US20140272280A1 - Anodized aluminum oxide nanoporous membrane integrated with micro-channel and method of formation thereof - Google Patents
Anodized aluminum oxide nanoporous membrane integrated with micro-channel and method of formation thereof Download PDFInfo
- Publication number
- US20140272280A1 US20140272280A1 US13/845,514 US201313845514A US2014272280A1 US 20140272280 A1 US20140272280 A1 US 20140272280A1 US 201313845514 A US201313845514 A US 201313845514A US 2014272280 A1 US2014272280 A1 US 2014272280A1
- Authority
- US
- United States
- Prior art keywords
- range
- aluminum oxide
- acid
- anodized aluminum
- pillars
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/12—Anodising more than once, e.g. in different baths
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/20—Acidic compositions for etching aluminium or alloys thereof
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
- C25D11/08—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used containing inorganic acids
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
- C25D11/10—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used containing organic acids
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/16—Pretreatment, e.g. desmutting
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
- C25D11/24—Chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/18—Polishing of light metals
- C25F3/20—Polishing of light metals of aluminium
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24174—Structurally defined web or sheet [e.g., overall dimension, etc.] including sheet or component perpendicular to plane of web or sheet
Definitions
- the present invention relates to an Anodized Aluminum Oxide nanoporous membrane integrated with micro channel and method of formation thereof.
- the invention further relates to formation of AAO pillars that are integrated in the membrane to create micro-channels to enhance mechanical stability and substantially reduce membrane thickness to nanometer range.
- Anodized Aluminum Oxide (AAO) ultrathin membrane find the application in sensors, filters, separation process etc. When filtration is conducted very thin membrane is desirable. However, AAO is not mechanically stable because of the substantial distance between the supports of the membrane. To overcome this problem the thickness of the membrane needs to be increased. This poses problem in filtration and separation because substantial pressure differential is required to pass the medium through the thick membrane. The thin membrane has problem of withstanding the pressure necessary for mass transfer. There is need in the market place to reduce the thickness and provide mechanical stability at the same to sustain the pressure.
- Patent application number 20120267337 discloses ultrathin porous nanoscale membranes, methods of making, and uses thereof.
- a process for forming a porous nanoscale membrane is described. The process involves applying a nanoscale film to one side of a substrate, where the nanoscale film includes a semiconductor material; masking an opposite side of the substrate; etching the substrate, beginning from the masked opposite side of the substrate and continuing until a passage is formed through the substrate, thereby exposing the film on both sides thereof to form a membrane; and then simultaneously forming a plurality of randomly spaced pores in the membrane.
- the resulting porous nanoscale membranes characterized by substantially smooth surfaces, high pore densities, and high aspect ratio dimensions, can be used in filtration devices, microfluidic devices, fuel cell membranes, and as electron microscopy substrates.
- United States Patent Application 20100219079 discloses methods for making membranes based on anodic aluminum oxide structures. It comprises of membranes including anodic aluminum oxide structures that are adapted for separation, purification, filtration, analysis, reaction and sensing.
- the membranes can include a porous anodic aluminum oxide (AAO) structure having pore channels extending through the AAO structure.
- AAO anodic aluminum oxide
- the membrane may also include an active layer, such as one including an active layer material and/or active layer pore channels.
- United States Patent Application 20110210259 discloses micro-channel plate detector.
- An anodized aluminum oxide membrane is provided and includes a plurality of nanopores which have an Al coating and a thin layer of an emissive oxide material responsive to incident radiation, thereby providing a plurality of radiation sensitive channels for the micro-channel plate detector.
- WIPO Patent Application WO/2008/124062 discloses composite structures with porous anodic oxide layers and methods of fabrication. It includes a composite gas separation module having a porous metal substrate; a porous anodic aluminum oxide layer, wherein the porous anodic aluminum oxidelayer overlies the porous metal substrate; and a dense gas-selective membrane, wherein the dense gas-selective membrane overlies the porous anodic aluminumoxide layer.
- Dong Sung Kim et. al. report fabrication of micro channel containing nanopillar arrays using micromachined AAO mold.
- a fabrication method of a microchannel containing nanopillar arrays based on the soft lithographical replication of PDMS (polydimethylsiloxane) using a micromachined AAO (anodic aluminum oxide) master mold without any photolithographic processes is disclosed.
- PDMS polydimethylsiloxane
- AAO anodic aluminum oxide
- Seon Woo Lee et. al report development of AAO based micro-channel plate for large area photo detector (Seon Woo Lee, Qing Peng2, Anil U. Mane, Jeffrey W. Elam2, Karen Byruml, Henry Frisch and Hau Wang, The Development of Anodic Aluminum Oxide Based Micro - channel Plate for Large - area Photo - detector, 2010 MRS Fall Meeting )
- the main object of the invention is to provide micro channel integrated Anodized Aluminum Oxide membrane and method of preparation thereof. Further object of the invention is to substantially reduce the membrane thickness in nanometer range.
- Another object of the invention is to form micro-channels in the membrane substrate as an integrated structure.
- Yet another object of the invention is to the membrane and the pillars are formed from the same substrate.
- Another object of the invention is to enable formation of the supporting pillar structures from membrane.
- Yet another object of the invention is to create cavity for the micro-channel from the said structure using selective etching of the membrane.
- Yet another object of the invention is to form micro-channel using external support to provide mechanical stability to the pillars and in turn the nano-porous structure.
- Yet another object of the invention is to enable attachment of the said pillars to the external surface that could be used as external support as per the end use.
- Another object of the invention is to enable creation of the micro-cavity in the substrate that is bound by the integrated ultrathin membrane at one end. Further object of the invention is to use such a structure for sensing purpose.
- Another object of the invention is to provide the micro-channel integrated membrane structure as a template for creating a desired structure on another substrate. Further object of the invention is to tailor the micro-channel dimensions as per the requirement of the configuration of the template to create desired structure on another substrate.
- micro-channel integrated nanoporous membrane comprises of
- the nanoporous structure is supported by the said pillars and is integrated with the said pillars wherein the said nanoporous structure functions as a membrane
- FIG. 1 illustrates schematic of the configuration of the AAO ultrathin membrane system
- FIG. 2 illustrates schematic of the result of second step of anodization process
- FIG. 3 illustrates schematic of the result of the selective etching process.
- FIG. 4 illustrates schematic of the result of the anodization process that follows the selective etching process.
- FIG. 5 illustrates schematic of the micro pillar attachment to the substrate
- FIG. 6 illustrates schematic of the barrier layer formation
- FIG. 7 illustrates schematic of the membrane after barrier layer removal
- FIG. 8 illustrates schematic of the embodiment of the system
- ultrathin nanoporous member used in the context of this invention refers to the membranes having thickness in the nanometer range.
- the nanoporous alumina structure/membrane module is illustrated schematically in FIG. 1 . It comprises of substrate 1 , plurality of alumina micro pillars 2 to form respective micro-channels 5 .
- the said pillars are attached with substrate with the help of adhesive layer 3 .
- the ultrathin porous structure 4 is supported by the said pillars and is integrated with the said pillars.
- the said porous structure 4 functions as a membrane.
- the substrate is made up of glass.
- the nanoporous structure/membrane is ultrathin having thickness is in the nanometer range.
- the method of preparation comprises steps of:
- the result of this selective etching process is depicted schematically in FIG. 3 .
- the cavity 32 is formed as a result of the selective etching in the plurality of micro pillars (indicated by numeral 30 ) of AAO.
- FIG. 4 The result of this anodization process is depicted schematically in FIG. 4 .
- Plurality of micro pillars (indicated by the numeral 40 ) of AAO from the substrate 41 are formed in the said cavity.
- the surrounding plurality of AAO micro pillars are indicated by numeral 42 .
- FIG. 5 illustrates the schematic of the system wherein the said micro pillars 50 (formed from the Al substrate 53 ) are attached to the substrate 51 with the aid of the adhesive 52 .
- the membrane it is required to etch Al and remove barrier layer. It comprises steps of chemical etching of Al substrate using CuCl2 and HCI wherein the concentration of CuCl2 is in the range of 0.2 to 0.25M and the concentration of HCI is in the range of 6 to 6.1M HCI, the temperature is in the range of 40 to 45° C. wherein etching time depends on Al thickness.
- FIG. 6 illustrates the schematic indicating the formation of the barrier layer 60 as a result of the etching process.
- the barrier layer (BL) is removed by placing of AAO in 5 wt % to 6 wt % Phosphoric acid for about 35 to 40 min at 31° C. to 32° C.
- FIG. 7 illustrates the schematic after removal of the barrier layer to form the membrane.
- FIG. 8 One of the embodiments of the system is depicted in FIG. 8 . It comprises of micro pillars (indicated by the numeral 80 ) surrounding the cavity 81 .
- the membrane 82 is at the end of the cavity (as seen from top).
- this system configuration is used in sensor application.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
Abstract
The present invention relates to an Anodized Aluminum Oxide nanoporous membrane integrated with micro channel and method of formation thereof. The invention further relates to formation of AAO pillars that are integrated in the membrane to create micro-channels to enhance mechanical stability and substantially reduce membrane thickness to nanometer range. This intrinsic configuration results in obviating the use of any external added material or support. The integrated membrane comprises of a substrate, plurality of alumina micro pillars that form respective micro-channels wherein the said pillars are attached with the substrate, nanoporous structure integrated with the pillars wherein the micro channel is formed between two consecutive pillars bound by the nanoporous structure surface and the substrate surface.
Description
- The present invention relates to an Anodized Aluminum Oxide nanoporous membrane integrated with micro channel and method of formation thereof. The invention further relates to formation of AAO pillars that are integrated in the membrane to create micro-channels to enhance mechanical stability and substantially reduce membrane thickness to nanometer range.
- Anodized Aluminum Oxide (AAO) ultrathin membrane (having thickness in nanometer range) find the application in sensors, filters, separation process etc. When filtration is conducted very thin membrane is desirable. However, AAO is not mechanically stable because of the substantial distance between the supports of the membrane. To overcome this problem the thickness of the membrane needs to be increased. This poses problem in filtration and separation because substantial pressure differential is required to pass the medium through the thick membrane. The thin membrane has problem of withstanding the pressure necessary for mass transfer. There is need in the market place to reduce the thickness and provide mechanical stability at the same to sustain the pressure.
- It is to be noted that in the conventional system and process for making substantially straight channels is very expensive due to the use of complex process and equipment such as ion milling that takes enormous time resulting in very high process cost. There is limitation of using chemical etching that results in irregular formation of the channels.
- Patent application number 20120267337 discloses ultrathin porous nanoscale membranes, methods of making, and uses thereof. A process for forming a porous nanoscale membrane is described. The process involves applying a nanoscale film to one side of a substrate, where the nanoscale film includes a semiconductor material; masking an opposite side of the substrate; etching the substrate, beginning from the masked opposite side of the substrate and continuing until a passage is formed through the substrate, thereby exposing the film on both sides thereof to form a membrane; and then simultaneously forming a plurality of randomly spaced pores in the membrane. The resulting porous nanoscale membranes, characterized by substantially smooth surfaces, high pore densities, and high aspect ratio dimensions, can be used in filtration devices, microfluidic devices, fuel cell membranes, and as electron microscopy substrates.
- United States Patent Application 20100219079 discloses methods for making membranes based on anodic aluminum oxide structures. It comprises of membranes including anodic aluminum oxide structures that are adapted for separation, purification, filtration, analysis, reaction and sensing. The membranes can include a porous anodic aluminum oxide (AAO) structure having pore channels extending through the AAO structure. The membrane may also include an active layer, such as one including an active layer material and/or active layer pore channels.
- United States Patent Application 20110210259 discloses micro-channel plate detector. An anodized aluminum oxide membrane is provided and includes a plurality of nanopores which have an Al coating and a thin layer of an emissive oxide material responsive to incident radiation, thereby providing a plurality of radiation sensitive channels for the micro-channel plate detector.
- WIPO Patent Application WO/2008/124062 discloses composite structures with porous anodic oxide layers and methods of fabrication. It includes a composite gas separation module having a porous metal substrate; a porous anodic aluminum oxide layer, wherein the porous anodic aluminum oxidelayer overlies the porous metal substrate; and a dense gas-selective membrane, wherein the dense gas-selective membrane overlies the porous anodic aluminumoxide layer.
- Mahadi Hasan et al have reported “Anodic Aluminum Oxide (AAO) to AAO Bonding and Their Application for Fabrication of 3D Microchannel”. (Mahadi Hasan, Ajab Khan Kasi, Jafar Khan Kasi, and Nitin Afzulpurkar, “Anodic Aluminum Oxide (AAO) to AAO Bonding and Their Application for Fabrication of 3D Microchannel”, Nanoscience and Nanotechnology Letters, Vol. 4, 569-573, 2012.)
- Dong Sung Kim et. al. report fabrication of micro channel containing nanopillar arrays using micromachined AAO mold. A fabrication method of a microchannel containing nanopillar arrays based on the soft lithographical replication of PDMS (polydimethylsiloxane) using a micromachined AAO (anodic aluminum oxide) master mold without any photolithographic processes is disclosed. (Dong Sung Kim, Han UI Lee, Dong Sung Kim, Kun-Hong Lee, Dong-Woo Cho, Fabrication of microchannel containing nanopillar arrays using micromachined AAO (anodic aluminum oxide) mold, Journal Microelectronic Engineering, Volume 84 Issue 5-8, May, 2007, Pages 1532-1535).
- Seon Woo Lee et. al report development of AAO based micro-channel plate for large area photo detector (Seon Woo Lee, Qing Peng2, Anil U. Mane, Jeffrey W. Elam2, Karen Byruml, Henry Frisch and Hau Wang, The Development of Anodic Aluminum Oxide Based Micro-channel Plate for Large-area Photo-detector, 2010 MRS Fall Meeting)
- In the prior art the attempt is made to prepare an ultrathin membrane with the use of micro-channel, however they suffer from the limitation of substantially high cost because of use of expensive process, material and machines that uses micro fabrication tools, clean room requirement, use of silicon. This semi-conductor technology is complex process steps and expensive. The scaling and use of such membranes for filtration is a challenge due to cost and scaling limitations.
- It is required to provide intrinsic means to enhance the mechanical stability of the membrane obviating the use of any external added material or support. It is necessary to integrate the process of membrane preparation and the support for mechanical strength from a single substrate in a single process without separation of the membrane from the support. It is necessary that the support is integrated with the membrane itself.
- The main object of the invention is to provide micro channel integrated Anodized Aluminum Oxide membrane and method of preparation thereof. Further object of the invention is to substantially reduce the membrane thickness in nanometer range.
- Another object of the invention is to form micro-channels in the membrane substrate as an integrated structure.
- Yet another object of the invention is to the membrane and the pillars are formed from the same substrate.
- Another object of the invention is to enable formation of the supporting pillar structures from membrane.
- Yet another object of the invention is to create cavity for the micro-channel from the said structure using selective etching of the membrane.
- Yet another object of the invention is to form micro-channel using external support to provide mechanical stability to the pillars and in turn the nano-porous structure.
- Yet another object of the invention is to enable attachment of the said pillars to the external surface that could be used as external support as per the end use.
- Another object of the invention is to enable creation of the micro-cavity in the substrate that is bound by the integrated ultrathin membrane at one end. Further object of the invention is to use such a structure for sensing purpose.
- Another object of the invention is to provide the micro-channel integrated membrane structure as a template for creating a desired structure on another substrate. Further object of the invention is to tailor the micro-channel dimensions as per the requirement of the configuration of the template to create desired structure on another substrate.
- Thus in accordance with the invention the micro-channel integrated nanoporous membrane comprises of
- plurality of alumina micro pillars to form respective micro-channels wherein the said pillars are attached with a surface/substrate with the help of adhesive layer; the nanoporous structure is supported by the said pillars and is integrated with the said pillars wherein the said nanoporous structure functions as a membrane
- wherein the method comprises steps of:
-
- electro-polishing of the said substrate comprising steps of:
- placing the said substrate in the mixture of perchloric acid and ethanol respectively wherein the ratio in the range of 1:3 to 1:5 by volume wherein purity of ethanol is in the range of 99%-99.9% and that of Perchloric acid is in the range of 69-72%;
- Applying potential at a temperature less than 10° C. wherein the potential is in the range of 10 to 20 V;
- Applying potential for 3 to 10 min depending on the surface roughness;
- first step anodization comprising steps of:
- selecting electrolyte from either of oxalic acid, phosphoric acid, sulfuric acid and malunic acid wherein the concentration of the said acid depends on the pore size;
- sing oxalic acid as electrolyte in the range of 0.2M to 0.3M;
- applying a potential in the range of 35 to 45V wherein process time is in the range from 1 h to 6 h;
- chemical etching of the anodized aluminum oxide comprising steps of:
- etching in chromic acid and phosphoric acid wherein the temperature is in the range of 65-80° C. wherein phosphoric acid is in the range of 6 wt % to 7 wt % and chromic acid is in the range of 2 wt % to 3 wt % wherein purity of Chromic acid is 99% and purity of phosphoric acid is 85%;
- second step anodization comprising steps of:
- repeating the process in the first step anodization wherein hexagonally arranged nanoporous structures are formed with one end blocked with barrier layer wherein process time depends on the membrane thickness, which makes height of pillars, it can range from 1 h to 48 h depending on pillars height.
- selective etching of AAO comprising steps of
- spin coating of positive photo resist at spinner speed 1000 to 3000 rpm for 10 to 20 seconds;
- soft backing at 50 to 80° C. for 20 to 30 seconds;
- placing mask of the desired texture;
- UV exposure of 200 to 1000 W lamp for 2 to 10 seconds;
- hard backing at 80 to 100° C. for 20 to 60 seconds;
- development of photo resist for 5 to 10 seconds in developer;
- selective chemical etching of aluminum oxide in chromic acid and phosphoric acid wherein the temperature is in the range of 65-80° C. wherein phosphoric acid is in the range of 6 wt % to 7 wt % and chromic acid is in the range of 2 wt % to 3 wt % wherein purity of Chromic acid is 99% and purity of phosphoric acid is 85%, wherein etching time from 1 to 5 minutes;
- chemical etching of photoresist in the specific etcher;
- anodization for making ultrathin nanoporous structure/membrane comprising steps of
- selecting electrolyte from either of oxalic acid, phosphoric acid, sulfuric acid and malunic acid wherein the concentration of the said acid depends on the pore size;
- using oxalic acid as electrolyte in the range of 0.2M to 0.3M;
- applying a potential in the range of 35 to 45V wherein process time is in the range from 10 to 60 minutes.
- spin coating of adhesive on glass substrate at spinner speed 300 to 3000 rpm depending on adhesive viscosity
- attachment of glass with alumina pillars
- etching of Al comprising steps of
- chemical etching of Al substrate using CuCl2 and HCI
- wherein the concentration of CuCl2 is in the range of 0.2 to 0.25M and the concentration of HCI is in the range of 6 to 6.1M HCI, the temperature is in the range of 40 to 45° C. wherein etching time depends on Al thickness;
- Barrier layer (BL) removal by placing of AAO in 5 wt % to 6 wt % Phosphoric acid for about 35 to 40 min at 31° C. to 32° C.
- electro-polishing of the said substrate comprising steps of:
- Features and advantages of this invention will become apparent in the following detailed description and the preferred embodiments with reference to the accompanying drawings. The embodiments are illustrated by way of example and not by way of limitation in the figures of the accompanying drawings.
-
FIG. 1 illustrates schematic of the configuration of the AAO ultrathin membrane system -
FIG. 2 illustrates schematic of the result of second step of anodization process -
FIG. 3 illustrates schematic of the result of the selective etching process. -
FIG. 4 illustrates schematic of the result of the anodization process that follows the selective etching process. -
FIG. 5 illustrates schematic of the micro pillar attachment to the substrate -
FIG. 6 illustrates schematic of the barrier layer formation -
FIG. 7 illustrates schematic of the membrane after barrier layer removal -
FIG. 8 illustrates schematic of the embodiment of the system - The term ultrathin nanoporous member used in the context of this invention refers to the membranes having thickness in the nanometer range.
- In the following description, various embodiments will be disclosed. However, it will be apparent to those skilled in the art that the embodiments may be practiced with some or shall disclosed subject matter. For purposes of explanation, specific numbers, materials, and/or configuration are set forth in order to provide a thorough understanding of the embodiments. However, it will also be apparent to one skilled in the art that the embodiments may be practiced without one or more of the specific details, or with other approaches, materials, components etc. In other instances, well-known structures, materials, and/or operations are not shown and/or described in detail to avoid obscuring the embodiments. Accordingly, in some instances, features are omitted and/or simplified in order to not obscure the disclosed embodiments. Furthermore, it is understood that the embodiments shown in the Figures are illustrative representation and are not necessarily drawn to scale.
- The nanoporous alumina structure/membrane module is illustrated schematically in
FIG. 1 . It comprises ofsubstrate 1, plurality of aluminamicro pillars 2 to form respective micro-channels 5. The said pillars are attached with substrate with the help ofadhesive layer 3. The ultrathinporous structure 4 is supported by the said pillars and is integrated with the said pillars. The saidporous structure 4 functions as a membrane. In one of the embodiments, the substrate is made up of glass. In one of the preferred embodiments, the nanoporous structure/membrane is ultrathin having thickness is in the nanometer range. - The method of preparation comprises steps of:
-
- electro-polishing of the said substrate comprising steps of:
- placing the said substrate in the mixture of perchloric acid and ethanol respectively wherein the ratio in the range of 1:3 to 1:5 by volume wherein purity of ethanol is in the range of 99%-99.9% and that of Perchloric acid is in the range of 69-72%;
- applying potential at a temperature less than 10° C. wherein the potential is in the range of 10 to 20 V;
- applying potential for 3 to 10 min depending on the surface roughness;
- first step anodization comprising steps of:
- selecting electrolyte from either of oxalic acid, phosphoric acid, sulfuric acid and malunic acid wherein the concentration of the said acid depends on the pore size;
- using oxalic acid as electrolyte in the range of 0.2M to 0.3M;
- applying a potential in the range of 35 to 45V wherein process time is in the range from 1 h to 6 h;
- chemical etching of the anodized aluminum oxide comprising steps of:
- etching in chromic acid and phosphoric acid wherein the temperature is in the range of 65-80° C. wherein phosphoric acid is in the range of 6 wt % to 7 wt % and chromic acid is in the range of 2 wt % to 3 wt % wherein purity of Chromic acid is 99% and purity of phosphoric acid is 85%;
- second step anodization comprising steps of:
- repeating the process in the first step anodization wherein hexagonally arranged nanoporous structures are formed with one end blocked with barrier layer wherein process time depends on the membrane thickness, which results in the height of the micro pillars, it can range from 1 h to 48 h depending on pillars height.
- The result of second step of anodization is depicted schematically in
FIG. 2 . Plurality of micro pillars (indicated by numeral 20) of AAO from thesubstrate 21 are formed. - selective etching of AAO comprising steps of
- spin coating of positive photo resist at spinner speed 1000 to 3000 rpm for 10 to 20 seconds;
- soft backing at 50 to 80° C. for 20 to 30 seconds;
- placing mask of the desired texture;
- UV exposure of 200 to 1000 W lamp for 2 to 10 seconds;
- hard backing at 80 to 100° C. for 20 to 60 seconds;
- development of photo resist for 5 to 10 seconds in developer;
- selective chemical etching of aluminum oxide in chromic acid and phosphoric acid wherein the temperature is in the range of 65-80° C. wherein phosphoric acid is in the range of 6 wt % to 7 wt % and chromic acid is in the range of 2 wt % to 3 wt % wherein purity of Chromic acid is 99% and purity of phosphoric acid is 85%, wherein etching time from 1 to 5 minutes;
- chemical etching of photoresist in the specific etcher.
- electro-polishing of the said substrate comprising steps of:
- The result of this selective etching process is depicted schematically in
FIG. 3 . Thecavity 32 is formed as a result of the selective etching in the plurality of micro pillars (indicated by numeral 30) of AAO. -
- Anodization for making ultrathin membrane comprising steps of
- selecting electrolyte from either of oxalic acid, phosphoric acid, sulfuric acid and malunic acid wherein the concentration of the said acid depends on the pore size;
- using oxalic acid as electrolyte in the range of 0.2M to 0.3M;
- applying a potential in the range of 35 to 45V wherein process time is in the range from 10 to 60 minutes.
- Anodization for making ultrathin membrane comprising steps of
- The result of this anodization process is depicted schematically in
FIG. 4 . Plurality of micro pillars (indicated by the numeral 40) of AAO from thesubstrate 41 are formed in the said cavity. The surrounding plurality of AAO micro pillars are indicated bynumeral 42. - The adhesive is applied on the on the glass using spin coating. The said micro pillars of alumina are attached to the glass substrate. In another embodiment the substrate is selected depending on the end use and application. Person skilled in art can contemplate such a variety of substrates.
FIG. 5 illustrates the schematic of the system wherein the said micro pillars 50 (formed from the Al substrate 53) are attached to thesubstrate 51 with the aid of the adhesive 52. - To form the membrane, it is required to etch Al and remove barrier layer. It comprises steps of chemical etching of Al substrate using CuCl2 and HCI wherein the concentration of CuCl2 is in the range of 0.2 to 0.25M and the concentration of HCI is in the range of 6 to 6.1M HCI, the temperature is in the range of 40 to 45° C. wherein etching time depends on Al thickness.
FIG. 6 illustrates the schematic indicating the formation of thebarrier layer 60 as a result of the etching process. - The barrier layer (BL) is removed by placing of AAO in 5 wt % to 6 wt % Phosphoric acid for about 35 to 40 min at 31° C. to 32° C.
FIG. 7 illustrates the schematic after removal of the barrier layer to form the membrane. - One of the embodiments of the system is depicted in
FIG. 8 . It comprises of micro pillars (indicated by the numeral 80) surrounding thecavity 81. Themembrane 82 is at the end of the cavity (as seen from top). In one of the variants of this embodiment, this system configuration is used in sensor application.
Claims (12)
1. An anodized aluminum oxide nanoporous membrane integrated with micro channel comprising of a substrate, plurality of alumina micro pillars that form respective micro-channels wherein the said pillars are attached with the substrate, nanoporous structure integrated with the pillars
wherein the micro channel is formed between two consecutive pillars bound by the nanoporous structure surface and the substrate surface.
2. An anodized aluminum oxide nanoporous membrane integrated with micro channel prepared in steps of
electro polishing of Al substrate
first step anodization;
chemical etching;
second step anodization;
selective etching of anodized aluminum oxide to form one or plurality of cavity/cavities;
anodization for forming anodized aluminum oxide structure in the said cavities;
attachment of the pillars to the substrate;
etching Al for separation of alumina and barrier layer removal or voltage pulse detachment for barrier layer removal and detachment of membrane from Al substrate.
3. An anodized aluminum oxide nanoporous membrane integrated with micro channel as claimed in claim 2 wherein the process of electro polishing of Al sheet comprises steps of:
placing the said substrate in the mixture of perchloric acid and ethanol respectively wherein the ratio in the range of 1:3 to 1:5 by volume wherein purity of ethanol is in the range of 99%-99.9% and that of Perchloric acid is in the range of 69-72%;
applying potential at a temperature less than 10° C. wherein the potential is in the range of 10 to 20 V;
applying potential for 3 to 10 min depending on the surface roughness.
4. An anodized aluminum oxide nanoporous membrane integrated with micro channel as claimed in claim 2 wherein the process of first step anodization comprising steps of:
selecting electrolyte from either of oxalic acid, phosphoric acid, sulfuric acid and malunic acid wherein the concentration of the said acid depends on the pore size;
using oxalic acid as electrolyte in the range of 0.2M to 0.3M;
applying a potential in the range of 35 to 45V wherein process time is in the range from 1 h to 6 h.
5. An anodized aluminum oxide nanoporous membrane integrated with micro channel as claimed in claim 2 wherein the process of chemical etching of the anodized aluminum oxide comprising steps of:
etching in chromic acid and phosphoric acid wherein the temperature is in the range of 65-80° C. wherein phosphoric acid is in the range of 6 wt % to 7 wt % and chromic acid is in the range of 2 wt % to 3 wt % wherein purity of chromic acid is 99% and purity of phosphoric acid is 85%.
6. An anodized aluminum oxide nanoporous membrane integrated with micro channel as claimed in claim 2 wherein the second step anodization comprises steps of:
selecting electrolyte from either of oxalic acid, phosphoric acid, sulfuric acid and malunic acid wherein the concentration of the said acid depends on the pore size;
using oxalic acid as electrolyte in the range of 0.2M to 0.3M;
applying a potential in the range of 35 to 45V wherein process time is in the range from 1 h to 6 h
wherein hexagonally arranged nanoporous structures are formed with one end blocked with barrier layer that results in the formation of the pillars.
7. An anodized aluminum oxide nanoporous membrane integrated with micro channel as claimed in claim 2 wherein the selective etching of anodized aluminum oxide to form cavity/cavities comprises steps of:
spin coating of positive photo resist at spinner speed 1000 to 3000 rpm for 10 to 20 seconds;
soft backing at 50 to 80° C. for 20 to 30 seconds;
placing mask of the desired texture;
UV exposure of 200 to 1000 W lamp for 2 to 10 seconds;
hard backing at 80 to 100° C. for 20 to 60 seconds;
development of photo resist for 5 to 10 seconds in developer;
selective chemical etching of aluminum oxide in chromic acid and phosphoric acid wherein the temperature is in the range of 65-80° C. wherein phosphoric acid is in the range of 6 wt % to 7 wt % and chromic acid is in the range of 2 wt % to 3 wt %, wherein etching time from 1 to 5 minutes;
chemical etching of photoresist in the specific etcher.
8. An anodized aluminum oxide nanoporous membrane integrated with micro channel as claimed in claim 2 wherein the process of anodization for the formation of the anodized aluminum oxide structure in the cavities comprises steps of:
selecting electrolyte from either of oxalic acid, phosphoric acid, sulfuric acid and malunic acid wherein the concentration of the said acid depends on the pore size;
using oxalic acid as electrolyte in the range of 0.2M to 0.3M;
applying a potential in the range of 35 to 45V wherein process time is in the range from 10 to 60 minutes.
9. An anodized aluminum oxide nanoporous membrane integrated with micro channel as claimed in claim 2 wherein the process of attachment of the pillars to the substrate comprises steps of applying adhesive on the glass substrate surface using spin coating and attaching the pillars.
10. An anodized aluminum oxide nanoporous membrane integrated with micro channel as claimed in claim 2 wherein barrier layer removal process comprises steps of chemical etching of Al substrate using CuCl2 and HCI wherein the concentration of CuCl2 is in the range of 0.2 to 0.25M and the concentration of HCI is in the range of 6 to 6.1 M HCI, the temperature is in the range of 40 to 45° C.
11. An anodized aluminum oxide nanoporous membrane integrated with micro channel as claimed in claim 1 comprising of micro pillars surrounding a cavity wherein there is a membrane at the end of the cavity.
12. An anodized aluminum oxide nanoporous membrane integrated with micro channel as claimed in claim 1 wherein the substrate is selected from glass, metal, alloy, nonmetal, polymer based or any surface on which the membrane is supported.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/845,514 US20140272280A1 (en) | 2013-03-18 | 2013-03-18 | Anodized aluminum oxide nanoporous membrane integrated with micro-channel and method of formation thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/845,514 US20140272280A1 (en) | 2013-03-18 | 2013-03-18 | Anodized aluminum oxide nanoporous membrane integrated with micro-channel and method of formation thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
US20140272280A1 true US20140272280A1 (en) | 2014-09-18 |
Family
ID=51528317
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US13/845,514 Abandoned US20140272280A1 (en) | 2013-03-18 | 2013-03-18 | Anodized aluminum oxide nanoporous membrane integrated with micro-channel and method of formation thereof |
Country Status (1)
Country | Link |
---|---|
US (1) | US20140272280A1 (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104328470A (en) * | 2014-09-30 | 2015-02-04 | 无锡英普林纳米科技有限公司 | Preparation method of porous aluminum oxide template |
KR101756357B1 (en) * | 2015-06-18 | 2017-07-11 | (주)포인트엔지니어링 | Micro heater and Micro sensor |
US9719926B2 (en) * | 2015-11-16 | 2017-08-01 | International Business Machines Corporation | Nanopillar microfluidic devices and methods of use thereof |
KR101760811B1 (en) * | 2015-06-18 | 2017-08-04 | (주)포인트엔지니어링 | Micro heater and Micro sensor |
US9780257B1 (en) * | 2016-03-16 | 2017-10-03 | Boe Technology Group Co., Ltd. | Method of preparing quantum dot layer, QLED display device having the quantum dot layer and method of preparing the same |
CN108675258A (en) * | 2018-04-25 | 2018-10-19 | 清华大学深圳研究生院 | Film assembly and preparation method thereof based on Woelm Alumina |
WO2019083729A1 (en) * | 2017-10-23 | 2019-05-02 | Trustees Of Boston University | Enhanced thermal transport across interfaces |
CN109972183A (en) * | 2019-03-27 | 2019-07-05 | 江苏理工学院 | The preparation method of deposit cobalt on a kind of anodic oxidation aluminium formwork |
CN109989085A (en) * | 2019-03-27 | 2019-07-09 | 江苏理工学院 | A kind of preparation method of porous anodic alumina films |
-
2013
- 2013-03-18 US US13/845,514 patent/US20140272280A1/en not_active Abandoned
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104328470A (en) * | 2014-09-30 | 2015-02-04 | 无锡英普林纳米科技有限公司 | Preparation method of porous aluminum oxide template |
KR101756357B1 (en) * | 2015-06-18 | 2017-07-11 | (주)포인트엔지니어링 | Micro heater and Micro sensor |
KR101760811B1 (en) * | 2015-06-18 | 2017-08-04 | (주)포인트엔지니어링 | Micro heater and Micro sensor |
US9719926B2 (en) * | 2015-11-16 | 2017-08-01 | International Business Machines Corporation | Nanopillar microfluidic devices and methods of use thereof |
US9780257B1 (en) * | 2016-03-16 | 2017-10-03 | Boe Technology Group Co., Ltd. | Method of preparing quantum dot layer, QLED display device having the quantum dot layer and method of preparing the same |
WO2019083729A1 (en) * | 2017-10-23 | 2019-05-02 | Trustees Of Boston University | Enhanced thermal transport across interfaces |
US10677542B2 (en) | 2017-10-23 | 2020-06-09 | Trustees Of Boston University | Enhanced thermal transport across interfaces |
CN108675258A (en) * | 2018-04-25 | 2018-10-19 | 清华大学深圳研究生院 | Film assembly and preparation method thereof based on Woelm Alumina |
CN109972183A (en) * | 2019-03-27 | 2019-07-05 | 江苏理工学院 | The preparation method of deposit cobalt on a kind of anodic oxidation aluminium formwork |
CN109989085A (en) * | 2019-03-27 | 2019-07-09 | 江苏理工学院 | A kind of preparation method of porous anodic alumina films |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20140272280A1 (en) | Anodized aluminum oxide nanoporous membrane integrated with micro-channel and method of formation thereof | |
Sato et al. | An all SU-8 microfluidic chip with built-in 3D fine microstructures | |
KR101248271B1 (en) | Energy conversion device using micro-nano channel and fabrication method thereof | |
US9789239B2 (en) | Nanoporous silicon nitride membranes, and methods for making and using such membranes | |
US20110168210A1 (en) | Micro-nano bubble generating method, microchannel cleaning method, micro-nano bubble generating system, and microreactor | |
Kasi et al. | Fabrication of mechanically stable AAO membrane with improved fluid permeation properties | |
US20100296986A1 (en) | Microscreen for filtering particles in microfluidics applications and production thereof | |
US20180038841A1 (en) | Component based on a structurable substrate with a membrane structure having three-dimensional pores in the nm range and semiconductor technology method for manufacturing same | |
Sainiemi et al. | Nanoperforated silicon membranes fabricated by UV-nanoimprint lithography, deep reactive ion etching and atomic layer deposition | |
Westerik et al. | Sidewall patterning—a new wafer-scale method for accurate patterning of vertical silicon structures | |
Guo et al. | Fabrication of 2D silicon nano-mold by side etch lift-off method | |
Hasan et al. | Anodic aluminum oxide (AAO) to AAO bonding and their application for fabrication of 3D microchannel | |
Kovacs et al. | Mechanical investigation of perforated and porous membranes for micro-and nanofilter applications | |
CN106861781B (en) | Micro-channel preparation method for reducing fluid resistance based on surface nano-bubbles | |
Kim et al. | Fabrication of microchannel containing nanopillar arrays using micromachined AAO (anodic aluminum oxide) mold | |
US10953370B2 (en) | Nano-pore arrays for bio-medical, environmental, and industrial sorting, filtering, monitoring, or dispensing | |
Hasan et al. | Fabrication of thinner anodic aluminum oxide based microchannels | |
Choi et al. | Fabrication of perforated micro/nanopore membranes via a combination of nanoimprint lithography and pressed self-perfection process for size reduction | |
CN106904700B (en) | Ion separation device with graphene-based film coated metal as electrode material | |
Lee et al. | Pore-size reduction protocol for SiN membrane nanopore using the thermal reflow in nanoimprinting for nanobio-based sensing | |
Pinti et al. | Fabrication of Hybrid Micro-Nanofluidic Devices With Centimeter Long Ultra-Low Aspect Ratio Nanochannels | |
Mardilovich et al. | Hybrid micromachining and surface microstructuring of alumina ceramic | |
Brechmann et al. | CMOS-compatible fabrication of perforated membranes for filtration applications | |
Pinti et al. | A two-step wet etch process for the facile fabrication of hybrid micro-nanofluidic devices | |
US11648514B2 (en) | Perfluorocarbon-free membranes for membrane distillation |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: ASIAN INSTITUTE OF TECHNOLOGY, THAILAND Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:AFZULPURKAR, NITIN;KASI, AJAB KHAN;REEL/FRAME:030601/0798 Effective date: 20130408 |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |