US20020119649A1 - Method of fabricating bit line and bit line contact plug of a memory cell - Google Patents
Method of fabricating bit line and bit line contact plug of a memory cell Download PDFInfo
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- US20020119649A1 US20020119649A1 US09/939,110 US93911001A US2002119649A1 US 20020119649 A1 US20020119649 A1 US 20020119649A1 US 93911001 A US93911001 A US 93911001A US 2002119649 A1 US2002119649 A1 US 2002119649A1
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- bit line
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
- H10B12/48—Data lines or contacts therefor
- H10B12/482—Bit lines
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
- H10B12/48—Data lines or contacts therefor
- H10B12/485—Bit line contacts
Definitions
- the present invention relates to a method of fabricating a bit line and contact plug for a dynamic random access memory (DRAM) cell, and more particularly to the fabrication of a bit line and a bit line contact plug for the DRAM cell.
- DRAM dynamic random access memory
- a DRAM cell comprises a metal-oxide-semiconductor field effect transistor (MOSFET) and a capacitor that are built in a semiconductor silicon substrate. There is an electrical contact between the drain of a MOSFET and the bottom storage electrodes of the adjacent capacitor, forming a memory cell of the DRAM device. A large number of memory cells make up the cell arrays, which combine with the peripheral circuit to produce DRAMs.
- MOSFET metal-oxide-semiconductor field effect transistor
- bit line contact plug connects bit line and drain region, and the bit line is on the top of the bit line contact plug.
- formation of the bit line contact plug usually takes place before that of the bit line.
- bit lines 160 , word lines 102 , active areas 104 , source/drain region 112 , and bit line contact plug 142 are shown on the layout of the memory cell array of a DRAM cell.
- FIG. 1B is a sectional view along the A-A line of FIG. 1A.
- a semiconductor substrate 100 is provided, using a LOCOS Oxidation process to form a field insulating layer (not shown) on the substrate 100 .
- the field insulating layer isolates each Active Area.
- ordinary semiconductor processes such as deposition, photolithography and ion implantation are used to form the transistor (not shown).
- the transistor is composed of a gate (not shown) and diffusion areas, such as the source/drain region 112 .
- a first insulating layer 120 which is made of borophosphosilicate glass (identified as BPSG hereafter), is formed to isolate the gate.
- BPSG borophosphosilicate glass
- a photoresist layer 130 is formed on the first insulating layer 120 .
- the first insulating layer 120 is defined to form a bit line contact window 140 , which exposes the surface of the source/drain region 112 .
- a first conductive layer (not shown) is deposited to fill up the bit line contact window 140 . Then, a bit line contact plug 142 is formed, which electrically connects the source/drain region 112 .
- the top portion of the bit line contact plug 142 is defined to form a trench 150 .
- a bit line 160 is formed by depositing a second conductive layer (not shown) to fill up the trench 150 .
- the bit line 160 electrically connects the source/drain region 112 through the bit line contact plug 142 . Manufacture of the bit line and the bit line contact plug of a memory cell is then completed.
- the line width of a memory cell has been reduced to less than 0.08 micrometer.
- the narrowed line width increases electrical resistance, and thus, increases the loss of current and heat generated by the device, and decreases the efficiency of the device. Accordingly, to reduce the electrical resistance, the increased line width of a device is necessary. And hence, in order to reduce the electrical resistance between the bit line contact plug and the source/drain region or the bit line and the bit line contact, enlarging the diameter of the bit line contact plug is necessary. Note the processes of a 0.14-micrometer device as an example. The distance between two neighboring bit lines is also about 0.14 micrometer.
- the ideal diameter of the bit line contact plug is about 0.17 to 0.18 micrometer.
- the distance between two neighboring bit lines is about 0.11 micrometer.
- the ideal diameter of the bit line contact plug is about 0.13 to 0.14 micrometer.
- the distance between two bit lines cannot be less than 0.11 micrometer.
- the diameter of the bit line contact plug is usually larger than the distance between two neighboring bit lines. If misalignment occurs during the formation of the bit lines, two neighboring bit lines may possibly encroach on two neighboring bit line contact plugs.
- FIG. 1G shows two neighboring bit line encroaching on two neighboring bit line contact plugs because of misalignment in photolithography. The juxtaposition can cause a short circuit, resulting in failure of the operation of a DRAM device.
- an object of the present invention is to provide a method for fabricating the bit line and the bit line contact plug of a semiconductor memory device, especially to avoid a bit line encroaching on two neighboring bit line contact plugs, which can cause short circuit or failure of the DRAM device.
- a method of fabricating a bit lines and a bit line contact plug according to an embodiment of the present invention is disclosed.
- a semiconductor substrate having a transistor, comprising at least one diffused region formed thereon and overlaid by a first insulating layer is provided.
- a first masking layer is formed on the first insulating layer.
- the first masking layer and the first insulating layer are defined to form a first trench, which is above the diffusion region.
- a second masking layer is formed to fill up the first trench.
- a hole is formed by removing a portion of the second masking layer, which is above the diffusion region.
- a bit line contact window is formed by removing a portion of the first insulating layer right beneath the hole until the surface of the diffusion region is exposed.
- a bit line contact plug is formed by forming a first conductive layer to fill the bit line contact window.
- the residual second masking layer is removed to form a second trench. Thereafter, the first masking layer is removed.
- a bit line is formed by forming a second conductive layer to fill the second trench, Thus, the fabrication of the bit line and the bit line contact plug of a memory cell is complete.
- FIG. 1A shows a layout of memory cell array of DRAM cells.
- FIGS. 1B through 1F show schematic cross-sectional views of a partially fabricated integrated circuit structure at successive stages in the formation of the bit line and the bit line contact plug of a DRAM cell of the prior art
- FIG. 1G shows schematic cross-sectional views of two neighboring bit lines encroaching on two neighboring bit line contact plugs because of misalignment in photolithography
- FIGS. 2A through 2F show schematic cross-sectional views of a partially fabricated integrated circuit structure at successive stages in the formation of the bit line and the bit line contact plug of a DRAM cell according to an embodiment of the present invention.
- the invention disclosed herein is directed to a method of fabricating a bit line and a bit line contact plug of DRAMs.
- numerous details are set forth in order to provide a thorough understanding of the present invention. It will be appreciated by ones skilled in the art that variations of these specific details are possible while still achieving the results of the present invention. Well-known processing steps are not described in detail in order to not obscure the present invention.
- the semiconductor substrate 200 is composed of silicon or germanium.
- the substrate 200 can be made by Epitaxial silicon or silicon on insulator (SOI).
- SOI silicon on insulator
- a field insulating layer (not shown) is formed by shallow trench isolation and oxidation. The field insulating layer isolates the active area (not shown).
- ordinary semiconductor process such as deposition, photolithography or ion implantation is used to form the transistor (not shown).
- the transistor is composed of a gate (not shown) and diffusion areas, such as the source/drain region 212 .
- a first insulating layer 220 which has a thickness of about 6000 to 10000 angstroms, can be made of BPSG, non-doped silicate glass, high density plasma oxide, or TEOS.
- the first insulating layer 220 can be formed by CVD, APCVD, SAPCVD, LPCVD, PECVD, and high density plasma CVD. Thereafter, the first insulating layer 220 is planarized by thermal reflow, etchback or chemical mechanical polishing (CMP) techniques.
- a first masking layer 226 which can be made of nitride or polycrystalline silicon, is formed on the first insulating layer 220 .
- the first masking layer 226 has a thickness of about 1500 to 3000 angstroms.
- the first masking layer 226 is defined.
- the first insulating layer 220 is defined using the first masking layer 226 as a mask.
- a portion of the first masking layer 226 and the first insulating layer 220 are removed by anisotropic etching to form a trench 240 , which is above the source/ drain region 212 .
- the trench 240 has a depth of about 1500 to 3000 angstroms.
- a second masking layer 242 which is made of nitride or polycrystalline silicon, is formed on the first masking layer 226 and fills the trench 240 .
- the second masking layer 242 can be formed by LPCVD and has a thickness of about 2000 to 4000 angstroms.
- the materials of the second masking layer 242 and the first masking layer 226 have to be different for the present invention. If the first masking layer 226 is made of nitride, the second masking layer 242 has to be made of polycrystalline silicon. On the other hand, if the first masking layer 226 is made of polycrystalline silicon, the second masking layer 242 has to be made of nitride.
- the second masking layer 242 on the first masking layer 226 is removed but the portion in the trench 240 remains.
- the first masking layer 226 is used as the stop layer.
- the remaining second masking layer 242 takes as the residual second masking layer 242 ′ hereinafter.
- a portion of the residual second masking layer 242 ′ above the source/drain region 212 is removed by photolithography and etching to form a hole 241 . Then, using the first masking layer 226 and the residual second masking layer 242 ′ as a mask, an etching is performed to remove a portion of the first insulating layer 220 right beneath the hole 241 until the surface of the source/drain region 212 is exposed. Then, a bit line contact window 260 is formed.
- the etching is usually an anisotropic etching, using carbon fluoride and its relative compound gases, such as C 2 F 4 , C 4 F 6 , C 4 F 8 , and C 5 F 8 as etchant, the etching rate of nitride or polycrystalline silicon is much lower than that of oxide. In this situation, the etching selectivity of nitride or polycrystalline silicon to oxide is 1:10.
- the carbon fluoride and its relative compound gases are bombarded into a free radical state, such as CF and CF 2 , by plasma during anisotropic etching. These radicals easily react with oxygen molecules contained in the BPSG, which is the first insulating layer 220 , to form CO 2 gas.
- the CO 2 gas then dissipates into the air.
- the carbon fluoride and its relative compound gases radicals react very little with silicon molecules contained in the first masking layer 226 or second masking layer 242 .
- the flow rate of the carbon fluoride compounds is about 5 to 50 sccm (standard cc per minute); the reaction pressure is about 30 to 80 m Torr; and the reaction time is about 1 to 10 minutes.
- a first conductive layer (not shown) is formed on the first masking layer 226 and fills up the bit line contact window 260 .
- the first conductive layer which can be made of polycrystalline silicon, tungsten, tungsten silicide or other metal silicide formed by LPCVD, has a thickness of about 2000 to 4000 angstroms.
- the first conductive layer on the first masking layer 226 is then removed.
- the first conductive layer remaining in the bit line contact window 260 forms the bit line contact plug 265 .
- isotropic etching is performed to remove the residual second masking layer 242 ′ and then the trench 240 is recovered. Since the material of the first masking layer 226 is different from that of the residual second masking layer 242 ′, after the residual second masking layer is removed, the first masking layer 226 remains.
- the first masking layer 226 is removed by isotropic etching.
- a second conductive layer (not shown) is formed on the first insulating layer 220 and fills up the trench 240 .
- the second conductive layer which can be made of polycrystalline silicon, tungsten, tungsten silicide or other metal silicide formed by LPCVD, has a thickness of about 2000 to 4000 angstroms.
- the second conductive layer on the first insulating layer 220 is then removed.
- the second conductive layer remaining in the trench 262 forms the bit line 270 .
- the fabrication of a bit line 270 and bit line contact plug 265 of a memory cell is then completed.
Abstract
A method of fabricating a bit line contact plug of a memory cell is disclosed. First, a semiconductor substrate having a transistor, comprising at least one diffused region is provided. A first insulating layer is formed on the substrate. A first masking layer is formed on the first insulating layer. The first masking layer and the first insulating layer are defined to form a first trench, which is above the diffusion region. A second masking layer is formed to fill the first trench. the materials of the first masking and the second masking are different. A hole is formed by removing the portion of the second masking layer, which is above the diffusion region. By using the first masking layer and the residual second masking layer as the mask, a bit line contact window is formed by removing a portion of the first insulating layer right beneath the hole until the surface of the diffusion region is exposed. A bit line contact plug is formed by forming a first conductive layer to fill the bit line contact window. The residual second masking layer is removed to form a second trench. Thereafter, the first masking layer is removed. A bit line is formed by forming a second conductive layer to fill the second trench, Thus, the fabrication of the bit line and the bit line contact plug of a memory cell is complete.
Description
- 1. Field of the Invention
- The present invention relates to a method of fabricating a bit line and contact plug for a dynamic random access memory (DRAM) cell, and more particularly to the fabrication of a bit line and a bit line contact plug for the DRAM cell.
- 2. Description of the Prior Art
- A DRAM cell comprises a metal-oxide-semiconductor field effect transistor (MOSFET) and a capacitor that are built in a semiconductor silicon substrate. There is an electrical contact between the drain of a MOSFET and the bottom storage electrodes of the adjacent capacitor, forming a memory cell of the DRAM device. A large number of memory cells make up the cell arrays, which combine with the peripheral circuit to produce DRAMs.
- In recent years, the dimensions of the MOSFETs have continuously shrunk so that the packing densities of these DRAM devices have increased considerably; thus, the dimensions of the MOSFETs and capacitors have become smaller; the line width of word lines, bit lines, and metal lines have become narrower; the distance between two bit lines, word lines or metal lines have also become closer. Since bit line contact plug connects bit line and drain region, and the bit line is on the top of the bit line contact plug. In conventional processes, formation of the bit line contact plug usually takes place before that of the bit line. The conventional processes for fabrication of the bit line and the bit line contract plug follow.
- Referring to FIG. 1A, in this figure,
bit lines 160,word lines 102,active areas 104, source/drain region 112, and bitline contact plug 142 are shown on the layout of the memory cell array of a DRAM cell. - FIG. 1B is a sectional view along the A-A line of FIG. 1A. In conventional processes, a
semiconductor substrate 100 is provided, using a LOCOS Oxidation process to form a field insulating layer (not shown) on thesubstrate 100. The field insulating layer isolates each Active Area. Thereafter, ordinary semiconductor processes, such as deposition, photolithography and ion implantation are used to form the transistor (not shown). The transistor is composed of a gate (not shown) and diffusion areas, such as the source/drain region 112. Then, a firstinsulating layer 120, which is made of borophosphosilicate glass (identified as BPSG hereafter), is formed to isolate the gate. - Referring to FIG. 1C, a
photoresist layer 130 is formed on the firstinsulating layer 120. After thephotoresist layer 130 is defined, the firstinsulating layer 120 is defined to form a bitline contact window 140, which exposes the surface of the source/drain region 112. - Referring to FIG. 1D, a first conductive layer (not shown) is deposited to fill up the bit
line contact window 140. Then, a bitline contact plug 142 is formed, which electrically connects the source/drain region 112. - Referring to FIG. 1E, by photolithography and etching, the top portion of the bit
line contact plug 142 is defined to form atrench 150. - Referring to FIG. 1F, a
bit line 160 is formed by depositing a second conductive layer (not shown) to fill up thetrench 150. Thebit line 160 electrically connects the source/drain region 112 through the bitline contact plug 142. Manufacture of the bit line and the bit line contact plug of a memory cell is then completed. - Since memory devices have become highly integrated, the line width of a memory cell has been reduced to less than 0.08 micrometer. For conductive structures, however, the narrowed line width increases electrical resistance, and thus, increases the loss of current and heat generated by the device, and decreases the efficiency of the device. Accordingly, to reduce the electrical resistance, the increased line width of a device is necessary. And hence, in order to reduce the electrical resistance between the bit line contact plug and the source/drain region or the bit line and the bit line contact, enlarging the diameter of the bit line contact plug is necessary. Note the processes of a 0.14-micrometer device as an example. The distance between two neighboring bit lines is also about 0.14 micrometer. In order to reduce the electrical resistance, the ideal diameter of the bit line contact plug is about 0.17 to 0.18 micrometer. Using the processes of a 0.11 micrometer device as another example, the distance between two neighboring bit lines is about 0.11 micrometer. The ideal diameter of the bit line contact plug is about 0.13 to 0.14 micrometer. The distance between two bit lines cannot be less than 0.11 micrometer. The diameter of the bit line contact plug is usually larger than the distance between two neighboring bit lines. If misalignment occurs during the formation of the bit lines, two neighboring bit lines may possibly encroach on two neighboring bit line contact plugs. FIG. 1G shows two neighboring bit line encroaching on two neighboring bit line contact plugs because of misalignment in photolithography. The juxtaposition can cause a short circuit, resulting in failure of the operation of a DRAM device.
- Accordingly, an object of the present invention is to provide a method for fabricating the bit line and the bit line contact plug of a semiconductor memory device, especially to avoid a bit line encroaching on two neighboring bit line contact plugs, which can cause short circuit or failure of the DRAM device.
- In order to achieve the above object, a method of fabricating a bit lines and a bit line contact plug according to an embodiment of the present invention is disclosed. A semiconductor substrate having a transistor, comprising at least one diffused region formed thereon and overlaid by a first insulating layer is provided. A first masking layer is formed on the first insulating layer. The first masking layer and the first insulating layer are defined to form a first trench, which is above the diffusion region. A second masking layer is formed to fill up the first trench. A hole is formed by removing a portion of the second masking layer, which is above the diffusion region. A bit line contact window is formed by removing a portion of the first insulating layer right beneath the hole until the surface of the diffusion region is exposed. A bit line contact plug is formed by forming a first conductive layer to fill the bit line contact window. The residual second masking layer is removed to form a second trench. Thereafter, the first masking layer is removed. A bit line is formed by forming a second conductive layer to fill the second trench, Thus, the fabrication of the bit line and the bit line contact plug of a memory cell is complete.
- The accompanying drawings form a material part of this description, in which:
- FIG. 1A shows a layout of memory cell array of DRAM cells.
- FIGS. 1B through 1F show schematic cross-sectional views of a partially fabricated integrated circuit structure at successive stages in the formation of the bit line and the bit line contact plug of a DRAM cell of the prior art;
- FIG. 1G shows schematic cross-sectional views of two neighboring bit lines encroaching on two neighboring bit line contact plugs because of misalignment in photolithography; and
- FIGS. 2A through 2F show schematic cross-sectional views of a partially fabricated integrated circuit structure at successive stages in the formation of the bit line and the bit line contact plug of a DRAM cell according to an embodiment of the present invention.
- The invention disclosed herein is directed to a method of fabricating a bit line and a bit line contact plug of DRAMs. In the following description, numerous details are set forth in order to provide a thorough understanding of the present invention. It will be appreciated by ones skilled in the art that variations of these specific details are possible while still achieving the results of the present invention. Well-known processing steps are not described in detail in order to not obscure the present invention.
- Referring now to FIG. 2A, a
semiconductor substrate 200 is provided. Thesemiconductor substrate 200 is composed of silicon or germanium. Thesubstrate 200 can be made by Epitaxial silicon or silicon on insulator (SOI). For simplicity, a P-typesemiconductor silicon substrate 200 is taken as an example in this invention. A field insulating layer (not shown) is formed by shallow trench isolation and oxidation. The field insulating layer isolates the active area (not shown). Then, ordinary semiconductor process, such as deposition, photolithography or ion implantation is used to form the transistor (not shown). The transistor is composed of a gate (not shown) and diffusion areas, such as the source/drain region 212. Next, a first insulatinglayer 220, which has a thickness of about 6000 to 10000 angstroms, can be made of BPSG, non-doped silicate glass, high density plasma oxide, or TEOS. The first insulatinglayer 220 can be formed by CVD, APCVD, SAPCVD, LPCVD, PECVD, and high density plasma CVD. Thereafter, the first insulatinglayer 220 is planarized by thermal reflow, etchback or chemical mechanical polishing (CMP) techniques. Afirst masking layer 226, which can be made of nitride or polycrystalline silicon, is formed on the first insulatinglayer 220. Thefirst masking layer 226 has a thickness of about 1500 to 3000 angstroms. - Referring to FIG. 2B, the
first masking layer 226 is defined. The first insulatinglayer 220 is defined using thefirst masking layer 226 as a mask. A portion of thefirst masking layer 226 and the first insulatinglayer 220 are removed by anisotropic etching to form atrench 240, which is above the source/drain region 212. Thetrench 240 has a depth of about 1500 to 3000 angstroms. - Referring to FIG. 2C, a
second masking layer 242, which is made of nitride or polycrystalline silicon, is formed on thefirst masking layer 226 and fills thetrench 240. Thesecond masking layer 242 can be formed by LPCVD and has a thickness of about 2000 to 4000 angstroms. The materials of thesecond masking layer 242 and thefirst masking layer 226 have to be different for the present invention. If thefirst masking layer 226 is made of nitride, thesecond masking layer 242 has to be made of polycrystalline silicon. On the other hand, if thefirst masking layer 226 is made of polycrystalline silicon, thesecond masking layer 242 has to be made of nitride. Then, by etch back or planarization, thesecond masking layer 242 on thefirst masking layer 226 is removed but the portion in thetrench 240 remains. In this step, thefirst masking layer 226 is used as the stop layer. The remainingsecond masking layer 242 takes as the residualsecond masking layer 242′ hereinafter. - Referring to FIG. 2D, a portion of the residual
second masking layer 242′ above the source/drain region 212 is removed by photolithography and etching to form ahole 241. Then, using thefirst masking layer 226 and the residualsecond masking layer 242′ as a mask, an etching is performed to remove a portion of the first insulatinglayer 220 right beneath thehole 241 until the surface of the source/drain region 212 is exposed. Then, a bitline contact window 260 is formed. The etching is usually an anisotropic etching, using carbon fluoride and its relative compound gases, such as C2F4, C4F6, C4F8, and C5F8 as etchant, the etching rate of nitride or polycrystalline silicon is much lower than that of oxide. In this situation, the etching selectivity of nitride or polycrystalline silicon to oxide is 1:10. The carbon fluoride and its relative compound gases are bombarded into a free radical state, such as CF and CF2, by plasma during anisotropic etching. These radicals easily react with oxygen molecules contained in the BPSG, which is the first insulatinglayer 220, to form CO2 gas. The CO2 gas then dissipates into the air. The carbon fluoride and its relative compound gases radicals react very little with silicon molecules contained in thefirst masking layer 226 orsecond masking layer 242. The flow rate of the carbon fluoride compounds is about 5 to 50 sccm (standard cc per minute); the reaction pressure is about 30 to 80 m Torr; and the reaction time is about 1 to 10 minutes. - Referring to FIG. 2E, a first conductive layer (not shown) is formed on the
first masking layer 226 and fills up the bitline contact window 260. The first conductive layer, which can be made of polycrystalline silicon, tungsten, tungsten silicide or other metal silicide formed by LPCVD, has a thickness of about 2000 to 4000 angstroms. The first conductive layer on thefirst masking layer 226 is then removed. The first conductive layer remaining in the bitline contact window 260 forms the bitline contact plug 265. Afterwards, isotropic etching is performed to remove the residualsecond masking layer 242′ and then thetrench 240 is recovered. Since the material of thefirst masking layer 226 is different from that of the residualsecond masking layer 242′, after the residual second masking layer is removed, thefirst masking layer 226 remains. - Referring to FIG. 2F, the
first masking layer 226 is removed by isotropic etching. A second conductive layer (not shown) is formed on the first insulatinglayer 220 and fills up thetrench 240. The second conductive layer, which can be made of polycrystalline silicon, tungsten, tungsten silicide or other metal silicide formed by LPCVD, has a thickness of about 2000 to 4000 angstroms. The second conductive layer on the first insulatinglayer 220 is then removed. The second conductive layer remaining in the trench 262 forms thebit line 270. The fabrication of abit line 270 and bitline contact plug 265 of a memory cell is then completed. - It is to be understood that although the present invention has been described with reference to a particular preferred embodiment, it should be appreciated that numerous modifications, variations and adaptations may be made without departing from the scope of the invention as defined in the claims.
Claims (16)
1. A method of fabricating bit line contact plug of a memory cell, comprising:
providing a semiconductor substrate having a transistor, comprising at least one diffused region, formed thereon and overlaid by a first insulating layer;
forming a first masking layer on said first insulating layer;
defining said first masking layer and said first insulating layer to form a first trench, which is above the diffusion region;
forming a second masking layer to fill said first trench;
forming a hole by removing the portion of said second masking layer which is above the diffusion region;
forming a bit line contact window by removing a portion of said first insulating layer right beneath said hole until the surface of said diffusion region is exposed;
forming a bit line contact plug by forming a first conductive layer to fill said bit line contact window;
removing said residual second masking layer to form a second trench;
removing said first masking layer; and
forming a bit line by forming a second conductive layer to fill up said second trench.
2. The method of claim 1 , wherein the semiconductor substrate is made of silicon.
3. The method of claim 1 , wherein said first insulating layer is composed of a material selected from the group consisting of BPSG, non-doped silicate glass, high density plasma oxide, or TEOS.
4. The method of claim 1 , wherein said first insulating layer has a thickness of about 6000 to 10000 angstroms.
5. The method of claim 1 , wherein said first masking layer is composed of a material selected from the group consisting of nitride and polycrystalline silicon.
6. The method of claim 1 , wherein said first masking layer has a thickness of about 1500 to 3000 angstroms.
7. The method of claim 1 , wherein said first trench has a depth of about 1500 to 3000 angstroms.
8. The method of claim 1 , wherein said second masking layer is composed of a material selected from the group consisting of nitride and polycrystalline silicon.
9. The method of claim 1 , wherein said second masking layer has a thickness of about 2000 to 4000 angstroms.
10. The method of claim 1 , wherein the material of said first masking layer and said second masking layer are different.
11. The method of claim 1 , wherein the formation of said bit line contact window is accomplished by anisotropic etching.
12. The method of claim 10 , wherein said anisotropic etching is performed using an etchant composed of a material selected from the group consisting of carbon fluoride, C2F4, C4F6, C4F8, and C5F8.
13. The method of claim 1 , wherein said first conductive layer is composed of a material selected from the group consisting of polycrystalline silicon, tungsten, tungsten silicide or other metal silicide.
14. The method of claim 1 , wherein said first conductive layer has a thickness of about 2000 to 4000 angstroms.
15. The method of claim 1 , wherein said second conductive layer is composed of a material selected from the group consisting of polycrystalline silicon, tungsten, tungsten silicide or other metal silicide.
16. The method of claim 1 , wherein said second conductive layer has a thickness of about 2000 to 4000 angstroms.
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TW090104624A TW478133B (en) | 2001-02-27 | 2001-02-27 | Manufacturing method of the bit line contact plug of semiconductor memory cell |
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US6300235B1 (en) * | 1997-06-30 | 2001-10-09 | Siemens Aktiengesellschaft | Method of forming multi-level coplanar metal/insulator films using dual damascene with sacrificial flowable oxide |
US6323118B1 (en) * | 1998-07-13 | 2001-11-27 | Taiwan Semiconductor For Manufacturing Company | Borderless dual damascene contact |
US6165898A (en) * | 1998-10-23 | 2000-12-26 | Taiwan Semiconductor Manufacturing Company | Dual damascene patterned conductor layer formation method without etch stop layer |
-
2001
- 2001-02-27 TW TW090104624A patent/TW478133B/en not_active IP Right Cessation
- 2001-08-24 US US09/939,110 patent/US6680254B2/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10217707B2 (en) * | 2016-09-16 | 2019-02-26 | International Business Machines Corporation | Trench contact resistance reduction |
WO2022198950A1 (en) * | 2021-03-22 | 2022-09-29 | 长鑫存储技术有限公司 | Preparation method for semiconductor structure and semiconductor structure |
Also Published As
Publication number | Publication date |
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US6680254B2 (en) | 2004-01-20 |
TW478133B (en) | 2002-03-01 |
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