TWM489155U - Gas diffusion device of wafer pod - Google Patents

Gas diffusion device of wafer pod

Info

Publication number
TWM489155U
TWM489155U TW103210143U TW103210143U TWM489155U TW M489155 U TWM489155 U TW M489155U TW 103210143 U TW103210143 U TW 103210143U TW 103210143 U TW103210143 U TW 103210143U TW M489155 U TWM489155 U TW M489155U
Authority
TW
Taiwan
Prior art keywords
gas diffusion
diffusion device
wafer pod
pod
wafer
Prior art date
Application number
TW103210143U
Other languages
English (en)
Inventor
Zhi-Ming Lin
ming-qian Qiu
Rui-Ken Gao
chen-hao Zhang
Original Assignee
Gudeng Precision Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gudeng Precision Industrial Co Ltd filed Critical Gudeng Precision Industrial Co Ltd
Priority to TW103210143U priority Critical patent/TWM489155U/zh
Publication of TWM489155U publication Critical patent/TWM489155U/zh
Priority to CN201520280396.XU priority patent/CN204558433U/zh
Priority to JP2015002372U priority patent/JP3198841U/ja
Priority to DE202015102686.2U priority patent/DE202015102686U1/de
Priority to KR2020150003672U priority patent/KR200482352Y1/ko
Priority to US14/735,126 priority patent/US9899246B2/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67389—Closed carriers characterised by atmosphere control
    • H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/86187—Plural tanks or compartments connected for serial flow
    • Y10T137/86212—Plural compartments formed by baffles
TW103210143U 2014-06-09 2014-06-09 Gas diffusion device of wafer pod TWM489155U (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
TW103210143U TWM489155U (en) 2014-06-09 2014-06-09 Gas diffusion device of wafer pod
CN201520280396.XU CN204558433U (zh) 2014-06-09 2015-05-04 晶圆盒的气体扩散装置
JP2015002372U JP3198841U (ja) 2014-06-09 2015-05-14 ウエハポッドの気体拡散装置
DE202015102686.2U DE202015102686U1 (de) 2014-06-09 2015-05-26 Gasdiffusionsanlage für Waferkassetten
KR2020150003672U KR200482352Y1 (ko) 2014-06-09 2015-06-08 웨이퍼 카세트의 기체 확산 장치
US14/735,126 US9899246B2 (en) 2014-06-09 2015-06-09 Gas distributor used in wafer carriers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW103210143U TWM489155U (en) 2014-06-09 2014-06-09 Gas diffusion device of wafer pod

Publications (1)

Publication Number Publication Date
TWM489155U true TWM489155U (en) 2014-11-01

Family

ID=53485361

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103210143U TWM489155U (en) 2014-06-09 2014-06-09 Gas diffusion device of wafer pod

Country Status (6)

Country Link
US (1) US9899246B2 (zh)
JP (1) JP3198841U (zh)
KR (1) KR200482352Y1 (zh)
CN (1) CN204558433U (zh)
DE (1) DE202015102686U1 (zh)
TW (1) TWM489155U (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI727795B (zh) * 2019-07-13 2021-05-11 家登精密工業股份有限公司 基板容器系統

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3304537A1 (en) 2015-06-05 2018-04-11 Apple Inc. Emission control apparatuses and methods for a display panel
WO2018203384A1 (ja) * 2017-05-02 2018-11-08 ミライアル株式会社 基板収納容器
KR102051380B1 (ko) 2017-12-21 2019-12-04 한국에너지기술연구원 비정상상태 조건 모니터링이 가능한 온라인 기체분석시스템 및 그 작동방법
KR102066175B1 (ko) * 2017-12-28 2020-01-14 우범제 웨이퍼 수납용기
KR20210027495A (ko) * 2018-08-28 2021-03-10 엔테그리스, 아이엔씨. 기판 컨테이너를 위한 멤브레인 디퓨저
TWI751814B (zh) * 2020-09-22 2022-01-01 家登精密工業股份有限公司 支撐片狀物的中央支撐裝置及存放片狀物的儲存設備
WO2022269718A1 (ja) * 2021-06-21 2022-12-29 ミライアル株式会社 基板収納容器
CN113937041A (zh) 2021-06-30 2022-01-14 家登精密工业股份有限公司 基板容器系统
US20230151490A1 (en) * 2021-11-17 2023-05-18 Entegris, Inc. Gas diffuser housings, devices, and related methods
CN117465827A (zh) * 2022-07-27 2024-01-30 家登精密工业股份有限公司 上开式载板载具

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5217053A (en) * 1990-02-05 1993-06-08 Texas Instruments Incorporated Vented vacuum semiconductor wafer cassette
JP3939101B2 (ja) * 2000-12-04 2007-07-04 株式会社荏原製作所 基板搬送方法および基板搬送容器
JP2002170874A (ja) * 2000-12-04 2002-06-14 Ebara Corp 基板搬送容器
KR100829327B1 (ko) * 2002-04-05 2008-05-13 가부시키가이샤 히다치 고쿠사이 덴키 기판 처리 장치 및 반응 용기
JP6057716B2 (ja) * 2009-12-10 2017-01-11 インテグリス・インコーポレーテッド 微小環境中に均一に分布した浄化ガスを得るための多孔質バリア
JP5041348B2 (ja) * 2010-02-26 2012-10-03 Ｔｄｋ株式会社 清浄ガスの置換機能を備えた基板収納ポッド
JP5361805B2 (ja) * 2010-06-15 2013-12-04 信越ポリマー株式会社 基板収納容器
KR101366135B1 (ko) * 2013-10-10 2014-02-25 주식회사 엘에스테크 포스트 퍼지 장치

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI727795B (zh) * 2019-07-13 2021-05-11 家登精密工業股份有限公司 基板容器系統
US11508594B2 (en) 2019-07-13 2022-11-22 Gudeng Precision Industrial Co., Ltd Substrate container system

Also Published As

Publication number Publication date
CN204558433U (zh) 2015-08-12
US9899246B2 (en) 2018-02-20
US20150357218A1 (en) 2015-12-10
JP3198841U (ja) 2015-07-23
KR20150004506U (ko) 2015-12-17
KR200482352Y1 (ko) 2017-01-13
DE202015102686U1 (de) 2015-06-10

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