TWI758618B - Polyaminic acid composition, polyamidite copper clad laminate, and circuit board - Google Patents
Polyaminic acid composition, polyamidite copper clad laminate, and circuit board Download PDFInfo
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本發明涉及一種聚醯胺酸組成物,由所述聚醯胺酸組成物環化制得的聚醯亞胺覆銅板及應用所述聚醯亞胺覆銅板制得的電路板。 The invention relates to a polyamide acid composition, a polyimide copper clad plate prepared by cyclization of the polyamide acid composition, and a circuit board prepared by using the polyimide copper clad plate.
近年來,印刷電路板被廣泛應用於各種電子產品上。目前,印刷電路板一般由覆銅板作為基材制得。其中,覆銅板包括銅箔、聚醯亞胺膜、及位於銅箔與聚醯亞胺膜之間用於將銅箔與聚醯亞胺膜結合在一起的膠粘層。 In recent years, printed circuit boards have been widely used in various electronic products. At present, printed circuit boards are generally made of copper clad laminates as substrates. Wherein, the copper clad laminate includes copper foil, polyimide film, and an adhesive layer located between the copper foil and the polyimide film for bonding the copper foil and the polyimide film together.
在電路板的製作過程中,會蝕刻掉結合在聚醯亞胺膜表面的部分銅箔,從而使得該區域的聚醯亞胺膜未結合銅箔而裸露,在電路板的安裝等制程中會使用CCD照相機透視該未結合銅箔的聚醯亞胺膜,以對元件進行精准定位。如此就要求該未結合銅箔的聚醯亞胺膜具有優良的透光度。 During the production process of the circuit board, part of the copper foil bound to the surface of the polyimide film will be etched away, so that the polyimide film in this area will be exposed without being bound to the copper foil. The uncoated polyimide film was seen through a CCD camera for precise component positioning. Thus, the copper-unbonded polyimide film is required to have excellent light transmittance.
為使去除銅箔後的聚醯亞胺膜具有較高的透光度,可以在表面粗糙度較低的銅箔的表面塗布形成聚醯亞胺膜,這樣可以保證在去除銅箔後聚醯亞胺膜的表面粗糙度較低而具有較高的透光度。 In order to make the polyimide film after removing the copper foil to have higher transmittance, a polyimide film can be formed on the surface of the copper foil with low surface roughness, which can ensure that the polyimide film is removed after the copper foil is removed. The surface roughness of the imine film is lower and the light transmittance is higher.
然而,現有的聚醯亞胺膜與表面粗糙度較低的銅箔的結合力較低,使用表面粗糙度較低的銅箔製作覆銅板時,銅箔與聚醯亞胺膜的結合力較低。 However, the bonding force between the existing polyimide film and the copper foil with low surface roughness is relatively low. Low.
有鑑於此,有必要提供一種新型的用於製作聚醯亞胺膜的聚醯胺酸組成物,以解決以上問題。 In view of this, it is necessary to provide a novel polyimide composition for making polyimide films to solve the above problems.
另,還有必要提供一種由所述聚醯胺酸組成物環化制得的聚醯亞胺覆銅板。 In addition, it is also necessary to provide a polyimide copper clad laminate obtained by cyclization of the polyimide composition.
另,還有必要提供一種應用所述聚醯亞胺覆銅板制得的電路板。 In addition, it is also necessary to provide a circuit board prepared by using the polyimide copper clad laminate.
一種聚醯胺酸組成物,由二酸酐單體與二胺單體聚合而成,且所述二酸酐單體與所述二胺單體的摩爾比的範圍為0.9~1.1;所述二胺單體包括含有液晶單元的二胺單體、含有柔軟結構的二胺單體及含有氮雜環的二胺單體;在所述二胺單體中,所述含有氮雜環的二胺單體的摩爾百分比為3%~8%,所述含有液晶單元的二胺單體與所述含有柔軟結構的二胺單體所占的摩爾百分比之和為92%~97%;所述含有液晶單元的二胺單體的結構式為
進一步地,所述二酸酐單體包括含有液晶單元的二酸酐單體或含有柔軟結構的二酸酐單體中的至少一種;所述含有液晶單元的二酸酐單體的結構式為、、
進一步地,在所述含有液晶單元的二胺單體與所述含有柔軟結構的二胺單體中,所述含有液晶單元的二胺單體所占的百分比為30~70%,所述含有柔軟結構的二胺單體所占的百分比為30~70%,兩者相加為100%。 Further, in the diamine monomer containing a liquid crystal unit and the diamine monomer containing a soft structure, the percentage of the diamine monomer containing a liquid crystal unit is 30-70%, and the The percentage of diamine monomer with soft structure is 30~70%, and the sum of the two is 100%.
進一步地,所述含有液晶單元的二酸酐單體為3,3',4,4'-聯苯四羧酸二酐、對苯基二(偏苯三酸酯)二酸酐及環己烷-1,4-二基雙(亞甲基)雙(1,3-二氧代-1,3-二氫異苯並呋喃-5-羧酸乙酯)中的至少一種,其中,所述3,3',4,4'-聯苯四羧酸二酐的結構式為,所述對苯基二(偏苯三酸酯)二酸酐的結構式為,所述環己烷-1,4-二基雙(亞甲基)雙(1,3-二氧代-1,3-二氫異苯並呋喃-5-羧酸乙酯)的結構式為:
進一步地,所述含有液晶單元的二胺單體為對氨基苯甲酸對氨基苯酯、1,4-雙(4-氨基苯氧基)苯及對苯二甲酸二對氨基苯酯中的至少一種;其中,所述對氨基苯甲酸對氨基苯酯的結構式為:,所述1,4-雙(4-氨基苯氧基)苯的結構式為:,所述對苯二甲酸二對氨基苯酯的結構式為:
進一步地,所述含有柔軟結構的二酸酐單體為4,4'-氧雙鄰苯二甲酸酐、2,3,3',4'-二苯醚四甲酸二酐、3,3',4,4'-二苯甲酮四甲酸二酐、3,3,4,4-二苯基碸四羧酸二酸酐、六氟二酐及雙酚A型二醚二酐;其中,所述4,4'-氧雙鄰苯二甲酸酐的結構式為:,所述2,3,3',4'-二苯醚四甲酸二酐的結構式為:,所述3,3',4,4'-二苯甲酮四甲酸二酐的結構式:為,所述3,3,4,4-二苯基碸四羧酸二酸酐的結 構式為:所述六氟二酐的結構式為:,所述雙酚A型二醚二酐的結構式為。 Further, the dianhydride monomer containing the soft structure is 4,4'-oxydiphthalic anhydride, 2,3,3',4'-diphenyl ether tetracarboxylic dianhydride, 3,3', 4,4'-benzophenone tetracarboxylic dianhydride, 3,3,4,4-diphenyltetracarboxylic dianhydride, hexafluorodianhydride and bisphenol A type diether dianhydride; wherein, the The structural formula of 4,4'-oxydiphthalic anhydride is: , the structural formula of the 2,3,3',4'-diphenyl ether tetracarboxylic dianhydride is: , the structural formula of the 3,3',4,4'-benzophenone tetracarboxylic dianhydride: is , the structural formula of the 3,3,4,4-diphenyltetracarboxylic acid dianhydride is: the structural formula of the hexafluorodianhydride is: , the structural formula of described bisphenol A diether dianhydride is .
進一步地,所述含有柔軟結構的二胺單體為4,4'-二氨基二苯醚、4,4'-二(4-氨基苯氧基)聯苯、2,2'-雙[4-(4-氨基苯氧基苯基)]丙烷、2,2-雙[4-(4-氨基苯氧基)苯基]-1,1,1,3,3,3-六氟丙烷、1,3-雙(4'-氨基苯氧基)苯及1,3-雙(3-氨基苯氧基)苯、市售工業品號為D230和D400且結構為的二胺、市售工業品號為DA-C6且結構為的二胺、結構式為的己二胺中的至少一種;其中,所述4,4'-二氨基二苯醚的結構式為:,所述4,4'-二(4-氨基苯氧基)聯苯的結構式為:,所述2,2'-雙[4-(4-氨基苯氧基苯基)] 丙烷的結構式為:,所述2,2-雙[4-(4-氨基苯氧基)苯基]-1,1,1,3,3,3-六氟丙烷的結構式為:,所述1,3-雙(4'-氨基苯氧基)苯的結構式為:,所述1,3-雙(3-氨基苯氧基)苯的結構式為:。 Further, the diamine monomer containing a soft structure is 4,4'-diaminodiphenyl ether, 4,4'-bis(4-aminophenoxy)biphenyl, 2,2'-bis[4 -(4-Aminophenoxyphenyl)]propane, 2,2-bis[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropane, 1,3-bis(4'-aminophenoxy)benzene and 1,3-bis(3-aminophenoxy)benzene, commercially available industrial product numbers are D230 and D400 and the structure is The diamine, commercially available industrial product number is DA-C6 and the structure is The diamine, the structural formula is At least one of hexanediamine; wherein, the structural formula of the 4,4'-diaminodiphenyl ether is: , the structural formula of described 4,4'-bis (4-aminophenoxy) biphenyl is: , the structural formula of the 2,2'-bis[4-(4-aminophenoxyphenyl)] propane is: , the structural formula of the 2,2-bis[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropane is: , the structural formula of described 1,3-bis (4'-aminophenoxy) benzene is: , the structural formula of described 1,3-bis (3-aminophenoxy) benzene is: .
進一步地,所述含有氮雜環的二胺單體為3,5-二氨基-1,2,4-三氮唑、2-(4-氨基苯基)-5-氨基苯並咪唑及2,5-雙(4-氨基苯基)嘧啶中的至少一種:其中,所述3,5-二氨基-1,2,4-三氮唑的結構式為:、所述2-(4-氨基苯基)-5-氨基苯並咪唑的結構式為:,所述2,5-雙(4-氨基苯基)嘧啶的結構式為:。 Further, the diamine monomer containing nitrogen heterocycle is 3,5-diamino-1,2,4-triazole, 2-(4-aminophenyl)-5-aminobenzimidazole and 2-(4-aminophenyl)-5-aminobenzimidazole , at least one of 5-bis(4-aminophenyl) pyrimidines: wherein, the structural formula of the 3,5-diamino-1,2,4-triazole is: , the structural formula of described 2-(4-aminophenyl)-5-aminobenzimidazole is: , the structural formula of the 2,5-bis(4-aminophenyl) pyrimidine is: .
一種聚醯亞胺覆銅板,其包括銅箔及結合於所述銅箔的表面的聚醯亞胺膜,所述聚醯亞胺膜由上述聚醯胺酸組成物塗布在所述銅箔的表面後經環化形成。 A polyimide copper clad laminate, comprising copper foil and a polyimide film bonded to the surface of the copper foil, wherein the polyimide film is coated on the copper foil by the above-mentioned polyimide composition. The surface is then formed by cyclization.
一種電路板,其包括電路基板及覆蓋在所述電路基板至少一表面的覆蓋膜,所述電路基板包括聚醯亞胺膜及結合在所述聚醯亞胺膜至少一表面的導電線路層,所述電路基板由覆銅板製成,所述覆銅板包括銅箔及結合於所述銅箔的表面的聚醯亞胺膜,所述導電線路層通過對銅箔進行圖案化所形成,所述聚醯亞胺膜由上述聚醯胺酸組合物塗布在所述銅箔的表面後經環化形成。 A circuit board, comprising a circuit substrate and a cover film covering at least one surface of the circuit substrate, the circuit substrate comprising a polyimide film and a conductive circuit layer combined on at least one surface of the polyimide film, The circuit substrate is made of a copper clad laminate, the copper clad laminate includes copper foil and a polyimide film bonded to the surface of the copper foil, the conductive circuit layer is formed by patterning the copper foil, the The polyimide film is formed by cyclization after coating the above-mentioned polyimide composition on the surface of the copper foil.
本發明提供的聚醯胺酸組成物由二酐單體及二胺單體聚合而成,且所述二酸酐單體包括含有液晶單元的二酸酐單體或含有柔軟結構的二酸酐單體中的至少一種,所述二胺單體中包括含有液晶單元的二胺單體、含有柔軟結構的二胺單體及含有氮雜環的二胺單體;1)所述含有氮雜環的二胺單體中的氮雜環上的氮原子可與銅產生配位作用因而可提高聚醯亞胺與銅箔的接著強度,改善因高分子結構中的液晶單元緊密排列形成結晶所造成的剛硬性影響降低了聚醯亞胺與銅箔的接著強度;2)在高溫條件下,所述含有液晶單元的二酸酐單體或二胺單體可使聚醯亞胺的高分子結構中的液晶單元緊密排列,形成結晶,降低了在高頻電場下聚醯亞胺高分子結構的可動性,從而減少了介電損耗;3)所述含有柔軟結構的二酸酐單體或二胺單體能夠調節因高分子結構中的液晶單元緊密排列形成結晶所造成的剛硬性,並調節聚醯亞胺的熱膨脹係數(CTE),使之能夠與銅箔匹配,從而避免覆銅板翹曲。 The polyamic acid composition provided by the present invention is formed by polymerizing a dianhydride monomer and a diamine monomer, and the dianhydride monomer includes a dianhydride monomer containing a liquid crystal unit or a dianhydride monomer containing a soft structure. At least one of the diamine monomers, the diamine monomers include a liquid crystal unit-containing diamine monomer, a soft structure-containing diamine monomer, and a nitrogen heterocycle-containing diamine monomer; 1) the nitrogen heterocycle-containing diamine monomer The nitrogen atom on the nitrogen heterocyclic ring in the amine monomer can coordinate with copper, which can improve the bonding strength of polyimide and copper foil, and improve the rigidity caused by the close arrangement of liquid crystal units in the polymer structure to form crystals. The effect of hardness reduces the bonding strength of polyimide and copper foil; 2) Under high temperature conditions, the dianhydride monomer or diamine monomer containing liquid crystal units can make the liquid crystal in the polymer structure of polyimide The units are closely arranged to form crystals, which reduces the mobility of the polyimide polymer structure under the high-frequency electric field, thereby reducing the dielectric loss; 3) The dianhydride monomer or diamine monomer containing a soft structure can Adjust the rigidity caused by the close arrangement of liquid crystal cells in the polymer structure to form crystals, and adjust the coefficient of thermal expansion (CTE) of polyimide, so that it can match the copper foil, thereby avoiding the warpage of the copper clad laminate.
100:聚醯亞胺覆銅板 100: Polyimide copper clad laminate
10:銅箔 10: Copper foil
20:聚醯亞胺膜 20: Polyimide film
200:電路板 200: circuit board
201:電路基板 201: circuit substrate
2011:導電線路層 2011: Conductive circuit layers
202:覆蓋膜 202: Overlay
圖1是本發明一較佳實施例的覆銅板的截面示意圖。 1 is a schematic cross-sectional view of a copper clad laminate according to a preferred embodiment of the present invention.
圖2是本發明一較佳實施例的電路板的截面示意圖。 2 is a schematic cross-sectional view of a circuit board according to a preferred embodiment of the present invention.
請結合參閱圖1,本發明較佳實施方式提供一種聚醯胺酸組成物,其主要用於製作聚醯亞胺覆銅板100中結合於銅箔10表面的聚醯亞胺膜20。
Please refer to FIG. 1 , a preferred embodiment of the present invention provides a polyimide composition, which is mainly used for making the
所述聚醯胺酸組成物主要由二酸酐單體與二胺單體聚合而成。 The polyamic acid composition is mainly formed by polymerizing dianhydride monomers and diamine monomers.
其中,所述二酸酐單體包括含有液晶單元的二酸酐單體或含有柔軟結構的二酸酐單體中的至少一種。 Wherein, the dianhydride monomer includes at least one of a dianhydride monomer containing a liquid crystal unit or a dianhydride monomer containing a soft structure.
優選地,所述二酸酐單體的柔軟結構中包含有-O-、-CH3CCH3-、-CF3CCF3-、-SO2-、-C=O-等基團中的至少一種。 Preferably, the soft structure of the dianhydride monomer contains at least one of -O-, -CH 3 CCH 3 -, -CF 3 CCF 3 -, -SO 2 -, -C=O- and other groups .
其中,所述二胺單體包括含有液晶單元的二胺單體、含有柔軟結構的二胺單體及含有氮雜環的二胺單體。其中,所述二胺單體的柔軟結構是指長鏈飽和脂肪烴基或長鏈不飽和脂肪烴基或醚基等。其中,長鏈的定義是指四碳或四碳以上之碳氫直鏈結構。優選地,所述二胺單體的柔軟結構中包含有-O-、-CH3CCH3-、-CF3CCF3-、-SO2-、-C=O-等基團中的至少一種。 Wherein, the diamine monomer includes a diamine monomer containing a liquid crystal unit, a diamine monomer containing a soft structure, and a diamine monomer containing a nitrogen heterocycle. Wherein, the soft structure of the diamine monomer refers to a long-chain saturated aliphatic hydrocarbon group, a long-chain unsaturated aliphatic hydrocarbon group, an ether group, or the like. Among them, the definition of long chain refers to the straight chain structure of four carbons or more hydrocarbons. Preferably, the soft structure of the diamine monomer contains at least one of -O-, -CH 3 CCH 3 -, -CF 3 CCF 3 -, -SO 2 -, -C=O- and other groups .
所述含有氮雜環的二胺單體中的氮雜環上的氮原子可與銅產生配位作用因而可提高聚醯亞胺與銅箔的接著強度,改善因高分子結構中的液晶單元緊密排列形成結晶所造成的剛硬性影響降低了聚醯亞胺與銅箔的接著強度。 The nitrogen atom on the nitrogen heterocycle in the nitrogen heterocycle-containing diamine monomer can coordinate with copper, thereby improving the bonding strength between the polyimide and the copper foil, improving the liquid crystal unit in the polymer structure. The rigidity effect caused by the close arrangement of crystals reduces the bonding strength of the polyimide to the copper foil.
在高溫條件下,所述含有液晶單元的二酸酐單體或二胺單體可使聚醯亞胺的高分子結構中的液晶單元緊密排列,形成結晶,降低了在高頻電場下聚醯亞胺高分子結構的可動性,從而減少了介電損耗。 Under high temperature conditions, the dianhydride monomer or diamine monomer containing liquid crystal units can make the liquid crystal units in the polymer structure of polyimide closely arranged to form crystals, which reduces the problem of polyimide under high-frequency electric field. Mobility of the amine polymer structure, thereby reducing dielectric losses.
所述含有柔軟結構的二酸酐單體或二胺單體能夠調節因高分子結構中的液晶單元緊密排列形成結晶所造成的剛硬性,並調節聚醯亞胺的熱膨脹係數(CTE),使之能夠與銅箔匹配,從而避免覆銅板翹曲。 The dianhydride monomer or diamine monomer containing a soft structure can adjust the rigidity caused by the close arrangement of liquid crystal units in the polymer structure to form crystals, and adjust the coefficient of thermal expansion (CTE) of the polyimide, so that it is Can be matched with copper foil to avoid warping of copper clad laminates.
其中,所述二酸酐單體與所述二胺單體的摩爾比的使用範圍為0.9~1.1。聚醯亞胺是由1:1二酸酐單體與二胺單體的縮合聚合反應生成,當兩者數量不相當的條件下進行縮合聚合反應時,所生成的聚合物平均分子量將過低,且分子量分佈亦會過寬,若將此情況的聚合物進一步加工成工業運用的材料時,材料本身的物理化學特性或機械特性將無法符合工業規格標準。 Wherein, the use range of the molar ratio of the dianhydride monomer to the diamine monomer is 0.9 to 1.1. Polyimide is formed by the condensation polymerization of 1:1 dianhydride monomer and diamine monomer. When the condensation polymerization is carried out under the condition that the two quantities are not equal, the average molecular weight of the resulting polymer will be too low. In addition, the molecular weight distribution will be too broad. If the polymer in this case is further processed into materials for industrial use, the physicochemical properties or mechanical properties of the materials themselves will not meet the industrial specifications.
其中,所述含有液晶單元的二胺單體與所述含有柔軟結構的二胺單體的在所述二胺單體中所占的摩爾百分比之和為92%~97%。其中,在所述含有液晶單元的二胺單體與所述含有柔軟結構的二胺單體中,所述含有液晶單元 的二胺單體所占的百分比為30~70%,所述含有柔軟結構的二胺單體所占的百分比為30~70%,兩者相加為100%。其中,含量範圍的差異會因為高分子的液晶單元或柔軟單元的多寡間接或直接影響材料介電損耗高低與CTE值的變化。 Wherein, the sum of the molar percentages of the liquid crystal unit-containing diamine monomer and the soft structure-containing diamine monomer in the diamine monomer is 92% to 97%. Wherein, in the diamine monomer containing a liquid crystal unit and the diamine monomer containing a flexible structure, the liquid crystal unit containing The percentage of the diamine monomer is 30-70%, the percentage of the diamine monomer containing the soft structure is 30-70%, and the sum of the two is 100%. Among them, the difference in the content range will indirectly or directly affect the change of the dielectric loss and the CTE value of the material due to the amount of the liquid crystal unit or the soft unit of the polymer.
其中,在所述二胺單體中,所述含有氮雜環的二胺單體的摩爾百分比為3%~8%。所述含量範圍可以由所述聚醯胺酸組成物制得的聚醯亞胺膜具有較強的剝離強度的同時具有較好的透光度。實驗表明,當所述含有氮雜環的二胺單體的摩爾量大於3%~8%的範圍時,對所制得的聚醯亞胺膜的剝離強度的提升不大,卻因含有氮雜環的二胺單體在吸光時有較大的電荷轉移效應而導致透光度明顯降低。 Wherein, in the diamine monomer, the molar percentage of the diamine monomer containing a nitrogen heterocycle is 3% to 8%. In the content range, the polyimide film prepared from the polyimide composition can have strong peeling strength and better light transmittance. Experiments show that when the molar amount of the nitrogen heterocycle-containing diamine monomer is greater than the range of 3% to 8%, the peel strength of the obtained polyimide film is not greatly improved, but due to the nitrogen content. Heterocyclic diamine monomers have a large charge transfer effect when absorbing light, resulting in a significant decrease in light transmittance.
其中,所述含有液晶單元的二酸酐單體的結構式為
具體地,所述含有液晶單元的二酸酐單體優選為芳香族四羧酸二酐。其中,所述含有液晶單元的二酸酐單體可以為但不局限於3,3',4,4'-聯苯四羧酸二酐(3,3',4,4'-Biphenyltetracarboxylic dianhydride,BPDA;CAS:2420-87-3)、對苯基二(偏苯三酸酯)二酸酐(p-Phenylene bis(trimellitate)dianhydride,TAHQ;CAS:2770-49-2)及環己烷-1,4-二基雙(亞甲基)雙(1,3-二氧代-1,3-二氫異苯並呋喃-5-羧酸乙酯)(cyclohexane-1,4-diylbis(methylene)bis(1,3-dioxo-1,3-dihy-droisobenzofuran-5-carboxylate),TA-CHDM)中的至少一種。 Specifically, the dianhydride monomer containing a liquid crystal unit is preferably an aromatic tetracarboxylic dianhydride. Wherein, the dianhydride monomer containing liquid crystal unit may be, but not limited to, 3,3',4,4'-biphenyltetracarboxylic dianhydride (3,3 ' ,4,4' - Biphenyltetracarboxylic dianhydride, BPDA) ; CAS: 2420-87-3), p-Phenylene bis(trimellitate) dianhydride (TAHQ; CAS: 2770-49-2) and cyclohexane-1, 4-Diylbis(methylene)bis(1,3-dioxo-1,3-dihydroisobenzofuran-5-carboxylate ethyl ester)(cyclohexane-1,4-diylbis(methylene)bis (1,3-dioxo-1,3-dihy-droisobenzofuran-5-carboxylate), at least one of TA-CHDM).
其中,所述3,3',4,4'-聯苯四羧酸二酐的結構式為,所述對苯基二(偏苯三酸酯)二酸酐的結構式為,所述環己烷-1,4-二基雙(亞甲基)雙(1,3-二氧代-1,3-二氫異苯並呋喃-5-羧酸乙酯)的結構式為:
所述含有液晶單元的二胺單體的結構式為、
具體地,所述含有液晶單元的二胺單體可以為但不局限於對氨基苯甲酸對氨基苯酯(4-Aminobenzoic acid 4-aminophenyl ester,APAB;CAS:20610-77-9)、1,4-雙(4-氨基苯氧基)苯(1,4-Bis(4-aminobenzo-yloxy)benzene,ABHQ;CAS:22095-98-3)及對苯二甲酸二對氨基苯酯(1,4-Benzenedicarboxylic acid bis(4-aMinophenyl)ester,BPTP;CAS:16926-73-1)中的至少一種。 Specifically, the diamine monomer containing the liquid crystal unit may be, but not limited to, p-aminophenyl p-aminobenzoic acid (4-Aminobenzoic acid 4-aminophenyl ester, APAB; CAS: 20610-77-9), 1, 4-Bis(4-aminophenoxy)benzene (1,4-Bis(4-aminobenzo-yloxy)benzene, ABHQ; CAS: 22095-98-3) and di-p-aminophenyl terephthalate (1, At least one of 4-Benzenedicarboxylic acid bis(4-aMinophenyl)ester, BPTP; CAS: 16926-73-1).
其中,所述對氨基苯甲酸對氨基苯酯的結構式為:,所述1,4-雙(4-氨基苯氧基)苯的結構式為:,所述對苯二甲酸二對氨基苯酯的結構式為:
其中,所述含有柔軟結構的二酸酐單體優選為芳香族四羧酸二酐。具體地,所述含有柔軟結構的二酸酐單體可以為但不局限於4,4'-氧雙鄰苯二甲酸酐(4,4'-Oxydiphthalic anhydride,ODPA;CAS:1823-59-2)、2,3,3',4'-二苯醚四甲酸二酐(3,4'-Oxydiphthalic Anhydride,A-ODPA;CAS:50662-95-8)、3,3',4,4'-二苯甲酮四甲酸二酐(Benzophenone-3,3',4,4'-tetracarboxylic dianhydride,BTDA;CAS:2421-28-5)、3,3,4,4-二苯基碸四羧酸二酸酐(3,3',4,4'-Diphenylsulfonetetracarboxylic Dianhydride,DSDA;CAS:2540-99-0)、六氟二酐(4,4'-(Hexafluoroisopropylidene)diphthalic anhydride,6FDA;CAS:1107-00-2)及雙酚A型二醚二酐(4,4'-(4,4'-isopropylidenediphenoxy)bis-(phthalic anhydride),BPADA;CAS:38103-06-9)中的至少一種。 Among them, the dianhydride monomer containing a soft structure is preferably an aromatic tetracarboxylic dianhydride. Specifically, the dianhydride monomer containing a soft structure can be, but is not limited to, 4,4' - Oxydiphthalic anhydride (ODPA; CAS: 1823-59-2) , 2,3,3',4'-diphenyl ether tetracarboxylic dianhydride (3,4'-Oxydiphthalic Anhydride, A-ODPA; CAS: 50662-95-8), 3,3',4,4'- Benzophenone tetracarboxylic dianhydride (Benzophenone-3,3 ' ,4,4 ' -tetracarboxylic dianhydride, BTDA; CAS: 2421-28-5), 3,3,4,4-diphenyltetracarboxylic acid Dianhydride (3,3',4,4'-Diphenylsulfonetetracarboxylic Dianhydride, DSDA; CAS: 2540-99-0), hexafluorodianhydride (4,4 ' -(Hexafluoroisopropylidene) diphthalic anhydride, 6FDA; CAS: 1107-00 -2) and at least one of bisphenol A-type diether dianhydride (4,4'-(4,4'-isopropylidenediphenoxy)bis-(phthalic anhydride), BPADA; CAS: 38103-06-9).
其中,所述4,4'-氧雙鄰苯二甲酸酐的結構式為:,所述2,3,3',4'-二苯醚四甲酸二酐的結構式為:,所述3,3',4,4'-二苯甲酮四甲酸二酐的結構式:為,所述3,3,4,4-二苯基碸四羧酸二酸酐的結構式為:,所述六氟二酐的結構式為:,所述雙酚A型二醚二酐的結構式為。 Wherein, the structural formula of described 4,4'-oxygen diphthalic anhydride is: , the structural formula of the 2,3,3',4'-diphenyl ether tetracarboxylic dianhydride is: , the structural formula of the 3,3',4,4'-benzophenone tetracarboxylic dianhydride: is , the structural formula of the 3,3,4,4-diphenyltetracarboxylic acid dianhydride is: , the structural formula of the hexafluorodianhydride is: , the structural formula of described bisphenol A diether dianhydride is .
其中,所述含有柔軟結構的二胺單體為芳香族二胺或脂肪族二胺等。具體地,所述含有柔軟結構的二胺單體可以為但不局限於4,4'-二氨基二苯醚(4,4'-Oxydianiline,ODA;CAS:101-80-4)、4,4'-二(4-氨基苯氧基)聯苯(4,4'-Bis(4-aminophenoxy)biphenyl,BAPB;CAS:13080-85-8)、2,2'-雙[4-(4-氨基苯氧基苯基)]丙烷(4,4'-(4,4'-Isopropylidenediphenyl-1,1'-diyldioxy)dianiline,m-BAPP;CAS:13080-86-9)、2,2-雙[4-(4-氨基苯氧基)苯基]-1,1,1,3,3,3-六氟丙烷(2,2-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane,HFBAPP;CAS:69563-88-8)、1,3-雙(4'-氨基苯氧基)苯(4,4'-(1,3-Phenylenedioxy)dianiline,TPE-R; CAS:2479-46-1)及1,3-雙(3-氨基苯氧基)苯(1,3-Bis(3-aminophenoxy)benzene,TPE-M;CAS:10526-07-5)、市售工業品號為D230和D400且結構為的二胺、市售工業品號為DA-C6且結構為的二胺、結構式為的己二胺中的至少一種。 Wherein, the diamine monomer containing a soft structure is an aromatic diamine, an aliphatic diamine, or the like. Specifically, the diamine monomer containing a soft structure can be, but is not limited to, 4,4'-diaminodiphenyl ether (4,4'-Oxydianiline, ODA; CAS: 101-80-4), 4,4'-Oxydianiline, ODA; CAS: 101-80-4 4'-bis(4-aminophenoxy)biphenyl (4,4'-Bis(4-aminophenoxy)biphenyl, BAPB; CAS: 13080-85-8), 2,2'-bis[4-(4 -Aminophenoxyphenyl)]propane (4,4'-(4,4'-Isopropylidenediphenyl-1,1'-diyldioxy)dianiline,m-BAPP; CAS: 13080-86-9), 2,2- Bis[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropane (2,2-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane, HFBAPP ; CAS: 69563-88-8), 1,3-bis(4'-aminophenoxy)benzene (4,4'-(1,3-Phenylenedioxy)dianiline, TPE-R; CAS: 2479-46- 1) and 1,3-Bis(3-aminophenoxy)benzene (1,3-Bis(3-aminophenoxy)benzene, TPE-M; CAS: 10526-07-5), the commercial product number is D230 and D400 and the structure is The diamine, commercially available industrial product number is DA-C6 and the structure is The diamine, the structural formula is at least one of hexamethylenediamine.
其中,所述4,4'-二氨基二苯醚的結構式為:,所述4,4'-二(4-氨基苯氧基)聯苯的結構式為:,所述2,2'-雙[4-(4-氨基苯氧基苯基)]丙烷的結構式為:,所述2,2-雙[4-(4-氨基苯氧基)苯基]-1,1,1,3,3,3-六氟丙烷的結構式為:,所述1,3-雙(4'-氨基苯氧基)苯的結構式為:
,所述1,3-雙(3-氨基苯氧基)苯的結構式為:
其中,所述含有氮雜環的二胺單體可以為但不局限於3,5-二氨基-1,2,4-三氮唑(1,2,4-Triazole-3,5-diamine,DTZ;CAS:1455-77-2)、2-(4-氨基苯基)-5-氨基苯並咪唑(2-(4-Aminophenyl)-1H-benzimidazol-5-amine,APBIA;CAS:7621-86-5)及2,5-雙(4-氨基苯基)嘧啶(4,4'-pyrimidine-2,5-diyldianiline,PRM;CAS:102570-64-9)中的至少一種。 Wherein, the diamine monomer containing nitrogen heterocycle may be but not limited to 3,5-diamino-1,2,4-triazole (1,2,4-Triazole-3,5-diamine, DTZ; CAS: 1455-77-2), 2-(4-Aminophenyl)-5-aminobenzimidazole (2-(4-Aminophenyl)-1H-benzimidazol-5-amine, APBIA; CAS: 7621- 86-5) and at least one of 2,5-bis(4-aminophenyl)pyrimidine (4,4'-pyrimidine-2,5-diyldianiline, PRM; CAS: 102570-64-9).
其中,所述3,5-二氨基-1,2,4-三氮唑的結構式為:、所述2-(4-氨基苯基)-5-氨基苯並咪唑的結構式為:,所述2,5-雙(4-氨基苯基)嘧啶的結構式為:。 Wherein, the structural formula of the 3,5-diamino-1,2,4-triazole is: , the structural formula of described 2-(4-aminophenyl)-5-aminobenzimidazole is: , the structural formula of the 2,5-bis(4-aminophenyl) pyrimidine is: .
所述聚醯胺酸組成物的製備方法可以為:將含有液晶單元的二胺單體、含有柔軟結構的二胺單體及含有氮雜環的二胺單體加入具有溶劑的反應瓶中;高速攪拌使含有液晶單元的二胺單體、含有柔軟結構的二胺單體及含有氮雜環的二胺單體完全溶解在溶劑中;接著,將含有液晶單元的二酸酐單體或含有柔軟結構的二酸酐單體中的至少一種加入所述反應瓶中,攪拌反應一段時間,即制得聚醯胺酸組成物。其中,所述溶劑優選為雙極性的質子惰性溶劑。所述雙極性的質子惰性溶劑可以為二甲基甲醯胺(DMF)、二甲基乙醯胺(DMAC)、N-甲基吡咯烷酮(NMP)、二甲基亞碸(DMSO)等。所述溶劑的添加量可根據需要進行變更,只要使所述含有液晶單元的二胺單體、含有柔軟結構的二胺單體及 含有氮雜環的二胺單體及含有液晶單元的二酸酐單體及/或含有柔軟結構的二酸酐單體能完全溶解即可。所述高速攪拌的轉速可以為1400rpm(轉每分鐘)左右。 The preparation method of the polyamic acid composition can be as follows: adding the diamine monomer containing liquid crystal unit, the diamine monomer containing soft structure and the diamine monomer containing nitrogen heterocycle into a reaction flask with solvent; High-speed stirring makes the diamine monomer containing liquid crystal unit, the diamine monomer containing soft structure and the diamine monomer containing nitrogen heterocycle completely dissolved in the solvent; At least one of the structural dianhydride monomers is added to the reaction flask, and the reaction is stirred for a period of time to obtain a polyamide acid composition. Among them, the solvent is preferably a bipolar aprotic solvent. The bipolar aprotic solvent can be dimethylformamide (DMF), dimethylacetamide (DMAC), N-methylpyrrolidone (NMP), dimethylsulfoxide (DMSO) and the like. The addition amount of the solvent can be changed as required, as long as the liquid crystal unit-containing diamine monomer, the soft structure-containing diamine monomer and the The diamine monomer containing a nitrogen heterocycle, the dianhydride monomer containing a liquid crystal unit, and/or the dianhydride monomer containing a soft structure may be completely dissolved. The rotational speed of the high-speed stirring may be about 1400 rpm (revolutions per minute).
請結合參閱圖1~2,一種聚醯亞胺覆銅板100,其用於製作電路板200。所述聚醯亞胺覆銅板100包括銅箔10及結合於所述銅箔10一表面的聚醯亞胺膜20。所述銅箔10的表面具有較低的粗糙度。其中,所述銅箔10的表面粗糙度在0.12um~2.1um之間。所述聚醯亞胺膜20通過將上述聚醯胺酸組成物塗布在所述銅箔10的表面後經高溫環化形成。
Please refer to FIGS. 1 to 2 in conjunction with a polyimide copper clad
其中,所述聚醯胺酸組成物經高溫環化形成所述聚醯亞胺膜20的原理為:
因所述聚醯胺酸組成物包括含有氮雜環的二胺單體,所述含有氮雜環的二胺單體中的氮雜環上的氮原子可與所述銅箔10產生配位作用,從而使得所述聚醯亞胺膜20與所述銅箔10之間具有較強的結合力。如此,可以使用表面粗糙度較低的銅箔10來製作聚醯亞胺覆銅板100,這樣可以使在銅箔10表面所形成的聚醯亞胺膜20的表面較為平整,從而使得該聚醯亞胺膜20具有較高的透光度。
Because the polyamic acid composition includes a nitrogen heterocyclic ring-containing diamine monomer, the nitrogen atom on the nitrogen heterocyclic ring in the nitrogen heterocyclic ring-containing diamine monomer can coordinate with the
其中,所述聚醯亞胺覆銅板100的所述銅箔10與所述聚醯亞胺膜20直接結合在一起,所述銅箔10與所述聚醯亞胺膜20之間未設置膠粘層,如此可以進一步提高所述聚醯亞胺膜20的透光度,並且可以節約成本。
Wherein, the
一種上述聚醯亞胺覆銅板100的製作方法:提供銅箔10,所述銅箔10的表面粗糙度在0.12um~2.1um之間。
A manufacturing method of the above-mentioned polyimide copper clad laminate 100: providing a
提供聚醯胺酸組成物,將所述聚醯胺酸組成物塗布在所述銅箔10的表面。
A polyamic acid composition is provided, and the polyamic acid composition is coated on the surface of the
高溫環化,使所述銅箔10表面的聚醯胺酸組成物高溫下脫水而進行閉環,得到結合在銅箔10表面的聚醯亞胺膜20,即制得覆銅板100。其中,所述高溫環化的溫度範圍大致為300~400℃。
In the high temperature cyclization, the polyimide composition on the surface of the
本發明還提供一種聚醯亞胺膜20,所述聚醯亞胺膜20通過將所述聚醯胺酸組成物塗覆在基材的表面後經高溫環化形成。其中,所述基材可以為離型膜、金屬箔、樹脂等常規應用於製備聚醯亞胺膜的基材。在高溫環化過程中,所述聚醯胺酸組成物會在高溫下脫水而進行閉環,從而得到結合在基材表面的聚醯亞胺膜20。
The present invention also provides a
請參閱圖2,一種電路板200,其應用於電腦、電子閱讀器、平板電腦、智慧手錶等電子裝置(圖未示)上。該電路板200包括電路基板201及覆蓋在該電路基板201至少一表面的覆蓋膜202。該電路基板201包括所述聚醯亞胺膜20及結合在所述聚醯亞胺膜20至少一表面的導電線路層2011。所述導電線路層2011通過對聚醯亞胺覆銅板100的銅箔10圖案化所形成。所述覆蓋膜202結合於所述導電線路層2011的遠離所述聚醯亞胺膜20的表面。
Referring to FIG. 2 , a
下面通過具體實施例進一步對本發明的聚醯胺酸組成物進行說明。 The polyamide composition of the present invention will be further described below through specific examples.
實施例1 Example 1
於500mL反應瓶中分別加入NMP(203.37g)、APAB(0.068mol,15.52g)、ODA(0.027mol,5.41g)、DTZ(0.005mol,0.50g),待高速攪拌至溶解後,再加入BPDA(0.1mol,29.42g)於無水氮氣環境下,以低於室溫條件攪拌反應48小時,即配置完成聚醯胺酸組成物。 Add NMP (203.37g), APAB (0.068mol, 15.52g), ODA (0.027mol, 5.41g), DTZ (0.005mol, 0.50g) to a 500mL reaction flask, stir at high speed until dissolved, then add BPDA (0.1 mol, 29.42 g) in an anhydrous nitrogen environment, stirring and reacting at a condition lower than room temperature for 48 hours, that is, the configuration of the polyamide acid composition is completed.
實施例2 Example 2
於500mL反應瓶中分別加入NMP(205.77g)、APAB(0.078mol,17.80g)、ODA(0.017mol,3.40g)、DTZ(0.005mol,0.50g),待高速攪拌至溶解後,再加入ODPA(0.02mol,6.20g)、BPDA(0.08mol,23.54g)於無水氮氣環境下,以低於室溫條件攪拌反應48小時,即配置完成聚醯胺酸組成物。 NMP (205.77g), APAB (0.078mol, 17.80g), ODA (0.017mol, 3.40g), DTZ (0.005mol, 0.50g) were added to the 500mL reaction flask, and ODPA was added after high-speed stirring until dissolved. (0.02mol, 6.20g), BPDA (0.08mol, 23.54g) in anhydrous nitrogen environment, stirring and reacting under the condition of room temperature for 48 hours, that is, the configuration of the polyamide acid composition is completed.
實施例3 Example 3
於500mL反應瓶中分別加入NMP(250.75g)、APAB(0.045mol,10.27g)、ODA(0.060mol,12.01g)、DTZ(0.005mol,0.50g),待高速攪拌至溶解後,再加入ODPA(0.04mol,12.41g)、TAHQ(0.06mol,27.50g)於無水氮氣環境下,以低於室溫條件攪拌反應48小時,即配置完成聚醯胺酸組成物。 NMP (250.75g), APAB (0.045mol, 10.27g), ODA (0.060mol, 12.01g), DTZ (0.005mol, 0.50g) were added to the 500mL reaction flask, and ODPA was added after high-speed stirring until dissolved. (0.04mol, 12.41g), TAHQ (0.06mol, 27.50g) in an anhydrous nitrogen environment, stirring and reacting under the condition of room temperature for 48 hours, that is, the configuration of the polyamide acid composition is completed.
實施例4 Example 4
於500mL反應瓶中分別加入NMP(211.68g)、APAB(0.085mol,19.40g)、ODA(0.010mol,2.00g)、DTZ(0.005mol,0.50g),待高速攪拌至溶解後,再加入ODPA(0.1mol,31.02g)於無水氮氣環境下,以低於室溫條件攪拌反應48小時,即配置完成聚醯胺酸組成物。 Add NMP (211.68g), APAB (0.085mol, 19.40g), ODA (0.010mol, 2.00g), DTZ (0.005mol, 0.50g) to a 500mL reaction flask, stir at high speed until dissolved, then add ODPA (0.1 mol, 31.02 g) in an anhydrous nitrogen environment, stirring and reacting at a condition lower than room temperature for 48 hours, that is, the configuration of the polyamide acid composition is completed.
比較例1 Comparative Example 1
於500mL反應瓶中分別加入NMP(170.66g)、PDA(0.068mol,7.34g)、ODA(0.027mol,5.41g)、DTZ(0.005mol,0.50g),待高速攪拌至溶解後,再加入BPDA(0.1mol,29.42g)於無水氮氣環境下,以低於室溫條件攪拌反應48小時,即配置完成聚醯胺酸組成物。 Add NMP (170.66g), PDA (0.068mol, 7.34g), ODA (0.027mol, 5.41g), DTZ (0.005mol, 0.50g) to the 500mL reaction flask, stir at high speed until dissolved, then add BPDA (0.1 mol, 29.42 g) in an anhydrous nitrogen environment, stirring and reacting at a condition lower than room temperature for 48 hours, that is, the configuration of the polyamide acid composition is completed.
比較例2 Comparative Example 2
於500mL反應瓶中分別加入NMP(205.61g)、APAB(0.070mol,15.98g)、ODA(0.030mol,6.01g),待高速攪拌至溶解後,再加入BPDA(0.1mol,29.42g)於無水氮氣環境下,以低於室溫條件攪拌反應48小時,即配置完成聚醯胺酸組成物。 Add NMP (205.61g), APAB (0.070mol, 15.98g), ODA (0.030mol, 6.01g) to a 500mL reaction flask, stir at high speed until dissolved, then add BPDA (0.1mol, 29.42g) in anhydrous Under a nitrogen atmosphere, the reaction is stirred for 48 hours at a condition lower than room temperature, that is, the configuration of the polyamide acid composition is completed.
比較例3 Comparative Example 3
於500mL反應瓶中分別加入NMP(263.41g)、ODA(0.1mol,20.02g),待高速攪拌至溶解後,再加入TAHQ(0.1mol,45.83g)於無水氮氣環境下,以低於室溫條件攪拌反應48小時,即配置完成聚醯胺酸組成物。 Add NMP (263.41g) and ODA (0.1mol, 20.02g) to a 500mL reaction flask, stir at a high speed to dissolve, then add TAHQ (0.1mol, 45.83g) in an anhydrous nitrogen environment, at a temperature lower than room temperature Condition stirring reaction for 48 hours, that is, the configuration of the polyamide acid composition is completed.
比較例4 Comparative Example 4
於500mL反應瓶中分別加入NMP(208.98g)、APAB(0.1mol,22.83g),待高速攪拌至溶解後,再加入BPDA(0.1mol,29.42g)於無水氮氣環境下,以低於室溫條件攪拌反應48小時,即配置完成聚醯胺酸組成物。 Add NMP (208.98g) and APAB (0.1mol, 22.83g) to a 500mL reaction flask, stir at a high speed to dissolve, and then add BPDA (0.1mol, 29.42g) under anhydrous nitrogen atmosphere, at a temperature lower than room temperature Condition stirring reaction for 48 hours, that is, the configuration of the polyamide acid composition is completed.
將上述實施例1~4及比較例1~4中所制得的聚醯胺酸組成物分別塗布在銅箔10的表面,將塗布有聚醯胺酸組成物的銅箔10分別置於高溫環境下,使聚醯胺酸組成物高溫環化聚合形成結合在銅箔10表面的聚醯亞胺膜20,制得覆銅板100。
The polyamic acid compositions prepared in the above-mentioned Examples 1 to 4 and Comparative Examples 1 to 4 were respectively coated on the surface of the
對所述覆銅板100分別進行剝離強度測試、漂錫測試、熱膨脹係數(CTE)測試、熱重測試(Tg)、介電常數(Dk)及介質損耗(Df)。測試結果參見表一。其中,所述漂錫測試中,若漂錫測試在溫度為288℃下持續10sec,錫不脫落,則漂錫測試結果為“通過”,表明覆銅板100達到了漂錫測試的需求。
The
由上表可知,實施例1~4為本發明導入含有液晶單元的單體與含氮雜環的二胺單體,其仍保有與銅箔良好的剝離強度並可降低介電損失Df值為0.004~0.006,而比較例1因為不含液晶單元單體的聚醯胺酸組成物,其介電損失Df值為0.014。比較例2~4雖含有液晶單元的單體但因缺少含氮雜環的二胺單體,所以與銅箔的剝離強度則會下降至非常低。比較例3含液晶單元的單體只搭配柔軟單體,則CTE值則偏大會造成覆銅板翹曲。比較例4含液晶單元的單體無搭配柔軟單體,則CTE值偏低,也會造成覆銅板翹曲。 As can be seen from the above table, Examples 1 to 4 are monomers containing liquid crystal cells and diamine monomers containing nitrogen heterocycles introduced in the present invention, which still maintain good peel strength with copper foil and can reduce the dielectric loss Df value. 0.004~0.006, and Comparative Example 1 has a dielectric loss Df value of 0.014 because of the polyamide acid composition that does not contain a liquid crystal cell monomer. Although the comparative examples 2-4 contained the monomer of a liquid crystal cell, since the diamine monomer containing a nitrogen heterocyclic ring was lacking, the peeling strength with copper foil fell very low. In Comparative Example 3, the monomer containing the liquid crystal unit is only matched with the soft monomer, and the CTE value is too high, which will cause the copper clad laminate to warp. In Comparative Example 4, the monomer containing the liquid crystal unit is not matched with the soft monomer, the CTE value is low, and the copper clad laminate is also warped.
本發明提供的聚醯胺酸組成物由二酐單體及二胺單體聚合而成,且所述二酸酐單體包括含有液晶單元的二酸酐單體或含有柔軟結構的二酸酐單體中的至少一種,所述二胺單體中包括含有液晶單元的二胺單體、含有柔軟結構的二胺單體及含有氮雜環的二胺單體;1)所述含有氮雜環的二胺單體中的氮雜環上的氮原子可與銅產生配位作用因而可提高聚醯亞胺與銅箔的接著強度,改善因高分子結構中的液晶單元緊密排列形成結晶所造成的剛硬性影響降低了聚醯亞胺與銅箔的接著強度;2)在高溫條件下,所述含有液晶單元的二酸酐單體或二胺單體可使聚醯亞胺的高分子結構中的液晶單元緊密排列,形成結晶,降低了在高頻電場下聚醯亞胺高分子結構的可動性,從而減少了介電損耗;3)所述含有柔軟結構的二酸酐單體或二胺單體能夠調節因高分子結構中的液晶單元緊密排列形成結晶所造成的剛硬性,並調節聚醯亞胺的熱膨脹係數(CTE),使之能夠與銅箔匹配,從而避免覆銅板翹曲。 The polyamic acid composition provided by the present invention is formed by polymerizing a dianhydride monomer and a diamine monomer, and the dianhydride monomer includes a dianhydride monomer containing a liquid crystal unit or a dianhydride monomer containing a soft structure. At least one of the diamine monomers, the diamine monomers include a liquid crystal unit-containing diamine monomer, a soft structure-containing diamine monomer, and a nitrogen heterocycle-containing diamine monomer; 1) the nitrogen heterocycle-containing diamine monomer The nitrogen atom on the nitrogen heterocyclic ring in the amine monomer can coordinate with copper, which can improve the bonding strength of polyimide and copper foil, and improve the rigidity caused by the close arrangement of liquid crystal units in the polymer structure to form crystals. The effect of hardness reduces the bonding strength of polyimide and copper foil; 2) Under high temperature conditions, the dianhydride monomer or diamine monomer containing liquid crystal units can make the liquid crystal in the polymer structure of polyimide The units are closely arranged to form crystals, which reduces the mobility of the polyimide polymer structure under the high-frequency electric field, thereby reducing the dielectric loss; 3) The dianhydride monomer or diamine monomer containing a soft structure can Adjust the rigidity caused by the close arrangement of liquid crystal cells in the polymer structure to form crystals, and adjust the coefficient of thermal expansion (CTE) of polyimide, so that it can match the copper foil, thereby avoiding the warpage of the copper clad laminate.
另外,對於本領域的普通技術人員來說,可以根據本發明的技術構思做出其它各種相應的改變與變形,而所有這些改變與變形都應屬於本發明的發明申請專利範圍的保護範圍。 In addition, for those of ordinary skill in the art, various other corresponding changes and deformations can be made according to the technical concept of the present invention, and all these changes and deformations should belong to the protection scope of the invention application patent scope of the present invention.
20:聚醯亞胺膜 20: Polyimide film
200:電路板 200: circuit board
201:電路基板 201: circuit substrate
2011:導電線路層 2011: Conductive circuit layers
202:覆蓋膜 202: Overlay
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