US20040169272A1 - Chip on board with heat sink attachment and assembly - Google Patents
Chip on board with heat sink attachment and assembly Download PDFInfo
- Publication number
- US20040169272A1 US20040169272A1 US10/792,244 US79224404A US2004169272A1 US 20040169272 A1 US20040169272 A1 US 20040169272A1 US 79224404 A US79224404 A US 79224404A US 2004169272 A1 US2004169272 A1 US 2004169272A1
- Authority
- US
- United States
- Prior art keywords
- semiconductor die
- heat sink
- substrate
- gel elastomer
- elastomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
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- 229920001971 elastomer Polymers 0.000 claims abstract description 100
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- 239000000463 material Substances 0.000 claims abstract description 69
- 239000000758 substrate Substances 0.000 claims abstract description 60
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 7
- 239000010703 silicon Substances 0.000 claims abstract description 7
- 239000000853 adhesive Substances 0.000 claims description 23
- 230000001070 adhesive effect Effects 0.000 claims description 23
- 239000004020 conductor Substances 0.000 claims description 12
- 229910000679 solder Inorganic materials 0.000 claims description 12
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- 239000002184 metal Substances 0.000 description 5
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- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
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Definitions
- This invention relates generally to integrated circuit packages and methods of package assembly. More particularly, the present invention pertains to the manufacture of Chip On Board devices with heat sinks for high power dissipation.
- heat sink is used herein in general reference to a passive heat transfer device, for example, an extruded aluminum plate with or without fins thereon.
- the plate is thermally coupled to an electronic component, e.g., semiconductor die, to absorb heat from the component and dissipate the heat by convection into the air.
- a heat sink will be distinguished from a “heat spreader,” the latter pertaining to a member which channels heat from a semiconductor die to leads which exit the die package.
- a heat sink and a heat spreader may together be used to cool a device.
- Integrated circuit devices are constructed by making, e.g., a (silicon or germanium) semiconductor die with internal and surface circuits including transistors, resistors, capacitors, etc.
- a single semiconductor die may contain thousands of such components and generate considerable heat.
- Electrical connection pads on an “active” surface of the semiconductor die are connected to the various die circuits.
- the integrated circuit device also includes electrical leads enabling the electrical connection pads of the semiconductor die to be connected to circuits on a PCB (or other substrate) of an appliance.
- Dissipation of generated thermal energy is necessary for safe operation of an electronic appliance.
- An excessively high temperature of an IC may cause a circuit board fire and damage or destroy the appliance. High temperatures cause failure of the integrated circuits themselves.
- State of the art methods for absorbing and dissipating thermal energy from high speed Chip On Board (COB) semiconductor devices are inadequate for any or all of the following reasons: (a) insufficient heat transfer capability, (b) excessively large package size, especially the profile height, (c) complexity of manufacture, and/or (d) excessive cost.
- a method for making a semiconductor device with an exposed die back side includes providing a printed wiring board (PWB) substrate with conductive traces, on which a semiconductor die is flip mounted and connected to the conductive traces.
- An electrically nonconductive coupling material is placed between the die and substrate.
- a package body is formed around the perimeter of the die, covering a portion of the conductive traces and any portion of the coupling material extending beyond the die perimeter.
- the back side of the die is left exposed through the use of a thin layer of tape placed in the mold cavity prior to the transfer molding of the package body around the die to prevent the flow of molding material forming the package from flowing on the inactive back side of the die. If the thin layer of tape adheres to the die after removal of the semiconductor device from the mold cavity, the thin layer of tape is removed from the die of the semiconductor device.
- an improved method for fabricating a Chip On Board semiconductor device requiring enhanced heat dissipation is applicable to direct attachment of semiconductor devices, such as dynamic memory semiconductor dice, to substrates, such as circuit boards and the like, and to the formation of modules incorporating a substrate, such as a circuit board.
- an elastomer is used to cover a portion of a semiconductor die prior to glob top application of the die to the circuit board.
- the elastomer is removed, e.g., by peeling, from the die surface and includes any glob top material which has inadvertently been applied to the elastomer.
- the portion of the semiconductor die remains free of contaminants.
- a heat sink may be attached to such portion of the semiconductor die.
- the method is applicable to both wire-bonded dice and flip-chip die bonding to circuit boards.
- the elastomer may be retained on a portion of the semiconductor die after the molding or glob-topping of the die for the attachment of a heat sink thereto, if desired.
- the elastomer may be a highly thermally conductive elastomer to enhance the heat transfer from the semiconductor die to the surrounding environment.
- An example of a highly thermally conductive elastomer is a metal-filled elastomer or an elastomer filled with a highly thermally conductive material like metal.
- the preferred elastomer is highly heat conductive, very compliant, has a relatively low adhesiveness and a high surface wetting property, all the type of properties that enhances heat transfer from the semiconductor die.
- a heat conductive cap is formed over a semiconductor die and comprises a heat sink.
- a layer of the metal-filled gel elastomer is placed between the non-active surface of a die and the cap. Compressing the die into the cap forms the desired adhesion to retain the die within the cap.
- the compliance of the elastomer enables the die and cap to be pressed together without overpressuring the die/circuit board interface.
- the high thermal conductivity of the elastomer enables devices having a very high heat output to be cooled to temperatures enabling reliable operation.
- the method of the invention includes steps for forming direct die-to-circuit board connections for “heat sinked” dice as well as for forming “heat sinked” die modules which may be themselves connected to a substrate such as a circuit board.
- FIG. 1 is a perspective view of a wire-bonded Chip On Board (COB) semiconductor device of the invention
- FIG. 2 is a perspective view of a flip-chip Chip On Board (COB) semiconductor device of the invention
- FIGS. 3A through 3G are cross-sectional views of a wire-bonded Chip On Board (COB) semiconductor device illustrating the steps of fabrication in accordance with the invention, as taken along line 3 - 3 of FIG. 1;
- COB Chip On Board
- FIGS. 4A through 4F are cross-sectional views of a flip-chip Chip On Board (COB) semiconductor device illustrating the steps of fabrication in accordance with the invention, as taken along line 4 - 4 of FIG. 2;
- COB Chip On Board
- FIG. 5 is a cross-sectional view of a Chip On Board (COB) semiconductor device of the invention having a cap as a heat sink;
- COB Chip On Board
- FIG. 6 is a cross-sectional view of a circuit board mounted semiconductor device of the invention having a cap as a heat sink;
- FIG. 7 is a cross-sectional view of a circuit board mounted semiconductor device of the invention having a heat sink resiliently retained on the semiconductor die.
- the semiconductor device 10 includes a semiconductor die 12 having an active surface 14 with bond pads 16 , as known in the art.
- the semiconductor die 12 has a back side 18 which is bonded to a substrate 20 , shown here as a printed circuit board (PCB).
- the bond pads 16 are shown as conventionally arrayed near the edges 32 of the semiconductor die 12 , and are wire-bonded with conductive, e.g., gold, wires 22 to corresponding electrical connection pads 24 on the substrate 20 . Leads on the upper surface 26 and below the upper surface 26 of the substrate 20 are not shown.
- a heat-conductive heat sink 30 with fins 28 is mounted on the upper, i.e., active surface 14 of the semiconductor die 12 , between the rows of bond pads 16 .
- the heat sink 30 has a relatively large exposed surface area, enabling a high transfer rate of thermal energy.
- An adhesive 34 having a high heat conductance is preferably used, but other adhesives may be alternatively used to bond the heat sink 30 to the semiconductor die 12 , particularly because the adhesive 34 is applied in a very thin layer.
- a “glob top” material 38 applied to encapsulate and seal the semiconductor die 12 , wires 22 , and surrounding portions 36 of the substrate 20 .
- a major portion of the heat sink 30 is exposed to the ambient air for high heat transfer rates. If necessitated by very high heat generation, a fan (not shown) may be used in the appliance to further increase heat dissipation.
- the glob top material 38 may be any suitable glob top material, an encapsulant type material, etc.
- the glob top material 38 may be applied to overcover a major portion or all of the heat sink 30 . This results in decreased heat dissipation capability, however, but may be used where the thermal output of the device permits.
- more than one semiconductor device 10 may be attached to a single heat sink 30 , and together sealed by application of glob top material 38 .
- the heat sink 30 is typically formed of a conductive metal such as aluminum, and has one attachment surface 46 which is attachable by adhesive 34 to the semiconductor die 12 .
- the heat sink 30 may be of any design which provides the desired heat dissipation, is joinable to the die active surface 14 and sealable by a glob top material 38 .
- the heat sink 30 may either have fins 28 or be finless.
- FIGS. 3A through 3G the steps of fabricating semiconductor device 10 from a semiconductor die 12 , lead wires 22 and a heat sink 30 are outlined in more detail.
- a semiconductor die 12 has an active surface 14 with bond pads 16 near opposing sides of the semiconductor die 12 .
- the back side 18 of the semiconductor die 12 is first bonded to the upper surface 26 of the substrate 20 by a layer of adhesive 40 .
- the substrate 20 may be a printed circuit board (PCB) or other materials such as a flex circuit or ceramic.
- a layer of a thermally conductive-filled gel elastomer 50 may be either applied to the semiconductor die while in wafer form or subsequently applied to active surface 14 between the arrays of bond pads 16 of the semiconductor die 12 after singulation of the semiconductor die 12 from the wafer.
- the purpose of the gel elastomer 50 is to provide a protective mask over an area of the semiconductor die 12 to which the heat sink 30 (FIG. 3E) is to be bonded.
- the first layer may be retained on a portion of the semiconductor die 12 after the molding or glob-topping of the semiconductor die 12 for the attachment of a heat sink thereto, if desired (to be described in FIG. 3C).
- the gel elastomer 50 is applied as a gel or as a semi-solid or solid coupon.
- the gel elastomer 50 or a suitable silicon elastomeric material, etc.
- the gel elastomer 50 may include one or more dams 52 to help prevent the flow of any subsequently applied material from covering the surface of the gel elastomer 50 .
- the dams 52 may extend along one or more sides of the semiconductor die 12 , as desired, and may be of any suitable height.
- the dams 52 may be of any suitable material.
- the dams 52 may comprise a second layer of gel elastomer 50 having a size smaller than that of the gel elastomer 50 .
- any glob top material 38 which lands on the gel elastomer 50 will be later removed by removal of the gel elastomer from the active surface 14 of the semiconductor die 12 .
- the gel elastomer 50 may be removed simply by peeling it from the active surface 14 of the semiconductor die 12 .
- a silicon type elastomer may be used on the semiconductor die 12 and removed therefrom for the application of a heat sink to the semiconductor die 12 .
- the gel elastomer 50 is a recently developed material and includes Heat PathTM-filled cross-linked silicone gels sold by Raychem. As used in this invention, the gel elastomer 50 is filled with a conductive material to provide high thermal conductivity. The gel elastomer material is compliant under light pressure, has a solid shape retention, cohesive strength and the ability to wet and adhere to surfaces.
- the bond pads 16 are wire bonded to electrical connection pads 24 on the substrate 20 by, e.g., thermosonic, thermocompression or ultrasonic methods, as known in the art.
- the wire bonding step may precede application of the gel elastomer 50 .
- FIG. 3C depicted is the next step of the process, that of applying glob top material 38 or suitable potting material to encapsulate the wire connections and the edges 32 (FIG. 3A) of the semiconductor die 12 .
- the glob top material 38 is typically a thermally resistive polymer such as commercially available epoxy or urethane.
- the glob top material 38 is typically applied as a curable liquid through a small nozzle, not shown, to extend to the layer of gel elastomer 50 , or nearly so.
- portions 38 A and 38 B of the glob top material 38 have spilled onto the exposed surface 44 of gel elastomer 50 . Without use of the layer of gel elastomer 50 , effective removal of glob top portions 38 A and 38 B may damage the semiconductor die 12 and/or substrate 20 and/or lead wires 22 , etc.
- glob top material 38 is followed by a curing step, such as by temperature elevation.
- the glob top material 38 is cured to provide a hard, impenetrable sealing surface.
- the gel elastomer 50 is then peeled away in direction 42 from the active surface 14 of the semiconductor die 12 . It has been found that the lower surface 51 of the gel elastomer 50 may be easily and cleanly stripped from the active surface 14 of semiconductor die 12 by simply peeling away the gel elastomer coupon. This leaves the active surface 14 of the semiconductor die 12 clean and prepared for strong bonding of a heat sink 30 with an adhesive 34 , shown in drawing FIG. 3E.
- die-to-substrate adhesives 40 include those commonly known and/or used in the art. Examples of such are polyimides, a 75% silver-filled cyanate ester paste, an 80% silver-filled cyanate ester paste, a silver-filled lead glass paste, etc.
- the adhesive 34 used to bond the heat sink 30 to the active surface 14 of the semiconductor die 12 may be an epoxy or the above identified die-to-substrate adhesives or an adhesive as known in the art.
- further glob top material 48 may be applied to the semiconductor device 10 , particularly between the existing glob top material 38 and the heat sink 30 , for improved sealing.
- the glob top materials 38 and 48 are shown overcovering the substrate 20 between semiconductor device 10 and an adjacent device, of which only a connection pad 24 A and a bond wire 22 A are visible.
- the semiconductor device 10 is effectively sealed to the substrate 20 to prevent electrical short-circuiting, wire breakage and debonding, and moisture penetration.
- a semiconductor die 12 has an active surface 14 with bond pads 16 near opposing sides of the semiconductor die 12 .
- the back side 18 (FIG. 4A) of the semiconductor die 12 is first bonded to the upper surface 26 of the substrate 20 by a layer of adhesive 40 .
- the substrate 20 may be a printed circuit board (PCB) or other materials such as a flex circuit or ceramic.
- a layer of a thermally conductive-filled gel elastomer 50 is either permanently applied to the semiconductor die while in wafer form or subsequently applied to active surface 14 between the arrays of bond pads 16 of the semiconductor die 12 after singulation of the semiconductor die 12 from the wafer.
- a layer or piece of disposable elastomer or tape 150 is releasably applied over the gel elastomer 50 .
- the purpose of the elastomer or tape 150 is to provide a protective mask over an area of the gel elastomer 50 attached to the semiconductor die 12 to which the heat sink 30 is to be bonded.
- the elastomer 150 is applied as a semi-solid or solid coupon.
- the elastomer 150 is to be disposed after removal from the semiconductor die 12 and may include one or more dams 52 to help prevent the flow of any subsequently applied material from covering the surface of the elastomer 150 .
- the dams 52 may extend along one or more sides of the elastomer 150 , as desired, and may be of any suitable height.
- the dams 52 may be of any suitable material.
- the dams 52 may comprise a second layer of elastomer 150 having a size smaller than that of the gel elastomer 50 . Subsequent glob top application is difficult to precisely control, and any glob top material 38 which lands on the elastomer 150 will be later removed by removal of the elastomer 150 from the surface of the gel elastomer 50 . Typically, the elastomer 150 may be removed simply by peeling it from the surface of the gel elastomer 50 permanently attached to the semiconductor die 12 .
- a silicon type elastomer may be used on the semiconductor die 12 and removed therefrom for the application of a heat sink to the semiconductor die 12 .
- the layer of elastomer 150 is then peeled away in direction 42 from the surface of the gel elastomer 50 . It has been found that the lower surface 152 of the elastomer 150 may be easily and cleanly stripped from the surface of the gel elastomer 50 by simply peeling away the elastomer coupon. This leaves the surface of the gel elastomer 50 clean and prepared for strong bonding of a heat sink 30 with an adhesive 34 , shown in drawing FIG. 3E.
- the glob top materials 38 and 48 may be the same or different materials.
- Glob top materials useful for this application include HYSOLTM FP4451 material or HYSOLTM FP4450 high-purity, low-stress liquid encapsulant material, available from the DEXTER ELECTRONIC MATERIALS DIVISION OF DEXTER CORPORATION, etc.
- FIG. 2 Depicted in drawing FIG. 2 is another aspect of the invention, wherein the semiconductor die 12 is bonded flip-chip fashion to electrical circuit traces 54 on the upper surface 26 of substrate 20 .
- the semiconductor die 12 has an active surface 14 with a grid of electrical connections 56 attached to the corresponding electrical circuit traces 54 .
- the electrical connections 56 may comprise a ball grid array (BGA) of solder balls, as shown, or other array.
- BGA ball grid array
- the opposite, back side 18 of the semiconductor die 12 is directed upwardly, away from the substrate 20 .
- a heat sink 30 here shown with fins 28 , has an attachment surface 46 which is adhesively bonded to the back side 18 with adhesive 34 .
- Glob top material 38 is applied to seal the semiconductor die 12 , including its edges 32 , and a surrounding portion 36 of the substrate. A major portion of the heat sink 30 is exposed to the ambient air for high heat transfer rates. Where very high heat dissipation rates are required, a fan (not shown) may be used to provide a high rate of air movement past the heat sink 30 .
- This type of attachment may similarly be used in chip scale packages, if desired. In such an instance, the semiconductor die 12 would be replaced by a chip scale package bonded flip-chip fashion to electrical circuit traces 54 on the upper surface 26 of substrate 20 .
- the chip scale package has an active surface 14 with a grid of electrical connections 56 attached to the corresponding electrical circuit traces 54 .
- the electrical connections 56 may comprise a ball grid array (BGA) of solder balls, as shown, or other array.
- BGA ball grid array
- the opposite, back side 18 of the chip scale package is directed upwardly, away from the substrate 20 .
- a heat sink 30 here shown with fins 28 , has an attachment surface 46 which is adhesively bonded to the back side 18 of the chip scale package with adhesive 34 .
- Glob top material 38 is applied to seal the chip scale package, including its edges 32 , and a surrounding portion 36 of the substrate.
- a major portion of the heat sink 30 is exposed to the ambient air for high heat transfer rates. Where very high heat dissipation rates are required, a fan (not shown) may be used to provide a high rate of air movement past the heat sink 30 .
- the semiconductor die 12 has an opposing back side 18 and edges 32 .
- the substrate 20 may be a printed circuit board (PCB) or other material such as a flex circuit or ceramic.
- a layer or coupon of thermally conductive-filled gel elastomer 50 alternatively, a suitable elastomer, silicon elastomeric material, etc.
- the gel elastomer 50 is to be discarded, is applied as a solid or semisolid to the back side 18 of the semiconductor die 12 , either before or (preferably) after the semiconductor die 12 is electrically down bonded to the substrate 20 .
- the gel elastomer 50 masks the back side 18 from glob top material 38 which may be inadvertently misapplied to the back side 18 , requiring removal by erosive blasting or other methods. The use of the gel elastomer 50 obviates such glob top removal methods.
- the next step encompasses the application of glob top material 38 to encapsulate and seal the semiconductor die 12 and portions of the adjacent substrate upper surface 26 .
- the spaces 60 between the electrical connections 56 are first filled with glob top material 38 or another low viscosity polymeric material.
- the glob top material 38 is depicted as applied to form a nearly uniform depth over an extended substrate area. Some of the glob top material 38 is shown as having been misapplied to the layer of gel elastomer 50 as portions 38 A and 38 B.
- the glob top material 38 is then cured, for example, by heating.
- the gel elastomer 50 is then removed, e.g., by peeling it from the back side 18 of the semiconductor die 12 .
- the back side 18 of semiconductor die 12 in drawing FIG. 4D is then bare and clean for enhanced attachment of a heat sink 30 thereto.
- a heat sink 30 is bonded to the back side 18 of semiconductor die 12 by a layer of adhesive 34 , as already described, relative to the embodiment of drawing FIG. 1.
- a further application of a glob top material 48 may be performed, particularly to fill the spaces between the glob top material 38 and the heat sink 30 .
- the glob top material 48 may be the same as glob top material 38 , or may be different.
- a room temperature vulcanizing rubber which may vary in the degree of thermal conductivity thereof, may be used to completely cover and seal the device to the substrate 20 , including the glob top material 38 .
- the heat sink 30 may also be completely or nearly completely encapsulated.
- the Chip On Board semiconductor device 10 of drawing FIG. 1 or drawing FIG. 2 may be formed as merely one of a plurality of components attached and sealed to a substrate.
- the chip scale package (CSP) semiconductor device 10 shown in FIG. 6, may be a stand-alone encapsulated device whereby a grid of electrical connections is formed on the opposite side 58 (see FIG. 6) of the substrate 20 for bonding to another substrate, not shown.
- the gel elastomer may also be used as a permanent compliant member 70 between a semiconductor die 12 and a heat sink 30 .
- a semiconductor die 12 has an active surface 14 with a ball grid array (BGA) of electrical connections 56 connected to traces (not shown) on a circuit board or other substrate 20 .
- a layer 70 of gel elastomer is then applied to inside attachment surface 46 of a cap style heat sink 30 .
- the heat sink 30 may be finned, or have no fins 28 .
- the heat sink 30 has lateral walls 62 whose lower edges 64 are designed to abut the upper surface 26 of the substrate 20 .
- a portion of the substrate 20 is configured to fit within the open end 66 of the heat sink 30 .
- a semiconductor die 12 has an active surface 14 with a ball grid array (BGA) of electrical connections 56 connected to traces (not shown) on a circuit board or other substrate 20 having a plurality of apertures 21 therein.
- BGA ball grid array
- a layer 70 of gel elastomer is then applied to inside attachment surface 46 of a cap style heat sink 30 .
- the heat sink 30 may be finned, or have no fins 28 .
- the heat sink 30 has resilient spring members 31 having a portion thereof engaging a fin 28 while the other end thereof engages an aperture 21 of the substrate 20 to resiliently retain the heat sink 30 engaging the gel elastomer layer 70 which engages the back side 18 of the semiconductor die 12 , leaving the heat sink 30 and semiconductor die 12 free to move with respect to each other.
- the back side 18 of semiconductor die 12 is then pressed into the gel elastomer layer 70 for attachment thereto.
- the adhesion of the gel elastomer layer 70 to the attachment surface 46 of the heat sink 30 and the back side 18 of the semiconductor die 12 as well as the resilient spring members 31 holds the parts in place.
- the interior of the heat sink “cap” may be filled with encapsulant material 68 as shown in FIG. 6.
- encapsulant may be injected through holes (not shown) in the heat sink 30 .
- FIG. 6 The embodiment of drawing FIG. 6 is shown with a further ball grid array (BGA) of solder balls 72 on the opposite side 58 of the substrate.
- BGA ball grid array
- the semiconductor device 10 may be bonded to another substrate, such as a circuit board, not shown.
- the gel elastomer layer 70 is first applied to back side 18 of the semiconductor die 12 , which is then pressed into the attachment surface 46 of the heat sink 30 .
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Abstract
A thermally enhanced Chip On Board semiconductor device with a heat sink is described. In one aspect, a thermally conducting filled gel elastomer material or a silicon elastomeric material or elastomeric material, if the material is to be removed, is applied to the die surface to which the heat sink is to be bonded. During the subsequent glob top application and curing steps, difficult-to-remove glob top material which otherwise may be misapplied to the die surface adheres to the upper surface of the elastomer material. The elastomer material is removed by peeling prior to adhesion bonding of the heat sink to the die. In another aspect, the thermally conducting filled gel elastomer material is applied between a die surface and the inside attachment surface of a cap-style heat sink to eliminate overpressure on the die/substrate interface.
Description
- This application is a divisional of application Ser. No. 09/834,297, filed Apr. 12, 2001, pending, which is a continuation of application Ser. No. 09/510,894, filed Feb. 23, 2000, now U.S. Pat. No. 6,229,204 B1, issued May 8, 2001, which is a divisional of application Ser. No. 09/146,945, filed Sep. 3, 1998, now U.S. Pat. No. 6,117,797, issued Sep. 12, 2000.
- 1. Field of the Invention
- This invention relates generally to integrated circuit packages and methods of package assembly. More particularly, the present invention pertains to the manufacture of Chip On Board devices with heat sinks for high power dissipation.
- 2. State of the Art
- Semiconductor devices are used in a wide variety of products, including computers, automobiles, integrated circuit cards, audio/video products, and a plethora of other electronic apparatus.
- Modern electronic appliances such as computers have hundreds of integrated circuits (IC) and other electronic components, most of which are mounted on printed circuit boards (PCB). Heat is generated by such components. The heat generated by many ICs and other electronic components with simple circuits may often be dissipated without an additional heat sink. However, components requiring added heat sinks are becoming more numerous as the required speed, circuit complexity, and circuit density have increased.
- In particular, as semiconductor devices have become more dense in terms of electrical power consumption per unit volume, heat generation has greatly increased, requiring package construction which dissipates the generated heat much more rapidly. As the state of the art progresses, the ability to adequately dissipate heat is often a severe constraint on the size, speed, and power consumption of an integrated circuit design.
- The term “heat sink” is used herein in general reference to a passive heat transfer device, for example, an extruded aluminum plate with or without fins thereon. The plate is thermally coupled to an electronic component, e.g., semiconductor die, to absorb heat from the component and dissipate the heat by convection into the air. In this application, a heat sink will be distinguished from a “heat spreader,” the latter pertaining to a member which channels heat from a semiconductor die to leads which exit the die package. However, a heat sink and a heat spreader may together be used to cool a device.
- Integrated circuit devices are constructed by making, e.g., a (silicon or germanium) semiconductor die with internal and surface circuits including transistors, resistors, capacitors, etc. A single semiconductor die may contain thousands of such components and generate considerable heat. Electrical connection pads on an “active” surface of the semiconductor die are connected to the various die circuits. The integrated circuit device also includes electrical leads enabling the electrical connection pads of the semiconductor die to be connected to circuits on a PCB (or other substrate) of an appliance.
- Dissipation of generated thermal energy is necessary for safe operation of an electronic appliance. An excessively high temperature of an IC may cause a circuit board fire and damage or destroy the appliance. High temperatures cause failure of the integrated circuits themselves. State of the art methods for absorbing and dissipating thermal energy from high speed Chip On Board (COB) semiconductor devices are inadequate for any or all of the following reasons: (a) insufficient heat transfer capability, (b) excessively large package size, especially the profile height, (c) complexity of manufacture, and/or (d) excessive cost.
- Current methods of forming glob topped Chip On Board devices with heat sinks are shown in U.S. Pat. No. 5,552,635 of Kim et al., U.S. Pat. No. 5,477,082 of Buckley III et al., U.S. Pat. No. 5,468,995 of Higgins III, U.S. Pat. No. 5,610,442 of Schneider et al., and U.S. Pat. No. 5,659,952 of Kovac et al.
- In U.S. Pat. No. 5,450,283 of Lin et al., a method for making a semiconductor device with an exposed die back side is described. The method includes providing a printed wiring board (PWB) substrate with conductive traces, on which a semiconductor die is flip mounted and connected to the conductive traces. An electrically nonconductive coupling material is placed between the die and substrate. A package body is formed around the perimeter of the die, covering a portion of the conductive traces and any portion of the coupling material extending beyond the die perimeter. The back side of the die is left exposed through the use of a thin layer of tape placed in the mold cavity prior to the transfer molding of the package body around the die to prevent the flow of molding material forming the package from flowing on the inactive back side of the die. If the thin layer of tape adheres to the die after removal of the semiconductor device from the mold cavity, the thin layer of tape is removed from the die of the semiconductor device.
- A device made with multiple layers of encapsulant is shown in U.S. Pat. No. 5,379,186 of Gold et al.
- In accordance with the invention, an improved method for fabricating a Chip On Board semiconductor device requiring enhanced heat dissipation is applicable to direct attachment of semiconductor devices, such as dynamic memory semiconductor dice, to substrates, such as circuit boards and the like, and to the formation of modules incorporating a substrate, such as a circuit board.
- In one aspect of the invention, an elastomer is used to cover a portion of a semiconductor die prior to glob top application of the die to the circuit board. The elastomer is removed, e.g., by peeling, from the die surface and includes any glob top material which has inadvertently been applied to the elastomer. Thus, the portion of the semiconductor die remains free of contaminants. If desired, since a portion of the semiconductor die is free of contaminants, providing a good adhesion surface, a heat sink may be attached to such portion of the semiconductor die. The method is applicable to both wire-bonded dice and flip-chip die bonding to circuit boards. Alternatively, the elastomer may be retained on a portion of the semiconductor die after the molding or glob-topping of the die for the attachment of a heat sink thereto, if desired. The elastomer may be a highly thermally conductive elastomer to enhance the heat transfer from the semiconductor die to the surrounding environment. An example of a highly thermally conductive elastomer is a metal-filled elastomer or an elastomer filled with a highly thermally conductive material like metal.
- The preferred elastomer is highly heat conductive, very compliant, has a relatively low adhesiveness and a high surface wetting property, all the type of properties that enhances heat transfer from the semiconductor die.
- In another aspect of the invention, a heat conductive cap is formed over a semiconductor die and comprises a heat sink. A layer of the metal-filled gel elastomer is placed between the non-active surface of a die and the cap. Compressing the die into the cap forms the desired adhesion to retain the die within the cap. The compliance of the elastomer enables the die and cap to be pressed together without overpressuring the die/circuit board interface. In addition, the high thermal conductivity of the elastomer enables devices having a very high heat output to be cooled to temperatures enabling reliable operation.
- The method of the invention includes steps for forming direct die-to-circuit board connections for “heat sinked” dice as well as for forming “heat sinked” die modules which may be themselves connected to a substrate such as a circuit board.
- These and other features and advantages will be more clearly understood from the following detailed description when taken in conjunction with the accompanying drawings. It is important to note that the illustrations are not necessarily drawn to scale, and that there may be other embodiments of the invention which are not specifically illustrated. Like elements of the various figures are designated by like numerals.
- The invention is illustrated in the following figures, wherein:
- FIG. 1 is a perspective view of a wire-bonded Chip On Board (COB) semiconductor device of the invention;
- FIG. 2 is a perspective view of a flip-chip Chip On Board (COB) semiconductor device of the invention;
- FIGS. 3A through 3G are cross-sectional views of a wire-bonded Chip On Board (COB) semiconductor device illustrating the steps of fabrication in accordance with the invention, as taken along line3-3 of FIG. 1;
- FIGS. 4A through 4F are cross-sectional views of a flip-chip Chip On Board (COB) semiconductor device illustrating the steps of fabrication in accordance with the invention, as taken along line4-4 of FIG. 2;
- FIG. 5 is a cross-sectional view of a Chip On Board (COB) semiconductor device of the invention having a cap as a heat sink;
- FIG. 6 is a cross-sectional view of a circuit board mounted semiconductor device of the invention having a cap as a heat sink; and
- FIG. 7 is a cross-sectional view of a circuit board mounted semiconductor device of the invention having a heat sink resiliently retained on the semiconductor die.
- As shown in drawing FIG. 1, a
first semiconductor device 10 with a high heat generation rate is shown. Thesemiconductor device 10 includes asemiconductor die 12 having anactive surface 14 withbond pads 16, as known in the art. The semiconductor die 12 has aback side 18 which is bonded to asubstrate 20, shown here as a printed circuit board (PCB). Thebond pads 16 are shown as conventionally arrayed near theedges 32 of the semiconductor die 12, and are wire-bonded with conductive, e.g., gold,wires 22 to correspondingelectrical connection pads 24 on thesubstrate 20. Leads on theupper surface 26 and below theupper surface 26 of thesubstrate 20 are not shown. - As shown, a heat-
conductive heat sink 30 withfins 28 is mounted on the upper, i.e.,active surface 14 of the semiconductor die 12, between the rows ofbond pads 16. Theheat sink 30 has a relatively large exposed surface area, enabling a high transfer rate of thermal energy. An adhesive 34 having a high heat conductance is preferably used, but other adhesives may be alternatively used to bond theheat sink 30 to the semiconductor die 12, particularly because the adhesive 34 is applied in a very thin layer. - Also shown in drawing FIG. 1 is a “glob top”
material 38 applied to encapsulate and seal the semiconductor die 12,wires 22, and surroundingportions 36 of thesubstrate 20. A major portion of theheat sink 30 is exposed to the ambient air for high heat transfer rates. If necessitated by very high heat generation, a fan (not shown) may be used in the appliance to further increase heat dissipation. Theglob top material 38 may be any suitable glob top material, an encapsulant type material, etc. - In an alternative arrangement, the
glob top material 38 may be applied to overcover a major portion or all of theheat sink 30. This results in decreased heat dissipation capability, however, but may be used where the thermal output of the device permits. - It is evident that more than one
semiconductor device 10 may be attached to asingle heat sink 30, and together sealed by application ofglob top material 38. - The
heat sink 30 is typically formed of a conductive metal such as aluminum, and has oneattachment surface 46 which is attachable by adhesive 34 to the semiconductor die 12. Theheat sink 30 may be of any design which provides the desired heat dissipation, is joinable to the dieactive surface 14 and sealable by aglob top material 38. For example, theheat sink 30 may either havefins 28 or be finless. - Turning now to drawing FIGS. 3A through 3G, the steps of fabricating
semiconductor device 10 from asemiconductor die 12,lead wires 22 and aheat sink 30 are outlined in more detail. - In drawing FIG. 3A, a
semiconductor die 12 has anactive surface 14 withbond pads 16 near opposing sides of the semiconductor die 12. Theback side 18 of the semiconductor die 12 is first bonded to theupper surface 26 of thesubstrate 20 by a layer ofadhesive 40. Thesubstrate 20 may be a printed circuit board (PCB) or other materials such as a flex circuit or ceramic. A layer of a thermally conductive-filledgel elastomer 50 may be either applied to the semiconductor die while in wafer form or subsequently applied toactive surface 14 between the arrays ofbond pads 16 of the semiconductor die 12 after singulation of the semiconductor die 12 from the wafer. The purpose of thegel elastomer 50 is to provide a protective mask over an area of the semiconductor die 12 to which the heat sink 30 (FIG. 3E) is to be bonded. Alternatively, when the second layer is used as a mask, the first layer may be retained on a portion of the semiconductor die 12 after the molding or glob-topping of the semiconductor die 12 for the attachment of a heat sink thereto, if desired (to be described in FIG. 3C). Thegel elastomer 50 is applied as a gel or as a semi-solid or solid coupon. Thegel elastomer 50, or a suitable silicon elastomeric material, etc. if thegel elastomer 50 is to be disposed after removal from the semiconductor die 12, or the use of a metal-filledgel elastomer 50, if such is to remain on the semiconductor die 12, may include one ormore dams 52 to help prevent the flow of any subsequently applied material from covering the surface of thegel elastomer 50. Thedams 52 may extend along one or more sides of the semiconductor die 12, as desired, and may be of any suitable height. Thedams 52 may be of any suitable material. Alternatively, thedams 52 may comprise a second layer ofgel elastomer 50 having a size smaller than that of thegel elastomer 50. Subsequent glob top application is difficult to precisely control, and anyglob top material 38 which lands on thegel elastomer 50 will be later removed by removal of the gel elastomer from theactive surface 14 of the semiconductor die 12. Typically, thegel elastomer 50 may be removed simply by peeling it from theactive surface 14 of the semiconductor die 12. Typically, if thegel elastomer 50 is to be removed from the semiconductor die 12 after the glob top material application, a silicon type elastomer may be used on the semiconductor die 12 and removed therefrom for the application of a heat sink to the semiconductor die 12. - The
gel elastomer 50 is a recently developed material and includes Heat Path™-filled cross-linked silicone gels sold by Raychem. As used in this invention, thegel elastomer 50 is filled with a conductive material to provide high thermal conductivity. The gel elastomer material is compliant under light pressure, has a solid shape retention, cohesive strength and the ability to wet and adhere to surfaces. - In the next step, shown in drawing FIG. 3B, the
bond pads 16 are wire bonded toelectrical connection pads 24 on thesubstrate 20 by, e.g., thermosonic, thermocompression or ultrasonic methods, as known in the art. - Alternatively, the wire bonding step may precede application of the
gel elastomer 50. - In drawing FIG. 3C, depicted is the next step of the process, that of applying
glob top material 38 or suitable potting material to encapsulate the wire connections and the edges 32 (FIG. 3A) of the semiconductor die 12. Theglob top material 38 is typically a thermally resistive polymer such as commercially available epoxy or urethane. Theglob top material 38 is typically applied as a curable liquid through a small nozzle, not shown, to extend to the layer ofgel elastomer 50, or nearly so. As shown,portions glob top material 38 have spilled onto the exposedsurface 44 ofgel elastomer 50. Without use of the layer ofgel elastomer 50, effective removal of globtop portions substrate 20 and/or leadwires 22, etc. - Application of the
glob top material 38 is followed by a curing step, such as by temperature elevation. Theglob top material 38 is cured to provide a hard, impenetrable sealing surface. - As shown in drawing FIG. 3D, the
gel elastomer 50 is then peeled away indirection 42 from theactive surface 14 of the semiconductor die 12. It has been found that thelower surface 51 of thegel elastomer 50 may be easily and cleanly stripped from theactive surface 14 of semiconductor die 12 by simply peeling away the gel elastomer coupon. This leaves theactive surface 14 of the semiconductor die 12 clean and prepared for strong bonding of aheat sink 30 with an adhesive 34, shown in drawing FIG. 3E. - The particular materials which may be used as die-to-
substrate adhesives 40 include those commonly known and/or used in the art. Examples of such are polyimides, a 75% silver-filled cyanate ester paste, an 80% silver-filled cyanate ester paste, a silver-filled lead glass paste, etc. - The adhesive34 used to bond the
heat sink 30 to theactive surface 14 of the semiconductor die 12 may be an epoxy or the above identified die-to-substrate adhesives or an adhesive as known in the art. - As illustrated in drawing FIG. 3F, further glob
top material 48 may be applied to thesemiconductor device 10, particularly between the existingglob top material 38 and theheat sink 30, for improved sealing. In this figure, theglob top materials substrate 20 betweensemiconductor device 10 and an adjacent device, of which only aconnection pad 24A and abond wire 22A are visible. Thesemiconductor device 10 is effectively sealed to thesubstrate 20 to prevent electrical short-circuiting, wire breakage and debonding, and moisture penetration. - In drawing FIG. 3G, a
semiconductor die 12 has anactive surface 14 withbond pads 16 near opposing sides of the semiconductor die 12. The back side 18 (FIG. 4A) of the semiconductor die 12 is first bonded to theupper surface 26 of thesubstrate 20 by a layer ofadhesive 40. Thesubstrate 20 may be a printed circuit board (PCB) or other materials such as a flex circuit or ceramic. A layer of a thermally conductive-filledgel elastomer 50 is either permanently applied to the semiconductor die while in wafer form or subsequently applied toactive surface 14 between the arrays ofbond pads 16 of the semiconductor die 12 after singulation of the semiconductor die 12 from the wafer. A layer or piece of disposable elastomer ortape 150 is releasably applied over thegel elastomer 50. The purpose of the elastomer ortape 150 is to provide a protective mask over an area of thegel elastomer 50 attached to the semiconductor die 12 to which theheat sink 30 is to be bonded. Theelastomer 150 is applied as a semi-solid or solid coupon. Theelastomer 150 is to be disposed after removal from the semiconductor die 12 and may include one ormore dams 52 to help prevent the flow of any subsequently applied material from covering the surface of theelastomer 150. Thedams 52 may extend along one or more sides of theelastomer 150, as desired, and may be of any suitable height. Thedams 52 may be of any suitable material. Alternatively, thedams 52 may comprise a second layer ofelastomer 150 having a size smaller than that of thegel elastomer 50. Subsequent glob top application is difficult to precisely control, and anyglob top material 38 which lands on theelastomer 150 will be later removed by removal of theelastomer 150 from the surface of thegel elastomer 50. Typically, theelastomer 150 may be removed simply by peeling it from the surface of thegel elastomer 50 permanently attached to the semiconductor die 12. Typically, if theelastomer 150 is to be removed from thegel elastomer 50 after the glob top material application, a silicon type elastomer may be used on the semiconductor die 12 and removed therefrom for the application of a heat sink to the semiconductor die 12. - As shown in drawing FIG. 3G, the layer of
elastomer 150 is then peeled away indirection 42 from the surface of thegel elastomer 50. It has been found that thelower surface 152 of theelastomer 150 may be easily and cleanly stripped from the surface of thegel elastomer 50 by simply peeling away the elastomer coupon. This leaves the surface of thegel elastomer 50 clean and prepared for strong bonding of aheat sink 30 with an adhesive 34, shown in drawing FIG. 3E. - The
glob top materials - Depicted in drawing FIG. 2 is another aspect of the invention, wherein the semiconductor die12 is bonded flip-chip fashion to electrical circuit traces 54 on the
upper surface 26 ofsubstrate 20. The semiconductor die 12 has anactive surface 14 with a grid ofelectrical connections 56 attached to the corresponding electrical circuit traces 54. Theelectrical connections 56 may comprise a ball grid array (BGA) of solder balls, as shown, or other array. The opposite, backside 18 of the semiconductor die 12 is directed upwardly, away from thesubstrate 20. Aheat sink 30, here shown withfins 28, has anattachment surface 46 which is adhesively bonded to theback side 18 withadhesive 34. Globtop material 38 is applied to seal the semiconductor die 12, including itsedges 32, and a surroundingportion 36 of the substrate. A major portion of theheat sink 30 is exposed to the ambient air for high heat transfer rates. Where very high heat dissipation rates are required, a fan (not shown) may be used to provide a high rate of air movement past theheat sink 30. This type of attachment may similarly be used in chip scale packages, if desired. In such an instance, the semiconductor die 12 would be replaced by a chip scale package bonded flip-chip fashion to electrical circuit traces 54 on theupper surface 26 ofsubstrate 20. The chip scale package has anactive surface 14 with a grid ofelectrical connections 56 attached to the corresponding electrical circuit traces 54. Theelectrical connections 56 may comprise a ball grid array (BGA) of solder balls, as shown, or other array. The opposite, backside 18 of the chip scale package is directed upwardly, away from thesubstrate 20. Aheat sink 30, here shown withfins 28, has anattachment surface 46 which is adhesively bonded to theback side 18 of the chip scale package with adhesive 34. Globtop material 38 is applied to seal the chip scale package, including itsedges 32, and a surroundingportion 36 of the substrate. A major portion of theheat sink 30 is exposed to the ambient air for high heat transfer rates. Where very high heat dissipation rates are required, a fan (not shown) may be used to provide a high rate of air movement past theheat sink 30. - The steps of fabricating the
semiconductor device 10 of drawing FIG. 2 are illustrated in drawing FIGS. 4A through 4F. If a chip scale package is used rather than asemiconductor die 12, all numerals and descriptions of the invention are the same except that the semiconductor die 12 is a chip scale package. - As depicted in drawing FIG. 4A, a flip-chip or semiconductor die12 having an
active surface 14 with a grid ofelectrical connections 56, shown as solder balls, is down bonded to electrical circuit traces 54 (not shown) on anupper surface 26 of asubstrate 20. The semiconductor die 12 has an opposing backside 18 and edges 32. Thesubstrate 20 may be a printed circuit board (PCB) or other material such as a flex circuit or ceramic. A layer or coupon of thermally conductive-filledgel elastomer 50, alternatively, a suitable elastomer, silicon elastomeric material, etc. if thegel elastomer 50 is to be discarded, is applied as a solid or semisolid to theback side 18 of the semiconductor die 12, either before or (preferably) after the semiconductor die 12 is electrically down bonded to thesubstrate 20. Thegel elastomer 50 masks theback side 18 from globtop material 38 which may be inadvertently misapplied to theback side 18, requiring removal by erosive blasting or other methods. The use of thegel elastomer 50 obviates such glob top removal methods. - As shown in drawing FIG. 4B, the next step encompasses the application of
glob top material 38 to encapsulate and seal the semiconductor die 12 and portions of the adjacent substrateupper surface 26. Preferably, thespaces 60 between theelectrical connections 56 are first filled withglob top material 38 or another low viscosity polymeric material. In these figures, theglob top material 38 is depicted as applied to form a nearly uniform depth over an extended substrate area. Some of theglob top material 38 is shown as having been misapplied to the layer ofgel elastomer 50 asportions - The
glob top material 38 is then cured, for example, by heating. - As shown in drawing FIG. 4C, the
gel elastomer 50 is then removed, e.g., by peeling it from theback side 18 of the semiconductor die 12. Theback side 18 of semiconductor die 12 in drawing FIG. 4D is then bare and clean for enhanced attachment of aheat sink 30 thereto. - In drawing FIG. 4E, a
heat sink 30 is bonded to theback side 18 of semiconductor die 12 by a layer of adhesive 34, as already described, relative to the embodiment of drawing FIG. 1. - In drawing FIG. 4F, a further application of a
glob top material 48 may be performed, particularly to fill the spaces between the globtop material 38 and theheat sink 30. Theglob top material 48 may be the same as globtop material 38, or may be different. - Alternatively, a room temperature vulcanizing rubber (RTV), which may vary in the degree of thermal conductivity thereof, may be used to completely cover and seal the device to the
substrate 20, including theglob top material 38. - Although a major portion of the
heat sink 30 is unencapsulated in the preferred embodiment, the heat sink may also be completely or nearly completely encapsulated. - The Chip On
Board semiconductor device 10 of drawing FIG.1 or drawing FIG. 2 may be formed as merely one of a plurality of components attached and sealed to a substrate. Alternatively, the chip scale package (CSP)semiconductor device 10, shown in FIG. 6, may be a stand-alone encapsulated device whereby a grid of electrical connections is formed on the opposite side 58 (see FIG. 6) of thesubstrate 20 for bonding to another substrate, not shown. - While application of the
gel elastomer 50 to the semiconductor die 12, when singulated or while in wafer form, is an additional step in device fabrication, it eliminates the troublesome step of glob top removal required by misapplication of glob top material to the die surface. A clean surface for bonding to a heat sink is assured. In addition, no other layers of good conductors and/or poor conductors are required, enabling both (a) high heat removal and (b) a device of reduced dimensions. - The gel elastomer may also be used as a permanent
compliant member 70 between asemiconductor die 12 and aheat sink 30. As depicted in drawing FIG. 5, asemiconductor die 12 has anactive surface 14 with a ball grid array (BGA) ofelectrical connections 56 connected to traces (not shown) on a circuit board orother substrate 20. Alayer 70 of gel elastomer is then applied toinside attachment surface 46 of a capstyle heat sink 30. Theheat sink 30 may be finned, or have nofins 28. In one embodiment, theheat sink 30 haslateral walls 62 whoselower edges 64 are designed to abut theupper surface 26 of thesubstrate 20. Alternatively (FIG. 6), a portion of thesubstrate 20 is configured to fit within theopen end 66 of theheat sink 30. - As depicted in drawing FIG. 7, a
semiconductor die 12 has anactive surface 14 with a ball grid array (BGA) ofelectrical connections 56 connected to traces (not shown) on a circuit board orother substrate 20 having a plurality ofapertures 21 therein. Alayer 70 of gel elastomer is then applied toinside attachment surface 46 of a capstyle heat sink 30. Theheat sink 30 may be finned, or have nofins 28. In one embodiment, theheat sink 30 hasresilient spring members 31 having a portion thereof engaging afin 28 while the other end thereof engages anaperture 21 of thesubstrate 20 to resiliently retain theheat sink 30 engaging thegel elastomer layer 70 which engages theback side 18 of the semiconductor die 12, leaving theheat sink 30 and semiconductor die 12 free to move with respect to each other. - In either case, as illustrated in drawing FIGS. 5, 6, and7, the
back side 18 of semiconductor die 12 is then pressed into thegel elastomer layer 70 for attachment thereto. The adhesion of thegel elastomer layer 70 to theattachment surface 46 of theheat sink 30 and theback side 18 of the semiconductor die 12 as well as theresilient spring members 31 holds the parts in place. - As a further step, the interior of the heat sink “cap” may be filled with
encapsulant material 68 as shown in FIG. 6. In the embodiment of drawing FIG. 5, encapsulant may be injected through holes (not shown) in theheat sink 30. - The embodiment of drawing FIG. 6 is shown with a further ball grid array (BGA) of
solder balls 72 on theopposite side 58 of the substrate. Thus, thesemiconductor device 10 may be bonded to another substrate, such as a circuit board, not shown. - In an alternative method of forming the semiconductor devices of drawing FIGS. 5 and 6, the
gel elastomer layer 70 is first applied to backside 18 of the semiconductor die 12, which is then pressed into theattachment surface 46 of theheat sink 30. - In the embodiments of drawing FIGS. 5 and 6, overpressuring of the die/substrate interface is eliminated by the compliance of the filled gel elastomer. Simultaneously, the high thermal conductivity of the filled gel elastomer maintains high heat dissipation from the device.
- It is apparent to those skilled in the art that various changes and modifications may be made to the method and apparatus of the invention as disclosed herein without departing from the spirit and scope of the invention as defined in the following claims.
Claims (10)
1. A semiconductor assembly comprising:
a substrate having a plurality of circuits on a portion of a surface thereof;
a semiconductor die having a plurality of bond pads located on an active surface thereof and having a back side surface;
a plurality of solder balls connecting at least a portion of the plurality of bond pads of the semiconductor die to at least a portion of the plurality of circuits of the substrate;
one of a glob top material and low viscosity polymeric material filing any space between the substrate and the semiconductor die;
a gel elastomer contacting at least a portion of the back side surface of the semiconductor die, wherein the gel elastomer is compliant, adhesive, and filled with a thermally conductive material; and
a heat sink cap covering the gel elastomer, the semiconductor die, the plurality of solder balls, and a portion of the substrate, the heat sink cap contacting at least a portion of the gel elastomer.
2. The semiconductor assembly of claim 1 , wherein the heat sink cap includes a plurality of fins thereon.
3. The semiconductor assembly of claim 1 , wherein the gel elastomer includes a cross-linked silicone.
4. A semiconductor assembly comprising:
a substrate having a surface having a plurality of circuits on a portion thereof;
a semiconductor die having a plurality of bond pads located on a first portion of an active surface thereof and having a back side surface;
a plurality of solder balls connecting at least a portion of the plurality of bond pads of the semiconductor die to at least a portion of the plurality of circuits of the substrate;
one of a glob top material and low viscosity polymeric material filing any space between the substrate and the semiconductor die;
a gel elastomer contacting a portion of the back side surface of the semiconductor die, wherein the gel elastomer is a cross-linked silicon gel, compliant, adhesive, and filled with a thermally conductive material; and
a heat sink cap having a portion thereof in contact with a portion of the gel elastomer, the heat sink cap covering the gel elastomer, the semiconductor die, the plurality of solder balls, and at least a portion of the substrate.
5. The semiconductor assembly of claim 4 , wherein the heat sink cap includes a plurality of fins thereon.
6. An assembly comprising:
a substrate having a plurality of circuits on a portion thereof;
a semiconductor die having a plurality of bond pads located thereon and having a back side surface;
a plurality of solder balls connecting at least a portion of the plurality of bond pads of the semiconductor die to at least a portion of the plurality of circuits of the substrate;
one of a glob top material and low viscosity polymeric material filing any space between the substrate and the semiconductor die;
a compliant, adhesive, and filled with a thermally conductive material gel elastomer contacting at least a portion of the back side surface of the semiconductor die; and
a heat sink cap covering the compliant, adhesive, and filled with a thermally conductive material gel elastomer, the semiconductor die, the plurality of solder balls, and a portion of the substrate, the heat sink cap contacting at least a portion of the gel elastomer.
7. The semiconductor assembly of claim 6 , wherein the heat sink cap includes a plurality of fins thereon.
8. The semiconductor assembly of claim 6 , wherein the compliant, adhesive, and filled with a thermally conductive material gel elastomer includes a cross-linked silicone.
9. An assembly comprising:
a substrate having a plurality of circuits on a portion thereof;
a semiconductor die having a plurality of bond pads and having a back side surface;
a plurality of solder balls connecting at least a portion of the plurality of bond pads of the semiconductor die to at least a portion of the plurality of circuits of the substrate;
one of a glob top material and low viscosity polymeric material filing any space between the substrate and the semiconductor die;
a compliant, adhesive, and filled with a thermally conductive material gel elastomer contacting a portion of the back side surface of the semiconductor die; and
a heat sink cap having a portion thereof in contact with a portion of the compliant, adhesive, and filled with a thermally conductive material gel elastomer, the heat sink cap covering the compliant, adhesive, and filled with a thermally conductive material gel elastomer, the semiconductor die, the plurality of solder balls, and at least a portion of the substrate.
10. The semiconductor assembly of claim 9 , wherein the heat sink cap includes a plurality of fins thereon.
Priority Applications (1)
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US10/792,244 US20040169272A1 (en) | 1998-09-03 | 2004-03-03 | Chip on board with heat sink attachment and assembly |
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US09/146,945 US6117797A (en) | 1998-09-03 | 1998-09-03 | Attachment method for heat sinks and devices involving removal of misplaced encapsulant |
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US09/834,297 US6806567B2 (en) | 1998-09-03 | 2001-04-12 | Chip on board with heat sink attachment and assembly |
US10/792,244 US20040169272A1 (en) | 1998-09-03 | 2004-03-03 | Chip on board with heat sink attachment and assembly |
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US09/834,297 Division US6806567B2 (en) | 1998-09-03 | 2001-04-12 | Chip on board with heat sink attachment and assembly |
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US09/510,890 Expired - Lifetime US6451709B1 (en) | 1998-09-03 | 2000-02-23 | Methodology of removing misplaced encapsulant for attachment of heat sinks in a chip on board package |
US09/511,609 Expired - Lifetime US6596565B1 (en) | 1998-09-03 | 2000-02-23 | Chip on board and heat sink attachment methods |
US09/510,894 Expired - Lifetime US6229204B1 (en) | 1998-09-03 | 2000-02-23 | Chip on board with heat sink attachment |
US09/606,969 Expired - Lifetime US6432840B1 (en) | 1998-09-03 | 2000-06-28 | Methodology of removing misplaced encapsulant for attachment of heat sinks in a chip on board package |
US09/834,297 Expired - Fee Related US6806567B2 (en) | 1998-09-03 | 2001-04-12 | Chip on board with heat sink attachment and assembly |
US10/189,097 Expired - Lifetime US6630371B2 (en) | 1998-09-03 | 2002-07-02 | Chip on board and heat sink attachment methods |
US10/200,929 Expired - Fee Related US6784113B2 (en) | 1998-09-03 | 2002-07-22 | Chip on board and heat sink attachment methods |
US10/624,332 Expired - Fee Related US7244637B2 (en) | 1998-09-03 | 2003-07-22 | Chip on board and heat sink attachment methods |
US10/792,244 Abandoned US20040169272A1 (en) | 1998-09-03 | 2004-03-03 | Chip on board with heat sink attachment and assembly |
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US09/510,890 Expired - Lifetime US6451709B1 (en) | 1998-09-03 | 2000-02-23 | Methodology of removing misplaced encapsulant for attachment of heat sinks in a chip on board package |
US09/511,609 Expired - Lifetime US6596565B1 (en) | 1998-09-03 | 2000-02-23 | Chip on board and heat sink attachment methods |
US09/510,894 Expired - Lifetime US6229204B1 (en) | 1998-09-03 | 2000-02-23 | Chip on board with heat sink attachment |
US09/606,969 Expired - Lifetime US6432840B1 (en) | 1998-09-03 | 2000-06-28 | Methodology of removing misplaced encapsulant for attachment of heat sinks in a chip on board package |
US09/834,297 Expired - Fee Related US6806567B2 (en) | 1998-09-03 | 2001-04-12 | Chip on board with heat sink attachment and assembly |
US10/189,097 Expired - Lifetime US6630371B2 (en) | 1998-09-03 | 2002-07-02 | Chip on board and heat sink attachment methods |
US10/200,929 Expired - Fee Related US6784113B2 (en) | 1998-09-03 | 2002-07-22 | Chip on board and heat sink attachment methods |
US10/624,332 Expired - Fee Related US7244637B2 (en) | 1998-09-03 | 2003-07-22 | Chip on board and heat sink attachment methods |
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US11004770B2 (en) | 2012-12-31 | 2021-05-11 | International Business Machines Corporation | Phase changing on-chip thermal heat sink |
US20150035131A1 (en) * | 2013-08-05 | 2015-02-05 | Media Tek Singapore Pte. Ltd. | Chip package |
US9607951B2 (en) * | 2013-08-05 | 2017-03-28 | Mediatek Singapore Pte. Ltd. | Chip package |
Also Published As
Publication number | Publication date |
---|---|
US6229204B1 (en) | 2001-05-08 |
US20040126931A1 (en) | 2004-07-01 |
US20020177258A1 (en) | 2002-11-28 |
US6451709B1 (en) | 2002-09-17 |
US20010015493A1 (en) | 2001-08-23 |
US6596565B1 (en) | 2003-07-22 |
US20020182781A1 (en) | 2002-12-05 |
US6432840B1 (en) | 2002-08-13 |
US6630371B2 (en) | 2003-10-07 |
US6784113B2 (en) | 2004-08-31 |
US6117797A (en) | 2000-09-12 |
US7244637B2 (en) | 2007-07-17 |
US6806567B2 (en) | 2004-10-19 |
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