TWI628239B - Compound,colorant composition comprising the same and resin composition comprising the same - Google Patents

Compound,colorant composition comprising the same and resin composition comprising the same Download PDF

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TWI628239B
TWI628239B TW106113674A TW106113674A TWI628239B TW I628239 B TWI628239 B TW I628239B TW 106113674 A TW106113674 A TW 106113674A TW 106113674 A TW106113674 A TW 106113674A TW I628239 B TWI628239 B TW I628239B
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chemical formula
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TW106113674A
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TW201739844A (en
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朴鍾鎬
李多美
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Lg化學股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C211/00Compounds containing amino groups bound to a carbon skeleton
    • C07C211/62Quaternary ammonium compounds
    • C07C211/64Quaternary ammonium compounds having quaternised nitrogen atoms bound to carbon atoms of six-membered aromatic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/02Compounds containing nitrogen atoms doubly-bound to a carbon skeleton containing imino groups
    • C07C251/20Compounds containing nitrogen atoms doubly-bound to a carbon skeleton containing imino groups having carbon atoms of imino groups being part of rings other than six-membered aromatic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C219/00Compounds containing amino and esterified hydroxy groups bound to the same carbon skeleton
    • C07C219/02Compounds containing amino and esterified hydroxy groups bound to the same carbon skeleton having esterified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton
    • C07C219/04Compounds containing amino and esterified hydroxy groups bound to the same carbon skeleton having esterified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated
    • C07C219/06Compounds containing amino and esterified hydroxy groups bound to the same carbon skeleton having esterified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having the hydroxy groups esterified by carboxylic acids having the esterifying carboxyl groups bound to hydrogen atoms or to acyclic carbon atoms of an acyclic saturated carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C311/00Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
    • C07C311/48Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups having nitrogen atoms of sulfonamide groups further bound to another hetero atom
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    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C65/00Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C65/01Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups containing hydroxy or O-metal groups
    • C07C65/03Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups containing hydroxy or O-metal groups monocyclic and having all hydroxy or O-metal groups bound to the ring
    • C07C65/05Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups containing hydroxy or O-metal groups monocyclic and having all hydroxy or O-metal groups bound to the ring o-Hydroxy carboxylic acids
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D303/00Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02Compounds containing oxirane rings
    • C07D303/36Compounds containing oxirane rings with hydrocarbon radicals, substituted by nitrogen atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D305/00Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms
    • C07D305/02Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings
    • C07D305/04Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
    • C07D305/06Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring atoms
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00Diaryl- or thriarylmethane dyes
    • C09B11/04Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10Amino derivatives of triarylmethanes
    • C09B11/12Amino derivatives of triarylmethanes without any OH group bound to an aryl nucleus
    • C09B11/16Preparation from diarylketones or diarylcarbinols, e.g. benzhydrol
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00Diaryl- or thriarylmethane dyes
    • C09B11/04Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10Amino derivatives of triarylmethanes
    • C09B11/12Amino derivatives of triarylmethanes without any OH group bound to an aryl nucleus
    • C09B11/20Preparation from other triarylmethane derivatives, e.g. by substitution, by replacement of substituents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00Other synthetic dyes of known constitution
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00Dyes not provided for by a single group of this subclass
    • C09B69/02Dyestuff salts, e.g. salts of acid dyes with basic dyes
    • C09B69/06Dyestuff salts, e.g. salts of acid dyes with basic dyes of cationic dyes with organic acids or with inorganic complex acids
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0048Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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Abstract

本說明書是有關於一種新穎的化合物、含有其的著色材料組成物以及含有其的樹脂組成物。This specification relates to a novel compound, a coloring material composition containing the same, and a resin composition containing the same.

Description

化合物、含有其的著色材料組成物以及含有其的樹脂組成物Compound, coloring material composition containing the same, and resin composition containing the same

本說明書是有關於一種新穎的化合物、含有其的著色材料組成物以及含有其的樹脂組成物。 This specification relates to a novel compound, a coloring material composition containing the same, and a resin composition containing the same.

近年來,作為液晶顯示器(Liquid Crystal Display,LCD)的光源,多使用發光二極體(Light Emitting Diode,LED)或者有機發光二極體(Organic Light Emitting Diode,OLED)、量子點(Quantum Dot,QD)等元件來代替現有的冷陰極螢光燈(Cold Cathode Fluorescent Lamp,CCFL)。但,為了製作薄膜顯示器及可撓性顯示器等而去除了彩色濾光片的顯示器製品,即,使用LED或OLED、QD等的自發光作為單位像素的顯示器製品正在開發及生產。 In recent years, as a light source of a liquid crystal display (LCD), a light emitting diode (Light Emitting Diode, LED), an organic light emitting diode (Organic Light Emitting Diode, OLED), and a quantum dot (Quantum Dot, QD) and other components to replace the existing Cold Cathode Fluorescent Lamp (CCFL). However, display products in which a color filter is removed in order to produce a thin film display, a flexible display, and the like, that is, display products using self-luminous light such as LEDs, OLEDs, and QDs as unit pixels are being developed and produced.

然而,於使用LED、OLED、QD等作為單位像素的顯示器的情況下,大面積化困難,於使用LED、OLED、QD等的情況下,亦為了開發出包含該些元件來作為光源且包含彩色濾光片的顯示器,而正在進行許多努力。 However, in the case of using LED, OLED, QD, etc. as a display unit pixel, it is difficult to increase the area. In the case of using LED, OLED, QD, etc., in order to develop these elements as light sources and color Filter displays, while many efforts are underway.

為了實現所需的顏色,而要求與光源適合的彩色濾光片,目前,通常應用將顏料用作著色劑的顏料分散法。 In order to achieve a desired color, a color filter suitable for a light source is required. Currently, a pigment dispersion method using a pigment as a colorant is generally applied.

然而,於顏料分散液的情況下,不僅顏料以粒子狀態存在而使光散射,而且藉由顏料的微細化,顏料的表面積急遽增加,由於藉此引起的分散穩定性的惡化而生成不均勻的顏料粒子。 However, in the case of a pigment dispersion liquid, not only the pigment exists in the state of particles to scatter light, but also the surface area of the pigment sharply increases due to the miniaturization of the pigment. As a result, the dispersion stability is deteriorated and unevenness is generated Pigment particles.

因此,被認為是難以滿足最近要求的高亮度、高對比度、高精細化等高品質要求條件的達到極限者。 Therefore, it is considered that it is difficult to meet the requirements of high-quality requirements such as high brightness, high contrast, and high definition that have recently reached the limit.

為了解決所述問題點,達成高亮度、高對比度及高解析度,最近正在研究使用染料代替顏料來作為著色劑。其中,進行了大量的使用三芳基甲烷染料來作為藍色著色劑的嘗試。通常,三芳基甲烷染料於420nm至450m下透光度高,色特性有效果,但由於高於顏料的溶解度而耐化學性下降,且由於低於顏料的耐熱性而於彩色濾光片中有限制地使用。 In order to solve the problems and achieve high brightness, high contrast, and high resolution, research into using dyes as pigments instead of pigments has recently been conducted. Among them, many attempts have been made to use triarylmethane dyes as blue colorants. Generally, triarylmethane dyes have high light transmittance at 420nm to 450m and have effective color characteristics. However, chemical resistance is reduced due to higher solubility than pigments, and they are found in color filters due to lower heat resistance than pigments. Restricted use.

[現有技術文獻] [Prior Art Literature]

[專利文獻] [Patent Literature]

韓國公開專利第2001-0009058號 Korean Published Patent No. 2001-0009058

韓國公開專利第2013-0130976號 Korean Public Patent No. 2013-0130976

本說明書提供一種新穎的化合物、含有其的著色材料組成物以及含有其的樹脂組成物。 This specification provides a novel compound, a coloring material composition containing the same, and a resin composition containing the same.

依據本說明書的一實施態樣,提供一種下述化學式1所表示的化合物。 According to one embodiment of the present specification, a compound represented by the following Chemical Formula 1 is provided.

所述化學式1中,A是由下述化學式A-1或者A-2所表示, In the chemical formula 1, A is represented by the following chemical formula A-1 or A-2,

R1至R6中至少一者為下述化學式a所表示的結構,其餘相互相同或不同,分別獨立地為氫、-R(C=O)R'、-RO(C=O)R'、-ROR'、 、經取代或未經取代的烷基、經取代或未經取代的烯基、經取代或未經取代的環烷基、經取代或未經取代的芳基、或者交聯性基;或者所述R1與R2、R3與R4、以及R5與R6中至少一者可相互鍵結而形成經取代或未經取代的環,R7至R22相互相同或不同,分別獨立地為氫、鹵素、羥基、經取代或未經取代的烷氧基、或者經取代或未經取代的烷基,R及R"相互相同或不同,分別獨立地為直接鍵結、經取代或未經取代的伸烷基、或者經取代或未經取代的伸芳基,R'及R'''相互相同或不同,分別獨立地為氫、經取代或未經取代的烷基、經取代或未經取代的烯基、或者經取代或未經取代的芳基,Z-為陰離子性基, 所述化學式a中,Q 為-R101C(=O)R102-、-R103OC(=O)R104-、-R105C(=O)OR106-、-R107OC(=O)OR108-、、-SOOR115-、-SOR116-、-SR117-、經取代或未經取代的伸烷基、或者經取代或未經取代的伸烯基,X 為羥基、胺基、-OCOOR118、-CONR119R120、或者-NR121COOR122,T為經取代或未經取代的烷基,R101至R109、R111、R112以及R114至R117相互相同或不同,分別獨立地為直接鍵結、經取代或未經取代的伸烷基、經取代或未經取代的伸環烷基、或者經取代或未經取代的伸烯基,R110、R113以及R118至R122相互相同或不同,分別獨立地為氫、或者經取代或未經取代的烷基,p及q分別為1至4的整數,2≦p+q≦5,於p及q分別為2以上的情況下,2個以上的括弧內的結構相互相同或不同,*為與化學式1的N連結的部位,為與所述化學式1連結的部位。 At least one of R1 to R6 is a structure represented by the following chemical formula a, and the rest are the same or different from each other, and are each independently hydrogen, -R (C = O) R ', -RO (C = O) R',- ROR ', , Substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted aryl, or crosslinkable group; or Said that at least one of R1 and R2, R3 and R4, and R5 and R6 may be bonded to each other to form a substituted or unsubstituted ring, R7 to R22 are the same or different from each other, and are each independently hydrogen, halogen, hydroxyl, A substituted or unsubstituted alkoxy group, or a substituted or unsubstituted alkyl group, R and R "are the same or different from each other, and are each independently a directly bonded, substituted or unsubstituted alkylene group, Or substituted or unsubstituted arylene, R 'and R''' are the same or different from each other, and are each independently hydrogen, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, Or a substituted or unsubstituted aryl group, Z - is an anionic group, In the chemical formula a, Q is -R101C (= O) R102-, -R103OC (= O) R104-, -R105C (= O) OR106-, -R107OC (= O) OR108-, ; , -SOOR115-, -SOR116-, -SR117-, substituted or unsubstituted alkylene, or substituted or unsubstituted alkylene, and X is hydroxyl, amine, -OCOOR118, -CONR119R120, or -NR121COOR122, T is a substituted or unsubstituted alkyl group, R101 to R109, R111, R112, and R114 to R117 are the same or different from each other, and are each independently a directly bonded, substituted or unsubstituted alkylene group, A substituted or unsubstituted cycloalkylene group, or a substituted or unsubstituted alkylene group, R110, R113, and R118 to R122 are the same as or different from each other, and are each independently hydrogen, or substituted or unsubstituted Alkyl, p and q are integers from 1 to 4, 2 ≦ p + q ≦ 5, and when p and q are 2 or more, the structures in two or more parentheses are the same or different from each other, and * is the same as The N-linked site of Chemical Formula 1, It is a site | part connected with said chemical formula 1.

依據本說明書的另一實施態樣,提供一種包含所述化學式1所表示的化合物的著色材料組成物。 According to another aspect of the present specification, a coloring material composition including the compound represented by the chemical formula 1 is provided.

依據本說明書的另一實施態樣,提供一種包含所述著色材料組成物的樹脂組成物。 According to another aspect of the present specification, a resin composition including the coloring material composition is provided.

依據本說明書的一實施態樣,提供一種包含所述樹脂組成物的彩色濾光片。 According to an aspect of the present specification, a color filter including the resin composition is provided.

另外,依據本說明書的一實施態樣,提供一種包含所述彩色濾光片的顯示器裝置。 In addition, according to an aspect of the present specification, a display device including the color filter is provided.

本說明書的一實施態樣的化學式1所表示的化合物對溶劑的溶解度優異,耐化學性優異。 The compound represented by Chemical Formula 1 according to one embodiment of the present specification has excellent solubility in a solvent and excellent chemical resistance.

另外,依據本說明書的一實施態樣,較使用現有顏料的情況而言,包含所述化學式1所表示的化合物的著色材料組成物更發揮高亮度,可導入交聯性基來改善三芳基甲烷染料所具有的脆弱的耐化學性。進而,可利用使用其的著色樹脂組成物,來製作耐化學性優異的彩色濾光片。 In addition, according to an embodiment of the present specification, the coloring material composition including the compound represented by the chemical formula 1 exhibits higher brightness than when a conventional pigment is used, and a crosslinkable group can be introduced to improve triarylmethane. The fragile chemical resistance of dyes. Furthermore, a coloring resin composition using the same can be used to produce a color filter excellent in chemical resistance.

圖1是表示本說明書的一實施態樣的實施例1至實施例3以及比較例1的耐化學性評價結果的圖。 FIG. 1 is a view showing the results of chemical resistance evaluation of Examples 1 to 3 and Comparative Example 1 as one embodiment of the present specification.

以下,對本說明書進行更詳細的說明。 Hereinafter, this specification will be described in more detail.

依據本說明書的一實施態樣,提供一種所述化學式1所表示的化合物。 According to an embodiment of the present specification, a compound represented by the chemical formula 1 is provided.

本說明書中,以下對取代基的例示進行說明,但並不限定於此。 In the present specification, examples of the substituent are described below, but the invention is not limited thereto.

所述所謂「取代」的用語是指化合物的鍵結於碳原子上的氫原子改變為其他取代基,所取代的位置若為氫原子被取代的位置、即取代基可取代的位置,則並無限定,於取代2個以上的情況下,2個以上的取代基可相互相同或者不同。 The term "substitution" means that a hydrogen atom bonded to a carbon atom of a compound is changed to another substituent, and if the substituted position is a position where the hydrogen atom is substituted, that is, a position where the substituent can be substituted, then Without limitation, when two or more substituents are substituted, the two or more substituents may be the same as or different from each other.

本說明書中所謂「經取代或未經取代的」的用語是指由如下的取代基所取代或者不具有任何取代基,所述取代基為選自由:氘、鹵素基、腈基、硝基、醯亞胺基、醯胺基、羰基、酯基、羥基、經取代或未經取代的烷基、經取代或未經取代的環烷基、經取代或未經取代的烷氧基、經取代或未經取代的芳基氧基、經取代或未經取代的烷基硫氧基、經取代或未經取代的芳基硫氧基、經取代或未經取代的烷基磺酸氧基、經取代或未經取代的芳基磺酸氧基、經取代或未經取代的烯基、經取代或未經取代的胺基、經取代或未經取代的芳基、以及經取代或未經取代的雜環基所組成的群組中的一種或兩種以上的取代基。 The term "substituted or unsubstituted" in this specification means substituted or not having any substituent selected from the group consisting of: deuterium, halo, nitrile, nitro,醯 imino, 醯 amino, carbonyl, ester, hydroxyl, substituted or unsubstituted alkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkoxy, substituted Or unsubstituted aryloxy, substituted or unsubstituted alkylthiooxy, substituted or unsubstituted arylthiooxy, substituted or unsubstituted alkylsulfonyloxy, Substituted or unsubstituted arylsulfonyloxy, substituted or unsubstituted alkenyl, substituted or unsubstituted amine, substituted or unsubstituted aryl, and substituted or unsubstituted One or two or more substituents in the group consisting of substituted heterocyclic groups.

本說明書中,是指與其他取代基或者鍵結部鍵結的的部位。 In this manual, It is a site | part bonded with another substituent or a bond part.

本說明書中,鹵素基可為氟、氯、溴或碘。 In the present specification, the halogen group may be fluorine, chlorine, bromine or iodine.

本說明書中,醯亞胺基的碳數並無特別限定,較佳為碳數1至30。具體而言,可為如下所述的結構的化合物,但並不限定於此。 In this specification, the carbon number of the fluorene imino group is not particularly limited, but is preferably 1 to 30 carbon numbers. Specifically, the compound may be a compound having a structure described below, but is not limited thereto.

本說明書中,醯胺基中,醯胺基的氮可由氫、碳數1至30的直鏈、分支鏈或環狀烷基或者碳數6至30的芳基所取代。具體而言,可為下述結構式的化合物,但並不限定於此。 In the present specification, in the amidino group, the nitrogen of the amidino group may be substituted by hydrogen, a linear, branched or cyclic alkyl group having 1 to 30 carbon atoms, or an aryl group having 6 to 30 carbon atoms. Specifically, although it may be a compound of the following structural formula, it is not limited to this.

本說明書中,羰基的碳數並無特別限定,較佳為碳數1至30。具體而言,可為如下所述的結構的化合物,但並不限定於此。 In the present specification, the number of carbon atoms of the carbonyl group is not particularly limited, but is preferably 1 to 30 carbon atoms. Specifically, the compound may be a compound having a structure described below, but is not limited thereto.

本說明書中,酯基中,酯基的氧可由碳數1至25的直鏈、分支鏈或環鏈烷基或者碳數6至30的芳基所取代。具體而言, 可為下述結構式的化合物,但並不限定於此。 In the present specification, in the ester group, the oxygen of the ester group may be substituted by a linear, branched or cyclic alkyl group having 1 to 25 carbon atoms or an aryl group having 6 to 30 carbon atoms. in particular, It may be a compound of the following structural formula, but it is not limited thereto.

本說明書中,所述烷基可為直鏈或者分支鏈,碳數並無特別限定,較佳為1至30。具體例有:甲基、乙基、正丙基、異丙基、正丁基、異丁基、第三丁基、第二丁基、1-甲基-丁基、1-乙基-丁基、正戊基、異戊基、新戊基、第三戊基、正己基、1-甲基戊基、2-甲基戊基、4-甲基-2-戊基、3,3-二甲基丁基、2-乙基丁基、正庚基、1-甲基己基、環戊基甲基、環己基甲基、正辛基、第三辛基、1-甲基庚基、2-乙基己基、2-丙基戊基、正壬基、2,2-二甲基庚基、1-乙基-丙基、1,1-二甲基-丙基、異己基、4-甲基己基、5-甲基己基等,但並不限定於此。 In the present specification, the alkyl group may be a straight chain or a branched chain, and the number of carbons is not particularly limited, but is preferably 1 to 30. Specific examples are: methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, third butyl, second butyl, 1-methyl-butyl, 1-ethyl-butyl Base, n-pentyl, isopentyl, neopentyl, third pentyl, n-hexyl, 1-methylpentyl, 2-methylpentyl, 4-methyl-2-pentyl, 3,3- Dimethylbutyl, 2-ethylbutyl, n-heptyl, 1-methylhexyl, cyclopentylmethyl, cyclohexylmethyl, n-octyl, third octyl, 1-methylheptyl, 2-ethylhexyl, 2-propylpentyl, n-nonyl, 2,2-dimethylheptyl, 1-ethyl-propyl, 1,1-dimethyl-propyl, isohexyl, 4 -Methylhexyl, 5-methylhexyl, and the like, but are not limited thereto.

本說明書中,環烷基並無特別限定,較佳為碳數3至30,具體而言有:環丙基、環丁基、環戊基、3-甲基環戊基、2,3-二甲基環戊基、環己基、3-甲基環己基、4-甲基環己基、2,3-二甲基環己基、3,4,5-三甲基環己基、4-第三丁基環己基、環庚基、環辛基等,但並不限定於此。 In this specification, the cycloalkyl group is not particularly limited, but preferably has a carbon number of 3 to 30. Specifically, there are: cyclopropyl, cyclobutyl, cyclopentyl, 3-methylcyclopentyl, 2,3- Dimethylcyclopentyl, cyclohexyl, 3-methylcyclohexyl, 4-methylcyclohexyl, 2,3-dimethylcyclohexyl, 3,4,5-trimethylcyclohexyl, 4-third Butylcyclohexyl, cycloheptyl, cyclooctyl and the like are not limited thereto.

本說明書中,所述烷氧基可為直鏈、分支鏈或環狀。烷氧基的碳數並無特別限定,較佳為碳數1至30。具體而言可為: 甲氧基、乙氧基、正丙氧基、異丙氧基、正丁氧基、異丁氧基、第三丁氧基、第二丁氧基、正戊基氧基、新戊基氧基、異戊基氧基、正己基氧基、3,3-二甲基丁基氧基、2-乙基丁基氧基、正辛基氧基、正壬基氧基、正癸基氧基、苄基氧基、對甲基苄基氧基等,但並不限定於此。 In the present specification, the alkoxy group may be linear, branched, or cyclic. The number of carbon atoms of the alkoxy group is not particularly limited, but is preferably 1 to 30 carbon atoms. Specifically: Methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, third butoxy, second butoxy, n-pentyloxy, neopentyloxy Methyl, isopentyloxy, n-hexyloxy, 3,3-dimethylbutyloxy, 2-ethylbutyloxy, n-octyloxy, n-nonyloxy, n-decyloxy Group, benzyloxy group, p-methylbenzyloxy group, and the like, but are not limited thereto.

本說明書中,胺基可選自由-NH2、烷基胺基、N-芳基烷基胺基、芳基胺基、N-芳基雜芳基胺基、N-烷基雜芳基胺基以及雜芳基胺基所組成的群組中,碳數並無特別限定,較佳為1至30。胺基的具體例有:甲基胺基、二甲基胺基、乙基胺基、二乙基胺基、苯基胺基、萘基胺基、聯苯基胺基、蒽基胺基、9-甲基-蒽基胺基、二苯基胺基、N-苯基萘基胺基、二甲苯基胺基、N-苯基甲苯基胺基、三苯基胺基等,但並不限定於此。 In the present specification, the amine group may be selected from the group consisting of -NH 2 , alkylamino, N-arylalkylamino, arylamino, N-arylheteroarylamine, and N-alkylheteroarylamine. The number of carbon atoms in the group consisting of a group and a heteroarylamino group is not particularly limited, but is preferably 1 to 30. Specific examples of the amino group include methylamino group, dimethylamino group, ethylamino group, diethylamino group, phenylamino group, naphthylamino group, biphenylamino group, anthracenylamino group, 9-methyl-anthrylamido, diphenylamino, N-phenylnaphthylamino, xylylamino, N-phenyltolylamino, triphenylamino, etc., but not Limited to this.

本說明書中,N-烷基芳基胺基是指於胺基的N上取代有烷基及芳基的胺基。 In the present specification, the N-alkylarylamino group refers to an amine group in which an alkyl group and an aryl group are substituted on N of the amine group.

本說明書中,N-芳基雜芳基胺基是指於胺基的N上取代有芳基及雜芳基的胺基。 In the present specification, the N-arylheteroarylamino group refers to an amine group in which an aryl group and a heteroaryl group are substituted on N of the amine group.

本說明書中,N-烷基雜芳基胺基是指於胺基的N上取代有烷基及雜芳基胺基的胺基。 In the present specification, the N-alkylheteroarylamino group refers to an amino group in which an alkyl group and a heteroarylamino group are substituted on N of the amine group.

本說明書中,烷基胺基、N-芳基烷基胺基、烷基硫氧基、烷基磺酸氧基、N-烷基雜芳基胺基中的烷基是如所述烷基的例示所述。具體而言,烷基硫氧基有甲基硫氧基、乙基硫氧基、第三丁基硫氧基、己基硫氧基、辛基硫氧基等,烷基磺酸氧基有甲基、 乙基磺酸氧基、丙基磺酸氧基、丁基磺酸氧基等,但並不限定於此。 In this specification, an alkyl group in an alkylamino group, an N-arylalkylamino group, an alkylthiooxy group, an alkylsulfonic acidoxy group, or an N-alkylheteroarylamino group is an alkyl group as described above. The example is described. Specifically, the alkylthiooxy group includes methylthiooxy group, ethylthiooxy group, third butylthiooxy group, hexylthiooxy group, and octylthiooxy group. base, Ethylsulfonic acidoxy group, propylsulfonic acidoxy group, butylsulfonic acidoxy group, and the like are not limited thereto.

本說明書中,所述烯基可為直鏈或者分支鏈,碳數並無特別限定,較佳為2至30。具體例有:乙烯基、1-丙烯基、異丙烯基、1-丁烯基、2-丁烯基、3-丁烯基、1-戊烯基、2-戊烯基、3-戊烯基、3-甲基-1-丁烯基、1,3-丁二烯基、烯丙基、1-苯基乙烯基-1-基、2-苯基乙烯基-1-基、2,2-二苯基乙烯基-1-基、2-苯基-2-(萘基-1-基)乙烯基-1-基、2,2-雙(二苯基-1-基)乙烯基-1-基、二苯乙烯基、苯乙烯基等,但並不限定於此。 In the present specification, the alkenyl group may be a straight chain or a branched chain, and the number of carbons is not particularly limited, but is preferably 2 to 30. Specific examples are: vinyl, 1-propenyl, isopropenyl, 1-butenyl, 2-butenyl, 3-butenyl, 1-pentenyl, 2-pentenyl, 3-pentene Group, 3-methyl-1-butenyl, 1,3-butadienyl, allyl, 1-phenylvinyl-1-yl, 2-phenylvinyl-1-yl, 2, 2-diphenylvinyl-1-yl, 2-phenyl-2- (naphthyl-1-yl) vinyl-1-yl, 2,2-bis (diphenyl-1-yl) vinyl 1-yl, distyryl, styryl, and the like are not limited thereto.

本說明書中,芳基可為單環式或者多環式。 In this specification, an aryl group may be monocyclic or polycyclic.

於所述芳基為單環式芳基的情況下,碳數並無特別限定,較佳為碳數6至30。具體而言,單環式芳基可列舉苯基、聯苯基、聯三苯基等,但並不限定於此。 In the case where the aryl group is a monocyclic aryl group, the number of carbons is not particularly limited, and preferably 6 to 30 carbons. Specific examples of the monocyclic aryl group include, but are not limited to, phenyl, biphenyl, and bitriphenyl.

於所述芳基為多環式芳基的情況下,碳數並無特別限定,較佳為碳數10至30。具體而言,多環式芳基可列舉:萘基、蒽基、菲基、芘基、苝基、基、茀基等,但並不限定於此。 In the case where the aryl group is a polycyclic aryl group, the number of carbon atoms is not particularly limited, and preferably 10 to 30 carbon atoms. Specific examples of the polycyclic aryl group include naphthyl, anthracenyl, phenanthryl, fluorenyl, fluorenyl, But not limited thereto.

本說明書中,「鄰接的」基團可指於和該取代基被取代的原子直接連結的原子上所取代的取代基、與該取代基在立體結構上位置最接近的取代基、或者於該取代基被取代的原子上取代的其他取代基。例如,於苯環上取代於鄰(ortho)位上的2個取代基以及於脂肪族環上取代於同一碳上的2個取代基可解釋為相互「鄰接的」基團。 In this specification, an "adjacent" group may refer to a substituent substituted on an atom directly connected to the atom to which the substituent is substituted, a substituent closest to the position of the substituent in the stereostructure, or Other substituents substituted on a substituted atom. For example, two substituents substituted at the ortho position on the benzene ring and two substituents substituted on the same carbon on the aliphatic ring can be interpreted as "adjacent" groups to each other.

本說明書中,芳基氧基、芳基硫氧基、芳基磺酸氧基、N-芳基烷基胺基、N-芳基雜芳基胺基以及芳基膦基中的芳基是如所述的芳基的例示所述。具體而言,芳基氧基有:苯氧基、對甲苯基氧基、間甲苯基氧基、3,5-二甲基-苯氧基、2,4,6-三甲基苯氧基、對第三丁基苯氧基、3-聯苯基氧基、4-聯苯基氧基、1-萘基氧基、2-萘基氧基、4-甲基-1-萘基氧基、5-甲基-2-萘基氧基、1-蒽基氧基、2-蒽基氧基、9-蒽基氧基、1-菲基氧基、3-菲基氧基、9-菲基氧基等,芳基硫氧基有:苯基硫氧基、2-甲基苯基硫氧基、4-第三丁基苯基硫氧基等,芳基磺酸氧基有:苯磺酸氧基、對甲苯磺酸氧基等,但並不限定於此。 In this specification, the aryl group in the aryloxy group, arylthiooxy group, arylsulfonic acid group, N-arylalkylamino group, N-arylheteroarylamino group, and arylphosphine group is As described for the exemplification of the aryl group. Specifically, aryloxy includes: phenoxy, p-tolyloxy, m-tolyloxy, 3,5-dimethyl-phenoxy, 2,4,6-trimethylphenoxy P-tert-butylphenoxy, 3-biphenyloxy, 4-biphenyloxy, 1-naphthyloxy, 2-naphthyloxy, 4-methyl-1-naphthyloxy 5-methyl-2-naphthyloxy, 1-anthryloxy, 2-anthyloxy, 9-anthryloxy, 1-phenanthryloxy, 3-phenanthryloxy, 9 -Phenanthryloxy, etc., arylthiooxy is: phenylthio, 2-methylphenylthio, 4-tert-butylphenylthio, etc., and arylsulfoxy is : Benzenesulfonic acid oxy group, p-toluenesulfonic acid oxy group, and the like, but are not limited thereto.

本說明書中,芳基胺基的例子有:經取代或未經取代的單芳基胺基、經取代或未經取代的二芳基胺基、或者經取代或未經取代的三芳基胺基。所述芳基胺基中的芳基可為單環式芳基,亦可為多環式芳基。包含2個以上的所述芳基的芳基胺基可包含單環式芳基、多環式芳基、或者同時包含單環式芳基與多環式芳基。例如,所述芳基胺基中的芳基可選自所述芳基的例示中。 Examples of arylamino groups in this specification are: substituted or unsubstituted monoarylamino groups, substituted or unsubstituted diarylamino groups, or substituted or unsubstituted triarylamino groups . The aryl group in the arylamino group may be a monocyclic aryl group or a polycyclic aryl group. The arylamine group containing two or more of the aryl groups may include a monocyclic aryl group, a polycyclic aryl group, or both a monocyclic aryl group and a polycyclic aryl group. For example, the aryl group in the arylamino group may be selected from the exemplification of the aryl group.

本說明書中,雜芳基為包含1個以上的不為碳的原子、異種原子者,具體而言,所述異種原子可包含1個以上的選自由O、N、Se及S等所組成的群組中的原子。碳數並無特別限定,較佳為碳數2至30,所述雜芳基可為單環式或者多環式。雜環基的例子有:噻吩基、呋喃基、吡咯基、咪唑基、噻唑基、噁唑基、噁二唑基、吡啶基、聯吡啶基、嘧啶基、三嗪基、三唑基、吖啶 基、噠嗪基、吡嗪基、喹啉基、喹唑啉基、喹噁啉基、酞嗪基、吡唑并嘧啶基、吡唑并吡嗪基、吡嗪并吡嗪基、異喹啉基、吲哚基、咔唑基、苯并噁唑基、苯并咪唑基、苯并噻唑基、苯并咔唑基、苯并噻吩基、二苯并噻吩基、苯并呋喃基、啡啉基(phenanthroline)、噻唑基、異噁唑基、噁二唑基、噻二唑基、苯并噻唑基、啡噻嗪基以及二苯并呋喃基等,但並不限定於該些。 In this specification, a heteroaryl group includes one or more atoms other than carbon and heterogeneous atoms. Specifically, the heteroaryl group may include one or more atoms selected from the group consisting of O, N, Se, S, and the like. Atoms in the group. The number of carbons is not particularly limited, but preferably 2 to 30, and the heteroaryl group may be monocyclic or polycyclic. Examples of heterocyclyl are: thienyl, furyl, pyrrolyl, imidazolyl, thiazolyl, oxazolyl, oxadiazolyl, pyridyl, bipyridyl, pyrimidinyl, triazinyl, triazolyl, acryl Pyridine Base, pyridazinyl, pyrazinyl, quinolinyl, quinazolinyl, quinoxaline, phthalazinyl, pyrazolopyrimidyl, pyrazolopyrazinyl, pyrazinopyrazinyl, isoquine Phenyl, indolyl, carbazolyl, benzoxazolyl, benzimidazolyl, benzothiazolyl, benzocarbazolyl, benzothienyl, dibenzothienyl, benzofuranyl, brown Phenanthroline, thiazolyl, isoxazolyl, oxadiazolyl, thiadiazolyl, benzothiazolyl, phenothiazyl, and dibenzofuranyl are not limited to these.

本說明書中,雜芳基胺基的例子有:經取代或未經取代的單雜芳基胺基、經取代或未經取代的二雜芳基胺基、或者經取代或未經取代的三雜芳基胺基。包含2個以上的所述雜芳基的雜芳基胺基可包含單環式雜芳基、多環式雜芳基、或者同時包含單環式雜芳基及多環式雜芳基。例如,所述雜芳基胺基中的雜芳基可選自所述雜芳基的例示中。 Examples of heteroarylamino groups in this specification are: substituted or unsubstituted monoheteroarylamine groups, substituted or unsubstituted diheteroarylamino groups, or substituted or unsubstituted triarylamino groups Heteroarylamino. The heteroarylamine group containing two or more of the heteroaryl groups may include a monocyclic heteroaryl group, a polycyclic heteroaryl group, or both a monocyclic heteroaryl group and a polycyclic heteroaryl group. For example, the heteroaryl group in the heteroarylamino group may be selected from the illustrations of the heteroaryl group.

本說明書中,N-芳基雜芳基胺基以及N-烷基雜芳基胺基中的雜芳基的例示是如所述雜芳基的例示所述。 In the present specification, examples of the heteroaryl group in the N-arylheteroarylamino group and the N-alkylheteroarylamino group are as described above.

本說明書中,雜環基可為單環或者多環,亦可為芳香族、脂肪族或者芳香族與脂肪族的縮合環,可選自所述雜芳基的例示中。 In the present specification, the heterocyclic group may be monocyclic or polycyclic, and may be an aromatic, aliphatic, or aromatic and aliphatic condensed ring, and may be selected from the examples of the heteroaryl group.

本說明書中,伸烷基是指於烷基上有兩個鍵結位置,即二價基。該些除了分別為二價基以外,可應用所述烷基的說明。 In this specification, an alkylene group means that there are two bonding positions on an alkyl group, that is, a divalent group. Except that these are each a divalent group, the description of the alkyl group can be applied.

本說明書中,伸環烷基是指於環烷基上有兩個鍵結位置,即二價基。該些除了分別為二價基以外,可應用所述環烷基的說明。 In this specification, a cycloalkyl group means a divalent group having two bonding positions on the cycloalkyl group. In addition to these being divalent groups, the description of the cycloalkyl group can be applied.

本說明書中,伸芳基是指於芳基上有兩個鍵結位置,即二價基。該些除了分別為二價基以外,可應用所述芳基的說明。 In the present specification, the arylene group means that there are two bonding positions on the aryl group, that is, a divalent group. In addition to these being divalent groups, the description of the aryl group can be applied.

本說明書中,伸雜芳基是指於雜芳基上有兩個鍵結位置,即二價基。該些除了分別為二價基以外,可應用所述雜芳基的說明。 In the present specification, a heteroaryl group means that there are two bonding positions on a heteroaryl group, that is, a divalent group. In addition to these being divalent groups, the description of the heteroaryl group can be applied.

依據本說明書的一實施態樣,所述化學式1是由下述化學式1-1或者1-2所表示。 According to an aspect of the present specification, the chemical formula 1 is represented by the following chemical formulas 1-1 or 1-2.

所述化學式1-1及1-2中, R1至R4、R7至R14以及Z-的定義與所述化學式1相同,R5、R6、R15至R22的定義與所述化學式A-1及A-2相同。 In Chemical Formula 1-1 and 1-2, R1 to R4, R7 to R14 and Z - is the same as defined in Chemical Formula 1, R5, definition of R6, R15 to R22 and the chemical formulas A-1 and A- 2 are the same.

依據本說明書的一實施態樣,所述R1至R6中至少一者為所述化學式a所表示的結構,其餘相互相同或不同,分別獨立地為氫、-ROR'、經取代或未經取代的烷基、經取代或未經取代的烯基、經取代或未經取代的芳基、或者交聯性基。 According to an embodiment of the present specification, at least one of R1 to R6 is a structure represented by the chemical formula a, and the rest are the same or different from each other, and are each independently hydrogen, -ROR ', substituted or unsubstituted. Alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted aryl, or crosslinkable group.

依據本說明書的一實施態樣,所述化學式1中,R1至R6中至少一者為所述化學式a所表示的結構,其餘相互相同或不同,分別獨立地為氫、-ROR'、經取代或未經取代的烷基、經取代或未經取代的烯基、經取代或未經取代的芳基、或者交聯性基。 According to an embodiment of the present specification, in the chemical formula 1, at least one of R1 to R6 is a structure represented by the chemical formula a, and the rest are the same or different from each other, and are each independently hydrogen, -ROR ', substituted Or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted aryl, or crosslinkable group.

依據本說明書的一實施態樣,所述R1至R6中至少一者為所述化學式a所表示的結構,其餘相互相同或不同,分別獨立地為氫、-ROR'、經羥基所取代或未經取代的烷基、烯基、經烷基所取代或未經取代的芳基、或者交聯性基。 According to an embodiment of the present specification, at least one of R1 to R6 is a structure represented by the chemical formula a, and the rest are the same or different from each other, and are each independently hydrogen, -ROR ', substituted or unsubstituted by a hydroxyl group. A substituted alkyl group, an alkenyl group, an aryl group substituted or unsubstituted, or a crosslinkable group.

依據本說明書的一實施態樣,所述R1至R6中至少一者為所述化學式a所表示的結構,其餘相互相同或不同,分別獨立地為氫、-ROR'、經羥基所取代或未經取代的乙基、乙烯基、烷基、經取代或未經取代的苯基、或者交聯性基。 According to an embodiment of the present specification, at least one of R1 to R6 is a structure represented by the chemical formula a, and the rest are the same or different from each other, and are each independently hydrogen, -ROR ', substituted or unsubstituted by a hydroxyl group. A substituted ethyl, vinyl, alkyl, substituted or unsubstituted phenyl, or crosslinkable group.

依據本說明書的一實施態樣,所述R1至R6中至少一者為所述化學式a所表示的結構,其餘相互相同或不同,分別獨立地為氫、-ROR'、經羥基所取代或未經取代的乙基、乙烯基、經選自由甲基及乙基所組成的群組中的一種以上取代基所取代或未經 取代的苯基、或者交聯性基。 According to an embodiment of the present specification, at least one of R1 to R6 is a structure represented by the chemical formula a, and the rest are the same or different from each other, and are each independently hydrogen, -ROR ', substituted or unsubstituted by a hydroxyl group. Substituted ethyl, vinyl, unsubstituted or substituted with one or more substituents selected from the group consisting of methyl and ethyl A substituted phenyl group or a crosslinkable group.

依據本說明書的另一實施態樣,所述R為經取代或未經取代的伸烷基、或者經取代或未經取代的伸環烷基。 According to another aspect of the present specification, the R is a substituted or unsubstituted alkylene group, or a substituted or unsubstituted cycloalkylene group.

依據本說明書的另一實施態樣,所述R為伸烷基、或者伸環烷基。 According to another aspect of the present specification, R is an alkylene group or a cycloalkylene group.

依據本說明書的另一實施態樣,所述R為伸乙基、或者伸環己基。 According to another embodiment of the present specification, the R is an ethylidene group or a cyclohexyl group.

依據本說明書的另一實施態樣,所述R'為經取代或未經取代的烷基。 According to another embodiment of the present specification, R ′ is a substituted or unsubstituted alkyl group.

依據本說明書的另一實施態樣,所述R'為烷基。 According to another aspect of the present specification, R ′ is an alkyl group.

依據本說明書的另一實施態樣,所述R'為乙烯基。 According to another embodiment of the present specification, R ′ is a vinyl group.

依據本說明書的一實施態樣,所述交聯性基是由下述化學式2至5中任一者所表示的結構。 According to an embodiment of the present specification, the crosslinkable group has a structure represented by any one of the following chemical formulas 2 to 5.

[化學式5] [Chemical Formula 5]

所述化學式2至5中,所述R201至R203相互相同或不同,分別獨立地為氫、或者經取代或未經取代的烷基,R204至R207相互相同或不同,分別獨立地為直接鍵結、O、NR208、經取代或未經取代的伸烷基、或者經取代或未經取代的伸環烷基,R208為氫、或者經取代或未經取代的烷基,r、s、t及u分別為1或2,於所述r、s、t及u分別為2的情況下,2個括弧內的結構可相同或不同。 In the chemical formulas 2 to 5, the R201 to R203 are the same or different from each other, and are independently hydrogen or a substituted or unsubstituted alkyl group, and the R204 to R207 are the same or different from each other, and are each independently directly bonded. , O, NR208, substituted or unsubstituted alkylene, or substituted or unsubstituted cycloalkyl, R208 is hydrogen, or substituted or unsubstituted alkyl, r, s, t and u is 1 or 2, respectively, and in the case where r, s, t, and u are 2, the structures in the two parentheses may be the same or different.

依據本說明書的一實施態樣,所述化學式2中,R201為氫、或者烷基。 According to an embodiment of the present specification, in the chemical formula 2, R201 is hydrogen or an alkyl group.

依據本說明書的一實施態樣,所述化學式2中,R201為氫、或者甲基。 According to an embodiment of the present specification, in the chemical formula 2, R201 is hydrogen or methyl.

依據本說明書的一實施態樣,所述化學式2中,R204為直接鍵結、O、NR208、伸烷基、或者伸環烷基。 According to an embodiment of the present specification, in the chemical formula 2, R204 is a direct bond, O, NR208, an alkylene group, or a cycloalkylene group.

依據本說明書的一實施態樣,所述化學式2中,R204為直接鍵結、O、NR208、伸乙基、或者伸環己基。 According to an embodiment of the present specification, in the chemical formula 2, R204 is a direct bond, O, NR208, ethylene, or cyclohexyl.

依據本說明書的一實施態樣,所述化學式3中,R205為直接鍵結、或者伸烷基。 According to an embodiment of the present specification, in the chemical formula 3, R205 is a direct bond or an alkylene group.

依據本說明書的一實施態樣,所述化學式3中,R205為直接鍵結、或者亞甲基。 According to an embodiment of the present specification, in the chemical formula 3, R205 is a direct bond or a methylene group.

依據本說明書的一實施態樣,所述化學式4中,R202為氫。 According to an embodiment of the present specification, in the chemical formula 4, R202 is hydrogen.

依據本說明書的一實施態樣,所述化學式4中,R206為直接鍵結、或者伸烷基。 According to an embodiment of the present specification, in the chemical formula 4, R206 is a direct bond or an alkylene group.

依據本說明書的一實施態樣,所述化學式4中,R206為直接鍵結、或者亞甲基。 According to an embodiment of the present specification, in the chemical formula 4, R206 is a direct bond or a methylene group.

依據本說明書的一實施態樣,所述化學式5中,R203為氫、碳數1至4的烷基。 According to an embodiment of the present specification, in the chemical formula 5, R203 is hydrogen and an alkyl group having 1 to 4 carbon atoms.

依據本說明書的一實施態樣,所述化學式5中,R207為直接鍵結、或者伸烷基。 According to an embodiment of the present specification, in the chemical formula 5, R207 is a direct bond or an alkylene group.

依據本說明書的一實施態樣,所述化學式5中,R207為直接鍵結、或者亞甲基。 According to an embodiment of the present specification, in the chemical formula 5, R207 is a direct bond or a methylene group.

依據本說明書的一實施態樣,所述R208為氫、或者碳數1至4的烷基。 According to an embodiment of the present specification, the R208 is hydrogen or an alkyl group having 1 to 4 carbon atoms.

依據本說明書的一實施態樣,所述化學式a中,X相對於T與化學式a的苯基鍵結的位置而鍵結於鄰(ortho)位上。 According to an embodiment of the present specification, in the chemical formula a, X is bonded to an ortho position with respect to the position where T is bonded to the phenyl group of the chemical formula a.

依據本說明書的一實施態樣,所述化學式1中,Z-為陰離子性基,所述陰離子性基並無特別限定,例如可應用:美國專利第7,939,644號、日本專利特開2006-003080號、日本專利特開2006-001917號、日本專利特開2005-159926號、日本專利特開 2007-7028897號、日本專利特開2005-071680號、韓國申請公開第2007-7000693號、日本專利特開2005-111696號、日本專利特開2008-249663號中記載的陰離子。 According to an embodiment of the present specification, in the chemical formula 1, Z - is an anionic group, and the anionic group is not particularly limited. For example, it can be applied: US Patent No. 7,939,644, Japanese Patent Laid-Open No. 2006-003080 , Japanese Patent Laid-Open No. 2006-001917, Japanese Patent Laid-Open No. 2005-159926, Japanese Patent Laid-Open No. 2007-7028897, Japanese Patent Laid-Open No. 2005-071680, Korean Application Publication No. 2007-7000693, Japanese Patent Laid-Open Anions described in 2005-111696 and Japanese Patent Laid-Open No. 2008-249663.

所述陰離子的具體例有:三氟甲磺酸根陰離子、雙(三氟甲基磺醯基)醯胺陰離子、雙三氟甲磺醯亞胺陰離子、雙全氟乙基磺醯亞胺陰離子、四苯基硼酸根陰離子、四(4-氟苯基)硼酸鹽、四(五氟苯基)硼酸鹽、三-三氟甲磺醯基甲基化物、磷酸根離子、硝酸根離子、碳酸根離子、亞硫酸根離子、鹵素基,例如溴基、氟基、碘基、氯基等。 Specific examples of the anion include trifluoromethanesulfonate anion, bis (trifluoromethylsulfonyl) fluorenimide anion, bistrifluoromethanesulfonimide anion, bisperfluoroethylsulfonimide anion, Phenylborate anion, tetra (4-fluorophenyl) borate, tetra (pentafluorophenyl) borate, tris-trifluoromethanesulfonylmethylate, phosphate ion, nitrate ion, carbonate ion , Sulfite ion, halogen group, such as bromo, fluoro, iodo, chloro and the like.

另外,所述Z-是指包含硼、鋁的陰離子;包含選自由鎢、鉬、矽及磷所組成的群組中的一種以上的元素及氧的陰離子。特別是,所述Z-可包含鎢磷酸的陰離子、鎢矽酸的陰離子、或者鎢系同多酸的陰離子。 Further, the Z - anion comprises means boron, aluminum; selected from the group comprising tungsten, molybdenum, the group, consisting of silicon and phosphorus and one or more elements of oxygen and anions. In particular, the Z - anion may include tungsten acid, tungsten silicate anions, isopoly or tungsten anion of an acid.

依據本說明書的一實施態樣,所述化學式1中,Z-為:包含鹵化烴基的磺醯亞胺酸;包含磺酸的陰離子;包含鹵素、硼、鋁的陰離子;或者包含選自由鎢、鉬、矽及磷所組成的群組中的一種以上的元素及氧的陰離子。 According to an embodiment aspect of the present specification, the Chemical Formula 1, Z - is: sulfonylureas imidate containing a halogenated hydrocarbon group; containing sulphonic acid; halogen-containing, boron, aluminum anions; comprising or selected from the group consisting of tungsten, An anion of one or more elements and oxygen in a group consisting of molybdenum, silicon, and phosphorus.

依據本說明書的一實施態樣,所述化學式a中,Q為-R101C(=O)R102-、或者-R103OC(=O)R104-。 According to an embodiment of the present specification, in the chemical formula a, Q is -R101C (= O) R102-, or -R103OC (= O) R104-.

依據本說明書的另一實施態樣,所述R101至R104相互相同或不同,分別獨立地為直接鍵結、經取代或未經取代的伸烷基、或者經取代或未經取代的伸環烷基。 According to another embodiment of the present specification, the R101 to R104 are the same as or different from each other, and are each independently a direct bond, a substituted or unsubstituted alkylene, or a substituted or unsubstituted cycloalkane base.

依據本說明書的另一實施態樣,所述R101至R104相互相同或不同,分別獨立地為直接鍵結、伸烷基、或者伸環烷基。 According to another embodiment of the present specification, the R101 to R104 are the same as or different from each other, and are each independently a direct bond, an alkylene group, or a cycloalkylene group.

依據本說明書的另一實施態樣,所述R101至R104相互相同或不同,分別獨立地為直接鍵結、亞甲基、伸乙基、或者伸環己基。 According to another embodiment of the present specification, the R101 to R104 are the same as or different from each other, and are each independently a direct bond, a methylene group, an ethylene group, or a cyclohexyl group.

依據本說明書的一實施態樣,所述化學式a中,X為羥基、-OCOOR118。 According to an embodiment of the present specification, in the chemical formula a, X is a hydroxyl group and -OCOOR118.

依據本說明書的另一實施態樣,R118為氫、或者經取代或未經取代的烷基。 According to another aspect of the present specification, R118 is hydrogen, or a substituted or unsubstituted alkyl group.

依據本說明書的另一實施態樣,R118為氫、或者烷基。 According to another aspect of the present specification, R118 is hydrogen or alkyl.

依據本說明書的另一實施態樣,R118為氫、或者第三丁基。 According to another embodiment of the present specification, R118 is hydrogen or a third butyl group.

依據本說明書的一實施態樣,所述化學式a中,T為經取代或未經取代的烷基。 According to an embodiment of the present specification, in the chemical formula a, T is a substituted or unsubstituted alkyl group.

依據本說明書的一實施態樣,所述化學式a中,T為烷基。 According to an embodiment of the present specification, in the chemical formula a, T is an alkyl group.

依據本說明書的一實施態樣,所述化學式a中,T為第三丁基。 According to an embodiment of the present specification, in the chemical formula a, T is a third butyl group.

依據本說明書的一實施態樣,所述化學式1可選自下述化合物中,但並非僅限定於此。 According to an embodiment of the present specification, the chemical formula 1 may be selected from the following compounds, but is not limited thereto.

所述化學式1所表示的化合物可以後述製造例為參考來製造。 The compound represented by the said Chemical Formula 1 can be manufactured with reference to the manufacturing example mentioned later as a reference.

依據本說明書的一實施態樣,提供一種包含所述化學式1所表示的化合物的著色材料組成物。 According to an aspect of the present specification, a coloring material composition including the compound represented by the chemical formula 1 is provided.

所述著色材料組成物除了包含所述化學式1所表示的化合物以外,可更包含染料及顏料中的至少一種。例如,所述著色材料組成物亦可僅包含所述化學式1所表示的化合物,亦可包含所述化學式1所表示的化合物與一種以上的染料,或者包含所述化學式1所表示的化合物與一種以上的顏料,或者包含所述化學式1所表示的化合物、一種以上的染料以及一種以上的顏料。本 說明書的一實施態樣中,提供一種包含所述著色材料組成物的樹脂組成物。 The coloring material composition may include at least one of a dye and a pigment in addition to the compound represented by the chemical formula 1. For example, the coloring material composition may include only the compound represented by the chemical formula 1, or the compound represented by the chemical formula 1 and one or more dyes, or the compound represented by the chemical formula 1 and one kind. The above pigments may include the compound represented by Chemical Formula 1, one or more dyes, and one or more pigments. this In one aspect of the specification, a resin composition including the coloring material composition is provided.

本說明書的一實施態樣中,所述樹脂組成物可更包含黏合劑樹脂、多官能性單體、抗氧化劑、光起始劑、以及溶媒。 In an embodiment of the present specification, the resin composition may further include a binder resin, a polyfunctional monomer, an antioxidant, a photoinitiator, and a solvent.

所述黏合劑樹脂若為可顯示出由樹脂組成物所製造的膜的強度、顯影性等物性者,則並無特別限定。 The binder resin is not particularly limited as long as it exhibits physical properties such as strength and developability of a film produced from a resin composition.

所述黏合劑樹脂可使用賦予機械強度的多官能性單體與賦予鹼溶解性的單體的共聚合樹脂,可更包含該技術領域中通常使用的黏合劑。 The binder resin may be a copolymerized resin of a polyfunctional monomer that imparts mechanical strength and a monomer that imparts alkali solubility, and may further include a binder commonly used in the technical field.

賦予所述膜的機械強度的多官能性單體可為不飽和羧酸酯類、芳香族乙烯基類、不飽和醚類、不飽和醯亞胺類、以及酸酐中的任一種以上。 The polyfunctional monomer that imparts mechanical strength to the film may be any one or more of unsaturated carboxylic acid esters, aromatic vinyls, unsaturated ethers, unsaturated sulfonimines, and acid anhydrides.

所述不飽和羧酸酯類的具體例可選自由以下化合物所組成的群組中:(甲基)丙烯酸苄酯、(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸二甲基胺基乙酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸異冰片酯、(甲基)丙烯酸乙基己酯、(甲基)丙烯酸2-苯氧基乙酯、(甲基)丙烯酸四氫糠酯、(甲基)丙烯酸羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸2-羥基-3-氯丙酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸醯基辛基氧基-2-羥基丙酯、丙三醇(甲基)丙烯酸酯、(甲基)丙烯酸2-甲氧基乙酯、(甲基)丙烯酸3-甲氧基丁酯、乙氧基二乙二醇(甲基)丙烯酸酯、甲氧基三乙二醇(甲 基)丙烯酸酯、甲氧基三丙二醇(甲基)丙烯酸酯、聚(乙二醇)甲醚(甲基)丙烯酸酯、苯氧基二乙二醇(甲基)丙烯酸酯、對壬基苯氧基聚乙二醇(甲基)丙烯酸酯、對壬基苯氧基聚丙二醇(甲基)丙烯酸酯、(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸四氟丙酯、(甲基)丙烯酸1,1,1,3,3,3-六氟異丙酯、(甲基)丙烯酸八氟戊酯、(甲基)丙烯酸十七氟癸酯、(甲基)丙烯酸三溴苯酯、α-羥基甲基丙烯酸甲酯、α-羥基甲基丙烯酸乙酯、α-羥基甲基丙烯酸丙酯以及α-羥基甲基丙烯酸丁酯,但並非僅限定於該些。 Specific examples of the unsaturated carboxylic acid esters can be selected from the group consisting of benzyl (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate, (methyl) ) Butyl acrylate, dimethylaminoethyl (meth) acrylate, isobutyl (meth) acrylate, tertiary butyl (meth) acrylate, cyclohexyl (meth) acrylate, (meth) Isobornyl acrylate, ethylhexyl (meth) acrylate, 2-phenoxyethyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, hydroxyethyl (meth) acrylate, (methyl) ) 2-hydroxypropyl acrylate, 2-hydroxy-3-chloropropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, fluorenyl octyloxy-2-hydroxypropyl (meth) acrylate Ester, glycerol (meth) acrylate, 2-methoxyethyl (meth) acrylate, 3-methoxybutyl (meth) acrylate, ethoxydiethylene glycol (meth) acrylate Esters, methoxytriethylene glycol (methyl Base) acrylate, methoxytripropylene glycol (meth) acrylate, poly (ethylene glycol) methyl ether (meth) acrylate, phenoxydiethylene glycol (meth) acrylate, p-nonylbenzene Oxypolyethylene glycol (meth) acrylate, p-nonylphenoxy polypropylene glycol (meth) acrylate, glycidyl (meth) acrylate, tetrafluoropropyl (meth) acrylate, (meth) ) Hexafluoroisopropyl 1,1,1,3,3,3-acrylic acid, octafluoropentyl (meth) acrylate, heptafluorodecyl (meth) acrylate, tribromophenyl (meth) acrylate Α-hydroxymethyl methacrylate, α-hydroxymethacrylate, α-hydroxymethacrylate, and α-hydroxymethacrylate, but it is not limited to these.

所述芳香族乙烯基單體類的具體例可選自由苯乙烯、α-甲基苯乙烯、(鄰、間、對)-乙烯基甲苯、(鄰、間、對)-甲氧基苯乙烯、以及(鄰、間、對)-氯苯乙烯所組成的群組中,但並非僅限定於該些。 Specific examples of the aromatic vinyl monomers include free styrene, α-methylstyrene, (o-, m-, p-)-vinyltoluene, (o-, m-, p-)-methoxystyrene And (ortho, meta, para) -chlorostyrene, but not limited to these.

所述不飽和醚類的具體例可選自由乙烯基甲醚、乙烯基乙醚、以及烯丙基縮水甘基醚所組成的群組中,但並非僅限定於該些。 Specific examples of the unsaturated ethers may be selected from the group consisting of vinyl methyl ether, vinyl ether, and allyl glycidyl ether, but are not limited to these.

所述不飽和醯亞胺類的具體例可選自由N-苯基順丁烯二醯亞胺、N-(4-氯苯基)順丁烯二醯亞胺、N-(4-羥基苯基)順丁烯二醯亞胺、以及N-環己基順丁烯二醯亞胺所組成的群組中,但並非僅限定於該些。 Specific examples of the unsaturated fluorene imines can be selected from N-phenylcis butylene diimide, N- (4-chlorophenyl) cis butylene diimide, and N- (4-hydroxybenzene Group), but is not limited to this group consisting of maleimide diimide and N-cyclohexylmaleimide.

所述酸酐有順丁烯二酸酐、甲基順丁烯二酸酐、四氫鄰苯二甲酸酐等,但並非僅限定於該些。 The acid anhydride includes maleic anhydride, methyl maleic anhydride, tetrahydrophthalic anhydride, and the like, but is not limited to these.

賦予所述鹼溶解性的單體若為包含酸基者,則並無特別 限定,例如較佳為使用選自由(甲基)丙烯酸、丁烯酸、衣康酸、順丁烯二酸、反丁烯二酸、單甲基順丁烯二酸、5-降冰片烯-2-羧酸、鄰苯二甲酸單-2-((甲基)丙烯醯氧基)乙酯、丁二酸單-2-((甲基)丙烯醯氧基)乙酯、ω-羧基聚己內酯單(甲基)丙烯酸酯所組成的群組中的一種以上,但並非僅限定於該些。 If the monomer which provides the said alkali solubility is an acid group, it does not have a special thing. The limitation is, for example, preferably selected from (meth) acrylic acid, butenoic acid, itaconic acid, maleic acid, fumaric acid, monomethyl maleic acid, 5-norbornene- 2-carboxylic acid, mono-2-(((meth) acryloxy) ethyl) phthalate, mono-2-(((meth) acryl) oxy) ethyl succinate, ω-carboxy poly One or more of the group consisting of caprolactone mono (meth) acrylate is not limited to these.

依據本說明書的一實施態樣,所述黏合劑樹脂的酸價為50KOH mg/g至130KOH mg/g,重量平均分子量為1,000至50,000。 According to an embodiment of the present specification, the acid value of the adhesive resin is 50 KOH mg / g to 130 KOH mg / g, and the weight average molecular weight is 1,000 to 50,000.

所述多官能性單體為具有藉由光而形成光阻像的作用的單體,具體而言可為選自由丙二醇甲基丙烯酸酯、二季戊四醇六丙烯酸酯、二季戊四醇丙烯酸酯、新戊二醇二丙烯酸酯、6-己二醇二丙烯酸酯、1,6-己二醇丙烯酸酯四乙二醇甲基丙烯酸酯、雙苯氧基乙醇二丙烯酸酯、三羥基乙基異氰脲酸酯三甲基丙烯酸酯、三甲基丙烷三甲基丙烯酸酯、二苯基季戊四醇六丙烯酸酯、季戊四醇三甲基丙烯酸酯、季戊四醇四甲基丙烯酸酯以及二季戊四醇六甲基丙烯酸酯所組成的群組中的一種或者兩種以上的混合物。 The polyfunctional monomer is a monomer having a function of forming a photoresist image by light, and specifically may be selected from propylene glycol methacrylate, dipentaerythritol hexaacrylate, dipentaerythritol acrylate, neopentyl Alcohol diacrylate, 6-hexanediol diacrylate, 1,6-hexanediol acrylate tetraethylene glycol methacrylate, bisphenoxyethanol diacrylate, trihydroxyethyl isocyanurate A group of trimethacrylate, trimethylpropane trimethacrylate, diphenyl pentaerythritol hexaacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, and dipentaerythritol hexamethacrylate One or a mixture of two or more of them.

所述光起始劑若為藉由光而產生自由基來觸發交聯的起始劑,則並無特別限定,例如可為選自由苯乙酮系化合物、聯咪唑系化合物、三嗪系化合物、以及肟系化合物所組成的群組中的一種以上。 The photoinitiator is not particularly limited as long as it is an initiator that generates free radicals by light to trigger cross-linking. And one or more of the group consisting of oxime-based compounds.

所述苯乙酮系化合物有:2-羥基-2-甲基-1-苯基丙烷-1- 酮、1-(4-異丙基苯基)-2-羥基-2-甲基丙烷-1-酮、4-(2-羥基乙氧基)-苯基-(2-羥基-2-丙基)酮、1-羥基環己基苯基酮、安息香甲醚、安息香乙醚、安息香異丁醚、安息香丁醚、2,2-二甲氧基-2-苯基苯乙酮、2-甲基-(4-甲硫基)苯基-2-嗎啉基-1-丙烷-1-酮、2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁烷-1-酮、2-(4-溴-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁烷-1-酮或者2-甲基-1-[4-(甲硫基)苯基)]-2-嗎啉基丙烷-1-酮等,並不限定於此。 The acetophenone compounds are: 2-hydroxy-2-methyl-1-phenylpropane-1- Ketone, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropane-1-one, 4- (2-hydroxyethoxy) -phenyl- (2-hydroxy-2-propane Ketone), 1-hydroxycyclohexylphenyl ketone, benzoin methyl ether, benzoin ethyl ether, benzoin isobutyl ether, benzoin butyl ether, 2,2-dimethoxy-2-phenylacetophenone, 2-methyl -(4-methylthio) phenyl-2-morpholinyl-1-propane-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinylphenyl)- Butane-1-one, 2- (4-bromo-benzyl-2-dimethylamino-1- (4-morpholinylphenyl) -butane-1-one, or 2-methyl-1 -[4- (methylthio) phenyl)]-2-morpholinylpropane-1-one and the like are not limited thereto.

所述聯咪唑系化合物有:2,2-雙(2-氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(鄰氯苯基)-4,4',5,5'-四(3,4,5-三甲氧基苯基)-1,2'-聯咪唑、2,2'-雙(2,3-二氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(鄰氯苯基)-4,4,5,5'-四苯基-1,2'-聯咪唑等,並不限定於此。 The biimidazole-based compounds include: 2,2-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o-chlorophenyl)- 4,4 ', 5,5'-tetra (3,4,5-trimethoxyphenyl) -1,2'-biimidazole, 2,2'-bis (2,3-dichlorophenyl)- 4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o-chlorophenyl) -4,4,5,5'-tetraphenyl-1,2'-biimidazole, etc. Is not limited to this.

所述三嗪系化合物有:3-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}丙酸、3-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}丙酸1,1,1,3,3,3-六氟異丙酯、2-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}乙酸乙酯、2-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}乙酸2-環氧基乙酯、2-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}乙酸環己酯、2-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}乙酸苄酯、3-{氯-4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}丙酸、3-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}丙醯胺、2,4-雙(三氯甲基)-6-對甲氧基苯乙烯基-均三嗪、2,4-雙(三氯甲基)-6-(1-對二甲基胺基苯基)-1,3-丁二烯基-均三嗪、2-三氯甲基-4-胺基-6-對甲氧基苯乙烯基-均三嗪等,並不限定於此。 The triazine-based compound includes: 3- {4- [2,4-bis (trichloromethyl) -s-triazine-6-yl] phenylthio} propanoic acid, 3- {4- [2,4 -Bis (trichloromethyl) -mesytriazin-6-yl] phenylthio} propanoic acid 1,1,1,3,3,3-hexafluoroisopropyl ester, 2- {4- [2,4 -Bis (trichloromethyl) -mesytriazin-6-yl] phenylthio} ethyl acetate, 2- {4- [2,4-bis (trichloromethyl) -mesytriazin-6-yl ] Phenylthio} 2-epoxyethyl acetate, 2- {4- [2,4-bis (trichloromethyl) -trisazine-6-yl] phenylthio} cyclohexyl acetate, 2 -{4- [2,4-bis (trichloromethyl) -mesytriazin-6-yl] phenylthio} benzyl acetate, 3- {chloro-4- [2,4-bis (trichloromethyl) ) -Mesytriazine-6-yl] phenylthio} propanoic acid, 3- {4- [2,4-bis (trichloromethyl) -mesytriazin-6-yl] phenylthio} propanyl Amine, 2,4-bis (trichloromethyl) -6-p-methoxystyryl-s-triazine, 2,4-bis (trichloromethyl) -6- (1-p-dimethylamine Phenyl) -1,3-butadienyl-s-triazine, 2-trichloromethyl-4-amino-6-p-methoxystyryl-s-triazine, etc. are not limited thereto .

所述肟系化合物有:1,2-辛二酮-1-(4-苯硫基)苯基-2-(鄰苯甲醯基肟)(汽巴-嘉基(Ciba-Geigy)公司,CGI124)、乙酮-1-(9-乙基)-6-(2-甲基苯甲醯基-3-基)-1-(O-乙醯基肟)(CGI242)、N-1919(艾迪科(ADEKA)公司)等,並不限定於此。 The oxime-based compounds include: 1,2-octanedione-1- (4-phenylthio) phenyl-2- (o-benzoyl oxime) (Ciba-Geigy), CGI124), ethyl ketone-1- (9-ethyl) -6- (2-methylbenzylidene-3-yl) -1- (O-acetamidooxime) (CGI242), N-1919 ( ADEKA, etc.) is not limited to this.

所述溶媒可為選自由以下化合物所組成的群組中的一種以上:丙酮、甲基乙基酮、甲基異丁基酮、甲基溶纖劑、乙基溶纖劑、四氫呋喃、1,4-二噁烷、乙二醇二甲醚、乙二醇二乙醚、丙二醇二甲醚、丙二醇二乙醚、二乙二醇二甲醚、二乙二醇二乙醚、二乙二醇甲基乙醚、氯仿、二氯甲烷、1,2-二氯乙烷、1,1,1-三氯乙烷、1,1,2-三氯乙烷、1,1,2-三氯乙烯、己烷、庚烷、辛烷、環己烷、苯、甲苯、二甲苯、甲醇、乙醇、異丙醇、丙醇、丁醇、第三丁醇、2-乙氧基丙醇、2-甲氧基丙醇、3-甲氧基丁醇、環己酮、環戊酮、丙二醇甲醚乙酸酯、丙二醇乙醚乙酸酯、3-甲氧基丁基乙酸酯、3-乙氧基丙酸乙酯、乙基溶纖劑乙酸酯、甲基溶纖劑乙酸酯、丁基乙酸酯、丙二醇單甲醚以及二丙二醇單甲醚,但並非僅限定於此。 The solvent may be one or more selected from the group consisting of acetone, methyl ethyl ketone, methyl isobutyl ketone, methyl cellosolve, ethyl cellosolve, tetrahydrofuran, 1, 4-Dioxane, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ether , Chloroform, dichloromethane, 1,2-dichloroethane, 1,1,1-trichloroethane, 1,1,2-trichloroethane, 1,1,2-trichloroethylene, hexane , Heptane, octane, cyclohexane, benzene, toluene, xylene, methanol, ethanol, isopropanol, propanol, butanol, tertiary butanol, 2-ethoxypropanol, 2-methoxy Propanol, 3-methoxybutanol, cyclohexanone, cyclopentanone, propylene glycol methyl ether acetate, propylene glycol ether acetate, 3-methoxybutyl acetate, 3-ethoxypropionic acid Ethyl ester, ethyl cellosolve acetate, methyl cellosolve acetate, butyl acetate, propylene glycol monomethyl ether, and dipropylene glycol monomethyl ether are not limited thereto.

依據本說明書的一實施態樣,以所述樹脂組成物中的固體成分的總重量為基準,所述著色材料組成物的含量為5重量%至90重量%,所述黏合劑樹脂的含量為1重量%至30重量%,所述抗氧化劑的含量為0.001重量%至20重量%,所述光起始劑的含量為0.1重量%至20重量%,所述多官能性單體的含量為0.1重 量%至50重量%。 According to an embodiment of the present specification, based on the total weight of solid components in the resin composition, the content of the coloring material composition is 5% to 90% by weight, and the content of the binder resin is 1 to 30% by weight, the content of the antioxidant is 0.001 to 20% by weight, the content of the photoinitiator is 0.1 to 20% by weight, and the content of the polyfunctional monomer is 0.1 weight Amount% to 50% by weight.

所謂所述固體成分的總重量是指樹脂組成物中除溶媒之外的成分的總重量的合計。固體成分以及各成分的以固體成分為基準的重量%的基準可利用液相層析法或者氣相層析法等本領域所使用的一般的分析方法來測定。 The total weight of the solid content refers to the total of the total weight of components other than the solvent in the resin composition. The solid content and the basis weight percentage of each component based on the solid content can be measured by a general analysis method used in the art such as liquid chromatography or gas chromatography.

依據本說明書的一實施態樣,所述樹脂組成物追加包含選自由光交聯增感劑、硬化促進劑、抗氧化劑、密合促進劑、界面活性劑、熱聚合防止劑、紫外線吸收劑、分散劑以及調平劑所組成的群組中的一種或兩種以上的添加劑。 According to an embodiment of the present specification, the resin composition additionally includes a member selected from the group consisting of a photocrosslinking sensitizer, a hardening accelerator, an antioxidant, an adhesion promoter, a surfactant, a thermal polymerization inhibitor, an ultraviolet absorber, One or two or more additives in a group consisting of a dispersant and a leveling agent.

依據本說明書的一實施態樣,以所述樹脂組成物中的固體成分的總重量為基準,所述添加劑的含量為0.1重量%至20重量%。 According to an embodiment of the present specification, based on the total weight of solid components in the resin composition, the content of the additive is 0.1% to 20% by weight.

所述光交聯增感劑可使用選自由以下化合物所組成的群組中的一種以上:二苯甲酮、4,4-雙(二甲基胺基)二苯甲酮、4,4-雙(二乙基胺基)二苯甲酮、2,4,6-三甲基胺基二苯甲酮、甲基-鄰苯甲醯基苯甲酸酯、3,3-二甲基-4-甲氧基二苯甲酮、3,3,4,4-四(第三丁基過氧化羰基)二苯甲酮等二苯甲酮系化合物;9-茀酮、2-氯-9-茀酮、2-甲基-9-茀酮等茀酮系化合物;硫雜蒽酮、2,4-二乙基硫雜蒽酮、2-氯硫雜蒽酮、1-氯-4-丙基氧基硫雜蒽酮、異丙基硫雜蒽酮、二異丙基硫雜蒽酮等硫雜蒽酮系化合物;氧雜蒽酮、2-甲基氧雜蒽酮等氧雜蒽酮系化合物;蒽醌、2-甲基蒽醌、2-乙基蒽醌、第三丁基蒽醌、2,6-二氯-9,10-蒽醌等蒽醌系化合物;9-苯基吖啶、 1,7-雙(9-吖啶基)庚烷、1,5-雙(9-吖啶基戊烷)、1,3-雙(9-吖啶基)丙烷等吖啶系化合物;苄基、1,7,7-三甲基-雙環[2,2,1]庚烷-2,3-二酮、9,10-菲醌等二羰基化合物;2,4,6-三甲基苯甲醯基二苯基氧化膦、雙(2,6-二甲氧基苯甲醯基)-2,4,4-三甲基戊基氧化膦等氧化膦系化合物;甲基-4-(二甲基胺基)苯甲酸酯、乙基-4-(二甲基胺基)苯甲酸酯、2-正丁氧基乙基-4-(二甲基胺基)苯甲酸酯等苯甲酸酯系化合物;2,5-雙(4-二乙基胺基亞苄基)環戊酮、2,6-雙(4-二乙基胺基亞苄基)環己酮、2,6-雙(4-二乙基胺基亞苄基)-4-甲基-環戊酮等胺基增效劑;3,3-羰基乙烯基-7-(二乙基胺基)香豆素、3-(2-苯并噻唑基)-7-(二乙基胺基)香豆素、3-苯甲醯基-7-(二乙基胺基)香豆素、3-苯甲醯基-7-甲氧基-香豆素、10,10-羰基雙[1,1,7,7-四甲基-2,3,6,7-四氫-1H,5H,11H-C1]-苯并吡喃并[6,7,8-ij]-喹嗪-11-酮等香豆素系化合物;4-二乙基胺基查耳酮、4-疊氮基亞苄基苯乙酮等查耳酮化合物;2-苯甲醯基亞甲基、3-甲基-b-萘并噻唑啉。 As the photocrosslinking sensitizer, one or more members selected from the group consisting of benzophenone, 4,4-bis (dimethylamino) benzophenone, 4,4- Bis (diethylamino) benzophenone, 2,4,6-trimethylaminobenzophenone, methyl-o-benzoyl benzoate, 3,3-dimethyl- Benzophenone compounds such as 4-methoxybenzophenone, 3,3,4,4-tetrakis (third butylperoxycarbonyl) benzophenone; 9-fluorenone, 2-chloro-9 -Fluorenone compounds such as fluorenone, 2-methyl-9-fluorenone; thioanthrone, 2,4-diethylthioxanthone, 2-chlorothiaxanthone, 1-chloro-4- Thioxanthone-based compounds such as propyloxythioxanthone, isopropylthioxanthone, and diisopropylthioxanthone; xanthracenes such as xanthone and 2-methylxanthone Ketone compounds; anthraquinone, 2-methylanthraquinone, 2-ethylanthraquinone, third butyl anthraquinone, 2,6-dichloro-9,10-anthraquinone and other anthraquinone compounds; 9-benzene Acridine, Acridine compounds such as 1,7-bis (9-acridyl) heptane, 1,5-bis (9-acridylpentane), 1,3-bis (9-acridyl) propane; benzyl Dicarbonyl compounds such as 1,7,7-trimethyl-bicyclo [2,2,1] heptane-2,3-dione, 9,10-phenanthrenequinone; 2,4,6-trimethyl Phosphine oxide compounds such as benzamyl diphenylphosphine oxide, bis (2,6-dimethoxybenzyl) -2,4,4-trimethylpentyl phosphine oxide; methyl-4- (Dimethylamino) benzoate, ethyl-4- (dimethylamino) benzoate, 2-n-butoxyethyl-4- (dimethylamino) benzoic acid Benzoate compounds such as esters; 2,5-bis (4-diethylaminobenzylidene) cyclopentanone, 2,6-bis (4-diethylaminobenzylidene) cyclohexanone Amine synergists such as 2,6-bis (4-diethylaminobenzylidene) -4-methyl-cyclopentanone; 3,3-carbonylvinyl-7- (diethylamino ) Coumarin, 3- (2-benzothiazolyl) -7- (diethylamino) coumarin, 3-benzylidene-7- (diethylamino) coumarin, 3 -Benzylidene-7-methoxy-coumarin, 10,10-carbonylbis [1,1,7,7-tetramethyl-2,3,6,7-tetrahydro-1H, 5H, Coumarin compounds such as 11H-C1] -benzopyrano [6,7,8-ij] -quinazin-11-one; 4-diethyl Chalcone group, 4-azido benzylidene acetophenone chalcone compound; 2- benzoyl methylene, 3-methyl-naphtho -b- thiazoline.

所述硬化促進劑是為了提高硬化以及機械強度而使用,具體而言可使用選自由以下化合物所組成的群組中的一種以上:2-巰基苯并咪唑、2-巰基苯并噻唑、2-巰基苯并噁唑、2,5-二巰基-1,3,4-噻二唑、2-巰基-4,6-二甲基胺基吡啶、季戊四醇-四(3-巰基丙酸酯)、季戊四醇-三(3-巰基丙酸酯)、季戊四醇-四(2-巰基乙酸酯)、季戊四醇-三(2-巰基乙酸酯)、三羥甲基丙烷-三(2-巰基乙酸酯)、以及三羥甲基丙烷-三(3-巰基丙酸酯)。 The hardening accelerator is used for improving hardening and mechanical strength. Specifically, one or more members selected from the group consisting of 2-mercaptobenzimidazole, 2-mercaptobenzothiazole, and 2- Mercaptobenzoxazole, 2,5-dimercapto-1,3,4-thiadiazole, 2-mercapto-4,6-dimethylaminopyridine, pentaerythritol-tetrakis (3-mercaptopropionate), Pentaerythritol-tris (3-mercaptopropionate), pentaerythritol-tetra (2-mercaptoacetate), pentaerythritol-tri (2-mercaptoacetate), trimethylolpropane-tris (2-mercaptoacetate) ), And trimethylolpropane-tris (3-mercaptopropionate).

本說明書中使用的密合促進劑可從甲基丙烯醯氧基丙 基三甲氧基矽烷、甲基丙烯醯氧基丙基二甲氧基矽烷、甲基丙烯醯氧基丙基三乙氧基矽烷、甲基丙烯醯氧基丙基二甲氧基矽烷等甲基丙烯醯基矽烷偶合劑中選擇一種以上來使用,作為烷基三甲氧基矽烷,可從辛基三甲氧基矽烷、十二烷基三甲氧基矽烷、十八烷基三甲氧基矽烷等中選擇一種以上來使用。 The adhesion promoter used in this specification can be selected from methacrylic acid Methyl groups such as methyltrimethoxysilane, methacryloxypropyldimethoxysilane, methacryloxypropyltriethoxysilane, methacryloxypropyldimethoxysilane, etc. One or more acrylic silane coupling agents are selected and used. As the alkyltrimethoxysilane, it can be selected from octyltrimethoxysilane, dodecyltrimethoxysilane, octadecyltrimethoxysilane, etc. Use more than one.

所述界面活性劑為矽酮系界面活性劑或者氟系界面活性劑,具體而言,矽酮系界面活性劑可使用:畢克化學(BYK-Chemie)公司的BYK-077、BYK-085、BYK-300、BYK-301、BYK-302、BYK-306、BYK-307、BYK-310、BYK-320、BYK-322、BYK-323、BYK-325、BYK-330、BYK-331、BYK-333、BYK-335、BYK-341v344、BYK-345v346、BYK-348、BYK-354、BYK-355、BYK-356、BYK-358、BYK-361、BYK-370、BYK-371、BYK-375、BYK-380、BYK-390等,氟系界面活性劑可使用:DIC(大日本油墨化學(DaiNippon Ink & Chemicals))公司的F-114、F-177、F-410、F-411、F-450、F-493、F-494、F-443、F-444、F-445、F-446、F-470、F-471、F-472SF、F-474、F-475、F-477、F-478、F-479、F-480SF、F-482、F-483、F-484、F-486、F-487、F-172D、MCF-350SF、TF-1025SF、TF-1117SF、TF-1026SF、TF-1128、TF-1127、TF-1129、TF-1126、TF-1130、TF-1116SF、TF-1131、TF1132、TF1027SF、TF-1441、TF-1442等,並非僅限定於此。 The surfactant is a silicone-based surfactant or a fluorine-based surfactant. Specifically, the silicone-based surfactant can be used: BYK-077, BYK-085, BYK-Chemie, BYK-300, BYK-301, BYK-302, BYK-306, BYK-307, BYK-310, BYK-320, BYK-322, BYK-323, BYK-325, BYK-330, BYK-331, BYK- 333, BYK-335, BYK-341v344, BYK-345v346, BYK-348, BYK-354, BYK-355, BYK-356, BYK-358, BYK-361, BYK-370, BYK-371, BYK-375, BYK-380, BYK-390, etc., fluorine-based surfactants can be used: F-114, F-177, F-410, F-411, F-411 of Dai Nippon Ink & Chemicals 450, F-493, F-494, F-443, F-444, F-445, F-446, F-470, F-471, F-472SF, F-474, F-475, F-477, F-478, F-479, F-480SF, F-482, F-483, F-484, F-486, F-487, F-172D, MCF-350SF, TF-1025SF, TF-1117SF, TF- 1026SF, TF-1128, TF-1127, TF-1129, TF-1126, TF-1130, TF-1116SF, TF-1131, TF1132, TF1027SF, TF-1441, TF-1442, etc. are not limited to this.

所述抗氧化劑可為選自由受阻酚系(Hindered phenol)抗氧化劑、胺系抗氧化劑、硫系抗氧化劑以及膦系抗氧化劑所組 成的群組中的一種以上,但並非僅限定於此。 The antioxidant may be selected from the group consisting of a hindered phenol antioxidant, an amine antioxidant, a sulfur antioxidant, and a phosphine antioxidant. One or more of the groups formed are not limited thereto.

所述抗氧化劑的具體例可列舉:磷酸、三甲基磷酸酯或者三乙基磷酸酯之類的磷酸系熱穩定劑;2,6-二-第三丁基-對甲酚、十八烷基-3-(4-羥基-3,5-二-第三丁基苯基)丙酸酯、四雙[亞甲基-3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]甲烷、1,3,5-三甲基-2,4,6-三(3,5-二-第三丁基-4-羥基苄基)苯、3,5-二-第三丁基-4-羥基苄基亞磷酸二乙酯、2,2-硫代雙(4-甲基-6-第三丁基苯酚)、2,6-g,t-丁基苯酚4,4'-亞丁基-雙(3-甲基-6-第三丁基苯酚)、4,4'-硫代雙(3-甲基-6-第三丁基苯酚)或者雙[3,3-雙-(4'-羥基-3'-第三丁基苯基)丁酸]二醇酯(Bis[3,3-bis-(4'-hydroxy-3'-tert-butylphenyl)butanoicacid]glycol ester)之類的受阻酚(Hindered phenol)系一次抗氧化劑;苯基-α-萘基胺、苯基-β-萘基胺、N,N'-二苯基-對苯二胺或者N,N'-二-β-萘基-對苯二胺之類的胺系二次抗氧化劑;二月桂基二硫化物、二月桂基硫代丙酸酯、二硬脂基硫代丙酸酯、巰基苯并噻唑或者四甲基秋蘭姆二硫化物四雙[亞甲基-3-(月桂基硫基)丙酸酯]甲烷等硫(Thio)系二次抗氧化劑;或者三苯基亞磷酸酯、三(壬基苯基)亞磷酸酯、三異癸基亞磷酸酯、雙(2,4-二丁基苯基)季戊四醇二亞磷酸酯(Bis(2,4-ditbutylphenyl)Pentaerythritol Diphosphite)或者(1,1'-聯苯基)-4,4'-二基雙亞膦酸四[2,4-雙(1,1-二甲基乙基)苯基]酯((1,1'-Biphenyl)-4,4'-Diylbisphosphonous acid tetrakis[2,4-bis(1,1-dimethylethyl)phenyl]ester)之類的亞磷酸酯系二次抗氧化劑。 Specific examples of the antioxidant include phosphoric acid-based heat stabilizers such as phosphoric acid, trimethyl phosphate, and triethyl phosphate; 2,6-di-third-butyl-p-cresol, and octadecane 3- (4-hydroxy-3,5-di-tert-butylphenyl) propionate, tetrabis [methylene-3- (3,5-di-tert-butyl-4-hydroxy) Phenyl) propionate] methane, 1,3,5-trimethyl-2,4,6-tris (3,5-di-third-butyl-4-hydroxybenzyl) benzene, 3,5- Diethyl tertiary butyl-4-hydroxybenzyl phosphite, 2,2-thiobis (4-methyl-6-third butylphenol), 2,6-g, t-butyl Phenol 4,4'-butylene-bis (3-methyl-6-third butylphenol), 4,4'-thiobis (3-methyl-6-third butylphenol) or bis [ 3,3-bis- (4'-hydroxy-3'-tert-butylphenyl) butanoic acid] glycol ester (Bis [3,3-bis- (4'-hydroxy-3'-tert-butylphenyl) Hindered phenol such as butanoicacid] glycol ester) is a primary antioxidant; phenyl-α-naphthylamine, phenyl-β-naphthylamine, N, N'-diphenyl-p-phenylenediamine Or amine secondary antioxidants such as N, N'-di-β-naphthyl-p-phenylenediamine; dilauryl disulfide, dilaurylthiopropionate, distearylsulfide Thio-based secondary antioxidants such as propionate, mercaptobenzothiazole or tetramethylthiuram disulfide tetrabis [methylene-3- (laurylthio) propionate] methane; or Triphenylphosphite, tris (nonylphenyl) phosphite, triisodecylphosphite, bis (2,4-dibutylphenyl) pentaerythritol diphosphite (Bis (2,4- ditbutylphenyl) Pentaerythritol Diphosphite) or (1,1'-biphenyl) -4,4'-diylbisphosphinic acid tetra [2,4-bis (1,1-dimethylethyl) phenyl] ester Phosphite-based secondary antioxidants such as ((1,1'-Biphenyl) -4,4'-Diylbisphosphonous acid tetrakis [2,4-bis (1,1-dimethylethyl) phenyl] ester).

所述紫外線吸收劑可使用:2-(3-第三丁基-5-甲基-2-羥基苯基)-5-氯-苯并三唑、烷氧基二苯甲酮等,但並不限定於此,本領域中通常使用者可使用任一種。 The ultraviolet absorber can be used: 2- (3-third butyl-5-methyl-2-hydroxyphenyl) -5-chloro-benzotriazole, alkoxybenzophenone, etc., but It is not limited to this, and generally any user can use either of them in the art.

作為所述熱聚合防止劑,例如可包含選自由以下化合物所組成的群組中的一種以上:對苯甲醚、對苯二酚、鄰苯二酚(pyrocatechol)、第三丁基兒茶酚(tert-butyl catechol)、N-亞硝基苯基羥基胺銨鹽、N-亞硝基苯基羥基胺鋁鹽、對甲氧基苯酚、二-第三丁基-對甲酚、鄰苯三酚、苯醌、4,4-硫代雙(3-甲基-6-第三丁基苯酚)、2,2-亞甲基雙(4-甲基-6-第三丁基苯酚)、2-巰基咪唑以及啡噻嗪(phenothiazine),但並非僅限定於該些,可包含該技術領域中通常已知者。 The thermal polymerization inhibitor may include, for example, one or more members selected from the group consisting of p-anisole, hydroquinone, pyrocatechol, and tert-butylcatechol. (tert-butyl catechol), N-nitrosophenylhydroxylamine ammonium salt, N-nitrosophenylhydroxylamine aluminum salt, p-methoxyphenol, di-third-butyl-p-cresol, o-benzene Triphenol, benzoquinone, 4,4-thiobis (3-methyl-6-third butylphenol), 2,2-methylenebis (4-methyl-6-third butylphenol) , 2-mercaptoimidazole, and phenothiazine, but are not limited to these, and may include those generally known in the technical field.

所述分散劑可於以下方法中使用:於預先對顏料進行表面處理的形態下內部添加於顏料中的方法、或者外部添加於顏料中的方法。所述分散劑可使用化合物型、非離子性、陰離子性或者陽離子性分散劑,可列舉氟系、酯系、陽離子系、陰離子系、非離子系、兩性界面活性劑等。該些可分別使用或者將兩種以上組合使用。 The dispersant may be used in a method of internally adding to the pigment or a method of externally adding to the pigment in a state where the pigment is surface-treated in advance. The dispersant may be a compound type, nonionic, anionic or cationic dispersant, and examples thereof include fluorine-based, ester-based, cationic, anionic, non-ionic, and amphoteric surfactants. These can be used individually or in combination of 2 or more types.

具體而言,所述分散劑有選自由聚烷二醇及其酯、聚氧伸烷基多元醇、酯環氧烷加成物、醇環氧烷加成物、磺酸酯、磺酸鹽、羧酸酯、羧酸鹽、烷基醯胺環氧烷加成物以及烷基胺所組成的群組中的一種以上,但並不限定於此。 Specifically, the dispersant is selected from the group consisting of polyalkylene glycols and their esters, polyoxyalkylene polyols, ester alkylene oxide adducts, alcohol alkylene oxide adducts, sulfonate esters, and sulfonate salts. Or more, but is not limited to the group consisting of carboxylic acid esters, carboxylic acid salts, alkylamidoalkylene oxide adducts, and alkylamines.

所述調平劑可為聚合物性或者非聚合物性。聚合物性的 調平劑的具體例可列舉:聚乙烯亞胺、聚醯胺胺、胺與環氧化物的反應產物,非聚合物性的調平劑的具體例包含非聚合物含硫化合物以及非聚合物含氮化合物,但並不限定於此,本技術領域中通常使用者可使用任一種。 The leveling agent may be polymeric or non-polymeric. Polymeric Specific examples of the leveling agent include polyethyleneimine, polyamidoamine, a reaction product of an amine and an epoxide, and specific examples of the non-polymeric leveling agent include non-polymer sulfur compounds and non-polymer compounds The nitrogen compound is not limited to this, and any one of ordinary users in the art can use either one.

依據本說明書的一實施態樣,提供一種包含所述樹脂組成物的彩色濾光片。 According to an aspect of the present specification, a color filter including the resin composition is provided.

所述彩色濾光片可使用包含所述著色材料組成物的樹脂組成物來製造。藉由將所述樹脂組成物塗佈於基板上,形成塗佈膜,對所述塗佈膜進行曝光、顯影及硬化,可形成彩色濾光片。 The color filter can be manufactured using a resin composition containing the coloring material composition. The resin composition is coated on a substrate to form a coating film, and the coating film is exposed, developed, and cured to form a color filter.

所述塗佈方法並無特別限制,可使用噴射法、輥塗法、旋塗法等,通常廣泛使用旋塗法。另外,於形成塗佈膜後,視情況,可於減壓下去除一部分的殘留溶媒。 The coating method is not particularly limited, and a spray method, a roll coating method, a spin coating method, or the like can be used, and a spin coating method is generally widely used. In addition, after forming the coating film, a part of the residual solvent can be removed under reduced pressure as appropriate.

用以使本說明書的樹脂組成物硬化的光源例如有:使波長為250nm至450nm的光發散的水銀蒸氣弧(arc)、碳弧、Xe弧等,但未必限定於此。 The light source for hardening the resin composition of the present specification includes, for example, mercury vapor arc (arc), carbon arc, Xe arc, and the like, which emit light having a wavelength of 250 nm to 450 nm, but is not necessarily limited thereto.

本說明書的樹脂組成物可用於:薄膜電晶體液晶顯示裝置(TFT LCD)彩色濾光片製造用顏料分散型感光材、薄膜電晶體液晶顯示裝置(TFT LCD)或者有機發光二極體的黑色矩陣形成用感光材、外塗層形成用感光材、柱狀間隔物感光材、光硬化型塗料、光硬化性墨水、光硬化性黏接劑、印刷版、印刷配線板用感光材、電漿顯示器面板(Plasma Diasplay Panel,PDP)用感光材等中,其用途並無特別限制。 The resin composition of this specification can be used for: pigment-dispersed photosensitive materials for manufacturing thin-film transistor liquid crystal display devices (TFT LCD), color filters, thin-film transistor liquid-crystal display devices (TFT LCD), or black matrices of organic light-emitting diodes. Photosensitive material for formation, Photosensitive material for overcoat layer formation, Columnar spacer photosensitive material, Photocurable paint, Photocurable ink, Photocurable adhesive, Printing plate, Photosensitive material for printed wiring board, Plasma display The use of the photosensitive material for a panel (Plasma Diasplay Panel, PDP) is not particularly limited.

本說明書的一實施態樣的樹脂組成物的耐熱性優異,由熱處理引起的顏色變化少,即便藉由彩色濾光片製造時的硬化過程,色再現率亦高,可提供亮度及對比度高的彩色濾光片。 The resin composition according to an embodiment of the present specification is excellent in heat resistance, and has little color change due to heat treatment. The color reproduction rate is high even through a hardening process during the manufacture of a color filter, and high brightness and contrast can be provided. Color filters.

所述基板可為玻璃板、矽晶圓以及聚醚碸(Polyethersulfone,PES)、聚碳酸酯(Polycarbonate,PC)等塑膠基材的板等,其種類並無特別限制。 The substrate may be a glass plate, a silicon wafer, and a plastic substrate plate such as polyethersulfone (PES), polycarbonate (PC), or the like, and the type thereof is not particularly limited.

所述彩色濾光片可包含紅色圖案、綠色圖案、藍色圖案、黑色矩陣。 The color filter may include a red pattern, a green pattern, a blue pattern, and a black matrix.

依據另一實施態樣,所述彩色濾光片可更包含外塗層。 According to another aspect, the color filter may further include an overcoat layer.

於彩色濾光片的彩色像素之間,出於提高對比度的目的,可配置稱為黑色矩陣的格子狀的黑色圖案。黑色矩陣的材料可使用鉻。該情況下可使用如下方法:使鉻蒸鍍於玻璃基板整體上,藉由蝕刻處理來形成圖案。但,考慮到步驟上的高成本、鉻的高反射率、由鉻廢液引起的環境污染,可使用利用可進行微細加工的顏料分散法的樹脂黑色矩陣。 Between the color pixels of the color filter, a grid-like black pattern called a black matrix may be arranged for the purpose of improving the contrast. The material of the black matrix can use chromium. In this case, a method can be used in which chromium is deposited on the entire glass substrate and a pattern is formed by an etching process. However, in consideration of the high cost of the steps, the high reflectance of chromium, and environmental pollution caused by chromium waste liquid, a resin black matrix using a pigment dispersion method capable of fine processing can be used.

本說明書的一實施態樣的黑色矩陣可使用黑色顏料或者黑色染料來作為著色材料。例如可單獨使用碳黑,或將碳黑與著色顏料混合使用,此時,由於混合遮光性不足的著色顏料,故而具有如下優點:即便相對而言著色材料的量增加,膜的強度或者對基板的密合性亦不會下降。 The black matrix according to an embodiment of the present specification may use a black pigment or a black dye as a coloring material. For example, carbon black can be used alone, or carbon black can be used in combination with colored pigments. At this time, because colored pigments with insufficient light-shielding properties are mixed, it has the following advantages: even if the amount of coloring material increases, the strength of the film or the substrate The adhesion will not decrease.

提供包含本說明書的彩色濾光片的顯示器裝置。 A display device including the color filter of the present specification is provided.

所述顯示器裝置可為電漿顯示器面板(Plasma Display Panel,PDP)、發光二極體(Light Emitting Diode,LED)、有機發光元件(Organic Light Emitting Diode,OLED)、液晶顯示裝置(Liquid Crystal Display,LCD)、薄膜電晶體液晶顯示裝置(Thin Film Transistor-Liquid Crystal Display,LCD-TFT)以及陰極射線管(Cathode Ray Tube,CRT)中的任一者。 The display device may be a plasma display panel (Plasma Display Panel (PDP), Light Emitting Diode (LED), Organic Light Emitting Diode (OLED), Liquid Crystal Display (LCD), Thin Film Transistor (Thin Film Transistor) -Liquid Crystal Display (LCD-TFT) and Cathode Ray Tube (CRT).

以下,列舉實施例來對本說明書進行詳細說明。下述實施例是用以對本說明書進行說明者,本說明書的範圍包括下述專利申請的範圍中記載的範圍以及其置換及變更,並不限定於實施例的範圍。 Hereinafter, the present specification will be described in detail with examples. The following examples are intended to explain the present specification, and the scope of the present specification includes the scope described in the scope of the following patent application and its substitutions and changes, and is not limited to the scope of the embodiments.

[製造例1]化合物A的製造 [Production Example 1] Production of Compound A

於0.55g(0.38mmol,1.2eq)的萘-1-胺中添加1mL的乙酸(AcOH)、0.3g(0.31mmol,1eq)的環己酮、1mL的二氯甲烷(MC),攪拌30分鐘左右。然後,緩緩添加1.0g(4.7mmol,1.5eq)的三乙醯氧基硼氫化鈉(NaBH(OAc)3)。於室溫下攪拌16小時左右後添加蒸餾水,以二氯甲烷來萃取,利用硫酸鈉使有機層乾燥,進行減壓乾燥。將所獲得的產物於管柱中(以乙酸乙酯:己烷=1:9的比例)進行純化,獲得0.74g的化合物A。(產率為86%) To 0.55 g (0.38 mmol, 1.2 eq) of naphthalene-1-amine were added 1 mL of acetic acid (AcOH), 0.3 g (0.31 mmol, 1 eq) of cyclohexanone, and 1 mL of dichloromethane (MC), and stirred for 30 minutes. about. Then, 1.0 g (4.7 mmol, 1.5 eq) of sodium triacetoxyborohydride (NaBH (OAc) 3 ) was slowly added. After stirring at room temperature for about 16 hours, distilled water was added, extraction was performed with dichloromethane, and the organic layer was dried with sodium sulfate and dried under reduced pressure. The obtained product was purified in a column (at a ratio of ethyl acetate: hexane = 1: 9) to obtain 0.74 g of compound A. (Yield 86%)

[製造例2]化合物B的製造 [Production Example 2] Production of Compound B

於3.7g(0.026mol,1eq)的萘-1-胺中添加50ml的二甲基甲醯胺(DMF),於室溫下緩緩添加17.85g(0.13mol,5eq)的碳酸鉀後,攪拌30分鐘。然後,添加7.8g(0.065mol,2.5eq)的溴丙烯,於室溫下攪拌4小時。反應結束後,添加蒸餾水,以醚進行萃取,利用硫酸鈉使有機層乾燥,進行減壓乾燥。將所獲得的產物於管柱中(以乙酸乙酯:己烷=1:100至1:80的比例)進行純化,以34%的產率獲得1.5g的化合物B。 50 ml of dimethylformamide (DMF) was added to 3.7 g (0.026 mol, 1 eq) of naphthalene-1-amine, and 17.85 g (0.13 mol, 5 eq) of potassium carbonate was slowly added at room temperature, followed by stirring 30 minutes. Then, 7.8 g (0.065 mol, 2.5 eq) of bromopropene was added, and it stirred at room temperature for 4 hours. After the reaction was completed, distilled water was added, extraction was performed with ether, and the organic layer was dried with sodium sulfate and dried under reduced pressure. The obtained product was purified in a column (in a ratio of ethyl acetate: hexane = 1: 100 to 1:80) to obtain 1.5 g of Compound B in a yield of 34%.

[製造例3]化合物C的製造 [Production Example 3] Production of Compound C

於3.0g(0.021mol,1eq)的萘-1-胺中添加30mL的二氯甲烷,於室溫下緩緩添加2.75g(0.027mol,1.3eq)的三乙胺(TEA)。然後,添加4.8g(0.056mol,2.7eq)的甲基丙烯酸,於常溫下攪拌16小時。反應結束後,添加蒸餾水,以二氯甲烷來萃取,利用硫酸鈉使有機層乾燥,進行減壓乾燥。將所獲得的產物於管柱中(以乙酸乙酯:己烷=1:10~1:15的比例)進行純化,以20%的產率獲得0.9g的化合物C。 30 mL of dichloromethane was added to 3.0 g (0.021 mol, 1 eq) of naphthalene-1-amine, and 2.75 g (0.027 mol, 1.3 eq) of triethylamine (TEA) was slowly added at room temperature. Then, 4.8 g (0.056 mol, 2.7 eq) of methacrylic acid was added and stirred at normal temperature for 16 hours. After completion of the reaction, distilled water was added, and the mixture was extracted with dichloromethane. The organic layer was dried with sodium sulfate and dried under reduced pressure. The obtained product was purified in a column (in a ratio of ethyl acetate: hexane = 1: 10 to 1:15), and 0.9 g of compound C was obtained in a yield of 20%.

[製造例4]化合物D的製造 [Production Example 4] Production of Compound D

於2.41g(0.01mol,1eq)的4-(萘-1-基胺基)環己-1-醇中添加25mL的二氯甲烷,於室溫下緩緩添加1.32g(0.013mol,1.3eq)的三乙胺。然後,添加2.3g(0.022mol,2.2eq)的甲基丙烯酸,於常溫下攪拌16小時。反應結束後,添加蒸餾水,以二氯甲烷來萃取,利用硫酸鈉使有機層乾燥,進行減壓乾燥。將所獲得的產物於管柱中(以乙酸乙酯:己烷=1:5的比例)進行純化,以74%的產率獲得2.3g的化合物D。 25 mL of dichloromethane was added to 2.41 g (0.01 mol, 1 eq) of 4- (naphthalene-1-ylamino) cyclohex-1-ol, and 1.32 g (0.013 mol, 1.3 eq) was slowly added at room temperature. ) Triethylamine. Then, 2.3 g (0.022 mol, 2.2 eq) of methacrylic acid was added and stirred at normal temperature for 16 hours. After completion of the reaction, distilled water was added, and the mixture was extracted with dichloromethane. The organic layer was dried with sodium sulfate and dried under reduced pressure. The obtained product was purified in a column (in a ratio of ethyl acetate: hexane = 1: 5) to obtain 2.3 g of a compound D in a yield of 74%.

[製造例5]化合物E的製造 [Production Example 5] Production of Compound E

於氮氣環境下,將2.92g(0.01mol,1.5eq)的3-(3,5-二-第三丁基-4-羥基苯基)丙酸溶解於30mL的四氫呋喃(THF)中後,設置冰浴(ice bath)。然後,加入2.54g(0.017mol,2.4eq)的1-乙基-3-(3-二甲基胺基丙基)碳二醯亞胺(EDC),攪拌約15分鐘後,加入0.34g(0.003mol,0.4eq)的4-二甲基胺基吡啶(4-Dimethylamino pyridine,DMAP)。15分鐘後,將1.69g(0.007mol,1eq)的4-(萘-1-基胺基)環己-1-醇溶解於10mL的四氫呋喃中,緩緩添加。攪拌24小時後,以二氯甲烷來萃取,進行減壓乾燥。於管柱中(以乙酸乙酯:己烷=1:5的比例)進行純化,獲得2.3g(產率65%)的化合物E。 Under nitrogen atmosphere, 2.92 g (0.01 mol, 1.5 eq) of 3- (3,5-di-third-butyl-4-hydroxyphenyl) propionic acid was dissolved in 30 mL of tetrahydrofuran (THF), and then set Ice bath. Then, 2.54 g (0.017 mol, 2.4 eq) of 1-ethyl-3- (3-dimethylaminopropyl) carbodiimide (EDC) was added, and after stirring for about 15 minutes, 0.34 g ( 0.003mol, 0.4eq) of 4-Dimethylamino pyridine, DMAP). After 15 minutes, 1.69 g (0.007 mol, 1 eq) of 4- (naphthalene-1-ylamino) cyclohex-1-ol was dissolved in 10 mL of tetrahydrofuran and slowly added. After stirring for 24 hours, it was extracted with dichloromethane and dried under reduced pressure. Purification was performed in a column (in a ratio of ethyl acetate: hexane = 1: 5) to obtain 2.3 g (yield 65%) of Compound E.

[製造例6]化合物F的製造 [Production Example 6] Production of Compound F

於氮氣環境下,加入15g(0.069mol,1eq)的4,4-二氟二苯甲酮及31.1g(0.35mol,5eq)的2-乙基胺基乙醇,於160℃下一邊攪拌一邊使其升溫。於160℃下反應48小時後,冷卻至常溫。加入蒸餾水,以二氯甲烷來萃取後,進行減壓乾燥。於常溫下以乙酸乙酯進行再結晶純化,獲得化合物F。(20g,產率82%) Under a nitrogen atmosphere, 15 g (0.069 mol, 1 eq) of 4,4-difluorobenzophenone and 31.1 g (0.35 mol, 5 eq) of 2-ethylaminoethanol were added, and the mixture was stirred at 160 ° C. with It heats up. After reacting at 160 ° C for 48 hours, it was cooled to normal temperature. Distilled water was added, and extraction was performed with dichloromethane, followed by drying under reduced pressure. Compound F was obtained by recrystallization purification with ethyl acetate at normal temperature. (20g, yield 82%)

[製造例7]化合物G的製造 [Production Example 7] Production of Compound G

於氮氣環境下,將9.6g(0.035mol,3eq)的3-(3,5-二-第三丁基-4-羥基苯基)丙酸溶解於70mL的四氫呋喃中後,設置冰浴 (ice bath)。於反應器中加入4.28g(0.028mol,2.4eq)的1-乙基-3-(3-二甲基胺基丙基)碳二醯亞胺,攪拌約15分鐘後,加入0.56g(0.005mol,0.4eq)的4-二甲基胺基吡啶(4-Dimethylamino pyridine)。15分鐘後,將4.10g(0.011mol,1eq)的化合物F溶解於30mL的四氫呋喃中,緩緩添加。攪拌24小時後,以二氯甲烷來萃取,進行減壓乾燥。於管柱中(以乙酸乙酯:己烷=1:3的比例)進行純化,以產率43%獲得4.31g的化合物G。於管柱純化後,於3-(3,5-二-第三丁基-4-羥基苯基)丙酸((3-(3,5-di-tert-buthyl-4-hydroxyphenyl)propanoic acid)的情況下,以NaHCO3(pH10)溶液進行水洗,以二氯甲烷來萃取,進行減壓乾燥。 In a nitrogen environment, 9.6 g (0.035 mol, 3 eq) of 3- (3,5-di-third-butyl-4-hydroxyphenyl) propionic acid was dissolved in 70 mL of tetrahydrofuran, and then an ice bath (ice bath). Add 4.28 g (0.028 mol, 2.4 eq) of 1-ethyl-3- (3-dimethylaminopropyl) carbodiimide to the reactor, and after stirring for about 15 minutes, add 0.56 g (0.005 mol, 0.4 eq) of 4-Dimethylamino pyridine. After 15 minutes, 4.10 g (0.011 mol, 1 eq) of Compound F was dissolved in 30 mL of tetrahydrofuran and slowly added. After stirring for 24 hours, it was extracted with dichloromethane and dried under reduced pressure. Purification was performed in a column (in a ratio of ethyl acetate: hexane = 1: 3) to obtain 4.31 g of Compound G in a yield of 43%. After purification in a column, the compound was purified in 3- (3,5-di-tert-butyl-4-hydroxyphenyl) propanoic acid ((3- (3,5-di-tert-buthyl-4-hydroxyphenyl) propanoic acid). In the case of), it was washed with NaHCO 3 (pH 10) solution, extracted with dichloromethane, and dried under reduced pressure.

[製造例8]化合物H及化合物I的製造 [Production Example 8] Production of Compound H and Compound I

除了於所述製造例7中加入1.5eq的3-(3,5-二-第三丁基-4-羥基苯基)丙酸以外,利用與製造例7相同的方法來製造後,於管柱中(以乙酸乙酯:己烷=1:3的比例)進行純化,以產率31.7%獲得2.5g的化合物H。於2.5g(0.004mol,1eq)的化合物H 中添加30mL的二氯甲烷。於室溫下緩緩添加0.53g(0.0053mol,1.3eq)的三乙胺。然後,添加0.77g(0.009mol,2.2eq)的甲基丙烯酸,於常溫下攪拌16小時。反應結束後,添加蒸餾水,以二氯甲烷來萃取,利用硫酸鈉使有機層乾燥,進行減壓乾燥。將所獲得的產物於管柱中(以乙酸乙酯:己烷=1:5的比例)進行純化,以68%的產率獲得1.9g的化合物I。 Except that 1.5 eq of 3- (3,5-di-third-butyl-4-hydroxyphenyl) propionic acid was added to Production Example 7, it was produced by the same method as Production Example 7, and then placed in a tube. Purification was performed in a column (at a ratio of ethyl acetate: hexane = 1: 3), and 2.5 g of compound H was obtained in a yield of 31.7%. At 2.5 g (0.004 mol, 1 eq) of Compound H To this was added 30 mL of dichloromethane. Slowly add 0.53 g (0.0053 mol, 1.3 eq) of triethylamine at room temperature. Then, 0.77 g (0.009 mol, 2.2 eq) of methacrylic acid was added and stirred at normal temperature for 16 hours. After completion of the reaction, distilled water was added, and the mixture was extracted with dichloromethane. The organic layer was dried with sodium sulfate and dried under reduced pressure. The obtained product was purified in a column (in a ratio of ethyl acetate: hexane = 1: 5) to obtain 1.9 g of Compound I in a yield of 68%.

[製造例9]化合物J的製造 [Production Example 9] Production of Compound J

於2g(0.006mol,1eq)的化合物F中添加30mL的二氯甲烷。於室溫下緩緩添加1.42g(0.028mol,2.5eq)的三乙胺。然後,添加2.16g(0.025mol,2.5eq)的甲基丙烯酸,於常溫下攪拌16小時。反應結束後,添加蒸餾水,以二氯甲烷來萃取,利用硫酸鈉使有機層乾燥,進行減壓乾燥。將所獲得的產物於管柱中(以乙酸乙酯:己烷=1:3的比例)進行純化,以54%的產率獲得1.5g的化合物J。 To 2 g (0.006 mol, 1 eq) of compound F was added 30 mL of dichloromethane. 1.42 g (0.028 mol, 2.5 eq) of triethylamine was slowly added at room temperature. Then, 2.16 g (0.025 mol, 2.5 eq) of methacrylic acid was added and stirred at normal temperature for 16 hours. After completion of the reaction, distilled water was added, and the mixture was extracted with dichloromethane. The organic layer was dried with sodium sulfate and dried under reduced pressure. The obtained product was purified in a column (in a ratio of ethyl acetate: hexane = 1: 3), and 1.5 g of compound J was obtained in a yield of 54%.

[製造例10]化合物K的製造 [Production Example 10] Production of Compound K

於40mL的吡啶中溶解4.31g(0.005mol,1eq)的化合物G後,緩緩添加2.68g(0.012mol,2.5eq)的二碳酸二-第三丁酯(Di-tert-butyl dicarbonate)。15分鐘後,加入1.20g(0.01mol,2eq)的4-二甲基胺基吡啶(4-Dimethylaminopyridine)。於60℃下反應3小時後加入蒸餾水,以二氯甲烷來萃取以及減壓而去除溶媒後,於管柱中(以二氯甲烷:乙酸乙酯=10:1的比例)進行純化,以73%的產率獲得3.87g的化合物K。 After dissolving 4.31 g (0.005 mol, 1 eq) of Compound G in 40 mL of pyridine, 2.68 g (0.012 mol, 2.5 eq) of di-tert-butyl dicarbonate was slowly added. After 15 minutes, 1.20 g (0.01 mol, 2 eq) of 4-Dimethylaminopyridine was added. After reacting at 60 ° C for 3 hours, distilled water was added, and the solvent was extracted with dichloromethane and the solvent was removed under reduced pressure. The residue was purified in a column (dichloromethane: ethyl acetate = 10: 1 ratio) to 73 % Yield of 3.87 g of compound K.

[製造例11]化合物L的製造 [Production Example 11] Production of Compound L

除了於所述製造例7中代替3-(3,5-二-第三丁基-4-羥基苯基)丙酸而使用3,5-二-第三丁基-4-羥基苯甲酸以外,利用與製造例7相同的方法來製造,以63%的產率獲得5.83g的化合物L。 Except for using 3,5-di-third-butyl-4-hydroxybenzoic acid in place of 3- (3,5-di-third-butyl-4-hydroxyphenyl) propionic acid in Production Example 7 described above It was produced by the same method as in Production Example 7, and 5.83 g of Compound L was obtained in a yield of 63%.

[製造例12]化合物M及化合物M-1的製造 [Production Example 12] Production of Compound M and Compound M-1

於氯仿中徹底溶解1.5g(0.002mol,1eq)的化合物I。於氮氣環境下,加入0.44g(0.003mol,1.3eq)的氯化磷醯,攪拌約30分鐘後,將0.58g(0.0026mol,1.3eq)的1-環己基-1-萘基胺溶解於氯仿中,緩緩添加。於60℃下反應2小時後,以蒸餾水來終結反應,以二氯甲烷來萃取。減壓而去除溶媒後,以二氯甲烷:乙酸乙酯=1:1的比例進行管柱純化而去除前驅物後,將組成改變為二氯甲烷:甲醇:乙酸乙酯=6:1:2而進行純化,以49%的產率獲得1.0g的化合物M。然後,將1.0g(0.001mol,1eq)的化合物M溶解於30mL的甲醇中後,加入0.46g(0.0016mol,1.5eq)的雙三氟甲磺醯亞胺(BMI),於常溫下攪拌。將加入蒸餾水而析出的藍色粉末進行過濾,以87%的產率獲得1.1g的化合物M-1。 1.5 g (0.002 mol, 1 eq) of Compound I was completely dissolved in chloroform. Under a nitrogen environment, 0.44 g (0.003 mol, 1.3 eq) of phosphorus phosphonium chloride was added, and after stirring for about 30 minutes, 0.58 g (0.0026 mol, 1.3 eq) of 1-cyclohexyl-1-naphthylamine was dissolved in Add slowly in chloroform. After reacting at 60 ° C for 2 hours, the reaction was terminated with distilled water and extracted with dichloromethane. After removing the solvent under reduced pressure, the column was purified by dichloromethane: ethyl acetate = 1: 1 to remove the precursor, and then the composition was changed to dichloromethane: methanol: ethyl acetate = 6: 1: 2. While purification was performed, 1.0 g of compound M was obtained in a yield of 49%. Then, 1.0 g (0.001 mol, 1 eq) of Compound M was dissolved in 30 mL of methanol, and then 0.46 g (0.0016 mol, 1.5 eq) of bistrifluoromethanesulfonimide (BMI) was added and stirred at normal temperature. The blue powder precipitated by adding distilled water was filtered to obtain 1.1 g of compound M-1 in a yield of 87%.

[製造例13]化合物N及化合物N-1的製造 [Production Example 13] Production of Compound N and Compound N-1

除了於所述製造例12中代替化合物I而使用化合物J,且代替化合物A而使用化合物E以外,利用與製造例12相同的方法來製造,以31%的產率獲得0.95g的化合物N,且以93%的產率獲得1.1g的化合物N-1。 The same method as in Production Example 12 was used, except that Compound J was used instead of Compound I and Compound E was used in Production Example 12, and 0.95 g of Compound N was obtained in a yield of 31%. And, 1.1 g of compound N-1 was obtained in a yield of 93%.

[製造例14]化合物O及化合物O-1的製造 [Production Example 14] Production of Compound O and Compound O-1

除了於所述製造例12中代替化合物I而使用化合物G,且代替化合物A而使用化合物B以外,利用與製造例12相同的方法來製造,以26%的產率獲得0.48g的化合物O,且以85%的產率獲 得0.5g的化合物O-1。 Except for using Compound G instead of Compound I and using Compound B instead of Compound A in Production Example 12, the same method as in Production Example 12 was used to produce 0.48 g of Compound O in a yield of 26%. And obtained in 85% yield 0.5 g of compound O-1 was obtained.

[製造例15]化合物P及化合物P-1的製造 [Production Example 15] Production of Compound P and Compound P-1

除了於所述製造例12中代替化合物I而使用化合物G,且代替化合物A而使用化合物C以外,利用與製造例12相同的方法來製造,以41%的產率獲得0.77g的化合物P,且以79%的產率獲得0.75g的化合物P-1。 Except for using Compound G instead of Compound I and using Compound C instead of Compound A in Production Example 12, the same method as in Production Example 12 was used to produce 0.77 g of Compound P in a yield of 41%. And 0.75 g of compound P-1 was obtained in a yield of 79%.

[製造例16]化合物Q及化合物Q-1的製造 [Production Example 16] Production of Compound Q and Compound Q-1

除了於所述製造例12中代替化合物I而使用化合物G,且代替化合物A而使用化合物D以外,利用與製造例12相同的方法來製造,以39%的產率獲得0.82g的化合物Q,且以76%的產率 獲得0.75g的化合物Q-1。 Except for using Compound G instead of Compound I and using Compound D instead of Compound A in Production Example 12, the same method as in Production Example 12 was used to produce 0.82 g of Compound Q in a yield of 39%. And at a yield of 76% 0.75 g of compound Q-1 was obtained.

[製造例17]化合物R的製造 [Production Example 17] Production of Compound R

陰離子是以與韓國公開專利2015-0009447的合成例1的方法相同的方式來製造。將0.5g(0.0005mol,1eq)的化合物M徹底溶解於10g的二甲基甲醯胺中。添加0.27g(0.0008mol,1.5eq)的陰離子。於55℃下攪拌3小時後冷卻至室溫。一邊攪拌1小時一邊滴加於1000g的蒸餾水中後,進行減壓過濾,以74%的產率獲得0.48g的化合物R。 The anion was produced in the same manner as the method of Synthesis Example 1 of Korean Laid-Open Patent 2015-0009447. 0.5 g (0.0005 mol, 1 eq) of Compound M was thoroughly dissolved in 10 g of dimethylformamide. 0.27 g (0.0008 mol, 1.5 eq) of anion was added. After stirring at 55 ° C for 3 hours, it was cooled to room temperature. The solution was added dropwise to 1000 g of distilled water while stirring for 1 hour, and then filtered under reduced pressure to obtain 0.48 g of Compound R in a yield of 74%.

[製造例18]比較例的化合物1的製造 [Production Example 18] Production of Compound 1 of Comparative Example

除了於韓國公開專利2012-0014111的實施例7中使用雙三氟甲磺醯亞胺作為陰離子以外,以相同的方式製造,以80%的產率獲得0.8g的比較例的化合物1。 Except that bistrifluoromethanesulfenimide was used as an anion in Example 7 of Korean Laid-Open Patent 2012-0014111, it was produced in the same manner, and 0.8 g of Compound 1 of Comparative Example was obtained in a yield of 80%.

[著色組成物的製造以及評價] [Production and evaluation of coloring composition]

比較例1 Comparative Example 1

以如下所述的組成來製造感光性藍色樹脂組成物。 A photosensitive blue resin composition was produced with the composition described below.

以將0.85重量%的作為藍色染料化合物的由製造例18所製造的比較例的化合物、20.78重量%的黏合劑樹脂(質量比為甲基丙烯酸苄酯:N-苯基順丁烯二醯亞胺:苯乙烯:甲基丙烯酸=55:9:11:25的共聚物)、20.46重量%的作為丙烯酸單體的二季戊四醇六丙烯酸酯、56.57重量%的丙二醇單甲醚乙酸酯、0.68重量%的光聚合起始劑(PBG-3142)、調平劑(TF-1740)及黏接助劑(KRM-503)0.66重量%均勻混合的方式進行攪拌,製造感光性藍色樹脂組成物。 A compound of Comparative Example manufactured in Production Example 18 as a blue dye compound and 0.85 wt% of a binder resin (mass ratio is benzyl methacrylate: N-phenylcis butylene difluorene) Imine: styrene: methacrylic acid = 55: 9: 11: 25 copolymer), 20.46% by weight of dipentaerythritol hexaacrylate as acrylic monomer, 56.57% by weight of propylene glycol monomethyl ether acetate, 0.68 The photopolymerization initiator (PBG-3142), leveling agent (TF-1740), and adhesion assistant (KRM-503) were mixed by 0.66% by weight in a uniformly mixed manner to produce a photosensitive blue resin composition. .

實施例1 Example 1

除了代替比較例的化合物1而使用化合物M-1來作為藍色染料化合物以外,以與比較例1相同的組成來製造藍色樹脂組成物。 A blue resin composition was produced with the same composition as that of Comparative Example 1 except that Compound M-1 was used instead of Compound 1 of Comparative Example as a blue dye compound.

實施例2 Example 2

除了代替比較例的化合物1而使用化合物N-1來作為藍色染料化合物以外,以與比較例1相同的組成來製造藍色樹脂組成物。 A blue resin composition was produced with the same composition as that of Comparative Example 1 except that Compound N-1 was used instead of Compound 1 of Comparative Example as a blue dye compound.

實施例3 Example 3

除了代替比較例的化合物1而使用化合物Q-1來作為藍色染料化合物以外,以與比較例1相同的組成來製造藍色樹脂組成物。 A blue resin composition was produced with the same composition as that of Comparative Example 1 except that Compound Q-1 was used instead of Compound 1 of Comparative Example as a blue dye compound.

基板製作方法 Substrate manufacturing method

將所述感光性樹脂組成物旋塗(spincoating)於玻璃(5cm×5cm)上,於100℃下實施100秒的預烘烤(pre-bake),形成膜。 對形成有膜的基板全面,使用曝光機以40mJ/cm2的曝光量來照射。 The photosensitive resin composition was spin-coated on glass (5 cm × 5 cm), and pre-bake was performed at 100 ° C. for 100 seconds to form a film. The entire surface of the substrate on which the film was formed was irradiated with an exposure machine at an exposure amount of 40 mJ / cm 2 .

將經曝光的基板於顯影液(KOH,0.05%)中顯影60秒,於230℃下進行20分鐘的後烘烤(post bake),獲得彩色圖案。 The exposed substrate was developed in a developing solution (KOH, 0.05%) for 60 seconds, and post-bake was performed at 230 ° C for 20 minutes to obtain a color pattern.

耐化學性的評價 Evaluation of chemical resistance

利用所述方法來製作基板,切割為1cm×5cm後,使切割為1cm×5cm的2片基板浸漬於16g的N-甲基-2-吡咯啶酮溶媒中後,於30℃的對流烘箱中進而進行40分鐘的烘烤(Baking)。測定取出了基板片的溶媒的吸光度,示於下述表1及圖1中。 A substrate was prepared by the above method, and after cutting into 1 cm × 5 cm, two substrates cut into 1 cm × 5 cm were immersed in 16 g of N-methyl-2-pyrrolidone solvent, and then convection oven at 30 ° C. Further, baking was performed for 40 minutes. The absorbance of the solvent from which the substrate sheet was taken out was measured and shown in Table 1 and FIG. 1 below.

藉由使用本說明書的一實施態樣的包含化學式1所表示的化合物的著色材料組成物,可獲得耐化學性優異的彩色濾光片用著色組成物及彩色濾光片。 By using a coloring material composition containing a compound represented by Chemical Formula 1 according to an embodiment of the present specification, a coloring composition for a color filter and a color filter having excellent chemical resistance can be obtained.

Claims (11)

一種下述化學式1所表示的化合物:
Figure TWI628239B_C0001
所述化學式1中,A是由下述化學式A-1或A-2所表示,
Figure TWI628239B_C0002
Figure TWI628239B_C0003
R1至R6中至少一者為下述化學式a所表示的結構,其餘相互相同或不同,分別獨立地為氫、-R(C=O)R'、-RO(C=O)R'、-ROR'、
Figure TWI628239B_C0004
、經取代或未經取代的烷基、經取代或未經取代的烯基、經取代或未經取代的環烷基、經取代或未經取代的芳基、或者交聯性基;或者所述R1與R2、R3與R4、以及R5與R6中至少一者可相互鍵結而形成經取代或未經取代的環;R7至R22相互相同或不同,分別獨立地為氫、鹵素、羥基、經取代或未經取代的烷氧基、或者經取代或未經取代的烷基,R及R"相互相同或不同,分別獨立地為直接鍵結、經取代或未經取代的伸烷基、或者經取代或未經取代的伸芳基,R'及R'''相互相同或不同,分別獨立地為氫、經取代或未經取代的烷基、經取代或未經取代的烯基、或者經取代或未經取代的芳基,Z-為陰離子性基,
Figure TWI628239B_C0005
所述化學式a中,Q 為-R101C(=O)R102-、-R103OC(=O)R104-、-R105C(=O)OR106-、-R107OC(=O)OR108-、
Figure TWI628239B_C0006
Figure TWI628239B_C0007
、-SOOR115-、-SOR116-、-SR117-、經取代或未經取代的伸烷基、或者經取代或未經取代的伸烯基,X 為羥基、胺基、-OCOOR118、-CONR119R120、或者-NR121COOR122,T為經取代或未經取代的烷基,R101至R109、R111、R112以及R114至R117相互相同或不同,分別獨立地為直接鍵結、經取代或未經取代的伸烷基、經取代或未經取代的伸環烷基、或者經取代或未經取代的伸烯基,R110、R113及R118至R122相互相同或不同,分別獨立地為氫、或者經取代或未經取代的烷基,p及q分別為1至4的整數,2≦p+q≦5,於p及q分別為2以上的情況下,2個以上的括弧內的結構相互相同或不同,*為與所述化學式1的N連結的部位,
Figure TWI628239B_C0008
為與所述化學式1連結的部位。
A compound represented by the following chemical formula 1:
Figure TWI628239B_C0001
In the above chemical formula 1, A is represented by the following chemical formula A-1 or A-2,
Figure TWI628239B_C0002
Figure TWI628239B_C0003
At least one of R1 to R6 is a structure represented by the following chemical formula a, and the rest are the same as or different from each other, and are independently hydrogen, -R (C = O) R ', -RO (C = O) R',- ROR ',
Figure TWI628239B_C0004
, Substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted aryl, or crosslinkable groups; or At least one of R1 and R2, R3 and R4, and R5 and R6 may be bonded to each other to form a substituted or unsubstituted ring; R7 to R22 are the same or different from each other, and are independently hydrogen, halogen, hydroxyl, Substituted or unsubstituted alkoxy, or substituted or unsubstituted alkyl, R and R "are the same as or different from each other, and are independently directly bonded, substituted or unsubstituted alkylene, Or substituted or unsubstituted arylene groups, R ′ and R ″ ′ are the same or different from each other, and are independently hydrogen, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, Or a substituted or unsubstituted aryl group, Z - is an anionic group,
Figure TWI628239B_C0005
In the chemical formula a, Q is -R101C (= O) R102-, -R103OC (= O) R104-, -R105C (= O) OR106-, -R107OC (= O) OR108-
Figure TWI628239B_C0006
,
Figure TWI628239B_C0007
, -SOOR115-, -SOR116-, -SR117-, substituted or unsubstituted alkylene, or substituted or unsubstituted alkenyl, X is hydroxyl, amine, -OCOOR118, -CONR119R120, or -NR121COOR122, T is a substituted or unsubstituted alkyl group, R101 to R109, R111, R112 and R114 to R117 are the same or different from each other, and are independently directly bonded, substituted or unsubstituted alkylene, Substituted or unsubstituted cycloalkylene, or substituted or unsubstituted alkenyl, R110, R113 and R118 to R122 are the same as or different from each other, and are independently hydrogen, or substituted or unsubstituted Alkyl groups, p and q are integers of 1 to 4, respectively 2 ≦ p + q ≦ 5, in the case where p and q are 2 or more, the structures in two or more brackets are the same or different from each other, * is the same as The N-linked part of the chemical formula 1,
Figure TWI628239B_C0008
It is a site linked to the above Chemical Formula 1.
如申請專利範圍第1項所述的化合物,其中所述交聯性基為下述化學式2至5中任一者所表示的結構者:[化學式2]
Figure TWI628239B_C0009
Figure TWI628239B_C0010
Figure TWI628239B_C0011
Figure TWI628239B_C0012
所述化學式2至5中,R201至R203相互相同或不同,分別獨立地為氫、或者經取代或未經取代的烷基,R204至R207相互相同或不同,分別獨立地為直接鍵結、-O-、-N(R208)-、經取代或未經取代的伸烷基、或者經取代或未經取代的伸環烷基,R208為氫、或者經取代或未經取代的烷基,r、s、t及u分別為1或2,於所述r、s、t及u分別為2的情況下,2個括弧內的結構可相同或不同。
The compound as described in Item 1 of the patent application, wherein the crosslinkable group is a structure represented by any one of the following Chemical Formulas 2 to 5: [Chemical Formula 2]
Figure TWI628239B_C0009
Figure TWI628239B_C0010
Figure TWI628239B_C0011
Figure TWI628239B_C0012
In the chemical formulae 2 to 5, R201 to R203 are the same as or different from each other, and are independently hydrogen or substituted or unsubstituted alkyl, and R204 to R207 are the same or different from each other, and are independently direct bonding,- O-, -N (R208)-, substituted or unsubstituted alkylene, or substituted or unsubstituted cycloalkyl, R208 is hydrogen, or substituted or unsubstituted alkyl, r , S, t, and u are 1 or 2, respectively. In the case where r, s, t, and u are 2, respectively, the structures within the two brackets may be the same or different.
如申請專利範圍第1項所述的化合物,其中所述X是相對於所述T與所述化學式a的苯基鍵結的位置而鍵結於鄰(ortho)位上者。The compound according to item 1 of the scope of the patent application, wherein the X is bonded to the ortho position relative to the position where the T is bonded to the phenyl group of the chemical formula a. 如申請專利範圍第1項所述的化合物,其中Z-為:包含鹵化烴基的磺醯亞胺酸、包含磺酸的陰離子、包含鹵素、硼、鋁的陰離子或者包含選自由鎢、鉬、矽及磷所組成的群組中的一種以上的元素及氧的陰離子。The compound as described in item 1 of the patent application, wherein Z - is: a sulfonylimide containing a halogenated hydrocarbon group, an anion containing a sulfonic acid, an anion containing halogen, boron, aluminum, or containing One or more elements in the group consisting of phosphorus and anions of oxygen. 如申請專利範圍第1項所述的化合物,其中所述化學式1是選自下述化合物中者:
Figure TWI628239B_C0013
Figure TWI628239B_C0014
Figure TWI628239B_C0015
Figure TWI628239B_C0016
Figure TWI628239B_C0017
Figure TWI628239B_C0018
Figure TWI628239B_C0019
Figure TWI628239B_C0020
Figure TWI628239B_C0021
Figure TWI628239B_C0022
Figure TWI628239B_C0023
Figure TWI628239B_C0024
Figure TWI628239B_C0025
Figure TWI628239B_C0026
Figure TWI628239B_C0027
Figure TWI628239B_C0028
Figure TWI628239B_C0029
Figure TWI628239B_C0030
Figure TWI628239B_C0031
Figure TWI628239B_C0032
Figure TWI628239B_C0033
Figure TWI628239B_C0034
Figure TWI628239B_C0035
Figure TWI628239B_C0036
Figure TWI628239B_C0037
Figure TWI628239B_C0038
Figure TWI628239B_C0039
Figure TWI628239B_C0040
Figure TWI628239B_C0041
Figure TWI628239B_C0042
Figure TWI628239B_C0043
The compound according to item 1 of the patent application scope, wherein the chemical formula 1 is selected from the following compounds:
Figure TWI628239B_C0013
Figure TWI628239B_C0014
Figure TWI628239B_C0015
Figure TWI628239B_C0016
Figure TWI628239B_C0017
Figure TWI628239B_C0018
Figure TWI628239B_C0019
Figure TWI628239B_C0020
Figure TWI628239B_C0021
Figure TWI628239B_C0022
Figure TWI628239B_C0023
Figure TWI628239B_C0024
Figure TWI628239B_C0025
Figure TWI628239B_C0026
Figure TWI628239B_C0027
Figure TWI628239B_C0028
Figure TWI628239B_C0029
Figure TWI628239B_C0030
Figure TWI628239B_C0031
Figure TWI628239B_C0032
Figure TWI628239B_C0033
Figure TWI628239B_C0034
Figure TWI628239B_C0035
Figure TWI628239B_C0036
Figure TWI628239B_C0037
Figure TWI628239B_C0038
Figure TWI628239B_C0039
Figure TWI628239B_C0040
Figure TWI628239B_C0041
Figure TWI628239B_C0042
Figure TWI628239B_C0043
一種著色材料組成物,其包含如申請專利範圍第1項至第5項中任一項所述的化合物。A coloring material composition comprising the compound according to any one of items 1 to 5 of the patent application. 如申請專利範圍第6項所述的著色材料組成物,其更包含染料及顏料中的至少一種。The coloring material composition as described in Item 6 of the patent application scope further includes at least one of dyes and pigments. 如申請專利範圍第7項所述的著色材料組成物,其中所述染料為選自氧雜蒽染料、花青染料以及氮雜卟啉染料中的一種以上的染料,所述顏料為藍色顏料或者紫色顏料。The coloring material composition as described in item 7 of the patent application scope, wherein the dye is one or more dyes selected from the group consisting of xanthene dyes, cyanine dyes and azaporphyrin dyes, and the pigments are blue pigments Or purple paint. 一種樹脂組成物,其包含如申請專利範圍第1項所述的化學式1所表示的化合物、黏合劑樹脂、多官能性單體、光起始劑、抗氧化劑以及溶媒。A resin composition comprising a compound represented by Chemical Formula 1 as described in item 1 of the patent application, a binder resin, a multifunctional monomer, a photoinitiator, an antioxidant, and a solvent. 一種彩色濾光片,其包含如申請專利範圍第9項所述的樹脂組成物。A color filter comprising the resin composition as described in item 9 of the patent application scope. 一種顯示器裝置,其包含如申請專利範圍第10項所述的彩色濾光片。A display device including the color filter as described in item 10 of the patent application scope.
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