TWI734783B - 半導體裝置、製造半導體裝置的方法及場效電晶體（ｆｅｔ） - Google Patents

半導體裝置、製造半導體裝置的方法及場效電晶體（ｆｅｔ） Download PDF

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TWI734783B
TWI734783B TW106115505A TW106115505A TWI734783B TW I734783 B TWI734783 B TW I734783B TW 106115505 A TW106115505 A TW 106115505A TW 106115505 A TW106115505 A TW 106115505A TW I734783 B TWI734783 B TW I734783B
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史帝芬 薩柯吉
耀宗 陳
理察 賴
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美商諾斯拉普葛蘭門系統公司
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Abstract

一種場效電晶體(FET)，包含基板、沉積在該基板上的複數半導體外延層、以及沉積在該半導體層上的重摻雜閘極層。該FET亦包含複數雉堞牆結構，其形成在該重摻雜閘極層上且彼此間隔開，其中各雉堞牆結構包含至少一通道層。閘極金屬沉積在該雉堞牆結構上並且在該雉堞牆結構之間，以與該重摻雜閘極層直接電接觸。施加到該閘極金屬結構的電壓位勢從上、下和側面方向調變在各雉堞牆結構中的該至少一通道層。

Description

半導體裝置、製造半導體裝置的方法及場效電晶體(FET)
本發明一般係有關於一種環繞閘極場效電晶體(WAGFET)，且尤其是，關於一種包含複數三維雉堞牆結構的WAGFET，各三維雉堞牆結構具有沉積在重摻雜層上的一或更多通道層，其中閘極金屬沉積在雉堞牆結構上並且在雉堞牆結構之間，以與該重摻雜閘極層直接電接觸，以便從所有方向調變該通道層。
場效電晶體(FET)在電晶體技術中是眾所皆知的，並且具有各種眾所皆知的類型，例如HEMT、MOSFET、MISFET、FinFET等，並且可以整合為水平裝置或垂直裝置。典型的FET將包含諸如矽、砷化鎵(GaAs)、砷化銦鎵(InGaAs)、氮化鎵(GaN)、磷化銦(InP)等的各種半導體層。有時，半導體層摻雜有各種雜質，諸如硼， 以增加在該層中的載子的總數，其中該層的摻雜級越高，特定半導體材料的電導率越大。FET還將包含源極端、汲極端和閘極端，其中一或更多半導體層被指定為通道層並且與源極和汲極端電接觸。提供電位勢給源極端，以允許N型或P型電載子穿過通道層流到汲極端。施加到閘極端的電信號產生電場，其調變在通道層中的載子，其中閘極電壓的小變化可以導致在通道層中載子的總數的大變動，以改變從源極端到汲極端的電流。
在本領域中已知提供一種FET，其包含間隔開的雉堞牆結構，其包含全部沉積在共基部結構上的一或更多通道層。在這些類型的雉堞牆FET中，共閘極金屬沉積在基部結構上，使得它包圍所有的雉堞牆結構，特別是雉堞牆結構的頂部和雉堞牆結構的側面。在這種類型的配置中，由閘極端產生的用於調變通道層或多層的電場不僅被施加到通道層的頂部，而且被施加到通道層的側面，其提高了電流的放大率。
3:線
10:WAGFET
12:基板
14:緩衝層
16:障壁層
18:閘極層
24:源極端
26:汲極端
28:閘極端
30:頂部部分
32:側面部分
36:雉堞牆結構
38:上通道層
40:下通道層
42:半導體間隔物層
44:第二半導體間隔物層
46:半導體蓋帽層
圖1是環繞場效電晶體(WAGNET)的等角視圖；圖2是圖1所示之WAGFET移除閘極端的等角視圖；以及圖3是通過圖1所示之線3-3的WAGFET的剖視、橫截面輪廓視圖。
【發明內容】及【實施方式】
以下對本發明的實施方式的論述，針對包含複數雉堞牆結構和重摻雜閘極層的WAGFET，其中閘極金屬沉積在雉堞牆結構上並且在該雉堞牆結構之間，以與該重摻雜閘極層直接電接觸，以便從所有方向調變該通道層，其中該論述實際上僅僅是示例性的，並且不旨在限制本發明或其應用或使用。
圖1是WAGFET 10的等角視圖，如將在下面詳細描述的，其提供一或更多通道層的調變。WAGFET 10包含基板12，其由任何合適的材料所製成，例如SiC、藍寶石、GaN、AlN、Si、GaAs等。在此非限制性實施例中，基板12是GaAs基板。然後，將許多半導體層在基板12上生長，作為外延層，至特定FET設計所需的層厚度。例如，在該非限制性實施方式中，在基板12上生長緩衝層14，並且在緩衝層14上生長InGaAs障壁層16。如下面將要詳細說明的，在障壁層16上生長重摻雜閘極層18並作為假導電層，該假導電層提供調變信號至通道層。閘極層18可以是任何合適的半導體材料，例如在該非限制性示實施例中的GaAs，其具有任何合適的厚度，並摻雜有任何合適的雜質或摻雜劑，其提供大量N型或P型載子。採用適當且眾所皆知的圖案化和金屬沉積步驟，以在閘極層18上沉積源極端24、汲極端26和閘極端28，其中，針對多個理由，閘極端28包含頂部部分30和側面部分32，並透過下面的論述，該些理由將變得顯而易懂。閘極端28未與源極端 24和汲極端26電接觸。
圖2是WAGFET 10的等角視圖，其具有移除的閘極端28，顯示出複數閘極雉堞牆(castellation)結構36。圖3是通過圖1的線3-3的WAGFET 10的剖視截面視圖。在此實施方式中，WAGFET 10包含兩個雉堞牆結構36。然而，如所屬領域中技術人員將會很好理解的，此處所述類型的這種雉堞牆FET將包含許多形成雉堞牆閘極的雉堞牆結構36。各雉堞牆結構36包含兩個通道層，即由半導體間隔物層42分開的上通道層38和下通道層40，其中通道層38和40可以是量子阱結構，例如GaAs和AlAs的交替層。雖然雉堞牆結構36包含兩個通道層38和40，但是這是非限制性實施例，因為雉堞牆結構36可以僅使用單個通道層、或多於兩個的通道層。此外，第二半導體間隔物層44設置在下通道層40和閘極層18之間。半導體蓋帽層46生長在上通道層38上，並將上通道層38與閘極端28絕緣。間隔物層42和44以及蓋帽層46可以由任何合適的半導體材料所製成，並且針對此處所述的目的具有任何合適的厚度。閘極端28的側面部分32圍繞著雉堞牆結構36的側面並未與通道層38和40電接觸。
顯而易懂的是，在這種配置中，閘極端28形成在每個雉堞牆結構36的頂部上並且圍繞每個雉堞牆結構36的側面，使得來自閘極端28的電壓位勢被提供至通道層38和40的側面和頂部。進一步，閘極端28與閘極層18電接觸，使得閘極層18處於與端28相同的位勢，這導致電流流過其中，其產生施加到通道層38和40的底部的電場。來自雉堞牆結構36的上、外側和下表面的場效應在各雉堞牆結 構36中的各通道層36和40中提供更均勻的通道流。換句話說，將調變信號施加到通道層38和40的所有側面，提供了更均勻的電場調變，這允許WAGFET 10以更高的線性度來運行，以放大具有不同強度的信號。來自閘極端28和重摻雜閘極層18的調變信號操作以均勻的方式填充通道層38和40，從而提高通道層38和40的性能。以這種方式，閘極層18可以與雉堞牆結構36相同的方式在基部層上生長，其中閘極端28之後沉積在雉堞牆結構36的頂部上，並且其中閘極層18將最終起了作為合適導體的作用。
上述論述僅揭露並描述了本發明的示例性實施方式。本領域技術人員將從這種論述和伴隨的圖式和申請專利範圍中容易地體認到，在不脫離如所附之申請專利範圍所限定的本發明的精神和範圍的情況下，可以在其中進行各種改變、修改和變化。
10:WAGFET
12:基板
14:緩衝層
16:障壁層
18:閘極層
28:閘極端
32:側面部分
36:雉堞牆結構
38:上通道層
40:下通道層
42:半導體間隔物層
44:第二半導體間隔物層
46:半導體蓋帽層

Claims (20)

  1. 一種半導體裝置，包括：基板；複數半導體層，沉積在該基板上；重摻雜閘極層，沉積在該半導體層上；複數雉堞牆結構，形成在該重摻雜層上且彼此間隔開，各雉堞牆結構包含至少一通道層；以及閘極金屬結構，形成在該複數雉堞牆結構上方，使得閘極金屬沉積在該雉堞牆結構上且在該雉堞牆結構之間，以直接沈積在該重摻雜閘極層上而與該重摻雜閘極層直接電接觸，其中，施加到該閘極金屬結構的電壓位勢從上、下和側面方向調變在各雉堞牆結構中的該至少一通道層。
  2. 如請求項1所述之半導體裝置，其中，各雉堞牆結構包含以間隔物層分開的二通道層。
  3. 如請求項1所述之半導體裝置，其中，各雉堞牆結構包含在該至少一通道層和該重摻雜層之間的間隔物層。
  4. 如請求項1所述之半導體裝置，其中，各雉堞牆結構包含在該至少一通道層的頂部上的蓋帽層。
  5. 如請求項1所述之半導體裝置，其中，該重摻雜層為 重摻雜N型GaAs層。
  6. 如請求項1所述之半導體裝置，其中，在各雉堞牆結構中的該至少一通道層為量子阱結構。
  7. 如請求項1所述之半導體裝置，其中，該基板為GaAs基板。
  8. 如請求項1所述之該半導體裝置，其中，該半導體裝置為場效電晶體。
  9. 一種場效電晶體(FET)，包括：基板；複數半導體層，沉積在該基板上；重摻雜閘極層，沉積在該半導體層上；複數雉堞牆結構，形成在該重摻雜層上且彼此間隔開，各雉堞牆結構包含上通道層、下通道層、位於該上和下通道層之間的第一間隔物層、位於該下通道層和該重摻雜閘極層之間的第二間隔物層、以及位於該上通道層的頂部上的蓋帽層；以及閘極金屬結構，形成在該複數雉堞牆結構上方，使得閘極金屬沉積在該雉堞牆結構上且在該雉堞牆結構之間，以直接沈積在該重摻雜閘極層上而與該重摻雜閘極層直接電接觸，其中，施加到該閘極金屬結構的電壓位勢從上、 下和側面方向調變在各雉堞牆結構中的該通道層。
  10. 如請求項9所述之FET，其中，該重摻雜層為重摻雜N型GaAs層。
  11. 如請求項9所述之FET，其中，在各雉堞牆結構中的該至少一通道層為量子阱結構。
  12. 如請求項9所述之FET，其中，該基板為GaAs基板。
  13. 一種製造半導體裝置的方法，包括：提供基板；外延生長沉積在該基板上的複數半導體層；在該半導體層上外延生長重摻雜閘極層；在該重摻雜層上形成複數雉堞牆結構且彼此間隔開，其中各雉堞牆結構包含至少一通道層；以及在該複數雉堞牆結構上方形成閘極金屬結構，使得閘極金屬沉積在該雉堞牆結構上且在該雉堞牆結構之間，以直接沈積在該重摻雜閘極層上而與該重摻雜閘極層直接電接觸，其中，施加到該閘極金屬結構的電壓位勢從上、下和側面方向調變在各雉堞牆結構中的該至少一通道層。
  14. 如請求項13所述之方法，其中，形成複數雉堞牆結構包含：形成包含二通道層的雉堞牆結構，該二通道層以間 隔物層分開。
  15. 如請求項13所述之方法，其中，形成複數雉堞牆結構包含：形成包含間隔物層的雉堞牆結構，該間隔物層在該至少一通道層和該重摻雜層之間。
  16. 如請求項13所述之方法，其中，形成複數雉堞牆結構包含：形成包含蓋帽層的雉堞牆結構，該蓋帽層在該至少一通道層的頂部上。
  17. 如請求項13所述之方法，其中，該重摻雜層為重摻雜N型GaAs層。
  18. 如請求項13所述之方法，其中，形成複數雉堞牆結構包含：形成雉堞牆結構，其中該至少一通道層為量子阱結構。
  19. 如請求項13所述之方法，其中，提供基板基板包含：提供GaAs基板。
  20. 如請求項13所述之方法，其中，該半導體裝置為場效電晶體。
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