US20140353767A1 - Method for the formation of fin structures for finfet devices - Google Patents
Method for the formation of fin structures for finfet devices Download PDFInfo
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- US20140353767A1 US20140353767A1 US13/906,505 US201313906505A US2014353767A1 US 20140353767 A1 US20140353767 A1 US 20140353767A1 US 201313906505 A US201313906505 A US 201313906505A US 2014353767 A1 US2014353767 A1 US 2014353767A1
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- 238000000034 method Methods 0.000 title claims description 69
- 230000015572 biosynthetic process Effects 0.000 title description 9
- 239000000463 material Substances 0.000 claims abstract description 70
- 239000004065 semiconductor Substances 0.000 claims abstract description 57
- 239000000758 substrate Substances 0.000 claims abstract description 50
- 239000003989 dielectric material Substances 0.000 claims abstract description 18
- 125000006850 spacer group Chemical group 0.000 claims abstract description 16
- 229910000577 Silicon-germanium Inorganic materials 0.000 claims description 74
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 claims description 37
- 229910052710 silicon Inorganic materials 0.000 claims description 27
- 239000010703 silicon Substances 0.000 claims description 27
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 21
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical group [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 17
- 238000000059 patterning Methods 0.000 claims description 4
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 72
- 229910052581 Si3N4 Inorganic materials 0.000 description 51
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 51
- 230000008569 process Effects 0.000 description 49
- 239000000377 silicon dioxide Substances 0.000 description 36
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Abstract
On a first semiconductor material substrate, an overlying sacrificial layer formed of a second semiconductor material is deposited. In a first region, a first semiconductor material region is formed over the sacrificial layer. In a second region, a second semiconductor material region is formed over the sacrificial layer. The first semiconductor material region is patterned to define a first FinFET fin. The second semiconductor material region is patterned to define a second FinFET fin. The fins are each covered with a cap and sidewall spacer. The sacrificial layer formed of the second semiconductor material is then selectively removed to form an opening below each of the first and second FinFET fins (with those fins being supported by the sidewall spacers). The openings below each of the fins are then filled with a dielectric material that serves to isolate the semiconductive materials of the fins from the substrate.
Description
- The present invention relates to integrated circuits and, in particular, to a process for the formation of fin structures for use in FinFET-type integrated circuit devices.
- The prior art teaches the formation of integrated circuits which utilize one or more FinFET type field effect transistors. The FinFET transistor comprises a channel region which is oriented to conduct an electrical current parallel to the surface of the substrate. The channel region is provided in an elongated section of semiconductor material. The source and drain regions of the transistor are formed in the elongated section on either side of the channel region. A gate is placed over and on both opposed sides of the elongated section at the location of the channel region to provide control over the conductive state of the transistor. This FinFET design is well suited for manufacturing a multi-channel transistor in which multiple elongated sections are formed in parallel to define neighboring channel regions which are separated from each other by an intermediate gate portion of the transistor gate spanning with a perpendicular orientation over the multiple elongated sections.
- A FinFET transistor is created from at least one thin portion (referred to as the “fin”) of semiconductor material defining the elongated section which is used to form the channel of the transistor and also its source and drain zones. This fin is typically defined by a mask that is formed on top of a monocrystalline silicon substrate at the position of the fin. The substrate material is then directionally etched where there is no mask, to a determined depth, such that the elongated section defining the fin remains under the mask and is composed of the substrate material.
- In one prior art implementation, the fin of semiconductor material which is thus obtained, and which comprises the channel of the final transistor, is not electrically insulated from the active portion of the circuit substrate, which itself is also of crystalline semiconductor material. Such a FinFET device suffers from three distinct types of leakage current. A first type of leakage current can circulate between the source and drain of the finFET transistor, via the active portion of the substrate situated below the channel. This first leakage current, internal to each transistor, is not controlled by the potential applied to the transistor gate. A second type of leakage current arises because the channel of the finFET transistor is also in electrical contact with the channels of other transistors of the same conductivity type via the substrate. The second leakage current flows between transistors in the form of an inter-transistor leakage current. A third type of leakage current appears between the channel of each finFET transistor and a lower part of the substrate in response to the substrate being connected to a reference potential.
- There is a need in the art for a bulk FinFET configuration which suppresses junction leakage between the source and drain.
- As CMOS process technology continues to scale towards smaller and smaller dimensions, further improvement in transistor performance is needed. Those skilled in the art recognize that the use of silicon-germanium (SiGe) materials for transistor fabrication provide for a significant boost in transistor performance, especially with respect to p-channel field effect transistor devices. Indeed, the art is moving towards the use of SiGe for p-channel devices of many different types. Specific to the use of FinFET devices, those skilled in art recognize a need to form the fin of the p-channel device from a SiGe material in order to reach improved transistor performance levels over prior art Si material only devices.
- In an embodiment, a method comprises: on a substrate formed of a first semiconductor material and having a first region and a second region, depositing an overlying sacrificial layer formed of a second semiconductor material; forming for the first region a region of first semiconductor material over the sacrificial layer; forming for the second region a region of second semiconductor material over the sacrificial layer; patterning the region of first semiconductor material to define at least one first fin of a FinFET transistor of a first conductivity type; patterning the region of second semiconductor material to define at least one second fin of a FinFET transistor of a second conductivity type; covering each of the first and second fins with a cap and sidewall spacer; selectively removing the sacrificial layer formed of the second semiconductor material to form an opening below each of the first and second fins, each first and second fin being supported by said sidewall spacer; and filling the opening below each of the first and second fins with a dielectric material so as to isolate the first and second fins from the substrate.
- In an embodiment, an apparatus comprises: a substrate formed of a first semiconductor material and having a first region and a second region; in the first region, a first dielectric pedestal with a trench on opposite sides of the first dielectric pedestal; in the second region, a second dielectric pedestal with a trench on opposite sides of the second dielectric pedestal; in the first region, a first fin of a FinFET transistor of a first conductivity type formed of a first semiconductor material over the first dielectric pedestal and insulated from the substrate by the first dielectric pedestal; and in the second region, a second fin of a FinFET transistor of a second conductivity type formed of a second semiconductor material over the second dielectric pedestal and insulated from the substrate by the second dielectric pedestal.
- For a better understanding of the embodiments, reference will now be made by way of example only to the accompanying figures in which:
-
FIGS. 1-18 illustrate process steps in the formation of fins for a FinFET device on a bulk substrate. - Reference is now made to
FIGS. 1-18 which illustrate the process steps in the formation of fins for a FinFET device on a bulk substrate. -
FIG. 1 shows a conventional bulksilicon substrate wafer 10. - Using an epitaxial process tool, an epitaxial growth process as known in the art is performed to grow a silicon-germanium (SiGe)
layer 12 on asilicon substrate 14 of the bulksilicon substrate wafer 10. The thickness of the silicon-germanium (SiGe)layer 12 is about 10 nm to 30 nm. The silicon-germanium (SiGe)layer 12 is a sacrificial layer to be replaced by an insulative dielectric material as will be described in more detail below. Without removing the substrate wafer 10 from the epitaxial process tool, an epitaxial growth process as known in the art is then performed to grow a silicon-carbide (SiC)layer 16 on the silicon-germanium (SiGe)layer 12. The thickness of the silicon-carbide (SiC)layer 16 is about 10 nm to 20 nm. Without removing the substrate wafer 10 from the epitaxial process tool, an epitaxial growth process as known in the art is then performed to grow a silicon (Si)layer 18 on the silicon-carbide (SiC)layer 16. The thickness of the silicon (Si)layer 18 is about 30 nm to 40 nm. The structure resulting from the foregoing epitaxial growth processes is shown inFIG. 2 . The stippling inFIG. 2 is provided to differentiate SiGe material from Si material. The silicon-germanium (SiGe)layer 12, silicon-carbide (SiC)layer 16 and silicon (Si)layer 18 may be doped as needed for the integrated circuit application. -
FIG. 3 shows the deposit of a silicon nitride (SiN)layer 20 over the silicon (Si)layer 18. - A lithographic process as known in the art is then used to form an
opening 22 in the silicon nitride (SiN)layer 20 which extends down to reach at least the top surface of the silicon (Si)layer 18. The result of the lithographic process is shown inFIG. 4 . The opening 22 is associated with aregion 24 of the substrate wafer 10 reserved for the formation of p-channel FinFET devices. Theregion 26 of thesubstrate wafer 10 is conversely reserved for the formation of n-channel FinFET devices. Thus, the process described and illustrated primarily concerns the formation of CMOS type integrated circuits, although it will be understood that this is not the only application of the described process. In plan view, the opening 22 may take on any desired shape governed by the size and number of p-channel devices to be formed within theregion 24. - Using an epitaxial process tool, a high pressure directional etch process (such as an RIE process) as known in the art is then performed to remove a
portion 28 of the silicon (Si)layer 18 within theregion 24 down to the silicon-carbide (SiC)layer 16. In an embodiment, the directional etch may comprise a high pressure HCl etch. The result of the directional etch process is shown inFIG. 5 . - Without removing the
substrate 10 from the epitaxial process tool used for the etch ofFIG. 5 , an epitaxial growth process as known in the art is then performed to grow a silicon-germanium (SiGe)layer 30 on top of the silicon-carbide (SiC)layer 16 inregion 24 to fill theportion 28 of the silicon (Si)layer 18 that was previously removed. The result of the epitaxial growth process is shown inFIG. 6 . The stippling inFIG. 6 is provided to differentiate SiGe material from Si material. The thickness of the silicon-germanium (SiGe)layer 30 inregion 24 is preferably at least the thickness of the silicon (Si)layer 18 in theadjacent region 26. The silicon nitride (SiN)layer 20 is then removed. - A lithographic process as known in the art is then used to define the
fins 150 for the FinFET devices. A lithographic mask of silicon nitride (SiN) 32 is applied over the top surface of the silicon-germanium (SiGe)layer 30 inregion 24 and the silicon (Si)layer 18 inregion 26. The mask is patterned to leave SiN mask material at the desired locations of thefins 150. An etching operation is then performed to openapertures 152 in the silicon-germanium (SiGe)layer 30 inregion 24 and in the silicon (Si)layer 18 inregion 26 on either side of eachfin 150. Theapertures 152 further extend through the silicon-carbide (SiC)layer 16 and reach partially into the silicon-germanium (SiGe)layer 12. In a preferred implementation, aportion 34 of the (sacrificial) silicon-germanium (SiGe)layer 12 remains at the bottom of eachaperture 152. The result of the etching process is shown inFIG. 7 . Thefins 150 includefins 150 p for use in forming p-channel transistors in theregion 24 andfins 150 n for use in forming n-channel transistors in theregion 26. The etching process used to form thefins 150 may, for example, comprise a Cl2 or HBr etch as known in the art and may be performed in multiple etch steps (such as a first etch through to the silicon-carbide (SiC)layer 16 followed by a second etch through the silicon-carbide (SiC)layer 16 and into the silicon-germanium (SiGe) layer 12). Even more particularly, the etching process may utilize a sidewall image transfer (SIT) process such as that described, for example, in U.S. Pat. No. 8,298,954, the disclosure of which is incorporated by reference. - Silicon nitride (SiN) is then deposited over the
fins 150. The deposited silicon nitride (SiN) is then etched (for example, using an RIE process) to remove the silicon nitride (SiN) at theportion 34 of the (sacrificial) silicon-germanium (SiGe)layer 12 between thefins 150 and thus definetrenches 40 betweenadjacent fins 150. The result of the silicon nitride (SiN) deposit and etch process is shown inFIG. 8 . Eachfin 150 is now covered by silicon nitride (SiN) in the form of a thick silicon nitride (SiN)cap 36 and thin silicon nitride (SiN)sidewall spacers 38. The thin silicon nitride (SiN)sidewall spacers 38 have a thickness of 3 nm to 10 nm. - The
trenches 40 are then filled with silicon dioxide (SiO2) 44 and a planarization process (for example, chemical-mechanical polishing (CMP)), is used to flatten the top of the wafer. The polishing process is configured to stop at the silicon nitride (SiN)cap 36. The result of the silicon dioxide (SiO2) deposit and polish process is shown inFIG. 9 . - Reference is now made to
FIG. 10 which illustrates a top view showing the relationship between a gate (PC) pattern and thefins 150. A PC mask in accordance with the PC pattern ofFIG. 10 is applied to the wafer ofFIG. 9 and an anisotropic etch of the silicon dioxide (SiO2) 44 deposit is performed through the PC mask to opentrenches 48 through the silicon dioxide (SiO2) 44 deposit to reach theportion 34 of the silicon-germanium (SiGe)layer 12 which remained at the bottom of each aperture 152 (see,FIG. 7 ). The anisotropic etch is continued to extend through the silicon-germanium (SiGe)layer 12 and reach partially into thesilicon substrate 14. As a result,trenches 48 are formed on opposite sides apedestal portion 49 defined in thesilicon substrate 14. - The result of the anisotropic etch is shown in
FIG. 11 , which illustrates a cross-section taken along lines A-A ofFIG. 10 .FIG. 9 illustrates the cross-section taken along lines B-B ofFIG. 10 . - A conformal silicon nitride (SiN) deposit is then made within each
open trench 48 to cover exposed side surfaces of eachfin 150 and the exposedsilicon substrate 14 at the bottom of eachopen trench 48. The result of this deposit is to extend (reference 38′) the thin silicon nitride (SiN)sidewall spacers 38 over the portions of the silicon-germanium (SiGe)layer 12 andsilicon substrate 14 exposed by the anisotropic etch performed in connection withFIGS. 10 and 11 to produceopen trenches 48. The thin silicon nitride (SiN)sidewall spacers 38 have a thickness of 6 nm to 12 nm and theextensions 38′ have a thickness of 3 nm to 8 nm. Thetrenches 48 are then filled with silicon dioxide (SiO2) 54 and a planarization process (for example, chemical-mechanical polishing (CMP)), is used to flatten the top of the wafer. The polishing process is configured to stop at the silicon nitride (SiN)cap 36. The result of the conformal silicon nitride (SiN) deposit, silicon dioxide (SiO2) deposit and polish process is shown inFIG. 12 (cross-section again taken along lines A-A ofFIG. 10 ).FIG. 9 illustrates the cross-section taken along lines B-B ofFIG. 10 . - The previously deposited silicon dioxide (SiO2) fills (
references 44 and 54) are then recessed to a depth sufficient to expose the silicon-germanium (SiGe)layer 12 at locations away from thetrenches 48 which were filled by silicon dioxide (SiO2) 54 (see,FIG. 11 ). In other words, the silicon-germanium (SiGe)layer 12 is exposed at those locations which were not covered by the thin silicon nitride (SiN)sidewall spacers 38 orextensions 38′. The process to recess is an etching process, for example of a standard dry etch type, to etch SiO2. The etch is a blanket removal. The etchant may comprise SiCoNi which has a uniform etch speed across different (dense or loose) areas. - The result of the process to recess the silicon dioxide (SiO2) 44 and 54 is shown in
FIG. 13 (cross-section again taken along lines A-A ofFIG. 10 ) andFIG. 14 (cross-section taken this time along lines B-B ofFIG. 10 ).FIG. 14 shows thelocations 56 where the process to recess the silicon dioxide (SiO2) 44 and 54 has exposed the underlying silicon-germanium (SiGe)layer 12. Additionally, it will be noted that process to recess the silicon dioxide (SiO2) 44 and 54 does not affect the silicon nitride (SiN) deposits and thus thefins 150 are protected in bothFIG. 13 andFIG. 14 by the thin silicon nitride (SiN)sidewall spacers 38 andextensions 38′. Theextensions 38′ inFIG. 13 further cover the silicon-germanium (SiGe)layer 12 and silicon (Si)substrate 14. - An etch process as known in the art is then performed to selectively remove the sacrificial material of the silicon-germanium (SiGe)
layer 12 through thelocations 56 where the silicon-germanium (SiGe)layer 12 is exposed. In an embodiment, the etch may comprise an HCl dry etch which is selective to remove SiGe and leave the adjacent Si structures in place. The result of the selective etch process is shown inFIGS. 15 and 16 (which correspond toFIGS. 13 and 14 , respectively). As a result of the removal of the sacrificial silicon-germanium (SiGe)layer 12,apertures 60 are formed at the locations previously occupied by the sacrificial silicon-germanium (SiGe)layer 12. Notwithstanding the presence ofapertures 60 at and under eachfin 150, it will be recognized that eachfin 150 continues to be structurally supported by the thin silicon nitride (SiN)sidewall spacers 38 andextensions 38′. - The silicon-carbide (SiC) material underneath the silicon-germanium (SiGe)
layer 30 inregion 24 serves to protect the silicon-germanium (SiGe) portion of thefins 150 p from being etched away along with the sacrificial material of the silicon-germanium (SiGe)layer 12. - The
apertures 60 under and around eachfin 150 and thetrenches 62 between fins 150 (FIGS. 15 and 16 ) are then filled with a dielectric material such as silicon dioxide (SiO2) 64 and a planarization process (for example, chemical-mechanical polishing (CMP)), is used to flatten the top of the wafer. The polishing process is configured to stop at the silicon nitride (SiN)cap 36. The result of the silicon dioxide (SiO2) fill and polish process is shown inFIG. 17 . - The silicon dioxide (SiO2) 64 fill between the
fins 150 is then recessed to a depth no lower than the bottom of the silicon-carbide (SiC)layer 16. The thick silicon nitride (SiN) cap 36 the thin silicon nitride (SiN)sidewall spacers 38 on top of and adjacent to each of thefins 150 are also removed. The result of the recess and removal process is shown inFIG. 18 whereinindividual fins 150 are formed. The fins includefins 150 p made of silicon-germanium from silicon-germanium (SiGe) layer 30 (in region 24) on top of silicon-carbide from silicon-carbide (SiC)layer 16 and insulated from thebulk silicon substrate 14 by the dielectric material (silicon dioxide (SiO2) 64) that was filled in place of the sacrificial silicon-germanium material of thelayer 12. The fins further includefins 150 n made of silicon from silicon (Si) layer 18 (in region 26) on top of silicon-carbide from silicon-carbide (SiC)layer 16 and insulated from thebulk silicon substrate 14 by the dielectric material (silicon dioxide (SiO2) 64) that was filled in place of the sacrificial silicon-germanium material of thelayer 12. The dielectric material under eachfin 150 forms adielectric pedestal region 68 supporting the fin and insulating the fin from the bulk substrate. - Conventional semiconductor processing as known in the art may then continue from the
fins 150 defined as shown inFIG. 18 to finish fabrication of FinFET devices utilizing thefins 150. - The process for
fin 150 formation disclosed herein possesses a number of advantages over prior art processes for bulk substrate supported FinFET devices including: a) fin height is determined by an epitaxial growth process which results in more uniformly dimensioned fins in comparison to conventional bulk processing which may rely, for example, on a SiO2 recess to define the fin dimensions; b) thefin 150 n for the n-channel FinFET devices is formed of silicon (from silicon (Si) layer 18) and thefin 150 p for the p-channel FinFET is formed of silicon-germanium (from the silicon-germanium (SiGe) layer 30) which promotes better transistor performance with respect to both conductivity type transistors; c) the source/drain regions of thefins 150 are isolated from thebulk silicon substrate 14 by dielectric material (from the silicon dioxide (SiO2) 64 material used to fill theapertures 60 left by the removal of the sacrificial silicon-germanium (SiGe) layer 12) so as to suppress junction leakage; d) the process technique is well suited for use in aggressively scaled CMOS fabrication techniques at and below the 10 nm process node; and e) the process technique is compatible with both gate first and gate last integration processing for FinFET devices. - Although this process is somewhat complex, the process provides a valuable means to produce an Si n-channel FinFET and SiGe p-channel FinFET from a bulk wafer. Bulk wafer fabrication is attractive because of a lower price point. The steps of the method are common to semiconductor fabrication and can be applied with limited cost.
- The foregoing description has provided by way of exemplary and non-limiting examples a full and informative description of the exemplary embodiment of this invention. However, various modifications and adaptations may become apparent to those skilled in the relevant arts in view of the foregoing description, when read in conjunction with the accompanying drawings and the appended claims. However, all such and similar modifications of the teachings of this invention will still fall within the scope of this invention as defined in the appended claims.
Claims (22)
1. A method, comprising:
on a substrate formed of a first semiconductor material and having a first region and a second region, depositing an overlying sacrificial layer formed of a second semiconductor material;
forming for the first region a region of first semiconductor material over the sacrificial layer;
forming for the second region a region of second semiconductor material over the sacrificial layer;
patterning the region of first semiconductor material to define at least one first fin of a FinFET transistor of a first conductivity type;
patterning the region of second semiconductor material to define at least one second fin of a FinFET transistor of a second conductivity type;
covering each of the first and second fins with a cap and sidewall spacer;
selectively removing the sacrificial layer formed of the second semiconductor material to form an opening below each of the first and second fins, each first and second fin being supported by said sidewall spacer; and
filling the opening below each of the first and second fins with a dielectric material so as to isolate the first and second fins from the substrate.
2. The method of claim 1 , wherein the first semiconductor material is silicon and the second semiconductor material is silicon-germanium.
3. The method of claim 2 , wherein the FinFET transistor of the first conductivity type formed of the first semiconductor material is an n-channel device and wherein the FinFET transistor of the second conductivity type formed of the second semiconductor material is a p-channel device.
4. The method of claim 1 , wherein the substrate is a bulk semiconductor substrate.
5. The method of claim 1 , further comprising depositing an intermediate semiconductor material layer between the overlying sacrificial layer and each of the region of first semiconductor material and region of second semiconductor material.
6. The method of claim 5 , wherein the intermediate semiconductor material layer is a silicon-carbide layer.
7. The method of claim 5 , wherein each first fin comprises first semiconductor material over intermediate semiconductor material over said dielectric material, and each second fin comprises second semiconductor material over intermediate semiconductor material over said dielectric material.
8. The method of claim 1 , further comprising removing the cap and sidewall spacer to expose each of said first and second fins.
9. The method of claim 1 , wherein selectively removing the sacrificial layer formed of the second semiconductor material further forms openings adjacent each of the first and second fins, and wherein filling further comprises filling the adjacent openings with the dielectric material to separate said fins from each other.
10. The method of claim 1 , further comprising defining a trench in the substrate between adjacent fins, and wherein filling further comprises filling the trench with the dielectric material.
11. The method of claim 10 , wherein selectively removing the sacrificial layer formed of the second semiconductor material further forms openings adjacent each of the first and second fins, said trench in communication with said adjacent openings, and wherein filling further comprises filling the adjacent openings and trenches with the dielectric material.
12. The method of claim 11 , wherein covering further comprises lining each of the trenches with said sidewall spacer.
13. An apparatus, comprising:
a substrate formed of a first semiconductor material and having a first region and a second region;
in the first region, a first dielectric pedestal with a trench on opposite sides of the first dielectric pedestal;
in the second region, a second dielectric pedestal with a trench on opposite sides of the second dielectric pedestal;
in the first region, a first fin of a FinFET transistor of a first conductivity type formed of a first semiconductor material over the first dielectric pedestal and insulated from the substrate by the first dielectric pedestal; and
in the second region, a second fin of a FinFET transistor of a second conductivity type formed of a second semiconductor material over the second dielectric pedestal and insulated from the substrate by the second dielectric pedestal.
14. The apparatus of claim 13 , wherein said trenches on opposite sides of the first and second dielectric pedestals further extend into said substrate to define corresponding substrate pedestal regions supporting the dielectric pedestals.
15. The apparatus of claim 14 , further comprising a dielectric material at least partially filling each of the trenches on opposite sides of the first and second dielectric pedestals and at least partially filling each of the trenches between the substrate pedestal regions.
16. The apparatus of claim 15 , further comprising a liner in said trenches between the substrate pedestal regions and the at least partially filling dielectric material.
17. The apparatus of claim 13 , further comprising a dielectric material at least partially filling each of the trenches on opposite sides of the first and second dielectric pedestals and a liner in said trenches between the dielectric pedestals and the at least partially filling dielectric material.
18. The apparatus of claim 13 , wherein the substrate is a bulk semiconductor substrate.
19. The apparatus of claim 13 , further comprising an intermediate semiconductor material between each of the first and second dielectric pedestals and the first semiconductor material of the first fin and second semiconductor material of the second fin, respectively.
20. The apparatus of claim 19 , wherein the intermediate semiconductor material is silicon-carbide.
21. The apparatus of claim 13 wherein the first semiconductor material is silicon and the second semiconductor material is silicon-germanium.
22. The apparatus of claim 21 , wherein the FinFET transistor of the first conductivity type formed of the first semiconductor material is an n-channel device and wherein the FinFET transistor of the second conductivity type formed of the second semiconductor material is a p-channel device.
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US20150325487A1 (en) | 2015-11-12 |
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