TWI440987B - - Google Patents

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Publication number
TWI440987B
TWI440987B TW097114469A TW97114469A TWI440987B TW I440987 B TWI440987 B TW I440987B TW 097114469 A TW097114469 A TW 097114469A TW 97114469 A TW97114469 A TW 97114469A TW I440987 B TWI440987 B TW I440987B
Authority
TW
Taiwan
Application number
TW097114469A
Other versions
TW200900877A (en
Inventor
新井洋一
Original Assignee
尼康股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2007113049 priority Critical
Application filed by 尼康股份有限公司 filed Critical 尼康股份有限公司
Publication of TW200900877A publication Critical patent/TW200900877A/zh
Application granted granted Critical
Publication of TWI440987B publication Critical patent/TWI440987B/zh

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B7/00Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70808Construction details, e.g. housing, load-lock, seals, windows for passing light in- and out of apparatus
    • G03F7/70825Mounting of individual elements, e.g. mounts, holders or supports
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709Vibration, e.g. vibration detection, compensation, suppression
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B27/00Other optical systems; Other optical apparatus
    • G02B27/64Imaging systems using optical elements for stabilisation of the lateral and angular position of the image
    • G02B27/646Imaging systems using optical elements for stabilisation of the lateral and angular position of the image compensating for small deviations, e.g. due to vibration or shake
TW097114469A 2007-04-23 2008-04-21 TWI440987B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007113049 2007-04-23

Publications (2)

Publication Number Publication Date
TW200900877A TW200900877A (en) 2009-01-01
TWI440987B true TWI440987B (zh) 2014-06-11

Family

ID=39871921

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097114469A TWI440987B (zh) 2007-04-23 2008-04-21

Country Status (7)

Country Link
US (2) US8363340B2 (zh)
JP (1) JP5251869B2 (zh)
KR (1) KR101506358B1 (zh)
CN (1) CN101681009B (zh)
HK (1) HK1136640A1 (zh)
TW (1) TWI440987B (zh)
WO (1) WO2008133234A1 (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8044373B2 (en) * 2007-06-14 2011-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20100293940A1 (en) * 2008-01-23 2010-11-25 Konica Minolta Opto., Inc. Drive mechanism and drive device
DE102009045163B4 (de) 2009-09-30 2017-04-06 Carl Zeiss Smt Gmbh Optische Anordnung in einer mikrolithographischen Projektionsbelichtungsanlage
WO2012075122A2 (en) 2010-11-30 2012-06-07 Purdue Research Foundation Processes and intermediates for preparing substituted hexahydrofuro [2,3-b] furans
KR20160027048A (ko) * 2013-06-28 2016-03-09 가부시키가이샤 니콘 이동체 장치 및 노광 장치, 그리고 디바이스 제조 방법
WO2015113861A1 (en) 2014-01-31 2015-08-06 Asml Netherlands Bv Stage positioning system and lithographic apparatus
US9784939B2 (en) * 2014-02-03 2017-10-10 Robert S. Hodge Optical retaining device
CN104088870A (zh) * 2014-07-11 2014-10-08 中国工程物理研究院激光聚变研究中心 一种钕玻璃片夹持结构
JPWO2016047354A1 (ja) * 2014-09-25 2017-07-06 日本電産コパル株式会社 撮像装置、光学機器、電子機器、車両および撮像装置の製造方法
JP5848470B2 (ja) * 2015-02-05 2016-01-27 カール・ツァイス・エスエムティー・ゲーエムベーハー 寄生負荷最小化光学素子モジュール
DE102016201316A1 (de) * 2016-01-29 2017-01-12 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie mit einem eine feste poröse Struktur enthaltenden Dämpfungselement

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3628480A1 (de) * 1985-08-23 1987-03-05 Canon Kk Verfahren und vorrichtung zur kompensation einer bewegung eines bildes
JPS6247011A (en) * 1985-08-26 1987-02-28 Canon Inc Optical vibration isolator
US4733945A (en) * 1986-01-15 1988-03-29 The Perkin-Elmer Corporation Precision lens mounting
JPH02287308A (en) * 1989-04-03 1990-11-27 Mikhailovich Khodosovich Vladimir Method for aligning lens in mount of optical unit
JPH11119280A (ja) * 1997-10-17 1999-04-30 Canon Inc 位置制御装置及び補正光学装置
US7274430B2 (en) * 1998-02-20 2007-09-25 Carl Zeiss Smt Ag Optical arrangement and projection exposure system for microlithography with passive thermal compensation
DE19827602A1 (de) * 1998-06-20 1999-12-23 Zeiss Carl Fa Verfahren zur Korrektur nicht-rotationssymmetrischer Bildfehler
JP3819599B2 (ja) * 1998-08-05 2006-09-13 株式会社東芝 対物レンズ駆動装置の製造方法
DE10000191B8 (de) * 2000-01-05 2005-10-06 Carl Zeiss Smt Ag Projektbelichtungsanlage der Mikrolithographie
CN2431112Y (zh) 2000-06-01 2001-05-23 朱金龙 复合金属减振板
AU7775801A (en) * 2000-08-18 2002-03-04 Nikon Corp Optical element holding device
JP2003077156A (ja) 2001-06-20 2003-03-14 Mitsubishi Electric Corp 光ヘッド装置
JP4574206B2 (ja) * 2003-04-25 2010-11-04 キヤノン株式会社 駆動装置、それを用いた露光装置、デバイスの製造方法
US20060192858A1 (en) * 2005-02-28 2006-08-31 Calvet Robert J Oil damping for camera optical assembly
JP4710427B2 (ja) * 2005-06-15 2011-06-29 株式会社ニコン 光学素子保持装置、鏡筒及び露光装置並びにデバイスの製造方法
JP2007017632A (ja) * 2005-07-06 2007-01-25 Nikon Corp 光学素子保持装置、鏡筒及び露光装置並びにデバイスの製造方法
US20080278828A1 (en) * 2005-07-14 2008-11-13 Carl Zeiss Smt Ag Optical Element
US7751130B2 (en) * 2005-12-30 2010-07-06 Asml Holding N.V. Optical element damping systems
DE102006016533A1 (de) * 2006-04-07 2007-11-15 Carl Zeiss Smt Ag Haltevorrichtung für optisches Element
JP4771499B2 (ja) * 2006-09-21 2011-09-14 株式会社リコー レンズ鏡筒、撮像装置およびディジタルカメラ

Also Published As

Publication number Publication date
CN101681009A (zh) 2010-03-24
JPWO2008133234A1 (ja) 2010-07-29
KR20100017162A (ko) 2010-02-16
US20080259469A1 (en) 2008-10-23
CN101681009B (zh) 2012-09-05
US20110235014A1 (en) 2011-09-29
US8363340B2 (en) 2013-01-29
HK1136640A1 (en) 2013-05-24
KR101506358B1 (ko) 2015-03-26
JP5251869B2 (ja) 2013-07-31
TW200900877A (en) 2009-01-01
WO2008133234A1 (ja) 2008-11-06
US8498067B2 (en) 2013-07-30

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