in such baths including other nickel salts, buffers, wetting agents, etc.
- the term high-chloride bath denotes a plating bath containing from about 150 to 500 grams/ liter of nickel chloride calculated as NiCl -6H O and having a pH of less than about 6.
- These baths may be operated at temperatures of from about 50 to 160 F.
- the amino acids of the invention added to such baths throughout this pH and temperature range enhance the corrosion properties of the final composite plate by improving the micro-crack pattern of the top chromium plate.
- aryl sulfonic acids or sulfonamides or sulfonimides such as sulfobenzaldehydes, benzene or naphthalene sulfonic acids, benzene sulfonamides or sulfonimides such as o-benzoylsulfimide, or the aliphatic unsaturated sulfonic acids, vinyl or allyl sulfonic acids, vinyl or ethynyl benzene sulfonic acids to obtain a full bright plate.
- aryl sulfonic acids or sulfonamides or sulfonimides such as sulfobenzaldehydes, benzene or naphthalene sulfonic acids, benzene sulfonamides or sulfonimides such as o-benzoylsulfimide, or the aliphatic unsaturated sulfonic acids
- decorative, bright electroplates are obtained by utilizing a bright nickel as the underlying nickel plate and a nickel strike is deposited thereon from a bath of this invention preferably at a pH of below 2 and operated at a temperature of from about 50 to 110 F. Under these conditions, using the amino acids, there is obtained a bright nickel strike of excellent adhesion on top of the underlying bright nickel without dulling or hazing at the end of 3 to about 10 minutes of plating time at 40-50 amperes/sq. ft. especially if good solution agitation is used. A top chromium plate is then deposited thereon and a full bright composite plate having superior corrosion properties is obtained.
- any of the nickel strike baths of this invention may have any of the conventional brighteners included therein, it is preferred that the use of sulfur containing materials be restricted so that the intermediate nickel strike plate has a sulfur concentration lower than that of the underlying bright nickel plate. If the sulfide sulfur content of the nickel strike plate is higher than the underneath nickel layer, the strike plate would corrode preferentially under saline conditions such as salted winter streets causing unsightly surface pits. Moreover, if high concentrations of cobalt salts are also present in the nickel strike baths containing aryl sulfonic, sulfonamide, or sulfonimide brighteners, the tendency to form surface pits is greatly increased in both marine and industrial atmospheres. Further, considering that the percentage of sulfur deposited from baths containing sulfon-compounds increases with a decreasing pH, it is best to restrict or eliminate the presence of these sulfon compounds in baths operated at a pH level of below 2.
- the intermediate nickel strike Since greatest utility for the present invention is found in the decorative field, the intermediate nickel strike must not be too thick as to dull the underlying bright nickel plate. If a conventional plain nickel bath were used to deposit the strike, the underlying bright nickel plate would become hazy after a plating time of one or two minutes at an average current density of 40-50 amps/ sq. ft.
- a strike plate of up to 10 minutes or over to obtain a plate thickness of up to 0.4 mil thickness can be utilized without dulling, especially if the bath is operated at temperatures below about F. Utilizing a strike plate of greater thickness than that defined above does not result in a further enhancement of corrosion protection, but may cause dulling unless the conventional brighteners are added thereto.
- strike plate having a thickness within the foregoing limits and deposited from a bath containing an amino acid but free from conventional secondary brighteners.
- the presence of such brighteners has a tendency to reduce adhesion and makes the bath more diificult to operate.
- the high-chloride bath from which the nickel strike is electrodeposited must contain an amino acid selected from the group consisting of amino-carboxylic acids, amino-sulfonic acids and amino-phosphonic acids, wherein the number of acid groups are equal to or greater than the number of amino groups in said amino acid molecule.
- amino acids may be aliphatic, cyclo-aliphatic, heterocyclic or aromatic and may contain other functional groups such as hydroXyl, nitro, cyano, halogen, etc.
- the amino acid have at least one amino group and one acid group which may be carboxylic, sulfonic or phosphonic, and that the number of acid groups is equal to or greater than the number of amino groups.
- the acids may contain multiple amino groups and/or acid groups which acid groups may be the same or different. Since nitro groups are easily reduced to amino groups in an acidic plating bath, as used herein, the term amino group will be understood to encompass nitro groups. Further, it is understood that the term amino, as used herein, shall include groups such as as are found in heterocyclics such as pyridine, quinoline, etc.
- the concentration of the amino acid is, in general, not sharply critical, though each acid has its optimum range, and in case of the aliphatic amino acids such as ethylenediaminetetraacetic acid and nitrilotriacetic acid, amounts up to saturation concentration can be used.
- aliphatic amino acids such as ethylenediaminetetraacetic acid and nitrilotriacetic acid
- some of the usable amino acids include picolinic acid, proline, pyridine dicarboxylic acids, picolene dicarboxylic acids, pyridine tricar-boxylic acids, the amides of these acids, N-aceto pyridinium chloride, N-sulfopropane pyridinium sultone, N-sulfoethane pyridinium chloride or bromide, anthranilic acid, sulfanilic acid, p-amino benzoic acid, sulfonylamide, aminonaph thoic acids, etc.
- aryl and heterocyclic acino acids require only small concentrations around 0.1 to 2 grams/ liter for optimum results, and especially beneficial are the carboxylic derivatives of pyridine and picolines such as nicotinic acid. It is to be understood that the sulfonamide group is slightly acidic and is here considered as an acidic group.
- amino acids usable in the high-chloride, nickel strike bath of this invention are amino acids containing at least one acid group and wherein the number of acid groups is equal to or greater than the number of amino groups having the following formula:
- R in each instance is the same or different and is hydrogen, or alkyl or alkylene groups containing from one to about eight carbon atoms; when R is alkylene, X in each instance is the same or different and is OH, COOH, SO OH, P(O)(OH) R is hydrogen,
- R is alkylene, cyclo-alkylene, arylene or wherein X and R are as previously defined, and n is an integer from 1 to 6.
- R in each instance is the same or difierent and is hydrogen or an alkylene group containing from one to about six carbon atoms, when R; is alkylene the attached X is COOH; Y is NH COOH, OH or wherein R and X are as just defined, and n is an integer from 1 to 6.
- amino acids usable in the nickel strike baths of the present invention include nitrilotriacetic acid (ammoniatriacetic acid), N-hydnoxethyliminodiacetic acid, N-dihydroxethyl-glycine, glutamic acid, glycine, glycylglycine, glycylglycylglycine, asparatic acid, 1, 2-diaminocyclohexanetetraacetic acid, alanine, taurine, N-methyltaurine, amino ethane phosphonic acid, asparagine and ammino-ethane sulfonamide.
- nitrilotriacetic acid ammoniatriacetic acid
- N-hydnoxethyliminodiacetic acid N-dihydroxethyl-glycine
- glutamic acid glycine, glycylglycine, glycylglycylgly
- ethylenediaminetetraacetic acid EDTA
- N,N' ethylenediaminediacetic acid EDDA
- N-hydroxyethylethylenediaminetriacetic acid HEDTA
- HEDDA N,N' dihydroxyethylenediaminediacetic acid
- DTPA diethylenetriaminepentaacetic acid
- the final essential step in the practice of the present method is the electrodeposition of a chromium layer on top of the thin nickel strike layer as defined above.
- Any chrome bath known to the industry may be used for this purpose.
- the conventional chromium plating baths containing -350 grams/liter of CrO and containing only the sulfate ion as catalyst may be used.
- One preferred type of chromium plating bath is one with a chromic acid content of about 200-250 grams/liter and with CrO to S0,; ratio of about 150-170 to one, and having dissolved therein a fluosilicate ion content of about 0.4 gram/ liter calculated as fluoride ion.
- the thickness of chromium plate is not critical and may vary within the range used by the industry as from about 0.005 to 0.050 mil thickness.
- the presence of the amino acids in the strike baths causes an increase in the amount of co-deposition of the fine, insoluble powders (as described hereinafter) that may be present in the high-chloride baths. It does not appear that sequestration of ions, as is the classical role of such amino acids as EDTA, is involved. For example, citric acid, a wellknown sequestering agent is ineffective for the purpose of this invention.
- certain bath insoluble organic and inorganic materials in the form of fine powders are dispersed in the highchloride nickel strike bath. These particles are co-deposited with the thin nickel strike and are occluded in the final nickel electroplate. Inclusion of these powders permits a more uniform porosity pattern in the final chromium plate, thereby resulting in maximum corrosion protection. Examples of the inorganic bath insoluble powders are described in our Patents 3,152,971, 3,152,972 and 3,152,973 assigned to the same assignee hereof.
- these co-deposited powders may have a particle size of up to about 10 microns and preferably less than about 5 microns in diameter and can be included in baths in a concentration of from about 0.2 to 500 grams/liter, preferably from 10 to about 50 grams/liter.
- the inorganic particles as described in the foregoing patents include, insoluble sulfates, carbonates, phosphates and oxalates of barium, strontium and calcium; silicates of aluminum, magnesium, boron, zirconium, calcium, barium and strontium and mixed silicates thereof; carbides of silicon, boron, and titanium; oxides of silicon, manganese, titanium, zircorrium, aluminum, cerium, iron chromium; fluorides of calcium, strontium and barium etc.
- the bath insoluble organic resin particles which are also useable in the nickel strike baths of this invention are described in our co-pending application Ser. No. 421,623 filed Dec. 28, 1964, now Patent No. 3,356,467 and include the group of resins consisting of saran, nylon, polyolefins, polyphenyleneoxide, acrylonitrile-butadienestyrene polymers, acetal polymers, polyvinylchloride polymers, and mixtures thereof.
- a top layer of about 0.01 mil of chromium plate a top layer of about 0.01 mil of chromium plate.
- the nickel strike bath compositions from which the strike was deposited on panels A, B and C were as follows:
- test panels A were markedly superior in both corrosion properties and general appearance to all other panels, especially as compared with panels B and D.
- Temperature, 50110 F Preferably 70-80 Cathode current density 40-50 amps/sq. ft. average (higher CD. with faster agitation). Plating time 1-6 minutes. .Air agitation or mechanical solution agitation.
- Example IV To the bath of Example II is added 0.2-30 grams/liter of fine zirconium silicate powder (0.05 to 5 micron particle size).
- EXAMPLE V l-l50 grams/liter of very fine barium sulfate powder (0.1 to 2 micron particle size) is dispersed in the nickel strike bath of Example II.
- EXAMPLE VI The nickel plate strike is deposited from the bath of Example II, but 4-30 grams of hydroxyethylethylenediaminetriacetic acid is used in place of EDTA.
- EXAMPLE VII From 0.3 to 2 grams/liter of diethylenetriaminepentaacetic acid is added to the nickel strike bath of Example VI.
- Example VIH To the bath in Example II is added 0.2 grams/liter of polyethylene glycol of average molecular weight of 400 (as for example, Carbowax 400) or 0.01 to 0.2 g./l. of butyne diol, or the ethylene oxide adducts of butyne diol or allyl alcohol.
- polyethylene glycol of average molecular weight of 400 as for example, Carbowax 400
- 0.01 to 0.2 g./l. of butyne diol or the ethylene oxide adducts of butyne diol or allyl alcohol.
- Example X The nicotinic acid used in Example X is especially useful at the higher pH values (2-6) of the high-chloride nickel strike baths in that it functions to produce an exceptionally bright plate. This is no doubt due to the fact that this compound functions also as an unsaturated secondary brightener because of the pyridine ring structure with its group.
- amino acids of this invention can be added as the acids or as the salts of the acids.
- the term is also meant to include the acid in the form of its salts, such as the sodium, potassium, ammonium, lithium or nickel salts.
- boric acid While it is not necessary to use bulfers in the highchloride nickel strike baths of this invention, it is preferred to use boric acid.
- Other buffers such as citrate, acetate, formate, etc., or mixture can be used.
- concentrations of cations such as zinc, cadmium or thallium can be present in the strike baths, but concentrations of over about 0.3 g./l. of such materials may cause poor chromium coverage or poor adhesion in the low current density recesses.
- concentrations of copper ions on the other hand, are much more detrimental in causing poor adhesion and should be kept as low as possible, preferably below 0.01 g./l. in total. Also, lead is very harmful.
- cathode current densities of at least 200 amps/ sq. ft. can be used.
- the high solution agitation greatly reduces the tendency toward hazy plates from the strike baths when more than about 2 minutes plating (at 40 50 amps/ sq. 'ft.) is used on top of the bright nickel plate.
- a wetting agent may be used such as n-octyl sulfonic acid, its sodium salt, sodium 2-ethyl hexyl sulfate or the sulfonate, etc.
- the saturated aliphatic sulfonic acids may be used liberally in the nickel strike baths because they do not contribute any appreciable sulfide sulfur to the nickel plate.
- the plate deposited from the amino acid-containing high-chloride nickel strike bath on top of the underlying nickel is highly micro stressed and especially so when dispersed fine powders such as zirconium silicate or aluminum silicate are present in the bath and co-deposited in the plate.
- the final chromium layer deposited thereon develops pores and a micro-cracked pattern not only because it is itself, highly stressed, but also because of the added stress in the nickel strike layer.
- a method of electrodepositing a composite corrosion protective electroplate on a basis metal susceptible to atmospheric corrosion which comprises the final steps of:
- amino acid is present in an amount of from 0.2 to 50 grams/liter and has one or more acid groups for every amino in the molecule and is of the formula:
- R in each instance is the same or different and is hydrogen or an alkylene group containing from one to about six carbon atoms, wherein when R is alkylene the attached X is COOH; Y is NH COOH, OH and /R1X N wherein R and X are as just defined, and n is an integer of from 1 to 6 inclusive.
- said high-chloride nickel strike bath additionally contains from 0.2 to grams/ liter of a bath-insoluble powder of average particle size of less than about 5 microns and selected from the group consisting of barium sulfate, zirconium silicate, aluminum silicate and silica and mixtures thereof, and wherein said bath has a pH of less than 2.0 and is operated at temperatures in the range of 50110 F.
- amino acid is nicotinic acid and is present in an amount of from 0.1 to 2 grams/liter.
- An article comprising a basis metal susceptible to atmospheric corrosion and an electroplate thereon, said electroplate comprising as its essential layers:
- an overlying adherent nickel strike electroplate of from about 0.005 to 0.4 mil thickness electro-deposited from an acidic, high-chloride aqueous nickel strike bath 'having a pH less than about 2.0 and operated at a temperature of from about 50-110 degrees F., said bath containing dissolved therein as essential substituents from about -500 grams per liter of nickel chloride and at least 0.1 gram per liter of at least one amino acid selected from the group consisting of amino carboxylic acids, amino sulfonic acids and amino phosphonic acids, said high-chloride nickel strike bath additionally containing from 0.2 to 50 grams per liter of bath insoluble powders of average particle size of less than about 5 microns and selected from the group consisting of barium sulfate, zirconium silicate, aluminum silicate, and silica, and mixtures thereof, and
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Description
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US48015665A | 1965-08-16 | 1965-08-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3471271A true US3471271A (en) | 1969-10-07 |
Family
ID=23906875
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US480156A Expired - Lifetime US3471271A (en) | 1965-08-16 | 1965-08-16 | Electrodeposition of a micro-cracked corrosion resistant nickel-chromium plate |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | US3471271A (en) |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3620936A (en) * | 1964-10-12 | 1971-11-16 | Renault | Electroplating a decorative chromium-plating resistant to corrosion |
| FR2123246A1 (en) * | 1971-01-11 | 1972-09-08 | Langbein Pfanhauser Werke Ag | |
| US3787297A (en) * | 1971-10-26 | 1974-01-22 | Conversion Chem Corp | Zinc plating bath and method |
| FR2201348A1 (en) * | 1972-09-29 | 1974-04-26 | Toyo Kogyo Co | Porous nickel-plated bearing surface - possessing improved wear resistance and able to absorb lubricants |
| FR2204703A1 (en) * | 1972-10-30 | 1974-05-24 | Oxy Metal Finishing Corp | |
| FR2213348A2 (en) * | 1972-08-01 | 1974-08-02 | Langbein Pfanhauser Werke Ag | |
| US3866289A (en) * | 1969-10-06 | 1975-02-18 | Oxy Metal Finishing Corp | Micro-porous chromium on nickel-cobalt duplex composite plates |
| JPS50104734A (en) * | 1974-01-25 | 1975-08-19 | ||
| US4010005A (en) * | 1973-06-23 | 1977-03-01 | Mitsui-Anaconda Electro Copper Sheet Co., Ltd. | Copper foil having bond strength |
| US4058439A (en) * | 1975-07-17 | 1977-11-15 | Sony Corporation | Nickel electroplating bath for satin finish and method |
| US4082621A (en) * | 1977-01-03 | 1978-04-04 | Allied Chemical Corporation | Plating method with lead or tin sublayer |
| US4239835A (en) * | 1976-07-15 | 1980-12-16 | Matsushita Electric Industrial Co., Ltd. | Magnetic recording medium |
| WO2011003957A1 (en) | 2009-07-07 | 2011-01-13 | Herbert Schmidt Gmbh & Co. Kg | Nickel system |
| EP3067443A1 (en) * | 2015-03-11 | 2016-09-14 | Jiaxing Minhui Automotive Parts Co.,Ltd | Nickel and/or chromium plated member and method for manufacturing the same |
| EP3147389A1 (en) | 2015-09-25 | 2017-03-29 | Enthone GmbH | Mulitcorrosion protection system for decorative parts with chrome finish |
Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1991747A (en) * | 1933-12-30 | 1935-02-19 | Hanson Van Winkle Munning Co | Electroplating sequence |
| US2773818A (en) * | 1954-05-20 | 1956-12-11 | Harshaw Chem Corp | Alkaline nickel plating solution |
| US2781306A (en) * | 1956-04-27 | 1957-02-12 | Udylite Res Corp | Electrodeposition of nickel |
| US2781305A (en) * | 1953-08-14 | 1957-02-12 | Udylite Res Corp | Electrodeposition of nickel |
| DE1015295B (en) * | 1955-10-26 | 1957-09-05 | Bosch Gmbh Robert | Bath for the galvanic deposition of shiny nickel coatings |
| US3133006A (en) * | 1962-05-28 | 1964-05-12 | Barnet D Ostrow | Acid nickel plating bath |
| US3152973A (en) * | 1960-07-26 | 1964-10-13 | Udylite Corp | Electrodeposition of lustrous nickel |
| US3170855A (en) * | 1963-03-18 | 1965-02-23 | Sarki Res And Dev Corp | Bright nickel plating baths |
| US3186925A (en) * | 1960-11-01 | 1965-06-01 | Gen Motors Corp | Chromium plating process with a pure nickel strike |
| US3268307A (en) * | 1963-03-01 | 1966-08-23 | Udylite Corp | Process of electrodepositing a corrosion resistant nickel-chromium coating and products thereof |
| US3298802A (en) * | 1962-02-23 | 1967-01-17 | Res Holland S Hertogenbosch Nv | Method for covering objects with a decorative bright-nickel/chromium coating, as well as objects covered by applying this method |
| US3388049A (en) * | 1964-10-12 | 1968-06-11 | Renault | Method of electrodepositing microcrack chromium coatings |
-
1965
- 1965-08-16 US US480156A patent/US3471271A/en not_active Expired - Lifetime
Patent Citations (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1991747A (en) * | 1933-12-30 | 1935-02-19 | Hanson Van Winkle Munning Co | Electroplating sequence |
| US2781305A (en) * | 1953-08-14 | 1957-02-12 | Udylite Res Corp | Electrodeposition of nickel |
| US2773818A (en) * | 1954-05-20 | 1956-12-11 | Harshaw Chem Corp | Alkaline nickel plating solution |
| DE1015295B (en) * | 1955-10-26 | 1957-09-05 | Bosch Gmbh Robert | Bath for the galvanic deposition of shiny nickel coatings |
| US2781306A (en) * | 1956-04-27 | 1957-02-12 | Udylite Res Corp | Electrodeposition of nickel |
| US3152973A (en) * | 1960-07-26 | 1964-10-13 | Udylite Corp | Electrodeposition of lustrous nickel |
| US3152971A (en) * | 1960-07-26 | 1964-10-13 | Udylite Corp | Electrodeposition of fine-grained lustrous nickel |
| US3186925A (en) * | 1960-11-01 | 1965-06-01 | Gen Motors Corp | Chromium plating process with a pure nickel strike |
| US3298802A (en) * | 1962-02-23 | 1967-01-17 | Res Holland S Hertogenbosch Nv | Method for covering objects with a decorative bright-nickel/chromium coating, as well as objects covered by applying this method |
| US3133006A (en) * | 1962-05-28 | 1964-05-12 | Barnet D Ostrow | Acid nickel plating bath |
| US3268307A (en) * | 1963-03-01 | 1966-08-23 | Udylite Corp | Process of electrodepositing a corrosion resistant nickel-chromium coating and products thereof |
| US3268308A (en) * | 1963-03-01 | 1966-08-23 | Udylite Corp | Electrodeposition of a corrosion resistant decorative nickel-chromium coating and products thereof |
| US3170855A (en) * | 1963-03-18 | 1965-02-23 | Sarki Res And Dev Corp | Bright nickel plating baths |
| US3388049A (en) * | 1964-10-12 | 1968-06-11 | Renault | Method of electrodepositing microcrack chromium coatings |
Cited By (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3620936A (en) * | 1964-10-12 | 1971-11-16 | Renault | Electroplating a decorative chromium-plating resistant to corrosion |
| US3866289A (en) * | 1969-10-06 | 1975-02-18 | Oxy Metal Finishing Corp | Micro-porous chromium on nickel-cobalt duplex composite plates |
| FR2123246A1 (en) * | 1971-01-11 | 1972-09-08 | Langbein Pfanhauser Werke Ag | |
| US3787297A (en) * | 1971-10-26 | 1974-01-22 | Conversion Chem Corp | Zinc plating bath and method |
| US3901773A (en) * | 1972-08-01 | 1975-08-26 | Langbein Pfanhauser Werke Ag | Method of making microcrack chromium coatings |
| FR2213348A2 (en) * | 1972-08-01 | 1974-08-02 | Langbein Pfanhauser Werke Ag | |
| FR2201348A1 (en) * | 1972-09-29 | 1974-04-26 | Toyo Kogyo Co | Porous nickel-plated bearing surface - possessing improved wear resistance and able to absorb lubricants |
| FR2204703A1 (en) * | 1972-10-30 | 1974-05-24 | Oxy Metal Finishing Corp | |
| US4010005A (en) * | 1973-06-23 | 1977-03-01 | Mitsui-Anaconda Electro Copper Sheet Co., Ltd. | Copper foil having bond strength |
| JPS50104734A (en) * | 1974-01-25 | 1975-08-19 | ||
| US4058439A (en) * | 1975-07-17 | 1977-11-15 | Sony Corporation | Nickel electroplating bath for satin finish and method |
| US4239835A (en) * | 1976-07-15 | 1980-12-16 | Matsushita Electric Industrial Co., Ltd. | Magnetic recording medium |
| US4082621A (en) * | 1977-01-03 | 1978-04-04 | Allied Chemical Corporation | Plating method with lead or tin sublayer |
| WO2011003957A1 (en) | 2009-07-07 | 2011-01-13 | Herbert Schmidt Gmbh & Co. Kg | Nickel system |
| CN102482792A (en) * | 2009-07-07 | 2012-05-30 | 赫伯特施密特有限公司 | Nickel system |
| EP3067443A1 (en) * | 2015-03-11 | 2016-09-14 | Jiaxing Minhui Automotive Parts Co.,Ltd | Nickel and/or chromium plated member and method for manufacturing the same |
| EP3147389A1 (en) | 2015-09-25 | 2017-03-29 | Enthone GmbH | Mulitcorrosion protection system for decorative parts with chrome finish |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3268423A (en) | Process of electrodepositing a corrosion resistant nickel-chromium coating | |
| US3152971A (en) | Electrodeposition of fine-grained lustrous nickel | |
| US3354059A (en) | Electrodeposition of nickel-iron magnetic alloy films | |
| US3806429A (en) | Electrodeposition of bright nickel-iron deposits,electrolytes therefor and coating an article with a composite nickel-iron,chromium coating | |
| US3355267A (en) | Corrosion resistant coated articles and processes of production thereof | |
| US3866289A (en) | Micro-porous chromium on nickel-cobalt duplex composite plates | |
| US3812566A (en) | Composite nickel iron electroplate and method of making said electroplate | |
| US3878067A (en) | Electrolyte and method for electrodepositing of bright nickel-iron alloy deposits | |
| US3591350A (en) | Novel plating process | |
| US3247082A (en) | Electrodeposition of a corrosion resistant coating | |
| US4384929A (en) | Process for electro-depositing composite nickel layers | |
| JPS60169588A (en) | Acidic zinc plating bath, acidic zinc alloy plating bath and process | |
| US3868229A (en) | Decorative electroplates for plastics | |
| US3528894A (en) | Method of electrodepositing corrosion resistant coating | |
| KR101046301B1 (en) | Nickel flash plating solution, electric zinc steel sheet and manufacturing method thereof | |
| US3691027A (en) | Method of producing corrosion resistant chromium plated articles | |
| US3825478A (en) | Electrolyte and method for electrodepositing microporous chromium-nickel composite coatings | |
| US3615281A (en) | Corrosion-resistant chromium-plated articles | |
| US3183067A (en) | Metal having two coats of sulfurcontaining nickel and method of making same | |
| US3703448A (en) | Method of making composite nickel electroplate and electrolytes therefor | |
| US3355268A (en) | Corrosive protected composite having triplated nickel deposits and method of making | |
| US2654703A (en) | Electrodeposition of bright nickel, cobalt, and alloys thereof | |
| US3726768A (en) | Nickel plating baths containing aromatic sulfonic acids | |
| US3574067A (en) | Electroforming metals and electrolytes therefor | |
| US3288574A (en) | Metal laminates and method of forming by electroplating |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AS | Assignment |
Owner name: HOOKER CHEMICALS & PLASTICS CORP. Free format text: MERGER;ASSIGNOR:OXY METAL INDUSTRIES CORPORATION;REEL/FRAME:004075/0885 Effective date: 19801222 |
|
| AS | Assignment |
Owner name: OCCIDENTAL CHEMICAL CORPORATION Free format text: CHANGE OF NAME;ASSIGNOR:HOOKER CHEMICAS & PLASTICS CORP.;REEL/FRAME:004126/0054 Effective date: 19820330 |
|
| AS | Assignment |
Owner name: OMI INTERNATIONAL CORPORATION, 21441 HOOVER ROAD, Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:OCCIDENTAL CHEMICAL CORPORATION;REEL/FRAME:004190/0827 Effective date: 19830915 |
|
| AS | Assignment |
Owner name: MANUFACTURERS HANOVER TRUST COMPANY, A CORP OF NY Free format text: SECURITY INTEREST;ASSIGNOR:INTERNATIONAL CORPORATION, A CORP OF DE;REEL/FRAME:004201/0733 Effective date: 19830930 |