TWI518027B - Large area nanopattering method and apparatus - Google Patents

Large area nanopattering method and apparatus Download PDF

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Publication number
TWI518027B
TWI518027B TW097144514A TW97144514A TWI518027B TW I518027 B TWI518027 B TW I518027B TW 097144514 A TW097144514 A TW 097144514A TW 97144514 A TW97144514 A TW 97144514A TW I518027 B TWI518027 B TW I518027B
Authority
TW
Taiwan
Prior art keywords
nanopattering
apparatus
method
large area
large
Prior art date
Application number
TW097144514A
Other versions
TW200932666A (en
Inventor
Boris Kobrin
Igor Landau
Boris Volf
Original Assignee
Rolith Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US1186108P priority Critical
Application filed by Rolith Inc filed Critical Rolith Inc
Publication of TW200932666A publication Critical patent/TW200932666A/en
Application granted granted Critical
Publication of TWI518027B publication Critical patent/TWI518027B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/42Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
    • B29C33/424Moulding surfaces provided with means for marking or patterning
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60Substrates
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/24Curved surfaces
TW097144514A 2008-01-22 2008-11-18 Large area nanopattering method and apparatus TWI518027B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US1186108P true 2008-01-22 2008-01-22

Publications (2)

Publication Number Publication Date
TW200932666A TW200932666A (en) 2009-08-01
TWI518027B true TWI518027B (en) 2016-01-21

Family

ID=40901352

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097144514A TWI518027B (en) 2008-01-22 2008-11-18 Large area nanopattering method and apparatus

Country Status (10)

Country Link
EP (1) EP2238608A4 (en)
JP (1) JP5102879B2 (en)
KR (1) KR20110008159A (en)
CN (2) CN101911249A (en)
AU (1) AU2008348353A1 (en)
CA (1) CA2709718A1 (en)
MX (1) MX2010007954A (en)
RU (1) RU2488188C2 (en)
TW (1) TWI518027B (en)
WO (1) WO2009094009A1 (en)

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WO2008153674A1 (en) 2007-06-09 2008-12-18 Boris Kobrin Method and apparatus for anisotropic etching
US8192920B2 (en) 2008-04-26 2012-06-05 Rolith Inc. Lithography method
US8334217B2 (en) 2008-06-09 2012-12-18 Rolith Inc. Material deposition over template
US8518633B2 (en) 2008-01-22 2013-08-27 Rolith Inc. Large area nanopatterning method and apparatus
CN101692151B (en) 2009-09-17 2011-12-28 复旦大学 Method for manufacturing a silicon nanowire template based soft nanoimprint technology
US9465296B2 (en) * 2010-01-12 2016-10-11 Rolith, Inc. Nanopatterning method and apparatus
RU2012134344A (en) * 2010-01-12 2014-02-20 Борис КОБРИН A method and apparatus for forming nanorisunka
CN101846880B (en) * 2010-05-12 2012-05-30 上海交通大学 Nanometer photolithography by excitating surface plasma
AT510217B1 (en) * 2010-08-13 2013-12-15 Hueck Folien Gmbh A process for the partial matting of UV coating layers
WO2012027050A2 (en) * 2010-08-23 2012-03-01 Rolith, Inc. Mask for near-field lithography and fabrication the same
US9187839B2 (en) * 2010-10-07 2015-11-17 Michael Sheehy Process for the manufacture of sealed anodized aluminum components
CN102169819B (en) * 2011-01-14 2013-01-30 中国科学院物理研究所 Method of preparing nanometer metal structure
WO2013049367A2 (en) * 2011-09-30 2013-04-04 Rolith, Inc. Plasmonic lithography using phase mask
KR101260221B1 (en) * 2011-12-01 2013-05-06 주식회사 엘지화학 Mask
WO2013158543A1 (en) * 2012-04-17 2013-10-24 The Regents Of The University Of Michigan Methods for making micro- and nano-scale conductive grids for transparent electrodes and polarizers by roll to roll optical lithography
US20150336301A1 (en) 2012-05-02 2015-11-26 Rolith, Inc. Cylindrical polymer mask and method of fabrication
JP6278954B2 (en) * 2012-05-02 2018-02-14 メタマテリアル テクノロジーズ ユーエスエー インコーポレイテッド Cylindrical polymer mask and a manufacturing method
CN102759855A (en) * 2012-07-17 2012-10-31 西安交通大学 Single code channel absolute grating scale rolling and impressing mould manufacturing method
TWI474432B (en) * 2012-11-15 2015-02-21 Lextar Electronics Corp Die positioning device, die positioning system having the same, and die positioning method of led display board
US9782917B2 (en) 2013-01-31 2017-10-10 Metamaterial Technologies Usa, Inc. Cylindrical master mold and method of fabrication
US9481112B2 (en) 2013-01-31 2016-11-01 Metamaterial Technologies Usa, Inc. Cylindrical master mold assembly for casting cylindrical masks
RU2593463C2 (en) * 2013-12-23 2016-08-10 Станислав Викторович Хартов Method for producing conductive mesh micro- and nanostructures and structure therefor
US9244356B1 (en) 2014-04-03 2016-01-26 Rolith, Inc. Transparent metal mesh and method of manufacture
KR101636696B1 (en) 2014-05-23 2016-07-06 연세대학교 산학협력단 variable large area nano imaging OPTICAL HEAD AND IMAGING DEVICE using flexible nano film optical structure
KR20160017292A (en) * 2014-08-04 2016-02-16 삼성디스플레이 주식회사 Mask for photolithography, method of manufacturing the same and method of manufacturing substrate using the same
KR20160093785A (en) 2015-01-29 2016-08-09 삼성디스플레이 주식회사 Variable mask
WO2017030151A1 (en) * 2015-08-19 2017-02-23 国立大学法人 東京大学 Method for manufacturing matrix
TWI579640B (en) * 2015-10-15 2017-04-21 Ming An Hsu Thin-film mask, fitting aids, fitting and exposure device and fitting method for the thin-film mask pasted on a curved substrate
CN106547044B (en) * 2017-01-24 2019-03-01 深圳市华星光电技术有限公司 A kind of process equipment and manufacturing method of polaroid
CN106647192A (en) * 2017-03-10 2017-05-10 深圳市华星光电技术有限公司 Exposure equipment

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Also Published As

Publication number Publication date
MX2010007954A (en) 2010-11-05
TW200932666A (en) 2009-08-01
WO2009094009A1 (en) 2009-07-30
RU2010134893A (en) 2012-02-27
CN105171985A (en) 2015-12-23
JP5102879B2 (en) 2012-12-19
CA2709718A1 (en) 2009-07-30
AU2008348353A1 (en) 2009-07-30
JP2011526069A (en) 2011-09-29
EP2238608A1 (en) 2010-10-13
KR20110008159A (en) 2011-01-26
EP2238608A4 (en) 2012-02-22
RU2488188C2 (en) 2013-07-20
CN101911249A (en) 2010-12-08

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