US20030090193A1 - Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same - Google Patents

Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same Download PDF

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Publication number
US20030090193A1
US20030090193A1 US10/166,079 US16607902A US2003090193A1 US 20030090193 A1 US20030090193 A1 US 20030090193A1 US 16607902 A US16607902 A US 16607902A US 2003090193 A1 US2003090193 A1 US 2003090193A1
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US
United States
Prior art keywords
phosphor
resin composition
photosensitive resin
composition layer
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US10/166,079
Inventor
Takeshi Nojiri
Hideyasu Tsuiki
Hiroyuki Tanaka
Yumiko Wada
Seiji Tai
Seikichi Tanno
Hajime Kakumaru
Kazuya Sato
Naoki Kimura
Ikuo Mukai
Original Assignee
Takeshi Nojiri
Hideyasu Tsuiki
Hiroyuki Tanaka
Yumiko Wada
Seiji Tai
Seikichi Tanno
Hajime Kakumaru
Kazuya Sato
Naoki Kimura
Ikuo Mukai
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP830696 priority Critical
Priority to JP8008307A priority patent/JPH09199027A/en
Priority to JP8306/1996 priority
Priority to JP8307/1996 priority
Priority to JP964396 priority
Priority to JP8009644A priority patent/JPH09199030A/en
Priority to JP9643/1996 priority
Priority to JP9644/1996 priority
Priority to JP4122996 priority
Priority to JP41229/1996 priority
Priority to US08/787,112 priority patent/US6329111B1/en
Priority to US09/927,548 priority patent/US6416931B2/en
Application filed by Takeshi Nojiri, Hideyasu Tsuiki, Hiroyuki Tanaka, Yumiko Wada, Seiji Tai, Seikichi Tanno, Hajime Kakumaru, Kazuya Sato, Naoki Kimura, Ikuo Mukai filed Critical Takeshi Nojiri
Priority to US10/166,079 priority patent/US20030090193A1/en
Publication of US20030090193A1 publication Critical patent/US20030090193A1/en
Abandoned legal-status Critical Current

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