US11239146B2 - Package structure - Google Patents
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- US11239146B2 US11239146B2 US16/923,554 US202016923554A US11239146B2 US 11239146 B2 US11239146 B2 US 11239146B2 US 202016923554 A US202016923554 A US 202016923554A US 11239146 B2 US11239146 B2 US 11239146B2
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- substrate
- package structure
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- H01L23/49838—
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
- H10W70/62—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
- H10W70/65—Shapes or dispositions of interconnections
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- H01L23/3157—
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- H01L23/4985—
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- H01L23/49866—
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- H01L24/05—
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
- H10W70/62—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
- H10W70/66—Conductive materials thereof
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
- H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
- H10W70/688—Flexible insulating substrates
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
- H10W74/131—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
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- H01L2224/05124—
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- H01L2224/05147—
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W42/00—Arrangements for protection of devices
- H10W42/121—Arrangements for protection of devices protecting against mechanical damage
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
- H10W72/251—Materials
- H10W72/252—Materials comprising solid metals or solid metalloids, e.g. PbSn, Ag or Cu
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
- H10W72/29—Bond pads specially adapted therefor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/921—Structures or relative sizes of bond pads
- H10W72/923—Bond pads having multiple stacked layers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/941—Dispositions of bond pads
- H10W72/9415—Dispositions of bond pads relative to the surface, e.g. recessed, protruding
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/951—Materials of bond pads
- H10W72/952—Materials of bond pads comprising metals or metalloids, e.g. PbSn, Ag or Cu
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/721—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
- H10W90/724—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL
Definitions
- Embodiments of the present disclosure relate to a package structure, and in particular they relate to a package structure including a hybrid pad.
- a package structure including a hybrid pad is provided.
- the package structure may effectively reduce the stress of the contacts, avoid stress problems such as contact deformation or detachment when the substrate is bent due to user actions or other external forces, and further improve the yield of electronic devices using the package structure.
- the embodiments of the present disclosure include a package structure.
- the package structure includes a substrate.
- the package structure also includes a hybrid pad disposed on the substrate.
- the hybrid pad includes a metal layer and a buffer layer connected to the metal layer.
- the Young's modulus of the buffer layer is less than the Young's modulus of the metal layer.
- the package structure further includes an electrically connecting structure disposed on the hybrid pad.
- the package structure includes a chip layer electrically connected to the electrically connecting structure.
- the package structure also includes a bonding pad disposed between the electrically connecting structure and the chip layer.
- FIG. 1 is a partial cross-sectional view illustrating a package structure according to one embodiment of the present disclosure.
- FIG. 2 is a partial top view illustrating a hybrid pad in one embodiment.
- FIG. 3 is a partial top view illustrating a hybrid pad in another embodiment.
- FIG. 4 is a partial top view illustrating a hybrid pad in another embodiment.
- FIG. 5 is a partial top view illustrating a hybrid pad in another embodiment.
- FIG. 6 is a partial cross-sectional view illustrating a package structure according to another embodiment of the present disclosure.
- FIG. 7 is a partial cross-sectional view of applying the package structure according to one embodiment of the present disclosure to a wearable electronic device.
- a first feature is formed on a second feature in the description that follows may include embodiments in which the first feature and second feature are formed in direct contact, and may also include embodiments in which additional features may be formed between the first feature and second feature, so that the first feature and second feature may not be in direct contact.
- spatially relative terms such as “beneath,” “below,” “lower,” “on,” “above,” “upper” and the like, may be used herein for ease of description to describe one element or feature's relationship to other elements or features as illustrated in the figures.
- the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures.
- the apparatus may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein may likewise be interpreted accordingly.
- the terms “about,” “approximately” and “substantially” typically mean+/ ⁇ 20% of the stated value, more typically +/ ⁇ 10% of the stated value, more typically +/ ⁇ 5% of the stated value, more typically +/ ⁇ 3% of the stated value, more typically +/ ⁇ 2% of the stated value, more typically +/ ⁇ 1% of the stated value and even more typically +/ ⁇ 0.5% of the stated value.
- the stated value of the present disclosure is an approximate value. That is, when there is no specific description of the terms “about,” “approximately” and “substantially”, the stated value includes the meaning of “about,” “approximately” or “substantially”.
- FIG. 1 is a partial cross-sectional view illustrating a package structure 100 according to one embodiment of the present disclosure. It should be noted that some components may be omitted in FIG. 1 and subsequent figures in the present disclosure in order to more clearly show the technical features of the embodiments of the present disclosure.
- the package structure 100 includes a substrate 11 .
- the substrate 11 may include an elementary semiconductor (e.g., silicon or germanium), a compound semiconductor (e.g., silicon carbide (SiC), gallium nitride (GaN), gallium phosphide (GaP), indium phosphide (InP), indium arsenide (InAs), indium antimonide (InSb), and so on), an alloy semiconductor (e.g., silicon germanium (SiGe), gallium arsenide phosphide (GaAsP), aluminum indium phosphide, aluminum gallium arsenide, gallium indium arsenide (GaInAs), gallium indium arsenide phosphide), any other applicable semiconductor, or a combination thereof, but the present disclosure is not limited thereto.
- an elementary semiconductor e.g., silicon or germanium
- a compound semiconductor e.g., silicon carbide (SiC), gallium nitrid
- the substrate 11 may be a flexible substrate or a flexible printed circuit board (FPCB).
- the substrate 11 may include a core layer (e.g., polyimide (PI) or polyester (PET)), a copper foil layer, an adhesive film, a protective layer (e.g., epoxy), and so on, but the present disclosure is not limited thereto.
- PI polyimide
- PET polyester
- a protective layer e.g., epoxy
- the package structure 100 includes a hybrid pad 13 disposed on the (flexible) substrate 11 .
- the (flexible) substrate 11 and the hybrid pad 13 may be regarded as a pad structure 20 .
- the pad structure 20 is not limited to be used in the package structure 100 in the embodiments of the present disclosure.
- the hybrid pad 13 includes a metal layer 131 and a buffer layer 133 (see the following FIG. 2 to FIG. 5 ), and the buffer layer 133 is connected to the metal layer 131 .
- the shapes and different arrangements of the metal layer 131 and the buffer layer 133 will be described with reference to the following figures.
- the Young's modulus of the buffer layer 133 is less than the Young's modulus of the metal layer 131 .
- the Young's modulus of the buffer layer 133 may be between 1 and 10, but the present disclosure is not limited thereto.
- the Young's modulus of the buffer layer 133 is less than the Young's modulus of the metal layer 131 , when the substrate 11 is bent because of external force (e.g., the user performs actions such as raising hands, bending down, running, etc.), it may effectively reduce the stress on the hybrid pad 13 and avoid stress problems such as contact deformation or disconnect.
- the material of the metal layer 131 may include copper, aluminum, a combination thereof, or an alloy thereof, but the present disclosure is not limited thereto.
- the buffer layer 133 may include a conductive material.
- the conductive material may include silver, nickel-copper, silver-nickel, silver-aluminum, silver-glass, silver-coated copper or carbon black, but the present disclosure is not limited thereto.
- FIG. 2 to FIG. 5 are partial top views of the hybrid pads of different embodiments.
- the different hybrid pads shown in FIG. 2 to FIG. 5 may be regarded to as the partial top view of the hybrid pad 13 shown in FIG. 1 . That is, FIG. 2 to FIG. may show the shapes and arrangements of the orthogonal projections of the metal layer 131 and the buffer layer 133 of the hybrid pad 13 on the top surface 11 T of the (flexible) substrate 11 .
- the different hybrid pads shown in FIG. 2 to FIG. 5 are merely examples.
- the orthogonal projections of the metal layer 131 and the buffer layer 133 of the hybrid pad 13 on the top surface 11 T of the (flexible) substrate 11 may also be in different shapes or arranged in other ways.
- the embodiments of the present disclosure are not limited to these examples.
- the orthogonal projection of the metal layer 131 of the hybrid pad 13 - 1 on the top surface 11 T of the (flexible) substrate 11 and the orthogonal projection of the buffer layer 133 of the hybrid pad 13 - 1 on the top surface 11 T of the (flexible) substrate 11 are alternately arranged, and the orthogonal projection of the metal layer 131 on the top surface 11 T of the (flexible) substrate 11 and the orthogonal projection of the buffer layer 133 on the top surface 11 T of the (flexible) substrate 11 are both spiral, but the present disclosure is not limited thereto.
- the hybrid pad 13 - 2 includes a plurality of metal layers 131 and a plurality of buffer layers 133 .
- the orthogonal projections of the metal layers 131 on the top surface 11 T of the (flexible) substrate 11 and the orthogonal projections of the buffer layers 133 on the top surface 11 T of the (flexible) substrate 11 are alternately arranged, and the orthogonal projection of each metal layer 131 on the top surface 11 T of the (flexible) substrate 11 and the orthogonal projection of each buffer layer 133 on the top surface 11 T of the (flexible) substrate 11 are round.
- the orthogonal projections of the metal layers 131 of the hybrid pad 13 - 2 on the top surface 11 T of the (flexible) substrate 11 and the orthogonal projections of the buffer layers 133 the hybrid pad 13 - 2 on the top surface 11 T of the (flexible) substrate 11 may be respectively arranged in concentric circles, but the present disclosure is not limited thereto.
- the orthogonal projection of each metal layer 131 on the top surface 11 T of the (flexible) substrate 11 and the orthogonal projection of each buffer layer 133 on the top surface 11 T of the (flexible) substrate 11 may also be oval.
- the hybrid pad 13 - 3 includes a plurality of metal layers 131 and a plurality of buffer layers 133 .
- the orthogonal projections of the metal layers 131 on the top surface 11 T of the (flexible) substrate 11 and the orthogonal projections of the buffer layers 133 on the top surface 11 T of the (flexible) substrate 11 are alternately arranged, and the orthogonal projection of each metal layer 131 on the top surface 11 T of the (flexible) substrate 11 and the orthogonal projection of each buffer layer 133 on the top surface 11 T of the (flexible) substrate 11 are rectangular, but the present disclosure is not limited thereto.
- the orthogonal projection of each metal layer 131 on the top surface 11 T of the (flexible) substrate 11 and the orthogonal projection of each buffer layer 133 on the top surface 11 T of the (flexible) substrate 11 may also be triangular, pentagonal, other polygonal or irregular.
- the hybrid pad 13 - 4 includes a plurality of metal layers 131 and a plurality of buffer layers 133 .
- the orthogonal projections of the metal layers 131 on the top surface 11 T of the (flexible) substrate 11 and the orthogonal projections of the buffer layers 133 on the top surface 11 T of the (flexible) substrate 11 are parallel with each other and alternately arranged, but the present disclosure is not limited thereto.
- the package structure 100 includes an electrically connecting structure 30 disposed on the hybrid pad 13 .
- the electrically connecting structure 30 may be a metal bump (e.g., solder ball, solder bump), tape-automated bonding (TAB), anisotropic conductive adhesive (ACA), anisotropic conductive film (ACF), polymer bump, or any other applicable conductive material, but the present disclosure is not limited thereto.
- the material of the electrically connecting structure 30 may be metal.
- the metal may include copper, aluminum, a combination thereof, or an alloy thereof, but the present disclosure is not limited thereto.
- the package structure 100 includes a chip layer 40 electrically connected to the electrically connecting structure 30 .
- the chip layer 40 may be a semiconductor wafer (e.g., silicon wafer or any other applicable semiconductor wafer), which includes a plurality of chips.
- the chip layer 40 itself may represent a single wafer, but the present disclosure is not limited thereto.
- the chip layer 40 may include various conductive features (e.g., conductive lines or conductive vias).
- the conductive features may be formed by aluminum (Al), copper (Cu), tungsten (W), their respective alloys, any other applicable conductive material, or a combination thereof, but the present disclosure is not limited thereto.
- the chip layer 40 may include various isolation features to separate different device regions in the chip layer 40 .
- the chip layer 40 may include shallow trench isolation (STI) features, but the present disclosure is not limited thereto.
- STI shallow trench isolation
- the package structure 100 may include a bonding pad 50 disposed between the electrically connecting structure 30 and the chip layer 40 . That is, the electrically connecting structure 30 may be disposed between hybrid pad 13 and the bonding pad 50 .
- the material of the bonding pad 50 may include copper, aluminum, gold, a combination thereof, or an alloy thereof, but the present disclosure is not limited thereto.
- the package structure 100 may further include an under bump metallurgy (UBM) (not shown), and the under bump metallurgy may be disposed between the bonding pad 50 and the chip layer 40 , but the present disclosure is not limited thereto.
- UBM under bump metallurgy
- the (flexible) substrate 11 may be electrically connected to the chip layer 40 through the hybrid pad 13 , the electrically connecting structure 30 , and the bonding pad 50 , but the present disclosure is not limited thereto.
- conductive components that are not shown in FIG. 1 may also be disposed between the (flexible) substrate 11 and the chip layer 40 to electrically connect the (flexible) substrate 11 and the chip layer 40 .
- the package structure 100 may include an underfill layer 60 disposed between the (flexible) substrate 11 and the chip layer 40 .
- the underfill layer 60 may fill the space between the (flexible) substrate 11 and the chip layer 40 except for the space occupied by the hybrid pad 13 , the electrically connecting structure 30 , and the bonding pad 50 , but the present disclosure is not limited thereto.
- the underfill layer 60 may have a high Young's modulus and a low coefficient of thermal expansion (CTE), and may be matched with solder contacts.
- the underfill layer 60 may make the chip layer 40 and the (flexible) substrate 11 have low moisture absorption and good adhesion characteristics, which may help improve the reliability of the package structure 100 (e.g., a flip chip package).
- the material of the underfill layer 60 may include a material with buffering characteristics, a material with protective characteristics, or a combination thereof.
- the material of the underfill layer 60 may have, for example, waterproof, antistatic, or antifouling effects.
- the underfill layer 60 may be a single-layer material, a composite material, or a multi-layer material.
- the package structure 100 may further include a protective layer (e.g., a molding compound) (not shown).
- the protection layer may be disposed on the chip layer 40 to further fix the chip layer 40 and provide a buffer, prevent the chip layer 40 from detachment or being damaged, and protect the wafer and the circuit from being affected and damaged by the external environment.
- FIG. 6 is a partial cross-sectional view illustrating a package structure 102 according to another embodiment of the present disclosure.
- the pad structure 20 may include a plurality of hybrid pads 13 (at least two hybrid pads 13 ) disposed on a single (flexible) substrate 11 .
- a plurality of hybrid pads 13 (at least two hybrid pads 13 ), a plurality of electrically connecting structures 30 (at least two electrically connecting structures 30 ), and a plurality of bonding pads 50 (at least two bonding pads 50 ) may be provided between the (flexible) substrate 11 and the chip layer 40 of the package structure 102 .
- the material using copper as the metal layer ( 131 ) with the buffer layers ( 133 ) of different materials is analyzed, so that the equivalent Young's modulus of the hybrid pad 13 is reduced to 6 GPa.
- the maximum stress value is 2.48 Mpa.
- the maximum stress value is 21.3 Mpa.
- FIG. 7 is a partial cross-sectional view of applying the package structure 100 according to one embodiment of the present disclosure to a wearable electronic device.
- the wearable electronic device here is, for example, smart clothes made of smart textiles, but the present disclosure is not limited thereto.
- the substrate 11 may be, for example, a flexible IC interposer, on which a plurality of hybrid pads 13 of the present disclosure are disposed.
- Each hybrid pad 13 includes a metal layer ( 131 ) and a buffer layer ( 133 ), which is not described in detail here.
- Electrically connecting structures 30 are disposed on the hybrid pad, and a chip layer 40 is electrically connected to the substrate 11 through the electrically connecting structures 30 .
- bonding pads 50 are disposed between the electrically connecting structures 30 and the chip layer 40 to electrically connect the electrically connecting structures 30 and the chip layer 40 .
- an underfill layer 60 is disposed between the substrate 11 and the chip layer 40 , and a package structure according to the embodiments of the present disclosure is completed.
- hybrid pads 13 are described here, the embodiments of the present disclosure are not limited thereto. In some other embodiments, the hybrid pad 13 may be replaced with the hybrid pad 13 - 1 shown in FIG. 2 , the hybrid pad 13 - 2 shown in FIG. 3 , the hybrid pad 13 - 3 shown in FIG. 4 , or the hybrid pad 13 - 4 shown in FIG. 5 , which is not described in detail here.
- the package structure may be connected to and disposed on a flexible printed circuit (FPC) 15 .
- the substrate 11 e.g., flexible IC interposer
- RDL redistribution layer
- This structure may be integrated on a wearable electronic device (e.g., smart clothes made of smart textiles).
- the package structure according to the embodiments of the present disclosure includes a hybrid pad, when the substrate is bent due to user actions or other external forces, it may be effectively prevented from stress problems such as contact deformation or detachment, and may further improve the yield of electronic devices using the package structure.
- the package structure according to the embodiment of the present disclosure includes a hybrid pad, and the hybrid pad includes a metal layer and a buffer layer having a lower Young's modulus than the metal layer, thereby effectively reducing the stress of the contacts, avoiding stress problems such as contact deformation or detachment when the substrate is bent due to user actions or other external forces, and further improving the yield of electronic devices using the package structure.
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Abstract
Description
Claims (12)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW108148596 | 2019-12-31 | ||
| TW108148596A TWI736093B (en) | 2019-12-31 | 2019-12-31 | Package structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| US20210202367A1 US20210202367A1 (en) | 2021-07-01 |
| US11239146B2 true US11239146B2 (en) | 2022-02-01 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US16/923,554 Active US11239146B2 (en) | 2019-12-31 | 2020-07-08 | Package structure |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US11239146B2 (en) |
| TW (1) | TWI736093B (en) |
Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6277669B1 (en) | 1999-09-15 | 2001-08-21 | Industrial Technology Research Institute | Wafer level packaging method and packages formed |
| US6324754B1 (en) * | 1998-03-25 | 2001-12-04 | Tessera, Inc. | Method for fabricating microelectronic assemblies |
| TW510039B (en) | 2000-11-30 | 2002-11-11 | Nec Corp | Semiconductor device, method of fabricating same, semiconductor device package construction, and method of mounting the semiconductor device |
| TWI305390B (en) | 2005-09-07 | 2009-01-11 | Ind Tech Res Inst | Chip structure, chip package structure and manufacturing thereof |
| CN100466246C (en) | 2005-10-10 | 2009-03-04 | 南茂科技股份有限公司 | Flexible Substrates for Packaging |
| US20110037156A1 (en) * | 2009-08-13 | 2011-02-17 | Qualcomm Incorporated | Variable Feature Interface That Induces A Balanced Stress To Prevent Thin Die Warpage |
| US20120281378A1 (en) | 2009-09-22 | 2012-11-08 | Wintec Industries, Inc. | Split Electrical Contacts in an Electronic Assembly |
| TW201312720A (en) | 2010-11-15 | 2013-03-16 | 泰斯拉公司 | Conductive pad defined by embedded traces |
| TWI483363B (en) | 2012-07-26 | 2015-05-01 | 臻鼎科技股份有限公司 | Chip package substrate, chip package structure and manufacturing method thereof |
| US9385099B2 (en) | 2014-03-28 | 2016-07-05 | Nxp, B.V. | Die interconnect |
| US20160194517A1 (en) * | 2013-09-11 | 2016-07-07 | Dexerials Corporation | Underfill Material and Method for Manufacturing Semiconductor Device Using the Same |
| US9647188B2 (en) | 2012-06-07 | 2017-05-09 | Cooledge Lighting Inc. | Wafer-level flip chip device packages and related methods |
| US9778688B2 (en) | 2014-11-12 | 2017-10-03 | Intel Corporation | Flexible system-in-package solutions for wearable devices |
-
2019
- 2019-12-31 TW TW108148596A patent/TWI736093B/en active
-
2020
- 2020-07-08 US US16/923,554 patent/US11239146B2/en active Active
Patent Citations (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6324754B1 (en) * | 1998-03-25 | 2001-12-04 | Tessera, Inc. | Method for fabricating microelectronic assemblies |
| US6277669B1 (en) | 1999-09-15 | 2001-08-21 | Industrial Technology Research Institute | Wafer level packaging method and packages formed |
| TW510039B (en) | 2000-11-30 | 2002-11-11 | Nec Corp | Semiconductor device, method of fabricating same, semiconductor device package construction, and method of mounting the semiconductor device |
| TWI305390B (en) | 2005-09-07 | 2009-01-11 | Ind Tech Res Inst | Chip structure, chip package structure and manufacturing thereof |
| CN100466246C (en) | 2005-10-10 | 2009-03-04 | 南茂科技股份有限公司 | Flexible Substrates for Packaging |
| US8076762B2 (en) | 2009-08-13 | 2011-12-13 | Qualcomm Incorporated | Variable feature interface that induces a balanced stress to prevent thin die warpage |
| US20110037156A1 (en) * | 2009-08-13 | 2011-02-17 | Qualcomm Incorporated | Variable Feature Interface That Induces A Balanced Stress To Prevent Thin Die Warpage |
| US20120281378A1 (en) | 2009-09-22 | 2012-11-08 | Wintec Industries, Inc. | Split Electrical Contacts in an Electronic Assembly |
| TW201312720A (en) | 2010-11-15 | 2013-03-16 | 泰斯拉公司 | Conductive pad defined by embedded traces |
| US9647188B2 (en) | 2012-06-07 | 2017-05-09 | Cooledge Lighting Inc. | Wafer-level flip chip device packages and related methods |
| TWI483363B (en) | 2012-07-26 | 2015-05-01 | 臻鼎科技股份有限公司 | Chip package substrate, chip package structure and manufacturing method thereof |
| US20160194517A1 (en) * | 2013-09-11 | 2016-07-07 | Dexerials Corporation | Underfill Material and Method for Manufacturing Semiconductor Device Using the Same |
| US9385099B2 (en) | 2014-03-28 | 2016-07-05 | Nxp, B.V. | Die interconnect |
| US9778688B2 (en) | 2014-11-12 | 2017-10-03 | Intel Corporation | Flexible system-in-package solutions for wearable devices |
Non-Patent Citations (4)
| Title |
|---|
| Kim, Ji-Hye, et al., "Bending Properties of Anisotropic Conductive Films Assembled Chip-in-Flex Packages for Wearable Electronics Applications", IEEE Transactions on Components, Packaging and Manufacturing Technology, Feb. 2016, pp. 208-215, vol. 6, No. 2, IEEE, US. |
| Kim, Ji-Hyun, et al., "Effects of the Types of Anisotropic Conductive Films on the Bending Reliability of Chip-in-Plastic Packages", IEEE Transactions on Components, Packaging and Manufacturing Technology, Mar. 2019, pp. 405-411, vol. 9, No. 3, IEEE, US. |
| Kim, Young-Lyong, et al., "Effects of the Mechanical Properties of Polymer Resin and the Conductive Ball Types of Anisotropic Conductive Films on the Bending Properties of Chip-in-Flex Package", IEEE Transactions on Components, Packaging and Manufacturing Technology, Feb. 2016, pp. 200-207, vol. 6, No. 2, IEEE, US. |
| Taiwan Paten Office, Office Action, Patent Application Serial No. 108148596, dated Nov. 20, 2020, Taiwan. |
Also Published As
| Publication number | Publication date |
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| US20210202367A1 (en) | 2021-07-01 |
| TW202127967A (en) | 2021-07-16 |
| TWI736093B (en) | 2021-08-11 |
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