TWI606543B - Transportation system and method for transporting processing member - Google Patents

Transportation system and method for transporting processing member Download PDF

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TWI606543B
TWI606543B TW105129745A TW105129745A TWI606543B TW I606543 B TWI606543 B TW I606543B TW 105129745 A TW105129745 A TW 105129745A TW 105129745 A TW105129745 A TW 105129745A TW I606543 B TWI606543 B TW I606543B
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acoustic wave
emitting device
carrier
processing component
wave emitting
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TW105129745A
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Chinese (zh)
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TW201812964A (en
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李雨青
林俊宏
王育青
鄭博中
陳桂順
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台灣積體電路製造股份有限公司
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Description

運送系統及運送加工元件的方法 Transport system and method of transporting processing components

本揭露係關於一種運送系統及利用該運送系統運送加工元件的方法,特別係關於一種運送製造半導體裝置的加工元件的運送系統及運送該加工元件的方法。 The present disclosure relates to a transport system and a method of transporting a processing component using the transport system, and more particularly to a transport system for transporting a processing component for manufacturing a semiconductor device and a method of transporting the processing component.

半導體裝置被用於多種電子應用,例如個人電腦、行動電話、數位相機以及其他電子設備。半導體裝置的製造通常是藉由在半導體基板上依序沉積絕緣或介電層材料、導電層材料以及半導體層材料,接著使用微影製程圖案化所形成的各種材料層,以形成電路組件和零件於此半導體基板之上。在積體電路之材料及其設計上的技術進步已發展出多個世代的積體電路。相較於前一個世代,每一世代具有更小更複雜的電路。然而,這些發展提昇了加工及製造積體電路的複雜度。為了使這些發展得以實現,在積體電路的製造以及生產上相似的發展也是必須的。 Semiconductor devices are used in a variety of electronic applications, such as personal computers, mobile phones, digital cameras, and other electronic devices. The semiconductor device is generally fabricated by sequentially depositing an insulating or dielectric layer material, a conductive layer material, and a semiconductor layer material on a semiconductor substrate, and then patterning the various material layers formed using a lithography process to form circuit components and parts. Above the semiconductor substrate. Technological advances in the materials and design of integrated circuits have led to the development of integrated circuits for many generations. Each generation has smaller and more complex circuits than the previous generation. However, these developments have increased the complexity of processing and manufacturing integrated circuits. In order for these developments to be realized, similar developments in the manufacture and production of integrated circuits are also necessary.

在半導體裝置的製造中,多種加工元件是依序被使用,以製造積體電路在半導體晶圓之上。舉例而言,在顯影步驟中,具有不同圖案的光罩係被使用以對半導體晶圓進行顯影。為使光罩依照製程順序被使用,上述多個光罩是透過多個 裝置進行運送。由於現有的方法及廠房設備仍無法有效率的運送光罩,因此仍需一種新的光罩運送系統以更高的效率完成半導體晶圓的加工。 In the fabrication of semiconductor devices, a variety of processing elements are used sequentially to fabricate integrated circuits over the semiconductor wafer. For example, in the developing step, masks having different patterns are used to develop the semiconductor wafer. In order to use the reticle in accordance with the process sequence, the plurality of reticles are transmitted through a plurality of The device is shipped. Since the existing methods and equipment still cannot efficiently transport the reticle, a new reticle transport system is still needed to process the semiconductor wafer with higher efficiency.

有鑑於此,本揭露之一目的在於提供一種運送系統,其可用於運送光罩或其餘製造半導體裝置所使用的加工元件,以更高的完成多個半導體製程步驟。 In view of the above, it is an object of the present disclosure to provide a transport system that can be used to transport a reticle or other processing components used in the fabrication of semiconductor devices to accomplish a higher number of semiconductor fabrication steps.

根據本揭露之一實施例,上述運送系統包括一聲波發射裝置,配置用以產生聲波;以及一承載裝置,配置用於承載該加工元件,其中當該加工元件設置於該承載裝置之上且該承載裝置相對該聲波發射裝置設置時,該加工元件藉由該聲波發射裝置所產生的聲波相對該承載裝置移動。 According to an embodiment of the present disclosure, the transport system includes an acoustic wave emitting device configured to generate sound waves, and a carrying device configured to carry the processing component, wherein the processing component is disposed on the carrier device and the When the carrying device is disposed relative to the acoustic wave transmitting device, the acoustic wave generated by the processing component by the acoustic wave transmitting device moves relative to the carrying device.

在上述實施例中,該聲波發射裝置與該承載裝置相隔一間距L,該間距L約略等於nλ/2,其中λ為該聲波發射裝置所產生的聲波的波長,n為大於等於1的自然數。 In the above embodiment, the acoustic wave transmitting device is spaced apart from the carrying device by a distance L which is approximately equal to nλ/2, wherein λ is the wavelength of the acoustic wave generated by the acoustic wave emitting device, and n is a natural number greater than or equal to 1. .

在上述實施例中,運送系統更包括一夾持頭沿一軸線相對該聲波發射裝置設置並配置用於夾持該加工元件。 In the above embodiment, the transport system further includes a gripping head disposed along an axis relative to the acoustic wave emitting device and configured to grip the processing element.

在上述實施例中,該聲波發射裝置包括:一底座;一可動件,沿一軸線相對該底座設置並面對該反射單元;複數個柱體,連結該底座與該可動件;以及一換能器,連結該等柱體之一者,當該換能器作動時,該可動件相對該底座進行震動。 In the above embodiment, the acoustic wave emitting device comprises: a base; a movable member disposed along the axis opposite to the base and facing the reflecting unit; a plurality of cylinders connecting the base and the movable member; and a transducing member And connecting one of the cylinders, the movable member vibrates relative to the base when the transducer is actuated.

在上述實施例中,夾持頭作為聲波反射元件,反射來自聲波發射裝置所產生的聲波。此時,聲波發射裝置與該夾持頭相隔一高度差H,該高度差H滿足方程式H=(2m+1)λ/4。 或者,運送系統更包括一換能器連結該夾持頭並配置用以產生聲波,夾持頭與聲波發射裝置同時產生聲波。此時,聲波發射裝置與該夾持頭相隔一高度差H,該高度差H滿足方程式H=mλ/2。 In the above embodiment, the chucking head functions as an acoustic wave reflecting element that reflects sound waves generated from the acoustic wave transmitting device. At this time, the acoustic wave emitting device is separated from the chuck by a height difference H which satisfies the equation H = (2m + 1) λ / 4. Alternatively, the transport system further includes a transducer coupled to the clamping head and configured to generate an acoustic wave, the clamping head simultaneously generating an acoustic wave with the acoustic wave emitting device. At this time, the acoustic wave emitting device is separated from the clamping head by a height difference H which satisfies the equation H=mλ/2.

本揭露之另一目的在於提供一種運送一加工元件的方法,該方法包括:放置該加工元件於一承載裝置之上;移動該承載裝置至一聲波發射裝置之上;以及以該聲波發射裝置產生具有能量變化之聲波,使位於該承載裝置之上的該加工元件藉由該聲波發射裝置所產生的聲波相對該承載裝置移動;以及自該承載裝置移除該加工元件。 Another object of the present disclosure is to provide a method of transporting a processing component, the method comprising: placing the processing component on a carrier device; moving the carrier device onto an acoustic wave emitting device; and generating the acoustic wave emitting device An acoustic wave having an energy change causes the processing element located above the carrier to move relative to the carrier by the acoustic wave generated by the acoustic emission device; and removing the processing component from the carrier.

在上述實施例中,當該承載裝置移動至該聲波發射裝置之上時,該聲波發射裝置與該承載裝置相隔一間距L,該間距L約略等於nλ/2,其中λ為該聲波發射裝置所產生的聲波的波長,n為大於或等於1的自然數。 In the above embodiment, when the carrying device moves onto the acoustic wave transmitting device, the acoustic wave transmitting device is spaced apart from the carrying device by a distance L, which is approximately equal to nλ/2, wherein λ is the acoustic wave transmitting device The wavelength of the generated sound wave, n is a natural number greater than or equal to 1.

在上述實施例中,當該承載裝置移動至該聲波發射裝置之上時,該承載裝置位於該聲波發射裝置以及一用於自該承載裝置移除該加工元件之夾持頭之間。 In the above embodiment, when the carrier device is moved over the acoustic wave emitting device, the carrier device is located between the acoustic wave transmitting device and a clamping head for removing the processing component from the carrier device.

在上述實施例中,改變該聲波發射裝置所產生的聲波的能量的方法包括,改變聲波的頻率及改變聲波的波長。 In the above embodiment, the method of changing the energy of the acoustic wave generated by the acoustic wave transmitting device includes changing the frequency of the acoustic wave and changing the wavelength of the acoustic wave.

在上述實施例中,夾持頭作為聲波反射元件,該聲波發射裝置所產生的聲波的波長滿足公式H=(2m+1)λ/4。H為該聲波發射裝置與該夾持頭之間的高度差,λ為該聲波發射裝置所產生的聲波的波長,m為大於或等於0的自然數。或者,該方法更包括利用一連結該夾持頭的一換能器產生另一聲 波,夾持頭與聲波發射裝置同時產生聲波,其中該聲波發射裝置所產生的聲波的波長滿足下列公式H=mλ/2。H為該聲波發射裝置與該夾持頭之高度差,λ為該聲波發射裝置所產生的聲波的波長,m為大於或等於1的自然數。 In the above embodiment, the chucking head serves as an acoustic wave reflecting element, and the wavelength of the acoustic wave generated by the acoustic wave transmitting device satisfies the formula H = (2m + 1) λ / 4. H is the height difference between the acoustic wave emitting device and the chucking head, λ is the wavelength of the sound wave generated by the sound wave emitting device, and m is a natural number greater than or equal to zero. Alternatively, the method further includes generating another sound by using a transducer coupled to the clamping head The wave, the chucking head and the acoustic wave emitting device simultaneously generate sound waves, wherein the wavelength of the sound wave generated by the sound wave emitting device satisfies the following formula H=mλ/2. H is the height difference between the acoustic wave emitting device and the clamping head, λ is the wavelength of the acoustic wave generated by the acoustic wave emitting device, and m is a natural number greater than or equal to 1.

1、1a、1b‧‧‧運送系統 1, 1a, 1b‧‧‧ delivery system

10‧‧‧加工元件載入口 10‧‧‧Processing component loading

11‧‧‧托架 11‧‧‧ bracket

20‧‧‧傳送裝置 20‧‧‧Transfer device

21‧‧‧控制單元 21‧‧‧Control unit

23‧‧‧機械手臂 23‧‧‧ Robotic arm

3、3’‧‧‧加工元件 3, 3'‧‧‧Processing components

301‧‧‧本體 301‧‧‧ Ontology

303‧‧‧薄膜膠 303‧‧‧ Film adhesive

30、30a、30b‧‧‧交換裝置 30, 30a, 30b‧‧‧ exchange devices

31‧‧‧基座 31‧‧‧ Pedestal

32‧‧‧升降單元 32‧‧‧ Lifting unit

33‧‧‧升降單元 33‧‧‧ Lifting unit

34、34a‧‧‧夾持頭 34, 34a‧‧‧ clamping head

35、35a‧‧‧夾持頭 35, 35a‧‧‧ clamping head

40‧‧‧承載裝置 40‧‧‧ Carrying device

41‧‧‧載臺本體 41‧‧‧Terminal body

43‧‧‧開口 43‧‧‧ openings

45‧‧‧吸盤裝置 45‧‧‧Sucker device

451‧‧‧吸孔 451‧‧ ‧ suction hole

47‧‧‧薄膜 47‧‧‧film

49‧‧‧真空來源 49‧‧‧vacuum source

5‧‧‧基板 5‧‧‧Substrate

50‧‧‧加工裝置 50‧‧‧Processing device

51‧‧‧光源 51‧‧‧Light source

53‧‧‧鏡片組件 53‧‧‧ lens components

55‧‧‧基板夾持座 55‧‧‧Substrate holder

60‧‧‧聲波發射裝置 60‧‧‧Sonic launcher

61‧‧‧換能器 61‧‧‧Transducer

62b‧‧‧底座 62b‧‧‧Base

63‧‧‧振盪器 63‧‧‧Oscillator

64b‧‧‧可動件 64b‧‧‧ movable parts

66b‧‧‧柱體 66b‧‧‧Cylinder

68b‧‧‧柱體 68b‧‧‧Cylinder

69b‧‧‧換能器 69b‧‧‧Transducer

70‧‧‧控制裝置 70‧‧‧Control device

80‧‧‧方法 80‧‧‧ method

81-84‧‧‧操作 81-84‧‧‧Operation

S1、S2、S3、S5‧‧‧駐波 S1, S2, S3, S5‧‧‧ standing waves

S4‧‧‧震波 S4‧‧‧ shock wave

L‧‧‧間距 L‧‧‧ spacing

H‧‧‧高度差 H‧‧‧ height difference

Z‧‧‧軸線 Z‧‧‧ axis

根據以下的詳細說明並配合所附圖式做完整揭露。應注意的是,根據本產業的一般作業,圖示並未必按照比例繪製。事實上,可能任意的放大或縮小元件的尺寸,以做清楚的說明。 The full disclosure is based on the following detailed description and in conjunction with the drawings. It should be noted that the illustrations are not necessarily drawn to scale in accordance with the general operation of the industry. In fact, it is possible to arbitrarily enlarge or reduce the size of the component for a clear explanation.

第1圖顯示本揭露之部分實施例之運送系統之示意圖。 Figure 1 shows a schematic diagram of a transport system of some embodiments of the present disclosure.

第2圖顯示本揭露之部分實施例之運送系統之部分元件之示意圖。 Figure 2 is a schematic illustration of some of the components of the transport system of some embodiments of the present disclosure.

第3圖顯示本揭露之部分實施例之承載裝置之上視圖。 Figure 3 shows a top view of a carrier device of some embodiments of the present disclosure.

第4圖顯示沿第3圖之B-B’線段所視之剖面圖。 Fig. 4 is a cross-sectional view taken along line B-B' of Fig. 3.

第5圖顯示本揭露之部分實施例之運送加工元件之方法之流程圖。 Figure 5 is a flow chart showing a method of transporting a processing component in accordance with some embodiments of the present disclosure.

第6圖顯示本揭露之部分實施例之運送加工元件之方法之步驟之示意圖。 Figure 6 is a schematic illustration of the steps of a method of transporting a component in accordance with some embodiments of the present disclosure.

第7圖顯示本揭露之部分實施例之運送加工元件之方法之步驟之示意圖。 Figure 7 is a schematic illustration of the steps of a method of transporting a component in accordance with some embodiments of the present disclosure.

第8圖顯示本揭露之部分實施例之運送加工元件之方法之步驟之示意圖。 Figure 8 is a schematic illustration of the steps of a method of transporting a component in accordance with some embodiments of the present disclosure.

第9圖顯示本揭露之部分實施例之運送加工元件之方法之步驟之示意圖。 Figure 9 is a schematic illustration of the steps of a method of transporting a component in accordance with some embodiments of the present disclosure.

第10圖顯示本揭露之部分實施例之運送系統之部分元件之示意圖,其中一駐波S2產生於聲波發射裝置與加工元件之間。 Figure 10 is a schematic illustration of some of the components of the transport system of some embodiments of the present disclosure, wherein a standing wave S2 is generated between the acoustic wave emitting device and the processing element.

第11圖顯示本揭露之部分實施例之運送系統之部分元件之示意圖,其中一駐波S3產生於聲波發射裝置與夾持頭之間。 Figure 11 is a view showing a part of the components of the transport system of some embodiments of the present disclosure, wherein a standing wave S3 is generated between the acoustic wave transmitting device and the chucking head.

第12圖顯示本揭露之部分實施例之運送系統之部分元件之示意圖,其中一駐波S5產生於聲波發射裝置與夾持頭之間。 Figure 12 is a view showing a part of the components of the transport system of some embodiments of the present disclosure, wherein a standing wave S5 is generated between the acoustic wave transmitting device and the chucking head.

以下將特舉數個具體之較佳實施例,並配合所附圖式做詳細說明,圖上顯示數個實施例。然而,本揭露可以許多不同形式實施,不局限於以下所述之實施例,在此提供之實施例可使得揭露得以更透徹及完整,以將本揭露之範圍完整地傳達予同領域熟悉此技藝者。 In the following, a number of specific preferred embodiments will be described in detail with reference to the accompanying drawings, which illustrate several embodiments. However, the present disclosure can be implemented in many different forms, and is not limited to the embodiments described below, and the embodiments provided herein may be made to provide a more thorough and complete disclosure of the scope of the disclosure. By.

而且,為便於描述,在此可以使用諸如“在...之下”、“在...下方”、“下部”、“在...之上”、“上部”等的空間相對術語,以描述如圖所示的一個元件或部件與另一個(或另一些)元件或部件的關係。除了圖中所示的方位外,空間相對術語旨在包括器件在使用或操作中的不同方位。裝置可以以其他方式定向(旋轉90度或在其他方位上),而本文使用的空間相對描述符可以同樣地作相應的解釋。應該理解,可以在方法之前、期間和之後提供額外的操作,並且對於方法的其他實施例,可以替換或消除一些描述的操作。 Moreover, for convenience of description, spatially relative terms such as "under", "below", "lower", "above", "upper", etc. may be used herein. To describe the relationship of one element or component to another (or other) element or component as illustrated. Spatially relative terms are intended to encompass different orientations of the device in use or operation. The device may be otherwise oriented (rotated 90 degrees or in other orientations), and the spatially relative descriptors used herein may be interpreted accordingly. It should be understood that additional operations may be provided before, during, and after the method, and that some of the described operations may be substituted or eliminated for other embodiments of the method.

必需了解的是,為特別描述或圖示之元件可以此技術人士所熟知之各種形式存在。此外,當某元件在其它元件「上」時,有可能是指「直接」在其它元件上,或之間夾設有 其它元件。 It is to be understood that the elements specifically described or illustrated may be in various forms well known to those skilled in the art. In addition, when a component is "on" another component, it may mean "directly" on other components, or between Other components.

此外,實施例中可能使用相對性的用語,例如「較低」或「底部」及「較高」或「頂部」,以描述圖示的一個元件對於另一元件的相對關係。能理解的是,如果將圖示的裝置翻轉使其上下顛倒,則所敘述在「較低」側的元件將會成為在「較高」側的元件。 In addition, relative terms such as "lower" or "bottom" and "higher" or "top" may be used in the embodiments to describe the relative relationship of one element to another. It will be understood that if the illustrated device is flipped upside down, the component described on the "lower" side will be the component on the "higher" side.

在此,「約」、「大約」之用語通常表示在一給定值或範圍的20%之內,較佳是10%之內,且更佳是5%之內。在此給定的數量為大約的數量,意即在沒有特定說明的情況下,仍可隱含「約」、「大約」之含義。 Here, the terms "about" and "about" are usually expressed within 20% of a given value or range, preferably within 10%, and more preferably within 5%. The quantity given here is an approximate quantity, meaning that the meaning of "about" or "about" may be implied without specific explanation.

第1圖顯示本揭露之部分實施例之運送系統1之示意圖。根據本揭露之部分實施例,運送系統1包括一加工元件載入口10、一傳送裝置20、一交換裝置30、一承載裝置40、一加工裝置50、一聲波發射裝置60、及一用於控制上述各裝置之控制裝置70。運送系統1之元件數量可以增加或減少,並不僅以此實施例為限。 Figure 1 shows a schematic view of a transport system 1 of some embodiments of the present disclosure. According to some embodiments of the present disclosure, the transport system 1 includes a processing component loading port 10, a transport device 20, an exchange device 30, a carrier device 40, a processing device 50, an acoustic wave transmitting device 60, and a The control device 70 of each of the above devices is controlled. The number of components of the transport system 1 can be increased or decreased, and is not limited to this embodiment.

在部分實施例中,加工元件載入口10配置以執行加工元件3自一托架11進入運送系統1,或自運送系統1移出加工元件3至托架11。在部分實施例中,加工元件載入口10可放置二個托架11。二個托架11其中之一者用於裝載即將運送至運送系統1之加工元件3,二個托架11其中之另一者用於裝載自運送系統1移出之加工元件3。 In some embodiments, the processing element loading port 10 is configured to perform processing element 3 from a carriage 11 into the transport system 1 or to remove the processing element 3 from the transport system 1 to the cradle 11. In some embodiments, the processing element loading port 10 can hold two brackets 11. One of the two carriages 11 is used to load the processing element 3 to be transported to the transport system 1, the other of which is used to load the processing element 3 removed from the transport system 1.

傳送裝置20係配置用於傳送加工元件3來回於加工元件載入口10與交換裝置30之間。在部分實施例中,傳送裝 置20設置於加工元件載入口10與交換裝置30之間。傳送裝置20可包括一控制單元21及一機械手臂23。機械手臂23受來自控制單元21之訊號所控制。機械手臂23可為一六軸機械手臂,並配置用於抓取加工元件3。 The conveyor 20 is configured to convey the machining element 3 back and forth between the machining element carrier 10 and the switching device 30. In some embodiments, the transport device The setting 20 is disposed between the processing component carrying inlet 10 and the switching device 30. The transport device 20 can include a control unit 21 and a robot arm 23. The robot arm 23 is controlled by a signal from the control unit 21. The robot arm 23 can be a six-axis robot arm and is configured to grip the machining element 3.

交換裝置30配置用於在加工元件3放置於承載裝置40前後抓取加工元件3。在部分實施例中,如第2圖所示,交換裝置30包括一基座31、二個升降單元32、33、及二個夾持頭34、35。二個升降單元32、33各自連結於基座31底面。二個夾持頭34、35分別連結於二個升降單元32、33之末端。基座31可繞一旋轉軸A轉動,且二個升降單元32、33可獨立相對基座31進行垂直方向之移動。二個夾持頭34、35係配置利用適當之方式夾持加工元件3。舉例而言,二個夾持頭34、35分別連結於一真空來源,並利用真空所產生之吸力固定加工元件3於其底面。 The exchange device 30 is configured to grip the machining element 3 before and after the machining element 3 is placed on the carrier device 40. In some embodiments, as shown in FIG. 2, the exchange device 30 includes a base 31, two lifting units 32, 33, and two clamping heads 34, 35. The two lifting units 32 and 33 are each coupled to the bottom surface of the base 31. The two clamping heads 34, 35 are respectively coupled to the ends of the two lifting units 32, 33. The base 31 is rotatable about a rotation axis A, and the two lifting units 32, 33 are independently movable in the vertical direction with respect to the base 31. The two clamping heads 34, 35 are configured to grip the processing element 3 in a suitable manner. For example, the two clamping heads 34, 35 are respectively connected to a vacuum source, and the processing element 3 is fixed to the bottom surface by the suction force generated by the vacuum.

在部分實施例中,二個夾持頭34、35用於連結加工元件3的表面係由金屬材質所製成,其具有高度反射聲波之特性。在部分實施例中,二個夾持頭34、35之表面係具有一凹陷,以利聲波之反射。 In some embodiments, the surfaces of the two clamping heads 34, 35 for joining the processing elements 3 are made of a metal material having a characteristic of highly reflected sound waves. In some embodiments, the surfaces of the two clamping heads 34, 35 have a recess to facilitate reflection of sound waves.

第3圖顯示本揭露之部分實施例中承載裝置40之上視圖,第4圖顯示沿第3圖B-B’截線所視之剖面圖。承載裝置40配置用於承載加工元件3,並移動加工元件3於一裝卸位置(第6圖)與一加工位置(第7圖)之間。在部分實施例中,如第3圖所示,承載裝置40包括一載臺本體41及二個吸盤裝置45。一開口43穿設載臺本體41之中心,其中開口43之大小可依 照加工元件3之尺寸進行調整。二個吸盤裝置45分別設置於開口43之相對二側。如第4圖所示,每一吸盤裝置45包括複數個吸孔451形成於其中,吸孔451係連結於一真空來源49。另外,一薄膜47係覆蓋於吸孔451之一端。 Figure 3 shows a top view of the carrier device 40 in some embodiments of the present disclosure, and Figure 4 shows a cross-sectional view taken along line B-B' of Figure 3; The carrier device 40 is configured to carry the processing element 3 and move the machining element 3 between a loading and unloading position (Fig. 6) and a machining position (Fig. 7). In some embodiments, as shown in FIG. 3, the carrier device 40 includes a stage body 41 and two chucking devices 45. An opening 43 is formed through the center of the stage body 41, wherein the size of the opening 43 can be The size of the processing element 3 is adjusted. Two suction cup devices 45 are respectively disposed on opposite sides of the opening 43. As shown in FIG. 4, each of the chucking devices 45 includes a plurality of suction holes 451 formed therein, and the suction holes 451 are coupled to a vacuum source 49. In addition, a film 47 is attached to one end of the suction hole 451.

參照第1圖,加工裝置50係配置用於利用加工元件3加工一基板5。在部分實施例中,加工元件3為一光罩,且基板5為一半導體晶圓。加工裝置50係用於在顯影製程當中曝光基板5之曝光裝置。在部分實施例中,曝光裝置50包括一光源51、一鏡片組件53及一用於夾持半導體晶圓5之基板夾持座55。 Referring to Fig. 1, the processing apparatus 50 is configured to process a substrate 5 by the processing element 3. In some embodiments, the processing component 3 is a photomask and the substrate 5 is a semiconductor wafer. The processing device 50 is an exposure device for exposing the substrate 5 during the development process. In some embodiments, the exposure device 50 includes a light source 51, a lens assembly 53, and a substrate holder 55 for holding the semiconductor wafer 5.

半導體晶圓5可包括多種裝置元件。形成於半導體晶圓5中的裝置元件的實施例包括電晶體(如金氧半場效應電晶體(MOSFET)、互補式金氧半場效電晶體(CMOS)、雙極接面電晶體(BJT)、高電壓電晶體、高頻電晶體、P-通道及/或N-通道場效電晶體等)、二極體及/或其他可應用元件。執行多種程序以形成該些裝置元件,例如,沉積、刻蝕、佈植、光刻、回火及/或其他適用程序。在部分實施例中,淺凹槽隔離(STI)層、層間介電質(ILD)或層間介電層覆蓋在半導體晶圓5的裝置元件上。 The semiconductor wafer 5 can include a variety of device components. Embodiments of device elements formed in semiconductor wafer 5 include transistors (eg, gold oxide half field effect transistors (MOSFET), complementary metal oxide half field effect transistors (CMOS), bipolar junction transistors (BJT), High voltage transistors, high frequency transistors, P-channels and/or N-channel field effect transistors, etc.), diodes and/or other applicable components. A variety of procedures are performed to form the device components, such as deposition, etching, implantation, photolithography, tempering, and/or other suitable procedures. In some embodiments, a shallow trench isolation (STI) layer, an interlayer dielectric (ILD), or an interlayer dielectric layer overlies the device elements of the semiconductor wafer 5.

如第2圖所示,光罩3可包括一本體301及一薄膠膜303。本體31可由適當的透明材料製成,例如玻璃、石英或CF2,在其上方形成不透明材料例如鉻的圖案。若該光罩為相轉移光罩(phase-shifting layer),則在鉻層的下方提供一相轉移層。於部分實施例中,該相轉移層可包括任一組成,擇自過渡金屬元素、鑭系元素及其任意組合。例如包括Mo、Zr、Ta、Cr、和 Hf。於一範例中,上述含金屬層是由以下材料之一構成,MoSi、MoSiON或Cr。薄膠膜303係組裝於該本體301上,以保護形成於本體301上的圖案。薄膠膜303可形成的厚度範圍介於約2μm至約5μm厚,且對於光具有高的穿透率。 As shown in FIG. 2, the photomask 3 may include a body 301 and a thin film 303. The body 31 can be made of a suitable transparent material, such as glass, quartz or CF2, over which a pattern of opaque material such as chrome is formed. If the reticle is a phase-shifting layer, a phase transfer layer is provided beneath the chrome layer. In some embodiments, the phase transfer layer can comprise any composition selected from transition metal elements, lanthanides, and any combination thereof. Examples include Mo, Zr, Ta, Cr, and Hf. In one example, the metal-containing layer is composed of one of the following materials, MoSi, MoSiON or Cr. A thin film 303 is assembled on the body 301 to protect a pattern formed on the body 301. The thin film 303 can be formed to a thickness ranging from about 2 μm to about 5 μm thick and having a high transmittance for light.

繼續參照第2圖,聲波產生裝置60係配置用於產生一聲波。在部分實施例中,聲波產生裝置60係相對二個夾持頭34、35之一者沿一軸線Z設置,且包括一換能器61及一連結於換能器61的振盪器63。換能器61電性連結於控制裝置70,並根據來自控制裝置70之電子訊號轉換為強度不同之磁力。振盪器63受上述磁力作用而振動,進而產生發出聲波。在部分實施例中,聲波產生裝置60產生之聲波為超音波,其頻率係介於約10kHz(千赫)至約100kHz之間。 Continuing with reference to Figure 2, the acoustic wave generating device 60 is configured to generate an acoustic wave. In some embodiments, the acoustic wave generating device 60 is disposed along an axis Z with respect to one of the two clamping heads 34, 35, and includes a transducer 61 and an oscillator 63 coupled to the transducer 61. The transducer 61 is electrically coupled to the control device 70 and converted to a magnetic force having a different intensity according to an electronic signal from the control device 70. The oscillator 63 is vibrated by the above-described magnetic force to generate an acoustic wave. In some embodiments, the acoustic wave generated by acoustic wave generating device 60 is an ultrasonic wave having a frequency between about 10 kHz (kilohertz) and about 100 kHz.

控制裝置70配置用於控制運送系統1的多個裝置的運作。在部分實施例中,控制裝置70為一電腦裝置,以有線或無線的方式連結至運送系統1的其餘裝置。舉例而言,控制裝置70電性連結至交換裝置30、承載裝置40、及聲波產生裝置60。控制裝置70控制交換裝置30與承載裝置40的移動,並且控制聲波產生裝置60的作動,包括聲波產生裝置60產生之聲波的波長或頻率。在部分實施例中,控制交換裝置30或聲波產生裝置60上配置有偵測器,以偵測承載裝置40的位置並回送至控制裝置70。 The control device 70 is configured to control the operation of a plurality of devices of the transport system 1. In some embodiments, control device 70 is a computer device that is coupled to the remaining devices of transport system 1 in a wired or wireless manner. For example, the control device 70 is electrically coupled to the switching device 30, the carrier device 40, and the acoustic wave generating device 60. The control device 70 controls the movement of the switching device 30 and the carrier device 40, and controls the operation of the acoustic wave generating device 60, including the wavelength or frequency of the acoustic wave generated by the acoustic wave generating device 60. In some embodiments, the control switching device 30 or the sound wave generating device 60 is provided with a detector to detect the position of the carrier device 40 and send it back to the control device 70.

第5圖是根據本揭露之部分實施例顯示之運送一光罩的方法80的流程圖。為了說明,該流程圖將與第6-9圖中所示的示意圖一起描述。對於不同的實施例,可以替換或消除 描述的一些操作。可以將額外的部件添加到運送系統1。對於不同的實施例,可以替換或消除描述的一些部件。 FIG. 5 is a flow chart showing a method 80 of transporting a reticle in accordance with some embodiments of the present disclosure. For purposes of illustration, the flowchart will be described in conjunction with the schematics shown in Figures 6-9. Can be replaced or eliminated for different embodiments Some of the operations described. Additional components can be added to the transport system 1. Some of the components described may be replaced or eliminated for different embodiments.

方法80開始於操作81,在操作81中,加工元件3利用交換裝置30放置於承載裝置40之上。在部分實施例中,為運送由夾持頭35所夾持的加工元件3至加工裝置50中以進行加工,承載裝置40係先移動至如第6圖所示之位置。在此位置上,承載裝置40位於夾持頭35與聲波發射裝置60之間。夾持頭35、承載裝置40及聲波發射裝置60依序沿軸線Z排列。在其餘未圖示的實施例中,在裝載加工元件3時,承載裝置40位於夾持頭35下方,而未設置在夾持頭35與聲波發射裝置60之間。 The method 80 begins at operation 81 where the processing element 3 is placed over the carrier device 40 using the switching device 30. In some embodiments, to transport the processing element 3 held by the clamping head 35 into the processing apparatus 50 for processing, the carrier 40 is first moved to the position shown in FIG. In this position, the carrier 40 is located between the clamping head 35 and the acoustic wave emitting device 60. The clamping head 35, the carrier device 40 and the acoustic wave emitting device 60 are sequentially arranged along the axis Z. In the remaining embodiments not shown, when the processing element 3 is loaded, the carrier 40 is located below the clamping head 35 and is not disposed between the clamping head 35 and the acoustic wave emitting device 60.

接著,下降升降單元33,使夾持頭35所夾持的加工元件3放置於承載裝置40之上。此時,加工元件3的薄膠膜303是位於開口43當中,並且加工元件3的本體301的相對二側是受吸盤裝置45所固定。其中,加工元件3的本體301的相對二側係直接接觸薄膜47,並藉由吸孔451所連結的真空吸附,以固定於承載裝置40之上。接著,如第7圖所示,夾持頭35釋放加工元件3,並且升降單元33升起夾持頭35。 Next, the lifting unit 33 is lowered to place the processing element 3 held by the chucking head 35 on the carrier device 40. At this time, the thin film 303 of the processing element 3 is located in the opening 43, and the opposite sides of the body 301 of the processing element 3 are fixed by the chuck device 45. The opposite sides of the body 301 of the processing element 3 directly contact the film 47 and are vacuum-adsorbed by the suction holes 451 to be fixed on the carrier 40. Next, as shown in Fig. 7, the chucking head 35 releases the processing member 3, and the lifting unit 33 raises the chucking head 35.

在加工裝置50利用加工元件3加工基板5的實施例中,承載裝置40接著移動加工元件3至加工裝置50當中,使加工元件3設置於加工的基板5上方,以利後續加工程序進行,然而本揭露並不僅此為限。在其餘實施例中,位於承載裝置40上的加工元件3並非用於加工基板5,加工元件3僅是透過承載裝置40傳送至另一裝置。或者,加工元件3僅是設置於承載裝置40之上,承載裝置40的位置為固定,乘載裝置40未移動加工元 件3。 In the embodiment in which the processing device 50 processes the substrate 5 using the processing element 3, the carrier device 40 then moves the processing element 3 into the processing device 50, and the processing element 3 is placed over the processed substrate 5 for subsequent processing. This disclosure is not limited to this. In the remaining embodiments, the processing element 3 on the carrier 40 is not used to machine the substrate 5, and the processing element 3 is only transmitted through the carrier 40 to another device. Alternatively, the processing element 3 is only disposed on the carrying device 40, the position of the carrying device 40 is fixed, and the loading device 40 does not move the processing element. Item 3.

方法80繼續至操作82,在操作82中,移動承載裝置40至聲波發射裝置60之上,使聲波發射裝置60發出聲波之一側面對加工元件3之正面。在部分實施例中,操作82進行時,承載裝置40係移動至相同於操作81的位置。亦即,承載裝置40位於夾持頭35與聲波發射裝置60之間。並且,夾持頭35、承載裝置40及聲波發射裝置60依序沿軸線Z排列。然而,本揭露並不僅此為限。在其餘未圖示的實施例中,操作82進行時,承載裝置40位於聲波發射裝置60上方,而未設置在夾持頭35與聲波發射裝置60之間。 The method 80 continues to operation 82 where the carrier device 40 is moved over the acoustic wave transmitting device 60 such that the acoustic wave transmitting device 60 emits one side of the acoustic wave facing the front side of the processing element 3. In some embodiments, when operation 82 is in progress, carrier 40 is moved to the same position as operation 81. That is, the carrier device 40 is located between the chucking head 35 and the acoustic wave emitting device 60. Further, the chucking head 35, the carrier device 40, and the acoustic wave emitting device 60 are sequentially arranged along the axis Z. However, the disclosure is not limited to this. In the remaining unillustrated embodiment, when operation 82 is in progress, carrier 40 is positioned above acoustic emission device 60 and is not disposed between clamping head 35 and acoustic emission device 60.

在部分實施例中,承載裝置40放置於聲波發射裝置60上方時,聲波發射裝置60與承載裝置40接觸加工元件3的平面P間相隔一間距L,間距L約略等於nλ/2,其中λ為該聲波發射裝置所產生的聲波的波長,n為大於等於1的自然數。加工元件3是大致位於聲波發射裝置所產生的聲波的波峰或波谷的位置。在聲波發射裝置60與上述平面P的間距L為固定的實施例中,上述方程式可透過調整聲波發射裝置所產生的聲波的波長而被滿足。 In some embodiments, when the carrier device 40 is placed above the acoustic wave emitting device 60, the acoustic wave transmitting device 60 is spaced apart from the plane P of the processing device 40 by the processing element 3 by a distance L, and the spacing L is approximately equal to nλ/2, where λ is The wavelength of the sound wave generated by the acoustic wave emitting device, n is a natural number greater than or equal to 1. The processing element 3 is located at a position substantially at the peak or trough of the acoustic wave generated by the acoustic wave emitting device. In the embodiment in which the pitch L between the acoustic wave transmitting device 60 and the plane P described above is fixed, the above equation can be satisfied by adjusting the wavelength of the acoustic wave generated by the acoustic wave transmitting device.

方法80繼續至操作83。在操作83中,利用聲波發射裝置60產生具有能量變化的聲波,使加工元件3藉由聲波相對承載裝置40移動。在部分實施例中,聲波發射裝置60所產生的聲波的波長λ滿足公式H=(2m+1)λ/4,其中H為聲波發射裝置60與夾持頭35之間的高度差H,m為大於等於0的自然數。在部分實施例中,m為大於等於1的自然數。在部分實施例中,m為 大於n的自然數。在部分實施例中,改變上述高度差之方法包括,移動該挾持頭35相對該聲波發射裝置60的位置。在部分實施例中,改變該聲波發射裝置所產生的聲波的能量的方法包括,改變聲波的頻率及改變聲波的波長等。 The method 80 continues to operation 83. In operation 83, the acoustic wave having the energy change is generated by the acoustic wave emitting device 60, causing the processing element 3 to move relative to the carrier 40 by the acoustic wave. In some embodiments, the wavelength λ of the acoustic wave generated by the acoustic wave emitting device 60 satisfies the formula H=(2m+1)λ/4, where H is the height difference H between the acoustic wave emitting device 60 and the clamping head 35, m Is a natural number greater than or equal to 0. In some embodiments, m is a natural number greater than or equal to one. In some embodiments, m is A natural number greater than n. In some embodiments, the method of varying the height difference includes moving the position of the holding head 35 relative to the acoustic wave emitting device 60. In some embodiments, the method of changing the energy of the acoustic wave generated by the acoustic wave transmitting device includes changing the frequency of the acoustic wave, changing the wavelength of the acoustic wave, and the like.

在部分實施例中,如第8圖所示,聲波發射裝置60所產生的聲波在夾持頭35之底面進行反射,且一駐波S1產生於聲波在聲波發射裝置60與夾持頭35之間。於是,位於聲波發射裝置60與夾持頭35之間的加工元件3與承載裝置40利用「聲波懸浮」(acoustic levitation)技術,在聲波的力量能拉動下朝駐波的節點前進。 In some embodiments, as shown in FIG. 8, the sound waves generated by the acoustic wave emitting device 60 are reflected on the bottom surface of the chucking head 35, and a standing wave S1 is generated in the sound wave transmitting device 60 and the chucking head 35. between. Thus, the processing element 3 and the carrier device 40 located between the acoustic wave emitting device 60 and the chucking head 35 advance by the "acoustic levitation" technique toward the node of the standing wave under the force of the sound wave.

在部分實實施例中,由於承載裝置40之重量遠大於加工元件3的重量,聲波的力量能帶動加工元件3移動卻無法使承載裝置40進行移動。於是,加工元件3透過具有能量變化的聲波相對承載裝置40產生往覆式的相對移動,加工元件3與承載裝置40之薄膜47(第4圖)間的吸附力受到破壞,加工元件3與薄膜47間的接觸力進而降低甚至消失。 In some embodiments, since the weight of the carrier device 40 is much larger than the weight of the processing member 3, the force of the acoustic wave can cause the processing member 3 to move but the carrier device 40 cannot be moved. Then, the processing element 3 is subjected to the relative movement of the acoustic wave having the energy change relative to the carrier 40, and the adsorption force between the processing element 3 and the film 47 (Fig. 4) of the carrier device 40 is destroyed, and the processing element 3 and the film are processed. The contact force of 47 is further reduced or even disappeared.

方法80繼續至操作84。在操作84中,自承載裝置40移除加工元件3。在部分實施例中,加工元件3是透過夾持頭35自承載裝置40移除。其中,升降單元33下降夾持頭35,使夾持頭35夾持加工元件3。接著,如第9圖所示,升起升降單元33,使加工元件3自承載裝置40移除。值得注意的是,由於加工元件3與承載裝置40之薄膜47(第4圖)間的吸附力已預先受到破壞,升降單元33所提供使加工元件3自承載裝置40移除的拉力可以因此降低,進而避免薄膜47在加工元件3移除的過程中受 到破壞。 The method 80 continues to operation 84. In operation 84, the processing element 3 is removed from the carrier device 40. In some embodiments, the processing element 3 is removed from the carrier 40 by the clamping head 35. Among them, the lifting unit 33 lowers the clamping head 35 so that the clamping head 35 grips the processing element 3. Next, as shown in Fig. 9, the lifting unit 33 is raised to remove the processing element 3 from the carrier unit 40. It is to be noted that since the suction force between the processing element 3 and the film 47 (Fig. 4) of the carrier device 40 has been previously broken, the pulling force provided by the lifting unit 33 to remove the processing member 3 from the carrier device 40 can be reduced. , thereby preventing the film 47 from being subjected to the removal of the processing element 3 To destruction.

在部分實施例中,由夾持頭34所夾持的加工元件3’係在加工元件3之後被使用。於是,夾持頭34、35藉由基座31繞旋轉軸A的轉動交換位置,使加工元件3’位於承載裝置40上方。接著,重複上述操作81-83移動加工元件3’。在此同時,已使用的加工元件3則自夾持頭34移除。若有後續欲使用的加工元件則藉由夾持頭34夾持。 In some embodiments, the processing element 3' held by the clamping head 34 is used after the processing element 3. Thus, the chucking heads 34, 35 are displaced by the rotation of the base 31 about the axis of rotation A such that the processing element 3' is positioned above the carrier unit 40. Next, the above-described operations 81-83 are repeated to move the processing element 3'. At the same time, the machining element 3 that has been used is removed from the clamping head 34. If there are subsequent processing elements to be used, they are held by the clamping head 34.

參照第10圖,在部分實施例中,加工元件3的表面是用於反射聲波發射裝置60所產生的聲波,且一駐波S2形成於聲波發射裝置60與加工元件3之間。此時,聲波發射裝置60與承載裝置40接觸加工元件3的平面P間相隔一間距L,間距L等於nλ/2,其中λ為該聲波發射裝置所產生的聲波的波長,n為大於等於1的自然數。在此實施例中,n較佳等於1,或小於等於4。 Referring to Fig. 10, in some embodiments, the surface of the processing element 3 is for reflecting the sound waves generated by the acoustic wave transmitting device 60, and a standing wave S2 is formed between the acoustic wave transmitting device 60 and the processing element 3. At this time, the sound wave emitting device 60 and the plane P of the carrier device 40 contacting the processing element 3 are separated by a distance L, and the pitch L is equal to nλ/2, where λ is the wavelength of the sound wave generated by the sound wave emitting device, and n is greater than or equal to 1 Natural number. In this embodiment, n is preferably equal to 1, or less than or equal to 4.

第11圖顯示本揭露之部分實施例之運送系統1a的部分元件的示意圖。在第11圖所示的實施例中與第2圖相同或相似的元件將施予相同的符號,且其特徵將不再詳述以簡化說明內容。電運送系統1與運送系統1a的差異包括,交換裝置30為交換裝置30a所取代。 Figure 11 shows a schematic view of some of the components of the transport system 1a of some embodiments of the present disclosure. The same or similar elements as those in FIG. 2 in the embodiment shown in FIG. 11 will be given the same reference numerals, and their features will not be described in detail to simplify the description. The difference between the electric transport system 1 and the transport system 1a includes that the exchange device 30 is replaced by the exchange device 30a.

交換裝置30a配置用於在加工元件3放置於承載裝置40前後抓取加工元件3。在部分實施例中,如第11圖所示,交換裝置30包括一基座31、二個升降單元32、33、二個夾持頭34a、35a、及二個換能器36a、37a。二個升降單元32、33各自連結於基座31底面。二個夾持頭34a、35a分別連結於二個升降單元32、33之末端。基座31可繞一旋轉軸A轉動,且二個升降 單元32、33可獨立相對基座31進行垂直方向之移動。二個夾持頭34a、35a係配置利用適當之方式夾持加工元件3。舉例而言,二個夾持頭34a、35a分別連結於一真空來源,並利用真空所產生之吸力固定加工元件3於其底面。 The exchange device 30a is configured to grip the machining element 3 before and after the machining element 3 is placed on the carrier device 40. In some embodiments, as shown in Fig. 11, the switching device 30 includes a base 31, two lifting units 32, 33, two clamping heads 34a, 35a, and two transducers 36a, 37a. The two lifting units 32 and 33 are each coupled to the bottom surface of the base 31. The two clamping heads 34a, 35a are respectively coupled to the ends of the two lifting units 32, 33. The base 31 is rotatable about a rotation axis A, and two lifting The units 32, 33 are independently movable in the vertical direction relative to the base 31. The two clamping heads 34a, 35a are arranged to grip the processing element 3 in a suitable manner. For example, the two clamping heads 34a, 35a are respectively coupled to a vacuum source, and the processing element 3 is fixed to the bottom surface by the suction generated by the vacuum.

二個換能器36a、37a分別連結挾持頭34a、35a且電性連結於控制裝置70。二個換能器36a、37a根據來自控制裝置70之電子訊號轉換為強度不同之磁力。夾持頭34a、35a受上述磁力作用而振動,進而產生發出聲波。在部分實施例中,換能器36a、37a產生之聲波為超音波,其頻率係介於約10kHz(千赫)至約100kHz之間。 The two transducers 36a and 37a are connected to the holding heads 34a and 35a, respectively, and are electrically connected to the control device 70. The two transducers 36a, 37a are converted into magnetic forces of different intensities based on the electronic signals from the control device 70. The chucking heads 34a, 35a are vibrated by the above-described magnetic force to generate sound waves. In some embodiments, the acoustic waves generated by the transducers 36a, 37a are ultrasonic waves having a frequency between about 10 kHz (kilohertz) and about 100 kHz.

在部分實施例中,如第11圖所示,聲波發射裝置60所產生的聲波與夾持頭35a所產生的聲波進行干涉,且一駐波S3產生於聲波在聲波發射裝置60與夾持頭35a之間。於是,位於聲波發射裝置60與夾持頭35a之間的加工元件3與承載裝置40利用「聲波懸浮」(acoustic levitation)技術,在聲波的力量能拉動下朝駐波的節點前進。 In some embodiments, as shown in FIG. 11, the acoustic wave generated by the acoustic wave emitting device 60 interferes with the acoustic wave generated by the chucking head 35a, and a standing wave S3 is generated from the acoustic wave at the acoustic wave transmitting device 60 and the clamping head. Between 35a. Thus, the processing element 3 and the carrier device 40 located between the acoustic wave emitting device 60 and the chucking head 35a are advanced by the "acoustic levitation" technique to the node of the standing wave by the force of the sound wave.

在部分實施例中,以交換裝置30a運送加工元件3的方法相似於第5圖之方法80。然而,在操作83執行時,聲波發射裝置60與夾持頭35a所產生的聲波的波長λ各自滿足公式H=mλ/2,其中H為聲波發射裝置60與夾持頭35a之間的高度差H,m為大於等於1的自然數。在部分實施例中,m為大於n的自然數。在部分實施例中,改變上述高度差之方法包括,移動該挾持頭35a相對該聲波發射裝置60的位置。在部分實施例中,由聲波發射裝置60發出之聲波滿足方程式ua=Asin(kx-wt),且 挾持頭35a發出之聲波滿足方程式ub=Asin(kx-wt),其中ua+ub=2Acos(wt)sin(kx),且k=2π/λ。 In some embodiments, the method of transporting the processing element 3 with the exchange device 30a is similar to the method 80 of FIG. However, at the time of operation 83, the wavelengths λ of the acoustic waves generated by the acoustic wave transmitting device 60 and the chucking head 35a each satisfy the formula H = mλ/2, where H is the height difference between the acoustic wave transmitting device 60 and the chucking head 35a. H, m is a natural number greater than or equal to 1. In some embodiments, m is a natural number greater than n. In some embodiments, the method of varying the height difference includes moving the position of the holding head 35a relative to the acoustic wave emitting device 60. In some embodiments, the acoustic wave emitted by the acoustic wave emitting device 60 satisfies the equation ua=Asin(kx-wt), and The acoustic wave emitted by the holding head 35a satisfies the equation ub=Asin(kx-wt), where ua+ub=2Acos(wt)sin(kx), and k=2π/λ.

第12圖顯示本揭露之部分實施例之運送系統1b的部分元件的示意圖。在第12圖所示的實施例中與第2圖相同或相似的元件將施予相同的符號,且其特徵將不再詳述以簡化說明內容。電運送系統1與運送系統1b的差異包括,聲波發射裝置60為聲波發射裝置60b所取代。 Figure 12 is a schematic illustration of some of the components of the transport system 1b of some embodiments of the present disclosure. Elements that are the same as or similar to those in FIG. 2 in the embodiment shown in FIG. 12 will be given the same reference numerals, and their features will not be described in detail to simplify the description. The difference between the electric transport system 1 and the transport system 1b includes that the acoustic wave transmitting device 60 is replaced by the acoustic wave transmitting device 60b.

聲波發射裝置60b包括一底座62b、一可動件66b、二個柱體64b、68b、及一換能器69b。可動件沿軸線Z相對底座62b設置。柱體64b、68b分別設置於底座62b之相對二側,且各自連結底座62b與可動件66b。換能器69b連結二個柱體64b、68b之一者,並電性連結至控制裝置70。換能器69b可包括一壓電材料。 The acoustic wave emitting device 60b includes a base 62b, a movable member 66b, two cylinders 64b, 68b, and a transducer 69b. The movable member is disposed along the axis Z with respect to the base 62b. The pillars 64b and 68b are respectively disposed on opposite sides of the base 62b, and each connects the base 62b and the movable member 66b. The transducer 69b connects one of the two cylinders 64b, 68b and is electrically connected to the control device 70. The transducer 69b can include a piezoelectric material.

當換能器69b作動時,可動件66b相對底座62b進行震動,以產生震波S4。在此同時,可動件66b周圍的空氣介質受震波S4影響而震動並在夾持頭35之底面進行反射,且多個駐波S5產生於聲波在聲波發射裝置60b與夾持頭35之間。於是,位於聲波發射裝置60b與夾持頭35之間的加工元件3與承載裝置40利用「聲波懸浮」(acoustic levitation)技術,在聲波的力量能拉動下朝駐波S5的節點前進。 When the transducer 69b is actuated, the movable member 66b vibrates against the base 62b to generate the shock wave S4. At the same time, the air medium around the movable member 66b is shaken by the shock wave S4 and reflected on the bottom surface of the chucking head 35, and the plurality of standing waves S5 are generated between the sound wave transmitting device 60b and the chucking head 35. Then, the processing element 3 and the carrier device 40 located between the acoustic wave emitting device 60b and the chucking head 35 advance by the "acoustic levitation" technique toward the node of the standing wave S5 by the force of the sound wave.

在部分實施例中,以交換裝置30b運送加工元件3的方法相似於第5圖之方法80。然而,在操作83執行時,聲波發射裝置60b所產生的聲波的波長λ滿足公式H=(2m+1)λ/4,其中H為聲波發射裝置60b與夾持頭35之間的高度差H,m為大於 等於0的自然數。在部分實施例中,m為大於等於1的自然數。在部分實施例中,m為大於n的自然數。在部分實施例中,改變上述高度差之方法包括,移動該挾持頭35相對該聲波發射裝置60b的位置。 In some embodiments, the method of transporting the processing element 3 with the exchange device 30b is similar to the method 80 of FIG. However, at the time of operation 83, the wavelength λ of the acoustic wave generated by the acoustic wave transmitting device 60b satisfies the formula H = (2m + 1) λ / 4, where H is the height difference H between the acoustic wave transmitting device 60b and the chucking head 35. , m is greater than A natural number equal to zero. In some embodiments, m is a natural number greater than or equal to one. In some embodiments, m is a natural number greater than n. In some embodiments, the method of varying the height difference includes moving the position of the holding head 35 relative to the acoustic wave emitting device 60b.

本揭露的多個運送系統的實施例中,加工元件在自承載裝置分離之前,加工元件與承載裝置間的吸附力利用聲波懸浮技術進行破壞。由於用於移除加工元件的外力可因此降低,在習知技術中,加工元件自承載裝置分離時,承載裝置上與加工元件接觸的薄膜遭到破壞的情形可以進而避免。另外,由於運送系統妥善率增加,利用運送系統所進行加工的產出可以進而增加。再者,由於運送系統的使用壽命得到延長,使用加工元件進行加工的成本也因此降低。 In an embodiment of the plurality of transport systems disclosed herein, the adsorptive force between the processing element and the carrier device is disrupted by sonic suspension techniques prior to separation of the processing element from the carrier. Since the external force for removing the processing element can be reduced as a result, in the prior art, when the processing element is separated from the carrier device, the film on the carrier device in contact with the processing element is destroyed and can be further avoided. In addition, as the proper rate of the transportation system increases, the output processed by the transportation system can be further increased. Moreover, as the service life of the transport system is extended, the cost of processing using the machined components is also reduced.

以上雖然詳細描述了實施例及它們的優勢,但應該理解,在不背離所附申請專利範圍限定的本揭露的精神和範圍的情況下,對本揭露可作出各種變化、替代和修改。此外,本申請的範圍不旨在限制於說明書中所述的製程、機器、製造、物質組成、工具、方法和步驟的特定實施例。作為本領域的普通技術人員將容易地從本揭露中理解,根據本揭露,可以利用現有的或今後將被開發的、執行與在本揭露所述的對應實施例基本相同的功能或實現基本相同的結果的製程、機器、製造、物質組成、工具、方法或步驟。因此,所附申請專利範圍旨在將這些製程、機器、製造、物質組成、工具、方法或步驟包括它們的範圍內。此外,每一個申請專利範圍構成一個單獨的實施例,且不同申請專利範圍和實施例的組合都在本揭露的 範圍內。 The embodiments and their advantages are described in detail above, and it is understood that various changes, substitutions and modifications may be made in the present disclosure without departing from the spirit and scope of the disclosure. Further, the scope of the present application is not intended to be limited to the specific embodiments of the process, the machine, the manufacture, the material composition, the tool, the method and the steps described in the specification. It will be readily apparent to those skilled in the art from this disclosure that, in accordance with the present disclosure, substantially the same functions or implementations as those of the corresponding embodiments described herein may be utilized. The resulting process, machine, manufacturing, material composition, tool, method or procedure. Therefore, the scope of the appended claims is intended to cover such processes, machines, manufacture, compositions of matter, tools, methods or steps. In addition, each patent application scope constitutes a separate embodiment, and combinations of different application patent scopes and embodiments are disclosed herein. Within the scope.

3、3’‧‧‧加工元件 3, 3'‧‧‧Processing components

30‧‧‧交換裝置 30‧‧‧Exchange device

31‧‧‧基座 31‧‧‧ Pedestal

32‧‧‧升降單元 32‧‧‧ Lifting unit

33‧‧‧升降單元 33‧‧‧ Lifting unit

34‧‧‧夾持頭 34‧‧‧Clamping head

35‧‧‧夾持頭 35‧‧‧Clamping head

40‧‧‧承載裝置 40‧‧‧ Carrying device

41‧‧‧載臺本體 41‧‧‧Terminal body

60‧‧‧聲波發射裝置 60‧‧‧Sonic launcher

61‧‧‧換能器 61‧‧‧Transducer

63‧‧‧振盪器 63‧‧‧Oscillator

70‧‧‧控制裝置 70‧‧‧Control device

S1‧‧‧駐波 S1‧‧‧ Standing wave

L‧‧‧間距 L‧‧‧ spacing

H‧‧‧高度差 H‧‧‧ height difference

Z‧‧‧軸線 Z‧‧‧ axis

Claims (10)

一種運送系統,適用於運送一加工元件,包括:一聲波發射裝置,配置用以產生聲波;以及一承載裝置,配置用於承載該加工元件,其中當該加工元件設置於該承載裝置之上且該承載裝置相對該聲波發射裝置設置時,該加工元件藉由該聲波發射裝置所產生的聲波相對該承載裝置移動。 A transport system adapted to transport a processing component, comprising: an acoustic wave emitting device configured to generate acoustic waves; and a carrier configured to carry the processing component, wherein the processing component is disposed on the carrier device and When the carrying device is disposed relative to the acoustic wave transmitting device, the sound wave generated by the processing component by the acoustic wave transmitting device moves relative to the carrying device. 如申請專利範圍第1項所述之運送系統,其中該聲波發射裝置與該承載裝置相隔一間距L,該間距L約略等於nλ/2,其中λ為該聲波發射裝置所產生的聲波的波長,n為大於等於1的自然數。 The transport system of claim 1, wherein the acoustic wave transmitting device is spaced apart from the carrying device by a distance L, which is approximately equal to nλ/2, wherein λ is the wavelength of the acoustic wave generated by the acoustic wave transmitting device, n is a natural number greater than or equal to 1. 如申請專利範圍第1項所述之運送系統,更包括一夾持頭沿一軸線相對該聲波發射裝置設置並配置用於夾持該加工元件;其中該聲波發射裝置與該夾持頭相隔一高度差H,該高度差H滿足下列方程式:H=(2m+1)λ/4其中,λ為該聲波發射裝置所產生的聲波的波長,m為大於等於0的自然數,藉此設置該承載裝置上之該加工元件藉由該聲波發射裝置與該夾持頭間所產生的駐波相對該承載裝置移動。 The transport system of claim 1, further comprising a clamping head disposed along an axis relative to the acoustic wave emitting device and configured to clamp the processing component; wherein the acoustic wave emitting device is spaced apart from the clamping head a height difference H which satisfies the following equation: H = (2m + 1) λ / 4 where λ is the wavelength of the acoustic wave generated by the acoustic wave emitting device, and m is a natural number greater than or equal to 0, thereby setting the The processing element on the carrier moves relative to the carrier by a standing wave generated between the acoustic wave transmitting device and the clamping head. 如申請專利範圍第1項所述之運送系統,更包括:一夾持頭沿一軸線相對該聲波發射裝置設置並配置用於夾持該加工元件;以及 一換能器,連結該夾持頭並配置用以產生聲波;其中該聲波發射裝置與該夾持頭相隔一高度差H,該高度差H滿足下列方程式:H=mλ/2其中,λ為該聲波發射裝置所產生的聲波的波長,m為大於等於1的自然數,藉此設置該承載裝置上之該加工元件藉由該聲波發射裝置與該夾持頭間所產生的駐波相對該承載裝置移動。 The transport system of claim 1, further comprising: a clamping head disposed along an axis relative to the acoustic wave emitting device and configured to clamp the processing component; a transducer coupled to the clamping head and configured to generate an acoustic wave; wherein the acoustic wave emitting device is separated from the clamping head by a height difference H, the height difference H satisfying the following equation: H=mλ/2, where λ is The wavelength of the acoustic wave generated by the acoustic wave transmitting device, m is a natural number greater than or equal to 1, whereby the processing element on the carrying device is disposed by the standing wave generated between the acoustic wave transmitting device and the clamping head The carrying device moves. 如申請專利範圍第1項所述之運送系統,其中該聲波發射裝置包括:一底座;一可動件,沿一軸線相對該底座設置;複數個柱體,連結該底座與該可動件;以及一換能器,連結該等柱體之一者,當該換能器作動時,該可動件相對該底座進行震動。 The transport system of claim 1, wherein the acoustic wave emitting device comprises: a base; a movable member disposed along the axis relative to the base; a plurality of cylinders connecting the base and the movable member; and a The transducer is coupled to one of the cylinders, and when the transducer is actuated, the movable member vibrates relative to the base. 一種運送一加工元件的方法,包括:放置該加工元件於一承載裝置之上;移動該承載裝置至一聲波發射裝置之上;以該聲波發射裝置產生具有能量變化之聲波,使位於該承載裝置之上的該加工元件藉由該聲波發射裝置所產生的聲波相對該承載裝置移動;以及自該承載裝置移除該加工元件。 A method of transporting a processing component, comprising: placing the processing component on a carrier device; moving the carrier device onto an acoustic wave emitting device; and generating an acoustic wave having an energy change by the acoustic wave emitting device to cause the carrier device to be located The processing element above is moved by the acoustic wave generated by the acoustic wave emitting device relative to the carrier; and the processing component is removed from the carrier. 如申請專利範圍第6項所述之方法,其中當該承載裝置移動至該聲波發射裝置之上時,該聲波發射裝置與該承載裝置 相隔一間距L,該間距L約略等於nλ/2,其中λ為該聲波發射裝置所產生的聲波的波長,n為大於或等於1的自然數。 The method of claim 6, wherein the acoustic wave transmitting device and the carrying device are when the carrying device moves over the acoustic wave transmitting device Separated by a spacing L, the spacing L is approximately equal to nλ/2, where λ is the wavelength of the acoustic wave generated by the acoustic wave emitting device, and n is a natural number greater than or equal to 1. 如申請專利範圍第6項所述之方法,其中當該承載裝置移動至該聲波發射裝置之上時,該承載裝置位於該聲波發射裝置以及一用於自該承載裝置移除該加工元件之夾持頭之間;其中該方法更包括利用一連結該夾持頭的一換能器產生另一聲波,其中該聲波發射裝置所產生的聲波的波長滿足下列公式:H=mλ/2其中,H為該聲波發射裝置與該夾持頭之高度差,λ為該聲波發射裝置所產生的聲波的波長,m為大於或等於1的自然數。 The method of claim 6, wherein when the carrier device is moved over the acoustic wave emitting device, the carrier device is located at the acoustic wave emitting device and a clip for removing the processing component from the carrier device Between the heads; wherein the method further comprises generating another sound wave by using a transducer coupled to the chucking head, wherein the wavelength of the sound wave generated by the sound wave emitting device satisfies the following formula: H=mλ/2, wherein H The height difference between the acoustic wave transmitting device and the clamping head, λ is the wavelength of the acoustic wave generated by the acoustic wave emitting device, and m is a natural number greater than or equal to 1. 如申請專利範圍第6項所述之方法,其中當該承載裝置移動至該聲波發射裝置之上時,該承載裝置位於該聲波發射裝置以及一用於自該承載裝置移除該加工元件之夾持頭之間;其中該聲波發射裝置所產生的聲波的波長滿足下列公式:H=(2m+1)λ/4其中,H為該聲波發射裝置與該夾持頭之間的高度差,λ為該聲波發射裝置所產生的聲波的波長,m為大於或等於0的自然數。 The method of claim 6, wherein when the carrier device is moved over the acoustic wave emitting device, the carrier device is located at the acoustic wave emitting device and a clip for removing the processing component from the carrier device Between the heads; wherein the wavelength of the sound wave generated by the acoustic wave transmitting device satisfies the following formula: H = (2m + 1) λ / 4 where H is the height difference between the acoustic wave emitting device and the clamping head, λ The wavelength of the sound wave generated by the acoustic wave emitting device, m is a natural number greater than or equal to zero. 如申請專利範圍第6項所述之方法,其中改變該聲波發射裝置所產生之聲波的能量的方法包括,改變聲波的頻率及改 變聲波的波長。 The method of claim 6, wherein the method of changing the energy of the sound wave generated by the sound wave transmitting device comprises changing the frequency of the sound wave and changing Varying the wavelength of the sound wave.
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TW382651B (en) * 1998-05-01 2000-02-21 Tokyo Electron Ltd Instrument for measuring film thickness, and method and apparatus for substrate processing
TW200415672A (en) * 2002-05-14 2004-08-16 Toshiba Kk Fabrication method, manufacturing method for semiconductor device, and fabrication device
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