US20140157813A1 - Temperature control system - Google Patents

Temperature control system Download PDF

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Publication number
US20140157813A1
US20140157813A1 US14/236,839 US201214236839A US2014157813A1 US 20140157813 A1 US20140157813 A1 US 20140157813A1 US 201214236839 A US201214236839 A US 201214236839A US 2014157813 A1 US2014157813 A1 US 2014157813A1
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United States
Prior art keywords
vapor
temperature
amount
line
makeup water
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Abandoned
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US14/236,839
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English (en)
Inventor
Yuzuru Kato
Eiichi Yamada
Kentarou Morita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cosmo Oil Co Ltd
Japan Petroleum Exploration Co Ltd
Inpex Corp
Japan Oil Gas and Metals National Corp
Nippon Steel Engineering Co Ltd
Eneos Corp
Original Assignee
Cosmo Oil Co Ltd
Japan Petroleum Exploration Co Ltd
Inpex Corp
Japan Oil Gas and Metals National Corp
JX Nippon Oil and Energy Corp
Nippon Steel and Sumikin Engineering Co Ltd
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Application filed by Cosmo Oil Co Ltd, Japan Petroleum Exploration Co Ltd, Inpex Corp, Japan Oil Gas and Metals National Corp, JX Nippon Oil and Energy Corp, Nippon Steel and Sumikin Engineering Co Ltd filed Critical Cosmo Oil Co Ltd
Assigned to JAPAN PETROLEUM EXPLORATION CO., LTD., JAPAN OIL, GAS AND METALS NATIONAL CORPORATION, INPEX CORPORATION, COSMO OIL CO., LTD., JX NIPPON OIL & ENERGY CORPORATION reassignment JAPAN PETROLEUM EXPLORATION CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: KATO, YUZURU, MORITA, KENTAROU, YAMADA, EIICHI
Assigned to JAPAN OIL, GAS AND METALS NATIONAL CORPORATION, JAPAN PETROLEUM EXPLORATION CO., LTD., JX NIPPON OIL & ENERGY CORPORATION, NIPPON STEEL & SUMIKIN ENGINEERING CO., LTD., INPEX CORPORATION, COSMO OIL CO., LTD. reassignment JAPAN OIL, GAS AND METALS NATIONAL CORPORATION CORRECTIVE ASSIGNMENT TO CORRECT THE 6TH ASSIGNEE INADVERTENTLY NOT ENTERED IN THE ASSIGNMENT PREVIOUSLY RECORDED ON REEL 032128 FRAME 0562. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: KATO, YUZURU, MORITA, KENTAROU, YAMADA, EIICHI
Publication of US20140157813A1 publication Critical patent/US20140157813A1/en
Abandoned legal-status Critical Current

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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22STEAM GENERATION
    • F22BMETHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B35/00Control systems for steam boilers
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25DREFRIGERATORS; COLD ROOMS; ICE-BOXES; COOLING OR FREEZING APPARATUS NOT OTHERWISE PROVIDED FOR
    • F25D7/00Devices using evaporation effects without recovery of the vapour
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/001Controlling catalytic processes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/20Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with liquid as a fluidising medium
    • B01J8/22Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with liquid as a fluidising medium gas being introduced into the liquid
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25DREFRIGERATORS; COLD ROOMS; ICE-BOXES; COOLING OR FREEZING APPARATUS NOT OTHERWISE PROVIDED FOR
    • F25D1/00Devices using naturally cold air or cold water
    • F25D1/02Devices using naturally cold air or cold water using naturally cold water, e.g. household tap water
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28BSTEAM OR VAPOUR CONDENSERS
    • F28B11/00Controlling arrangements with features specially adapted for condensers
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28BSTEAM OR VAPOUR CONDENSERS
    • F28B9/00Auxiliary systems, arrangements, or devices
    • F28B9/02Auxiliary systems, arrangements, or devices for feeding steam or vapour to condensers
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28BSTEAM OR VAPOUR CONDENSERS
    • F28B9/00Auxiliary systems, arrangements, or devices
    • F28B9/04Auxiliary systems, arrangements, or devices for feeding, collecting, and storing cooling water or other cooling liquid
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008Controlling the process
    • B01J2208/00017Controlling the temperature
    • B01J2208/00026Controlling or regulating the heat exchange system
    • B01J2208/00035Controlling or regulating the heat exchange system involving measured parameters
    • B01J2208/00044Temperature measurement
    • B01J2208/00061Temperature measurement of the reactants
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008Controlling the process
    • B01J2208/00017Controlling the temperature
    • B01J2208/00106Controlling the temperature by indirect heat exchange
    • B01J2208/00115Controlling the temperature by indirect heat exchange with heat exchange elements inside the bed of solid particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049Controlling or regulating processes
    • B01J2219/00191Control algorithm
    • B01J2219/00193Sensing a parameter
    • B01J2219/00195Sensing a parameter of the reaction system
    • B01J2219/002Sensing a parameter of the reaction system inside the reactor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049Controlling or regulating processes
    • B01J2219/00191Control algorithm
    • B01J2219/00211Control algorithm comparing a sensed parameter with a pre-set value
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049Controlling or regulating processes
    • B01J2219/00191Control algorithm
    • B01J2219/00222Control algorithm taking actions
    • B01J2219/00227Control algorithm taking actions modifying the operating conditions
    • B01J2219/00238Control algorithm taking actions modifying the operating conditions of the heat exchange system
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10GCRACKING HYDROCARBON OILS; PRODUCTION OF LIQUID HYDROCARBON MIXTURES, e.g. BY DESTRUCTIVE HYDROGENATION, OLIGOMERISATION, POLYMERISATION; RECOVERY OF HYDROCARBON OILS FROM OIL-SHALE, OIL-SAND, OR GASES; REFINING MIXTURES MAINLY CONSISTING OF HYDROCARBONS; REFORMING OF NAPHTHA; MINERAL WAXES
    • C10G2/00Production of liquid hydrocarbon mixtures of undefined composition from oxides of carbon
    • C10G2/30Production of liquid hydrocarbon mixtures of undefined composition from oxides of carbon from carbon monoxide with hydrogen
    • C10G2/32Production of liquid hydrocarbon mixtures of undefined composition from oxides of carbon from carbon monoxide with hydrogen with the use of catalysts

Definitions

  • the present invention relates to a temperature control system that can perform precise temperature control of a reactor by making the temperature in a refrigerant drum such as a steam drum uniform.
  • Patent Document 1 Conventionally, as a water supply system for a steam drum, there are those described for example in Patent Documents 1 and 2.
  • the water supply system described in Patent Document 1 supplies water to a drum via a water supply line from an economizer upon reception of flue gas, and generates steam by vapor-liquid separation performed by a vapor-liquid separator for an evaporator.
  • the temperature at the feed water outlet of the economizer increases and becomes higher than the saturation temperature with respect to drum pressure.
  • a vapor-liquid separator for vapor-liquid separation is provided to perform vapor-liquid separation in order to prevent steaming in the drum.
  • an internal feed line is provided in the drum instead of a vapor-liquid separator, and a small hole is formed in an upper half thereof and a through hole having a larger diameter than that is formed in a lower half thereof so that vapor and feed water flow out.
  • the above-described configuration is for a general boiler, and if the temperature of the makeup water is lower than that of the vapor phase in the steam drum, a temperature difference occurs between the vapor phase and the liquid phase. If the feed-water temperature of the makeup water to the steam drum is low, the temperature of the liquid phase becomes lower than the saturation temperature. Hence, if this configuration is applied to temperature control of an FT (Fisher-Tropsch) reactor, control becomes unstable. Moreover, there is another problem in that the amount of generated vapor becomes unstable because the temperature of the liquid phase decreases due to the amount of water supplied to the steam drum.
  • FT Fisher-Tropsch
  • a reactor converts synthesis gas containing rich hydrogen gas and carbon monoxide gas to hydrocarbon by using a catalyst.
  • the FT synthesis reaction is an exothermal reaction, and the temperature range for an appropriate reaction is very narrow. Accordingly, the reaction temperature in the reactor needs to be controlled precisely, while recovering the generated reaction heat.
  • This temperature control system 100 supplies water accumulated in a steam drum 101 in a vapor-liquid equilibrium state by a pump 102 from the bottom to a heat removing tube 104 in a reactor 103 in which a Fisher-Tropsch synthesis reaction (exothermal reaction) is performed. Water in the heat removing tube 104 is partly evaporated and heat-recovered by reaction heat generated in the reactor 103 accompanying the exothermal reaction, and this vapor-water two-phase fluid passes through a Return line 105 to the steam drum 101 and is returned to the steam drum 101 . The vapor then passes through a Vapor outlet line 107 and is supplied to a vapor user outside of the system.
  • a Fisher-Tropsch synthesis reaction exothermal reaction
  • makeup water in an amount matched with the vapor supplied to the outside of the system is replenished to the steam drum 101 through a Replenishing line 106 .
  • Supply of makeup water is adjusted so that the liquid level becomes constant based on a measurement result obtained by a level measuring section 108 that measures the water level in the steam drum 101 .
  • a temperature control system recovers reaction heat in a reactor in which an exothermal reaction occurs, to control the temperature in the reactor.
  • the temperature control system comprises: a refrigerant drum in which vapor and a liquid refrigerant are stored in a vapor-liquid equilibrium state; a heat removing section arranged in the reactor to evaporate a part of the liquid refrigerant supplied from the refrigerant drum by the reaction heat; a Return line that returns mixed phase fluid of vapor and the liquid refrigerant generated in the heat removing section to the refrigerant drum; a Vapor outlet line that supplies vapor in the refrigerant drum to outside of the system; and a Replenishing line that supplies makeup water in an amount matched with an amount of vapor discharged to the outside of the system, to the Return line.
  • the temperature control system may include: a control unit that determines the amount of makeup water by dividing the reaction heat in the reactor by the heat capacity per unit quantity of refrigerant determined based on a difference between a comparatively high temperature in the refrigerant drum and a comparatively low temperature of makeup water, and physical values (specific heat, evaporative latent heat) of the refrigerant; and a makeup water adjusting device that sets the amount of makeup water to be supplied from the Replenishing line to the Return line according to the amount of makeup water determined by the control unit.
  • the amount of makeup water determined by the control unit be calculated according to the following equation:
  • r evaporative latent heat of liquid refrigerant.
  • the Replenishing line may be connected to the Return line at an acute angle along a traveling direction of mixed phase fluid in the Return line at a junction of the Return line and the Replenishing line.
  • the Replenishing line may be provided with a seal portion that prevents back flow of vapor.
  • a spray nozzle that sprays makeup water into the Return line may be provided in the Replenishing line at the junction of the Return line and the Replenishing line.
  • the temperature control system is provided with the Replenishing line that supplies makeup water in an amount matched with an amount of vapor discharged to the outside of the system, to the Return line that returns mixed phase fluid of vapor and the liquid refrigerant generated in the heat removing section in the reactor, to the refrigerant drum. Accordingly, makeup water in an amount matched with the amount of vapor discharged to the outside of the system, is merged into the Return line and directly mixed with vapor in the Return line at saturation temperature, thereby enabling to heat the makeup water to saturation temperature before being supplied to the refrigerant drum. As a result, the gas-liquid temperature in the refrigerant drum can be maintained at saturation temperature at all times.
  • the complexity of the structure and enlargement of the equipment can be avoided, and the temperature in the refrigerant drum can be made uniform.
  • the temperature control system includes: the control unit that determines the amount of makeup water by dividing the reaction heat in the reactor by heat capacity per unit quantity of refrigerant determined based on the difference between a comparatively high temperature in the refrigerant drum and a comparatively low temperature of makeup water, and physical values (specific heat, evaporative latent heat) of the refrigerant; and the makeup water adjusting device that sets the amount of makeup water to be supplied from the Replenishing line to the Return line according to the amount of makeup water determined by the control unit. Consequently, the control unit can accurately calculate the amount of makeup water so as to be equal to a flow rate of vapor supplied to the outside of the system, and can accurately limit the amount of makeup water so as not to exceed the flow rate of vapor. As a result, hammering due to complete condensation at the junction can be reliably prevented.
  • the amount of makeup water determined by the control unit is specifically calculated according to the following equation, the amount of makeup water can be accurately calculated so as to be equal to the flow rate of vapor supplied to the outside of the system, and can be limited so as not to exceed the flow rate of vapor.
  • r evaporative latent heat of liquid refrigerant.
  • the Replenishing line is connected to the Return line at an acute angle along the traveling direction of mixed phase fluid at the junction of the Return line and the Replenishing line. Consequently, makeup water in the Replenishing line can be supplied along a flow direction of the mixed phase fluid at the time of merging makeup water to the mixed phase fluid of vapor into the liquid refrigerant in the Return line. As a result, generation of hammering due to an impact when makeup water collides with the mixed phase fluid at the time of joining can be prevented.
  • the seal portion for preventing back flow of vapor is provided in the Replenishing line. Consequently, when the supply amount of makeup water is small, a situation where vapor in the Return line flows back into the Replenishing line and condenses causing hammering, can be prevented.
  • the spray nozzle that sprays makeup water into the Return line is provided in the Replenishing line, at the junction of the Return line and the Replenishing line. Consequently, when makeup water is supplied from the Replenishing line to the Return line at the junction, if makeup water is sprayed by the spray nozzle and dispersed uniformly to be brought into contact with vapor in the mixed phase fluid, rapid vapor condensation due to an imbalance of makeup water can be suppressed, and the occurrence of hammering can be prevented.
  • FIG. 1 is a schematic configuration diagram of a temperature control system according to a first embodiment of the present invention
  • FIG. 2 is an explanatory diagram showing circulation paths of water and vapor, flow rates thereof, and temperatures thereof, in the temperature control system according to the embodiment.
  • FIG. 3 is an explanatory diagram showing a junction of a Return line and a Replenishing line in a reactor according to a first modified example.
  • FIG. 4 is an explanatory diagram showing the junction of the Return line and the Replenishing line in the reactor according to a second modified example.
  • FIG. 5 is an explanatory diagram showing the junction of the Return line and the Replenishing line in the reactor according to a third modified example.
  • FIG. 6 is a graph showing a change in a vapor percentage at the Return line after being joined to the outlet of the reactor in an example.
  • FIG. 7 is a schematic configuration diagram of a conventional temperature control system.
  • a temperature control system 1 shown in FIG. 1 for example, water is accumulated at a saturation temperature as a liquid refrigerant in a gas-liquid equilibrium state in a steam drum 2 , which is a refrigerant drum, and vapor is filled in a saturated state on an upper side of a liquid level in the steam drum 2 .
  • a supply line 3 is connected to the bottom of the steam drum 2 , and water is fed to a Heat removing line 7 (heat removing section) in an FT reactor 5 (hereinafter, referred to as “reactor”) in which a Fischer-Tropsch synthesis reaction (exothermal reaction) is performed, by a water supply pump 4 via the supply line 3 . Water is partially evaporated in the Heat removing line 7 due to reaction heat accompanying the exothermal reaction generated by the reactor 5 , and the reaction heat is recovered.
  • two-phase fluid (mixed phase fluid) containing vapor generated by evaporation of a part of the water in the Heat removing line 7 , and water, is returned to the steam drum 2 via the Return line 8 for the steam drum 2 , and a discharge opening of the Return line 8 is opened in an area of vapor on the upper side of the liquid level in the steam drum 2 .
  • vapor is supplied to a vapor user (not shown) outside of the system via a Vapor outlet line 9 .
  • a vapor discharge amount measuring unit 11 that measures the discharge amount of vapor to the outside of the system is provided in the Vapor outlet line 9 .
  • a Replenishing line 10 for replenishing the steam drum 2 with a liquid refrigerant, for example, makeup water, in an amount matched with the discharge amount of vapor supplied to the outside of the system.
  • the Replenishing line 10 is connected at a junction 6 in the middle of the Return line 8 . Consequently, makeup water having a comparatively low temperature (for example, a temperature t3) is directly mixed with vapor having a comparatively high temperature (for example, a temperature t1; t1>t3) evaporated in the reactor 5 , in the Return line 8 and heated to reach saturation temperature.
  • a replenishing temperature measuring section 16 that measures the temperature of the makeup water is provided in the Replenishing line 10 .
  • the makeup water in the Replenishing line 10 reaches saturation temperature in the Return line 8 , and is supplied to the steam drum 2 .
  • a pressure control section 18 that controls the pressure in the steam drum 2 based on a measurement result of the reaction heat temperature measuring section 14 that measures the temperature in the reactor 5 in which the exothermal reaction is performed, is provided to adjust the amount of vapor discharged from the Vapor outlet line 9 to the outside of the system by cascade control, thereby controlling the temperature in the reactor 5 in which the exothermal reaction is performed.
  • the reaction heat temperature measuring section 14 may include, for example, a plurality of temperature sensors arranged away from each other in a vertical direction in the reactor 5 , so that a mean value of the respective temperatures measured by these temperature sensors can be designated as the temperature in the reactor 5 .
  • a vapor phase (gas phase) and a water phase (liquid phase) in the steam drum 2 are in the vapor-liquid equilibrium state. Therefore the vapor phase pressure and the temperature of the water phase in the steam drum 2 are in a certain correlation. Consequently, when a deviation occurs in the actual temperature in the reactor 5 measured by the reaction heat temperature measuring section 14 with respect to a temperature set value of the reactor 5 in which the exothermal reaction is performed, the pressure control section 18 is operated to change the vapor phase pressure in the steam drum 2 .
  • the pressure control section 18 includes; the Vapor outlet line 9 , a pressure adjusting valve 19 provided in the Vapor outlet line 9 , and a pressure setting section 21 that controls the pressure adjusting valve 19 to set the pressure in the steam drum 2 via the Vapor outlet line 9 .
  • the temperature measurement result of the reaction heat temperature measuring section 14 is input to the pressure setting section 21 .
  • the pressure setting section 21 calculates a deviation of the actual temperature in the reactor 5 with respect to the temperature set value based on the temperature measurement result, and controls the pressure adjusting valve 19 based on the deviation to change the vapor phase pressure in the steam drum 2 .
  • the temperature of the water phase in the steam drum 2 (that is, the temperature of the water supplied to the Heat removing line 7 in the reactor 5 in which the exothermal reaction is performed) is changed, thereby enabling to change the amount of heat recovered by the Heat removing line 7 , and the temperature in the reactor 5 in which the exothermal reaction is performed can be made to approach the temperature set value.
  • the temperature of the water phase in the steam drum 2 can be measured by a water-phase temperature measuring section 23 provided at the bottom of the steam drum 2 .
  • the steam drum 2 , the supply line 3 , the Heat removing line 7 , and the Return line 8 constitute a system in which water as a liquid refrigerant circulates.
  • makeup water is supplied to the Return line 8 , the temperature in the steam drum 2 is at saturation temperature at all times under any pressure, thereby enabling to control the temperature in the reactor precisely and highly accurately.
  • the temperature control system 1 includes a control unit 25 that controls the amount of makeup water so that the amount of makeup water from the Replenishing line 10 does not exceed the amount of vapor discharged from the Vapor outlet line 9 to the outside of the system.
  • the control unit 25 receives respective measurement values obtained by; the water-phase temperature measuring section 23 that measures the water phase temperature in the steam drum 2 , the reaction heat calculating section 15 , and the replenishing temperature measuring section 16 that measures the temperature of the makeup water in the Replenishing line 10 , and calculates and determines the amount of makeup water so that it does not exceed the amount of vapor discharged from the Vapor outlet line 9 .
  • Data of the calculated amount of makeup water is output to a flow rate adjusting device 26 provided in the Replenishing line 10 .
  • the flow rate adjusting device 26 adjusts an aperture of a flow rate adjusting valve 13 to control the amount of makeup water.
  • a level measuring section 12 that measures the water level (liquid level) in the steam drum 2 , is provided in the steam drum 2 .
  • the valve aperture of the flow rate adjusting valve 13 output based on a measurement result of the level measuring section 12 is smaller than a valve aperture corresponding to the calculated amount of makeup water, that aperture is selected in order to prevent excessive water supply to the steam drum 2 (prevent overflow).
  • the amount of makeup water is controlled so as not to exceed the flow rate of vapor.
  • the vapor amount discharged by the Vapor outlet line 9 is WV1
  • the temperature thereof is t1
  • the flow rate of water supplied via the supply line 3 to the reactor 5 is WL4
  • the temperature thereof is t1
  • the amount of vapor discharged from the reactor 5 to the Return line 8 is WV2
  • the flow rate of water is WL2
  • each temperature is t1
  • the flow rate of water supplied from the Replenishing line 10 to the Return line 8 is WL3
  • the temperature thereof is t3
  • the amount of vapor returned from the Return line 8 after being merged into the steam drum 2 is WV1
  • the flow rate of water is WL4, and each temperature is t1.
  • the flow rate of water is in units of kg/h
  • the flow rate of vapor is in units of kg/h
  • the temperature is ° C.
  • the temperature of the amount of makeup water WL3 is the low temperature t3, and other temperatures are at the high temperature t1 (>t3).
  • the amount of vapor condensation water supply preheat amount/evaporative latent heat.
  • the amount of makeup water WL3 can be obtained based on the relation between the amount of reaction heat Q and the water supply temperatures t1 and t3.
  • the amount of reaction heat Q can be obtained from a product of; the reaction amount in the reactor 5 measured and calculated separately or a temperature difference between the steam drum 2 and the reactor 5 , the heat transfer area of the Heat removing line, and the overall heat transfer coefficient.
  • the temperature control system 1 has the above-described configuration. Next is a description of a control method thereof.
  • water at temperature t1 is supplied at the flow rate WL4 from the steam drum 2 to the reactor 5 .
  • a part of the water flow rate WL4 is evaporated in the Heat removing line 7 due to reaction heat accompanying the exothermal reaction generated in the reactor 5 to become two-phase fluid having the vapor flow rate WV2 and the water flow rate WL2 at temperature t1.
  • the two-phase fluid (mixed phase fluid) is fed by the Return line 8 .
  • the amount of makeup water WL3 determined by the control unit 25 is adjusted and supplied by the flow rate adjusting valve 13 .
  • the amount of makeup water WL3 at the comparatively low temperature t3 determined by the control unit 25 is replenished and merged into the two-phase fluid (WV2+WL2) in the Return line 8 at the junction 6 with the Return line 8 .
  • the amount of makeup water WL3 at temperature t3 is directly mixed with the vapor WV2 at the high temperature t1 in the Return line 8 and heated up to saturation temperature t1. Further, a part of the vapor is condensed at the junction 6 , and the flow rate of water in the Return line 8 becomes the same as the flow rate WL4 of water supplied from the steam drum 2 to the supply line 3 .
  • the flow rate becomes the flow rate WV1 of vapor and the flow rate WL4 of water at temperature t1, and the two-phase fluid is discharged to above the water surface in the steam drum 2 .
  • the temperature t1 measured by the water-phase temperature measuring section 23 that measures the water phase temperature in the steam drum 2 , the amount of reaction heat Q calculated by the reaction heat calculating section 15 , and the temperature t3 of the makeup water measured by the replenishing temperature measuring section 16 in the Replenishing line 10 are input to the control unit 25 .
  • the control unit 25 then calculates the amount of makeup water WL3 according to the above equation (6).
  • the calculation value for this amount of makeup water WL3 is output to the flow rate adjusting device 26 to operate the flow rate adjusting valve 13 and supply makeup water in the amount of WL3 to the Replenishing line 10 to merge into the Return line 8 at the junction 6 , and be discharged to the steam drum 2 .
  • vapor is supplied at the flow rate WV1 from the steam drum 2 to the outside of the system by the Vapor outlet line 9 , and makeup water in the amount of WL3 merges into to the vapor-water two-phase fluid at the junction 6 with the Return line 8 and is supplied to the steam drum 2 . Because the amount of makeup water WL3 is controlled by the control unit 25 to be equal to the flow rate of vapor WV1, the water level in the steam drum 2 is maintained constant.
  • the amount of makeup water WL3 equal to the flow rate of vapor WV1 to be supplied to the outside of the system by the Vapor outlet line 9 and at the comparatively low temperature t3, can be joined to the Return line 8 from the Replenishing line 10 , and can be directly mixed with vapor at the flow rate WV2 at saturation temperature t1 in the Return line 8 . Therefore the makeup water can be heated instantaneously to saturation temperature.
  • the reactor temperature can be controlled precisely and highly accurately.
  • control unit 25 can calculate so that the amount of makeup water WL3 becomes equal to the flow rate of vapor WV1 to be supplied to the outside of the system, and can accurately limit the amount of makeup water so that the amount of makeup water WL3 does not exceed the flow rate of vapor WV1, thereby enabling to prevent hammering due to complete condensation at the junction 6 .
  • the configuration is such that makeup water is directly supplied to the steam drum 2 . Therefore, heating of the makeup water is performed by heat transfer (condensation of vapor) in the steam drum 2 .
  • the amount of makeup water in the Replenishing line 10 needs to be divided into as small an amount of supply water as possible, or a sufficient residence time needs to be ensured in the steam drum 2 , thereby making the structure complicated and the equipment large, which leads to a cost increase.
  • the complexity of the structure and enlargement of the equipment can be avoided, and the temperature in the steam drum 2 can be made uniform.
  • FIG. 3 shows a configuration of the junction 6 according to a first modified example.
  • the Replenishing line 10 is connected and merged at an acute angle ⁇ with respect to the flow direction of the two-phase fluid in the Return line 8 . Consequently, makeup water smoothly joins to the vapor-water two-phase fluid flowing in the Return line 8 , and hence, hammering does not occur due to an impact when the makeup water collides with the mixed phase fluid at the time of joining or rapid condensation of the mixed phase fluid.
  • the Replenishing line 10 is connected and joined at an acute angle with respect to the flow direction of the two-phase fluid in the Return line 8 .
  • a substantially U-shaped depression 10 a is formed in the Replenishing line 10 on an upstream side of the junction 6 , and a water seal portion 27 in which water is residually filled in the depression 10 a , is provided in the Replenishing line 10 as a seal portion.
  • a check valve can be provided instead of the water seal portion 27 .
  • FIG. 5 shows a configuration of the junction 6 according to a third modified example.
  • the Replenishing line 10 is connected at an acute angle with respect to the flow direction of the two-phase fluid in the Return line 8 , and a spray nozzle 28 that disperses and sprays makeup water in the Return line 8 , is formed at the end of the Replenishing line 10 .
  • makeup water that joins the vapor and water in the Return line 8 is widely sprayed by the spray nozzle 28 , and hence, rapid vapor condensation is suppressed to prevent hammering.
  • any two or three configurations of the first to the third modified examples can be combined.
  • the temperature inside the steam drum 2 the respective water temperatures t1 of the water to be supplied at the flow rates WL4 and WL2 via the supply line 3 , and the temperature t1 of vapor at the flow rates WV1 and WV2 are all a saturation temperature of 195° C. It is also assumed that the water temperature t3 of the makeup water in the amount of WL3 is 110° C.
  • circulation amount WL4 of water supply pump 4 68000 kg/h.
  • control unit 25 of the temperature control system 1 determines the amount of makeup water WL3 which becomes equal to the flow rate of vapor WV1 to the outside of the system, according to the above equation (6), so as to make the temperature in the steam drum 2 uniform and keep the liquid level constant. That is to say, substituting for the respective numerals in equation (6) gives,
  • the flow rate of vapor WV1 is equal to the amount of makeup water WL3, and hence
  • FIG. 6 is a graph for an example showing a change in vapor percentage at positions before and after the junction 6 between the Return line 8 and the Replenishing line 10 , in the temperature control system 1 .
  • the horizontal axis denotes the percentage of vapor WV2 generated in the reactor 5 with respect to the water circulation amount WL4 to be supplied from the steam drum 2 to the reactor 5 (WV2/WL4)
  • the vertical axis denotes the percentage of vapor content in the two-phase fluid in the Return line 8 at positions before and after the junction 6 as a percentage of the gas phase portion.
  • the broken line M denotes a change in the percentage of gas phase (vapor) at the outlet (Return line 8 ) of the reactor 5 (WV2/(WL2+WV2)), and the solid line N denotes a change in the percentage of gas phase (vapor) in the Return line 8 after where the Replenishing line 10 is joined thereto (WV1/(WV1+WL4).
  • the FT reactor in which the Fischer-Tropsch synthesis reaction is performed inside the reactor 5 is used.
  • the reaction need not be the Fischer-Tropsch synthesis reaction.
  • the respective modified examples, and the examples water is adopted as the liquid refrigerant.
  • the liquid refrigerant need not be water.
  • the present invention relates to a temperature control system that can perform precise temperature control in a reactor by making the temperature in a refrigerant drum such as a steam drum uniform.
  • the temperature can be controlled highly accurately by maintaining the vapor-liquid temperature in the steam drum at saturation temperature.

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Production Of Liquid Hydrocarbon Mixture For Refining Petroleum (AREA)
  • Control Of Temperature (AREA)
US14/236,839 2011-08-05 2012-08-02 Temperature control system Abandoned US20140157813A1 (en)

Applications Claiming Priority (3)

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JP2011-171812 2011-08-05
JP2011171812A JP5815324B2 (ja) 2011-08-05 2011-08-05 温度制御システム
PCT/JP2012/069692 WO2013021908A1 (ja) 2011-08-05 2012-08-02 温度制御システム

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JP (1) JP5815324B2 (pt)
CN (1) CN103717986B (pt)
AP (1) AP2014007443A0 (pt)
AU (1) AU2012293758B2 (pt)
BR (1) BR112014002617A2 (pt)
CA (1) CA2843842C (pt)
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Cited By (2)

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EP3348902A1 (en) * 2016-12-19 2018-07-18 General Electric Company Systems and methods for controlling drum levels using flow
US11208993B2 (en) * 2011-08-08 2021-12-28 Joo-Hyuk Yim Energy-saving pump and control system for the pump

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JP5802397B2 (ja) * 2011-01-31 2015-10-28 独立行政法人石油天然ガス・金属鉱物資源機構 温度制御システム
FR3013430B1 (fr) * 2013-11-20 2016-12-23 Itp Sa Systeme d'apport de frigories
JP6899256B2 (ja) * 2017-05-12 2021-07-07 株式会社テイエルブイ ドレン回収システム及び配管継手

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US4447693A (en) * 1979-09-06 1984-05-08 Litton Systems, Inc. Power controlled microwave oven
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EP2741030A4 (en) 2015-01-14
JP2013034930A (ja) 2013-02-21
CA2843842A1 (en) 2013-02-14
AP2014007443A0 (en) 2014-02-28
MY166929A (en) 2018-07-24
CA2843842C (en) 2016-05-10
ZA201401203B (en) 2015-10-28
WO2013021908A1 (ja) 2013-02-14
EA201490365A1 (ru) 2014-07-30
AU2012293758B2 (en) 2015-10-08
JP5815324B2 (ja) 2015-11-17
CN103717986A (zh) 2014-04-09
CN103717986B (zh) 2015-11-25
EP2741030A1 (en) 2014-06-11
BR112014002617A2 (pt) 2017-03-01
AU2012293758A1 (en) 2014-02-20

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