US20160005694A1 - Semiconductor package structure, alignment structure, and alignment method - Google Patents
Semiconductor package structure, alignment structure, and alignment method Download PDFInfo
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- US20160005694A1 US20160005694A1 US14/322,495 US201414322495A US2016005694A1 US 20160005694 A1 US20160005694 A1 US 20160005694A1 US 201414322495 A US201414322495 A US 201414322495A US 2016005694 A1 US2016005694 A1 US 2016005694A1
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/93—Batch processes
- H01L24/94—Batch processes at wafer-level, i.e. with connecting carried out on a wafer comprising a plurality of undiced individual devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54426—Marks applied to semiconductor devices or parts for alignment
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- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/291—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
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- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8312—Aligning
- H01L2224/83136—Aligning involving guiding structures, e.g. spacers or supporting members
- H01L2224/83138—Aligning involving guiding structures, e.g. spacers or supporting members the guiding structures being at least partially left in the finished device
- H01L2224/83139—Guiding structures on the body
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
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- H01L2224/83136—Aligning involving guiding structures, e.g. spacers or supporting members
- H01L2224/83138—Aligning involving guiding structures, e.g. spacers or supporting members the guiding structures being at least partially left in the finished device
- H01L2224/83141—Guiding structures both on and outside the body
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- H—ELECTRICITY
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- H01L2224/93—Batch processes
- H01L2224/94—Batch processes at wafer-level, i.e. with connecting carried out on a wafer comprising a plurality of undiced individual devices
Definitions
- Eutectic and fusion bonding has been used for MEMS (micro electro mechanical systems) production procedure as a wafer level package process.
- the eutectic and fusion bonding describes a wafer bonding technique with an intermediate metal layer that may form a eutectic system.
- the eutectic metals may be alloys that transform directly from solid to liquid state or vice versa from liquid to solid state at a specific temperature without passing a two-phase equilibrium.
- the eutectic temperature is lower than the melting temperature of the two or more pure elements, so that it is convenient to reduce the process temperature of a bonding process between two elements.
- the eutectic and fusion bonding process may be used.
- the bonding process has two main functions: one function is to package the two wafers in wafer level, and the other function is to maintain the pressure of a device of the wafer.
- Some semiconductor products need precisely optical alignment to make perfect bonding. If the alignment system of a bonding tool used in the bonding process is abnormal, the wafers may be shifted to bond, and thereby leading device vacuum leakage. Since the eutectic bond alignment precision and the process stability are difficultly improved, the yield rate of the products is also difficultly improved.
- FIG. 1 is a perspective view of a semiconductor package structure according to some embodiments of the present disclosure
- FIG. 2 is a cross-sectional view of a semiconductor package structure taken along line 2 - 2 shown in FIG. 1 ;
- FIG. 3 is a flow chart of an alignment method according to some embodiments of the present disclosure.
- FIG. 4 is a schematic view of a second wafer shown in FIG. 1 before assembled to a first wafer;
- FIG. 5 is a schematic view of a protruding portion of a second wafer shown in FIG. 4 when entering an opening of a concave portion;
- FIG. 6 is a bottom view of a protruding portion of a second wafer shown in FIG. 4 ;
- FIG. 7 is a top view of a concave portion of a first wafer shown in FIG. 4 ;
- FIG. 8 is a cross-sectional view of a semiconductor package structure according to some embodiments of the present disclosure, in which the cross-sectional position is the same as in FIG. 2 ;
- FIG. 9 is a schematic view of a protruding portion of the second wafer shown in FIG. 8 when entering an opening of a concave portion;
- FIG. 10 is a cross-sectional view of a semiconductor package structure according to some embodiments of the present disclosure, in which the cross-sectional position is the same as in FIG. 2 ;
- FIG. 11 is a cross-sectional view of an alignment structure according to some embodiments of the present disclosure, in which the cross-sectional position is the same as in FIG. 2 without a second wafer;
- FIG. 12 is a schematic view of a protruding portion when entering a groove of an alignment structure shown in FIG. 11 ;
- FIG. 13 is a schematic view of the alignment structure shown in FIG. 12 when a protruding portion slides to a bottom surface of an alignment structure;
- FIG. 14 is a schematic view of a groove of an alignment structure shown in FIG. 11 .
- first and second features are formed in direct contact
- additional features may be formed between the first and second features, such that the first and second features may not be in direct contact
- present disclosure may repeat reference numerals and/or letters in the various examples. This repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed.
- spatially relative terms such as “beneath,” “below,” “lower,” “above,” “upper” and the like, may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures.
- the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures.
- the apparatus may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein may likewise be interpreted accordingly.
- “around”, “about” or “approximately” shall generally mean within 20 percent, preferably within 10 percent, and more preferably within 5 percent of a given value or range. Numerical quantities given herein are approximate, meaning that the term “around”, “about” or “approximately” can be inferred if not expressly stated.
- FIG. 1 is a perspective view of a semiconductor package structure 100 according to some embodiments of the present disclosure.
- FIG. 2 is a cross-sectional view of the semiconductor package structure 100 taken along line 2 - 2 shown in FIG. 1 .
- the semiconductor package structure includes a first wafer 110 and a second wafer 120 .
- the first wafer 110 has a concave portion 112
- the concave portion 112 has a bottom surface 114 and at least one sidewall 116 .
- the sidewall 116 is adjacent to the bottom surface 114 , and an obtuse angle ⁇ is formed between the bottom surface 114 and the sidewall 116 .
- the second wafer 120 is disposed on the first wafer 110 and has a protruding portion 122 .
- the concave portion 112 of the first wafer 110 is an anti-wedge-shaped structure
- the protruding portion 122 of the second wafer 120 is a wedge-shaped structure.
- the concave portion 112 of the first wafer 110 is used to couple to the protruding portion 122 of the second wafer 120 .
- a following adhering process may be performed, such as a eutectic process, a fusion process, a soldering process, etc. That is to say, the concave portion 112 of the first wafer 110 and the protruding portion 122 of the second wafer 120 may be regarded as alignment structures of the semiconductor package structure 100 .
- each of the first and second wafers 110 , 120 may be a thin slice of semiconductor material, such as a silicon crystal, used in the fabrication of integrated circuits and other micro devices.
- the first and second wafers 110 , 120 may serve as the substrates for microelectronic devices built thereon, and may undergo micro fabrication process steps, such as doping implantation, ion implantation, etching, CVD (chemical vapor deposition) of various materials, PVD (physical vapor deposition) of various materials, and photolithographic patterning.
- the first and second wafers 110 , 120 may be overlapped and packaged in wafer level to form the semiconductor package structure 100 shown in FIG. 1 .
- the protruding portion 122 of the second wafer 120 and the concave portion 112 of the first wafer 110 may be formed by a grinding process, or photolithography processes (i.e., an exposure process, a development process, and an etching process), but the present disclosure is not limited in this regard.
- FIG. 3 is a flow chart of an alignment method according to some embodiments of the present disclosure.
- the alignment method for a bonding process includes the following steps.
- step S 1 a concave portion of a first wafer and a protruding portion of a second wafer are substantially aligned.
- step S 2 the second wafer is moved to the first wafer, such that a sidewall of the concave portion is abutted against the protruding portion.
- step S 3 the protruding portion of the second wafer slides along the sidewall to a bottom surface of the concave portion, such that the protruding portion is located on the bottom surface.
- FIG. 4 is a schematic view of the second wafer 120 shown in FIG. 1 before assembled to the first wafer 110 .
- FIG. 5 is a schematic view of the protruding portion 122 of the second wafer 120 shown in FIG. 4 when entering the opening 113 of the concave portion 112 .
- an alignment tool e.g., an optical equipment
- the concave portion 112 of the first wafer 110 and the protruding portion 122 of the second wafer 120 may not be aligned precisely, and may be only substantially aligned.
- Substantially aligned means that the center position of the protruding portion 122 may not be definitely aligned with the center position of the bottom surface 114 of the concave portion 112 , such that a shift is formed between the protruding portion 122 and the concave portion 112 .
- the sidewall 116 of the concave portion 112 may be abutted against the protruding portion 122 of the second wafer 120 , as shown in FIG. 5 .
- the sidewall 116 is an oblique plane relative to the bottom surface 114 . Therefore, after the protruding portion 122 enters the opening 113 of the concave portion 112 to contact the sidewall 116 of the concave portion 112 , the protruding portion 122 of the second wafer 120 may slide along the sidewall 116 to the bottom surface 114 in a direction D 2 , such that the protruding portion 122 of the second wafer 120 may be coupled to the concave portion 112 of the first wafer 110 , as shown in FIG. 2 .
- the protruding portion 122 of the second wafer 120 may slide along the sidewall 116 of the concave portion 112 depending on gravity and the design of the obtuse angle ⁇ formed between the bottom surface 114 and the sidewall 116 , such that the protruding portion 122 may be located on the bottom surface 114 of the concave portion 112 even if the previous alignment between the first and second wafers 110 , 120 is shifted or abnormal.
- the protruding portion 122 of the second wafer 120 may be moved in the vertical direction D 1 to directly locate on the bottom surface 114 of the concave portion 112 . In this case, the protruding portion 122 does not need to slide along the sidewall 116 of the concave portion 112 .
- the semiconductor package structure 100 (see FIG. 2 ) of the present disclosure reaches the self-alignment purpose for the concave portion 112 of the second first wafer 110 and the protruding portion 122 of the second wafer 120 , thereby improving the yield rate of the bonding process for the first and second wafers 110 , 120 , and reducing the possibility of vacuum leakage of devices disposed on the first and second wafers 110 , 120 .
- the first wafer 110 has a first surface 111 facing the second wafer 120 , and the concave portion 112 is formed in the first surface 111 of the first wafer 110 .
- the second wafer 120 has a second surface 121 facing the first wafer 110 , and the protruding portion 122 is formed on the second surface 121 of the second wafer 120 .
- a first connecting edge 115 is formed between the bottom surface 114 and the sidewall 116 of the first wafer 110
- a second connecting edge 117 is formed between the sidewall 116 and the first surface 111 of the first wafer 110 .
- a horizontal distance D between the first and second connecting edges 115 , 117 may be in a range from 8 to 12 ⁇ m.
- the horizontal distance D is 10 ⁇ m.
- the horizontal distance D may increase the probability of the alignment between the first and second wafers 110 , 120 .
- the protruding portion 122 of the second wafer 120 has a top surface 123 .
- the top surface 123 of the protruding portion 122 is abutted against the bottom surface 114 of the first wafer 110 .
- the width W 1 of the bottom surface 114 of the concave portion 112 may be greater than the width W 2 of the top surface 123 of the protruding portion 122 in a range from 5 to 7 ⁇ m. For example, the difference between the width W 1 and the width W 2 is 6 ⁇ m.
- FIG. 6 is a bottom view of the protruding portion 122 of the second wafer 120 shown in FIG. 4 .
- FIG. 7 is a top view of the concave portion 113 of the first wafer 110 shown in FIG. 4 .
- the sidewall 116 surrounds the bottom surface 114 , and the concave portion 112 and the protruding portion 122 have two corresponding cross-shaped marks.
- the difference between the width W 1 of the bottom surface 114 and the width W 2 of the top surface 123 may be in a range from 5 to 7 ⁇ m, and the horizontal distance D between the first and second connecting edges 115 , 117 may be in a range from 9 to 11 ⁇ m.
- the present disclosure does not easily lead wafer shift due to the alignment equipment abnormal.
- the alignment accuracy tolerance of the bonding process for the first and second wafers 110 , 120 may be improved in a range from 2 to 4 ⁇ m.
- FIG. 8 is a cross-sectional view of a semiconductor package structure 100 a according to some embodiments of the present disclosure, in which the cross-sectional position is the same as in FIG. 2 .
- the semiconductor package structure 100 a includes the first and second wafers 110 , 120 .
- the first wafer 110 has the concave portion 112 having the bottom surface 114 and the sidewall 116 .
- the sidewall 116 is adjacent to the bottom surface 114 , and the obtuse angle ⁇ is formed between the bottom surface 114 and the sidewall 116 .
- the semiconductor package structure 100 a further includes a first hydrophobic film 130 formed on the sidewall 116 and the bottom surface 114 , and includes a second hydrophobic film 140 formed on the protruding portion 122 .
- FIG. 9 is a schematic view of the protruding portion 122 of the second wafer 120 shown in FIG. 8 when entering the opening 113 of the concave portion 112 .
- the obtuse angle ⁇ is formed between the bottom surface 114 and the sidewall 116 . Therefore, after the protruding portion 122 of the second wafer 120 enters the opening 113 of the concave portion 112 of the first wafer 110 to contact the sidewall 116 of the concave portion 112 , the protruding portion 122 of the second wafer 120 may slide along the sidewall 116 to the bottom surface 114 in the direction D 2 .
- the protruding portion 122 is prevented form being adhered to the sidewall 116 and the bottom surface 114 of the concave portion 112 .
- the protruding portion 122 of the second wafer 120 may smoothly slide along the sidewall 116 of the concave portion 112 of the first safer 110 .
- the first hydrophobic film 130 is located on the sidewall 116 and the bottom surface 114 of the concave portion 112 .
- FIG. 10 is a cross-sectional view of a semiconductor package structure 100 b according to some embodiments of the present disclosure, in which the cross-sectional position is the same as in FIG. 2 .
- the semiconductor package structure 100 b includes the first and second wafers 110 , 120 .
- the first wafer 110 has the concave portion 112 having the bottom surface 114 and the sidewall 116 .
- the sidewall 116 is adjacent to the bottom surface 114 , and the obtuse angle ⁇ is formed between the bottom surface 114 and the sidewall 116 .
- the semiconductor package structure 100 b further includes an adhesive layer 150 .
- the adhesive layer 150 is between the first and second wafers 110 , 120 , such that the second wafer 120 is adhered to the first wafer 110 , and the semiconductor package structure 100 b is sealed by the adhesive layer 150 .
- the adhesive layer 150 may be applied after the bonding process of the first and second wafers 110 , 120 .
- the adhesive layer 150 may be made of a material including metal, alloy, solder, or combinations thereof.
- FIG. 11 is a cross-sectional view of an alignment structure 200 according to some embodiments of the present disclosure, in which the cross-sectional position is the same as in FIG. 2 without the second wafer 120 .
- the alignment structure 200 includes a bottom surface 210 , two sidewalls 220 a, 220 b.
- the sidewalls 220 a, 220 b are respectively adjacent to two end edges of the bottom surface 210 , and sidewall 220 a is opposite to the sidewall 220 b.
- a groove 230 is formed among the bottom surface 210 and the sidewalls 220 a, 220 b.
- the width W 3 of the groove 230 is gradually increased in an outward direction D 3 that is away from the bottom surface 210 .
- the sidewalls 220 a, 220 b are oblique planes relative to the bottom surface 210 .
- FIG. 12 is a schematic view of a protruding portion 310 when entering the groove 230 of the alignment structure 200 shown in FIG. 11 .
- FIG. 13 is a schematic view of the alignment structure 200 shown in FIG. 12 when the protruding portion 310 slides to the bottom surface 210 of the alignment structure 200 .
- the alignment structure 200 may be used to assemble to the protruding portion 310 .
- the protruding portion 310 contacts the sidewall 220 a or the sidewall 220 b of the alignment structure 200 .
- the protruding portion 310 may slide along the sidewall 220 a (e.g., in a direction D 4 ) or the sidewall 220 b to the bottom surface 210 due to the design of the groove 230 .
- the protruding portion 310 slides to the bottom surface 210 , the protruding portion 310 is coupled to the groove 230 , and the sidewalls 220 a, 220 b surround the protruding portion 310 , as shown in FIG. 13 .
- the bottom surface 210 and the sidewalls 220 a, 220 b may be formed on a first wafer 240
- the protruding portion 310 may be formed on a second wafer 320 .
- the second wafer 320 may overlap the first wafer 240 .
- the protruding portion 310 of the second wafer 320 may slide along the sidewall 220 a or the sidewall 220 b of the alignment structure 200 depending on gravity and the design of the width W 3 (see FIG. 11 ) of the groove 230 , such that the protruding portion 310 may be located on the bottom surface 210 of the alignment structure 200 even if the previous alignment between the first and second wafers 240 , 320 is shifted or abnormal.
- the protruding portion 310 of the second wafer 320 may be moved in a downward direction to directly locate on the bottom surface 210 of the alignment structure 200 without sliding along the sidewalls 220 a, 220 b of the alignment structure 200 .
- FIG. 14 is a schematic view of the groove 230 of the alignment structure 200 shown in FIG. 11 .
- the width W 3 of the groove 230 is gradually increased in the direction D 3 . That is to say, a distance D 5 between the two sidewalls 220 a, 220 b defines the width W 3 of the groove 230 of the alignment structure 200 .
- the sidewall 220 a of the alignment structure 200 has a first end edge 222 a and a second end edge 224 a.
- the second end edge 224 a is opposite to the first end edge 222 a.
- the sidewall 220 b of the alignment structure 200 has a first end edge 222 b and a second end edge 224 b.
- the second end edge 224 b is opposite to the first end edge 222 b.
- the two first end edges 222 a, 222 b are connected to the bottom surface 210 .
- a distance D 6 between the two second end edges 224 a, 224 b is the maximum width W 3 of the groove 230
- a distance D 7 between the two first end edges 222 a, 222 b is the minimum width W 3 of the groove 230
- the minimum width W 3 of the groove 230 is the same as the width W 4 of the bottom surface 210 .
- each of the concave portion 112 , the protruding portions 122 , 310 , and the groove 230 of the present disclosure may be regarded as alignment structures for the wafer bonding process.
- the first hydrophobic film 130 and the second hydrophobic film 140 shown in FIG. 8 may also be used to the bottom surface 210 and the sidewalls 220 a, 220 b of the alignment structure 200 , such that the protruding portion 310 may smoothly slide along the sidewall 220 a or the sidewall 220 b.
- the semiconductor package structure, the alignment structure, and the alignment method of the present disclosure have the following advantages.
- the alignment accuracy may be enhanced by the design of the aforesaid alignment structure, thereby leading perfect bonding reaction and seal.
- the appearance of the wafer may be easily changed to form the alignment structure, the manufacturing cost for the alignment structure of the wafer is not increased.
- this new design still leads a wafer bonding in the right position of another wafer due to the aforesaid directional side surface adjacent to the bottom surface.
- a semiconductor package structure includes a first wafer and a second wafer.
- the first wafer has a concave portion.
- the concave portion has a bottom surface and at least one sidewall adjacent to the bottom surface. An obtuse angle is formed between the bottom surface and the sidewall.
- the second wafer is disposed on the first wafer and has a protruding portion. When the protruding portion enters an opening of the concave portion, the protruding portion slides along the sidewall to the bottom surface, such that the protruding portion is coupled to the concave portion.
- an alignment structure for being assembled to a protruding portion.
- the alignment structure includes a bottom surface and at least one sidewall.
- the sidewall is adjacent to the bottom surface.
- a groove is formed among the bottom surface and the sidewall. The width of the groove is gradually increased in an outward direction that is away from the bottom surface. When the protruding portion enters the groove, the protruding portion slides along the sidewall to the bottom surface.
- an alignment method for bonding process includes the following steps. A concave portion of a first wafer and of a protruding portion of a second wafer are substantially aligned. The second wafer is moved to the first wafer, such that a sidewall of the concave portion is abutted against the protruding portion. The protruding portion of the second wafer slides along the sidewall to a bottom surface of the concave portion, such that the protruding portion is located on the bottom surface.
Abstract
Description
- Eutectic and fusion bonding has been used for MEMS (micro electro mechanical systems) production procedure as a wafer level package process. The eutectic and fusion bonding describes a wafer bonding technique with an intermediate metal layer that may form a eutectic system. The eutectic metals may be alloys that transform directly from solid to liquid state or vice versa from liquid to solid state at a specific temperature without passing a two-phase equilibrium. Moreover, the eutectic temperature is lower than the melting temperature of the two or more pure elements, so that it is convenient to reduce the process temperature of a bonding process between two elements.
- For example, when there is a need to bond a wafer to another wafer, the eutectic and fusion bonding process may be used. In general, the bonding process has two main functions: one function is to package the two wafers in wafer level, and the other function is to maintain the pressure of a device of the wafer. Some semiconductor products need precisely optical alignment to make perfect bonding. If the alignment system of a bonding tool used in the bonding process is abnormal, the wafers may be shifted to bond, and thereby leading device vacuum leakage. Since the eutectic bond alignment precision and the process stability are difficultly improved, the yield rate of the products is also difficultly improved.
- Aspects of the present disclosure are best understood from the following detailed description when read with the accompanying figures. It is noted that, in accordance with the standard practice in the industry, various features are not drawn to scale. In fact, the dimensions of the various features may be arbitrarily increased or reduced for clarity of discussion.
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FIG. 1 is a perspective view of a semiconductor package structure according to some embodiments of the present disclosure; -
FIG. 2 is a cross-sectional view of a semiconductor package structure taken along line 2-2 shown inFIG. 1 ; -
FIG. 3 is a flow chart of an alignment method according to some embodiments of the present disclosure; -
FIG. 4 is a schematic view of a second wafer shown inFIG. 1 before assembled to a first wafer; -
FIG. 5 is a schematic view of a protruding portion of a second wafer shown inFIG. 4 when entering an opening of a concave portion; -
FIG. 6 is a bottom view of a protruding portion of a second wafer shown inFIG. 4 ; -
FIG. 7 is a top view of a concave portion of a first wafer shown inFIG. 4 ; -
FIG. 8 is a cross-sectional view of a semiconductor package structure according to some embodiments of the present disclosure, in which the cross-sectional position is the same as inFIG. 2 ; -
FIG. 9 is a schematic view of a protruding portion of the second wafer shown inFIG. 8 when entering an opening of a concave portion; -
FIG. 10 is a cross-sectional view of a semiconductor package structure according to some embodiments of the present disclosure, in which the cross-sectional position is the same as inFIG. 2 ; -
FIG. 11 is a cross-sectional view of an alignment structure according to some embodiments of the present disclosure, in which the cross-sectional position is the same as inFIG. 2 without a second wafer; -
FIG. 12 is a schematic view of a protruding portion when entering a groove of an alignment structure shown inFIG. 11 ; -
FIG. 13 is a schematic view of the alignment structure shown inFIG. 12 when a protruding portion slides to a bottom surface of an alignment structure; and -
FIG. 14 is a schematic view of a groove of an alignment structure shown inFIG. 11 . - The following disclosure provides many different embodiments, or examples, for implementing different features of the provided subject matter. Specific examples of components and arrangements are described below to simplify the present disclosure. These are, of course, merely examples and are not intended to be limiting. For example, the formation of a first feature over or on a second feature in the description that follows may include embodiments in which the first and second features are formed in direct contact, and may also include embodiments in which additional features may be formed between the first and second features, such that the first and second features may not be in direct contact. In addition, the present disclosure may repeat reference numerals and/or letters in the various examples. This repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed.
- Further, spatially relative terms, such as “beneath,” “below,” “lower,” “above,” “upper” and the like, may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. The spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. The apparatus may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein may likewise be interpreted accordingly.
- As used herein, “around”, “about” or “approximately” shall generally mean within 20 percent, preferably within 10 percent, and more preferably within 5 percent of a given value or range. Numerical quantities given herein are approximate, meaning that the term “around”, “about” or “approximately” can be inferred if not expressly stated.
- The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the disclosure. As used herein, the singular forms “a”, “an” and “the” are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms “comprises” and/or “comprising”, or “includes” and/or “including” or “has” and/or “having” when used in this specification, specify the presence of stated features, regions, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, regions, integers, steps, operations, elements, components, and/or groups thereof.
- It will be understood that when an element is referred to as being “on” another element, it can be directly on the other element or intervening elements may be present therebetween. In contrast, when an element is referred to as being “directly on” another element, there are no intervening elements present. As used herein, the term “and/or” includes any and all combinations of one or more of the associated listed items.
- Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this disclosure belongs. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and the present disclosure, and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.
- Reference will now be made in detail to the present embodiments of the disclosure, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers are used in the drawings and the description to refer to the same or like parts.
-
FIG. 1 is a perspective view of asemiconductor package structure 100 according to some embodiments of the present disclosure.FIG. 2 is a cross-sectional view of thesemiconductor package structure 100 taken along line 2-2 shown inFIG. 1 . As shown inFIG. 1 andFIG. 2 , the semiconductor package structure includes afirst wafer 110 and asecond wafer 120. Thefirst wafer 110 has aconcave portion 112, and theconcave portion 112 has abottom surface 114 and at least onesidewall 116. Thesidewall 116 is adjacent to thebottom surface 114, and an obtuse angle θ is formed between thebottom surface 114 and thesidewall 116. - The
second wafer 120 is disposed on thefirst wafer 110 and has a protrudingportion 122. In some embodiments, theconcave portion 112 of thefirst wafer 110 is an anti-wedge-shaped structure, and theprotruding portion 122 of thesecond wafer 120 is a wedge-shaped structure. During a bonding process for the first andsecond wafers concave portion 112 of thefirst wafer 110 is used to couple to the protrudingportion 122 of thesecond wafer 120. - After the protruding
portion 122 of thesecond wafer 120 is located on thebottom surface 114 ofconcave portion 112, a following adhering process may be performed, such as a eutectic process, a fusion process, a soldering process, etc. That is to say, theconcave portion 112 of thefirst wafer 110 and theprotruding portion 122 of thesecond wafer 120 may be regarded as alignment structures of thesemiconductor package structure 100. - In some embodiments, each of the first and
second wafers second wafers second wafers semiconductor package structure 100 shown inFIG. 1 . - The protruding
portion 122 of thesecond wafer 120 and theconcave portion 112 of thefirst wafer 110 may be formed by a grinding process, or photolithography processes (i.e., an exposure process, a development process, and an etching process), but the present disclosure is not limited in this regard. -
FIG. 3 is a flow chart of an alignment method according to some embodiments of the present disclosure. The alignment method for a bonding process includes the following steps. In step S1, a concave portion of a first wafer and a protruding portion of a second wafer are substantially aligned. Thereafter in step S2, the second wafer is moved to the first wafer, such that a sidewall of the concave portion is abutted against the protruding portion. Finally in step S3, the protruding portion of the second wafer slides along the sidewall to a bottom surface of the concave portion, such that the protruding portion is located on the bottom surface. - In the following description, the aforementioned steps will be described in detail.
-
FIG. 4 is a schematic view of thesecond wafer 120 shown inFIG. 1 before assembled to thefirst wafer 110.FIG. 5 is a schematic view of the protrudingportion 122 of thesecond wafer 120 shown inFIG. 4 when entering theopening 113 of theconcave portion 112. As shown inFIG. 4 andFIG. 5 , in some embodiments, an alignment tool (e.g., an optical equipment) is used to align the first andsecond wafers concave portion 112 of thefirst wafer 110 and the protrudingportion 122 of thesecond wafer 120 may not be aligned precisely, and may be only substantially aligned. “Substantially aligned” means that the center position of the protrudingportion 122 may not be definitely aligned with the center position of thebottom surface 114 of theconcave portion 112, such that a shift is formed between the protrudingportion 122 and theconcave portion 112. - As a result, when the
second wafer 120 is moved to thefirst wafer 110 in a vertical direction D1 toward theconcave portion 112, thesidewall 116 of theconcave portion 112 may be abutted against the protrudingportion 122 of thesecond wafer 120, as shown inFIG. 5 . - Since the obtuse angle θ is formed between the
bottom surface 114 and thesidewall 116, thesidewall 116 is an oblique plane relative to thebottom surface 114. Therefore, after the protrudingportion 122 enters theopening 113 of theconcave portion 112 to contact thesidewall 116 of theconcave portion 112, the protrudingportion 122 of thesecond wafer 120 may slide along thesidewall 116 to thebottom surface 114 in a direction D2, such that the protrudingportion 122 of thesecond wafer 120 may be coupled to theconcave portion 112 of thefirst wafer 110, as shown inFIG. 2 . - The protruding
portion 122 of thesecond wafer 120 may slide along thesidewall 116 of theconcave portion 112 depending on gravity and the design of the obtuse angle θ formed between thebottom surface 114 and thesidewall 116, such that the protrudingportion 122 may be located on thebottom surface 114 of theconcave portion 112 even if the previous alignment between the first andsecond wafers - Moreover, if the protruding
portion 122 of thesecond wafer 120 is precisely aligned with theconcave portion 112 of the secondfirst wafer 110 by the alignment tool, the protrudingportion 122 of thesecond wafer 120 may be moved in the vertical direction D1 to directly locate on thebottom surface 114 of theconcave portion 112. In this case, the protrudingportion 122 does not need to slide along thesidewall 116 of theconcave portion 112. - The semiconductor package structure 100 (see
FIG. 2 ) of the present disclosure reaches the self-alignment purpose for theconcave portion 112 of the secondfirst wafer 110 and the protrudingportion 122 of thesecond wafer 120, thereby improving the yield rate of the bonding process for the first andsecond wafers second wafers - In addition, the
first wafer 110 has afirst surface 111 facing thesecond wafer 120, and theconcave portion 112 is formed in thefirst surface 111 of thefirst wafer 110. Thesecond wafer 120 has asecond surface 121 facing thefirst wafer 110, and the protrudingportion 122 is formed on thesecond surface 121 of thesecond wafer 120. A first connectingedge 115 is formed between thebottom surface 114 and thesidewall 116 of thefirst wafer 110, and a second connectingedge 117 is formed between thesidewall 116 and thefirst surface 111 of thefirst wafer 110. - In some embodiments, a horizontal distance D between the first and second connecting
edges second wafers - As shown in
FIG. 2 andFIG. 4 , the protrudingportion 122 of thesecond wafer 120 has atop surface 123. When the protrudingportion 122 is located on thebottom surface 114 of theconcave portion 112, thetop surface 123 of the protrudingportion 122 is abutted against thebottom surface 114 of thefirst wafer 110. In some embodiments, the width W1 of thebottom surface 114 of theconcave portion 112 may be greater than the width W2 of thetop surface 123 of the protrudingportion 122 in a range from 5 to 7 μm. For example, the difference between the width W1 and the width W2 is 6 μm. -
FIG. 6 is a bottom view of the protrudingportion 122 of thesecond wafer 120 shown inFIG. 4 .FIG. 7 is a top view of theconcave portion 113 of thefirst wafer 110 shown inFIG. 4 . As shown inFIG. 6 andFIG. 7 , thesidewall 116 surrounds thebottom surface 114, and theconcave portion 112 and the protrudingportion 122 have two corresponding cross-shaped marks. When thesecond wafer 120 is bonded to thefirst wafer 110, the protrudingportion 122 of thesecond wafer 120 needs to locate on thebottom surface 114 of thefirst wafer 110. In some embodiments, the difference between the width W1 of thebottom surface 114 and the width W2 of thetop surface 123 may be in a range from 5 to 7 μm, and the horizontal distance D between the first and second connectingedges - Since the protruding
portion 122 may slide along theside surface 116 to thebottom surface 114 of theconcave portion 112, the present disclosure does not easily lead wafer shift due to the alignment equipment abnormal. As a result, the alignment accuracy tolerance of the bonding process for the first andsecond wafers - It is to be noted that the utility and the connection relationships of the structures described above will not be repeated in the following description, and only aspects related to other elements of the semiconductor package structure will be described.
-
FIG. 8 is a cross-sectional view of asemiconductor package structure 100 a according to some embodiments of the present disclosure, in which the cross-sectional position is the same as inFIG. 2 . As shown inFIG. 8 , thesemiconductor package structure 100 a includes the first andsecond wafers first wafer 110 has theconcave portion 112 having thebottom surface 114 and thesidewall 116. Thesidewall 116 is adjacent to thebottom surface 114, and the obtuse angle θ is formed between thebottom surface 114 and thesidewall 116. - The difference between this embodiment and the embodiment shown in
FIG. 2 is that thesemiconductor package structure 100 a further includes a firsthydrophobic film 130 formed on thesidewall 116 and thebottom surface 114, and includes a secondhydrophobic film 140 formed on the protrudingportion 122. -
FIG. 9 is a schematic view of the protrudingportion 122 of thesecond wafer 120 shown inFIG. 8 when entering theopening 113 of theconcave portion 112. As shown inFIG. 8 andFIG. 9 , the obtuse angle θ is formed between thebottom surface 114 and thesidewall 116. Therefore, after the protrudingportion 122 of thesecond wafer 120 enters theopening 113 of theconcave portion 112 of thefirst wafer 110 to contact thesidewall 116 of theconcave portion 112, the protrudingportion 122 of thesecond wafer 120 may slide along thesidewall 116 to thebottom surface 114 in the direction D2. - Since the first
hydrophobic film 130 is located on thesidewall 116 and thebottom surface 114 of theconcave portion 112 and the secondhydrophobic film 140 is located on the protrudingportion 122 of thesecond wafer 120, the protrudingportion 122 is prevented form being adhered to thesidewall 116 and thebottom surface 114 of theconcave portion 112. - As a result, the protruding
portion 122 of thesecond wafer 120 may smoothly slide along thesidewall 116 of theconcave portion 112 of the first safer 110. The firsthydrophobic film 130 is located on thesidewall 116 and thebottom surface 114 of theconcave portion 112. -
FIG. 10 is a cross-sectional view of asemiconductor package structure 100 b according to some embodiments of the present disclosure, in which the cross-sectional position is the same as inFIG. 2 . Thesemiconductor package structure 100 b includes the first andsecond wafers first wafer 110 has theconcave portion 112 having thebottom surface 114 and thesidewall 116. Thesidewall 116 is adjacent to thebottom surface 114, and the obtuse angle θ is formed between thebottom surface 114 and thesidewall 116. - The difference between this embodiment and the embodiment shown in
FIG. 8 is that thesemiconductor package structure 100 b further includes anadhesive layer 150. Theadhesive layer 150 is between the first andsecond wafers second wafer 120 is adhered to thefirst wafer 110, and thesemiconductor package structure 100 b is sealed by theadhesive layer 150. In some embodiments, theadhesive layer 150 may be applied after the bonding process of the first andsecond wafers adhesive layer 150 may be made of a material including metal, alloy, solder, or combinations thereof. -
FIG. 11 is a cross-sectional view of analignment structure 200 according to some embodiments of the present disclosure, in which the cross-sectional position is the same as inFIG. 2 without thesecond wafer 120. As show inFIG. 11 , thealignment structure 200 includes abottom surface 210, twosidewalls sidewalls bottom surface 210, andsidewall 220 a is opposite to thesidewall 220 b. Agroove 230 is formed among thebottom surface 210 and thesidewalls groove 230 is gradually increased in an outward direction D3 that is away from thebottom surface 210. - Since the width W3 of the
groove 230 is gradually increased in the outward direction D3 that is away from thebottom surface 210, thesidewalls bottom surface 210. -
FIG. 12 is a schematic view of a protrudingportion 310 when entering thegroove 230 of thealignment structure 200 shown inFIG. 11 .FIG. 13 is a schematic view of thealignment structure 200 shown inFIG. 12 when the protrudingportion 310 slides to thebottom surface 210 of thealignment structure 200. As shown inFIG. 12 andFIG. 13 , thealignment structure 200 may be used to assemble to the protrudingportion 310. When the protrudingportion 310 enters thegroove 230, the protrudingportion 310 contacts thesidewall 220 a or thesidewall 220 b of thealignment structure 200. Thereafter, the protrudingportion 310 may slide along thesidewall 220 a (e.g., in a direction D4) or thesidewall 220 b to thebottom surface 210 due to the design of thegroove 230. - Moreover, when the protruding
portion 310 slides to thebottom surface 210, the protrudingportion 310 is coupled to thegroove 230, and thesidewalls portion 310, as shown inFIG. 13 . - In some embodiments, the
bottom surface 210 and thesidewalls first wafer 240, and the protrudingportion 310 may be formed on asecond wafer 320. As a result, when the protrudingportion 310 of thesecond wafer 320 slides to thebottom surface 210 of thefirst wafer 240, thesecond wafer 320 may overlap thefirst wafer 240. - The protruding
portion 310 of thesecond wafer 320 may slide along thesidewall 220 a or thesidewall 220 b of thealignment structure 200 depending on gravity and the design of the width W3 (seeFIG. 11 ) of thegroove 230, such that the protrudingportion 310 may be located on thebottom surface 210 of thealignment structure 200 even if the previous alignment between the first andsecond wafers - Moreover, if the protruding
portion 310 of thesecond wafer 320 is precisely aligned with the center of thegroove 230 of thealignment structure 200 by the alignment tool, the protrudingportion 310 of thesecond wafer 320 may be moved in a downward direction to directly locate on thebottom surface 210 of thealignment structure 200 without sliding along thesidewalls alignment structure 200. -
FIG. 14 is a schematic view of thegroove 230 of thealignment structure 200 shown inFIG. 11 . As shown inFIG. 11 andFIG. 14 , the width W3 of thegroove 230 is gradually increased in the direction D3. That is to say, a distance D5 between the twosidewalls groove 230 of thealignment structure 200. In some embodiments, thesidewall 220 a of thealignment structure 200 has afirst end edge 222 a and asecond end edge 224 a. Thesecond end edge 224 a is opposite to thefirst end edge 222 a. Thesidewall 220 b of thealignment structure 200 has afirst end edge 222 b and asecond end edge 224 b. Thesecond end edge 224 b is opposite to thefirst end edge 222 b. Moreover, the two first end edges 222 a, 222 b are connected to thebottom surface 210. - In addition, a distance D6 between the two second end edges 224 a, 224 b is the maximum width W3 of the
groove 230, and a distance D7 between the two first end edges 222 a, 222 b is the minimum width W3 of thegroove 230. Furthermore, the minimum width W3 of thegroove 230 is the same as the width W4 of thebottom surface 210. - As shown in
FIG. 2 andFIG. 13 , each of theconcave portion 112, the protrudingportions groove 230 of the present disclosure may be regarded as alignment structures for the wafer bonding process. Moreover, the firsthydrophobic film 130 and the secondhydrophobic film 140 shown inFIG. 8 may also be used to thebottom surface 210 and thesidewalls alignment structure 200, such that the protrudingportion 310 may smoothly slide along thesidewall 220 a or thesidewall 220 b. - The semiconductor package structure, the alignment structure, and the alignment method of the present disclosure have the following advantages. The alignment accuracy may be enhanced by the design of the aforesaid alignment structure, thereby leading perfect bonding reaction and seal. Moreover, since the appearance of the wafer may be easily changed to form the alignment structure, the manufacturing cost for the alignment structure of the wafer is not increased. In addition, even though the alignment position is not precise, but this new design still leads a wafer bonding in the right position of another wafer due to the aforesaid directional side surface adjacent to the bottom surface.
- According to some embodiments, a semiconductor package structure is provided. The semiconductor package structure includes a first wafer and a second wafer. The first wafer has a concave portion. The concave portion has a bottom surface and at least one sidewall adjacent to the bottom surface. An obtuse angle is formed between the bottom surface and the sidewall. The second wafer is disposed on the first wafer and has a protruding portion. When the protruding portion enters an opening of the concave portion, the protruding portion slides along the sidewall to the bottom surface, such that the protruding portion is coupled to the concave portion.
- According to some embodiments, an alignment structure for being assembled to a protruding portion. The alignment structure includes a bottom surface and at least one sidewall. The sidewall is adjacent to the bottom surface. A groove is formed among the bottom surface and the sidewall. The width of the groove is gradually increased in an outward direction that is away from the bottom surface. When the protruding portion enters the groove, the protruding portion slides along the sidewall to the bottom surface.
- According to some embodiments, an alignment method for bonding process is provided. The alignment method includes the following steps. A concave portion of a first wafer and of a protruding portion of a second wafer are substantially aligned. The second wafer is moved to the first wafer, such that a sidewall of the concave portion is abutted against the protruding portion. The protruding portion of the second wafer slides along the sidewall to a bottom surface of the concave portion, such that the protruding portion is located on the bottom surface.
- Although the present disclosure has been described in considerable detail with reference to certain embodiments thereof, other embodiments are possible. Therefore, the spirit and scope of the appended claims should not be limited to the description of the embodiments contained herein.
- It will be apparent to those skilled in the art that various modifications and variations can be made to the structure of the present disclosure without departing from the scope or spirit of the disclosure. In view of the foregoing, it is intended that the present disclosure cover modifications and variations of this disclosure provided they fall within the scope of the following claims.
- The foregoing outlines features of several embodiments so that those skilled in the art may better understand the aspects of the present disclosure. Those skilled in the art should appreciate that they may readily use the present disclosure as a basis for designing or modifying other processes and structures for carrying out the same purposes and/or achieving the same advantages of the embodiments introduced herein. Those skilled in the art should also realize that such equivalent constructions do not depart from the spirit and scope of the present disclosure, and that they may make various changes, substitutions, and alterations herein without departing from the spirit and scope of the present disclosure.
Claims (20)
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