TWI742744B - Display apparatus and manufacturing method thereof - Google Patents

Display apparatus and manufacturing method thereof Download PDF

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Publication number
TWI742744B
TWI742744B TW109122232A TW109122232A TWI742744B TW I742744 B TWI742744 B TW I742744B TW 109122232 A TW109122232 A TW 109122232A TW 109122232 A TW109122232 A TW 109122232A TW I742744 B TWI742744 B TW I742744B
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Taiwan
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connection pad
light
emitting element
electrically connected
substrate
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TW109122232A
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Chinese (zh)
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TW202127119A (en
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劉展睿
林振祺
鄭君丞
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友達光電股份有限公司
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Priority to US17/105,410 priority Critical patent/US11476301B2/en
Priority to CN202110023279.5A priority patent/CN112885245B/en
Publication of TW202127119A publication Critical patent/TW202127119A/en
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Publication of TWI742744B publication Critical patent/TWI742744B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector

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Abstract

A display apparatus including a substrate, a conductive structure, a pixel unit, a signal line, a transmission line, and a repair structure is provided. The substrate has a first surface, a second surface opposite to the first surface, and a through hole penetrating the first surface and the second surface. The conductive structure is disposed in the through hole. The pixel unit is disposed on the first surface. The pixel unit includes a first connection pad, a second connection pad, a third connection pad, a fourth connection pad, a driving device, and a light-emitting device. The light emitting device is electrically connected to the first connection pad and the second connection pad. The signal line is disposed on the first surface. The driving device is electrically connected to the first connection pad and the third connection pad through the signal line. The transmission line is disposed on the second surface. The transmission line is electrically connected to the second connection pad or the fourth connection pad at least through the conductive structure. The repair structure is disposed between the transmission line and the conductive structure.

Description

顯示裝置及其製造方法Display device and manufacturing method thereof

本發明是有關於一種顯示裝置及其製造方法,且特別是有關於一種具有修補結構的顯示裝置及其製造方法。 The present invention relates to a display device and a manufacturing method thereof, and more particularly to a display device with a repair structure and a manufacturing method thereof.

在顯示裝置的製造過程中,常會有不可避免缺陷產生(如:非正常的亮點)。因此,如何針對上述的缺陷進行修復,以提升顯示裝置的品質,實已成目前亟欲解決的課題。 In the manufacturing process of the display device, there are often unavoidable defects (such as abnormal bright spots). Therefore, how to repair the above-mentioned defects to improve the quality of the display device has become an urgent problem to be solved at present.

本發明提供一種顯示裝置及其製造方法,可以使顯示裝置具有較佳的顯示效果。 The present invention provides a display device and a manufacturing method thereof, which can enable the display device to have a better display effect.

本發明的顯示裝置包括基板、第一導電結構、第一畫素單元、第一訊號線、傳輸線以及第一修補結構。基板具有第一表面、相對於第一表面的第二表面及貫穿第一表面及第二表面的第一通孔。第一導電結構位於第一通孔內。第一畫素單元位於基板的第一表面上。畫素單元包括第一連接墊、第二連接墊、第三連 接墊、第四連接墊、第一驅動元件及第一發光元件。第一發光元件電性連接於第一連接墊及第二連接墊。第一訊號線位於基板的第一表面上。第一驅動元件藉由第一訊號線電性連接於第一連接墊及第三連接墊。傳輸線位於基板的第二表面上。傳輸線至少藉由第一導電結構電性連接於第二連接墊或第四連接墊。第一修補結構位於傳輸線及第一導電結構之間。 The display device of the present invention includes a substrate, a first conductive structure, a first pixel unit, a first signal line, a transmission line, and a first repair structure. The substrate has a first surface, a second surface opposite to the first surface, and a first through hole penetrating the first surface and the second surface. The first conductive structure is located in the first through hole. The first pixel unit is located on the first surface of the substrate. The pixel unit includes a first connecting pad, a second connecting pad, and a third connecting pad. The contact pad, the fourth connection pad, the first driving element and the first light emitting element. The first light-emitting element is electrically connected to the first connection pad and the second connection pad. The first signal line is located on the first surface of the substrate. The first driving element is electrically connected to the first connection pad and the third connection pad through the first signal line. The transmission line is located on the second surface of the substrate. The transmission line is electrically connected to the second connection pad or the fourth connection pad through at least the first conductive structure. The first repair structure is located between the transmission line and the first conductive structure.

本發明的顯示裝置的製造方法包括以下步驟。提供顯示結構。顯示結構包括基板、第一導電結構、第一畫素單元、第一訊號線、傳輸線以及第一修補結構。基板具有第一表面、相對於第一表面的第二表面及貫穿第一表面及第二表面的第一通孔。第一導電結構位於第一通孔內。第一畫素單元位於基板的第一表面上。畫素單元包括第一連接墊、第二連接墊、第三連接墊、第四連接墊、第一驅動元件及第一發光元件。第一發光元件電性連接於第一連接墊及第二連接墊。第一訊號線位於基板的第一表面上。第一驅動元件藉由第一訊號線電性連接於第一連接墊及第三連接墊。傳輸線位於基板的第二表面上。傳輸線至少藉由第一導電結構電性連接於第二連接墊及第四連接墊。第一修補結構位於傳輸線及第一導電結構之間。對顯示結構的第一發光元件進行測試。於對第一發光元件進行測試之後,令傳輸線不電性連接於第二連接墊。配置第二發光元件於第一表面上,且電性連接於第三連接墊及第四連接墊。 The manufacturing method of the display device of the present invention includes the following steps. Provide display structure. The display structure includes a substrate, a first conductive structure, a first pixel unit, a first signal line, a transmission line, and a first repair structure. The substrate has a first surface, a second surface opposite to the first surface, and a first through hole penetrating the first surface and the second surface. The first conductive structure is located in the first through hole. The first pixel unit is located on the first surface of the substrate. The pixel unit includes a first connection pad, a second connection pad, a third connection pad, a fourth connection pad, a first driving element, and a first light emitting element. The first light-emitting element is electrically connected to the first connection pad and the second connection pad. The first signal line is located on the first surface of the substrate. The first driving element is electrically connected to the first connection pad and the third connection pad through the first signal line. The transmission line is located on the second surface of the substrate. The transmission line is electrically connected to the second connection pad and the fourth connection pad through at least the first conductive structure. The first repair structure is located between the transmission line and the first conductive structure. The first light-emitting element of the display structure was tested. After testing the first light-emitting element, the transmission line is not electrically connected to the second connection pad. The second light emitting element is arranged on the first surface and is electrically connected to the third connection pad and the fourth connection pad.

基於上述,在顯示裝置的製造過程中,在對第一發光元 件進行測試之後,若認為其不具有預期的發光狀態,則可以藉由配置第二發光元件以及令傳輸線不電性連接於第二連接墊的方式,而使修復後的顯示裝置具有良好的顯示。如此一來,可以使顯示裝置可以具有較佳的顯示效果。 Based on the above, in the manufacturing process of the display device, the first light-emitting element is After the device is tested, if it is deemed that it does not have the expected light-emitting state, the second light-emitting element can be configured and the transmission line is not electrically connected to the second connection pad, so that the repaired display device has a good display . In this way, the display device can have a better display effect.

100、200:顯示裝置 100, 200: display device

101:基板結構 101: Substrate structure

102:顯示結構 102: display structure

110:基板 110: substrate

111:第一表面 111: first surface

112:第二表面 112: second surface

115:通孔 115: through hole

115a:第一通孔 115a: first through hole

115b:第二通孔 115b: second through hole

215c:第三通孔 215c: third through hole

120:第一圖案化導電層 120: The first patterned conductive layer

121:第一訊號線 121: The first signal line

222:第二訊號線 222: second signal line

129:開口 129: Open

131:第一驅動元件 131: The first drive element

232:第二驅動元件 232: second drive element

141:第一連接墊 141: The first connection pad

142:第二連接墊 142: The second connecting pad

143:第三連接墊 143: The third connection pad

144:第四連接墊 144: The fourth connection pad

245:第五連接墊 245: Fifth connection pad

246:第六連接墊 246: The sixth connection pad

150:第二圖案化導電層 150: second patterned conductive layer

151、151’:第一修補結構 151, 151’: First repair structure

252:第一連接線路 252: first connection line

253’:第二修補結構 253’: Second repair structure

156:傳輸線 156: Transmission Line

158、358、458:導電結構 158, 358, 458: conductive structure

158a:第一導電結構 158a: first conductive structure

158b:第二導電結構 158b: second conductive structure

258c:第三導電結構 258c: third conductive structure

171:第一發光元件 171: The first light-emitting element

172:第二發光元件 172: second light-emitting element

273:第三發光元件 273: The third light-emitting element

388:保護層 388: protective layer

387:絕緣層 387: Insulation layer

PU1:第一畫素單元 PU1: The first pixel unit

PU2:第二畫素單元 PU2: second pixel unit

D1:第一方向 D1: First direction

D2:第二方向 D2: second direction

D3:第三方向 D3: Third party

L1:第一距離 L1: first distance

L2:第二距離 L2: second distance

L3:第三距離 L3: third distance

L4:第四距離 L4: fourth distance

圖1A是依照本發明的第一實施例的一種顯示裝置的部分製造方法的部分立體示意圖。 FIG. 1A is a partial perspective view of a part of a manufacturing method of a display device according to a first embodiment of the present invention.

圖1B是依照本發明的第一實施例的一種顯示裝置的部分製造方法的部分上視示意圖。 FIG. 1B is a schematic partial top view of a part of a manufacturing method of a display device according to the first embodiment of the present invention.

圖1C是依照本發明的第一實施例的一種顯示裝置的部分製造方法的部分立體示意圖。 FIG. 1C is a partial perspective view of a part of a manufacturing method of a display device according to the first embodiment of the present invention.

圖1D是依照本發明的第一實施例的一種顯示裝置的部分製造方法的部分立體示意圖。 FIG. 1D is a partial perspective view of a part of a manufacturing method of a display device according to the first embodiment of the present invention.

圖1E是依照本發明的第一實施例的一種顯示裝置的部分製造方法的部分上視示意圖。 1E is a schematic partial top view of a part of a manufacturing method of a display device according to the first embodiment of the present invention.

圖2A至圖2C是依照本發明的一實施例的一種導電結構的部分形成方法的上視示意圖。 2A to 2C are schematic top views of a method of partially forming a conductive structure according to an embodiment of the present invention.

圖3A至圖3C是依照本發明的一實施例的一種導電結構的部分形成方法的剖視示意圖。 3A to 3C are schematic cross-sectional views of a method of partially forming a conductive structure according to an embodiment of the present invention.

圖4A至圖4C是依照本發明的另一實施例的一種導電結構的 部分形成方法的上視示意圖。 4A to 4C are diagrams of a conductive structure according to another embodiment of the present invention A schematic top view of the partial formation method.

圖5A至圖5C是依照本發明的另一實施例的一種導電結構的部分形成方法的剖視示意圖。 5A to 5C are schematic cross-sectional views of a method of partially forming a conductive structure according to another embodiment of the present invention.

圖6是依照本發明的第二實施例的一種顯示裝置的部分上視示意圖。 FIG. 6 is a schematic partial top view of a display device according to the second embodiment of the present invention.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。如本領域技術人員將認識到的,可以以各種不同的方式修改所描述的實施例,而不脫離本發明的精神或範圍。 In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail in conjunction with the accompanying drawings. As those skilled in the art would realize, the described embodiments may be modified in various different ways without departing from the spirit or scope of the present invention.

在附圖中,為了清楚起見,放大了各元件等的厚度或尺寸。在整個說明書中,相同的附圖標記表示相同的元件。應當理解,當諸如層、膜、區域或基板的元件被稱為在“另一元件上”、或“連接到另一元件”、“重疊於另一元件”時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反,當元件被稱為“直接在另一元件上”或“直接連接到”另一元件時,不存在中間元件。如本文所使用的,“連接”可以指物理及/或電連接。 In the drawings, the thickness or size of each element and the like are exaggerated for clarity. Throughout the specification, the same reference numerals denote the same elements. It should be understood that when an element such as a layer, film, region, or substrate is referred to as being “on”, “connected to,” or “overlapped on another element”, it may be directly on the other element. On or connected to another element, or intermediate elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements. As used herein, "connected" can refer to physical and/or electrical connections.

應當理解,儘管術語“第一”、“第二”、“第三”等在本文中可以用於描述各種元件、部件、區域、層及/或部分,但是這些元件、部件、區域、及/或部分不應受這些術語的限制。這些術語僅用於將一個元件、部件、區域、層或部分與另一個元件、部件、 區域、層或部分區分開。因此,下面討論的“第一元件”、“部件”、“區域”、“層”、或“部分”可以被稱為第二元件、部件、區域、層或部分而不脫離本文的教導。 It should be understood that although the terms "first", "second", "third", etc. may be used herein to describe various elements, components, regions, layers and/or parts, these elements, components, regions, and/or Or part should not be restricted by these terms. These terms are only used to associate one element, component, region, layer or section with another element, component, Distinguish by region, layer or part. Therefore, the “first element,” “component,” “region,” “layer,” or “portion” discussed below may be referred to as a second element, component, region, layer or section without departing from the teachings herein.

這裡使用的術語僅僅是為了描述特定實施例的目的,而不是限制性的。如本文所使用的,除非內容清楚地指示,否則單數形式“一”、“一個”和“該”旨在包括複數形式,包括“至少一個”。“或”表示“及/或”。如本文所使用的,術語“及/或”包括一個或多個相關所列項目的任何和所有組合。還應當理解,當在本說明書中使用時,術語“包括”及/或“包括”指定所述特徵、區域、整體、步驟、操作、元件的存在及/或部件,但不排除一個或多個其它特徵、區域整體、步驟、操作、元件、部件及/或其組合的存在或添加。 The terminology used here is only for the purpose of describing specific embodiments and is not restrictive. As used herein, unless the content clearly indicates otherwise, the singular forms "a", "an" and "the" are intended to include plural forms, including "at least one." "Or" means "and/or". As used herein, the term "and/or" includes any and all combinations of one or more of the related listed items. It should also be understood that when used in this specification, the terms "including" and/or "including" designate the presence of the features, regions, wholes, steps, operations, elements, and/or components, but do not exclude one or more The existence or addition of other features, regions as a whole, steps, operations, elements, components, and/or combinations thereof.

此外,諸如“下”或“底部”和“上”或“頂部”的相對術語可在本文中用於描述一個元件與另一元件的關係,如圖所示。應當理解,相對術語旨在包括除了圖中所示的方位之外的裝置的不同方位。例如,如果一個附圖中的裝置翻轉,則被描述為在其他元件的“下”側的元件將被定向在其他元件的“上”側。因此,示例性術語“下”可以包括“下”和“上”的取向,取決於附圖的特定取向。類似地,如果一個附圖中的裝置翻轉,則被描述為在其它元件“下方”或“下方”的元件將被定向為在其它元件“上方”。因此,示例性術語“下面”或“下面”可以包括上方和下方的取向。 In addition, relative terms such as "lower" or "bottom" and "upper" or "top" may be used herein to describe the relationship between one element and another element, as shown in the figure. It should be understood that relative terms are intended to include different orientations of the device in addition to the orientation shown in the figures. For example, if the device in one figure is turned over, elements described as being on the "lower" side of other elements will be oriented on the "upper" side of the other elements. Therefore, the exemplary term "lower" may include an orientation of "lower" and "upper", depending on the specific orientation of the drawing. Similarly, if the device in one figure is turned over, elements described as "below" or "beneath" other elements will be oriented "above" the other elements. Thus, the exemplary terms "below" or "below" can include an orientation of above and below.

本文使用的“基本上”包括所述值和在本領域普通技術人員確定的特定值的可接受的偏差範圍內的平均值,考慮到所討論 的測量和與測量相關的誤差的特定數量(即,測量系統的限制)。例如,“基本上”可以表示在所述值的一個或多個標準偏差內,或±30%、±20%、±10%、±5%內。 As used herein, "substantially" includes the stated value and the average value within the acceptable deviation range of the specific value determined by a person of ordinary skill in the art, taking into account the discussion The measurement and the specific number of errors associated with the measurement (ie, the limit of the measurement system). For example, "substantially" can mean within one or more standard deviations of the stated value, or within ±30%, ±20%, ±10%, ±5%.

除非另有定義,本文使用的所有術語(包括技術和科學術語)具有與本發明所屬領域的普通技術人員通常理解的相同的含義。將進一步理解的是,諸如在通常使用的字典中定義的那些術語應當被解釋為具有與它們在相關技術和本發明的上下文中的含義一致的含義,並且將不被解釋為理想化的或過度正式的意義,除非本文中明確地這樣定義。 Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by those of ordinary skill in the art to which the present invention belongs. It will be further understood that terms such as those defined in commonly used dictionaries should be interpreted as having meanings consistent with their meanings in the context of related technologies and the present invention, and will not be interpreted as idealized or excessive The formal meaning, unless explicitly defined as such in this article.

本文參考作為理想化實施例的示意圖的截面圖來描述示例性實施例。因此,可以預期到作為例如製造技術及/或公差的結果的圖示的形狀變化。因此,本文所述的實施例不應被解釋為限於如本文所示的區域的特定形狀,而是包括例如由製造導致的形狀偏差。例如,示出或描述為平坦的區域通常可以具有粗糙及/或非線性特徵。此外,所示的銳角可以是圓的。因此,圖中所示的區域本質上是示意性的,並且它們的形狀不是旨在示出區域的精確形狀,並且不是旨在限制權利要求的範圍。 The exemplary embodiments are described herein with reference to cross-sectional views that are schematic diagrams of idealized embodiments. Therefore, a change in the shape of the diagram as a result of, for example, manufacturing technology and/or tolerances can be expected. Therefore, the embodiments described herein should not be interpreted as being limited to the specific shape of the area as shown herein, but include, for example, shape deviations caused by manufacturing. For example, regions shown or described as flat may generally have rough and/or non-linear characteristics. In addition, the acute angles shown may be rounded. Therefore, the regions shown in the figures are schematic in nature, and their shapes are not intended to show the precise shape of the regions, and are not intended to limit the scope of the claims.

圖1A至圖1E是依照本發明的第一實施例的一種顯示裝置的部分製造方法的部分上視示意圖立體或部分上視示意圖。舉例而言,圖1B中的顯示結構可以是對應於圖1A中的顯示結構的部分上視示意圖,圖1E中的顯示裝置可以是對應於圖1D中的顯示結構的部分上視示意圖。並且,為求清楚表示,於圖1A至圖 1E中可能省略繪示了部分的膜層或構件。 1A to 1E are partial top schematic three-dimensional or partial top schematic diagrams of a part of a manufacturing method of a display device according to a first embodiment of the present invention. For example, the display structure in FIG. 1B may be a partial top view diagram corresponding to the display structure in FIG. 1A, and the display device in FIG. 1E may be a partial top view diagram corresponding to the display structure in FIG. 1D. And, for clarity, in Figure 1A to Figure In 1E, some of the film layers or components may be omitted.

請參照圖1A及圖1B,提供基板結構101。基板結構101可以包括基板110、至少一導電結構158、第一連接墊141、第二連接墊142、第三連接墊143、第四連接墊144、第一訊號線121、第一驅動元件131、傳輸線156以及第一修補結構151’。基板110具有第一表面111、第二表面112及至少一通孔115。第二表面112相對於第一表面111。前述的通孔115貫穿第一表面111及第二表面112。導電結構158位於對應的通孔115內。第一連接墊141、第二連接墊142、第三連接墊143、第四連接墊144、第一訊號線121及第一驅動元件131位於基板110的第一表面111上。第一驅動元件131藉由第一訊號線121電性連接於第一連接墊141及第三連接墊143。傳輸線156位於基板110的第二表面112上。傳輸線156至少藉由導電結構158電性連接於第二連接墊142或第四連接墊144。第一修補結構151’位於傳輸線156及至少其中一導電結構158之間。 1A and 1B, a substrate structure 101 is provided. The substrate structure 101 may include a substrate 110, at least one conductive structure 158, a first connection pad 141, a second connection pad 142, a third connection pad 143, a fourth connection pad 144, a first signal line 121, a first driving element 131, The transmission line 156 and the first repair structure 151'. The substrate 110 has a first surface 111, a second surface 112 and at least one through hole 115. The second surface 112 is opposite to the first surface 111. The aforementioned through hole 115 penetrates the first surface 111 and the second surface 112. The conductive structure 158 is located in the corresponding through hole 115. The first connection pad 141, the second connection pad 142, the third connection pad 143, the fourth connection pad 144, the first signal line 121 and the first driving element 131 are located on the first surface 111 of the substrate 110. The first driving element 131 is electrically connected to the first connection pad 141 and the third connection pad 143 through the first signal line 121. The transmission line 156 is located on the second surface 112 of the substrate 110. The transmission line 156 is electrically connected to the second connection pad 142 or the fourth connection pad 144 at least through the conductive structure 158. The first repair structure 151' is located between the transmission line 156 and at least one of the conductive structures 158.

舉例而言,導電結構158可以包括第一導電結構158a及第二導電結構158b,通孔115可以包括第一通孔115a及第二通孔115b。第一導電結構158a位於第一通孔115a內。第二導電結構158b位於第二通孔115b內。傳輸線156可以藉由第二導電結構158b電性連接於第四連接墊144。 For example, the conductive structure 158 may include a first conductive structure 158a and a second conductive structure 158b, and the through hole 115 may include a first through hole 115a and a second through hole 115b. The first conductive structure 158a is located in the first through hole 115a. The second conductive structure 158b is located in the second through hole 115b. The transmission line 156 may be electrically connected to the fourth connection pad 144 through the second conductive structure 158b.

於圖1A及圖1B的結構中,第一修補結構151’位於傳輸線156及第一導電結構158a之間,且第一修補結構151’中的導體 為連續的結構。也就是說,於圖1A及圖1B的結構中,傳輸線156可以藉由第一導電結構158a電性連接於第二連接墊142。 In the structure of FIG. 1A and FIG. 1B, the first repair structure 151' is located between the transmission line 156 and the first conductive structure 158a, and the conductor in the first repair structure 151' It is a continuous structure. That is, in the structure of FIG. 1A and FIG. 1B, the transmission line 156 can be electrically connected to the second connection pad 142 through the first conductive structure 158a.

在一實施例中,第一驅動元件131可以是薄膜電晶體(thin film transistor;TFT),但本發明不限於此。舉例而言,第一驅動元件131可以為包括源極、汲極及閘極的薄膜電晶體。第一驅動元件131的汲極可以藉由第一訊號線121電性連接於第一連接墊141及第三連接墊143。前述的薄膜電晶體可以是頂閘極薄膜電晶體(top gate TFT)、底閘極薄膜電晶體(bottom gate TFT)或雙閘極薄膜電晶體(dual gate TFT)。 In an embodiment, the first driving element 131 may be a thin film transistor (TFT), but the invention is not limited thereto. For example, the first driving element 131 may be a thin film transistor including a source electrode, a drain electrode, and a gate electrode. The drain of the first driving element 131 can be electrically connected to the first connection pad 141 and the third connection pad 143 through the first signal line 121. The aforementioned thin film transistor may be a top gate TFT, a bottom gate TFT, or a dual gate TFT.

在一實施例中,第一驅動元件131可以是驅動晶片(driving chiplet),但本發明不限於此。 In an embodiment, the first driving element 131 may be a driving chiplet (driving chiplet), but the invention is not limited thereto.

在一實施例中,一種導電結構358(導電結構158可以包括的其中一種)的形成方法可以如下。 In an embodiment, a method for forming a conductive structure 358 (one of the conductive structures 158 may include) may be as follows.

請參照圖2A至圖2C及圖3A至圖3C,其中圖2A至圖2C是依照本發明的一實施例的一種導電結構的部分形成方法的上視示意圖,且圖3A至圖3C是依照本發明的一實施例的一種導電結構的部分形成方法的剖視示意圖。舉例而言,圖3A可以是對應於圖2A中I-I’剖線上的剖視示意圖,圖3B可以是對應於圖2B中II-II’剖線上的剖視示意圖,且/或圖3C可以是對應於圖2C中III-III’剖線上的剖視示意圖。 Please refer to FIGS. 2A to 2C and FIGS. 3A to 3C, wherein FIGS. 2A to 2C are schematic top views of a method for partially forming a conductive structure according to an embodiment of the present invention, and FIGS. 3A to 3C are in accordance with the present invention. A schematic cross-sectional view of a method for partially forming a conductive structure according to an embodiment of the invention. For example, FIG. 3A may be a schematic cross-sectional view corresponding to the line II-II′ in FIG. 2A, FIG. 3B may be a schematic cross-sectional view corresponding to the II-II′ line in FIG. 2B, and/or FIG. 3C may be It is a schematic cross-sectional view corresponding to the line III-III' in FIG. 2C.

請參照圖2A及圖3A,在一實施例中,可以在基板110的第一表面111上形成第一圖案化導電層120。第一圖案化導電層 120中的部分圖案化線路可以構成部分的第一訊號線121。 2A and 3A, in an embodiment, the first patterned conductive layer 120 may be formed on the first surface 111 of the substrate 110. First patterned conductive layer Part of the patterned lines in 120 may constitute part of the first signal line 121.

在一實施例中,第一圖案化導電層120可以具有開口129。 In an embodiment, the first patterned conductive layer 120 may have an opening 129.

在一實施例中,第一圖案化導電層120可以藉由濺鍍的方式形成。 In an embodiment, the first patterned conductive layer 120 may be formed by sputtering.

在一實施例中,第一圖案化導電層120與基板110之間可以具有絕緣層387。在一實施例中,絕緣層387可以被稱為緩衝層,但本發明不限於此。 In an embodiment, an insulating layer 387 may be provided between the first patterned conductive layer 120 and the substrate 110. In an embodiment, the insulating layer 387 may be referred to as a buffer layer, but the present invention is not limited thereto.

在一實施例中,基板110的第一表面111上可以具有保護層388。保護層388可以包括藉由鍍覆、塗佈、黏貼或其他適宜的方式所形成的絕緣層或絕緣膜。如此一來,在後續的移除步驟中(如:藉由雷射燒灼的方式以移除部分的膜層或構件時),可能可以降低導電飛屑或導電粒子直接沾附於第一圖案化導電層120(或;第一訊號線121)上的可能。 In an embodiment, a protective layer 388 may be provided on the first surface 111 of the substrate 110. The protective layer 388 may include an insulating layer or an insulating film formed by plating, coating, pasting or other suitable methods. In this way, in the subsequent removal steps (for example, when a part of the film or components is removed by laser burning), it may be possible to reduce the conductive flying debris or conductive particles directly adhering to the first patterning. Possible on the conductive layer 120 (or; the first signal line 121).

請參照圖2A至圖2B及圖3A至圖3B,於基板110上形成至少一通孔115。舉例而言,可以藉由雷射燒灼的方式,從基板110的第一表面111上,形成自第一表面111向第二表面112貫通基板110的通孔115。通孔115可以對應於第一圖案化導電層120的開口129。另外,藉由上述的方式,可以於保護層388上形成對應於通孔115的開口,且/或於絕緣層387上形成對應於通孔115的開口。 Referring to FIGS. 2A to 2B and FIGS. 3A to 3B, at least one through hole 115 is formed on the substrate 110. For example, a laser burning method may be used to form a through hole 115 that penetrates the substrate 110 from the first surface 111 to the second surface 112 from the first surface 111 of the substrate 110. The through hole 115 may correspond to the opening 129 of the first patterned conductive layer 120. In addition, by the above method, an opening corresponding to the through hole 115 may be formed on the protective layer 388, and/or an opening corresponding to the through hole 115 may be formed on the insulating layer 387.

請參照圖2B至圖2C及圖3B至圖3C,於基板110上形 成至少一通孔115之後,可以在基板110的第二表面112上形成第二圖案化導電層150。第二圖案化導電層150中的部分圖案化線路可以構成部分的第一修補結構151’及/或部分的傳輸線156。另外,用於形成第二圖案化導電層150的部分導電材料可以更填入通孔115(如:第一通孔115a或第一通孔115a)內,而可以形成導電結構158(如:第一導電結構158a或第一導電結構158b)。 Please refer to FIG. 2B to FIG. 2C and FIG. 3B to FIG. 3C, on the substrate 110 After at least one through hole 115 is formed, a second patterned conductive layer 150 may be formed on the second surface 112 of the substrate 110. Part of the patterned lines in the second patterned conductive layer 150 may constitute part of the first repair structure 151' and/or part of the transmission line 156. In addition, part of the conductive material used to form the second patterned conductive layer 150 may be more filled into the through hole 115 (such as the first through hole 115a or the first through hole 115a), and the conductive structure 158 (such as the first through hole 115a) may be formed. A conductive structure 158a or a first conductive structure 158b).

在一實施例中,可以在基板110的第二表面112上形成種子層(seed layer),然後再藉由電鍍的方式於前述的種子層上鍍覆電鍍層。並且,可以在對前述的種子層進行圖案化步驟之後,且在對前述的種子層進行圖案化步驟之後,使圖案化的種子層及圖案化的電鍍層構成第二圖案化導電層150。 In one embodiment, a seed layer may be formed on the second surface 112 of the substrate 110, and then an electroplated layer may be plated on the aforementioned seed layer by electroplating. Furthermore, after the patterning step is performed on the aforementioned seed layer, and after the patterning step is performed on the aforementioned seed layer, the patterned seed layer and the patterned electroplating layer may constitute the second patterned conductive layer 150.

在一實施例中,於形成第二圖案化導電層150之前,可以移除部分的保護層388。 In one embodiment, before forming the second patterned conductive layer 150, a part of the protective layer 388 may be removed.

在一實施例中,填入通孔115內的導電材料可以更進一步地覆蓋於基板110的第一表面111上,而可以覆蓋部分的第一圖案化導電層。 In an embodiment, the conductive material filled in the through hole 115 may further cover the first surface 111 of the substrate 110, and may cover part of the first patterned conductive layer.

在另一實施例中,一種導電結構458(導電結構158可以包括的其中一種)的形成方法可以如下。 In another embodiment, a method for forming a conductive structure 458 (one of the conductive structures 158 may include) may be as follows.

請參照圖4A至圖4C及圖5A至圖5C,其中圖4A至圖4C是依照本發明的另一實施例的一種導電結構的部分形成方法的上視示意圖,且圖5A至圖5C是依照本發明的另一實施例的一種導電結構的部分形成方法的剖視示意圖。舉例而言,圖5A可以是 對應於圖4A中IV-IV’剖線上的剖視示意圖,圖5B可以是對應於圖4B中V-V’剖線上的剖視示意圖,且/或圖5C可以是對應於圖4C中VI-VI’剖線上的剖視示意圖。另外,本實施例的導電結構458的形成方法與前述實施例的導電結構358的形成方法相似,其類似的構件以相同的標號表示,且具有類似的功能、材質、形成方式或配置方式,並省略描述。 Please refer to FIGS. 4A to 4C and FIGS. 5A to 5C, in which FIGS. 4A to 4C are schematic top views of a method for partially forming a conductive structure according to another embodiment of the present invention, and FIGS. 5A to 5C are in accordance with A schematic cross-sectional view of a method for partially forming a conductive structure according to another embodiment of the present invention. For example, Figure 5A can be Corresponding to the schematic cross-sectional view on the IV-IV' cross-sectional line in FIG. 4A, FIG. 5B may be a schematic cross-sectional view corresponding to the V-V' cross-sectional line in FIG. 4B, and/or FIG. 5C may correspond to the VI- in FIG. 4C A schematic cross-sectional view on the VI' section line. In addition, the formation method of the conductive structure 458 of this embodiment is similar to the formation method of the conductive structure 358 of the foregoing embodiment, and similar components are denoted by the same reference numerals, and have similar functions, materials, formation methods or configurations, and The description is omitted.

請參照圖4A及圖5A,在一實施例中,可以在基板110的第一表面111上形成第一圖案化導電層120。第一圖案化導電層120中的部分圖案化線路可以構成部分的第一訊號線121。 Referring to FIGS. 4A and 5A, in an embodiment, the first patterned conductive layer 120 may be formed on the first surface 111 of the substrate 110. Part of the patterned lines in the first patterned conductive layer 120 may constitute part of the first signal line 121.

請參照圖4A至圖4B及圖5A至圖5B,於基板110上形成至少一通孔115。舉例而言,可以藉由雷射燒灼的方式,從基板110的第二表面112上,形成自第二表面112向第一表面111貫通基板110的通孔115。通孔115可以暴露出部分的第一圖案化導電層120。另外,藉由上述的方式,可以於絕緣層387上形成對應於通孔115的開口。 Referring to FIGS. 4A to 4B and FIGS. 5A to 5B, at least one through hole 115 is formed on the substrate 110. For example, a laser burning method may be used to form a through hole 115 that penetrates the substrate 110 from the second surface 112 to the first surface 111 from the second surface 112 of the substrate 110. The through hole 115 may expose a portion of the first patterned conductive layer 120. In addition, by the above-mentioned method, an opening corresponding to the through hole 115 can be formed on the insulating layer 387.

請參照圖4B至圖4C及圖5B至圖5C,於基板110上形成至少一通孔115之後,可以在基板110的第二表面112上形成第二圖案化導電層150。第二圖案化導電層150中的部分圖案化線路可以構成部分的第一修補結構151’及/或部分的傳輸線156。另外,用於形成第二圖案化導電層150的導電材料可以更填入通孔115(如:第一通孔115a或第二通孔115b)內,而可以形成導電結構158(如:第一導電結構158a或第二導電結構158b)。 Referring to FIGS. 4B to 4C and FIGS. 5B to 5C, after at least one through hole 115 is formed on the substrate 110, a second patterned conductive layer 150 may be formed on the second surface 112 of the substrate 110. Part of the patterned lines in the second patterned conductive layer 150 may constitute part of the first repair structure 151' and/or part of the transmission line 156. In addition, the conductive material used to form the second patterned conductive layer 150 can be more filled in the through hole 115 (such as the first through hole 115a or the second through hole 115b), and the conductive structure 158 (such as the first through hole 115b) can be formed. The conductive structure 158a or the second conductive structure 158b).

請參照圖1C,配置第一發光元件171於基板110的第一表面111上,且使第一發光元件171的兩極(如:陽極及陰極)可以分別電性連接於第一連接墊141及第二連接墊142。 1C, the first light-emitting element 171 is arranged on the first surface 111 of the substrate 110, and the two poles (such as the anode and the cathode) of the first light-emitting element 171 can be electrically connected to the first connection pad 141 and the first connection pad 141, respectively. Two connection pad 142.

在本實施例中,第一發光元件171可以為半導體晶粒,且並未限定配置於基板110上的第一發光元件171需為已知良好晶粒(Known Good Die;KGD)。 In this embodiment, the first light-emitting element 171 may be a semiconductor die, and it is not limited that the first light-emitting element 171 disposed on the substrate 110 needs to be a known good die (KGD).

在本實施例中,基板結構101及配置於其上的第一發光元件171可以被稱為顯示結構102。第一連接墊141、第二連接墊142、第三連接墊143、第四連接墊144、第一驅動元件131及第一發光元件171可以構成顯示結構102的第一畫素單元PU1。 In this embodiment, the substrate structure 101 and the first light-emitting element 171 disposed thereon can be referred to as the display structure 102. The first connection pad 141, the second connection pad 142, the third connection pad 143, the fourth connection pad 144, the first driving element 131 and the first light emitting element 171 may constitute the first pixel unit PU1 of the display structure 102.

在本實施例中,可以對顯示結構102的第一發光元件171進行測試,以確認第一畫素單元PU1的第一發光元件171是否可以具有預期的發光狀態。舉例而言,可以對顯示結構102的第一發光元件171進行常用的亮點測試(bright point defect test)。 In this embodiment, the first light-emitting element 171 of the display structure 102 can be tested to confirm whether the first light-emitting element 171 of the first pixel unit PU1 can have an expected light-emitting state. For example, a common bright point defect test (bright point defect test) can be performed on the first light emitting element 171 of the display structure 102.

請參照圖1C至圖1D及圖1E,於對如圖1C所繪示地第一發光元件171進行測試之後,若認為其不具有預期的發光狀態,則可以如圖1D所繪示地令傳輸線156不電性連接於第二連接墊142。舉例而言,於對如圖1C所繪示地第一發光元件171進行亮點測試之後,若認為其為非正常的亮點(bright point defect),則可以如圖1D所繪示地令傳輸線156不電性連接於第二連接墊142。 Please refer to FIGS. 1C to 1D and 1E. After testing the first light emitting element 171 as shown in FIG. 156 is not electrically connected to the second connection pad 142. For example, after performing a bright point test on the first light-emitting element 171 as shown in FIG. 1C, if it is considered to be an abnormal bright point defect, the transmission line 156 can be made to fail as shown in FIG. 1D. It is electrically connected to the second connection pad 142.

在本實施例中,可以藉由移除如圖1C所繪示地第一修補結構151’的部分導體,以使圖1D或圖1E所繪示地第一修補結構 151為斷路。也就是說,圖1D及圖1E所繪示地第一修補結構151中的導體為不連續的結構,而使其為斷路。 In this embodiment, a part of the conductor of the first repair structure 151' as shown in FIG. 1C can be removed, so that the first repair structure as shown in FIG. 1D or FIG. 1E 151 is open circuit. That is to say, the conductor in the first repair structure 151 shown in FIG. 1D and FIG. 1E is a discontinuous structure, making it open.

在本實施例中,可以藉由雷射燒灼(laser burning)的方式移除如圖1C所繪示地第一修補結構151’的部分導體。 In this embodiment, a part of the conductor of the first repair structure 151' as shown in FIG. 1C can be removed by laser burning.

在本實施例中,由於第一修補結構(可包括第一修補結構151’或第一修補結構151)位於基板110的第二表面112上,因此若藉由雷射燒灼(laser burning)的方式以移除如圖1c所繪示地第一修補結構151’的部分導體時,可能可以降低位於基板110的第一表面111上的膜層或元件(如:第一連接墊141、第二連接墊142、第三連接墊143、第四連接墊144、第一驅動元件131、第一發光元件171或第一訊號線121,但不限)損傷或損壞的可能。 In this embodiment, since the first repair structure (which may include the first repair structure 151' or the first repair structure 151) is located on the second surface 112 of the substrate 110, if laser burning is used In order to remove part of the conductors of the first repair structure 151' as shown in FIG. The pad 142, the third connection pad 143, the fourth connection pad 144, the first driving element 131, the first light emitting element 171 or the first signal line 121, but not limited to the possibility of damage or damage.

在本實施例中,於垂直於第一表面111或第二表面112的方向上,第一修補結構151不重疊於第一連接墊141、第二連接墊142、第一驅動元件131及第一發光元件171。舉例而言,類似於圖1B所示,第一修補結構151於第一表面111/第二表面112上的投影可以完全不重疊於第一連接墊141、第二連接墊142、第一驅動元件131及第一發光元件171於第一表面111/第二表面112上的投影。如此一來,若藉由雷射燒灼的方式以移除如圖1C所繪示地第一修補結構151’的部分導體時,可能可以降低第一連接墊141、第二連接墊142、第一驅動元件131及第一發光元件171損傷或損壞的可能。 In this embodiment, in the direction perpendicular to the first surface 111 or the second surface 112, the first repair structure 151 does not overlap the first connection pad 141, the second connection pad 142, the first driving element 131 and the first Light-emitting element 171. For example, similar to that shown in FIG. 1B, the projection of the first repair structure 151 on the first surface 111/the second surface 112 may not overlap the first connection pad 141, the second connection pad 142, and the first driving element at all. 131 and the projection of the first light emitting element 171 on the first surface 111/the second surface 112. In this way, if a part of the conductor of the first repair structure 151' as shown in FIG. 1C is removed by laser burning, it may be possible to reduce the first connection pad 141, the second connection pad 142, and the first The driving element 131 and the first light-emitting element 171 may be damaged or damaged.

在本實施例中,第一修補結構151自第一導電結構158a 向第一方向D1延伸,第一訊號線121自第一連接墊141向第二方向D2延伸,且第一方向D1不同於第二方向D2。如此一來,若藉由雷射燒灼的方式以移除如圖1C所繪示地第一修補結構151’的部分導體時,可能可以降低第一訊號線121損傷或損壞的可能。 In this embodiment, the first repair structure 151 is derived from the first conductive structure 158a Extending in the first direction D1, the first signal line 121 extends from the first connection pad 141 in the second direction D2, and the first direction D1 is different from the second direction D2. In this way, if a part of the conductor of the first repair structure 151' as shown in FIG. 1C is removed by laser burning, the possibility of damage or damage to the first signal line 121 may be reduced.

在本實施例中,於垂直於第一表面111或第二表面112的方向上,第一修補結構151可以不重疊於第一訊號線121。舉例而言,類似於圖1B所示,第一修補結構151於第一表面111/第二表面112上的投影可以完全不重疊於第一訊號線121於第一表面111/第二表面112上的投影。 In this embodiment, in a direction perpendicular to the first surface 111 or the second surface 112, the first repair structure 151 may not overlap the first signal line 121. For example, similar to that shown in FIG. 1B, the projection of the first repair structure 151 on the first surface 111/the second surface 112 may not overlap the first signal line 121 on the first surface 111/the second surface 112 at all. Projection.

請參照圖1C至圖1D及圖1E,於對如圖1C所繪示地第一發光元件171進行測試之後,若認為其不具有預期的發光狀態,則可以如圖1D或圖1E所繪示地配置第二發光元件172於基板110的第一表面111上,且使第二發光元件172的兩極(如:陽極及陰極)可以分別電性連接於第三連接墊143及第四連接墊144。 Please refer to FIGS. 1C to 1D and 1E. After testing the first light-emitting element 171 as shown in FIG. 1C, if it is deemed that it does not have the expected light-emitting state, it can be as shown in FIG. 1D or FIG. 1E. The second light-emitting element 172 is grounded on the first surface 111 of the substrate 110, and the two poles (such as the anode and the cathode) of the second light-emitting element 172 can be electrically connected to the third connection pad 143 and the fourth connection pad 144, respectively .

在本實施例中,可以在形成斷路的第一修補結構151之後,才將第二發光元件172配置於基板110的第一表面111上。在一實施例中,可以在將第二發光元件172配置於基板110的第一表面111上之後,才形成斷路的第一修補結構151。 In this embodiment, the second light-emitting element 172 may be disposed on the first surface 111 of the substrate 110 after the first repair structure 151 of the open circuit is formed. In an embodiment, the disconnected first repair structure 151 may be formed after the second light emitting element 172 is disposed on the first surface 111 of the substrate 110.

在本實施例中,第二發光元件172的可發光顏色基本上相同於第一發光元件171所預期的可發光顏色。在一實施例中,第二發光元件172的結構基本上相同於第一發光元件171的結構。舉例而言,第二發光元件172與第一發光元件171可以包括 具有相同摻雜元素(doping element)及/或摻雜濃度(doping concentration)的膜層的半導體發光二極體元件。 In this embodiment, the light-emitting color of the second light-emitting element 172 is substantially the same as the expected light-emitting color of the first light-emitting element 171. In an embodiment, the structure of the second light-emitting element 172 is substantially the same as the structure of the first light-emitting element 171. For example, the second light-emitting element 172 and the first light-emitting element 171 may include A semiconductor light-emitting diode element with a film layer with the same doping element and/or doping concentration.

經過上述的製造方法後即可大致上完成本實施例之顯示裝置100的製作。 After the above-mentioned manufacturing method, the manufacturing of the display device 100 of this embodiment can be substantially completed.

請參照圖1D及圖1E,顯示裝置100包括基板110、第一導電結構158a、第一畫素單元PU1、第一訊號線121、傳輸線156以及第一修補結構151。第一畫素單元PU1位於基板110的第一表面111上。第一畫素單元PU1包括第一連接墊141、第二連接墊142、第三連接墊143、第四連接墊144、第一驅動元件131及第一發光元件171。第一修補結構151位於傳輸線156及第一導電結構158a之間。 1D and 1E, the display device 100 includes a substrate 110, a first conductive structure 158a, a first pixel unit PU1, a first signal line 121, a transmission line 156, and a first repair structure 151. The first pixel unit PU1 is located on the first surface 111 of the substrate 110. The first pixel unit PU1 includes a first connection pad 141, a second connection pad 142, a third connection pad 143, a fourth connection pad 144, a first driving element 131, and a first light emitting element 171. The first repair structure 151 is located between the transmission line 156 and the first conductive structure 158a.

在本實施例中,第一修補結構151可以為斷路。也就是說,傳輸線156與第一導電結構158a於之間可以電性絕緣。 In this embodiment, the first repair structure 151 may be open. In other words, the transmission line 156 and the first conductive structure 158a can be electrically insulated therebetween.

在本實施例中,第一畫素單元PU1可以更包括第二發光元件172。在一實施例中,在顯示裝置100的製造過程中,在對第一發光元件171進行測試之後,若認為其不具有預期的發光狀態(如:亮點),則可以藉由配置第二發光元件172以及令傳輸線156不電性連接於第二連接墊142(例如:使第一修補結構151為斷路)的方式,而使修復後的顯示裝置100具有良好的顯示。如此一來,可以使顯示裝置100可以具有較佳的顯示效果。 In this embodiment, the first pixel unit PU1 may further include a second light-emitting element 172. In one embodiment, in the manufacturing process of the display device 100, after the first light-emitting element 171 is tested, if it is deemed that it does not have the expected light-emitting state (such as a bright spot), the second light-emitting element can be configured 172 and the way that the transmission line 156 is not electrically connected to the second connection pad 142 (for example, the first repair structure 151 is disconnected), so that the repaired display device 100 has a good display. In this way, the display device 100 can have a better display effect.

在一實施例中,於平行於第一表面111或第二表面112的一水平方向上,第一導電結構158a與傳輸線156之間具有第一 距離L1,第一導電結構158a與第一發光元件171之間具有第二距離L2,且第一距離L1大於第二距離L2。如此一來,若藉由雷射燒灼的方式以移除類似於如圖1C所繪示地第一修補結構151’的部分導體時,可能可以降低第一導電結構158a或第一發光元件171損傷或損壞的可能。 In one embodiment, in a horizontal direction parallel to the first surface 111 or the second surface 112, there is a first conductive structure 158a between the first conductive structure 158a and the transmission line 156. The distance L1 is a second distance L2 between the first conductive structure 158a and the first light emitting element 171, and the first distance L1 is greater than the second distance L2. In this way, if a part of the conductor similar to the first repair structure 151' as shown in FIG. 1C is removed by laser burning, the damage of the first conductive structure 158a or the first light-emitting element 171 may be reduced. Or the possibility of damage.

在一實施例中,第一距離L1可以大於或等於1微米(micrometer;μm),且小於或等於30微米,但本發明不限於此。 In an embodiment, the first distance L1 may be greater than or equal to 1 micrometer (micrometer; μm) and less than or equal to 30 micrometers, but the present invention is not limited thereto.

在一實施例中,於對如圖1C所繪示地第一發光元件171進行測試之後,若認為其具有預期的發光狀態,則如圖1C所繪示地顯示結構102仍可以被稱為顯示裝置。在一實施例中,若如圖1C所繪示地第一發光元件171具有預期的發光狀態,則第三連接墊143及第四連接墊144上可以不具有發光元件(如:相同或相似於第二發光元件172的發光元件)。也就是說,在一實施例中,顯示裝置可以具有第一狀態(如:被稱為顯示裝置的顯示結構102的狀態)或第二狀態(如:顯示裝置100的狀態),其中第一狀態與第二狀態的差別在於:於第一狀態之下,傳輸線156電性連接於第二連接墊142,且第三連接墊143及第四連接墊144上不具有發光元件;於第二狀態之下,傳輸線156不電性連接於第二連接墊142,且第三連接墊143及第四連接墊144上具有第二發光元件172。 In one embodiment, after testing the first light-emitting element 171 as shown in FIG. 1C, if it is deemed to have the expected light-emitting state, the display structure 102 as shown in FIG. 1C can still be called a display Device. In one embodiment, if the first light-emitting element 171 has the expected light-emitting state as shown in FIG. 1C, the third connection pad 143 and the fourth connection pad 144 may not have the light-emitting element (such as: the same or similar to Light-emitting element of the second light-emitting element 172). That is, in an embodiment, the display device may have a first state (such as the state of the display structure 102 called the display device) or a second state (such as the state of the display device 100), wherein the first state The difference from the second state is that in the first state, the transmission line 156 is electrically connected to the second connection pad 142, and the third connection pad 143 and the fourth connection pad 144 do not have light-emitting elements; in the second state Next, the transmission line 156 is not electrically connected to the second connection pad 142, and the second light-emitting element 172 is provided on the third connection pad 143 and the fourth connection pad 144.

圖6是依照本發明的第二實施例的一種顯示裝置的部分上視示意圖。本實施例的顯示裝置200與第一實施例的顯示裝置 100相似,其類似的構件以相同的標號表示,且具有類似的功能、材質、形成方式或配置方式,並省略描述。 FIG. 6 is a schematic partial top view of a display device according to the second embodiment of the present invention. The display device 200 of this embodiment and the display device of the first embodiment 100 is similar, and similar components are denoted by the same reference numerals, and have similar functions, materials, formation methods, or configuration methods, and the description is omitted.

請參照圖6,在一實施例中,顯示裝置200可以包括基板110、第一導電結構158a、第一畫素單元PU1、第一訊號線121、傳輸線156、第一修補結構151、第一連接線路252以及第二導電結構158b。第一連接線路252位於基板110的第二表面112上且電性連接於傳輸線156。第四連接墊144藉由第二導電結構158b及第一連接線路252電性連接於傳輸線156。第一修補結構151自第一導電結構158a向第一方向D1延伸,第一連接線路252自第二導電結構158b向第三方向D3延伸,且第一方向D1不同於第三方向D3。如此一來,若藉由雷射燒灼的方式以移除類似於如圖1C所繪示地第一修補結構151’的部分導體時,可能可以降低第一連接線路252損傷或損壞的可能。 Referring to FIG. 6, in an embodiment, the display device 200 may include a substrate 110, a first conductive structure 158a, a first pixel unit PU1, a first signal line 121, a transmission line 156, a first repair structure 151, and a first connection The line 252 and the second conductive structure 158b. The first connection line 252 is located on the second surface 112 of the substrate 110 and is electrically connected to the transmission line 156. The fourth connection pad 144 is electrically connected to the transmission line 156 through the second conductive structure 158 b and the first connection line 252. The first repair structure 151 extends from the first conductive structure 158a in the first direction D1, the first connection line 252 extends from the second conductive structure 158b to the third direction D3, and the first direction D1 is different from the third direction D3. In this way, if a part of the conductor similar to the first repair structure 151' as shown in FIG. 1C is removed by laser burning, the possibility of damage or damage to the first connection line 252 may be reduced.

在一實施例中,第一連接線路252的形成方式可以相同或相似於傳輸線156,但本發明不限於此。 In an embodiment, the first connection line 252 may be formed in the same or similar manner as the transmission line 156, but the present invention is not limited thereto.

在一實施例中,第二方向D2可以相同或相似於第三方向D3,但本發明不限於此。 In an embodiment, the second direction D2 may be the same or similar to the third direction D3, but the invention is not limited thereto.

請參照圖6,在一實施例中,顯示裝置200可以包括基板110、第一導電結構158a、第一畫素單元PU1、第一訊號線121、傳輸線156、第一修補結構151以及第二畫素單元PU2。第二畫素單元PU2位於基板110的第一表面111上。第二畫素單元PU2包括第五連接墊245、第六連接墊246、第二驅動元件232及第三發 光元件273。第三發光元件273電性連接於第五連接墊245及第六連接墊246。第二驅動元件232電性連接於第五連接墊245。傳輸線156電性連接於第六連接墊246。 Referring to FIG. 6, in an embodiment, the display device 200 may include a substrate 110, a first conductive structure 158a, a first pixel unit PU1, a first signal line 121, a transmission line 156, a first repair structure 151, and a second picture.素unit PU2. The second pixel unit PU2 is located on the first surface 111 of the substrate 110. The second pixel unit PU2 includes a fifth connection pad 245, a sixth connection pad 246, a second driving element 232, and a third generator. Light element 273. The third light emitting element 273 is electrically connected to the fifth connection pad 245 and the sixth connection pad 246. The second driving element 232 is electrically connected to the fifth connection pad 245. The transmission line 156 is electrically connected to the sixth connection pad 246.

在一實施例中,第三發光元件273的兩極(如:陽極及陰極)可以分別電性連接於第五連接墊245及第六連接墊246。 In an embodiment, the two electrodes (eg, anode and cathode) of the third light-emitting element 273 may be electrically connected to the fifth connection pad 245 and the sixth connection pad 246, respectively.

在一實施例中,第三發光元件273的可發光顏色不同於第一發光元件171所預期的可發光顏色或第二發光元件172所預期的可發光顏色。 In an embodiment, the light-emitting color of the third light-emitting element 273 is different from the light-emitting color expected by the first light-emitting element 171 or the light-emitting color expected by the second light-emitting element 172.

在一實施例中,第二驅動元件232可以類似於第一驅動元件131。舉例而言,第二驅動元件232可以為包括源極、汲極及閘極的薄膜電晶體,且第二驅動元件232的汲極可以藉由第二訊號線222電性連接於第五連接墊245。 In an embodiment, the second driving element 232 may be similar to the first driving element 131. For example, the second driving element 232 may be a thin film transistor including a source, a drain, and a gate, and the drain of the second driving element 232 may be electrically connected to the fifth connection pad through the second signal line 222 245.

在一實施例中,顯示裝置200可以更包括第一連接線路252、第二修補結構253’以及第三導電結構258c。基板110更具有貫穿第一表面111及第二表面112的第三通孔215c。第三導電結構258c位於第三通孔215c內且電性連接於第五連接墊245與第二修補結構253’。第二修補結構253’位於傳輸線156及第三導電結構258c之間。部分的第一連接線路252不位於第一修補結構151與第二修補結構253’的連線上。舉例而言,第一修補結構151的任意部分與第二修補結構253’的任意部分相連的連線不會與部分的第一連接線路252相交錯。如此一來,若藉由雷射燒灼的方式以移除類似於如圖1C所繪示地第一修補結構151’的部分導體 時;且/或,若有需要藉由雷射燒灼的方式以移除第二修補結構253’的部分導體時,可能可以降低第一連接線路252損傷或損壞的可能。 In an embodiment, the display device 200 may further include a first connection line 252, a second repair structure 253', and a third conductive structure 258c. The substrate 110 further has a third through hole 215 c penetrating through the first surface 111 and the second surface 112. The third conductive structure 258c is located in the third through hole 215c and is electrically connected to the fifth connection pad 245 and the second repair structure 253'. The second repair structure 253' is located between the transmission line 156 and the third conductive structure 258c. Part of the first connection line 252 is not located on the line connecting the first repair structure 151 and the second repair structure 253'. For example, the line connecting any part of the first repairing structure 151 and any part of the second repairing structure 253' will not intersect part of the first connecting line 252. In this way, if laser burning is used to remove part of the conductor similar to the first repair structure 151' as shown in FIG. 1C And/or, if it is necessary to remove part of the conductor of the second repair structure 253' by laser burning, the possibility of damage or damage to the first connection line 252 may be reduced.

在一實施例中,第二導電結構158b與第一導電結構158a之間具有第三距離L3,第三導電結構258c與第一導電結構158a之間具有第四距離L4,且第四距離L4大於第三距離L3。如此一來,若藉由雷射燒灼的方式以移除類似於如圖1C所繪示地第一修補結構151’的部分導體時;且/或,若有需要藉由雷射燒灼的方式以移除第二修補結構253’的部分導體時,更可能可以降低第一連接線路252損傷或損壞的可能。如此一來,可以使顯示裝置200可以具有較佳的顯示效果。 In an embodiment, there is a third distance L3 between the second conductive structure 158b and the first conductive structure 158a, a fourth distance L4 between the third conductive structure 258c and the first conductive structure 158a, and the fourth distance L4 is greater than The third distance is L3. In this way, if a part of the conductor similar to the first repair structure 151' as shown in FIG. 1C is removed by laser burning; and/or, if necessary, by laser burning When part of the conductors of the second repair structure 253 ′ are removed, it is more likely that the possibility of damage or damage to the first connection line 252 can be reduced. In this way, the display device 200 can have a better display effect.

在一實施例中,第三距離L3可以大於或等於10微米,且小於或等於85微米,但本發明不限於此。 In an embodiment, the third distance L3 may be greater than or equal to 10 micrometers and less than or equal to 85 micrometers, but the invention is not limited thereto.

前述實施例中,導電層可為單層或多層結構。而若為多層結構的導電層,則前述的多層結構之間可以不具有絕緣材質。 In the foregoing embodiments, the conductive layer may have a single-layer or multi-layer structure. If it is a conductive layer with a multi-layer structure, the aforementioned multi-layer structure may not have an insulating material between them.

前述實施例中,絕緣層可為單層或多層結構。而若為多層結構的絕緣層,則前述的多層結構之間可以不具有導電材質。 In the foregoing embodiments, the insulating layer may have a single-layer or multi-layer structure. If it is an insulating layer with a multi-layer structure, the aforementioned multi-layer structure may not have conductive materials between them.

綜上所述,本發明在顯示裝置的製造過程中,在對第一發光元件進行測試之後,若認為其不具有預期的發光狀態,則可以藉由配置第二發光元件以及令傳輸線不電性連接於第二連接墊的方式,而使修復後的顯示裝置具有良好的顯示。如此一來,可以使顯示裝置可以具有較佳的顯示效果。 In summary, in the manufacturing process of the display device of the present invention, after the first light-emitting element is tested, if it is deemed that it does not have the expected light-emitting state, the second light-emitting element can be configured and the transmission line can be made electrically non-conductive. The way of connecting to the second connecting pad enables the repaired display device to have a good display. In this way, the display device can have a better display effect.

100:顯示裝置100: display device

110:基板110: substrate

111:第一表面111: first surface

112:第二表面112: second surface

121:第一訊號線121: The first signal line

131:第一驅動元件131: The first drive element

141:第一連接墊141: The first connection pad

142:第二連接墊142: The second connecting pad

143:第三連接墊143: The third connection pad

144:第四連接墊144: The fourth connection pad

151:第一修補結構151: The first repair structure

156:傳輸線156: Transmission Line

158:導電結構158: conductive structure

158a:第一導電結構158a: first conductive structure

158b:第二導電結構158b: second conductive structure

171:第一發光元件171: The first light-emitting element

172:第二發光元件172: second light-emitting element

PU1:第一畫素單元PU1: The first pixel unit

Claims (16)

一種顯示裝置,包括:基板,具有第一表面、相對於所述第一表面的第二表面及貫穿所述第一表面及所述第二表面的第一通孔;第一導電結構,位於所述第一通孔內;第一畫素單元,位於所述基板的所述第一表面上,且所述畫素單元包括第一連接墊、第二連接墊、第三連接墊、第四連接墊、第一驅動元件及第一發光元件,其中所述第一發光元件電性連接於所述第一連接墊及所述第二連接墊;第一訊號線,位於所述基板的所述第一表面上,且所述第一驅動元件藉由所述第一訊號線電性連接於所述第一連接墊及所述第三連接墊;傳輸線,位於所述基板的所述第二表面上,且所述傳輸線至少藉由所述第一導電結構電性連接於所述第二連接墊或所述第四連接墊;以及第一修補結構,位於所述基板的所述第二表面上且位於所述傳輸線及所述第一導電結構之間。 A display device includes: a substrate having a first surface, a second surface opposite to the first surface, and a first through hole penetrating the first surface and the second surface; In the first through hole; a first pixel unit located on the first surface of the substrate, and the pixel unit includes a first connection pad, a second connection pad, a third connection pad, and a fourth connection Pad, a first driving element, and a first light-emitting element, wherein the first light-emitting element is electrically connected to the first connection pad and the second connection pad; the first signal line is located on the first connection pad of the substrate On a surface, and the first driving element is electrically connected to the first connection pad and the third connection pad through the first signal line; the transmission line is located on the second surface of the substrate , And the transmission line is electrically connected to the second connection pad or the fourth connection pad through at least the first conductive structure; and a first repair structure located on the second surface of the substrate and Located between the transmission line and the first conductive structure. 如請求項1所述的顯示裝置,其中所述第一修補結構為通路。 The display device according to claim 1, wherein the first repair structure is a passage. 如請求項1所述的顯示裝置,其中所述第一修補結構為斷路,且所述第一畫素單元更包括: 第二發光元件,電性連接於所述第三連接墊及所述第四連接墊。 The display device according to claim 1, wherein the first repair structure is an open circuit, and the first pixel unit further includes: The second light-emitting element is electrically connected to the third connection pad and the fourth connection pad. 如請求項3所述的顯示裝置,其中所述第一發光元件的發光顏色與所述第二發光元件的發光顏色基本上相同。 The display device according to claim 3, wherein the emission color of the first light-emitting element and the emission color of the second light-emitting element are substantially the same. 如請求項1所述的顯示裝置,其中於垂直於所述第一表面或所述第二表面的方向上,所述第一修補結構不重疊於所述第一連接墊、所述第二連接墊、所述第一驅動元件及所述第一發光元件。 The display device according to claim 1, wherein in a direction perpendicular to the first surface or the second surface, the first repair structure does not overlap the first connection pad and the second connection Pad, the first driving element, and the first light-emitting element. 如請求項1所述的顯示裝置,其中所述第一修補結構自所述第一導電結構向第一方向延伸,所述第一訊號線自所述第一連接墊向第二方向延伸,且所述第一方向不同於所述第二方向。 The display device according to claim 1, wherein the first repair structure extends from the first conductive structure in a first direction, the first signal line extends from the first connection pad in a second direction, and The first direction is different from the second direction. 如請求項1所述的顯示裝置,其中於平行於所述第一表面或所述第二表面的水平方向上,所述第一導電結構與所述傳輸線之間具有第一距離,所述第一導電結構與所述第一發光元件之間具有第二距離,且所述第一距離大於所述第二距離。 The display device according to claim 1, wherein in a horizontal direction parallel to the first surface or the second surface, there is a first distance between the first conductive structure and the transmission line, and the first There is a second distance between a conductive structure and the first light-emitting element, and the first distance is greater than the second distance. 如請求項1所述的顯示裝置,其中所述基板更具有貫穿所述第一表面及所述第二表面的第二通孔,且所述顯示裝置更包括:第一連接線路,位於所述基板的所述第二表面上且電性連接於所述傳輸線;以及 第二導電結構,位於所述第二通孔內且電性連接於所述第三連接墊與所述第一連接線路,其中所述第一修補結構自所述第一導電結構向第一方向延伸,所述第一連接線路自所述第二導電結構向第三方向延伸,且所述第一方向不同於所述第三方向。 The display device according to claim 1, wherein the substrate further has a second through hole penetrating the first surface and the second surface, and the display device further includes: a first connection line located in the On the second surface of the substrate and electrically connected to the transmission line; and The second conductive structure is located in the second through hole and is electrically connected to the third connection pad and the first connection line, wherein the first repair structure extends from the first conductive structure to the first direction Extending, the first connecting line extends from the second conductive structure in a third direction, and the first direction is different from the third direction. 如請求項1所述的顯示裝置,更包括:第二畫素單元,位於所述基板的所述第一表面上,且所述第二畫素單元包括第五連接墊、第六連接墊、第二驅動元件及第三發光元件,其中所述第三發光元件電性連接於所述第五連接墊及所述第六連接墊,所述第二驅動元件電性連接於所述第五連接墊,且所述傳輸線電性連接於所述第六連接墊。 The display device according to claim 1, further comprising: a second pixel unit located on the first surface of the substrate, and the second pixel unit includes a fifth connection pad, a sixth connection pad, The second driving element and the third light emitting element, wherein the third light emitting element is electrically connected to the fifth connection pad and the sixth connection pad, and the second driving element is electrically connected to the fifth connection Pad, and the transmission line is electrically connected to the sixth connection pad. 如請求項9所述的顯示裝置,其中所述第一發光元件的發光顏色與所述第三發光元件的發光顏色不同。 The display device according to claim 9, wherein the light emission color of the first light emitting element is different from the light emission color of the third light emitting element. 如請求項9所述的顯示裝置,其中所述基板更具有貫穿所述第一表面及所述第二表面的第二通孔及第三通孔,且所述顯示裝置更包括:第一連接線路,位於所述基板的所述第二表面上且電性連接於所述傳輸線;第二導電結構,位於所述第二通孔內且電性連接於所述第四連接墊與所述第一連接線路;第三導電結構,位於所述第三通孔內且電性連接於所述第五連接墊;以及 第二修補結構,位於所述傳輸線及所述第三導電結構之間,其中部分的所述第一連接線路不位於所述第一修補結構與所述第二修補結構的連線上。 The display device according to claim 9, wherein the substrate further has a second through hole and a third through hole penetrating the first surface and the second surface, and the display device further includes: a first connection A circuit located on the second surface of the substrate and electrically connected to the transmission line; a second conductive structure located in the second through hole and electrically connected to the fourth connection pad and the first A connection line; a third conductive structure located in the third through hole and electrically connected to the fifth connection pad; and The second repair structure is located between the transmission line and the third conductive structure, and part of the first connection line is not located on the connection line between the first repair structure and the second repair structure. 如請求項9所述的顯示裝置,其中所述第二導電結構與所述第一導電結構之間具有第三距離,所述第三導電結構與所述第一導電結構之間具有第四距離,且所述第四距離大於所述第三距離。 The display device according to claim 9, wherein there is a third distance between the second conductive structure and the first conductive structure, and there is a fourth distance between the third conductive structure and the first conductive structure , And the fourth distance is greater than the third distance. 一種顯示裝置的製造方法,包括:提供顯示結構,其包括:基板,具有第一表面、相對於所述第一表面的第二表面及貫穿所述第一表面及所述第二表面的第一通孔;第一導電結構,位於所述第一通孔內;第一畫素單元,位於所述基板的所述第一表面上,且所述畫素單元包括第一連接墊、第二連接墊、第三連接墊、第四連接墊、第一驅動元件及第一發光元件,其中所述第一發光元件電性連接於所述第一連接墊及所述第二連接墊;第一訊號線,位於所述基板的所述第一表面上,且所述第一驅動元件藉由所述第一訊號線電性連接於所述第一連接墊及所述第三連接墊;傳輸線,位於所述基板的所述第二表面上,且至少藉由所述第一導電結構電性連接於所述第二連接墊及所述第四連接 墊;以及第一修補結構,位於所述基板的所述第二表面上且位於所述傳輸線及所述第一導電結構之間;對所述顯示結構的所述第一發光元件進行測試;於對所述第一發光元件進行測試之後,令所述傳輸線不電性連接於所述第二連接墊;以及配置第二發光元件於所述第一表面上,且電性連接於所述第三連接墊及所述第四連接墊。 A method for manufacturing a display device includes: providing a display structure, which includes: a substrate having a first surface, a second surface opposite to the first surface, and a first surface penetrating the first surface and the second surface. A through hole; a first conductive structure located in the first through hole; a first pixel unit located on the first surface of the substrate, and the pixel unit includes a first connection pad and a second connection Pad, third connection pad, fourth connection pad, first driving element and first light emitting element, wherein said first light emitting element is electrically connected to said first connection pad and said second connection pad; a first signal Line is located on the first surface of the substrate, and the first driving element is electrically connected to the first connection pad and the third connection pad through the first signal line; the transmission line is located On the second surface of the substrate and electrically connected to the second connection pad and the fourth connection through at least the first conductive structure Pad; and a first repair structure located on the second surface of the substrate and between the transmission line and the first conductive structure; testing the first light-emitting element of the display structure; After the first light-emitting element is tested, the transmission line is not electrically connected to the second connection pad; and the second light-emitting element is arranged on the first surface and is electrically connected to the third The connection pad and the fourth connection pad. 如請求項13所述的顯示裝置的製造方法,其中於令所述傳輸線不電性連接於所述第二連接墊之前,於所述基板的所述第一表面上形成保護層。 The method of manufacturing a display device according to claim 13, wherein before the transmission line is not electrically connected to the second connection pad, a protective layer is formed on the first surface of the substrate. 如請求項13所述的顯示裝置的製造方法,其中於對所述第一發光元件進行測試之前,所述第一修補結構為通路,令所述傳輸線不電性連接於所述第二連接墊的步驟包括:移除部分的所述第一修補結構,以使所述第一修補結構為斷路。 The method for manufacturing a display device according to claim 13, wherein before the first light-emitting element is tested, the first repair structure is a via, so that the transmission line is not electrically connected to the second connection pad The steps include: removing part of the first repair structure to make the first repair structure open. 如請求項15所述的顯示裝置的製造方法,其中移除部分的所述第一修補結構的步驟包括藉由雷射燒灼。 The method of manufacturing a display device according to claim 15, wherein the step of removing part of the first repair structure includes burning by laser.
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