US12384804B2 - Composition, film, display device and article prepared therefrom, and method of preparing article - Google Patents
Composition, film, display device and article prepared therefrom, and method of preparing articleInfo
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- US12384804B2 US12384804B2 US18/310,214 US202318310214A US12384804B2 US 12384804 B2 US12384804 B2 US 12384804B2 US 202318310214 A US202318310214 A US 202318310214A US 12384804 B2 US12384804 B2 US 12384804B2
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/63—Additives non-macromolecular organic
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- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
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- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
- C08G65/005—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
- C08G65/007—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/336—Polymers modified by chemical after-treatment with organic compounds containing silicon
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/46—Block-or graft-polymers containing polysiloxane sequences containing polyether sequences
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/54—Nitrogen-containing linkages
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/549—Silicon-containing compounds containing silicon in a ring
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
- C08L71/02—Polyalkylene oxides
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/10—Block- or graft-copolymers containing polysiloxane sequences
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2150/00—Compositions for coatings
Definitions
- the present disclosure relates to a composition, a film, a display device and an article prepared therefrom, and a method of preparing the article.
- functionality of such a functional layer may be deteriorated by continuous or repeated contacts of a finger or a tool with the functional layer.
- a method for preparing an article including:
- Example embodiments of inventive concepts are described herein with reference to cross-sectional illustrations that are schematic illustrations of idealized embodiments of example embodiments. As such, variations from the shapes of the illustrations as a result, for example, of manufacturing techniques and/or tolerances, are to be expected. Thus, example embodiments of inventive concepts should not be construed as limited to the particular shapes of regions illustrated herein but are to include deviations in shapes that result, for example, from manufacturing. For example, a region illustrated or described as flat may, typically, have rough and/or nonlinear features. Moreover, sharp angles that are illustrated may be rounded. Thus, the regions illustrated in the figures are schematic in nature and their shapes are not intended to illustrate the precise shape of a region and are not intended to limit the scope of the present description and claims.
- At least one of R i and R j may be, for example, a substituted or unsubstituted C1 to C20 alkoxy group, a halogen, or a hydroxy group.
- composition including the compound having a fluorine-containing (poly)ether group, wherein the compound is represented by Formula 1 and the heteroatom-containing cyclic silane compound represented by Formula 2 or Formula 3 may be used as a material for coating a surface of a substrate.
- the display surface When a coating film is formed on a surface of a display, the display surface may be abraded due to a contact of a finger, etc., with the passage of time, thereby lowering durability of the display.
- the composition includes both of the compound having a fluorine-containing (poly)ether group represented by Formula 1 and the heteroatom-containing cyclic silane compound represented by Formula 2 or Formula 3, in the course of forming a coating film, the heteroatom-containing cyclic silane compound is bonded to a polar functional group, such as a hydroxy group, of a substrate through a ring-opening reaction even without water.
- a polar functional group such as a hydroxy group
- the composition may form a heteroatom-containing terminal functional group, and the heteroatom-containing terminal functional group may function as a catalyst a hydrolysis and/or polycondensation reaction of the compound having a fluorine-containing (poly)ether group, or may be used as a reactant in a hydrolysis and/or polycondensation reaction of the compound having a fluorine-containing (poly)ether group.
- a coating film which is more solid and has improved durability can be obtained.
- the chamber Since the inside of a chamber is under vacuum, for example, in deposition or coating, the chamber is substantially in an anhydrous condition. It is difficult to carry out a hydrolysis and/or polycondensation reaction on the substrate surface by the compound having a fluorine-containing (poly)ether group, which has been vaporized inside the chamber, to a perform the hydrolysis and/or polycondensation reaction on the substrate surface by the compound having a fluorine-containing (poly)ether group. The efficiency of the hydrolysis reaction and/or the polycondensation reaction on the substrate surface is lowered during deposition or coating by using only the compound having a fluorine-containing (poly)ether group.
- the durability of the coating film obtained through the hydrolysis reaction and/or polycondensation reaction may also be lowered.
- the composition including not only the compound having a fluorine-containing (poly)ether group but also the heteroatom-containing cyclic silane compound the heteroatom-containing cyclic silane compound is bound to the surface of the substrate through a ring-opening reaction even in an anhydrous condition.
- the heteroatom-containing cyclic silane compound has a ring strain and is capable of easily forming a bond with a hydrophilic functional group on a substrate even without water.
- the compound produced through a ring-opening reaction of the heteroatom-containing cyclic silane compound includes a heteroatom-containing terminal functional group at a side opposite to the substrate.
- the heteroatom-containing terminal functional group e.g., an amine group and/or thiol group, involves in the hydrolysis reaction and/or polycondensation reaction of the compound having a fluorine-containing (poly)ether group as a catalyst and/or a reactant. Therefore, the efficiency of the hydrolysis reaction and/or polycondensation reaction of the compound having a fluorine-containing (poly)ether group may be noticeably improved. Consequently, the durability of the obtained coating film is improved.
- the compound produced by the hydrolysis and/or polycondensation reaction of the compound produced through a ring-opening reaction of the heteroatom-containing cyclic silane compound represented by Formula 2 or Formula 3 and the compound produced by the hydrolysis and/or polycondensation reaction of the compound having a fluorine-containing (poly)ether group represented by Formula 1 includes a linking group capable of forming a non-covalent interaction with adjacent molecules between the fluorine-containing (poly)ether moiety and the silane group.
- the compounds prepared from the composition through the above-described reactions firmly maintain inter-chain interactions, and thus reduce or prevent damage and/or destruction of the bonding of the coating film due to frequent frictions.
- the surface coating film may not be easily worn away due to the frequent frictions but may have reinforced durability. More specifically, since a non-covalent interaction, for example, a hydrogen bond, is maintained between a non-covalent electron pair of an amino group or an amide group included in the compound produced by the hydrolysis reaction and/or the polycondensation reaction of a ring-opening reaction product of the heteroatom-containing cyclic silane compound represented by Formula 2 or Formula 3 and the compound having a fluorine-containing (poly)ether group, wherein the compound is represented by Formula 1, and a hydrogen atom of an amide group included in an adjacent compound, a coating film prepared from the composition may have further improved durability.
- a non-covalent interaction for example, a hydrogen bond
- the silane group included in the heteroatom-containing cyclic silane compound may not include a hydrolytic group. Even if a hydrolytic group is included in the silane group, the silane group included in the heteroatom-containing cyclic silane compound may easily form a bond on the substrate or the underlying layer by the ring strain, as described herein,
- the silane not including a hydrolytic group may be, for example, a silane substituted by a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group.
- the silane group may be a silane substituted by at least one hydrolytic group.
- the silane group may be more easily bonded to the substrate or the underlying layer.
- the silane substituted by at least one hydrolytic group may be, for example, a silane substituted by at least one substituted or unsubstituted C1 to C20 alkoxy group, a halogen atom or a hydroxy group.
- the hydrolytic silane group may be bonded to a substrate or an underlying layer through a hydrolysis and/or polycondensation reaction.
- the bonding may be, for example, a covalent bond.
- a hydrolytic silane group may be subjected to a hydrolysis and/or polycondensation reaction during coating of a composition, thereby forming a network including a hydrolysis product and/or a polycondensation product of silane.
- the hydrolysable group may include, for example, a C1-C10 alkoxy group, a halogen atom, or a hydroxy group, and examples thereof may include a C1-C8 alkoxy group, such as a methoxy group or an ethoxy group. Specifically, the methoxy group has excellent hydrolytic reactivity.
- the silane group is bonded to a substrate or an underlying layer by a ring-opening reaction of the heteroatom-containing cyclic silane compound, and a heteroatom-containing functional group is disposed at an opposite side (i.e., an atmosphere side) to the substrate or the underlying layer.
- the heteroatom-containing functional group may be, for example, an amine group or a thiol group.
- the compound represented by Formula 1 is linked to the heteroatom-containing functional group through a hydrolysis and/or polycondensation reaction.
- the compound represented by Formula 1 for example, has a perfluoroether(poly)ether (PFPE) group as the fluorine-containing (poly)ether group, and a functional group having reactivity with respect to the heteroatom-containing functional group is linked to the PFPE group.
- PFPE perfluoroether(poly)ether
- Examples of the functional group having reactivity with respect to the heteroatom-containing functional group may include, but not limited to, an ester group, an acrylate group, an epoxy group, a malate group, an anhydride group, a cyclic carbonate group, or any suitable functional group capable of reacting with the heteroatom-containing functional group may be suitably used.
- the compound produced by linking the compound represented by Formula 1 to the heteroatom-containing functional group derived from a heteroatom-containing cyclic silane compound through the hydrolysis and/or polycondensation reaction includes, for example, an amide bond.
- a hydrogen bond is formed between amide bonds included in the produced compounds, and thus the compounds each including an amide bond may be more firmly bonded to each other. Therefore, a film formed from such a composition may have further improved abrasion resistance.
- the compound represented by Formula 1 may be, for example, a compound represented by Formula 4: Rf a —O-Lf b -(L1) p2 -Q1 Formula 4
- Lfb is a (poly)oxyalkylene group including one or more eating units of the formula —CFXO—, —CFXCFXO—, —CF2CF2CF2O—, —CF2CF2CF2O—, or —CF2CF2CF2CF2O—, the number of repeating units is, for example, 2 to 510, 2 to 410, 2 to 310, 2 to 210, or 2 to 110 2 to 510, and X is, for example, Cl, Br, or I.
- Rf a is perfluoroether or perfluoropolyether.
- the fluorine-containing (poly)ether groups included in the compounds represented by Formulas 1 and 4 may have a structure in which a CF 3 O group, a CF 3 CF 2 O group, or a CF 3 CF 2 CF 2 O group, for example, is present at ends thereof, and —(CF 2 CF 2 O) m — and —(CF 2 O) n — are bound to the CF 3 O group, the CF 3 CF 2 O group, or the CF 3 CF 2 CF 2 O group, regardless of order.
- n and n are each independently an integer of, for example, 1 to 110, 5 to 100, 10 to 80, 10 to 70, 10 to 50, or 10 to 40, and m+n is in a range of, for example, 2 to 210, 2 to 200, 2 to 150, 5 to 100, or 10 to 50.
- the fluorine-containing (poly)ether groups included in the compounds represented by Formulas 1 and 4 may have a structure in which a CF 3 O group, a CF 3 CF 2 O group, or a CF 3 CF 2 CF 2 O group, for example, is present at ends thereof, and —(CF 2 CF 2 O) m —, —(CF 2 O) n1 —, and —(CF 2 CF 2 CF 2 O) n2 — are bound to the CF 3 O group, the CF 3 CF 2 O group, or the CF 3 CF 2 CF 2 O group, regardless of order.
- n1, and n2 are each independently an integer of, for example, 1 to 110, 5 to 100, 10 to 80, 10 to 70, 10 to 50, or 10 to 40, and m+n1+n2 is in a range of, for example, 3 to 310, 3 to 300, 3 to 250, 3 to 200, 5 to 150, 10 to 110, or 10 to 50.
- the fluorine-containing (poly)ether groups included in the compounds represented by Formulas 1 and 4 may have a structure in which a CF 3 O group, a CF 3 CF 2 O group, or a CF 3 CF 2 CF 2 O group is present at ends thereof, and —(CF 2 CF 2 O) m —, —(CF 2 O) n1 —, —(CF 2 CF 2 CF 2 O) n2 —, and —(CF 2 CF 2 CF 2 O) n3 — are bound to the CF 3 O group, the CF 3 CF 2 O group, or the CF 3 CF 2 CF 2 O group, regardless of order.
- the compound represented by Formula 2 or Formula 3 includes compounds represented by Formulas 6 to 8:
- the compound represented by Formula 2 or Formula 3 may include, for example, compounds represented by Formulas 9 to 11:
- the compound represented by Formula 2 or Formula 3 may include, for example, compounds represented by Formulas 12a to 12n:
- the fluorine-containing (poly)ether group may have a weight average molecular weight of, for example, about 1,000 grams per mole (g/mol) to about 20,000 g/mol, about 1,000 g/mol to about 15,000 g/mol, about 1,000 g/mol to about 10,000 g/mol, about 2,000 g/mol to about 9,000 g/mol, about 3,000 g/mol to about 8,000 g/mol, about 3,000 g/mol to about 7,000 g/mol, or about 3,000 g/mol to about 6,000 g/mol.
- g/mol grams per mole
- a mixing molar ratio of the silane compound represented by Formula 1 and the amine compound represented by Formula 2 may be, for example, about 1:0.1 to about 1:10, about 1:0.2 to about 1:10, about 1:0.5 to about 1:10, about 1:0.8 to about 1:10, about 1:1 to about 1:10, or about 1:1 to about 1:5.
- the compound represented by Formula 1 and the compound represented by Formula 2 or Formula 3 may be applied onto a substrate in a liquid phase.
- a mixing molar ratio of the compound represented by Formula 1 and the compound represented by Formula 2 or Formula 3 may be, for example, about 1:0.1 to about 1:10, about 1:0.2 to about 1:10, about 1:0.5 to about 1:10, about 1:0.8 to about 1:10, about 1:1 to about 1:10, or about 1:1 to about 1:5.
- a composition including the compound represented by Formula 1 and the compound represented by Formula 2 or Formula 3 may be impregnated into a substrate in a liquid phase or may be injected into a vessel, the prepared composition may be vaporized to then be fed to a chamber, and the composition in a gas phase may be applied onto the substrate.
- a mixing molar ratio of the compound represented by Formula 1 and the compound represented by Formula 2 or Formula 3 included in the gas-phase composition obtained in the chamber may be, for example, about 1:0.1 to about 1:10, about 1:0.2 to about 1:10, about 1:0.5 to about 1:10, about 1:0.8 to about 1:10, about 1:1 to about 1:10, or about 1:1 to about 1:5.
- the compound represented by Formula 1 and the compound represented by Formula 2 or Formula 3 may be impregnated into separate substrates in a liquid phase or may be injected into separate vessels, respectively, the prepared products may be vaporized to then be fed to a chamber along separate supply lines and mixed therein, thereby obtaining a gas-phase composition, and the obtained gas-phase composition may be supplied to the substrate.
- a mixing molar ratio of the compound represented by Formula 1 and the compound represented by Formula 2 or Formula 3 included in the gas-phase composition obtained in the chamber may be, for example, about 1:0.1 to about 1:10, about 1:0.2 to about 1:10, about 1:0.5 to about 1:10, about 1:0.8 to about 1:10, about 1:1 to about 1:10, or about 1:1 to about 1:5.
- the mixing molar ratio of the gas-phase composition may be determined by feeding rates of the compound represented by Formula 1 and the compound represented by Formula 2 or Formula 3, which are supplied to the chamber.
- a pressure in the chamber may not be higher than the atmospheric pressure.
- the pressure in the chamber may be, for example, about 101325 Pa or less, about 10000 Pa or less, about 5000 Pa or less, about 1000 Pa or less, about 500 Pa or less, about 100 Pa or less, about 50 Pa or less, or about 10 Pa or less.
- the pressure in the chamber may be, for example, about 1 Pa to about 101325 Pa, about 1 Pa to about 10000 Pa, about 1 Pa to about 5000 Pa, about 1 Pa to about 1000 Pa, about 1 Pa to about 500 Pa, about 1 Pa to about 50 Pa, or about 1 Pa to about 10 Pa.
- the composition may further include a solvent.
- the solvent may be, for example, a fluorinated ether-based solvent.
- the fluorinated ether-based solvent may include 1,1,2,2-Tetrafluoroethyl-2,2,3,3-tetrafluoropropyl ether, 1,1,2,2-tetrafluoroethyl-1H,1H,5H-octafluoropeityl ether, 1,1,2,2-Tetrafluoroethyl-2,2,2-trifluoroethyl ether, or a mixture thereof, but are not limited thereto.
- the composition may further include an additive.
- the composition may further include an additive capable of interacting with the compound represented by Formula 1 and/or the compound represented by Formula 2 or Formula 3.
- the additive may be an acyclic silane compound having a fluorine-containing (poly)ether group.
- the composition may firmly maintain inter-chain interactions among adjacent molecular chains of a plurality of polycondensation products, and thus reduce or prevent damage and/or destruction of the bonding of the plurality of polycondensation products due to frequent frictions.
- the composition may prevent a surface coating material from being easily worn away due to frequent frictions and may reinforce the durability.
- the additive may include, for example, an acyclic silane compound represented by Formula 13 and 14: CF 3 (CF 2 ) h O(CF 2 CF 2 O) i (CF 2 O) j (CH 2 O) k —(CR 17 R 18 ) p4 —C( ⁇ O)—NH—(CH 2 ) p5 —Si(R 19 )(R 20 )(R 21 ) Formula 13 CF 3 (CF 2 ) h O(CF 2 CF 2 O) i (CF 2 O) j (CH 2 O) k —(CR 17 R 18 ) p3 —C( ⁇ O)—N((CH 2 ) p4 —Si(R 19 )(R 20 )(R 21 ))((CH 2 ) p6 —Si(R 22 )(R 23 )(R 24 ))
- Formula 14 CF 3 (CF 2 ) h O(CF 2 CF 2 O) i (CF 2 O)
- a film according to an embodiment may include a ring-opening reaction product of a compound represented by Formula 2 or Formula 3, a compound including a ring-opening reaction product of the compound represented by Formula 2 or Formula 3 and the fluorine-containing (poly)ether group represented by Formula 1, or a polycondensation product of a ring-opening reaction product of the compound represented by Formula 2 or Formula 3 and a compound represented by Formula 1, or a combination thereof.
- the film may have improved durability.
- a ring-opening reaction product of a compound means a resultant product obtained by a ring-opening reaction, and optionally subsequent hydrolysis and/or polycondensation, of the heteroatom-containing cyclic silane compound.
- the resultant product of the ring-opening reaction may be, for example, a compound bonded to a substrate.
- a polycondensation product of a compound means a resultant product obtained by a polycondensation reaction of a compound having a fluorine-containing (poly)ether group and a ring-opening reaction product of a cyclic silane compound.
- the film may include, for example, a ring-opening reaction product of the compound represented by Formula 2 or Formula 3.
- the film may further include a compound represented by Formula 1.
- a mixing molar ratio of the ring-opening reaction product of the compound represented by Formula 2 or Formula 3 and the compound represented by Formula 1, included in the film may be, for example, about 1:0.1 to about 1:10, about 1:0.2 to about 1:10, about 1:0.5 to about 1:10, about 1:0.8 to about 1:10, about 1:1 to about 1:10, or about 1:1 to about 1:5.
- the film may include, for example, a polycondensation product of the ring-opening reaction product of the compound represented by Formula 2 or Formula 3 and the compound represented by Formula 1.
- the film may be formed by forming a polycondensation product through a polycondensation reaction after the ring-opening reaction product of the heteroatom-containing cyclic silane compound is bonded to a substrate surface, an end of the ring-opening reaction product and the compound represented by Formula 1.
- the film may include, for example, a polycondensation product of the compound represented by Formula 2 or Formula 3 and the compound represented by Formula 1.
- the film may be formed by binding a forming a polycondensation product through a cyclic silane compound with a substrate surface through a ring-opening reaction after forming a polycondensation product of the compound represented by Formula 2 or Formula 3 and the compound represented by Formula 1 through a polycondensation reaction.
- the film may have a thickness of, for example, about 1 micrometer ( ⁇ m) or less, about 500 nanometer (nm) or less, about 100 nm or less, about 50 nm or less, about 40 nm or less, about 30 nm or less, about 20 nm or less, or about 15 nm or less.
- the film may be disposed on, for example, a substrate.
- a silane group of the polycondensation product of the ring-opening reaction product of the compound represented by Formula 2 or Formula 3 and the compound represented by Formula 1 may be boned to the substrate, and a fluorine-containing (poly)ether group may be arranged at a surface (air) side.
- the polycondensation product of the ring-opening reaction product of the compound represented by Formula 2 or Formula 3 and the compound represented by Formula 1 may be arranged in a substantially perpendicular to the substrate.
- the film may be a non-self-supporting film that is disposed on a substrate and requires a substrate.
- Anti-fingerprint coating performance of a film may be quantified by analyzing a water contact angle and/or a diiodomethane contact angle at room temperature, for example, 25° C.
- a contact angle of a film may be measured using water.
- the film may have an improved contact angle by including a fluorine-containing (poly)ether group on a surface thereof.
- the film may have good slipperiness and water repellency.
- the film may have a contact angle of, for example, about 100° or greater, about 105° or greater, about 110° or greater, or about 115° or greater, for example, about 100° to about 180°, about 105° to about 180°, about 110° to about 180°, about 115° to about 180°, or about 120° to about 180°.
- the contact angle may be measured by using a Sessile drop technique.
- a liquid used in measuring the contact angle may be water, and the contact angle may be measured by dropping a predetermined amount (about 3 microliter ( ⁇ l)) of water on a film surface using a Drop Shape Analyzer (DSA100, KRUSS, Germany).
- the film may maintain a high contact angle even after frequent frictions.
- Durability of a film may be evaluated by measuring a contact angle change after multiple times of friction. For example, after an abrasion test (5,000 times of rubbing) with a rubber eraser having a load of 1 kilogram (kg), the film may have a contact angle change of about 20° or less, about 18° or less, about 15° or less, about 12° or less, or about 10° or less, for example, about 0.5° to about 20°, about 1° to about 20°, about 1° to about 15°, about 1° to about 12°, about 1° to about 10°, or about 1° to about 5°.
- the film may have a contact angle of about 95° or greater even after an abrasion test (1,000 times of rubbing) with a rubber eraser having a load of 1 kg.
- the film may have a contact angle of about 50° or greater even after an abrasion test (10,000 times of rubbing) with a rubber eraser having a load of 1 kg.
- the film may have a contact angle of about 95° to about 175°, about 75° to about 175°, about 60° to about 175°, or about 50° to about 175° even after an abrasion test (1,000 times of rubbing) with a rubber eraser having a load of 1 kg.
- a contact angle of a film may be measured using diiodomethane.
- the film may have a contact angle of, for example, about 90° or greater, about 95° or greater or about 97° or greater, for example, about 90° to about 180°, about 95° to about 180°, about 97° to about 180°, about 100° to about 170°, or about 110° to about 180°.
- the contact angle may be measured by using a Sessile drop technique.
- a liquid used in measuring the contact angle may be diiodomethane, and the contact angle may be measured by dropping a predetermined amount (about 2.7 ⁇ l) of diiodomethane on a film surface using a Drop Shape Analyzer (DSA100, KRUSS, Germany).
- a display device includes a film including a ring-opening reaction product of a compound represented by Formula 2 or Formula 3, a compound including a ring-opening reaction product of the compound represented by Formula 2 or Formula 3, the fluorine-containing (poly)ether group represented by Formula 1, or a combination thereof, or a polycondensation product of a ring-opening reaction product of the compound represented by Formula 2 or Formula 3, a compound represented by Formula 1, or a combination thereof.
- the display device includes a film including a ring-opening reaction product and a polycondensation product of the above-described compound.
- the display device may have improved durability.
- a display device 100 includes a display panel 50 and a functional film 10 A.
- the display panel 50 may be, for example, an organic light emitting panel or a liquid crystal panel.
- the display panel 50 may be, for example, a bendable display panel, a foldable display panel, or a rollable display panel.
- the functional film 10 A may include the film or a stacked structure thereof, and may be disposed on the side of an observer. Another layer may be further disposed between the display panel 50 and the functional film 10 A. For example, a monolayer or a plurality of layers of a polymer layer (not shown) and optionally a transparent adhesive layer (not shown) may be further disposed between the display panel 50 and the functional film 10 A.
- a display device 200 includes a display panel 50 , a functional film 10 A, and a touch screen panel 70 disposed between the display panel 50 and the functional film 10 A.
- the display panel 50 may be, for example, an organic light emitting panel or a liquid crystal panel.
- the display panel 50 may be, for example, a bendable display panel, a foldable display panel, or a rollable display panel.
- the functional film 10 A may include the film or a stacked structure thereof, and may be disposed on the side of an observer.
- a monolayer or a plurality of layers of a polymer layer (not shown) and optionally a transparent adhesive layer (not shown) may be further disposed between the touch screen panel 70 and the functional film 10 A.
- Another layer may be further disposed between the touch screen panel 70 and the display panel 50 .
- a monolayer or a plurality of layers of a polymer layer (not shown) and optionally a transparent adhesive layer (not shown) may be further disposed between the touch screen panel 70 and the display panel 50 .
- the functional film 10 A including the film or a stacked structure thereof may be applied to a variety of electronic devices including a display device. Specifically, the functional film 10 A may be applied to, for example, a smartphone, a tablet PC, a camera, a touch screen panel, etc., but not limited thereto.
- An article may include a substrate; and a film disposed on the substrate, wherein the film includes a ring-opening reaction product of a compound represented by Formula 2 or Formula 3, a compound including a ring-opening reaction product of the compound represented by Formula 2 or Formula 3 and the fluorine-containing (poly)ether group represented by Formula 1, or a polycondensation product of a ring-opening reaction product of the compound represented by Formula 2 or Formula 3 and a compound having a fluorine-containing (poly)ether group represented by Formula 1, or a combination thereof.
- the article may have improved durability.
- a substrate may include, for example, ceramic, glass or a polymer, but not limited thereto.
- the film may be formed on the substrate to then be disposed thereon.
- the substrate and the film may form, for example, a stacked structure.
- the stacked structure may further include one or more layers between the substrate and the film.
- the stacked structure may be a transparent film, for example, a transparent flexible film.
- the film or the stacked structure may be attached on a display panel.
- the display panel and the film or the stacked structure may be directly bonded or may be bonded by interposing an adhesive.
- the display panel may be, for example, a liquid crystal panel or an organic light emitting panel, but not limited thereto.
- the film or the stacked structure may be disposed on the side of an observer. Examples of the article may include a mobile display device, a fixed display device, a display for an automobile, a display for an airplane, a head-up display (HUD), a mobile sensor, a fixed sensor, or an optical article, but not limited thereto.
- HUD head-up display
- a method for preparing an article according to an embodiment include applying the above-described composition onto a substrate to place a film thereon.
- the compound represented by Formula 1 and the compound represented by Formula 2 or Formula 3 may be applied onto the substrate in a liquid phase or a gas phase, for example.
- the film may be formed by, for example, coating using a solution process in which the composition is supplied in a liquid phase, or deposition using a dry process in which the composition is supplied in a gas phase. Therefore, the film may be a coating film or a deposition film.
- the applying of the composition onto the substrate to place the film thereon the substrate may include coating a solution prepared by dissolving or dispersing the composition in a solvent on the substrate by, for example, spin coating, slit coating, inkjet printing, spray coating or dipping, and drying.
- the applying of the composition onto the substrate in a gas phase to place the film thereon the substrate may include coating the composition on the substrate by, for example, thermal deposition, vacuum deposition, or chemical vapor deposition.
- the solvent may be, for example, a fluorinated ether-based solvent.
- fluorinated ether-based solvent may include 1,1,2,2-Tetrafluoroethyl-2,2,3,3-tetrafluoropropyl ether, 1,1,2,2-tetrafluoroethyl-1H,1H,5H-octafluoropeityl ether, 1,1,2,2-Tetrafluoroethyl-2,2,2-trifluoroethyl ether, or a mixture thereof, but are not limited thereto.
- the method may further include placing an interlayer.
- the interlayer may include a metal oxide.
- the metal oxide may be, for example, silica (SiO 2 ).
- the interlayer may be, for example, a primer layer of SiO 2 .
- the primer layer may have a thickness of about 100 nm or less, about 50 nm or less, about 30 nm or less, about 20 nm or less, about 10 nm or less, or about 7 nm or less, for example, about 0.1 nm to about 100 nm, about 1 nm to about 100 nm, about 7 nm to about 100 nm, about 10 nm to about 100 nm, about 20 nm to about 100 nm, about 30 nm to about 100 nm, about 50 nm to about 100 nm, about 70 nm to about 100 nm, or about 80 nm to about 100 nm.
- substituents of a substituted alkylene group, a substituted oxyalkylene group, a substituted alkoxy group, a substituted alkyl group, and a substituted aryl group each independently represent a halogen, a hydroxy group, a C1 to C5 alkyl group, a C1 to C5 alkoxy group, or a combination thereof.
- alkyl refers to a fully saturated branched or non-branched (or straight or linear) hydrocarbon.
- Non-limiting examples of the “alkyl” may include methyl, ethyl, i-propyl, isopropyl, i-butyl, isobutyl, sec-butyl, i-pentyl, isopentyl, neopentyl, i-hexyl, 3-methylhexyl, 2,2-dimethylpentyl, 2,3-dimethylpentyl, and i-heptyl.
- halogen atom or “halogen” includes fluorine, bromine, chlorine, and iodine.
- alkoxy refers to alkyl-O—, and the alkyl is the same as described above.
- Non-limiting examples of the alkoxy may include methoxy, ethoxy, propoxy, 2-propoxy, butoxy, tert-butoxy, pentyloxy, hexyloxy, cyclopropoxy, and cyclohexyloxy.
- At least one hydrogen atom in the alkoxy group may be substituted by the same substituent as that of the alkyl group.
- alkylthio refers to “alkyl-S—”, where the alkyl is the same as defined above.
- alkylthio group may include a thiomethyl group, a thioethyl group, a thiopropyl group, a 2-thiopropyl group, a thiobutyl group, a thio-tert-butyl group, a thiopentyl group, a thiohexyl group, a thiocyclopropyl group, and a thiocyclohexyl group.
- At least one hydrogen atom in the alkylthio group may be substituted with the same substituent as described above in connection with the alkyl group.
- aryl refers to an aromatic hydrocarbon including one or more rings.
- aryl also includes a functional group having an aromatic ring fused with one or more cycloalkyl rings.
- Non-limiting examples of the “aryl” group include phenyl, naphthyl, and tetrahydronaphthyl.
- at least one hydrogen atom in the aryl group may be substituted by the same substituent as that of the alkyl group.
- arylthio refers to aryl-S—, where the aryl is the same as defined above.
- Non-limiting examples of the arylthio group may include a thiophenyl group, a thionaphthyl group, or a thiotetrahydronaphthyl group.
- At least one hydrogen atom of the “arylthio” group may be substituted with the same substituent as described above in connection with the alkyl group.
- hetero refers to a functional group including 1 to 4 heteroatoms that are N, O, S, Se, Te, or P.
- a glass substrate having 7 nm thick SiO 2 thermally deposited and a tablet having the composition impregnated therein were placed in a chamber.
- the composition vaporized in the vacuum chamber was deposited on the glass substrate under vacuum to produce a glass substrate having 10 nm thick film disposed thereon.
- the composition was prepared in the same manner as in Example 1, except that a molar ratio of ester compound (A) and cyclic silane compound (B) was changed to 1:1.5, and a glass substrate having 10 nm thick film disposed thereon was then prepared using the composition.
- the composition was prepared in the same manner as in Example 1, except that a molar ratio of ester compound (A) and cyclic silane compound (B) was changed to 1:3, and a glass substrate having 10 nm thick film disposed thereon was then prepared using the composition.
- the obtained product was dissolved in a Novec 7200 solvent and then purified by allowing the solution to pass through silica gel, thereby obtaining CF 3 O(CF 2 CF 2 O) p (CF 2 O) q CF 2 C( ⁇ O)NHCH 2 CH ⁇ CH 2 .
- trimethoxy silane was added thereto, followed by stirring at 60° C. for 12 hours.
- unreacted trimethoxy silane was removed under high-temperature vacuum conditions of 80° C.
- a glass substrate having a 10 nm thick film disposed thereon was prepared in the same manner as in Example 1, except that the composition was used.
- a film was prepared in the same manner as in Example 1, except that a commercially available perfluoro (poly)ether silane compound (OPTOOL US509, Daikin) was used.
- OPTOOL US509 commercially available perfluoro (poly)ether silane compound
- Durability of a film may be evaluated by measuring a contact angle change due to friction.
- An initial contact angle was evaluated by using a Sessile drop technique and measured by dropping water dropwise on each film at 25° C. with a Drop shape analyzer (DSA100, KRUSS, Germany).
- the respective films were rubbed multiple times (5000 times (5K), 10000 times (10K), 12000 times (12K), 15000 times (15K), and 20000 times (20K)) using a polyurethane rubber eraser having a load of 1 kg and a width of 6 mm.
- a water contact angle was measured in the same manner as the initial contact angle, and Table 1 summarizes numbers of times of rubbing, in which the water contact angle was maintained at about 100° or greater. As the number of times of rubbing increases, the film has improved durability.
- the slipperiness was evaluated by measuring a coefficient of friction (COF) at 25° C. using a standard measuring method provided in the manual of a friction tester (model FPT-F1, Labthink). Some of COF measurement results are shown in Table 1.
- COF coefficient of friction
- the numbers of times of rubbing of the films prepared in Examples 1 to 7 were all 10K or greater, in which contact angles of 100° or greater were maintained.
- the numbers of times of rubbing of the films prepared in Examples 1, 2 and 4 to 6 were all 12K or greater, and the contact angles of the films were maintained at 100° or greater.
- the films prepared in Examples 1 to 7 showed a coefficient of friction of 0.1 or less, suggesting that good slipperiness was attained, like the films prepared in Comparative Examples 1 and 2.
- a film prepared from the composition and a display and an article including the film may have improved durability.
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Abstract
-
- wherein, in Formulas 1 to 3,
- Rf is a fluorine-containing (poly)ether group, and
- L1, Q1, p1, q1, q2, q3, A1, A2, A3, Ra, Rb, Ri, Rj, Rc, Rd, Re, Rf, Rg, Rh, Rk, Rl, Rm, Rn, Ro, Rp, Rq, Rr, Rs, and Rt are as described in the detailed description.
Description
-
- a compound having a fluorine-containing (poly)ether group, wherein the compound is represented by Formula 1; and
- a heteroatom-containing cyclic silane compound represented by Formula 2 or Formula 3:
-
- wherein, in Formulas 1 to 3,
- Rf is a fluorine-containing (poly)ether group,
- L1 is a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C1 to C20 oxyalkylene group, or a combination thereof,
- Q1 is —C(═O)O—R1, —C(═O)—O—C(═O)—R2, —O—(C═O)—CR3═CR4R5, —O—(C═O)—CR6═CR7—(C═O)—O—R8, —O—C(═O)—O—R9, an epoxy-containing group, or a cyclic carbonate-containing group,
- p1 is an integer of 1 to 10,
- q1, q2, and q3 are each independently an integer of 1 to 10,
- A1, A2, and A3 are each independently ═N—Ru or —S—,
- R1, R2, R5, R8, and R9 are each independently a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group,
- R3, R4, R6, and R7 are each independently a hydrogen, a halogen atom, a hydroxy group, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group,
- Ra, Rb, Ri, and Rj are each independently a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, a halogen, or a hydroxy group, and
- Rc, Rd, Re, Rf, Rg, Rh, Rk, Rl, Rm, Rn, Ro, Rp, Rq, Rr, Rs, Rt, and Ru are each independently a hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted C2 to C20 alkenyl group.
-
- a ring-opening reaction product of a compound represented by Formula 2 or Formula 3,
- a compound including a ring-opening reaction product of the compound represented by Formula 2 or Formula 3, and the fluorine-containing (poly)ether group represented by Formula 1, or
- a polycondensation product of a ring-opening reaction product of the heteroatom-containing cyclic silane compound represented by Formula 2 or 3, a compound having a fluorine-containing (poly)ether group represented by Formula 1, or a combination thereof:
-
- wherein, in Formulas 1 to 3,
- Rf is a fluorine-containing (poly)ether group,
- L1 is a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C1 to C20 oxyalkylene group, or a combination thereof,
- Q1 is —C(═O)O—R1, —C(═O)—O—C(═O)—R2, —O—(C═O)—CR3═CR4R5, —O—(C═O)—CR6═CR7—(C═O)—O—R8, —O—C(═O)—O—R9, an epoxy-containing group, or a cyclic carbonate-containing group,
- p1 is an integer of 1 to 10,
- q1, q2, and q3 are each independently an integer of 1 to 10,
- A1, A2, and A3 are each independently ═N—Ru or —S—,
- R1, R2, R5, R8, and R9 are each independently a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group,
- R3, R4, R6, and R7 are each independently a hydrogen, a halogen atom, a hydroxy group, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group,
- Ra, Rb, Ri, and Rj are each independently a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, halogen, or a hydroxy group, and
- Rc, Rd, Re, Rf, Rg, Rh, Rk, Rl, Rm, Rn, Ro, Rp, Rq, Rr, Rs, Rt, and Ru are each independently a hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted C2 to C20 alkenyl group.
-
- a film including a ring-opening reaction product of a compound represented by Formula 2 or Formula 3,
- a film including a compound including a ring-opening reaction product of the compound represented by Formula 2 or Formula 3, and the fluorine-containing (poly)ether group represented by Formula 1, or
- a film including a polycondensation product of a ring-opening reaction product of the compound represented by Formula 2 or Formula 3, a compound having a fluorine-containing (poly)ether group represented by Formula 1, or a combination thereof:
-
- wherein, in the above formulas,
- Rf is a fluorine-containing (poly)ether group,
- L1 is a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C1 to C20 oxyalkylene group, or a combination thereof,
- Q1 is —C(═O)O—R1, —C(═O)—O—C(═O)—R2, —O—(C═O)—CR3═CR4R5, —O—(C═O)—CR6═CR7—(C═O)—O—R8, —O—C(═O)—O—R9, an epoxy-containing group, or a cyclic carbonate-containing group,
- p1 is an integer of 1 to 10,
- q1, q2, and q3 are each independently an integer of 1 to 10,
- A1, A2, and A3 are each independently represent ═N—Ru or —S—,
- R1, R2, R5, R8, and R9 are each independently a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group,
- R3, R4, R6, and R7 are each independently a hydrogen, a halogen atom, a hydroxy group, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group,
- Ra, Rb, Ri, and Rj are each independently a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, a halogen, or a hydroxy group, and
- Rc, Rd, Re, Rf, Rg, Rh, Rk, Rl, Rm, Rn, Ro, Rp, Rq, Rr, Rs, Rt, and Ru are each independently a hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted C2 to C20 alkenyl group.
-
- a substrate; and
- a film disposed on the substrate, wherein
- the film includes
- a ring-opening reaction product of a compound represented by Formula 2 or Formula 3,
- a compound including a ring-opening reaction product of the compound represented by Formula 2 or Formula 3, the fluorine-containing (poly)ether group represented by Formula 1, or a combination thereof, or
- a polycondensation product of a ring-opening reaction product of the compound represented by Formula 2 or Formula 3, a compound having a fluorine-containing (poly)ether group represented by Formula 1, or a combination thereof:
-
- wherein, in Formulas 1 to 3,
- Rf is a fluorine-containing (poly)ether group,
- L1 is a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C1 to C20 oxyalkylene group, or a combination thereof,
- Q1 is —C(═O)O—R1, —C(═O)—O—C(═O)—R2, —O—(C═O)—CR3═CR4R5, —O—(C═O)—CR6═CR7—(C═O)—O—R8, —O—C(═O)—O—R9, an epoxy-containing group, or a cyclic carbonate-containing group,
- p1 is an integer of 1 to 10,
- q1, q2, and q3 are each independently an integer of 1 to 10,
- A1, A2, and A3 are each independently ═N—Ru or —S—,
- R1, R2, R5, R8, and R9 are each independently a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group,
- R3, R4, R6, and R7 are each independently a hydrogen, a halogen atom, a hydroxy group, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group,
- Ra, Rb, Ri, and Rj are each independently a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, a halogen, or a hydroxy group, and
- Rc, Rd, Re, Rf, Rg, Rh, Rk, Rl, Rm, Rn, Ro, Rp, Rq, Rr, Rs, Rt, and Ru are each independently a hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted C2 to C20 alkenyl group.
-
- applying the composition onto the substrate to place a film thereon.
-
- wherein, in the above formulas,
- Rf is a fluorine-containing (poly)ether group,
- L1 is a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C1 to C20 oxyalkylene group, or a combination thereof,
- Q1 is —C(═O)O—R1, —C(═O)—O—C(═O)—R2, —O—(C═O)—CR3═CR4R5, —O—(C═O)—CR6═CR7—(C═O)—O—R8, —O—C(═O)—O—R9, an epoxy-containing group, or a cyclic carbonate-containing group,
- p1 is an integer of 1 to 10, q1, q2, and q3 are each independently an integer of 1 to 10,
- A1, A2, and A3 are each independently ═N—Ru or —S—,
- R1, R2, R5, R8, and R9 are each independently a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group,
- R3, R4, R6, and R7 are each independently a hydrogen, a halogen atom, a hydroxy group, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group,
- Ra, Rb, Ri, and Rj are each independently a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, a halogen, or a hydroxy group, and
- Rc, Rd, Re, Rf, Rg, Rh, Rk, Rl, Rm, Rn, Ro, Rp, Rq, Rr, Rs, Rt, and Ru are each independently a hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted C2 to C20 alkenyl group.
Rfa—O-Lfb-(L1)p2-Q1 Formula 4
-
- wherein, in Formula 4,
- Rfa is a C1 to C20 perfluoroalkyl group,
- Lfb is a (poly)oxyalkylene group including a fluorine-containing C1 to C5 alkylene group,
- L1 is a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C1 to C20 oxyalkylene group, or a combination thereof,
- Q1 is —C(═O)O—R1, —C(═O)—O—C(═O)—R2, —O—(C═O)—CR3═CR4R5, —O—(C═O)—CR6═CR7—(C═O)—O—R8, —O—C(═O)—O—R9, an epoxy-containing group, or a cyclic carbonate-containing group,
- p2 is an integer of 1 to 10,
- R1, R2, R5, R8, and R9 are each independently a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group, and
- R3, R4, R6, and R7 are each independently a hydrogen, a halogen atom, a hydroxy group, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group.
-
- CF3O—(CF2CF2O)m—(CF2O)n—,
- CF3O—(CF2CF2O)m—(CF2O)n1—(CF2CF2CF2O)n2—,
- CF3O—(CF2CF2O)m—(CF2O)n1—(CF2CF2CF2O)n2—(CF2CF2CF2CF2O)n3—,
- CF3O—(CF2CF2O)m—(CF2O)n1—(CF2CF2CF2O)n2—(CF2CF2CF2CF2O)n3—(CF2CF2CF2CF2CF2O)n4—,
- CF3CF2O—(CF2CF2O)m—(CF2O)n—,
- CF3CF2O—(CF2CF2O)m—(CF2O)n1—(CF2CF2CF2O)n2—,
- CF3CF2O—(CF2CF2O)m—(CF2O)n1—(CF2CF2CF2O)n2—(CF2CF2CF2CF2O)n3—,
- CF3CF2O—(CF2CF2O)m—(CF2O)n1—(CF2CF2CF2O)n2—(CF2CF2CF2CF2O)n3—(CF2CF2CF2CF2CF2O)n4—, CF3CF2CF2O—(CF2CF2O)m—(CF2O)n—,
- CF3CF2CF2O—(CF2CF2O)m—(CF2O)n1—(CF2CF2CF2O)n2—,
- CF3CF2CF2O—(CF2CF2O)m—(CF2O)n1—(CF2CF2CF2O)n2—(CF2CF2CF2CF2O)n3—, or
- CF3CF2CF2O—(CF2CF2O)m—(CF2O)n1—(CF2CF2CF2O)n2—(CF2CF2CF2CF2O)n3— (CF2CF2CF2CF2CF2O)n4—.
- wherein m, n1, n2, n3, and n4 are each independently an integer of, for example, 1 to 110, 5 to 100, 10 to 80, 10 to 70, 10 to 50, or 10 to 40. m+n is in a range of, for example, 2 to 210, 2 to 200, 2 to 150, 5 to 100, or 10 to 50. m+n1+n2 is in a range of, for example, 3 to 310, 3 to 300, 3 to 250, 3 to 200, 5 to 150, 10 to 110, or 10 to 50. m+n1+n2+n3 is in a range of, for example, 4 to 410, 4 to 400, 4 to 350, 4 to 300, 4 to 250, 4 to 200, 5 to 150, 10 to 110, or 10 to 50. m+n1+n2+n3+n4 is in a range of, for example, 5 to 510, 5 to 500, 5 to 450, 5 to 400, 5 to 350, 5 to 300, 5 to 250, 5 to 200, 5 to 150, 10 to 110, or 10 to 50.
CF3O—(CF2CF2O)m—(CF2O)n—(CR12R13)p3—C(═O)O—R1 Formula 5a
CF3O—(CF2CF2O)m—(CF2O)n—(CR14R15CR16R17)p3—C(═O)O—R1 Formula 5b
CF3O—(CF2CF2O)m—(CF2O)n—(CR12R13)p3—C(═O)—O—C(═O)—R2 Formula 5c
CF3O—(CF2CF2O)m—(CF2O)n—(CR14R15CR16R17)p3—C(═O)—O—C(═O)—R2 Formula 5d
CF3O—(CF2CF2O)m—(CF2O)n—(CR12R13)p3—O—(C═O)—CR3═CR4R5 Formula 5e
CF3O—(CF2CF2O)m—(CF2O)n—(CR14R15CR16R17)p3—O—(C═O)—CR3═CR4R5 Formula 5f
CF3O—(CF2CF2O)m—(CF2O)n—(CR12R13)p3—O—(C═O)—CR6═CR7—(C═O)—O—R8 Formula 5g
CF3O—(CF2CF2O)m—(CF2O)n—(CR14R15CR16R17)p3—O—(C═O)—CR6═CR7—(C═O)—O—R8 Formula 5h
CF3O—(CF2CF2O)m—(CF2O)n—(CR12R13)p3—O—C(═O)—O—R9 Formula 5i
CF3O—(CF2CF2O)m—(CF2O)n—(CR14R15CR16R17)p3—O—C(═O)—O—R9 Formula 5j
CF3O—(CF2CF2O)m—(CF2O)n—(CR12R13)p3—R10 Formula 5k
CF3O—(CF2CF2O)m—(CF2O)n—(CR14R15CR16R17)p3—R10 Formula 5l
CF3O—(CF2CF2O)m—(CF2O)n—(CR12R13)p3—R11 Formula 5m
CF3O—(CF2CF2O)m—(CF2O)n—(CR14R15CR16R17)p3—R11 Formula 5n
-
- wherein, in the above formulas,
- R10 and R11 are each independently a hydrogen, a C1 to C5 alkyl group, fluorine, or a fluorinated C1 to C5 alkyl group,
- m and n are each independently an integer of 1 to 110, m+n is in a range of 2 to 210, p3 is in a range of 1 to 10,
- R1, R2, R5, R8, and R9 are each independently a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group,
- R3, R4, R6, R7, R12, R13, R14, R15, R16, and R17 are each independently a hydrogen, a halogen atom, a hydroxy group, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group,
- R10 is
-
- R11 is
-
- R18, R19, and R20 are each independently a hydrogen, a halogen atom, a hydroxy group, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group.
-
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2)p3—C(═O)O—CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2)p3—C(═O)O—CH2CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2)p3—C(═O)O—CH2CH2CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2CH2)p3—C(═O)O—CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2CH2)p3—C(═O)O—CH2CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2CH2)p3—C(═O)O—CH2CH2CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CH2)p3—C(═O)O—CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CH2)p3—C(═O)O—CH2CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CH2)p3—C(═O)O—CH2CH2CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2)p3—C(═O)—O—C(═O)—CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2)p3—C(═O)—O—C(═O)—CH2CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2)p3—C(═O)—O—C(═O)—CH2CH2CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2CH2)p3—C(═O)—O—C(═O)—CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2CH2)p3—C(═O)—O—C(═O)—CH2CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2CH2)p3—C(═O)—O—C(═O)—CH2CH2CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CH2)p3—C(═O)—O—C(═O)—CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CH2)p3—C(═O)—O—C(═O)—CH2CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CH2)p3—C(═O)—O—C(═O)—CH2CH2CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2)p3—O—(C═O)—CH═CH2,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2)p3—O—(C═O)—C(CH3)═CH2,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2)p3—O—(C═O)—CH═CHCH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2CH2)p3—O—(C═O)—CH═CH2,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2CH2)p3—O—(C═O)—C(CH3)═CH2,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2CH2)p3—O—(C═O)—CH═CHCH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CH2)p3—O—(C═O)—CH═CH2,
- CF3O—(CF2CF2O)m—(CF2O)n—(CH2)p3—O—(C═O)—C(CH3)═CH2,
- CF3O—(CF2CF2O)m—(CF2O)n—(CH2)p3—O—(C═O)—CH═CHCH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2)p3—O—(C═O)—CH═CH—(C═O)—O—CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2)p3—O—(C═O)—CH═CH—(C═O)—O—CH2CH3,
- CF3O—(CF2CF2O)m—(CF2)n—(CF2)p3—O—(C═O)—CH═CH—(C═O)—O—CH2CH2CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2CH2)p3—O—(C═O)—CH═CH—(C═O)—O—CH3,
- CF3O—(CF2CF2O)m—(CF2)n—(CF2CH2)p3—O—(C═O)—CH═CH—(C═O)—O—CH2CH3,
- CF3O—(CF2CF2O)m—(CF2)n—(CF2CH2)p3—O—(C═O)—CH═CH—(C═O)—O—CH2CH2CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CH2)p3—O—(C═O)—CH═CH—(C═O)—O—CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CH2)p3—O—(C═O)—CH═CH—(C═O)—O—CH2CH3,
- CF3O—(CF2CF2O)m—(CF2)n—(CH2)p3—O—(C═O)—CH═CH—(C═O)—O—CH2CH2CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2)p3—O—C(═O)—O—CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2)p3—O—C(═O)—O—CH2CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2)p3—O—C(═O)—O—CH2CH2CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2CH2)p3—O—C(═O)—O—CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CF2CH2)p3—O—C(═O)—O—CH2CH3,
- CF3O—(CF2CF2O)m—(CF2CH2O)n—(CF2)p3—O—C(═O)—O—CH2CH2CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CH2)p3—O—C(═O)—O—CH3,
- CF3O—(CF2CF2O)m—(CF2O)n—(CH2)p3—O—C(═O)—O—CH2CH3,
- CF3O—(CF2CF2O)m—(CH2O)n—(CF2)p3—O—C(═O)—O—CH2CH2CH3,
-
- wherein m and n are each independently an integer of, for example, 1 to 110, 5 to 100, 10 to 80, 10 to 70, 10 to 50, or 10 to 40,
- m+n is in a range of, for example, 2 to 210, 2 to 200, 2 to 150, 5 to 100, or 10 to 50. p3 is an integer of 1 to 10.
-
- wherein, in the above formulas,
- Ra1, Rb1, Ri1, Rj1, Ra1, and Rb1 are each independently a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C1 to C20 alkyl group, or a hydroxy group, and
- Rd1, Re1, Rg1, Re1, Rm1, Ro1, Rq1, Rs1, Ru1, Ru2, and Ru3 are each independently a hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C2 to C20 alkenyl group.
-
- wherein, in the above formulas,
- Ra2, Rb2, Ri2, and Rj2 are each independently a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C1 to C20 alkyl group, and
- Re2, Ru4, Ru5, and Ru6 are each independently a hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C2 to C20 alkenyl group.
CF3(CF2)hO(CF2CF2O)i(CF2O)j(CH2O)k—(CR17R18)p4—C(═O)—NH—(CH2)p5—Si(R19)(R20)(R21) Formula 13
CF3(CF2)hO(CF2CF2O)i(CF2O)j(CH2O)k—(CR17R18)p3—C(═O)—N((CH2)p4—Si(R19)(R20)(R21))((CH2)p6—Si(R22)(R23)(R24)) Formula 14
-
- wherein, in the above formulas,
- R17 and R18 are each independently a hydrogen, C1-C5 alkyl, fluorine, or a fluorinated C1-C5 alkyl group,
- p4, p5, and p6 are each independently an integer of 1 to 10,
- h and k are each independently an integer of 0 to 10, i and j are each independently an integer of 1 to 100,
- R17, R18, R19, R20, R21, R22, R23, and R24 are each independently a hydrogen, a substituted or unsubstituted C1 to C20 alkoxy group, a halogen atom, a hydroxy group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, or a combination thereof,
- with the proviso that at least one of R19, R20, and R21 is a substituted or unsubstituted C1 to C20 alkoxy group, a halogen atom, or a hydroxy group, and at least one of R22, R23, and R24 is a substituted or unsubstituted C1 to C20 alkoxy group, a halogen atom, or a hydroxy group.
Film
| TABLE 1 | ||||
| Coefficient | Initial | Number of times | ||
| of friction | contact angle | of rubbing | ||
| (COF) | [degree] | [Number of times] | ||
| Example 1 | 0.07 | 117 | 20K |
| Example 2 | 0.06 | 117 | 20K |
| Example 3 | 0.06 | 117 | 10K |
| Example 4 | 0.07 | 117 | 15K |
| Example 5 | 0.06 | 117 | 12K |
| Example 6 | 0.06 | 117 | 15K |
| Example 7 | 0.07 | 116 | 10K |
| Comparative | 0.07 | 118 | 10K |
| Example 1 | |||
| Comparative | 0.07 | 118 | 5K |
| Example 2 | |||
Claims (19)
Rfa—O-Lfb-(L1)p2-Q1 Formula 4
CF3O—(CF2CF2O)m—(CF2O)n—(CR12R13)p3—C(═O)O—R1 Formula 5a
CF3O—(CF2CF2O)m—(CF2O)n—(CR14R15CR16R17)p3—C(═O)O—R1 Formula 5b
CF3O—(CF2CF2O)m—(CF2O)n—(CR12R13)p3—C(═O)—O—C(═O)—R2 Formula 5c
CF3O—(CF2CF2O)m—(CF2O)n—(CR14R15CR16R17)p3—C(═O)—O—C(═O)—R2 Formula 5d
CF3O—(CF2CF2O)m—(CF2O)n—(CR12R13)p3—O—(C═O)—CR3═CR4R5 Formula 5e
CF3O—(CF2CF2O)m—(CF2O)n—(CR14R15CR16R17)p3—O—(C═O)—CR3═CR4R5 Formula 5f
CF3O—(CF2CF2O)m—(CF2O)n—(CR12R13)p3—O—(C═O)—CR6═CR7—(C═O)—O—R8 Formula 5g
CF3O—(CF2CF2O)m—(CF2O)n—(CR14R15CR16R17)p3—O—(C═O)—CR6═CR7—(C═O)—O—R8 Formula 5h
CF3O—(CF2CF2O)m—(CF2O)n—(CR12R13)p3—O—C(═O)—O—R9 Formula 5i
CF3O—(CF2CF2O)m—(CF2O)n—(CR14R15CR16R17)p3—O—C(═O)—O—R9 Formula 5j
CF3O—(CF2CF2O)m—(CF2O)n—(CR12R13)p3—R10 Formula 5k
CF3O—(CF2CF2O)m—(CF2O)n—(CR14R15CR16R17)p3—R10 Formula 5l
CF3O—(CF2CF2O)m—(CF2O)n—(CR12R13)p3—R11 Formula 5m
CF3O—(CF2CF2O)m—(CF2O)n—(CR14R15CR16R17)p3—R11, Formula 5n
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Citations (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5914420A (en) | 1998-05-29 | 1999-06-22 | Pcr, Inc. | Perfluorinated organo substituted cyylosiloxanes and copolymers prepared from these cyclosiloxahes |
| WO2003091186A2 (en) | 2002-04-23 | 2003-11-06 | Gelest, Inc. | Azasilanes and methods for making and using the same |
| KR20070089976A (en) | 2004-12-30 | 2007-09-04 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | Low refractive index fluoropolymer coating composition for use in antireflective polymer films |
| WO2008045953A2 (en) * | 2006-10-10 | 2008-04-17 | Celonova Biosciences, Inc. | Compositions and devices comrising silicone and specific polyphosphazenes |
| US20100084574A1 (en) * | 2008-10-03 | 2010-04-08 | Nordson Corporation | Ultraviolet curing apparatus for continuous material |
| US20100114274A1 (en) * | 2005-06-29 | 2010-05-06 | St. Jude Medical Ab | Surface modification of implantable article |
| WO2011076924A1 (en) | 2009-12-23 | 2011-06-30 | Dsm Ip Assets B.V. | Method to activate silicone rubber surfaces |
| KR101050650B1 (en) | 2007-11-29 | 2011-07-19 | 주식회사 엘지화학 | Coating composition and coating film excellent in wear resistance and fingerprint removal |
| US20120262790A1 (en) * | 2011-04-15 | 2012-10-18 | Qspex Technologies, Inc. | Anti-reflective lenses and methods for manufacturing the same |
| US20130033753A1 (en) * | 2011-04-15 | 2013-02-07 | Qspex Technologies, Inc. | Anti-reflective lenses and methods for manufacturing the same |
| US20130189495A1 (en) | 2010-11-12 | 2013-07-25 | The Regents Of The University Of Michigan | Nanoscale Photolithography |
| JP5987117B2 (en) | 2012-10-10 | 2016-09-07 | キュースペックス テクノロジーズ インコーポレイテッドQspex Technologies,Inc. | Antireflection lens and manufacturing method thereof |
| US20170106129A1 (en) | 2014-05-14 | 2017-04-20 | 1866402 Ontario Limited | Bonded microsphere filter |
| US20180030071A1 (en) * | 2015-06-16 | 2018-02-01 | Gelest Technologies, Inc. | Hydridosilapyrroles, hydridosilaazapyrroles, thiasilacyclopentanes, method for preparation thereof, and reaction products therefrom |
| US10082607B2 (en) | 2011-04-15 | 2018-09-25 | Qspex Technologies, Inc. | Anti-reflective lenses and methods for manufacturing the same |
| US20190127580A1 (en) | 2017-10-27 | 2019-05-02 | Shin-Etsu Chemical Co., Ltd. | Semiconductor Encapsulating Resin Composition and Semiconductor Device |
| US20210054149A1 (en) | 2019-08-21 | 2021-02-25 | Samsung Electronics Co., Ltd. | Silane compound including fluorine-containing poly(ether) group, composition including the same, film formed from the composition, display device, and article |
| US20210261813A1 (en) | 2020-02-21 | 2021-08-26 | Samsung Electronics Co., Ltd. | Composition, film prepared therefrom, display device prepared therefrom, article prepared therefrom, and method of preparing article |
| US20210261738A1 (en) | 2020-02-26 | 2021-08-26 | Samsung Electronics Co., Ltd. | Silane compound including fluorine-containing (poly)ether group, composition including the same, film formed from the composition, display device comprising the film, and article comprising the composition |
| US20220184658A1 (en) | 2020-12-11 | 2022-06-16 | Samsung Electronics Co., Ltd. | Laminate, display including the same, and article including the display |
| US11639361B2 (en) * | 2020-11-20 | 2023-05-02 | Samsung Electronics Co., Ltd. | Composition, film, display device and article prepared therefrom, and method of preparing article |
-
2020
- 2020-11-20 KR KR1020200156928A patent/KR20220069619A/en active Pending
-
2021
- 2021-11-19 US US17/530,534 patent/US11639361B2/en active Active
-
2023
- 2023-05-01 US US18/310,214 patent/US12384804B2/en active Active
Patent Citations (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5914420A (en) | 1998-05-29 | 1999-06-22 | Pcr, Inc. | Perfluorinated organo substituted cyylosiloxanes and copolymers prepared from these cyclosiloxahes |
| WO2003091186A2 (en) | 2002-04-23 | 2003-11-06 | Gelest, Inc. | Azasilanes and methods for making and using the same |
| US20070232822A1 (en) | 2002-04-23 | 2007-10-04 | Gelest, Inc. | Azasilanes and method for making and using the same |
| KR20070089976A (en) | 2004-12-30 | 2007-09-04 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | Low refractive index fluoropolymer coating composition for use in antireflective polymer films |
| US7323514B2 (en) | 2004-12-30 | 2008-01-29 | 3M Innovative Properties Company | Low refractive index fluoropolymer coating compositions for use in antireflective polymer films |
| US20100114274A1 (en) * | 2005-06-29 | 2010-05-06 | St. Jude Medical Ab | Surface modification of implantable article |
| WO2008045953A2 (en) * | 2006-10-10 | 2008-04-17 | Celonova Biosciences, Inc. | Compositions and devices comrising silicone and specific polyphosphazenes |
| KR101050650B1 (en) | 2007-11-29 | 2011-07-19 | 주식회사 엘지화학 | Coating composition and coating film excellent in wear resistance and fingerprint removal |
| US8557890B2 (en) | 2007-11-29 | 2013-10-15 | Lg Chem, Ltd. | Coating composition and coating film having enhanced abrasion resistance and fingerprint traces removability |
| US20100084574A1 (en) * | 2008-10-03 | 2010-04-08 | Nordson Corporation | Ultraviolet curing apparatus for continuous material |
| WO2011076924A1 (en) | 2009-12-23 | 2011-06-30 | Dsm Ip Assets B.V. | Method to activate silicone rubber surfaces |
| US20160075841A1 (en) * | 2009-12-23 | 2016-03-17 | Dsm Ip Assets B.V. | Method to activate silicone rubber surfaces |
| US20130189495A1 (en) | 2010-11-12 | 2013-07-25 | The Regents Of The University Of Michigan | Nanoscale Photolithography |
| US20130033753A1 (en) * | 2011-04-15 | 2013-02-07 | Qspex Technologies, Inc. | Anti-reflective lenses and methods for manufacturing the same |
| US20120262790A1 (en) * | 2011-04-15 | 2012-10-18 | Qspex Technologies, Inc. | Anti-reflective lenses and methods for manufacturing the same |
| US10082607B2 (en) | 2011-04-15 | 2018-09-25 | Qspex Technologies, Inc. | Anti-reflective lenses and methods for manufacturing the same |
| JP5987117B2 (en) | 2012-10-10 | 2016-09-07 | キュースペックス テクノロジーズ インコーポレイテッドQspex Technologies,Inc. | Antireflection lens and manufacturing method thereof |
| US20170106129A1 (en) | 2014-05-14 | 2017-04-20 | 1866402 Ontario Limited | Bonded microsphere filter |
| US20180030071A1 (en) * | 2015-06-16 | 2018-02-01 | Gelest Technologies, Inc. | Hydridosilapyrroles, hydridosilaazapyrroles, thiasilacyclopentanes, method for preparation thereof, and reaction products therefrom |
| US20190127580A1 (en) | 2017-10-27 | 2019-05-02 | Shin-Etsu Chemical Co., Ltd. | Semiconductor Encapsulating Resin Composition and Semiconductor Device |
| US20210054149A1 (en) | 2019-08-21 | 2021-02-25 | Samsung Electronics Co., Ltd. | Silane compound including fluorine-containing poly(ether) group, composition including the same, film formed from the composition, display device, and article |
| US20210261813A1 (en) | 2020-02-21 | 2021-08-26 | Samsung Electronics Co., Ltd. | Composition, film prepared therefrom, display device prepared therefrom, article prepared therefrom, and method of preparing article |
| US20210261738A1 (en) | 2020-02-26 | 2021-08-26 | Samsung Electronics Co., Ltd. | Silane compound including fluorine-containing (poly)ether group, composition including the same, film formed from the composition, display device comprising the film, and article comprising the composition |
| US11639361B2 (en) * | 2020-11-20 | 2023-05-02 | Samsung Electronics Co., Ltd. | Composition, film, display device and article prepared therefrom, and method of preparing article |
| US20220184658A1 (en) | 2020-12-11 | 2022-06-16 | Samsung Electronics Co., Ltd. | Laminate, display including the same, and article including the display |
Non-Patent Citations (14)
| Title |
|---|
| Alain E. Kaloyeros et al., Emerging Molecular and Atomic Level Techniques for Nanoscale Applications. Alain E. Kaloyeros, Jonathan Goff, and Barry Arkles. Electrochem. Soc. Interface, 27 (2018), pp. 59-63. |
| ASTM Designation D7334-08, Standard Practice for Surface Wettability of Coatings, Substrates and Pigments by Advancing Contact Angle Measurement (2013) (Year: 2013). * |
| Byproduct-Free Synthesis, Characterization, and Reactivity of 1, 2-Diaminosiloxane Monolayers on Silicon/Silicon Dioxide. K.Khadka, G. K. Carpenter IV,G.S. Ferguson. Chemistry Select 2019, 4, 11801-11807. |
| D. Kim et al, 138 Journal of the American Chemical Society, 15106-15109 (2016) (Year: 2016). |
| D. Kim et al., 138 Journal of the American Chemical Society, 15106-15109 (2018) (Year: 2018). * |
| M. Buese et al., 42 Polymer Preprints, 174-175 (2001) (Year: 2001). |
| N. Adamczyk et al., 24 Langmuir, 2081-2089 (2008) (Year: 2008). * |
| P. de Gennes, 57 Reviews of Modern Physics, 827-863 (1985) (Year: 1985). * |
| Susan H. Tilford, et al., Cyclic Azasilanes and Cyclic Thiasilanes for Nano-Surface Modification. S.H. Tilford, B. Arkles , J. Goff., Speciality Chemicals Magazine 37.Dec. 6, 2017. www.specchemonline.com. |
| Wolfgang Ziche, et al., Synthesis and Structure of 1,6-Diaza-2,2-Dimethoxy-2-Silacyclooctane, Journal of Organometallic Chemistry (1996), 521(1-2), 29-31. |
| Y. Ma et al., 48 Polymer, 7455-7460 (2007) (Year: 2007). * |
| Y. Pan et al., 12 Chemistry an Asian Journal, 1198-1203 (2017) (Year: 2017). |
| Y.Pan, et al., Surface-Triggered Tandem Coupling Reactions of Cyclic Azasilanes. Y.Pan, A.Maddox, T. Min, F. Gonzaga, J. Goff, B. Arkles. Chem. Asian J. 2017, 12, 1198-1203. |
| Z. Wang et al., 9 RSC Advances, 31013-31020 (2019) (Year: 2019). |
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| US11639361B2 (en) | 2023-05-02 |
| KR20220069619A (en) | 2022-05-27 |
| US20230265114A1 (en) | 2023-08-24 |
| US20220162237A1 (en) | 2022-05-26 |
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