US2592035A

US2592035A - Photoelectric exposure control

Info

Publication number: US2592035A
Application number: US32908A
Authority: US
Inventors: Jacoby George
Original assignee: IRENE PAPCSY
Current assignee: IRENE PAPCSY
Priority date: 1947-06-27
Filing date: 1948-06-14
Publication date: 1952-04-08
Anticipated expiration: 1969-04-08

Description

April 8, 1952 G. JACOBY PHOTOELECTRIC EXPOSURE CONTROL 4 Sheets-Sheet 2 Filed June 14, 1948 in A d JYAVAYAV VAVAVAV V- 60 I25 250 J00 1000 2000 4000 8000 10000 32000 64000 lux 5a log L April 8, 1952 G. JACOBY PHOTOELECTRIC EXPOSURE CONTROL 4 Sheets-Sheet 3 Filed June 14, 1948 INVENTOR:

April 1952 G. JACOBY 2,592,035

PHOTOELECTRIC EXPOSURE CONTROL Filed June 14, 1948 4 Sheets-Sheet 4 I I I I I I I I I25 250 .500 1000 2000 4000 8000 15000 33000 lux log 1., log L 3 Fig. 14. I H

Hi fi'fi r-q' l I INVENTOR: @\zl I 22 l I I Patented Apr. 8, 1952 noronmcrmc EXPOSURECONTR'OL George J acoby, Marquartstein; Germanyrassignor.

of one-twentieth: to Ralph s; Schubert,- Alexandria Var, and Irene Papcsy, .-Newark, NwJ.

Application .J une14, 194'8,Serial No. 32 908 1' In France J une-27-,1947 Y 14Claims.

This invention relates to photographic exposure meters for determining-a satisfactory relation among the values vofa number of variable factors (hereinafter called exposure controlling factors) which in combination will result in a desired quality of exposure (herein termed correct exposure) The invention isexclusively concerned with exposure meters incorporating a photoelectric cell 'in'whichthe intensity of the prevailing light is taken into accountby variation of the produced by the cell, and therefore light intensity is herein "not regarded as one ofthe exposure controlling factors;-this term being confined to other'variable factors which, when their values havea certain relation, combine to achieve correct exposure at all light intensities. In all cases, the exposure controlling factors include exposure time (or shutter speed) and lens aperture (or stop). In some cases, it maybe desired to, take into consideration other exposure controlling factors, examples of which are sensitivity (or speed) of the photographic material and light absorption by .lens attachments or filters or by the lens itself when the latter is interchangeable;

More particularly. the invention'relates to exposure meters of the kind comprising :a photo'- electric cell,'an electric current measuringand indicating instrument, and resistance means'electrically' connected in circuit with-the 'celland the instrument and adapted to have its resistance value variedin accordance with the values of those exposure controlling factorswhich are to be taken into consideratiom'the-instrumentindi eating a predetermined current value whenever the values of the exposure controlling'factors are such as will in combination result in correctexposure.

It is evident that an exposure-meter of the kind specified must be provided with'adjusting means for varying said resistance means in accordance with the variation of the exposure controlling factors. Although the exposure meter may be a device separate and distinct from the camera, it will be most useful when built into or incorporated in the camera; in that case the adjusting means for varying said resistance means conveniently may be constituted by the means for varying the exposure controlling factors, which latter means will herein :be generically referred to as exposure control means! Photographic cameras areknown which incorporate exposure meters of the kind specified. Ii -one known form, the individual resistors of said resistance means are all connected in series 2 1 with each :other and with i the.measuringrinstrue mentpbut it -is also :known toconnect one resistor in-series withthetmeasuring instrument and a further resistor in parallelxwithitl .A metho'd of arranging said resistance means. has .also zbeen proposed according to .:which .two resistorsslare varied-simultaneously by :one. of the exposure control means, oneof these resistorsisconnected in :series .with the measuring instrument, and

"' the otheris'shuntin'g:theinstrument. The values in series =or:in parallel with said two resistors.

None-of these-known exposure meters, however,

produce satisfactory results, having regard to the properties of suchphotoelectric cells as are at present available, for :reasons which -willheres inafter-be discussed.

With reference to the-accompanying drawings forming part of the speci-ficationpthe following is a brief description ofthem:

Fig. 1 is a graph showing characteristiccurves of a photoelectric 'ce1l.

Fig-.--2 is a circuit diagram :of one-form of'exposure meter embodying the inventionwherei-n all resistances are connected-in series to the'instrumentybut so as to form two branches -in parallel--relation to each other.

Fig.3 is a graph showing values of resistances plotted against the light intensity in the circuit of the exposure meter according to Fig. 2.

Fig.4 is a modification oi Fig. 2.

Fig. 5 is acircuit diagram of another form of exposure meter embodying the invention wherein there are resistances connected directly in series to theinstrument and resistances connected in parallel to the instrument.

Fig. 6 is a graph showing values-of resistances plotted against the light intensityincthe circuit Of Fig; 5.:

Fig.7 is a modificationof Fig;

Fig-8 is a circuit diagramof a third form of exposure meter embodying the invention wherein there are resistances connected in-parallel to theinstrument and resistances connected in series to the instrument andsaid parallel-resistances.

Fig; 9 is a circuit diagram or a fourth tem of exposure I meter embodying the invention wherein said resistances form a bridge connection.

Fig. is a simplified circuit with which the bridge circuit of Fig. 9 is identical.

Fig. 11 is a graph showing values of resistances plotted against the light intensity in the circuit of Fig. 9. r I

Fig. 12 is a simplified version of the circuit diagram, of Fig. 5, including means to compensate for difierences in the properties of different photoelectric cells and different measuring instruments. V

Fig. 13 shows, by way of example, constructional details of mechanical coupling the resistances with a ring controlling the exposure.

Fig. 14. shows, by way of example, constructional details of mechanical coupling between the resistances and a scale showing the film speed values.

For the purpose of discussing the prior art and the principle underlying the present invention it will be desirable to examine the properties of photoelectric cells at present available, by means of measurements which have been made of the electric current supplied by such cells at different light intensities and with different values of the external circuit resistance, i. e. resistance excluding that of the cell. Fig. 1 shows a graph constructed from these measurements, in which the current J supplied by a cell is plotted against light intensity L for different values of the total external circuit resistance R. The resulting curves are the characteristic curves of the cell. It should be noted that the values which have been here selected for the total external circuit resistance (R1, R2, R3 etc.) go up in even steps. Light intensity L has been plotted using a logarithmic scale because this enables the principle underlying the present invention and the disadvantages of the prior art to be more easily understood and is in accord with the most usual practice in graduating the marks of the exposure control means on photographic cameras. Thus, in Fig. 1 the values of light intensity corresponding to successive graduation marks of the exposure control means are spaced apart equidistantly.

The exposure meters of the prior art herein- .before referred to will now be examined in relation to Fi 1.

In the known exposure meter in which all resistors are connected in series with each other and with the measuring instrument, the current indicated by the latter equals the cell current and thus, for a correct combination of all exposure controlling factors, the cell current J must have'the same predetermined value for all light intensities. This is shown in Fig. l by a horizontal 1ine.J1 by means of which the characteristic curves determine the required values of the total external circuit resistance for different light intensities. These resistance values, however, do not vary linearly with varying values of log L, since the characteristic curves are steeper with the smaller resistance values than with the larger ones. Therefore, the distances on the line J1 between the points of intersection with the characteristic curves are not equal. This means that the values of resistance variation which provide a constant instrument current with varying values of light intensity are not all equal. They are greater for small values of light intensity than for high values. However, since several exposure controlling factors have to be taken into consideration, a separate resistor for each factor must be series-connected in the circuit. The values of resistance variation corresponding to the values of variation of the exposure controlling factors should be equal in order to be able to combine the various factors freely. If at a given light intensity, correct exposure can be achieved by altering the exposure controlling factors by a certain number of values it should make absolutely no difference whether this alteration is made by varying one exposure controlling factor or combination of factors or a different factor or factor combination. This would be possible only if all the values of resistance variation were equal; this cannot be the case in an arrangement having only series-connected resistors and the photoelectric cells at present available, because the characteristic curves of the latter are not parallel but diverge (as shown in Fig. 1) therefore, the exposure control cannot be effected satisfactorily by such an arrangement.

Inthe other known exposure meter hereinbefore referred to, one resistor, variable in accordance with the variation of one of the exposure controlling factors, is connected in series with the measuring instrument, while another resistor, variable in accordance with the variation of a second exposure controlling factor, is connected in parallel with the instrument. In this arrangement, if the series resistor is varied and the parallel resistor is unchanged, conditions are similar to those described in the preceding paragraph; that is to say, the cell current for correct exposure must be the same with different values of light intensity (e. g. J1 in Fig. 1). If the parallel resistor alone is varied, then, in order to obtain constant instrument current at the predetermined value with different light intensities, the cell current must have varying values that depend on the variation of the parallel resistor. Thus, for example. for a given number of values of variation of the parallel resistor in accordance with said second exposure controlling factor. the cell current will be J2 in Fig. 2. If thereafter it is desired to effect further values of variation of said first mentioned facton by means of the series resistor, the cell current= must be kept constant at J2 for constant instru-\ ment current, and not at J1 as before, with the result that quite different values of variation of the series resistor will be required, because the distances between the characteristic curves are .greater for higher current values than for lower ously with the parallel resistor, i. e. by variation of the aforesaid second exposure controlling factor so as to maintain the combined resistance of, instrument, parallel resistor, and additional series resistor at a constant value. Therefore if the aforesaid first exposure controlling factor is varied, and with it the main series resistor, the cell current for correct exposure must be the same for all values of light intensity (e. g. J1 in Fig. 1)

this determines the values of variation of the ,main series resistor which is varied with said first factor.

Assuming that upon a change of light intensity, it is desired to make allowance for this change by varying only said second exposure controlling factor; this will cause the paralleland the additional series resistors .to-be altered so as to restore the-instrumentcurrent to its predetermined value for-correctexposure by alteration of the cell current, but theresultant circuit resistance will not .bealtered thereby. This change in cell current is graphically represented in Fig. 1 by moving from J1 to J2 along one of the,characteristic-curves (e. g- R13), since the total circuit resistance remains :constant. If thereafter it is-desired to-vary-said first exposure controlling factor, the consequent variation of themain series resistor in order tokeep the instrument current constant at said-predeter mined value .for correct exposure, will have to be such that the-cell cu-rent remains constant, but at the new value J2 and notat the .previous value J1. As in thearrangement discussed in the preceding paragraph, therefore; the main series resistor will now have to be varied by values of a different size.

The objection to all knownarrangement may besummed up by saying that it is impossible to eifect satisfactory exposure. control by a system in which one factor'controls a resistor and the other factor controls another resistor, these two resistors occupying dilferentpositions in the circuit in relation to the instrument, because the values which these resistors musthave for correct exposure are dependent on each other.

In contrast to the foregoing, the underlying principle of the present invention canbe described as follows: circuit relations are usedin which the resistancescomprise two branches-connected to one side of the photocell in parallel relation to each other, each branch comprising a plurality of resistances; a separate resistance adjusting means from each branch is mechanically coupled to each of the-exposure control means, the two branches being connected-at their opposite ends to each other and by means to the other side of the photocell and said resistance adjusting means being correlated with the exposure factors whereby the adjustment of the resistances causes the instrument to indicate a constantcu-rrent in accordance with the factors andthe light falling on the cell. Thereforato each exposure controlling factor one. resistance is --correlated from each branch and consequently the resultant resistance of the whole circuit is affected by the variation of each factor in the same way,because the resistances, being in the same branch, willbe varied according to the same regularity. Throughout the wholerange of control, the cell current has tofollow a certain run in function of the logarithm of light intensity in order to keep the instrument current at its predetermined constant value. From the intersections of the cell'current curve with the characteristic curves (Fig. 1), the run of the resultant external resistance of the circuit can be determined in function of the logarithm of light intensity. This run if of such a nature, as will be shown later in the detailed description, that it can be approximated a great deal by using two branches of resistances connected in parallel relation toeach other. This approximationis so close to the ideal curvethat it supplies sufliciently good results in all practical applications, as will be seen from thenumerical examples. So the individual resistances of-each branch and the variations of theseresistances correlated with the exposure controlling factors can be calculated :from :the characteristic curves of the photocell. The principle of;pr.esent inventlon makes, it'possible to construct exposure meter circuits .whichithe, variation of resistances cone trolledbycone factor is not influenced by that of other factors, assuring that. any combination of the factors resulting incorrect exposure with a certain light intensity. can .be controlled by the instrument indicating a constant current; furthermore, the circuits are adapted ,tothe actual characteristic of the self-generating photoelectrio cells; neither of these features can be achieved by arrangementsrotherthan those found in the presentinvention.

Inthe description which follows each arrangement is shown to bedesigned to take three exposure controlling factors into consideration (aperture orstop, shutterspced or exposure time, and the speed or. sensitivity of the photographic emulsion), which are referred to as, and inuthe drawings the. parts associated therewith are in. dicated by Roman numerals .I, .II. and ,III. It should be pointed out that other exposure con,- trolling factors (as e. .g. light absorption ,of lens attachments or filters) can be taken into consideration too, by using additional resistances in the circuits in exactly the way shown for the above mentioned three factors. In all arrangements described, it will be assumed that the ex.- posure meter is incorporated in thecamera. The manner of using the exposure meter will not be particularly mentionedin each case,,it being obvious that the user merely has to focus the camera on the object he wishes to photograph, adjust the exposure setting controls until the instrument indicates the predetermined current for correct exposure, keeping in mind the desirable or unavoidablevalues of some of .the exposure controlling factors in the prevailing circumstances, and make the exposure.

In the arrangement in Fig. 2, all resistors are connected inseries with'the instrument and are contained in two branches of a parallel network. One branch-contains a fixed resistor A and three variable resistors R31, R52, and Rah, while the other branch contains a fixed resistor B and three variable resistors Rbl, RbZ and Etc. The resistors RM and Rm are varied simultaneously by the exposure control means. of one factor with sliding contact I, in like manner the resistors'Rez and Rbz are jointly operatedwith sliding contact II, and the resistors Ra3 and Rbs are separated with sliding contact III. The two parts of sliding con tacts I and II are electrically insulated from each other, but mechanically they are coupled together. The parts of sliding .contactIII are both electrically andmechanically coupled together.

The exposure control means of the factors for cameras usually are graduated so that .by changing from one value of an exposure controlling factor .toanother value, with the other factors remaining unchanged, the latter.value allows for twice or half the light intensity of the former value in producing correct. exposure. E. g. if a shutter speed of A second produces correct exposure at a given light intensity, a change in the shutter speed to second, all other factors remaining unchanged, produces correct exposure at twice the given light intensity and therefore constitutes-a step of variation of the shutter speed; for the same reason, a change in the lens aperture e. g; from stop f/4 to stop ,f/2.8 or to stop 175.6 is a step of variation of the lens aperture. In other words, successive steps :of variationof eachexposure controlling factor alone achieve correct exposure with. an exponential variation in the light intensity, the; exponentcorresponding to the number of steps of variation. Thus, the logarithmic representation of light intensity in Fig. 1

corresponds at the same time to the steps of variation of the exposure controlling factors.

The variable resistors in Fig. 2 are coordinated to the factors in such a manner that a change in the value of any factor by one step causes a variation of the resistance by the same value, thus constituting resistance steps corresponding to the steps of variation of factors. In each branch, all the resistance steps of the three variable resistors have the same value; the value of each resistance step in the branch containing the resistors Rn, Ra2, and R113 will be denoted by a, and that of each resistance step in the other branch will be denoted by b. It will be apparent that the number (m) of resistance steps included at any time in one branch of the circuit by the sliding contact I (the same number 111 being of course included in the other branch) may differ from the number (m) included at that time by the sliding contact II and from the number (113) included by the sliding contact III. In this arrangement,

however, it will be only necessary to consider the total number n of resistance steps included in either branch at any time by all three sliding contacts together, being of course n1+n2+n3.

It should be pointed out that this arrangement by which one step of resistance variation is coordinated to one step of factor variation, as these steps have been defined above, does not mean that the resistors must be tapped by steps, though this might be the case in many practical applications. The step concept explains only the way of correlation between the variations of resistances and factors. It is entirely possible, according to the principle of this arrangement, to make a continuous variation of resistances with contacts sliding directly on the resistors, thus setting up a continuous exposure control for any factor.

In the arrangement of Fig. 2 the full cell current passes through the measuring instrument and thus the current must reach the same predetermined value over the whole range of regulation from Lt to Lmax, e. g. the line J1 in Fig. 1. As can be seen from the length of the intercepts of the characteristic curves on the line J1 in Fig. 1, the total external resistance required to limit the current to J1 increases as light intensity increases. This is shown in Fig. 3 in which the total external resistance R to provide constant cell current J1 is plotted against log L. By de-' ducting the fixed resistance of the instrument (Rm) from R, the curve Rd is obtained. Thus, to obtain the current J1 at all light intensities the resultant resistance of the resistors in the two branches (Fig. 2) must equal Rd. This readily can be achieved, since the resistance variations in both branches are linear. We have:

where Ra is the resultant resistance of the resistors Rn, Rsz and R33, and Rb is the resultant resistance of the resistors Rm, Rb2 and Rims.

The resultant resistance of two linearly variable resistances connected in parallel is, as is well known, a concave curve as seen from below.

The four constants, A, B, a and b can be chosen at will so that the curve Rd can be approximated closely by the resultant of the resistors in the two parallel branches of the network of Fig. 2.

Fig. 4 shows a modification of Fig. 2, in which in each branch one common resistor is coordinat ed to two factors. As only the total number of resistance steps has to be considered, it is possible to set the sum of RM and Rh resp. that of R112 and R153 on one resistor each, i. e. Rm resp. Rb23, by using two sliding contacts on each resistor. The sliding contact of factor II consists of two parts 11s and 11b, electrically insulated from each other but mechanically coupled together. This coupling is shown schematically by 71.. Between the sliding contacts I13 and III, the sum Ra2+Ra3 will be adjusted in one branch, and at the same time in the other branch Rb2+Rb3 will be set between II]: and III. The resistance steps shown in Fig. 4 are: in one branch a; in the other branch, b.

A numerical example of the values chosen for an exposure meter according to Fig. 4 now will be given. In this example, the arrangement is such that one resistance step is included in the circuit at the minimum light intensity Lo provided for (i. e. n=1 when LzLo) The range of values of the factors provided for in this example are as follows: aperture, F/2 to f/16; shutter speed to second; speed of the photographic material, 34 to 25 Scheiner (24/10" to 15/ 10 DIN).

The light intensity range of the control, Gil-32,000 lux (5-3000 foot-candles) the values of the resistance steps, a=28,8=00 ohms, b=5150 ohms; the constant resistances, A=11,000 ohms, B=30,000 ohms; the instrument resistance, Rm=1500 ohms; the constant current indicating the correct exposure, Im=8 y. amps. The cell used in this example is a selenium photoelectric element with an active surface of 4 cm It was found that the exposure conditions determined by using this construction were accurate to within i10%.

Fig. 5 shows an example of the other main type of circuit embodying the invention; namely, that in which the resistors used are connected partly in series and partly in parallel with the measuring instrument. Two resistors are controlled by each exposure controlling factor; namely, Rsl, and Rpl by that of factor I, R52 and R z by that of factor II, and R53 and R 13 by that of factor III. The resistors are adjusted by sliding contacts I, II and III; each of which has two sliding arms and is mechanically coupled with the corresponding exposure control means; this mechanical coupling however is not shown in Fig. 5. The resistors R5 and R1) are included in a parallel network; one branch of which is connected in series with the instrument and contains the resistors Rs connected in series with each other, while the other branch is connected in parallel with the instrument and contains the resistors Rp which are connected in parallel with each other. Thus each branch contains one variable resistor for each exposure controllin factor. A fixed resistance S shown in dotted lines may be connected in a third branch in series with the instrument but this connection will not be considered at the moment. The circuit contains an additional constant resistor (R11) connected in series with said parallel network. In certain instances this resistor may not be necessary, as will be shown later.

Since the circuit now includes resistors (Rp) connected in parallel with the instrument, the cell current will notbe the same over the whole range of regulation but must vary in such manner that the instrument current is always kept constant at the pedetermined value for correct exposure. The variation of the cell current necessary to ensure this is determined by the rela-v branch (Rm-z and Rs) and ;those in thevbranchw parallel r to the? instrument; (R5);

Before this relation can be determined, as'regular law of variation for 1'Rs:and R first must be'Iset up;

law (see Fig. 6), we have:

Rs:Rsl+Rs2|-Rs3=n.C

where n is, as before, the'total number of re- IUI substituted-for it; im this case this difference curve" can be ap'proximated closely by two par allel-resistance gi'OupS A-F'Ra and B+Rb (similaras that shown-in Fig.8), both varying linearly 5; but in opposite senses,-i. esRs increases as Rb de- II the :resistors' vary linearly. and the r resistors R vary according to va rectangular hyperbolicsistance steps .included the circuit, and 5c is the :value .of each -resistancestep' 'in the l branch containing them resistors';;.

Since the resistorsR i, Rp2 and R s follow a rectangular hyperbolic law;- we have k k k R 1=E Rp2;; Rp3;); where k is the-maximum finite value of each of the three resistors and ni, m and 123 have the meaning hereinbefore explained, their sum being' equal to n.

Let Rp be theresultant resistanceof Rpl, Rpz and Rps; then:

1 1 1 milea e J2 E ED RJRPC k I k I k k and When L=Lo, n=0 and thus 128:0 and R12: 00

This rectangular hyperbolic variation ofthek creases and vice-versa, connected in series with the para'llelnetwork formed by Rs and R instead of Rd'in'Fig. 5;inthis case, altogether four resistances will be coordinatedto each factor.

It has been mentioned previously that 'a resistance-(S) maybe connected in parallel across the resistors (Fig; 5). This has the effect of making the cell current curve-J3 (in Fig. 1) less steep, since theresultant resistance of Rs and S connected in parallel" is "always'less than that of Rs by' itself; the divergence becoming morema'rkedas'n increases (and consequently as L increases) this may be seen clearly upon examination ofthe foregoin-gerelation for a. Thus i-the'va'riation of 'the'total external resistance (R) zsiiplaced the resistors R51, R52 'andRpi, R z, respecwill be" less steep, and R'may be approximated easier.

In-the'arrangement" of Fig; '7, which is a modification of Fig; 5, resistors Rsiz and Rprz have retively; of Figr5; each is controlled' by two exposure controlling factors, namely, factors I and Y H; The-resistors Rs: and R'pz are'adjusted according to the variationsof'factor' III. Accordingly,

sliding 'contactsis and I connected electrically and'mechanic'ally; are moved by the eXpbSuTe controlmeans--'bywhichfactor I is adjusted; sliding contacts 115 and 11p, electrically insulated but mechanically connected, are moved by the ss exposure control -m'eans:by which factor II is adjusted; and sliding contacts D15 and IIIp, connected electrically and mechanically, are moved by the exposure control means by which factor III is adjusted." Asbefore the resistors (R in where. Rp representswthe resultant resistance-,0? 40- parallel with the instrument vary hyperbolically; Rah-R5 and R15 while 2R;- is the algebraidsum of these resistances, i.

Therefore; in order? to maintain the instru-' ment current constant atits'predetermined value at alllight intensities the' cell current must 'var-y overrthe whole range of regulationaccording to" a parabolic curve: Thiscurve 'isshown in Fig. l

by the dotted line J3." The photoelectric'cell will supplythis current if the total external resist ance R of the cell circuitis varied with 'the light intensity in the manner determined" by the points of intersection of the curve'Jawith'th'e constant resistance lines- :in Fig. l This is shown by' the curve R in' Fig. 6,-which alsdsh'ows the 'varia tion= of Rm+RwandRp with light intensity;

By suitable choice of the resistance stepsof the and .Rh resistors: it Y is possible i to make the' curve of the"- resultant l resistance Rsis coincide withfthat of R "(Fig '6) so that Ra' 'may be dis-'- pensed with." Alternatively'iit may be-"possible to iarrange'itheivalues so that the resultant of Rap .and- Rs sufiiciently closely approximates th'e' curve R with Rs remaining-"constant forvary ingwalues "of L, thus'necessitating only: a fixed: i resistor in series with the parallel fnetwork" as shown in Figr 5. In some instances, the :dif-

ierencesbetween Brand .Rs'p 031113658, function of r L so that: a constant: resistance Ra cannot benected in parallel with each otherl The number have beenadjusted; and to this end, the congated contact segments on the'sliding contacts;

th I'GSi StOIS RpIZ and R53 are connected in'par allel with each other."

The resistor Rina iscompos'ed of a number of equal resistance elements (each of value is) conof su'ch elements included in 'the circuit depends on the relative -posltion "ofthe two sliding contacts Iiand-II g ii-ejon the positions to which the exposure control means for factors I and II tacts Ip and'll eachare provided with an elongated contact segment (F and G respectively) whereby the variou's'elements' of'the resistorRpm can be'conn'ected or disconnected in parallel be 55xtween the contact' segments" F and 'G. These terminals 9 of the resistance elements, or the two arrangements maybe used in combination. It

will'beapp'arent from his foregoing that the re-: sistor'R 'izcan-be regarded as a single resistor; whoseresi'stance'value is varied by'adding thereto or-reinoving therefrom one or more parallel re sistance steps (is) in accordance with therela tive'positions' of the contacts-I and II this arrangementds analogous to that of the resistor Rel? Whose resistancevalueis varied by'adding thereto or removing therefrom one or more series resistance steps (6); in accordance with the rela-' tivefpositions-ot thecontacts ls -and lk.

sistors Rpl and RpZ may be provided as in Fig. 5,

instead of the resistor Em.

A numerical example of the values chosen for an exposure meter according to Fig. '7 will now be given. The range of values of the exposure" controlling factors provided for in this example 1 is as follows: aperture, 7/ 2 to f/ 22; shutter speed, 1 to /1000 seconds; speed of photographic material, 34 to 25 Scheiner (24/10 to 15/'10'DIN). The minimum light intensity provided for is 30 lux (2.5 foot-candles) using photographic material of sensitivity 34 Scheiner, 60 lux (5 footcandles) for 31 Scheiner, candles) for 28 Scheiner and 250 lux (20 footcandles) for 25 Scheiner. The maximum light intensity allowed for is 64,000 lux (6000 footcandles). The value of the resistance steps 0 is 3700' ohms, and of the resistance steps is is I000 ohms. The values of Rpz are determined by the fact that they must vary hyperbolically: when n=0, Rp3= .when 11:1, R 3=k=7000 ohms: when n= 2, R, =g= 3500 ohms when n=3, R =2333 ohms Therefore, the resistance steps of R133 must be rated as follows: kso: k31=3500 ohms, 1032:1167 ohms, 7033:2333 ohms. The instrument resistance Rm is 1200 ohms and the predetermined current for correct exposure Jm=12 amps. The cell used, in this example is aselenium photoelectric element with an active surface of 11 cmf If a cell 7 having an active surface of 6 cm? were used, the predetermined instrument current would be 6 amps. The results obtained when using this construction were found to be accurate to within *-15%.

The numerical examples hereinbefore discussed with reference to Figs. 4 and '7 were concerned with exposure meters having relatively large and relatively small external resistances (in the example referring to Fig. 4, R varies between 9500 and 61,000 ohms; in the example referring to Fig. '7, between 3000 and 500 ohms), and with a very wide range of light intensity (L varying between 30 and 64,000 lux). A reduction of the minimum light intensity below 30 lux presents no difiiculties, depending only on the size of the cell surface and on the sensitivity of the measuring instrument. The examples show that the invention is not restricted to a particular range of resistances or light intensities, but is of general usefulness. 1

A further circuit arrangement which also belongs to the type in which the resistances are connected partly in series and partly in parallel is shown in Fig. 8. The circuit comprises resistances connected in parallel with each other and with the instrument and arranged to vary hyperbolically, except that two parallel branches 120 lux (10 foot are arranged in series with said network, com prising resistances (A+Ra and B+Rt are varied linearly in opposite senses. The variation of the cell current necessary to maintain the instrument current constant at the predetermined value for correct exposure is determined solely-by the resultant resistance Rp of these parallel re-" sistors Rm, R112, R a. Thus: I

m mv' where Rmp is the resultant resistance. of R13 an the instrument resistance Rm connected in parallel with each other and is therefore given by Accordingly, in order to maintain the instrument current Jm constant at its predetermined value for correct exposure at all light intensities, the cell current J must vary linearly over the whole range of regulation, as indicated by the straight.

line J4 in Fig. 1. The variation of the resultant external resistance (R) with the light intensity can be determined again from the intercepts of J4. with the characteristic curves in Fig. 1. The subtraction .of Rxnp from R results in a curve the effect of which again may be closely approximated by the two branches A+Ra and B+Rb of the first parallel network.

Linear variation of the cell current (e.' g, as indicated by J4 in Fig. 1) also can be obtained by substituting a fixed resistance for the variable resistors R1) in the circuit diagram of Fig. 5 and inserting the parallel branches of A+Ra and B-I-Rb instead of Rd in Fig. 5. In that case the linear variation of the series resistors Rs will result in a linear variation of the cell current.

Another circuit arrangement is shown in Fig. 9

wherein the resistances form a bridge connection.

The adjustable resistances (R51, R52, R53) and the measuring instrument (Rm) form one branch of the bridge; the adjustable resistances (R 1, Rpz, R a) and a constant resistance (P) form the other branch of the bridge, a constant resistance two branches, 1. e. Rs increases as Rp decreases and vice-versa. The contact arms 11s and 11p emanate resp msiand mz'r'are'felectricall'yiinsulatem mea.- chanically coupled";v one' resistance-Rir isi'come; monly coordinated totwo factors (I andII) since;

on the one hand, R51 and Rizpwhich are adjusted between the-two:sliding contactsl and-11s, form: part of r the series branch of the" circuit, and: on 1 the other hand; the remainingipart R i-ofs-this resistance, which is adjusted-by contact I, form part of the parallel branch of thezcircuitF-This is possible because the resistancei'steps (c) are the same'in both branches'iRa' and R and the two branches vary inopposite senses;

In the" fo1lowing-formu1as N means 'a figure which is higher than :the 'numberof "resistance steps (nmax) introduced infcase of maximum. light The circuit of 'Fign9 is identical with that of Fig. '10 which can be seen easily bythe way=of the following well :known relationships:

From "above equations it can *beseenthat the circuit "ofFig.*- which is identicalto that oi' Fig. 9 comprisesiinearly varying resistances'inthe" branch 'of" the measuringinstrumentand in'its' parallel branch too (Ts resp. r both branches being variedby the same-step ('7) but in' opposite senses; Be'sidethis, the circuitcomprises an-iother'variable resistancetu) which is'in"eifect' equivalent with" two parallel "branches" (B's? and Rb), being varied linearly-bythe same step (c) but in opposite senses: Bythe arrangement'of the bridge circuit,"the two variable :re'sistorsper factor have "actually the" effect ."of fouriresistors" per factor.

The relation between"'ce11"currentfJ and in:

strument current willlbe" given' by "the following I Therefore, in order :to maintain theinstrument; currentr constant 1 atx-al-l light intensities,;:the cell- 7 current must vary over the whole range of. regulation; according to a :hyperbolic T curve.-: This curve is shown int Fig.2 1 by: the dottedlinen-J5.- o Thesvariation of the total externalresistance (R) duevetothe hyperbolic variation of the cell.cur-

rent istshowninr-Figi"11, where the runof the other resistances is shown at the same timer By deductingthe values of 75p from R,"the difference :curve' ucannrbe =approx imated closely by :thei-- The constant": values 0,:P and-U can-be:chosensothat a good':

parallel branches of Rsnand Rp;

approximation always can be obtained.

Numerical: values 'of an example according to therbridge'xcircuitr Aperturej/Z to'j/ 16 shutter 1 speedJA-E/ww second speed of photographic materialn 34 25 'Scheiner-Q (24/10-15/10 'DIN'),

lightintensity -7432900111); (10-3000 foot-can dles'): I resistance steps 0:4000 ohms constant a; resistors 'U:2600 ohms. and P:- ohms; measuringinstrumentRm=l500 ohms. The constant current'fori correct exposure 'Jm:8 amps.

with an activeisurface of4-cmfi.

In :the manufacture of; this 1 novel wexposure meter; difficulties may bef-causedzbythe' fact that the characteristics of differentiphotoelectric cells vary considerably? as: :dot'the sensitivity and lathe ments:

This "arrangement'is shown in Fig. 12 as applied to the circuit of Fig.:"5,f bu't lfor'simplicity and greatericlarity each branch is represented by only one resistance iii-Fig. 112. This does not affect the present'discus'sion, since only the compensating fixed resistanceswill'now be considered.

An I exact compensation with regard to the measuringinstrument is possible by connecting a fixed resistance (V)' across the-instrument and by connecting a further fixed resistance (T)' in series with both'V'and the instrument. V'must berated accordingtothedifierences in instrument sensitivity and T 'according'to the differ- :ence in instrument resistance to *be compensated for, sothat'the resultant resistance of Rev and T equals Rm;-

Instead of using-a resistance 'V, the differences-ininstrument sensitivity may be compensated for'in'a manner known per" se, namely by usingi'a magnetic-shunt circuit at the pole pieces ofthe instrument. The resistance T to compensate 'for' the-difierences 'in the internal instrument resistance is still required however.

Thediflerences between the characteristics of different cells maybe compensated for completely bynppropriatel-y rating -the fixed circuit resistances already provided (e; g.'-S inFi'g. 5) or by' using additional fiXed Iesistances if necessary", e.-g.- a fixed resistance could beconnected in series with R5 for-this purpose.

Large differences in the temperature may be compensated for 'by'a 'magnetic' shunt circuit associated with the instrument and*consisting of material the permeability of which varies with The; cell :used was" a selenium photoelectric element temperature. It is also possible to effect this compensation by connecting a variable resistance in parallel with the instrument and adjusting it by hand when large temperature fluctuations occur. However, the temperature coefiicient of cells is generally so low that the problem of compensation is unimportant.

Examples of the mechanical connection between the exposure control means and the resistances for the case in which two variable resistors are simultaneously varied by one exposure controlling factor, will be described with reference to Figs. 13 and 14.

The reference numeral l in Fig. 13 denotes the objective of a camera, around which is positioned in well known manner an aperture adjustment ring 2, toothed around its outer edge. The toothed edge engages cooperating teeth provided on a ring 4 arranged torevolve about a stationary spindle 3. A ring 5 made of electrically insulating material is secured to the inner surface of the ring 4, and has mounted on it contact strips 6 to which are connected lead-in wires leading to resistors l. The latter are mounted on a disc 8 revolving with the ring 4. Two stationary contact members It, secured to the spindle 3 by means of a resilient ring 9, cooperate with the movable contact strips 6. Lead-in wires H connect the operative parts of the resistors l as determined by the relative position of the contact strips 6 and contact members 10 to the other parts of the circuit.

Instead of this gear wheel transmission any other mechanical transmission may be used. The same mechanism also may be used in conjunction with a shutter-speed adjusting ring or disc. Alternatively the movable contacts may be provided directly on the aperture-adjusting or the shutter-speed adjusting ring, suitable insulation being interposed.

Fig. 14 shows one method of varying two resistors to allow for the speed of the photographic material. The numeral l2 denotes the casing walls of a camera. Insulating plates 13 are secured to the latter on the inside and have fixed contact strips M mounted on them. Resistors 15, connected to the contact strips It, may be accommodated in any suitable place within the camera casing. A pair of sliding contacts l6 secured to spring blades I! are guided for rectilinear movement in a guide member It, the movement being imparted to the spring blades IT by a sliding member [9 to which the spring blades l! are secured. Thus, as the member H3 is moved along the guide member l8, the contacts it slide over the contact strips M. The member is may be moved by means of a knob 20 which is disposed outside the camera casin and carries a pointer 2| cooperating with indices suitably graduated for speeds or degrees of sensitivity of different photographic materials likely to be used. The knob 20 is manually adjusted so that the pointer 2| indicates the speed of the particular photographic material used. Electric wires 22 are provided for connecting the operative portions of the resistors l5 to the other parts of the circuit.

.Alternatively, the contacts for varying the re sistors in accordance with the speed of the photographic material may be mounted on a ring or a disc, rotated directly or through gearing as in the case of the arrangement previously described for the contacts which vary the resistors in accordance with the aperture-adjusting or theshutter-speed adjusting controls. If the adjustment of the shutter speed is effected by a slide guided I6 rectilinearlyinstead of'by rotation of a ring or. a disc, the'connectionwith the ring or disc carrying the contact may be eiTected by means of a toothed rack; alternatively, the contacts may be arranged on a straight line as in Fig. 14. If more than two variable resistances are simultaneously varied by one exposure controlling factor, the number'of sliding contacts would have to be increased accordingly.

Instead of sliding on fixed contact strips, the sliding contacts could be arranged so as to slide directly on the resistors, which would permit continuous variation. In that case the resistances of course would have to be designed so as to vary linearly or hyperbolically, as the case may be, the motion of the exposure control means being ar ranged accordingly.

Additional exposure controlling factors may be made to control variable resistors in a manner similar to that adopted for taking into consideration the speed of the photographic material or, alternatively, by arranging that the resistors controlled by the speed of the photographic material are further adjustable in accordance with the additional factor or factors.

Each resistor varied by only one exposure controlling factor may be accommodated in a memher which also carries the fixed contacts, for example as shown in Fig. 13 in respect of the resistors 1. Alternatively, the resistors could be accommodated in any other suitable place within the camera casing away from the contacts, being connected to the latter by wires; for example as shown in Fig. 14 with respectto the resistors it. In the latter case' all the resistances could be placed near the measuring instrument or near the cell, possibly in a single casing. Thus all or some of the components of the exposure meter, except the contacts, could be accommodated in a separate casing,'the electric connections with the contacts being made by means of wires.

The measuring instrument may be arranged in a manner known per se, namely, so that the in strument needle and the index mark for the predetermined current are visible in the view-finder eyepiece or in front of the focussing screen, either directly or through suitable optical means (e. g., mirrors or prisms) It is also possible to use two or more photoelectric cells in combination to increase the sensitivity of the exposure meter, the cells bein advantageously connected in parallel. When plotting the characteristics, all the cells used must be regarded as one unit. It is possible also to use two measuring instruments in combination in order to facilitate more accurate observation of the position which indicates the predetermined current for correct exposure. In that case, the two measuring instruments may be connected either in series or in parallel so that the value of the current passing through each of them is the same. The instruments then are arranged so that the deflections of the two instrument needles are in opposite directions, the two needles occupying the same relative position when the current passing through the two instruments is equal to the predetermined value at which correct exposure is produced. Ifithe current difiers from the predetermined value, the two needles are deflected in opposite directions, the differences between them being more readily recognisable than by means of a single needle cooperating with a fixed mark.

In the examples hereinbefore discussed, all the factors are provided for by resistances. How

ever, it is also possible to. provide a control in which one or more factors are taken care-of by other known means, while the remaining factors are taken care of by resistances. E. g., a brightness control provided in front of, the cell may be operated synchronously with the adjustment of the stop of the camera; or, e. g, the emulsion speed may be taken care of by adjusting the index mark of the measuring instrument while the other factors are coupled with resistances according to the invention.

I claim:

1. A photoelectric exposure meter circuit for ascertaining and controlling the setting of correct exposure for photographic pictures comprising a self-generating photoelectric cell which supplies current for the circuit according to the light falling on it, a measuring instrument, resistances connected in circuit relation with the cell and instrument, the resistances comprising two branches connected to one side of the photocell in parallel relation to each other, each branch comprising a plurality of resistances connected together, adjusting means for a plurality of the resistances in each branch, a plurality of exposure control means, a separate adjusting means from each branch being mechanically coupled to each of the exposure control means, the two branches being connected at their opposite ends to each other, and means connecting said ends to the other side of the photocell, said resistance adjusting means being correlated with the exposure factors whereby the adjustment of the resistances causes the instrument to indicate a constant current in accordance with the factors and the light falling on the cell.

2. A photoelectric exposure meter according to claim 1, all of said resistances being connected in series to said instrument and forming two branches connected in parallel to each other, one resistance each from the two branches being associated to each of the factors.

3. A photoelectric exposure meter according to claim 1, all of said resistances being connected in series to said instrument and forming two branches connected in parallel to each other, a common resistance of the same branch being connected to two factors, including two sliding contacts.

4. A photoelectric exposure meter according to claim 1, all of said resistances being connected in series to said instrument and forming two branches connected in parallel to each other, said resistances being varied linearly with successive values of the factors in such a way that the light intensity necessary to the correct exposure is doubled for each value.

5. A photoelectric exposure meter according to claim 1, all of said resistances being connected in series to said instrument and forming two branches connected in parallel to each other, the resistance adjusting means comprising moving contacts by which the resistances are varied synchronously with the respective factors.

6. A photoelectric exposure meter according to claim 1, the circuit comprising resistances connected in series and resistances connected in parallel to said instrument, a resistance from the group connected in series with the instrument and a resistance from the group connected in parallel to the instrument being coordinated to each factor.

7. A photoelectric exposure meter according to claim 1, the circuit comprising resistances connected in series and resistances connected in claim lithe circuit comprising resistances con-- nected in series and resistances connected in.

18; parallel to said-instrument, two factors being coordinatedto a common resistance of one of the resistance groups, the adjusting means for the resistance including two sliding contacts.

8. A photoelectric exposure meter according to parallel tosaid instrument, a plurality of resistances being varied linearly with successive values of the factors in such a way that th light intensity necessary to the correct exposure is doubled for each value and the remaining resistances being varied according to a hyperbolic regularity with the mentioned values of factors.

9. A photoelectric exposure meter according to claim 1, the circuit comprising resistances connected in series and resistances connected in parallel to said instrument, the resistance adjusting means comprising moving contacts by which the resistances are varied synchronously with the respective factors.

10. A photoelectric exposure meter according to claim 1, said resistances comprising resistances connected in parallel to said instrument and resistances connected in series to said instrument and said parallel resistances, and forming on their part two branches connected in parallel to each other.

11. A photoelectric exposure meter according to claim 1, said resistances comprising resistances connected in series to the instrument directly, resistances connected in parallel to said instrument and its series resistances, and a constant resistance connected in series to this circuit system.

12. A photoelectric exposure meter according to claim 1, said resistances comprising resistances connected in series to the instrument directly, resistances connected in parallel to said instrument and its series resistances, and a constant resistance connected in series to this circuit system, furthermore another constant resistance connected in parallel to the resistances connected in series to the instrument directly.

13. A photoelectric exposure meter according to claim 1, said resistances forming a bridge connection comprising adjustable resistances and the measuring instrument in on branch of said bridge, adjustable resistances and a constant resistance in the other branch of the bridge and a constant resistance between the junction points formed in one branch by the adjustable resistances and the measuring instrument, in the other branch by the adjustable resistances and the constant resistance.

14. A photoelectric exposure meter according to claim 1, said resistances forming a bridge connection comprising adjustable resistances and the measuring instrument in one branch of said bridge, adjustable resistances and a constant resistance in the other branch of the bridge, and a constant resistance between the junction points formed in one branch by the adjustable resistances and the measuring instrument, in the other branch by the adjustable resistances and the constant resistance, a part of a resistance connected in series to said instrument being coordinated to two factors, said last mentioned resistance combining in itself the resistances connected in series to said instrument and the resistances connected in parallel to said instrument for one factor.

GEORGE JACOBY.

(References on following page) REFERENCES CITED Number The following references are of record in the 23011606 file of this patent: UNITED STATES PATENTS 5 Number Name Date Re. 20,486 Riszdorfer Aug. 24, 1937 u r Riszdorfer Mar. 3, 1936 7.

Name Date Bing May 21, 1940 Wagner July 6, 1943 Bath Oct. 23, 1945 FOREIGN PATENTS Country Date Switzerland Aug. 16, 1943