TWI742744B - Display apparatus and manufacturing method thereof - Google Patents
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Abstract
Description
本發明是有關於一種顯示裝置及其製造方法,且特別是有關於一種具有修補結構的顯示裝置及其製造方法。 The present invention relates to a display device and a manufacturing method thereof, and more particularly to a display device with a repair structure and a manufacturing method thereof.
在顯示裝置的製造過程中,常會有不可避免缺陷產生(如:非正常的亮點)。因此,如何針對上述的缺陷進行修復,以提升顯示裝置的品質,實已成目前亟欲解決的課題。 In the manufacturing process of the display device, there are often unavoidable defects (such as abnormal bright spots). Therefore, how to repair the above-mentioned defects to improve the quality of the display device has become an urgent problem to be solved at present.
本發明提供一種顯示裝置及其製造方法,可以使顯示裝置具有較佳的顯示效果。 The present invention provides a display device and a manufacturing method thereof, which can enable the display device to have a better display effect.
本發明的顯示裝置包括基板、第一導電結構、第一畫素單元、第一訊號線、傳輸線以及第一修補結構。基板具有第一表面、相對於第一表面的第二表面及貫穿第一表面及第二表面的第一通孔。第一導電結構位於第一通孔內。第一畫素單元位於基板的第一表面上。畫素單元包括第一連接墊、第二連接墊、第三連 接墊、第四連接墊、第一驅動元件及第一發光元件。第一發光元件電性連接於第一連接墊及第二連接墊。第一訊號線位於基板的第一表面上。第一驅動元件藉由第一訊號線電性連接於第一連接墊及第三連接墊。傳輸線位於基板的第二表面上。傳輸線至少藉由第一導電結構電性連接於第二連接墊或第四連接墊。第一修補結構位於傳輸線及第一導電結構之間。 The display device of the present invention includes a substrate, a first conductive structure, a first pixel unit, a first signal line, a transmission line, and a first repair structure. The substrate has a first surface, a second surface opposite to the first surface, and a first through hole penetrating the first surface and the second surface. The first conductive structure is located in the first through hole. The first pixel unit is located on the first surface of the substrate. The pixel unit includes a first connecting pad, a second connecting pad, and a third connecting pad. The contact pad, the fourth connection pad, the first driving element and the first light emitting element. The first light-emitting element is electrically connected to the first connection pad and the second connection pad. The first signal line is located on the first surface of the substrate. The first driving element is electrically connected to the first connection pad and the third connection pad through the first signal line. The transmission line is located on the second surface of the substrate. The transmission line is electrically connected to the second connection pad or the fourth connection pad through at least the first conductive structure. The first repair structure is located between the transmission line and the first conductive structure.
本發明的顯示裝置的製造方法包括以下步驟。提供顯示結構。顯示結構包括基板、第一導電結構、第一畫素單元、第一訊號線、傳輸線以及第一修補結構。基板具有第一表面、相對於第一表面的第二表面及貫穿第一表面及第二表面的第一通孔。第一導電結構位於第一通孔內。第一畫素單元位於基板的第一表面上。畫素單元包括第一連接墊、第二連接墊、第三連接墊、第四連接墊、第一驅動元件及第一發光元件。第一發光元件電性連接於第一連接墊及第二連接墊。第一訊號線位於基板的第一表面上。第一驅動元件藉由第一訊號線電性連接於第一連接墊及第三連接墊。傳輸線位於基板的第二表面上。傳輸線至少藉由第一導電結構電性連接於第二連接墊及第四連接墊。第一修補結構位於傳輸線及第一導電結構之間。對顯示結構的第一發光元件進行測試。於對第一發光元件進行測試之後,令傳輸線不電性連接於第二連接墊。配置第二發光元件於第一表面上,且電性連接於第三連接墊及第四連接墊。 The manufacturing method of the display device of the present invention includes the following steps. Provide display structure. The display structure includes a substrate, a first conductive structure, a first pixel unit, a first signal line, a transmission line, and a first repair structure. The substrate has a first surface, a second surface opposite to the first surface, and a first through hole penetrating the first surface and the second surface. The first conductive structure is located in the first through hole. The first pixel unit is located on the first surface of the substrate. The pixel unit includes a first connection pad, a second connection pad, a third connection pad, a fourth connection pad, a first driving element, and a first light emitting element. The first light-emitting element is electrically connected to the first connection pad and the second connection pad. The first signal line is located on the first surface of the substrate. The first driving element is electrically connected to the first connection pad and the third connection pad through the first signal line. The transmission line is located on the second surface of the substrate. The transmission line is electrically connected to the second connection pad and the fourth connection pad through at least the first conductive structure. The first repair structure is located between the transmission line and the first conductive structure. The first light-emitting element of the display structure was tested. After testing the first light-emitting element, the transmission line is not electrically connected to the second connection pad. The second light emitting element is arranged on the first surface and is electrically connected to the third connection pad and the fourth connection pad.
基於上述,在顯示裝置的製造過程中,在對第一發光元 件進行測試之後,若認為其不具有預期的發光狀態,則可以藉由配置第二發光元件以及令傳輸線不電性連接於第二連接墊的方式,而使修復後的顯示裝置具有良好的顯示。如此一來,可以使顯示裝置可以具有較佳的顯示效果。 Based on the above, in the manufacturing process of the display device, the first light-emitting element is After the device is tested, if it is deemed that it does not have the expected light-emitting state, the second light-emitting element can be configured and the transmission line is not electrically connected to the second connection pad, so that the repaired display device has a good display . In this way, the display device can have a better display effect.
100、200:顯示裝置 100, 200: display device
101:基板結構 101: Substrate structure
102:顯示結構 102: display structure
110:基板 110: substrate
111:第一表面 111: first surface
112:第二表面 112: second surface
115:通孔 115: through hole
115a:第一通孔 115a: first through hole
115b:第二通孔 115b: second through hole
215c:第三通孔 215c: third through hole
120:第一圖案化導電層 120: The first patterned conductive layer
121:第一訊號線 121: The first signal line
222:第二訊號線 222: second signal line
129:開口 129: Open
131:第一驅動元件 131: The first drive element
232:第二驅動元件 232: second drive element
141:第一連接墊 141: The first connection pad
142:第二連接墊 142: The second connecting pad
143:第三連接墊 143: The third connection pad
144:第四連接墊 144: The fourth connection pad
245:第五連接墊 245: Fifth connection pad
246:第六連接墊 246: The sixth connection pad
150:第二圖案化導電層 150: second patterned conductive layer
151、151’:第一修補結構 151, 151’: First repair structure
252:第一連接線路 252: first connection line
253’:第二修補結構 253’: Second repair structure
156:傳輸線 156: Transmission Line
158、358、458:導電結構 158, 358, 458: conductive structure
158a:第一導電結構 158a: first conductive structure
158b:第二導電結構 158b: second conductive structure
258c:第三導電結構 258c: third conductive structure
171:第一發光元件 171: The first light-emitting element
172:第二發光元件 172: second light-emitting element
273:第三發光元件 273: The third light-emitting element
388:保護層 388: protective layer
387:絕緣層 387: Insulation layer
PU1:第一畫素單元 PU1: The first pixel unit
PU2:第二畫素單元 PU2: second pixel unit
D1:第一方向 D1: First direction
D2:第二方向 D2: second direction
D3:第三方向 D3: Third party
L1:第一距離 L1: first distance
L2:第二距離 L2: second distance
L3:第三距離 L3: third distance
L4:第四距離 L4: fourth distance
圖1A是依照本發明的第一實施例的一種顯示裝置的部分製造方法的部分立體示意圖。 FIG. 1A is a partial perspective view of a part of a manufacturing method of a display device according to a first embodiment of the present invention.
圖1B是依照本發明的第一實施例的一種顯示裝置的部分製造方法的部分上視示意圖。 FIG. 1B is a schematic partial top view of a part of a manufacturing method of a display device according to the first embodiment of the present invention.
圖1C是依照本發明的第一實施例的一種顯示裝置的部分製造方法的部分立體示意圖。 FIG. 1C is a partial perspective view of a part of a manufacturing method of a display device according to the first embodiment of the present invention.
圖1D是依照本發明的第一實施例的一種顯示裝置的部分製造方法的部分立體示意圖。 FIG. 1D is a partial perspective view of a part of a manufacturing method of a display device according to the first embodiment of the present invention.
圖1E是依照本發明的第一實施例的一種顯示裝置的部分製造方法的部分上視示意圖。 1E is a schematic partial top view of a part of a manufacturing method of a display device according to the first embodiment of the present invention.
圖2A至圖2C是依照本發明的一實施例的一種導電結構的部分形成方法的上視示意圖。 2A to 2C are schematic top views of a method of partially forming a conductive structure according to an embodiment of the present invention.
圖3A至圖3C是依照本發明的一實施例的一種導電結構的部分形成方法的剖視示意圖。 3A to 3C are schematic cross-sectional views of a method of partially forming a conductive structure according to an embodiment of the present invention.
圖4A至圖4C是依照本發明的另一實施例的一種導電結構的 部分形成方法的上視示意圖。 4A to 4C are diagrams of a conductive structure according to another embodiment of the present invention A schematic top view of the partial formation method.
圖5A至圖5C是依照本發明的另一實施例的一種導電結構的部分形成方法的剖視示意圖。 5A to 5C are schematic cross-sectional views of a method of partially forming a conductive structure according to another embodiment of the present invention.
圖6是依照本發明的第二實施例的一種顯示裝置的部分上視示意圖。 FIG. 6 is a schematic partial top view of a display device according to the second embodiment of the present invention.
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。如本領域技術人員將認識到的,可以以各種不同的方式修改所描述的實施例,而不脫離本發明的精神或範圍。 In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail in conjunction with the accompanying drawings. As those skilled in the art would realize, the described embodiments may be modified in various different ways without departing from the spirit or scope of the present invention.
在附圖中,為了清楚起見,放大了各元件等的厚度或尺寸。在整個說明書中,相同的附圖標記表示相同的元件。應當理解,當諸如層、膜、區域或基板的元件被稱為在“另一元件上”、或“連接到另一元件”、“重疊於另一元件”時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反,當元件被稱為“直接在另一元件上”或“直接連接到”另一元件時,不存在中間元件。如本文所使用的,“連接”可以指物理及/或電連接。 In the drawings, the thickness or size of each element and the like are exaggerated for clarity. Throughout the specification, the same reference numerals denote the same elements. It should be understood that when an element such as a layer, film, region, or substrate is referred to as being “on”, “connected to,” or “overlapped on another element”, it may be directly on the other element. On or connected to another element, or intermediate elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements. As used herein, "connected" can refer to physical and/or electrical connections.
應當理解,儘管術語“第一”、“第二”、“第三”等在本文中可以用於描述各種元件、部件、區域、層及/或部分,但是這些元件、部件、區域、及/或部分不應受這些術語的限制。這些術語僅用於將一個元件、部件、區域、層或部分與另一個元件、部件、 區域、層或部分區分開。因此,下面討論的“第一元件”、“部件”、“區域”、“層”、或“部分”可以被稱為第二元件、部件、區域、層或部分而不脫離本文的教導。 It should be understood that although the terms "first", "second", "third", etc. may be used herein to describe various elements, components, regions, layers and/or parts, these elements, components, regions, and/or Or part should not be restricted by these terms. These terms are only used to associate one element, component, region, layer or section with another element, component, Distinguish by region, layer or part. Therefore, the “first element,” “component,” “region,” “layer,” or “portion” discussed below may be referred to as a second element, component, region, layer or section without departing from the teachings herein.
這裡使用的術語僅僅是為了描述特定實施例的目的,而不是限制性的。如本文所使用的,除非內容清楚地指示,否則單數形式“一”、“一個”和“該”旨在包括複數形式,包括“至少一個”。“或”表示“及/或”。如本文所使用的,術語“及/或”包括一個或多個相關所列項目的任何和所有組合。還應當理解,當在本說明書中使用時,術語“包括”及/或“包括”指定所述特徵、區域、整體、步驟、操作、元件的存在及/或部件,但不排除一個或多個其它特徵、區域整體、步驟、操作、元件、部件及/或其組合的存在或添加。 The terminology used here is only for the purpose of describing specific embodiments and is not restrictive. As used herein, unless the content clearly indicates otherwise, the singular forms "a", "an" and "the" are intended to include plural forms, including "at least one." "Or" means "and/or". As used herein, the term "and/or" includes any and all combinations of one or more of the related listed items. It should also be understood that when used in this specification, the terms "including" and/or "including" designate the presence of the features, regions, wholes, steps, operations, elements, and/or components, but do not exclude one or more The existence or addition of other features, regions as a whole, steps, operations, elements, components, and/or combinations thereof.
此外,諸如“下”或“底部”和“上”或“頂部”的相對術語可在本文中用於描述一個元件與另一元件的關係,如圖所示。應當理解,相對術語旨在包括除了圖中所示的方位之外的裝置的不同方位。例如,如果一個附圖中的裝置翻轉,則被描述為在其他元件的“下”側的元件將被定向在其他元件的“上”側。因此,示例性術語“下”可以包括“下”和“上”的取向,取決於附圖的特定取向。類似地,如果一個附圖中的裝置翻轉,則被描述為在其它元件“下方”或“下方”的元件將被定向為在其它元件“上方”。因此,示例性術語“下面”或“下面”可以包括上方和下方的取向。 In addition, relative terms such as "lower" or "bottom" and "upper" or "top" may be used herein to describe the relationship between one element and another element, as shown in the figure. It should be understood that relative terms are intended to include different orientations of the device in addition to the orientation shown in the figures. For example, if the device in one figure is turned over, elements described as being on the "lower" side of other elements will be oriented on the "upper" side of the other elements. Therefore, the exemplary term "lower" may include an orientation of "lower" and "upper", depending on the specific orientation of the drawing. Similarly, if the device in one figure is turned over, elements described as "below" or "beneath" other elements will be oriented "above" the other elements. Thus, the exemplary terms "below" or "below" can include an orientation of above and below.
本文使用的“基本上”包括所述值和在本領域普通技術人員確定的特定值的可接受的偏差範圍內的平均值,考慮到所討論 的測量和與測量相關的誤差的特定數量(即,測量系統的限制)。例如,“基本上”可以表示在所述值的一個或多個標準偏差內,或±30%、±20%、±10%、±5%內。 As used herein, "substantially" includes the stated value and the average value within the acceptable deviation range of the specific value determined by a person of ordinary skill in the art, taking into account the discussion The measurement and the specific number of errors associated with the measurement (ie, the limit of the measurement system). For example, "substantially" can mean within one or more standard deviations of the stated value, or within ±30%, ±20%, ±10%, ±5%.
除非另有定義,本文使用的所有術語(包括技術和科學術語)具有與本發明所屬領域的普通技術人員通常理解的相同的含義。將進一步理解的是,諸如在通常使用的字典中定義的那些術語應當被解釋為具有與它們在相關技術和本發明的上下文中的含義一致的含義,並且將不被解釋為理想化的或過度正式的意義,除非本文中明確地這樣定義。 Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by those of ordinary skill in the art to which the present invention belongs. It will be further understood that terms such as those defined in commonly used dictionaries should be interpreted as having meanings consistent with their meanings in the context of related technologies and the present invention, and will not be interpreted as idealized or excessive The formal meaning, unless explicitly defined as such in this article.
本文參考作為理想化實施例的示意圖的截面圖來描述示例性實施例。因此,可以預期到作為例如製造技術及/或公差的結果的圖示的形狀變化。因此,本文所述的實施例不應被解釋為限於如本文所示的區域的特定形狀,而是包括例如由製造導致的形狀偏差。例如,示出或描述為平坦的區域通常可以具有粗糙及/或非線性特徵。此外,所示的銳角可以是圓的。因此,圖中所示的區域本質上是示意性的,並且它們的形狀不是旨在示出區域的精確形狀,並且不是旨在限制權利要求的範圍。 The exemplary embodiments are described herein with reference to cross-sectional views that are schematic diagrams of idealized embodiments. Therefore, a change in the shape of the diagram as a result of, for example, manufacturing technology and/or tolerances can be expected. Therefore, the embodiments described herein should not be interpreted as being limited to the specific shape of the area as shown herein, but include, for example, shape deviations caused by manufacturing. For example, regions shown or described as flat may generally have rough and/or non-linear characteristics. In addition, the acute angles shown may be rounded. Therefore, the regions shown in the figures are schematic in nature, and their shapes are not intended to show the precise shape of the regions, and are not intended to limit the scope of the claims.
圖1A至圖1E是依照本發明的第一實施例的一種顯示裝置的部分製造方法的部分上視示意圖立體或部分上視示意圖。舉例而言,圖1B中的顯示結構可以是對應於圖1A中的顯示結構的部分上視示意圖,圖1E中的顯示裝置可以是對應於圖1D中的顯示結構的部分上視示意圖。並且,為求清楚表示,於圖1A至圖 1E中可能省略繪示了部分的膜層或構件。 1A to 1E are partial top schematic three-dimensional or partial top schematic diagrams of a part of a manufacturing method of a display device according to a first embodiment of the present invention. For example, the display structure in FIG. 1B may be a partial top view diagram corresponding to the display structure in FIG. 1A, and the display device in FIG. 1E may be a partial top view diagram corresponding to the display structure in FIG. 1D. And, for clarity, in Figure 1A to Figure In 1E, some of the film layers or components may be omitted.
請參照圖1A及圖1B,提供基板結構101。基板結構101可以包括基板110、至少一導電結構158、第一連接墊141、第二連接墊142、第三連接墊143、第四連接墊144、第一訊號線121、第一驅動元件131、傳輸線156以及第一修補結構151’。基板110具有第一表面111、第二表面112及至少一通孔115。第二表面112相對於第一表面111。前述的通孔115貫穿第一表面111及第二表面112。導電結構158位於對應的通孔115內。第一連接墊141、第二連接墊142、第三連接墊143、第四連接墊144、第一訊號線121及第一驅動元件131位於基板110的第一表面111上。第一驅動元件131藉由第一訊號線121電性連接於第一連接墊141及第三連接墊143。傳輸線156位於基板110的第二表面112上。傳輸線156至少藉由導電結構158電性連接於第二連接墊142或第四連接墊144。第一修補結構151’位於傳輸線156及至少其中一導電結構158之間。
1A and 1B, a
舉例而言,導電結構158可以包括第一導電結構158a及第二導電結構158b,通孔115可以包括第一通孔115a及第二通孔115b。第一導電結構158a位於第一通孔115a內。第二導電結構158b位於第二通孔115b內。傳輸線156可以藉由第二導電結構158b電性連接於第四連接墊144。
For example, the
於圖1A及圖1B的結構中,第一修補結構151’位於傳輸線156及第一導電結構158a之間,且第一修補結構151’中的導體
為連續的結構。也就是說,於圖1A及圖1B的結構中,傳輸線156可以藉由第一導電結構158a電性連接於第二連接墊142。
In the structure of FIG. 1A and FIG. 1B, the first repair structure 151' is located between the
在一實施例中,第一驅動元件131可以是薄膜電晶體(thin film transistor;TFT),但本發明不限於此。舉例而言,第一驅動元件131可以為包括源極、汲極及閘極的薄膜電晶體。第一驅動元件131的汲極可以藉由第一訊號線121電性連接於第一連接墊141及第三連接墊143。前述的薄膜電晶體可以是頂閘極薄膜電晶體(top gate TFT)、底閘極薄膜電晶體(bottom gate TFT)或雙閘極薄膜電晶體(dual gate TFT)。
In an embodiment, the
在一實施例中,第一驅動元件131可以是驅動晶片(driving chiplet),但本發明不限於此。
In an embodiment, the
在一實施例中,一種導電結構358(導電結構158可以包括的其中一種)的形成方法可以如下。
In an embodiment, a method for forming a conductive structure 358 (one of the
請參照圖2A至圖2C及圖3A至圖3C,其中圖2A至圖2C是依照本發明的一實施例的一種導電結構的部分形成方法的上視示意圖,且圖3A至圖3C是依照本發明的一實施例的一種導電結構的部分形成方法的剖視示意圖。舉例而言,圖3A可以是對應於圖2A中I-I’剖線上的剖視示意圖,圖3B可以是對應於圖2B中II-II’剖線上的剖視示意圖,且/或圖3C可以是對應於圖2C中III-III’剖線上的剖視示意圖。 Please refer to FIGS. 2A to 2C and FIGS. 3A to 3C, wherein FIGS. 2A to 2C are schematic top views of a method for partially forming a conductive structure according to an embodiment of the present invention, and FIGS. 3A to 3C are in accordance with the present invention. A schematic cross-sectional view of a method for partially forming a conductive structure according to an embodiment of the invention. For example, FIG. 3A may be a schematic cross-sectional view corresponding to the line II-II′ in FIG. 2A, FIG. 3B may be a schematic cross-sectional view corresponding to the II-II′ line in FIG. 2B, and/or FIG. 3C may be It is a schematic cross-sectional view corresponding to the line III-III' in FIG. 2C.
請參照圖2A及圖3A,在一實施例中,可以在基板110的第一表面111上形成第一圖案化導電層120。第一圖案化導電層
120中的部分圖案化線路可以構成部分的第一訊號線121。
2A and 3A, in an embodiment, the first patterned
在一實施例中,第一圖案化導電層120可以具有開口129。
In an embodiment, the first patterned
在一實施例中,第一圖案化導電層120可以藉由濺鍍的方式形成。
In an embodiment, the first patterned
在一實施例中,第一圖案化導電層120與基板110之間可以具有絕緣層387。在一實施例中,絕緣層387可以被稱為緩衝層,但本發明不限於此。
In an embodiment, an insulating
在一實施例中,基板110的第一表面111上可以具有保護層388。保護層388可以包括藉由鍍覆、塗佈、黏貼或其他適宜的方式所形成的絕緣層或絕緣膜。如此一來,在後續的移除步驟中(如:藉由雷射燒灼的方式以移除部分的膜層或構件時),可能可以降低導電飛屑或導電粒子直接沾附於第一圖案化導電層120(或;第一訊號線121)上的可能。
In an embodiment, a
請參照圖2A至圖2B及圖3A至圖3B,於基板110上形成至少一通孔115。舉例而言,可以藉由雷射燒灼的方式,從基板110的第一表面111上,形成自第一表面111向第二表面112貫通基板110的通孔115。通孔115可以對應於第一圖案化導電層120的開口129。另外,藉由上述的方式,可以於保護層388上形成對應於通孔115的開口,且/或於絕緣層387上形成對應於通孔115的開口。
Referring to FIGS. 2A to 2B and FIGS. 3A to 3B, at least one through
請參照圖2B至圖2C及圖3B至圖3C,於基板110上形
成至少一通孔115之後,可以在基板110的第二表面112上形成第二圖案化導電層150。第二圖案化導電層150中的部分圖案化線路可以構成部分的第一修補結構151’及/或部分的傳輸線156。另外,用於形成第二圖案化導電層150的部分導電材料可以更填入通孔115(如:第一通孔115a或第一通孔115a)內,而可以形成導電結構158(如:第一導電結構158a或第一導電結構158b)。
Please refer to FIG. 2B to FIG. 2C and FIG. 3B to FIG. 3C, on the
在一實施例中,可以在基板110的第二表面112上形成種子層(seed layer),然後再藉由電鍍的方式於前述的種子層上鍍覆電鍍層。並且,可以在對前述的種子層進行圖案化步驟之後,且在對前述的種子層進行圖案化步驟之後,使圖案化的種子層及圖案化的電鍍層構成第二圖案化導電層150。
In one embodiment, a seed layer may be formed on the
在一實施例中,於形成第二圖案化導電層150之前,可以移除部分的保護層388。
In one embodiment, before forming the second patterned
在一實施例中,填入通孔115內的導電材料可以更進一步地覆蓋於基板110的第一表面111上,而可以覆蓋部分的第一圖案化導電層。
In an embodiment, the conductive material filled in the through
在另一實施例中,一種導電結構458(導電結構158可以包括的其中一種)的形成方法可以如下。
In another embodiment, a method for forming a conductive structure 458 (one of the
請參照圖4A至圖4C及圖5A至圖5C,其中圖4A至圖4C是依照本發明的另一實施例的一種導電結構的部分形成方法的上視示意圖,且圖5A至圖5C是依照本發明的另一實施例的一種導電結構的部分形成方法的剖視示意圖。舉例而言,圖5A可以是 對應於圖4A中IV-IV’剖線上的剖視示意圖,圖5B可以是對應於圖4B中V-V’剖線上的剖視示意圖,且/或圖5C可以是對應於圖4C中VI-VI’剖線上的剖視示意圖。另外,本實施例的導電結構458的形成方法與前述實施例的導電結構358的形成方法相似,其類似的構件以相同的標號表示,且具有類似的功能、材質、形成方式或配置方式,並省略描述。 Please refer to FIGS. 4A to 4C and FIGS. 5A to 5C, in which FIGS. 4A to 4C are schematic top views of a method for partially forming a conductive structure according to another embodiment of the present invention, and FIGS. 5A to 5C are in accordance with A schematic cross-sectional view of a method for partially forming a conductive structure according to another embodiment of the present invention. For example, Figure 5A can be Corresponding to the schematic cross-sectional view on the IV-IV' cross-sectional line in FIG. 4A, FIG. 5B may be a schematic cross-sectional view corresponding to the V-V' cross-sectional line in FIG. 4B, and/or FIG. 5C may correspond to the VI- in FIG. 4C A schematic cross-sectional view on the VI' section line. In addition, the formation method of the conductive structure 458 of this embodiment is similar to the formation method of the conductive structure 358 of the foregoing embodiment, and similar components are denoted by the same reference numerals, and have similar functions, materials, formation methods or configurations, and The description is omitted.
請參照圖4A及圖5A,在一實施例中,可以在基板110的第一表面111上形成第一圖案化導電層120。第一圖案化導電層120中的部分圖案化線路可以構成部分的第一訊號線121。
Referring to FIGS. 4A and 5A, in an embodiment, the first patterned
請參照圖4A至圖4B及圖5A至圖5B,於基板110上形成至少一通孔115。舉例而言,可以藉由雷射燒灼的方式,從基板110的第二表面112上,形成自第二表面112向第一表面111貫通基板110的通孔115。通孔115可以暴露出部分的第一圖案化導電層120。另外,藉由上述的方式,可以於絕緣層387上形成對應於通孔115的開口。
Referring to FIGS. 4A to 4B and FIGS. 5A to 5B, at least one through
請參照圖4B至圖4C及圖5B至圖5C,於基板110上形成至少一通孔115之後,可以在基板110的第二表面112上形成第二圖案化導電層150。第二圖案化導電層150中的部分圖案化線路可以構成部分的第一修補結構151’及/或部分的傳輸線156。另外,用於形成第二圖案化導電層150的導電材料可以更填入通孔115(如:第一通孔115a或第二通孔115b)內,而可以形成導電結構158(如:第一導電結構158a或第二導電結構158b)。
Referring to FIGS. 4B to 4C and FIGS. 5B to 5C, after at least one through
請參照圖1C,配置第一發光元件171於基板110的第一表面111上,且使第一發光元件171的兩極(如:陽極及陰極)可以分別電性連接於第一連接墊141及第二連接墊142。
1C, the first light-emitting
在本實施例中,第一發光元件171可以為半導體晶粒,且並未限定配置於基板110上的第一發光元件171需為已知良好晶粒(Known Good Die;KGD)。
In this embodiment, the first light-emitting
在本實施例中,基板結構101及配置於其上的第一發光元件171可以被稱為顯示結構102。第一連接墊141、第二連接墊142、第三連接墊143、第四連接墊144、第一驅動元件131及第一發光元件171可以構成顯示結構102的第一畫素單元PU1。
In this embodiment, the
在本實施例中,可以對顯示結構102的第一發光元件171進行測試,以確認第一畫素單元PU1的第一發光元件171是否可以具有預期的發光狀態。舉例而言,可以對顯示結構102的第一發光元件171進行常用的亮點測試(bright point defect test)。
In this embodiment, the first light-emitting
請參照圖1C至圖1D及圖1E,於對如圖1C所繪示地第一發光元件171進行測試之後,若認為其不具有預期的發光狀態,則可以如圖1D所繪示地令傳輸線156不電性連接於第二連接墊142。舉例而言,於對如圖1C所繪示地第一發光元件171進行亮點測試之後,若認為其為非正常的亮點(bright point defect),則可以如圖1D所繪示地令傳輸線156不電性連接於第二連接墊142。
Please refer to FIGS. 1C to 1D and 1E. After testing the first
在本實施例中,可以藉由移除如圖1C所繪示地第一修補結構151’的部分導體,以使圖1D或圖1E所繪示地第一修補結構
151為斷路。也就是說,圖1D及圖1E所繪示地第一修補結構151中的導體為不連續的結構,而使其為斷路。
In this embodiment, a part of the conductor of the first repair structure 151' as shown in FIG. 1C can be removed, so that the first repair structure as shown in FIG. 1D or FIG.
在本實施例中,可以藉由雷射燒灼(laser burning)的方式移除如圖1C所繪示地第一修補結構151’的部分導體。 In this embodiment, a part of the conductor of the first repair structure 151' as shown in FIG. 1C can be removed by laser burning.
在本實施例中,由於第一修補結構(可包括第一修補結構151’或第一修補結構151)位於基板110的第二表面112上,因此若藉由雷射燒灼(laser burning)的方式以移除如圖1c所繪示地第一修補結構151’的部分導體時,可能可以降低位於基板110的第一表面111上的膜層或元件(如:第一連接墊141、第二連接墊142、第三連接墊143、第四連接墊144、第一驅動元件131、第一發光元件171或第一訊號線121,但不限)損傷或損壞的可能。
In this embodiment, since the first repair structure (which may include the first repair structure 151' or the first repair structure 151) is located on the
在本實施例中,於垂直於第一表面111或第二表面112的方向上,第一修補結構151不重疊於第一連接墊141、第二連接墊142、第一驅動元件131及第一發光元件171。舉例而言,類似於圖1B所示,第一修補結構151於第一表面111/第二表面112上的投影可以完全不重疊於第一連接墊141、第二連接墊142、第一驅動元件131及第一發光元件171於第一表面111/第二表面112上的投影。如此一來,若藉由雷射燒灼的方式以移除如圖1C所繪示地第一修補結構151’的部分導體時,可能可以降低第一連接墊141、第二連接墊142、第一驅動元件131及第一發光元件171損傷或損壞的可能。
In this embodiment, in the direction perpendicular to the
在本實施例中,第一修補結構151自第一導電結構158a
向第一方向D1延伸,第一訊號線121自第一連接墊141向第二方向D2延伸,且第一方向D1不同於第二方向D2。如此一來,若藉由雷射燒灼的方式以移除如圖1C所繪示地第一修補結構151’的部分導體時,可能可以降低第一訊號線121損傷或損壞的可能。
In this embodiment, the
在本實施例中,於垂直於第一表面111或第二表面112的方向上,第一修補結構151可以不重疊於第一訊號線121。舉例而言,類似於圖1B所示,第一修補結構151於第一表面111/第二表面112上的投影可以完全不重疊於第一訊號線121於第一表面111/第二表面112上的投影。
In this embodiment, in a direction perpendicular to the
請參照圖1C至圖1D及圖1E,於對如圖1C所繪示地第一發光元件171進行測試之後,若認為其不具有預期的發光狀態,則可以如圖1D或圖1E所繪示地配置第二發光元件172於基板110的第一表面111上,且使第二發光元件172的兩極(如:陽極及陰極)可以分別電性連接於第三連接墊143及第四連接墊144。
Please refer to FIGS. 1C to 1D and 1E. After testing the first light-emitting
在本實施例中,可以在形成斷路的第一修補結構151之後,才將第二發光元件172配置於基板110的第一表面111上。在一實施例中,可以在將第二發光元件172配置於基板110的第一表面111上之後,才形成斷路的第一修補結構151。
In this embodiment, the second light-emitting
在本實施例中,第二發光元件172的可發光顏色基本上相同於第一發光元件171所預期的可發光顏色。在一實施例中,第二發光元件172的結構基本上相同於第一發光元件171的結構。舉例而言,第二發光元件172與第一發光元件171可以包括
具有相同摻雜元素(doping element)及/或摻雜濃度(doping concentration)的膜層的半導體發光二極體元件。
In this embodiment, the light-emitting color of the second light-emitting
經過上述的製造方法後即可大致上完成本實施例之顯示裝置100的製作。
After the above-mentioned manufacturing method, the manufacturing of the
請參照圖1D及圖1E,顯示裝置100包括基板110、第一導電結構158a、第一畫素單元PU1、第一訊號線121、傳輸線156以及第一修補結構151。第一畫素單元PU1位於基板110的第一表面111上。第一畫素單元PU1包括第一連接墊141、第二連接墊142、第三連接墊143、第四連接墊144、第一驅動元件131及第一發光元件171。第一修補結構151位於傳輸線156及第一導電結構158a之間。
1D and 1E, the
在本實施例中,第一修補結構151可以為斷路。也就是說,傳輸線156與第一導電結構158a於之間可以電性絕緣。
In this embodiment, the
在本實施例中,第一畫素單元PU1可以更包括第二發光元件172。在一實施例中,在顯示裝置100的製造過程中,在對第一發光元件171進行測試之後,若認為其不具有預期的發光狀態(如:亮點),則可以藉由配置第二發光元件172以及令傳輸線156不電性連接於第二連接墊142(例如:使第一修補結構151為斷路)的方式,而使修復後的顯示裝置100具有良好的顯示。如此一來,可以使顯示裝置100可以具有較佳的顯示效果。
In this embodiment, the first pixel unit PU1 may further include a second light-emitting
在一實施例中,於平行於第一表面111或第二表面112的一水平方向上,第一導電結構158a與傳輸線156之間具有第一
距離L1,第一導電結構158a與第一發光元件171之間具有第二距離L2,且第一距離L1大於第二距離L2。如此一來,若藉由雷射燒灼的方式以移除類似於如圖1C所繪示地第一修補結構151’的部分導體時,可能可以降低第一導電結構158a或第一發光元件171損傷或損壞的可能。
In one embodiment, in a horizontal direction parallel to the
在一實施例中,第一距離L1可以大於或等於1微米(micrometer;μm),且小於或等於30微米,但本發明不限於此。 In an embodiment, the first distance L1 may be greater than or equal to 1 micrometer (micrometer; μm) and less than or equal to 30 micrometers, but the present invention is not limited thereto.
在一實施例中,於對如圖1C所繪示地第一發光元件171進行測試之後,若認為其具有預期的發光狀態,則如圖1C所繪示地顯示結構102仍可以被稱為顯示裝置。在一實施例中,若如圖1C所繪示地第一發光元件171具有預期的發光狀態,則第三連接墊143及第四連接墊144上可以不具有發光元件(如:相同或相似於第二發光元件172的發光元件)。也就是說,在一實施例中,顯示裝置可以具有第一狀態(如:被稱為顯示裝置的顯示結構102的狀態)或第二狀態(如:顯示裝置100的狀態),其中第一狀態與第二狀態的差別在於:於第一狀態之下,傳輸線156電性連接於第二連接墊142,且第三連接墊143及第四連接墊144上不具有發光元件;於第二狀態之下,傳輸線156不電性連接於第二連接墊142,且第三連接墊143及第四連接墊144上具有第二發光元件172。
In one embodiment, after testing the first light-emitting
圖6是依照本發明的第二實施例的一種顯示裝置的部分上視示意圖。本實施例的顯示裝置200與第一實施例的顯示裝置
100相似,其類似的構件以相同的標號表示,且具有類似的功能、材質、形成方式或配置方式,並省略描述。
FIG. 6 is a schematic partial top view of a display device according to the second embodiment of the present invention. The
請參照圖6,在一實施例中,顯示裝置200可以包括基板110、第一導電結構158a、第一畫素單元PU1、第一訊號線121、傳輸線156、第一修補結構151、第一連接線路252以及第二導電結構158b。第一連接線路252位於基板110的第二表面112上且電性連接於傳輸線156。第四連接墊144藉由第二導電結構158b及第一連接線路252電性連接於傳輸線156。第一修補結構151自第一導電結構158a向第一方向D1延伸,第一連接線路252自第二導電結構158b向第三方向D3延伸,且第一方向D1不同於第三方向D3。如此一來,若藉由雷射燒灼的方式以移除類似於如圖1C所繪示地第一修補結構151’的部分導體時,可能可以降低第一連接線路252損傷或損壞的可能。
Referring to FIG. 6, in an embodiment, the
在一實施例中,第一連接線路252的形成方式可以相同或相似於傳輸線156,但本發明不限於此。
In an embodiment, the
在一實施例中,第二方向D2可以相同或相似於第三方向D3,但本發明不限於此。 In an embodiment, the second direction D2 may be the same or similar to the third direction D3, but the invention is not limited thereto.
請參照圖6,在一實施例中,顯示裝置200可以包括基板110、第一導電結構158a、第一畫素單元PU1、第一訊號線121、傳輸線156、第一修補結構151以及第二畫素單元PU2。第二畫素單元PU2位於基板110的第一表面111上。第二畫素單元PU2包括第五連接墊245、第六連接墊246、第二驅動元件232及第三發
光元件273。第三發光元件273電性連接於第五連接墊245及第六連接墊246。第二驅動元件232電性連接於第五連接墊245。傳輸線156電性連接於第六連接墊246。
Referring to FIG. 6, in an embodiment, the
在一實施例中,第三發光元件273的兩極(如:陽極及陰極)可以分別電性連接於第五連接墊245及第六連接墊246。
In an embodiment, the two electrodes (eg, anode and cathode) of the third light-emitting
在一實施例中,第三發光元件273的可發光顏色不同於第一發光元件171所預期的可發光顏色或第二發光元件172所預期的可發光顏色。
In an embodiment, the light-emitting color of the third light-emitting
在一實施例中,第二驅動元件232可以類似於第一驅動元件131。舉例而言,第二驅動元件232可以為包括源極、汲極及閘極的薄膜電晶體,且第二驅動元件232的汲極可以藉由第二訊號線222電性連接於第五連接墊245。
In an embodiment, the
在一實施例中,顯示裝置200可以更包括第一連接線路252、第二修補結構253’以及第三導電結構258c。基板110更具有貫穿第一表面111及第二表面112的第三通孔215c。第三導電結構258c位於第三通孔215c內且電性連接於第五連接墊245與第二修補結構253’。第二修補結構253’位於傳輸線156及第三導電結構258c之間。部分的第一連接線路252不位於第一修補結構151與第二修補結構253’的連線上。舉例而言,第一修補結構151的任意部分與第二修補結構253’的任意部分相連的連線不會與部分的第一連接線路252相交錯。如此一來,若藉由雷射燒灼的方式以移除類似於如圖1C所繪示地第一修補結構151’的部分導體
時;且/或,若有需要藉由雷射燒灼的方式以移除第二修補結構253’的部分導體時,可能可以降低第一連接線路252損傷或損壞的可能。
In an embodiment, the
在一實施例中,第二導電結構158b與第一導電結構158a之間具有第三距離L3,第三導電結構258c與第一導電結構158a之間具有第四距離L4,且第四距離L4大於第三距離L3。如此一來,若藉由雷射燒灼的方式以移除類似於如圖1C所繪示地第一修補結構151’的部分導體時;且/或,若有需要藉由雷射燒灼的方式以移除第二修補結構253’的部分導體時,更可能可以降低第一連接線路252損傷或損壞的可能。如此一來,可以使顯示裝置200可以具有較佳的顯示效果。
In an embodiment, there is a third distance L3 between the second
在一實施例中,第三距離L3可以大於或等於10微米,且小於或等於85微米,但本發明不限於此。 In an embodiment, the third distance L3 may be greater than or equal to 10 micrometers and less than or equal to 85 micrometers, but the invention is not limited thereto.
前述實施例中,導電層可為單層或多層結構。而若為多層結構的導電層,則前述的多層結構之間可以不具有絕緣材質。 In the foregoing embodiments, the conductive layer may have a single-layer or multi-layer structure. If it is a conductive layer with a multi-layer structure, the aforementioned multi-layer structure may not have an insulating material between them.
前述實施例中,絕緣層可為單層或多層結構。而若為多層結構的絕緣層,則前述的多層結構之間可以不具有導電材質。 In the foregoing embodiments, the insulating layer may have a single-layer or multi-layer structure. If it is an insulating layer with a multi-layer structure, the aforementioned multi-layer structure may not have conductive materials between them.
綜上所述,本發明在顯示裝置的製造過程中,在對第一發光元件進行測試之後,若認為其不具有預期的發光狀態,則可以藉由配置第二發光元件以及令傳輸線不電性連接於第二連接墊的方式,而使修復後的顯示裝置具有良好的顯示。如此一來,可以使顯示裝置可以具有較佳的顯示效果。 In summary, in the manufacturing process of the display device of the present invention, after the first light-emitting element is tested, if it is deemed that it does not have the expected light-emitting state, the second light-emitting element can be configured and the transmission line can be made electrically non-conductive. The way of connecting to the second connecting pad enables the repaired display device to have a good display. In this way, the display device can have a better display effect.
100:顯示裝置100: display device
110:基板110: substrate
111:第一表面111: first surface
112:第二表面112: second surface
121:第一訊號線121: The first signal line
131:第一驅動元件131: The first drive element
141:第一連接墊141: The first connection pad
142:第二連接墊142: The second connecting pad
143:第三連接墊143: The third connection pad
144:第四連接墊144: The fourth connection pad
151:第一修補結構151: The first repair structure
156:傳輸線156: Transmission Line
158:導電結構158: conductive structure
158a:第一導電結構158a: first conductive structure
158b:第二導電結構158b: second conductive structure
171:第一發光元件171: The first light-emitting element
172:第二發光元件172: second light-emitting element
PU1:第一畫素單元PU1: The first pixel unit
Claims (16)
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Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11398441B2 (en) | 2020-09-14 | 2022-07-26 | Nanya Technology Corporation | Semiconductor device with slanted conductive layers and method for fabricating the same |
TWI757181B (en) | 2021-05-19 | 2022-03-01 | 友達光電股份有限公司 | Display panel and method of fabricating the same |
TWI775530B (en) * | 2021-07-13 | 2022-08-21 | 友達光電股份有限公司 | Display device |
TWI793768B (en) * | 2021-09-23 | 2023-02-21 | 錼創顯示科技股份有限公司 | Micro light emitting diode package structure and micro light emitting diode display apparatus |
TWI800945B (en) * | 2021-10-12 | 2023-05-01 | 友達光電股份有限公司 | Display panel |
TWI792914B (en) * | 2022-02-10 | 2023-02-11 | 友達光電股份有限公司 | Display apparatus |
TWI837052B (en) * | 2023-08-04 | 2024-03-21 | 聚積科技股份有限公司 | Splicing display and manufacturing method thereof |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9786646B2 (en) * | 2015-12-23 | 2017-10-10 | X-Celeprint Limited | Matrix addressed device repair |
US20190181060A1 (en) * | 2017-12-12 | 2019-06-13 | Facebook Technologies, Llc | Redundant pixel architecture in iled displays |
TWI668856B (en) * | 2018-12-12 | 2019-08-11 | 友達光電股份有限公司 | Light emitting diode panel |
Family Cites Families (55)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1140915A (en) * | 1997-05-22 | 1999-02-12 | Nec Corp | Printed wiring board |
US7209107B2 (en) * | 2002-11-06 | 2007-04-24 | Sharp Kabushiki Kaisha | Liquid crystal display device and manufacturing method for the same |
KR101198374B1 (en) * | 2006-02-23 | 2012-11-07 | 삼성디스플레이 주식회사 | Light emitting diode substrate and manufacturing method thereof and liquid crystal display using the same |
CN101389182B (en) * | 2007-09-13 | 2011-03-30 | 鸿富锦精密工业(深圳)有限公司 | Printed circuit board |
JP2011023376A (en) * | 2007-11-16 | 2011-02-03 | Panasonic Corp | Flexible semiconductor device, and method of manufacturing the same |
TWI333100B (en) * | 2008-01-22 | 2010-11-11 | Au Optronics Corp | Mother substrate of display panel and menufacturing method thereof |
TWI434356B (en) * | 2008-05-23 | 2014-04-11 | Innolux Corp | Display device and method of forming the same, and electronic device having the same |
KR101393265B1 (en) * | 2009-12-25 | 2014-05-08 | 가부시키가이샤 리코 | Field-effect transistor, semiconductor memory, display element, image display device, and system |
JP5463205B2 (en) * | 2010-05-27 | 2014-04-09 | 日本メクトロン株式会社 | Flexible circuit board |
JP2013243456A (en) * | 2012-05-18 | 2013-12-05 | Olympus Corp | Solid state imaging device, solid state imaging device control method and imaging device |
CN104737290B (en) * | 2012-10-26 | 2017-09-19 | 奥林巴斯株式会社 | Solid camera head, camera device and signal reading method |
JP6320713B2 (en) * | 2013-10-03 | 2018-05-09 | 株式会社ジャパンディスプレイ | Display device and manufacturing method thereof |
KR102203100B1 (en) * | 2013-10-30 | 2021-01-15 | 삼성디스플레이 주식회사 | Organic light-emitting display apparatus |
US9367094B2 (en) * | 2013-12-17 | 2016-06-14 | Apple Inc. | Display module and system applications |
TWI552319B (en) * | 2014-05-23 | 2016-10-01 | 友達光電股份有限公司 | Display device |
KR102241846B1 (en) * | 2014-07-16 | 2021-04-20 | 삼성디스플레이 주식회사 | Organic light-emitting display apparatus and manufacturing method of the same |
US9799719B2 (en) * | 2014-09-25 | 2017-10-24 | X-Celeprint Limited | Active-matrix touchscreen |
US9793252B2 (en) * | 2015-03-30 | 2017-10-17 | Emagin Corporation | Method of integrating inorganic light emitting diode with oxide thin film transistor for display applications |
KR102414300B1 (en) * | 2015-08-26 | 2022-06-30 | 삼성전자주식회사 | Operating Module for display and operating Method, and electronic device supporting the same |
CN106531044B (en) * | 2015-09-11 | 2019-09-03 | 南京瀚宇彩欣科技有限责任公司 | Display panel and its gate drive circuit |
US10079264B2 (en) * | 2015-12-21 | 2018-09-18 | Hong Kong Beida Jade Bird Display Limited | Semiconductor devices with integrated thin-film transistor circuitry |
TWI561891B (en) * | 2016-01-04 | 2016-12-11 | Au Optronics Corp | Pixel array substrate |
CN107134496B (en) * | 2016-02-29 | 2019-05-31 | 昆山工研院新型平板显示技术中心有限公司 | Thin film transistor (TFT) and its manufacturing method, display panel and display device |
JP6705687B2 (en) * | 2016-04-04 | 2020-06-03 | 株式会社ジャパンディスプレイ | Display device |
CN105870265A (en) * | 2016-04-19 | 2016-08-17 | 京东方科技集团股份有限公司 | Light-emitting diode substrate and preparation method thereof and display device |
DE102016112104A1 (en) * | 2016-07-01 | 2018-01-04 | Osram Opto Semiconductors Gmbh | MODULAR MODULE |
KR102687577B1 (en) * | 2016-12-30 | 2024-07-22 | 엘지디스플레이 주식회사 | Light emitting diode display apparatus and multi screen display apparatus using the same |
KR102690480B1 (en) * | 2016-12-30 | 2024-07-31 | 엘지디스플레이 주식회사 | Flexible Display Device and Method for Manufacturing the Same |
KR102373441B1 (en) * | 2017-03-31 | 2022-03-14 | 삼성디스플레이 주식회사 | Display apparatus |
US10021762B1 (en) * | 2017-06-30 | 2018-07-10 | Innolux Corporation | Display device |
CN107275379A (en) * | 2017-07-28 | 2017-10-20 | 武汉华星光电半导体显示技术有限公司 | Touch oled display panel and display device |
CN107342375B (en) * | 2017-08-21 | 2019-05-31 | 深圳市华星光电半导体显示技术有限公司 | The production method and flexible display panels of flexible display panels |
JP2019045676A (en) * | 2017-09-01 | 2019-03-22 | 大日本印刷株式会社 | Display device |
CN107731888B (en) * | 2017-11-23 | 2020-07-03 | 京东方科技集团股份有限公司 | Flexible display panel, manufacturing method thereof and display device |
US10707266B2 (en) * | 2017-11-23 | 2020-07-07 | Century Micro Display Technology (Shenzhen) Co., Ltd. | Micro LED display panel with double-sides display |
KR102508251B1 (en) * | 2017-11-28 | 2023-03-08 | 엘지디스플레이 주식회사 | Foldable display device |
CN108183156A (en) * | 2017-12-26 | 2018-06-19 | 深圳市华星光电技术有限公司 | Micro-led display panel and preparation method thereof |
TWI657289B (en) * | 2017-12-28 | 2019-04-21 | 友達光電股份有限公司 | Display panel |
CN108417604B (en) * | 2018-02-27 | 2020-08-04 | 上海天马微电子有限公司 | Display panel and display device |
CN108493236B (en) * | 2018-03-22 | 2021-03-26 | 京东方科技集团股份有限公司 | Thin film transistor, manufacturing method thereof, flexible display screen and display device |
CN108615743B (en) * | 2018-03-23 | 2020-12-01 | 上海天马微电子有限公司 | Organic light-emitting display panel, preparation method thereof and organic light-emitting display device |
CN108598087B (en) * | 2018-04-26 | 2021-01-15 | 京东方科技集团股份有限公司 | Array substrate, manufacturing method thereof, display panel and electronic device |
CN108598091B (en) * | 2018-05-03 | 2020-03-17 | 武汉华星光电半导体显示技术有限公司 | Array substrate and manufacturing method thereof |
TWI684270B (en) * | 2018-05-10 | 2020-02-01 | 友達光電股份有限公司 | Transparent display panel and manufacturing method thereof |
US10690978B2 (en) * | 2018-05-28 | 2020-06-23 | Wuhan China Star Optoelectronics Technology Co., Ltd. | Array substrate, display panel, and display |
CN109065505B (en) * | 2018-08-10 | 2021-01-15 | 武汉华星光电半导体显示技术有限公司 | Display panel and method for manufacturing the same |
TWI695205B (en) * | 2018-08-10 | 2020-06-01 | 友達光電股份有限公司 | Image-sensing display device and image processing method |
CN109300950B (en) * | 2018-09-29 | 2020-08-25 | 广州国显科技有限公司 | Flexible display device |
CN109671721A (en) * | 2018-12-10 | 2019-04-23 | 武汉华星光电半导体显示技术有限公司 | Display device and its manufacturing method |
CN110034150B (en) * | 2019-03-25 | 2020-11-27 | 厦门天马微电子有限公司 | Display panel, manufacturing method thereof and display device |
CN109950226B (en) * | 2019-03-26 | 2020-12-15 | 京东方科技集团股份有限公司 | Circuit substrate and manufacturing method thereof, display substrate and splicing display device |
CN110335542B (en) * | 2019-04-03 | 2021-04-30 | 上海天马微电子有限公司 | Display panel, manufacturing method thereof and display device |
TWI702579B (en) * | 2019-05-07 | 2020-08-21 | 友達光電股份有限公司 | Flexible display |
CN110265454A (en) * | 2019-06-25 | 2019-09-20 | 上海天马微电子有限公司 | Display panel, manufacturing method thereof and display device |
CN110429098B (en) * | 2019-07-31 | 2021-07-23 | 成都辰显光电有限公司 | Display panel, manufacturing method thereof and display device |
-
2020
- 2020-04-28 TW TW109114222A patent/TW202032226A/en unknown
- 2020-05-13 TW TW109115866A patent/TWI732551B/en active
- 2020-05-26 TW TW109117489A patent/TWI735241B/en active
- 2020-05-26 TW TW109117483A patent/TWI722908B/en active
- 2020-05-28 TW TW109117929A patent/TWI728822B/en active
- 2020-06-01 TW TW109118284A patent/TWI742705B/en active
- 2020-06-17 TW TW109120379A patent/TWI729856B/en active
- 2020-07-01 TW TW109122232A patent/TWI742744B/en active
- 2020-07-15 TW TW109123890A patent/TWI734558B/en active
- 2020-07-28 TW TW109125439A patent/TWI730855B/en active
- 2020-08-03 TW TW109126158A patent/TWI775125B/en active
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- 2020-08-14 TW TW109127648A patent/TWI738464B/en active
- 2020-09-30 TW TW109134224A patent/TWI735344B/en active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9786646B2 (en) * | 2015-12-23 | 2017-10-10 | X-Celeprint Limited | Matrix addressed device repair |
US20190181060A1 (en) * | 2017-12-12 | 2019-06-13 | Facebook Technologies, Llc | Redundant pixel architecture in iled displays |
TWI668856B (en) * | 2018-12-12 | 2019-08-11 | 友達光電股份有限公司 | Light emitting diode panel |
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TWI730855B (en) | 2021-06-11 |
TWI735344B (en) | 2021-08-01 |
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TWI745025B (en) | 2021-11-01 |
TW202127119A (en) | 2021-07-16 |
TWI747433B (en) | 2021-11-21 |
TW202127403A (en) | 2021-07-16 |
TW202127427A (en) | 2021-07-16 |
TW202127412A (en) | 2021-07-16 |
TW202127655A (en) | 2021-07-16 |
TWI738464B (en) | 2021-09-01 |
TW202127971A (en) | 2021-07-16 |
TWI775125B (en) | 2022-08-21 |
TWI735241B (en) | 2021-08-01 |
TWI732551B (en) | 2021-07-01 |
TW202127114A (en) | 2021-07-16 |
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