TWI788783B - 光罩測量方法 - Google Patents

光罩測量方法 Download PDF

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Publication number
TWI788783B
TWI788783B TW110105486A TW110105486A TWI788783B TW I788783 B TWI788783 B TW I788783B TW 110105486 A TW110105486 A TW 110105486A TW 110105486 A TW110105486 A TW 110105486A TW I788783 B TWI788783 B TW I788783B
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TW
Taiwan
Prior art keywords
reticle
latent image
mask
spatial
alignment
Prior art date
Application number
TW110105486A
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English (en)
Chinese (zh)
Other versions
TW202136901A (zh
Inventor
迪米奇 希馬克
湯瑪士 泰勒
史蒂芬 斯坦奈特
德克 拜爾
尤特 布特格雷特
Original Assignee
德商卡爾蔡司Ｓｍｔ有限公司
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Application filed by 德商卡爾蔡司Ｓｍｔ有限公司 filed Critical 德商卡爾蔡司Ｓｍｔ有限公司
Publication of TW202136901A publication Critical patent/TW202136901A/zh
Application granted granted Critical
Publication of TWI788783B publication Critical patent/TWI788783B/zh

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW110105486A 2020-02-18 2021-02-18 光罩測量方法 TWI788783B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102020104167.5 2020-02-18
DE102020104167.5A DE102020104167B4 (de) 2020-02-18 2020-02-18 Verfahren zur Vermessung von Photomasken

Publications (2)

Publication Number Publication Date
TW202136901A TW202136901A (zh) 2021-10-01
TWI788783B true TWI788783B (zh) 2023-01-01

Family

ID=77060607

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110105486A TWI788783B (zh) 2020-02-18 2021-02-18 光罩測量方法

Country Status (6)

Country Link
US (1) US11899358B2 (https=)
JP (2) JP2021144211A (https=)
KR (1) KR102638175B1 (https=)
CN (1) CN113340564B (https=)
DE (1) DE102020104167B4 (https=)
TW (1) TWI788783B (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102021112547A1 (de) * 2021-05-14 2022-11-17 Carl Zeiss Smt Gmbh Verfahren zur Ermittlung eines Registrierungsfehlers

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US5504793A (en) * 1995-02-17 1996-04-02 Loral Federal Systems Company Magnification correction for 1-X proximity X-Ray lithography
WO2012013638A1 (en) * 2010-07-26 2012-02-02 Carl Zeiss Sms Ltd. Lithographic targets for uniformity control
TW201327030A (zh) * 2011-12-19 2013-07-01 United Microelectronics Corp 修正佈局圖案的方法以及製作光罩的方法
JP2017058397A (ja) * 2015-09-14 2017-03-23 大日本印刷株式会社 フォトマスクの転写特性評価方法と転写特性評価システムおよびフォトマスクの製造方法
US10176966B1 (en) * 2017-04-13 2019-01-08 Fractilia, Llc Edge detection system

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WO2000025181A1 (en) * 1998-10-23 2000-05-04 Hitachi, Ltd. Method for fabricating semiconductor device and method for forming mask suitable therefor
JP2005251983A (ja) * 2004-03-04 2005-09-15 Renesas Technology Corp 荷電粒子線マスク検査方法及び荷電粒子線マスク検査装置
US7617477B2 (en) * 2005-09-09 2009-11-10 Brion Technologies, Inc. Method for selecting and optimizing exposure tool using an individual mask error model
KR100924335B1 (ko) * 2007-03-27 2009-11-02 주식회사 하이닉스반도체 멀티 도즈 시뮬레이션을 이용한 광근접보정 방법
KR100881194B1 (ko) * 2007-05-16 2009-02-05 삼성전자주식회사 공간 영상 검사 장비를 이용한 마스크 측정 방법
KR100914297B1 (ko) * 2007-12-28 2009-08-27 주식회사 하이닉스반도체 웨이퍼 패턴 계측 데이터를 이용한 광근접효과보정 방법
EP2093614A1 (en) 2008-02-22 2009-08-26 Imec Split and design guidelines for double patterning
DE102008015631A1 (de) 2008-03-20 2009-09-24 Carl Zeiss Sms Gmbh Verfahren und Vorrichtung zur Vermessung von Masken für die Photolithographie
JP5341399B2 (ja) 2008-06-03 2013-11-13 ルネサスエレクトロニクス株式会社 パターン検証方法、パターン検証装置、プログラム、及び半導体装置の製造方法
JP2010038944A (ja) 2008-07-31 2010-02-18 Toshiba Corp フォトマスクの製造方法及びこのフォトマスクを用いた半導体デバイスの製造方法
JP5235719B2 (ja) 2009-02-27 2013-07-10 株式会社日立ハイテクノロジーズ パターン測定装置
DE102009038558A1 (de) * 2009-08-24 2011-03-10 Carl Zeiss Sms Gmbh Verfahren zur Emulation eines fotolithographischen Prozesses und Maskeninspektionsmikroskop zur Durchführung des Verfahrens
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EP3037878B1 (en) 2014-12-23 2020-09-09 Aselta Nanographics Method of applying vertex based corrections to a semiconductor design
US10572990B2 (en) * 2017-04-07 2020-02-25 Nuflare Technology, Inc. Pattern inspection apparatus, pattern position measurement apparatus, aerial image measurement system, method for measuring aerial image, pattern position repairing apparatus, method for repairing pattern position, aerial image data processing apparatus, method for processing aerial image data, pattern exposure apparatus, method for exposing pattern, method for manufacturing mask, and mask manufacturing system
CN107121893B (zh) * 2017-06-12 2018-05-25 中国科学院上海光学精密机械研究所 光刻投影物镜热像差在线预测方法
DE102017115365B4 (de) * 2017-07-10 2020-10-15 Carl Zeiss Smt Gmbh Inspektionsvorrichtung für Masken für die Halbleiterlithographie und Verfahren
DE102017219217B4 (de) * 2017-10-26 2021-03-25 Carl Zeiss Smt Gmbh Masken für die Mikrolithographie, Verfahren zur Bestimmung von Kantenpositionen der Bilder der Strukturen einer derartigen Maske und System zur Durchführung eines derartigen Verfahrens
DE102018111972A1 (de) 2018-05-18 2019-05-29 Carl Zeiss Smt Gmbh Verfahren zur Bestimmung von Registrationsfehlern auf einer Photomaske für die Halbleiterlithographie
DE102018210315B4 (de) * 2018-06-25 2021-03-18 Carl Zeiss Smt Gmbh Verfahren zur Erfassung einer Struktur einer Lithografiemaske sowie Vorrichtung zur Durchführung des Verfahrens

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5504793A (en) * 1995-02-17 1996-04-02 Loral Federal Systems Company Magnification correction for 1-X proximity X-Ray lithography
WO2012013638A1 (en) * 2010-07-26 2012-02-02 Carl Zeiss Sms Ltd. Lithographic targets for uniformity control
US20130295698A1 (en) * 2010-07-26 2013-11-07 Rainer Pforr Lithographic targets for uniformity control
TW201327030A (zh) * 2011-12-19 2013-07-01 United Microelectronics Corp 修正佈局圖案的方法以及製作光罩的方法
JP2017058397A (ja) * 2015-09-14 2017-03-23 大日本印刷株式会社 フォトマスクの転写特性評価方法と転写特性評価システムおよびフォトマスクの製造方法
US10176966B1 (en) * 2017-04-13 2019-01-08 Fractilia, Llc Edge detection system

Also Published As

Publication number Publication date
JP2023129405A (ja) 2023-09-14
KR102638175B1 (ko) 2024-02-19
US20210255541A1 (en) 2021-08-19
CN113340564B (zh) 2024-12-06
DE102020104167B4 (de) 2023-01-26
US11899358B2 (en) 2024-02-13
TW202136901A (zh) 2021-10-01
DE102020104167A1 (de) 2021-08-19
CN113340564A (zh) 2021-09-03
JP2021144211A (ja) 2021-09-24
KR20210105838A (ko) 2021-08-27

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