TWI786650B - Plasma mixed liquid generating device and plasma generating module - Google Patents

Plasma mixed liquid generating device and plasma generating module Download PDF

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TWI786650B
TWI786650B TW110119158A TW110119158A TWI786650B TW I786650 B TWI786650 B TW I786650B TW 110119158 A TW110119158 A TW 110119158A TW 110119158 A TW110119158 A TW 110119158A TW I786650 B TWI786650 B TW I786650B
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plasma
magnetic ring
unit
guide pin
electrically coupled
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TW110119158A
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TW202247707A (en
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盧仁傑
廖啟宏
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拜普生醫股份有限公司
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Abstract

A plasma mixed liquid generating device and a plasma generating module are provided. The plasma generating device has a driving unit and a plasma generating unit that is electrically coupled to the driving unit. The plasma generating unit has a magnetic ring and a guide pin. The magnetic ring is electrically coupled to the drive unit. The magnetic ring has a uniform magnetic field. The guide pin is disposed in the magnetic ring and electrically coupled to the drive unit. The guide pin and an inner edge of the magnetic ring are spaced apart from each other, and the guide pin has the same distance from anywhere on the inner edge of the magnetic ring, so that the guide pin and the magnetic ring can be driven by the drive unit to jointly produce a circular plasma. Accordingly, the plasma generating module can greatly increase the quantity of plasma particles generated during the electrolysis of gas.

Description

電漿液產生裝置及電漿產生模組 Plasma liquid generating device and plasma generating module

本發明涉及一種產生裝置,尤其涉及一種電漿液產生裝置及電漿產生模組。 The invention relates to a generating device, in particular to a plasma liquid generating device and a plasma generating module.

現有電漿液產生裝置具有容置液體的一水箱及設置於水箱上的一電漿產生器,電漿產生器具有極性相反的一第一電極及一第二電極,並且第一電極及第二電極會設置於水箱內的液體表面上。據此當第一電極及第二電極運作而產生電弧時,液體表面上的空氣被電弧電解而產生電漿粒子,進而通過攪拌或其他物理方式使液體與電漿粒子混合形成一電漿液。 The existing plasma liquid generating device has a water tank for accommodating liquid and a plasma generator arranged on the water tank. The plasma generator has a first electrode and a second electrode with opposite polarities, and the first electrode and the second electrode Will be set on the surface of the liquid in the tank. Accordingly, when the first electrode and the second electrode operate to generate an arc, the air on the surface of the liquid is electrolyzed by the arc to generate plasma particles, and then the liquid and the plasma particles are mixed to form a plasma liquid by stirring or other physical methods.

然而,現有電漿液產生裝置礙於其結構的限制,導致電漿產生器於單位時間內所能產生的電漿粒子數量低落,進而影響電漿液的產出效率。 However, due to the limitation of the structure of the existing plasma liquid generating device, the number of plasma particles that the plasma generator can generate per unit time is reduced, thereby affecting the output efficiency of the plasma liquid.

於是,本發明人認為上述缺陷可改善,乃特潛心研究並配合科學原理的運用,終於提出一種設計合理且有效改善上述缺陷的本發明。 Therefore, the inventor believes that the above-mentioned defects can be improved, Naite devoted himself to research and combined with the application of scientific principles, and finally proposed an invention with reasonable design and effective improvement of the above-mentioned defects.

本發明所要解決的技術問題在於,針對現有技術的不足提供一種電漿液產生裝置及電漿產生模組,能有效地改善現有電漿液產生裝置所可 能產生的缺陷。 The technical problem to be solved by the present invention is to provide a plasma liquid generation device and a plasma generation module for the deficiencies of the prior art, which can effectively improve the performance of the existing plasma liquid generation device. possible defects.

本發明實施例公開一種電漿液產生裝置,包括:一氣液混合模組,包含:一容置殼,包含一容置部及連通所述容置部的一導出部,所述容置部能用來容置一氣體,並且由所述導出部導出所述氣體;及一文氏管,連通於所述導出部的一端,所述文氏管能用來供一液體通過,使所述導出部產生一負壓;一電漿產生模組,包含:一驅動單元及一電漿導出單元,所述驅動單元電性耦接所述電漿導出單元,所述電漿導出單元設置於所述容置殼內,所述驅動單元能驅動所述電漿導出單元導出一環形電場,其中所述電漿導出單元包含:一絕緣座,其位置對應所述導出部;一磁環,設置於所述絕緣座上且電性耦接所述驅動單元,所述磁環具有均勻的一磁場;及一導針,設置所述磁環內並電性耦接所述驅動單元,所述導針與所述磁環的內緣間隔配置,並且所述導針至所述磁環的內緣的任一處具有相同距離,使所述導針與所述磁環能被所述驅動單元驅動而共同產生所述環形電場,所述環形電場能用來電解通過所述導出部的所述氣體,並產生多個電漿粒子;其中,當所述文氏管供所述液體流經時,所述文氏管利用所述負壓由所述導出部吸入多個所述電漿粒子,使所述液體與多個所述電漿粒子混合為一電漿液。 The embodiment of the present invention discloses a plasma liquid generating device, including: a gas-liquid mixing module, including: a housing shell, including a housing part and a lead-out part connected to the housing part, the housing part can be used to accommodate a gas, and lead out the gas from the outlet; and a venturi tube, communicated with one end of the outlet, the venturi can be used for a liquid to pass through, so that the outlet produces A negative pressure; a plasma generating module, including: a driving unit and a plasma exporting unit, the driving unit is electrically coupled to the plasma exporting unit, and the plasma exporting unit is arranged in the accommodating In the shell, the driving unit can drive the plasma exporting unit to export a circular electric field, wherein the plasma exporting unit includes: an insulating seat, whose position corresponds to the exporting part; a magnetic ring, arranged on the insulating On the base and electrically coupled to the drive unit, the magnetic ring has a uniform magnetic field; and a guide pin, set in the magnetic ring and electrically coupled to the drive unit, the guide pin and the described drive unit The inner edge of the magnetic ring is arranged at intervals, and the guide pin has the same distance from any place on the inner edge of the magnetic ring, so that the guide pin and the magnetic ring can be driven by the drive unit to jointly generate the The annular electric field can be used to electrolyze the gas passing through the outlet and generate a plurality of plasma particles; wherein, when the venturi tube is used for the liquid to flow through, the venturi The tube uses the negative pressure to suck in a plurality of plasma particles from the outlet part, so that the liquid and the plasma particles are mixed into a plasma liquid.

本發明另一種實施例公開一種電漿產生模組,包括:一驅動單元及一電漿導出單元,所述驅動單元電性耦接所述電漿導出單元,所述驅動單元能驅動所述電漿導出單元導出一環形電場,其中所述電漿導出單元包含:一磁環,電性耦接所述驅動單元,所述磁環具有均勻的一磁場;以及一導針,設置所述磁環內並電性耦接所述驅動單元,所述導針與所述磁環的內緣間隔配置,並且所述導針至所述磁環的內緣的任一處具有相同距離,使所述導針與所述磁環能被所述驅動單元驅動而共同產生所述環形電場,所述環形電場能用來電解所述氣體,並產生多個電漿粒子。 Another embodiment of the present invention discloses a plasma generating module, including: a driving unit and a plasma deriving unit, the driving unit is electrically coupled to the plasma deriving unit, and the driving unit can drive the electric The plasma deriving unit derives an annular electric field, wherein the plasma deriving unit includes: a magnetic ring, electrically coupled to the drive unit, the magnetic ring has a uniform magnetic field; and a guide pin, the magnetic ring is set Internally and electrically coupled to the drive unit, the guide pin is spaced apart from the inner edge of the magnetic ring, and the guide pin has the same distance from any position on the inner edge of the magnetic ring, so that the The guide needle and the magnetic ring can be driven by the driving unit to jointly generate the annular electric field, and the annular electric field can be used to electrolyze the gas and generate a plurality of plasma particles.

綜上所述,本發明實施例所公開的電漿液產生裝置及電漿產生模組,能通過“所述磁環具有均勻的所述磁場”以及“所述導針至所述磁環的內緣的任一處具有相同距離,使所述導針與所述磁環能被所述驅動單元驅動而共同產生所述環形電場”的設計,使所述電漿液產生裝置及所述電漿產生模組能大幅提升電解氣體時所產生的電漿粒子。 To sum up, the plasma liquid generating device and the plasma generating module disclosed in the embodiments of the present invention can pass "the magnetic ring has a uniform magnetic field" and "the guide needle reaches the inner surface of the magnetic ring." Any part of the edge has the same distance, so that the guide pin and the magnetic ring can be driven by the drive unit to jointly generate the annular electric field" design, so that the plasma liquid generating device and the plasma generating device The mod greatly increases the plasma particles produced when electrolyzing gas.

為使能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與圖式,然而所提供的圖式僅用於提供參考與說明,並非用來對本發明加以限制。 In order to further understand the features and technical content of the present invention, please refer to the following detailed description and drawings related to the present invention. However, the provided drawings are only for reference and description, and are not intended to limit the present invention.

100:電漿液產生裝置 100: Plasma liquid generation device

1:氣液混合模組 1: Gas-liquid mixing module

11:容置殼 11:Accommodating shell

111:容置部 111:Accommodating part

112:導出部 112: Export department

SP1:第一腔室 SP1: First Chamber

SP2:第二腔室 SP2: second chamber

12:止逆閥 12: Check valve

13:文氏管 13: Venturi tube

131:液體流通段 131: liquid circulation section

132:氣體導入段 132: Gas introduction section

2:電漿產生模組 2: Plasma Generation Module

21:驅動單元 21: Drive unit

211:供電件 211: Power supply

2111:第一導線 2111: First lead

2112:第二導線 2112:Second wire

212:調控件 212: Adjustment control

22:電漿導出單元 22: Plasma export unit

221:絕緣座 221: Insulation seat

222:磁環 222: magnetic ring

223:導針 223: guide pin

AR:氣體 AR: gas

LR:液體 LR: liquid

CE:環形電場 CE: Toroidal electric field

圖1為本發明的電漿液產生裝置的連接示意圖。 FIG. 1 is a schematic diagram of the connection of the plasma liquid generating device of the present invention.

圖2為本發明的電漿液產生裝置不包含止逆閥與文氏管的剖視示意圖。 FIG. 2 is a schematic cross-sectional view of the plasma liquid generating device of the present invention without a check valve and a venturi tube.

圖3為本發明的電漿產生模組的立體示意圖。 FIG. 3 is a schematic perspective view of the plasma generating module of the present invention.

圖4為本發明的電漿產生模組的電路方塊示意圖。 FIG. 4 is a schematic circuit block diagram of the plasma generating module of the present invention.

以下是通過特定的具體實施例來說明本發明所公開有關“電漿液產生裝置及電漿產生模組”的實施方式,本領域技術人員可由本說明書所公開的內容瞭解本發明的優點與效果。本發明可通過其他不同的具體實施例加以施行或應用,本說明書中的各項細節也可基於不同觀點與應用,在不悖離本發明的構思下進行各種修改與變更。另外,本發明的附圖僅為簡單示意說明,並非依實際尺寸的描繪,事先聲明。以下的實施方式將進一步詳細說明本發明的相關技術內容,但所公開的內容並非用以限制本發明的保護範圍。 The following are specific examples to illustrate the implementation of the "plasma liquid generating device and plasma generating module" disclosed in the present invention. Those skilled in the art can understand the advantages and effects of the present invention from the content disclosed in this specification. The present invention can be implemented or applied through other different specific embodiments, and various modifications and changes can be made to the details in this specification based on different viewpoints and applications without departing from the concept of the present invention. In addition, the drawings of the present invention are only for simple illustration, and are not drawn according to the actual size, which is stated in advance. The following embodiments will further describe the relevant technical content of the present invention in detail, but the disclosed content is not intended to limit the protection scope of the present invention.

應當可以理解的是,雖然本文中可能會使用到“第一”、“第二”、“第三”等術語來描述各種元件或者信號,但這些元件或者信號不應受這些術語的限制。這些術語主要是用以區分一元件與另一元件,或者一信號與另一信號。另外,本文中所使用的術語“或”,應視實際情況可能包括相關聯的列出項目中的任一個或者多個的組合。 It should be understood that although terms such as "first", "second", and "third" may be used herein to describe various elements or signals, these elements or signals should not be limited by these terms. These terms are mainly used to distinguish one element from another element, or one signal from another signal. In addition, the term "or" used herein may include any one or a combination of more of the associated listed items depending on the actual situation.

如圖1至圖4所示,其為本發明的其中一種實施例,本實施例公開一種電漿液產生裝置100,所述電漿液產生裝置100包含一氣液混合模組1及一電漿產生模組2。所述電漿產生模組2能產生用來電解一氣體AR的一環形電場CE;所述氣液混合模組1能用來供一液體LR通過,並產生能吸入被電解的所述氣體AR的一負壓。據此,所述電漿液產生裝置100於運作時,所述電漿液產生裝置100能將被電解的所述氣體AR吸入所述液體LR內,據以混合兩者而產生一電漿液。 As shown in Figures 1 to 4, it is one of the embodiments of the present invention. This embodiment discloses a plasma liquid generating device 100. The plasma liquid generating device 100 includes a gas-liquid mixing module 1 and a plasma generating module. Group 2. The plasma generation module 2 can generate an annular electric field CE for electrolyzing a gas AR; the gas-liquid mixing module 1 can be used for a liquid LR to pass through, and generate the gas AR that can be absorbed and electrolyzed of a negative pressure. Accordingly, when the plasma liquid generating device 100 is in operation, the plasma liquid generating device 100 can suck the electrolyzed gas AR into the liquid LR, and mix the two to generate a plasma liquid.

需先說明的是,上述氣液混合模組1及電漿產生模組2於本實施例中雖共同被定義為所述電漿液產生裝置100。但本發明不受限於此。舉例來說,所述電漿產生模組2也可以是單獨地被運用(如:販賣)或搭配其他構件使用。以下將分別介紹所述電漿液產生裝置100的各個元件構造,並適時說明所述電漿液產生裝置100的各個元件彼此之間的連接關係。 It should be noted that the above-mentioned gas-liquid mixing module 1 and the plasma generating module 2 are collectively defined as the plasma liquid generating device 100 in this embodiment. But the present invention is not limited thereto. For example, the plasma generating module 2 can also be used independently (for example: sold) or used in combination with other components. The structure of each component of the plasma liquid generating device 100 will be introduced below, and the connection relationship between the various components of the plasma liquid generating device 100 will be described in due course.

配合圖1及圖2所示,所述氣液混合模組1於本實施例中包含一容置殼11、連通所述容置殼11的一止逆閥12、及連通所述止逆閥12的一文氏管13,但本發明不受限於此。舉例來說,本發明於其他未繪示的實施例中,使用者可以根據實據需求省略所述止逆閥12,亦即所述文氏管13是直接連通所述容置殼11。 As shown in Figures 1 and 2, the gas-liquid mixing module 1 in this embodiment includes a housing 11, a check valve 12 communicating with the housing 11, and a check valve communicating with the housing 11. 12 a venturi tube 13, but the present invention is not limited thereto. For example, in other unillustrated embodiments of the present invention, the user can omit the check valve 12 according to actual requirements, that is, the venturi tube 13 is directly connected to the housing 11 .

所述容置殼11於本實施例中為中空結構,並且包含一容置部111及連通所述容置部111的一導出部112。接著,以下將先介紹所述容置 部111,而後接著介紹所述導出部112。 The accommodating shell 11 is a hollow structure in this embodiment, and includes an accommodating portion 111 and a lead-out portion 112 communicating with the accommodating portion 111 . Next, the following will first introduce the accommodating Section 111, and then introduce the derivation section 112.

所述容置部111具有一第一腔室SP1,所述第一腔室SP1能用來容置所述氣體AR,其中所述氣體AR的來源可以主動由所述容置部111的外部輸入(例如:利用連接氣體泵浦的一導管導入所述氣體)、又或者是被動由所述容置部111的外部輸入(例如:所述第一腔室SP1與外部連通,使所述氣體AR能自然進入所述第一腔室SP1),其中本發明所繪示的圖2是以後者為例子所進行繪製,並且所述氣體AR來源方向是圖2中所述第一腔室SP1的兩側所標示的箭頭,但此非限制條件。 The accommodating portion 111 has a first chamber SP1, the first chamber SP1 can be used to accommodate the gas AR, wherein the source of the gas AR can be actively input from the outside of the accommodating portion 111 (for example: using a conduit connected to a gas pump to introduce the gas), or passively input from the outside of the accommodating portion 111 (for example: the first chamber SP1 communicates with the outside, so that the gas AR can naturally enter the first chamber SP1), wherein Figure 2 shown in the present invention is drawn with the latter as an example, and the source direction of the gas AR is the two sides of the first chamber SP1 in Figure 2 Arrows marked on the side, but this is not a limitation.

所述導出部112連接於所述容置部111的一側,並且所述導出部112具有連通所述第一腔室SP1的一第二腔室SP2,其中所述第二腔室SP2內的體積較佳是小於所述第一腔室SP1的體積,從而確保所述第二腔室SP2相較於所述第一腔室SP1更容易集中導入的所述氣體AR,但本發明不受限於此。所述導出部112的末端於實務上能連接所述止逆閥12,從而變免任何液體進入所述第二腔室SP2及所述第一腔室SP1內。 The lead-out part 112 is connected to one side of the accommodating part 111, and the lead-out part 112 has a second chamber SP2 communicating with the first chamber SP1, wherein the second chamber SP2 The volume is preferably smaller than the volume of the first chamber SP1, so as to ensure that the gas AR introduced into the second chamber SP2 is easier to concentrate than the first chamber SP1, but the present invention is not limited here. The end of the outlet portion 112 can be practically connected to the check valve 12, so as to prevent any liquid from entering the second chamber SP2 and the first chamber SP1.

所述文氏管13於本實施中是通過所述止逆閥12而連通於所述導出部112的一端(即末端)。所述文氏管13具有相互垂直且連通的一液體流通段131及一氣體導入段132(如圖1所示),所述液體流通段131能用來供所述液體LR通過,而所述氣體導入段132則能用來供所述氣體AR流通。其中,當所述液體LR通過所述液體流通段131時,所述氣體導入段132會產生一負壓,使所述容置部111(的所述第一腔室SP1)內的所述氣體AR經由所述導出部112(的所述第二腔室SP2)而被導入所述液體流通段131內,並且與所述液體LR混合。須說明的是,所述文氏管13導入所述氣體AR並與所述液體LR混合為現有技術,因此於此則不再贅述。 In this implementation, the venturi tube 13 communicates with one end (ie, the end) of the outlet portion 112 through the check valve 12 . The venturi tube 13 has a liquid flow section 131 and a gas introduction section 132 (as shown in FIG. 1 ) which are vertical and communicated with each other. The liquid flow section 131 can be used for the passage of the liquid LR, and the The gas introduction section 132 can be used for the gas AR to circulate. Wherein, when the liquid LR passes through the liquid circulation section 131, the gas introduction section 132 will generate a negative pressure, so that the gas in the accommodating part 111 (the first chamber SP1) AR is introduced into the liquid flow section 131 through (the second chamber SP2 of) the outlet part 112 and mixed with the liquid LR. It should be noted that it is a prior art that the venturi tube 13 introduces the gas AR and mixes it with the liquid LR, so it will not be repeated here.

配合圖3及圖4所示,所述電漿產生模組2包含一驅動單元21及電 性耦接所述驅動單元21的一電漿導出單元22。所述電漿導出單元22設置於所述容置殼11內,並且能被所述驅動單元21驅動而導出一環形電場CE(如圖2及圖3所示)。為了方便說明,接者將先介紹所述電漿導出單元22,而後介紹所述驅動單元21。 As shown in Figure 3 and Figure 4, the plasma generation module 2 includes a driving unit 21 and an electric A plasma deriving unit 22 is coupled to the driving unit 21 . The plasma deriving unit 22 is disposed in the housing 11 and can be driven by the driving unit 21 to derive a circular electric field CE (as shown in FIG. 2 and FIG. 3 ). For the convenience of description, the plasma deriving unit 22 will be introduced first, and then the driving unit 21 will be introduced later.

所述電漿導出單元22於本實施例中包含一絕緣座221、設置於所述絕緣座221的一磁環222、設置於所述磁環222內的一導針223。其中,所述磁環222與所述導針223分別電性耦接所述驅動單元21,並且分別具有正、負相反的極性。 In this embodiment, the plasma deriving unit 22 includes an insulating base 221 , a magnetic ring 222 disposed on the insulating base 221 , and a guide pin 223 disposed inside the magnetic ring 222 . Wherein, the magnetic ring 222 and the guide pin 223 are respectively electrically coupled to the driving unit 21 , and have opposite polarities of positive and negative respectively.

所述絕緣座221於本實施例中呈環框狀,並且是由高耐溫且絕緣的材料所製成(例如:陶瓷),但本發明不受限於此。舉例來說,所述絕緣座221也可以是其他框狀結構(例如:矩形)。此外,所述絕緣座221於本實施例中是設置於所述容置部111內且位置對應所述導出部112,使所述容置部111內的所述氣體AR需經由所述絕緣座221的內緣而進入所述導出部112。 In this embodiment, the insulating base 221 is in the shape of a ring frame and is made of high temperature-resistant and insulating material (such as ceramics), but the present invention is not limited thereto. For example, the insulating seat 221 may also be in other frame-like structures (eg, rectangular). In addition, in this embodiment, the insulating seat 221 is arranged in the accommodating portion 111 and its position corresponds to the outlet portion 112, so that the gas AR in the accommodating portion 111 needs to pass through the insulating seat. 221 into the lead-out part 112.

所述磁環222於本實施中位於所述絕緣座221與所述導出部112之間,亦即所述氣體AR需經由所述磁環222進入所述導出部112,但本發明不受限於此。此外,所述磁環222於本實施例中是呈環框狀並具有均勻的一磁場,並且所述磁環222的中心至任一處其內緣所測得的磁力都均等。 The magnetic ring 222 is located between the insulating seat 221 and the lead-out part 112 in this implementation, that is, the gas AR needs to enter the lead-out part 112 through the magnetic ring 222, but the present invention is not limited thereto. here. In addition, the magnetic ring 222 in this embodiment is in the shape of a ring frame and has a uniform magnetic field, and the magnetic force measured from the center of the magnetic ring 222 to any inner edge thereof is equal.

於優選情況下,所述磁環222與所述絕緣座221具有相同的一圓心,並且所述磁環222的內緣直徑等於所述絕緣座221的內緣直徑,亦即所述磁環222與所述絕緣座221的內緣為尺寸相同的同心圓。據此,當所述氣體AR通過所述磁環222與所述絕緣座221的內緣時,所述氣體AR能具有理想的流通性,但此非本發明的限制條件。 Preferably, the magnetic ring 222 has the same center of circle as the insulating seat 221, and the inner diameter of the magnetic ring 222 is equal to the inner diameter of the insulating seat 221, that is, the magnetic ring 222 The inner edge of the insulating seat 221 is a concentric circle with the same size. Accordingly, when the gas AR passes through the inner edge of the magnetic ring 222 and the insulating seat 221 , the gas AR can have ideal flowability, but this is not a limiting condition of the present invention.

所述導針223設置所述磁環222內,並且與所述磁環222的內緣間隔配置。所述導針223至所述磁環222的內緣的任一處具有相同距離,亦即所述導針223位於所述磁環222的圓心處,使所述導針223至所述磁環222內緣之任一處的磁力都相等。據此,當所述驅動單元21驅動所述電漿產生模組2時,所述電漿產生模組2能利用“所述導針223與所述磁環222分別具有彼此正、負相反的極性”以及“所述導針223至所述磁環222內緣之任一處具有相同磁力”等設計,使所述電漿產生模組2於所述導針223與所述磁環222之間產生為平面狀的所述環形電場CE。 The guide pin 223 is disposed in the magnetic ring 222 and spaced apart from the inner edge of the magnetic ring 222 . There is the same distance between the guide pin 223 and the inner edge of the magnetic ring 222, that is, the guide pin 223 is located at the center of the magnetic ring 222, so that the guide pin 223 is at the center of the magnetic ring 222. The magnetic force of any one of 222 inner edges is all equal. Accordingly, when the drive unit 21 drives the plasma generation module 2, the plasma generation module 2 can use "the guide pin 223 and the magnetic ring 222 have positive and negative polarities opposite to each other, respectively. Polarity" and "anywhere from the guide pin 223 to the inner edge of the magnetic ring 222 has the same magnetic force", so that the plasma generation module 2 is located between the guide pin 223 and the magnetic ring 222 The circular electric field CE is generated in a planar shape.

一般來說,所述環形電場CE的面積是受所述磁環222內緣的尺寸影響,但理想情況下,所述環形電場CE的面積較佳是不小於所述導出部112的截面積的50%,從而能確保所述氣體AR被電解時產出電漿粒子的效率。於本實施例中,所述環形電場CE的面積是與所述導出部112內的截面積相同,也就是100%(如圖2所示)。 Generally speaking, the area of the annular electric field CE is affected by the size of the inner edge of the magnetic ring 222, but ideally, the area of the annular electric field CE is preferably not less than the cross-sectional area of the deriving portion 112 50%, so as to ensure the efficiency of producing plasma particles when the gas AR is electrolyzed. In this embodiment, the area of the annular electric field CE is the same as the cross-sectional area of the lead-out portion 112 , that is, 100% (as shown in FIG. 2 ).

需說明的是,所述環形電場CE能用來電解通過所述導出部112的所述氣體AR,並產生多個電漿粒子。於實務上,多個所述電漿粒子並不只是單一種類,例如:臭氧、硝酸根離子、活性氧離子(ROS)及活性氮離子(RNS)等至少其中一者,本實施例的多個所述電漿粒子是包含活性氧離子(ROS)及活性氮離子(RNS)兩種,並且活性氧離子及活性氮離子於單位時間內產出的比例可以通過調整所述環形電場CE實現。 It should be noted that the annular electric field CE can be used to electrolyze the gas AR passing through the outlet portion 112 to generate a plurality of plasma particles. In practice, the plurality of plasma particles is not just a single type, for example: at least one of ozone, nitrate ion, reactive oxygen ion (ROS) and reactive nitrogen ion (RNS), etc., the plurality of plasma particles in this embodiment The plasma particles include reactive oxygen ions (ROS) and reactive nitrogen ions (RNS), and the production ratio of reactive oxygen ions and reactive nitrogen ions per unit time can be realized by adjusting the annular electric field CE.

另外,當所述環形電場CE於所述導針223與所述磁環222之間形成時,所述環形電場CE會產生高溫,從而破壞所述導針223以及所述磁環222的磁性與結構。因此,於優選情況下,所述磁環222及所述導針223可以選用耐高溫的導電材料所製成,使所述磁環222及所述導針223具有一理想耐溫,並且所述理想耐溫較佳為至少大於攝氏150度。 In addition, when the annular electric field CE is formed between the guide needle 223 and the magnetic ring 222 , the annular electric field CE will generate high temperature, thereby destroying the magnetic compatibility of the guide needle 223 and the magnetic ring 222 . structure. Therefore, in a preferred situation, the magnetic ring 222 and the guide pin 223 can be made of a high temperature resistant conductive material, so that the magnetic ring 222 and the guide pin 223 have an ideal temperature resistance, and the The ideal temperature resistance is preferably at least greater than 150 degrees Celsius.

需特別強調的是,所述電漿導出單元22於本實施例中雖具有所述絕緣座221,但本發明不受限於此。舉例來說,本發明於其他未繪示的實施例中,所述容置殼11的材質可以被調整為耐高溫的絕緣材料,並且所述磁環222直接設置於所述導出部112內,據以使所述絕緣座221可以被合理省略。 It should be emphasized that although the plasma deriving unit 22 has the insulating seat 221 in this embodiment, the present invention is not limited thereto. For example, in other unillustrated embodiments of the present invention, the material of the accommodating shell 11 can be adjusted to high temperature resistant insulating material, and the magnetic ring 222 is directly arranged in the lead-out part 112 , According to this, the insulating seat 221 can be reasonably omitted.

配合圖2所示,所述驅動單元21於本實施例中設置於所述容置部111內,並且所述驅動單元21不位於所述導出部112正投影於所述容置部111的範圍內,亦即所述驅動單元21不會位於所述導出部112的任一端處,據以確保所述驅動單元21所在位置不影響所述氣體AR由所述容置部111進入所述導出部112的動線。 As shown in FIG. 2 , the drive unit 21 is arranged in the accommodating portion 111 in this embodiment, and the drive unit 21 is not located in the range where the lead-out portion 112 is projected onto the accommodating portion 111 That is, the drive unit 21 will not be located at any end of the outlet portion 112, so as to ensure that the location of the drive unit 21 does not affect the gas AR entering the outlet portion from the accommodating portion 111 112 moving lines.

所述驅動單元21包含一供電件211及電性耦接所述供電件211的一調控件212。所述供電件211包含正、負極相反的一第一導線2111及一第二導線2112,並且所述第一導線2111電性耦接所述磁環222,而所述第二導線2112電性耦接所述導針223。所述供電件211能利用所述第一導線2111及所述第二導線2112輸出一驅動電源至所述電漿導出單元22,使所述電漿導出單元22產生所述環形電場CE。 The driving unit 21 includes a power supply element 211 and an adjustment element 212 electrically coupled to the power supply element 211 . The power supply 211 includes a first wire 2111 and a second wire 2112 with opposite positive and negative poles, and the first wire 2111 is electrically coupled to the magnetic ring 222, and the second wire 2112 is electrically coupled to Connect the guide pin 223. The power supply part 211 can use the first wire 2111 and the second wire 2112 to output a driving power to the plasma deriving unit 22 to make the plasma deriving unit 22 generate the annular electric field CE.

所述調控件212能調控所述驅動電源的電壓及頻率,以改變所述活性氧離子及所述活性氮離子被電解時的佔比。一般來說,當所述驅動電源的電壓被提升時,所述活性氮離子於單位時間內的產出量會被增加,而所述活性氧離子則會下降,但本發明不受限於此。另外,所述調控件212調控所述驅動電源的方式為現有技術,於此則不再贅述。 The regulating part 212 can regulate the voltage and frequency of the driving power supply, so as to change the proportion of the active oxygen ions and the active nitrogen ions being electrolyzed. Generally speaking, when the voltage of the driving power is increased, the output of the active nitrogen ions per unit time will increase, while the active oxygen ions will decrease, but the present invention is not limited thereto . In addition, the manner in which the adjusting member 212 regulates the driving power is in the prior art, and will not be repeated here.

為了更明確說明本發明的電漿液產生裝置100,以下將以使用者於實際使用所述電漿液產生裝置100的一例子進行說明,但本發明不受限於所述例子的限制: In order to more clearly illustrate the plasma liquid generating device 100 of the present invention, an example of the user actually using the plasma liquid generating device 100 will be described below, but the present invention is not limited to the limitation of the example:

使用者可以將所述文氏管13(的所述液體流通段131)與液體管路連接,使所述液體LR於通過所述文氏管13而對所述氣體導入段132產生負壓。所述負壓能使所述氣液混合模組1內部形成一氣體流路,所述氣體流路的路徑依序為所述容置部111、所述絕緣座221與所述磁環222的內緣、所述導出部112、所述止逆閥12、所述氣體導入段132、以及所述液體流通段131。 The user can connect the venturi tube 13 (the liquid passage section 131 ) to a liquid pipeline, so that the liquid LR passes through the venturi tube 13 to generate a negative pressure on the gas introduction section 132 . The negative pressure can form a gas flow path inside the gas-liquid mixing module 1, and the path of the gas flow path is the path of the accommodating part 111, the insulating seat 221 and the magnetic ring 222 in sequence. inner edge, the outlet portion 112 , the check valve 12 , the gas introduction section 132 , and the liquid circulation section 131 .

換句話說,所述氣體AR於進入所述液體流通段131時都會先經過所述絕緣座221與所述磁環222的內緣,因此當所述電漿產生模組2運作時,所述氣體流路上的所述氣體AR必然都會通過為平面狀的所述環形電場CE而被電解,從而產生多個所述電漿粒子。也就是如此,本發明的所述電漿液產生裝置100能大幅提升電解氣體時所產生的電漿粒子。 In other words, the gas AR will first pass through the inner edge of the insulating seat 221 and the magnetic ring 222 when entering the liquid circulation section 131, so when the plasma generating module 2 operates, the The gas AR on the gas flow path is inevitably electrolyzed by the planar annular electric field CE, thereby generating a plurality of plasma particles. That is to say, the plasma liquid generating device 100 of the present invention can greatly increase the plasma particles generated when the gas is electrolyzed.

另外,需特別強調的是,本發明的電漿液產生裝置100是採用為平面狀的環形電場CE才能具備前述效果。舉反例來說,若於本發明的電漿液產生裝置100之架構下,僅將所述電漿產生模組2置換為線性電漿裝置時,線性電漿裝置產生的一線性電漿並無法大範圍電解所述氣體流路上的所述氣體AR,因此電漿粒子產出的效率會極差。也就是說,任何無法產出(為平面狀的)環形電場的電漿液產生裝置及電漿產生模組,並非本案所指的電漿液產生裝置100及電漿產生模組2。 In addition, it should be emphasized that the plasma liquid generating device 100 of the present invention can only achieve the aforementioned effects by adopting a planar annular electric field CE. For example, if only the plasma generating module 2 is replaced with a linear plasma device under the framework of the plasma liquid generating device 100 of the present invention, the linear plasma generated by the linear plasma device cannot be greatly increased. The scope electrolyzes the gas AR on the gas flow path, so the efficiency of plasma particle generation will be extremely poor. That is to say, any plasma liquid generating device and plasma generating module that cannot generate (a planar) annular electric field is not the plasma liquid generating device 100 and the plasma generating module 2 referred to in this case.

[本發明實施例的技術效果] [Technical effects of the embodiments of the present invention]

綜上所述,本發明實施例所公開的電漿液產生裝置及電漿產生模組,能通過“所述磁環具有均勻的所述磁場”以及“所述導針至所述磁環的內緣的任一處具有相同距離,使所述導針與所述磁環能被所述驅動單元驅動而共同產生所述環形電場”的設計,使所述電漿液產生裝置及所述電漿產生模組能大幅提升電解氣體時所產生的電漿粒子。 To sum up, the plasma liquid generating device and the plasma generating module disclosed in the embodiments of the present invention can pass "the magnetic ring has a uniform magnetic field" and "the guide needle reaches the inner surface of the magnetic ring." Any part of the edge has the same distance, so that the guide pin and the magnetic ring can be driven by the drive unit to jointly generate the annular electric field" design, so that the plasma liquid generating device and the plasma generating device The mod greatly increases the plasma particles produced when electrolyzing gas.

以上所公開的內容僅為本發明的優選可行實施例,並非因此侷限本發明的申請專利範圍,所以凡是運用本發明說明書及圖式內容所做的等效技術變化,均包含於本發明的申請專利範圍內。 The content disclosed above is only a preferred feasible embodiment of the present invention, and does not therefore limit the scope of the patent application of the present invention. Therefore, all equivalent technical changes made by using the description and drawings of the present invention are included in the application of the present invention. within the scope of the patent.

2:電漿產生模組 2: Plasma Generation Module

21:驅動單元 21: Drive unit

2111:第一導線 2111: First lead

2112:第二導線 2112:Second wire

22:電漿導出單元 22: Plasma export unit

221:絕緣座 221: Insulation seat

222:磁環 222: magnetic ring

223:導針 223: guide pin

CE:環形電場 CE: Toroidal electric field

Claims (9)

一種電漿液產生裝置,包括:一氣液混合模組,包含:一容置殼,包含一容置部及連通所述容置部的一導出部,所述容置部能用來容置一氣體,並且由所述導出部導出所述氣體;及一文氏管,連通於所述導出部的一端,所述文氏管能用來供一液體通過,使所述導出部產生一負壓;以及一電漿產生模組,包含:一驅動單元及一電漿導出單元,所述驅動單元電性耦接所述電漿導出單元,所述電漿導出單元設置於所述容置殼內,所述驅動單元能驅動所述電漿導出單元導出一環形電場,其中所述電漿導出單元包含:一絕緣座,其位置對應所述導出部;一磁環,設置於所述絕緣座上,所述磁環為導電材料且電性耦接所述驅動單元,所述磁環具有均勻的一磁場;及一導針,設置所述磁環內並電性耦接所述驅動單元,所述導針與所述磁環的內緣間隔配置,並且所述導針至所述磁環的內緣的任一處具有相同距離,使所述導針與所述磁環能被所述驅動單元驅動而共同產生所述環形電場,所述環形電場能用來電解通過所述導出部的所述氣體,並產生多個電漿粒子;其中,當所述文氏管供所述液體流經時,所述文氏管利用所述負壓由所述導出部吸入多個所述電漿粒子,使所述液體與多個所述電漿粒子混合為一電漿液。 A plasma liquid generating device, comprising: a gas-liquid mixing module, including: a housing shell, including a housing part and a lead-out part connected to the housing part, the housing part can be used to accommodate a gas , and the gas is led out from the outlet part; and a venturi tube is communicated with one end of the outlet part, and the venturi tube can be used for a liquid to pass through, so that the outlet part generates a negative pressure; and A plasma generation module, including: a drive unit and a plasma export unit, the drive unit is electrically coupled to the plasma export unit, the plasma export unit is arranged in the housing, the The driving unit can drive the plasma deriving unit to derive a circular electric field, wherein the plasma deriving unit includes: an insulating base, whose position corresponds to the deriving part; a magnetic ring, arranged on the insulating base, the The magnetic ring is made of conductive material and is electrically coupled to the drive unit, the magnetic ring has a uniform magnetic field; and a guide pin is set in the magnetic ring and electrically coupled to the drive unit, the guide The needle is spaced apart from the inner edge of the magnetic ring, and the guide needle is at the same distance from any part of the inner edge of the magnetic ring, so that the guide needle and the magnetic ring can be driven by the drive unit And jointly generate the annular electric field, the annular electric field can be used to electrolyze the gas passing through the outlet part, and generate a plurality of plasma particles; wherein, when the venturi tube is used for the liquid to flow through, The venturi tube uses the negative pressure to suck in a plurality of plasma particles from the outlet, so that the liquid and the plasma particles are mixed into a plasma liquid. 如請求項1所述的電漿液產生裝置,其中,所述磁環及所述導針各具有一理想耐溫,所述理想耐溫至少大於攝氏150度;多個所述電漿粒子進一步包含活性氧離子(ROS)及活性氮離子(RNS)至少其中一者。 The plasma liquid generating device according to claim 1, wherein each of the magnetic ring and the guide pin has an ideal temperature resistance, and the ideal temperature resistance is at least greater than 150 degrees Celsius; the plurality of plasma particles further include At least one of reactive oxygen species (ROS) and reactive nitrogen species (RNS). 如請求項2所述的電漿液產生裝置,其中,所述驅動單元包含:一供電件,包含正、負極相反的一第一導線及一第二導線,所述第一導線電性耦接所述磁環,所述第二導線電性耦接所述導針,所述供電件能輸出一驅動電源至所述電漿導出單元,使所述電漿導出單元產生所述環形電場;及一調控件,電性耦接所述供電件,所述調控件能調控所述驅動電源的電壓及頻率,以改變所述活性氧離子及所述活性氮離子被電解時的佔比。 The plasma liquid generating device according to claim 2, wherein the drive unit includes: a power supply element, including a first wire and a second wire with opposite positive and negative poles, the first wire is electrically coupled to the The magnetic ring, the second wire is electrically coupled to the guide pin, the power supply part can output a driving power to the plasma deriving unit, so that the plasma deriving unit generates the annular electric field; and a The regulating part is electrically coupled to the power supply part, and the regulating part can regulate the voltage and frequency of the driving power supply, so as to change the ratio of the active oxygen ions and the active nitrogen ions to be electrolyzed. 如請求項1所述的電漿液產生裝置,其中,所述環形電場的面積不小於所述導出部的截面積的50%。 The plasma liquid generating device according to claim 1, wherein the area of the annular electric field is not less than 50% of the cross-sectional area of the lead-out part. 如請求項1所述的電漿液產生裝置,其中,所述絕緣座與所述磁環各呈環框狀的,並且所述磁環與所述絕緣座具有相同的一圓心,所述磁環的內緣直徑等於所述絕緣座的內緣直徑,所述導針設置於所述圓心上。 The plasma liquid generating device according to claim 1, wherein the insulating seat and the magnetic ring are each in the shape of a ring frame, and the magnetic ring and the insulating seat have the same center of a circle, and the magnetic ring The diameter of the inner edge is equal to the diameter of the inner edge of the insulating seat, and the guide pin is arranged on the center of the circle. 如請求項1所述的電漿液產生裝置,其中,所述驅動單元設置於所述容置部內,並且所述驅動單元不位於所述導出部正投影於所述容置部的範圍內。 The plasma liquid generating device according to claim 1, wherein the driving unit is disposed in the accommodating portion, and the driving unit is not located within the range of the orthographic projection of the outlet portion on the accommodating portion. 一種電漿產生模組,包括:一驅動單元及一電漿導出單元,所述驅動單元電性耦接所述 電漿導出單元,所述驅動單元能驅動所述電漿導出單元導出一環形電場,其中所述電漿導出單元包含:一磁環,為導電材料且電性耦接所述驅動單元,所述磁環具有均勻的一磁場;以及一導針,設置所述磁環內並電性耦接所述驅動單元,所述導針與所述磁環的內緣間隔配置,並且所述導針至所述磁環的內緣的任一處具有相同距離,使所述導針與所述磁環能被所述驅動單元驅動而共同產生所述環形電場,所述環形電場能用來電解一氣體,並產生多個電漿粒子。 A plasma generating module, comprising: a driving unit and a plasma deriving unit, the driving unit is electrically coupled to the The plasma deriving unit, the driving unit can drive the plasma deriving unit to derive a circular electric field, wherein the plasma deriving unit includes: a magnetic ring, which is a conductive material and is electrically coupled to the driving unit, the The magnetic ring has a uniform magnetic field; and a guide pin is arranged in the magnetic ring and electrically coupled to the drive unit, the guide pin is spaced from the inner edge of the magnetic ring, and the guide pin is connected to the inner edge of the magnetic ring. Any part of the inner edge of the magnetic ring has the same distance, so that the guide pin and the magnetic ring can be driven by the drive unit to jointly generate the annular electric field, and the annular electric field can be used to electrolyze a gas , and generate multiple plasma particles. 如請求項7所述的電漿產生模組,其中,所述磁環及所述導針各具有一理想耐溫,所述理想耐溫至少大於攝氏150度;多個所述電漿粒子進一步包含一活性氧離子(ROS)及一活性氮離子(RNS)至少其中一者;其中,所述驅動單元包含:一供電件,具有正、負極相反的一第一導線及一第二導線,所述第一導線電性耦接所述磁環,所述第二導線電性耦接所述導針,所述供電件能輸出一驅動電源至所述電漿導出單元,使所述電漿導出單元產生所述環形電場;及一調控件,電性耦接所述供電件,所述調控件能調控所述驅動電源的電壓及頻率,以改變所述活性氧離子及所述活性氮離子被電解時的佔比。 The plasma generation module according to claim 7, wherein each of the magnetic ring and the guide pin has an ideal temperature resistance, and the ideal temperature resistance is at least greater than 150 degrees Celsius; a plurality of the plasma particles further Including at least one of a reactive oxygen ion (ROS) and a reactive nitrogen ion (RNS); wherein, the drive unit includes: a power supply element having a first wire and a second wire with opposite positive and negative poles, so The first wire is electrically coupled to the magnetic ring, the second wire is electrically coupled to the guide pin, and the power supply part can output a driving power to the plasma exporting unit, so that the plasma is exported The unit generates the ring-shaped electric field; and a regulating part, electrically coupled to the power supply part, the regulating part can regulate the voltage and frequency of the driving power supply, so as to change the active oxygen ions and the active nitrogen ions The proportion of electrolysis. 如請求項7所述的電漿產生模組,其中,所述電漿產生模組更包含一絕緣座,並且所述磁環設置於所述絕緣座上;所述絕緣座與所述磁環各呈環形,所述磁環疊置於所述絕緣座上,並且所述磁環與所述絕緣座具有相同的一圓心,所述磁環的內緣直徑等於所述絕緣座的內緣直徑,所述導針設置於所述圓心上。 The plasma generation module according to claim 7, wherein the plasma generation module further includes an insulating base, and the magnetic ring is arranged on the insulating base; the insulating base and the magnetic ring Each is ring-shaped, the magnetic ring is stacked on the insulating seat, and the magnetic ring and the insulating seat have the same center of circle, and the inner diameter of the magnetic ring is equal to the inner diameter of the insulating seat , the guide pin is set on the center of the circle.
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TWI601694B (en) * 2016-06-06 2017-10-11 拜普生醫科技股份有限公司 Plasma liquid generating device
TWI601693B (en) * 2016-06-06 2017-10-11 拜普生醫科技股份有限公司 Plasma liquid generating device

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TWI601694B (en) * 2016-06-06 2017-10-11 拜普生醫科技股份有限公司 Plasma liquid generating device
TWI601693B (en) * 2016-06-06 2017-10-11 拜普生醫科技股份有限公司 Plasma liquid generating device

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