US2063760A - Bath for and process of electrodeposition of metal - Google Patents

Bath for and process of electrodeposition of metal Download PDF

Info

Publication number
US2063760A
US2063760A US562201A US56220131A US2063760A US 2063760 A US2063760 A US 2063760A US 562201 A US562201 A US 562201A US 56220131 A US56220131 A US 56220131A US 2063760 A US2063760 A US 2063760A
Authority
US
United States
Prior art keywords
bath
sulphate
deposition
metal
cobalt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US562201A
Inventor
Schulein Joseph
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to US562201A priority Critical patent/US2063760A/en
Application granted granted Critical
Publication of US2063760A publication Critical patent/US2063760A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S204/00Chemistry: electrical and wave energy
    • Y10S204/08AC plus DC

Definitions

  • the present invention relates to improvement in the electro-deposition of metal, and has specific reference to a new and improved bath for of the important objects of the present .invention resides in the utilization of the electro-deposition of metal on off-sized metal parts, and particularly precision tools and: machine parts, such as hobs, thread mills, milling cutters, cams, etc.
  • machine parts such as hobs, thread mills, milling cutters, cams, etc.
  • Chromium plate is particularly adapted for this purpose.
  • Metal lost by wear can be replaced in the same manner.
  • hard wearing surfaces can be provided on relatively soft parts.
  • a thicker layer of metal than necessary is electro-depcsited, and the excess metal is removed as by grinding or lapping.
  • a further object resides in the provision of a novel process of electro-deposition by which a high rate of deposition so as to enable the expeditious and economical handling of a large number of parts.
  • the invention contemplates the use of an electrolytic bath having a high acid concentration and the property of stabilizing the critical point, and the use of high current densities to increase the throwing power of the bath and the rate of deposition.
  • the bath employed comprises chromic acid, and a suitable sulphate or any chromium plating solution.
  • the chromic acid concentration may be varied over a wide range, and for deposition on steel preferably is about 4.38 M.
  • the ratio between the weight of CIO; and S04 is also subject to considerable variation, and the best results are obtained when the ratio of'CrOz molarity to S04 normality is within the range of 50 to 200, i. e.,
  • the sulphate is added, at least in part, as sulphuric acid (H1804) because of its known purity, but may also be added in the form of chromium sulphate.
  • H184 sulphuric acid
  • the high acid concentration and high current density is particularly advantageous for plating off-size metal parts since the rate of deposition is high and since the appearance is not of any great consequence.
  • the critical point has been sub- I ject to considerable fluctuation, thus often preventing the current density from being uniform over the entire eflective surface of the cathode. As a result, it has been difllcult to obtain a coating of uniform depth, color and hardness.
  • the cobalt is added in the form of cobalt sulphate.
  • the cobalt content may be anything up to concentrations producing alloys.
  • the cobalt sulphate is added in such amounts asto furnish one-half of the sulphate (S04) content of the bath.
  • S04 sulphate
  • the use of a. small amount of cobalt. as cobalt sulphate or its equivalent in solution tends to stabilize the critical point and to increase the useful plating range.
  • the cobalt appears to have a catalytic effect on the hydrogen film present on the cathode.
  • the high acid concentration permits a high current density, and hence imparts deep throwing properties and a high rate of deposition.
  • the current density is an important factor in determining the physical properties of the deposited metal, for example imparting extreme hardness at 4 amperes per square inch. believed that the high current density also tends to cause the deposit of hydrogen on the cathode in an amount sufiicient to reduce the adjacent layer or film of electrolyte and thus allow the deposition to proceed.
  • alternating current having a low voltage and high amperage may be superimposed on the direct current for a predetermined period.
  • the ratio of alternating current to direct current is subject to variation.
  • the ratio may be such that the lowest resultant current density is below the critical point of cathode polarization. In this instance, the voltage drops through the critical range into the passive zone.
  • the alternating current produces a slight etching effeet on the surface of the metal to be plated, and keeps the surface from being oxidized. No etching occurs above the critical point.
  • the current ratio may also be such that the lowest resultant current density may be negative with respect to the cathode polarization so that the cathode will become an anode during part of the alternating cin'rent cycle.
  • the alternating current may be such that the lowest resultant current density is always above the critical point of cathode polarization. It will be evident that any combination of the foregoing may be utilized in series.
  • the alternating current may be superimposed on the direct current during the entire process, but in this event is varied so that the resultant during the initial period dips below the critical point and during the final period never passes below the critical point.
  • alternating current alone may be utilized during the initial period, and then direct current alone may be used during the final period.
  • sulphate radical being present in the form of cobalt sulphate.
  • a bath for the electro-deposition of chr0- mium containing approximately 4.38 M chromic acid and a sulphate radical bearing a molarity ratio to the chromic acid of from .02 to .005, part of said sulphate radical being present in the form of cobalt sulpha JOSEPH SCHULEIN.

Description

as r uniform coating is obtained, and which has a Patented Dec. 8, 1936 UNITED STATES na'rn ron m moons s or mononnrosrnou or man Julep]! Schnlein, will, Ill.
No Drawing. Application September 10, 1931,
serial No. 562,201
3 Claims. ((71. 204-1) The present invention relates to improvement in the electro-deposition of metal, and has specific reference to a new and improved bath for of the important objects of the present .invention resides in the utilization of the electro-deposition of metal on off-sized metal parts, and particularly precision tools and: machine parts, such as hobs, thread mills, milling cutters, cams, etc. Thus, where such parts, as for example the bore of a hob, are oversize, they need not be scrapped, but can be brought baclc to size by depositing a plate of the desired thickness. Chromium plate is particularly adapted for this purpose. Metal lost by wear can be replaced in the same manner. Also, hard wearing surfaces can be provided on relatively soft parts. Preferably, a thicker layer of metal than necessary is electro-depcsited, and the excess metal is removed as by grinding or lapping.
Heretofore, it has been found that relatively heavy coats of chromium plate, for example in excess of .002", tend to chip and crack. Another object resides in the provision of a new and improved process of electro-deposition by which chromium plate many times thicker than .002" that will not chip or crack can be deposited, thereby adapting chromium plating successfully to the foregoing uses.
. A further object resides in the provision of a novel process of electro-deposition by which a high rate of deposition so as to enable the expeditious and economical handling of a large number of parts.
More specifically, the invention contemplates the use of an electrolytic bath having a high acid concentration and the property of stabilizing the critical point, and the use of high current densities to increase the throwing power of the bath and the rate of deposition.
In carrying out the process, the bath employed comprises chromic acid, and a suitable sulphate or any chromium plating solution. The chromic acid concentration may be varied over a wide range, and for deposition on steel preferably is about 4.38 M. The ratio between the weight of CIO; and S04 is also subject to considerable variation, and the best results are obtained when the ratio of'CrOz molarity to S04 normality is within the range of 50 to 200, i. e.,
from a ratio of 50 to 1 to a ratio of .200 to l. The precise ratio depends on the type of plate desired, 1. e. bright, dull, deep throwing, etc. For deposition on steel, a ratio of 125 preferably is used. Preferably, the sulphate is added, at least in part, as sulphuric acid (H1804) because of its known purity, but may also be added in the form of chromium sulphate. The high acid concentration and high current density is particularly advantageous for plating off-size metal parts since the rate of deposition is high and since the appearance is not of any great consequence.
In the past, the critical point has been sub- I ject to considerable fluctuation, thus often preventing the current density from being uniform over the entire eflective surface of the cathode. As a result, it has been difllcult to obtain a coating of uniform depth, color and hardness. I have found that voltage fluctuations of the critical point are substantially eliminated upon adding a small amount of cobalt in the form of a suitable soluble salt to the bath. Preferably, the cobalt is added in the form of cobalt sulphate. The cobalt content may be anything up to concentrations producing alloys. In the present instance, the cobalt sulphate is added in such amounts asto furnish one-half of the sulphate (S04) content of the bath. The use of a. small amount of cobalt. as cobalt sulphate or its equivalent in solution, tends to stabilize the critical point and to increase the useful plating range. The cobalt appears to have a catalytic effect on the hydrogen film present on the cathode.
The high acid concentration permits a high current density, and hence imparts deep throwing properties and a high rate of deposition. The current density is an important factor in determining the physical properties of the deposited metal, for example imparting extreme hardness at 4 amperes per square inch. believed that the high current density also tends to cause the deposit of hydrogen on the cathode in an amount sufiicient to reduce the adjacent layer or film of electrolyte and thus allow the deposition to proceed.
With the part to be coated mounted in the electrolytic bath as the cathode, a suitable direct current is impressed across the electrodes. As a result, plating will occur. It will be understood that in the course of the process direct current alone may be used as is common in the art, or, if desired, both direct current and alternating current may be used as hereinafter set Itis.
i'orth. Thus, alternating current having a low voltage and high amperage may be superimposed on the direct current for a predetermined period. The ratio of alternating current to direct current is subject to variation. Thus, the ratio may be such that the lowest resultant current density is below the critical point of cathode polarization. In this instance, the voltage drops through the critical range into the passive zone. The alternating current produces a slight etching effeet on the surface of the metal to be plated, and keeps the surface from being oxidized. No etching occurs above the critical point.
The current ratio may also be such that the lowest resultant current density may be negative with respect to the cathode polarization so that the cathode will become an anode during part of the alternating cin'rent cycle. Finally, the alternating current may be such that the lowest resultant current density is always above the critical point of cathode polarization. It will be evident that any combination of the foregoing may be utilized in series.
After the surface of the cathode has been etched, only the direct current is impressed across the electrodes. Since the alternating current kept the cathode clean, there is no layer of oxide on the surface to be coated when changing to the direct current, and hence immediate deposition occurs.
The rapid deposition gives a close intimate contact which is considerably enhanced by the uneven etching due to the non-homogeneous structure of the steel. Thus, a very adherent plate is obtained.
Also, the alternating current may be superimposed on the direct current during the entire process, but in this event is varied so that the resultant during the initial period dips below the critical point and during the final period never passes below the critical point. Or, alternating current alone may be utilized during the initial period, and then direct current alone may be used during the final period.
It will be understood that it is frequently desirable to prevent certain areas from being plated. Thus, in plating the oversize bore of a hob, no plating is desired on the ends and the outer periphery of the hob. The exterior surfaces may thus be covered with a suitable substance that will keep them free from plating and at the same time from being stained or attacked by the solution.
I claim as my invention:
1. The process of electro-depos iting chromium which consists in passing a current of approximately 4 amperes per square inch through an aqueous chromium plating bath containing approximately 4.38 M chromium trioxide, chromium sulphate and cobalt sulphate, the ratio of the chromium trioxide molarity to sulphate normality being within the range of from 50 to 200, the cobalt sulphate being present in an amount to supply one-half of the sulphate content of the bath and insufllcient to produce a cobalt alloy in an appreciable amount, and maintaining the composition of the bath sub stantially unchanged during the electrolysis.
2. A bath for the electro-deposition of chrmium containing approximately 4.38 M chromic acid and a sulphate radical bearing a molarity ratio to the chromic acid of from .02 to .005, ap-
proximately one-half of the sulphate radical being present in the form of cobalt sulphate.
3. A bath for the electro-deposition of chr0- mium containing approximately 4.38 M chromic acid and a sulphate radical bearing a molarity ratio to the chromic acid of from .02 to .005, part of said sulphate radical being present in the form of cobalt sulpha JOSEPH SCHULEIN.
US562201A 1931-09-10 1931-09-10 Bath for and process of electrodeposition of metal Expired - Lifetime US2063760A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US562201A US2063760A (en) 1931-09-10 1931-09-10 Bath for and process of electrodeposition of metal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US562201A US2063760A (en) 1931-09-10 1931-09-10 Bath for and process of electrodeposition of metal

Publications (1)

Publication Number Publication Date
US2063760A true US2063760A (en) 1936-12-08

Family

ID=24245233

Family Applications (1)

Application Number Title Priority Date Filing Date
US562201A Expired - Lifetime US2063760A (en) 1931-09-10 1931-09-10 Bath for and process of electrodeposition of metal

Country Status (1)

Country Link
US (1) US2063760A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2443600A (en) * 1947-08-09 1948-06-22 Poor & Co Electroplating method and electrolyte
US2443599A (en) * 1942-05-04 1948-06-22 Poor & Co Electroplating method employing pulsating current of adjustable wave form
US2515192A (en) * 1944-09-27 1950-07-18 Poor & Co Method of electroplating
US2524912A (en) * 1945-09-29 1950-10-10 Westinghouse Electric Corp Process of electrodepositing copper, silver, or brass
US2546150A (en) * 1946-11-08 1951-03-27 Brenner Abner Method for securing adhesion of electroplated coatings to a metal base
US2548867A (en) * 1945-04-14 1951-04-17 Poor & Co Electroplating metals
US2575712A (en) * 1945-09-29 1951-11-20 Westinghouse Electric Corp Electroplating
US2603593A (en) * 1952-07-15 Electeodepositiqn of metaiis
US2651610A (en) * 1950-07-17 1953-09-08 Poor & Co Method of electroplating zinc
US2651609A (en) * 1950-07-17 1953-09-08 Poor & Co Method of electroplating copper
US20050284768A1 (en) * 2004-06-24 2005-12-29 Feng Po Y Method for coloring socket

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2603593A (en) * 1952-07-15 Electeodepositiqn of metaiis
US2443599A (en) * 1942-05-04 1948-06-22 Poor & Co Electroplating method employing pulsating current of adjustable wave form
US2515192A (en) * 1944-09-27 1950-07-18 Poor & Co Method of electroplating
US2548867A (en) * 1945-04-14 1951-04-17 Poor & Co Electroplating metals
US2524912A (en) * 1945-09-29 1950-10-10 Westinghouse Electric Corp Process of electrodepositing copper, silver, or brass
US2575712A (en) * 1945-09-29 1951-11-20 Westinghouse Electric Corp Electroplating
US2546150A (en) * 1946-11-08 1951-03-27 Brenner Abner Method for securing adhesion of electroplated coatings to a metal base
US2443600A (en) * 1947-08-09 1948-06-22 Poor & Co Electroplating method and electrolyte
US2651610A (en) * 1950-07-17 1953-09-08 Poor & Co Method of electroplating zinc
US2651609A (en) * 1950-07-17 1953-09-08 Poor & Co Method of electroplating copper
US20050284768A1 (en) * 2004-06-24 2005-12-29 Feng Po Y Method for coloring socket

Similar Documents

Publication Publication Date Title
Dennis et al. Nickel and chromium plating
US2927066A (en) Chromium alloy plating
US2063760A (en) Bath for and process of electrodeposition of metal
US2822326A (en) Bright chromium alloy plating
US6837981B2 (en) Chromium alloy coating and a method and electrolyte for the deposition thereof
US20060257683A1 (en) Stainless steel electrolytic coating
US2686756A (en) Chromium plating
US2693444A (en) Electrodeposition of chromium and alloys thereof
Karahan Effects of pH value of the electrolyte and glycine additive on formation and properties of electrodeposited Zn-Fe coatings
US2990343A (en) Chromium alloy plating
US4249999A (en) Electrolytic zinc-nickel alloy plating
US3461048A (en) Method of electrodepositing duplex microcrack chromium
US3296100A (en) Process for producing anticorrosive surface treated steel sheets and product thereof
US2950233A (en) Production of hard surfaces on base metals
US2430750A (en) Method of electroplating to produce fissure network chromium plating
US2952590A (en) Process for chromium plating
US3111464A (en) Electrodeposition of chromium and chromium alloys
FI63445B (en) PROCESS FOR FOLLOWING AV CONTAINING CROWN FRAME WITH TRIVAL CROSS PLATE
US3891542A (en) Method for insuring high silicon carbide content in elnisil coatings
US1782092A (en) Articles having tarnish-resisting surface and process of making same
US3421986A (en) Method of electroplating a bright adherent chromium coating onto cast-iron
US3488264A (en) High speed electrodeposition of nickel
US2812297A (en) Method of preventing etching by chromic acid chromium plating baths
US2809156A (en) Electrodeposition of iron and iron alloys
US2380044A (en) Process for producing electrodeposits