US20020047140A1 - Arrangement in a power mosfet - Google Patents
Arrangement in a power mosfet Download PDFInfo
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- US20020047140A1 US20020047140A1 US09/906,697 US90669701A US2002047140A1 US 20020047140 A1 US20020047140 A1 US 20020047140A1 US 90669701 A US90669701 A US 90669701A US 2002047140 A1 US2002047140 A1 US 2002047140A1
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- 239000000463 material Substances 0.000 claims description 3
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- 229910052796 boron Inorganic materials 0.000 description 2
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- 238000002513 implantation Methods 0.000 description 1
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- 229920005591 polysilicon Polymers 0.000 description 1
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- H01L29/0843—Source or drain regions of field-effect devices
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
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Definitions
- the invention relates to power MOS transistors and more specifically to an arrangement for improving linearity and efficiency of such transistors.
- a power MOS transistor consists of an intrinsic structure that repeats itself over and over again.
- a power MOS transistor can be seen as a plurality of small transistor segments connected in parallel.
- the power MOS transistor operates with its source terminal connected to ground and its drain terminal connected to a positive supply voltage.
- the threshold voltage is desired to be uniform throughout the transistor so that current sharing is equal between the transistor segments and maximum efficiency is obtained when the transistor is operating at full power. This is to say that all transistor segments shall have the same threshold voltage.
- the quiescent drain current is a relatively small contributor to the total drain current consumption at full output power, typically around 10%, and thus has little impact on overall efficiency.
- Linearity performance is also a strong function of gate DC bias.
- the object of the invention is to improve efficiency and linearity in a power MOS transistor under backed-off operating conditions with maintained peak power capability.
- the threshold voltage is graded throughout the transistor.
- FIG. 1 is a cross-sectional view of two transistor segments of a power MOS transistor according to the invention.
- FIG. 1 is a cross-sectional view of two adjacent transistor segments of a power LDMOS transistor according to the invention.
- the transistor is built into a p + silicon substrate 1 with a p ⁇ epitaxial layer 2 on its one side and a source metal layer (not shown) on its other side.
- Deep diffused p + regions 8 allow for current to pass from the n + source regions 4 to the p + substrate 1 with minimal voltage drop by means of clamps 9 , i.e. metallic contacts, that short-circuit the n + source regions 4 and the p + regions 8 .
- the threshold voltage of the transistor segments is traditionally desired to be uniform throughout the transistor so that current sharing is equal between the transistor segments and maximum efficiency is obtained when the transistor is operating at full power.
- the threshold voltage of the transistor segments is gradually adjusted throughout the transistor.
- groups of transistor segments will have different threshold voltages. These groups do not have to be located on one and the same die but can be located on different interconnected dies.
- gate DC bias of the transistor according to the invention will be adjusted as to allow a quiescent drain current to flow only through the part of the transistor with the lowest threshold voltage.
- the threshold voltage of an LDMOS transistor segment is determined by the gate oxide thickness, the concentration of boron under the gate, and the choice of gate finger material.
- the threshold voltage was adjusted for an LDMOS transistor operating in the 1.8-2.0 GHz region, so that one half of the transistor had a threshold voltage that was approximately 0.3 V lower than that of the other half.
- IMD intermodulation distortion
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Abstract
Description
- The invention relates to power MOS transistors and more specifically to an arrangement for improving linearity and efficiency of such transistors.
- A power MOS transistor consists of an intrinsic structure that repeats itself over and over again. Thus, a power MOS transistor can be seen as a plurality of small transistor segments connected in parallel.
- The power MOS transistor operates with its source terminal connected to ground and its drain terminal connected to a positive supply voltage.
- When a positive voltage on its gate terminal exceeds a threshold voltage of the transistor, an n-type inversion region will form underneath its gate, allowing for current to pass between its drain and source.
- Traditionally, the threshold voltage is desired to be uniform throughout the transistor so that current sharing is equal between the transistor segments and maximum efficiency is obtained when the transistor is operating at full power. This is to say that all transistor segments shall have the same threshold voltage.
- In e.g. a power LDMOS transistor operating in class AB, a gate DC bias voltage slightly above the threshold voltage will cause a quiescent drain current to flow through the transistor.
- The quiescent drain current is a relatively small contributor to the total drain current consumption at full output power, typically around 10%, and thus has little impact on overall efficiency.
- At low levels of output power (so called backed-off conditions), this is no longer true. Here, the quiescent drain current is a significant, or even the dominant, contributor to total drain current consumption.
- In an LDMOS transistor, linearity will improve significantly as output power is decreased, which is why the backed-off mode of operation is of particular interest.
- Linearity performance is also a strong function of gate DC bias.
- There exists an optimal quiescent drain current value that results in best linearity performance at a given output power level. To lower the quiescent drain current further in order to improve efficiency will degrade the linearity.
- The object of the invention is to improve efficiency and linearity in a power MOS transistor under backed-off operating conditions with maintained peak power capability.
- This is attained in accordance with the invention in that at least one group of said transistor segments has another threshold voltage than the rest of the transistor segments.
- Thus, the threshold voltage is graded throughout the transistor.
- Hereby, more and more of the transistor, i.e. actually more and more transistor segments, will become active as the input voltage on its gate terminal is increased, allowing for improved efficiency and/or linearity under backed-off operating conditions with maintained peak power capability.
- The invention will be described more in detail below with reference to the appended drawing on which FIG. 1 is a cross-sectional view of two transistor segments of a power MOS transistor according to the invention.
- FIG. 1 is a cross-sectional view of two adjacent transistor segments of a power LDMOS transistor according to the invention.
- However, it is to be understood that the invention is not restricted to just LDMOS transistors.
- In a manner known per se, the transistor is built into a p+ silicon substrate 1 with a p−
epitaxial layer 2 on its one side and a source metal layer (not shown) on its other side. - n+ source regions 4 and drain regions, each comprising an n+
drain contact region 3 surrounded on both sides by n− drift regions 5, are provided in the p− layer 2. A drain metal finger D is provided on top of the n+drain contact region 3. - Gate fingers G are embedded in
dielectric layers 7 on both sides of the drain metal finger D on top of the p− layer 2. A p-well 6 is diffused laterally under eachgate finger 7 from its source side. - Deep diffused p+ regions 8 allow for current to pass from the n+ source regions 4 to the p+ substrate 1 with minimal voltage drop by means of
clamps 9, i.e. metallic contacts, that short-circuit the n+ source regions 4 and the p+ regions 8. - As indicated in the introductory portion, the threshold voltage of the transistor segments is traditionally desired to be uniform throughout the transistor so that current sharing is equal between the transistor segments and maximum efficiency is obtained when the transistor is operating at full power.
- However, as also indicated above, when the threshold voltage of the transistor segments is uniform throughout the transistor, efficiency and linearity is not optimised when the transistor operates under so-called backed-off conditions, i.e. below its 1 dB compression point.
- According to the invention, the threshold voltage of the transistor segments is gradually adjusted throughout the transistor. In practice, groups of transistor segments will have different threshold voltages. These groups do not have to be located on one and the same die but can be located on different interconnected dies.
- In operation, gate DC bias of the transistor according to the invention will be adjusted as to allow a quiescent drain current to flow only through the part of the transistor with the lowest threshold voltage.
- As input signal voltage is increased, more and more of the transistor, i.e. more and more of the transistor segments, will become active, allowing for improved efficiency and linearity under backed-off operating conditions with maintained peak power capability.
- The threshold voltage of an LDMOS transistor segment is determined by the gate oxide thickness, the concentration of boron under the gate, and the choice of gate finger material.
- There are multiple ways to achieve graded threshold voltages in a transistor.
- The most practical option to achieve graded threshold voltages is to vary the p-well doping.
- It is normal practice to use one mask layer to define regions where the p-well implant is introduced into the silicon and then do one boron implantation followed by a furnace drive-in cycle.
- To achieve graded threshold voltages, it is also possible to use multiple p-well implant masks and
- use different p-well implant doses or implant energies or implant tilt angles for different transistor segments and still follow up with one common furnace drive-in cycle,
- use the same p-well implant dose each time but different sequential drive-in cycles or
- use a combination of the above methods.
- Other options to achieve graded threshold voltages in the transistor would be to
- vary the amount of n+ source lateral diffusion between the transistor segments using the same methods as described above,
- introduce varying degrees of threshold adjustment implants prior to gate formation,
- use polysilicon gate fingers with varying doping between transistor segments, or even use different gate materials or
- vary the gate oxide thickness between transistor segments.
- Depending on the exact process set-up, more options should readily be available to anyone skilled in the art.
- If two or more separate transistor dies with different threshold voltages are assembled in parallel in the same package, the basic principle is still valid.
- By adjusting e.g. the p-well implant tilt angle, the threshold voltage was adjusted for an LDMOS transistor operating in the 1.8-2.0 GHz region, so that one half of the transistor had a threshold voltage that was approximately 0.3 V lower than that of the other half.
- As a consequence, two-tone intermodulation distortion (IMD), which is a common measure of linearity performance, was improved by approximately 3 dB at an output power level 17 dB below its 1 dB compression point, compared to the case with uniform threshold voltage.
Claims (10)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0002714A SE518797C2 (en) | 2000-07-19 | 2000-07-19 | Power LDMOS transistor comprising a plurality of parallel-connected transistor segments with different threshold voltages |
SE0002714-4 | 2000-07-19 | ||
SE0002714 | 2000-07-19 |
Publications (2)
Publication Number | Publication Date |
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US20020047140A1 true US20020047140A1 (en) | 2002-04-25 |
US6818951B2 US6818951B2 (en) | 2004-11-16 |
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Application Number | Title | Priority Date | Filing Date |
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US09/906,697 Expired - Lifetime US6818951B2 (en) | 2000-07-19 | 2001-07-18 | Arrangement in a power mosfet |
Country Status (7)
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US (1) | US6818951B2 (en) |
EP (1) | EP1310000A1 (en) |
CN (1) | CN1291496C (en) |
AU (1) | AU2001271188A1 (en) |
SE (1) | SE518797C2 (en) |
TW (1) | TW486822B (en) |
WO (1) | WO2002007223A1 (en) |
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6503786B2 (en) | 2000-08-08 | 2003-01-07 | Advanced Power Technology, Inc. | Power MOS device with asymmetrical channel structure for enhanced linear operation capability |
US20040267325A1 (en) * | 2003-06-27 | 2004-12-30 | Frederick Geheb | Method and apparatus for enhancement of chest compressions during CPR |
US20050101889A1 (en) * | 2003-11-06 | 2005-05-12 | Freeman Gary A. | Using chest velocity to process physiological signals to remove chest compression artifacts |
US20050256415A1 (en) * | 2004-05-12 | 2005-11-17 | Qing Tan | ECG rhythm advisory method |
US20060025824A1 (en) * | 2004-05-12 | 2006-02-02 | Freeman Gary A | Automatic therapy advisor |
US20060231905A1 (en) * | 2003-05-02 | 2006-10-19 | Roedle Thomas C | Electronic device comprising a field effect transistor for high-frequency aplications |
CN1324716C (en) * | 2003-02-18 | 2007-07-04 | 株式会社东芝 | Semiconductor device |
US20070287404A1 (en) * | 2006-06-08 | 2007-12-13 | Torkel Arnborg | Apparatus and method for exploiting reverse short channel effects in transistor devices |
US20110260246A1 (en) * | 2002-08-14 | 2011-10-27 | Advanced Analogic Technologies, Inc. | Isolated Transistor |
WO2013071959A1 (en) * | 2011-11-15 | 2013-05-23 | X-Fab Semiconductor Foundries Ag | A mos device assembly |
US9257504B2 (en) | 2002-09-29 | 2016-02-09 | Advanced Analogic Technologies Incorporated | Isolation structures for semiconductor devices |
US20160172011A1 (en) * | 2014-12-12 | 2016-06-16 | International Business Machines Corporation | Cmos transistor bias temperature instability based chip identifier |
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US9601614B2 (en) * | 2015-03-26 | 2017-03-21 | Nxp Usa, Inc. | Composite semiconductor device with different channel widths |
US10610679B2 (en) | 2015-03-27 | 2020-04-07 | Zoll Medical Corporation | ECG and defibrillator electrode detection and tracking system and method |
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Also Published As
Publication number | Publication date |
---|---|
US6818951B2 (en) | 2004-11-16 |
EP1310000A1 (en) | 2003-05-14 |
CN1443371A (en) | 2003-09-17 |
SE0002714L (en) | 2002-01-20 |
SE0002714D0 (en) | 2000-07-19 |
CN1291496C (en) | 2006-12-20 |
TW486822B (en) | 2002-05-11 |
WO2002007223A1 (en) | 2002-01-24 |
AU2001271188A1 (en) | 2002-01-30 |
SE518797C2 (en) | 2002-11-19 |
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