TWI502282B - 驅動微鏡之方法及裝置 - Google Patents

驅動微鏡之方法及裝置 Download PDF

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Publication number
TWI502282B
TWI502282B TW098133956A TW98133956A TWI502282B TW I502282 B TWI502282 B TW I502282B TW 098133956 A TW098133956 A TW 098133956A TW 98133956 A TW98133956 A TW 98133956A TW I502282 B TWI502282 B TW I502282B
Authority
TW
Taiwan
Prior art keywords
tilt
micromirror
control
actuators
control signals
Prior art date
Application number
TW098133956A
Other languages
English (en)
Chinese (zh)
Other versions
TW201019051A (en
Inventor
Jan Horn
Christian Kempter
Original Assignee
Zeiss Carl Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Gmbh filed Critical Zeiss Carl Smt Gmbh
Publication of TW201019051A publication Critical patent/TW201019051A/zh
Application granted granted Critical
Publication of TWI502282B publication Critical patent/TWI502282B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Micromachines (AREA)
TW098133956A 2008-10-08 2009-10-07 驅動微鏡之方法及裝置 TWI502282B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102008050446A DE102008050446B4 (de) 2008-10-08 2008-10-08 Verfahren und Vorrichtungen zur Ansteuerung von Mikrospiegeln

Publications (2)

Publication Number Publication Date
TW201019051A TW201019051A (en) 2010-05-16
TWI502282B true TWI502282B (zh) 2015-10-01

Family

ID=41821122

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098133956A TWI502282B (zh) 2008-10-08 2009-10-07 驅動微鏡之方法及裝置

Country Status (8)

Country Link
US (2) US8345224B2 (https=)
EP (2) EP3193203B1 (https=)
JP (1) JP5325301B2 (https=)
KR (1) KR101233900B1 (https=)
CN (2) CN102177460A (https=)
DE (1) DE102008050446B4 (https=)
TW (1) TWI502282B (https=)
WO (1) WO2010040506A1 (https=)

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DE102008050446B4 (de) 2008-10-08 2011-07-28 Carl Zeiss SMT GmbH, 73447 Verfahren und Vorrichtungen zur Ansteuerung von Mikrospiegeln
JP5587917B2 (ja) 2009-03-13 2014-09-10 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置
DE102010062720B4 (de) 2010-12-09 2012-07-12 Carl Zeiss Smt Gmbh EUV-Lithographiesystem
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TWI557432B (zh) 2011-06-13 2016-11-11 尼康股份有限公司 照明方法、曝光方法、元件製造方法、照明光學系統、以及曝光裝置
CN107390477B (zh) 2011-10-24 2020-02-14 株式会社尼康 照明系统、曝光装置及制造、图像形成、照明与曝光方法
US9732934B2 (en) 2011-10-28 2017-08-15 Nikon Corporation Illumination device for optimizing polarization in an illumination pupil
WO2013071940A1 (en) 2011-11-15 2013-05-23 Carl Zeiss Smt Gmbh Light modulator and illumination system of a microlithographic projection exposure apparatus
DE102013201506A1 (de) 2012-02-17 2013-08-22 Carl Zeiss Smt Gmbh Optisches Bauelement
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KR102170864B1 (ko) 2012-05-02 2020-10-28 가부시키가이샤 니콘 동공 휘도 분포의 평가 방법 및 개선 방법, 조명 광학계 및 그 조정 방법, 노광 장치, 노광 방법, 및 디바이스 제조 방법
DE102012011202A1 (de) * 2012-06-06 2013-09-12 Carl Zeiss Smt Gmbh Projektor und Verfahren zum Erzeugen eines Bildes
WO2014187599A1 (en) * 2013-05-22 2014-11-27 Carl Zeiss Smt Gmbh Optical component comprising an optical device and means for reducing radiation-induced influences on said optical device
DE102013212613B4 (de) * 2013-06-28 2015-07-23 Carl Zeiss Sms Gmbh Beleuchtungsoptik für ein Metrologiesystem sowie Metrologiesystem mit einer derartigen Beleuchtungsoptik
JP6273109B2 (ja) * 2013-08-28 2018-01-31 株式会社ミツトヨ 光干渉測定装置
DE102014203188A1 (de) 2014-02-21 2015-08-27 Carl Zeiss Smt Gmbh Verfahren zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage
CN104111592B (zh) * 2014-08-06 2016-06-08 中国科学院光电技术研究所 一种基于微反射镜阵列实现可变自由照明光瞳的方法
CN105573061B (zh) * 2014-10-16 2018-03-06 中芯国际集成电路制造(上海)有限公司 Euv光源和曝光装置
DE102017217164B4 (de) 2017-09-27 2020-10-15 Continental Automotive Gmbh Projektionsvorrichtung zum Erzeugen eines pixelbasierten Beleuchtungsmusters
DE102018202421B3 (de) 2018-02-16 2019-07-11 Carl Zeiss Microscopy Gmbh Vielstrahl-Teilchenstrahlsystem
DE102018216344A1 (de) * 2018-09-25 2020-03-26 Carl Zeiss Smt Gmbh Abstützung eines optischen elements
CN110347082B (zh) * 2019-07-12 2021-07-27 中国科学院上海微系统与信息技术研究所 一种驱动电路、驱动方法及微反射镜阵列
CN110954142B (zh) * 2019-12-10 2021-12-28 京东方科技集团股份有限公司 一种光学微电机传感器、基板及电子设备
CN114660880A (zh) * 2022-04-11 2022-06-24 长沙沃默科技有限公司 一种反射式投影成像装置及其设计方法
CN116698367A (zh) * 2023-05-23 2023-09-05 上海镭望光学科技有限公司 微反射镜阵列反射光光斑位置标定方法、装置及标定设备
DE102023207368A1 (de) * 2023-08-01 2025-02-06 Carl Zeiss Smt Gmbh Ansteuervorrichtung, optisches system und lithographieanlage

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Also Published As

Publication number Publication date
KR101233900B1 (ko) 2013-02-15
TW201019051A (en) 2010-05-16
CN104267495B (zh) 2016-12-07
EP3193203B1 (en) 2018-08-29
US20130088698A1 (en) 2013-04-11
DE102008050446A1 (de) 2010-04-15
JP2012505533A (ja) 2012-03-01
US10061202B2 (en) 2018-08-28
CN104267495A (zh) 2015-01-07
JP5325301B2 (ja) 2013-10-23
DE102008050446B4 (de) 2011-07-28
US8345224B2 (en) 2013-01-01
US20110188017A1 (en) 2011-08-04
EP2340456B1 (en) 2017-04-05
EP3193203A1 (en) 2017-07-19
CN102177460A (zh) 2011-09-07
WO2010040506A1 (en) 2010-04-15
KR20110067156A (ko) 2011-06-21
EP2340456A1 (en) 2011-07-06

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