US3086114A - Electron microscope diaphragm arrangement with auxiliary device for X-ray spectroscopy of irradiated specimen - Google Patents

Electron microscope diaphragm arrangement with auxiliary device for X-ray spectroscopy of irradiated specimen Download PDF

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US3086114A
US3086114A US22262A US2226260A US3086114A US 3086114 A US3086114 A US 3086114A US 22262 A US22262 A US 22262A US 2226260 A US2226260 A US 2226260A US 3086114 A US3086114 A US 3086114A
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Prior art keywords
diaphragm
specimen
auxiliary
electron microscope
auxiliary device
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Expired - Lifetime
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US22262A
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Herrmann Karl-Heinz
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Siemens and Halske AG
Siemens AG
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Siemens AG
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/079—Investigating materials by wave or particle radiation secondary emission incident electron beam and measuring excited X-rays
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/316—Accessories, mechanical or electrical features collimators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/40—Imaging
    • G01N2223/418—Imaging electron microscope

Definitions

  • This invention is concerned with a diaphragm arrangement for electron microscopes with an auxiliary device for X-ray spectroscopy of radiation permeable specimen.
  • Specimen in a permeating radiation electron microscope emit X-rays during the electron irradiation thereof. It has been proposed to carry out an elementary analysis of the specimen by spectral resolution of these X-rays with the aid of X-ray spectrometers cooperatively associated with the electron microscope.
  • the diameter of the irradiated specimen area is advantageously reduced to a few microns, which is in view of the simultaneously required high density of the illuminating current most advantageously achieved with the aid of a plural stage condenser.
  • Irradiated specimen exhibit a considerably lower X- ray yield than massive specimen, so that few electrons falling upon the massive parts of the specimen diaphragm produce already a stronger X-ray radiation than would be produced by more intensive irradiation of the specimen.
  • scattered electrons are therefore to be carefully kept away from the massive rim of the specimen diaphragm.
  • scattered electrons originate abundantly, for example, at the condenser aperture diaphragm.
  • the invention avoids this disburbance by the provision of an auxiliary diaphragm disposed between the specimen and the condenser, the aperture of which is smaller than that of the object diaphragm, but large enough so that it is not impacted by the direct radiation of the illuminating beam. If the auxiliary diaphragm is centered with respect to the specimen diaphragm, the scattered electrons are kept away from the massive rim of the specimen diaphragm. In order to facilitate the centering, it is advantageous to dispose the preceding diaphragm so that it can be displaced perpendicularly to the electron beam.
  • auxiliary diaphragm 2 Ahead of the specimen diaphragm 1 is disposed the auxiliary diaphragm 2. Both diaphragms are rigidly interconnected by means of the object cartridge 3.
  • the X-ray radiation enters into the spectrometer 5 through 3,086,114 Patented Apr. 16, 1963 the channel 4.
  • the schematically indicated condenser lens and 7 indicates the aperture diaphragm; numeral '8 indicates the objective lens of the electron microscope. In this arrangement, unavoidable tolerances must be equalized or compensated by condenser tipping.
  • auxiliary diaphragm In order to satisfy particularly high requirements, it may in some cases be necessary to shield also the secondary scattering electron radiation of the auxiliary diaphragm. This may be obtained by the provision of further diaphragms positioned above the specimen. The diaphragm diameter must thereby increase in the irradiation direction, but must in all diaphragms remain smaller than the diameter of the specimen diaphragm.

Description

Aprll 16, 1963- KARL-HEINZ HERRMANN 3,086,114
ELECTRON MICROSCOPE DIAPHRAGM ARRANGEMENT WITH AUXILIARY DEVICE FOR X-RAY SPECTROSCOPY 0F IRRADIATED SPECIMEN Filed April 14, 1960 United States Patent 3,086,114 ELECTRON MICROSCOPE DIAPHRAGM AR- RANQEMENT WITH AUXILIARY DEVICE. FOR X-RAY SPECTROSCOPY 0F IRRADI- ATEI) SPECIMEN Karl-Heinz Herrmann, Berlin-Zehlendorf, Germany, as-
signor to Siemens & Halske Aktiengesellschaft Berlin and Munich, a corporation of Germany Filed Apr. 14, 1960, Ser. No. 22,262 Claims priority, application Germany May 26, 1959 3 Claims. (Cl. 25051.5)
This invention is concerned with a diaphragm arrangement for electron microscopes with an auxiliary device for X-ray spectroscopy of radiation permeable specimen.
Specimen in a permeating radiation electron microscope emit X-rays during the electron irradiation thereof. It has been proposed to carry out an elementary analysis of the specimen by spectral resolution of these X-rays with the aid of X-ray spectrometers cooperatively associated with the electron microscope. In order to comprehend for the spectral analysis specimen details as small as possible, the diameter of the irradiated specimen area is advantageously reduced to a few microns, which is in view of the simultaneously required high density of the illuminating current most advantageously achieved with the aid of a plural stage condenser.
Irradiated specimen exhibit a considerably lower X- ray yield than massive specimen, so that few electrons falling upon the massive parts of the specimen diaphragm produce already a stronger X-ray radiation than would be produced by more intensive irradiation of the specimen. In order to provide for a clean-cut spectral analysis, scattered electrons are therefore to be carefully kept away from the massive rim of the specimen diaphragm. However, scattered electrons originate abundantly, for example, at the condenser aperture diaphragm.
The invention avoids this disburbance by the provision of an auxiliary diaphragm disposed between the specimen and the condenser, the aperture of which is smaller than that of the object diaphragm, but large enough so that it is not impacted by the direct radiation of the illuminating beam. If the auxiliary diaphragm is centered with respect to the specimen diaphragm, the scattered electrons are kept away from the massive rim of the specimen diaphragm. In order to facilitate the centering, it is advantageous to dispose the preceding diaphragm so that it can be displaced perpendicularly to the electron beam.
An embodiment of the invention is shown in simplified diagrammatic manner in the accompanying drawing.
Ahead of the specimen diaphragm 1 is disposed the auxiliary diaphragm 2. Both diaphragms are rigidly interconnected by means of the object cartridge 3. The X-ray radiation enters into the spectrometer 5 through 3,086,114 Patented Apr. 16, 1963 the channel 4. At 6 is provided the schematically indicated condenser lens and 7 indicates the aperture diaphragm; numeral '8 indicates the objective lens of the electron microscope. In this arrangement, unavoidable tolerances must be equalized or compensated by condenser tipping.
In order to satisfy particularly high requirements, it may in some cases be necessary to shield also the secondary scattering electron radiation of the auxiliary diaphragm. This may be obtained by the provision of further diaphragms positioned above the specimen. The diaphragm diameter must thereby increase in the irradiation direction, but must in all diaphragms remain smaller than the diameter of the specimen diaphragm.
Changes may be made within the scope and spirit of the appended claims which define what is believed to be new and desired to have protected by Letters Patent.
I claim:
1. A diaphragm arrangement for an electron microscope having an auxiliary device for X-ray spectroscopy of radiation permeable specimens, comprising a first apertured diaphragm which determines the cross-sectional area of the direct radiation of the illuminating beam, a second specimen diaphragm which is not impacted by the direct radiation due to the size of the aperture thereof, at least one auxiliary diaphragm disposed between said first and second diaphragms having an aperture of a size lying between the size of the apertures of the first and second diaphragms, said arrangement being constructed for the operative disposition of spectrometer means between said auxiliary and specimen diaphragms, said auxiliary diaphragm being efiective to keep away from the specimen diaphragm scattered electrons originating at said first diaphragm and being not impacted by the direct radiation.
2. A diaphragm arrangement according to claim 1, wherein the auxiliary diaphragm arranged above the specimen diaphragm is displaceable in a plane extending perpendicular to the direction of the electron beam.
3. A diaphragm arrangement according to claim 1, wherein the size of the apertures of said auxiliary diaphragm and said specimen diaphragm increases in the direction of illumination.
References Cited in the file of this patent UNITED STATES PATENTS 1,865,441 Mutscheller July 5, 1932 2,098,990 Newton Nov. 16, 1937 2,260,041 Mahl et al. Oct. 2-1, 1941 2,386,785 Friedman Oct. 16, 1945 2,418,029 Hillier Mar. 25, 1947 2,819,404 Herrnring et al. Jan. 7, 1958 2,846,589 Pellissier et al. Aug. 5, 1958

Claims (1)

1. A DIAPHRAGM ARRANGEMENT FOR AN ELECTRON MICROSCOPE HAVING AN AUXILIARY DEVICE FOR X-RAY SPECTROSCOPY OF RADIATION PERMEABLE SPECIMENS, COMPRISING A FIRST APERTURED DIAPHRAGM WHICH DETERMINES THE CROSS-SECTIONAL AREA OF THE DIRECT RADIATION OF THE ILLUMINATING BEAM, A SECOND SPECIMEN DIAPHRAGM WHICH IS NOT IMPACTED BY THE DIRECT RADIATION DUE TO THE SIZE OF THE APERTURE THEREOF, AT LEAST ONE AUXILIARY DIAPHRAGM DISPOSED BETWEEN SAID FIRST AND SECOND DIAPHRAGMS HAVING AN APERTURE OF A SIZE LYING BETWEEN THE SIZE OF THE APERTURES OF THE FIRST AND SECOND DIAPHRAGMS, SAID ARRANGEMENT BEING CONSTRUCTED FOR THE OPERATIVE DISPOSITION OF SPECTROMETER MEANS BETWEEN SAID AUXILIARY AND SPECIMEN DIAPHRAGMS, SAID AUXILIARY DIAPHRAGM BEING EFFECTIVE TO KEEP AWAY FROM THE SPECIMEN DIAPHRAGM SCATTERED ELECTRONS ORIGINATING AT SAID FIRST DIAPHRAGM AND BEING NOT IMPACTED BY THE DIRECT RADIATION.
US22262A 1959-05-26 1960-04-14 Electron microscope diaphragm arrangement with auxiliary device for X-ray spectroscopy of irradiated specimen Expired - Lifetime US3086114A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DES63144A DE1099102B (en) 1959-05-26 1959-05-26 Aperture arrangement for electron microscopes with additional equipment for X-ray spectroscopy of translucent preparations

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US3086114A true US3086114A (en) 1963-04-16

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CH (1) CH384093A (en)
DE (1) DE1099102B (en)
GB (1) GB915299A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3155827A (en) * 1960-04-07 1964-11-03 Hilger & Watts Ltd Electron microscope with a secondary electron source utilized for electron probe analysis

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1865441A (en) * 1923-08-04 1932-07-05 Wappler Electric Company Inc Method of and apparatus for controlling the direction of x-rays
US2098990A (en) * 1934-03-10 1937-11-16 Phillip S Newton Therapeutic lamp and method
US2260041A (en) * 1939-03-22 1941-10-21 Gen Electric Electron microscope
US2386785A (en) * 1942-07-28 1945-10-16 Friedman Herbert Method and means for measuring x-ray diffraction patterns
US2418029A (en) * 1943-10-08 1947-03-25 Rca Corp Electron probe analysis employing X-ray spectrography
US2819404A (en) * 1951-05-25 1958-01-07 Herrnring Gunther Optical image-forming mirror systems having aspherical reflecting surfaces
US2846589A (en) * 1954-04-01 1958-08-05 United States Steel Corp Apparatus for determining the thickness of zinc coating on a ferrous metal base

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1865441A (en) * 1923-08-04 1932-07-05 Wappler Electric Company Inc Method of and apparatus for controlling the direction of x-rays
US2098990A (en) * 1934-03-10 1937-11-16 Phillip S Newton Therapeutic lamp and method
US2260041A (en) * 1939-03-22 1941-10-21 Gen Electric Electron microscope
US2386785A (en) * 1942-07-28 1945-10-16 Friedman Herbert Method and means for measuring x-ray diffraction patterns
US2418029A (en) * 1943-10-08 1947-03-25 Rca Corp Electron probe analysis employing X-ray spectrography
US2819404A (en) * 1951-05-25 1958-01-07 Herrnring Gunther Optical image-forming mirror systems having aspherical reflecting surfaces
US2846589A (en) * 1954-04-01 1958-08-05 United States Steel Corp Apparatus for determining the thickness of zinc coating on a ferrous metal base

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3155827A (en) * 1960-04-07 1964-11-03 Hilger & Watts Ltd Electron microscope with a secondary electron source utilized for electron probe analysis

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Publication number Publication date
GB915299A (en) 1963-01-09
CH384093A (en) 1964-11-15
DE1099102B (en) 1961-02-09

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