TWI792672B - Semiconductor device with contact check circuitry - Google Patents

Semiconductor device with contact check circuitry Download PDF

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TWI792672B
TWI792672B TW110142023A TW110142023A TWI792672B TW I792672 B TWI792672 B TW I792672B TW 110142023 A TW110142023 A TW 110142023A TW 110142023 A TW110142023 A TW 110142023A TW I792672 B TWI792672 B TW I792672B
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signal
pad
voltage detection
comparison
circuit
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TW110142023A
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TW202319773A (en
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姚澤華
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晶豪科技股份有限公司
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Abstract

A semiconductor device with contact check circuitry is provided. The semiconductor device includes a plurality of pads, an internal circuit, and a contact check circuit. The plurality of pads includes a first pad and a second pad. The internal circuit is coupled to the plurality of pads. The contact check circuit, at least coupled to the first pad and the second pad, is used for checking, when the semiconductor device is under test, contact connections to the first pad and the second pad to generate a check result signal according to comparison of a first test signal and a second test signal received from the first pad and the second pad with at least one reference signal.

Description

具有接觸檢查電路的半導體裝置 Semiconductor device with contact check circuit

本發明係關於一種積體電路,尤指一種具有接觸檢查電路的半導體裝置。 The invention relates to an integrated circuit, especially a semiconductor device with a contact inspection circuit.

在電子產品中,電子保險絲(e-fuse)是一種允許對半導體裝置(或晶片)即時動態地重新程式化的技術。理論上,計算機邏輯通常「蝕刻」或「寫死」到晶片上,且在晶片製造完成後便無法更改。藉由在半導體裝置中使用一組電子保險絲,晶片製造商可使晶片上的電路在運行時,或將晶片運送到下游客戶之前進行更改。 In electronic products, electronic fuse (e-fuse) is a technology that allows real-time dynamic reprogramming of semiconductor devices (or chips). In theory, computer logic is usually "etched" or "hard-coded" onto the chip and cannot be changed after the chip is manufactured. By using a set of electronic fuses in a semiconductor device, a chip manufacturer can make changes to the circuitry on a chip while it is running, or before shipping the chip to a downstream customer.

在一種電子保險絲燒熔的操作中,來自半導體測試設備的訊號是透過與半導體裝置的複數個焊墊接觸的半導體測試設備的複數個探針而輸入到該半導體裝置。如果探針與焊墊沒有正確的接觸,燒熔就無法正確地進行。 In an electronic fuse blowing operation, signals from semiconductor test equipment are input to the semiconductor device through probes of the semiconductor test equipment that contact pads of the semiconductor device. If the probe does not make proper contact with the pad, the firing will not proceed properly.

本發明的一目的是提供一種具有接觸檢查電路的半導體裝置。該半導體裝置包括一接觸檢查電路,在例如使用連接到該半導體裝置的至少兩個焊墊的半導體測試設備來對該半導體裝置進行測試時,該接觸檢查電路能夠對該第一焊墊與該第二焊墊的多個接觸連接進行檢查以產生一檢查結果訊號。 An object of the present invention is to provide a semiconductor device having a contact inspection circuit. The semiconductor device includes a contact check circuit capable of contacting the first pad with the second pad when the semiconductor device is tested, for example, using semiconductor test equipment connected to at least two pads of the semiconductor device. A plurality of contact connections of the two pads are inspected to generate an inspection result signal.

為達到至少上述的目的,本發明提供一種具有接觸檢查電路的半導體裝置。該半導體裝置包括複數個焊墊、一內部電路以及一接觸檢查電路。該等焊墊包括一第一焊墊及一第二焊墊。該內部電路耦接於該等焊墊。該接觸檢查電路至少耦接於該第一焊墊及該第二焊墊,且用於當該半導體裝置受測時,對該第一焊墊與該第二焊墊的多個接觸連接進行檢查以產生一檢查結果訊號,該檢查結果訊號是根據接收自該第一焊墊的一第一測試訊號及該第二焊墊的一第二測試訊號與至少一參考訊號之間的比較而產生。 To achieve at least the above objects, the present invention provides a semiconductor device having a contact inspection circuit. The semiconductor device includes a plurality of pads, an internal circuit and a contact inspection circuit. The pads include a first pad and a second pad. The internal circuit is coupled to the pads. The contact inspection circuit is at least coupled to the first pad and the second pad, and is used for inspecting a plurality of contact connections between the first pad and the second pad when the semiconductor device is tested To generate an inspection result signal, the inspection result signal is generated according to a comparison between a first test signal received from the first pad and a second test signal received from the second pad with at least one reference signal.

在一些實施例中,該接觸檢查電路包括一電壓偵測電路及一比較電路。該電壓偵測電路耦接於該第一焊墊及該第二焊墊,且用於產生至少一電壓偵測訊號。該比較電路耦接於該電壓偵測電路,且用於根據該至少一電壓偵測訊號及該至少一參考訊號產生該檢查結果訊號。 In some embodiments, the contact check circuit includes a voltage detection circuit and a comparison circuit. The voltage detection circuit is coupled to the first pad and the second pad, and is used for generating at least one voltage detection signal. The comparison circuit is coupled to the voltage detection circuit and used for generating the inspection result signal according to the at least one voltage detection signal and the at least one reference signal.

在一些實施例中,該電壓偵測電路包括一分壓器,該分壓器耦接於該第一焊墊與該第二焊墊之間,且用以產生該至少一電壓偵測訊號。 In some embodiments, the voltage detection circuit includes a voltage divider coupled between the first pad and the second pad for generating the at least one voltage detection signal.

在一些實施例中,該比較電路包括一比較器,該比較器用以根據該至少一電壓偵測訊號及該至少一參考訊號產生該檢查結果訊號。 In some embodiments, the comparison circuit includes a comparator for generating the inspection result signal according to the at least one voltage detection signal and the at least one reference signal.

在一些實施例中,該至少一參考訊號包括一第一參考訊號及一第二參考訊號。該比較電路配置為根據該至少一電壓偵測訊號及該第一參考訊號產生一第一比較訊號;以及該比較電路配置為根據該至少一電壓偵測訊號及該第二參考訊號產生一第二比較訊號,其中該比較電路配置為根據該第一比較訊號及該第二比較訊號產生該檢查結果訊號。 In some embodiments, the at least one reference signal includes a first reference signal and a second reference signal. The comparison circuit is configured to generate a first comparison signal according to the at least one voltage detection signal and the first reference signal; and the comparison circuit is configured to generate a second voltage detection signal according to the at least one voltage detection signal and the second reference signal A comparison signal, wherein the comparison circuit is configured to generate the inspection result signal according to the first comparison signal and the second comparison signal.

在一些實施例中,該比較電路包括一第一比較器、一第二比較器及一邏輯單元。該第一比較器用於根據該至少一電壓偵測訊號及該第一參考 訊號產生該第一比較訊號。該第二比較器用於根據該至少一電壓偵測訊號及該第二參考訊號產生該第二比較訊號。該邏輯單元耦接於該第一比較器及該第二比較器,且用於根據該第一比較訊號及該第二比較訊號產生該檢查結果訊號。 In some embodiments, the comparison circuit includes a first comparator, a second comparator and a logic unit. The first comparator is used for detecting the signal according to the at least one voltage and the first reference The signal generates the first comparison signal. The second comparator is used for generating the second comparison signal according to the at least one voltage detection signal and the second reference signal. The logic unit is coupled to the first comparator and the second comparator, and is used for generating the inspection result signal according to the first comparison signal and the second comparison signal.

在一些實施例中,該至少一電壓偵測訊號包括一第一電壓偵測訊號及一第二電壓偵測訊號,且該電壓偵測電路配置為根據該第一測試訊號及一第一電源供應訊號產生該第一電壓偵測訊號;以及該電壓偵測電路配置為根據一第二電源供應訊號及該第二測試訊號產生該第二電壓偵測訊號。 In some embodiments, the at least one voltage detection signal includes a first voltage detection signal and a second voltage detection signal, and the voltage detection circuit is configured to A signal generates the first voltage detection signal; and the voltage detection circuit is configured to generate the second voltage detection signal according to a second power supply signal and the second test signal.

在一些實施例中,該至少一電壓偵測訊號包括一第一電壓偵測訊號及一第二電壓偵測訊號,且該電壓偵測電路包括一第一分壓器及一第二分壓器。該第一分壓器耦接於該第一焊墊與一第一電源供應端之間,且用於產生該第一電壓偵測訊號。該第二分壓器耦接於一第二電源供應端與該第二焊墊之間,且用於產生該第二電壓偵測訊號。 In some embodiments, the at least one voltage detection signal includes a first voltage detection signal and a second voltage detection signal, and the voltage detection circuit includes a first voltage divider and a second voltage divider . The first voltage divider is coupled between the first welding pad and a first power supply end, and is used for generating the first voltage detection signal. The second voltage divider is coupled between a second power supply terminal and the second welding pad, and is used for generating the second voltage detection signal.

在一些實施例中,該至少一電壓偵測訊號包括一第一電壓偵測訊號及一第二電壓偵測訊號;該至少一參考訊號包括該第一參考訊號及該第二參考訊號;該比較電路配置為根據該第一電壓偵測訊號及該第一參考訊號產生一第一比較訊號;以及該比較電路配置為根據該第二電壓偵測訊號及該第二參考訊號產生一第二比較訊號,其中該比較電路配置為根據該第一比較訊號及該第二比較訊號產生該檢查結果訊號。 In some embodiments, the at least one voltage detection signal includes a first voltage detection signal and a second voltage detection signal; the at least one reference signal includes the first reference signal and the second reference signal; the comparison The circuit is configured to generate a first comparison signal according to the first voltage detection signal and the first reference signal; and the comparison circuit is configured to generate a second comparison signal according to the second voltage detection signal and the second reference signal , wherein the comparison circuit is configured to generate the inspection result signal according to the first comparison signal and the second comparison signal.

在一些實施例中,該比較電路包括一第一比較器、一第二比較器及一邏輯單元。該第一比較器用於根據該第一電壓偵測訊號及該第一參考訊號產生該第一比較訊號。該第二比較器用於根據該第二電壓偵測訊號及該第二 參考訊號產生該第二比較訊號。該邏輯單元用於根據該第一比較訊號及該第二比較訊號產生該檢查結果訊號。 In some embodiments, the comparison circuit includes a first comparator, a second comparator and a logic unit. The first comparator is used for generating the first comparison signal according to the first voltage detection signal and the first reference signal. The second comparator is used to detect the signal according to the second voltage and the second The reference signal generates the second comparison signal. The logic unit is used for generating the inspection result signal according to the first comparison signal and the second comparison signal.

在一些實施例中,該內部電路包括一電子保險絲,該電子保險絲耦接於該第一焊墊及該第二焊墊之間。 In some embodiments, the internal circuit includes an electronic fuse coupled between the first pad and the second pad.

在一些實施例中,該半導體裝置更包含一輸出邏輯單元,用於根據該檢查結果訊號及一回應碼產生一測試結果訊號。 In some embodiments, the semiconductor device further includes an output logic unit for generating a test result signal according to the inspection result signal and a response code.

因此,提供了具有接觸檢查電路的半導體裝置的實施例。該半導體裝置包括接觸檢查電路,例如在在使用連接到半導體裝置的至少兩個焊墊的半導體測試設備對該半導體裝置進行測試時,對該至少兩個焊墊的多個接觸連接進行檢查以產生一檢查結果訊號。檢查結果訊號可用於表示與第一焊墊及第二焊墊的接觸連接是否失效,且半導體測試設備可配置為根據檢查結果訊號來決定是否繼續進行測試。如此一來可增進半導體裝置測試的可靠性。 Accordingly, embodiments of a semiconductor device having a contact check circuit are provided. The semiconductor device includes a contact checking circuit for checking a plurality of contact connections of at least two pads of the semiconductor device to generate A check result signal. The inspection result signal can be used to indicate whether the contact connection with the first pad and the second pad is invalid, and the semiconductor testing equipment can be configured to determine whether to continue testing according to the inspection result signal. In this way, the reliability of semiconductor device testing can be improved.

1:半導體裝置 1: Semiconductor device

1A:半導體裝置 1A: Semiconductor device

10:接觸檢查電路 10: Contact check circuit

110:電壓偵測電路 110: Voltage detection circuit

120:比較電路 120: Comparison circuit

111:分壓器 111: Voltage divider

2:內部電路 2: Internal circuit

20:接觸檢查電路 20: Contact check circuit

220:比較電路 220: comparison circuit

30:接觸檢查電路 30: Contact check circuit

310:電壓偵測電路 310: Voltage detection circuit

311:第一分壓器 311: The first voltage divider

312:第二分壓器 312: second voltage divider

320:比較電路 320: comparison circuit

5:接觸檢查電路 5: Contact check circuit

510:解碼器 510: decoder

520:電子保險絲單元 520: Electronic fuse unit

600:輸出邏輯單元 600: output logic unit

9:半導體測試設備 9: Semiconductor test equipment

CMD:命令端 CMD: command terminal

CMP:比較器 CMP: comparator

CMP1:第一比較器 CMP1: the first comparator

CMP2:第二比較器 CMP2: second comparator

DQ:資料端 DQ: data terminal

IN:回應碼 IN: response code

LU:邏輯單元 LU: logical unit

OUT:測試結果訊號 OUT: Test result signal

P1:第一焊墊 P1: The first pad

P2:第二焊墊 P2: Second pad

PS1:第一電源供應端 PS1: the first power supply terminal

PS2:第二電源供應端 PS2: Second power supply terminal

PB:探針 PB: Probe

R1:電阻 R1: resistance

R11:電阻 R11: Resistor

R12:電阻 R12: Resistor

R2:電阻 R2: resistance

R21:電阻 R21: Resistor

R22:電阻 R22: Resistor

Sn:電壓偵測訊號 S n : voltage detection signal

SC1:第一比較訊號 S C1 : The first comparison signal

SC2:第二比較訊號 S C2 : The second comparison signal

SCR:檢查結果訊號 S CR : Check result signal

SD1:第一電壓偵測訊號 S D1 : the first voltage detection signal

SD2:第二電壓偵測訊號 S D2 : Second voltage detection signal

VREF:參考訊號 V REF : Reference signal

VREF1:第一參考訊號 V REF1 : The first reference signal

VREF2:第二參考訊號 V REF2 : Second reference signal

圖1是描繪代表本發明的各種實施例的具有接觸檢查電路的半導體裝置的示例架構的示意圖,其中半導體裝置由半導體測試設備進行測試。 FIG. 1 is a schematic diagram depicting an example architecture of a semiconductor device with a contact inspection circuit, which is tested by semiconductor test equipment, representing various embodiments of the present invention.

圖2是用於圖1的示例架構的接觸檢查電路的一實施例的方塊圖。 FIG. 2 is a block diagram of an embodiment of a contact check circuit for the example architecture of FIG. 1 .

圖3是描繪用於圖1的示例架構中的接觸檢查電路的另一實施例的方塊圖。 FIG. 3 is a block diagram depicting another embodiment of a contact check circuit for use in the example architecture of FIG. 1 .

圖4是描繪用於圖1的示例架構中的接觸檢查電路的又一實施例的方塊圖。 FIG. 4 is a block diagram depicting yet another embodiment of a contact check circuit for use in the example architecture of FIG. 1 .

圖5是描繪用於圖1的示例架構中的半導體裝置的一實施例的方塊圖。 FIG. 5 is a block diagram depicting an embodiment of a semiconductor device used in the example architecture of FIG. 1 .

圖6是描繪用於圖5的示例架構中的輸出邏輯單元的實施例的示意圖。 FIG. 6 is a schematic diagram depicting an embodiment of an output logic unit used in the example architecture of FIG. 5 .

為充分瞭解本發明之目的、特徵及功效,茲藉由下述具體之實施例,並配合所附之圖式,對本發明做一詳細說明,說明如後:參照圖1,其描繪了代表本發明各種實施例具有接觸檢查電路的半導體裝置1的示例架構。 In order to fully understand the purpose, characteristics and effects of the present invention, the present invention will be described in detail by the following specific embodiments, and in cooperation with the attached drawings, as follows: With reference to Fig. 1, it depicts a representative Inventive Various Embodiments Example architecture of a semiconductor device 1 with a contact inspection circuit.

如圖1所示,半導體裝置1包括複數個焊墊、內部電路2及接觸檢查電路5。該等焊墊包括一第一焊墊P1及一第二焊墊P2。該內部電路2耦接該等焊墊。該接觸檢查電路5至少耦接於該第一焊墊P1及該第二焊墊P2,且用以當使用連接至第一焊墊P1及第二焊墊P2(例如使用測試探針)的一半導體測試設備9測試半導體裝置1時,對該第一焊墊P1及該第二焊墊P2的接觸連接進行檢查以產生一檢查結果訊號,該檢查結果訊號是根據從該第一焊墊P1及該第二焊墊P2所接收的一第一測試訊號及一第二測試訊號與至少一參考訊號之間的比較而產生。 As shown in FIG. 1 , a semiconductor device 1 includes a plurality of pads, an internal circuit 2 and a contact inspection circuit 5 . The pads include a first pad P1 and a second pad P2. The internal circuit 2 is coupled to the pads. The contact inspection circuit 5 is at least coupled to the first pad P1 and the second pad P2, and is used to connect to the first pad P1 and the second pad P2 (for example, using a test probe). When the semiconductor testing equipment 9 tests the semiconductor device 1, it checks the contact connection between the first pad P1 and the second pad P2 to generate an inspection result signal. It is generated by comparing a first test signal and a second test signal received by the second pad P2 with at least one reference signal.

在實際的情景中,該內部電路2可包括用於特定目的的電路(例如,控制器、記憶體、邏輯電路等)及一電子保險絲單元,電子保險絲單元包括一或更多用於選擇性改變該電路的功能或操作的電子保險絲。在電子保險絲燒熔操作的測試中,來自半導體測試設備9的訊號是透過與半導體裝置1的複數個焊墊接觸的半導體測試設備9的複數個探針PB而輸入到半導體裝置1。如果該等探針PB與該等焊墊沒有正確的接觸,則無法正確進行燒熔。在這種情景下,可利用檢查結果訊號來表示與第一焊墊P1的接觸連接及第二焊墊P2的接觸連接是否可正確地用於測試。 In a practical scenario, the internal circuit 2 may include circuits for specific purposes (for example, controllers, memories, logic circuits, etc.) and an electronic fuse unit, which includes one or more circuits for selectively changing The function or operation of an electronic fuse in that circuit. In the test of the electronic fuse blowing operation, signals from the semiconductor testing equipment 9 are input to the semiconductor device 1 through the plurality of probes PB of the semiconductor testing equipment 9 contacting the plurality of pads of the semiconductor device 1 . If the probes PB are not in proper contact with the solder pads, the firing cannot be performed correctly. In this case, the inspection result signal can be used to indicate whether the contact connection to the first pad P1 and the contact connection to the second pad P2 can be used correctly for testing.

在一些實施例中,該接觸檢查電路5可實現為包括一電壓偵測電路(例如圖2中的110或圖4中的310)以及一比較電路(例如,圖2中的120、圖3中 的220或圖4中的320)。電壓偵測電路耦接到該第一焊墊P1及該第二焊墊P2,且用於產生至少一電壓偵測訊號(例如,在圖2中由Sn所表示者;圖4中的SD1及SD2)。比較電路耦接到該電壓偵測電路的,且用於根據該至少一電壓偵測訊號及該至少一參考訊號(例如圖2中的VREF所表示者;或圖3、4中的VREF1及VREF2所表示者),來產生該檢查結果訊號(例如SCR所表示者)。該至少一參考訊號,例如可藉由該半導體裝置1的一或複數個能隙(bandgap)電壓電路而獲得,或外部電源供應器或電壓源而獲得。 In some embodiments, the contact check circuit 5 can be implemented to include a voltage detection circuit (such as 110 in FIG. 2 or 310 in FIG. 4 ) and a comparison circuit (such as 120 in FIG. 2 , 220 or 320 in Fig. 4). The voltage detection circuit is coupled to the first pad P1 and the second pad P2, and is used to generate at least one voltage detection signal (for example, represented by S n in FIG. 2; S in FIG. 4 D1 and S D2 ). The comparison circuit is coupled to the voltage detection circuit, and is used for detecting the at least one voltage signal and the at least one reference signal (such as represented by V REF in FIG. 2 ; or V REF1 in FIGS. 3 and 4 ) and V REF2 ), to generate the inspection result signal (such as represented by S CR ). The at least one reference signal can be obtained, for example, by one or a plurality of bandgap voltage circuits of the semiconductor device 1 , or by an external power supply or voltage source.

參照圖2,其描繪了用於圖1的示例架構的接觸檢查電路的一實施例。在圖2中,一接觸檢查電路10包括一電壓偵測電路110及一比較電路120。 Referring to FIG. 2 , an embodiment of a contact check circuit for the example architecture of FIG. 1 is depicted. In FIG. 2 , a contact check circuit 10 includes a voltage detection circuit 110 and a comparison circuit 120 .

在一實施例中,該電壓偵測電路10包括一分壓器111。耦接於該第一焊墊P1與該第二焊墊P2之間的分壓器111,是用於產生一電壓偵測訊號SnIn one embodiment, the voltage detection circuit 10 includes a voltage divider 111 . The voltage divider 111 coupled between the first pad P1 and the second pad P2 is used to generate a voltage detection signal S n .

例如,該比較電路120包括一比較器CMP,比較器CMP用以根據該電壓偵測訊號Sn及一參考訊號VREF產生一檢查結果訊號SCRFor example, the comparison circuit 120 includes a comparator CMP for generating a check result signal S CR according to the voltage detection signal S n and a reference signal V REF .

藉由圖2中所描繪的實施例,該接觸檢查電路10可配置為或設計為表示:該等探針對於該第一焊墊P1及該第二焊墊P2的該等接觸連接是否已失效。例如,假設該半導體裝置1實現為包括該第一焊墊P1及該第二焊墊P2,該第一焊墊P1及該第二焊墊P2設計為接收所需的一正供應電壓及一負供應電壓,例如分別為4伏特及-2伏特的直流(DC)電壓。為了表示該等接觸連接在測試中是否正確或可靠,可藉由設定電阻R1、R2的電阻值來設計該分壓器111,使得當該第一焊墊P1及該第二焊墊P2確實接收該所需的電壓供應訊號時,藉由該偵 測訊號Sn(例如電壓訊號位準(大小))等於或大於該參考訊號VREF(例如VREF=1.25伏特),加上該檢查結果訊號SCR接著在例如一邏輯高位準下輸出,來表示該等接觸連接是正確的。相反地,在一測試中,若該第一焊墊P1及該第二焊墊P2沒有與所對應的探針正確接觸,該偵測訊號Sn將會少於該參考訊號VREF(例如VREF=1.25伏特),該檢查結果訊號SCR接著在一邏輯低位準下輸出,該邏輯低位準是表示該等接觸連接已失效。 With the embodiment depicted in FIG. 2, the contact checking circuit 10 can be configured or designed to indicate whether the contact connections of the probes to the first pad P1 and the second pad P2 have failed . For example, assuming that the semiconductor device 1 is implemented to include the first pad P1 and the second pad P2, the first pad P1 and the second pad P2 are designed to receive a required positive supply voltage and a negative supply voltage. The supply voltages are, for example, direct current (DC) voltages of 4 volts and -2 volts respectively. In order to indicate whether the contact connections are correct or reliable during the test, the voltage divider 111 can be designed by setting the resistance values of the resistors R1 and R2, so that when the first pad P1 and the second pad P2 are indeed receiving When the required voltage supply signal is obtained, the detection signal S n (such as voltage signal level (magnitude)) is equal to or greater than the reference signal V REF (such as V REF =1.25 volts), plus the inspection result signal SCR is then output at, for example, a logic high level to indicate that the contact connections are correct. On the contrary, in a test, if the first pad P1 and the second pad P2 are not in contact with the corresponding probes correctly, the detection signal S n will be less than the reference signal V REF (for example, V REF =1.25 volts), the check result signal S CR is then output at a logic low level, which indicates that the contact connections have failed.

為了更準確地進行接觸檢查,接觸檢查電路5可以實現為,使得檢測訊號(例如圖2中的Sn)與表示不同參考值的兩個或複數個參考訊號進行比較,而不是與圖2中一個參考訊號(例如VREF)進行比較。 In order to perform a contact check more accurately, the contact check circuit 5 can be implemented such that the detection signal (such as S n in FIG. 2 ) is compared with two or a plurality of reference signals representing different reference values instead of the reference signal in FIG. 2 A reference signal (such as V REF ) for comparison.

參照圖3,其描繪用於圖1的示例架構的一接觸檢查電路的另一實施例。在圖3中,一接觸檢查電路20其包括一電壓偵測電路110及一比較電路220。圖3的接觸檢查電路20與圖2的接觸檢查電路10的不同處在於:該至少一參考訊號包括一第一參考訊號VREF1及一第二參考訊號VREF2;以及該接觸檢查電路20的比較電路220配置為根據該電壓偵測訊號Sn及該第一參考訊號VREF1產生一第一比較訊號SC1,且根據該電壓偵測訊號Sn及該第二參考訊號VREF2產生一第一比較訊號SC2,且根據該第一比較訊號SC1及該第一比較訊號SC2產生該檢查結果訊號SCRReferring to FIG. 3 , another embodiment of a contact check circuit for the example architecture of FIG. 1 is depicted. In FIG. 3 , a contact check circuit 20 includes a voltage detection circuit 110 and a comparison circuit 220 . The contact inspection circuit 20 of FIG. 3 is different from the contact inspection circuit 10 of FIG. 2 in that: the at least one reference signal includes a first reference signal V REF1 and a second reference signal V REF2 ; and the comparison of the contact inspection circuit 20 The circuit 220 is configured to generate a first comparison signal S C1 according to the voltage detection signal S n and the first reference signal V REF1 , and generate a first comparison signal S C1 according to the voltage detection signal S n and the second reference signal V REF2 The comparison signal S C2 , and the inspection result signal S CR is generated according to the first comparison signal S C1 and the first comparison signal S C2 .

如圖3所示,該比較電路220包括一第一比較器CMP1、一第二比較器CMP2以及一邏輯單元LU。 As shown in FIG. 3 , the comparison circuit 220 includes a first comparator CMP1 , a second comparator CMP2 and a logic unit LU.

該第一比較器CMP1用於根據該電壓偵測訊號Sn及該第一參考訊號VREF1產生該第一比較訊號SC1。例如,該第一比較器CMP1具有用於接收該電壓偵測訊號Sn的一正相端、以及用於接收該第一參考訊號VREF1的一反相端。 The first comparator CMP1 is used for generating the first comparison signal S C1 according to the voltage detection signal S n and the first reference signal V REF1 . For example, the first comparator CMP1 has a non-inverting terminal for receiving the voltage detection signal S n and an inverting terminal for receiving the first reference signal V REF1 .

該第二比較器CMP2用於根據該電壓偵測訊號Sn及該第二參考訊號VREF2產生該第二比較訊號SC2。例如,該第二比較器CMP2具有用於接收該第二參考訊號VREF2的一正相端、以及用於接收該電壓偵測訊號Sn的一反相端。 The second comparator CMP2 is used for generating the second comparison signal S C2 according to the voltage detection signal S n and the second reference signal V REF2 . For example, the second comparator CMP2 has a non-inverting terminal for receiving the second reference signal V REF2 and an inverting terminal for receiving the voltage detection signal Sn .

耦接於該第一比較器CMP1及該第二比較器CMP2的邏輯單元LU,是用於根據該第一比較訊號SC1及該第二比較訊號SC2產生該檢查結果訊號SCR。在一實施例中,該邏輯單元LU包括一及閘(AND gate)。及閘用於接收該第一比較訊號SC1及該第二比較訊號SC2,並用於輸出該檢查結果訊號SCRThe logic unit LU coupled to the first comparator CMP1 and the second comparator CMP2 is used to generate the inspection result signal S CR according to the first comparison signal S C1 and the second comparison signal S C2 . In one embodiment, the logic unit LU includes an AND gate. The AND gate is used for receiving the first comparison signal S C1 and the second comparison signal S C2 , and for outputting the inspection result signal S CR .

如圖3中的示例,該比較電路220可實現為確定該電壓偵測訊號Sn是否介於該第一參考訊號VREF1及該第二參考訊號VREF2之間(例如該VREF1

Figure 110142023-A0305-02-0010-2
Sn
Figure 110142023-A0305-02-0010-1
VREF2)。例如,該第一參考訊號VREF1及該第二參考訊號VREF2可分別設為VREF-D及VREF+D的電壓值(例如VREF=1.25V,D=0.25V)。 As shown in FIG. 3, the comparison circuit 220 can be implemented to determine whether the voltage detection signal Sn is between the first reference signal V REF1 and the second reference signal V REF2 (for example, the V REF1
Figure 110142023-A0305-02-0010-2
S n
Figure 110142023-A0305-02-0010-1
V REF2 ). For example, the first reference signal V REF1 and the second reference signal V REF2 can be respectively set to the voltage values of V REF −D and V REF +D (eg V REF =1.25V, D=0.25V).

藉由圖3所描繪的實施例,該接觸檢查電路20可配置為或設計為表示:該探針對於該第一焊墊P1及該第二焊墊P2的接觸連接是否已失效。例如,假設該半導體裝置1實現為包括該第一焊墊P1及該第二焊墊P2,該第一焊墊P1及該第二焊墊P2設計為接收所需的一正供應電壓及一負供應電壓,例如分別為4伏特及-2伏特的直流(DC)電壓。為了表示該等接觸連接在測試中是否正確或可靠,可藉由設定電阻R1、R2的電阻值來設計該分壓器111,使得當該第一焊墊P1及該第二焊墊P2確實接收該所需的電壓供應訊號時,藉由該偵測訊號Sn(例如電壓訊號位準(大小))介於該第一參考訊號VREF1及該第二參考訊號VREF2之間(例如VREF1

Figure 110142023-A0305-02-0010-3
Sn
Figure 110142023-A0305-02-0010-4
VREF2),加上該檢查結果訊號SCR接著在例如一邏輯高位準下輸出,來表示該等接觸連接是正確的。相反地,在一測試中,若該第一焊墊P1及該第二焊墊P2沒有與所對應的探針正確接觸,該偵測訊號Sn將會少於該第 一參考訊號VREF1(例如VREF1=1.0伏特)或大於該第二參考訊號VREF2(例如VREF2=1.5伏特),該檢查結果訊號SCR接著在一邏輯低位準下輸出,該邏輯低位準是表示該等接觸連接已失效。例如,若該第一焊墊P1正確地接收一正供應電壓(例如4伏特)且該第二焊墊P2沒有正確地接收到一負供應電壓(例如對應的探針沒有接觸第二焊墊P2或不正確的接觸),該偵測訊號Sn(例如2伏特、3伏特、3.8伏特或4伏特)可能會大於該第二參考訊號VREF2(例如VREF2=1.5伏特)。在其他實施例中,相反地,若該第一焊墊P1沒有正確地接收到一正供應電壓(例如對應的探針沒有接觸第一焊墊P1或不正確的接觸),且該第二焊墊P2正確地接收一負供應電壓(例如-2伏特),該偵測訊號Sn(例如,-2伏特、-1伏特、0伏特或0.5伏特)可能會少於該第一參考訊號VREF1(例如VREF1=1.0伏特)。 With the embodiment depicted in FIG. 3 , the contact checking circuit 20 can be configured or designed to indicate whether the contact connection of the probe to the first pad P1 and the second pad P2 has failed. For example, assuming that the semiconductor device 1 is implemented to include the first pad P1 and the second pad P2, the first pad P1 and the second pad P2 are designed to receive a required positive supply voltage and a negative supply voltage. The supply voltages are, for example, direct current (DC) voltages of 4 volts and -2 volts respectively. In order to indicate whether the contact connections are correct or reliable during the test, the voltage divider 111 can be designed by setting the resistance values of the resistors R1 and R2, so that when the first pad P1 and the second pad P2 are indeed receiving When the required voltage supply signal, by the detection signal S n (such as voltage signal level (magnitude)) between the first reference signal V REF1 and the second reference signal V REF2 (such as V REF1
Figure 110142023-A0305-02-0010-3
S n
Figure 110142023-A0305-02-0010-4
V REF2 ), plus the check result signal S CR is then output at eg a logic high level to indicate that the contact connections are correct. On the contrary, in a test, if the first pad P1 and the second pad P2 are not in contact with the corresponding probes correctly, the detection signal S n will be less than the first reference signal V REF1 ( For example, V REF1 =1.0 volts) or greater than the second reference signal V REF2 (for example, V REF2 =1.5 volts), the inspection result signal S CR is then output at a logic low level, which indicates that the contact connections expired. For example, if the first pad P1 correctly receives a positive supply voltage (for example, 4 volts) and the second pad P2 does not receive a negative supply voltage correctly (for example, the corresponding probe does not touch the second pad P2 or incorrect contact), the detection signal S n (eg 2V, 3V, 3.8V or 4V) may be greater than the second reference signal V REF2 (eg V REF2 =1.5V). In other embodiments, on the contrary, if the first pad P1 does not correctly receive a positive supply voltage (for example, the corresponding probe does not touch the first pad P1 or is not in correct contact), and the second pad P1 Pad P2 correctly receives a negative supply voltage (eg -2V), the detection signal S n (eg -2V, -1V, 0V or 0.5V) may be less than the first reference signal V REF1 (eg V REF1 =1.0 Volts).

為了更準確地進行接觸檢查,該接觸檢查電路5可以實現為,使得利用從該第一焊墊P1所接收的第一測試訊號及從該第二焊墊P2所接收的第二測試訊號來得到兩個對應的電壓偵測訊號(例如圖4中的SD1或SD2),而不是從圖2或圖3中的一個偵測訊號(例如Sn)。 In order to perform contact inspection more accurately, the contact inspection circuit 5 can be implemented such that the first test signal received from the first pad P1 and the second test signal received from the second pad P2 are used to obtain Two corresponding voltage detection signals (such as SD1 or SD2 in FIG. 4 ) instead of one detection signal (such as S n ) in FIG. 2 or FIG. 3 .

參照圖4,其描繪用於圖1的示例架構的接觸檢查電路的另一實施例。在圖4中,一接觸檢查電路30包括一電壓偵測電路310及一比較電路320。圖4中的接觸檢查電路30與圖3的接觸檢查電路20的不同處在於:該至少一電壓偵測訊號包括一第一電壓偵測訊號SD1及一第二電壓偵測訊號SD2;以及該接觸檢查電路30的電壓偵測電路310配置為根據該第一測試訊號及一第一電源供應訊號來產生該第一電壓偵測訊號SD1,且根據一第二電源供應訊號及該第二測試訊號來產生該第二電壓偵測訊號SD2。此外,該接觸檢查電路30的比較電路320配置為根據該第一電壓偵測訊號SD1及該第一參考訊號VREF1來產生一第一 比較訊號SC1,且根據該第二電壓偵測訊號SD2及該第二參考訊號VREF2來產生一第二比較訊號SC2Referring to FIG. 4 , another embodiment of a contact check circuit for the example architecture of FIG. 1 is depicted. In FIG. 4 , a contact check circuit 30 includes a voltage detection circuit 310 and a comparison circuit 320 . The contact inspection circuit 30 in FIG. 4 is different from the contact inspection circuit 20 in FIG. 3 in that: the at least one voltage detection signal includes a first voltage detection signal S D1 and a second voltage detection signal S D2 ; and The voltage detection circuit 310 of the contact inspection circuit 30 is configured to generate the first voltage detection signal S D1 according to the first test signal and a first power supply signal, and to generate the first voltage detection signal S D1 according to a second power supply signal and the second The test signal is used to generate the second voltage detection signal S D2 . In addition, the comparison circuit 320 of the contact inspection circuit 30 is configured to generate a first comparison signal S C1 according to the first voltage detection signal S D1 and the first reference signal V REF1 , and to generate a first comparison signal S C1 according to the second voltage detection signal S D2 and the second reference signal V REF2 to generate a second comparison signal S C2 .

如圖4所示,該電壓偵測電路310例如包括一第一分壓器311及一第二分壓器312。耦接於該第一焊墊P1及一第一電源供應端PS1之間的第一分壓器311是用於產生該第一電壓偵測訊號SD1。耦接於一第二電源供應端PS2及該第二焊墊P2之間的第二分壓器312是用於產生該第二電壓偵測訊號SD2As shown in FIG. 4 , the voltage detection circuit 310 includes, for example, a first voltage divider 311 and a second voltage divider 312 . The first voltage divider 311 coupled between the first pad P1 and a first power supply terminal PS1 is used to generate the first voltage detection signal S D1 . The second voltage divider 312 coupled between a second power supply terminal PS2 and the second pad P2 is used to generate the second voltage detection signal S D2 .

如圖4所示,該比較電路320包括一第一比較器CMP1、一第二比較器CMP2及一邏輯單元LU。相較於圖3的比較電路220,該比較電路320是接收該第一電壓偵測訊號SD1及該第二電壓偵測訊號SD2,而非接收一個電壓偵測訊號SnAs shown in FIG. 4 , the comparison circuit 320 includes a first comparator CMP1 , a second comparator CMP2 and a logic unit LU. Compared with the comparison circuit 220 in FIG. 3 , the comparison circuit 320 receives the first voltage detection signal SD1 and the second voltage detection signal SD2 instead of receiving a voltage detection signal S n .

該比較電路320的第一比較器CMP1用於根據該第一電壓偵測訊號SD1及該第一參考訊號VREF1來產生該第一比較訊號SC1。例如,該第一比較器CMP1具有用於接收該第一電壓偵測訊號SD1的一正相端、及用於接收該第一參考訊號VREF1的一反相端。 The first comparator CMP1 of the comparison circuit 320 is used for generating the first comparison signal S C1 according to the first voltage detection signal S D1 and the first reference signal V REF1 . For example, the first comparator CMP1 has a non-inverting terminal for receiving the first voltage detection signal SD1 and an inverting terminal for receiving the first reference signal V REF1 .

該比較電路320的第二比較器CMP2用於根據該第二電壓偵測訊號SD2及該第二參考訊號VREF2來產生該第一比較訊號SC1。例如,該第二比較器CMP2具有用於接收該第二參考訊號VREF2的一正相端、及用於接收該第二電壓偵測訊號SD2的一反相端。 The second comparator CMP2 of the comparison circuit 320 is used for generating the first comparison signal S C1 according to the second voltage detection signal SD2 and the second reference signal V REF2 . For example, the second comparator CMP2 has a non-inverting terminal for receiving the second reference signal V REF2 and an inverting terminal for receiving the second voltage detection signal SD2 .

耦接於該第一比較器CMP1及該第二比較器CMP2的邏輯單元LU,是用於根據該第一比較訊號SC1及該第二比較訊號SC2來產生該檢查結果訊號SCR。例如,該比較電路320與比較電路220的邏輯單元LU相似。 The logic unit LU coupled to the first comparator CMP1 and the second comparator CMP2 is used to generate the inspection result signal S CR according to the first comparison signal S C1 and the second comparison signal S C2 . For example, the comparison circuit 320 is similar to the logic unit LU of the comparison circuit 220 .

如圖4之示例,該比較電路320可實現為確定該第一電壓偵測訊號SD1是否大於或等於該第一參考訊號VREF1,及該第二參考訊號VREF2是否大於或等於該第二電壓偵測訊號SD2(例如:SD1

Figure 110142023-A0305-02-0013-5
VREF1且VREF2
Figure 110142023-A0305-02-0013-6
SD2)。例如,該第一參考訊號VREF1及該第二參考訊號VREF2可設為相同電壓值或不同電壓值。 As shown in Figure 4, the comparison circuit 320 can be implemented to determine whether the first voltage detection signal S D1 is greater than or equal to the first reference signal V REF1 , and whether the second reference signal V REF2 is greater than or equal to the second Voltage detection signal S D2 (for example: S D1
Figure 110142023-A0305-02-0013-5
V REF1 and V REF2
Figure 110142023-A0305-02-0013-6
SD2 ). For example, the first reference signal V REF1 and the second reference signal V REF2 can be set to the same voltage or different voltages.

藉由圖4所描繪的方法,該接觸檢查電路30可配置為或設計為表示探針對於該第一焊墊P1及該第二焊墊P2的接觸連接是否失效。例如,假設半導體裝置1實現為包括第一焊墊P1及第二焊墊P2。第一焊墊P1及第二焊墊P2用於接收所需的一正供應電壓及一負供應電壓,例如分別為4伏特及-2伏特的直流(DC)電壓。為了表示在測試中該等接觸連接是否正確或可靠,可藉由設定電阻R11、R12、R21及R22的電阻值來設計該分壓器311及該分壓器312,使得當該第一焊墊P1及該第二焊墊P2確實接收到電壓供應訊號時,藉由該第一電壓偵測訊號SD1大於或等於該第一參考訊號VREF1,加上該第二參考訊號VREF2大於或等於該第二電壓偵測訊號SD2(例如:SD1

Figure 110142023-A0305-02-0013-7
VREF1且VREF2
Figure 110142023-A0305-02-0013-8
SD2,其中VREF1
Figure 110142023-A0305-02-0013-9
VREF2),加上該檢查結果訊號SCR接著在例如一邏輯高位準下輸出,來表示該等接觸連接是正確的。相反地,在測試中,若該第一焊墊P1及該第二焊墊P2的其中之一沒有正確的接觸於對應的探針,該第一電壓偵測訊號SD1將會少於該第一參考訊號VREF1(例如:SD1<VREF1),或該第二參考訊號VREF2小於該第二電壓偵測訊號SD2(例如:VREF2<SD2),該檢查結果訊號SCR接著在例如一邏輯低位準下輸出,來表示該等接觸連接是失效的。如此一來,藉由接觸檢查電路30可更準確地進行接觸檢查。 By the method depicted in FIG. 4 , the contact inspection circuit 30 can be configured or designed to indicate whether the contact connection of the probes to the first pad P1 and the second pad P2 fails. For example, assume that the semiconductor device 1 is implemented to include the first pad P1 and the second pad P2. The first pad P1 and the second pad P2 are used to receive a required positive supply voltage and a negative supply voltage, such as direct current (DC) voltages of 4 volts and −2 volts respectively. In order to show whether these contact connections are correct or reliable during the test, the voltage divider 311 and the voltage divider 312 can be designed by setting the resistance values of the resistors R11, R12, R21 and R22, so that when the first pad When P1 and the second pad P2 do receive the voltage supply signal, the first voltage detection signal S D1 is greater than or equal to the first reference signal V REF1 , plus the second reference signal V REF2 is greater than or equal to The second voltage detection signal S D2 (for example: S D1
Figure 110142023-A0305-02-0013-7
V REF1 and V REF2
Figure 110142023-A0305-02-0013-8
S D2 , where V REF1
Figure 110142023-A0305-02-0013-9
V REF2 ), plus the check result signal S CR is then output at eg a logic high level to indicate that the contact connections are correct. On the contrary, in the test, if one of the first pad P1 and the second pad P2 is not correctly contacted with the corresponding probe, the first voltage detection signal S D1 will be less than the first voltage detection signal S D1 A reference signal V REF1 (for example: S D1 <V REF1 ), or the second reference signal V REF2 is smaller than the second voltage detection signal S D2 (for example: V REF2 <S D2 ), the inspection result signal S CR is then output at eg a logic low level to indicate that the contact connections are disabled. In this way, the contact inspection can be performed more accurately by the contact inspection circuit 30 .

在一些實施例中,該接觸檢查電路20或30的邏輯單元LU可包括一或更多的邏輯閘,例如及閘(AND)、或閘(OR)、反閘(NOT)、互斥或閘(XOR) 或反互斥或閘(XNOR),或為了輸出該檢查結果訊號SCR的相同目的之任何合理的組合。例如,在接觸檢查電路20的第一比較器CMP1的配置修改為使其正相端和反相端分別接收第一參考訊號VREF1及電壓檢測訊號Sn的情況下,為了輸出該檢查結果訊號SCR的相同目的,接觸檢查電路20的邏輯單元LU可改為另一邏輯電路,以執行利用反閘以及互斥或閘(NOR)的(SC1'+SC2)'的布林(Boolean)方程式。接觸檢查電路30的邏輯單元LU可以類似地以這種方式實現。此外,邏輯單元LU也可以作其他修改。因此,本發明的實現並不限於這些實施例。 In some embodiments, the logic unit LU of the contact check circuit 20 or 30 may include one or more logic gates, such as an AND gate (AND), an OR gate (OR), an inverted gate (NOT), a mutual exclusion OR gate (XOR) or exclusive OR gate (XNOR), or any reasonable combination for the same purpose of outputting the check result signal S CR . For example, when the configuration of the first comparator CMP1 of the contact inspection circuit 20 is modified so that its non-inverting terminal and inverting terminal respectively receive the first reference signal V REF1 and the voltage detection signal Sn , in order to output the inspection result signal For the same purpose of S CR , the logic unit LU of the contact check circuit 20 can be changed to another logic circuit to implement the Boolean equation of (SC1'+SC2)' using reverse gate and exclusive OR gate (NOR) . The logic unit LU of the contact check circuit 30 can similarly be implemented in this way. In addition, the logic unit LU can also be modified in other ways. Therefore, the implementation of the present invention is not limited to these embodiments.

在一些實施例中,半導體裝置1可配置為根據圖2、3或4中所示的接觸檢查電路10、20或30來實現該接觸檢查電路5,以便在測試中至少對該第一焊墊P1及第二焊墊P2進行接觸檢查。為了回應該半導體測試設備9的測試請求訊號,該半導體裝置1接著向該半導體測試設備9輸出檢查結果訊號SCR,以當作一測試結果訊號,或根據檢查結果訊號SCR以及可由半導體裝置1中執行的附加邏輯測試中獲得的一個或多個附加結果,來輸出一測試結果訊號。 In some embodiments, the semiconductor device 1 can be configured to implement the contact inspection circuit 5 according to the contact inspection circuit 10, 20 or 30 shown in FIG. 2, 3 or 4, so that at least the first pad P1 and the second pad P2 are contact checked. In response to the test request signal of the semiconductor testing equipment 9, the semiconductor device 1 then outputs the inspection result signal S CR to the semiconductor testing equipment 9 as a test result signal, or according to the inspection result signal S CR and can be generated by the semiconductor device 1 output a test result signal based on one or more additional results obtained from the additional logic tests performed in the

參照圖5,其描繪用於圖1的示例架構的半導體裝置的實施例。在圖5中,作為半導體裝置1的一實施例的半導體裝置1A包括複數個焊墊、一內部電路以及一接觸檢查電路5。 Referring to FIG. 5 , an embodiment of a semiconductor device for the example architecture of FIG. 1 is depicted. In FIG. 5 , a semiconductor device 1A as an example of a semiconductor device 1 includes a plurality of pads, an internal circuit, and a contact inspection circuit 5 .

該等焊墊包括一第一焊墊P1、一第二焊墊P2、一資料端DQ及一命令端CMD。該內部電路耦接於該等焊墊。 The pads include a first pad P1, a second pad P2, a data terminal DQ and a command terminal CMD. The internal circuit is coupled to the pads.

該內部電路可包括一解碼器510及一電子保險絲單元520。該解碼器510耦接於該資料端DQ、該命令端CMD及該電子保險絲單元520。該電子保險絲單元520可包括複數個電子保險絲。例如,該等電子保險絲的至少其中 之一的兩端是耦接於該第一焊墊P1及該第二焊墊P2。如圖5所示,該第一焊墊P1及該第二焊墊P2都耦接到該接觸檢查電路5。 The internal circuit may include a decoder 510 and an electronic fuse unit 520 . The decoder 510 is coupled to the data terminal DQ, the command terminal CMD and the electronic fuse unit 520 . The electronic fuse unit 520 may include a plurality of electronic fuses. For example, at least one of these electronic fuses Two ends of one of them are coupled to the first pad P1 and the second pad P2. As shown in FIG. 5 , both the first pad P1 and the second pad P2 are coupled to the contact checking circuit 5 .

為了回應從該資料端DQ及該命令端CMD所接收到的一資料訊號及一命令訊號,該解碼器510可實現為執行不同模式。例如,在燒熔電子保險絲的操作之前,可執行一測試。半導體測試設備9分別產生給該資料端DQ、該命令端CMD、該第一焊墊P1及該第二焊墊P2的一資料訊號、一命令訊號、一正供應電壓及一負供應電壓。該資料訊號表示一特定碼或位址,且該命令訊號表示一測試命令其用以檢查該半導體裝置1A對於電子保險絲燒熔的程序是否已準備好。若該半導體裝置1A在邏輯上已準備好,該解碼器510可產生一回應碼(例如:110011001100),以回應該資料訊號及該命令訊號。 In response to a data signal and a command signal received from the data terminal DQ and the command terminal CMD, the decoder 510 can be implemented to perform different modes. For example, a test may be performed prior to the operation of blowing an electronic fuse. The semiconductor testing equipment 9 respectively generates a data signal, a command signal, a positive supply voltage and a negative supply voltage to the data terminal DQ, the command terminal CMD, the first pad P1 and the second pad P2. The data signal represents a specific code or address, and the command signal represents a test command for checking whether the semiconductor device 1A is ready for the electronic fuse blowing procedure. If the semiconductor device 1A is logically ready, the decoder 510 can generate a response code (for example: 110011001100) in response to the data signal and the command signal.

另一方面,如圖2、圖3或圖4所描繪的接觸檢查電路5對於第一焊墊P1及第二焊墊P2的接觸連接進行檢查以產生一檢查結果訊號SCR,該檢查結果訊號SCR是根據接收自該第一焊墊P1的一第一測試訊號及該第二焊墊P2的一第二測試訊號與至少一參考訊號之間的比較而產生。 On the other hand, the contact checking circuit 5 depicted in FIG. 2 , FIG. 3 or FIG. 4 checks the contact connection between the first pad P1 and the second pad P2 to generate a check result signal S CR , the check result signal SCR is generated according to a comparison between a first test signal received from the first pad P1 and a second test signal received from the second pad P2 with at least one reference signal.

在一實施例中,產生自該解碼器510的回應碼以及由該接觸檢查電路5所產生檢查結果訊號SCR可被送回該半導體測試設備9。 In one embodiment, the response code generated from the decoder 510 and the inspection result signal S CR generated by the contact inspection circuit 5 can be sent back to the semiconductor testing equipment 9 .

在其他實施例中,如圖6所示,該半導體裝置1A可更包括一輸出邏輯單元600,以根據該檢查結果訊號SCR及該回應碼(例如表示為IN)產生一測試結果訊號OUT。例如,該輸出邏輯單元600可包括一專屬的反互斥或閘。若該回應碼IN其例如在二進位中的「110011001100」表示該半導體裝置1A邏輯上已準備好,且該檢查結果訊號SCR(例如邏輯1)表示該接觸連接是正確的,該測試結果訊號OUT與該回應碼IN呈現相同的碼。若該回應碼IN表示該半導體裝 置1A在邏輯上已準備好,然而該檢查結果訊號SCR(例如邏輯0)表示接觸連接不正確,該測試結果訊號OUT在二進位中表示為「001100110011」。在其他實施例中,該輸出邏輯單元600可包括一或更多的邏輯閘,例如及閘(AND)、或閘(OR)、反閘(NOT)、互斥或閘(XOR)或反互斥或閘(XNOR),或以上任何合理的結合。 In other embodiments, as shown in FIG. 6 , the semiconductor device 1A may further include an output logic unit 600 for generating a test result signal OUT according to the test result signal S CR and the response code (for example, IN). For example, the output logic unit 600 may include a dedicated exclusive OR gate. If the response code IN is, for example, "110011001100" in binary, it indicates that the semiconductor device 1A is logically ready, and the check result signal S CR (for example, logic 1) indicates that the contact connection is correct, and the test result signal OUT presents the same code as the response code IN. If the response code IN indicates that the semiconductor device 1A is logically ready, but the inspection result signal S CR (for example, logic 0) indicates that the contact connection is incorrect, the test result signal OUT is represented as “001100110011” in binary. In other embodiments, the output logic unit 600 may include one or more logic gates, such as AND gate (AND), OR gate (OR), Inversion gate (NOT), exclusive OR gate (XOR) or mutual inversion XNOR, or any reasonable combination of the above.

在此方式下,該半導體測試設備9可被實現為:一旦接收到例如表示該等接觸連接是失效(例如:「001100110011」)的測試結果訊號OUT,則終止測試。如此一來,如圖2、圖3或圖4所示的使用該接觸檢查電路5的半導體裝置1A,在探針與焊墊沒有正確連接時,可用來避免該半導體測試設備9錯誤地執行測試或甚至一燒熔操作(例如針對電子保險絲)。 In this way, the semiconductor testing equipment 9 can be implemented to terminate the test once it receives the test result signal OUT indicating that the contact connections are failed (for example: “001100110011”). In this way, the semiconductor device 1A using the contact inspection circuit 5 as shown in FIG. 2, FIG. 3 or FIG. Or even a blow operation (eg for electronic fuses).

如上,已提供具有接觸檢查電路的半導體裝置的多種實施例。該半導體裝置包括一接觸檢查電路,當該半導體裝置使用連接到該半導體裝置的例如至少兩焊墊的一半導體測試設備進行測試,該接觸檢查電路對該至少兩焊墊的接觸連接進行檢查以產生一檢查結果訊號。該檢查結果訊號可用於表示對於該第一焊墊與該第二焊墊的接觸連接是否失效,且該半導體測試設備可配置為根據該檢查結果訊號來決定是否要繼續執行該測試。因此,可增進對於半導體裝置測試的可靠度。 As above, various embodiments of the semiconductor device with the contact inspection circuit have been provided. The semiconductor device includes a contact checking circuit. When the semiconductor device is tested using a semiconductor test equipment connected to the semiconductor device, for example, at least two pads, the contact checking circuit checks the contact connection of the at least two pads to generate A check result signal. The inspection result signal can be used to indicate whether the contact connection between the first pad and the second pad is invalid, and the semiconductor testing equipment can be configured to determine whether to continue the test according to the inspection result signal. Therefore, reliability for semiconductor device testing can be improved.

本發明在上文中已以較佳實施例揭露,然熟習本項技術者應理解的是,該實施例僅用於描繪本發明,而不應解讀為限制本發明之範圍。應注意的是,舉凡與該實施例等效之變化與置換,均應設為涵蓋於本發明之範疇內。因此,本發明之保護範圍當以申請專利範圍所界定者為準。 The present invention has been disclosed above with preferred embodiments, but those skilled in the art should understand that the embodiments are only used to describe the present invention, and should not be construed as limiting the scope of the present invention. It should be noted that all changes and substitutions equivalent to the embodiment should be included in the scope of the present invention. Therefore, the scope of protection of the present invention should be defined by the scope of the patent application.

1:半導體裝置 1: Semiconductor device

2:內部電路 2: Internal circuit

5:接觸檢查電路 5: Contact check circuit

9:半導體測試設備 9: Semiconductor test equipment

P1:第一焊墊 P1: The first pad

P2:第二焊墊 P2: Second pad

PB:探針 PB: Probe

Claims (10)

一種具有接觸檢查電路的半導體裝置,其包含:複數個焊墊,包括一第一焊墊以及一第二焊墊;一內部電路,耦接於該等焊墊;以及一接觸檢查電路,至少耦接於該第一焊墊及該第二焊墊,用於當該半導體裝置進行測試時,對該第一焊墊與該第二焊墊的多個接觸連接進行檢查以產生一檢查結果訊號,該檢查結果訊號是根據接收自該第一焊墊的一第一測試訊號及該第二焊墊的一第二測試訊號與至少一參考訊號之間的比較而產生;其中,該接觸檢查電路包括:一電壓偵測電路,耦接於該第一焊墊及該第二焊墊且用以產生至少一電壓偵測訊號,該至少一電壓偵測訊號包括一第一電壓偵測訊號及一第二電壓偵測訊號,該電壓偵測電路配置為根據該第一測試訊號及一第一電源供應訊號產生該第一電壓偵測訊號並根據一第二電源供應訊號及該第二測試訊號產生該第二電壓偵測訊號;以及一比較電路,耦接於該電壓偵測電路且用以根據該至少一電壓偵測訊號及該至少一參考訊號產生該檢查結果訊號。 A semiconductor device with a contact check circuit, comprising: a plurality of pads, including a first pad and a second pad; an internal circuit coupled to the pads; and a contact check circuit coupled to at least connected to the first pad and the second pad, and is used for inspecting a plurality of contact connections between the first pad and the second pad to generate an inspection result signal when the semiconductor device is tested, The inspection result signal is generated according to a comparison between a first test signal received from the first pad and a second test signal received from the second pad with at least one reference signal; wherein the contact inspection circuit includes : a voltage detection circuit, coupled to the first pad and the second pad and used to generate at least one voltage detection signal, the at least one voltage detection signal includes a first voltage detection signal and a first voltage detection signal Two voltage detection signals, the voltage detection circuit is configured to generate the first voltage detection signal according to the first test signal and a first power supply signal and generate the first voltage detection signal according to a second power supply signal and the second test signal a second voltage detection signal; and a comparison circuit coupled to the voltage detection circuit and used for generating the inspection result signal according to the at least one voltage detection signal and the at least one reference signal. 如請求項1所述之半導體裝置,其中該電壓偵測電路包括一分壓器,該分壓器耦接於該第一焊墊與該第二焊墊之間,用以產生該至少一電壓偵測訊號。 The semiconductor device as claimed in claim 1, wherein the voltage detection circuit includes a voltage divider coupled between the first pad and the second pad to generate the at least one voltage detection signal. 如請求項1所述之半導體裝置,其中該比較電路包括一比較器,該比較器用以根據該至少一電壓偵測訊號及該至少一參考訊號產生該檢查結果訊號。 The semiconductor device according to claim 1, wherein the comparison circuit includes a comparator for generating the inspection result signal according to the at least one voltage detection signal and the at least one reference signal. 如請求項1所述之半導體裝置,其中該至少一參考訊號包括一第一參考訊號及一第二參考訊號,該比較電路配置為根據該至少一電壓偵測訊號及該第一參考訊號產生一第一比較訊號;以及該比較電路配置為根據該至少一電壓偵測訊號及該第二參考訊號產生一第二比較訊號;其中該比較電路配置為根據該第一比較訊號及該第二比較訊號產生該檢查結果訊號。 The semiconductor device as described in Claim 1, wherein the at least one reference signal includes a first reference signal and a second reference signal, and the comparison circuit is configured to generate a voltage based on the at least one voltage detection signal and the first reference signal a first comparison signal; and the comparison circuit is configured to generate a second comparison signal based on the at least one voltage detection signal and the second reference signal; wherein the comparison circuit is configured to generate a second comparison signal based on the first comparison signal and the second comparison signal Generate the check result signal. 如請求項4所述之半導體裝置,其中該比較電路包括:一第一比較器,用於根據該至少一電壓偵測訊號及該第一參考訊號產生該第一比較訊號;一第二比較器,用於根據該至少一電壓偵測訊號及該第二參考訊號產生該第二比較訊號;以及一邏輯單元,耦接於該第一比較器及該第二比較器,並用以根據該第一比較訊號及該第二比較訊號產生該檢查結果訊號。 The semiconductor device as described in claim 4, wherein the comparison circuit includes: a first comparator for generating the first comparison signal according to the at least one voltage detection signal and the first reference signal; a second comparator , for generating the second comparison signal according to the at least one voltage detection signal and the second reference signal; and a logic unit, coupled to the first comparator and the second comparator, and used for generating the second comparison signal according to the first The comparison signal and the second comparison signal generate the inspection result signal. 如請求項1所述之半導體裝置,其中該電壓偵測電路包括:一第一分壓器,耦接於該第一焊墊與一第一電源供應端之間,用以產生該第一電壓偵測訊號;以及一第二分壓器,耦接於一第二電源供應端與該第二焊墊之間,以產生該第二電壓偵測訊號。 The semiconductor device according to claim 1, wherein the voltage detection circuit includes: a first voltage divider, coupled between the first pad and a first power supply terminal, for generating the first voltage detection signal; and a second voltage divider coupled between a second power supply end and the second welding pad to generate the second voltage detection signal. 如請求項1所述之半導體裝置,其中該至少一參考訊號包括一第一參考訊號及一第二參考訊號;該比較電路配置為根據該第一電壓偵測訊號及該第一參考訊號產生一第一比較訊號;以及 該比較電路配置為根據該第二電壓偵測訊號及該第二參考訊號產生一第二比較訊號;其中該比較電路配置為根據該第一比較訊號及該第二比較訊號產生該檢查結果訊號。 The semiconductor device as described in claim 1, wherein the at least one reference signal includes a first reference signal and a second reference signal; the comparison circuit is configured to generate a voltage according to the first voltage detection signal and the first reference signal the first comparison signal; and The comparison circuit is configured to generate a second comparison signal according to the second voltage detection signal and the second reference signal; wherein the comparison circuit is configured to generate the inspection result signal according to the first comparison signal and the second comparison signal. 如請求項7所述之半導體裝置,其中該比較電路包括:一第一比較器,用於根據該第一電壓偵測訊號及該第一參考訊號產生該第一比較訊號;一第二比較器,用於根據該第二電壓偵測訊號及該第二參考訊號產生該第二比較訊號;以及一邏輯單元,用於根據該第一比較訊號及該第二比較訊號產生該檢查結果訊號。 The semiconductor device as described in claim 7, wherein the comparison circuit includes: a first comparator for generating the first comparison signal according to the first voltage detection signal and the first reference signal; a second comparator , for generating the second comparison signal according to the second voltage detection signal and the second reference signal; and a logic unit, for generating the inspection result signal according to the first comparison signal and the second comparison signal. 如請求項1所述之半導體裝置,其中該內部電路包括一電子保險絲,該電子保險絲耦接於該第一焊墊及該第二焊墊之間。 The semiconductor device as claimed in claim 1, wherein the internal circuit includes an electronic fuse, and the electronic fuse is coupled between the first pad and the second pad. 如請求項1所述之半導體裝置,其中該半導體裝置更包含一輸出邏輯單元,用於根據該檢查結果訊號及一回應碼產生一測試結果訊號。 The semiconductor device as claimed in claim 1, wherein the semiconductor device further includes an output logic unit for generating a test result signal according to the inspection result signal and a response code.
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US20110089964A1 (en) * 2007-01-08 2011-04-21 Samsung Electronics Co., Ltd. Method for testing semiconductor memory device using probe and semiconductor memory device using the same
TW201218143A (en) * 2010-10-28 2012-05-01 Au Optronics Corp Display device and system for inspecting bonding resistance and inpsecting method thereof
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