US3440050A - Lithographic plate - Google Patents
Lithographic plate Download PDFInfo
- Publication number
- US3440050A US3440050A US430753A US3440050DA US3440050A US 3440050 A US3440050 A US 3440050A US 430753 A US430753 A US 430753A US 3440050D A US3440050D A US 3440050DA US 3440050 A US3440050 A US 3440050A
- Authority
- US
- United States
- Prior art keywords
- aluminum
- sensitive
- light
- plates
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052782 aluminium Inorganic materials 0.000 description 27
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 27
- 150000001875 compounds Chemical class 0.000 description 19
- 239000002585 base Substances 0.000 description 16
- 238000000576 coating method Methods 0.000 description 16
- 238000000034 method Methods 0.000 description 16
- 239000011248 coating agent Substances 0.000 description 15
- 230000008569 process Effects 0.000 description 15
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 12
- 239000007795 chemical reaction product Substances 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 9
- 238000007743 anodising Methods 0.000 description 8
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 7
- 229910001512 metal fluoride Inorganic materials 0.000 description 7
- 229910017464 nitrogen compound Inorganic materials 0.000 description 7
- 150000002830 nitrogen compounds Chemical class 0.000 description 7
- 150000008049 diazo compounds Chemical class 0.000 description 6
- 238000011282 treatment Methods 0.000 description 6
- 239000007859 condensation product Substances 0.000 description 5
- 229910052735 hafnium Inorganic materials 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 229910052719 titanium Inorganic materials 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 229910052726 zirconium Inorganic materials 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 4
- 229910052783 alkali metal Inorganic materials 0.000 description 4
- 150000001340 alkali metals Chemical class 0.000 description 4
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 4
- 150000001342 alkaline earth metals Chemical class 0.000 description 4
- 238000002048 anodisation reaction Methods 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 150000001768 cations Chemical class 0.000 description 3
- 239000007822 coupling agent Substances 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- OMQSJNWFFJOIMO-UHFFFAOYSA-J zirconium tetrafluoride Chemical compound F[Zr](F)(F)F OMQSJNWFFJOIMO-UHFFFAOYSA-J 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 235000005074 zinc chloride Nutrition 0.000 description 2
- 239000011592 zinc chloride Substances 0.000 description 2
- PLXMOAALOJOTIY-FPTXNFDTSA-N Aesculin Natural products OC[C@@H]1[C@@H](O)[C@H](O)[C@@H](O)[C@H](O)[C@H]1Oc2cc3C=CC(=O)Oc3cc2O PLXMOAALOJOTIY-FPTXNFDTSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 102000009027 Albumins Human genes 0.000 description 1
- 108010088751 Albumins Proteins 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- SGGPVBOWEPPPEH-UHFFFAOYSA-N [K].[Zr] Chemical compound [K].[Zr] SGGPVBOWEPPPEH-UHFFFAOYSA-N 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- 239000003637 basic solution Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 125000000490 cinnamyl group Chemical group C(C=CC1=CC=CC=C1)* 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
- BJZIJOLEWHWTJO-UHFFFAOYSA-H dipotassium;hexafluorozirconium(2-) Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[K+].[K+].[Zr+4] BJZIJOLEWHWTJO-UHFFFAOYSA-H 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- TWYSBDNLTRUTQT-UHFFFAOYSA-A hexadecapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O.[O-]P([O-])(=O)OP([O-])([O-])=O.[O-]P([O-])(=O)OP([O-])([O-])=O.[O-]P([O-])(=O)OP([O-])([O-])=O TWYSBDNLTRUTQT-UHFFFAOYSA-A 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- -1 nitrogen containing compound Chemical class 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 239000000276 potassium ferrocyanide Substances 0.000 description 1
- 239000012260 resinous material Substances 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- XOGGUFAVLNCTRS-UHFFFAOYSA-N tetrapotassium;iron(2+);hexacyanide Chemical compound [K+].[K+].[K+].[K+].[Fe+2].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-] XOGGUFAVLNCTRS-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 150000003755 zirconium compounds Chemical class 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/03—Chemical or electrical pretreatment
- B41N3/038—Treatment with a chromium compound, a silicon compound, a phophorus compound or a compound of a metal of group IVB; Hydrophilic coatings obtained by hydrolysis of organometallic compounds
Definitions
- lithographic light-sensitive plates having an anodized aluminum base sheet, a reaction product on the surface of the aluminum base sheet formed by a reaction between the anodized aluminum surface and a Group IV-B metal fluoride, and a light-sensitive coating thereover.
- This invention relates to sheet materials useful for photochemical processes such as the preparation of lithographic plates, and relates particularly to sheet materials which comprise an aluminum base having overcoats of a light-sensitive material such as the various diazo compounds known to the art.
- lithographic printing depends upon a printing surface having both hydrophilic and hydrophobic areas and the consequent preferential retention of greasy image-forming substances by the hydrophobic areas with a similar retention of an oleophobic dampening fluid by the hydrophilic areas.
- the light-sensitive compound is the condensation product of paradiazodiphenylamine with formaldehyde, such as paraformaldehyde zinc chloride. This condensation is carried out in concentrated sulfuric acid and the process and product formed thereby are well known in the lithographic printing art.
- the diazo product is in fact a zinc chloride double salt.
- diazo shall be meant to include not only lightsensitive diazo compounds which are known to the art such as the aforementioned double salt but is also in tended to include the reaction products of certain coupling agents and diazos as disclosed in the copending application U.S. Ser. No. 307,025, filed by Simon Chu on Sept. 6, 1963, now Patent No. 3,300,309, and other light-sensitive diazo reaction products, for example, the reaction product of a diazo and potassium ferrocyanide disclosed in US. Patent 3,113,023.
- nitrogen containing compound is used to define, not only diazo compounds discussed above, but also azides and other such light-sensitive compounds known to the art.
- the aluminum used as the base sheet is preferably 99% or more pure.
- aluminum alloys such as the 1100 or 1145 alloys are suitable. Purer alloys than these two types would not appear to have any advantage because they would have less mechanical strength and would be higher in cost.
- the anodizing processing is carried out as is substantially known to the art.
- the electrolyte is advantageously a 0.5 to 2.0% solution of hydrochloric acid.
- the temperature of the anodizing bath is usually maintained between 15 C. and C.
- the time of anodization is desirably between about 5 to 20 minutes at 6 to 14 volts.
- the spacing of the plates being anodized is conveniently from 1.5 to 4.0 inches. It will be understood by those skilled in the art that the time required for the anodization process will be reduced as the acid temperature is increased or as the voltage is increased.
- plates are immersed in a dilute basic solution, such as a 1% aqueous solution of ammonia. This step is taken in order to neutralize the surface of the plate on which residual hydrochloric acid may be present after the anodization process.
- a dilute basic solution such as a 1% aqueous solution of ammonia.
- the treatment with the base is followed by reacting the plates in a hot aqueous bath of a compound such as zirconium fluoride from about 30 seconds to 5 minutes at a temperature of from about to C. to form a hydrophilic layer of the aluminum plate.
- the potassium zirconium fiuoride solution is suitably of from about 0.5 to 1% concentration.
- Compounds useful for forming a hydrophilic layer include not only zirconium compounds but also compounds of the other Group IV-B compounds, i.e.,'
- salts of the formula MlMzF in which M is hydrogen, in alkali metal, an alkaline earth metal or an ammonium cation, M is selected from Ti, Zr or Hf, and n is 5 or 6, may also be advantageously used in the process of the present invention.
- M is hydrogen, in alkali metal, an alkaline earth metal or an ammonium cation
- M is selected from Ti, Zr or Hf
- n is 5 or 6
- U.S. Patent 3,160,506 contains further information relating to the use of these compounds on aluminum sheets preparatory to coating a lightsensitive layer thereover.
- Na ZrF KZIFS, KZZI'FS, KzTlFg, K HfF NZlHfF5, and H ZrF Plates prepared as described above can be used for lithographic printing.
- a longer shelf life can be obtained and scumming can be prevented by subjecting the plates to an additional mild alkali treatment.
- This treatment neutralizes any of the fluoride coating which may remain on the surface of the aluminum, and which would tend to oxidize and then react to form hydrophobic areas with the subsequently applied light-sensitive coating.
- This additional alkali treatment can be advantageously carried out by submerging the plate in a 0.5 to aqueous solution of potassium tetrapyrophosphate at a temperature from 55 C. to 65 C.
- the plate, prepared as described above, is in condition for shipment to the printer who would wipe on a light sensitive compound and proceed with the processing and use of the plate as is known in the art.
- an additional acidifying step is highly desirable wherein an aqueous solution of about 0.005% of a compound such as K ZrF (or a dilute acetic acid solution) is used to acidify the plate surface at room temperature.
- a compound such as K ZrF (or a dilute acetic acid solution) is used to acidify the plate surface at room temperature.
- the plate is subsequently dried and coated with a light sensitive diazo compound.
- a sheet adapted to receive a light-sensitive coating to form a lithographic printing plate which comprises an aluminum base sheet, said aluminum base sheet having an anodized surface thereon, and a hydrophilic coating on said anodized surface, said coating being essentially the reaction product of said anodized aluminum surface and a Group IV-B metal fluoride compound of the formula M 1 or of the formula M M F in which M is a 4 hydrogen, an alkali metal, an alkaline earth metal or an ammonium cation, M is a Ti, Zr or Hf cation, and n is the integer 5 or 6.
- a lithographic plate comprising an aluminum base sheet, said aluminum base sheet having an anodized surface thereon, a hydrophilic coating on said anodized surface, said coating being essentially the reaction product of said anodized aluminum surface and a metal fluoride compound of the formula M 1 or of the formula M M F in which M is a hydrogen, an alkali metal, an alkaline earth metal or an ammonium cation, M is a Ti, Zr or Hf cation, and n is the integer 5 or 6, and a light-sensitive nitrogen compound coated over said hydrophilic coating.
- a lithographic plate according to claim 2 wherein said metal fluoride compound is a zirconium fluoride salt.
- a lithographic plate according to claim 2 wherein said light-sensitive nitrogen compound is a condensation product of paradiazodiphenylamine and formaldehyde.
- a lithographic plate according to claim 2 wherein said light-sensitive nitrogen compound is a reaction product of (1) a condensation product of paradiazodiphenylamine and formaldehyde and (2) a coupling agent therefor.
- a process for making a lithographic plate which comprises anodizing a surface of an aluminum base sheet, reacting the anodized surface of said aluminum base sheet with essentially a metal fluoride compound of the formula M 1 or of the formula M M F in which M is a hydrogen, an alkali metal, an alkaline earth metal or an ammonium cation, M is a Ti, Zr or Hf cation, and n is the integer 5 or 6, to form a hydrophilic reaction product layer on said base sheet, and coating a light-sensitive nitrogen compound over said hydrophilic reaction product layer.
- a process according to claim 6 wherein said metal fluoride compound is potassium zirconium fluoride.
- said lightsensitive nitrogen compound is a condensation product of paradiazodiphenylamine and formaldehyde.
- said lightsensitive nitrogen compound is a reaction product of (l) a condensation product of paradiazodiphenylamine and formaldehyde and (2) a coupling agent therefor.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US43075365A | 1965-02-05 | 1965-02-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3440050A true US3440050A (en) | 1969-04-22 |
Family
ID=23708876
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US430753A Expired - Lifetime US3440050A (en) | 1965-02-05 | 1965-02-05 | Lithographic plate |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3440050A (enrdf_load_stackoverflow) |
| DE (1) | DE1300415B (enrdf_load_stackoverflow) |
| GB (1) | GB1128506A (enrdf_load_stackoverflow) |
| SE (1) | SE314994B (enrdf_load_stackoverflow) |
Cited By (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3658662A (en) * | 1969-01-21 | 1972-04-25 | Durolith Corp | Corrosion resistant metallic plates particularly useful as support members for photo-lithographic plates and the like |
| US3765894A (en) * | 1967-04-03 | 1973-10-16 | Polychrome Corp | Elevated image printing plate |
| FR2308956A1 (fr) * | 1975-04-21 | 1976-11-19 | Minnesota Mining & Mfg | Plaques lithographiques et leur preparation |
| US4090880A (en) * | 1977-03-03 | 1978-05-23 | Polychrome Corporation | Lithographic printing plate and method of making same |
| FR2388305A1 (fr) * | 1977-04-18 | 1978-11-17 | Polychrome Corp | Traitement ameliore des plaques d'impression lithographique par une couche intermediaire |
| US4152158A (en) * | 1971-10-08 | 1979-05-01 | Polychrome Corporation | Electrochemically treated photo-lithographic plates |
| US4159227A (en) * | 1976-03-22 | 1979-06-26 | Sundquist Charles T | Dual temperature direct contact condenser sumps |
| US4301229A (en) * | 1978-03-27 | 1981-11-17 | Fuji Photo Film Co., Ltd. | Electrolytically grained aluminum support for making a lithographic plate and presensitized lithographic printing plate |
| US4427765A (en) | 1981-07-06 | 1984-01-24 | Hoechst Aktiengesellschaft | Hydrophilic coating of salt-type phosphorus or sulfur polymer on aluminum support materials for offset printing plates and process for manufacture and use with light sensitive layer thereon |
| US4427766A (en) | 1981-07-06 | 1984-01-24 | Hoechst Aktiengesellschaft | Hydrophilic coating of salt type nitrogen polymer on aluminum support materials for offset printing plates and process for manufacture and use with light sensitive layer thereon |
| US4458005A (en) * | 1981-07-06 | 1984-07-03 | Hoechst Aktiengesellschaft | Polyvinylmethylphosphinic acid, process for its manufacture and use |
| US4554216A (en) * | 1982-02-23 | 1985-11-19 | Hoechst Aktiengesellschaft | Process for manufacturing support materials for offset printing plates |
| US4554057A (en) * | 1982-02-23 | 1985-11-19 | Hoechst Aktiengesellschaft | Process for manufacturing support materials for offset printing plates |
| US4782000A (en) * | 1986-08-16 | 1988-11-01 | Basf Aktiengesellschaft | Electrophotographic recording elements with hydrolyzed silane layer |
| US4935332A (en) * | 1986-08-16 | 1990-06-19 | Basf Aktiengesellschaft | Photosensitive element having an aluminum base and silane intermediate layer |
| US5073475A (en) * | 1989-08-31 | 1991-12-17 | Basf Aktiengesellschaft | Production of plate-like, sheet-like or tape-like materials and of sensitized lithographic printing plates |
| US5178963A (en) * | 1990-07-21 | 1993-01-12 | Hoechst Aktiengesellschaft | Hydrophilic copolymers and their use in reprography |
| US5178961A (en) * | 1990-07-21 | 1993-01-12 | Hoechst Aktiengesellschaft | Thermally crosslinkable hydrophilic copolymers and their use in reprography |
| US5219664A (en) * | 1990-07-21 | 1993-06-15 | Hoechst Aktiengesellschaft | Hydrophilic copolymers and their use in reprography |
| US5262244A (en) * | 1990-07-21 | 1993-11-16 | Hoechst Aktiengesellschaft | Hydrophilic copolymers and their use in reprography |
| US5302460A (en) * | 1990-07-21 | 1994-04-12 | Hoechst Aktiengesellschaft | Support material for offset-printing plates in the form of a sheet, a foil or a web process for its production and offset-printing plate comprising said material |
| FR2780337A1 (fr) * | 1998-06-29 | 1999-12-31 | Okamoto Chemical Industry Co L | Procede pour la formation d'un substrat d'aluminium pour une plaque lithographique et pour une plaque lithographique presensibilisee |
| WO2002000442A1 (en) * | 2000-06-26 | 2002-01-03 | Kodak Polychrome Graphics Co. Ltd. | Imaging member containing heat-sensitive thiosulphate polymer andmethods of use |
| EP1176031A1 (en) * | 2000-07-17 | 2002-01-30 | Agfa-Gevaert | Production of support for lithographic printing plate |
| US6540901B2 (en) | 2000-07-17 | 2003-04-01 | Agfa-Gevaert | Production of support for lithographic printing plate |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL156092B (nl) * | 1968-03-25 | 1978-03-15 | Polychrome Corp | Werkwijze voor de vervaardiging van een lithografische drukplaat. |
| US4966659A (en) * | 1988-06-03 | 1990-10-30 | Sumitomo Metal Industries, Ltd. | Method for molten salt electroplating of steel |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2008733A (en) * | 1932-05-26 | 1935-07-23 | Aluminum Co Of America | Treatment of coatings |
| US3030210A (en) * | 1959-02-12 | 1962-04-17 | Gen Aniline & Film Corp | Treatment of metal surfaces for the manufacture of lithographic plates |
| US3066055A (en) * | 1958-11-10 | 1962-11-27 | Purex Corp Ltd | Process and composition for producing aluminum surface conversion coatings |
| US3160506A (en) * | 1962-10-19 | 1964-12-08 | Polychrome Corp | Planographic printing plate and method for preparing same |
| US3169065A (en) * | 1960-10-11 | 1965-02-09 | Harris Intertype Corp | Method of making resist and deep etch lithographic printing plates with ferric ammonium compound sensitized plates |
| US3181461A (en) * | 1963-05-23 | 1965-05-04 | Howard A Fromson | Photographic plate |
-
1965
- 1965-02-05 US US430753A patent/US3440050A/en not_active Expired - Lifetime
-
1966
- 1966-01-25 GB GB3338/66A patent/GB1128506A/en not_active Expired
- 1966-02-03 SE SE1413/66A patent/SE314994B/xx unknown
- 1966-02-05 DE DEP38702A patent/DE1300415B/de active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2008733A (en) * | 1932-05-26 | 1935-07-23 | Aluminum Co Of America | Treatment of coatings |
| US3066055A (en) * | 1958-11-10 | 1962-11-27 | Purex Corp Ltd | Process and composition for producing aluminum surface conversion coatings |
| US3030210A (en) * | 1959-02-12 | 1962-04-17 | Gen Aniline & Film Corp | Treatment of metal surfaces for the manufacture of lithographic plates |
| US3169065A (en) * | 1960-10-11 | 1965-02-09 | Harris Intertype Corp | Method of making resist and deep etch lithographic printing plates with ferric ammonium compound sensitized plates |
| US3160506A (en) * | 1962-10-19 | 1964-12-08 | Polychrome Corp | Planographic printing plate and method for preparing same |
| US3181461A (en) * | 1963-05-23 | 1965-05-04 | Howard A Fromson | Photographic plate |
Cited By (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3765894A (en) * | 1967-04-03 | 1973-10-16 | Polychrome Corp | Elevated image printing plate |
| US3658662A (en) * | 1969-01-21 | 1972-04-25 | Durolith Corp | Corrosion resistant metallic plates particularly useful as support members for photo-lithographic plates and the like |
| US4152158A (en) * | 1971-10-08 | 1979-05-01 | Polychrome Corporation | Electrochemically treated photo-lithographic plates |
| FR2308956A1 (fr) * | 1975-04-21 | 1976-11-19 | Minnesota Mining & Mfg | Plaques lithographiques et leur preparation |
| US4018605A (en) * | 1975-04-21 | 1977-04-19 | Minnesota Mining And Manufacturing Company | Metal lithographic plate made imageable by diffusion transfer by treatment with Group IV-B metal fluoride |
| US4159227A (en) * | 1976-03-22 | 1979-06-26 | Sundquist Charles T | Dual temperature direct contact condenser sumps |
| US4090880A (en) * | 1977-03-03 | 1978-05-23 | Polychrome Corporation | Lithographic printing plate and method of making same |
| FR2388305A1 (fr) * | 1977-04-18 | 1978-11-17 | Polychrome Corp | Traitement ameliore des plaques d'impression lithographique par une couche intermediaire |
| US4301229A (en) * | 1978-03-27 | 1981-11-17 | Fuji Photo Film Co., Ltd. | Electrolytically grained aluminum support for making a lithographic plate and presensitized lithographic printing plate |
| US4427765A (en) | 1981-07-06 | 1984-01-24 | Hoechst Aktiengesellschaft | Hydrophilic coating of salt-type phosphorus or sulfur polymer on aluminum support materials for offset printing plates and process for manufacture and use with light sensitive layer thereon |
| US4427766A (en) | 1981-07-06 | 1984-01-24 | Hoechst Aktiengesellschaft | Hydrophilic coating of salt type nitrogen polymer on aluminum support materials for offset printing plates and process for manufacture and use with light sensitive layer thereon |
| US4458005A (en) * | 1981-07-06 | 1984-07-03 | Hoechst Aktiengesellschaft | Polyvinylmethylphosphinic acid, process for its manufacture and use |
| US4554216A (en) * | 1982-02-23 | 1985-11-19 | Hoechst Aktiengesellschaft | Process for manufacturing support materials for offset printing plates |
| US4554057A (en) * | 1982-02-23 | 1985-11-19 | Hoechst Aktiengesellschaft | Process for manufacturing support materials for offset printing plates |
| US4782000A (en) * | 1986-08-16 | 1988-11-01 | Basf Aktiengesellschaft | Electrophotographic recording elements with hydrolyzed silane layer |
| US4935332A (en) * | 1986-08-16 | 1990-06-19 | Basf Aktiengesellschaft | Photosensitive element having an aluminum base and silane intermediate layer |
| US5073475A (en) * | 1989-08-31 | 1991-12-17 | Basf Aktiengesellschaft | Production of plate-like, sheet-like or tape-like materials and of sensitized lithographic printing plates |
| US5219664A (en) * | 1990-07-21 | 1993-06-15 | Hoechst Aktiengesellschaft | Hydrophilic copolymers and their use in reprography |
| US5178961A (en) * | 1990-07-21 | 1993-01-12 | Hoechst Aktiengesellschaft | Thermally crosslinkable hydrophilic copolymers and their use in reprography |
| US5178963A (en) * | 1990-07-21 | 1993-01-12 | Hoechst Aktiengesellschaft | Hydrophilic copolymers and their use in reprography |
| US5262244A (en) * | 1990-07-21 | 1993-11-16 | Hoechst Aktiengesellschaft | Hydrophilic copolymers and their use in reprography |
| US5302460A (en) * | 1990-07-21 | 1994-04-12 | Hoechst Aktiengesellschaft | Support material for offset-printing plates in the form of a sheet, a foil or a web process for its production and offset-printing plate comprising said material |
| FR2780337A1 (fr) * | 1998-06-29 | 1999-12-31 | Okamoto Chemical Industry Co L | Procede pour la formation d'un substrat d'aluminium pour une plaque lithographique et pour une plaque lithographique presensibilisee |
| WO2002000442A1 (en) * | 2000-06-26 | 2002-01-03 | Kodak Polychrome Graphics Co. Ltd. | Imaging member containing heat-sensitive thiosulphate polymer andmethods of use |
| US6465152B1 (en) | 2000-06-26 | 2002-10-15 | Kodak Polychrome Graphics Llc | Imaging member containing heat sensitive thiosulfate polymer on improved substrate and methods of use |
| EP1176031A1 (en) * | 2000-07-17 | 2002-01-30 | Agfa-Gevaert | Production of support for lithographic printing plate |
| US6540901B2 (en) | 2000-07-17 | 2003-04-01 | Agfa-Gevaert | Production of support for lithographic printing plate |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1128506A (en) | 1968-09-25 |
| SE314994B (enrdf_load_stackoverflow) | 1969-09-22 |
| DE1300415B (de) | 1969-07-31 |
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