TWI562853B - - Google Patents

Info

Publication number
TWI562853B
TWI562853B TW103139727A TW103139727A TWI562853B TW I562853 B TWI562853 B TW I562853B TW 103139727 A TW103139727 A TW 103139727A TW 103139727 A TW103139727 A TW 103139727A TW I562853 B TWI562853 B TW I562853B
Authority
TW
Taiwan
Application number
TW103139727A
Other languages
Chinese (zh)
Other versions
TW201524663A (zh
Inventor
Hidekazu Azuma
Masayuki Yamamoto
Kazunori Nitta
Original Assignee
Towa Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Towa Corp filed Critical Towa Corp
Publication of TW201524663A publication Critical patent/TW201524663A/zh
Application granted granted Critical
Publication of TWI562853B publication Critical patent/TWI562853B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q11/00Accessories fitted to machine tools for keeping tools or parts of the machine in good working condition or for cooling work; Safety devices specially combined with or arranged in, or specially adapted for use in connection with, machine tools
    • B23Q11/08Protective coverings for parts of machine tools; Splash guards
    • B23Q11/0816Foldable coverings, e.g. bellows
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q11/00Accessories fitted to machine tools for keeping tools or parts of the machine in good working condition or for cooling work; Safety devices specially combined with or arranged in, or specially adapted for use in connection with, machine tools
    • B23Q11/08Protective coverings for parts of machine tools; Splash guards
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30625With simultaneous mechanical treatment, e.g. mechanico-chemical polishing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Auxiliary Devices For Machine Tools (AREA)
  • Diaphragms And Bellows (AREA)
  • Dicing (AREA)
  • Folding Of Thin Sheet-Like Materials, Special Discharging Devices, And Others (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
TW103139727A 2013-11-25 2014-11-17 蛇腹機構以及具備其之搬送裝置、基板切斷裝置、加工裝置及檢查裝置 TW201524663A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013242692A JP5918197B2 (ja) 2013-11-25 2013-11-25 蛇腹機構並びにそれを備えた基板切断装置及び装置

Publications (2)

Publication Number Publication Date
TW201524663A TW201524663A (zh) 2015-07-01
TWI562853B true TWI562853B (de) 2016-12-21

Family

ID=53238312

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103139727A TW201524663A (zh) 2013-11-25 2014-11-17 蛇腹機構以及具備其之搬送裝置、基板切斷裝置、加工裝置及檢查裝置

Country Status (4)

Country Link
JP (1) JP5918197B2 (de)
KR (1) KR101692113B1 (de)
CN (1) CN104646385B (de)
TW (1) TW201524663A (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110449975B (zh) * 2019-09-18 2024-03-08 河北速博机械制造有限公司 鳞片固定结构、伸缩护罩及机床
CN110480411B (zh) * 2019-09-18 2024-03-29 河北速博机械制造有限公司 伸缩位移限制装置、鳞片伸缩护罩及机床

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB968053A (en) * 1962-05-16 1964-08-26 Arnold Hennig Improvements in and relating to the construction of bellows
US4596162A (en) * 1983-11-03 1986-06-24 Hema Maschinen- Und Apparateschutz Gmbh Protective covering for structural components of machine tools
DE3532702C2 (de) * 1985-09-13 1993-10-07 Arno Arnold Gmbh Faltenbalgen für die Abdeckung von Maschinenteilen
TW401337B (en) * 1997-01-14 2000-08-11 Disco Abrasive Systems Ltd Machining device
JP2000310330A (ja) * 1999-04-26 2000-11-07 Naberu:Kk 蛇 腹
JP2002066866A (ja) * 2000-09-04 2002-03-05 Disco Abrasive Syst Ltd ジャバラ装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1121967B (de) * 1956-08-24 1962-01-11 Arno Arnold Harmonikaartig faltbare Abdeckung fuer Werkzeugmaschinen, insbesondere fuer Schleifmaschinen
CH666732A5 (de) * 1984-07-11 1988-08-15 Gebr Hennig Gmbh Faltenbalg.
JP3103961B2 (ja) * 1993-10-20 2000-10-30 株式会社ナベル 蛇腹製造法
JPH07156039A (ja) 1993-11-30 1995-06-20 Disco Abrasive Syst Ltd 切削装置のジャバラ機構
DE4431452C2 (de) * 1994-09-03 1998-04-09 Moeller Werke Gmbh Faltenbalg zur Abdeckung von Führungsbahnen
JP3049959U (ja) * 1996-12-20 1998-06-30 日本ジャバラ工業株式会社 扇形布製ジャバラ
JP4212186B2 (ja) * 1999-06-03 2009-01-21 株式会社ナベル 工業用蛇腹
JP4988413B2 (ja) * 2007-04-16 2012-08-01 株式会社ナベル 廃液飛散防止用蛇腹装置
CN201988996U (zh) * 2011-01-31 2011-09-28 李寿鹏 “回”字型防护罩
CN103381562A (zh) * 2012-05-05 2013-11-06 文静 一种数控机床液压缸柔性保护罩
CN202934401U (zh) * 2012-10-19 2013-05-15 恽建军 散热机床防护罩

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB968053A (en) * 1962-05-16 1964-08-26 Arnold Hennig Improvements in and relating to the construction of bellows
US4596162A (en) * 1983-11-03 1986-06-24 Hema Maschinen- Und Apparateschutz Gmbh Protective covering for structural components of machine tools
DE3532702C2 (de) * 1985-09-13 1993-10-07 Arno Arnold Gmbh Faltenbalgen für die Abdeckung von Maschinenteilen
TW401337B (en) * 1997-01-14 2000-08-11 Disco Abrasive Systems Ltd Machining device
JP2000310330A (ja) * 1999-04-26 2000-11-07 Naberu:Kk 蛇 腹
JP2002066866A (ja) * 2000-09-04 2002-03-05 Disco Abrasive Syst Ltd ジャバラ装置

Also Published As

Publication number Publication date
CN104646385B (zh) 2016-10-19
CN104646385A (zh) 2015-05-27
KR20150060523A (ko) 2015-06-03
KR101692113B1 (ko) 2017-01-02
JP2015100875A (ja) 2015-06-04
TW201524663A (zh) 2015-07-01
JP5918197B2 (ja) 2016-05-18

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