TWI418258B - 以電漿處理多孔性原材的方法及裝置 - Google Patents

以電漿處理多孔性原材的方法及裝置 Download PDF

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Publication number
TWI418258B
TWI418258B TW095133620A TW95133620A TWI418258B TW I418258 B TWI418258 B TW I418258B TW 095133620 A TW095133620 A TW 095133620A TW 95133620 A TW95133620 A TW 95133620A TW I418258 B TWI418258 B TW I418258B
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TW
Taiwan
Prior art keywords
porous
plasma
gas
raw material
ground electrode
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TW095133620A
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English (en)
Chinese (zh)
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TW200718291A (en
Inventor
Koichi Kono
Kotaro Kimishima
Kazuki Kiso
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Publication of TW200718291A publication Critical patent/TW200718291A/zh
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Publication of TWI418258B publication Critical patent/TWI418258B/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0081—After-treatment of organic or inorganic membranes
    • B01D67/009—After-treatment of organic or inorganic membranes with wave-energy, particle-radiation or plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/06—Organic material
    • B01D71/26—Polyalkenes
    • B01D71/261—Polyethylene
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M10/00—Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements
    • D06M10/02—Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements ultrasonic or sonic; Corona discharge
    • D06M10/025—Corona discharge or low temperature plasma
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M14/00—Graft polymerisation of monomers containing carbon-to-carbon unsaturated bonds on to fibres, threads, yarns, fabrics, or fibrous goods made from such materials
    • D06M14/18—Graft polymerisation of monomers containing carbon-to-carbon unsaturated bonds on to fibres, threads, yarns, fabrics, or fibrous goods made from such materials using wave energy or particle radiation
    • D06M14/26—Graft polymerisation of monomers containing carbon-to-carbon unsaturated bonds on to fibres, threads, yarns, fabrics, or fibrous goods made from such materials using wave energy or particle radiation on to materials of synthetic origin
    • D06M14/28—Graft polymerisation of monomers containing carbon-to-carbon unsaturated bonds on to fibres, threads, yarns, fabrics, or fibrous goods made from such materials using wave energy or particle radiation on to materials of synthetic origin of macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2323/00—Details relating to membrane preparation
    • B01D2323/26—Spraying processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2323/00—Details relating to membrane preparation
    • B01D2323/34—Use of radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2323/00—Details relating to membrane preparation
    • B01D2323/42—Details of membrane preparation apparatus
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Textile Engineering (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • General Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
TW095133620A 2005-09-12 2006-09-12 以電漿處理多孔性原材的方法及裝置 TWI418258B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005264269A JP4930913B2 (ja) 2005-09-12 2005-09-12 多孔性素材のプラズマ処理方法及び処理装置

Publications (2)

Publication Number Publication Date
TW200718291A TW200718291A (en) 2007-05-01
TWI418258B true TWI418258B (zh) 2013-12-01

Family

ID=37864914

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095133620A TWI418258B (zh) 2005-09-12 2006-09-12 以電漿處理多孔性原材的方法及裝置

Country Status (9)

Country Link
US (1) US8475724B2 (fr)
EP (1) EP1933608A4 (fr)
JP (1) JP4930913B2 (fr)
KR (1) KR20080044325A (fr)
CN (1) CN101263749A (fr)
CA (1) CA2622229A1 (fr)
RU (1) RU2402374C2 (fr)
TW (1) TWI418258B (fr)
WO (1) WO2007032321A1 (fr)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0919274D0 (en) * 2009-11-03 2009-12-16 Univ The Glasgow Plasma generation apparatus and use of plasma generation apparatus
JP2011222404A (ja) * 2010-04-13 2011-11-04 Akitoshi Okino プラズマ処理方法およびプラズマ処理装置ならびにプラズマ処理された処理対象物
US8723423B2 (en) * 2011-01-25 2014-05-13 Advanced Energy Industries, Inc. Electrostatic remote plasma source
US20140101930A1 (en) * 2011-06-13 2014-04-17 Nitto Denko Corporation Method for producing separator for nonaqueous electrolyte electricity storage devices and method for producing nonaqueous electrolyte electricity storeage device
KR101945212B1 (ko) * 2011-10-20 2019-02-07 도레이 카부시키가이샤 다공질막의 제조 방법 및 그 다공질막, 전지용 세퍼레이터 및 전지
EP2586322A1 (fr) * 2011-10-27 2013-05-01 Creepservice S.à.r.l. Filtre et procédé de fabrication associé
GB201215098D0 (en) * 2012-08-24 2012-10-10 Fujifilm Mfg Europe Bv Method of treating a porous substrate and manufacture of a membrane
US11326255B2 (en) * 2013-02-07 2022-05-10 Uchicago Argonne, Llc ALD reactor for coating porous substrates
JP6020483B2 (ja) * 2014-02-14 2016-11-02 トヨタ自動車株式会社 表面処理装置と表面処理方法
EP2937890B1 (fr) * 2014-04-22 2020-06-03 Europlasma nv Appareil de revêtement au plasma avec un diffuseur de plasma et procédé prévenant la décoloration d'un substrat
TWI701292B (zh) * 2014-06-20 2020-08-11 日商東京應化工業股份有限公司 醯亞胺系樹脂膜製造系統及醯亞胺系樹脂膜製造方法
TWI673154B (zh) * 2014-06-20 2019-10-01 日商東京應化工業股份有限公司 多孔性之醯亞胺系樹脂膜製造系統、分隔膜及多孔性之醯亞胺系樹脂膜製造方法
JP2016083658A (ja) 2014-10-24 2016-05-19 パナソニックＩｐマネジメント株式会社 プラズマ生成装置
JP6545053B2 (ja) * 2015-03-30 2019-07-17 東京エレクトロン株式会社 処理装置および処理方法、ならびにガスクラスター発生装置および発生方法
WO2016158054A1 (fr) 2015-03-30 2016-10-06 東京エレクトロン株式会社 Dispositif et procédé de traitement, dispositif et procédé de génération d'agrégats de gaz
JP6779300B2 (ja) * 2016-08-22 2020-11-04 株式会社Ｆｕｊｉ プラズマ照射装置、および、プラズマ照射方法
JP6988522B2 (ja) * 2018-01-30 2022-01-05 トヨタ自動車株式会社 光照射装置
KR102243998B1 (ko) * 2019-06-06 2021-04-23 박봄이 유수 분리 기재의 표면 처리 장치
WO2021020427A1 (fr) * 2019-07-31 2021-02-04 株式会社ユポ・コーポレーション Film de conversion d'énergie, élément de conversion d'énergie et procédé de production d'un film de conversion d'énergie
WO2021072502A1 (fr) * 2019-10-16 2021-04-22 David R Mckenzie Traitement ionique de substrats par plasma
KR20220093149A (ko) * 2019-11-01 2022-07-05 도쿄엘렉트론가부시키가이샤 기판 세정 장치 및 기판 세정 방법

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1994028568A1 (fr) * 1993-05-28 1994-12-08 The University Of Tennessee Procede et appareil pour le traitement au plasma a decharge luminescente de materiaux polymeres a la pression atmospherique
JP2000208124A (ja) * 1999-01-11 2000-07-28 Sekisui Chem Co Ltd ２次電池用セパレ―タ及びその製造方法
TW429280B (en) * 1998-06-05 2001-04-11 Ind Tech Res Inst A method of surface treatment and modification on fibrous products and making the same
WO2004099490A1 (fr) * 2003-05-05 2004-11-18 Commonwealth Scientific And Industrial Research Organisation Appareil et procede de traitement par plasma

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5254688A (en) * 1975-10-30 1977-05-04 Sumitomo Chem Co Ltd Method of producing semipermeable memebrane
DE3337763A1 (de) * 1983-10-18 1985-05-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 8000 München Verfahren und vorrichtung zur oberflaechenmodifizierung der poreninnenwaende von membranen
JPH02132327A (ja) 1988-11-14 1990-05-21 Toshiba Corp 高温用超音波センサー
JPH0663099B2 (ja) * 1989-03-06 1994-08-17 善八 小久見 薄膜の製造方法
JP3286816B2 (ja) 1992-12-24 2002-05-27 イーシー化学株式会社 大気圧グロ−放電プラズマ処理法
US5403453A (en) 1993-05-28 1995-04-04 The University Of Tennessee Research Corporation Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure
DE4432919C2 (de) 1994-07-22 1997-10-23 Fraunhofer Ges Forschung Verfahren und Vorrichtung zur Plasmamodifizierung von flächigen porösen Gegenständen
JP2805002B2 (ja) 1995-04-12 1998-09-30 三洋化成工業株式会社 水性接着剤組成物
JP3455610B2 (ja) * 1995-06-09 2003-10-14 森 勇蔵 多孔体の改質処理方法およびその装置
JP3455611B2 (ja) * 1995-06-09 2003-10-14 森 勇蔵 多孔体の改質処理方法およびその装置
JPH0931226A (ja) 1995-07-20 1997-02-04 Tonen Chem Corp 親水性ポリエチレン微多孔膜、その製造方法及びそれを用いた電池用セパレータ
JPH11128634A (ja) 1997-11-04 1999-05-18 Nippon Millipore Kk 不織布フィルタおよびその製造方法並びに不織布フィルタカートリッジ
US6149985A (en) 1999-07-07 2000-11-21 Eastman Kodak Company High-efficiency plasma treatment of imaging supports
CA2395180A1 (fr) * 1999-12-15 2001-06-21 Erich Kunhardt Decharge capillaire par electrode segmentee, dispositif a plasma non thermique, et procede destine a induire des reactions chimiques
US6955794B2 (en) * 1999-12-15 2005-10-18 Plasmasol Corporation Slot discharge non-thermal plasma apparatus and process for promoting chemical reaction
JP2003007497A (ja) 2001-06-19 2003-01-10 Pearl Kogyo Kk 大気圧プラズマ処理装置
WO2003005397A2 (fr) * 2001-07-02 2003-01-16 Plasmasol Corporation Electrode nouvelle a utiliser avec un appareil emetteur de plasma et son procede d'utilisation
JP3824302B2 (ja) * 2001-11-02 2006-09-20 シャープ株式会社 プラズマ処理装置
JP2005203166A (ja) 2004-01-14 2005-07-28 Pioneer Electronic Corp プラズマ処理方法およびプラズマ処理装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1994028568A1 (fr) * 1993-05-28 1994-12-08 The University Of Tennessee Procede et appareil pour le traitement au plasma a decharge luminescente de materiaux polymeres a la pression atmospherique
TW429280B (en) * 1998-06-05 2001-04-11 Ind Tech Res Inst A method of surface treatment and modification on fibrous products and making the same
JP2000208124A (ja) * 1999-01-11 2000-07-28 Sekisui Chem Co Ltd ２次電池用セパレ―タ及びその製造方法
WO2004099490A1 (fr) * 2003-05-05 2004-11-18 Commonwealth Scientific And Industrial Research Organisation Appareil et procede de traitement par plasma

Also Published As

Publication number Publication date
RU2008114322A (ru) 2009-10-20
KR20080044325A (ko) 2008-05-20
JP2007080588A (ja) 2007-03-29
CN101263749A (zh) 2008-09-10
RU2402374C2 (ru) 2010-10-27
TW200718291A (en) 2007-05-01
EP1933608A1 (fr) 2008-06-18
US20090277776A1 (en) 2009-11-12
EP1933608A4 (fr) 2011-02-16
CA2622229A1 (fr) 2007-03-22
JP4930913B2 (ja) 2012-05-16
WO2007032321A1 (fr) 2007-03-22
US8475724B2 (en) 2013-07-02

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