TWI365519B - Apparatuses and methods for suppressing thermally induced motion of a workpiece - Google Patents

Apparatuses and methods for suppressing thermally induced motion of a workpiece

Info

Publication number
TWI365519B
TWI365519B TW093139109A TW93139109A TWI365519B TW I365519 B TWI365519 B TW I365519B TW 093139109 A TW093139109 A TW 093139109A TW 93139109 A TW93139109 A TW 93139109A TW I365519 B TWI365519 B TW I365519B
Authority
TW
Taiwan
Prior art keywords
workpiece
apparatuses
methods
thermally induced
induced motion
Prior art date
Application number
TW093139109A
Other languages
Chinese (zh)
Other versions
TW200525721A (en
Inventor
David Malcolm Camm
Mladen Bumbulovic
Joseph Cibere
J Kiefer Elliott
Steve Mccoy
Gregory Stuart
Original Assignee
Mattson Tech Canada Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/742,575 external-priority patent/US9627244B2/en
Application filed by Mattson Tech Canada Inc filed Critical Mattson Tech Canada Inc
Publication of TW200525721A publication Critical patent/TW200525721A/en
Application granted granted Critical
Publication of TWI365519B publication Critical patent/TWI365519B/en

Links

TW093139109A 2003-12-19 2004-12-16 Apparatuses and methods for suppressing thermally induced motion of a workpiece TWI365519B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/742,575 US9627244B2 (en) 2002-12-20 2003-12-19 Methods and systems for supporting a workpiece and for heat-treating the workpiece
US56868504P 2004-05-07 2004-05-07

Publications (2)

Publication Number Publication Date
TW200525721A TW200525721A (en) 2005-08-01
TWI365519B true TWI365519B (en) 2012-06-01

Family

ID=47787473

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093139109A TWI365519B (en) 2003-12-19 2004-12-16 Apparatuses and methods for suppressing thermally induced motion of a workpiece

Country Status (2)

Country Link
JP (1) JP5926142B2 (en)
TW (1) TWI365519B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114608475A (en) * 2022-02-28 2022-06-10 南京中安半导体设备有限责任公司 Chuck, phase-shift interferometer and wafer morphology interference measurement method

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59121821A (en) * 1982-12-28 1984-07-14 Ushio Inc Set-up means for heater
JPS59218722A (en) * 1983-05-27 1984-12-10 Ushio Inc Method for formation of film
JPS61129834A (en) * 1984-11-28 1986-06-17 Dainippon Screen Mfg Co Ltd Heat treatment apparatus
JPS6237927U (en) * 1985-08-27 1987-03-06
JP2680202B2 (en) * 1991-03-20 1997-11-19 国際電気株式会社 Vapor phase growth method and apparatus
US5163312A (en) * 1991-05-31 1992-11-17 Texas Instruments Incorporated Wafer proximity sensor
JPH0778830A (en) * 1993-09-07 1995-03-20 Hitachi Ltd Semiconductor manufacturing equipment
EP0669640A1 (en) * 1994-02-25 1995-08-30 Applied Materials, Inc. Susceptor for deposition apparatus
WO1999023691A2 (en) * 1997-11-03 1999-05-14 Asm America, Inc. Improved low mass wafer support system
JP2001319887A (en) * 2000-02-08 2001-11-16 Matsushita Electric Ind Co Ltd Lamp annealing apparatus and substrate for display element
WO2002047123A1 (en) * 2000-12-04 2002-06-13 Vortek Industries Ltd. Heat-treating methods and systems
US6594446B2 (en) * 2000-12-04 2003-07-15 Vortek Industries Ltd. Heat-treating methods and systems
JP2005050904A (en) * 2003-07-30 2005-02-24 Dainippon Screen Mfg Co Ltd Apparatus and method for heat treatment, and substrate installing mechanism

Also Published As

Publication number Publication date
TW200525721A (en) 2005-08-01
JP5926142B2 (en) 2016-05-25
JP2013030772A (en) 2013-02-07

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