TWI679715B - Vaporizing tank, vaporizer and vaporizing device - Google Patents

Vaporizing tank, vaporizer and vaporizing device Download PDF

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Publication number
TWI679715B
TWI679715B TW104139142A TW104139142A TWI679715B TW I679715 B TWI679715 B TW I679715B TW 104139142 A TW104139142 A TW 104139142A TW 104139142 A TW104139142 A TW 104139142A TW I679715 B TWI679715 B TW I679715B
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TW
Taiwan
Prior art keywords
liquid
gasification
space
container
chamber
Prior art date
Application number
TW104139142A
Other languages
Chinese (zh)
Other versions
TW201624590A (en
Inventor
田口明廣
Akihiro Taguchi
矢田秀貴
Hidetaka Yada
Original Assignee
日商堀場Stec股份有限公司
Horiba Stec Co., Ltd.
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Priority to JP2014-259536 priority Critical
Priority to JP2014259536 priority
Application filed by 日商堀場Stec股份有限公司, Horiba Stec Co., Ltd. filed Critical 日商堀場Stec股份有限公司
Publication of TW201624590A publication Critical patent/TW201624590A/en
Application granted granted Critical
Publication of TWI679715B publication Critical patent/TWI679715B/en

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Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22STEAM GENERATION
    • F22BMETHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B15/00Water-tube boilers of horizontal type, i.e. the water-tube sets being arranged horizontally
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24HFLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEAT GENERATING MEANS, IN GENERAL
    • F24H1/00Water heaters having heat generating means, e.g. boiler, flow- heater, water-storage heater
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22STEAM GENERATION
    • F22BMETHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B1/00Methods of steam generation characterised by form of heating method
    • F22B1/28Methods of steam generation characterised by form of heating method in boilers heated electrically
    • F22B1/282Methods of steam generation characterised by form of heating method in boilers heated electrically with water or steam circulating in tubes or ducts
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22STEAM GENERATION
    • F22BMETHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B1/00Methods of steam generation characterised by form of heating method
    • F22B1/28Methods of steam generation characterised by form of heating method in boilers heated electrically
    • F22B1/30Electrode boilers
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22STEAM GENERATION
    • F22BMETHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B33/00Steam-generation plants, e.g. comprising steam boilers of different types in mutual association
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22STEAM GENERATION
    • F22BMETHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B35/00Control systems for steam boilers
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24HFLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEAT GENERATING MEANS, IN GENERAL
    • F24H9/00Details
    • F24H9/18Arrangement or mounting of grates, burners, or heating elements

Abstract

The present invention provides a gasification container, a gasifier, and a gasification device, capable of outputting a material gas stably and at a large flow rate while maintaining compactness. The gasification container (11) has a gasification chamber (11a) for vaporizing the liquid material introduced into the gasification chamber (11a) and discharging the generated material gas. The gasification container includes a partition wall (6) The partition wall (6) divides the space below the gasification chamber (11a) into a first lower space (11e) into which the liquid material is initially introduced and an overflow space introduced from the first lower space (11e) is introduced into The second lower space (11f) of the liquid material.

Description

Gasification container, gasifier and gasification device

The present invention relates to a heating type gasification device and the like for vaporizing a liquid semiconductor material.

The semiconductor material includes a semiconductor material which does not contain chlorochloroethane and is liquid at normal temperature. In the semiconductor manufacturing system, when such a liquid semiconductor material is used, a heating-type gasification device that heats the liquid semiconductor material to vaporize it is required.

As a typical gasification device for this purpose, there are, for example, a storage-type gasification device that stores a sufficient amount of material necessary for a predetermined process in a gasification container and vaporizes it to output a material gas, and A continuous introduction type gasification device that continuously and intermittently introduces a liquid material into a gasification container and vaporizes the liquid material to output the material gas.

Since the storage type gasification device only needs to store a sufficient amount of liquid material in the gasification container, it does not need a complicated flow channel structure and valve control for introducing the liquid material, and the Heating temperature control also does not require too high fast reactivity. Therefore, the storage-type gasification device has the advantages of easily stabilizing the material gas and outputting a large flow. On the other hand, there is a disadvantage that the gasification container is easily enlarged and difficult to be compacted.

On the other hand, although a continuous introduction type gasification device has the advantage of miniaturizing a gasification container, it has the disadvantage that it is difficult to output a material gas stably and at a large flow rate. This is because it is necessary to ensure that new liquid materials are continuously introduced in accordance with the portion that is vaporized and output in the gasification container, and thus it is necessary to control the reactivity of the amount of liquid material introduced. For example, if the control is not timely, there is a danger that an unvaporized liquid material may overflow due to excessive introduction of the liquid material into the gasification container, and the liquid material may be outputted from a material gas outlet, thereby causing an accident or the like. .

In this way, when an emergency output stop mechanism is added in order to prevent overflow of the liquid material caused by excessive introduction, an output stop state frequently occurs, which adversely affects the semiconductor processing itself, so it cannot constitute a countermeasure to fundamentally solve the above problems.

Moreover, the above-mentioned problems are not uncommon in a storage-type gasification unit.

[Prior technical literature]

Patent Document 1: Japanese Patent Laid-Open Publication No. 2004-157719.

The present invention has been made in view of the above-mentioned problems, and an object thereof is to provide a gasification device and the like used in a semiconductor manufacturing device and the like, while maintaining compactness, and capable of outputting a material gas stably and at a large flow rate.

That is, the gasification container of the present invention has a gasification chamber, and the generated material gas is gasified by discharging a liquid material introduced into the gasification chamber, wherein the gasification container includes a partition wall, and the partition wall The lower space of the gasification chamber is divided into a first lower space into which a liquid material is first introduced and a second lower space into which a liquid material overflows from the first lower space.

According to the above-mentioned structure, since the liquid material that first flows into the first lower space overflows from the partition wall to the second lower space for a period of time, the liquid surface height remains substantially constant, so the liquid surface height control can be performed by using the time. Therefore, the mechanism for controlling the height of the liquid surface does not need to be an expensive and highly responsive mechanism to maintain the amount of liquid material (liquid surface height) in the gasification chamber in an appropriate range, thereby simultaneously solving the compactness that is the subject of the present invention. Sex and large flow.

As long as the liquid surface height at which the liquid material starts to overflow into the second lower space is set within the target liquid surface height range of the liquid material in the gasification chamber, or above the target liquid surface height range, the liquid surface height control is controlled. It becomes easy, and the above effects become significant.

In order to provide a stable supply of a large flow of material gas in a compact gasification chamber, it is preferable not only to perform the above-mentioned liquid level control in order to ensure that a liquid material commensurate with the amount of material gas to be introduced into the gasification chamber is introduced. The liquid material in the gasification chamber is maintained at a gasification-promoting temperature that ensures gasification.

Therefore, it is even more preferable to include a plurality of heat transfer members protruding from the inner wall surface of the gasification chamber. This is because the heat from the heater is efficiently transmitted to the liquid material by the plurality of heat transfer members. Therefore, even if the liquid material is continuously introduced into the compact gasification chamber, and the liquid material is replaced at a faster rate, a large flow rate can be obtained. By eliminating the resulting temperature drop, the liquid material is quickly heated and maintained at a gasification-promoting temperature.

In order to simplify manufacturing, it is preferable to include: a block-shaped body formed with a bottomed hole opened on a predetermined surface; and a cover body for forming the gas by closing the opening of the bottomed hole. Chemical chamber, by A plurality of parts of the predetermined surface are perforated to form the bottomed hole, and a residual wall portion formed between the perforation and the perforation functions as the heat transfer member.

In order to more efficiently transfer the heat from the heater to the liquid material, it is preferable that a wall for forming the gasification chamber can be embedded with a heater for heating the liquid material.

In addition, the gasifier of the present invention includes: any one of the gasification containers described above; and a heater that heats the gasification container to promote gasification of a liquid material in the gasification chamber.

The gasification device of the present invention includes: the gasifier; a liquid level sensor that detects the liquid level of the liquid material stored in the gasification chamber; and a flow regulating valve provided in the liquid communicating with the gasification chamber Material is introduced into the flow channel; and a control mechanism controls the flow regulating valve so that the height of the liquid surface detected by the liquid level sensor is within a predetermined target liquid level range.

According to the present invention having the above-mentioned structure, since the liquid material that first flows into the first lower space overflows from the partition wall to the second lower space for a period of time, the liquid surface height remains substantially constant, so the liquid surface can be reliably performed using the time. Height control. Therefore, in the continuous introduction type gasification device and the like, the material gas can be output stably and at a large flow rate while maintaining compactness.

100‧‧‧Gasification unit

1‧‧‧Gasifier

11‧‧‧Gasification container

111‧‧‧ main body

112‧‧‧ Cover

11a‧‧‧Gasification chamber

11b‧‧‧ entrance

11c‧‧‧Export

11d‧‧‧Heater hole

11e‧‧‧First lower space

11f‧‧‧Second lower space

11g‧‧‧perforated

11h‧‧‧ with bottom hole

2‧‧‧preheater

21‧‧‧Preheating container

21a‧‧‧preheating room

21b‧‧‧Inlet

21c‧‧‧Export

21d ~ 21g‧‧‧Extended runner

21h ~ 21j‧‧‧ Connect to the runner

21k‧‧‧hole for second heater

3‧‧‧ Import volume control mechanism

31‧‧‧Flow regulating valve

32‧‧‧ level sensor

33‧‧‧valve control circuit

4‧‧‧ plate block

4a‧‧‧First runner / inner runner

4b‧‧‧Second runner / inner runner

4c‧‧‧Third runner / inner runner

4d‧‧‧Fourth runner / inner runner

5‧‧‧ Remaining wall part / heat transfer piece

6‧‧‧ dividing wall

7‧‧‧mass flow controller

12‧‧‧Gasification chamber temperature control mechanism

121‧‧‧ heater

122‧‧‧Heater control circuit

123‧‧‧Temperature sensor

22‧‧‧Pre-heating chamber temperature control mechanism

221‧‧‧Second heater

222‧‧‧Second heater control circuit

223‧‧‧Temperature sensor

Lines A and B‧‧‧

FIG. 1 is a schematic diagram showing the overall configuration of a gasification apparatus according to an embodiment of the present invention.

Fig. 2 is a perspective view showing a gasification container according to the same embodiment.

Fig. 3 is a plan view showing a main body of a gasification container according to the same embodiment; Illustration.

FIG. 4 is a right side view showing a main body of a gasification container according to the same embodiment.

Fig. 5 is a sectional view taken along the line A-A in Fig. 3.

Fig. 6 is a sectional view taken along the line B-B in Fig. 3.

Fig. 7 is a perspective view showing a preheating container according to the same embodiment.

FIG. 8 is a front view showing an arrangement structure of a gasifier, a preheater, a flow control valve, and the like of a gasification device according to the same embodiment.

Hereinafter, one embodiment of the present invention will be described with reference to the drawings.

(1) Overview of the gasification apparatus 100 according to this embodiment

The gasification apparatus 100 according to the present embodiment is, for example, incorporated in a semiconductor manufacturing system and is used to supply a material gas having a predetermined flow rate to a processing chamber of the semiconductor manufacturing system.

Further, as shown in FIG. 1, the gasification device 100 includes a gasifier 1 to vaporize the introduced liquid material and output the material gas, and a preheater 2 to preheat the liquid material and introduce the gasifier 1 An introduction amount control mechanism 3 that controls the flow rate of the liquid material introduced from the preheater 2 to the gasifier 1; and a mass flow controller 7 that is connected to the output port of the gasifier 1 and controls the Mass flow of material gas.

Next, each part of the gasification apparatus 100 will be described.

(2) Structure of the gasifier 1

As shown in FIG. 1, the gasifier 1 includes a gasification container 11 having a gasification chamber 11 a inside, and a gasification chamber temperature control mechanism 12 And controlling the temperature of the liquid material in the gasification chamber 11a to a predetermined gasification promotion temperature for promoting gasification.

As shown in FIG. 2 to FIG. 5, the gasification container 11 is provided with the gasification chamber 11 a inside a metal piece having a long block shape (more specifically, a rectangular parallelepiped shape), and is perpendicular to the longitudinal direction of the gasification chamber 11 a. One end surface is provided with an introduction port 11b for introducing a liquid material into the gasification chamber 11a and a lead-out port 11c for discharging a material gas from the gasification chamber 11a. The gasification container 11 has a long-side direction set to a horizontal direction, and the lead-out port 11c is disposed above the introduction port 11b. The liquid material introduced from the introduction port 11b is stored in the gasification chamber. A material space formed by vaporizing a liquid material in the space below 11a fills the space above and is output from the outlet 11c.

As shown in FIG. 1, the gasification chamber temperature control mechanism 12 includes a heater 121 installed in the gasification container 11, a temperature sensor 123 for directly or indirectly measuring the temperature of the liquid material in the gasification chamber, and heater control. The circuit 122 controls the heater 121 so that the temperature measured by the temperature sensor 123 becomes the vaporization promotion temperature. The heater 121 is a rod-shaped member. As shown in FIG. 2 and the like, the heater 121 is inserted into a heater hole 11d, and the heater hole 11d is opened at one end surface of the gasification container 11 and extends along the same. The long side direction extends.

(3) Structure of preheater 2

As shown in FIGS. 1 and 7, the preheater 2 includes: a preheating container 21 having a preheating chamber 21a inside; and a preheating chamber temperature control mechanism 22 that controls the preheating chamber 21a The temperature of the liquid material inside is maintained at a ratio The gasification promotion temperature has a predetermined preheating temperature that is low, and as described above, the preheater 2 directs the preheated liquid material to the gasifier 1.

The preheating container 21 is the same as the gasification container 11, and the preheating chamber 21 a is provided inside a metal piece having a long block shape (more specifically, a rectangular parallelepiped shape), and one end surface is perpendicular to the longitudinal direction An introduction port 21b for introducing a liquid material into the preheating chamber 21a, and an outlet 21c for guiding the preheated liquid material out of the preheating chamber 21a are provided.

As shown in FIG. 7, the preheating container 21 has a long-side direction as a horizontal direction, and is arranged such that the lead-out port 21 c is positioned above the lead-in port 21 b. In addition, the preheating chamber 21a includes: a plurality of (here, four) extension flow passages 21d to 21g, extending along the long side direction; and connecting flow passages 21h to 21j, connecting the extension flow passages 21d to 21g. Ends so that the extended flow passages 21d to 21g are connected in series. Further, a start end of the extension flow path 21d located at the most upstream is the introduction port 21b, and a termination end of the extension flow channel 21g located at the most downstream is the guide port 21c. These extension flow paths 21d to 21g are provided such that the extension flow path on the upstream side is located below the extension flow path on the downstream side. Therefore, even if the liquid material is vaporized in the preheating chamber 21a to become a material gas, the material gas flows naturally to the side of the outlet 21c and does not remain in the preheating chamber 21a.

As shown in FIG. 1, the preheating chamber temperature control mechanism 22 includes: a second heater 221 installed in the preheating chamber 21a; a temperature sensor 223 that directly or indirectly measures the temperature of the liquid material in the preheating chamber; and The second heater control circuit 222 controls the second heater 221 so that the temperature measured by the temperature sensor 223 becomes the preheating temperature. The second heater 221 As a rod-shaped member, as shown in FIG. 7, the second heater 221 is inserted into a second heater hole 21k, and the second heater hole 21k is opened at the center of the other end surface of the preheating container 21 and extends along the The long side direction extends. When viewed from the other end surface, the extension runners 21d to 21g are disposed so as to surround the second heater hole 21k. This makes it possible to transfer the heat generated by the second heater 221 to the liquid material in the preheating chamber 21 a very efficiently. Further, in the present embodiment, the most downstream extension flow passage 21g and the most upstream extension flow passage 21d are arranged to face each other via the second heater hole 21k. Thereby, it is possible to prevent as much as possible that the liquid material in the hottest and most downstream extended flow path 21 g is affected by the liquid material in the coldest and most upstream extended flow path 21 d and lowers the temperature.

(4) Structure of the introduction amount control mechanism 3

As shown in FIG. 1, the introduction amount control mechanism 3 includes: a flow regulating valve 31 provided on a connecting flow path of the preheating container 21 and the gasification container 11; An amount of the liquid material stored in the gasification chamber 11a; and a valve control circuit 33 that drives the flow regulating valve 31 to control the flow rate of the liquid material introduced into the gasification container 11 so that the liquid level sensor 32 The detected amount of liquid material is within the specified target range.

The flow regulating valve 31 is, for example, cylindrical in shape, and includes a multilayer piezoelectric element (not shown) and a valve body driven by the multilayer piezoelectric element. On and off valves of two values. In the present embodiment, as shown in FIG. 8, the flow regulating valve 31, the gasification container 11, and the preheating container 21 are located at The longitudinal direction is a horizontal posture, and it is mounted on one side surface of the erected plate-like block 4 in an up-down arrangement. The plate-like block 4 is a manifold block formed with an internal flow channel. The internal flow channel includes: a first flow channel 4a for supplying a liquid material to the inlet 21b of the preheating container 21; and a communicating preheating container. The outlet 21c of 21 and the second flow path 4b of the flow control valve 31, the third flow path 4c that connects the flow control valve 31 and the inlet 11b of the gasification container 11 and the outlet 11c from the gasification container 11 The fourth flow path 4d that outputs the vaporized material gas. In this way, the plate-like block member 4 having the internal flow channels 4a to 4d formed thereon is erected, and the preheating container 21, the flow regulating valve 31, and the gasification container 11 in a horizontal posture are sequentially mounted on the plate from below The block member 4 is thus made compact.

The liquid level sensor 32 is, for example, a buoy type liquid level sensor for detecting the liquid level of the liquid material stored in the first lower space 11e. As shown in FIG. 5, the liquid level sensor 32 The probe is inserted and mounted downward from the upper wall surface of the gasification container 11.

More specifically, the valve control circuit 33 receives the output from the liquid level sensor 32, and closes the valve when the liquid level detected by the liquid level sensor 32 exceeds a predetermined target liquid level range. When the flow rate adjustment valve 31 is lower than the target liquid level height range, the flow rate adjustment valve 31 is opened. In addition, the target liquid level height range may have a range or a single point.

As shown in FIG. 1, the valve control circuit 33 is physically provided as an integrated circuit together with the heater control circuit 122 and the second heater control circuit 222. Since the circuit has, for example, a CPU, a memory, A digital circuit composed of a communication interface and the like and an analog circuit composed of an ADC, a DAC, an amplifier, a buffer, etc., so that the peripheral circuit operates in accordance with a predetermined program stored in the memory as the aforementioned valve control circuit. 33. The heater control circuit 122, the second heater control circuit 222, and the like function.

(5) Structure of mass flow controller 7

Although not shown in detail, the mass flow controller 7 is, for example, a differential pressure type mass flow controller connected to the outlet 11c of the gasifier 1, so that the flow resistance element The pressure difference becomes the target value, that is, the target mass flow rate. The internal flow control valve is controlled to control the mass flow rate of the material gas output from the gasifier 1.

(6) Characteristic structure of the present gasification device 100

In the present embodiment, the gasification container 11 includes the following features.

That is, as shown in FIG. 2, FIG. 3, and FIG. 5, it is characterized in that a partition wall 6 is provided, which partitions the space below the gasification chamber 11 a into a first lower space 11 e and a second lower space 11 f. The first lower space 11e is a space on one end face side where the introduction port 11b is provided, and the second lower space 11f is a space on the other end face side. The capacity of the first lower space 11e is set to 8 to 10 times or more the capacity of the second lower space 11f. The space above the gasification chamber 11a is continuous without being partitioned. In addition, the liquid level sensor 32 is disposed directly above the first lower space 11e, and can detect the liquid level of the first lower space 11e.

Next, the above-mentioned characteristic points will be specifically described.

The gasification container 11 in the present embodiment includes a block-shaped body 111 formed with a bottomed hole 11h opened on a predetermined surface (here, an upper surface) in the longitudinal direction, and a plate-shaped cover. The body 112 forms the gasification chamber 11a by closing the opening of the bottomed hole 11h.

For example, the first lower space 11e and the upper space of the bottomed hole 11h are formed by cutting (excavating) the upper surface of the metal block with a drill or the like, and perforating multiple times in a vertical and horizontal matrix. All the perforations 11g here have the same diameter, and the perforation pitch is slightly larger than the perforation diameter. As a result, an uncut portion remains between 11 g of each of the drilled holes after the hole is drilled. In this embodiment, by cutting a part of the uncut portion, the plan view is formed to extend in the short side direction and to be equally spaced in the long side direction in plan view. A plurality of remnant wall sections 6 arranged.

These residual wall portions 5 assume the functions of the aforementioned heat transfer member 5. The height of the upper end of the residual wall portion, that is, the heat transfer member 5 is set lower than the opening surface of the bottomed hole 11h, and the heat transfer member 5 does not extend to the space above the gasification chamber 11a. This ensures the gas flowability in the upper space. In addition, each heat transfer member 5 is provided to be separated from the inner side surface of the bottomed hole 11h, so that the liquid material is stored in the entire first lower space 11e without stagnation.

In addition, in this embodiment, the number of perforations 11g arranged along the short side direction is three, and the depth of the perforations 11g in the center is set to be shallower than the depth of the perforations 11g at both ends. Thereby, a heater hole 11d into which the heater 121 is inserted is formed in a region below the central perforation 11g.

On the other hand, the partition wall 6 is configured to extend in the short-side direction, and each end portion thereof is continuous with the inner side surface of the bottomed hole 11h in plan view. The upper end height is set near the upper limit of the target liquid level height range controlled by the introduction amount control mechanism 3 or above the upper limit of the target liquid level height range.

In addition, the height of the upper end of the residual wall portion 5 is set to be the same as or slightly lower than the height of the upper end of the partition wall 6. In addition, the introduction port 11b is set at a position lower than the upper end of the partition wall 6, and the guide port 11c is set at an upper limit higher than the upper end of the partition wall 6 and higher than the upper limit of the target liquid level range. High position.

(7) Operation of the gasification device 100

Next, the operation of the gasification device 100 having the above-mentioned configuration will be described.

The liquid material is introduced into the preheating container 21 and is preheated and then introduced into the gasification container 11 and stored. The liquid material is heated in the gasification container 11 to be vaporized and becomes a material gas. The material gas is continuously output from the outlet 11c of the gasification container 11 in a state where the flow rate is controlled by a mass flow controller located downstream of the outlet 11c.

On the other hand, due to the output of the material gas, the liquid material in the gasification chamber 11a gradually decreases, and the liquid level of the liquid material decreases continuously. When the liquid level of the liquid material is lower than the target liquid level range, the introduction amount control mechanism 3 detects this and opens the flow regulating valve 31. Then, the liquid material flows into the gasification chamber 11a to raise the liquid level. However, when the liquid level exceeds a predetermined target range, the introduction amount control mechanism 3 detects this and closes the flow rate regulating valve 31.

In this manner, in a state where the liquid material is intermittently introduced into the gasification chamber 11a, the material gas is continuously output from the gasification chamber 11a. Also, during this period The temperature of the liquid material in the gasification chamber 11 a is controlled by the gasification chamber temperature control mechanism 12 so as to maintain a predetermined gasification promotion temperature for promoting gasification.

(8) Effects produced by the gasification device 100

Generally, if it is desired to stably output a large flow of material gas while achieving compactness of the gasification chamber, a large flow of liquid material must be introduced into the gasification chamber, and its flow rate control needs rapid reactivity. That is, since the liquid level height fluctuation speed of the liquid material in the gasification chamber becomes large, if the response speed of the introduction amount control mechanism including a liquid level sensor, a control circuit, a flow regulating valve, etc. cannot be simply increased, the introduction amount The control mechanism cannot follow the changing speed of the liquid surface height, which may cause the failure of the non-gasified liquid material to overflow from the outlet. In particular, since the rising speed of the liquid surface becomes relatively fast, the rapid responsiveness of the control against this situation becomes very important.

In contrast, according to the present gasification device 100, the liquid material that first flows into the first lower space 11e of the gasification chamber 11a overflows from the partition wall 6 and flows into the second lower space 11f. The liquid level remains constant for a period of time. In addition, the liquid level is set to a position slightly higher than the upper limit of the target liquid level range, so it is not necessary to increase the reactivity of the introduction amount control mechanism 3 barely, and the liquid level can be maintained at a substantially constant level. The amount of liquid material (liquid surface height) in the gasification chamber 11a is sufficiently controlled to an appropriate value during the aforementioned time.

Therefore, the liquid level sensor 32 does not need to use an expensive sensor with excellent response speed and sensing performance, and the flow regulating valve 31 can use an inexpensive on-off, on-off and closing valve, etc., which not only controls costs, but also exhibits compactness and large flow Such expected performance.

In addition, when the liquid material overflows into the second lower space 11f each time the liquid material is filled, if the spilled liquid material remains and accumulates as it is, the second lower space 11f will eventually be filled with the liquid material. Moreover, once this state occurs, the effect that the liquid material flows from the first lower space 11e across the partition wall 6 and flows into the second lower space 11f can no longer be expected, so that the above-mentioned function can no longer be exerted, that is, the use of liquid materials The overflow to the second lower space 11f keeps the liquid level constant, thereby delaying the control time of the flow rate regulating valve 31.

However, since the liquid material was vaporized, the liquid material was refilled and reached the upper end of the partition wall 6 to overflow to the second lower space 11f again. The liquid that overflowed into the second lower space 11f in the previous cycle The material vaporizes and almost disappears, so the above problems do not occur. Conversely, it is necessary to set the introduction amount of the liquid material and the liquid surface area of the second lower space 11f as follows: the period during which the liquid material is refilled and passes through the partition wall 6 to overflow into the second lower space 11f again, In the previous cycle, the liquid material overflowing into the second lower space 11f vaporizes and disappears.

On the other hand, as described above, the gasification device 100 of the present embodiment is provided with a plurality of heat transfer members 5 integrally protruding from the inner wall of the gasification chamber 11a, so that the heat from the heater 121 is efficiently applied to the liquid. Material transfer, so even if a large flow of liquid material is continuously introduced into the compact gasification chamber 11a to accelerate the replacement rate of the liquid material, the subsequent temperature decrease can be eliminated, and the liquid material can be quickly heated and maintained at the gasification promotion temperature ,can Stable output of material gas under large flow. In particular, in this embodiment, the heat transfer member 5 uses a residual wall portion formed by perforation, and its cross-sectional shape becomes an irregular shape with unevenness, so the surface area is greatly increased, and extremely efficient heat conduction can be achieved.

In addition, the heater 121 is embedded in the metal wall (inserted into the heater hole 11d) for forming the gasification container 11, and also contributes to the above-mentioned effect from the viewpoint of efficiently transferring heat from the heater 121. In addition, the preheater 2 provided in the front section of the gasifier 1 also contributes to the stable output of the material gas under a large flow rate. This is because the temperature fluctuation when the liquid material flows into the gasification chamber 11a is small, and it is easy to maintain the temperature of the liquid material in the gasification chamber 11a.

(9) Modifications

The present invention is not limited to the embodiments described above.

For example, an extended portion may be provided which extends further upward from the upper end of the partition wall. At this time, by opening holes or the like in the extension portion, the liquid material can overflow from the first lower space to the second lower space at the same height as in the above embodiment.

In addition, as the liquid level sensor, a buoy type liquid level sensor is used in the above embodiment, but a heat capacity type (for example, a resistor with a constant current flowing into the sensor body may be used, for example, the resistance may It generates heat at the temperature of the surrounding environment. When the resistance is in a gas or when immersed in a liquid, the specific heat capacity of the gas and the liquid is used to change the temperature of the resistance. Measuring liquid level) and other ultrasonic, capacitive, pressure, vibration, etc. Liquid level sensor.

As the heat capacity type liquid level sensor, for example, a heat capacity type liquid level sensor composed of a platinum temperature measuring resistor (Pt sensor) can be considered.

In addition, as the heat capacity type liquid level sensor, a heat capacity type liquid level sensor including a thermocouple type temperature sensor and a heating element may be considered, and the heating element enables a temperature measurement contact of the thermocouple type temperature sensor. The temperature is higher than the reference junction temperature. The heating element is, for example, a Pt sensor provided around or near the temperature measurement contact, and the temperature of the temperature measurement contact is made higher than the temperature of the reference contact in advance. In addition, the reference contact is provided at a position that is not heated by the heating element. This can increase the output when the liquid material contacts the temperature-measuring contact (temperature of the temperature-measuring contact-the temperature of the reference contact), and the liquid level of the liquid material can be detected well. On the other hand, when the temperature measuring contact is not heated by a heating element, the output when the liquid material contacts the temperature measuring contact (temperature of the temperature measuring contact-the temperature of the reference contact) is small, and it is difficult to detect the liquid material well. Height of the liquid surface. This is because the temperature of the liquid phase (liquid material) in the gasification chamber is approximately the same as the temperature of the gaseous phase (gasified material) in the gasification chamber. The point produces a temperature difference.

Among the above two types of heat capacity type liquid level sensors, if the miniaturization and reactivity of the sensor are considered, a heat capacity type liquid level sensor composed of a platinum temperature measuring resistor (Pt sensor) is preferred. On the other hand, in consideration of reducing measurement errors due to fluctuations in ambient temperature, a heat capacity type liquid level sensor including a temperature sensor and the heating element is preferred.

Moreover, an emergency stop mechanism may be provided, that is, a second liquid level sensor may be provided, which can detect that the liquid level in the gasification chamber exceeds the target liquid level range. In the case where the upper end of the enclosure and the partition wall is close to the vicinity of the guide outlet, when the second liquid level sensor detects that the liquid level is near the guide outlet, the flow regulating valve that introduces liquid material into the gasification chamber is closed, and an emergency is notified. Stopped content. With this structure, even if an unexpected situation occurs (for example, a failure of the liquid level sensor), it is possible to reliably prevent the unvaporized liquid material from overflowing.

The heat transfer member may be protruded from any part of the inner wall of the gasification chamber. Similar to the above-mentioned embodiment, considering the facilitation of manufacturing, for example, a heat transfer member may be integrally provided from the back surface of the cover body.

In the above embodiment, the remaining wall portion formed by the perforation 11g is used as the heat transfer member 5, but the shape of the heat transfer member is not limited to this, and a gasification container and a heat transfer member may be integrally formed by using a mold. In addition, in the above embodiment, the diameters of the perforations are the same, and the diameters of the perforations may be different.

The heater may not be buried in the gasification container, but may be a type that covers the periphery of the gasification container.

The flow regulating valve is not limited to an on-off, closed-close valve, and may be a type in which the opening degree continuously changes.

The present invention is not limited to the above-mentioned embodiments, and various modifications can be made without departing from the spirit of the present invention.

Claims (7)

  1. A gasification container having a gasification chamber for gasifying a liquid material introduced into the gasification chamber and discharging the generated material gas, wherein the gasification vessel includes a partition wall and a space below the gasification chamber. Divided into a first lower space into which the liquid material is first introduced and a second lower space into which the liquid material overflows from the first lower space; a liquid level sensor that detects the liquid level of the liquid material stored in the gasification chamber And an introduction port for introducing liquid material from the outside of the gasification container to the first lower space; the capacity of the first lower space is greater than the capacity of the second lower space; The upper end of the partition wall is also lower.
  2. The gasification container according to claim 1, wherein a liquid level at which the liquid material starts to overflow into the second lower space is set within a target liquid level range of the liquid material in the gasification chamber, or within the target Above the liquid level range.
  3. The gasification container according to claim 1, further comprising a plurality of heat transfer members protruding from the inner wall surface of the gasification chamber.
  4. The gasification container according to claim 3, further comprising: a block-shaped body having a bottomed hole opened in a predetermined surface; and a lid body for forming the gasification by closing the opening with the bottomed hole. Chamber; the bottomed hole is formed by perforating a plurality of locations on the predetermined surface of the main body; and a residual wall portion formed between the perforation and the perforation functions as the heat transfer member.
  5. The gasification container according to claim 1, wherein the wall body forming the gasification chamber can be embedded with a heater for heating a liquid material.
  6. A gasifier comprising: the container for gasification according to any one of claims 1 to 5; and a heater for heating the gasification container to promote gasification of a liquid material in the gasification chamber.
  7. A gasification device, comprising: the gasifier according to claim 6; a flow regulating valve provided on a liquid material introduction flow path communicating with the gasification chamber; and a control mechanism that controls the flow regulating valve so that the liquid The height of the liquid surface detected by the surface sensor is within a predetermined target liquid level range.
TW104139142A 2014-12-22 2015-11-25 Vaporizing tank, vaporizer and vaporizing device TWI679715B (en)

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CN105716224A (en) 2016-06-29

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