TWI727089B - 晶圓的加工方法及研磨裝置 - Google Patents
晶圓的加工方法及研磨裝置 Download PDFInfo
- Publication number
- TWI727089B TWI727089B TW106130122A TW106130122A TWI727089B TW I727089 B TWI727089 B TW I727089B TW 106130122 A TW106130122 A TW 106130122A TW 106130122 A TW106130122 A TW 106130122A TW I727089 B TWI727089 B TW I727089B
- Authority
- TW
- Taiwan
- Prior art keywords
- wafer
- polishing
- liquid
- polishing pad
- layer
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/31051—Planarisation of the insulating layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
- B24B37/345—Feeding, loading or unloading work specially adapted to lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
- H01L21/02008—Multistep processes
- H01L21/0201—Specific process step
- H01L21/02016—Backside treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016-195906 | 2016-10-03 | ||
JP2016195906A JP6827289B2 (ja) | 2016-10-03 | 2016-10-03 | ウエーハの加工方法及び研磨装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201814784A TW201814784A (zh) | 2018-04-16 |
TWI727089B true TWI727089B (zh) | 2021-05-11 |
Family
ID=61803184
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW106130122A TWI727089B (zh) | 2016-10-03 | 2017-09-04 | 晶圓的加工方法及研磨裝置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6827289B2 (ko) |
KR (1) | KR102320761B1 (ko) |
CN (1) | CN107891358B (ko) |
TW (1) | TWI727089B (ko) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110576386B (zh) * | 2018-06-26 | 2021-10-12 | 蓝思精密(东莞)有限公司 | 指纹环的加工方法 |
WO2020054504A1 (ja) * | 2018-09-13 | 2020-03-19 | 東京エレクトロン株式会社 | 処理システム及び処理方法 |
EP3900876A1 (de) * | 2020-04-23 | 2021-10-27 | Siltronic AG | Verfahren zum schleifen einer halbleiterscheibe |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006344878A (ja) * | 2005-06-10 | 2006-12-21 | Disco Abrasive Syst Ltd | 加工装置および加工方法 |
JP2013247132A (ja) * | 2012-05-23 | 2013-12-09 | Disco Abrasive Syst Ltd | 板状物の加工方法 |
JP2015046550A (ja) * | 2013-08-29 | 2015-03-12 | 株式会社ディスコ | 研磨パッドおよびウエーハの加工方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5997392A (en) * | 1997-07-22 | 1999-12-07 | International Business Machines Corporation | Slurry injection technique for chemical-mechanical polishing |
JPH1190816A (ja) * | 1997-09-22 | 1999-04-06 | Toshiba Corp | 研磨装置及び研磨方法 |
US6346032B1 (en) * | 1999-09-30 | 2002-02-12 | Vlsi Technology, Inc. | Fluid dispensing fixed abrasive polishing pad |
JP2002141313A (ja) * | 2000-08-22 | 2002-05-17 | Nikon Corp | Cmp装置及び半導体デバイスの製造方法 |
KR100681683B1 (ko) * | 2001-03-16 | 2007-02-09 | 동부일렉트로닉스 주식회사 | 가공물의 표면 연마장치 |
JP2002273651A (ja) * | 2001-03-19 | 2002-09-25 | Fujitsu Ltd | 研磨方法及び研磨装置 |
JP2004253775A (ja) * | 2003-01-31 | 2004-09-09 | Nec Electronics Corp | 化学機械的研磨方法 |
CN102001035A (zh) * | 2009-08-28 | 2011-04-06 | 中芯国际集成电路制造(上海)有限公司 | 化学机械抛光系统 |
CN102528653B (zh) * | 2010-12-30 | 2014-11-05 | 中芯国际集成电路制造(上海)有限公司 | 固定式颗粒研磨装置及其研磨方法 |
JP2015202545A (ja) * | 2014-04-16 | 2015-11-16 | 株式会社ディスコ | 研削装置 |
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2016
- 2016-10-03 JP JP2016195906A patent/JP6827289B2/ja active Active
-
2017
- 2017-09-04 TW TW106130122A patent/TWI727089B/zh active
- 2017-09-22 CN CN201710866117.1A patent/CN107891358B/zh active Active
- 2017-09-26 KR KR1020170124277A patent/KR102320761B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006344878A (ja) * | 2005-06-10 | 2006-12-21 | Disco Abrasive Syst Ltd | 加工装置および加工方法 |
JP2013247132A (ja) * | 2012-05-23 | 2013-12-09 | Disco Abrasive Syst Ltd | 板状物の加工方法 |
JP2015046550A (ja) * | 2013-08-29 | 2015-03-12 | 株式会社ディスコ | 研磨パッドおよびウエーハの加工方法 |
Also Published As
Publication number | Publication date |
---|---|
KR102320761B1 (ko) | 2021-11-01 |
TW201814784A (zh) | 2018-04-16 |
JP6827289B2 (ja) | 2021-02-10 |
CN107891358A (zh) | 2018-04-10 |
JP2018060872A (ja) | 2018-04-12 |
KR20180037113A (ko) | 2018-04-11 |
CN107891358B (zh) | 2021-06-18 |
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