TWI809122B - 遠端電漿源之自由基輸出監測器及其使用方法 - Google Patents

遠端電漿源之自由基輸出監測器及其使用方法 Download PDF

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Publication number
TWI809122B
TWI809122B TW108120410A TW108120410A TWI809122B TW I809122 B TWI809122 B TW I809122B TW 108120410 A TW108120410 A TW 108120410A TW 108120410 A TW108120410 A TW 108120410A TW I809122 B TWI809122 B TW I809122B
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TW
Taiwan
Prior art keywords
plasma source
channel
gas
plasma
thermal sensor
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TW108120410A
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English (en)
Chinese (zh)
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TW202017074A (zh
Inventor
麥可 哈瑞斯
璆瑛 戴
艾圖 古柏塔
Original Assignee
美商Ｍｋｓ儀器公司
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Application filed by 美商Ｍｋｓ儀器公司 filed Critical 美商Ｍｋｓ儀器公司
Publication of TW202017074A publication Critical patent/TW202017074A/zh
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Publication of TWI809122B publication Critical patent/TWI809122B/zh

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
    • H05H1/0068—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature by thermal means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32954—Electron temperature measurement

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
TW108120410A 2018-06-14 2019-06-13 遠端電漿源之自由基輸出監測器及其使用方法 TWI809122B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201862684820P 2018-06-14 2018-06-14
US62/684,820 2018-06-14

Publications (2)

Publication Number Publication Date
TW202017074A TW202017074A (zh) 2020-05-01
TWI809122B true TWI809122B (zh) 2023-07-21

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW108120410A TWI809122B (zh) 2018-06-14 2019-06-13 遠端電漿源之自由基輸出監測器及其使用方法

Country Status (8)

Country Link
US (1) US11114287B2 (enExample)
EP (1) EP3785494B8 (enExample)
JP (1) JP7301075B2 (enExample)
KR (1) KR102697703B1 (enExample)
CN (1) CN112335342B (enExample)
SG (1) SG11202011069RA (enExample)
TW (1) TWI809122B (enExample)
WO (1) WO2019241405A1 (enExample)

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PL3648554T3 (pl) 2017-06-27 2021-11-22 Canon Anelva Corporation Urządzenie do przetwarzania plazmowego
CN114666965B (zh) 2017-06-27 2025-08-01 佳能安内华股份有限公司 等离子体处理装置
EP4017223B1 (en) 2017-06-27 2025-10-15 Canon Anelva Corporation Plasma processing apparatus
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PL3817517T3 (pl) * 2018-06-26 2024-10-28 Canon Anelva Corporation Urządzenie do obróbki plazmą, sposób obróbki plazmą, program oraz nośnik pamięci
CN115900990A (zh) * 2023-01-03 2023-04-04 大连理工大学 用于七通道级联弧等离子体源的温度监测系统
CN120264567B (zh) * 2025-04-29 2026-04-21 江苏神州半导体科技股份有限公司 一种远程等离子发生器
CN120870230A (zh) * 2025-09-24 2025-10-31 江苏神州半导体科技有限公司 一种远程等离子体源解离率监测装置及监测方法

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Also Published As

Publication number Publication date
TW202017074A (zh) 2020-05-01
EP3785494A4 (en) 2022-01-26
KR20210009428A (ko) 2021-01-26
US11114287B2 (en) 2021-09-07
US20190385829A1 (en) 2019-12-19
EP3785494B1 (en) 2026-02-18
EP3785494A1 (en) 2021-03-03
KR102697703B1 (ko) 2024-08-23
CN112335342A (zh) 2021-02-05
WO2019241405A1 (en) 2019-12-19
JP7301075B2 (ja) 2023-06-30
EP3785494B8 (en) 2026-04-01
SG11202011069RA (en) 2020-12-30
JP2021530076A (ja) 2021-11-04
CN112335342B (zh) 2023-07-14

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