TWI577641B - System and method for recycling photoresist stripper waste liquid - Google Patents

Description

Photoresist stripper waste liquid recovery system and method thereof

The present invention relates to a waste liquid recovery system and method thereof, and more particularly to a photoresist stripper waste liquid recovery system and method therefor.

In the fabrication of a thin film transistor array for a semiconductor or a flat panel display, a specific circuit pattern is formed on the germanium wafer by a process such as coating a photoresist layer, developing, and etching, and a specific circuit pattern is formed on the germanium wafer. After that, the photoresist remaining on the germanium wafer is removed by a photo-resist stripper.

The known manufacturer removes the photoresist stripper used in the photoresist stripping process machine to the waste liquid storage tank, and some used photoresist stripper is pumped to the condenser through the exhaust system to collect and collect it into the waste liquid storage tank. . Next, the used photoresist stripper stored in the waste liquid storage tank is sent to the waste liquid clearer for waste liquid treatment. However, the above methods are likely to cause waste of resources and environmental problems. Furthermore, many electronic products currently on the market need to undergo a photoresist stripping process in the manufacturing process, so that the demand for the photoresist stripper is increased. Therefore, how to effectively recycle and reuse the used photoresist stripper is The direction of future improvement.

In view of this, the present invention provides a photoresist stripper waste liquid recovery system and a method thereof, thereby improving the recovery rate of the photoresist stripper waste liquid and reducing the waste of the photoresist stripper.

The photoresist stripper waste liquid recovery system disclosed by the invention comprises a recovery device and a waste liquid treatment device, and the waste liquid treatment device comprises a distillation module and a condensation module. The recycling device receives and processes the first waste liquid generated in the photoresist stripping process and generates the second waste liquid and the first recovered liquid, and the distillation module receives and heats the second waste liquid to make the stripping in the second waste liquid The mixture of the agent and the water partially evaporated. The condensing module receives and condenses the partially evaporated stripper mixture with water to liquefy the partially evaporated stripper mixture with water to a second recovered liquid. The first recovery liquid comprises a stripper mixture and water, and the second waste liquid and the first waste liquid both comprise at least a solid substance, a stripper mixture and water, and the second recovered liquid comprises at least a stripper mixture and water.

In one embodiment, the stripper mixture comprises at least ethylene glycol monobutyl ether (BDG), ethanolamine (1-Amino-2-hydroxyethane, monoethanolamine, MEA), and dimethyl sulfoxide (Dimethyl Sulfoxide, DMSO). And at least two of N-Methyl-2-Pyrrolidone (NMP).

In an embodiment, the distillation module may include a first heating unit to heat the second waste liquid.

In one embodiment, the waste liquid processing apparatus may include a circulation module that generates a residual liquid when the distillation module heats the second waste liquid, and the circulation module heats the residual liquid and transports the heated residual liquid back to the distillation module.

In an embodiment, the circulation module may include a second heating unit to heat the residual liquid.

In one embodiment, after the distillation module is distilled to complete the second waste liquid, a distillation residue is formed, wherein the distillation residue contains the solid matter.

In an embodiment, the solid object may include a photoresist, wherein the photoresist system may be selected from positive A group of type photoresists, negative photoresists, and combinations thereof.

In an embodiment, the photoresist stripper waste recovery system may further include a vacuum pumping unit to increase the vacuum of the waste liquid processing apparatus.

In one embodiment, the first recovered liquid can be delivered to the photoresist stripping process station.

In an embodiment, the first recovered liquid may be first delivered to the photoresist stripper adjustment tank.

In an embodiment, the second recovered liquid can be delivered to the recovery unit.

In an embodiment, the second recovered liquid may be first delivered to the storage tank.

In an embodiment, the condensation module can include a condenser, a first intermediate tank, and a second intermediate tank. The first intermediate tank is connected to the condenser to store a portion of the water in the second waste liquid. The second intermediate tank is connected to the condenser to store the second recovered liquid.

In an embodiment, the condensation module may include two switching units, one of the switching units being disposed between the condenser and the first intermediate slot, and the other switching unit being disposed between the condenser and the second intermediate slot. The switching unit selectively connects the condenser to the first intermediate tank and the second intermediate tank according to the temperature at which the distillation module heats the second waste liquid.

In one embodiment, when the temperature of the second waste liquid heated by the distillation module is less than the first temperature, the switching units may connect the condenser to the first intermediate tank, and when the distillation module heats the second waste liquid, the temperature is greater than the first At the temperature, these switching units connect the condenser to the second intermediate tank, wherein the first temperature is related to the boiling point of the water and stripper mixture.

The method for recovering the photoresist stripper waste liquid disclosed by the invention comprises: receiving, by the recovery device, the first waste liquid generated in the photoresist stripping process and generating the second waste liquid and the first recovered liquid, wherein the first The recovery liquid contains a stripper mixture and water, and the second waste liquid And the first waste liquid comprises at least a solid matter, a stripper mixture and water; and the second waste liquid is received by the distillation module of the waste liquid treatment device, and the stripper mixture and the water portion in the second waste liquid are partially evaporated. And receiving, by the condensation module of the waste liquid processing device, and condensing the partially evaporated stripper mixture and water, so that the partially evaporated stripper mixture and the water are liquefied into a second recovered liquid, wherein the second recovered liquid At least a stripper mixture and water are included.

In one embodiment, a residual liquid is additionally produced during the step of heating the second waste liquid. The waste liquid processing apparatus may further comprise a circulation module, wherein the photoresist stripper waste liquid recovery method may include the step of heating the residual liquid by the circulation module and conveying the heated residual liquid back to the distillation module.

In one embodiment, the photoresist stripper waste liquid recovery method may include the step of forming a distillation residue after the second waste liquid is distilled, wherein the distillation residue may comprise a solid matter.

In an embodiment, the photoresist stripper waste liquid recovery method may include the step of transporting the first recovered liquid to the photoresist stripping process machine.

In one embodiment, before the step of transporting the first recovered liquid to the photoresist stripping process machine, the photoresist stripper waste liquid recovery method includes the step of transporting the first recovered liquid into the photoresist stripper adjustment tank.

In one embodiment, the photoresist stripper waste recovery process can include the step of delivering a second recycle to the recovery unit.

In one embodiment, the photoresist stripper waste recovery method may include the step of delivering the second recovered liquid to the storage tank before the step of transporting the second recovered liquid to the recovery unit.

In an embodiment, the waste liquid processing apparatus may include a condenser, a first intermediate tank and a second intermediate tank, wherein the first intermediate tank and the second intermediate tank are respectively connected to the condenser, and the photoresist stripper waste liquid recovery method may include : condensing a portion of the water in the second waste liquid by the condenser to be stored in the first intermediate tank; and condensing the second recovered liquid from the condenser to be stored in the second intermediate tank.

In an embodiment, the waste liquid processing apparatus may include two switching units, one of the switching units being disposed between the condenser and the first intermediate tank, and the other switching unit being disposed between the condenser and the second intermediate tank. The photoresist stripper waste liquid recovery method may include: when the waste liquid processing device heats the second waste liquid to be lower than the first temperature, the switching units connect the condenser to the first intermediate tank to store the second waste liquid portion The water is in the first intermediate tank; and when the temperature of the waste liquid processing device heating the second waste liquid is greater than the first temperature, the switching units connect the condenser to the second intermediate tank to store the second recovered liquid in the second intermediate tank Where the first temperature is related to the boiling point of the water and stripper mixture.

According to the photoresist release agent waste liquid recovery system and method of the present invention, the second waste liquid generated by the recovery device can be treated by the waste liquid treatment device to generate the second recovery liquid to the recovery device, thereby effectively recovering A stripper mixture in the second recovered liquor. The design of the circulation module can speed up the evaporation rate of the stripper mixture and the water in the second waste liquid, and the temperature of the distillation module is kept stable, and is not easily affected by the second liquid waste at room temperature which is sent to the distillation module. The switching unit is designed such that the first intermediate tank can store a portion of the water in the second waste liquid, and the second intermediate tank can store the second recovered liquid. Furthermore, by the configuration of the vacuum pump, the vacuum degree of the photoresist stripper waste liquid recovery system is increased, thereby lowering the boiling point of the stripper mixture and water, thereby accelerating the photoresist stripping agent waste liquid recovery system for photoresist stripping. The time for the waste liquid to be recovered.

The above description of the present invention and the following description of the embodiments are intended to illustrate and explain the spirit and principles of the invention, and to provide a further explanation of the scope of the invention.

40‧‧‧ Adjusting agent

50‧‧‧Second recovery liquid

52‧‧‧Residual liquid

54‧‧‧Distillation residue

80‧‧‧First Waste

82‧‧‧Second waste

84‧‧‧First recovery liquid

88‧‧‧ water

89‧‧‧ Solids

100, 200, 300‧‧‧ photoresist stripping agent waste liquid recovery system

102‧‧‧Photoresist stripping machine

104‧‧‧Recycling device

106‧‧‧Photoresist stripping agent adjustment tank

108‧‧‧Waste treatment device

110‧‧‧ storage tank

112‧‧‧vacuum pump

502‧‧‧film evaporator

504‧‧‧Decolorizer

506‧‧‧Dehydration Tower

510‧‧‧High boiling point ingredients

512‧‧‧Low boiling point ingredients

602‧‧‧Distillation module

604‧‧‧Condensing module

606‧‧‧Circuit module

608‧‧‧ distiller

610‧‧‧First heating unit

612‧‧‧Agitator

614‧‧‧Condenser

616‧‧‧First intermediate slot

618‧‧‧second intermediate trough

620, 621, 622, 623‧‧ ‧ switching unit

624‧‧‧ pump unit

626‧‧‧Second heating unit

628‧‧‧ heat exchanger

1 is a schematic structural view of an embodiment of a photoresist stripper waste liquid recovery system according to the present invention.

Fig. 2 is a schematic view showing the structure of an embodiment of the recovery apparatus according to Fig. 1.

Fig. 3 is a schematic view showing the structure of an embodiment of the waste liquid processing apparatus according to Fig. 1.

Fig. 4 is a flow chart showing the method for recovering the photoresist stripping agent waste liquid according to an embodiment of the photoresist stripper waste liquid recovery system of Fig. 1.

Figure 5 is a schematic view showing the structure of another embodiment of the photoresist stripper waste liquid recovery system according to the present invention.

Fig. 6 is a schematic view showing the structure of an embodiment of the waste liquid processing apparatus according to Fig. 5.

Fig. 7 is a flow chart showing a method for recovering a photoresist stripping agent waste liquid according to an embodiment of the photoresist stripper waste liquid recovery system according to Fig. 5.

Figure 8 is a schematic view showing the structure of a further embodiment of the photoresist stripper waste liquid recovery system according to the present invention.

Please refer to FIG. 1 , which is a schematic structural view of an embodiment of a photoresist stripper waste liquid recovery system according to the present invention. The photoresist stripper waste liquid recovery system 100 can include a recovery unit 104 and a waste liquid processing unit 108. Recycling device 104 for receiving and processing The photoresist stripping process machine 102 performs the first waste liquid 80 generated by the photoresist stripping process and generates the second waste liquid 82 and the first recovered liquid 84. The first recovered liquid 84 can be sent to the photoresist stripping process table 102 for the photoresist stripping process table 102 to perform a photoresist stripping process, and the second waste liquid 82 can be sent to the waste liquid processing device 108. The waste liquid processing device 108 receives and processes the second waste liquid 82 and generates a second recovered liquid 50, and the second recovered liquid 50 can be sent to the recovery device 104, so that the recovery device 104 further processes the second recovered liquid 50, but the embodiment It is not intended to limit the invention. The first recovery liquid 84 includes a stripper mixture and water 88. The second waste liquid 82 and the first waste liquid 80 each include at least a solid matter 89, a stripper mixture and water 88, and the second recovered liquid 50 includes at least a stripper mixture. And water 88. In addition, the photoresist stripper waste liquid recovery system 100 may further include a vacuum pump 112 to increase the vacuum degree of the waste liquid processing apparatus 108, thereby reducing the boiling point of all components in the second waste liquid 82 under reduced pressure to avoid Deteriorated due to high temperatures.

Please refer to "Fig. 2" and "3rd drawing", which are schematic structural views of an embodiment of a recovery device and a waste liquid processing device according to "Fig. 1", respectively. The recovery unit 104 can include a thin film evaporator 502, a decolorizer 504, and a dehydration column 506, wherein the thin film evaporator 502, the decolorization column 504, and the dehydration column 506 can substantially separate the first waste liquid 80 by the principle that different substances have different boiling points, respectively. The solid matter 89, the high boiling component 510 and the low boiling component 512 generate a second waste liquid 82 and a first recovered liquid 84. The solid matter 89 may be, but not limited to, a photoresist in the first waste liquid 80. The high boiling component 510 may be, but not limited to, a partial stripper mixture in the first waste liquid 80, and the low boiling point component 512 may be, but not limited to, the first A portion of the water 88 in the waste liquid 80, the second waste liquid 82 may include a high boiling component 510. That is, the liquid in the subsequent waste liquid treatment of the present invention, the low boiling point component 512 is water, and the high boiling point component 510 is exemplified by the stripper mixture, but is not limited thereto. In other embodiments, at least two The lower boiling component of the above component is lower boiling component 512, the higher boiling component may be high boiling component 510, and the lower boiling component 512 or high boiling component 510 has recycling to be reused. When the composition, for example, the high boiling component 510, the embodiment of the present invention can be employed.

The waste liquid processing device 108 includes a distillation module 602 and a condensation module 604. The distillation module 602 can include a distiller 608 and a first heating unit 610. The condensation module 604 can include a condenser 614, a first intermediate tank 616, a second intermediate tank 618, and switching units 620, 622 for storing a portion of the low-boiling component of the second waste liquid 82, such as Water 88, a second intermediate tank 618 for storing the second recovered liquid 50. The distillation module 602 can receive the second waste liquid 82 by the distiller 608 and heat the second waste liquid 82 through the first heating unit 610, so that the stripper mixture in the second waste liquid 82 and the water 88 partially evaporate. Additionally, the distillation module 602 can include an agitator 612 to uniformly heat the second spent liquid 82 in the distiller 608.

Condensation module 604 receives and condenses the partially evaporated stripper mixture with water 88 by condenser 614 to liquefy the partially evaporated stripper mixture with water 88 into second recovered liquid 50. The switching unit 620 is disposed between the condenser 614 and the first intermediate tank 616, the switching unit 622 is disposed between the condenser 614 and the second intermediate tank 618, and the switching units 620 and 622 are heated according to the distillation module 602. The temperature of the waste liquid 82 selectively connects the condenser 614 to the first intermediate tank 616 and the second intermediate tank 618. The switching of the switching units 620, 622 will be described in detail later.

In addition, the photoresist stripper waste liquid recovery system 100 may further include switching units 621, 623. The switching unit 621 is disposed between the vacuum pump 112 and the first intermediate slot 616. The switching unit 623 is disposed between the vacuum pump 112 and the second intermediate tank 618. The switching units 621 and 623 selectively connect the vacuum pump 112 to the first intermediate tank 616 and the second intermediate tank 618 according to the temperature of the distillation module 602 to heat the second waste liquid 82. The switching conditions of the switching units 621 and 623 are acceptable. Detailed later.

In more detail, please refer to "1st" to "4th", and "4th" is an example of a photoresist stripper waste recycling system according to "1st drawing". Schematic diagram of the liquid recovery method. The photoresist stripper waste liquid recovery method includes:

Step 402: Receiving and processing the first waste liquid generated in the photoresist stripping process by the recovery device and generating the second waste liquid and the first recovered liquid;

Step 404: Receiving and heating the second waste liquid from the distillation module of the waste liquid processing device, so that the stripper mixture in the second waste liquid and the water portion are partially evaporated;

Step 406: Receiving and condensing the partially evaporated stripper mixture and water by the condensation module of the waste liquid processing apparatus, so that the partially evaporated stripper mixture and the water are liquefied into the second recovered liquid.

In this embodiment, the photoresist stripping process described in step 402 can be, but is not limited to, the process of removing photoresist during the process of fabricating a thin film transistor array, and the photoresist can be selected from the group consisting of a positive photoresist and a negative photoresist. The combination group, the selection of the photoresist type is adjusted according to the actual needs of the thin film transistor array. The photoresist stripping process machine 102 can be, but is not limited to, a photoresist removal machine (machine model code such as STO, STA or WTO), which can be adjusted according to the characteristics of objects of different photoresists. The solids 89 described above may include photoresist that is removed during the photoresist strip process.

The above stripper mixture 88 comprises at least ethylene glycol monobutyl ether (BDG), ethanolamine (1-Amino-2-hydroxyethane, Monoethanolamine (MEA), Dimethyl Sulfoxide (DMSO) and N-Methyl-2-Pyrrolidone (NMP) are at least two of them. In this embodiment, the stripper mixture 88 can be a mixture of ethylene glycol monobutyl ether and ethanolamine. Wherein, the weight percentage of water 88, solid matter 89, ethylene glycol monobutyl ether and ethanolamine in the first waste liquid 80, the first recovered liquid 84, the second waste liquid 82 and the second recovered liquid 50 can be referred to the following "table" 1", but this embodiment is not intended to limit the invention.

When performing the above steps 404 and 406, the distiller 608 of the distillation module 602 may first receive the second waste liquid 82 at normal temperature in batches, and the switching unit 620 connects the condenser 614 to the first intermediate tank 616, and the switching unit 621 The first intermediate tank 616 is connected to the vacuum pump 112, the switching unit 622 prevents the condenser 614 from being connected to the second intermediate tank 618, and the switching unit 623 prevents the second intermediate tank 618 from being connected to the vacuum pump 112. Next, the vacuum pump 112 is activated to raise the vacuum of the waste treatment device 108 to a predetermined vacuum, for example, about 130 torr. At this time, the boiling point of the water 88 is about 56 degrees Celsius, and the boiling point of the ethanolamine is about Celsius. At 122 degrees, the boiling point of ethylene glycol monobutyl ether is about 170 degrees Celsius, but this embodiment is not intended to limit the present invention, and the degree of vacuum of the waste liquid processing apparatus 108 can be adjusted according to actual needs.

When the temperature of the distillation module 602 to heat the second waste liquid 82 is substantially less than the first temperature, the condenser 614 can be caused to condense a portion of the evaporated water 88 in the second waste liquid 82 for storage in the first intermediate tank 616. In this embodiment, the first temperature may be about 110 degrees Celsius, wherein the first temperature is related to the composition ratio of water 88, ethanolamine, and ethylene glycol monobutyl ether to the second waste liquid 82. It should be noted that the first temperature is preferably between the boiling point of water 88 and the lowest boiling point of the material included in the stripper mixture.

When the temperature of the distillation module 602 heating the second waste liquid 82 is substantially greater than the first temperature, the switching unit 620 prevents the condenser 614 from being connected to the first intermediate tank 616, and the switching unit 621 prevents the first intermediate tank 616 from being connected to the vacuum pump. 112 is connected, the switching unit 622 connects the condenser 614 to the second intermediate tank 618, and the switching unit 623 connects the second intermediate tank 618 with the vacuum pump 112. At this time, the condenser 614 can condense part of the ethanol waste, ethylene glycol monobutyl ether and water 88 in the second waste liquid 82 to be stored in the second intermediate tank 618.

When the distillation module 602 heats the second waste liquid 82 to a temperature substantially greater than the second temperature, the distillation module 602 can complete the distillation of the second waste liquid 82 of the batch to form a distillation residue 54 wherein the distillation residue 54 Contains solids 89. In this embodiment, the second temperature may be about 190 degrees Celsius, and the second temperature is related to the ratio of the composition of the water 88, the ethanolamine and the ethylene glycol monobutyl ether in the second waste liquid 82, and the second temperature is greater than the first temperature. At a temperature, it should be noted that the second temperature needs to be greater than the highest boiling point of the material included in the stripper mixture.

The solid matter 89 in the above distillation residue 54 can be used as the fuel of the first heating unit 610, but the embodiment is not intended to limit the present invention, that is, the first heating unit 610 can provide a thermal energy pre-distillator by means of combustion. 608, which can also be converted to thermal energy using electrical energy to heat the distiller 608 and the heat exchanger 628.

Please refer to FIG. 5, which is a schematic structural view of another embodiment of the photoresist stripper waste liquid recovery system according to the present invention. In the present embodiment, the photoresist stripper waste liquid recovery system 200 may include a photoresist stripper adjustment tank 106 in addition to the structure described in the photoresist stripper waste liquid recovery system 100. In the present embodiment, the first recovered liquid 84 generated by the recovery device 104 is first sent to the photoresist stripper adjusting tank 106. The photoresist stripper adjustment groove 106 can adjust the first recovered liquid 84 and then transport it to the photoresist stripping process table 102 for use in the photoresist stripping process.

In the present embodiment, the waste liquid processing apparatus 108 may further include a circulation module 606 (refer to "FIG. 6", which is a schematic structural view of an embodiment of the waste liquid processing apparatus according to "FIG. 5"). The circulation module 606 can include a pumping unit 624, a second heating unit 626, and a heat exchanger 628.

In more detail, please refer to "Fig. 5" to "Fig. 7", and "Fig. 7" is an example of a photoresist stripping agent waste liquid recovery system according to "Fig. 5". Schematic diagram of the liquid recovery method. The photoresist stripper waste liquid recovery method comprises: Step 702: receiving, by the recovery device, the first waste liquid generated in the photoresist stripping process and generating the second waste liquid and the first recovered liquid; Step 703: conveying the first Recovering liquid to the photoresist stripper adjusting tank, and adding a adjusting agent to adjust the first recovered liquid; Step 704: receiving and heating the second waste liquid from the distillation module of the waste liquid processing apparatus, so that the stripping agent in the second waste liquid The mixture and the water partially evaporate and produce a residual liquid; step 706: heating the residual liquid in the heat exchanger by the second heating unit of the circulation module and conveying it back to the distillation module; Step 708: Receiving and condensing the partially evaporated stripper mixture and water by the condensation module of the waste liquid processing apparatus, so that the partially evaporated stripper mixture and the water are liquefied into the second recovered liquid.

When the above step 703 is performed, generally, in order to enable the first recovered liquid 84 to meet the standard of the photoresist stripping process table 102, the adjusting agent 40 is further introduced into the first recovered liquid 84 to adjust the concentration of the photoresist stripper or the first The pH of the recovered liquid 84, but this example is not intended to limit the invention. That is, when the adjusting agent 40 is added to the first recovered liquid 84, the concentration of the photoresist stripper and the pH value of the first recovered liquid 84 can be simultaneously adjusted. The adjusting agent 40 may be a brand new unused photoresist stripping agent, or may be a adjusting agent for adjusting the composition ratio of each photoresist stripping agent accommodated in the photoresist stripping agent adjusting groove 106, but the embodiment is not It is used to define the invention.

When the above steps 704 to 708 are performed, the distiller 608 of the distillation module 602 can first receive the second waste liquid 82 at normal temperature in batches, and the switching unit 620 connects the condenser 614 to the first intermediate tank 616, and the switching unit 621 makes The first intermediate tank 616 is connected to the vacuum pump 112. The switching unit 622 prevents the condenser 614 from being connected to the second intermediate tank 618. The switching unit 623 prevents the second intermediate tank 618 from being connected to the vacuum pump 112. Next, the vacuum pump 112 is activated to raise the vacuum of the waste treatment device 108 to a predetermined degree of vacuum, for example, about 130 torr. At this time, the boiling point of the water 88 is about 56 degrees Celsius, and the boiling point of the ethanolamine is about Celsius. At 122 degrees, the boiling point of ethylene glycol monobutyl ether is about 170 degrees Celsius.

When the temperature of the distillation module 602 to heat the second waste liquid 82 is substantially less than the first temperature, the water 88 in the portion of the second waste liquid 82 may be evaporated and the residual liquid 52 may be generated. In one aspect, the circulation module 606 can deliver the residual liquid 52 to the heat exchanger 628 by the pumping unit 624. Then, the residual liquid 52 in the heat exchanger 628 is heated by the second heating unit 626, and finally the heated residual liquid 52 is sent back to the distillation module 602. On the other hand, the condenser 614 can condense a portion of the evaporated water 88 in the second spent liquid 82 for storage in the first intermediate tank 616.

When the temperature of the distillation module 602 heating the second waste liquid 82 is substantially greater than the first temperature, the switching unit 620 prevents the condenser 614 from being connected to the first intermediate tank 616, and the switching unit 621 prevents the first intermediate tank 616 from being connected to the vacuum pump. 112 is connected, the switching unit 622 connects the condenser 614 to the second intermediate tank 618, and the switching unit 623 connects the second intermediate tank 618 with the vacuum pump 112. At this time, ethanolamine, ethylene glycol monobutyl ether and water 88 in a part of the second waste liquid 82 are heated by the distillation module 602 to evaporate and generate a residual liquid 52. In one aspect, the circulation module 606 can transfer the residual liquid 52 to the heat exchanger 628 by the pumping unit 624, and then heat the residual liquid 52 in the heat exchanger 628 with the second heating unit 626, and finally the heated residue. The liquid 52 is sent back to the distillation module 602. In another aspect, the condenser 614 can condense a portion of the second spent liquor 82 of ethanolamine, ethylene glycol monobutyl ether, and water 88 (i.e., the condenser 614 can liquefy the partially evaporated stripper mixture with the water 88 to a second The recovered liquid 50) is stored in the second intermediate tank 618.

When the distillation module 602 heats the second waste liquid 82 to a temperature substantially greater than the second temperature, the distillation module 602 completes the distillation of the second waste liquid 82 of the batch to form a distillation residue 54, wherein the distillation residue 54 comprises Solids 89. The solid matter 89 in the above distillation residue 54 can be used as fuel for the first heating unit 610 and the second heating unit 626, but the embodiment is not intended to limit the present invention, that is, the first heating unit 610 and the second heating unit. Unit 626 can provide thermal energy pre-distiller 608 and heat exchanger 628, respectively, by means of combustion, or can be converted to thermal energy by electrical energy to heat distiller 608 and heat exchanger 628.

Please refer to FIG. 8 , which is a schematic structural view of still another embodiment of the photoresist stripper waste liquid recovery system according to the present invention. In the present embodiment, the photoresist stripper waste liquid recovery system 300 may include a storage tank 110 in addition to the structure described in the photoresist stripper waste liquid recovery system 200. In this embodiment, the waste liquid processing device 108 can transport the second recovered liquid 50 to the storage tank 110 through the second intermediate tank 618. When the storage tank 110 stores a certain amount of the second recovered liquid 50, the photoresist is stripped. The agent waste liquid recovery system 300 transfers the second recovered liquid 50 in the storage tank 110 to the recovery unit 104 to further process the second recovered liquid 50, but this embodiment is not intended to limit the present invention.

According to the photoresist release agent waste liquid recovery system and method of the present invention, the second waste liquid generated by the recovery device can be treated by the waste liquid treatment device to generate the second recovery liquid to the recovery device, thereby effectively recovering The stripper mixture in the second recovered liquid, wherein the stripper mixture is the main component required for the photoresist stripping process. By means of the circulation flow design and the configuration of the heat exchanger included in the circulation module, on the one hand, the stripper mixture which is not evaporated in the second waste liquid can be quickly evaporated with water, and on the other hand, the temperature of the distillation module can be made. It is stable and is not easily affected by the second waste liquid at room temperature that is sent to the distillation module. The vacuum pump can be configured to increase the vacuum of the waste liquid treatment device, thereby reducing the boiling point of the stripper mixture and water, thereby reducing the heating temperature required for the distillation module, and allowing the second waste liquid to be recycled. The ingredients used avoid deterioration due to high temperatures. The different temperatures of the second waste liquid and the design of the switching unit can be heated by the distillation module so that the first intermediate tank can store a portion of the water in the second waste liquid, and the second intermediate tank can store the second recovered liquid.

Furthermore, the waste liquid processing device 108 in the foregoing embodiment of the present invention can be disposed in the same factory area or in the same place as the recovery device 104, and the waste liquid processing device. 108 may also be disposed in a different plant or in a different location from the recovery unit 104.

While the present invention has been described above in terms of the preferred embodiments thereof, it is not intended to limit the invention, and the invention may be modified and modified without departing from the spirit and scope of the invention. The scope of patent protection of the invention is subject to the definition of the scope of the patent application attached to this specification.

40‧‧‧ Adjusting agent

50‧‧‧Second recovery liquid

80‧‧‧First Waste

82‧‧‧Second waste

84‧‧‧First recovery liquid

102‧‧‧Photoresist stripping machine

104‧‧‧Recycling device

106‧‧‧Photoresist stripping agent adjustment tank

108‧‧‧Waste treatment device

112‧‧‧vacuum pump

200‧‧‧Photoresist stripper waste recovery system

Claims (24)

A photoresist stripper waste liquid recovery system includes: a recovery device that receives and processes a first waste liquid generated in a photoresist stripping process, and separates a solid substance and a stripper in the first waste liquid Mixing the mixture with water, and generating a second waste liquid and a first recovered liquid, the first recovered liquid is sent to a photoresist stripping process machine, wherein the first recovered liquid comprises the stripper mixture and water, and the first The second waste liquid and the first waste liquid both include the solid matter, the stripper mixture and water; and a waste liquid treatment device, comprising: a distillation module, receiving and heating the second waste liquid, so that the first waste liquid The stripper mixture in the second waste liquid is partially evaporated with water; and a condensation module receives and condenses the partially evaporated mixture of the stripper and water to liquefy the partially stripped stripper mixture with water Forming a second recovered liquid, wherein the second recovered liquid comprises at least the stripper mixture and water. The photoresist stripper waste liquid recovery system according to claim 1, wherein the stripper mixture comprises at least ethylene glycol monobutyl ether (BDG), ethanolamine (1-Amino-2-hydroxyethane, Monoethanolamine, MEA). ), at least two of Dimethyl Sulfoxide (DMSO) and N-Methyl-2-Pyrrolidone (NMP). The photoresist stripper waste liquid recovery system of claim 1, wherein the distillation module comprises a first heating unit for heating the second waste liquid. The photoresist stripper waste liquid recovery system according to claim 1, wherein the waste liquid The processing device includes a circulation module that generates a residual liquid when the distillation module heats the second waste liquid, and the circulation module heats the residual liquid and transports the heated residual liquid back to the distillation module. The photoresist stripper waste liquid recovery system of claim 4, wherein the circulation module comprises a second heating unit for heating the residual liquid. The photoresist stripper waste liquid recovery system according to claim 1, wherein when the distillation module is distilled to complete the second waste liquid, a distillation residue is formed, wherein the distillation residue contains the solid matter. The photoresist stripper waste liquid recovery system of claim 1, wherein the solid matter comprises a photoresist. The photoresist stripper waste liquid recovery system of claim 1, wherein the photoresist stripper waste liquid recovery system further comprises a vacuum pump unit for increasing the vacuum degree of the waste liquid processing apparatus. . The photoresist stripper waste liquid recovery system of claim 1, wherein the first recovered liquid is first transferred to a photoresist stripper adjustment tank. The photoresist stripper waste liquid recovery system of claim 1, wherein the second recovered liquid is delivered to the recovery device. The photoresist stripper waste liquid recovery system of claim 10, wherein the second recovered liquid is first transferred to a storage tank. The photoresist stripper waste liquid recovery system of claim 1, wherein the condensation module comprises: a condenser; A first intermediate tank is connected to the condenser to store a portion of the water in the second waste liquid, and a second intermediate tank is connected to the condenser to store the second recovered liquid. The photoresist stripper waste liquid recovery system of claim 12, wherein the condensation module comprises two switching units, one of the switching units being disposed between the condenser and the first intermediate tank, and the other The switching unit is disposed between the condenser and the second intermediate tank, and the switching units selectively connect the condenser to the first intermediate tank according to the temperature of the distillation module to heat the second waste liquid Two intermediate slots. The photoresist stripper waste liquid recovery system of claim 13, wherein when the temperature of the second waste liquid heated by the distillation module is substantially less than a first temperature, the switching units connect the condenser to the first An intermediate slot. The photoresist stripper waste liquid recovery system of claim 14, wherein when the temperature of the second waste liquid heated by the distillation module is substantially greater than the first temperature, the switching units connect the condenser to the first Two intermediate slots. A method for recovering a stripper waste liquid, comprising: receiving and processing a first waste liquid generated in a photoresist stripping process by a recycling device, separating a solid substance in the first waste liquid, a stripper mixture and water, and a second waste liquid and a first recovery liquid, wherein the first recovery liquid comprises the stripper mixture and water, and the second waste liquid and the first waste liquid both include at least The solid matter, the stripper mixture and water; receiving and heating the second waste liquid from a distillation module of a waste liquid treatment device, so that the stripper mixture and the water portion in the second waste liquid are partially evaporated; as well as Receiving and condensing the partially evaporated mixture of the stripper and water by a condensation module of the waste liquid processing device, so that the partially evaporated mixture of the stripper and the water are liquefied into a second recovered liquid, wherein the first The second recovered liquid contains at least the stripper mixture and water. The method for recovering a photoresist stripper waste liquid according to claim 16, wherein when the step of heating the second waste liquid is performed, a residual liquid is further produced, the waste liquid processing apparatus comprising a circulation module, the photoresist stripper The waste liquid recovery method includes the step of heating the residual liquid by the circulation module and conveying the heated residual liquid back to the distillation module. The method for recovering a photoresist stripper waste liquid according to claim 16, comprising the step of forming a distillation residue after the distillation of the second waste liquid is completed, wherein the distillation residue comprises the solid matter. The method for recovering a photoresist stripper waste liquid according to claim 16, comprising the step of transporting the first recovered liquid to a photoresist stripping process machine. The method for recovering the photoresist stripper waste liquid according to claim 19, before the step of transporting the first recovered liquid to the photoresist stripping process machine, comprising conveying the first recovered liquid to a photoresist stripper adjusting tank The steps in . The method for recovering a photoresist stripper waste liquid according to claim 16, comprising the step of transporting the second recovered liquid into the recovery device. The method for recovering the photoresist stripper waste liquid according to claim 21, comprising the step of transporting the second recovered liquid to a storage tank before the step of transporting the second recovered liquid to the recovery device. The method for recovering a photoresist stripper waste liquid according to claim 16, wherein the waste liquid processing apparatus comprises a condenser, a first intermediate tank and a second intermediate tank, the first intermediate The trough and the second intermediate trough are respectively connected to the condenser, and the photoresist stripper waste liquid recovery method comprises: condensing a part of the water in the second waste liquid by the condenser to be stored in the first intermediate tank; The second recovered liquid is condensed by the condenser to be stored in the second intermediate tank. The method for recovering a photoresist stripper waste liquid according to claim 23, wherein the waste liquid processing apparatus comprises two switching units, one of the switching units being disposed between the condenser and the first intermediate tank, and A switching unit is disposed between the condenser and the second intermediate tank, and the photoresist stripper waste liquid recovery method comprises: when the waste liquid processing device heats the second waste liquid, the temperature is substantially less than a first temperature The switching unit connects the condenser to the first intermediate tank to store a portion of the water in the second waste liquid in the first intermediate tank; and when the waste liquid processing device heats the second waste liquid When the temperature is substantially greater than the first temperature, the switching units connect the condenser to the second intermediate tank to store the second recovered liquid in the second intermediate tank.