US20050058384A1 - Low-friction moving interfaces in micromachines and nanomachines - Google Patents

Low-friction moving interfaces in micromachines and nanomachines Download PDF

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Publication number
US20050058384A1
US20050058384A1 US10/925,866 US92586604A US2005058384A1 US 20050058384 A1 US20050058384 A1 US 20050058384A1 US 92586604 A US92586604 A US 92586604A US 2005058384 A1 US2005058384 A1 US 2005058384A1
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low
friction device
diamond
points
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US10/925,866
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Victor Kley
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General Nanotechnology LLC
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General Nanotechnology LLC
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Priority to US10/925,866 priority Critical patent/US20050058384A1/en
Publication of US20050058384A1 publication Critical patent/US20050058384A1/en
Priority to US11/342,061 priority patent/US20060147131A1/en
Priority to US11/894,778 priority patent/US20080181540A1/en
Priority to US12/702,139 priority patent/US20100284635A1/en
Abandoned legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B5/00Devices comprising elements which are movable in relation to each other, e.g. comprising slidable or rotatable elements
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16CSHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C11/00Pivots; Pivotal connections
    • F16C11/04Pivotal connections
    • F16C11/06Ball-joints; Other joints having more than one degree of angular freedom, i.e. universal joints
    • F16C11/0619Ball-joints; Other joints having more than one degree of angular freedom, i.e. universal joints the female part comprising a blind socket receiving the male part
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16CSHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C33/00Parts of bearings; Special methods for making bearings or parts thereof
    • F16C33/02Parts of sliding-contact bearings
    • F16C33/04Brasses; Bushes; Linings
    • F16C33/043Sliding surface consisting mainly of ceramics, cermets or hard carbon, e.g. diamond like carbon [DLC]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/70Nanostructure
    • Y10S977/724Devices having flexible or movable element
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/902Specified use of nanostructure
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T74/00Machine element or mechanism
    • Y10T74/18Mechanical movements
    • Y10T74/18568Reciprocating or oscillating to or from alternating rotary
    • Y10T74/18576Reciprocating or oscillating to or from alternating rotary including screw and nut
    • Y10T74/18736Pressurized fluid introduced between nut and screw

Definitions

  • This application relates generally to micromachines and nanomachines and more specifically to devices providing low-friction rotational and translational interfaces for micromachine and nanomachine contacts.
  • Micromachines and nanomachines are poised to solve mechanical problems at the molecular and atomic level. Such machines may solve problems in environments were other devices, such as electronic devices, fail.
  • microscale mechanical memories may be of use in environments, such as space, in which semiconductor based devices have high fault rates due to high-energy cosmic radiation.
  • microscale mechanical machines may be of surgical use, reaching areas of the body not otherwise accessible or manipulable by traditional surgical tools and techniques.
  • Lithographic techniques have been deployed to make relatively small mechanical devices, for example, relatively small gears etched from silicon wafers.
  • relatively small silicon gears have a tendency to stick and fuse to each other. If such gears are in mechanical motion when stiction between the gears occurs, the gears may gall each other or worse tear each other apart.
  • Lubricants have been applied to relatively small mechanical interfaces in an attempt to limit friction, stiction, and galling.
  • liquids at relatively small scale also exhibit problematic behavior that would be of little consequence at relatively larger scale. For example, surface tension causes relatively small quantities of liquid to form small droplets that tend not to flow across a surface, thus limiting a lubricant's effectiveness.
  • low-friction moving interfaces in micromachines and nanomachines include low-friction sliding interfaces.
  • a device has first and second members in sliding contact. Each the members has a maximum dimension of about 100 ⁇ m or less between any two points and one of the first and second members is formed of diamond.
  • a device has a toothed member and a tooth-engaging member in meshing contact. Both the toothed member and tooth-engaging member have dimension of about 100 ⁇ m or less between any two points and one of the toothed member and tooth-engaging member is formed of diamond.
  • FIG. 1 is a graph of the temperature of a diamond-silicon dynamic interface for a relatively small diamond according to a mathematical model of the interface;
  • FIG. 2 is an overall perspective view of a mechanical device having a low-friction moving interface according to an embodiment of the present invention
  • FIG. 3 is a schematic cross-sectional view of another mechanical device having a low-friction moving interface according to another embodiment of the present invention.
  • FIG. 4 is a schematic cross-sectional view of another mechanical device having a low-friction moving interface according to another embodiment of the present invention.
  • FIG. 5 is a schematic cross-sectional view of another mechanical device having a low-friction moving interface according to another embodiment of the present invention.
  • FIG. 6 is an overall perspective view of another mechanical device having low-friction moving interfaces according to an embodiment of the present invention.
  • Embodiments of the invention can be applied to sliding and/or meshing mechanical contacts.
  • Diamond is a very slippery crystal. Diamond in mechanical contact with crystals such as diamond itself or silicon exhibits relatively low-frictional heating and has a tendency not to fuse with itself or silicon. Further, the flash temperature of diamond-silicon interfaces is relatively high. The flash temperature is that at which bodies in frictional contact tend to gall each other. The flash temperature of various interfaces can be estimated by taking into account, for example, the speed at which surfaces move with respect to each other and the forces at the interface. For example, see “Tribology and Mechanics of Magnetic Storage Devices,” publisher Springer, pp. 366-411, by Bhushan in which a general formalism is developed to calculate flash temperatures.
  • FIG. 1 is a graph of a mathematical modeling of the temperature of a dynamic diamond-silicon interface at various interface forces and velocities.
  • the diamond-silicon interface modeled is that of a diamond rod having a flat circular end sliding across a planar piece of silicon. The diameter of the flat circular end of the rod is about 50 nm at the interface.
  • the temperature of the diamond and silicon forming the interface rises from frictional heating as the force and/or velocity of the diamond and silicon increase.
  • Pinnacle 110 at the top right of the graph represent the flash temperature of the interface. As can be seen, the flash temperature, is between 900° C. and 1000° C.
  • the interface force of the diamond on silicon at the flash temperature is between 275 millinewtons and 300 millinewtons and the velocity of the surfaces relative to each other is about 500 millimeter/second. Forces and velocities in these ranges are relatively high indicating the general durability of the interface. While the graph represent only a single geometric interface of diamond and silicon in frictional contract, an impetus is created for the manufacture of diamond-silicon mechanical interfaces of relatively small scale.
  • both of the members may be diamond or one of the members may be diamond with the other being, for example, silicon, quartz, a III-V material such as gallium arsenide, and the like.
  • substances such as silicon and gallium arsenide are of limited mechanical use at macroscale dimensions (e.g. greater than 1 millimeter) due to their fragility, such substances suffer less from fragility at relatively smaller scales, (e.g. 100 ⁇ m).
  • each of the aforementioned materials in such contact with diamond provides for devices that have relatively low friction and are relatively mechanically sound.
  • each of the aforementioned materials has a relatively high flash temperature in sliding contact with diamond, for example, as high as 900° C. and above. Thus at normal operating temperature, (e.g., 300° C.) such materials tend not to gall each other.
  • a “sliding contact” is defined herein as a first member that is in dynamic frictional contact with a second member, such that the first member and second member have surfaces that are in smooth continuous contact.
  • FIG. 2 is an overall perspective view of a mechanical device 200 having a low-friction moving interface 210 according to an embodiment of the present invention.
  • the mechanical device includes a first member 215 that has a circular aperture 222 . Portions of the aperture are indicated in phantom view.
  • the aperture has a surface denoted by reference numeral 225 .
  • the mechanical device includes a second member 250 in the shape of a spindle having a rounded surface 252 , portions of which are shown in phantom. As shown, the second member is fitted into the aperture.
  • Low-friction moving interface 210 is identified as the areas at which the aperture surface and the second member are in sliding contact.
  • the first member and second member may have a rotational degree of motion with respect to each other (as indicated by double-headed arrow 262 ), a translational degree of motion with respect to each other (as indicated by double-headed arrow 268 ), or both.
  • First member 215 and second member 250 may each be a single or multicrystalline structure.
  • first member 215 may be a single diamond crystal or a polycrystalline diamond.
  • the first and second members may be fabricated using a variety of techniques.
  • a member comprising silicon may be etched from a silicon wafer using known lithographic techniques or may be cut from a silicon wafer using cutting and sweeping techniques discussed in the above referenced U.S. patent application for “Nanomachining Method and Apparatus,” Attorney Docket No. 020921-001430US.
  • a member comprising silicon may be formed by lapping techniques such as those discussed in the above referenced U.S. patent application for “Methods and Apparatus for Nanolapping,” Attorney Docket No. 020921-001450US.
  • lapping techniques such as those discussed in the above referenced U.S. patent application for “Methods and Apparatus for Nanolapping,” Attorney Docket No. 020921-001450US.
  • Each of these fabrication techniques is similarly applicable to diamond members, quartz members, and the like. Those of skill in the art will know of other useful fabrication techniques.
  • First member 215 may be coated into the aperture of another device such as a disk.
  • a first member so positioned is commonly referred to as a bushing.
  • a first member comprising diamond may be coated into an aperture in a silicon disk.
  • a first member so positioned may be formed, for example, by first forming a diamond-like carbon layer in the aperture and second growing a diamond onto the diamond-like carbon layer.
  • Diamond-like carbon may be coated into an aperture via a vacuum arc process or via ion-beam techniques and grown using plasma-enhanced chemical vapor deposition. Those of skill in the art will know other useful coating processes for diamond-like carbon. Diamond can also subsequently be grown onto the diamond-like carbon in a diamond-anvil cell or other high-pressure device.
  • each of the first and second members has a maximum dimension of about 100 ⁇ m or less between any two points. According to another embodiment, each of the first and second members has a maximum dimension of about 5 ⁇ m or less between any two points.
  • FIG. 3 is a schematic cross-sectional view of a mechanical device 300 having a low-friction moving interface 310 according to another embodiment of the present invention.
  • the mechanical device includes a first member 315 that has a round socket 322 , which is defined by surface 326 .
  • Mechanical device 300 includes a second member 350 that has an arm portion 352 and a ball end 354 . The ball end of the second member is in sliding contact with surface 326 .
  • Such a configuration is commonly referred to as a ball-and-socket joint.
  • FIG. 3 is considered to lie in the x-y plane, and the z-axis will be considered to extend out of the page.
  • an axis extending out of the page will be denoted by a dot in a circle while an axis extending into the page will be denoted by a + in a circle.
  • the cross-sectional view of FIG. 3 thus shows mechanical device 300 extending laterally in the x-y plane.
  • references to direction and orientation that mention an axis (e.g., the x-axis) or a plane (e.g., the x-y plane) should be considered to include lines parallel to that axis, or planes parallel to that plane
  • First and second members 315 and 350 may have a variety of rotational degrees of motion with respect to each other, for example, member 350 may rotate relative to member 315 about the z-axis, the x-axis, or any axis laying between the z and x-axes.
  • FIG. 4 is an overall perspective view of a mechanical device 400 having low-friction moving interfaces 410 according to an embodiment of the present invention.
  • the mechanical device includes a first member 415 in the shape of a plate, and a second member 420 having a slot 422 . A portion of first member 415 is inserted into slot 422 .
  • the first member spins such that portions of its surfaces 423 and 425 are in sliding contact with surfaces 427 and 429 , respectively.
  • each of the members has a maximum dimension of about 100 ⁇ m or less between any two points. According to another embodiment, each of the members each has a maximum dimension of about 5 ⁇ m or less between any two points.
  • First and second members 410 and 420 may be fabricated by a variety of processes such as those described above for the fabrication of mechanical device 200 shown in FIG. 2 .
  • Mechanical devices having components e.g., diamond plate and silicon slotted member
  • components e.g., diamond plate and silicon slotted member
  • mechanical device 400 may be of use as a fluid pump.
  • the low-friction moving interface can drag a fluid between ends of the slot, thus providing pumping.
  • such a device made of say diamond and silicon or diamond and diamond, provides for tremendous translational rates.
  • a diamond plate in a silicon slot of the dimension discussed above may be turned at millions or more revolutions per second prior to reaching the flash temperature.
  • Each of devices 200 , 300 , and 400 may be bearing type devices, wherein one of the members provide support, guidance, and reduces the friction of motion between the other member and moving or fixed machine parts (not pictured in FIGS. 2, 3 , or 4 ).
  • Other moving or fixed machine parts may include, for example, a housing (e.g., a journal box) containing one of the devices, or additional members in sliding contact devices 200 , 300 , and 400 .
  • a “meshing contact” is defined herein as a “toothed member” being in frictional contact with a “tooth-engaging member,” such that the toothed member meshes with the tooth-engaging member to transmit motion or to change direction or speed.
  • FIG. 5 is a schematic cross-sectional view of a mechanical device 500 having a low-friction moving interface 510 according to another embodiment of the present invention.
  • the mechanical device includes a gear 515 (an example of a toothed member) that has a plurality of gear teeth 520 and includes a rack 550 (an example of a tooth-engaging member) that has a plurality of gear teeth 555 .
  • gear teeth 520 and gear teeth 555 are in meshing contact.
  • Mechanical device 500 provides for two types of motion: (a) the rack may be moved laterally along the x-axis causing the gear to rotate about the z-axis, or (b) the gear may be rotated causing the rack to be translated.
  • Translation device 560 coupled to rack 550 may provide such translations of the rack.
  • Translation device 560 may include a variety of devices, such as, piezoelectric transducers, thermal expansion/contraction devices, mechanical actuators, and the like. Further, such translation devices may be coupled to both ends of the rack for further control.
  • rack 550 is shown to have teeth that extend beyond the region where the gear and rack mesh, the teeth may extend a lesser amount, for example, the teeth may be limited to the region where the gear and rack mesh.
  • each of the gear and rack has a maximum dimension of about 100 ⁇ m or less between any two points. According to another embodiment, each of the gear and rack has a maximum dimension of about 5 ⁇ m or less between any two points. Gears and racks made of materials such as those discussed may be fabricated by a variety of processes such as those described above for the fabrication of mechanical device 200 shown in FIG. 2 .
  • FIG. 6 is a schematic cross-sectional view of a mechanical device 600 having a low-friction moving interface 610 according to another embodiment of the present invention.
  • the mechanical device includes a gear 615 (an example of a toothed member) that has a plurality of gear teeth 620 and includes a worm gear 650 (an example of a tooth-engaging member) that has a thread 655 .
  • gear teeth 620 and thread 655 are in meshing contact.
  • Mechanical device 600 provides for two types of motion: (a) worm gear 650 may be rotated about the x-axis causing gear 615 to rotate about the z-axis, or (b) gear 615 may be rotated about the z-axis causing the worm gear to rotate about the x-axis.
  • Both the gear and/or rack shown in FIG. 5 and the gear and/or worm gear shown in FIG. 6 may be coupled to a devices 200 , 300 , or 400 shown in FIGS. 2, 3 , and 4 .
  • the second member 252 ( FIG. 2 ) having a spindle shape may be coupled to the center of rotation of gear 515 and/or worm gear 550 .
  • Both gear 610 and worm gear 650 have similar maximum dimension as those of gear 510 and rack 550 shown in FIG. 5 and can be fabricated by similar methods.
  • diamond-silicon, diamond-diamond, and the like may be variously configured while still providing low stiction, low galling, and relatively high flash temperature devices.
  • device 200 may have a first member 215 that has a trench instead of an aperture in which the second member is in sliding contact.
  • diamond-silicon, diamond-diamond, and the like meshing interfaces may include, for example, gear on gear interfaces in addition to gear on rack/worm gear interfaces. Therefore, the above description should not be taken as limiting the scope of the invention a defined by the claims

Abstract

A low-friction device having a moving interface comprising first and second members. Each of the members has a maximum dimension of about 100 μm or less between any two points. At least the first member is formed of diamond and the first and second members are in sliding contact or meshing contact.

Description

    CROSS-REFERENCES TO RELATED APPLICATIONS
  • This application is a continuation application of U.S. application Ser. No. 10/094,149 filed Mar. 7, 2002, which claims priority from the following provisional application, the entire disclosures of which are incorporated by reference in their entirety for all purposes:
      • U.S. application No. 60/287,677, filed Apr. 30, 2001 by Victor B. Kley for “Scanning Probe Microscopy and Nanomachining.”
  • The following six U.S. patent applications, were filed concurrently with U.S. application Ser. No. 10/094,149 and the disclosure of each other application is incorporated by reference in its entirety for all purposes:
      • U.S. patent application Ser. No. ______, filed Mar. 7, 2002 by Victor B. Kley for “Method and Apparatus for Scanning in Scanning Probe Microscopy and Presenting Results” (Attorney Docket No. 020921-001420US);
      • U.S. patent application Ser. No. ______, filed Mar. 7, 2002 by Victor B. Kley for “Nanomachining Method and Apparatus” (Attorney Docket No. 020921-001430US);
      • U.S. patent application Ser. No. ______, filed Mar. 7, 2002 by Victor B. Kley for “Active Cantilever for Nanomachining and Metrology” (Attorney Docket No. 020921-001440US);
      • U.S. patent application Ser. No. ______, filed Mar. 7, 2002 by Victor B. Kley for “Methods and Apparatus for Nanolapping” (Attorney Docket No. 020921-001450US);
      • U.S. patent application Ser. No. ______, filed Mar. 7, 2002 by Victor B. Kley for “Low Friction Moving Interfaces in Micromachines and Nanomachines” (Attorney Docket No. 020921-001460US); and
      • U.S. patent application Ser. No. ______, filed Mar. 7, 2002 by Victor B. Kley and Robert T. LoBianco for “Method and Apparatus for Tool and Tip Design for Nanomachining and Measurement” (Attorney Docket No. 020921-001510US).
  • The following U.S. patents are incorporated by reference in their entirety for all purposes:
      • U.S. Pat. No. 6,144,028, issued Nov. 7, 2000 to Victor B. Kley for “Scanning Probe Microscope Assembly and Method for Making Confocal, Spectrophotometric, Near-Field, and Scanning Probe Measurements and Associated Images;”
      • U.S. Pat. No. 6,252,226, issued Jun. 26, 2001 to Victor B. Kley for “Nanometer Scale Data Storage Device and Associated Positioning System;”
      • U.S. Pat. No. 6,337,479, issued Jan. 8, 2002 to Victor B. Kley for “Object Inspection and/or Modification System and Method;” and
      • U.S. Pat. No. 6,339,217, issued Jan. 15, 2002 to Victor B. Kley for “Scanning Probe Microscope Assembly and Method for Making Confocal, Spectrophotometric, Near-Field, and Scanning Probe Measurements and Associated Images.”
  • The disclosure of the following published PCT application is incorporated by reference in its entirety for all purposes:
      • WO 01/03157 (International Publication Date: Jan. 11, 2001) based on PCT Application No. PCT/US00/18041, filed Jun. 30, 2000 by Victor B. Kley for “Object Inspection and/or Modification System and Method.”
    BACKGROUND OF THE INVENTION
  • This application relates generally to micromachines and nanomachines and more specifically to devices providing low-friction rotational and translational interfaces for micromachine and nanomachine contacts.
  • Micromachines and nanomachines are poised to solve mechanical problems at the molecular and atomic level. Such machines may solve problems in environments were other devices, such as electronic devices, fail. For example, microscale mechanical memories may be of use in environments, such as space, in which semiconductor based devices have high fault rates due to high-energy cosmic radiation. Further, microscale mechanical machines may be of surgical use, reaching areas of the body not otherwise accessible or manipulable by traditional surgical tools and techniques.
  • At small scale, for example in the hundreds and tens of micron range and below, mechanical elements exhibit problematic behavior that either 1) does not arise or 2) is of little consequence at relatively larger scale. For example, meshed gears in macroscale machines do not tend to exhibit problems due to stiction, which is the sticking and fusing of different elements or portions of elements into a union. However, at smaller scale, such problems can arise.
  • Lithographic techniques have been deployed to make relatively small mechanical devices, for example, relatively small gears etched from silicon wafers. However, such relatively small silicon gears have a tendency to stick and fuse to each other. If such gears are in mechanical motion when stiction between the gears occurs, the gears may gall each other or worse tear each other apart.
  • Lubricants have been applied to relatively small mechanical interfaces in an attempt to limit friction, stiction, and galling. However, like solid bits of matter of relatively small scale, liquids at relatively small scale also exhibit problematic behavior that would be of little consequence at relatively larger scale. For example, surface tension causes relatively small quantities of liquid to form small droplets that tend not to flow across a surface, thus limiting a lubricant's effectiveness.
  • Consequently, new microscale and nanoscale devices are sought which provide for improved performance.
  • BRIEF SUMMARY OF THE INVENTION
  • In accordance with the invention low-friction moving interfaces in micromachines and nanomachines include low-friction sliding interfaces. In one aspect of the invention, a device has first and second members in sliding contact. Each the members has a maximum dimension of about 100 μm or less between any two points and one of the first and second members is formed of diamond. In another aspect of the invention, a device has a toothed member and a tooth-engaging member in meshing contact. Both the toothed member and tooth-engaging member have dimension of about 100 μm or less between any two points and one of the toothed member and tooth-engaging member is formed of diamond.
  • A further understanding of the nature and advantages of the present invention may be realized by reference to the remaining portions of the specification and the drawings.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIG. 1 is a graph of the temperature of a diamond-silicon dynamic interface for a relatively small diamond according to a mathematical model of the interface;
  • FIG. 2 is an overall perspective view of a mechanical device having a low-friction moving interface according to an embodiment of the present invention;
  • FIG. 3 is a schematic cross-sectional view of another mechanical device having a low-friction moving interface according to another embodiment of the present invention;
  • FIG. 4 is a schematic cross-sectional view of another mechanical device having a low-friction moving interface according to another embodiment of the present invention;
  • FIG. 5 is a schematic cross-sectional view of another mechanical device having a low-friction moving interface according to another embodiment of the present invention; and
  • FIG. 6 is an overall perspective view of another mechanical device having low-friction moving interfaces according to an embodiment of the present invention.
  • DETAILED DESCRIPTION OF THE INVENTION INTRODUCTION
  • The following description sets forth embodiments of low-friction moving interfaces in micromachines and nanomachines according to the invention. Embodiments of the invention can be applied to sliding and/or meshing mechanical contacts.
  • Diamond is a very slippery crystal. Diamond in mechanical contact with crystals such as diamond itself or silicon exhibits relatively low-frictional heating and has a tendency not to fuse with itself or silicon. Further, the flash temperature of diamond-silicon interfaces is relatively high. The flash temperature is that at which bodies in frictional contact tend to gall each other. The flash temperature of various interfaces can be estimated by taking into account, for example, the speed at which surfaces move with respect to each other and the forces at the interface. For example, see “Tribology and Mechanics of Magnetic Storage Devices,” publisher Springer, pp. 366-411, by Bhushan in which a general formalism is developed to calculate flash temperatures.
  • FIG. 1 is a graph of a mathematical modeling of the temperature of a dynamic diamond-silicon interface at various interface forces and velocities. The diamond-silicon interface modeled is that of a diamond rod having a flat circular end sliding across a planar piece of silicon. The diameter of the flat circular end of the rod is about 50 nm at the interface. As indicated by the graph, the temperature of the diamond and silicon forming the interface rises from frictional heating as the force and/or velocity of the diamond and silicon increase. Pinnacle 110 at the top right of the graph represent the flash temperature of the interface. As can be seen, the flash temperature, is between 900° C. and 1000° C. The interface force of the diamond on silicon at the flash temperature is between 275 millinewtons and 300 millinewtons and the velocity of the surfaces relative to each other is about 500 millimeter/second. Forces and velocities in these ranges are relatively high indicating the general durability of the interface. While the graph represent only a single geometric interface of diamond and silicon in frictional contract, an impetus is created for the manufacture of diamond-silicon mechanical interfaces of relatively small scale.
  • Described below are various embodiments where two members engage each other in different ways, referred to as sliding contact and meshing contact. These types of interaction will be defined below in connection with the specific embodiments. In these embodiments, both of the members may be diamond or one of the members may be diamond with the other being, for example, silicon, quartz, a III-V material such as gallium arsenide, and the like. While substances such as silicon and gallium arsenide are of limited mechanical use at macroscale dimensions (e.g. greater than 1 millimeter) due to their fragility, such substances suffer less from fragility at relatively smaller scales, (e.g. 100 μm). At such small scales, each of the aforementioned materials in such contact with diamond provides for devices that have relatively low friction and are relatively mechanically sound. Further, each of the aforementioned materials has a relatively high flash temperature in sliding contact with diamond, for example, as high as 900° C. and above. Thus at normal operating temperature, (e.g., 300° C.) such materials tend not to gall each other.
  • EMBODIMENTS HAVING SLIDING CONTACT
  • A “sliding contact” is defined herein as a first member that is in dynamic frictional contact with a second member, such that the first member and second member have surfaces that are in smooth continuous contact.
  • FIG. 2 is an overall perspective view of a mechanical device 200 having a low-friction moving interface 210 according to an embodiment of the present invention. The mechanical device includes a first member 215 that has a circular aperture 222. Portions of the aperture are indicated in phantom view. The aperture has a surface denoted by reference numeral 225. The mechanical device includes a second member 250 in the shape of a spindle having a rounded surface 252, portions of which are shown in phantom. As shown, the second member is fitted into the aperture. Low-friction moving interface 210 is identified as the areas at which the aperture surface and the second member are in sliding contact. The first member and second member may have a rotational degree of motion with respect to each other (as indicated by double-headed arrow 262), a translational degree of motion with respect to each other (as indicated by double-headed arrow 268), or both.
  • First member 215 and second member 250 may each be a single or multicrystalline structure. For example, first member 215 may be a single diamond crystal or a polycrystalline diamond.
  • The first and second members may be fabricated using a variety of techniques. For example, a member comprising silicon may be etched from a silicon wafer using known lithographic techniques or may be cut from a silicon wafer using cutting and sweeping techniques discussed in the above referenced U.S. patent application for “Nanomachining Method and Apparatus,” Attorney Docket No. 020921-001430US. Alternatively, a member comprising silicon may be formed by lapping techniques such as those discussed in the above referenced U.S. patent application for “Methods and Apparatus for Nanolapping,” Attorney Docket No. 020921-001450US. Each of these fabrication techniques is similarly applicable to diamond members, quartz members, and the like. Those of skill in the art will know of other useful fabrication techniques.
  • First member 215 may be coated into the aperture of another device such as a disk. A first member so positioned is commonly referred to as a bushing. For example, a first member comprising diamond may be coated into an aperture in a silicon disk. A first member so positioned may be formed, for example, by first forming a diamond-like carbon layer in the aperture and second growing a diamond onto the diamond-like carbon layer. Diamond-like carbon may be coated into an aperture via a vacuum arc process or via ion-beam techniques and grown using plasma-enhanced chemical vapor deposition. Those of skill in the art will know other useful coating processes for diamond-like carbon. Diamond can also subsequently be grown onto the diamond-like carbon in a diamond-anvil cell or other high-pressure device.
  • According to a specific embodiment of the invention, each of the first and second members has a maximum dimension of about 100 μm or less between any two points. According to another embodiment, each of the first and second members has a maximum dimension of about 5 μm or less between any two points.
  • FIG. 3 is a schematic cross-sectional view of a mechanical device 300 having a low-friction moving interface 310 according to another embodiment of the present invention. The mechanical device includes a first member 315 that has a round socket 322, which is defined by surface 326. Mechanical device 300 includes a second member 350 that has an arm portion 352 and a ball end 354. The ball end of the second member is in sliding contact with surface 326. Such a configuration is commonly referred to as a ball-and-socket joint.
  • For consistency and clarity, a particular coordinate system will be shown and referred to. FIG. 3 is considered to lie in the x-y plane, and the z-axis will be considered to extend out of the page. In accordance with standard symbology, an axis extending out of the page will be denoted by a dot in a circle while an axis extending into the page will be denoted by a + in a circle. The cross-sectional view of FIG. 3 thus shows mechanical device 300 extending laterally in the x-y plane. In most instances, references to direction and orientation that mention an axis (e.g., the x-axis) or a plane (e.g., the x-y plane) should be considered to include lines parallel to that axis, or planes parallel to that plane
  • First and second members 315 and 350 may have a variety of rotational degrees of motion with respect to each other, for example, member 350 may rotate relative to member 315 about the z-axis, the x-axis, or any axis laying between the z and x-axes.
  • FIG. 4 is an overall perspective view of a mechanical device 400 having low-friction moving interfaces 410 according to an embodiment of the present invention. The mechanical device includes a first member 415 in the shape of a plate, and a second member 420 having a slot 422. A portion of first member 415 is inserted into slot 422. The first member spins such that portions of its surfaces 423 and 425 are in sliding contact with surfaces 427 and 429, respectively.
  • According to a specific embodiment of the invention, each of the members has a maximum dimension of about 100 μm or less between any two points. According to another embodiment, each of the members each has a maximum dimension of about 5 μm or less between any two points. First and second members 410 and 420 may be fabricated by a variety of processes such as those described above for the fabrication of mechanical device 200 shown in FIG. 2.
  • Mechanical devices having components (e.g., diamond plate and silicon slotted member) providing low-friction translational contact are deployable for a variety of tasks. For example, mechanical device 400 may be of use as a fluid pump. The low-friction moving interface can drag a fluid between ends of the slot, thus providing pumping. Further, such a device, made of say diamond and silicon or diamond and diamond, provides for tremendous translational rates. For example, a diamond plate in a silicon slot of the dimension discussed above may be turned at millions or more revolutions per second prior to reaching the flash temperature.
  • Each of devices 200, 300, and 400 may be bearing type devices, wherein one of the members provide support, guidance, and reduces the friction of motion between the other member and moving or fixed machine parts (not pictured in FIGS. 2, 3, or 4). Other moving or fixed machine parts may include, for example, a housing (e.g., a journal box) containing one of the devices, or additional members in sliding contact devices 200, 300, and 400.
  • EMBODIMENTS HAVING MESHING CONTACT
  • A “meshing contact” is defined herein as a “toothed member” being in frictional contact with a “tooth-engaging member,” such that the toothed member meshes with the tooth-engaging member to transmit motion or to change direction or speed.
  • FIG. 5 is a schematic cross-sectional view of a mechanical device 500 having a low-friction moving interface 510 according to another embodiment of the present invention. The mechanical device includes a gear 515 (an example of a toothed member) that has a plurality of gear teeth 520 and includes a rack 550 (an example of a tooth-engaging member) that has a plurality of gear teeth 555. As shown, gear teeth 520 and gear teeth 555 are in meshing contact. Mechanical device 500 provides for two types of motion: (a) the rack may be moved laterally along the x-axis causing the gear to rotate about the z-axis, or (b) the gear may be rotated causing the rack to be translated. Translation device 560 coupled to rack 550 may provide such translations of the rack. Translation device 560 may include a variety of devices, such as, piezoelectric transducers, thermal expansion/contraction devices, mechanical actuators, and the like. Further, such translation devices may be coupled to both ends of the rack for further control.
  • While rack 550 is shown to have teeth that extend beyond the region where the gear and rack mesh, the teeth may extend a lesser amount, for example, the teeth may be limited to the region where the gear and rack mesh.
  • According to a specific embodiment of the invention, each of the gear and rack has a maximum dimension of about 100 μm or less between any two points. According to another embodiment, each of the gear and rack has a maximum dimension of about 5 μm or less between any two points. Gears and racks made of materials such as those discussed may be fabricated by a variety of processes such as those described above for the fabrication of mechanical device 200 shown in FIG. 2.
  • FIG. 6 is a schematic cross-sectional view of a mechanical device 600 having a low-friction moving interface 610 according to another embodiment of the present invention. The mechanical device includes a gear 615 (an example of a toothed member) that has a plurality of gear teeth 620 and includes a worm gear 650 (an example of a tooth-engaging member) that has a thread 655. As shown, gear teeth 620 and thread 655 are in meshing contact. Mechanical device 600 provides for two types of motion: (a) worm gear 650 may be rotated about the x-axis causing gear 615 to rotate about the z-axis, or (b) gear 615 may be rotated about the z-axis causing the worm gear to rotate about the x-axis.
  • Both the gear and/or rack shown in FIG. 5 and the gear and/or worm gear shown in FIG. 6 may be coupled to a devices 200, 300, or 400 shown in FIGS. 2, 3, and 4. For example, the second member 252 (FIG. 2) having a spindle shape may be coupled to the center of rotation of gear 515 and/or worm gear 550. Both gear 610 and worm gear 650 have similar maximum dimension as those of gear 510 and rack 550 shown in FIG. 5 and can be fabricated by similar methods.
  • CONCLUSION
  • While the above is a complete description of specific embodiments of the invention, various modifications, alternative constructions, and equivalents by be used. For example, diamond-silicon, diamond-diamond, and the like may be variously configured while still providing low stiction, low galling, and relatively high flash temperature devices. For example, device 200 may have a first member 215 that has a trench instead of an aperture in which the second member is in sliding contact. Further, diamond-silicon, diamond-diamond, and the like meshing interfaces may include, for example, gear on gear interfaces in addition to gear on rack/worm gear interfaces. Therefore, the above description should not be taken as limiting the scope of the invention a defined by the claims

Claims (33)

1. A low-friction device having a moving interface, the low-friction device comprising first and second members wherein:
each of the members has a maximum dimension of about 100 μm or less between any two points;
at least the first member is formed of diamond; and
the first and second members are in sliding contact.
2. The low-friction device of claim 1 wherein the second member is formed of a material chosen from the group consisting of diamond, silicon, quartz, and a III-V semiconductor material.
3. The low-friction device of claim 2 wherein one of the members has a cylindrical shape with an aperture.
4. The low-friction device of claim 3 wherein the other of the members has a spindle shape.
5. The low-friction device of claim 2 wherein:
one of the members has a ball end and the other of the members has a socket; and
the first and second members form a ball-and-socket joint.
6. The low-friction device of claim 2 wherein; one of the members is a bushing and the other of the members is a spindle.
7. The low-friction device of claim 2 wherein each of the members has a maximum dimension of about 50 μm or less between any two points.
8. The low-friction device of claim 2 wherein each of the members has a maximum dimension of about 25 μm or less between any two points.
9. The low-friction device of claim 2 wherein each of the members has a maximum dimensions of about 5 μm or less between any two points.
10. A low-friction device having a moving interface comprising:
a toothed member having a maximum dimension of about 100 μm or less between any two points; and
a tooth-engaging member having a maximum dimension of about 100 μm or less between any two points;
at least one of the toothed member and tooth-engaging member being diamond; and
the toothed member and the tooth-engaging member being in meshing contact.
11. The low-friction device of claim 10 wherein the other of the toothed member and tooth-engaging member is chosen from the group consisting of diamond, silicon, quartz, and a III-V semiconductor material.
12. The low-friction device of claim 11 wherein the toothed member is a gear.
13. The low-friction device of claim 12 wherein the tooth-engaging member is a gear.
14. The low-friction device of claim 12 wherein the tooth-engaging member is a rack.
15. The low-friction device of claim 12 wherein the tooth-engaging member is a worm gear.
16. The low-friction device of claim 14 and further comprising a piezoelectric transducer coupled to the rack, wherein the piezoelectric transducer causes the rack to be translated causing the gear to rotate.
17. The low-friction device of claim 14 and further comprising a thermal expansion/contraction device coupled to the rack, wherein the device causes the rack to be translated causing the gear to rotate.
18. The low-friction device of claim 14 and further comprising an electric linear actuator coupled to the rack, wherein the actuator causes the rack to be translated causing the gear to rotate.
19. The low-friction device of claim 11 wherein each of the gear and the tooth-engaging member has a maximum dimension of about 50 μm or less between any two points.
20. The low-friction device of claim 11 wherein the each of the gear and the tooth-engaging member has a maximum dimension of about 25 μm or less between any two points.
21. The low-friction device of claim 11 wherein each of the gear and the tooth-engaging member has a maximum dimension of about 5 μm or less between any two points.
22. A low-friction device having a moving interface comprising:
a diamond gear having a maximum dimension of about 100 μm or less between any two points; and
a silicon gear having a maximum dimension of about 100 μm or less between any two points;
wherein the diamond gear and the silicon gear are in meshing contact.
23. A low-friction moving interface comprising:
a diamond bearing having a maximum dimension of about 100 μm or less between any two points; and
a silicon spindle having a maximum dimension of about 100 μm or less between any two points;
wherein the bearing and spindle are in sliding contact.
24. A low-friction device having a moving interface comprising:
a silicon plate having a diamond coated aperture, the coated aperture having a diameter in the range of about 100 μm to about 5 μm; and
a spindle fitted into the diamond coated aperture in sliding contact, the spindle having a maximum dimension of about 100 μm or less between any two points.
25. A low-friction device having a moving interface comprising:
a silicon plate formed with an aperture having a diameter in the range of about 100 μm to about 5 μm;
a diamond bushing inside the aperture; and
a spindle having a maximum dimension of about 100 μm or less between any two points;
wherein the diamond bushing and the spindle are in sliding contact.
26. The low-friction device of claim 25 wherein the spindle is chosen from the group consisting of diamond, silicon, quartz, and a III-V semiconductor material.
27. A low-friction device having a moving interface comprising first, second, and third plates, wherein:
each of the first, second, and third plates has a maximum dimension of about 100 μm or less between any two points; and the third plate is diamond; and
the third plate has a rotational degree of freedom and is in sliding contact with the first and second plates.
28. The low-friction device of claim 27 wherein the first and second plates are chosen from the group consisting of diamond, silicon, quartz, and a III-V semiconductor material.
29. The low-friction device of claim 28 wherein the first, second, and third plates are a fluid pump.
30. A low-friction device comprising first and second plates, wherein:
each of the first and second plates has a maximum dimension of about 100 μm or less between any two points;
one of the first and second plates is diamond;
the other of the first and second plate is silicon; and
the first and second plates are in sliding contact.
31. The low-friction device of claim 30 wherein the first and second plates are chosen from the group consisting of diamond, silicon, quartz, and a III-V semiconductor material.
32. The low-friction device of claim 31 wherein the second plate has a slot, and portions of the first plate are in the slot.
33. The low-friction device of claim 32 wherein the first and second plates are a fluid pump.
US10/925,866 2001-04-30 2004-08-24 Low-friction moving interfaces in micromachines and nanomachines Abandoned US20050058384A1 (en)

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US11/342,061 US20060147131A1 (en) 2001-04-30 2006-01-27 Low-friction moving interfaces in micromachines and nanomachines
US11/894,778 US20080181540A1 (en) 2001-04-30 2007-08-20 Low-friction moving interfaces in micromachines and nanomachines
US12/702,139 US20100284635A1 (en) 2001-04-30 2010-02-08 Low-Friction Moving Interfaces in Micromachines and Nanomachines

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US11/342,061 Abandoned US20060147131A1 (en) 2001-04-30 2006-01-27 Low-friction moving interfaces in micromachines and nanomachines
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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080315092A1 (en) * 1994-07-28 2008-12-25 General Nanotechnology Llc Scanning probe microscopy inspection and modification system
US6923044B1 (en) * 2001-03-08 2005-08-02 General Nanotechnology Llc Active cantilever for nanomachining and metrology
US6802646B1 (en) * 2001-04-30 2004-10-12 General Nanotechnology Llc Low-friction moving interfaces in micromachines and nanomachines
US7196328B1 (en) 2001-03-08 2007-03-27 General Nanotechnology Llc Nanomachining method and apparatus
US6998689B2 (en) * 2002-09-09 2006-02-14 General Nanotechnology Llc Fluid delivery for scanning probe microscopy
ATE340670T1 (en) * 2004-05-18 2006-10-15 Black & Decker Inc ARRANGEMENT OF AN OUTPUT Plunger AND MOTORIZED TOOL HAVING SUCH ARRANGEMENT

Citations (90)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US32457A (en) * 1861-06-04 allen
US34214A (en) * 1862-01-21 Improvement in washers for paper-pulp
US34708A (en) * 1862-03-18 Improved device for straining gold and silver amalgam
US3586865A (en) * 1968-06-21 1971-06-22 British Scient Instr Research Method of,and apparatus for,inspecting the shape of small objects
US3812288A (en) * 1972-11-21 1974-05-21 Edax Int Inc Television display system
US4672559A (en) * 1984-12-26 1987-06-09 E. I. Du Pont De Nemours And Company Method for operating a microscopical mapping system
US4673477A (en) * 1984-03-02 1987-06-16 Regents Of The University Of Minnesota Controlled vacuum arc material deposition, method and apparatus
US4831614A (en) * 1986-05-27 1989-05-16 International Business Machines Corporation Direct access storage unit using tunneling current techniques
US4907195A (en) * 1984-09-14 1990-03-06 Xerox Corporation Method of and system for atomic scale recording of information
US4924091A (en) * 1989-02-01 1990-05-08 The Regents Of The University Of California Scanning ion conductance microscope
US4999495A (en) * 1988-08-31 1991-03-12 Seiko Instruments Inc. Scanning tunneling microscope
US5001344A (en) * 1988-08-26 1991-03-19 Hitachi, Ltd. Scanning electron microscope and method of processing the same
US5010249A (en) * 1988-09-13 1991-04-23 Seiko Instruments Inc. Diamond probe and forming method thereof
US5015850A (en) * 1989-06-20 1991-05-14 The Board Of Trustees Of The Leland Stanford Junior University Microfabricated microscope assembly
US5018865A (en) * 1988-10-21 1991-05-28 Ferrell Thomas L Photon scanning tunneling microscopy
US5025346A (en) * 1989-02-17 1991-06-18 Regents Of The University Of California Laterally driven resonant microstructures
US5081390A (en) * 1990-08-13 1992-01-14 Digital Instruments, Inc. Method of operating a scanning probe microscope to improve drift characteristics
US5105305A (en) * 1991-01-10 1992-04-14 At&T Bell Laboratories Near-field scanning optical microscope using a fluorescent probe
US5107112A (en) * 1988-09-30 1992-04-21 Canon Kabushiki Kaisha Scanning tunnel-current-detecting device and method for detecting tunnel current and scanning tunnelling microscope and recording/reproducing device using thereof
US5108865A (en) * 1990-04-18 1992-04-28 Minnesota Mining And Manufacturing Company Offset transfer of toner images in electrography
US5118541A (en) * 1989-06-19 1992-06-02 Matsushita Electric Industrial Co., Ltd. Erasable optical disk media and method of recording/erasing the same
US5187367A (en) * 1990-08-14 1993-02-16 Canon Kabushiki Kaisha Cantilever type probe, scanning tunneling microscope and information processing device equipped with said probe
USRE34214E (en) * 1984-03-15 1993-04-06 Molecular Dynamics, Inc. Method and apparatus for microphotometering microscope specimens
US5210410A (en) * 1991-09-26 1993-05-11 The Board Of Trustees Of The Leland Stanford Junior University Scanning probe microscope having scan correction
US5216631A (en) * 1990-11-02 1993-06-01 Sliwa Jr John W Microvibratory memory device
US5220555A (en) * 1988-09-30 1993-06-15 Canon Kabushiki Kaisha Scanning tunnel-current-detecting device and method for detecting tunnel current and scanning tunnelling microscope and recording/reproducing device using thereof
US5276672A (en) * 1990-08-16 1994-01-04 Canon Kabushiki Kaisha Micro-displacement type information detection probe device and scanning tunneling microscope, atomic force microscope, information processing device by use thereof
US5278704A (en) * 1990-09-05 1994-01-11 Canon Kabushiki Kaisha Information processing apparatus including magnetic material having a predetermined magnetization pattern with respect to a recording medium
US5283437A (en) * 1990-12-21 1994-02-01 International Business Machines Corporation Pneumatically and electrostatically driven scanning tunneling microscope
US5289408A (en) * 1989-02-09 1994-02-22 Olympus Optical Co., Ltd. Memory apparatus using tunnel current techniques
US5297130A (en) * 1991-02-08 1994-03-22 Canon Kabushiki Kaisha Driving apparatus and a recording and/or reproducing apparatus using the same
US5299184A (en) * 1991-05-15 1994-03-29 Canon Kabushiki Kaisha Information processing apparatus with held distance control on track edge detection
US5302239A (en) * 1992-05-15 1994-04-12 Micron Technology, Inc. Method of making atomically sharp tips useful in scanning probe microscopes
US5308974A (en) * 1992-11-30 1994-05-03 Digital Instruments, Inc. Scanning probe microscope using stored data for vertical probe positioning
US5317152A (en) * 1991-04-22 1994-05-31 Canon Kabushiki Kaisha Cantilever type probe, and scanning tunnel microscope and information processing apparatus employing the same
US5317533A (en) * 1988-01-27 1994-05-31 The Board Of Trustees Of The Leland Stanford University Integrated mass storage device
US5319961A (en) * 1991-09-17 1994-06-14 Olympus Optical Co., Ltd. Cantilever chip for use in scanning probe microscope
US5319977A (en) * 1991-06-20 1994-06-14 The Board Of Trustees Of The Leland Stanford Junior University Near field acoustic ultrasonic microscope system and method
US5322735A (en) * 1990-04-27 1994-06-21 Saphirwerk Industrieprodukte Ag Roller body, method of its manufacture, and of roller or plain bearings
US5389475A (en) * 1991-06-21 1995-02-14 Canon Kabushiki Kaisha Recording medium and information-erasing method
US5392275A (en) * 1990-10-19 1995-02-21 Canon Kabushiki Kaisha Information recording unit and method for information recording/reproduction
US5393647A (en) * 1993-07-16 1995-02-28 Armand P. Neukermans Method of making superhard tips for micro-probe microscopy and field emission
US5396483A (en) * 1989-08-10 1995-03-07 Canon Kabushiki Kaisha Recording medium having a track and electrode layer provided and recording and reproducing device and system using same
US5408094A (en) * 1992-05-07 1995-04-18 Olympus Optical Co., Ltd. Atomic force microscope with light beam emission at predetermined angle
US5412641A (en) * 1992-05-07 1995-05-02 Canon Kabushiki Kaisha Information recording/reproducing apparatus for recording/reproducing information with probes
US5414690A (en) * 1991-01-29 1995-05-09 Canon Kabushiki Kaisha Moving apparatus, a moving method and an information detection and/or input apparatus using the same
US5414260A (en) * 1992-05-01 1995-05-09 Canon Kabushiki Kaisha Scanning probe microscope and method of observing samples by using the same
US5416331A (en) * 1991-01-11 1995-05-16 Hitachi, Ltd. Surface atom fabrication method and apparatus
US5426631A (en) * 1992-12-21 1995-06-20 Canon Kabushiki Kaisha Information recording and reproducing apparatus for recording and reproducing information by using a probe electrode
US5490132A (en) * 1990-04-18 1996-02-06 Canon Kabushiki Kaisha Apparatus including at least one probe for being displaced relative to a recording medium for recording and/or reproducing information
US5495109A (en) * 1995-02-10 1996-02-27 Molecular Imaging Corporation Electrochemical identification of molecules in a scanning probe microscope
US5502306A (en) * 1991-05-30 1996-03-26 Kla Instruments Corporation Electron beam inspection system and method
US5506829A (en) * 1990-12-17 1996-04-09 Canon Kabushiki Kaisha Cantilever probe and apparatus using the same
US5510615A (en) * 1994-07-12 1996-04-23 Topometrix Corporation Scanning probe microscope apparatus for use in a scanning electron microscope
US5519686A (en) * 1987-08-25 1996-05-21 Canon Kabushiki Kaisha Encoder for controlling measurements in the range of a few angstroms
US5602820A (en) * 1995-08-24 1997-02-11 International Business Machines Corporation Method and apparatus for mass data storage
US5610898A (en) * 1991-07-17 1997-03-11 Canon Kabushiki Kaisha Information recording/reproducing method for recording and/or reproducing information on information recording carrier by use of probe electrode
US5623476A (en) * 1986-12-24 1997-04-22 Canon Kabushiki Kaisha Recording device and reproduction device
US5634230A (en) * 1994-12-27 1997-06-03 Siemens Aktiengesellschaft Apparatus and method for cleaning photomasks
US5717680A (en) * 1994-03-18 1998-02-10 Canon Kabushiki Kaisha Information processing apparatus with mechanism for adjusting interval between substrate for supporting a plurality of probes and recording medium
US5751683A (en) * 1995-07-24 1998-05-12 General Nanotechnology, L.L.C. Nanometer scale data storage device and associated positioning system
US5756997A (en) * 1996-03-04 1998-05-26 General Nanotechnology, L.L.C. Scanning probe/optical microscope with modular objective/probe and drive/detector units
US5763879A (en) * 1996-09-16 1998-06-09 Pacific Western Systems Diamond probe tip
US5865978A (en) * 1997-05-09 1999-02-02 Cohen; Adam E. Near-field photolithographic masks and photolithography; nanoscale patterning techniques; apparatus and method therefor
US5874726A (en) * 1995-10-10 1999-02-23 Iowa State University Research Foundation Probe-type near-field confocal having feedback for adjusting probe distance
US5883387A (en) * 1994-11-15 1999-03-16 Olympus Optical Co., Ltd. SPM cantilever and a method for manufacturing the same
US6031756A (en) * 1997-02-06 2000-02-29 International Business Machines Corporation Molecule, layered medium and method for creating a pattern
US6066265A (en) * 1996-06-19 2000-05-23 Kionix, Inc. Micromachined silicon probe for scanning probe microscopy
US6173604B1 (en) * 1996-09-20 2001-01-16 The Regents Of The University Of California Scanning evanescent electro-magnetic microscope
US6199269B1 (en) * 1997-10-23 2001-03-13 International Business Machines Corporation Manipulation of micromechanical objects
US6201226B1 (en) * 1997-02-19 2001-03-13 Canon Kabushiki Kaisha Probe with tip having micro aperture for detecting or irradiating light, near-field optical microscope, recording/reproduction apparatus, and exposure apparatus using the probe, and method of manufacturing the probe
US6229609B1 (en) * 1993-04-12 2001-05-08 Seiko Instruments Inc. Scanning near-field optic/atomic force microscope
US6229138B1 (en) * 1994-07-28 2001-05-08 General Neontechnology, Llc Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images
US6229607B1 (en) * 1997-10-31 2001-05-08 Hitachi Construction Machinery Co., Ltd. Fine movement mechanism unit and scanning probe microscope
US6239426B1 (en) * 1998-07-08 2001-05-29 Seiko Instruments Inc. Scanning probe and scanning probe microscope
US6249747B1 (en) * 1997-07-17 2001-06-19 International Business Machines Corporation Investigation and/or manipulation device
US6252226B1 (en) * 1994-07-28 2001-06-26 General Nanotechnology, L.L.C. Nanometer scale data storage device and associated positioning system
US6337479B1 (en) * 1994-07-28 2002-01-08 Victor B. Kley Object inspection and/or modification system and method
US6339217B1 (en) * 1995-07-28 2002-01-15 General Nanotechnology Llc Scanning probe microscope assembly and method for making spectrophotometric, near-field, and scanning probe measurements
US6340813B1 (en) * 1999-02-02 2002-01-22 Japan As Represented By Secretary Of Agency Of Industrial Science And Technology Variable-aperture optical near-field probe
US20020007667A1 (en) * 2000-04-12 2002-01-24 Pohl Dieter W. Method and apparatus for the controlled conditioning of scanning probes
US6353219B1 (en) * 1994-07-28 2002-03-05 Victor B. Kley Object inspection and/or modification system and method
US6404520B1 (en) * 1998-12-21 2002-06-11 Mci Worldcom, Inc. Fault isolation of an optical link by correlating PMD events with other measurements
US6507553B2 (en) * 1995-07-24 2003-01-14 General Nanotechnology Llc Nanometer scale data storage device and associated positioning system
US20030012657A1 (en) * 2001-05-03 2003-01-16 Marr David W.M. Devices employing colloidal-sized particles
US20030027354A1 (en) * 2001-06-08 2003-02-06 Francois Geli Device for the analysis of chemical or biochemical specimens, comparative analysis, and associated analysis process
US6517249B1 (en) * 2000-06-06 2003-02-11 The Timken Company Bearing with amorphous boron carbide coating
US20030082193A1 (en) * 1993-05-21 2003-05-01 Jeffrey L. Nauss Model for testing immunogencity of peptides
US20030089182A1 (en) * 2001-09-07 2003-05-15 Jacob Thaysen Flexible structure with integrated sensor/actuator
US6737331B1 (en) * 1999-09-23 2004-05-18 Nanoptics, Inc. Force sensing devices with multiple filled and/or empty channels and other attributes

Family Cites Families (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4115806A (en) 1975-05-23 1978-09-19 Bausch & Lomb Incorporated Image analysis data transfer
US4260203A (en) * 1979-09-10 1981-04-07 Smith International, Inc. Bearing structure for a rotary rock bit
USRE32457E (en) 1981-09-30 1987-07-07 Rca Corporation Scanning capacitance microscope
DE3276138D1 (en) 1982-12-27 1987-05-27 Ibm Optical near-field scanning microscope
US4697594A (en) 1985-08-21 1987-10-06 North American Philips Corporation Displaying a single parameter image
US4681451A (en) 1986-02-28 1987-07-21 Polaroid Corporation Optical proximity imaging method and apparatus
US4793201A (en) * 1987-06-29 1988-12-27 Nippon Telegraph And Telephone Corporation Porous static pressure guide
DE3850544T2 (en) 1987-09-24 1994-11-24 Canon Kk Micro probe, its manufacture and electronic device using this micro probe.
JP2557964B2 (en) 1988-01-22 1996-11-27 インターナシヨナル・ビジネス・マシーンズ・コーポレイーシヨン Data storage
IL87139A0 (en) 1988-07-17 1989-02-28 Aaron Lewis Nanometer dimension optical device
US4866986A (en) 1988-09-15 1989-09-19 Sonoscan, Inc. Method and system for dual phase scanning acoustic microscopy
NL8802335A (en) 1988-09-21 1990-04-17 Philips Nv METHOD AND APPARATUS FOR PROCESSING A MATERIAL SURFACE ON SUB-MIKRON SCALE
EP0363550B1 (en) 1988-10-14 1994-08-03 International Business Machines Corporation Distance-controlled tunneling transducer and direct access storage unit employing the transducer
US5241527A (en) 1989-03-16 1993-08-31 Canon Kabushiki Kaisha Recording and reproducing apparatus and method using a recording layer having a positioning region
US5260824A (en) 1989-04-24 1993-11-09 Olympus Optical Co., Ltd. Atomic force microscope
GB8910566D0 (en) 1989-05-08 1989-06-21 Amersham Int Plc Imaging apparatus and method
JP2909828B2 (en) 1989-07-05 1999-06-23 セイコーインスツルメンツ株式会社 Compound scanning tunneling microscope
JP2647504B2 (en) 1989-07-26 1997-08-27 オリンパス光学工業株式会社 Real image type zoom finder
US4954704A (en) 1989-12-04 1990-09-04 Digital Instruments, Inc. Method to increase the speed of a scanning probe microscope
US5289004A (en) 1990-03-27 1994-02-22 Olympus Optical Co., Ltd. Scanning probe microscope having cantilever and detecting sample characteristics by means of reflected sample examination light
US5155589A (en) 1990-05-22 1992-10-13 Gere David S Storage and retrieval of images from a grey image having artificially enhanced color regions
JP2945090B2 (en) 1990-07-09 1999-09-06 キヤノン株式会社 Encoder
JPH0477605A (en) 1990-07-20 1992-03-11 Olympus Optical Co Ltd Scanning type tunnel microscope and probe used therein
JP2744339B2 (en) 1990-08-03 1998-04-28 キヤノン株式会社 Information processing apparatus and information processing method
US5231286A (en) 1990-08-31 1993-07-27 Olympus Optical Co., Ltd. Scanning probe microscope utilizing an optical element in a waveguide for dividing the center part of the laser beam perpendicular to the waveguide
US5047649A (en) 1990-10-09 1991-09-10 International Business Machines Corporation Method and apparatus for writing or etching narrow linewidth patterns on insulating materials
US5166520A (en) 1991-05-13 1992-11-24 The Regents Of The University Of California Universal, microfabricated probe for scanning probe microscopes
EP0518112B1 (en) * 1991-05-24 1997-04-02 Sumitomo Electric Industries, Ltd. A process for fabricating micromachines
JP3109861B2 (en) 1991-06-12 2000-11-20 キヤノン株式会社 Information recording and / or reproducing apparatus
JPH0540034A (en) 1991-08-08 1993-02-19 Nikon Corp Compound microscope
JP2992141B2 (en) 1991-09-26 1999-12-20 松下電器産業株式会社 Probe for atomic force microscope for scanning tunneling electron microscope and silicon compound containing 3-thienyl group
US5254854A (en) 1991-11-04 1993-10-19 At&T Bell Laboratories Scanning microscope comprising force-sensing means and position-sensitive photodetector
US5249077A (en) 1991-12-12 1993-09-28 Microvideo Instruments, Inc. Darkfield illuminator for a microscope slide
US5348638A (en) 1992-01-16 1994-09-20 Matsushita Electric Industrial Co., Ltd. Method of manufacturing a probe for a scanning tunneling microscope
GB9209500D0 (en) 1992-05-01 1992-06-17 Link Analytical Ltd X-ray analysis apparatus
JP2917674B2 (en) 1992-06-03 1999-07-12 松下電器産業株式会社 Probe for scanning tunneling microscope and method of manufacturing the same
US5504366A (en) 1992-07-17 1996-04-02 Biotechnology Research And Development Corp. System for analyzing surfaces of samples
JP3246987B2 (en) 1992-09-10 2002-01-15 キヤノン株式会社 Information processing device with multi-probe control circuit
US5472881A (en) 1992-11-12 1995-12-05 University Of Utah Research Foundation Thiol labeling of DNA for attachment to gold surfaces
US5338932A (en) 1993-01-04 1994-08-16 Motorola, Inc. Method and apparatus for measuring the topography of a semiconductor device
US5354985A (en) 1993-06-03 1994-10-11 Stanford University Near field scanning optical and force microscope including cantilever and optical waveguide
US5453970A (en) 1993-07-13 1995-09-26 Rust; Thomas F. Molecular memory medium and molecular memory disk drive for storing information using a tunnelling probe
US5463897A (en) 1993-08-17 1995-11-07 Digital Instruments, Inc. Scanning stylus atomic force microscope with cantilever tracking and optical access
KR950024146A (en) 1994-01-31 1995-08-21 모리시타 요이찌 Information recording and reproducing apparatus and information recording and reproducing method
US5679952A (en) 1994-05-23 1997-10-21 Hitachi, Ltd. Scanning probe microscope
WO1998034092A2 (en) 1997-01-21 1998-08-06 Rave, L.L.C. Object inspection and/or modification system and method
US6265711B1 (en) 1994-07-28 2001-07-24 General Nanotechnology L.L.C. Scanning probe microscope assembly and method for making spectrophotometric near-field optical and scanning measurements
JPH0862230A (en) 1994-08-24 1996-03-08 Olympus Optical Co Ltd Integration type spm sensor
US5804709A (en) 1995-02-07 1998-09-08 International Business Machines Corporation Cantilever deflection sensor and use thereof
US5644512A (en) 1996-03-04 1997-07-01 Advanced Surface Microscopy, Inc. High precision calibration and feature measurement system for a scanning probe microscope
US5825670A (en) 1996-03-04 1998-10-20 Advanced Surface Microscopy High precison calibration and feature measurement system for a scanning probe microscope
US5821410A (en) 1996-09-20 1998-10-13 Regents Of The University Of California Scanning tip microwave near field microscope
US5922214A (en) 1997-01-17 1999-07-13 Wayne State University Nanometer scale fabrication method to produce thin film nanostructures
US5936243A (en) * 1997-06-09 1999-08-10 Ian Hardcastle Conductive micro-probe and memory device
US6802646B1 (en) * 2001-04-30 2004-10-12 General Nanotechnology Llc Low-friction moving interfaces in micromachines and nanomachines
US5990473A (en) * 1998-02-04 1999-11-23 Sandia Corporation Apparatus and method for sensing motion in a microelectro-mechanical system
GB9803213D0 (en) * 1998-02-14 1998-04-08 Glacier Vandervell Ltd Improved bearings

Patent Citations (102)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US32457A (en) * 1861-06-04 allen
US34214A (en) * 1862-01-21 Improvement in washers for paper-pulp
US34708A (en) * 1862-03-18 Improved device for straining gold and silver amalgam
US3586865A (en) * 1968-06-21 1971-06-22 British Scient Instr Research Method of,and apparatus for,inspecting the shape of small objects
US3812288A (en) * 1972-11-21 1974-05-21 Edax Int Inc Television display system
US4673477B1 (en) * 1984-03-02 1993-01-12 Univ Minnesota
US4673477A (en) * 1984-03-02 1987-06-16 Regents Of The University Of Minnesota Controlled vacuum arc material deposition, method and apparatus
USRE34214E (en) * 1984-03-15 1993-04-06 Molecular Dynamics, Inc. Method and apparatus for microphotometering microscope specimens
US4907195A (en) * 1984-09-14 1990-03-06 Xerox Corporation Method of and system for atomic scale recording of information
US4672559A (en) * 1984-12-26 1987-06-09 E. I. Du Pont De Nemours And Company Method for operating a microscopical mapping system
US4831614A (en) * 1986-05-27 1989-05-16 International Business Machines Corporation Direct access storage unit using tunneling current techniques
US5623476A (en) * 1986-12-24 1997-04-22 Canon Kabushiki Kaisha Recording device and reproduction device
US5519686A (en) * 1987-08-25 1996-05-21 Canon Kabushiki Kaisha Encoder for controlling measurements in the range of a few angstroms
US5721721A (en) * 1987-08-25 1998-02-24 Canon Kabushiki Kaisha Two scanning probes information recording/reproducing system with one probe to detect atomic reference location on a recording medium
US5317533A (en) * 1988-01-27 1994-05-31 The Board Of Trustees Of The Leland Stanford University Integrated mass storage device
US5001344A (en) * 1988-08-26 1991-03-19 Hitachi, Ltd. Scanning electron microscope and method of processing the same
US4999495A (en) * 1988-08-31 1991-03-12 Seiko Instruments Inc. Scanning tunneling microscope
US5010249A (en) * 1988-09-13 1991-04-23 Seiko Instruments Inc. Diamond probe and forming method thereof
US5107112A (en) * 1988-09-30 1992-04-21 Canon Kabushiki Kaisha Scanning tunnel-current-detecting device and method for detecting tunnel current and scanning tunnelling microscope and recording/reproducing device using thereof
US5220555A (en) * 1988-09-30 1993-06-15 Canon Kabushiki Kaisha Scanning tunnel-current-detecting device and method for detecting tunnel current and scanning tunnelling microscope and recording/reproducing device using thereof
US5018865A (en) * 1988-10-21 1991-05-28 Ferrell Thomas L Photon scanning tunneling microscopy
US4924091A (en) * 1989-02-01 1990-05-08 The Regents Of The University Of California Scanning ion conductance microscope
US5289408A (en) * 1989-02-09 1994-02-22 Olympus Optical Co., Ltd. Memory apparatus using tunnel current techniques
US5025346A (en) * 1989-02-17 1991-06-18 Regents Of The University Of California Laterally driven resonant microstructures
US5118541A (en) * 1989-06-19 1992-06-02 Matsushita Electric Industrial Co., Ltd. Erasable optical disk media and method of recording/erasing the same
US5015850A (en) * 1989-06-20 1991-05-14 The Board Of Trustees Of The Leland Stanford Junior University Microfabricated microscope assembly
US5396483A (en) * 1989-08-10 1995-03-07 Canon Kabushiki Kaisha Recording medium having a track and electrode layer provided and recording and reproducing device and system using same
US5490132A (en) * 1990-04-18 1996-02-06 Canon Kabushiki Kaisha Apparatus including at least one probe for being displaced relative to a recording medium for recording and/or reproducing information
US5108865A (en) * 1990-04-18 1992-04-28 Minnesota Mining And Manufacturing Company Offset transfer of toner images in electrography
US5322735A (en) * 1990-04-27 1994-06-21 Saphirwerk Industrieprodukte Ag Roller body, method of its manufacture, and of roller or plain bearings
US5081390A (en) * 1990-08-13 1992-01-14 Digital Instruments, Inc. Method of operating a scanning probe microscope to improve drift characteristics
US5187367A (en) * 1990-08-14 1993-02-16 Canon Kabushiki Kaisha Cantilever type probe, scanning tunneling microscope and information processing device equipped with said probe
US5276672A (en) * 1990-08-16 1994-01-04 Canon Kabushiki Kaisha Micro-displacement type information detection probe device and scanning tunneling microscope, atomic force microscope, information processing device by use thereof
US5278704A (en) * 1990-09-05 1994-01-11 Canon Kabushiki Kaisha Information processing apparatus including magnetic material having a predetermined magnetization pattern with respect to a recording medium
US5392275A (en) * 1990-10-19 1995-02-21 Canon Kabushiki Kaisha Information recording unit and method for information recording/reproduction
US5307311A (en) * 1990-11-02 1994-04-26 Sliwa Jr John W Microvibratory memory device
US5216631A (en) * 1990-11-02 1993-06-01 Sliwa Jr John W Microvibratory memory device
US5506829A (en) * 1990-12-17 1996-04-09 Canon Kabushiki Kaisha Cantilever probe and apparatus using the same
US5283437A (en) * 1990-12-21 1994-02-01 International Business Machines Corporation Pneumatically and electrostatically driven scanning tunneling microscope
US5105305A (en) * 1991-01-10 1992-04-14 At&T Bell Laboratories Near-field scanning optical microscope using a fluorescent probe
US5416331A (en) * 1991-01-11 1995-05-16 Hitachi, Ltd. Surface atom fabrication method and apparatus
US5414690A (en) * 1991-01-29 1995-05-09 Canon Kabushiki Kaisha Moving apparatus, a moving method and an information detection and/or input apparatus using the same
US5297130A (en) * 1991-02-08 1994-03-22 Canon Kabushiki Kaisha Driving apparatus and a recording and/or reproducing apparatus using the same
US5317152A (en) * 1991-04-22 1994-05-31 Canon Kabushiki Kaisha Cantilever type probe, and scanning tunnel microscope and information processing apparatus employing the same
US5299184A (en) * 1991-05-15 1994-03-29 Canon Kabushiki Kaisha Information processing apparatus with held distance control on track edge detection
US5502306A (en) * 1991-05-30 1996-03-26 Kla Instruments Corporation Electron beam inspection system and method
US5319977A (en) * 1991-06-20 1994-06-14 The Board Of Trustees Of The Leland Stanford Junior University Near field acoustic ultrasonic microscope system and method
US5389475A (en) * 1991-06-21 1995-02-14 Canon Kabushiki Kaisha Recording medium and information-erasing method
US5610898A (en) * 1991-07-17 1997-03-11 Canon Kabushiki Kaisha Information recording/reproducing method for recording and/or reproducing information on information recording carrier by use of probe electrode
US5319961A (en) * 1991-09-17 1994-06-14 Olympus Optical Co., Ltd. Cantilever chip for use in scanning probe microscope
US5210410A (en) * 1991-09-26 1993-05-11 The Board Of Trustees Of The Leland Stanford Junior University Scanning probe microscope having scan correction
US5414260A (en) * 1992-05-01 1995-05-09 Canon Kabushiki Kaisha Scanning probe microscope and method of observing samples by using the same
US5412641A (en) * 1992-05-07 1995-05-02 Canon Kabushiki Kaisha Information recording/reproducing apparatus for recording/reproducing information with probes
US5408094A (en) * 1992-05-07 1995-04-18 Olympus Optical Co., Ltd. Atomic force microscope with light beam emission at predetermined angle
US5302239A (en) * 1992-05-15 1994-04-12 Micron Technology, Inc. Method of making atomically sharp tips useful in scanning probe microscopes
US5418363A (en) * 1992-11-30 1995-05-23 Digital Instruments, Inc. Scanning probe microscope using stored data for vertical probe positioning
US5308974A (en) * 1992-11-30 1994-05-03 Digital Instruments, Inc. Scanning probe microscope using stored data for vertical probe positioning
US5418363B1 (en) * 1992-11-30 1998-01-06 Digital Instr Inc Scanning probe microscope using stored data for vertical probe positioning
US5308974B1 (en) * 1992-11-30 1998-01-06 Digital Instr Inc Scanning probe microscope using stored data for vertical probe positioning
US5426631A (en) * 1992-12-21 1995-06-20 Canon Kabushiki Kaisha Information recording and reproducing apparatus for recording and reproducing information by using a probe electrode
US6229609B1 (en) * 1993-04-12 2001-05-08 Seiko Instruments Inc. Scanning near-field optic/atomic force microscope
US20030082193A1 (en) * 1993-05-21 2003-05-01 Jeffrey L. Nauss Model for testing immunogencity of peptides
US5393647A (en) * 1993-07-16 1995-02-28 Armand P. Neukermans Method of making superhard tips for micro-probe microscopy and field emission
US5717680A (en) * 1994-03-18 1998-02-10 Canon Kabushiki Kaisha Information processing apparatus with mechanism for adjusting interval between substrate for supporting a plurality of probes and recording medium
US5510615A (en) * 1994-07-12 1996-04-23 Topometrix Corporation Scanning probe microscope apparatus for use in a scanning electron microscope
US6353219B1 (en) * 1994-07-28 2002-03-05 Victor B. Kley Object inspection and/or modification system and method
US6515277B1 (en) * 1994-07-28 2003-02-04 General Nanotechnology L.L.C. Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images
US6396054B1 (en) * 1994-07-28 2002-05-28 General Nanotechnology Llc Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images
US6369379B1 (en) * 1994-07-28 2002-04-09 General Nanotechnology Llc Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images
US6337479B1 (en) * 1994-07-28 2002-01-08 Victor B. Kley Object inspection and/or modification system and method
US6252226B1 (en) * 1994-07-28 2001-06-26 General Nanotechnology, L.L.C. Nanometer scale data storage device and associated positioning system
US6242734B1 (en) * 1994-07-28 2001-06-05 General Nanotechnology, Llc Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images
US6232597B1 (en) * 1994-07-28 2001-05-15 General Nanotechnology, Llc Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images
US6229138B1 (en) * 1994-07-28 2001-05-08 General Neontechnology, Llc Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images
US5883387A (en) * 1994-11-15 1999-03-16 Olympus Optical Co., Ltd. SPM cantilever and a method for manufacturing the same
US5634230A (en) * 1994-12-27 1997-06-03 Siemens Aktiengesellschaft Apparatus and method for cleaning photomasks
US5495109A (en) * 1995-02-10 1996-02-27 Molecular Imaging Corporation Electrochemical identification of molecules in a scanning probe microscope
US6507553B2 (en) * 1995-07-24 2003-01-14 General Nanotechnology Llc Nanometer scale data storage device and associated positioning system
US6724712B2 (en) * 1995-07-24 2004-04-20 General Nanotechnology Llc Nanometer scale data storage device and associated positioning system
US5751683A (en) * 1995-07-24 1998-05-12 General Nanotechnology, L.L.C. Nanometer scale data storage device and associated positioning system
US6339217B1 (en) * 1995-07-28 2002-01-15 General Nanotechnology Llc Scanning probe microscope assembly and method for making spectrophotometric, near-field, and scanning probe measurements
US5602820A (en) * 1995-08-24 1997-02-11 International Business Machines Corporation Method and apparatus for mass data storage
US5874726A (en) * 1995-10-10 1999-02-23 Iowa State University Research Foundation Probe-type near-field confocal having feedback for adjusting probe distance
US5756997A (en) * 1996-03-04 1998-05-26 General Nanotechnology, L.L.C. Scanning probe/optical microscope with modular objective/probe and drive/detector units
US6066265A (en) * 1996-06-19 2000-05-23 Kionix, Inc. Micromachined silicon probe for scanning probe microscopy
US5763879A (en) * 1996-09-16 1998-06-09 Pacific Western Systems Diamond probe tip
US6173604B1 (en) * 1996-09-20 2001-01-16 The Regents Of The University Of California Scanning evanescent electro-magnetic microscope
US6031756A (en) * 1997-02-06 2000-02-29 International Business Machines Corporation Molecule, layered medium and method for creating a pattern
US6201226B1 (en) * 1997-02-19 2001-03-13 Canon Kabushiki Kaisha Probe with tip having micro aperture for detecting or irradiating light, near-field optical microscope, recording/reproduction apparatus, and exposure apparatus using the probe, and method of manufacturing the probe
US5865978A (en) * 1997-05-09 1999-02-02 Cohen; Adam E. Near-field photolithographic masks and photolithography; nanoscale patterning techniques; apparatus and method therefor
US6249747B1 (en) * 1997-07-17 2001-06-19 International Business Machines Corporation Investigation and/or manipulation device
US6199269B1 (en) * 1997-10-23 2001-03-13 International Business Machines Corporation Manipulation of micromechanical objects
US6229607B1 (en) * 1997-10-31 2001-05-08 Hitachi Construction Machinery Co., Ltd. Fine movement mechanism unit and scanning probe microscope
US6239426B1 (en) * 1998-07-08 2001-05-29 Seiko Instruments Inc. Scanning probe and scanning probe microscope
US6404520B1 (en) * 1998-12-21 2002-06-11 Mci Worldcom, Inc. Fault isolation of an optical link by correlating PMD events with other measurements
US6340813B1 (en) * 1999-02-02 2002-01-22 Japan As Represented By Secretary Of Agency Of Industrial Science And Technology Variable-aperture optical near-field probe
US6737331B1 (en) * 1999-09-23 2004-05-18 Nanoptics, Inc. Force sensing devices with multiple filled and/or empty channels and other attributes
US20020007667A1 (en) * 2000-04-12 2002-01-24 Pohl Dieter W. Method and apparatus for the controlled conditioning of scanning probes
US6517249B1 (en) * 2000-06-06 2003-02-11 The Timken Company Bearing with amorphous boron carbide coating
US20030012657A1 (en) * 2001-05-03 2003-01-16 Marr David W.M. Devices employing colloidal-sized particles
US20030027354A1 (en) * 2001-06-08 2003-02-06 Francois Geli Device for the analysis of chemical or biochemical specimens, comparative analysis, and associated analysis process
US20030089182A1 (en) * 2001-09-07 2003-05-15 Jacob Thaysen Flexible structure with integrated sensor/actuator

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