TWI371779B - Temperature setting method thermal processing plate, computer-readable recording medium recording program thereon, and temperature setting apparatus for thermal processing plate - Google Patents

Temperature setting method thermal processing plate, computer-readable recording medium recording program thereon, and temperature setting apparatus for thermal processing plate

Info

Publication number
TWI371779B
TWI371779B TW096134671A TW96134671A TWI371779B TW I371779 B TWI371779 B TW I371779B TW 096134671 A TW096134671 A TW 096134671A TW 96134671 A TW96134671 A TW 96134671A TW I371779 B TWI371779 B TW I371779B
Authority
TW
Taiwan
Prior art keywords
temperature setting
thermal processing
processing plate
computer
recording medium
Prior art date
Application number
TW096134671A
Other languages
Chinese (zh)
Other versions
TW200915386A (en
Inventor
Megumi Jyousaka
Hiroshi Tomita
Masahide Tadokoro
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200915386A publication Critical patent/TW200915386A/en
Application granted granted Critical
Publication of TWI371779B publication Critical patent/TWI371779B/en

Links

TW096134671A 2006-05-22 2007-09-17 Temperature setting method thermal processing plate, computer-readable recording medium recording program thereon, and temperature setting apparatus for thermal processing plate TWI371779B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006141351A JP4664233B2 (en) 2006-05-22 2006-05-22 Heat treatment plate temperature setting method, program, computer-readable recording medium storing the program, and heat treatment plate temperature setting device

Publications (2)

Publication Number Publication Date
TW200915386A TW200915386A (en) 2009-04-01
TWI371779B true TWI371779B (en) 2012-09-01

Family

ID=38844248

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096134671A TWI371779B (en) 2006-05-22 2007-09-17 Temperature setting method thermal processing plate, computer-readable recording medium recording program thereon, and temperature setting apparatus for thermal processing plate

Country Status (2)

Country Link
JP (1) JP4664233B2 (en)
TW (1) TWI371779B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4796476B2 (en) * 2006-11-07 2011-10-19 東京エレクトロン株式会社 Heat treatment plate temperature setting method, program, computer-readable recording medium storing the program, and heat treatment plate temperature setting device
JP5162314B2 (en) * 2008-04-25 2013-03-13 東京エレクトロン株式会社 Substrate processing method, program, computer storage medium, and substrate processing system
JP6942555B2 (en) 2017-08-03 2021-09-29 東京エレクトロン株式会社 Board processing method, computer storage medium and board processing system
KR102626801B1 (en) * 2018-02-14 2024-01-18 도쿄엘렉트론가부시키가이샤 Substrate processing apparatus, substrate processing method, and storage medium

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3875158B2 (en) * 2002-08-09 2007-01-31 株式会社東芝 Exposure apparatus determination system, exposure apparatus determination method, exposure apparatus determination program, and semiconductor device manufacturing method
US7042550B2 (en) * 2002-11-28 2006-05-09 Asml Netherlands B.V. Device manufacturing method and computer program
JP2007227570A (en) * 2006-02-22 2007-09-06 Toshiba Corp System and method for adjusting manufacturing equipment

Also Published As

Publication number Publication date
TW200915386A (en) 2009-04-01
JP2007311690A (en) 2007-11-29
JP4664233B2 (en) 2011-04-06

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