TWI744134B - Data storage device and control method for data storage device - Google Patents

Data storage device and control method for data storage device Download PDF

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TWI744134B
TWI744134B TW109144169A TW109144169A TWI744134B TW I744134 B TWI744134 B TW I744134B TW 109144169 A TW109144169 A TW 109144169A TW 109144169 A TW109144169 A TW 109144169A TW I744134 B TWI744134 B TW I744134B
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latch
read
data storage
storage device
memory cell
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TW109144169A
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TW202226256A (en
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馬晨亮
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力晶積成電子製造股份有限公司
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Abstract

A data storage device and a control method of the data storage device are provided. The data storage device includes a memory array and a reading device. The memory array includes at least one memory cell and a global bit line. Each memory cell stores multiple bits. An input terminal of the reading device is coupled to the global bit line. The reading device includes a plurality of impedance elements, a plurality of latch circuits, and a latch reading circuit. The first terminal of each impedance element is mutually coupled to the input terminal of the reading device. The input terminal of each latch circuit is respectively coupled to a second terminal of each corresponding impedance element. The latch reading circuit reads latch bits in each of the latch circuits, respectively. A data stored in the memory cell is determined by the latch bit in each of the latch circuits read by the latch reading circuit.

Description

資料儲存裝置與資料儲存裝置的控制方法Data storage device and control method of data storage device

本發明是有關於一種用於資料儲存裝置的資料存取技術,且特別是有關於一種資料儲存裝置與資料儲存裝置的控制方法。 The present invention relates to a data access technology for a data storage device, and more particularly to a data storage device and a control method of the data storage device.

目前消費性電子產品的發展大部分朝向無線通訊領域與車用電子領域發展,從而希望非揮發性記憶體能夠具備高讀寫速率以及高穩定性。詳細來說,由於無線傳輸技術的資料傳輸速率逐漸加快,因此也希望電子設備中的非揮發性記憶體裝置朝向大容量、且具備快速操作速度(又稱,讀寫速度)邁進。並且,在車用電子蓬勃發展下,非揮發性記憶體裝置的高穩定度與穩定的反應速度(亦即,資料讀取速度)也是十分重要的一環。 At present, most of the development of consumer electronic products is toward the field of wireless communication and automotive electronics, so it is hoped that non-volatile memory can have high reading and writing speed and high stability. In detail, as the data transmission rate of wireless transmission technology is gradually increasing, it is also hoped that non-volatile memory devices in electronic equipment will move towards large capacity and fast operation speed (also known as read and write speed). Moreover, under the booming development of automotive electronics, high stability and stable response speed (ie, data reading speed) of non-volatile memory devices are also very important.

非揮發性記憶體中的NAND快閃記憶體技術已發展出利用單個快閃記憶體胞元儲存兩個或兩個以上位元的技術。也就是說,NAND快閃記憶體的類別包括多級胞元(Multi-Level Cells;MLC)、三級胞元(Triple-Level Cells;TLC)甚至四級胞元(Quad-Level Cells;QLC)...等,從而擁有更大容量的資料密度。 NAND flash memory technology in non-volatile memory has developed a technology that uses a single flash memory cell to store two or more bits. In other words, the categories of NAND flash memory include Multi-Level Cells (MLC), Triple-Level Cells (TLC) and even Quad-Level Cells (QLC). ...And so on, so as to have a greater data density.

然而,由於每個記憶體胞元中儲存有多個位元,且在對儲存有多個位元的記憶體胞元進行讀取操作時,將需要更多的讀取時間來判斷這個記憶體胞元的電壓準位為何。例如,在進行MLC的讀取操作時,需要對MLC讀取兩次以判斷其電位;在進行TLC的讀取操作時,需要對TLC讀取三次以判斷其電位為何,並依此類推。如此一來,將會大幅增加對於記憶體胞元的讀取時間。另一方面,由於前述讀取操作中對於記憶體胞元的讀取次數將依照記憶體胞元中儲存的位元數量而對應增加,導致增加了讀取操作的功率消耗、並降低了每個記憶體胞元的使用壽命。 However, because there are multiple bits stored in each memory cell, and when a memory cell that stores multiple bits is read, it will take more reading time to determine this memory. What is the voltage level of the cell? For example, when performing an MLC reading operation, it is necessary to read the MLC twice to determine its potential; when performing a TLC reading operation, it is necessary to read the TLC three times to determine its potential, and so on. As a result, the read time for memory cells will be greatly increased. On the other hand, since the number of reads to the memory cell in the aforementioned read operation will increase in accordance with the number of bits stored in the memory cell, it will increase the power consumption of the read operation and reduce each The service life of the memory cell.

本發明提供一種資料儲存裝置以及其控制方法,透過以電流偵測方式感測與判定可儲存多個位元的記憶體胞元中的資料,減少在讀取操作時對多級胞元的讀取次數,提高記憶體胞元的使用壽命與可靠度。 The present invention provides a data storage device and a control method thereof. By sensing and judging data in a memory cell capable of storing multiple bits in a current detection mode, the reading of multi-level cells during a read operation is reduced. The frequency of fetching improves the service life and reliability of the memory cell.

本發明的資料儲存裝置包括記憶體陣列以及讀取裝置。記憶體陣列包括至少一個記憶體胞元以及總體位元線,每個記憶體胞元儲存多個位元且選擇性地連接至該總體位元線。讀取裝置的輸入端耦接該總體位元線。讀取裝置包括多個阻抗元件、多個鎖存電路以及鎖存讀取電路。每個阻抗元件的第一端相互耦接至該讀取裝置的該輸入端。每個鎖存電路的輸入端分別耦接對應的每個阻抗元件的第二端。鎖存讀取電路耦接該些鎖存電路的輸出 端。鎖存讀取電路讀取該些鎖存電路中各自的鎖存位元。該至少一記憶體胞元所儲存的資料由該鎖存讀取電路所讀取的該些鎖存電路中的該些鎖存位元來判定。 The data storage device of the present invention includes a memory array and a reading device. The memory array includes at least one memory cell and an overall bit line, and each memory cell stores a plurality of bits and is selectively connected to the overall bit line. The input terminal of the reading device is coupled to the overall bit line. The reading device includes a plurality of impedance elements, a plurality of latch circuits, and a latch read circuit. The first end of each impedance element is mutually coupled to the input end of the reading device. The input terminal of each latch circuit is respectively coupled to the second terminal of each corresponding impedance element. The latch reading circuit is coupled to the outputs of the latch circuits end. The latch reading circuit reads the respective latch bits in the latch circuits. The data stored in the at least one memory cell is determined by the latch bits in the latch circuits read by the latch read circuit.

本發明的資料儲存裝置的控制方法適用於包括記憶體陣列的資料儲存裝置。憶體陣列包括至少一記憶體胞元以及總體位元線,每個記憶體胞元儲存多個位元。控制方法包括下列步驟:在讀取操作的讀取充電時間時,將被選擇的該至少一記憶體胞元的輸出端耦接該總體位元線,其中讀取裝置的輸入端經設置以耦接該總體位元線,該讀取裝置包括多個阻抗元件以及多個鎖存電路,每個阻抗元件的第一端相互耦接至該讀取裝置的該輸入端,每個鎖存電路的輸入端分別耦接對應的每個阻抗元件的第二端,每個鎖存電路分別具備對應的臨界電壓;在該讀取充電時間之後,讀取該些鎖存電路中各自的鎖存位元;以及,依據所讀取的該些鎖存電路中的該些鎖存位元來判定該至少一記憶體胞元所儲存的資料。 The control method of the data storage device of the present invention is suitable for a data storage device including a memory array. The memory array includes at least one memory cell and an overall bit line, and each memory cell stores multiple bits. The control method includes the following steps: during the reading charging time of the reading operation, the output terminal of the selected at least one memory cell is coupled to the overall bit line, wherein the input terminal of the reading device is configured to be coupled Connected to the overall bit line, the reading device includes a plurality of impedance elements and a plurality of latch circuits, the first end of each impedance element is mutually coupled to the input end of the reading device, and the The input terminal is respectively coupled to the second terminal of each corresponding impedance element, and each latch circuit has a corresponding threshold voltage; after the charging time is read, the respective latch bits in the latch circuits are read ; And, determine the data stored in the at least one memory cell according to the read latch bits in the latch circuits.

基於上述,本發明實施例所述的資料儲存裝置以及其控制方法透過調整讀取裝置中的電路架構,從原本以二分法多次地讀取記憶體胞元的臨界電壓與預設電壓相互比對,改為本實施例中以電流偵測方式一次性地感測與判定記憶體胞元中的資料。也就是說,本發明實施例透過調整讀取裝置中各個阻抗元件的阻抗值和/或鎖存電路的臨界電壓,使對應的鎖存電路在讀取操作的讀取充電時間內透過流經對應的阻抗元件的電流而充電,進而調整 其內部的鎖存位元。藉此,本發明實施例可減少在讀取操作時對多級胞元的讀取次數,提高記憶體胞元的使用壽命與可靠度。 Based on the above, the data storage device and its control method according to the embodiments of the present invention adjust the circuit structure of the reading device to read the threshold voltage of the memory cell multiple times from the original dichotomy compared with the preset voltage. Yes, instead, in this embodiment, the current detection method is used to sense and determine the data in the memory cell at one time. That is to say, the embodiment of the present invention adjusts the impedance value of each impedance element in the reading device and/or the threshold voltage of the latch circuit, so that the corresponding latch circuit flows through the corresponding Of the impedance element’s current while charging, and then adjusting The internal latch bit. In this way, the embodiment of the present invention can reduce the number of times to read multi-level cells during a read operation, and improve the service life and reliability of memory cells.

100:資料儲存裝置 100: Data storage device

110:記憶體陣列 110: memory array

112、112-1~112-4:記憶體胞元 112, 112-1~112-4: Memory cell

120:讀取裝置 120: Reading device

131~133:阻抗單元 131~133: Impedance unit

141~143、410、510:鎖存電路 141~143, 410, 510: latch circuit

150:鎖存讀取電路 150: latch read circuit

311~314:狀態分布區域 311~314: State distribution area

520、530、INV1~INV4:反相器 520, 530, INV1~INV4: inverter

800:資料儲存裝置的控制方法 800: Control method of data storage device

S810~S830:資料儲存裝置的控制方法的各步驟 S810~S830: Steps of the control method of the data storage device

SL:選擇線 SL: select line

Sgs:源極端選擇閘極 Sgs: Source selection gate

Sgd:汲極端選擇閘極 Sgd: Drain extreme selection gate

BL0~BL2:位元線 BL0~BL2: bit line

WL0~WLM:字元線 WL0~WLM: character line

R1~R3:阻抗單元的阻抗值 R1~R3: Impedance value of impedance unit

I1~I3:電流 I1~I3: current

P1~P3:路徑 P1~P3: path

PIN:讀取裝置的輸入端 PIN: the input terminal of the reading device

GBL:全域位元線 GBL: Global bit line

TI2~TI4:加總電流 TI2~TI4: total current

PST:程式化狀態 PST: stylized state

EST:抹除狀態 EST: Erase status

NUM:記憶體胞元在各個狀態的數量 NUM: the number of memory cells in each state

d:狀態分布區域之間的相鄰距離 d: Adjacent distance between state distribution areas

RWL1~RWL3:讀取信號 RWL1~RWL3: Read signal

RBL:讀取位元線 RBL: read bit line

T1~T3、T11~T13、T21~T23:電晶體 T1~T3, T11~T13, T21~T23: Transistor

READ:讀取信號 READ: read signal

RESET:重置信號 RESET: reset signal

INN:鎖存電路的輸入端 INN: The input terminal of the latch circuit

OUTN:鎖存電路的輸出端 OUTN: The output terminal of the latch circuit

In11、In21:反及閘的第一輸入端 In11, In21: the first input terminal of reverse and gate

In12、In22:反及閘的第二輸入端 In12, In22: the second input terminal of reverse and gate

Out1、Out2:反及閘的輸出端 Out1, Out2: output terminal of reverse and gate

圖1是依照本實施例一實施例的資料儲存裝置的示意圖。 FIG. 1 is a schematic diagram of a data storage device according to an embodiment of the present embodiment.

圖2是本實施例一實施例中,在記憶體胞元是多級胞元(MLC)的情況下,記憶體胞元所儲存的資料與鎖存電路在經歷讀取充電時間後各自的鎖存位元的示意圖。 2 is an embodiment of the present embodiment, in the case that the memory cell is a multi-level cell (MLC), the data stored in the memory cell and the latch circuit are locked after reading and charging time. Schematic diagram of bit storage.

圖3是本實施例一實施例中,以多級胞元作為記憶體胞元的情況下,記憶體胞元所儲存的資料與記憶體胞元的臨界電壓分布圖之間的關係示意圖。 3 is a schematic diagram of the relationship between the data stored in the memory cell and the threshold voltage distribution diagram of the memory cell in the case of using multi-level cells as the memory cell in an embodiment of the present embodiment.

圖4是圖1或圖2中鎖存電路的一種範例電路圖。 FIG. 4 is an example circuit diagram of the latch circuit in FIG. 1 or FIG. 2.

圖5是圖1或圖2中鎖存電路的另一種範例電路圖。 FIG. 5 is another example circuit diagram of the latch circuit in FIG. 1 or FIG. 2. FIG.

圖6是圖1中鎖存讀取電路的範例電路圖。 FIG. 6 is an example circuit diagram of the latch reading circuit in FIG. 1. FIG.

圖7是本實施例一實施例中資料儲存裝置以立體積體電路(3DIC)來實現的示意圖。 FIG. 7 is a schematic diagram of a data storage device implemented by a volumetric volume circuit (3DIC) in an embodiment of this embodiment.

圖8是本實施例一實施例中資料儲存裝置的控制方法的流程圖。 FIG. 8 is a flowchart of a control method of a data storage device in an embodiment of this embodiment.

圖1是依照本實施例一實施例的資料儲存裝置100的示 意圖。資料儲存裝置100可以是用於消費型電子裝置的記憶體裝置,例如NAND型或NOR型快閃記憶體裝置。 FIG. 1 is a diagram of a data storage device 100 according to an embodiment of this embodiment. intention. The data storage device 100 may be a memory device used in a consumer electronic device, such as a NAND-type or NOR-type flash memory device.

請參照圖1,資料儲存裝置100包括記憶體陣列110以及讀取裝置120。記憶體陣列110包括至少一個記憶體胞元以及全域位元線GBL。本實施例的記憶體胞元透過矩陣形式排列,並且具備位元線BL0~BL2以及字元線WL0~WLM。這些記憶體胞元選擇性地連接至全域位元線GBL。在進行相應的操作(如,讀取操作)時,資料儲存裝置100中的控制器可透過控制選擇線SL、源極端選擇閘極Sgs、汲極端選擇閘極Sgd以及字元線WL0~WLM以選擇這些記憶體胞元的其中一個(例如,被選擇的記憶體胞元112),並將被選擇的記憶體胞元112的輸出端透過位元線(如,位元線BL1)耦接全域位元線GBL。藉此,耦接至全域位元線GBL的讀取裝置120能夠依據此全域位元線GBL的電壓來判定記憶體胞元112所儲存的資料為何。 Please refer to FIG. 1, the data storage device 100 includes a memory array 110 and a reading device 120. The memory array 110 includes at least one memory cell and a global bit line GBL. The memory cells of this embodiment are arranged in a matrix form, and have bit lines BL0~BL2 and word lines WL0~WLM. These memory cells are selectively connected to the global bit line GBL. When performing a corresponding operation (such as a read operation), the controller in the data storage device 100 can control the selection line SL, the source selection gate Sgs, the drain selection gate Sgd, and the word lines WL0~WLM. Select one of these memory cells (for example, the selected memory cell 112), and couple the output terminal of the selected memory cell 112 to the whole area through a bit line (for example, bit line BL1) Bit line GBL. In this way, the reading device 120 coupled to the global bit line GBL can determine the data stored in the memory cell 112 according to the voltage of the global bit line GBL.

本實施例中,每個記憶體胞元儲存多個位元。也就是說,本實施例的每個記憶體胞元中所儲存的位元的數量為N,N為大於等於2的正整數。換句話說,本實施例的記憶體胞元可以是多級胞元(Multi-Level Cells;MLC)(N等於2)、三級胞元(Triple-Level Cells;TLC)(N等於3)或是四級胞元(Quad-Level Cells;QLC)(N等於4)。本實施例以多級胞元作為記憶體胞元的範例,也就是,本實施例記憶體陣列110中各個記憶體胞元可儲存兩個位元的資料。 In this embodiment, each memory cell stores multiple bits. In other words, the number of bits stored in each memory cell in this embodiment is N, and N is a positive integer greater than or equal to 2. In other words, the memory cells of this embodiment can be multi-level cells (Multi-Level Cells; MLC) (N is equal to 2), three-level cells (Triple-Level Cells; TLC) (N is equal to 3), or It is Quad-Level Cells (QLC) (N equals 4). In this embodiment, a multi-level cell is used as an example of a memory cell. That is, each memory cell in the memory array 110 of this embodiment can store two bits of data.

讀取裝置120的輸入端耦接全域位元線GBL。讀取裝置120主要包括多個阻抗元件(如,圖1中的阻抗元件131~133)、多個鎖存電路(如,圖1中的鎖存電路141~143)以及鎖存讀取電路150。本實施例的阻抗元件131~133可由電阻實現。阻抗元件131~133的第一端相互耦接至讀取裝置120的輸入端PIN。每個鎖存電路141~143的輸入端分別耦接對應的每個阻抗元件131~133的第二端。例如,鎖存電路141的輸入端耦接阻抗元件131的第二端、鎖存電路142的輸入端耦接阻抗元件132的第二端且鎖存電路143的輸入端耦接阻抗元件133的第二端。鎖存讀取電路150耦接鎖存電路141~143的輸出端。 The input end of the reading device 120 is coupled to the global bit line GBL. The reading device 120 mainly includes a plurality of impedance elements (for example, the impedance elements 131 to 133 in FIG. 1), a plurality of latch circuits (for example, the latch circuits 141 to 143 in FIG. 1), and a latch reading circuit 150 . The impedance elements 131 to 133 of this embodiment can be realized by resistors. The first ends of the impedance elements 131 to 133 are mutually coupled to the input terminal PIN of the reading device 120. The input terminal of each latch circuit 141-143 is respectively coupled to the second terminal of each corresponding impedance element 131-133. For example, the input terminal of the latch circuit 141 is coupled to the second terminal of the impedance element 131, the input terminal of the latch circuit 142 is coupled to the second terminal of the impedance element 132, and the input terminal of the latch circuit 143 is coupled to the second terminal of the impedance element 133. Two ends. The latch reading circuit 150 is coupled to the output terminals of the latch circuits 141 to 143.

藉此,本發明實施例調整讀取裝置120中的電路架構,從原本以二分法多次地讀取記憶體胞元的臨界電壓與預設電壓相互比對,改為本實施例中單次讀取記憶體胞元的電壓且透過電流偵測的方式一次性地感測與判定胞元中的資料。詳細來說,本實施例透過調整每個路徑P1~P3上各個阻抗元件131~133的阻抗值、各個鎖存電路141~143的臨界電壓、或同時調整前述兩者,從而使鎖存電路141~143在讀取操作的讀取充電時間內透過流經對應的每個阻抗元件131~133的電流而充電,且每個鎖存電路141~143中各自的鎖存位元會依據在前述讀取充電時間內所充電的充電電壓以及對應的臨界電壓而被調整其數值。藉此,本實施例的鎖存讀取電路150便在前述讀取充電時間後讀取鎖存電路141~143中各自的鎖存位元。如此一來,被選擇的記憶體胞元112所儲存的 資料由鎖存讀取電路150所讀取的鎖存電路141~143中的鎖存位元來判定。 In this way, the embodiment of the present invention adjusts the circuit structure of the reading device 120, instead of comparing the threshold voltage of the memory cell with the preset voltage that is read multiple times by dichotomy, instead of comparing the threshold voltage of the memory cell with the preset voltage in this embodiment. Read the voltage of the memory cell and sense and determine the data in the cell at one time through current detection. In detail, this embodiment adjusts the impedance value of each impedance element 131~133 on each path P1~P3, the threshold voltage of each latch circuit 141~143, or adjusts both of the foregoing, so that the latch circuit 141 ~143 is charged by the current flowing through each corresponding impedance element 131~133 during the read charging time of the read operation, and the respective latch bit in each latch circuit 141~143 will be charged according to the previous reading Take the charging voltage charged during the charging time and the corresponding threshold voltage to adjust its value. In this way, the latch reading circuit 150 of this embodiment reads the respective latch bits in the latch circuits 141 to 143 after the charging time is read. In this way, the selected memory cell 112 stored The data is determined by the latch bits in the latch circuits 141 to 143 read by the latch read circuit 150.

在此針對『調整每個路徑P1~P3上各個阻抗元件131~133的阻抗值、各個鎖存電路141~143的臨界電壓、或同時調整前述兩者』詳細描述。符合本實施例的一種作法(又稱,第一作法)是經設計以調整每個路徑P1~P3上各個阻抗元件131~133的阻抗值R1~R3各不相同、且讓鎖存電路141~143的臨界電壓為相同來實現。由於位在全域位元線GBL上的電壓相同,導致路徑P1~P3上的電流I1~I3將因為阻抗元件131~133中互不相同的阻抗值R1~R3而有流經各個阻抗元件131~133且互不相同的電流值。藉此,基於電流I1~I3的電流值互為不同且鎖存電路141~143皆具備相同的讀取充電時間,鎖存電路141~143因充電所提升的充電電壓不一定會高於鎖存電路141~143自身所設計的臨界電壓。換句話說,鎖存電路141~143中的這些鎖存位元將會因為全域位元線GBL上的電壓而有不同的呈現方式,從而判定記憶體胞元112中所儲存的資料為何。 Here is a detailed description of “adjusting the impedance value of each impedance element 131 to 133 on each path P1 to P3, the threshold voltage of each latch circuit 141 to 143, or adjusting the foregoing two at the same time". A method (also called the first method) that conforms to this embodiment is designed to adjust the impedance values R1~R3 of the impedance elements 131~133 on each path P1~P3 to be different, and let the latch circuit 141~ The threshold voltage of 143 is the same to achieve. Since the voltages on the global bit line GBL are the same, the currents I1~I3 on the paths P1~P3 will flow through the impedance elements 131~ because of the different impedance values R1~R3 of the impedance elements 131~133. 133 and different current values. In this way, the current values based on the currents I1~I3 are different from each other and the latch circuits 141~143 all have the same read charging time. The charging voltage raised by the latch circuits 141~143 due to charging may not be higher than that of the latch. Circuits 141 to 143 design their own critical voltages. In other words, the latch bits in the latch circuits 141 to 143 will have different presentation modes due to the voltage on the global bit line GBL, so as to determine the data stored in the memory cell 112.

符合本實施例的另一種作法(又稱,第二作法)則是經設計以調整每個路徑P1~P3上鎖存電路141~143的臨界電壓互為不同、且讓各個阻抗元件131~133的阻抗值R1~R3為相同數值來實現。由於位在全域位元線GBL上的電壓相同,基於電流I1~I3的電流值互為相同、但鎖存電路141~143自身所設計的臨界電壓互為不同的情況下,不同的鎖存電路141~143所需的充電時間便 不相同。因此,在基於相同的讀取充電時間的情況下,每個鎖存電路141~143因充電所提升的充電電壓不一定會皆高於鎖存電路141~143自身所設計的臨界電壓。換句話說,鎖存電路141~143中的這些鎖存位元將會因為全域位元線GBL上的電壓而有不同的呈現方式,從而判定記憶體胞元112中所儲存的資料為何。 Another method (also known as the second method) that conforms to this embodiment is designed to adjust the threshold voltages of the latch circuits 141 to 143 on each path P1 to P3 to be different from each other, and to allow the impedance elements 131 to 133 to be different from each other. The impedance values of R1~R3 are the same value to achieve. Since the voltage on the global bit line GBL is the same, the current values based on the currents I1~I3 are the same, but the threshold voltages designed by the latch circuits 141~143 are different from each other, different latch circuits 141~143 The required charging time is Are not the same. Therefore, based on the same read charging time, the charging voltage raised by each of the latch circuits 141 to 143 due to charging is not necessarily higher than the threshold voltage designed by the latch circuits 141 to 143 itself. In other words, the latch bits in the latch circuits 141 to 143 will have different presentation modes due to the voltage on the global bit line GBL, so as to determine the data stored in the memory cell 112.

圖2是本實施例一實施例中,在記憶體胞元112是MLC的情況下,記憶體胞元112所儲存的資料與鎖存電路在經歷讀取充電時間後各自的鎖存位元的示意圖。在此以前述第一作法結合圖2來說明本發明實施例。在此假設,阻抗元件131中阻抗值R1大於阻抗元件132中阻抗值R2,且阻抗元件132中阻抗值R2大於阻抗元件133中阻抗值R3。因此,流經阻抗元件131的電流I1將會小於流經阻抗元件132的電流I2,且流經阻抗元件132的電流I2將會小於流經阻抗元件133的電流I3。由於記憶體胞元112是MLC,因此記憶體胞元112可儲存兩個位元的資料,也就是,可儲存四種狀態(即,”00”、”10”、”01”或是”11”)的資料。 2 is an example of this embodiment, in the case that the memory cell 112 is an MLC, the data stored in the memory cell 112 and the latch circuit after the read charge time has elapsed the respective latch bits Schematic. Here, the embodiment of the present invention will be described with the aforementioned first method in conjunction with FIG. 2. It is assumed here that the impedance value R1 in the impedance element 131 is greater than the impedance value R2 in the impedance element 132, and the impedance value R2 in the impedance element 132 is greater than the impedance value R3 in the impedance element 133. Therefore, the current I1 flowing through the impedance element 131 will be less than the current I2 flowing through the impedance element 132, and the current I2 flowing through the impedance element 132 will be less than the current I3 flowing through the impedance element 133. Since the memory cell 112 is MLC, the memory cell 112 can store two bits of data, that is, it can store four states (ie, "00", "10", "01" or "11" ")data of.

圖2中(A)至(D)部分的鎖存電路141~143中有標註對應的鎖存位元。鎖存位元為”0”時,表示此鎖存電路在讀取充電時間中所儲存的充電電壓並未大於此鎖存電路預設的臨界電壓;鎖存位元為”1”時,表示此鎖存電路在讀取充電時間中所儲存的充電電壓已大於此鎖存電路預設的臨界電壓。 The latch circuits 141 to 143 in parts (A) to (D) in FIG. 2 have corresponding latch bits marked. When the latch bit is "0", it means that the charging voltage stored by the latch circuit during the read charging time is not greater than the threshold voltage preset by the latch circuit; when the latch bit is "1", it means The charging voltage stored in the latch circuit during the read charging time is greater than the threshold voltage preset by the latch circuit.

圖2左上方(A)部分用以表示,記憶體胞元112以電壓型態儲存狀態為”00”的資料,且在讀取充電時間中鎖存電路 141~143中的鎖存位元依序表示為”0”、”0”、”0”。本實施例將儲存”00”狀態的記憶體胞元112的輸出電壓設定為相對於其他狀態為最小(minimum)的輸出電壓,意即,於(A)部分表示”00”狀態的加總電流TI1將小於(B)部分至(D)部分中分別表示”10”、”01與”11”狀態的加總電流TI2~TI4。由於加總電流TI1還會分流以成為流經路徑P1~P3的電流I1~I3,因此各個鎖存電路141~143在讀取充電時間中所儲存的充電電壓並未大於此鎖存電路預設的臨界電壓,導致每個鎖存電路141~143的鎖存位元為”0”。藉此,本實施例的鎖存讀取電路150在讀取到鎖存電路141~143中的鎖存位元為”0”、”0”、”0”時,便判定記憶體胞元112儲存有”00”狀態的的資料。 The upper left part (A) of FIG. 2 is used to show that the memory cell 112 stores data in the state of "00" in voltage mode, and latches the circuit during the read charge time The latch bits in 141~143 are sequentially expressed as "0", "0", and "0". In this embodiment, the output voltage of the memory cell 112 storing the "00" state is set to the minimum output voltage relative to other states, which means that the total current in the "00" state is shown in part (A) TI1 will be smaller than the total current TI2~TI4 representing the states of "10", "01" and "11" in parts (B) to (D). Because the total current TI1 will also be divided to flow through paths P1~P3 Therefore, the charging voltage stored in each latch circuit 141-143 during the read charging time is not greater than the threshold voltage preset by the latch circuit, resulting in the latching of each latch circuit 141-143 The bit is “0.” Therefore, when the latch reading circuit 150 of this embodiment reads the latched bits in the latch circuits 141 to 143 as “0”, “0”, and “0”, It is determined that the memory cell 112 stores data in the "00" state.

圖2右上方(B)部分用以表示,記憶體胞元112儲存資料”10”,且在讀取充電時間中鎖存電路141~143中的鎖存位元依序表示為”0”、”0”、”1”。本實施例將儲存”10”狀態的記憶體胞元112的輸出電壓設定為比”00”狀態的記憶體胞元112的輸出電壓為大,但比”01”、”11”狀態的記憶體胞元112的輸出電壓為小。意即,(B)部分表示”10”狀態的加總電流TI2將大於(A)部分的加總電流TI1,但小於(C)部分的加總電流TI3以及(D)部分的加總電流TI4。如此一來,(B)部分中經分流的電流I3將會較電流I1~I2為大,從而更易於使鎖存電路143在讀取充電時間中的充電電壓大於其臨界電壓。本實施例可設計以使鎖存電路143在讀取充電時間中所儲存的充電電壓將大於此鎖存電路143預設的臨界 電壓(即,鎖存電路143的鎖存位元為”1”),但鎖存電路141~142在相同的讀取充電時間中所儲存的充電電壓將小於此鎖存電路141~142預設的臨界電壓(即,鎖存電路141~142的鎖存位元為”0”)。藉此,本實施例的鎖存讀取電路150在讀取到鎖存電路141~143中的鎖存位元為”0”、”0”、”1”時,便判定記憶體胞元112儲存有”10”狀態的的資料。 The upper right part (B) of FIG. 2 is used to show that the memory cell 112 stores data "10", and the latch bits in the latch circuits 141 to 143 in the read charge time are sequentially expressed as "0", "0", "1". In this embodiment, the output voltage of the memory cell 112 storing the "10" state is set to be greater than the output voltage of the memory cell 112 in the "00" state, but higher than that of the memory cells in the "01" and "11" states. The output voltage of the cell 112 is small. That is, part (B) indicates that the total current TI2 of the "10" state will be greater than the total current TI1 of the part (A), but less than the total current TI3 of the part (C) and the total current TI4 of the (D) part . In this way, the shunted current I3 in part (B) will be larger than the currents I1~I2, so that it is easier to make the charging voltage of the latch circuit 143 during the read charging time greater than its threshold voltage. This embodiment can be designed so that the charging voltage stored in the latch circuit 143 during the read charging time will be greater than the threshold preset by the latch circuit 143 Voltage (that is, the latch bit of the latch circuit 143 is "1"), but the charging voltage stored by the latch circuits 141~142 in the same read charging time will be less than the preset value of the latch circuit 141~142 (Ie, the latch bits of the latch circuits 141 to 142 are "0"). Therefore, the latch reading circuit 150 of this embodiment determines the memory cell 112 when the latch bits in the latch circuits 141 to 143 are "0", "0", or "1". Store the data with "10" status.

圖2左下方(C)部分用以表示,記憶體胞元112儲存資料”01”,且在讀取充電時間中鎖存電路141~143中的鎖存位元依序表示為”0”、”1”、”1”。本實施例將儲存”01”狀態的記憶體胞元112的輸出電壓設定為比”00”、”10”狀態的記憶體胞元112的輸出電壓為大,但比”11”狀態的記憶體胞元112的輸出電壓為小。意即,(C)部分表示”10”狀態的加總電流TI3將大於(A)部分的加總電流TI1以及(B)部分的加總電流TI2,但小於(D)部分的加總電流TI4。如此一來,(C)部分中經分流的電流I3與電流I2將會較(A)部分與(B)部分中的電流I3與電流I2為大,從而更易於使鎖存電路142~143在讀取充電時間中的充電電壓大於其臨界電壓。本實施例可設計以使鎖存電路142~143在讀取充電時間中所儲存的充電電壓將大於此鎖存電路142~143預設的臨界電壓(即,鎖存電路142~143的鎖存位元為”1”),但鎖存電路141在相同的讀取充電時間中所儲存的充電電壓將小於此鎖存電路141預設的臨界電壓(即,鎖存電路141的鎖存位元為”0”)。藉此,本實施例的鎖存讀取電路150在讀取到鎖存電路141~143中的鎖 存位元為”0”、”1”、”1”時,便判定記憶體胞元112儲存有”01”狀態的的資料。 The lower left part (C) of FIG. 2 is used to show that the memory cell 112 stores data "01", and the latch bits in the latch circuits 141 to 143 are sequentially expressed as "0" during the read charge time, "1", "1". In this embodiment, the output voltage of the memory cell 112 storing the "01" state is set to be greater than the output voltage of the memory cell 112 in the "00" and "10" states, but higher than the output voltage of the memory cell 112 in the "11" state The output voltage of the cell 112 is small. That is, part (C) indicates that the total current TI3 of the "10" state will be greater than the total current TI1 of the part (A) and the total current TI2 of the part (B), but less than the total current TI4 of the part (D) . In this way, the shunted currents I3 and I2 in part (C) will be larger than the currents I3 and current I2 in parts (A) and (B), making it easier for the latch circuits 142 to 143 to operate in Read that the charging voltage during the charging time is greater than its critical voltage. This embodiment can be designed so that the charging voltage stored in the latch circuits 142~143 during the read charging time will be greater than the threshold voltage preset by the latch circuits 142~143 (that is, the latch circuits 142~143 The bit is “1”), but the charging voltage stored by the latch circuit 141 during the same read charging time will be less than the threshold voltage preset by the latch circuit 141 (that is, the latch bit of the latch circuit 141 Is "0"). As a result, the latch read circuit 150 of this embodiment reads the latches in the latch circuits 141 to 143 When the stored bits are "0", "1", or "1", it is determined that the memory cell 112 stores data in the "01" state.

圖2右下方(D)部分用以表示,記憶體胞元112儲存資料”01”,且在讀取充電時間中鎖存電路141~143中的鎖存位元依序表示為”1”、”1”、”1”。本實施例將儲存”11”狀態的記憶體胞元112的輸出電壓設定為相對於其他狀態為最大(maximum)的輸出電壓,意即,於(D)部分表示”11”狀態的加總電流TI4將大於(A)部分至(C)部分中分別表示”00”、”10”與”01”狀態的加總電流TI1~TI3。由於加總電流TI4還會分流以成為流經路徑P1~P3的電流I1~I3,因此各個鎖存電路141~143在讀取充電時間中所儲存的充電電壓將會大於鎖存電路141~143預設的臨界電壓,使每個鎖存電路141~143的鎖存位元皆為”1”。藉此,本實施例的鎖存讀取電路150在讀取到鎖存電路141~143中的鎖存位元為”1”、”1”、”1”時,便判定記憶體胞元112儲存有”11”狀態的的資料。 The lower right part (D) of FIG. 2 is used to show that the memory cell 112 stores data "01", and the latch bits in the latch circuits 141 to 143 in the read charge time are sequentially expressed as "1", "1", "1". In this embodiment, the output voltage of the memory cell 112 that stores the "11" state is set to the maximum output voltage relative to the other states, which means that the total current in the "11" state is shown in part (D) TI4 will be greater than the total current TI1~TI3 of the states "00", "10" and "01" in parts (A) to (C). Since the total current TI4 will also be divided to become the currents I1~I3 flowing through the paths P1~P3, the charging voltage stored by each latch circuit 141~143 during the read charging time will be greater than that of the latch circuit 141~143 The preset threshold voltage makes the latch bit of each latch circuit 141-143 all be "1". Therefore, the latch reading circuit 150 of this embodiment determines the memory cell 112 when the latch bits in the latch circuits 141 to 143 are "1", "1", and "1". Store the data with "11" status.

應用本實施例者可依前述需求來設定阻抗單元131~133各自的阻抗值R1~R3。本實施例透過以下範例解釋,如何將前述阻抗值R1~R3輕易推導得出。在此假設,讀取充電時間表示為T;當圖2(B)中加總電流T12設定為10微安培(μA)時,圖2(B)中電流I3則可計算其為

Figure 109144169-A0305-02-0014-1
μA,並且鎖存電路143在讀取充電時間T後的鎖存位元為”1”;當圖2(D)中加總電流TI4設定為100μA時,圖2(D)中電流I1則可計算其為(100μA×
Figure 109144169-A0305-02-0014-3
μA,且鎖存電路141在讀取充電時間T後的鎖存位元 為”1”。如此一來,基於鎖存電路141與143具有相同的臨界電壓的情況下,圖2(B)中電流I3在讀取充電時間T中所累積出來的充電電壓將會超過鎖存電路143的臨界電壓,且圖2(D)中電流I1在讀取充電時間T中所累積出來的充電電壓將會超過鎖存電路141的臨界電壓。因此,可藉由下述方程式(1)約略計算出讀取充電時間T的數值:
Figure 109144169-A0305-02-0015-4
Those applying this embodiment can set the respective impedance values R1 to R3 of the impedance units 131 to 133 according to the aforementioned requirements. This embodiment uses the following example to explain how to easily derive the aforementioned impedance values R1 to R3. Suppose here that the reading charge time is expressed as T; when the total current T12 in Figure 2(B) is set to 10 microamperes (μA), the current I3 in Figure 2(B) can be calculated as
Figure 109144169-A0305-02-0014-1
μA, and the latch bit of the latch circuit 143 after reading the charging time T is "1"; when the total current TI4 in Figure 2 (D) is set to 100 μA, the current I1 in Figure 2 (D) can be Calculate it as (100μA×
Figure 109144169-A0305-02-0014-3
μA, and the latched bit of the latch circuit 141 after reading the charging time T is "1". In this way, based on the situation that the latch circuits 141 and 143 have the same threshold voltage, the charging voltage accumulated by the current I3 in the read charging time T in FIG. 2(B) will exceed the threshold of the latch circuit 143 The charging voltage accumulated by the current I1 in the reading charging time T in FIG. 2(D) will exceed the threshold voltage of the latch circuit 141. Therefore, the value of the read charging time T can be roughly calculated by the following equation (1):
Figure 109144169-A0305-02-0015-4

如此一來,將可透過前述運算方式來得知讀取充電時間T與阻抗值R1~R3之間的對應關係。 In this way, the corresponding relationship between the read charging time T and the impedance values R1~R3 can be known through the aforementioned calculation method.

另一方面,應用本實施例者亦可將阻抗元件131~133中的阻抗值R1~R3設計為相同數值,且鎖存電路141~143中對應的臨界電壓經設計而互為不同。藉此,只要鎖存電路141~143可在讀取充電時間T中透過相對應的電流而產生相對應的鎖存位元的狀態,亦可實現本發明實施例。 On the other hand, those applying this embodiment can also design the impedance values R1 to R3 in the impedance elements 131 to 133 to the same value, and the corresponding threshold voltages in the latch circuits 141 to 143 are designed to be different from each other. Therefore, as long as the latch circuits 141 to 143 can generate corresponding latch bit states through the corresponding current during the read charging time T, the embodiments of the present invention can also be implemented.

圖2中的實施例是以多級胞元(MLC)作為記憶體胞元的實施例,也就是,記憶體胞元中所儲存的位元的數量為2。因此,讀取電路120中鎖存電路141~143的數量等於3(2的2次方減1),且阻抗元件131~133的數量也等於鎖存電路141~143的數量。若是以三級胞元(TLC)作為記憶體胞元的實施例,也就是,記憶體胞元中所儲存的位元的數量為3。因此,此實施例的讀取電路中鎖存電路的數量為7(2的3次方減1),且阻抗元件的數量等於鎖存電路的數量。若是以四級胞元(QLC)作為記憶體胞元的實施例, 也就是,記憶體胞元中所儲存的位元的數量為4。因此,此實施例的讀取電路中鎖存電路的數量為15(2的4次方減1),且阻抗元件的數量等於鎖存電路的數量。依此類推,當符合本發明實施例中記憶體胞元所儲存的位元數量為N(N為大於等於2的正整數)時,鎖存電路的數量等同於阻抗元件的數量,皆為2的N次方減1。 The embodiment in FIG. 2 is an embodiment in which a multi-level cell (MLC) is used as a memory cell, that is, the number of bits stored in the memory cell is two. Therefore, the number of latch circuits 141 to 143 in the reading circuit 120 is equal to 3 (2 minus 1), and the number of impedance elements 131 to 133 is also equal to the number of latch circuits 141 to 143. If a three-level cell (TLC) is used as an embodiment of the memory cell, that is, the number of bits stored in the memory cell is three. Therefore, the number of latch circuits in the read circuit of this embodiment is 7 (2 to the third power minus 1), and the number of impedance elements is equal to the number of latch circuits. If a four-level cell (QLC) is used as an embodiment of the memory cell, That is, the number of bits stored in the memory cell is 4. Therefore, the number of latch circuits in the read circuit of this embodiment is 15 (2 to the 4th power minus 1), and the number of impedance elements is equal to the number of latch circuits. By analogy, when the number of bits stored in the memory cell in accordance with the embodiment of the present invention is N (N is a positive integer greater than or equal to 2), the number of latch circuits is equal to the number of impedance elements, both of which are 2. Minus 1 to the Nth power.

圖3是本實施例一實施例中,以多級胞元作為記憶體胞元112的情況下,記憶體胞元112所儲存的資料與記憶體胞元112的臨界電壓分布圖之間的關係示意圖。圖3的上方部分由右至左分別是”00”狀態(標示為(A))、”10”狀態(標示為(B))、”01”狀態(標示為(C))與”11”狀態(標示為(D))的記憶體胞元112-1~112-4。圖3的中間部分用以表示每個狀態的記憶體胞元流經的電流的示意圖。圖3的下方部分呈現記憶體胞元112-1~112-4的臨界電壓分布圖。圖3的臨界電壓分布圖的橫軸呈現記憶體胞元在各個狀態的輸出電壓。圖3的臨界電壓分布圖的縱軸呈現記憶體胞元在各個狀態的數量NUM。也就是說,圖3的臨界電壓分布圖用以呈現記憶體胞元的臨界電壓分布於狀態分布區域311~314中。狀態分布區域311~314分別對應”00”狀態(A)、”10”狀態(B)、”01”狀態(C)與”11”狀態(D)的記憶體胞元112-1~112-4。 FIG. 3 is a diagram showing the relationship between the data stored in the memory cell 112 and the threshold voltage distribution diagram of the memory cell 112 in the case of using multi-level cells as the memory cell 112 in an embodiment of the present embodiment Schematic. From right to left in the upper part of Figure 3 are the "00" state (marked as (A)), "10" state (marked as (B)), "01" state (marked as (C)) and "11" State (marked as (D)) memory cells 112-1~112-4. The middle part of FIG. 3 is used to show a schematic diagram of the current flowing through the memory cell in each state. The lower part of FIG. 3 shows a distribution diagram of the threshold voltages of the memory cells 112-1 to 112-4. The horizontal axis of the critical voltage distribution diagram in FIG. 3 shows the output voltage of the memory cell in each state. The vertical axis of the critical voltage distribution diagram in FIG. 3 shows the number NUM of memory cells in each state. In other words, the threshold voltage distribution diagram of FIG. 3 is used to present the threshold voltage distribution of the memory cells in the state distribution regions 311 to 314. The state distribution areas 311~314 respectively correspond to the memory cells 112-1~112- in the "00" state (A), "10" state (B), "01" state (C) and "11" state (D) 4.

本實施例是透過電流偵測的方式來一次性地感測與判定記憶體胞元112中的資料為何種狀態,而不是如以往般採用電壓 偵測的方式進行。以往採用電壓偵測的方式僅能在臨界電壓分布圖的抹除狀態中放入單個狀態分布區域,其他的狀態分布區域皆需放在臨界電壓分布圖的程式化狀態中。因此,由於程式化狀態中相鄰的狀態分布區域十分接近,導致採用前述電壓偵測的方式進行讀取操作時仍有較高機率發生誤判。 In this embodiment, the current detection method is used to sense and determine the state of the data in the memory cell 112 at one time, instead of using voltage as in the past. The way of detection. In the past, the voltage detection method can only put a single state distribution area in the erased state of the critical voltage distribution map, and other state distribution areas need to be placed in the programmed state of the critical voltage distribution map. Therefore, because the adjacent state distribution areas in the programmed state are very close, there is still a high probability of misjudgment when the aforementioned voltage detection method is used for the reading operation.

本實施例在讀取操作的讀取驗證判定(read verify judge)上是不需要採用以往的負電壓(negative voltage)型式來驗證記憶體胞元112中的資料,從而可在圖3中MLC類型的記憶體胞元的臨界電壓分布圖中平均配置相等數量的狀態分布區域311~314於程式化狀態(program state)PST以及抹除狀態(erase state)EST。在圖3記憶體胞元112-1~112-4的臨界電壓分布圖中,程式化狀態PST中狀態分布區域311~312的數量(亦即,2)等於抹除狀態EST中的狀態分布區域313~314的數量(亦即,2)。也就是說,本實施例在臨界電壓分布圖的抹除狀態EST中可以包括兩個甚至兩個以上的狀態分布區域(如,狀態分布區域313~314)。如此一來,本實施例圖3中狀態分布區域313~314之間的相鄰距離d較以往採用電壓偵測的方式來的長,且抹除狀態EST中的狀態分布區域的數量也可增加,擺脫電壓偵測方法在抹除狀態EST內只能具備單個狀態分布區域的問題。 In this embodiment, the read verify judge of the read operation does not need to use the previous negative voltage (negative voltage) type to verify the data in the memory cell 112, so that the MLC type in FIG. 3 In the threshold voltage distribution map of the memory cells, an equal number of state distribution regions 311 to 314 are evenly arranged in a program state (program state) PST and an erase state (erase state) EST. In the critical voltage distribution diagram of the memory cells 112-1~112-4 in FIG. 3, the number of state distribution regions 311~312 in the programmed state PST (that is, 2) is equal to the state distribution region in the erased state EST The number of 313~314 (that is, 2). In other words, in this embodiment, the erasure state EST of the threshold voltage distribution graph may include two or more state distribution regions (eg, state distribution regions 313 to 314). As a result, the adjacent distance d between the state distribution areas 313 to 314 in FIG. 3 of the present embodiment is longer than the conventional voltage detection method, and the number of state distribution areas in the erased state EST can also be increased. , To get rid of the problem that the voltage detection method can only have a single state distribution area in the erased state EST.

圖4是圖1或圖2中鎖存電路141~143的一種範例電路圖。在此以圖4的鎖存電路410作為圖1或圖2中鎖存電路141~143的範例電路。鎖存電路410為SR鎖存器(SR latch)。詳細來說, 鎖存電路410主要包括兩個反及(NAND)閘420與430、輸入端INN與輸出端OUTN。鎖存電路410的輸入端INN用以耦接圖1、圖2中對應的阻抗單元131~133其中之一。鎖存電路410的輸出端OUTN耦接圖1中讀取電路120的鎖存讀取電路150。反及閘420的第一輸入端In11耦接鎖存電路410的輸入端INN,反及閘420的第二輸入端In12耦接反及閘430的輸出端Out2,且反及閘420的輸出端Out1耦接鎖存電路410的輸出端OUTN。反及閘430的第一輸入端In21耦接反及閘420的輸出端Out1,反及閘430的第二輸入端In22耦接鎖存電路410的輸入端INN。換句話說,鎖存電路410可透過由NAND閘組成的靜態隨機存取記憶體(SRAM)胞元來實現。藉此,在讀取充電時間T中透過鎖存電路410的輸入端INN提供的電流所累積的充電電壓足以推動反及閘420與430而使反及閘420的輸出端Out1上的電壓值高於臨界電壓的話,便可視為鎖存電路410中的鎖存位元為”1”。相對地,在讀取充電時間T中透過鎖存電路410的輸入端INN提供的電流所累積的充電電壓不足以推動反及閘420與430而使反及閘420的輸出端Out1上的電壓值高於臨界電壓的話,便可視為鎖存電路410中的鎖存位元為”0”。 FIG. 4 is an example circuit diagram of the latch circuits 141 to 143 in FIG. 1 or FIG. 2. Here, the latch circuit 410 in FIG. 4 is taken as an example circuit of the latch circuits 141 to 143 in FIG. 1 or FIG. 2. The latch circuit 410 is an SR latch. In detail, The latch circuit 410 mainly includes two NAND gates 420 and 430, an input terminal INN and an output terminal OUTN. The input terminal INN of the latch circuit 410 is used to couple to one of the corresponding impedance units 131 to 133 in FIGS. 1 and 2. The output terminal OUTN of the latch circuit 410 is coupled to the latch read circuit 150 of the read circuit 120 in FIG. 1. The first input terminal In11 of the inverter gate 420 is coupled to the input terminal INN of the latch circuit 410, the second input terminal In12 of the inverter gate 420 is coupled to the output terminal Out2 of the inverter gate 430, and the output terminal of the inverter gate 420 Out1 is coupled to the output terminal OUTN of the latch circuit 410. The first input terminal In21 of the inverter gate 430 is coupled to the output terminal Out1 of the inverter gate 420, and the second input terminal In22 of the inverter gate 430 is coupled to the input terminal INN of the latch circuit 410. In other words, the latch circuit 410 can be implemented by a static random access memory (SRAM) cell composed of NAND gates. Thereby, the accumulated charging voltage through the current provided by the input terminal INN of the latch circuit 410 during the reading of the charging time T is sufficient to drive the inverters 420 and 430 so that the voltage value on the output terminal Out1 of the inverter 420 is high. If it is below the threshold voltage, it can be regarded as the latch bit in the latch circuit 410 is "1". On the contrary, the accumulated charging voltage through the current provided by the input terminal INN of the latch circuit 410 during the reading of the charging time T is not enough to drive the inverters 420 and 430 and the voltage value on the output terminal Out1 of the inverter 420 If the voltage is higher than the threshold voltage, it can be regarded that the latch bit in the latch circuit 410 is "0".

圖5是圖1或圖2中鎖存電路141~143的另一種範例電路圖。在此以圖5的鎖存電路510作為圖1或圖2中鎖存電路141~143的範例電路。鎖存電路510主要是由兩個反相器520與530結合多個電晶體(如,電晶體T1~T3)的控制來實現。反相器 520的輸入端以及反相器530的輸出端透過電晶體耦接鎖存電路510的輸入端INN。反相器520的輸出端以及反相器530的輸入端則同時耦接至鎖存電路510的輸出端OUTN。換句話說,鎖存電路510可透過由反相器與多個電晶體組成的靜態隨機存取記憶體胞元來實現。例如,可藉由讀取信號READ將鎖存電路510的輸入端INN提供的電流導引到電晶體T1以判斷是否讓電晶體T1導通其兩端。並且,可藉由重置信號RESET將鎖存電路510的輸出端OUTN上的電荷透過耦接至地的方式清除,從而重置此鎖存電路510(即,將鎖存電路510的輸出端OUTN上的電壓清除為0)。 FIG. 5 is another example circuit diagram of the latch circuits 141 to 143 in FIG. 1 or FIG. 2. Here, the latch circuit 510 in FIG. 5 is taken as an example circuit of the latch circuits 141 to 143 in FIG. 1 or FIG. 2. The latch circuit 510 is mainly realized by the control of two inverters 520 and 530 combined with multiple transistors (eg, transistors T1 to T3). inverter The input terminal of the 520 and the output terminal of the inverter 530 are coupled to the input terminal INN of the latch circuit 510 through a transistor. The output terminal of the inverter 520 and the input terminal of the inverter 530 are simultaneously coupled to the output terminal OUTN of the latch circuit 510. In other words, the latch circuit 510 can be implemented by a static random access memory cell composed of an inverter and a plurality of transistors. For example, the read signal READ can be used to guide the current provided by the input terminal INN of the latch circuit 510 to the transistor T1 to determine whether the transistor T1 is turned on. In addition, the charge on the output terminal OUTN of the latch circuit 510 can be removed by coupling to the ground by the reset signal RESET, thereby resetting the latch circuit 510 (that is, the output terminal OUTN of the latch circuit 510 is reset). The voltage on is cleared to 0).

圖6是圖1中鎖存讀取電路150的範例電路圖。本實施例使用用於讀取靜態隨機存取記憶體(SRAM)胞元的電路作為鎖存讀取電路150的適例。鎖存讀取電路150包括多個電晶體T11~T13與T21~T23以及反相器INV1~INV4。電晶體T21受控於讀取信號RWL1,以在讀取信號RWL1致能時,鎖存電路141中的鎖存位元經由電晶體T21以及讀取位元線RBL而導引到反相器INV1~INV4進行暫存與讀取;電晶體T22受控於讀取信號RWL2,以在讀取信號RWL2致能時,鎖存電路142中的鎖存位元經由電晶體T22以及讀取位元線RBL而導引到反相器INV1~INV4進行暫存與讀取;電晶體T23受控於讀取信號RWL3,以在讀取信號RWL3致能時,鎖存電路143中的鎖存位元經由電晶體T23以及讀取位元線RBL而導引到反相器INV1~INV4進行暫存與讀取。本實施例的鎖存讀取電路150係依據讀取鎖存電路141~143並判 讀其中的鎖存位元為”0”還是”1”,應用本實施例者亦可利用其他電路結構而以並行的方式同時讀取讀取鎖存電路141~143中的鎖存位元為”0”還是”1”。 FIG. 6 is an exemplary circuit diagram of the latch reading circuit 150 in FIG. 1. This embodiment uses a circuit for reading static random access memory (SRAM) cells as a suitable example of the latch reading circuit 150. The latch reading circuit 150 includes a plurality of transistors T11 to T13 and T21 to T23 and inverters INV1 to INV4. The transistor T21 is controlled by the read signal RWL1, so that when the read signal RWL1 is enabled, the latched bit in the latch circuit 141 is guided to the inverter INV1 through the transistor T21 and the read bit line RBL ~INV4 for temporary storage and reading; transistor T22 is controlled by the read signal RWL2, so that when the read signal RWL2 is enabled, the latched bit in the latch circuit 142 passes through the transistor T22 and the read bit line RBL is guided to inverters INV1~INV4 for temporary storage and reading; transistor T23 is controlled by the read signal RWL3, so that when the read signal RWL3 is enabled, the latch bit in the latch circuit 143 passes through The transistor T23 and the read bit line RBL are guided to the inverters INV1~INV4 for temporary storage and reading. The latch read circuit 150 of this embodiment is based on the read latch circuits 141 to 143 and judges To read whether the latch bit is "0" or "1", the application of this embodiment can also use other circuit structures to simultaneously read the latch bits in the read latch circuits 141 to 143 in a parallel manner. "0" or "1".

圖7是本實施例一實施例中資料儲存裝置100以立體積體電路(3DIC)來實現的示意圖。在圖7中,資料儲存裝置100的記憶體陣列110原本就可透過立體積體電路的方式實現,且可將全域位元線GBL配置於與讀取裝置120相耦接之處。讀取裝置120的阻抗單元131~133、鎖存電路141~143以及鎖存讀取電路150皆可配置於記憶體陣列110的上方位置,從而輕易地以立體積體電路來實現資料儲存裝置100。 FIG. 7 is a schematic diagram of the data storage device 100 implemented by a volumetric volume circuit (3DIC) in an embodiment of this embodiment. In FIG. 7, the memory array 110 of the data storage device 100 can be originally implemented by means of a volumetric circuit, and the global bit line GBL can be arranged where it is coupled with the reading device 120. The impedance units 131 to 133, the latch circuits 141 to 143, and the latch read circuit 150 of the reading device 120 can all be arranged above the memory array 110, so that the data storage device 100 can be easily realized by a volumetric circuit. .

圖8是本實施例一實施例中資料儲存裝置的控制方法的流程圖。此控制方法800適用於圖1與圖2中的資料儲存裝置100。也就是說,請參照圖1,資料儲存裝置100包括記憶體陣列110。記憶體陣列110包括至少一個記憶體胞元112以及全域位元線GBL。每個記憶體胞元儲存多個位元。 FIG. 8 is a flowchart of a control method of a data storage device in an embodiment of this embodiment. This control method 800 is applicable to the data storage device 100 in FIG. 1 and FIG. 2. That is, referring to FIG. 1, the data storage device 100 includes a memory array 110. The memory array 110 includes at least one memory cell 112 and a global bit line GBL. Each memory cell stores multiple bits.

請參見圖1與圖8,於步驟S810中,在讀取操作的讀取充電時間時,將被選擇的記憶體胞元112的輸出端耦接全域位元線GBL。讀取裝置120的輸入端PIN經設置以耦接全域位元線GBL。讀取裝置120包括阻抗元件131~134以及鎖存電路141~143。阻抗元件131~134的第一端相互耦接至讀取裝置120的輸入端PIN。每個鎖存電路141~143的輸入端分別耦接對應的每個阻抗元件131~134的第二端。每個鎖存電路141~143分別具備對應的臨界電 壓。於步驟S820中,在前述讀取充電時間之後,讀取鎖存電路141~143中各自的鎖存位元。於步驟S830中,依據所讀取的鎖存電路141~143中的鎖存位元來判定記憶體胞元所儲存的資料。控制方法800也可以稱為是對資料儲存裝置中記憶體胞元的讀取方法。控制方法800的詳細操作請參見上述各實施例。 Referring to FIGS. 1 and 8, in step S810, during the reading of the charging time of the reading operation, the output terminal of the selected memory cell 112 is coupled to the global bit line GBL. The input PIN of the reading device 120 is configured to be coupled to the global bit line GBL. The reading device 120 includes impedance elements 131 to 134 and latch circuits 141 to 143. The first ends of the impedance elements 131 to 134 are mutually coupled to the input terminal PIN of the reading device 120. The input terminal of each latch circuit 141-143 is respectively coupled to the second terminal of each corresponding impedance element 131-134. Each latch circuit 141~143 has a corresponding threshold voltage. Pressure. In step S820, after the aforementioned charging time is read, the respective latch bits in the latch circuits 141 to 143 are read. In step S830, the data stored in the memory cell is determined according to the read latch bits in the latch circuits 141 to 143. The control method 800 can also be referred to as a method for reading memory cells in a data storage device. For detailed operations of the control method 800, please refer to the foregoing embodiments.

綜上所述,本發明實施例所述的資料儲存裝置以及其控制方法透過調整讀取裝置中的電路架構,從原本以二分法多次地讀取記憶體胞元的臨界電壓與預設電壓相互比對,改為本實施例中以電流偵測方式一次性地感測與判定胞元中的資料。也就是說,本發明實施例透過調整讀取裝置中各個阻抗元件的阻抗值和/或鎖存電路的臨界電壓,使對應的鎖存電路在讀取操作的讀取充電時間內透過流經對應的阻抗元件的電流而充電,進而調整其內部的鎖存位元。藉此,本發明實施例可減少在讀取操作時對多級胞元的讀取次數,提高記憶體胞元的使用壽命與可靠度。 In summary, the data storage device and its control method according to the embodiment of the present invention reads the threshold voltage and the preset voltage of the memory cell multiple times by adjusting the circuit structure in the reading device. Compared with each other, the current detection method is used in this embodiment to sense and determine the data in the cell at one time. That is to say, the embodiment of the present invention adjusts the impedance value of each impedance element in the reading device and/or the threshold voltage of the latch circuit, so that the corresponding latch circuit flows through the corresponding The current of the impedance element is charged, and then the internal latch bit is adjusted. In this way, the embodiment of the present invention can reduce the number of times to read multi-level cells during a read operation, and improve the service life and reliability of memory cells.

100:資料儲存裝置 100: Data storage device

110:記憶體陣列 110: memory array

112:記憶體胞元 112: memory cell

120:讀取裝置 120: Reading device

131~133:阻抗單元 131~133: Impedance unit

141~143:鎖存電路 141~143: latch circuit

150:鎖存讀取電路 150: latch read circuit

SL:選擇線 SL: select line

Sgs:源極端選擇閘極 Sgs: Source selection gate

Sgd:汲極端選擇閘極 Sgd: Drain extreme selection gate

BL0~BL2:位元線 BL0~BL2: bit line

WL0~WLM:字元線 WL0~WLM: character line

R1~R3:阻抗單元的阻抗值 R1~R3: Impedance value of impedance unit

I1~I3:電流 I1~I3: current

P1~P3:路徑 P1~P3: path

PIN:讀取裝置的輸入端 PIN: the input terminal of the reading device

GBL:全域位元線 GBL: Global bit line

Claims (16)

一種資料儲存裝置,包括:記憶體陣列,包括至少一記憶體胞元以及全域位元線,每個記憶體胞元儲存多個位元且選擇性地連接至該全域位元線;以及讀取裝置,該讀取裝置的輸入端耦接該全域位元線,其中該讀取裝置包括:多個阻抗元件,其中每個阻抗元件的第一端相互耦接至該讀取裝置的該輸入端;多個鎖存電路,其中每個鎖存電路的輸入端分別耦接對應的每個阻抗元件的第二端;以及鎖存讀取電路,耦接該些鎖存電路的輸出端,以讀取該些鎖存電路中各自的鎖存位元,其中該至少一記憶體胞元所儲存的資料由該鎖存讀取電路所讀取的該些鎖存電路中的該些鎖存位元來判定。 A data storage device includes: a memory array, including at least one memory cell and a global bit line, each memory cell stores a plurality of bits and is selectively connected to the global bit line; and read A device in which the input terminal of the reading device is coupled to the global bit line, wherein the reading device includes: a plurality of impedance elements, wherein the first end of each impedance element is mutually coupled to the input terminal of the reading device Multiple latch circuits, wherein the input end of each latch circuit is respectively coupled to the second end of each corresponding impedance element; and a latch read circuit, coupled to the output end of the latch circuits, to read Fetch the respective latch bits in the latch circuits, wherein the data stored in the at least one memory cell is read by the latch read circuit and the latch bits in the latch circuits To judge. 如請求項1所述的資料儲存裝置,其中每個鎖存電路分別具備對應的臨界電壓,其中每個鎖存電路在讀取操作的讀取充電時間內透過流經對應的每個阻抗元件的電流而充電,且每個鎖存電路中各自的該鎖存位元依據在該讀取充電時間內所充電的充電電壓以及對應的該臨界電壓而被調整。 The data storage device according to claim 1, wherein each latch circuit has a corresponding threshold voltage, wherein each latch circuit passes through the corresponding impedance element during the read charging time of the read operation The current is charged, and the respective latch bit in each latch circuit is adjusted according to the charging voltage charged during the read charging time and the corresponding threshold voltage. 如請求項1所述的資料儲存裝置,其中每個阻抗元件中的阻抗值各不相同,且該些鎖存電路中對應的臨界電壓為相同數值。 The data storage device according to claim 1, wherein the impedance value in each impedance element is different, and the corresponding threshold voltages in the latch circuits are the same value. 如請求項1所述的資料儲存裝置,其中所述阻抗元件中的阻抗值為相同數值,且該些鎖存電路中對應的臨界電壓互為不同。 The data storage device according to claim 1, wherein the impedance values in the impedance elements are the same value, and the corresponding threshold voltages in the latch circuits are different from each other. 如請求項1所述的資料儲存裝置,其中每個記憶體胞元中所儲存的位元的數量為N,N為大於等於2的正整數,所述鎖存電路的數量等同於所述阻抗元件的數量,為2的N次方減1。 The data storage device according to claim 1, wherein the number of bits stored in each memory cell is N, where N is a positive integer greater than or equal to 2, and the number of latch circuits is equal to the impedance The number of components is 2 to the Nth power minus 1. 如請求項1所述的資料儲存裝置,其中該記憶體陣列是NAND或NOR記憶體陣列。 The data storage device according to claim 1, wherein the memory array is a NAND or NOR memory array. 如請求項1所述的資料儲存裝置,其中該些阻抗元件是多個電阻。 The data storage device according to claim 1, wherein the impedance elements are resistors. 如請求項1所述的資料儲存裝置,其中該些鎖存電路是靜態隨機存取記憶體(SRAM)胞元。 The data storage device according to claim 1, wherein the latch circuits are static random access memory (SRAM) cells. 如請求項1所述的資料儲存裝置,其中,在該至少一記憶體胞元的臨界電壓分布圖中,程式化狀態(program state)中狀態分布區域的數量等於抹除狀態(erase state)中的狀態分布區域的數量。 The data storage device according to claim 1, wherein, in the threshold voltage distribution diagram of the at least one memory cell, the number of state distribution regions in the program state is equal to that in the erase state The number of state distribution areas. 一種資料儲存裝置的控制方法,其中該資料儲存裝置包括記憶體陣列及讀取裝置,該記憶體陣列包括至少一記憶體胞元以及全域位元線,每個記憶體胞元儲存多個位元,該控制方法包括:在讀取操作的讀取充電時間時,將被選擇的該至少一記憶體 胞元的輸出端耦接該全域位元線,其中該讀取裝置的輸入端經設置以耦接該全域位元線,該讀取裝置包括多個阻抗元件以及多個鎖存電路,每個阻抗元件的第一端相互耦接至該讀取裝置的該輸入端,每個鎖存電路的輸入端分別耦接對應的每個阻抗元件的第二端,每個鎖存電路分別具備對應的臨界電壓;在該讀取充電時間之後,讀取該些鎖存電路中各自的鎖存位元;以及依據所讀取的該些鎖存電路中的該些鎖存位元來判定該至少一記憶體胞元所儲存的資料。 A control method of a data storage device, wherein the data storage device includes a memory array and a reading device, the memory array includes at least one memory cell and a global bit line, and each memory cell stores a plurality of bits , The control method includes: when the charging time of the reading operation is read, the selected at least one memory The output terminal of the cell is coupled to the global bit line, wherein the input terminal of the reading device is configured to be coupled to the global bit line, the reading device includes a plurality of impedance elements and a plurality of latch circuits, each The first end of the impedance element is mutually coupled to the input end of the reading device, the input end of each latch circuit is respectively coupled to the second end of each corresponding impedance element, and each latch circuit has a corresponding Threshold voltage; after the read charging time, read the respective latch bits in the latch circuits; and determine the at least one latch bit in the latch circuits that are read Data stored in memory cells. 如請求項10所述的控制方法,其中每個鎖存電路分別具備對應的臨界電壓,其中該控制方法還包括:在該讀取充電時間內,每個鎖存電路透過流經對應的每個阻抗元件的電流而充電,且每個鎖存電路中各自的該鎖存位元依據在該讀取充電時間內所充電的充電電壓以及對應的該臨界電壓而被調整。 The control method according to claim 10, wherein each latch circuit has a corresponding threshold voltage, and the control method further includes: during the read charging time, each latch circuit flows through each corresponding The current of the impedance element is charged, and the respective latch bit in each latch circuit is adjusted according to the charging voltage charged during the read charging time and the corresponding threshold voltage. 如請求項10所述的控制方法,其中每個阻抗元件中的阻抗值各不相同,且該些鎖存電路中對應的臨界電壓為相同數值。 The control method according to claim 10, wherein the impedance value in each impedance element is different, and the corresponding threshold voltages in the latch circuits are the same value. 如請求項10所述的控制方法,其中其中所述阻抗元件中的阻抗值為相同數值,且該些鎖存電路中對應的臨界電壓互為不同。 The control method according to claim 10, wherein the impedance values in the impedance elements are the same value, and the corresponding threshold voltages in the latch circuits are different from each other. 如請求項10所述的控制方法,其中該非揮發性記憶體陣列是NAND或NOR記憶體陣列。 The control method according to claim 10, wherein the non-volatile memory array is a NAND or NOR memory array. 如請求項10所述的控制方法,其中該些阻抗元件是多個電阻。 The control method according to claim 10, wherein the impedance elements are multiple resistors. 如請求項10所述的控制方法,其中該些鎖存電路是靜態隨機存取記憶體(SRAM)胞元。 The control method according to claim 10, wherein the latch circuits are static random access memory (SRAM) cells.
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