TWI610614B - Flexible flat cable - Google Patents

Flexible flat cable Download PDF

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TWI610614B
TWI610614B TW099130909A TW99130909A TWI610614B TW I610614 B TWI610614 B TW I610614B TW 099130909 A TW099130909 A TW 099130909A TW 99130909 A TW99130909 A TW 99130909A TW I610614 B TWI610614 B TW I610614B
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film
layer
mask
conductive
adhesive layer
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TW201112941A (en
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森元昌平
武部稔
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大自達電線股份有限公司
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Abstract

一種可不使成為遮罩膜的貼附對象的基板的接地導體露出而容易地接地的遮罩膜、可使用該遮罩膜並以一個步驟而具有遮罩功能與阻抗控制功能的遮罩配線板、以及使用有該遮罩膜的接地方法。藉由加熱以及加壓而連接於導電構件(30)的遮罩膜(20)由熔點比加熱時的溫度更高的樹脂所形成,該遮罩膜(20)包括:覆蓋膜(25),在連接時,形成為比從導電性接著層(33)突出的導電性粒子(35)的平均突出長度(L2)更薄的層厚度(L1);以及依次層疊於覆蓋膜(25)的金屬薄膜層(24)及接著層(23)。 A mask film that can be easily grounded without exposing the ground conductor of the substrate to which the mask film is attached, and a mask wiring board that can use the mask film and has a mask function and an impedance control function in one step , And the grounding method using the mask film. The masking film (20) connected to the conductive member (30) by heating and pressing is formed of a resin having a melting point higher than the temperature at the time of heating. The masking film (20) includes: a cover film (25), At the time of connection, a layer thickness (L1) that is thinner than the average protrusion length (L2) of the conductive particles (35) protruding from the conductive adhesive layer (33); and the metal sequentially stacked on the cover film (25) Thin film layer (24) and adhesive layer (23).

Description

柔性扁平電纜 Flexible flat cable

本發明關於一種柔性扁平電纜(flexible flat cable)等的具有導電體的基板中所使用的遮罩膜(shield film)、具有該遮罩膜的遮罩配線板、以及遮罩膜的接地(ground)連接方法。The present invention relates to a shield film used in a substrate with a conductive body such as a flexible flat cable, a shield wiring board having the shield film, and a ground of the shield film )connection method.

以往,柔性扁平電纜等的具有導電體的基板在以電視(television)、錄影機(video recorder)、手機及個人電腦為代表的辦公自動化(Office Automation,OA)設備等的各種電子設備中,多被用於將設備內部或設備之間予以連接。Conventionally, substrates with conductors such as flexible flat cables have been used in various electronic devices such as office automation (OA) equipment represented by televisions, video recorders, mobile phones, and personal computers. Used to connect devices inside or between devices.

另外,近年來,由於資訊社會的發展,電子設備被要求實現電子通信的高速化,隨之,為了減輕來自高速化後的電信號的多餘輻射或來自外部的雜訊(noise),在柔性扁平電纜等的具有導電體的基板上貼附著遮罩膜。而且,因為需要在與所連接的設備之間進行阻抗(impedance)的匹配,所以所述基板貼附著具有對阻抗進行控制(control)的功能的阻抗控制膜(impedance control film)。In addition, in recent years, due to the development of the information society, electronic devices have been required to increase the speed of electronic communications. In order to reduce unnecessary radiation from high-speed electrical signals or noise from the outside, flexible and flat A masking film is attached to a substrate having a conductor such as a cable. Furthermore, because impedance matching with the connected device is required, the substrate is attached with an impedance control film having a function of controlling the impedance.

例如,在專利文獻1中,如圖6所示,揭示了一種柔性扁平電纜50,包括信號導體51與接地導體52的多個導體並排地排列在寬度方向上,由具有絕緣性的接著層53的發泡絕緣體54在厚度方向上,從兩側來夾持所述多個導體之後,經過層疊(laminate)加工,接著由具有導電性接著層55的金屬層56從兩側來夾持所述發泡絕緣體54。另外,在金屬層56上設置有絕緣性膜57。For example, in Patent Document 1, as shown in FIG. 6, a flexible flat cable 50 is disclosed, in which a plurality of conductors including a signal conductor 51 and a ground conductor 52 are arranged side by side in the width direction, and consist of an insulating adhesive layer 53 The foamed insulator 54 in the thickness direction, after sandwiching the plurality of conductors from both sides, undergoes a lamination process, and then is sandwiched from both sides by a metal layer 56 having a conductive adhesive layer 55 Foam insulator 54. In addition, an insulating film 57 is provided on the metal layer 56.

具有如上所述的構成的柔性扁平電纜50藉由將發泡絕緣體54的介電常數與空氣的介電常數予以複合,可對特性阻抗進行調整。另外,柔性扁平電纜50在金屬層56的作用下,具有遮罩效果。The flexible flat cable 50 having the above-described configuration can adjust the characteristic impedance by combining the dielectric constant of the foam insulator 54 and the dielectric constant of air. In addition, the flexible flat cable 50 has a shielding effect under the action of the metal layer 56.

另外,例如,在專利文獻2中,如圖7所示,揭示了一種阻抗控制遮罩配線板60,在基礎膜(base film)63上,包括信號導體61及接地導體62的多個導體並排地排列在寬度方向上,且設置有絕緣層64,而且,依次設置有包括具有導電性接著層65的開口金屬薄膜層66與絕緣性膜67的阻抗控制膜、以及包括具有導電性接著層68的非開口金屬薄膜層69與絕緣性膜70的遮罩膜。In addition, for example, in Patent Document 2, as shown in FIG. 7, an impedance control mask wiring board 60 is disclosed in which a plurality of conductors including a signal conductor 61 and a ground conductor 62 are arranged side by side on a base film 63 Arranged in the width direction and provided with an insulating layer 64, and in turn, an impedance control film including an opening metal thin film layer 66 having a conductive adhesive layer 65 and an insulating film 67, and a conductive adhesive layer 68 The non-opening metal thin film layer 69 and the insulating film 70 are masking films.

具有如上所述的構成的阻抗控制遮罩配線板60在開口金屬薄膜層66的作用下,具有阻抗控制效果,且在非開口金屬薄膜層69的作用下,具有遮罩效果。The impedance control mask wiring board 60 having the above-mentioned configuration has an impedance control effect under the action of the opening metal thin film layer 66, and has a mask effect under the action of the non-opening metal thin film layer 69.

[先行技術文獻][Advanced technical literature]

[專利文獻][Patent Literature]

[專利文獻1]日本專利特開2003-31033號公報[Patent Document 1] Japanese Patent Laid-Open No. 2003-31033

[專利文獻2]日本專利特開2006-24824號公報[Patent Document 2] Japanese Patent Laid-Open No. 2006-24824

但是,如圖6所示,對於專利文獻1的柔性扁平電纜50而言,為了使金屬層56的電位為接地電位,需要特意預先在導電性接著層55、發泡絕緣體54、以及接著層53內的一部分上形成非絕緣部58,並藉由填埋該非絕緣部58的導電性接著層59來將金屬層56與接地導體52予以連接。However, as shown in FIG. 6, for the flexible flat cable 50 of Patent Document 1, in order to set the potential of the metal layer 56 to the ground potential, the conductive adhesive layer 55, the foam insulator 54, and the adhesive layer 53 need to be specifically prepared in advance. A non-insulating portion 58 is formed on a part of the inside, and the metal layer 56 and the ground conductor 52 are connected by filling the conductive adhesive layer 59 of the non-insulating portion 58.

另外,為了使柔性扁平電纜50獲得阻抗效果與遮罩效果這兩個效果,需要至少兩個步驟即對發泡絕緣體54進行加工的步驟、及然後由金屬層56來進行夾持的步驟。In addition, in order to obtain the two effects of the impedance effect and the shielding effect of the flexible flat cable 50, at least two steps, namely, the step of processing the foamed insulator 54 and the step of clamping the metal layer 56 are required.

另外,如圖7所示,對於專利文獻2的阻抗控制遮罩配線板60而言,為了使開口金屬薄膜層66的電位為接地電位,也需要特意預先在絕緣層64內的一部分上設置非絕緣部71,並藉由填埋該非絕緣部71的導電性接著層65來將開口金屬薄膜層66與接地導體62予以連接。In addition, as shown in FIG. 7, in the impedance control mask wiring board 60 of Patent Document 2, in order to make the potential of the opening metal thin film layer 66 the ground potential, it is also necessary to intentionally provide a part of the insulating layer 64 in advance. The insulating portion 71 connects the opening metal thin film layer 66 and the ground conductor 62 by filling the conductive adhesive layer 65 of the non-insulating portion 71.

另外,為了使阻抗控制遮罩配線板60獲得阻抗效果與遮罩效果這兩個效果,需要形成開口金屬薄膜層以及非開口金屬薄膜層該兩個層的至少兩個步驟。In addition, in order for the impedance control mask wiring board 60 to obtain both the impedance effect and the mask effect, at least two steps of forming the two layers of the opening metal thin film layer and the non-opening metal thin film layer are required.

如此,專利文獻1的柔性扁平電纜50及專利文獻2的阻抗控制遮罩配線板60存在如下的問題:為了獲得遮罩效果以及阻抗控制效果,需要特意設置非絕緣部並使接地導體露出,或需要形成具有遮罩效果的層與具有阻抗控制效果的層的至少兩個步驟,會耗費工夫及成本(cost)。In this way, the flexible flat cable 50 of Patent Document 1 and the impedance control shield wiring board 60 of Patent Document 2 have the following problem: In order to obtain the shielding effect and the impedance control effect, it is necessary to specifically provide a non-insulating portion and expose the ground conductor, or At least two steps are required to form a layer with a masking effect and a layer with an impedance control effect, which takes time and cost.

因此,本發明的目的在於提供可不使成為遮罩膜的貼附對象的基板的接地導體露出而容易地接地的遮罩膜、可使用該遮罩膜並以一個步驟而具有遮罩功能與阻抗控制功能的遮罩配線板、以及使用有該遮罩膜的接地方法。Therefore, an object of the present invention is to provide a mask film that can be easily grounded without exposing the ground conductor of the substrate to which the mask film is attached, and can use the mask film to have a mask function and impedance in one step Shield wiring board for control function, and grounding method using the shielding film.

本發明的遮罩膜藉由加熱以及加壓而連接於導電構件,該導電構件包括接觸狀態下的用以與外部接地構件連接的金屬層及包含導電性粒子的導電性接著層,所述遮罩膜包括:覆蓋膜(cover film),由因所述加熱而軟化的樹脂所形成,藉由所述加熱以及加壓來連接之後,形成為比從所述導電性接著層突出的所述導電性粒子的平均突出長度更薄的層厚度,並且接著於所述導電性接著層;以及依次層疊於所述覆蓋膜的金屬薄膜層及接著層。The mask film of the present invention is connected to a conductive member by heating and pressing, the conductive member including a metal layer for connecting to an external ground member in a contact state and a conductive adhesive layer containing conductive particles, the mask The cover film includes a cover film formed of a resin softened by the heating, and after being connected by the heating and pressurization, the conductive film protrudes from the conductive adhesive layer. The average protruding length of the sex particles is a thinner layer thickness, followed by the conductive adhesive layer; and the metal thin film layer and the adhesive layer sequentially stacked on the cover film.

根據所述構成,當藉由加熱以及加壓來將導電構件連接於包括覆蓋膜、金屬薄膜層、以及接著層的遮罩膜時,遮罩膜內的由樹脂所形成的覆蓋膜因加熱而軟化,而且在連接時,覆蓋膜的層厚度比從導電構件內的導電性接著層突出的導電性粒子的平均突出長度更薄,因此,因加壓而從導電性接著層突出的導電性粒子可穿破遮罩膜內的覆蓋膜而到達金屬薄膜層為止。藉此,因為可經由導電性粒子來使遮罩膜內的金屬薄膜層的電位為接地電位,所以無需像以往那樣,將貼附著遮罩膜的基板內的接地導體與遮罩膜內的金屬薄膜層予以連接。因此,既不需要預先對基板進行加工來使接地導體露出的工夫,也不會耗費加工成本。另外,因為僅將導電構件連接於遮罩膜,所以即使例如在使用了長條狀的基板時,仍可在預期的位置容易地將遮罩膜接地。According to the above configuration, when the conductive member is connected to the mask film including the cover film, the metal thin film layer, and the adhesive layer by heating and pressurization, the cover film formed of resin in the mask film is heated by It softens, and at the time of connection, the layer thickness of the cover film is thinner than the average protruding length of the conductive particles protruding from the conductive adhesive layer in the conductive member, therefore, the conductive particles protruding from the conductive adhesive layer due to pressure It can penetrate the cover film in the mask film and reach the metal thin film layer. Thereby, since the potential of the metal thin film layer in the mask film can be grounded via conductive particles, there is no need to connect the ground conductor in the substrate to which the mask film is attached to the metal in the mask film as in the past The thin film layer is connected. Therefore, there is no need to process the substrate in advance to expose the ground conductor, and no processing cost is consumed. In addition, since only the conductive member is connected to the mask film, even when, for example, a long substrate is used, the mask film can be easily grounded at a desired position.

另外,在本發明的遮罩膜中,也可在所述接著層上進一步接著有插入層,藉由將所述插入層接著於具有導電體的基板,對具有該導電體的基板的阻抗進行控制。In addition, in the mask film of the present invention, an interposer layer may be further adhered to the adhesive layer, and by adhering the interposer layer to a substrate having a conductor, the impedance of the substrate having the conductor may be control.

根據所述構成,藉由對插入層的厚度進行調整,可對具有導電體的基板的阻抗進行調整。因此,遮罩膜包括對具有導電體的基板的阻抗進行調整的層以及具有遮罩效果的層,僅藉由將遮罩膜貼附於基板的一個步驟,就既可對基板賦予遮罩效果,又可對該基板賦予阻抗控制效果。According to the above configuration, by adjusting the thickness of the insertion layer, the impedance of the substrate having the conductor can be adjusted. Therefore, the mask film includes a layer that adjusts the impedance of the substrate with a conductor and a layer with a masking effect, and the masking effect can be imparted to the substrate by only one step of attaching the masking film to the substrate In addition, the substrate can be given an impedance control effect.

另外,在本發明的遮罩膜中,所述基板也可為柔性扁平電纜。In addition, in the mask film of the present invention, the substrate may be a flexible flat cable.

根據所述構成,可提供貼附於柔性扁平電纜的遮罩膜。According to the above configuration, it is possible to provide a masking film attached to the flexible flat cable.

另外,本發明是一種遮罩配線板,包括具有導電體的基板、以及如上所述的遮罩膜。In addition, the present invention is a mask wiring board including a substrate having a conductor and the mask film as described above.

根據所述構成,可提供貼附有遮罩膜的遮罩配線板。According to the above configuration, the mask wiring board to which the mask film is attached can be provided.

另外,本發明是一種遮罩膜的接地方法,該遮罩膜包括由樹脂所形成的覆蓋膜、以及依次層疊於所述覆蓋膜的金屬薄膜層及接著層,該遮罩膜的接地方法的特徵在於:In addition, the present invention is a grounding method for a masking film. The masking film includes a cover film formed of a resin, and a metal thin film layer and an adhesive layer sequentially stacked on the cover film. The characteristics are:

導電構件包括接觸狀態下的與外部接地構件連接的金屬層及包含導電性粒子的導電性接著層,以使所述樹脂軟化的溫度來對該導電構件一邊加熱、一邊加壓,將該導電性接著層與所述覆蓋膜予以接著,藉此,突出得比所述覆蓋膜的層厚度更長的所述導電性粒子到達所述金屬薄膜層為止,從而接地。The conductive member includes a metal layer connected to an external ground member in a contact state and a conductive adhesive layer containing conductive particles, and the conductive member is heated and pressurized at a temperature at which the resin softens to increase the conductivity The subsequent layer and the cover film are adhered, whereby the conductive particles protruding longer than the layer thickness of the cover film reach the metal thin film layer to be grounded.

根據所述接地方法,當藉由加熱以及加壓來將導電構件連接於包括覆蓋膜、金屬薄膜層、以及接著層的遮罩膜時,遮罩膜內的由樹脂所形成的覆蓋膜因加熱而軟化,而且在連接時,覆蓋膜的層厚度比從導電構件內的導電性接著層突出的導電性粒子的平均突出長度更薄,因此,因加壓而從導電性接著層突出的導電性粒子可穿破遮罩膜內的覆蓋膜而到達金屬薄膜層為止。藉此,因為可經由導電性粒子來使遮罩膜內的金屬薄膜層的電位為接地電位,所以無需像以往那樣,將貼附著遮罩膜的基板內的接地導體與遮罩膜內的金屬薄膜層予以連接。因此,既不需要預先對基板進行加工來使接地導體露出的工夫,也不會耗費加工成本。另外,因為僅將導電構件連接於遮罩膜,所以即使例如在使用了長條狀的基板時,仍可在預期的位置容易地將遮罩膜接地。According to the grounding method, when the conductive member is connected to the mask film including the cover film, the metal thin film layer, and the adhesive layer by heating and pressing, the cover film formed of resin in the mask film is heated by It softens, and when connected, the layer thickness of the cover film is thinner than the average protruding length of the conductive particles protruding from the conductive adhesive layer in the conductive member. Therefore, the conductivity of the conductive particles protruding from the conductive adhesive layer due to pressure The particles can penetrate the cover film in the mask film and reach the metal thin film layer. Thereby, since the potential of the metal thin film layer in the mask film can be grounded via conductive particles, there is no need to connect the ground conductor in the substrate to which the mask film is attached to the metal in the mask film as in the past The thin film layer is connected. Therefore, there is no need to process the substrate in advance to expose the ground conductor, and no processing cost is consumed. In addition, since only the conductive member is connected to the mask film, even when, for example, a long substrate is used, the mask film can be easily grounded at a desired position.

[發明的效果][Effect of invention]

根據本發明的遮罩膜,因為可經由導電性粒子來使遮罩膜內的金屬薄膜層的電位為接地電位,所以既不需要預先對基板進行加工來使接地導體露出的工夫,也不會耗費加工成本。另外,因為僅將導電構件連接於遮罩膜,所以可在預期的位置容易地將遮罩膜接地。According to the mask film of the present invention, since the potential of the metal thin film layer in the mask film can be grounded via conductive particles, there is no need to process the substrate in advance to expose the ground conductor. Consume processing costs. In addition, since only the conductive member is connected to the mask film, the mask film can be easily grounded at a desired position.

上述說明僅是本發明技術方案的概述,為了能夠更清楚瞭解本發明的技術手段,並可依照說明書的內容予以實施,以下以本發明的較佳實施例並配合附圖詳細說明如後。The above description is only an overview of the technical solutions of the present invention. In order to understand the technical means of the present invention more clearly and can be implemented according to the content of the specification, the following is a detailed description of the preferred embodiments of the present invention and the accompanying drawings.

以下,基於附圖來對本發明的實施方式進行說明。Hereinafter, embodiments of the present invention will be described based on the drawings.

(整體構成)(Overall composition)

如圖1所示,本發明的遮罩膜20藉由加熱以及加壓而連接於導電構件30,該導電構件30包括接觸狀態下的用以與外部接地構件連接的金屬層及包含導電性粒子35的導電性接著層33,所述遮罩膜20包括:覆蓋膜25,由因加熱而軟化的樹脂所形成,當藉由加熱以及加壓來連接時,形成為比從導電性接著層33突出的導電性粒子35的平均突出長度L2更薄的層厚度L1,並且接著於導電性接著層33;以及依次層疊於覆蓋膜25的金屬薄膜層24及接著層23。As shown in FIG. 1, the mask film 20 of the present invention is connected to a conductive member 30 by heating and pressing. The conductive member 30 includes a metal layer for connecting to an external ground member in a contact state and contains conductive particles 35. The conductive adhesive layer 33. The mask film 20 includes a cover film 25 formed of a resin softened by heating. When connected by heating and pressurization, it is formed from the conductive adhesive layer 33. The protruding conductive particles 35 have a thinner layer thickness L1 with an average protruding length L2, and are next to the conductive adhesive layer 33; and the metal thin film layer 24 and the adhesive layer 23 that are sequentially stacked on the cover film 25.

另外,如圖1所示,本發明的遮罩膜20貼附於柔性扁平電纜10等的具有導電體的基板上,該遮罩膜20具有如下的功能:減輕來自電信號的多餘輻射或來自外部的雜訊,並對阻抗進行調整,以使柔性扁平電纜10與連接於該柔性扁平電纜10的設備之間不會產生阻抗的不匹配。In addition, as shown in FIG. 1, the mask film 20 of the present invention is attached to a substrate having a conductor such as a flexible flat cable 10, and the mask film 20 has the following functions: reducing excess radiation from electrical signals or from External noise and adjust the impedance so that there is no impedance mismatch between the flexible flat cable 10 and the equipment connected to the flexible flat cable 10.

此外,因為本發明的遮罩膜20藉由加熱以及加壓而連接於與外部接地構件連接的導電構件30,所以可將該遮罩膜20的電位設為接地電位。In addition, since the mask film 20 of the present invention is connected to the conductive member 30 connected to the external ground member by heating and pressurization, the potential of the mask film 20 can be set to the ground potential.

此處,所謂「連接」是指兩個以上的構件至少進行電連接,在此情況下,所謂「連接」是指遮罩膜20與導電構件30至少進行電連接。Here, the “connection” means that at least two members are electrically connected at least. In this case, the “connection” means that the mask film 20 and the conductive member 30 are electrically connected at least.

(導電構件30)(Conductive member 30)

此處,首先對連接於本發明的遮罩膜20的導電構件30進行說明。如圖4(a)、圖4(b)所示,導電構件30具有如下的構成:在以接觸狀態與包含導電性粒子35的導電性接著層33接著的金屬層32上,更施加有鍍金層、鍍錫層等的鍍敷層31。Here, first, the conductive member 30 connected to the mask film 20 of the present invention will be described. As shown in FIGS. 4 (a) and 4 (b), the conductive member 30 has a structure in which a gold plating is applied to the metal layer 32 that is in contact with the conductive adhesive layer 33 including the conductive particles 35. Plating layer 31 such as a layer, a tin plating layer, or the like.

(導電性接著層33)(Conductive adhesive layer 33)

導電構件30中所含的導電性接著層33形成為導電性粒子35與接著劑34(丙烯酸(acrylic)系樹脂等)的混合體。即,導電性接著層33是使導電性粒子35分散在丙烯酸系樹脂等的接著劑34中而成的。導電性接著層33的電連接,是藉由接著劑34內的1個或多個導電性粒子35在導電性接著劑層33的厚度方向上連續地接觸來實現並藉由接著劑34的接著力來保持。The conductive adhesive layer 33 contained in the conductive member 30 is formed as a mixture of the conductive particles 35 and the adhesive 34 (acrylic resin or the like). That is, the conductive adhesive layer 33 is formed by dispersing the conductive particles 35 in the adhesive 34 such as acrylic resin. The electrical connection of the conductive adhesive layer 33 is achieved by the continuous contact of one or more conductive particles 35 in the adhesive 34 in the thickness direction of the conductive adhesive layer 33 and the adhesion of the adhesive 34 To maintain.

(接著劑34)(Adhesive 34)

關於導電性接著層33中所含的接著劑34,可列舉丙烯酸系樹脂、環氧(epoxy)系樹脂、矽(silicon)系樹脂、熱塑性彈性體(elastomer)系樹脂、橡膠(gum)系樹脂、以及聚酯(polyester)系樹脂等。再者,接著劑34既可以是所述樹脂的單體,也可以是所述樹脂的混合體。Examples of the adhesive 34 contained in the conductive adhesive layer 33 include acrylic resins, epoxy resins, silicon resins, thermoplastic elastomer (elastomer) resins, and gum resins. , And polyester resins. Furthermore, the adhesive 34 may be a monomer of the resin or a mixture of the resin.

另外,接著劑34也可更包含增粘劑。作為增粘劑,可列舉脂肪酸烴樹脂、C5/C9混合樹脂、松香(rosin)、松香衍生物、特殊樹脂、萜烯(terpene)樹脂、芳香族系烴樹脂、以及熱反應性樹脂等的增粘劑(tackifier)。In addition, the adhesive 34 may further contain a tackifier. Examples of tackifiers include fatty acid hydrocarbon resins, C5 / C9 mixed resins, rosin, rosin derivatives, special resins, terpene resins, aromatic hydrocarbon resins, and heat-reactive resins. Tackifier.

(導電性粒子35)(Conductive particles 35)

藉由金屬材料來形成導電性接著層33中所含的導電性粒子35的一部分或全部。例如,導電性粒子35有銅粉、銀粉、鎳(nickel)粉、覆蓋有銀的銅粉(覆蓋有Ag的Cu粉)、覆蓋有金的銅粉、覆蓋有銀的鎳粉(覆蓋有Ag的Ni粉)、以及覆蓋有金的鎳粉,可藉由水霧化法(water atomization method)、羰基法(carbonyl method)等來製作這些金屬粉。另外,除了所述粉以外,還可使用在金屬粉上包覆著樹脂的粒子、以及在樹脂上包覆著金屬粉的粒子。再者,導電性粒子35較佳為覆蓋有Ag的Cu粉、或覆蓋有Ag的Ni粉。原因在於可藉由廉價的材料來獲得導電性提高的導電性粒子35。A part or all of the conductive particles 35 included in the conductive adhesive layer 33 are formed by a metal material. For example, the conductive particles 35 include copper powder, silver powder, nickel powder, copper powder covered with silver (Cu powder covered with Ag), copper powder covered with gold, nickel powder covered with silver (covered with Ag Ni powder), and nickel powder covered with gold, these metal powders can be produced by a water atomization method, a carbonyl method, or the like. In addition to the powder, particles coated with resin on metal powder and particles coated with metal powder on resin can also be used. Furthermore, the conductive particles 35 are preferably Cu powder covered with Ag or Ni powder covered with Ag. The reason is that the conductive particles 35 with improved conductivity can be obtained by an inexpensive material.

另外,如圖4(a)所示,導電性粒子35處於與金屬層32接觸的狀態,並且在貼附於遮罩膜20的一側,該導電性粒子35的一部分從導電性接著層33突出。As shown in FIG. 4 (a), the conductive particles 35 are in contact with the metal layer 32, and part of the conductive particles 35 are separated from the conductive adhesive layer 33 on the side attached to the mask film 20. protruding.

(金屬層32)(Metal layer 32)

導電構件30中所含的金屬層32是由鎳、銅、銀、錫、金、鈀(palladium)、鋁(aluminium)、鉻(chrome)、鈦(titanium)、鋅、以及包含這些材料中的任一種材料或2種以上的材料的合金等的金屬材料所形成。The metal layer 32 contained in the conductive member 30 is made of nickel, copper, silver, tin, gold, palladium, aluminum, chrome, titanium, zinc, and those containing these materials It is formed of a metal material such as any one material or an alloy of two or more materials.

另外,如圖2所示,金屬層32連接於框體等的外部接地構件,該金屬層32的電位保持為接地電位。In addition, as shown in FIG. 2, the metal layer 32 is connected to an external ground member such as a housing, and the potential of the metal layer 32 is maintained at the ground potential.

而且,在金屬層32上施加有鍍金層、鍍錫層等的鍍敷層31。Furthermore, a plating layer 31 such as a gold plating layer, a tin plating layer, or the like is applied on the metal layer 32.

(遮罩膜20)(Mask film 20)

如圖1所示,使用所述導電構件30來接地的本發明的遮罩膜20以成層的方式依次層疊著具有接著層21的插入層22、具有接著層23的金屬薄膜層24、以及覆蓋膜25。As shown in FIG. 1, the mask film 20 of the present invention using the conductive member 30 to be grounded is sequentially laminated in a layered manner with an insertion layer 22 having an adhesive layer 21, a metal thin film layer 24 having an adhesive layer 23, and a cover膜 25。 Film 25.

(覆蓋膜25)(Cover 25)

遮罩膜20中所含的覆蓋膜25是由環氧系、聚酯系、丙烯酸系、苯酚(phenol)系、氨酯(urethane)系等的樹脂或這些樹脂的混合物所形成。The cover film 25 included in the mask film 20 is formed of epoxy-based, polyester-based, acrylic-based, phenol-based, urethane-based resin, or a mixture of these resins.

此處,圖1中的圓部E是將導電構件30內的導電性接著層33接著於覆蓋膜25的情況予以放大的部分。Here, the round portion E in FIG. 1 is an enlarged portion when the conductive adhesive layer 33 in the conductive member 30 is adhered to the cover film 25.

如圖1的圓部E所示,當導電構件30連接於遮罩膜20時,導電構件30內的導電性接著層33連接於遮罩膜20內的覆蓋膜25。當實現該接著時,覆蓋膜25被從導電構件30側加熱而軟化。As shown in the circle E of FIG. 1, when the conductive member 30 is connected to the mask film 20, the conductive adhesive layer 33 in the conductive member 30 is connected to the cover film 25 in the mask film 20. When this bonding is achieved, the cover film 25 is heated from the conductive member 30 side and softened.

另外,形成覆蓋膜25的環氧系樹脂是由在將導電構件30連接於遮罩膜20時的加熱溫度下軟化的樹脂所形成,該樹脂的軟化溫度處於100℃~140℃的範圍。The epoxy resin forming the cover film 25 is formed of a resin softened at a heating temperature when the conductive member 30 is connected to the mask film 20, and the softening temperature of the resin is in the range of 100 ° C to 140 ° C.

另外,如圖1的圓部E所示,導電性粒子35存在於導電構件30內的導電性接著層33的內部。當將遮罩膜20與導電構件30予以連接時,該導電性粒子35的一部分從導電性接著層33突出,該突出部的導電性粒子35的平均突出長度L2被設定得比覆蓋膜25的層厚度L1更長。In addition, as shown in the circle E of FIG. 1, the conductive particles 35 exist inside the conductive adhesive layer 33 in the conductive member 30. When the mask film 20 and the conductive member 30 are connected, a part of the conductive particles 35 protrudes from the conductive adhesive layer 33, and the average protruding length L2 of the conductive particles 35 of the protruding portion is set to be The layer thickness L1 is longer.

(金屬薄膜層24)(Metal film layer 24)

遮罩膜20中所含的金屬薄膜層24具有減輕來自電信號的多餘輻射或來自外部的雜訊的遮罩效果。The metal thin film layer 24 contained in the masking film 20 has a masking effect that reduces unnecessary radiation from electrical signals or noise from the outside.

另外,因為連接於外部接地構件的導電構件30藉由加熱以及加壓而連接於遮罩膜20,所以金屬薄膜層24經由穿破覆蓋膜25的導電性接著層33內的導電性粒子35而與導電構件30連接。藉此,可通過導電構件30來將遮罩膜20接地。In addition, since the conductive member 30 connected to the external ground member is connected to the mask film 20 by heating and pressing, the metal thin film layer 24 passes through the conductive particles 35 in the conductive adhesive layer 33 of the cover film 25 Connected to the conductive member 30. Thereby, the shielding film 20 can be grounded through the conductive member 30.

作為形成該金屬薄膜層24的金屬材料,可列舉鎳、銅、銀、錫、金、鈀、鋁、鉻、鈦、鋅、以及包含這些材料中的任一種材料或2種以上的材料的合金等。另外,根據所需的遮罩效果以及耐反覆彎曲性、耐滑動性來適當地選擇金屬薄膜層24的金屬材料以及厚度即可,但對於厚度而言,設為3 μm~20 μm左右的厚度即可。另外,較佳為6 μm~15 μm,更佳為9 μm~12 μm。若厚度不足3 μm,則無法獲得充分的傳輸特性,若厚度超過20 μm,則彎曲性成為問題。此外,金屬薄膜層24可考慮使用金屬箔、鍍敷層等,但較佳為金屬箔。Examples of the metal material forming the metal thin film layer 24 include nickel, copper, silver, tin, gold, palladium, aluminum, chromium, titanium, zinc, and alloys containing any one or two or more of these materials Wait. In addition, the metal material and thickness of the metal thin film layer 24 may be appropriately selected according to the required mask effect, repeated bending resistance, and sliding resistance, but the thickness is set to a thickness of about 3 μm to 20 μm That's it. In addition, it is preferably 6 μm to 15 μm, and more preferably 9 μm to 12 μm. If the thickness is less than 3 μm, sufficient transmission characteristics cannot be obtained, and if the thickness exceeds 20 μm, bendability becomes a problem. In addition, the metal thin film layer 24 may be a metal foil, a plating layer, or the like, but it is preferably a metal foil.

(插入層22)(Insert layer 22)

遮罩膜20中所含的插入層22是由聚對苯二甲酸乙二酯(polyethylene terephthalate)、聚乙烯(polyethylene)、聚丙烯(polypropylene)、發泡聚對苯二甲酸乙二酯、發泡聚乙烯、發泡聚丙烯、以及不織布等所構成,且利用接著層23而層疊於金屬薄膜層24,藉此來進一步增加遮罩膜20的厚度。另外,藉由對該厚度進行調整,在將遮罩膜20貼附於柔性扁平電纜10時,可對柔性扁平電纜10的阻抗進行調整。而且,可藉由接著層21來將插入層22接著於柔性扁平電纜10。根據此種構成,遮罩膜20可藉由接著層23的接著來將插入層22貼附於柔性扁平電纜10等。如此,藉由對插入層22的厚度進行調整,可對柔性扁平電纜10的阻抗進行調整。因此,遮罩膜20包括對柔性扁平電纜10的阻抗進行調整的層與具有遮罩效果的層,僅藉由將遮罩膜20貼附於柔性扁平電纜10的一個步驟,就既可對柔性扁平電纜10賦予遮罩效果,又可對該柔性扁平電纜10賦予阻抗控制效果。The insertion layer 22 contained in the mask film 20 is made of polyethylene terephthalate (polyethylene terephthalate), polyethylene (polyethylene), polypropylene (polypropylene), expanded polyethylene terephthalate, It is composed of foamed polyethylene, foamed polypropylene, non-woven fabric, and the like, and is laminated on the metal thin film layer 24 by the adhesive layer 23, thereby further increasing the thickness of the mask film 20. In addition, by adjusting the thickness, when the mask film 20 is attached to the flexible flat cable 10, the impedance of the flexible flat cable 10 can be adjusted. Furthermore, the insertion layer 22 can be adhered to the flexible flat cable 10 by the adhesion layer 21. According to such a configuration, the masking film 20 can adhere the insertion layer 22 to the flexible flat cable 10 or the like by the adhesion layer 23. In this way, by adjusting the thickness of the insertion layer 22, the impedance of the flexible flat cable 10 can be adjusted. Therefore, the masking film 20 includes a layer for adjusting the impedance of the flexible flat cable 10 and a layer having a masking effect. By only one step of attaching the masking film 20 to the flexible flat cable 10, the flexibility The flat cable 10 imparts a shielding effect, and can also impart an impedance control effect to the flexible flat cable 10.

(接著層21、23)(Layer 21, 23)

遮罩膜20中所含的接著層21、23是由烯烴(olefin)系、氨酯系、醋酸乙烯酯(vinyl acetate)系、聚酯系、聚醯胺(polyamide)系、橡膠系、及丙烯酸系等的熱塑性樹脂,或苯酚系、環氧系、氨酯系、三聚氰胺(melamine)系、聚醯亞胺(polyimide)系、及醇酸(alkyd)系等的熱硬化型樹脂所構成。可藉由接著層21來將插入層22接著於柔性扁平電纜10。另外,可藉由接著層23來將金屬薄膜層24接著於插入層22。The adhesive layers 21 and 23 contained in the mask film 20 are composed of olefin-based, urethane-based, vinyl acetate-based, polyester-based, polyamide-based, rubber-based, and Thermoplastic resins such as acrylic resins, or thermosetting resins such as phenol resins, epoxy resins, urethane resins, melamine resins, polyimide resins, and alkyd resins. The insertion layer 22 can be adhered to the flexible flat cable 10 by the adhesion layer 21. In addition, the metal thin film layer 24 can be adhered to the insertion layer 22 by the adhesive layer 23.

若使用具有所述構成的遮罩膜20,則當藉由加熱以及加壓來將導電構件30連接於包括覆蓋膜25、金屬薄膜層24、以及接著層23的遮罩膜20時,遮罩膜20內的由樹脂所形成的覆蓋膜25因加熱而軟化,而且在連接時,覆蓋膜25的層厚度L1比從導電構件30內的導電性接著層33突出的導電性粒子35的平均突出長度L2更薄,因此,因加壓而從導電性接著層33突出的導電性粒子35可穿破遮罩膜20內的覆蓋膜25而到達金屬薄膜層24為止。藉此,因為可經由導電性粒子35來使遮罩膜20內的金屬薄膜層24的電位為接地電位,所以無需像以往那樣,將貼附著遮罩膜20的基板內的接地導體與遮罩膜20內的金屬薄膜層24予以連接。因此,既不需要預先對基板進行加工來使接地導體露出的工夫,也不會耗費加工成本。另外,因為僅將導電構件30連接於遮罩膜20,所以即使例如在使用了長條狀的基板時,仍可在預期的位置容易地將遮罩膜20接地。If the mask film 20 having the above configuration is used, when the conductive member 30 is connected to the mask film 20 including the cover film 25, the metal thin film layer 24, and the adhesive layer 23 by heating and pressing, the mask The cover film 25 made of resin in the film 20 is softened by heating, and when connected, the layer thickness L1 of the cover film 25 protrudes more than the average of the conductive particles 35 protruding from the conductive adhesive layer 33 in the conductive member 30 Since the length L2 is thinner, the conductive particles 35 protruding from the conductive adhesive layer 33 due to pressure can penetrate the cover film 25 in the mask film 20 and reach the metal thin film layer 24. Thereby, since the potential of the metal thin film layer 24 in the mask film 20 can be set to the ground potential through the conductive particles 35, there is no need to connect the ground conductor and the mask in the substrate to which the mask film 20 is attached as in the past The metal thin film layer 24 in the film 20 is connected. Therefore, there is no need to process the substrate in advance to expose the ground conductor, and no processing cost is consumed. In addition, since only the conductive member 30 is connected to the mask film 20, even when, for example, a long substrate is used, the mask film 20 can be easily grounded at a desired position.

(柔性扁平電纜10)(Flexible flat cable 10)

接著,對貼附於具有所述構成的遮罩膜20的柔性扁平電纜10進行說明。如圖1所示,柔性扁平電纜10具有如下的構成:在基礎膜14上,包括信號導體11與接地導體12的多個導體並排地排列在寬度方向上,而且在所述多個導體上設置著絕緣膜13。Next, the flexible flat cable 10 attached to the mask film 20 having the above-mentioned configuration will be described. As shown in FIG. 1, the flexible flat cable 10 has the following structure: on the base film 14, a plurality of conductors including a signal conductor 11 and a ground conductor 12 are arranged side by side in the width direction, and are provided on the plurality of conductors着 INSULATION FILM 13.

基礎膜14與絕緣膜13均由工程塑料(engineering plastic)所形成。例如,可列舉聚對苯二甲酸乙二酯、聚丙烯、交聯聚乙烯、聚酯、聚苯並咪唑(polybenzimidazole)、聚醯亞胺、聚醯亞胺聚醯胺、聚醚醯亞胺(polyetherimide)、以及聚苯硫醚(Poly Phenylene Sulfide,PPS)等的樹脂。當不太要求耐熱性時,較佳為廉價的聚酯膜,當要求阻燃性時,較佳為聚苯硫醚膜,此外,當要求耐熱性時,較佳為聚醯亞胺膜。Both the base film 14 and the insulating film 13 are formed of engineering plastic. For example, polyethylene terephthalate, polypropylene, cross-linked polyethylene, polyester, polybenzimidazole (polybenzimidazole), polyimide, polyimide, polyimide, polyetherimide (polyetherimide), and polyphenylene sulfide (Poly Phenylene Sulfide, PPS) and other resins. When heat resistance is not so much required, an inexpensive polyester film is preferred, when flame retardancy is required, a polyphenylene sulfide film is preferred, and when heat resistance is required, a polyimide film is preferred.

另外,在將基礎膜14與信號導體11及接地導體12予以接合時,可藉由接著劑來進行接著,也可對樹脂進行擠出成形。In addition, when the base film 14 is joined to the signal conductor 11 and the ground conductor 12, it may be adhered by an adhesive, or the resin may be extruded.

另外,如圖3所示,在柔性扁平電纜10的端部設置有加強板40,使柔性扁平電纜的連接器(connector)插入部的強度提高。In addition, as shown in FIG. 3, a reinforcement plate 40 is provided at the end of the flexible flat cable 10 to improve the strength of the connector insertion portion of the flexible flat cable.

具有所述構成的柔性扁平電纜10藉由遮罩膜20內的金屬薄膜層24來使電路信號變得穩定。而且,柔性扁平電纜10在遮罩膜20的作用下,具有電磁遮罩效果。The flexible flat cable 10 having the above configuration stabilizes the circuit signal by the metal thin film layer 24 in the mask film 20. Moreover, the flexible flat cable 10 has an electromagnetic shielding effect under the action of the shielding film 20.

再者,遮罩膜20除了可用於柔性扁平電纜之外,還可用於柔性電路板(Flexible Printed Circuit,FPC)、搭載著晶片的柔性電路板(Chip On Flexible,COF)、RF(柔性印刷板)、多層柔性基板、以及硬質(rigid)基板等,但並不一定限於這些基板。In addition, the mask film 20 can be used not only for flexible flat cables, but also for flexible printed circuits (FPC), chip-on-chip flexible circuit boards (COF), and RF (flexible printed boards) ), Multilayer flexible substrates, rigid substrates, etc., but not necessarily limited to these substrates.

另外,如圖2所示,柔性扁平電纜10的接地導體12與導電構件30同樣地連接於所裝入的電子設備的框體等的外部接地構件,藉此,接地導體12與導電構件30達到相同的接地電位。而且,如上所述,可經由導電性粒子35來將導電構件30與遮罩膜20設為相同電位,因此,可使遮罩膜20與接地導體12為相同的接地電位。In addition, as shown in FIG. 2, the ground conductor 12 of the flexible flat cable 10 is connected to the external ground member such as the housing of the incorporated electronic device like the conductive member 30, whereby the ground conductor 12 and the conductive member 30 reach The same ground potential. Furthermore, as described above, the conductive member 30 and the mask film 20 can be set to the same potential via the conductive particles 35, and therefore, the mask film 20 and the ground conductor 12 can be set to the same ground potential.

(遮罩配線板1)(Mask wiring board 1)

接著,對由遮罩膜20與柔性扁平電纜10構成的遮罩配線板1進行說明。Next, the mask wiring board 1 composed of the mask film 20 and the flexible flat cable 10 will be described.

如圖1以及圖3所示,本發明的遮罩配線板1具有如下的構成:藉由一塊遮罩膜20而貼在柔性扁平電纜10(FFC)的單面或兩個面上,或者包裹在柔性扁平電纜10的兩個面上,導電構件30連接於遮罩膜20。As shown in FIGS. 1 and 3, the mask wiring board 1 of the present invention has the following structure: attached to one or both sides of a flexible flat cable 10 (FFC) by a mask film 20, or wrapped On both sides of the flexible flat cable 10, the conductive member 30 is connected to the shielding film 20.

如上所述,因為導電構件30連接於遮罩膜20,所以可通過連接於框體等的外部接地構件的導電構件30來使遮罩膜20接地。As described above, since the conductive member 30 is connected to the mask film 20, the mask film 20 can be grounded by the conductive member 30 connected to an external ground member such as a casing.

(遮罩膜20的接地方法)(Grounding method of mask film 20)

接著,使用圖4(a)、圖4(b)來詳細地對遮罩膜20的接地方法進行說明。Next, the grounding method of the mask film 20 will be described in detail using FIGS. 4 (a) and 4 (b).

如圖4(a)、圖4(b)所示,本發明的遮罩膜20的接地方法,是包括由樹脂所形成的覆蓋膜25、以及依次層疊於覆蓋膜25的金屬薄膜層24及接著層23的遮罩膜20的接地方法,導電構件30包括接觸狀態下的連接於外部接地構件的金屬層32及包含導電性粒子35的導電性接著層33,以使樹脂軟化的溫度來對該導電構件30一邊加熱、一邊加壓,將導電性接著層33與覆蓋膜25予以接著,藉此,突出得比覆蓋膜25的層厚度L1更長的導電性粒子35到達金屬薄膜層24為止,從而接地。As shown in FIGS. 4 (a) and 4 (b), the grounding method of the mask film 20 of the present invention includes a cover film 25 formed of resin, and a metal thin film layer 24 sequentially stacked on the cover film 25 and The grounding method of the mask film 20 of the next layer 23, the conductive member 30 includes a metal layer 32 connected to an external ground member in a contact state and a conductive adhesive layer 33 containing conductive particles 35 at a temperature at which the resin softens The conductive member 30 is heated and pressurized to bond the conductive adhesive layer 33 and the cover film 25, whereby the conductive particles 35 protruding longer than the layer thickness L1 of the cover film 25 reach the metal thin film layer 24 To ground.

首先,如圖4(a)所示,將保持為接地電位的導電構件30對準遮罩膜20,並從導電構件30側進行加熱。此時的加熱溫度設為使樹脂所形成的覆蓋膜25軟化的100℃~140℃的範圍,藉由該加熱,覆蓋膜25開始軟化。再者,此時的加熱溫度較佳為120℃~135℃,若該加熱溫度不足100℃,則無法獲得充分的接著。另外,若所述加熱溫度超過140℃,則會對柔性扁平電纜10造成損傷(damage),因此不佳。接著,對覆蓋膜25進行加熱之後,從導電構件30側向遮罩膜20加壓,藉此,導電構件30內的導電性接著層33進一步密著於覆蓋膜25。此時,覆蓋膜25因軟化而具有粘著性,從導電性接著層33突出的導電性粒子35進入至覆蓋膜25內。此處,當遮罩膜20與導電構件30連接時,從導電性接著層33突出的導電性粒子35的平均突出長度L2比覆蓋膜的層厚度L1更長,因此,藉由從導電構件30側進一步進行加壓,導電性粒子35會穿破覆蓋膜25並到達金屬薄膜層24為止。First, as shown in FIG. 4 (a), the conductive member 30 held at the ground potential is aligned with the mask film 20 and heated from the conductive member 30 side. The heating temperature at this time is set in the range of 100 ° C. to 140 ° C. to soften the cover film 25 formed of the resin. By this heating, the cover film 25 starts to soften. In addition, the heating temperature at this time is preferably 120 ° C. to 135 ° C. If the heating temperature is less than 100 ° C., sufficient adhesion cannot be obtained. In addition, if the heating temperature exceeds 140 ° C, damage to the flexible flat cable 10 is caused, which is not good. Next, after the cover film 25 is heated, the mask film 20 is pressed from the conductive member 30 side, whereby the conductive adhesive layer 33 in the conductive member 30 is further adhered to the cover film 25. At this time, the cover film 25 has adhesiveness due to softening, and the conductive particles 35 protruding from the conductive adhesive layer 33 enter the cover film 25. Here, when the mask film 20 and the conductive member 30 are connected, the average protrusion length L2 of the conductive particles 35 protruding from the conductive adhesive layer 33 is longer than the layer thickness L1 of the cover film. The side is further pressurized, and the conductive particles 35 will penetrate the cover film 25 and reach the metal thin film layer 24.

藉此,如圖4(b)所示,金屬層32與金屬薄膜層24經由導電性粒子35而成為導通狀態,從而可將金屬薄膜層24的電位設為接地電位。As a result, as shown in FIG. 4 (b), the metal layer 32 and the metal thin film layer 24 are brought into a conductive state via the conductive particles 35, so that the potential of the metal thin film layer 24 can be set to the ground potential.

如此,根據所述接地方法,當藉由加熱以及加壓來將導電構件30連接於包括覆蓋膜25、金屬薄膜層24以及接著層23的遮罩膜20時,遮罩膜20內的由樹脂所形成的覆蓋膜25因加熱而軟化,而且在連接時,覆蓋膜25的層厚度L1比從導電構件30內的導電性接著層33突出的導電性粒子35的平均突出長度L2更薄,因此,因加壓而從導電性接著層33突出的導電性粒子35可穿破遮罩膜內的覆蓋膜25而到達金屬薄膜層24為止。藉此,因為可經由導電性粒子35來使遮罩膜20內的金屬薄膜層24的電位為接地電位,所以無需像以往那樣,將貼附著遮罩膜20的基板內的接地導體與遮罩膜20內的金屬薄膜層24予以連接。因此,既不要需預先對基板進行加工來使接地導體露出的工夫,也不會耗費加工成本。另外,因為僅將導電構件30連接於遮罩膜20,所以即使例如在使用了長條狀的基板時,仍可在預期的位置容易地將遮罩膜20接地。As such, according to the grounding method, when the conductive member 30 is connected to the mask film 20 including the cover film 25, the metal thin film layer 24, and the adhesive layer 23 by heating and pressing, the resin in the mask film 20 The formed cover film 25 is softened by heating, and when connected, the layer thickness L1 of the cover film 25 is thinner than the average protrusion length L2 of the conductive particles 35 protruding from the conductive adhesive layer 33 in the conductive member 30, so The conductive particles 35 protruding from the conductive adhesive layer 33 due to the pressure can penetrate the cover film 25 in the mask film and reach the metal thin film layer 24. Thereby, since the potential of the metal thin film layer 24 in the mask film 20 can be set to the ground potential through the conductive particles 35, there is no need to connect the ground conductor and the mask in the substrate to which the mask film 20 is attached as in the past The metal thin film layer 24 in the film 20 is connected. Therefore, there is no need to process the substrate in advance to expose the ground conductor, and it does not consume processing costs. In addition, since only the conductive member 30 is connected to the mask film 20, even when, for example, a long substrate is used, the mask film 20 can be easily grounded at a desired position.

(遮罩膜20的製造方法)(Manufacturing method of mask film 20)

接著,使用圖5來對遮罩膜20的製造方法進行說明。Next, a method of manufacturing the mask film 20 will be described using FIG. 5.

如圖5所示,本實施方式的遮罩膜20的製造方法包括:卷出步驟,將捲繞成卷狀的金屬薄膜層24卷出;覆蓋膜形成步驟,在金屬薄膜層24上形成覆蓋膜25;接著層形成步驟,在金屬薄膜層24上形成接著層23;插入層形成步驟,藉由接著層23來貼合具有接著層21的插入層22而形成遮罩膜20;以及纏繞步驟,將所形成的遮罩膜20纏繞成卷狀。As shown in FIG. 5, the manufacturing method of the mask film 20 of this embodiment includes: a roll-out step to roll out the metal thin film layer 24 wound into a roll shape; a cover film forming step to form a cover on the metal thin film layer 24 Film 25; adhesive layer forming step, forming adhesive layer 23 on metal thin film layer 24; insertion layer forming step, bonding adhesive layer 22 with adhesive layer 21 by adhesive layer 23 to form masking film 20; and winding step , The formed mask film 20 is wound into a roll shape.

具體而言,首先在卷出步驟中,將放置(set)在卷出機41上的卷狀的金屬薄膜層24卷出。然後,一邊由引導輥(roller)來對所卷出的金屬薄膜層24進行引導(guide),一邊使該金屬薄膜層24向塗佈裝置42移動。Specifically, first, in the unwinding step, the rolled metal film layer 24 set on the unwinding machine 41 is rolled out. Then, while the rolled metal thin film layer 24 is guided by a roller, the metal thin film layer 24 is moved to the coating device 42.

接著,在覆蓋膜形成步驟中,藉由塗佈裝置42來將環氧系樹脂等塗佈到金屬薄膜層24上,在乾燥爐43中經過乾燥,從而形成覆蓋膜25。然後,再次一邊由引導輥進行引導,一邊向塗佈裝置44移動。Next, in the coating film forming step, the epoxy resin or the like is applied to the metal thin film layer 24 by the coating device 42 and dried in the drying furnace 43 to form the coating film 25. Then, while being guided by the guide roller again, it moves to the coating device 44.

接著,在接著層形成步驟中,藉由塗佈裝置44來將熱塑性樹脂或熱硬化型樹脂塗佈到形成有覆蓋膜25的金屬薄膜層24,在乾燥爐45中經過乾燥,從而形成接著層23。Next, in the adhesive layer forming step, the thermoplastic resin or thermosetting resin is applied to the metal thin film layer 24 on which the cover film 25 is formed by the coating device 44 and dried in the drying furnace 45 to form the adhesive layer twenty three.

然後,在插入層形成步驟中,藉由貼合機46來將預先另外製造的具有接著層21的插入層22,貼合到形成有覆蓋膜25與接著層23的金屬薄膜層24上,從而製造遮罩膜20。Then, in the interlayer formation step, the interlayer 22 having the adhesion layer 21 separately manufactured in advance is attached to the metal thin film layer 24 on which the cover film 25 and the adhesion layer 23 are formed by the bonding machine 46, thereby Manufacturing mask film 20.

最後,一邊由引導輥來對完成的遮罩膜20進行引導,一邊藉由纏繞機47來將該遮罩膜20逐漸纏繞成卷狀。藉此,可製造本實施方式的遮罩膜20。Finally, while guiding the completed mask film 20 by a guide roller, the mask film 20 is gradually wound into a roll shape by a winding machine 47. Thereby, the mask film 20 of this embodiment can be manufactured.

以上,對本發明的一個實施方式進行了說明。再者,本發明不必限定於所述實施方式。In the above, one embodiment of the present invention has been described. Furthermore, the present invention is not necessarily limited to the above-mentioned embodiment.

例如,在本實施方式的情況下,導電性粒子35的剖面具有圓形的形狀,但不必限定於此,只要在連接時,與金屬層32接觸,且從導電性接著層33突出的平均突出長度L2比覆蓋膜25的層厚度L1更長,則所述導電性粒子35的剖面也可具有圓形(只要是橢圓形、雞蛋形等角帶有弧度的形狀即可)、樹突(dendrite)形狀、鱗片形狀、針形狀、鎖鏈形狀、尖峰(spike)形狀等任一個形狀。再者,較佳為圓形。For example, in the case of this embodiment, the cross-section of the conductive particles 35 has a circular shape, but it is not necessarily limited to this, as long as it is in contact with the metal layer 32 at the time of connection and protrudes from the conductive adhesive layer 33 on average When the length L2 is longer than the layer thickness L1 of the cover film 25, the cross section of the conductive particles 35 may also have a circular shape (as long as it is an elliptical shape, an egg shape, etc. with a curved shape), dendrite (dendrite ) Shape, scale shape, needle shape, chain shape, spike shape, etc. Furthermore, it is preferably circular.

另外,在圖4(a)、圖4(b)中,導電構件30為如下的構成:在導電性接著層33的厚度方向上包含1個導電性粒子35,多個該導電性粒子35排列在導電性接著層33的寬度方向上,但本發明不必限定於此。例如,導電性接著層33的厚度方向上所含的導電性粒子35不限於1個,也可根據導電性粒子35的粒子徑,將多個導電性粒子35在接觸狀態下連續地排列在導電性接著層33的厚度方向上。In addition, in FIGS. 4 (a) and 4 (b), the conductive member 30 has a configuration in which one conductive particle 35 is included in the thickness direction of the conductive adhesive layer 33 and a plurality of the conductive particles 35 are arranged In the width direction of the conductive adhesive layer 33, the present invention is not necessarily limited to this. For example, the conductive particles 35 contained in the thickness direction of the conductive adhesive layer 33 are not limited to one, and a plurality of conductive particles 35 may be continuously arranged in a conductive state in contact with each other according to the particle diameter of the conductive particles 35 The adhesive layer 33 is in the thickness direction.

另外,在圖5的遮罩膜20的製造方法中,藉由貼合機46來將預先形成有接著層21的插入層22貼合於形成有覆蓋膜25與接著層23的金屬薄膜層24,但不必限定於此,也可在形成有覆蓋膜25與接著層23的金屬薄膜層24上依次形成插入層22與接著層21。In addition, in the manufacturing method of the mask film 20 of FIG. 5, the interposer layer 22 in which the adhesive layer 21 is formed in advance is bonded to the metal thin film layer 24 on which the cover film 25 and the adhesive layer 23 are formed by the bonding machine 46 However, it is not necessarily limited to this, and the insertion layer 22 and the adhesion layer 21 may be sequentially formed on the metal thin film layer 24 on which the cover film 25 and the adhesion layer 23 are formed.

以上,對本發明的實例進行了說明,但僅對具體例進行了例示,並不特別地限定本發明,可適當地對具體的構成等進行設計及變更。另外,發明的實施方式中所述的作用及效果僅列舉了由本發明產生的最佳作用及效果,本發明的作用及效果並不限定於本發明的實施方式中所述的作用及效果。The examples of the present invention have been described above, but only specific examples have been exemplified, the present invention is not particularly limited, and specific configurations and the like can be appropriately designed and changed. In addition, the actions and effects described in the embodiments of the invention only list the best actions and effects produced by the present invention, and the actions and effects of the present invention are not limited to the actions and effects described in the embodiments of the present invention.

本發明可利用於柔性扁平電纜等的具有導電體的基板上所使用的遮罩膜、及具有遮罩膜的遮罩配線板。The present invention can be applied to a mask film used on a substrate having a conductor such as a flexible flat cable, and a mask wiring board having a mask film.

以上所述,僅是本發明的較佳實施例而已,並非對本發明作任何形式上的限制,雖然本發明已以較佳實施例揭露如上,然而並非用以限定本發明,任何熟悉本專業的技術人員,在不脫離本發明技術方案範圍內,當可利用上述揭示的結構及技術內容作出些許的更動或修飾為等同變化的等效實施例,但是凡是末脫離本發明技術方案的內容,依據本發明的技術實質對以上實施例所作的任何簡單修改、等同變化與修飾,均仍屬於本發明技術方案的範圍內。The above is only the preferred embodiments of the present invention, and does not limit the present invention in any form. Although the present invention has been disclosed in the preferred embodiments as above, it is not intended to limit the present invention. Anyone familiar with the profession Technical personnel, without departing from the scope of the technical solution of the present invention, when the above disclosed structure and technical content can be used to make some changes or modifications to equivalent equivalent embodiments, but any content that does not depart from the technical solution of the present invention is based on Any simple modifications, equivalent changes, and modifications made to the above embodiments by the technical essence of the present invention still fall within the scope of the technical solution of the present invention.

1...遮罩配線板1. . . Shield wiring board

10...柔性扁平電纜10. . . Flexible flat cable

11、51、61...信號導體11, 51, 61. . . Signal conductor

12、52、62...接地導體12, 52, 62. . . Grounding conductor

13...絕緣膜13. . . Insulating film

14、63...基礎膜14, 63. . . Base film

20...遮罩膜20. . . Masking film

21、23、53...接著層21, 23, 53. . . Next layer

22...插入層twenty two. . . Insert layer

24...金屬薄膜層twenty four. . . Metal film layer

25...覆蓋膜25. . . Cover film

30...導電構件30. . . Conductive member

31...鍍敷層31. . . Plating layer

32、56...金屬層32, 56. . . Metal layer

33、55、59、65、68...導電性接著層33, 55, 59, 65, 68. . . Conductive adhesive layer

34...接著劑34. . . Adhesive

35...導電性粒子35. . . Conductive particles

40...加強板40. . . Reinforcing plate

41...卷出機41. . . Unwinding machine

42、44...塗佈裝置42, 44. . . Coating device

43、45...乾燥爐43, 45. . . Drying furnace

46...貼合機46. . . Laminating machine

47...纏繞機47. . . Winding machine

50...柔性扁平電纜50. . . Flexible flat cable

54...發泡絕緣體54. . . Foam insulator

57、67、70...絕緣性膜57, 67, 70. . . Insulating film

58、71...非絕緣部58, 71. . . Non-insulated part

60...阻抗控制遮罩配線板60. . . Impedance control shield wiring board

64...絕緣層64. . . Insulation

66...開口金屬薄膜層66. . . Open metal film layer

69...非開口金屬薄膜層69. . . Non-opening metal film layer

E...圓部E. . . Circle

L1...層厚度L1. . . Layer thickness

L2...平均突出長度L2. . . Average protruding length

圖1是本發明實施方式的遮罩配線板的圖2的A-A'線箭視剖面圖。FIG. 1 is a cross-sectional view taken along line AA ′ of FIG. 2 of the mask wiring board according to the embodiment of the present invention.

圖2是表示本發明實施方式的遮罩配線板的外觀的圖。2 is a diagram showing the appearance of a mask wiring board according to an embodiment of the present invention.

圖3是本發明實施方式的遮罩配線板的圖2的B-B'線箭視剖面圖。3 is a cross-sectional view taken along line BB ′ of FIG. 2 of the mask wiring board according to the embodiment of the present invention.

圖4(a)是表示本發明實施方式的遮罩膜的接地方法中,將導電構件與遮罩膜予以連接之前的圖。圖4(b)是表示本發明實施方式的遮罩膜的接地方法中,將導電構件與遮罩膜予以連接時的圖。FIG. 4 (a) is a diagram showing a method before grounding the mask film in the embodiment of the present invention, before connecting the conductive member and the mask film. 4 (b) is a diagram showing a method of connecting the conductive member and the mask film in the method of grounding the mask film according to the embodiment of the present invention.

圖5是表示本發明實施方式的遮罩膜的製造方法的圖。5 is a diagram showing a method of manufacturing a mask film according to an embodiment of the present invention.

圖6是表示專利文獻1的柔性扁平電纜的剖面的圖。6 is a diagram showing a cross section of the flexible flat cable of Patent Document 1. FIG.

圖7是表示專利文獻2的阻抗控制遮罩配線板的剖面的圖。7 is a diagram showing a cross section of an impedance control mask wiring board of Patent Document 2. FIG.

1...遮罩配線板1. . . Shield wiring board

10...柔性扁平電纜10. . . Flexible flat cable

11...信號導體11. . . Signal conductor

12...接地導體12. . . Grounding conductor

13...絕緣膜13. . . Insulating film

14...基礎膜14. . . Base film

20...遮罩膜20. . . Masking film

21、23...接著層21, 23. . . Next layer

22...插入層twenty two. . . Insert layer

24...金屬薄膜層twenty four. . . Metal film layer

25...覆蓋膜25. . . Cover film

30...導電構件30. . . Conductive member

33...導電性接著層33. . . Conductive adhesive layer

35...導電性粒子35. . . Conductive particles

E...圓部E. . . Circle

L1...層厚度L1. . . Layer thickness

L2...平均突出長度L2. . . Average protruding length

Claims (1)

一種柔性扁平電纜,包括:導電構件,所述導電構件具有金屬層及包含導電性粒子的導電性接著層;覆蓋膜,所述覆蓋膜形成為比從所述導電性接著層突出的所述導電性粒子的平均突出長度更薄的層厚度,並且接著於所述導電性接著層;遮罩膜,所述遮罩膜具有依次層疊於所述覆蓋膜的金屬薄膜層、接著層以及插入層;以及具有接地導體的基板,所述具有接地導體的基板與所述插入層接著,且所述導電構件與所述接地導體間無電性連接。 A flexible flat cable includes: a conductive member having a metal layer and a conductive adhesive layer containing conductive particles; a cover film formed to be more conductive than the conductive adhesive layer The average protruding length of the sex particles is a thinner layer thickness, and is followed by the conductive adhesive layer; a mask film, the mask film having a metal thin film layer, an adhesive layer, and an insertion layer that are sequentially stacked on the cover film; And a substrate with a ground conductor, the substrate with a ground conductor is connected to the insertion layer, and the conductive member and the ground conductor are not electrically connected.
TW099130909A 2009-09-18 2010-09-13 Flexible flat cable TWI610614B (en)

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JP2009-217650 2009-09-18
JP2009217650A JP2011066329A (en) 2009-09-18 2009-09-18 Shield film, shielded wiring board including the same, ground connection method in the shield film

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TWI610614B true TWI610614B (en) 2018-01-01

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